US20150109696A1 - Solar reflector plate - Google Patents
Solar reflector plate Download PDFInfo
- Publication number
- US20150109696A1 US20150109696A1 US14/391,420 US201314391420A US2015109696A1 US 20150109696 A1 US20150109696 A1 US 20150109696A1 US 201314391420 A US201314391420 A US 201314391420A US 2015109696 A1 US2015109696 A1 US 2015109696A1
- Authority
- US
- United States
- Prior art keywords
- reflector plate
- reflective layer
- sheet
- steel
- solar reflector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 94
- 239000011241 protective layer Substances 0.000 claims abstract description 70
- 239000000758 substrate Substances 0.000 claims abstract description 52
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 50
- 239000000126 substance Substances 0.000 claims abstract description 31
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 16
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 16
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 16
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 16
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- 229920005989 resin Polymers 0.000 claims description 27
- 239000011347 resin Substances 0.000 claims description 27
- 239000011229 interlayer Substances 0.000 claims description 23
- 239000007822 coupling agent Substances 0.000 claims description 18
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 14
- 229910010272 inorganic material Inorganic materials 0.000 claims description 12
- 239000011147 inorganic material Substances 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 239000011368 organic material Substances 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 229910052726 zirconium Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 7
- 239000004576 sand Substances 0.000 abstract description 19
- 229910000831 Steel Inorganic materials 0.000 description 91
- 239000010959 steel Substances 0.000 description 91
- 150000001875 compounds Chemical class 0.000 description 77
- 239000010408 film Substances 0.000 description 49
- 239000003795 chemical substances by application Substances 0.000 description 44
- 239000002585 base Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- -1 polyethylene Polymers 0.000 description 11
- 230000003746 surface roughness Effects 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 239000010960 cold rolled steel Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910001335 Galvanized steel Inorganic materials 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000008397 galvanized steel Substances 0.000 description 3
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 229920005648 ethylene methacrylic acid copolymer Polymers 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 229920000554 ionomer Polymers 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052914 metal silicate Inorganic materials 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 229920006284 nylon film Polymers 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920006289 polycarbonate film Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 229920006268 silicone film Polymers 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000000371 solid-state nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 238000009823 thermal lamination Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 1
- HVGAPIUWXUVICC-UHFFFAOYSA-N 6-methylheptan-1-olate;titanium(4+) Chemical compound [Ti+4].CC(C)CCCCC[O-].CC(C)CCCCC[O-].CC(C)CCCCC[O-].CC(C)CCCCC[O-] HVGAPIUWXUVICC-UHFFFAOYSA-N 0.000 description 1
- 238000003855 Adhesive Lamination Methods 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 150000007945 N-acyl ureas Chemical group 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- LZBCVRCTAYKYHR-UHFFFAOYSA-N acetic acid;chloroethene Chemical compound ClC=C.CC(O)=O LZBCVRCTAYKYHR-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- QMYDVDBERNLWKB-UHFFFAOYSA-N propane-1,2-diol;hydrate Chemical compound O.CC(O)CO QMYDVDBERNLWKB-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/09—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/18—Layered products comprising a layer of metal comprising iron or steel
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/06—Coating on the layer surface on metal layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
- B32B2255/205—Metallic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/28—Multiple coating on one surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/416—Reflective
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/712—Weather resistant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/12—Photovoltaic modules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
Definitions
- This disclosure relates to a solar reflector plate suitably used for solar power generation.
- optical reflector those obtained by depositing a thin film of a metal such as aluminum or silver on the front or back surface of a glass substrate having excellent smoothness have been used.
- JP 62-57904 B proposes a reflective heat collector plate obtained by providing a reflective metal (aluminum, silver, or the like) deposition film onto the surface of a metal plate (aluminum, stainless steel, or the like), and coating the outer surface of the metal deposition film with a protective film of a transparent inorganic substance (SiO, SiO 2 , or the like).
- JP 57-4003 A proposes a reflector including a substrate formed of an appropriate material such as a metal or an alloy like aluminum, a steel plate, or stainless steel, or plastic, a metal reflective film deposited onto the substrate and formed of aluminum, silver, or the like, and a transparent inorganic protective film deposited onto the surface of the metal reflective film and formed of, for example, a vitreous film such as SiO or SiO 2 .
- JP 57-125901 A proposes a reflector obtained by providing a laminate-like protective layer formed of elements including a coat formed of de-alkalized metal silicate and a resin coat directly stacked and deposited onto the above coat, onto a metal substrate having a reflective surface.
- the reflector plates disclosed in JP '904 and JP '003 are excellent in weather resistance since they have a coat containing an inorganic material as a main component.
- the reflector plates are used as a solar reflector plate frequently positioned in a region where dust flies such as a desert region, the resistance thereof against the flying sand is insufficient.
- FIG. 1A to 1C are schematic cross-sectional views showing an example of our solar reflector plate.
- Our solar reflector plate includes a substrate, a reflective layer provided onto the substrate, and a protective layer provided onto the reflective layer, wherein the protective layer contains silicon and an organic substance, contains silicon in an amount of 10% by mass to 60% by mass in terms of SiO 2 , and has 1.5 to 3.2 oxygen atoms on average that form a chemical bond with silicon.
- a solar reflector plate 10 includes a substrate 1 , a reflective layer 2 provided onto the substrate 1 , and a protective layer 3 provided onto the reflective layer 2 .
- the solar reflector plate 10 may include an interlayer 4 between the reflective layer 2 and the protective layer 3 .
- a base layer 5 may be provided between the substrate 1 and the reflective layer 2 .
- the shape of the solar reflector plate 10 shown in FIG. 1 has a planar shape
- the shape of the solar reflector plate is not limited to the planar shape, and may have a curved shape such as a trough shape (gutter shape), and a parabolic shape.
- the substrate that the solar reflector plate includes is not particularly limited and, for example, a substrate such as a steel sheet, a plastic sheet, a ceramic sheet, or a glass sheet can be used.
- the steel sheet that can be suitably used is not particularly limited as long as it is a general steel sheet.
- a stainless steel sheet is preferable since it is excellent in corrosion resistance of the back surface or sheared surface, and a cold-rolled steel sheet or a steel sheet plated with zinc or the like is preferable in view of economics and for the reason that corrosion resistance can be improved by coating or the like.
- the surface of the substrate be smooth in view of reducing the surface roughness of the reflective layer and protective layer described later.
- the substrate surface may be smoothened by rolling, skin pass, polishing such as sandpaper polishing, electrolytic polishing and electrolytic compound polishing, a method of coating the substrate surface with an organic substance and/or an inorganic substance, a method of laminating a smooth film by using an adhesive, a method of pasting a smooth film by thermal lamination, and the like.
- polishing such as sandpaper polishing, electrolytic polishing and electrolytic compound polishing
- a sheet thickness of the substrate is preferably 10 mm or less in view of facilitating a curved shaping, and more preferably 6 mm or less, particularly in view of the workability of the curved shaping.
- the reflective layer that the solar reflector plate has is not particularly limited as long as it is a reflective layer containing a metal.
- the metal examples include aluminum (Al), silver (Ag), and the like having a high reflectance, and in view of economics, Al is preferable.
- the content of the metal in the reflective layer is preferably 50% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, in view of improving the reflectance.
- the method of depositing the reflective layer onto the substrate is not particularly limited and, for example, methods such as deposition, sputtering, electroplating, hot-dip coating, and non-electrolytic plating can be applied.
- the film thickness of the reflective layer is preferably 0.001 ⁇ m to 0.5 ⁇ m, and more preferably 0.01 ⁇ m to 0.2 ⁇ m, in view of reflectance improvement and uniformity.
- the film thickness of the reflective layer is preferably about 5 ⁇ m to 200 ⁇ m, and in view of reflectance improvement, it is preferable to reduce the surface roughness of plating by rolling, skin pass, polishing, and the like.
- the reflective layer it is possible to use a film or a glass sheet onto which a metal such as Al or Ag has been deposited or sputtered. In such a case, the reflective layer can be pasted to the substrate by an adhesive or thermal lamination.
