US20170069429A1 - Low Energy Milling to Produce Flake Powders - Google Patents
Low Energy Milling to Produce Flake Powders Download PDFInfo
- Publication number
- US20170069429A1 US20170069429A1 US15/338,577 US201615338577A US2017069429A1 US 20170069429 A1 US20170069429 A1 US 20170069429A1 US 201615338577 A US201615338577 A US 201615338577A US 2017069429 A1 US2017069429 A1 US 2017069429A1
- Authority
- US
- United States
- Prior art keywords
- valve metal
- surface area
- powder
- increasing surface
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000843 powder Substances 0.000 title claims abstract description 83
- 238000003801 milling Methods 0.000 title claims description 47
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- 238000000034 method Methods 0.000 claims abstract description 48
- 239000002923 metal particle Substances 0.000 claims abstract description 36
- 239000002245 particle Substances 0.000 claims abstract description 23
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 48
- 229910052715 tantalum Inorganic materials 0.000 claims description 36
- 239000012535 impurity Substances 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 15
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 12
- 229910000831 Steel Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 239000010959 steel Substances 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 239000011651 chromium Substances 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- 229910000825 440 stainless steel Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 claims description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 2
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- 239000003990 capacitor Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 7
- 229910019580 Cr Zr Inorganic materials 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 238000002386 leaching Methods 0.000 description 3
- 238000003701 mechanical milling Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000000498 ball milling Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical class F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 241000237858 Gastropoda Species 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010316 high energy milling Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C17/00—Disintegrating by tumbling mills, i.e. mills having a container charged with the material to be disintegrated with or without special disintegrating members such as pebbles or balls
-
- B22F1/0011—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/15—Solid electrolytic capacitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
- B22F1/068—Flake-like particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
- B22F2009/043—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling by ball milling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
- B22F2301/20—Refractory metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G2009/05—Electrodes or formation of dielectric layers thereon characterised by their structure consisting of tantalum, niobium, or sintered material; Combinations of such electrodes with solid semiconductive electrolytes, e.g. manganese dioxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
Definitions
- Prior art valve metal, and particularly tantalum, flake powder for use in fabricating the anodes of electrolytic capacitors have been produced by mechanically milling powder in ball mills, vibratory ball mills, attritor mills and the like for the purpose of increasing the specific surface area of the particles.
- This approach has been broadly practiced and described in numerous patents such as U.S. Pat. Nos. 5,580,367; 4,940,490; 5,211,741; 5,261,942; 4,441,927; 4,555,268; 4,740,238 and 3647415 each of which is incorporated herein by reference.
- Valve metal flakes made by prior art methods have been characterized as having a low to medium level of charge density, as typically reported in micro-farad volts per gram (CV/g), and the levels were considered to be the limit achievable by mechanical milling. It has been considered in the industry that mechanical deformation in steel milling machines can not be expected to achieve flakes with CV/g greater than about 20,000 micro-farad volts per gram of valve metal, preferably of tantalum, with a Brunauer-Emmett-Tell (BET) surface area of more than about 1 M 2 /g.
- BET Brunauer-Emmett-Tell
- Milling is a very advanced art and those of skill in the art have considered the valve metal powders achieved by milling to have reached their pinnacle. While those of skill in the art have considered the mechanical limit to have been reached it has been surprisingly found, through diligent research, that high charge density powder can be achieved by producing high specific surface area with lower milling energy which is contrary to the expectations in the art. Under specific conditions, as set forth herein, a lower milling energy can actually achieve a high surface area with lower surface impurity thereby leading to a material which exceeds the properties previously thought achievable by mechanical milling.
- a particular advantage is the ability to utilize relatively low value powder, such as one with low charge density, and to increase the value by milling to a higher charge density.
- the method includes charging a mill apparatus with a valve metal powder and a media wherein the media has an average diameter of at least 0.01 cm to no more than 0.3175 cm.
- the valve metal powder is then milled at an average kinetic energy of no more than 3,000 ergs per media particle to obtain a milled powder.
- valve metal powder with a CV/g of at least 30,000 micro-farad volts per gram; a BET surface area of greater than 4 M 2 /g; and an aspect ratio of at least 3.
- valve metal powder has a CV/g of at least 180,000 micro-farad volts per gram, a BET surface area of greater than 4 M 2 /g and an aspect ratio of at least 3.
- a dielectric is on the anode and a cathode is on the dielectric.
- FIG. 1 is a graphical representation of an advantage provided by an embodiment of the invention.
- FIG. 2 is a graphical representation of an advantage provided by an embodiment of the invention.
- FIG. 3 is a graphical representation of an advantage provided by an embodiment of the invention and FIG. 4 is a schematic representation of an embodiment of the invention.
- the present invention is directed to an improved valve metal flake, and particularly tantalum flake, which has a higher CV/g and a higher surface area than previously considered achievable by mechanical milling.
- the present invention is also directed to an improved milling method relying on small media and low energies which was previously considered incapable of forming suitable flake.
- the present invention is also related to an improved capacitor comprising the valve metal as the anode.
- the present invention is directed to improved valve metal particles, particularly tantalum particles, produced by mechanical ball milling, attritor milling, vibratory ball milling, or roll milling using very small media.
- the media preferably has an average diameter of at least 0.001 cm to no more than 0.3175 cm. More preferably the media has an average diameter of at least 0.025 cm to 0.1 cm and even more preferably the media has an average diameter of at least 0.025 cm to 0.030 cm.
- the milling is done with low milling energies such as achieved at an RPM of an attritor mill of less than 120 RPM.
