US20190082565A1 - Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same - Google Patents
Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same Download PDFInfo
- Publication number
- US20190082565A1 US20190082565A1 US15/836,424 US201715836424A US2019082565A1 US 20190082565 A1 US20190082565 A1 US 20190082565A1 US 201715836424 A US201715836424 A US 201715836424A US 2019082565 A1 US2019082565 A1 US 2019082565A1
- Authority
- US
- United States
- Prior art keywords
- component
- stack
- insulation
- shield
- insulation component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
- H04M1/026—Details of the structure or mounting of specific components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/02—Arrangements of circuit components or wiring on supporting structure
- H05K7/04—Arrangements of circuit components or wiring on supporting structure on conductive chassis
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0007—Casings
- H05K9/002—Casings with localised screening
- H05K9/0022—Casings with localised screening of components mounted on printed circuit boards [PCB]
- H05K9/0024—Shield cases mounted on a PCB, e.g. cans or caps or conformal shields
Definitions
- This disclosure relates to shield structures and, more particularly, to shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same.
- a conventional shield structure may include a shield component and two or more insulation components along a surface of the shield component for insulating that shield component surface from another structure.
- the spacing between such insulation components along the shield component surface is often too large to meet certain functional requirements of the shield structure.
- Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same are provided.
- a method for forming an insulated shield structure for an electronic device using a shield component and a stack that includes a plurality of components, wherein the plurality of components includes a first insulation component and a second insulation component that is stacked above the first insulation component, the method including creating a cut through at least two components of the plurality of components of the stack, wherein the cut separates a first portion of the first insulation component from a second portion of the first insulation component, the cut separates a first portion of the second insulation component from a second portion of the second insulation component, the first portion of the second insulation component is stacked above the first portion of the first insulation component, and the second portion of the second insulation component is stacked above the second portion of the first insulation component, the method also including removing a first portion of the stack from a second portion of the stack, wherein the first portion of the stack includes the second portion of the first insulation component, and attaching a surface of the shield component to an exposed portion of the second portion of the stack, wherein the exposed portion of the second portion of
- an electronic device includes an electronic component and an insulated shield structure operative to shield the electronic component, wherein the insulated shield structure includes a shield component including a first shield component surface and a second shield component surface, a first insulation component attached to the first shield component surface, and a second insulation component attached to the first shield component surface, wherein a distance between a surface of the first insulation component and a surface of the second insulation component is less than 80 micrometers.
- a method for forming a multi-component structure using a base component and a stack that includes a plurality of stack components, wherein the plurality of stack components includes a first stack component and a second stack component that is stacked above the first stack component, the method including creating a cut through at least a portion of the stack, wherein the cut separates a first portion of the first stack component from a second portion of the first stack component, the cut separates a first portion of the second stack component from a second portion of the second stack component, the first portion of the second stack component is stacked above the first portion of the first stack component, and the second portion of the second stack component is stacked above the second portion of the first stack component, and the method also including joining a surface of the base component to the first portion of the first stack component and the second portion of the second stack component.
- FIG. 1 is a cross-sectional view of an illustrative assembly that includes a shield structure with reduced spacing between adjacent insulation components;
- FIG. 2 is a cross-sectional view, similar to FIG. 1 , of a portion of a material stack in a first stage of assembly of the shield structure of the assembly of FIG. 1 , taken from line II-II of FIG. 2A ;
- FIG. 2A is a top view of a portion of the material stack of FIG. 2 , taken from line IIA-IIA of FIG. 2 ;
- FIG. 3 is a cross-sectional view, similar to FIGS. 1 and 2 , of a portion of the material stack of FIGS. 2 and 2A , in a second stage of assembly of the shield structure of the assembly of FIG. 1 , taken from line III-III of FIG. 3A ;
- FIG. 3A is a top view, similar to FIG. 2A , of a portion of the material stack of FIGS. 2, 2A, and 3 , taken from line IIIA-IIIA of FIG. 2 ;
- FIG. 4 is a cross-sectional view, similar to FIGS. 1, 2, and 3 , of a portion of the material stack of FIGS. 2-3A , in a third stage of assembly of the shield structure of the assembly of FIG. 1 ;
- FIG. 5 is a cross-sectional view, similar to FIGS. 1, 2, 3, and 4 , of a portion of the material stack of FIGS. 2-4 , in a fourth stage of assembly of the shield structure of the assembly of FIG. 1 ;
- FIG. 6 is a cross-sectional view, similar to FIGS. 1, 2, 3, 4, and 5 , of a portion of the material stack of FIGS. 2-5 , in a fifth stage of assembly of the shield structure of the assembly of FIG. 1 ;
- FIG. 7 is a cross-sectional view, similar to FIGS. 1, 2, 3, 4, 5, and 6 , of a portion of the material stack of FIGS. 2-6 , in a sixth stage of assembly of the shield structure of the assembly of FIG. 1 , taken from line VII-VII of FIG. 7A ;
- FIG. 7A is a top view, similar to FIGS. 2A and 3A , of a portion of the material stack of FIGS. 2-7 , taken from line VIIA-VIIA of FIG. 7 ;
- FIGS. 8 and 9 are flowcharts of illustrative processes for manufacturing a shield structure.
- Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same are provided and described with reference to FIGS. 1-9 .
- Different insulation components of different layers of a stack may be attached to the same surface of a shield component during a single attachment (e.g., lamination) operation to attenuate the spacing between the different insulation components attached to the shield component.
- Limiting the size of a spacing between adjacent insulation components along a shield component of a shield structure may limit the size of an exposed portion of the shield component, which may limit the opportunity for that exposed shield component portion to be shorted to another structure (e.g., a support structure of an electronic device that includes the shield structure).
- the different insulation components may have different characteristics for enabling different functionalities of the shield structure.
- a first insulation component e.g., a pressure sensitive adhesive made from polyethylene terephthalate
- a second insulation component e.g., a polyimide substrate
- an electronic device assembly 100 may include an electronic component 170 and a shield structure 102 that may be operative to shield electronic component 170 .
- Electronic component 170 may be any suitable component or collection of components that may generate and/or be susceptible to any electromagnetic fields (e.g., radio frequency (“RF”) electromagnetic radiation and/or any other suitable electromagnetic interference (“EMI”)), such as any suitable electronic sensor subassembly or circuit board or the like, while shield structure 102 may be any suitable component or collection of components that may be operative to create at least a portion of a barrier for blocking EMI from traveling towards or away from electronic component 170 .
- RF radio frequency
- EMI electromagnetic interference
- Shield structure 102 may include a shield component 140 positioned above and extending along at least a portion of a top surface 171 of electronic component 170 , where shield component 140 may be any suitable component or combination of components that may be operative to create an EMI barrier, such as a conductive metal sheet (e.g., aluminum foil). Additionally, as shown, shield structure 102 may include a lower insulation component 150 positioned between and extending along at least a portion of a bottom surface 149 of shield component 140 and at least a portion of top surface 171 of electronic component 170 , where lower insulation component 150 may be any suitable component or combination of components that may be operative to insulate shield component 140 from electronic component 170 , such as a polyester core.
- Lower insulation component 150 may also include an adhesive layer along a top surface 151 for adhering lower insulation component 150 to bottom surface 149 of shield component 140 and/or an adhesive layer along a bottom surface 159 for adhering lower insulation component 150 to top surface 171 of electronic component 170 .
- shield structure 102 may include a first upper insulation component 120 positioned between and extending along a first portion of a top surface 141 of shield component 140 and a first portion of a bottom surface 119 of an assembly structure 110 opposite a top surface 111 of assembly structure 10 (e.g., any suitable support plate, such as a stainless steel mid plate or housing structure of an electronic device assembly 100 ), where upper insulation component 120 may be any suitable component or combination of components that may be operative to insulate shield component 140 from assembly structure 110 , such as a polyester core.
- first upper insulation component 120 positioned between and extending along a first portion of a top surface 141 of shield component 140 and a first portion of a bottom surface 119 of an assembly structure 110 opposite a top surface 111 of assembly structure 10 (e.g., any suitable support plate, such as a stainless steel mid plate or housing structure of an electronic device assembly 100 ), where upper insulation component 120 may be any suitable component or combination of components that may be operative to insulate shield component 140 from assembly structure 110 , such as
- Upper insulation component 120 may also include an adhesive layer along a top surface 121 for adhering upper insulation component 120 to bottom surface 119 of assembly structure 110 and/or an adhesive layer along a bottom surface 129 for adhering upper insulation component 120 to top surface 141 of shield component 140 .
- Shield structure 102 may also include a second upper insulation component 130 positioned between and extending along a second portion of top surface 141 of shield component 140 and a second portion of bottom surface 119 of assembly structure 110 , where upper insulation component 130 may be any suitable component or combination of components that may be operative to insulate shield component 140 from assembly structure 110 , such as a polyimide substrate.
- Upper insulation component 130 may also include an adhesive layer along a top surface 131 for adhering upper insulation component 130 to bottom surface 119 of assembly structure 110 and/or an adhesive layer along a bottom surface 139 for adhering upper insulation component 130 to top surface 141 of shield component 140 .
- First and second insulation components 120 and 130 may have different characteristics for enabling different functionalities of shield structure 102 .
- first insulation component 120 e.g., a pressure sensitive adhesive including a core made from polyethylene terephthalate
- second insulation component 130 e.g., a black polyimide tape including a polyimide core
- component 160 may be any suitable conductive component, such as any suitable conductive adhesive, that may be operative to form a conductive (e.g., grounding) path between electronic component 170 and shield component 140 .
- assembly 100 may also include another shield structure 108 that may include a shield component 190 , which may be positioned below and extending along at least a portion of a bottom surface 179 of electronic component 170 , and an insulation component 180 that positioned between and extending along at least a portion of a top surface 191 of shield component 190 and at least a portion of bottom surface 179 of electronic component 170 , where insulation component 180 may be any suitable component or combination of components that may be operative to insulate shield component 190 from electronic component 170 , such as a polyester core.
- a shield component 190 which may be positioned below and extending along at least a portion of a bottom surface 179 of electronic component 170
- insulation component 180 may be any suitable component or combination of components that may be operative to insulate shield component 190 from electronic component 170 , such as a polyester core.
- Insulation component 180 may also include an adhesive layer along a top surface 181 for adhering insulation component 180 to bottom surface 179 of electronic component 170 and/or an adhesive layer along a bottom surface 189 for adhering insulation component 180 to top surface 191 of shield component 190 .
- An interconnect component 166 may be positioned between a portion of electronic component 170 and a portion of shield component 190 .
- component 166 may be any suitable conductive component, such as any suitable conductive adhesive, that may be operative to form a conductive (e.g., grounding) path between electronic component 170 and shield component 190 .
- a spacing 201 of a magnitude SX may exist between a side surface 124 of first insulation component 120 and a side surface 136 of second insulation component 130 when components 120 and 130 are positioned adjacent to one another on top surface 141 of shield component 140 of shield structure 102 , where spacing 201 may expose a portion of top surface 141 of shield component 140 for potential shorting or other unfavorable electrical communication with bottom surface 119 of assembly structure 110 .
- magnitude SX of spacing 201 must be limited to a magnitude less than a particular magnitude (e.g., less than 80 micrometers, or less than 50 micrometers, or less than 30 micrometers, or less than 20 micrometers, or less than 10 micrometers).
- first insulation component 120 of a desired geometry may be obtained and attached (e.g., laminated) to top surface 141 of shield component 140
- second insulation component 130 of a desired geometry may be obtained and attached (e.g., laminated) to top surface 141 of shield component 140 at a position adjacent to first insulation component 120 that may result in an appropriately sized spacing 201 .
- magnitude SX of spacing 201 may expose magnitude SX of spacing 201 to various controlling dimensions (e.g., the cutting of the shape of component 120 , the placement of component 120 , the cutting of the shape of component 130 , the placement of component 130 , etc.) that may unfavorably increase the tolerance accumulation of magnitude SX beyond an acceptable magnitude. Therefore, other approaches may be more reliable for limiting the spacing between adjacent components on a base component, such as by attaching different insulation components from different stacked layers of a stack onto the same surface of a shield component, for example, in a single attachment operation (e.g., a single lamination operation).