- the film include films containing a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic resin film, a polyvinyl alcohol film, a polycarbonate film, a polystyrene film, a polyacrylonitrile film, an ethylene-vinyl acetate copolymer film, an ethylene-vinyl alcohol copolymer film, an ethylene-methacrylic acid copolymer film, a nylon film, an ionomer film, and a silicone film.
- a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic resin film, a polyvinyl alcohol
- the surface roughness of the film is desirably low in view of the reflectance improvement.
- the surface roughness is preferably 0.2 ⁇ m or less and more preferably 0.02 ⁇ m or less, in terms of an arithmetic mean roughness (Ra).
- the thickness of the film is preferably 1 ⁇ m or more, and more preferably 5 ⁇ m or more, in view of inhibiting the influence of the surface roughness of the substrate and improving the reflectance.
- the thickness of the film is preferably 5000 ⁇ m or less, and more preferably 500 ⁇ m or less, in view of economics.
- the glass sheet is not particularly limited, but the surface roughness thereof is preferably 0.2 ⁇ m or less, and more preferably 0.02 ⁇ m or less, in terms of Ra.
- the thickness of the glass sheet is not also particularly limited, the thickness is preferably 50 ⁇ m to 1000 ⁇ m, and more preferably 100 ⁇ m to 500 ⁇ m, in view of facilitating a curved shaping.
- the protective layer that the solar reflector plate has is a specific protective layer containing silicon (Si) and an organic substance.
- the protective layer is not easily scratched since it is formed of a hard material.
- the protective layer is rather vulnerable to micro scratches caused by flying sand, and the transparency easily deteriorates.
- the protective layer is easily scratched since the material is soft, and the sand resistance is inferior.
- a protective layer which contains Si and an organic substance, and in which the content of Si (hereinafter, also called the “Si content”) is a specific value, and the number of oxygen (O) atoms binding to Si (hereinafter, also called the “Si-bound oxygen atom number”) is a specific value can maintain an excellent reflectance of the reflective layer and greatly improve sand resistance and weather resistance.
- a content of Si in the protective layer is 10% by mass to 60% by mass, preferably 15% by mass to 50% by mass, and more preferably 20% by mass to 40% by mass in terms of SiO 2 .
- Si content is within the above range, sand resistance and weather resistance become excellent. We believe that this is because the hardness resulting from Si is excellently balanced with the flexibility resulting from the organic substance.
- the Si content in the protective layer can be quantitated by fluorescence X-ray analysis or ICP-AES analysis.
- ICP-AES analysis a method of performing analysis by peeling or scraping off the protective layer can be used, and a portion accounting for about 50% or more of the thickness from the surface layer may be analyzed and used as a representative.
- the protective layer is a thin film, sometimes the reflective layer or substrate may be mixed into the sample for analysis. However, if these (the mixed reflective layer or substrate) are quantitated by analysis and subtracted, the Si content of the protective layer can be quantitated.
- Si and the organic substance may be dispersed (mixed) while forming a sea-island structure, and any of Si and the organic substance may form the portion corresponding to the island.
- the portions corresponding to the islands be fine, since the sand resistance becomes better in this structure.
- the diameter of the portions is preferably 100 nm or less, and more preferably 50 nm or less.
- Si and the organic substance are preferably a complex or a hybrid forming a chemical bond at the molecular level, since the transparency increases.
- the Si-bound oxygen atom number in the protective layer is 1.5 to 3.2, and preferably 1.7 to 2.7 on average.
- Si-bound oxygen atom number is within the above range, sand resistance and weather resistance become excellent. It is considered that this is because crosslinking proceeds suitably, and an appropriate molecular structure is formed.
- the average number of oxygen atoms forming a chemical bond with one Si atom refers to a value confirmed by solid-state NMR (Dipolar Decoupling method), and can be measured using, for example, JNM-ECA series manufactured by JEOL Ltd.
- a protective layer for example, it is possible to use a silicone-based compound (silicone-based resin) in which a siloxane bond has been generated by crosslinking (curing) of a silane compound containing an alkoxysilyl group or a silanol group.
- silane compound examples include monofunctional R 3 Si(OR) 1 , bifunctional R 2 Si(OR) 2 , trifunctional RiSi(OR) 3 , and tetrafunctional Si(OR) 4 (in each formula, R represents a hydrogen atom or an organic group). If the respective silane compounds differing in the number of functional group are used in an appropriate combination, the Si-bound oxygen atom number described above can be adjusted.
- the raw material (silane compound) of the silicone-based resin as the protective layer include tetraalkoxysilanes such as tetramethoxysilane and tetraethoxysi-lane; trialkoxysilanes such as methyltrimethoxysilane, phenyltrimethoxysilane, methyltriethoxy-silane, phenyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, hexyltrimethox-ysilane, hexyltriethoxysilane, decyltrimethoxysilane, trifluoropropyltrimethoxysilane, vinyltri-methoxysilane, vinyltriethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxy, vinyl
- the organic substance in the protective layer is not particularly limited and may be derived from, for example, the functional group (for example, an alkyl group, a phenyl group, an epoxy group, a vinyl group, a methacryloyl group, or an acryloyl group) that the above-described silane compound has.
- the organic substance may be an epoxy resin, an acrylic resin, a polyester resin, an olefin-based resin, and the like that are mixed or made into a complex with the silane compound not having been crosslinked or with the silicone-based resin having been crosslinked.
- the organic substance may be optionally cured by heating or ultraviolet rays.
- organic substance in the protective layer examples include an organic filler, a resin stabilizer, and the like, in view of improving handling ability such as slipperiness and improving coating hardness.
- organic filler examples include polystyrene, polyacrylate, and the like. One kind of these may be used alone, or two or more kinds thereof may be used concurrently.
- the resin stabilizer examples include a hindered amine-based light stabilizer; a benzotriazole-based ultraviolet absorber; an antioxidant based on phenol, phosphorus, or sulfur; and the like.
- a hindered amine-based light stabilizer a benzotriazole-based ultraviolet absorber
- an antioxidant based on phenol, phosphorus, or sulfur an antioxidant based on phenol, phosphorus, or sulfur; and the like.
- One kind of these may be used alone, or two or more kinds thereof used concurrently.
- the protective layer may contain other components in addition to Si and the organic substance.
- the protective layer may contain an inorganic filler.
- the inorganic filler examples include titanium oxide, calcium carbonate, zirconium oxide, alumina, magnesium oxide, zinc oxide, barium sulfate, calcium phosphate, and the like. One kind of these may be used alone, or two or more kinds thereof may be used concurrently.
- the content of the components is not particularly limited as long as it is within a range that does not diminish the effect of our plates. However, the content is preferably about 15% or less in the protective layer.
- An elastic modulus of the protective layer is preferably 0.10 GPa to 15 GPa, and more preferably 0.5 GPa to 10 GPa, since sand resistance becomes better.
- the elastic modulus can be measured using, for example, a Picodenter HM500 manufactured by Fischer Instruments K.K.
- a surface profile of the protective layer is preferably smooth, in view of light condensation rate.
- a surface roughness of the protective layer is preferably 0.10 ⁇ m or less in terms of an arithmetic mean roughness (Ra), since reflecting components diffused are reduced, and a regular reflectance can be maintained at a higher value.
- Ra can be measured based on JIS B0601 (2001).
- the surface roughness of the protective layer can be adjusted to some extent by controlling surface profiles of the substrate or the reflective layer. Accordingly, to reduce the surface roughness of the protective layer, it is effective to reduce beforehand the surface roughness of the substrate or the reflective layer.
- the surface roughness of the protective layer can also be adjusted by a method such as reducing a viscosity of a coating liquid for forming the protective layer, or increasing time allowed to elapse before curing is performed.
- a method is also effective in which coating is performed by diluting the components with a solvent such as acetone, toluene, ethyl ether, methyl cellosolve, cellosolve, butyl cellosolve (ethylene glycol monobutyl ether), ethanol, isopropyl alcohol, propylene glycol 1-monomethyl ether 2-acetate, or water.
- a solid content concentration at that time is preferably about 0.5% by mass to 50% by mass.
- the thickness of the protective layer is not particularly limited. However, in view of balance between the reflectance and protection, the thickness is preferably 0.01 ⁇ m to 20 ⁇ m, more preferably 0.01 ⁇ m to 10 ⁇ m, and particularly preferably 0.1 ⁇ m to 5 ⁇ m.