- the valve metal particles are milled to high BET surface area over several hours.
- the resultant particles have a BET surface area which is 2 to 4 times higher than the BET surface area of the particles fed to the mill and the surface impurities of the resultant particles are maintained at low levels.
- the BET of a powder fed to the improved milling process was increased from about 2 to about 7 square meters per gram.
- valve metal flakes are milled to have a BET of greater than 4 M 2 /g, more preferably greater than 5 M 2 /g, even more preferably greater than 6 M 2 /g, even more preferably at least 7 M 2 /g, even more preferably at least 8 M 2 /g and even more preferably at least 9 M 2 /g.
- the valve metal particles preferably have a low level of metallic impurity and preferably no more than 30 ppm metal other than the valve metal. More preferably the valve metal particles have no more than 30 ppm of iron, nickel and chromium combined and more importantly no more than 30 ppm of iron, nickel, chromium, silicon and zirconium combined. Carbon is also preferably low while the carbon content was lowered from about 23 micrograms per square meter of particle surface to less than about 18 micrograms per square meter.
- the valve metal powder has a CV/g of preferably at least 180,000 micro-farad volts per gram of valve metal, preferably of tantalum, and even more preferably at least 200,000 micro-farad volts per gram of valve metal, preferably of tantalum, and even more preferably at least 250,000 micro-farad volts per gram of valve metal, preferably of tantalum.
- Low CV/g powders such as less than 30,000 micro-farad volts per gram can be treated to significantly increase the CV/g thereby significantly increasing the value of the powder.
- powders with less than 50,000 micro-farad volts per gram can be treated to significantly increase the CV/g and even more preferably, powders with less than 100,000 micro-farad volts per gram can be treated to significantly increase the CV/g.
- the kinetic energy applied to the media particles in the mill can be defined quantitatively as
- ⁇ Media is the density of the media material in grams per cubic centimeter
- ⁇ Media is the volume of an average media object, for instance a spherical media ball, in cubic centimeters
- V is the maximum speed of the stirring mechanism of the mill that imparts kinetic energy to the media objects during the milling operation expressed as centimeters per second.
- V L ⁇ RPM ⁇ 2 ⁇ ⁇ 60
- r is the average radius of the steel spheres in centimeters. If, for this example, a diameter of the media sphere is 0.1 cm is assumed with a stirring arm length of 10 centimeter and the mill RPM is 200 the kinetic energy per sphere is
- Milling energy above about 3,000 ergs per milling media sphere cause impurities to increase which is undesirable. More preferably the milling energy is less than about 1,000 ergs and even more preferably less than 100 ergs. A milling energy of no more than 5 ergs per milling media sphere is particularly suitable with no more than 2 ergs being more desirable and no more than 1 erg being most desirable.
- Prior art methods for milling tantalum powders relied on the use of high mass, metallic milling media to achieve a high energy.
- the size of the milling media was chosen to take advantage of the large mass and correspondingly large momentum of the media to create high kinetic energy during the high energy processing in the various mills used.
- the need for what is termed “high energy” mills to create enough surface area during the milling to enable high micro-farad volts per gram of tantalum powders was considered necessary with multiples of 3,000 ergs, and usually well over 10,000 ergs, being considered necessary to achieve adequate results.
- Our experimentation to emulate these processes shows that, achieving high micro-farad volts per gram of tantalum by these methods surprisingly causes surface contamination by the materials of construction of the mill and most notably by the milling media.
- the media is preferably chosen from the group consisting of spherical steel, zirconia, yttria stabilized zirconia, 440 stainless steel, glass, tungsten carbide, tantalum, niobium, tantalum nitride, niobium nitride, tantalum carbide and mixtures thereof.
- the mixtures may include structured materials such as a core shell structure with an inner material which is softer and an outer material which is harder.
- An example of media made of mixed materials would be a tantalum sphere coated with tantalum nitride.
- the particles being milled to flake are preferably valve metal particles selected from the group consisting of tantalum, niobium, tungsten, titanium, aluminum and alloys thereof. Tantalum is the preferred valve metal.
- the flakes preferably have an aspect ratio, determined as the ratio of the diameter with the same surface area as a flake to the thickness, of at least 3 to about 300. More preferably, the flake has an aspect ratio of at least 10 and more preferably at least 100. An aspect ratio of about 200 to about 300 is particularly preferred.
- the flaked niobium powder permits enhanced surface area due to its morphology
- valve metal powder described herein is particularly suited for use as the anode, 10 , in a capacitor as illustrated schematically in FIG. 4 .
- the valve metal anode is preferably oxidized to form a dielectric, 12 , and the dielectric is over coated with a conductor, 14 , as the cathode as well known in the art.
- a sample of metallurgical grade tantalum powder with a BET of 0.18 M 2 /g was loaded into an 1-S attritor mill made by Union Process of Akron Ohio with stirring arms 9.842 cm (3.875 inch) long.
- the mill was operated with ethyl alcohol as a milling lubricant using 0.4762 cm (0.1875 inch) equivalent diameter 440 stainless steel spheres as milling media in accordance with standard industrial practice.
- the mill was run at 400 RPM for 180 minutes thereby imparting a kinetic energy of over 38,600 ergs.
- the milled product was removed from the mill and acid leached in HCl and HF acids to determine the residual Fe, Ni, Cr, Si and Zr from the wear of the mill.
- the inventive examples have very high values for micro-farad volts per gram and acceptable leakage values in all cases.
- the Micro-farad volts per gram levels of greater than 200,000 are achievable.
