US20170088971A1 - Treatment of Etch Baths - Google Patents

Treatment of Etch Baths Download PDF

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Publication number
US20170088971A1
US20170088971A1 US14/870,738 US201514870738A US2017088971A1 US 20170088971 A1 US20170088971 A1 US 20170088971A1 US 201514870738 A US201514870738 A US 201514870738A US 2017088971 A1 US2017088971 A1 US 2017088971A1
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United States
Prior art keywords
electrolyte
sulfuric acid
manganese
ions
concentration
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Abandoned
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US14/870,738
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English (en)
Inventor
Roderick D. Herdman
Trevor Pearson
Roshan V. Chapaneri
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MacDermid Acumen Inc
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MacDermid Acumen Inc
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Application filed by MacDermid Acumen Inc filed Critical MacDermid Acumen Inc
Priority to US14/870,738 priority Critical patent/US20170088971A1/en
Assigned to MACDERMID ACUMEN, INC. reassignment MACDERMID ACUMEN, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHAPANERI, ROSHAN V., HERDMAN, RODERICK D, PEARSON, TREVOR
Priority to PL16852563.2T priority patent/PL3356577T3/pl
Priority to MX2018004025A priority patent/MX2018004025A/es
Priority to CA3000659A priority patent/CA3000659A1/en
Priority to EP16852563.2A priority patent/EP3356577B1/en
Priority to ES16852563T priority patent/ES2928058T3/es
Priority to CN201680057134.4A priority patent/CN108350586A/zh
Priority to JP2018516118A priority patent/JP6815394B2/ja
Priority to KR1020187010223A priority patent/KR102124453B1/ko
Priority to BR112018006281-2A priority patent/BR112018006281B1/pt
Priority to PCT/US2016/054350 priority patent/WO2017059019A1/en
Priority to TW105131464A priority patent/TWI636122B/zh
Publication of US20170088971A1 publication Critical patent/US20170088971A1/en
Assigned to BARCLAYS BANK PLC, AS COLLATERAL AGENT reassignment BARCLAYS BANK PLC, AS COLLATERAL AGENT SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MACDERMID ACUMEN, INC.
Assigned to CITIBANK, N.A. reassignment CITIBANK, N.A. ASSIGNMENT OF SECURITY INTEREST IN PATENT COLLATERAL Assignors: BARCLAYS BANK PLC
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22—Roughening, e.g. by etching
    • C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics

Definitions

  • the present invention relates generally to an etchant for preparing a non-conductive substrate to accept metal plating thereon.
  • non-conductive substrates i.e. plastics
  • Plastic moldings are relatively inexpensive to produce and metal plated plastic is used for many applications.
  • metal plated plastics are used for decoration and for the fabrication of electronic devices.
  • An example of a decorative use includes automobile parts such as trim.
  • Examples of electronic uses include printed circuits, wherein metal plated in a selective pattern comprises the conductors of the printed circuit board, and metal plated plastics used for EMI shielding.
  • ABS resins are the most commonly plated plastics for decorative purposes while phenolic and epoxy resins are the most commonly plated plastics for the fabrication of printed circuit boards.
  • Plating on plastic surfaces is used in the production of a variety of consumer items.
  • Plastic moldings are relatively inexpensive to produce and plated plastic is used for many applications, including automotive trim.
  • ABS acrylonitrile/butadiene/styrene
  • ABS/PC polycarbonate
  • this material has been etched almost exclusively using a mixture of chromic and sulfuric acids, which is highly effective as an etchant for ABS and ABS/PC.
  • the polybutadiene phase of the plastic contains double bonds in the polymer backbone, which are oxidized by the chromic acid, thus causing complete breakdown and dissolution of the polybutadiene phase exposed at the surface of the plastic which gives an effective etch to the surface of the plastic.
  • chromic acid is a recognized carcinogen and is increasingly regulated, requiring that wherever possible, the use of chromic acid be replaced with safer alternatives.
  • the use of a chromic acid etchant also has well-known and serious drawbacks, including the toxicity of chromium compounds which makes their disposal difficult, chromic acid residues remaining on the polymer surface that inhibit electroless deposition, and the difficulty of rinsing chromic acid residues from the polymer surface following treatment.
  • Permanganate solutions are also described in U.S. Pat. No. 3,625,758 to Stahl et al., which is herein incorporated by reference in its entirety. Stahl suggests the suitability of either a chrome and sulfuric acid bath or a permanganate solution for preparing the surface.
  • U.S. Pat. No. 4,948,630 to Courduvelis et al. which is herein incorporated by reference in its entirety, describes a hot alkaline permanganate solution that also contains a material, such as sodium hypochlorite, that has an oxidation potential higher than the oxidation potential of the permanganate solution.
  • permanganate ions can react with hydrogen ions to produce manganese (II) ions and water according to the following reaction:
  • the manganese(II) ions formed by this reaction can then undergo further reaction with permanganate ions forming a sludge of manganese dioxide according to the following reaction:
  • trivalent manganese as an etchant for plastics, including ABS and ABS/PC.
  • trivalent manganese can be produced by electrolysis at low current density of divalent manganese ions in a strong acid solution.
  • Trivalent manganese is unstable and is highly oxidizing (standard redox potential of 1.51 versus normal hydrogen electrode). In solution, it very rapidly disproportionates to manganese dioxide and divalent manganese via the following reaction:
  • the trivalent manganese ion becomes metastable and forms a cherry purple/red colored sulfate complex, which is a suitable medium for the etching of ABS and has many advantages over chromium-free etches of the prior art.
  • the concentration of sulfuric acid is preferably at least 8 molar, more preferably between about 9 and about 15 molar. Below a concentration of about 9 molar, the rate of etch becomes slow and above about 14 molar, the solubility of manganese ions in the solution becomes low. For good etching of plastic, a concentration of sulfuric acid of at least about 12 M is necessary to provide rapid etching. This has the effect of reducing the solubility of manganese ions in the bath and the maximum solubility of manganese ions in the bath at operating temperature is about 0.08 M.
  • the concentration of sulfuric acid is between about 12 and 13 molar, which is dilute enough to allow the safe addition of water to the etch and strong enough to optimize the etch rate of the plastic.
  • concentration of sulfuric acid up to around 0.08 M of manganese sulfate can be dissolved at the preferred operating temperature of the etch.
  • concentration of manganese ions in solution should be as high as it is feasible to achieve.
  • the manganese(II) ions are preferably selected from the group consisting of manganese sulfate, manganese carbonate and manganese hydroxide although other similar sources of manganese(II) ions are known in the art.
  • the concentration of manganese(II) ions may be in the range of between about 0.005 molar up to saturation.
  • the electrolyte also comprises colloidal manganese dioxide, which may form to some extent as a natural result of disproportionation of manganese(III) in solution, or may be added deliberately.
  • Manganese(III) ions can be conveniently generated by electrochemical means by the oxidation of manganese(II) ions. In addition, it is generally preferable that the electrolyte not contain any permanganate ions.
  • the amount of manganese that can be dissolved in the bath may be increased by replacing a portion of the sulfuric acid with another acid in which the manganese ions may be more soluble.
  • Acids which would have both the necessary stability to oxidation and the ability to increase the solubility of manganese ions in the bath are methane sulfonic acid and methane disulfonic acid. Since the solubility of manganese(II) is much better in methane sulfonic acid (and sulfuric acid) than it is in methane disulfonic acid, the former choices produce better performance. Thus methane sulfonic acid is the preferred additional acid and sulfuric acid is the preferred primary acid.
  • the electrolyte for etching ABS and ABS/PC plastics may contain at least 8 M of sulfuric acid and contains about 0 M to about 6 M of methane sulfonic acid or methane disulfonic acid, preferably from about 1 M to about 6 M methane sulfonic acid.