- the solar reflector plate include an interlayer between the reflective layer and the protective layer since the adhesiveness of the protective layer is improved, and the weather resistance becomes better in this manner.
- the interlayer contains at least one kind selected from a group consisting of a silane coupling agent, a titanium coupling agent, a zirconium coupling agent, and an organic resin.
- a film thickness of the interlayer is preferably about a thickness at a monolayer level (several angstroms) to 0.5 ⁇ m.
- the thickness is preferably about 0.1 ⁇ m to 5 ⁇ m.
- silane coupling agent examples include alkoxysilanes having a functional group such as a vinyl group, an epoxy group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, a ureide group, a mercapto group, a sulfide group, or an isocyanate group.
- a functional group such as a vinyl group, an epoxy group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, a ureide group, a mercapto group, a sulfide group, or an isocyanate group.
- titanium coupling agent examples include titanium tetraisopropoxide, titanium tetra-n-butoxide, titanium butoxide dimer, titanium tetra-2-ethylhexoxide, and the like.
- zirconium coupling agent examples include zirconium acetate, zirconium ammonium carbonate, zirconium fluoride, and the like.
- a silane coupling agent is preferable since it has excellent compatibility with the protective layer and makes it possible to improve the weather resistance and maintain the excellent reflectance of the reflective layer at a higher degree.
- the interlayer When a silane coupling agent is used as the interlayer, the interlayer may be regarded as a portion of the protective layer, and an amount of the silane coupling agent that is expressed in terms of SiO 2 can be added to the Si content of the protective layer.
- an organic resin for example, a vinyl chloride resin, a vinyl chloride acetate resin, an acrylic resin, a modified olefin resin, a polyester resin, a polycarbonate resin, and the like having excellent transparency and light resistance can be used.
- At least one base layer constituted with an organic material and/or an inorganic material be provided between the substrate and the reflective layer, since the smoothness of the reflective layer is improved, and the reflectance is heightened in this manner.
- the base layer constituted with an organic material include films containing a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic resin film, a polyvinyl alcohol film, a polycarbonate film, a polystyrene film, a polyacrylonitrile film, an ethylene-vinyl acetate copolymer film, an ethylene-vinyl alcohol copolymer film, an ethylene-methacrylic acid copolymer film, a nylon film, an ionomer film, a silicone film, and the like.
- a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic
- the base layer constituted with an inorganic material examples include a glass sheet, a glass coat, metal plating such as nickel or zinc, and the like.
- the base layer, reflective layer, interlayer, and protective layer shown in Tables 1 to 3 were formed by the following method, thereby preparing solar reflector plates.
- a cell marked with “-” indicates that the corresponding item is not provided (not treated).
- the substrate shown in Tables 1 to 3 specifically the following substrates were used.
- the substrate surface on which the reflective layer would be formed was subjected to skin pass finishing.
- the base layer was pasted to the substrate by using an adhesive.
- a film having an arithmetic mean roughness (Ra) of 0.1 ⁇ m and a thickness described in Tables 1 to 3 (50 ⁇ m if the thickness is not described in Tables 1 to 3) was used.
- Example 50 As a glass sheet for the base layer used in Example 50, AN100 (sheet thickness 0.5 mm) manufactured by ASAHI GLASS CO., LTD. was used.
- a glass coat for the base layer used in Example 54 a glass coat was used which was obtained by firing powdered glass for a low-temperature seal (BAS115, manufactured by ASAHI GLASS CO., LTD.) for 30 minutes at 500° C. to yield a thickness of 100 ⁇ m.
- BAS115 manufactured by ASAHI GLASS CO., LTD.
- the reflective layer was formed by depositing Al or Ag shown in Tables 1 to 3 onto the base layer. Further, regarding Example 60, the reflective layer was formed in a manner in which melted Al was plated onto the base layer such that the thickness thereof became 100 ⁇ m, and then mirror polishing was performed until the thickness thereof became 80 ⁇ m.
- the thickness of the reflective layers not described in Tables 1 to 3 was 0.1 ⁇ m.
- the interlayer was formed in a manner in which a 0.5% by mass aqueous solution in which the silane coupling agent or the like shown in Tables 1 to 3 was dissolved was coated onto the reflective layer at 10 g/m 2 , followed by drying for 5 minutes at 110° C.
- the thickness of the respective interlayers was as described in Tables 1 to 3.
- 3-glycidoxypropyltrimethoxysilane was used as a silane coupling agent
- titanium tetraisopropoxide was used as a titanium coupling agent
- zirconium ammonium carbonate was used as a zirconium coupling agent.
- silane coupling agent marked with “#” 3-aminopropyltrimethoxysilane was used.
- the protective layer was formed in a manner in which a coating liquid (solid content concentration 10% by mass), which was obtained by mixing the compounding agent shown in Table 4 and the curing agent shown in Table 5 with a solvent (ethylene glycol monobutyl ether) such that a mass ratio between them became the value shown in Tables 1 to 3, was coated onto the reflective layer (interlayer when the interlayer was provided) by using a bar coater, followed by heating and drying under the curing conditions shown in Tables 1 to 3.
- a coating liquid solid content concentration 10% by mass
- a solvent ethylene glycol monobutyl ether
- the Si content (expressed in terms of SiO 2 ) was quantitated by alkali fusion/ICP-AES analysis by peeling the protective layer or scraping off the protective layer from the surface layer.
- the Si-bound oxygen atom number was calculated from chemical shift of solid-state NMR (JNM-ECA series, manufactured by JEOL Ltd.). The results of these are shown in Tables 1 to 3 together with the measurement results of the elastic modulus, thickness, and arithmetic mean roughness (Ra).
- a regular reflectance at a wavelength of 300 nm to 2500 nm was measured and evaluated as a solar radiation reflectance multiplied by a weighting coefficient based on JIS K5602 (2008).
- a reflectance of 70% or higher was regarded as pass.
- the solar reflector plates prepared in Examples 14 to 21, 24 to 31, 33 to 47, 49 to 50, and 61 to 71 in which a stainless steel sheet, a cold-rolled steel sheet, a hot-dip galvanized steel sheet, or an electrogalvanized steel sheet is used as a substrate, and the interlayer is provided between the reflective layer and protective layer, the sand resistance and weather resistance (particularly, weather resistance) tend to further improve.
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Abstract
Description
- This disclosure relates to a solar reflector plate suitably used for solar power generation.
- In the related art, as an optical reflector, those obtained by depositing a thin film of a metal such as aluminum or silver on the front or back surface of a glass substrate having excellent smoothness have been used.
- When a thin metal film is deposited onto the surface of a glass substrate, a relatively high reflectance can be obtained. However, when this is used as a reflector plate for solar power generation (solar reflector plate), the plate is inevitably used outdoors. Accordingly, many problems regarding sand resistance, weather resistance, impact resistance, lightening of weight, and the like should be solved.
- Regarding those problems, for example, JP 62-57904 B proposes a reflective heat collector plate obtained by providing a reflective metal (aluminum, silver, or the like) deposition film onto the surface of a metal plate (aluminum, stainless steel, or the like), and coating the outer surface of the metal deposition film with a protective film of a transparent inorganic substance (SiO, SiO2, or the like).
- Moreover, JP 57-4003 A proposes a reflector including a substrate formed of an appropriate material such as a metal or an alloy like aluminum, a steel plate, or stainless steel, or plastic, a metal reflective film deposited onto the substrate and formed of aluminum, silver, or the like, and a transparent inorganic protective film deposited onto the surface of the metal reflective film and formed of, for example, a vitreous film such as SiO or SiO2.
- In addition, JP 57-125901 A proposes a reflector obtained by providing a laminate-like protective layer formed of elements including a coat formed of de-alkalized metal silicate and a resin coat directly stacked and deposited onto the above coat, onto a metal substrate having a reflective surface.
- We found that the reflector plates disclosed in JP '904 and JP '003 are excellent in weather resistance since they have a coat containing an inorganic material as a main component. However, if the reflector plates are used as a solar reflector plate frequently positioned in a region where dust flies such as a desert region, the resistance thereof against the flying sand is insufficient.