- the same attritor mill as used for the above examples was loaded with 3.86 Kgs of tantalum powder made by Kemet Blue Powder in Mound House Nevada with a BET specific surface area of 2.09 M 2 /g.
- the mill was also loaded with 50 Kgs of tantalum spheres, with an average diameter of between 0.01 cm and 0.03 cm, and covered with ethyl alcohol. These very small tantalum spheres were used as the milling media for the grinding process.
- the mill was run at 60 RPM for 1020 minutes and the product removed from the mill and cleaned by acid leaching in hydrochloric, nitric and hydrofluoric acids as is typical of the acid treatment for tantalum powders in the industry.
- the kinetic energy was less than 0.5 erg per particle.
- the tantalum flake produced was physically and chemically analyzed producing the bulk results presented in Table 4.
- the same attritor mill as used in Inventive Example 4 was loaded with same tantalum powder as used in Inventive Example 4 and with the same very small spherical tantalum media and ethyl alcohol. The mill was run at 70 RPM for 1260 minutes thereby imparting less than 0.5 ergs per particle. The product was acid cleaned as in Inventive Example 4. The tantalum flake produced was physically and chemically analyzed with the bulk results presented in Table 5.
- the same attritor mill as used in Inventive Example 4 was loaded with the same tantalum powder used in Inventive Example 4 and with the same very small spherical tantalum media and ethyl alcohol. The mill was run at 70 RPM for 1500 minutes. The product was acid cleaned as in Inventive Example 4. The tantalum flake produced was physically and chemically analyzed with bulk results presented in Table 6.
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Food Science & Technology (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Crushing And Grinding (AREA)
Abstract
Description
- The present invention is a divisional application of pending U.S. patent application Ser. No. 14/205,698 filed Mar. 12, 2014 which, in turn, claims priority to expired U.S. Provisional Patent Application No. 61/779,242 filed Mar. 13, 2013.
- Prior art valve metal, and particularly tantalum, flake powder for use in fabricating the anodes of electrolytic capacitors have been produced by mechanically milling powder in ball mills, vibratory ball mills, attritor mills and the like for the purpose of increasing the specific surface area of the particles. This approach has been broadly practiced and described in numerous patents such as U.S. Pat. Nos. 5,580,367; 4,940,490; 5,211,741; 5,261,942; 4,441,927; 4,555,268; 4,740,238 and 3647415 each of which is incorporated herein by reference.
- Valve metal flakes made by prior art methods have been characterized as having a low to medium level of charge density, as typically reported in micro-farad volts per gram (CV/g), and the levels were considered to be the limit achievable by mechanical milling. It has been considered in the industry that mechanical deformation in steel milling machines can not be expected to achieve flakes with CV/g greater than about 20,000 micro-farad volts per gram of valve metal, preferably of tantalum, with a Brunauer-Emmett-Tell (BET) surface area of more than about 1 M2/g.
- Milling is a very advanced art and those of skill in the art have considered the valve metal powders achieved by milling to have reached their pinnacle. While those of skill in the art have considered the mechanical limit to have been reached it has been surprisingly found, through diligent research, that high charge density powder can be achieved by producing high specific surface area with lower milling energy which is contrary to the expectations in the art. Under specific conditions, as set forth herein, a lower milling energy can actually achieve a high surface area with lower surface impurity thereby leading to a material which exceeds the properties previously thought achievable by mechanical milling.
- It is an object of the invention to provide a new method for making high surface area valve metal, preferably tantalum, powders that achieve the requisite specific surface area without introducing unacceptable levels of metallic impurities; specifically, without causing unacceptably high levels of iron, nickel, chromium, silicon and zirconium.
- A particular advantage is the ability to utilize relatively low value powder, such as one with low charge density, and to increase the value by milling to a higher charge density.
- These and other advantages, as will be realized, are provided in a method for increasing surface area of a valve metal particle. The method includes charging a mill apparatus with a valve metal powder and a media wherein the media has an average diameter of at least 0.01 cm to no more than 0.3175 cm. The valve metal powder is then milled at an average kinetic energy of no more than 3,000 ergs per media particle to obtain a milled powder.
- Yet another embodiment is provided in a valve metal powder with a CV/g of at least 30,000 micro-farad volts per gram; a BET surface area of greater than 4 M2/g; and an aspect ratio of at least 3.
- Yet another embodiment is provided in a capacitor with an anode comprising a valve metal powder wherein the valve metal powder has a CV/g of at least 180,000 micro-farad volts per gram, a BET surface area of greater than 4 M2/g and an aspect ratio of at least 3. A dielectric is on the anode and a cathode is on the dielectric.
-
FIG. 1 is a graphical representation of an advantage provided by an embodiment of the invention. -
FIG. 2 is a graphical representation of an advantage provided by an embodiment of the invention. -
FIG. 3 is a graphical representation of an advantage provided by an embodiment of the invention andFIG. 4 is a schematic representation of an embodiment of the invention. - The present invention is directed to an improved valve metal flake, and particularly tantalum flake, which has a higher CV/g and a higher surface area than previously considered achievable by mechanical milling. The present invention is also directed to an improved milling method relying on small media and low energies which was previously considered incapable of forming suitable flake. The present invention is also related to an improved capacitor comprising the valve metal as the anode.
- The present invention is directed to improved valve metal particles, particularly tantalum particles, produced by mechanical ball milling, attritor milling, vibratory ball milling, or roll milling using very small media. The media preferably has an average diameter of at least 0.001 cm to no more than 0.3175 cm. More preferably the media has an average diameter of at least 0.025 cm to 0.1 cm and even more preferably the media has an average diameter of at least 0.025 cm to 0.030 cm.