  • One way to remove moisture from the solution and restore the desired high concentration of sulfuric acid is to remove a portion of the bath and to replace the portion with fresh material. However, the removed portion must then be treated as waste, along with the associated costs and environmental issues.
  • Another approach is to blow dehumidified air over the electrolyte solution in the electrolytic cell to achieve evaporation of water from the bath electrolyte contained in the electrolytic cell.
  • the partial pressure of water in the air must be lower than the partial pressure of water in the etch bath.
  • the etch bath is open to the atmosphere during production, it is not practical to maintain a layer of dry air over the production tank.
  • the rate of dry air production must match the rate of extraction, which can be very high (i.e., more than 1,000 m 3 /hour).
  • the present invention relates generally to a method of maintaining a concentration of sulfuric acid in an electrolyte comprising manganese(III) ions in a solution of sulfuric acid, the method comprising the steps of:
  • FIG. 1 depicts a schematic of an electrolytic system in accordance with the present invention.
  • the present invention relates generally to a method of maintaining a concentration of sulfuric acid in an electrolyte comprising manganese(III) ions in a solution of sulfuric acid, the method comprising the steps of:
  • the present invention takes the approach that a portion of the electrolyte can be removed from the electrolytic cell and fed into an enclosed annex tank for treatment to remove moisture.
  • an electrolyte comprising manganese(III) ions may be prepared by oxidizing an electrolyte comprising a solution of manganese(II) ions in at least one acid in an electrolytic cell wherein the electrolytic cell comprises an anode and a cathode; applying a current between the anode and the cathode.
  • the electrolyte solution, and particularly the concentration of sulfuric acid in the electrolytic cell are closely monitored so that the concentration of the sulfuric acid and other electrolyte bath constituents remain with the preferred range for the process. That is, as described herein, it is desirable that the concentration of sulfuric acid be maintained at preferably at least 8 molar, more preferably between about 9 and about 15 molar. For good etching of plastic, a concentration of sulfuric acid of at least about 12 M is necessary to provide rapid etching, which also has the effect of reducing the solubility of manganese ions in the bath and the maximum solubility of manganese ions in the bath at operating temperature is about 0.08 M. Thus, the concentration of sulfuric acid is, optionally but preferably maintained at a level between about 12 and 13 M if sulfuric acid is the only acid present in the electrolyte.
  • the electrolyte may contain at least 8 M of sulfuric acid and about 0 M to about 6 M of methane sulfonic acid or methane disulfonic acid, preferably from about 1 M to about 6 M methane sulfonic acid.
  • the concentration of sulfuric acid in the electrolyte decreases to about 8 M or so, depending on the composition of the electrolyte, a portion of the electrolyte is removed from the electrolytic cell to the annex cell for treatment to remove moisture and thus restore the concentration of the sulfuric acid in the solution to the desired level.
  • the removed portion of the electrolyte is treated for the period of time necessary to restore the concentration of the sulfuric acid to the desired level and will depend in part on the desired concentration of sulfuric acid in the bath electrolyte as well as the extent to which the concentration of sulfuric acid has been depleted from the electrolyte.
  • the electrolyte is treated for a period of about 1 minute to about 30 minutes, more preferably for about 5 to about 20 minutes until the desired level of sulfuric acid in the removed portion has been achieved. Thereafter, the now restored bath electrolyte can be returned to the main electrolytic cell.
  • the annex tank is an enclosed tank.
  • dry gas may be fed over the surface of the electrolyte solution in the enclosed annex tank. While any dry gas may be used in the practice of the invention, air is generally preferred due to its lower cost and general availability.
  • a dry gas is a gas with a partial vapor pressure of water vapor that is lower than the partial pressure of water in the solution being treated.
  • a dry gas such as nitrogen has a much higher cost as well as a potential safely issue due to possible asphyxiation.
  • the dry gas inlet is preferably a dry air inlet.
  • the source of dry air can be from a dehumidifier unit or may be compressed air.
  • Compressed air is a convenient source of dried air for many plants and is generally readily available. Compressed air by nature is much drier than ambient air because the compression forces moisture of the gases.
  • the compressed air can also be passed through a desiccant chamber before use to further reduce humidity. Suitable desiccants would be known to those skilled in the art and may include silica gel, sodium hydroxide, and calcium chloride, among others.
  • the dry air is fed into the enclosed annex tank from the source of dry air through the dry air inlet.
  • the dry air is typically maintained at a temperature of between about 15 to about 30° C., more preferably about 20 to 25° C., and has an initial humidity of less than about 15%, more preferably, less than about 5% to remove water from the etchant baths and control moisture absorption in the baths.
  • the now moist air can be removed from the enclosed annex tank through an air outlet that carries moist air out of the annex tank.
  • the air outlet can be vented to an extraction duct so that the moist air is removed from the system through normal extraction.
  • the need to remove the etch bath periodically can be minimized and possibly eliminated. It is also highly desirable that the rate of moisture removed from the annex tank matches or exceeds the rate of moisture absorption in the production tank.
  • the annex tank can be operated on either a continuous basis or as a batch process.
  • a regeneration cell is required or at least preferred to maintain the Mn(III) content of the etchant and prevent build-up of Mn(II) ions in the electrolytic cell.
  • the regeneration cell may be used for both replenishing or maintaining the Mn(III) content in the electrolyte and removing water from the electrolyte to restore the sulfuric acid content of the electrolyte in a single step.