- We also found that since the reflector plate disclosed in JP '901 includes a resin coat as an uppermost surface layer, the sand resistance thereof is very poor.
- Accordingly, it could be helpful to provide a solar reflector plate which maintains an excellent reflectance of a reflective layer and has excellent sand resistance and weather resistance.
- We found that if a specific protective layer containing silicon and an organic substance is provided to a solar reflector plate, an excellent reflectance of a reflective layer is maintained, and sand resistance and weather resistance become excellent.
- We thus provide the following (1) to (5):
-
- (1) A solar reflector plate comprising:
- a substrate;
- a reflective layer provided onto the substrate; and
- a protective layer provided onto the reflective layer,
- wherein the protective layer contains silicon and an organic substance, contains silicon in an amount of 10% by mass to 60% by mass in terms of SiO2, and has 1.5 to 3.2 oxygen atoms on average that form a chemical bond with silicon.
- (2) The solar reflector plate according to (1), wherein an elastic modulus of the protective layer is 0.1 GPa to 15 GPa.
- (3) The solar reflector plate according to (1) or (2), wherein the reflective layer contains aluminum and/or silver.
- (4) The solar reflector plate according to any one of (1) to (3), further comprising an interlayer containing at least one kind selected from a group consisting of a silane coupling agent, a titanium coupling agent, a zirconium coupling agent, and an organic resin, between the reflective layer and the protective layer.
- (5) The solar reflector plate according to any one of (1) to (4), further comprising at least one base layer constituted with an organic material and/or an inorganic material, between the substrate and the reflective layer.
- (1) A solar reflector plate comprising:
- It is possible to provide a solar reflector plate which maintains an excellent reflectance of a reflective layer and has excellent sand resistance and weather resistance.
-
FIG. 1A to 1C are schematic cross-sectional views showing an example of our solar reflector plate. -
- 1: SUBSTRATE
- 2: REFLECTIVE LAYER
- 3: PROTECTIVE LAYER
- 4: INTERLAYER
- 5: BASE LAYER
- 10: SOLAR REFLECTOR PLATE
- Our solar reflector plate includes a substrate, a reflective layer provided onto the substrate, and a protective layer provided onto the reflective layer, wherein the protective layer contains silicon and an organic substance, contains silicon in an amount of 10% by mass to 60% by mass in terms of SiO2, and has 1.5 to 3.2 oxygen atoms on average that form a chemical bond with silicon.
- Next, the overall constitution of the solar reflector plate will be described using drawings.
- As shown in
FIGS. 1A to 1C , asolar reflector plate 10 includes asubstrate 1, areflective layer 2 provided onto thesubstrate 1, and aprotective layer 3 provided onto thereflective layer 2. - Moreover, as shown in
FIG. 1B , thesolar reflector plate 10 may include an interlayer 4 between thereflective layer 2 and theprotective layer 3. - In addition, as shown in
FIG. 1C , abase layer 5 may be provided between thesubstrate 1 and thereflective layer 2. - Though the
solar reflector plate 10 shown inFIG. 1 has a planar shape, the shape of the solar reflector plate is not limited to the planar shape, and may have a curved shape such as a trough shape (gutter shape), and a parabolic shape. - Next, regarding the respective constitutions of the solar reflector plate, the materials, formation methods, and the like will be described.
- The substrate that the solar reflector plate includes is not particularly limited and, for example, a substrate such as a steel sheet, a plastic sheet, a ceramic sheet, or a glass sheet can be used.
- Among these, the steel sheet that can be suitably used is not particularly limited as long as it is a general steel sheet. However, a stainless steel sheet is preferable since it is excellent in corrosion resistance of the back surface or sheared surface, and a cold-rolled steel sheet or a steel sheet plated with zinc or the like is preferable in view of economics and for the reason that corrosion resistance can be improved by coating or the like.
- It is preferable that the surface of the substrate be smooth in view of reducing the surface roughness of the reflective layer and protective layer described later.
- The substrate surface may be smoothened by rolling, skin pass, polishing such as sandpaper polishing, electrolytic polishing and electrolytic compound polishing, a method of coating the substrate surface with an organic substance and/or an inorganic substance, a method of laminating a smooth film by using an adhesive, a method of pasting a smooth film by thermal lamination, and the like.
- In addition, a sheet thickness of the substrate is preferably 10 mm or less in view of facilitating a curved shaping, and more preferably 6 mm or less, particularly in view of the workability of the curved shaping.
- The reflective layer that the solar reflector plate has is not particularly limited as long as it is a reflective layer containing a metal.
- Specific examples of the metal include aluminum (Al), silver (Ag), and the like having a high reflectance, and in view of economics, Al is preferable.
- The content of the metal in the reflective layer is preferably 50% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, in view of improving the reflectance.
- The method of depositing the reflective layer onto the substrate (a base layer if the solar reflector plate has the base layer described later) is not particularly limited and, for example, methods such as deposition, sputtering, electroplating, hot-dip coating, and non-electrolytic plating can be applied.
- When deposition or sputtering is applied, the film thickness of the reflective layer is preferably 0.001 μm to 0.5 μm, and more preferably 0.01 μm to 0.2 μm, in view of reflectance improvement and uniformity.
- Furthermore, when electroplating or hot-dip coating is applied, the film thickness of the reflective layer is preferably about 5 μm to 200 μm, and in view of reflectance improvement, it is preferable to reduce the surface roughness of plating by rolling, skin pass, polishing, and the like.
- In addition, as the reflective layer, it is possible to use a film or a glass sheet onto which a metal such as Al or Ag has been deposited or sputtered. In such a case, the reflective layer can be pasted to the substrate by an adhesive or thermal lamination.
- Specific examples of the film include films containing a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic resin film, a polyvinyl alcohol film, a polycarbonate film, a polystyrene film, a polyacrylonitrile film, an ethylene-vinyl acetate copolymer film, an ethylene-vinyl alcohol copolymer film, an ethylene-methacrylic acid copolymer film, a nylon film, an ionomer film, and a silicone film.
- Though not particularly limited, the surface roughness of the film is desirably low in view of the reflectance improvement. Specifically, the surface roughness is preferably 0.2 μm or less and more preferably 0.02 μm or less, in terms of an arithmetic mean roughness (Ra).
- Moreover, though not particularly limited, the thickness of the film is preferably 1 μm or more, and more preferably 5 μm or more, in view of inhibiting the influence of the surface roughness of the substrate and improving the reflectance. Similarly, the thickness of the film is preferably 5000 μm or less, and more preferably 500 μm or less, in view of economics.
- Meanwhile, the glass sheet is not particularly limited, but the surface roughness thereof is preferably 0.2 μm or less, and more preferably 0.02 μm or less, in terms of Ra.
- Though the thickness of the glass sheet is not also particularly limited, the thickness is preferably 50 μm to 1000 μm, and more preferably 100 μm to 500 μm, in view of facilitating a curved shaping.
- The protective layer that the solar reflector plate has is a specific protective layer containing silicon (Si) and an organic substance.
- It was believed that if a vitreous coat containing an inorganic substance as a main component is used as the protective layer, the protective layer is not easily scratched since it is formed of a hard material. However, we found that since the material is brittle, the protective layer is rather vulnerable to micro scratches caused by flying sand, and the transparency easily deteriorates.
- Moreover, if silicone rubber or a silicone resin is used as the protective layer, the protective layer is easily scratched since the material is soft, and the sand resistance is inferior.
- We found, however, that a protective layer which contains Si and an organic substance, and in which the content of Si (hereinafter, also called the “Si content”) is a specific value, and the number of oxygen (O) atoms binding to Si (hereinafter, also called the “Si-bound oxygen atom number”) is a specific value can maintain an excellent reflectance of the reflective layer and greatly improve sand resistance and weather resistance.
- A content of Si in the protective layer is 10% by mass to 60% by mass, preferably 15% by mass to 50% by mass, and more preferably 20% by mass to 40% by mass in terms of SiO2.
- If the Si content is within the above range, sand resistance and weather resistance become excellent. We believe that this is because the hardness resulting from Si is excellently balanced with the flexibility resulting from the organic substance.