- The milling is done with low milling energies such as achieved at an RPM of an attritor mill of less than 120 RPM. The valve metal particles are milled to high BET surface area over several hours. The resultant particles have a BET surface area which is 2 to 4 times higher than the BET surface area of the particles fed to the mill and the surface impurities of the resultant particles are maintained at low levels. In one embodiment the BET of a powder fed to the improved milling process was increased from about 2 to about 7 square meters per gram. It Is preferable that the valve metal flakes are milled to have a BET of greater than 4 M2/g, more preferably greater than 5 M2/g, even more preferably greater than 6 M2/g, even more preferably at least 7 M2/g, even more preferably at least 8 M2/g and even more preferably at least 9 M2/g. The valve metal particles preferably have a low level of metallic impurity and preferably no more than 30 ppm metal other than the valve metal. More preferably the valve metal particles have no more than 30 ppm of iron, nickel and chromium combined and more importantly no more than 30 ppm of iron, nickel, chromium, silicon and zirconium combined. Carbon is also preferably low while the carbon content was lowered from about 23 micrograms per square meter of particle surface to less than about 18 micrograms per square meter.
- The valve metal powder has a CV/g of preferably at least 180,000 micro-farad volts per gram of valve metal, preferably of tantalum, and even more preferably at least 200,000 micro-farad volts per gram of valve metal, preferably of tantalum, and even more preferably at least 250,000 micro-farad volts per gram of valve metal, preferably of tantalum. Low CV/g powders, such as less than 30,000 micro-farad volts per gram can be treated to significantly increase the CV/g thereby significantly increasing the value of the powder. More preferably, powders with less than 50,000 micro-farad volts per gram can be treated to significantly increase the CV/g and even more preferably, powders with less than 100,000 micro-farad volts per gram can be treated to significantly increase the CV/g.
- The kinetic energy applied to the media particles in the mill can be defined quantitatively as
-
- where ρMedia is the density of the media material in grams per cubic centimeter, νMedia is the volume of an average media object, for instance a spherical media ball, in cubic centimeters, and V is the maximum speed of the stirring mechanism of the mill that imparts kinetic energy to the media objects during the milling operation expressed as centimeters per second.
- As an example of how to perform this calculation consider an attritor mill configuration wherein a vertical cylindrical tank is filled with 0.1 cm diameter spherical steel media which are propelled by a stirring mechanism composed of horizontally positioned metal arms of length, L, attached to and rotating about a centrally positioned vertical drive shaft. The tip speed, V, of such rotating metal arms, which would be the maximum stirring speed of the milling mechanism, is calculated as
-
- where the length of the stirring arms, L, is given in centimeters and RPM is the rotations per minute of the drive shaft. In this example the final calculation of the average kinetic energy of an average media object would use the density of the spherical steel media ρMedia equal to about 8 grams per cubic centimeter (the typical density of steel), and νMedia would be set equal to
-
- where r is the average radius of the steel spheres in centimeters. If, for this example, a diameter of the media sphere is 0.1 cm is assumed with a stirring arm length of 10 centimeter and the mill RPM is 200 the kinetic energy per sphere is
-
- Milling energy above about 3,000 ergs per milling media sphere cause impurities to increase which is undesirable. More preferably the milling energy is less than about 1,000 ergs and even more preferably less than 100 ergs. A milling energy of no more than 5 ergs per milling media sphere is particularly suitable with no more than 2 ergs being more desirable and no more than 1 erg being most desirable.
- Prior art methods for milling tantalum powders relied on the use of high mass, metallic milling media to achieve a high energy. The size of the milling media was chosen to take advantage of the large mass and correspondingly large momentum of the media to create high kinetic energy during the high energy processing in the various mills used. The need for what is termed “high energy” mills to create enough surface area during the milling to enable high micro-farad volts per gram of tantalum powders was considered necessary with multiples of 3,000 ergs, and usually well over 10,000 ergs, being considered necessary to achieve adequate results. Our experimentation to emulate these processes shows that, achieving high micro-farad volts per gram of tantalum by these methods surprisingly causes surface contamination by the materials of construction of the mill and most notably by the milling media.
- The media is preferably chosen from the group consisting of spherical steel, zirconia, yttria stabilized zirconia, 440 stainless steel, glass, tungsten carbide, tantalum, niobium, tantalum nitride, niobium nitride, tantalum carbide and mixtures thereof. The mixtures may include structured materials such as a core shell structure with an inner material which is softer and an outer material which is harder. An example of media made of mixed materials would be a tantalum sphere coated with tantalum nitride.
- The particles being milled to flake are preferably valve metal particles selected from the group consisting of tantalum, niobium, tungsten, titanium, aluminum and alloys thereof. Tantalum is the preferred valve metal.