  • separate tanks or cells may be used for the maintaining or replenishing the Mn(III) content of the electrolyte and for removing water from the electrolyte.
  • the electrolytic system of the present invention typically comprises an electrolytic cell comprising a cathode 2 in contact with an electrolyte solution 6 ; and an anode 4 in contact with the electrolyte solution 6 .
  • the electrolyte solution 6 comprises manganese(III) ions in a solution of sulfuric acid and optionally, an additional acid selected from the group consisting of methane sulfonic acid, methane disulfonic acid and combinations thereof.
  • the electrolyte solution initially contains an electrolyte comprising a solution of manganese(II) ions in a strong acid which are oxidized to manganese(III) ions.
  • the platable plastic can be immersed in the metastable complex for a period of time to etch the surface of the platable plastic.
  • the time period of the immersion of the plastic in the electrolyte is preferably between about 10 and about 30 minutes.
  • the electrolyte bath 6 picks up moisture and the concentration of sulfuric acid in the electrolyte solution is diluted to a certain level, at least a portion of the electrolyte bath can be circulated to the annex tank 8 for treatment.
  • the electrolyte enters the enclosed annex tank 8 through a solution inlet 10 and the treated electrolyte is returned to the electrolyte bath 6 in the electrolytic cell through a solution outlet 12 .
  • Dry air enters the annex tank 8 through a dry air inlet 14 from a source of dry air 16 . Once the dry air passes over the surface of the electrolyte solution in the annex tank 8 , the now moist air is removed through the dry air outlet 18 .
  • Annex tank 8 used to remove moisture from the solution, may be an enclosed tank in which the dry air is passed over the solution surface. Alternatively, it may contain a means of increasing the surface area of the solution in contact with the dry air, for example by passing the electrolyte over a cascade tray system or by spraying the solution into the dry air atmosphere. Such examples increase the evaporation rate which results in the need for only a very small annex tank.
  • etch solutions absorb moisture at a rate of about 70 g/hr per m 2 of etch solution surface area, when the etch solution is between 65-70° C.
  • dry air the inventors found it was possible to evaporate moisture from similar etch solutions at a rate of up to 400 g/hr per m 2 of etch solution surface area, when the etch solution is between 65-70° C.
  • the platable plastic is immersed in the electrolyte which comprises the metastable complex of manganese(III) ions in sulfuric acid and which is maintained at a temperature of between 30 and 80° C.
  • the rate of etching increases with temperature and is slow below 50° C.
  • the upper limit of temperature is determined by the nature of the plastic being etched. ABS begins to distort above 70° C., thus in a preferred embodiment the temperature of the electrolyte is maintained between about 50 and about 70° C., especially when etching ABS materials.
  • Articles etched in this manner may be subsequently electroplated using conventional pretreatment for plated plastics or the etched surface of the plastic may be used to enhance the adhesion of paint, lacquers or other surface coatings.
  • the anode and cathode usable in the electrolytic cell containing manganese(III) and strong sulfuric acid described herein may comprise various materials.
  • the cathode may comprise a material selected from the group consisting of platinum, platinized titanium, niobium, iridium oxide coated titanium, and lead.
  • the cathode comprises platinum or platinized titanium.
  • the cathode comprises lead.
  • the anode may also comprise platinized titanium, platinum, iridium/tantalum oxide, niobium, boron doped diamond, or any other suitable material.
  • the etchant is also very aggressive towards certain electrodes necessary to produce the manganese(III) ions.
  • anodes having a titanium substrate may be rapidly degraded by the etchant.
  • Other anode materials include vitreous carbon, reticulated vitreous carbon, and woven carbon fiber anodes, as well as lead and suitable lead alloys, as described, for example, in U.S. Pat. Pub. No. 2013/0186862 to Pearson et al., the subject matter of which is herein incorporated by reference in its entirety.
  • the current density which can be applied in the electrolytic cell is limited in part by the oxygen overpotential on the anode material chosen.
  • the potential of the anode is sufficiently high to liberate oxygen.
  • the conversion efficiency of manganese(II) ions to manganese(III) ions falls and thus any further increase in current density is wasted.
  • operating the anodes at the higher overpotential required to produce the higher current density tends to produce manganese dioxide at the anode surface rather than manganese(III) ions.
  • anode area which is large in comparison to the area of the cathode.
  • the area ratio of anode to cathode is at least about 10:1.
  • the present invention described an improved method of maintaining the sulfuric acid content of a manganese(III) bath electrolyte solution for etching ABS and ABS/PC plastics in a consistent and efficient manner.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)
  • ing And Chemical Polishing (AREA)
US14/870,738 2015-09-30 2015-09-30 Treatment of Etch Baths Abandoned US20170088971A1 (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
US14/870,738 US20170088971A1 (en) 2015-09-30 2015-09-30 Treatment of Etch Baths
PCT/US2016/054350 WO2017059019A1 (en) 2015-09-30 2016-09-29 Treatment of etch baths
CN201680057134.4A CN108350586A (zh) 2015-09-30 2016-09-29 蚀刻浴的处理
KR1020187010223A KR102124453B1 (ko) 2015-09-30 2016-09-29 식각 배스들의 처리
CA3000659A CA3000659A1 (en) 2015-09-30 2016-09-29 Treatment of etch baths
EP16852563.2A EP3356577B1 (en) 2015-09-30 2016-09-29 Treatment of etch baths
ES16852563T ES2928058T3 (es) 2015-09-30 2016-09-29 Tratamiento de baños de ataque químico
PL16852563.2T PL3356577T3 (pl) 2015-09-30 2016-09-29 Obróbka w kąpieli wytrawiającej
JP2018516118A JP6815394B2 (ja) 2015-09-30 2016-09-29 エッチング浴の処理
MX2018004025A MX2018004025A (es) 2015-09-30 2016-09-29 Tratamiento de ba?os de grabado.
BR112018006281-2A BR112018006281B1 (pt) 2015-09-30 2016-09-29 Tratamento de banhos de gravação
TW105131464A TWI636122B (zh) 2015-09-30 2016-09-30 蝕刻浴處理