- The Si content in the protective layer can be quantitated by fluorescence X-ray analysis or ICP-AES analysis. In ICP-AES analysis, a method of performing analysis by peeling or scraping off the protective layer can be used, and a portion accounting for about 50% or more of the thickness from the surface layer may be analyzed and used as a representative. In addition, when the protective layer is a thin film, sometimes the reflective layer or substrate may be mixed into the sample for analysis. However, if these (the mixed reflective layer or substrate) are quantitated by analysis and subtracted, the Si content of the protective layer can be quantitated.
- There is a possibility that Si and the organic substance may be dispersed (mixed) while forming a sea-island structure, and any of Si and the organic substance may form the portion corresponding to the island.
- Moreover, in the dispersed state of Si and the organic substance, it is preferable that the portions corresponding to the islands be fine, since the sand resistance becomes better in this structure. Specifically, the diameter of the portions is preferably 100 nm or less, and more preferably 50 nm or less.
- Furthermore, Si and the organic substance are preferably a complex or a hybrid forming a chemical bond at the molecular level, since the transparency increases.
- The Si-bound oxygen atom number in the protective layer is 1.5 to 3.2, and preferably 1.7 to 2.7 on average.
- If the Si-bound oxygen atom number is within the above range, sand resistance and weather resistance become excellent. It is considered that this is because crosslinking proceeds suitably, and an appropriate molecular structure is formed.
- The average number of oxygen atoms forming a chemical bond with one Si atom refers to a value confirmed by solid-state NMR (Dipolar Decoupling method), and can be measured using, for example, JNM-ECA series manufactured by JEOL Ltd.
- As such a protective layer, for example, it is possible to use a silicone-based compound (silicone-based resin) in which a siloxane bond has been generated by crosslinking (curing) of a silane compound containing an alkoxysilyl group or a silanol group.
- Examples of the silane compound include monofunctional R3Si(OR)1, bifunctional R2Si(OR)2, trifunctional RiSi(OR)3, and tetrafunctional Si(OR)4 (in each formula, R represents a hydrogen atom or an organic group). If the respective silane compounds differing in the number of functional group are used in an appropriate combination, the Si-bound oxygen atom number described above can be adjusted.
- Specific examples of the raw material (silane compound) of the silicone-based resin as the protective layer include tetraalkoxysilanes such as tetramethoxysilane and tetraethoxysi-lane; trialkoxysilanes such as methyltrimethoxysilane, phenyltrimethoxysilane, methyltriethoxy-silane, phenyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, hexyltrimethox-ysilane, hexyltriethoxysilane, decyltrimethoxysilane, trifluoropropyltrimethoxysilane, vinyltri-methoxysilane, vinyltriethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-acrylox-ypropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, bis(triethoxy-silylpropyl)tetrasulfide, and 3-isocyanatopropyltriethoxysilane; dialkoxysilanes such as dimeth-yldimethoxysilane, dimethyldiethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycid-oxypropylmethyldiethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, and 3-mercaptopropylmethyldimethoxysilane; chloro-silanes such as methyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltri-chlorosilane, trimethylsilyl chloride, and triethylsilyl chloride; silazanes such as hexamethyldisi-lazane; and the like. One kind of these may be used alone, or two or more kinds thereof may be used concurrently.
- The organic substance in the protective layer is not particularly limited and may be derived from, for example, the functional group (for example, an alkyl group, a phenyl group, an epoxy group, a vinyl group, a methacryloyl group, or an acryloyl group) that the above-described silane compound has. In view of adjusting the Si content, the organic substance may be an epoxy resin, an acrylic resin, a polyester resin, an olefin-based resin, and the like that are mixed or made into a complex with the silane compound not having been crosslinked or with the silicone-based resin having been crosslinked.
- When such a resin is used as the organic substance, the organic substance may be optionally cured by heating or ultraviolet rays.
- Other examples of the organic substance in the protective layer include an organic filler, a resin stabilizer, and the like, in view of improving handling ability such as slipperiness and improving coating hardness.
- Specific examples of the organic filler include polystyrene, polyacrylate, and the like. One kind of these may be used alone, or two or more kinds thereof may be used concurrently.
- Specific examples of the resin stabilizer include a hindered amine-based light stabilizer; a benzotriazole-based ultraviolet absorber; an antioxidant based on phenol, phosphorus, or sulfur; and the like. One kind of these may be used alone, or two or more kinds thereof used concurrently.
- The protective layer may contain other components in addition to Si and the organic substance. For example, in view of improving handling ability such as slipperiness and improving coating hardness, the protective layer may contain an inorganic filler.
- Specific examples of the inorganic filler include titanium oxide, calcium carbonate, zirconium oxide, alumina, magnesium oxide, zinc oxide, barium sulfate, calcium phosphate, and the like. One kind of these may be used alone, or two or more kinds thereof may be used concurrently.
- When the protective layer contains other components in addition to Si and the organic substance, the content of the components is not particularly limited as long as it is within a range that does not diminish the effect of our plates. However, the content is preferably about 15% or less in the protective layer.
- An elastic modulus of the protective layer is preferably 0.10 GPa to 15 GPa, and more preferably 0.5 GPa to 10 GPa, since sand resistance becomes better.
- The elastic modulus can be measured using, for example, a Picodenter HM500 manufactured by Fischer Instruments K.K.
- Moreover, though not particularly limited, A surface profile of the protective layer is preferably smooth, in view of light condensation rate.
- A surface roughness of the protective layer is preferably 0.10 μm or less in terms of an arithmetic mean roughness (Ra), since reflecting components diffused are reduced, and a regular reflectance can be maintained at a higher value. Ra can be measured based on JIS B0601 (2001).
- The surface roughness of the protective layer can be adjusted to some extent by controlling surface profiles of the substrate or the reflective layer. Accordingly, to reduce the surface roughness of the protective layer, it is effective to reduce beforehand the surface roughness of the substrate or the reflective layer.
- Furthermore, the surface roughness of the protective layer can also be adjusted by a method such as reducing a viscosity of a coating liquid for forming the protective layer, or increasing time allowed to elapse before curing is performed.
- In addition, a method is also effective in which coating is performed by diluting the components with a solvent such as acetone, toluene, ethyl ether, methyl cellosolve, cellosolve, butyl cellosolve (ethylene glycol monobutyl ether), ethanol, isopropyl alcohol, propylene glycol 1-monomethyl ether 2-acetate, or water. A solid content concentration at that time is preferably about 0.5% by mass to 50% by mass.
- Moreover, the thickness of the protective layer is not particularly limited. However, in view of balance between the reflectance and protection, the thickness is preferably 0.01 μm to 20 μm, more preferably 0.01 μm to 10 μm, and particularly preferably 0.1 μm to 5 μm.
- It is preferable that the solar reflector plate include an interlayer between the reflective layer and the protective layer since the adhesiveness of the protective layer is improved, and the weather resistance becomes better in this manner.
- The interlayer contains at least one kind selected from a group consisting of a silane coupling agent, a titanium coupling agent, a zirconium coupling agent, and an organic resin.
- In addition, when a silane coupling agent, a titanium coupling agent, or a zirconium coupling agent is used, a film thickness of the interlayer is preferably about a thickness at a monolayer level (several angstroms) to 0.5 μm. When an organic resin is used, the thickness is preferably about 0.1 μm to 5 μm.
- Examples of the silane coupling agent include alkoxysilanes having a functional group such as a vinyl group, an epoxy group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, a ureide group, a mercapto group, a sulfide group, or an isocyanate group.
- Examples of the titanium coupling agent include titanium tetraisopropoxide, titanium tetra-n-butoxide, titanium butoxide dimer, titanium tetra-2-ethylhexoxide, and the like.
- Examples of the zirconium coupling agent include zirconium acetate, zirconium ammonium carbonate, zirconium fluoride, and the like.
- Among these, a silane coupling agent is preferable since it has excellent compatibility with the protective layer and makes it possible to improve the weather resistance and maintain the excellent reflectance of the reflective layer at a higher degree.
- When a silane coupling agent is used as the interlayer, the interlayer may be regarded as a portion of the protective layer, and an amount of the silane coupling agent that is expressed in terms of SiO2 can be added to the Si content of the protective layer.