- The flakes preferably have an aspect ratio, determined as the ratio of the diameter with the same surface area as a flake to the thickness, of at least 3 to about 300. More preferably, the flake has an aspect ratio of at least 10 and more preferably at least 100. An aspect ratio of about 200 to about 300 is particularly preferred. The flaked niobium powder permits enhanced surface area due to its morphology
- The valve metal powder described herein is particularly suited for use as the anode, 10, in a capacitor as illustrated schematically in
FIG. 4 . The valve metal anode is preferably oxidized to form a dielectric, 12, and the dielectric is over coated with a conductor, 14, as the cathode as well known in the art. - A sample of metallurgical grade tantalum powder with a BET of 0.18 M2/g was loaded into an 1-S attritor mill made by Union Process of Akron Ohio with stirring arms 9.842 cm (3.875 inch) long. The mill was operated with ethyl alcohol as a milling lubricant using 0.4762 cm (0.1875 inch) equivalent diameter 440 stainless steel spheres as milling media in accordance with standard industrial practice. The mill was run at 400 RPM for 180 minutes thereby imparting a kinetic energy of over 38,600 ergs. The milled product was removed from the mill and acid leached in HCl and HF acids to determine the residual Fe, Ni, Cr, Si and Zr from the wear of the mill. This technique takes advantage of the fact that tantalum is practically unaffected by the exposure to strong mineral acids which readily dissolve any free 440 stainless steel particles. The bulk analysis from this acid cleaned sample is shown in Table 1. These levels are generally considered in the industry to be too high for a commercially useful tantalum capacitor powder. The reason the steel impurities are retained after acid treatment is believed to indicate that steel particles were beaten into the surface of the tantalum which then acted to protect the steel from attack by the acids.
- A sample of NT 40 tantalum powder available from Kemet Electronics of Mound House Nevada with a BET of 1.44 M2/g was loaded into the same mill as used in Comparative Example 1 and milled using ethyl alcohol using 0.4762 cm (0.1875 inch) diameter 440 stainless steel spheres for 3600 minutes at 350 RPM in accordance with standard industry practice thereby imparting a kinetic energy of over 29,600 ergs. The product was leached in HCl and HF acids as in Example 1. The bulk analysis of the product is shown in Table 1. These levels are generally considered in the industry to be too high for a commercially useful tantalum capacitor powder.
- A sample of NT 120 tantalum powder with a BET of 2.23 M2/g was loaded into the same attritor mill with 0.317 cm (0.125) inch diameter 440 stainless steel spheres in ethyl alcohol and run for 120 minutes at 250 rpm thereby achieving a kinetic energy of over 4,400 ergs. The product was acid leached as before and analyzed with results shown in Table 1. While these levels are an improvement they would still be considered out of the specification limits for commercially available tantalum powders with comparable BET.
-
TABLE 1 Milling Mill Comp. Time Speed BET Fe Ni Cr Zr Example (min) (RPM) Media (m2/g) (ppm) (ppm) (ppm) (ppm) 1 180 400 .476 cm 440 1.6 1000 53 620 <2 stainless steel 2 3600 350 .476 cm 440 2.06 1000 191 1000 <2 stainless steel 3 120 120 .317 cm 440 3.08 44 14 16 <2 stainless steel - While improvements were made in reducing the surface density of impurities in high BET tantalum powders through increasing the BET of the powder loaded into the mill the prior art process could not achieve BET greater than about 2 without adding unacceptable impurity levels.
- In order to find a new method to achieve high specific surface area tantalum powder with acceptable levels of impurities we investigated a radical departure from the prior art methods by reducing the energy intensity within the mill during milling. It has long been considered necessary to increase milling energy to achieve increased surface area.
- The same attritor mill as above was loaded with NT 120 tantalum powder having a BET of 2.23 M2/g. The stainless steel spheres were replaced with low mass zirconia spheres having a diameter of 0.05 cm. These milling spheres were 359 times smaller in mass than the spheres used in Comparative Example 3. In addition to reducing the mass of the spheres the mill RPM was reduced to 100 RPM thereby inputting less than 2 ergs of kinetic energy. With this combination of extremely low mass media and low power input to the milling process a milling time of 1800 minutes was used. With these radically different materials and conditions the final product, after leaching in HCl and HF acids, was analyzed with the bulk results shown in Table 2. These surface concentrations of impurities would generally be usable for commercial tantalum capacitors.
- The same attritor mill as above was loaded with NT 120 tantalum powder with a BET of 2.23 M2/g. The stainless steel spheres of prior art were replaced with low mass zirconia spheres having a diameter of 0.05 cm. These milling spheres were 359 times smaller in mass than the spheres used in Comparative Example 3. In addition to reducing the mass of the spheres the RPMs was reduced to 90 RPM inputting less than 2 ergs of kinetic. With this combination of extremely low mass media and low power input to the milling process a milling time of 1800 minutes was used. With these radically different materials and conditions the final product, after leaching in HCl and HF acids, was analyzed with bulk results shown in Table 2. These surface concentrations of impurities would generally be usable for commercial tantalum capacitors.
- It is shown in these examples that the prior art process using massive spheres with high input power resulted in high energy milling that could not achieve a BET greater than 2 M2/g without imparting unacceptable levels of impurities. The inventive low energy process has achieved a BET of greater than 4 or 5 M2/g with acceptable levels of impurities.
-
TABLE 2 Invention Milling Mill Example time rpm Media BET Fe Ni Cr Zr 1 1800 100 0.5 mm 5.29 1 0 0 51 minutes zirconia 2 1800 90 0.5 mm 4.89 1 0 0 28 minutes zirconia - Three samples of tantalum powder were prepared using the same general procedure as Invention Example 2, except that a range of different combinations of milling RPMs and milling times were used. These samples were thermally agglomerated at 800° C. and deoxidized by magnesium at 800° C. using procedures common in tantalum powder industry. The tantalum powder was converted into sintered anode slugs and evaluated electrically as capacitor anodes to verify the functional capacitance achievable. The milling time and RPMs used for the manufacture of these powders, and the electrical test results for anodes made from the three samples, are shown in comparison to the non-milled starting material fed to the mill in Table 3. At 60 RPM less than 1 erg of kinetic energy was imparted on the powder per particle and at 100 RPM less than 2 ergs of kinetic energy was imparted on the powder per particle.