- a single attachment operation e.g., a single lamination operation
- a material stack 200 may be used in conjunction with shield component 140 to form at least a portion of shield structure 102 with reduced spacing between insulation component 120 and insulation component 130 along surface 141 of shield component 140 .
- FIGS. 2-7A may be described with respect to a process for adjacently attaching two stacked insulation components on a shield component for forming an insulated shield structure, it is to be understood that such FIGS. 2-7A and such a process may be with respect to attaching any two stacked components in an adjacent manner on a surface of any base component for forming any suitable multi-component structure.
- FIGS. 2 and 2A show stack 200 in a first stage of assembly of shield structure 102 (i.e., in a stage 200 - 1 ).
- Stack 200 may include any suitable number of any suitable stack components arranged in any suitable stacking order that includes at least first insulation component 120 and second insulation component 130 .
- stage 200 - 1 of stack 200 may include a carrier component 220 , a buffer component 240 , second insulation component 130 stacked in between a portion of a bottom surface 229 of carrier component 220 and a portion of a top surface 241 of buffer component 240 , first insulation component 120 , a first liner (e.g., heavy liner) component 260 stacked in between a bottom surface 249 of buffer component 240 and top surface 121 of first insulation component 120 , and a second liner (e.g., light liner) component 280 stacked below first insulation component 120 .
- first liner e.g., heavy liner
- second liner e.g., light liner
- Second liner component 280 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 280 H between a top surface 281 and a bottom surface 289 in order to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 120 (e.g., an adhesive layer 123 ) that may be positioned to extend above and along top surface 281 of liner component 280 .
- an adhesive layer of component 120 e.g., an adhesive layer 123
- liner component 280 may include any suitable substrate layer 287 of any suitable height 287 H that may define and extend upwards from bottom surface 289 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., polyethylene terephthalate (“PET”))) or paper based substrate, in order to protect bottom surface 129 of component 120 .
- a plastic e.g., polyester (e.g., polyethylene terephthalate (“PET”)
- PET polyethylene terephthalate
- liner component 280 may include any suitable releasing agent layer 283 of any suitable height 283 H that may define and extend downwards from top surface 281 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release of liner component 280 from an adhesive layer of component 120 (e.g., adhesive layer 123 ).
- suitable releasing agent layer 283 of any suitable height 283 H may define and extend downwards from top surface 281 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release of liner component 280 from an adhesive layer of component 120 (e.g., adhesive layer 123 ).
- Height 280 H may be about 25 micrometers or may be in any suitable range, such as between 2 micrometers and 55 micrometers, while height 287 H may be about 24 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers, while height 283 H may be about 1 micrometer or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers.
- First insulation component 120 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 120 H between top surface 121 and bottom surface 129 in order to provide any suitable insulation that may be operative to insulate (e.g., from assembly structure 110 ) a portion of a shield component 140 that may be positioned to extend below and along bottom surface 129 of component 120 and/or to provide any suitable adhesion between bottom surface 129 of insulation component 120 and top surface 141 of shield component 140 and/or to provide any suitable adhesion between top surface 121 of insulation component 120 and bottom surface 119 of assembly structure 110 (e.g., a pressure sensitive adhesive).
- a pressure sensitive adhesive e.g., a pressure sensitive adhesive
- insulation component 120 may include any suitable lower adhesive layer 127 of any suitable height 127 H that may define and extend upwards from bottom surface 129 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere to top surface 141 of shield component 140 .
- insulation component 120 may include any suitable upper adhesive layer 123 of any suitable height 123 H that may define and extend downwards from top surface 121 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere to bottom surface 119 of assembly structure 110 .
- insulation component 120 may include any suitable core layer 125 of any suitable height 125 H that may extend between adhesive layers 123 and 127 and that may be made of any suitable core material, such as a polyester (e.g., PET) and/or paper-based and/or fabric and/or foam and/or metal foil based core, in order to eventually insulate (e.g., from assembly structure 110 ) a portion of a shield component 140 .
- a polyester e.g., PET
- paper-based and/or fabric and/or foam and/or metal foil based core in order to eventually insulate (e.g., from assembly structure 110 ) a portion of a shield component 140 .
- Height 120 H may be about 25 micrometers or may be in any suitable range, such as between 1 micrometer and 800 micrometers or between 2 micrometers and 54 micrometers, while height 127 H may be about 12 micrometers or may be in any suitable range, such as between 1 micrometer and 300 micrometers or between 1 micrometer and 25 micrometers, while height 125 H may be about 1 micrometer or may be in any suitable range, such as between 1 micrometer and 200 micrometers or between 1 micrometer and 4 micrometers, and while height 123 H may be about 12 micrometers or may be in any suitable range, such as between 1 micrometer and 300 micrometers or between 1 micrometer and 25 micrometers.
- First liner component 260 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 260 H between a top surface 261 and a bottom surface 269 in order to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 120 (e.g., adhesive layer 123 ) that may be positioned to extend below and along bottom surface 269 of liner component 260 .
- an adhesive layer of component 120 e.g., adhesive layer 123
- liner component 260 may include any suitable substrate layer 263 of any suitable height 263 H that may define and extend downwards from top surface 261 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., PET)) or paper based substrate, in order to protect top surface 121 of component 120 .
- liner component 260 may include any suitable releasing agent layer 267 of any suitable height 267 H that may define and extend upwards from bottom surface 269 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release of liner component 260 from an adhesive layer of component 120 (e.g., adhesive layer 123 ).
- Height 260 H may be about 25 micrometers or may be in any suitable range, such as between 2 micrometers and 55 micrometers, while height 263 H may be about 24 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers, while height 267 H may be about 1 micrometer or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers. Alternatively, height 260 H may be about 75 micrometers.
- Buffer component 240 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 240 H between a top surface 241 and bottom surface 249 in order to provide any suitable adhesion between bottom surface 249 of buffer component 240 and top surface 261 of liner component 260 and/or to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 130 (e.g., an adhesive layer 137 ) that may be positioned to extend above and along a portion of top surface 241 of buffer component 240 and/or to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of carrier component 220 (e.g., an adhesive layer 227 ) that may be positioned to extend above and along another portion of top surface 241 of buffer component 240 .
- an adhesive layer of component 130 e.g., an adhesive layer 137
- buffer component 240 may include any suitable lower adhesive layer 247 of any suitable height 247 H that may define and extend upwards from bottom surface 249 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive or foam based adhesive, in order to adhere to top surface 261 of substrate layer 263 of liner component 260 .
- suitable adhesive material such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive or foam based adhesive
- buffer component 240 may include any suitable releasing agent layer 243 of any suitable height 243 H that may define and extend downwards from top surface 241 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release of buffer component 240 from an adhesive layer of component 130 (e.g., an adhesive layer 137 ) and/or in order to enable release of buffer component 240 from an adhesive layer of carrier component 220 (e.g., adhesive layer 227 ).
- suitable releasing agent layer 243 of any suitable height 243 H may define and extend downwards from top surface 241 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release of buffer component 240 from an adhesive layer of component 130 (e.g., an adhesive layer 137 ) and/or in order to enable release of buffer component 240 from an adhesive layer of carrier component 220 (e.g., adhesive layer 227 ).
- buffer component 240 may include any suitable substrate layer 245 of any suitable height 245 H that may extend between adhesive layer 247 and releasing agent layer 243 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., PET)) or paper based substrate, in order to provide any suitable robust structure to buffer component 240 .
- a plastic e.g., polyester (e.g., PET)
- paper based substrate e.g., paper based substrate
- Height 240 H may be about 50 micrometers or may be in any suitable range, such as between 3 micrometers and 85 micrometers or between 4 micrometers and 14 micrometers, while height 247 H may be about 30 micrometers or may be in any suitable range, such as between 1 micrometer and 30 micrometers or between 1 micrometer and 8 micrometers, while height 245 H may be about 50 micrometers or may be in any suitable range, such as between 2 micrometers and 60 micrometers or between 3 micrometers and 10 micrometers, and while height 243 H may be about 5 micrometers or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers or between 0.5 micrometers and 2.0 micrometers.
- Second insulation component 130 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 130 H between top surface 131 and bottom surface 139 in order to provide any suitable insulation that may be operative to insulate (e.g., from assembly structure 110 ) a portion of shield component 140 that may be positioned to extend below and along bottom surface 139 of component 130 and/or to enable any suitable thermo-bonding process with a portion of shield component 140 below component 130 (e.g., for grounding interconnect component 160 that may be positioned between a portion of electronic component 170 and the portion of shield component 140 below second insulation component 130 ).
- insulation component 130 may include any suitable lower adhesive layer 137 of any suitable height 137 H that may define and extend upwards from bottom surface 139 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere to top surface 141 of shield component 140 .
- insulation component 130 may include any suitable substrate layer 133 of any suitable height 133 H that may extend downwards from top surface 131 and that may be made of any suitable substrate material, such as a polyimide substrate, in order to eventually insulate (e.g., from assembly structure 110 ) a portion of shield component 140 (e.g., as a black polyimide tape including a polyimide core).
- Height 130 H may be about 20 micrometers or may be in any suitable range, such as between 6 micrometers and 200 micrometers or between 6 micrometers and 45 micrometers, while height 137 H may be about 12 micrometers or may be in any suitable range, such as between 4 micrometers and 150 micrometers or between 4 micrometers and 30 micrometers, while height 133 H may be about 8 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers or between 2 micrometers and 15 micrometers.
- Carrier component 220 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 220 H between a top surface 221 and a bottom surface 229 in order to provide any suitable carrier structure that may be operative to carry some or all of the other components of stack 200 that may be positioned to extend below and along bottom surface 229 of carrier component 220 during the various stages of assembly of stack 200 (e.g., for forming shield structure 102 ), such as by adhering to insulation component 130 that may be positioned to extend below and along a portion of bottom surface 229 of carrier component 220 and/or by adhering to a portion of buffer component 240 that may be positioned to extend below and along another portion of bottom surface 229 of carrier component 220 .
- carrier component 220 may include any suitable lower adhesive layer 227 of any suitable height 227 H that may define and extend upwards from bottom surface 229 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive and/or foam adhesive, in order to adhere to top surface 131 of insulation component 130 and/or in order to adhere to a portion of top surface 241 of buffer component 240 .
- any suitable adhesive material such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive and/or foam adhesive
- carrier component 220 may include any suitable substrate layer 223 of any suitable height 223 H that may extend downwards from top surface 221 and that may be made of any suitable substrate material, such as a polyester (e.g., PET) and/or a paper-based substrate, in order to eventually provide structure to one or more other portions of stack 200 during one or more stages of assembly (e.g., as a carrier film).
- suitable substrate material such as a polyester (e.g., PET) and/or a paper-based substrate
- Height 220 H may be about 60 micrometers or may be in any suitable range, such as between 27 micrometers and 250 micrometers or between 53 micrometers and 85 micrometers, while height 227 H may be about 55 micrometers or may be in any suitable range, such as between 25 micrometers and 200 micrometers or between 50 micrometers and 75 micrometers, while height 223 H may be about 5 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers or between 3 micrometers and 10 micrometers.
- One, some, or each of components 220 , 240 , 260 , 120 , and 280 of at least stage 200 - 1 of stack 200 may be provided to extend along any suitable length in the X-axis direction (e.g., a length including length portion LP of stack 200 ), while component 130 may only extend along a portion of that length (e.g., between surfaces 132 and 138 , as shown in FIG. 2A in broken line under a transparently illustrated portion of component 220 ).
- Such a length may enable stack 200 to be used in any suitable conversion processing system, such as a roll-to-roll processing system or web processing system or reel-to-reel processing system or the like (e.g., in a +X rolling direction or in a ⁇ X rolling direction).
- a roll-to-roll processing system or web processing system or reel-to-reel processing system or the like e.g., in a +X rolling direction or in a ⁇ X rolling direction.