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Application Number Priority Date Filing Date Title
US14/870,738 US20170088971A1 (en) 2015-09-30 2015-09-30 Treatment of Etch Baths

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US20170088971A1 true US20170088971A1 (en) 2017-03-30

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US (1) US20170088971A1 (pl)
EP (1) EP3356577B1 (pl)
JP (1) JP6815394B2 (pl)
KR (1) KR102124453B1 (pl)
CN (1) CN108350586A (pl)
BR (1) BR112018006281B1 (pl)
CA (1) CA3000659A1 (pl)
ES (1) ES2928058T3 (pl)
MX (1) MX2018004025A (pl)
PL (1) PL3356577T3 (pl)
TW (1) TWI636122B (pl)
WO (1) WO2017059019A1 (pl)

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US20190009184A1 (en) * 2017-07-10 2019-01-10 Srg Global, Inc. Hexavalent chromium free etch manganese recovery system
WO2019012417A1 (en) * 2017-07-10 2019-01-17 Srg Global, Inc. ENGRAVED MANGANESE VACUUM EVAPORATION SYSTEM WITHOUT CHROME HEXAVALENT

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US10889905B2 (en) * 2018-12-11 2021-01-12 Rohm And Haas Electronic Materials Llc Methods of generating manganese (III) ions in mixed aqueous acid solutions using ozone
JP7336126B2 (ja) * 2019-03-11 2023-08-31 国立研究開発法人産業技術総合研究所 高価数マンガンの製造方法、及び製造装置

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