-
TABLE 3 1100° C. Sinter 1150° C. Sinter Wet Wet Charge Leakage Charge Leakage CV/g nA/CV CV/g nA/CV Time Speed BET FE Ni Cr Zr (μF-V/g) (nA/μF-V) (μF-V/g) (nA/μF-V) (min) (RPM) (m2/g) (ppm) (ppm) (ppm) (ppm) (50 Hz) (50 Hz) (50 Hz) (50 Hz) N/A N/A 2.10 <1 <3 <1 2 N/A N/A N/A N/A 2700 60 5.15 9 13 2 23 208,500 1.97 160,300 3.45 3000 60 5.99 1 <3 <1 83 213,100 2.12 168,700 2.86 2400 100 6.92 9 17 2 121 215,000 2.29 169,300 4.22 - The inventive examples have very high values for micro-farad volts per gram and acceptable leakage values in all cases. The Micro-farad volts per gram levels of greater than 200,000 are achievable.
- The same attritor mill as used for the above examples was loaded with 3.86 Kgs of tantalum powder made by Kemet Blue Powder in Mound House Nevada with a BET specific surface area of 2.09 M2/g. The mill was also loaded with 50 Kgs of tantalum spheres, with an average diameter of between 0.01 cm and 0.03 cm, and covered with ethyl alcohol. These very small tantalum spheres were used as the milling media for the grinding process. The mill was run at 60 RPM for 1020 minutes and the product removed from the mill and cleaned by acid leaching in hydrochloric, nitric and hydrofluoric acids as is typical of the acid treatment for tantalum powders in the industry. The kinetic energy was less than 0.5 erg per particle. The tantalum flake produced was physically and chemically analyzed producing the bulk results presented in Table 4.
-
TABLE 4 Time Speed BET FE Ni Cr Zr (min) (RPM) (m2/g) (ppm) (ppm) (ppm) (ppm) N/A N/A 2.09 <1 <3 <1 <2 1020 60 5.54 3 <3 <1 <2 - The same attritor mill as used in Inventive Example 4 was loaded with same tantalum powder as used in Inventive Example 4 and with the same very small spherical tantalum media and ethyl alcohol. The mill was run at 70 RPM for 1260 minutes thereby imparting less than 0.5 ergs per particle. The product was acid cleaned as in Inventive Example 4. The tantalum flake produced was physically and chemically analyzed with the bulk results presented in Table 5.
-
TABLE 5 Time Speed BET FE Ni Cr Zr (min) (RPM) (m2/g) (ppm) (ppm) (ppm) (ppm) N/A N/A 2.09 <1 <3 <1 <2 1260 70 6.08 2 <3 <1 <2 - The same attritor mill as used in Inventive Example 4 was loaded with the same tantalum powder used in Inventive Example 4 and with the same very small spherical tantalum media and ethyl alcohol. The mill was run at 70 RPM for 1500 minutes. The product was acid cleaned as in Inventive Example 4. The tantalum flake produced was physically and chemically analyzed with bulk results presented in Table 6.
-
TABLE 6 Time Speed BET FE Ni Cr Zr (min) (RPM) (m2/g) (ppm) (ppm) (ppm) (ppm) N/A N/A 2.09 <1 <3 <1 <2 1500 70 7.06 1 <3 <1 <2 - To determine the electrical properties powder from Inventive Examples 1 and 2 were binderized with a commercial organic binder and anodes were pressed using a commercial style press to form anodes which were approximately 0.24 cm x 0.22 cm×0.05 cm at a density of 6.0 g/cm3. A 0.03 cm Ta wire was inserted during the pressing operation for electrical connection. The anodes were delubed at approx. 400° C. and then vacuum sintered at temperatures ranging from 1050 to 1150° C. Lead wire pull strength was measured after sintering by fixturing the anode and pulling the wire out of the anode with a Chatillon LTCM-6. Anodes were then formed in a solution of phosphoric acid and water (350 ohm-cm) at 83° C. and 18V. Anodes were then tested for capacitance, with zero bias at 50Hz and for leakage current at 70% of the formation voltage. The pull strength results are in provided in
FIG. 1 , the CV/g results are provided inFIG. 2 and the leakage is provided inFIG. 3 . - The invention has been described with particular reference to preferred embodiments without limit thereto. One of skill in the art would realize additional embodiments and improvements which are not specifically enumerated but which are within the scope of the invention as specifically set forth in the claims appended hereto.