- two or more second insulation stack components such as second insulation stack component 130 extending between surfaces 138 and 132 , as well as another second insulation stack component 130 a extending between surface 138 a and another surface (not shown), such that a single stack 200 may be used to generate multiple shield structures.
- various elements of assembly 100 and/or stack 200 may not be illustrated to scale and/or to exact geometry in one or more of FIGS. 1-7A in order to clearly show certain features thereof in a more efficient manner.
- FIGS. 3 and 3A show stack 200 in a second stage of assembly of shield structure 102 (i.e., in a stage 200 - 2 ), which may be the same as stage 200 - 1 of stack 200 but after a cut 209 has been made through at least a portion of stack 200 by a cutting mechanism 300 .
- cutting mechanism 300 may include a blade with a pierce cutting angle 301 (e.g., an angle of 10° or less than 5° or less than 10° or less than 15°) that may create cut 209 (e.g., in about or less than 0.2 seconds) or a laser that may create cut 209 (e.g., in about or less than 0.2 microseconds), where cut 209 may be a die cut or a kiss cut or any other suitable cut type in various embodiments.
- Cutting mechanism 300 may be operative to create cut 209 without removing any material from stack 200 (e.g., while a controlled tension is provided across stack 200 (e.g., along the X-axis direction)).
- Cut 209 may be made by introducing a blade or laser or any other suitable cutting feature of cutting mechanism 300 upwards through stack 200 in an upwards cutting direction of arrow C, which may be substantially perpendicular to the bottom surface of stack 200 and/or to the bottom surface of one or more material layers of stack 200 (e.g., in the +Z direction, where the stacking of stacked components of stack 200 may be along the Z-axis), and then through removal of the cutting feature from stack 200 in a downwards removal direction of arrow R, although it is to be understood that the cutting direction and/or removal direction may form any other suitable angle with respect to stack 200 .
- cut 209 may be provided through liner component 280 , through insulation component 120 , through liner component 260 , through buffer component 240 , and through insulation component 130 , but not through carrier component 220 (e.g., such that carrier component 220 may maintain its ability to carry stack 200 through future stages of assembly).
- Cut 209 may be provided through the entirety of liner component 280 between bottom surface 289 and top surface 281 for separating liner component 280 into a first liner component portion 280 a , which may include an exposed side surface 284 , and a second liner component portion 280 b , which may include an exposed side surface 286 that may face exposed side surface 284 on an opposing side of cut 209 .
- Cut 209 may be provided through the entirety of insulation component 120 between bottom surface 129 and top surface 121 for separating insulation component 120 into a first insulation component portion 120 a , which may include an exposed side surface 124 , and a second insulation component portion 120 b , which may include an exposed side surface 126 that may face exposed side surface 124 on an opposing side of cut 209 .
- Cut 209 may be provided through the entirety of liner component 260 between bottom surface 269 and top surface 261 for separating liner component 260 into a first liner component portion 260 a , which may include an exposed side surface 264 , and a second liner component portion 260 b , which may include an exposed side surface 266 that may face exposed side surface 264 on an opposing side of cut 209 .
- Cut 209 may be provided through the entirety of buffer component 240 between bottom surface 249 and top surface 241 for separating buffer component 240 into a first buffer component portion 240 a , which may include an exposed side surface 244 , and a second buffer component portion 240 b , which may include an exposed side surface 246 that may face exposed side surface 244 on an opposing side of cut 209 .
- Cut 209 may also be provided through the entirety of insulation component 130 between bottom surface 139 and top surface 131 for separating insulation component 130 into a first insulation component portion 130 a , which may include an exposed side surface 134 , and a second insulation component portion 130 b , which may include an exposed side surface 136 that may face exposed side surface 134 on an opposing side of cut 209 .
- first component portion 130 a may be stacked above first component portion 240 a , which may be stacked above first component portion 260 a , which may be stacked above first component portion 120 a , which may be stacked above first component portion 280 a
- second component portion 130 b may be stacked above second component portion 240 b , which may be stacked above second component portion 260 b , which may be stacked above second component portion 120 b , which may be stacked above second component portion 280 b.
- Cut 209 may be created to define any suitable cut shape about a portion of stack 200 .
- a horizontal cross-section cut shape 209 s of cut 209 through stack 200 below carrier component 220 e.g., through component 280 and/or component 120 and/or component 260 and/or component 240 and/or component 130
- carrier component 220 e.g., through component 280 and/or component 120 and/or component 260 and/or component 240 and/or component 130
- any other suitable shape 209 s may be provided by cut 209 .
- FIG. 3A by cut shape 209 s only a portion of cut 209 may be provided through component 130 , while another portion of cut 209 may be provided through a portion of stack 200 that does not include component 130 .
- cut shape 209 s of cut 209 may be provided within the bounds of component 130 within stack 200 .
- cut shape 209 s may not be a closed shape, but instead cut 209 may extend to an edge of stack 200 (e.g., all the way to the ⁇ Y edge 215 of stack 200 ).
- FIG. 4 shows stack 200 in a third stage of assembly of shield structure 102 (i.e., in a stage 200 - 3 ), which may be the same as stage 200 - 2 of stack 200 but after a portion of stack 200 has been removed from another portion of stack 200 through any suitable removal process.
- a first portion of stack 200 of stage 200 - 2 which may include second component portion 240 b and second component portion 260 b and second component portion 120 b and second component portion 280 b , may be removed (e.g., in the removal direction of arrow R) from a second portion of stack 200 of stage 200 - 2 , which may include carrier component 220 and first component portion 130 a and second component portion 130 b and first component portion 240 a and first component portion 260 a and first component portion 120 a and first component portion 280 a , such that stack 200 of stage 200 - 3 may only include that remaining second portion of stack 200 . Therefore, in some embodiments, the stack portion removed from stack 200 to provide stage 200 - 3 may be the portion of the stack separated from another portion of the stack by cut 209 , except for the separated portions of insulation component 130 .
- the stack portion removal process for providing stage 200 - 3 may be accomplished using any suitable technique(s), including any suitable scraping process. Removal of the stack portion may be accomplished without affecting the geometry of the remaining stack portion.
- Stack 200 may be configured such that the release force required (e.g., in the direction of arrow R) to remove buffer component 240 from insulation component 130 may be less than the release force required (e.g., in the direction of arrow R) to remove insulation component 130 from carrier component 220 , such that second component portion 130 b may remain as a portion of stack 200 of stage 200 - 3 despite that second component portion 130 b being stacked above the stack portion that was removed from stack 200 (e.g., the release force that may be required to release adhesive layer 227 of bottom surface 229 of carrier component 220 from substrate layer 133 of top surface 131 of insulation component 130 may be greater (e.g., 20-100 times greater) than the release force that may be required to release releasing agent layer 243 of top surface 241 of buffer component 240 from adhesive layer 137
- FIG. 5 shows stack 200 in a fourth stage of assembly of shield structure 102 (i.e., in a stage 200 - 4 ), which may be the same as stage 200 - 3 of stack 200 but after another portion of stack 200 has been removed through any suitable removal process.
- first component portion 280 a of liner component 280 may be removed (e.g., in the removal direction of arrow R) from the remainder of stack 200 of stage 200 - 3 , such that adhesive layer 127 of bottom surface 129 of insulation component 120 may be exposed.
- the stack portion removal process for providing stage 200 - 4 may be accomplished using any suitable technique(s), including any suitable scraping process. Removal of first component portion 280 a of liner component 280 may be accomplished without affecting the geometry of the remaining stack portion.
- Stack 200 may be configured such that the release force required (e.g., in the direction of arrow R) to remove first component portion 280 a of liner component 280 from first component portion 120 a of insulation component 120 may be less than the release force required (e.g., in the direction of arrow R) to remove first component portion 120 a of insulation component 120 from first component portion 260 a of liner component 260 , such that first component portion 120 a may remain as a portion of stack 200 of stage 200 - 4 despite that first component portion 120 a being stacked above the stack portion that was removed from stack 200 (e.g., the release force that may be required to release adhesive layer 123 of top surface 121 of first component portion 120 a of insulation component 120 from releasing agent layer 267 of bottom surface 269
- a surface of a base component such as top surface 141 of shield component 140
- stack 200 may be positioned under stack 200 (e.g., as shown in FIG. 5 ) and then an exposed portion of stack 200 may be attached to the base component.
- FIG. 6 shows stack 200 in a fifth stage of assembly of shield structure 102 (i.e., in a stage 200 - 5 ), which may be the same as stage 200 - 4 of stack 200 but after top surface 141 of shield component 140 has been attached to stack 200 .
- Shield component 140 may be provided by any suitable material layer or combination of any suitable stacked material layers of any suitable height 140 H between top surface 141 and bottom surface 149 in order to provide any suitable base structure that may be operative to be insulated by insulation components 120 and 130 and that may be operative to create an EMI barrier (e.g., between assembly structure 110 and electronic component 170 of assembly 100 ).
- shield component 140 may include any suitable lower layer 147 of any suitable height 147 H that may define and extend upwards from bottom surface 149 and that may be made of any suitable shield material, such as an aluminum foil, in order to eventually shield electronic component 170 .
- shield component 140 may include any suitable top layer 143 of any suitable height 143 H that may define and/or extend downwards from top surface 141 and that may be made of any suitable substrate material, such as a PET film or polyimide film (e.g., by direct coating or lamination on layer 147 ).
- suitable substrate material such as a PET film or polyimide film (e.g., by direct coating or lamination on layer 147 ).
- Height 140 H may be about 20 micrometers or may be in any suitable range, such as between 8 micrometers and 150 micrometers or between 12 micrometers and 35 micrometers, while height 147 H may be about 16 micrometers or may be in any suitable range, such as between 8 micrometers and 100 micrometers or between 12 micrometers and 25 micrometers, while height 143 H may be about 4 micrometers or may be in any suitable range, such as between 0 micrometers and 50 micrometers or between 0 micrometers and 10 micrometers.
- top surface 141 of shield component 140 may be attached to an exposed (e.g., bottom) portion of stage 200 - 4 of stack 200 to provide stage 200 - 5 of stack 200 , where such an exposed portion of stack 200 may include first portion 120 a of insulation component 120 (e.g., bottom surface 129 of lower adhesive layer 127 of first portion 120 a of insulation component 120 ) and second portion 130 b of insulation component 130 (e.g., bottom surface 139 of adhesive layer 137 of second portion 130 b of insulation component 130 ).
- the attachment process for providing stage 200 - 5 may be accomplished using any suitable technique(s), including any suitable laminating process.
- a first portion of top surface 141 of shield component 140 may be pressed against bottom surface 129 of lower adhesive layer 127 of first portion 120 a of insulation component 120 while a second portion of top surface 141 of shield component 140 may be pressed against bottom surface 139 of adhesive layer 137 of second portion 130 b of insulation component 130 , for example, by using set of rollers that may be heated or otherwise for joining stage 200 - 4 of stack 200 to top surface 141 of shield component 140 for providing stage 200 - 5 of stack 200 .
- the attachment of stack 200 to shield component 140 may be accomplished during a single attachment operation (e.g., a single lamination operation (e.g., a single pass through of stack 200 and shield component 140 between a set of rollers)).
- each roller may be a rubber roller (e.g., with a durometer of 70 Shore A) and the rollers may apply any suitable pressure (e.g., a pressure in a range of 0.3 megapascals to 2.0 megapascals or about 0.65 megapascals) on stack 200 and shield component 140 (e.g., on top surface 221 of carrier component 220 (e.g., in the direction of arrow R) and bottom surface 149 of shield component 140 (e.g., in the direction of arrow C)) to provide stage 200 - 5 of stack 200 .
- any suitable pressure e.g., a pressure in a range of 0.3 megapascals to 2.0 megapascals or about 0.65 megapascals
- a deformable (e.g., rubber) roller may be provided to roll along top surface 221 of carrier component 220 (e.g., along the +X-direction) to constantly push stage 200 - 4 of stack 200 against shield component 140 for providing stage 200 - 5 of stack 200 .
- Carrier component 220 may be operative to stretch (e.g., in the ⁇ Z direction) during the attachment process to press bottom surface 139 of adhesive layer 137 of second portion 130 b of insulation component 130 against top surface 141 of shield component 140 .
- FIGS. 7 and 7A show stack 200 in a sixth stage of assembly of shield structure 102 (i.e., in a stage 200 - 6 ), which may be the same as stage 200 - 5 of stack 200 but after another portion of stack 200 has been removed through any suitable removal process.
- carrier component 220 and first component portion 130 a of insulation component 130 and first component portion 240 a of buffer component 240 and first component portion 260 a of liner component 260 may be removed (e.g., in the removal direction of arrow C) from the remainder of stack 200 of stage 200 - 5 , such that adhesive layer 123 of top surface 121 of first component portion 120 a of insulation component 120 may be exposed and such that substrate layer 133 of top surface 131 of second component portion 130 b of insulation component 130 may be exposed.
- the stack portion removal process for providing stage 200 - 6 may be accomplished using any suitable technique(s), including any suitable scraping process.
- Stack 200 may be configured such that the release force required (e.g., in the direction of arrow C) to remove first component portion 260 a of liner component 260 from first component portion 120 a of insulation component 120 may be less than the release force required (e.g., in the direction of arrow C) to remove first component portion 120 a of insulation component 120 from shield component 140 , such that first component portion 120 a of insulation component 120 may remain as a portion of stack 200 of stage 200 - 6 despite that first component portion 120 a being stacked below the stack portion that was removed from stack 200 (e.g., the release force that may be required to release adhesive layer 127 of bottom surface 129 of first component portion 120 a of insulation component 120 from top surface 141 of shield component 140 may be greater than the release force that may be required to
- stack 200 may be configured such that the release force required (e.g., in the direction of arrow C) to remove carrier component 220 from second component portion 130 b of insulation component 130 may be less than the release force required (e.g., in the direction of arrow C) to remove second component portion 130 b of insulation component 130 from shield component 140 , such that second component portion 130 b of insulation component 130 may remain as a portion of stack 200 of stage 200 - 6 despite that second component portion 130 b being stacked below the stack portion that was removed from stack 200 (e.g., the release force that may be required to release adhesive layer 137 of bottom surface 139 of second component portion 130 b of insulation component 130 from top surface 141 of shield component 140 may be greater than the release force that may be required to release adhesive layer 227 of bottom surface 229 of carrier component 220 from substrate layer 133 of top surface 131 of second component portion 130 b of insulation component 130 ).
- the release force required e.g., in the direction of arrow C
- Carrier component 220 may be configured such that adhesive layer 227 may be permanently adhered to substrate layer 223 or at least have a very strong adhesion to substrate layer 223 (e.g., by cleaning and activating a bottom surface of substrate layer 223 before coating that bottom surface with a proper formulation of adhesive layer 227 to maximize such adhesion), while adhesive layer 227 may be configured to weakly adhere to substrate layer 133 of insulation component 130 (e.g., an adhesion weaker than the adhesion of adhesive layer 227 to substrate layer 223 ), where such adhesion may be stable along heat soak aging.
- adhesive layer 227 may be permanently adhered to substrate layer 223 or at least have a very strong adhesion to substrate layer 223 (e.g., by cleaning and activating a bottom surface of substrate layer 223 before coating that bottom surface with a proper formulation of adhesive layer 227 to maximize such adhesion)
- adhesive layer 227 may be configured to weakly adhere to substrate layer 133 of insulation component 130 (e.g., an adhesion weaker
- stage 200 - 6 may provide spacing 201 of magnitude SX between exposed side surface 124 of first component portion 120 a of first insulation component 120 and exposed side surface 136 of second component portion 130 b of second insulation component 130 , where magnitude SX may be less than a particular magnitude (e.g., less than 80 micrometers, or less than 50 micrometers, or less than 30 micrometers, or less than 20 micrometers, or less than 10 micrometers).
- magnitude SX may be less than a particular magnitude (e.g., less than 80 micrometers, or less than 50 micrometers, or less than 30 micrometers, or less than 20 micrometers, or less than 10 micrometers).
- horizontal cross-section cut shape 209 s of cut 209 may provide a structure of stage 200 - 6 of stack 200 that may expose not only top surface 121 of first component portion 120 a of insulation component 120 and top surface 131 of second component portion 130 b of insulation component 130 , but also a portion of top surface 141 of shield component 140 .
- top surface 141 of shield component 140 may be limited to magnitude SX of spacing 201 between exposed side surface 124 of first component portion 120 a of first insulation component 120 and exposed side surface 136 of second component portion 130 b of second insulation component 130 (e.g., surfaces extending in Y-Z planes), and to a similar magnitude SY of a spacing 203 between other exposed side surfaces of first insulation component 120 and second insulation component 130 (e.g., surfaces extending in X-Z planes), an additional exposed portion of top surface 141 of shield component 140 may be exposed by the portion of cut shape 209 s that may have been provided through a portion of stack 200 that does not include component 130 (if such a result is desired).
- stage 200 - 6 of stack 200 may provide the reduced spacing between adjacent insulation components 120 and 130 along top surface 141 of shield component 140 . Stage 200 - 6 of stack 200 may then be provided within assembly 100 of FIG. 1 for providing at least a portion of insulated shield structure 102 .
- a top surface of substrate layer 133 may be provided with an adhesive for adhering insulation component 130 to bottom surface 119 of assembly structure 110 within assembly 100 . In other embodiments, the top surface of substrate layer 133 may not include an adhesive and/or component 130 may not be adhered to assembly structure 110 within assembly 100 .
- FIG. 8 is a flowchart of an illustrative process 800 for forming an insulated shield structure (e.g., shield structure 102 or stage 200 - 6 of stack 200 ) for an electronic device (e.g., assembly 100 ) using a shield component (e.g., shield component 140 ) and a stack (e.g., stage 200 - 1 of stack 200 ) that includes a number of components including a first insulation component (e.g., insulation component 120 ) and a second insulation component (e.g., insulation component 130 ) that is stacked above the first insulation component.
- a shield component e.g., shield component 140
- a stack e.g., stage 200 - 1 of stack 200
- first insulation component e.g., insulation component 120
- a second insulation component e.g., insulation component 130
- a cut (e.g., cut 209 ) may be created through at least two components of the stack (e.g., stage 200 - 1 of stack 200 ), wherein the cut separates a first portion of the first insulation component (e.g., first component portion 120 a ) from a second portion of the first insulation component (e.g., second component portion 120 b ), wherein the cut separates a first portion of the second insulation component (e.g., first component portion 130 a ) from a second portion of the second insulation component (e.g., second component portion 130 b ), wherein the first portion of the second insulation component (e.g., first component portion 130 a ) is stacked above the first portion of the first insulation component (e.g., first component portion 120 a ), and wherein the second portion of the second insulation component (e.g., second component portion 130 b ) is stacked above the second portion of the first insulation component (e.g., second component portion 120 b
- a first portion of the stack may be removed from a second portion of the stack, wherein the first portion of the stack includes the second portion of the first insulation component (e.g., second component portion 120 b ).
- a surface of the shield component e.g., top surface 141 of shield component 140
- the exposed portion of the second portion of the stack includes the first portion of the first insulation component (e.g., first component portion 120 a ) and the second portion of the second insulation component (e.g., second component portion 130 b ).
- process 800 of FIG. 8 are only illustrative and that existing operations may be modified or omitted, additional operations may be added, and the order of certain operations may be altered.
- FIG. 9 is a flowchart of an illustrative process 900 for forming a multi-component structure (e.g., structure 102 or stage 200 - 6 of stack 200 ) using a base component (e.g., component 140 ) and a stack (e.g., stage 200 - 1 of stack 200 ) that includes a number of stack components including a first stack component (e.g., component 120 ) and a second stack component (e.g., component 130 ) that is stacked above the first stack component.
- a base component e.g., component 140
- a stack e.g., stage 200 - 1 of stack 200
- a number of stack components including a first stack component (e.g., component 120 ) and a second stack component (e.g., component 130 ) that is stacked above the first stack component.
- a cut (e.g., cut 209 ) may be created through at least a portion of the stack (e.g., stage 200 - 1 of stack 200 ), wherein the cut separates a first portion of the first stack component (e.g., first component portion 120 a ) from a second portion of the first stack component (e.g., second component portion 120 b ), wherein the cut separates a first portion of the second stack component (e.g., first component portion 130 a ) from a second portion of the second stack component (e.g., second component portion 130 b ), wherein the first portion of the second stack component (e.g., first component portion 130 a ) is stacked above the first portion of the first stack component (e.g., first component portion 120 a ), and wherein the second portion of the second stack component (e.g., second component portion 130 b ) is stacked above the second portion of the first stack component (e.g., second component portion 120 ),
- a surface of the base component may be joined to the first portion of the first stack component (e.g., first component portion 120 a ) and to the second portion of the second stack component (e.g., second component portion 130 b ).
- process 900 of FIG. 9 are only illustrative and that existing operations may be modified or omitted, additional operations may be added, and the order of certain operations may be altered.
- directional and orientational terms such as “up” and “down,” “front” and “back,” “top” and “bottom” and “side,” “above” and “below,” “length” and “width” and “thickness” and “diameter” and “cross-section” and “longitudinal,” “X-” and “Y-” and “Z-,” and the like, may be used herein only for convenience, and that no fixed or absolute directional or orientational limitations are intended by the use of these terms.
- the components of the shield structure can have any desired orientation. If reoriented, different directional or orientational terms may need to be used in their description, but that will not alter their fundamental nature as within the scope and spirit of the invention.
Abstract
Description
- This application claims the benefit of prior filed U.S. Provisional Patent Application No. 62/556,441, filed Sep. 10, 2017, which is hereby incorporated by reference herein in its entirety.
- This disclosure relates to shield structures and, more particularly, to shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same.
- A conventional shield structure may include a shield component and two or more insulation components along a surface of the shield component for insulating that shield component surface from another structure. However, the spacing between such insulation components along the shield component surface is often too large to meet certain functional requirements of the shield structure.
- Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same are provided.
- As an example, a method is provided for forming an insulated shield structure for an electronic device using a shield component and a stack that includes a plurality of components, wherein the plurality of components includes a first insulation component and a second insulation component that is stacked above the first insulation component, the method including creating a cut through at least two components of the plurality of components of the stack, wherein the cut separates a first portion of the first insulation component from a second portion of the first insulation component, the cut separates a first portion of the second insulation component from a second portion of the second insulation component, the first portion of the second insulation component is stacked above the first portion of the first insulation component, and the second portion of the second insulation component is stacked above the second portion of the first insulation component, the method also including removing a first portion of the stack from a second portion of the stack, wherein the first portion of the stack includes the second portion of the first insulation component, and attaching a surface of the shield component to an exposed portion of the second portion of the stack, wherein the exposed portion of the second portion of the stack includes the first portion of the first insulation component and the second portion of the second insulation component.
- As another example, an electronic device is provided that includes an electronic component and an insulated shield structure operative to shield the electronic component, wherein the insulated shield structure includes a shield component including a first shield component surface and a second shield component surface, a first insulation component attached to the first shield component surface, and a second insulation component attached to the first shield component surface, wherein a distance between a surface of the first insulation component and a surface of the second insulation component is less than 80 micrometers.
- As yet another example, a method is provided for forming a multi-component structure using a base component and a stack that includes a plurality of stack components, wherein the plurality of stack components includes a first stack component and a second stack component that is stacked above the first stack component, the method including creating a cut through at least a portion of the stack, wherein the cut separates a first portion of the first stack component from a second portion of the first stack component, the cut separates a first portion of the second stack component from a second portion of the second stack component, the first portion of the second stack component is stacked above the first portion of the first stack component, and the second portion of the second stack component is stacked above the second portion of the first stack component, and the method also including joining a surface of the base component to the first portion of the first stack component and the second portion of the second stack component.
- This Summary is provided only to present some example embodiments, so as to provide a basic understanding of some aspects of the subject matter described in this document. Accordingly, it will be appreciated that the features described in this Summary are only examples and should not be construed to narrow the scope or spirit of the subject matter described herein in any way. Unless otherwise stated, features described in the context of one example may be combined or used with features described in the context of one or more other examples. Other features, aspects, and advantages of the subject matter described herein will become apparent from the following Detailed Description, Figures, and Claims.
- The discussion below makes reference to the following drawings, in which like reference characters may refer to like parts throughout, and in which:
-
FIG. 1 is a cross-sectional view of an illustrative assembly that includes a shield structure with reduced spacing between adjacent insulation components; -
FIG. 2 is a cross-sectional view, similar toFIG. 1 , of a portion of a material stack in a first stage of assembly of the shield structure of the assembly ofFIG. 1 , taken from line II-II ofFIG. 2A ; -
FIG. 2A is a top view of a portion of the material stack ofFIG. 2 , taken from line IIA-IIA ofFIG. 2 ; -
FIG. 3 is a cross-sectional view, similar toFIGS. 1 and 2 , of a portion of the material stack ofFIGS. 2 and 2A , in a second stage of assembly of the shield structure of the assembly ofFIG. 1 , taken from line III-III ofFIG. 3A ; -
FIG. 3A is a top view, similar toFIG. 2A , of a portion of the material stack ofFIGS. 2, 2A, and 3 , taken from line IIIA-IIIA ofFIG. 2 ; -
FIG. 4 is a cross-sectional view, similar toFIGS. 1, 2, and 3 , of a portion of the material stack ofFIGS. 2-3A , in a third stage of assembly of the shield structure of the assembly ofFIG. 1 ; -
FIG. 5 is a cross-sectional view, similar toFIGS. 1, 2, 3, and 4 , of a portion of the material stack ofFIGS. 2-4 , in a fourth stage of assembly of the shield structure of the assembly ofFIG. 1 ; -
FIG. 6 is a cross-sectional view, similar toFIGS. 1, 2, 3, 4, and 5 , of a portion of the material stack ofFIGS. 2-5 , in a fifth stage of assembly of the shield structure of the assembly ofFIG. 1 ; -
FIG. 7 is a cross-sectional view, similar toFIGS. 1, 2, 3, 4, 5, and 6 , of a portion of the material stack ofFIGS. 2-6 , in a sixth stage of assembly of the shield structure of the assembly ofFIG. 1 , taken from line VII-VII ofFIG. 7A ; -
FIG. 7A is a top view, similar toFIGS. 2A and 3A , of a portion of the material stack ofFIGS. 2-7 , taken from line VIIA-VIIA ofFIG. 7 ; and -
FIGS. 8 and 9 are flowcharts of illustrative processes for manufacturing a shield structure. - Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same are provided and described with reference to
FIGS. 1-9 . - Different insulation components of different layers of a stack may be attached to the same surface of a shield component during a single attachment (e.g., lamination) operation to attenuate the spacing between the different insulation components attached to the shield component. Limiting the size of a spacing between adjacent insulation components along a shield component of a shield structure may limit the size of an exposed portion of the shield component, which may limit the opportunity for that exposed shield component portion to be shorted to another structure (e.g., a support structure of an electronic device that includes the shield structure). The different insulation components may have different characteristics for enabling different functionalities of the shield structure. For example, a first insulation component (e.g., a pressure sensitive adhesive made from polyethylene terephthalate) may be better suited for adhering the shield structure to a support structure, while a second insulation component (e.g., a polyimide substrate) may be better suited for enabling a thermo-bonding process with the shield component of the shield structure.
- A shield structure with reduced spacing between adjacent insulation components may be provided as part of any suitable electronic assembly. For example, as shown in
FIG. 1 , anelectronic device assembly 100 may include anelectronic component 170 and ashield structure 102 that may be operative to shieldelectronic component 170.Electronic component 170 may be any suitable component or collection of components that may generate and/or be susceptible to any electromagnetic fields (e.g., radio frequency (“RF”) electromagnetic radiation and/or any other suitable electromagnetic interference (“EMI”)), such as any suitable electronic sensor subassembly or circuit board or the like, whileshield structure 102 may be any suitable component or collection of components that may be operative to create at least a portion of a barrier for blocking EMI from traveling towards or away fromelectronic component 170. -
Shield structure 102 may include ashield component 140 positioned above and extending along at least a portion of a top surface 171 ofelectronic component 170, whereshield component 140 may be any suitable component or combination of components that may be operative to create an EMI barrier, such as a conductive metal sheet (e.g., aluminum foil). Additionally, as shown,shield structure 102 may include alower insulation component 150 positioned between and extending along at least a portion of abottom surface 149 ofshield component 140 and at least a portion of top surface 171 ofelectronic component 170, wherelower insulation component 150 may be any suitable component or combination of components that may be operative to insulateshield component 140 fromelectronic component 170, such as a polyester core.Lower insulation component 150 may also include an adhesive layer along atop surface 151 for adheringlower insulation component 150 tobottom surface 149 ofshield component 140 and/or an adhesive layer along abottom surface 159 for adheringlower insulation component 150 to top surface 171 ofelectronic component 170. - Additionally or alternatively, as shown,
shield structure 102 may include a firstupper insulation component 120 positioned between and extending along a first portion of atop surface 141 ofshield component 140 and a first portion of a bottom surface 119 of anassembly structure 110 opposite atop surface 111 of assembly structure 10 (e.g., any suitable support plate, such as a stainless steel mid plate or housing structure of an electronic device assembly 100), whereupper insulation component 120 may be any suitable component or combination of components that may be operative to insulateshield component 140 fromassembly structure 110, such as a polyester core.Upper insulation component 120 may also include an adhesive layer along atop surface 121 for adheringupper insulation component 120 to bottom surface 119 ofassembly structure 110 and/or an adhesive layer along abottom surface 129 for adheringupper insulation component 120 totop surface 141 ofshield component 140.Shield structure 102 may also include a secondupper insulation component 130 positioned between and extending along a second portion oftop surface 141 ofshield component 140 and a second portion of bottom surface 119 ofassembly structure 110, whereupper insulation component 130 may be any suitable component or combination of components that may be operative to insulateshield component 140 fromassembly structure 110, such as a polyimide substrate.Upper insulation component 130 may also include an adhesive layer along atop surface 131 for adheringupper insulation component 130 to bottom surface 119 ofassembly structure 110 and/or an adhesive layer along abottom surface 139 for adheringupper insulation component 130 totop surface 141 ofshield component 140. First andsecond insulation components shield structure 102. For example, first insulation component 120 (e.g., a pressure sensitive adhesive including a core made from polyethylene terephthalate) may be better suited for adheringshield structure 102 toassembly structure 110, while second insulation component 130 (e.g., a black polyimide tape including a polyimide core) may be better suited for enabling a thermo-bonding process with a portion ofshield component 140 below second insulation component 130 (e.g., for grounding aninterconnect component 160 that may be positioned between a portion ofelectronic component 170 and the portion ofshield component 140 below second insulation component 130). In some embodiments,component 160 may be any suitable conductive component, such as any suitable conductive adhesive, that may be operative to form a conductive (e.g., grounding) path betweenelectronic component 170 andshield component 140. - Additionally, as also shown in
FIG. 1 ,assembly 100 may also include anothershield structure 108 that may include a shield component 190, which may be positioned below and extending along at least a portion of abottom surface 179 ofelectronic component 170, and aninsulation component 180 that positioned between and extending along at least a portion of atop surface 191 of shield component 190 and at least a portion ofbottom surface 179 ofelectronic component 170, whereinsulation component 180 may be any suitable component or combination of components that may be operative to insulate shield component 190 fromelectronic component 170, such as a polyester core.Insulation component 180 may also include an adhesive layer along atop surface 181 for adheringinsulation component 180 tobottom surface 179 ofelectronic component 170 and/or an adhesive layer along abottom surface 189 for adheringinsulation component 180 totop surface 191 of shield component 190. Aninterconnect component 166 may be positioned between a portion ofelectronic component 170 and a portion of shield component 190. In some embodiments,component 166 may be any suitable conductive component, such as any suitable conductive adhesive, that may be operative to form a conductive (e.g., grounding) path betweenelectronic component 170 and shield component 190. - As shown in
FIG. 1 , aspacing 201 of a magnitude SX (e.g., along an X-axis dimension) may exist between aside surface 124 offirst insulation component 120 and aside surface 136 ofsecond insulation component 130 whencomponents top surface 141 ofshield component 140 ofshield structure 102, wherespacing 201 may expose a portion oftop surface 141 ofshield component 140 for potential shorting or other unfavorable electrical communication with bottom surface 119 ofassembly structure 110. Therefore, in order to limit the possibility of such communication, magnitude SX ofspacing 201 must be limited to a magnitude less than a particular magnitude (e.g., less than 80 micrometers, or less than 50 micrometers, or less than 30 micrometers, or less than 20 micrometers, or less than 10 micrometers). In some embodiments,first insulation component 120 of a desired geometry may be obtained and attached (e.g., laminated) totop surface 141 ofshield component 140, and thensecond insulation component 130 of a desired geometry may be obtained and attached (e.g., laminated) totop surface 141 ofshield component 140 at a position adjacent tofirst insulation component 120 that may result in an appropriately sizedspacing 201. However, such an approach may expose magnitude SX ofspacing 201 to various controlling dimensions (e.g., the cutting of the shape ofcomponent 120, the placement ofcomponent 120, the cutting of the shape ofcomponent 130, the placement ofcomponent 130, etc.) that may unfavorably increase the tolerance accumulation of magnitude SX beyond an acceptable magnitude. Therefore, other approaches may be more reliable for limiting the spacing between adjacent components on a base component, such as by attaching different insulation components from different stacked layers of a stack onto the same surface of a shield component, for example, in a single attachment operation (e.g., a single lamination operation). - As shown in
FIGS. 2-7A , for example, amaterial stack 200 may be used in conjunction withshield component 140 to form at least a portion ofshield structure 102 with reduced spacing betweeninsulation component 120 andinsulation component 130 alongsurface 141 ofshield component 140. AlthoughFIGS. 2-7A may be described with respect to a process for adjacently attaching two stacked insulation components on a shield component for forming an insulated shield structure, it is to be understood that suchFIGS. 2-7A and such a process may be with respect to attaching any two stacked components in an adjacent manner on a surface of any base component for forming any suitable multi-component structure. -
FIGS. 2 and 2A showstack 200 in a first stage of assembly of shield structure 102 (i.e., in a stage 200-1).Stack 200 may include any suitable number of any suitable stack components arranged in any suitable stacking order that includes at leastfirst insulation component 120 andsecond insulation component 130. For example, as shown, stage 200-1 ofstack 200 may include acarrier component 220, abuffer component 240,second insulation component 130 stacked in between a portion of abottom surface 229 ofcarrier component 220 and a portion of atop surface 241 ofbuffer component 240,first insulation component 120, a first liner (e.g., heavy liner)component 260 stacked in between abottom surface 249 ofbuffer component 240 andtop surface 121 offirst insulation component 120, and a second liner (e.g., light liner)component 280 stacked belowfirst insulation component 120. -
Second liner component 280 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 280H between atop surface 281 and abottom surface 289 in order to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 120 (e.g., an adhesive layer 123) that may be positioned to extend above and alongtop surface 281 ofliner component 280. For example, as shown,liner component 280 may include anysuitable substrate layer 287 of anysuitable height 287H that may define and extend upwards frombottom surface 289 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., polyethylene terephthalate (“PET”))) or paper based substrate, in order to protectbottom surface 129 ofcomponent 120. Additionally, as shown,liner component 280 may include any suitable releasingagent layer 283 of anysuitable height 283H that may define and extend downwards fromtop surface 281 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release ofliner component 280 from an adhesive layer of component 120 (e.g., adhesive layer 123).Height 280H may be about 25 micrometers or may be in any suitable range, such as between 2 micrometers and 55 micrometers, whileheight 287H may be about 24 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers, whileheight 283H may be about 1 micrometer or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers. -
First insulation component 120 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 120H betweentop surface 121 andbottom surface 129 in order to provide any suitable insulation that may be operative to insulate (e.g., from assembly structure 110) a portion of ashield component 140 that may be positioned to extend below and alongbottom surface 129 ofcomponent 120 and/or to provide any suitable adhesion betweenbottom surface 129 ofinsulation component 120 andtop surface 141 ofshield component 140 and/or to provide any suitable adhesion betweentop surface 121 ofinsulation component 120 and bottom surface 119 of assembly structure 110 (e.g., a pressure sensitive adhesive). For example, as shown,insulation component 120 may include any suitable loweradhesive layer 127 of anysuitable height 127H that may define and extend upwards frombottom surface 129 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere totop surface 141 ofshield component 140. Additionally, as shown,insulation component 120 may include any suitable upperadhesive layer 123 of anysuitable height 123H that may define and extend downwards fromtop surface 121 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere to bottom surface 119 ofassembly structure 110. Additionally, as shown,insulation component 120 may include anysuitable core layer 125 of anysuitable height 125H that may extend betweenadhesive layers shield component 140.Height 120H may be about 25 micrometers or may be in any suitable range, such as between 1 micrometer and 800 micrometers or between 2 micrometers and 54 micrometers, whileheight 127H may be about 12 micrometers or may be in any suitable range, such as between 1 micrometer and 300 micrometers or between 1 micrometer and 25 micrometers, whileheight 125H may be about 1 micrometer or may be in any suitable range, such as between 1 micrometer and 200 micrometers or between 1 micrometer and 4 micrometers, and whileheight 123H may be about 12 micrometers or may be in any suitable range, such as between 1 micrometer and 300 micrometers or between 1 micrometer and 25 micrometers. -
First liner component 260 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 260H between atop surface 261 and abottom surface 269 in order to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 120 (e.g., adhesive layer 123) that may be positioned to extend below and alongbottom surface 269 ofliner component 260. For example, as shown,liner component 260 may include anysuitable substrate layer 263 of any suitable height 263H that may define and extend downwards fromtop surface 261 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., PET)) or paper based substrate, in order to protecttop surface 121 ofcomponent 120. Additionally, as shown,liner component 260 may include any suitable releasingagent layer 267 of anysuitable height 267H that may define and extend upwards frombottom surface 269 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release ofliner component 260 from an adhesive layer of component 120 (e.g., adhesive layer 123).Height 260H may be about 25 micrometers or may be in any suitable range, such as between 2 micrometers and 55 micrometers, while height 263H may be about 24 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers, whileheight 267H may be about 1 micrometer or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers. Alternatively,height 260H may be about 75 micrometers. -
Buffer component 240 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 240H between atop surface 241 andbottom surface 249 in order to provide any suitable adhesion betweenbottom surface 249 ofbuffer component 240 andtop surface 261 ofliner component 260 and/or to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of component 130 (e.g., an adhesive layer 137) that may be positioned to extend above and along a portion oftop surface 241 ofbuffer component 240 and/or to provide any suitable release liner that may be operative to protect but be harmlessly removed from an adhesive layer of carrier component 220 (e.g., an adhesive layer 227) that may be positioned to extend above and along another portion oftop surface 241 ofbuffer component 240. For example, as shown,buffer component 240 may include any suitable loweradhesive layer 247 of anysuitable height 247H that may define and extend upwards frombottom surface 249 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive or foam based adhesive, in order to adhere totop surface 261 ofsubstrate layer 263 ofliner component 260. Additionally, as shown,buffer component 240 may include any suitable releasingagent layer 243 of anysuitable height 243H that may define and extend downwards fromtop surface 241 and that may be made of any suitable material, such as a silicone, olephene, and/or acrylate releasing agent, in order to enable release ofbuffer component 240 from an adhesive layer of component 130 (e.g., an adhesive layer 137) and/or in order to enable release ofbuffer component 240 from an adhesive layer of carrier component 220 (e.g., adhesive layer 227). Additionally, as shown,buffer component 240 may include anysuitable substrate layer 245 of anysuitable height 245H that may extend betweenadhesive layer 247 and releasingagent layer 243 and that may be made of any suitable material, such as a plastic (e.g., polyester (e.g., PET)) or paper based substrate, in order to provide any suitable robust structure tobuffer component 240.Height 240H may be about 50 micrometers or may be in any suitable range, such as between 3 micrometers and 85 micrometers or between 4 micrometers and 14 micrometers, whileheight 247H may be about 30 micrometers or may be in any suitable range, such as between 1 micrometer and 30 micrometers or between 1 micrometer and 8 micrometers, whileheight 245H may be about 50 micrometers or may be in any suitable range, such as between 2 micrometers and 60 micrometers or between 3 micrometers and 10 micrometers, and whileheight 243H may be about 5 micrometers or may be in any suitable range, such as between 0.2 micrometers and 5.0 micrometers or between 0.5 micrometers and 2.0 micrometers. -
Second insulation component 130 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 130H betweentop surface 131 andbottom surface 139 in order to provide any suitable insulation that may be operative to insulate (e.g., from assembly structure 110) a portion ofshield component 140 that may be positioned to extend below and alongbottom surface 139 ofcomponent 130 and/or to enable any suitable thermo-bonding process with a portion ofshield component 140 below component 130 (e.g., for groundinginterconnect component 160 that may be positioned between a portion ofelectronic component 170 and the portion ofshield component 140 below second insulation component 130). For example, as shown,insulation component 130 may include any suitable loweradhesive layer 137 of anysuitable height 137H that may define and extend upwards frombottom surface 139 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive, in order to eventually adhere totop surface 141 ofshield component 140. Additionally, as shown,insulation component 130 may include anysuitable substrate layer 133 of anysuitable height 133H that may extend downwards fromtop surface 131 and that may be made of any suitable substrate material, such as a polyimide substrate, in order to eventually insulate (e.g., from assembly structure 110) a portion of shield component 140 (e.g., as a black polyimide tape including a polyimide core).Height 130H may be about 20 micrometers or may be in any suitable range, such as between 6 micrometers and 200 micrometers or between 6 micrometers and 45 micrometers, whileheight 137H may be about 12 micrometers or may be in any suitable range, such as between 4 micrometers and 150 micrometers or between 4 micrometers and 30 micrometers, whileheight 133H may be about 8 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers or between 2 micrometers and 15 micrometers. -
Carrier component 220 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 220H between atop surface 221 and abottom surface 229 in order to provide any suitable carrier structure that may be operative to carry some or all of the other components ofstack 200 that may be positioned to extend below and alongbottom surface 229 ofcarrier component 220 during the various stages of assembly of stack 200 (e.g., for forming shield structure 102), such as by adhering toinsulation component 130 that may be positioned to extend below and along a portion ofbottom surface 229 ofcarrier component 220 and/or by adhering to a portion ofbuffer component 240 that may be positioned to extend below and along another portion ofbottom surface 229 ofcarrier component 220. For example, as shown,carrier component 220 may include any suitable loweradhesive layer 227 of anysuitable height 227H that may define and extend upwards frombottom surface 229 and that may be made of any suitable adhesive material, such as acrylate, polyurethane, silicone, or rubber-based pressure sensitive adhesive and/or foam adhesive, in order to adhere totop surface 131 ofinsulation component 130 and/or in order to adhere to a portion oftop surface 241 ofbuffer component 240. Additionally, as shown,carrier component 220 may include anysuitable substrate layer 223 of anysuitable height 223H that may extend downwards fromtop surface 221 and that may be made of any suitable substrate material, such as a polyester (e.g., PET) and/or a paper-based substrate, in order to eventually provide structure to one or more other portions ofstack 200 during one or more stages of assembly (e.g., as a carrier film).Height 220H may be about 60 micrometers or may be in any suitable range, such as between 27 micrometers and 250 micrometers or between 53 micrometers and 85 micrometers, whileheight 227H may be about 55 micrometers or may be in any suitable range, such as between 25 micrometers and 200 micrometers or between 50 micrometers and 75 micrometers, whileheight 223H may be about 5 micrometers or may be in any suitable range, such as between 2 micrometers and 50 micrometers or between 3 micrometers and 10 micrometers. - One, some, or each of
components stack 200 may be provided to extend along any suitable length in the X-axis direction (e.g., a length including length portion LP of stack 200), whilecomponent 130 may only extend along a portion of that length (e.g., betweensurfaces FIG. 2A in broken line under a transparently illustrated portion of component 220). Such a length may enablestack 200 to be used in any suitable conversion processing system, such as a roll-to-roll processing system or web processing system or reel-to-reel processing system or the like (e.g., in a +X rolling direction or in a −X rolling direction). As shown inFIG. 2A , two or more second insulation stack components, such as secondinsulation stack component 130 extending betweensurfaces insulation stack component 130 a extending betweensurface 138 a and another surface (not shown), such that asingle stack 200 may be used to generate multiple shield structures. It is to be appreciated that various elements ofassembly 100 and/or stack 200 may not be illustrated to scale and/or to exact geometry in one or more ofFIGS. 1-7A in order to clearly show certain features thereof in a more efficient manner. - Once
material stack 200 has been formed in any suitable manner to be made available in its first stage of assembly 200-1, a cut may be created through at least a portion ofstack 200, such as through at least two stack components, including, for example, through at leastfirst insulation component 120 andsecond insulation component 130.FIGS. 3 and 3A showstack 200 in a second stage of assembly of shield structure 102 (i.e., in a stage 200-2), which may be the same as stage 200-1 ofstack 200 but after acut 209 has been made through at least a portion ofstack 200 by acutting mechanism 300. For example,cutting mechanism 300 may include a blade with a pierce cutting angle 301 (e.g., an angle of 10° or less than 5° or less than 10° or less than 15°) that may create cut 209 (e.g., in about or less than 0.2 seconds) or a laser that may create cut 209 (e.g., in about or less than 0.2 microseconds), wherecut 209 may be a die cut or a kiss cut or any other suitable cut type in various embodiments.Cutting mechanism 300 may be operative to create cut 209 without removing any material from stack 200 (e.g., while a controlled tension is provided across stack 200 (e.g., along the X-axis direction)). Cut 209 may be made by introducing a blade or laser or any other suitable cutting feature of cuttingmechanism 300 upwards throughstack 200 in an upwards cutting direction of arrow C, which may be substantially perpendicular to the bottom surface ofstack 200 and/or to the bottom surface of one or more material layers of stack 200 (e.g., in the +Z direction, where the stacking of stacked components ofstack 200 may be along the Z-axis), and then through removal of the cutting feature fromstack 200 in a downwards removal direction of arrow R, although it is to be understood that the cutting direction and/or removal direction may form any other suitable angle with respect to stack 200. - As shown in
FIG. 3 , cut 209 may be provided throughliner component 280, throughinsulation component 120, throughliner component 260, throughbuffer component 240, and throughinsulation component 130, but not through carrier component 220 (e.g., such thatcarrier component 220 may maintain its ability to carrystack 200 through future stages of assembly). Cut 209 may be provided through the entirety ofliner component 280 betweenbottom surface 289 andtop surface 281 for separatingliner component 280 into a firstliner component portion 280 a, which may include an exposedside surface 284, and a secondliner component portion 280 b, which may include an exposedside surface 286 that may face exposedside surface 284 on an opposing side ofcut 209. Cut 209 may be provided through the entirety ofinsulation component 120 betweenbottom surface 129 andtop surface 121 for separatinginsulation component 120 into a firstinsulation component portion 120 a, which may include an exposedside surface 124, and a secondinsulation component portion 120 b, which may include an exposedside surface 126 that may face exposedside surface 124 on an opposing side ofcut 209. Cut 209 may be provided through the entirety ofliner component 260 betweenbottom surface 269 andtop surface 261 for separatingliner component 260 into a firstliner component portion 260 a, which may include an exposedside surface 264, and a second liner component portion 260 b, which may include an exposedside surface 266 that may face exposedside surface 264 on an opposing side ofcut 209. Cut 209 may be provided through the entirety ofbuffer component 240 betweenbottom surface 249 andtop surface 241 for separatingbuffer component 240 into a firstbuffer component portion 240 a, which may include an exposedside surface 244, and a secondbuffer component portion 240 b, which may include an exposedside surface 246 that may face exposedside surface 244 on an opposing side ofcut 209. Cut 209 may also be provided through the entirety ofinsulation component 130 betweenbottom surface 139 andtop surface 131 for separatinginsulation component 130 into a firstinsulation component portion 130 a, which may include an exposedside surface 134, and a secondinsulation component portion 130 b, which may include an exposedside surface 136 that may face exposedside surface 134 on an opposing side ofcut 209. As shown,first component portion 130 a may be stacked abovefirst component portion 240 a, which may be stacked abovefirst component portion 260 a, which may be stacked abovefirst component portion 120 a, which may be stacked abovefirst component portion 280 a, whilesecond component portion 130 b may be stacked abovesecond component portion 240 b, which may be stacked above second component portion 260 b, which may be stacked abovesecond component portion 120 b, which may be stacked abovesecond component portion 280 b. - Cut 209 may be created to define any suitable cut shape about a portion of
stack 200. For example, as shown inFIG. 3A (e.g., in broken line under a transparently illustrated portion of component 220), a horizontal cross-section cutshape 209 s ofcut 209 throughstack 200 below carrier component 220 (e.g., throughcomponent 280 and/orcomponent 120 and/orcomponent 260 and/orcomponent 240 and/or component 130) may be rectangular, although any othersuitable shape 209 s may be provided bycut 209. As shown inFIG. 3A bycut shape 209 s, only a portion ofcut 209 may be provided throughcomponent 130, while another portion ofcut 209 may be provided through a portion ofstack 200 that does not includecomponent 130. Alternatively, in other embodiments, the entirety ofcut shape 209 s ofcut 209 may be provided within the bounds ofcomponent 130 withinstack 200. Alternatively, in some embodiments, cutshape 209 s may not be a closed shape, but instead cut 209 may extend to an edge of stack 200 (e.g., all the way to the −Y edge 215 of stack 200). - Once
material stack 200 has been cut to be made available in its second stage of assembly 200-2, a portion ofstack 200 that may be at least partially defined by or bound by the cut, which may include a portion ofinsulation component 120, may be removed from the stack.FIG. 4 shows stack 200 in a third stage of assembly of shield structure 102 (i.e., in a stage 200-3), which may be the same as stage 200-2 ofstack 200 but after a portion ofstack 200 has been removed from another portion ofstack 200 through any suitable removal process. For example, as shown, a first portion ofstack 200 of stage 200-2, which may includesecond component portion 240 b and second component portion 260 b andsecond component portion 120 b andsecond component portion 280 b, may be removed (e.g., in the removal direction of arrow R) from a second portion ofstack 200 of stage 200-2, which may includecarrier component 220 andfirst component portion 130 a andsecond component portion 130 b andfirst component portion 240 a andfirst component portion 260 a andfirst component portion 120 a andfirst component portion 280 a, such thatstack 200 of stage 200-3 may only include that remaining second portion ofstack 200. Therefore, in some embodiments, the stack portion removed fromstack 200 to provide stage 200-3 may be the portion of the stack separated from another portion of the stack bycut 209, except for the separated portions ofinsulation component 130. - The stack portion removal process for providing stage 200-3 may be accomplished using any suitable technique(s), including any suitable scraping process. Removal of the stack portion may be accomplished without affecting the geometry of the remaining stack portion.
Stack 200 may be configured such that the release force required (e.g., in the direction of arrow R) to removebuffer component 240 frominsulation component 130 may be less than the release force required (e.g., in the direction of arrow R) to removeinsulation component 130 fromcarrier component 220, such thatsecond component portion 130 b may remain as a portion ofstack 200 of stage 200-3 despite thatsecond component portion 130 b being stacked above the stack portion that was removed from stack 200 (e.g., the release force that may be required to releaseadhesive layer 227 ofbottom surface 229 ofcarrier component 220 fromsubstrate layer 133 oftop surface 131 ofinsulation component 130 may be greater (e.g., 20-100 times greater) than the release force that may be required to release releasingagent layer 243 oftop surface 241 ofbuffer component 240 fromadhesive layer 137 ofbottom surface 139 of insulation component 130). - Once a stack portion has been removed from
material stack 200 to providestack 200 in its third stage of assembly 200-3, another portion ofstack 200 may be removed from the stack in order to prepare the stack for attachment to a shield component.FIG. 5 shows stack 200 in a fourth stage of assembly of shield structure 102 (i.e., in a stage 200-4), which may be the same as stage 200-3 ofstack 200 but after another portion ofstack 200 has been removed through any suitable removal process. For example, as shown,first component portion 280 a ofliner component 280 may be removed (e.g., in the removal direction of arrow R) from the remainder ofstack 200 of stage 200-3, such thatadhesive layer 127 ofbottom surface 129 ofinsulation component 120 may be exposed. The stack portion removal process for providing stage 200-4 may be accomplished using any suitable technique(s), including any suitable scraping process. Removal offirst component portion 280 a ofliner component 280 may be accomplished without affecting the geometry of the remaining stack portion.Stack 200 may be configured such that the release force required (e.g., in the direction of arrow R) to removefirst component portion 280 a ofliner component 280 fromfirst component portion 120 a ofinsulation component 120 may be less than the release force required (e.g., in the direction of arrow R) to removefirst component portion 120 a ofinsulation component 120 fromfirst component portion 260 a ofliner component 260, such thatfirst component portion 120 a may remain as a portion ofstack 200 of stage 200-4 despite thatfirst component portion 120 a being stacked above the stack portion that was removed from stack 200 (e.g., the release force that may be required to releaseadhesive layer 123 oftop surface 121 offirst component portion 120 a ofinsulation component 120 from releasingagent layer 267 ofbottom surface 269 offirst component portion 260 a ofliner component 260 may be greater (e.g., 2-5 times greater) than the release force that may be required to releaseadhesive layer 127 ofbottom surface 129 offirst component portion 120 a ofinsulation component 120 from releasingagent layer 283 oftop surface 281 offirst component portion 280 a of liner component 280). - Once each appropriate stack portion has been removed from
material stack 200 to providestack 200 in its fourth stage of assembly 200-4, a surface of a base component, such astop surface 141 ofshield component 140, may be positioned under stack 200 (e.g., as shown inFIG. 5 ) and then an exposed portion ofstack 200 may be attached to the base component.FIG. 6 shows stack 200 in a fifth stage of assembly of shield structure 102 (i.e., in a stage 200-5), which may be the same as stage 200-4 ofstack 200 but aftertop surface 141 ofshield component 140 has been attached to stack 200.Shield component 140 may be provided by any suitable material layer or combination of any suitable stacked material layers of anysuitable height 140H betweentop surface 141 andbottom surface 149 in order to provide any suitable base structure that may be operative to be insulated byinsulation components assembly structure 110 andelectronic component 170 of assembly 100). For example, as shown,shield component 140 may include any suitablelower layer 147 of any suitable height 147H that may define and extend upwards frombottom surface 149 and that may be made of any suitable shield material, such as an aluminum foil, in order to eventually shieldelectronic component 170. Additionally, as shown,shield component 140 may include any suitabletop layer 143 of anysuitable height 143H that may define and/or extend downwards fromtop surface 141 and that may be made of any suitable substrate material, such as a PET film or polyimide film (e.g., by direct coating or lamination on layer 147).Height 140H may be about 20 micrometers or may be in any suitable range, such as between 8 micrometers and 150 micrometers or between 12 micrometers and 35 micrometers, while height 147H may be about 16 micrometers or may be in any suitable range, such as between 8 micrometers and 100 micrometers or between 12 micrometers and 25 micrometers, whileheight 143H may be about 4 micrometers or may be in any suitable range, such as between 0 micrometers and 50 micrometers or between 0 micrometers and 10 micrometers. - As shown in
FIG. 6 ,top surface 141 ofshield component 140 may be attached to an exposed (e.g., bottom) portion of stage 200-4 ofstack 200 to provide stage 200-5 ofstack 200, where such an exposed portion ofstack 200 may includefirst portion 120 a of insulation component 120 (e.g.,bottom surface 129 of loweradhesive layer 127 offirst portion 120 a of insulation component 120) andsecond portion 130 b of insulation component 130 (e.g.,bottom surface 139 ofadhesive layer 137 ofsecond portion 130 b of insulation component 130). The attachment process for providing stage 200-5 may be accomplished using any suitable technique(s), including any suitable laminating process. For example, a first portion oftop surface 141 ofshield component 140 may be pressed againstbottom surface 129 of loweradhesive layer 127 offirst portion 120 a ofinsulation component 120 while a second portion oftop surface 141 ofshield component 140 may be pressed againstbottom surface 139 ofadhesive layer 137 ofsecond portion 130 b ofinsulation component 130, for example, by using set of rollers that may be heated or otherwise for joining stage 200-4 ofstack 200 totop surface 141 ofshield component 140 for providing stage 200-5 ofstack 200. The attachment ofstack 200 to shieldcomponent 140 may be accomplished during a single attachment operation (e.g., a single lamination operation (e.g., a single pass through ofstack 200 andshield component 140 between a set of rollers)). As just one example, each roller may be a rubber roller (e.g., with a durometer of 70 Shore A) and the rollers may apply any suitable pressure (e.g., a pressure in a range of 0.3 megapascals to 2.0 megapascals or about 0.65 megapascals) onstack 200 and shield component 140 (e.g., ontop surface 221 of carrier component 220 (e.g., in the direction of arrow R) andbottom surface 149 of shield component 140 (e.g., in the direction of arrow C)) to provide stage 200-5 ofstack 200. A deformable (e.g., rubber) roller may be provided to roll alongtop surface 221 of carrier component 220 (e.g., along the +X-direction) to constantly push stage 200-4 ofstack 200 againstshield component 140 for providing stage 200-5 ofstack 200.Carrier component 220 may be operative to stretch (e.g., in the −Z direction) during the attachment process to pressbottom surface 139 ofadhesive layer 137 ofsecond portion 130 b ofinsulation component 130 againsttop surface 141 ofshield component 140. - Once a base component (e.g., shield component 140) has been attached to stack 200 in fourth stage 200-4 to provide fifth stage 200-5 of