- Meanwhile, as an organic resin, for example, a vinyl chloride resin, a vinyl chloride acetate resin, an acrylic resin, a modified olefin resin, a polyester resin, a polycarbonate resin, and the like having excellent transparency and light resistance can be used.
- It is preferable that in the solar reflector plate, at least one base layer constituted with an organic material and/or an inorganic material be provided between the substrate and the reflective layer, since the smoothness of the reflective layer is improved, and the reflectance is heightened in this manner.
- Specific examples of the base layer constituted with an organic material include films containing a resin as a main component such as a PET film, a polyester film, a polyethylene film, a polypropylene film, a polyolefin film, a polyvinyl chloride film, a polyvinylidene chloride film, an acrylic resin film, a polyvinyl alcohol film, a polycarbonate film, a polystyrene film, a polyacrylonitrile film, an ethylene-vinyl acetate copolymer film, an ethylene-vinyl alcohol copolymer film, an ethylene-methacrylic acid copolymer film, a nylon film, an ionomer film, a silicone film, and the like.
- Specific examples of the base layer constituted with an inorganic material include a glass sheet, a glass coat, metal plating such as nickel or zinc, and the like.
- Hereinafter, our plates will be described in detail based on examples, but this disclosure is not limited to such examples.
- On the substrate shown in Tables 1 to 3, the base layer, reflective layer, interlayer, and protective layer shown in Tables 1 to 3 were formed by the following method, thereby preparing solar reflector plates.
- In Tables 1 to 3, a cell marked with “-” indicates that the corresponding item is not provided (not treated). Moreover, as the substrate shown in Tables 1 to 3, specifically the following substrates were used. When any of a stainless steel sheet, a cold-rolled steel sheet, a hot-dip galvanized steel sheet, and an electrogalvanized steel sheet was used as the substrate, the substrate surface on which the reflective layer would be formed was subjected to skin pass finishing.
-
-
- Stainless steel sheet: SUS430 (sheet thickness 0.1 mm)
- Cold-rolled steel sheet: SPCC (sheet thickness 0.35 mm)
- Plastic substrate: vinyl chloride (
sheet thickness 5 mm) - Ceramic substrate: fiber-reinforced cement sheet [flexible board (
sheet thickness 5 mm, manufactured by Mitsubishi Materials Corporation.) - Glass substrate: float sheet glass (
sheet thickness 5 mm, manufactured by ASAHI GLASS CO., LTD.) - Hot-dip galvanized steel sheet (sheet thickness 0.30 mm, both side plating, amount of plating deposit on each side: 100 g/m2)
- Electrogalvanized steel sheet (sheet thickness 0.45 mm, both side plating, amount of plating deposit on each side: 20 g/m2)
- The base layer was pasted to the substrate by using an adhesive.
- As a PET film for the base layer, a film having an arithmetic mean roughness (Ra) of 0.1 μm and a thickness described in Tables 1 to 3 (50 μm if the thickness is not described in Tables 1 to 3) was used.
- As a glass sheet for the base layer used in Example 50, AN100 (sheet thickness 0.5 mm) manufactured by ASAHI GLASS CO., LTD. was used.
- As a glass coat for the base layer used in Example 54, a glass coat was used which was obtained by firing powdered glass for a low-temperature seal (BAS115, manufactured by ASAHI GLASS CO., LTD.) for 30 minutes at 500° C. to yield a thickness of 100 μm.
- The reflective layer was formed by depositing Al or Ag shown in Tables 1 to 3 onto the base layer. Further, regarding Example 60, the reflective layer was formed in a manner in which melted Al was plated onto the base layer such that the thickness thereof became 100 μm, and then mirror polishing was performed until the thickness thereof became 80 μm.
- The thickness of the reflective layers not described in Tables 1 to 3 was 0.1 μm.
- The interlayer was formed in a manner in which a 0.5% by mass aqueous solution in which the silane coupling agent or the like shown in Tables 1 to 3 was dissolved was coated onto the reflective layer at 10 g/m2, followed by drying for 5 minutes at 110° C. The thickness of the respective interlayers was as described in Tables 1 to 3.
- 3-glycidoxypropyltrimethoxysilane was used as a silane coupling agent, titanium tetraisopropoxide was used as a titanium coupling agent, and zirconium ammonium carbonate was used as a zirconium coupling agent.
- Moreover, as the silane coupling agent marked with “#,”3-aminopropyltrimethoxysilane was used.
- The protective layer was formed in a manner in which a coating liquid (
solid content concentration 10% by mass), which was obtained by mixing the compounding agent shown in Table 4 and the curing agent shown in Table 5 with a solvent (ethylene glycol monobutyl ether) such that a mass ratio between them became the value shown in Tables 1 to 3, was coated onto the reflective layer (interlayer when the interlayer was provided) by using a bar coater, followed by heating and drying under the curing conditions shown in Tables 1 to 3. Regarding Comparative Examples 10 to 14, the compounding agents shown in Table 4 and the curing agents shown in Table 5 were not used, and the silicone rubber (RTV rubber KE-1842, curing conditions: 120° C.×1 hr,thickness 1 μm, manufactured by Shin-Etsu Chemical Co., Ltd.), a silicone resin (KR-300, curing conditions: 250° C.×1 hr,thickness 1 μm, manufactured by Shin-Etsu Chemical Co., Ltd.), a SiO2 deposition film, borosilicate glass, and metal silicate (lithium silicate LSS45, manufactured by NISSAN CHEMICAL INDUSTRIES, LTD.) were respectively used as shown in Table 1 to form the protective layer. - Regarding the formed protective layer, the Si content (expressed in terms of SiO2) was quantitated by alkali fusion/ICP-AES analysis by peeling the protective layer or scraping off the protective layer from the surface layer. The Si-bound oxygen atom number was calculated from chemical shift of solid-state NMR (JNM-ECA series, manufactured by JEOL Ltd.). The results of these are shown in Tables 1 to 3 together with the measurement results of the elastic modulus, thickness, and arithmetic mean roughness (Ra).
- The respective solar reflector plates prepared were evaluated in terms of the reflectance, sand resistance, and weather resistance by the evaluation methods shown below. These results are shown in Tables 1 to 3.
- By using a spectrophotometer (UV-3100PC, manufactured by Shimadzu Corporation), a regular reflectance at a wavelength of 300 nm to 2500 nm was measured and evaluated as a solar radiation reflectance multiplied by a weighting coefficient based on JIS K5602 (2008). A reflectance of 70% or higher was regarded as pass.
- Based on JIS H8503 (1989), a reduction rate of the regular reflectance at the time when 2 kg of silicon carbide was dropped on the test surface was evaluated.
-
-
- 1: 5% or less (pass)
- 2: higher than 5% to 10% or less (pass)
- 3: higher than 10% to 30% or less (failure)
- 4: higher than 30% (failure)
- Based on JIS D0205 (1987), a reduction rate of the regular reflectance at the time when a sunshine weather test was performed for 1000 hours was evaluated.
-
-
- 1: 5% or less (pass)
- 2: higher than 5% to 10% or less (pass)
- 3: higher than 10% to 30% or less (failure)
- 4: higher than 30% (failure)
-
TABLE 1 Protective layer Characteristics Interlayer SiO2 SiOn Elastic Cur- Re- Reflec- Thick- Con- Num- mod- Thick- ing flec- Sand Weather Sub- Base tive ness A B C D E F G V W Other verted ber ulus ness Ra condi- tance resis- resis- strate layer layer Type μm Parts by mass % of n GPa μm μm tions (%) tance tance Compar- Stain- PET Al — — Sili- 100 960 48 5 2.0 1.2 1.0 0.01 100° C. × 86.2 4 4 ative less cone- 1 hr Exam- steel based ple 1 sheet com- pound Compar- Stain- PET Al — — Sili- 100 590 29.5 8 2.0 1.6 1.0 0.01 100° C. × 85.9 3 3 ative less cone- 1 hr Exam- steel based ple 2 sheet com- pound Exam- Stain- PET Al — — Sili- 100 460 23 10 2.0 2.1 1.0 0.01 100° C. × 87.1 2 2 ple 1 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 300 15 14 2.0 2.3 1.0 0.01 100° C. × 88.6 1 2 ple 2 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 210 10.5 19 2.0 2.8 1.0 0.01 100° C. × 88.4 1 2 ple 3 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 130 6.5 29 2.0 2.9 1.0 0.01 100° C. × 89.9 1 2 ple 4 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 90 4.5 38 2.0 3.0 1.0 0.01 100° C. × 88.2 1 2 ple 5 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 63 3.15 49 2.0 3.2 1.0 0.01 100° C. × 88.0 1 2 ple 6 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 47 2.35 58 2.0 3.1 1.0 0.01 100° C. × 87.8 2 2 ple 7 less cone- 1 hr steel based sheet com- pound Compar- Stain- PET Al — — Sili- 100 35 1.75 68 2.0 2.8 1.0 0.01 100° C. × 86.4 3 2 ative less cone- 1 hr Exam- steel based ple 3 sheet com- pound Compar- Stain- PET Al — — Sili- 100 30 1.5 73 2.0 2.3 1.0 0.01 100° C. × 87.5 4 3 ative less cone- 1 hr Exam- steel based ple 4 sheet com- pound Compar- Stain- PET Al — — Sili- 100 170 300 15 29 1.2 0.1 1.0 0.01 100° C. × 85.9 4 4 ative less cone- 1 hr Exam- steel based ple 5 sheet com- pound Compar- Stain- PET Al — — Sili- 100 120 250 12.5 29 1.3 0.4 1.0 0.01 100° C. × 87.3 3 3 ative less cone- 1 hr Exam- steel based ple 6 sheet com- pound Exam- Stain- PET Al — — Sili- 100 50 180 9 29 1.5 0.7 1.0 0.01 100° C. × 89.1 2 2 ple 8 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 20 150 7.5 29 1.7 1.2 1.0 0.01 100° C. × 88.7 1 2 ple 9 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 50 100 185 9.25 29 2.3 2.5 1.0 0.01 100° C. × 87.9 1 2 ple 10 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 200 100 350 17.5 29 2.7 2.9 1.0 0.01 100° C. × 87.6 1 2 ple 11 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 600 100 795 39.75 29 2.9 4.4 1.0 0.01 100° C. × 87.4 2 2 ple 12 less cone- 1 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 30 100 135 6.75 29 3.2 5.0 1.0 0.01 100° C. × 86.2 2 2 ple 13 less cone- 1 hr steel based sheet com- Compar- Stain- PET Al — — pound 60 100 160 8 29 3.4 6.8 1.0 0.01 100° C. × 85.9 3 2 ative less Sili- 1 hr Exam- steel cone- ple 7 sheet based com- pound Compar- Stain- PET Al — — Sili- 120 100 220 11 29 3.6 11 1.0 0.01 100° C. × 85.4 4 3 ative less cone- 1 hr Exam- steel based ple 8 sheet com- pound Compar- Stain- PET Al — — Sili- 300 100 390 19.5 29 3.8 15 1.0 0.01 100° C. × 85.6 4 4 ative less cone- 1 hr Exam- steel based ple 9 sheet com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 30 2.0 0.01 1.0 0.01 100° C. × 86.7 2 2 ple 14 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 0.013 30 2.0 0.05 1.0 0.01 100° C. × 86.9 2 2 ple 15 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 0.13 30 2.0 0.1 1.0 0.01 100° C. × 88.5 1 2 ple 16 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 1.3 30 2.0 0.5 1.0 0.01 100° C. × 89.4 1 1 ple 17 rolled cou- cone- 1 hr steel lingp based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 7.8 29 2.0 7.0 1.0 0.01 100° C. × 89.4 1 1 ple 18 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 9.1 28 2.0 10 1.0 0.01 100° C. × 89.4 1 1 ple 19 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 10.4 28 2.0 15 1.0 0.01 100° C. × 88.4 1 2 ple 20 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Cold- PET Al Silane ≦0.1 Sili- 100 130 13 28 2.0 20 1.0 0.01 100° C. × 85.1 2 2 ple 21 rolled cou- cone- 1 hr steel pling based sheet agent com- pound Exam- Stain- PET Al — — Sili- 100 130 39 24 2.0 0.4 1.0 0.01 120° C. × 88.6 1 2 ple 22 less cone- 24 hr steel based sheet com- pound Exam- Stain- PET Al — — Sili- 100 130 176 15 2.0 2.9 1.0 0.01 120 C. × 87.9 1 2 ple 23 less cone- 24 hr steel based sheet com- pound Compar- Stain- PET Al — — Sili- 75 2.0 0.1 1.0 0.01 — 75.4 4 4 ative less cone Exam- steel rubber ple 10 sheet Compar- Stain- PET Al — — Sili- 78 3.0 2.0 1.0 0.01 — 81.1 4 4 ative less cone Exam- steel resin ple 11 sheet Compar- Stain- PET Al — — SiO2 100 4.0 90 0.1 0.01 — 89.9 3 4 ative less Depo- Exam- steel sition ple 12 sheet film Compar- Stain- PET Al — — Boro- 60 4.0 70 10.0 0.01 — 86.6 3 4 ative less silicate Exam- steel glass ple 13 sheet Compar- Stain- PET Al — — Metal 70 4.0 70 1.0 0.01 — 87.6 3 4 ative less silicate Exam- steel ple 14 sheet -
TABLE 2 Protective layer Characteristics Interlayer SiO2 SiOn Elastic Re- Reflec- Thick- Con- Num- mod- Thick- Curing flec- Sand Weather Sub- Base tive ness A B C D E F G V W Other verted ber ulus ness Ra condi- tance resis- resis- strate layer layer Type μm Parts by mass % of n GPa μm μm tions (%) tance tance Exam- Stain- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.7 1.0 0.01 100° C. × 88.7 1 1 ple 24 less cou- based 1 hr steel pling compound sheet agent Exam- Stain- PET Al Tita- ≦0.1 Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.01 100° C. × 87.6 1 1 ple 25 less nium based 1 hr steel cou- compound sheet pling agent Exam- Stain- PET Al Zr ≦0.1 Silicone- 100 130 6.5 29 2.0 3.0 1.0 0.01 100° C. × 88.5 1 1 ple 26 less cou- based 1 hr steel pling compound sheet agent Exam- Stain- PET Al Viny 0.5 Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 86.2 1 1 ple 27 less chloride based 1 hr steel acetate compound sheet resin Exam- Stain- PET Al Vinyl 1 Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 85.8 1 1 ple 28 less chloride based 1 hr steel acetate compound sheet resin Exam- Stain- PET Al Vinyl 2 Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 83.4 1 1 ple 29 less chloride based 1 hr steel acetate compound sheet resin Exam- Stain- PET Al Vinyl 5 Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 81.1 1 1 ple 30 less chloride based 1 hr steel acetate compound sheet resin Exam- Stain- PET Al Acrylic 0.5 Silicone- 100 130 6.5 29 2.0 3.3 1.0 0.01 100° C. × 86.1 1 1 ple 31 less resin based 1 hr steel compound sheet Exam- Cold- PET Al — — Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 89.7 1 2 ple 32 rolled based 1 hr steel compound sheet Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 0.01 0.01 100° C. × 90.0 2 2 ple 33 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 0.1 0.01 100° C. × 89.9 1 2 ple 34 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 88.7 1 2 ple 35 Rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 10.0 0.01 100° C. × 87.8 1 2 ple 36 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 20.0 0.01 100° C. × 82.3 1 2 ple 37 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 50 100 130 6.5 30 2.5 2.2 1.0 0.01 100° C. × 88.5 1 2 ple 38 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 100 130 6.5 31 2.7 4.8 1.0 0.01 100° C. × 89.0 1 2 ple 39 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 12 3.0 5.1 1.0 0.01 100° C. × 88.8 1 2 ple 40 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 50 100 120 6 31 2.0 2.1 1.0 0.01 100° C. × 89.1 1 2 ple 41 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 15 0.75 29 2.0 2.3 1.0 0.01 100° C. × 89.7 1 2 ple 42 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.5 0.1 0.01 100° C. × 88.7 1 2 ple 43 rolled (10 μm cou-\ based 1 hr steel thick- pling compound sheet ness) agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.4 0.1 0.01 100° C. × 90.2 1 2 ple 44 rolled (100 μm cou- based 1 hr steel thick- pling compound sheet ness) agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 0.1 0.01 100° C. × 78.6 1 2 ple 45 rolled (0.01 cou- based 1 hr steel μm pling compound sheet Thick- agent ness) Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 0.1 0.01 100° C. × 85.3 1 2 ple 46 rolled (0.05 cou- based 1 hr steel μm pling compound sheet thick- agent ness) Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 0.1 0.01 100° C. × 88.4 1 2 ple 47 rolled (0.2 cou- based 1 hr steel μm pling compound sheet thick- agent ness) Exam- Cold- PET Ag — — Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.01 100° C. × 95.3 1 2 ple 48 rolled based 1 hr steel compound sheet Exam- Cold- PET Ag Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.5 0.1 0.01 100° C. × 94.8 1 2 ple 49 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- Glass Al Silane ≦0.1 Silicone- 100 130 6.5 29 2.0 2.6 10.0 0.01 100° C. × 90.1 1 2 ple 50 rolled sheet cou- based 1 hr steel pling compound sheet agent -
TABLE 3 Protective layer Characteristics Interlayer SiO2 SiOn Elastic Re- Reflec- Thick- Con- Num- mod- Thick- Curing flec- Sand Weather Sub- Base tive ness A B C D E F G V W Other verted ber ulus ness Ra condi- tance resis- resis- strate layer layer Type μm Parts by mass % of n GPa μm μm tions (%) tance tance Exam- Plastic PET Al — — Silicone- 100 130 6.5 29 2.0 3.0 1.0 0.01 100° C. × 89.7 1 2 ple 51 sub- based 1 hr strate compound Exam- Ceramic PET Al — — Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.01 100° C. × 89.4 1 2 ple 52 sub- based 1 hr strate compound Exam- Glass PET Al — — Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.01 100° C. × 88.6 1 2 ple 53 sub- based 1 hr strate compound Exam- Stain- Glass Al — — Silicone- 100 130 6.5 29 2.0 2.9 1.0 0.01 100° C. × 87.9 1 2 ple 54 less coat based 1 hr steel compound sheet Exam- Stain- — Al — — Silicone- 100 130 6.5 29 2.0 2.9 1.0 0.02 100° C. × 75.4 1 2 ple 55 less based 1 hr steel compound sheet Exam- Stain- PET Al — — Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.05 100° C. × 85.1 1 2 ple 56 less based 1 hr steel compound sheet Exam- Stain- PET Al — — Silicone- 100 130 6.5 29 2.0 3.0 1.0 0.10 100° C. × 81.2 1 2 ple 57 less based 1 hr steel compound sheet Exam- Stain- PET Al — — Silicone- 100 130 6.5 29 2.0 3.1 1.0 0.30 100° C. × 75.4 1 2 ple 58 less based 1 hr steel compound sheet Exam- Stain- PET Al — — Silicone- 100 130 6.5 29 2.0 2.9 1.0 0.50 100° C. × 71.0 1 2 ple 59 less based 1 hr steel compound sheet Exam- Cold- — Melted Al — — Silicone- 100 130 6.5 29 2.0 2.6 1.0 0.01 100° C. × 84.7 1 2 ple 60 rolled (having a based 1 hr steel thickness compound sheet of 80 μm by being subjected to mirror polishing) Compar- Stain- — — — — — — — 50.7 4 4 ative less Exam- steel ple 15 sheet Compar- Cold- — — — — — — — 34.3 4 4 ative rolled Exam- steel ple 16 sheet Exam- Hot-dip PET Al Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.8 1.0 0.02 100° C. × 88.6 1 1 ple 61 galva- cou- based 1 hr nized pling compound Exam- Hot-dip PET Al Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.7 5.0 0.01 100° C. × 88.5 1 1 ple 62 galva- cou- based 1 hr nized pling compound steel agent sheet Exam- Hot-dip PET Al #Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.8 1.0 0.01 100° C. × 88.7 1 1 ple 63 galva- cou- based 1 hr nized pling compound steel agent sheet Exam- electro- PET Al Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.9 1.0 0.01 100° C. × 88.9 1 1 ple 64 galva- cou- based 1 hr nized pling compound steel agent sheet Exam- electro- PET Al Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.7 5.0 0.01 100° C. × 88.4 1 1 ple 65 galva- cou- based 1 hr nized pling compound steel agent sheet Exam- electro- PET Al #Silane ≦0.1 Silicone- 100 130 6.5 30 2.0 2.7 1.0 0.01 100° C. × 88.7 1 1 ple 66 galva- cou- based 1 hr nized pling compound steel agent sheet Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 0 30 2.0 0.01 1.0 0.01 100° C. × 86.7 2 2 ple 67 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 0.013 30 2.0 0.05 1.0 0.01 100° C. × 86.9 2 2 ple 68 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 7.8 X30 24 2.0 8.3 3.0 0.02 100° C. × 85.3 1 1 ple 69 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 7.8 Y30 24 2.0 4.6 4.0 0.03 100° C. × 80.1 2 1 ple 70 rolled cou- based 1 hr steel pling compound sheet agent Exam- Cold- PET Al Silane ≦0.1 Silicone- 100 130 7.8 Z30 24 2.0 7.9 5.0 0.10 100° C. × 72.1 2 1 ple 71 rolled cou- based 1 hr steel pling compound sheet agent -
TABLE 4 Compounding agent A Tetramethoxysilane B 3-Glycidoxypropyltrimethoxysilane C Methyltrimethoxysilane D 3-Glycidoxypropylmethyldimethoxysilane E Dimethyldimethoxysilane F Trimethylsilyl chloride G 1,4-Butanediol diglycidyl ether X Titanium oxide (rutile type, particle size 10 nm)Y Calcium carbonate (particle size 0.2 μm) Z Zirconium oxide (particle size 0.6 μm) -
TABLE 5 Curing agent V Diethylenetriamine W A mixture of methyl hexahydrophthalic anhydride:tris(dimethylaminomethyl)phenol = 99:1 - As the results described in Tables 1 to 3 clearly show, we found that if a protective layer in which either or both of the Si content (expressed in terms of SiO2) and the Si-bound oxygen atom number are outside of a predetermined range is used, the reflectance can be maintained at a high value, but the sand resistance and weather resistance deteriorate (Comparative Examples 1 to 14).
- On the other hand, we found that if a protective layer in which both the Si content (expressed in terms of SiO2) and the Si-bound oxygen atom number are within a predetermined range is used, the excellent reflectance of the reflective layer is maintained, and the sand resistance and weather resistance also become excellent (Examples 1 to 71).
- Particularly, we found that in the solar reflector plates prepared in Examples 14 to 21, 24 to 31, 33 to 47, 49 to 50, and 61 to 71 in which a stainless steel sheet, a cold-rolled steel sheet, a hot-dip galvanized steel sheet, or an electrogalvanized steel sheet is used as a substrate, and the interlayer is provided between the reflective layer and protective layer, the sand resistance and weather resistance (particularly, weather resistance) tend to further improve.
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US10879439B2 (en) * | 2015-06-29 | 2020-12-29 | Kuraray Co., Ltd. | Polyamide composition for LED reflection plate, LED reflection plate, and light-emitting device including reflection plate |
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WO2022019659A1 (en) * | 2020-07-24 | 2022-01-27 | 주식회사 나노밸리 | Solar cell reflective structure |
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US10879439B2 (en) * | 2015-06-29 | 2020-12-29 | Kuraray Co., Ltd. | Polyamide composition for LED reflection plate, LED reflection plate, and light-emitting device including reflection plate |
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JP5994845B2 (en) | 2016-09-21 |
WO2013153923A8 (en) | 2014-08-21 |
US9594191B2 (en) | 2017-03-14 |
EP2837958A4 (en) | 2015-07-08 |
KR20140125448A (en) | 2014-10-28 |
CN104220905B (en) | 2017-10-24 |
JPWO2013153923A1 (en) | 2015-12-17 |
ES2778865T3 (en) | 2020-08-12 |
EP2837958A1 (en) | 2015-02-18 |
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