Claims (49)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/338,577 US20170069429A1 (en) | 2013-03-13 | 2016-10-31 | Low Energy Milling to Produce Flake Powders |
US16/515,238 US20190378660A1 (en) | 2013-03-13 | 2019-07-18 | Low Energy Milling to Produce Flake Powders |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361779242P | 2013-03-13 | 2013-03-13 | |
US14/205,698 US9514890B2 (en) | 2013-03-13 | 2014-03-12 | Low energy milling to produce flake powders |
US15/338,577 US20170069429A1 (en) | 2013-03-13 | 2016-10-31 | Low Energy Milling to Produce Flake Powders |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/205,698 Division US9514890B2 (en) | 2013-03-13 | 2014-03-12 | Low energy milling to produce flake powders |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/515,238 Division US20190378660A1 (en) | 2013-03-13 | 2019-07-18 | Low Energy Milling to Produce Flake Powders |
Publications (1)
Publication Number | Publication Date |
---|---|
US20170069429A1 true US20170069429A1 (en) | 2017-03-09 |
Family
ID=51526116
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/205,698 Active 2034-10-24 US9514890B2 (en) | 2013-03-13 | 2014-03-12 | Low energy milling to produce flake powders |
US15/338,577 Abandoned US20170069429A1 (en) | 2013-03-13 | 2016-10-31 | Low Energy Milling to Produce Flake Powders |
US16/515,238 Abandoned US20190378660A1 (en) | 2013-03-13 | 2019-07-18 | Low Energy Milling to Produce Flake Powders |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/205,698 Active 2034-10-24 US9514890B2 (en) | 2013-03-13 | 2014-03-12 | Low energy milling to produce flake powders |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/515,238 Abandoned US20190378660A1 (en) | 2013-03-13 | 2019-07-18 | Low Energy Milling to Produce Flake Powders |
Country Status (5)
Country | Link |
---|---|
US (3) | US9514890B2 (en) |
JP (3) | JP6223542B2 (en) |
CN (1) | CN105026078B (en) |
DE (1) | DE112014001332T5 (en) |
WO (1) | WO2014165038A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6716386B2 (en) * | 2016-08-03 | 2020-07-01 | 太平洋セメント株式会社 | Method for producing metallic tantalum particles |
JP6908503B2 (en) * | 2017-11-17 | 2021-07-28 | 株式会社トーキン | Electrolytic capacitor |
US20190287730A1 (en) * | 2018-03-15 | 2019-09-19 | Kemet Electronics Corporation | Method to Reduce Anode Lead Wire Embrittlement in Capacitors |
CN109913726B (en) * | 2019-05-06 | 2021-01-22 | 北方民族大学 | Ta-W-based alloy and preparation method thereof |
CN110610810B (en) * | 2019-09-29 | 2022-02-08 | 宇启材料科技南通有限公司 | Dry manufacturing method of valve metal coating electrode foil and electrolytic capacitor |
WO2023074413A1 (en) * | 2021-10-28 | 2023-05-04 | パナソニックIpマネジメント株式会社 | Anode body and manufacturing method thereof, and electrolytic capacitor and manufacturing method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4486225A (en) * | 1982-06-07 | 1984-12-04 | Mpd Technology Corporation | Production of highly reflective metal flake |
US5593773A (en) * | 1992-07-23 | 1997-01-14 | Silberline Limited | Metal powder pigment |
US20040252445A1 (en) * | 2003-06-10 | 2004-12-16 | Duan-Fan Wang | Tantalum powders and methods of producing same |
US20060070492A1 (en) * | 2004-06-28 | 2006-04-06 | Yongjian Qiu | High capacitance tantalum flakes and methods of producing the same |
US20090214378A1 (en) * | 2004-10-08 | 2009-08-27 | H.C. Starck Gmbh & Co. Kg | Method for the production of valve metal powders |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5241465B1 (en) * | 1967-10-25 | 1977-10-18 | ||
US4441927A (en) | 1982-11-16 | 1984-04-10 | Cabot Corporation | Tantalum powder composition |
US4555268A (en) | 1984-12-18 | 1985-11-26 | Cabot Corporation | Method for improving handling properties of a flaked tantalum powder composition |
US4740238A (en) | 1987-03-26 | 1988-04-26 | Fansteel Inc. | Platelet-containing tantalum powders |
US4940490A (en) * | 1987-11-30 | 1990-07-10 | Cabot Corporation | Tantalum powder |
US5211741A (en) | 1987-11-30 | 1993-05-18 | Cabot Corporation | Flaked tantalum powder |
US5580367A (en) | 1987-11-30 | 1996-12-03 | Cabot Corporation | Flaked tantalum powder and method of using same flaked tantalum powder |
US5261942A (en) * | 1987-11-30 | 1993-11-16 | Cabot Corporation | Tantalum powder and method of making same |
JP2665928B2 (en) * | 1988-03-25 | 1997-10-22 | 昭和キャボットスーパーメタル株式会社 | Tantalum powder and method for producing the same |
US5217526A (en) * | 1991-05-31 | 1993-06-08 | Cabot Corporation | Fibrous tantalum and capacitors made therefrom |
JP2004500480A (en) * | 1999-03-19 | 2004-01-08 | キャボット コーポレイション | Production of niobium and other metal powders by grinding |
US6375704B1 (en) * | 1999-05-12 | 2002-04-23 | Cabot Corporation | High capacitance niobium powders and electrolytic capacitor anodes |
JP2003299977A (en) * | 2002-04-08 | 2003-10-21 | Cabot Supermetal Kk | Manufacturing method for tantalum powder or niobium powder |
TW200407262A (en) | 2002-09-30 | 2004-05-16 | Showa Denko Kk | Metal oxide structure containing titanium oxide and production method and use thereof |
JP2005325448A (en) * | 2004-04-15 | 2005-11-24 | Jfe Mineral Co Ltd | Tantalum powder, and solid electrolyte capacitor using it |
EP2343716A4 (en) * | 2008-10-29 | 2015-08-19 | Showa Denko Kk | Method for manufacturing capacitor element |
JP5654213B2 (en) * | 2008-11-27 | 2015-01-14 | グローバルアドバンストメタルジャパン株式会社 | Method for producing tantalum aggregated particles, tantalum pellet and capacitor |