stack 200, another portion ofstack 200 may be removed from the stack in order to prepare the stack for use withinassembly 100 as a shield structure.FIGS. 7 and 7A showstack 200 in a sixth stage of assembly of shield structure 102 (i.e., in a stage 200-6), which may be the same as stage 200-5 ofstack 200 but after another portion ofstack 200 has been removed through any suitable removal process. For example, as shown,carrier component 220 andfirst component portion 130 a ofinsulation component 130 andfirst component portion 240 a ofbuffer component 240 andfirst component portion 260 a ofliner component 260 may be removed (e.g., in the removal direction of arrow C) from the remainder ofstack 200 of stage 200-5, such thatadhesive layer 123 oftop surface 121 offirst component portion 120 a ofinsulation component 120 may be exposed and such thatsubstrate layer 133 oftop surface 131 ofsecond component portion 130 b ofinsulation component 130 may be exposed. The stack portion removal process for providing stage 200-6 may be accomplished using any suitable technique(s), including any suitable scraping process. Removal ofcarrier component 220 andfirst component portion 130 a ofinsulation component 130 andfirst component portion 240 a ofbuffer component 240 andfirst component portion 260 a ofliner component 260 may be accomplished without affecting the geometry of the remaining stack portion.Stack 200 may be configured such that the release force required (e.g., in the direction of arrow C) to removefirst component portion 260 a ofliner component 260 fromfirst component portion 120 a ofinsulation component 120 may be less than the release force required (e.g., in the direction of arrow C) to removefirst component portion 120 a ofinsulation component 120 fromshield component 140, such thatfirst component portion 120 a ofinsulation component 120 may remain as a portion ofstack 200 of stage 200-6 despite thatfirst component portion 120 a being stacked below the stack portion that was removed from stack 200 (e.g., the release force that may be required to releaseadhesive layer 127 ofbottom surface 129 offirst component portion 120 a ofinsulation component 120 fromtop surface 141 ofshield component 140 may be greater than the release force that may be required to release releasingagent layer 267 ofbottom surface 269 offirst component portion 260 a ofliner component 260 fromadhesive layer 123 oftop surface 121 offirst component portion 120 a of insulation component 120). Additionally, stack 200 may be configured such that the release force required (e.g., in the direction of arrow C) to removecarrier component 220 fromsecond component portion 130 b ofinsulation component 130 may be less than the release force required (e.g., in the direction of arrow C) to removesecond component portion 130 b ofinsulation component 130 fromshield component 140, such thatsecond component portion 130 b ofinsulation component 130 may remain as a portion ofstack 200 of stage 200-6 despite thatsecond component portion 130 b being stacked below the stack portion that was removed from stack 200 (e.g., the release force that may be required to releaseadhesive layer 137 ofbottom surface 139 ofsecond component portion 130 b ofinsulation component 130 fromtop surface 141 ofshield component 140 may be greater than the release force that may be required to releaseadhesive layer 227 ofbottom surface 229 ofcarrier component 220 fromsubstrate layer 133 oftop surface 131 ofsecond component portion 130 b of insulation component 130).Carrier component 220 may be configured such thatadhesive layer 227 may be permanently adhered tosubstrate layer 223 or at least have a very strong adhesion to substrate layer 223 (e.g., by cleaning and activating a bottom surface ofsubstrate layer 223 before coating that bottom surface with a proper formulation ofadhesive layer 227 to maximize such adhesion), whileadhesive layer 227 may be configured to weakly adhere tosubstrate layer 133 of insulation component 130 (e.g., an adhesion weaker than the adhesion ofadhesive layer 227 to substrate layer 223), where such adhesion may be stable along heat soak aging. The remaining structure of stage 200-6 may provide spacing 201 of magnitude SX between exposedside surface 124 offirst component portion 120 a offirst insulation component 120 and exposedside surface 136 ofsecond component portion 130 b ofsecond insulation component 130, where magnitude SX may be less than a particular magnitude (e.g., less than 80 micrometers, or less than 50 micrometers, or less than 30 micrometers, or less than 20 micrometers, or less than 10 micrometers). - As shown in
FIG. 7A , horizontal cross-section cutshape 209 s ofcut 209 may provide a structure of stage 200-6 ofstack 200 that may expose not onlytop surface 121 offirst component portion 120 a ofinsulation component 120 andtop surface 131 ofsecond component portion 130 b ofinsulation component 130, but also a portion oftop surface 141 ofshield component 140. While the exposed portion oftop surface 141 ofshield component 140 may be limited to magnitude SX of spacing 201 between exposedside surface 124 offirst component portion 120 a offirst insulation component 120 and exposedside surface 136 ofsecond component portion 130 b of second insulation component 130 (e.g., surfaces extending in Y-Z planes), and to a similar magnitude SY of aspacing 203 between other exposed side surfaces offirst insulation component 120 and second insulation component 130 (e.g., surfaces extending in X-Z planes), an additional exposed portion oftop surface 141 ofshield component 140 may be exposed by the portion ofcut shape 209 s that may have been provided through a portion ofstack 200 that does not include component 130 (if such a result is desired). Nevertheless, stage 200-6 ofstack 200 may provide the reduced spacing betweenadjacent insulation components top surface 141 ofshield component 140. Stage 200-6 ofstack 200 may then be provided withinassembly 100 ofFIG. 1 for providing at least a portion of insulatedshield structure 102. In some embodiments, a top surface ofsubstrate layer 133 may be provided with an adhesive for adheringinsulation component 130 to bottom surface 119 ofassembly structure 110 withinassembly 100. In other embodiments, the top surface ofsubstrate layer 133 may not include an adhesive and/orcomponent 130 may not be adhered toassembly structure 110 withinassembly 100. -
FIG. 8 is a flowchart of anillustrative process 800 for forming an insulated shield structure (e.g.,shield structure 102 or stage 200-6 of stack 200) for an electronic device (e.g., assembly 100) using a shield component (e.g., shield component 140) and a stack (e.g., stage 200-1 of stack 200) that includes a number of components including a first insulation component (e.g., insulation component 120) and a second insulation component (e.g., insulation component 130) that is stacked above the first insulation component. Atoperation 802 ofprocess 800, a cut (e.g., cut 209) may be created through at least two components of the stack (e.g., stage 200-1 of stack 200), wherein the cut separates a first portion of the first insulation component (e.g.,first component portion 120 a) from a second portion of the first insulation component (e.g.,second component portion 120 b), wherein the cut separates a first portion of the second insulation component (e.g.,first component portion 130 a) from a second portion of the second insulation component (e.g.,second component portion 130 b), wherein the first portion of the second insulation component (e.g.,first component portion 130 a) is stacked above the first portion of the first insulation component (e.g.,first component portion 120 a), and wherein the second portion of the second insulation component (e.g.,second component portion 130 b) is stacked above the second portion of the first insulation component (e.g.,second component portion 120 b). Atoperation 804 ofprocess 800, a first portion of the stack may be removed from a second portion of the stack, wherein the first portion of the stack includes the second portion of the first insulation component (e.g.,second component portion 120 b). Atoperation 806 ofprocess 800, a surface of the shield component (e.g.,top surface 141 of shield component 140) may be attached to an exposed portion of the second portion of the stack, wherein the exposed portion of the second portion of the stack includes the first portion of the first insulation component (e.g.,first component portion 120 a) and the second portion of the second insulation component (e.g.,second component portion 130 b). - It is understood that the operations shown in
process 800 ofFIG. 8 are only illustrative and that existing operations may be modified or omitted, additional operations may be added, and the order of certain operations may be altered. -
FIG. 9 is a flowchart of anillustrative process 900 for forming a multi-component structure (e.g.,structure 102 or stage 200-6 of stack 200) using a base component (e.g., component 140) and a stack (e.g., stage 200-1 of stack 200) that includes a number of stack components including a first stack component (e.g., component 120) and a second stack component (e.g., component 130) that is stacked above the first stack component. Atoperation 902 ofprocess 900, a cut (e.g., cut 209) may be created through at least a portion of the stack (e.g., stage 200-1 of stack 200), wherein the cut separates a first portion of the first stack component (e.g.,first component portion 120 a) from a second portion of the first stack component (e.g.,second component portion 120 b), wherein the cut separates a first portion of the second stack component (e.g.,first component portion 130 a) from a second portion of the second stack component (e.g.,second component portion 130 b), wherein the first portion of the second stack component (e.g.,first component portion 130 a) is stacked above the first portion of the first stack component (e.g.,first component portion 120 a), and wherein the second portion of the second stack component (e.g.,second component portion 130 b) is stacked above the second portion of the first stack component (e.g.,second component portion 120 b). Atoperation 904 ofprocess 900, a surface of the base component (e.g.,surface 141 of component 140) may be joined to the first portion of the first stack component (e.g.,first component portion 120 a) and to the second portion of the second stack component (e.g.,second component portion 130 b). - It is understood that the operations shown in
process 900 ofFIG. 9 are only illustrative and that existing operations may be modified or omitted, additional operations may be added, and the order of certain operations may be altered. - While there have been described shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same, it is to be understood that many changes may be made therein without departing from the spirit and scope of the subject matter described herein in any way. Insubstantial changes from the claimed subject matter as viewed by a person with ordinary skill in the art, now known or later devised, are expressly contemplated as being equivalently within the scope of the claims. Therefore, obvious substitutions now or later known to one with ordinary skill in the art are defined to be within the scope of the defined elements. It is also to be understood that various directional and orientational terms, such as “up” and “down,” “front” and “back,” “top” and “bottom” and “side,” “above” and “below,” “length” and “width” and “thickness” and “diameter” and “cross-section” and “longitudinal,” “X-” and “Y-” and “Z-,” and the like, may be used herein only for convenience, and that no fixed or absolute directional or orientational limitations are intended by the use of these terms. For example, the components of the shield structure can have any desired orientation. If reoriented, different directional or orientational terms may need to be used in their description, but that will not alter their fundamental nature as within the scope and spirit of the invention.
- Therefore, those skilled in the art will appreciate that the invention can be practiced by other than the described embodiments, which are presented for purposes of illustration rather than of limitation.
Claims (20)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/836,424 US10238018B1 (en) | 2017-09-10 | 2017-12-08 | Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762556441P | 2017-09-10 | 2017-09-10 | |
US15/836,424 US10238018B1 (en) | 2017-09-10 | 2017-12-08 | Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same |
Publications (2)
Publication Number | Publication Date |
---|---|
US20190082565A1 true US20190082565A1 (en) | 2019-03-14 |
US10238018B1 US10238018B1 (en) | 2019-03-19 |
Family
ID=65632018
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/836,424 Active US10238018B1 (en) | 2017-09-10 | 2017-12-08 | Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same |
Country Status (1)
Country | Link |
---|---|
US (1) | US10238018B1 (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100371877B1 (en) * | 1997-04-16 | 2003-02-11 | 가부시끼가이샤 도시바 | Wiring board, wiring board fabrication method, and semiconductor package |
KR100606654B1 (en) * | 2005-08-01 | 2006-08-01 | 삼성전자주식회사 | Semiconductor package having ferrite shielding structure for reducing electromagnetic interference, and fabrication method thereof |
-
2017
- 2017-12-08 US US15/836,424 patent/US10238018B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
US10238018B1 (en) | 2019-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1977478B1 (en) | Radio frequency (rf) antenna containing element and methods of making the same | |
KR20100051039A (en) | Chip module for an rfid system | |
EP1587029B1 (en) | RFID-tag | |
KR20140139155A (en) | sheild can and manufacturing method thereof | |
KR20100051040A (en) | Method and device for producing an rfid label | |
JP2013242698A (en) | Method of manufacturing base material sheet with wireless ic module | |
US10238018B1 (en) | Shield structures with reduced spacing between adjacent insulation components and systems and methods for making the same | |
JP2005223470A (en) | Transfer-type copper foil antenna | |
JP2010168214A (en) | Film affixing device | |
WO2017042617A1 (en) | Method for manufacturing laminate | |
US7828217B2 (en) | Method and device for producing RFID smart labels or smart label inlays | |
US20120327019A1 (en) | Method of producing touch screen | |
KR101718855B1 (en) | Method of composite sheet for shielding electromagnetic wave and dissipating heat | |
JP5968941B2 (en) | Cut-out laminate sheet and preparation method thereof | |
CN104936381B (en) | The manufacturing method and its intermediate product of flexible printed circuit board | |
CN106711593A (en) | Nfc antenna manufacturing method | |
JP4637499B2 (en) | Sheet wound with interposer and IC tag | |
CA2509397A1 (en) | A method of protecting metal foil substrates | |
US20070171619A1 (en) | Electronic circuit board intermediate member, manufacturing method therefor, manufacturing equipment therefor, method for rmanufacturing noncontact id card and the like, and equipment therefor | |
JP6208276B2 (en) | Cut-out laminate sheet | |
JP2667240B2 (en) | Method of manufacturing composite sheet for electromagnetic shielding | |
KR20120079557A (en) | Magnetic sheet printed circuit board and method for fabricating the same | |
WO2023178678A1 (en) | Foldable foil antenna component | |
CN117750622A (en) | Flexible circuit board and preparation method thereof | |
JP5040551B2 (en) | Non-contact type data carrier conductive member and method and apparatus for manufacturing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: APPLE INC., NEW YORK Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LIN, WEI;GUPTA, NATHAN K.;ZHONG, JOHN Z.;SIGNING DATES FROM 20171201 TO 20171205;REEL/FRAME:044342/0688 |
|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 4 |