US8520366B2 (en) * | 2009-12-22 | 2013-08-27 | Kemet Electronics Corporation | Solid electrolytic capacitor and method of manufacture |
US8824122B2 (en) * | 2010-11-01 | 2014-09-02 | Avx Corporation | Solid electrolytic capacitor for use in high voltage and high temperature applications |
US8947857B2 (en) * | 2011-04-07 | 2015-02-03 | Avx Corporation | Manganese oxide capacitor for use in extreme environments |
WO2013006600A1 (en) * | 2011-07-05 | 2013-01-10 | Orchard Material Technology, Llc | Retrieval of high value refractory metals from alloys and mixtures |
-
2014
- 2014-03-12 DE DE112014001332.3T patent/DE112014001332T5/en not_active Ceased
- 2014-03-12 CN CN201480013327.0A patent/CN105026078B/en active Active
- 2014-03-12 WO PCT/US2014/024202 patent/WO2014165038A1/en active Application Filing
- 2014-03-12 US US14/205,698 patent/US9514890B2/en active Active
- 2014-03-12 JP JP2016501436A patent/JP6223542B2/en active Active
-
2016
- 2016-10-31 US US15/338,577 patent/US20170069429A1/en not_active Abandoned
-
2017
- 2017-07-14 JP JP2017138081A patent/JP6749289B2/en active Active
-
2019
- 2019-02-01 JP JP2019016597A patent/JP2019090117A/en active Pending
- 2019-07-18 US US16/515,238 patent/US20190378660A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4486225A (en) * | 1982-06-07 | 1984-12-04 | Mpd Technology Corporation | Production of highly reflective metal flake |
US5593773A (en) * | 1992-07-23 | 1997-01-14 | Silberline Limited | Metal powder pigment |
US20040252445A1 (en) * | 2003-06-10 | 2004-12-16 | Duan-Fan Wang | Tantalum powders and methods of producing same |
US20060070492A1 (en) * | 2004-06-28 | 2006-04-06 | Yongjian Qiu | High capacitance tantalum flakes and methods of producing the same |
US20090214378A1 (en) * | 2004-10-08 | 2009-08-27 | H.C. Starck Gmbh & Co. Kg | Method for the production of valve metal powders |
Also Published As
Publication number | Publication date |
---|---|
DE112014001332T5 (en) | 2015-11-26 |
US9514890B2 (en) | 2016-12-06 |
JP6223542B2 (en) | 2017-11-01 |
JP2019090117A (en) | 2019-06-13 |
US20140268494A1 (en) | 2014-09-18 |
WO2014165038A1 (en) | 2014-10-09 |
JP2018020315A (en) | 2018-02-08 |
JP6749289B2 (en) | 2020-09-02 |
CN105026078B (en) | 2017-10-24 |
JP2016519210A (en) | 2016-06-30 |
US20190378660A1 (en) | 2019-12-12 |
CN105026078A (en) | 2015-11-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20190378660A1 (en) | Low Energy Milling to Produce Flake Powders | |
US7981191B2 (en) | Method for the production of tantalum powder using reclaimed scrap as source material | |
JP5070502B2 (en) | High capacitance niobium powder and electrolytic capacitor anode | |
CN1082550C (en) | Method of making tantalum metal powder with controlled size distribution and products made therefrom | |
JP4972249B2 (en) | Niobium Niobium Powder and Niobium Electrolytic Capacitor | |
JP2021515846A (en) | Spherical powder containing anode and capacitor | |
EP3095540B1 (en) | Method for preparing tantalum powder for high-reliability, high specific capacity electrolytic capacitor | |
JP2008504692A (en) | High capacitance tantalum flakes and production method thereof | |
JP2014222776A (en) | Tantalum powders and methods of producing the same | |
JP2012169631A5 (en) | ||
CN104911380A (en) | Preparation method of ultrafine-grain Ti-6Al-4V alloy | |
US10737322B2 (en) | Composite tantalum powder and process for preparing the same and capacitor anode prepared from the tantalum powder | |
US10074486B2 (en) | High specific capacitance capacitor-grade tantalum powder with improved electrical properties and process for making the same | |
US9789538B2 (en) | Method for producing ultrafine tungsten powder | |
CN111097916A (en) | Preparation method of superfine high-purity rhenium powder | |
WO2015123851A1 (en) | Wet ball-milling method for tantalum powder and tantalum powder prepared therefrom | |
CN103878364B (en) | A kind of preparation method of the middle pressure tantalum powder for improving proof voltage energy | |
JP4965696B2 (en) | Method for producing oxide dispersion strengthened platinum alloy | |
JP2017141492A (en) | Aggregate of sponge titanium for manufacturing titanium powder and manufacturing method therefor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
AS | Assignment |
Owner name: BANK OF AMERICA, N.A., AS COLLATERAL AGENT, NORTH Free format text: SECURITY AGREEMENT;ASSIGNORS:KEMET CORPORATION;KEMET ELECTRONICS CORPORATION;KEMET BLUE POWDER CORPORATION;REEL/FRAME:042523/0639 Effective date: 20170505 Owner name: BANK OF AMERICA, N.A., AS COLLATERAL AGENT, NORTH CAROLINA Free format text: SECURITY AGREEMENT;ASSIGNORS:KEMET CORPORATION;KEMET ELECTRONICS CORPORATION;KEMET BLUE POWDER CORPORATION;REEL/FRAME:042523/0639 Effective date: 20170505 |
|
AS | Assignment |
Owner name: KEMET ELECTRONICS CORPORATION, FLORIDA Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:BANK OF AMERICA, N.A.;REEL/FRAME:047450/0926 Effective date: 20181107 Owner name: KEMET CORPORATION,, FLORIDA Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:BANK OF AMERICA, N.A.;REEL/FRAME:047450/0926 Effective date: 20181107 Owner name: KEMET BLUE POWDER CORPORATION, NEVADA Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:BANK OF AMERICA, N.A.;REEL/FRAME:047450/0926 Effective date: 20181107 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: FINAL REJECTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: ADVISORY ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: ADVISORY ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |