US20130240009A1 - Metal Dendrite-free Solar Cell - Google Patents

Metal Dendrite-free Solar Cell Download PDF

Info

Publication number
US20130240009A1
US20130240009A1 US13/423,231 US201213423231A US2013240009A1 US 20130240009 A1 US20130240009 A1 US 20130240009A1 US 201213423231 A US201213423231 A US 201213423231A US 2013240009 A1 US2013240009 A1 US 2013240009A1
Authority
US
United States
Prior art keywords
solar cell
electrical contact
contact material
wafer
cell assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US13/423,231
Inventor
Xiaobo Zhang
Vincent A. Lim
Hoon H. Lee
John P. Serra
Uming T. Jeng
Steven M. Bunyan
Julie J. Hoskin
Kent E. Barbour
Dimitri D. Krut
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing Co
Original Assignee
Boeing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boeing Co filed Critical Boeing Co
Priority to US13/423,231 priority Critical patent/US20130240009A1/en
Assigned to THE BOEING COMPANY reassignment THE BOEING COMPANY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: Hoskin, Julie J., Barbour, Kent E., Bunyan, Steven M., Jeng, Uming T., KRUT, DIMITRI D., LEE, HOON H., LIM, VINCENT A., Serra, John P., ZHANG, XIAOBO
Priority to CN2013100571376A priority patent/CN103325795A/en
Priority to TW106121997A priority patent/TWI685122B/en
Priority to TW102108757A priority patent/TWI685121B/en
Priority to EP13159060.6A priority patent/EP2642526A3/en
Publication of US20130240009A1 publication Critical patent/US20130240009A1/en
Priority to US15/488,618 priority patent/US10224440B2/en
Priority to US16/249,015 priority patent/US11139407B2/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/022433Particular geometry of the grid contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0475PV cell arrays made by cells in a planar, e.g. repetitive, configuration on a single semiconductor substrate; PV cell microarrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/05Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
    • H01L31/0504Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
    • H01L31/0508Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module the interconnection means having a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • This application relates to solar cells, such as multijunction solar cells, and, more particularly, to solar cells that are substantially free of metal dendrites.
  • Solar cells convert the sun's energy into useful electrical energy by way of the photovoltaic effect.
  • Modern multijunction solar cells operate at efficiencies significantly higher than traditional, silicon solar cells, with the added advantage of being lightweight. Therefore, solar cells provide a reliable, lightweight and sustainable source of electrical energy suitable for a variety of terrestrial and space applications.
  • a solar cell typically includes a semiconductor material having a certain energy bandgap. Photons in sunlight having energy greater than the bandgap of the semiconductor material are absorbed by the semiconductor material, thereby freeing electrons within the semiconductor material. The freed electrons diffuse through the semiconductor material and flow through a circuit as an electric current.
  • the disclosed metal dendrite-free solar cell assembly may include a semiconductor wafer having a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and an electrical contact material positioned on the solar cell portion, wherein the wing portion is substantially free of the electrical contact material.
  • the disclosed metal dendrite-free solar cell assembly may include a semiconductor wafer having a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, a first electrical contact material positioned on the solar cell portion and a second electrical contact material positioned on the wing portion, wherein the first electrical contact material is spaced at least 1 millimeter (or a few millimeters) from the second electrical contact material.
  • a method for forming a metal dendrite-free solar cell may include the steps of (1) providing a semiconductor wafer, (2) applying an electrical contact material to the semiconductor wafer, (3) forming an isolation channel in the semiconductor wafer to define a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and wherein both the wing portion and the solar cell portion include the electrical contact material, (4) forming a spacer zone between the solar cell portion and the wing portion, the spacer zone being substantially free of the electrical contact material, wherein the spacer zone spaces the electrical contact material on the wing portion a minimum of at least 1 millimeter (or a few millimeters) from the electrical contact material on the solar cell portion, and/or (5) separating the solar cell portion from the wing portion.
  • a method for forming a metal dendrite-free solar cell may include the steps of (1) providing a semiconductor wafer, (2) applying an electrical contact material to the semiconductor wafer, (3) forming an isolation channel in the semiconductor wafer to define a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and wherein the wing portion is substantially free of the electrical contact material, and (4) separating the solar cell portion from the wing portion.
  • FIG. 1A is a schematic top plan view of a semiconductor wafer having an anti-reflection coating applied thereto during the manufacture of the disclosed metal dendrite-free solar cell;
  • FIG. 1B is a schematic top plan view of the semiconductor wafer of FIG. 1A , shown with an electrical contact material applied thereto;
  • FIG. 1C is a schematic top plan view of the semiconductor wafer of FIG. 1B , shown with cell electrical isolation defining wafer wings;
  • FIG. 1D is a schematic top plan view of the semiconductor wafer of FIG. 1C , shown after separation into two solar cells;
  • FIG. 1E is a schematic top plan view of the semiconductor wafer of FIG. 1C , shown after separation into two solar cell assemblies which comprise solar cells and other devices on the wings;
  • FIG. 2 is a schematic side elevational view, in section, of a solar cell assembly undergoing metal dendrite formation
  • FIG. 3A is a photograph of a silver grid tip that was spaced 288 ⁇ m from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 3B is a photograph of a silver grid tip that was spaced 438 ⁇ m from silver on a wafer wing during manufacture
  • FIG. 3C is a photograph of a silver grid tip that was spaced 1038 ⁇ m from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 3D is a photograph of a silver grid tip that was spaced 3438 ⁇ m from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 4 is a top plan view of a first implementation of a first embodiment of the disclosed metal dendrite-free solar cell
  • FIG. 5 is a top plan view of a second implementation of the first embodiment of the disclosed metal dendrite-free solar cell
  • FIG. 6 is a top plan view of a first implementation of a second embodiment of the disclosed metal dendrite-free solar cell.
  • FIG. 7 is a top plan view of a second implementation of the second embodiment of the disclosed metal dendrite-free solar cell.
  • Silver is often used in the manufacture of multiple junction solar cells as an electrical contact metal due to its high conductivity.
  • the metal grid contact front side serves as the cathode of the cell, which has more negative charges than the silver metal contact on the wings due to more metal coverage and wafer perimeter electrical shunting.
  • the silver ions from wings are transferred through aqueous medium to cell grids and reduced to silver dendrite by acquiring electrons.
  • the silver dendrite introduces obscurity to sun light and reduces solar cell efficiency and compromises solar cell reliability. Therefore, disclosed are solar cell wafer front metal contact designs that reduce or eliminate silver dendrite growth on the metal grid.
  • FIGS. 1A-1E disclosed is a metal dendrite-free solar cell shown during various stages of manufacture. While a single semiconductor wafer 10 is shown yielding two of the disclosed metal dendrite-free solar cells 12 , 14 ( FIGS. 1C and 1D ) or solar cell assemblies ( FIGS. 1C and 1E ), those skilled in the art will appreciate that the semiconductor wafer 10 may yield only one solar cell or more than two solar cells without departing from the scope of the present disclosure.
  • the solar cell assemblies 12 , 14 may be monolithic integrated solar cells with various electronic devices 11 , such as protecting diodes, formed on the wafer wings.
  • the semiconductor wafer 10 may have an upper surface 16 , and may be grown on a substrate (see substrate 20 in FIG. 2 ). Portions of the upper surface 16 of the semiconductor wafer 10 may be coated with an anti-reflection coating 18 . During the step of coating the upper surface 16 of the semiconductor wafer 10 with the anti-reflection coating 18 , a masking material (not shown) may be applied over portions of the upper surface 16 such that only the desired portions of the upper surface 16 (i.e., the active portions) receive the anti-reflection coating 18 .
  • an electrical contact material 22 may be applied to portions of the upper surface 16 of the semiconductor wafer 10 .
  • a masking material (not shown) may be applied over portions of the upper surface 16 such that only the desired portions of the upper surface 16 receive the electrical contact material 22 .
  • the masking material may cover the anti-reflection coating 18 and, optionally, the areas of the semiconductor wafer 10 where isolation channels will be formed during the electrical isolation step.
  • the electrical contact material 22 may be any electrically conductive material capable of being applied to the upper surface 16 of the semiconductor wafer 10 .
  • the electrical contact material 22 may be an electrically conductive metal or metal alloy.
  • the electrical contact material 22 may be a highly electrically conductive metal or metal alloy.
  • the electrical contact material 22 may be silver.
  • the electrical contact material 22 may form an electrically conductive grid 24 on the upper surface 16 of the semiconductor wafer 10 .
  • the electrically conductive grid 24 may include grid lines 30 extending from a bus bar 32 . Each grid line 30 may terminate at a grid tip 34 .
  • the solar cells 12 , 14 may be electrically isolated from the wafer wings 26 . Electrical isolation of the solar cells 12 , 14 from the wafer wings 26 may be effected by forming one or more isolation channels 28 in the semiconductor wafer 10 . The isolation channels 28 may extend through the semiconductor wafer 10 down to the underlying substrate 20 .
  • each solar cell 12 , 14 may be separated from the adjacent solar cell 12 , 14 , and may or may not be separated from the wafer wings 26 . Separation may be effected by cutting or other available means.
  • metal dendrites such as silver dendrites
  • a solvent e.g., deionized water.
  • Metal dendrite growth may be particularly pronounced in certain solar cell fabrication processes, such as metal lift off at elevated temperatures after solar cell electrical isolation.
  • Metal dendrites may obscure the passage of light to the underlying semiconductor wafer 10 , thereby negatively impacting solar cell efficiency. Furthermore, metal dendrites may compromise solar cell reliability, particularly if the metal dendrites grow beyond the cap layer and contact the window layer of the solar cell structure.
  • FIG. 2 is a cross-sectional view of a portion of a solar cell wafer taken along a grid line 30 .
  • the grid lines 30 serve as a cathode, which has more negative charges than the electrical contact material 22 (silver) on the wafer wings 26 due to more electrical contact material coverage and wafer perimeter electrical shunting. Therefore, silver ions may transfer from the wafer wings 26 , across the isolation channels 28 through the solvent (e.g., deionized water) and, ultimately, to the grid lines 30 .
  • the silver ions may acquire electrons and may be reduced to silver, which may accumulate on the grid lines 30 as silver dendrite.
  • metal dendrite growth multiple factors may affect metal dendrite growth, including, but not limited to, the type of electrical contact material 22 used (e.g., silver), the geometry of the electrical contact material 22 on the solar cells 12 , 14 and the wafer wings 26 , the illumination condition, solar cell shunting resistance, and the type of solvent in which solar cell assembly is submerged. Many of these factors are dictated by the cell fabrication process being used to manufacture the solar cells 12 , 14 .
  • Dendrite growth rate is proportional to the electric field intensity between the solar cells 12 , 14 and the wafer wings 26 .
  • the electrical potential difference between the solar cells 12 , 14 and the wafer wings 26 may be generally constant at fixed light condition. Therefore, the shorter the distance D ( FIG. 2 ) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26 , the higher the electric field intensity that drives metal dendrite growth.
  • the minimum distance D ( FIG. 2 ) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26 has on metal dendrite growth four different wafer specimens were prepared with silver grid lines terminating at a tip, wherein the minimum distance D of the first specimen was 288 ⁇ m ( FIG. 3A ), the minimum distance D of the second specimen was 438 ⁇ m ( FIG. 3B ), the minimum distance D of the third specimen was 1038 ⁇ m ( FIG. 3C ) and the minimum distance D of the fourth specimen was 3438 ⁇ m ( FIG. 3D ).
  • the specimens were submerged in isopropyl alcohol for 20 minutes under fluorescent room lighting conditions.
  • the electrical potential difference between the cell and wafer wing was 1.83 volts.
  • the grid tips were observed under 500 times magnification. The results are shown in FIGS. 3A-3D .
  • metal dendrite growth was reduced as the minimum distance D ( FIG. 2 ) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26 increased. Significantly, little or no metal dendrite growth was observed when the distance D was about 1 mm ( FIG. 3C ), while no metal dendrite growth was observed when the distance D was about 3 mm ( FIG. 3D ).
  • the orientation of the electrically conductive grid 24 may also have a significant impact on the growth rate of metal dendrites.
  • the metal dendrites tend to deposit at sharp edges, specifically at the tips 34 of the grid lines 30 . Without being limited to any particular theory, it is believed that the preference of dendrites to deposit on grid tips 34 is because direct current (“DC”) flows more densely to the sharp edges of the grid tips 34 than the less accessible portions of the electrically conductive grid 24 .
  • DC direct current
  • growth of metal dendrites on solar cell grid lines may be significantly reduced or eliminated by forming the solar cell assembly such that the wafer wings are substantially free of the electrical contact material.
  • a solar cell assembly may include a semiconductor wafer 102 , an anti-reflection coating 104 and an electrical contact material 106 .
  • the electrical contact material 106 may be applied in a grid pattern to form grid lines 108 .
  • the grid lines 108 may extend outward from a bus bar 110 and may terminate at a tip 112 .
  • Isolation channels may be formed in the solar cell assembly 100 to define and electrically isolate two solar cells 114 , 116 from wafer wings 118 .
  • the wafer wings 118 may be substantially free of the electrical contact material 106 (e.g., silver) used to form the grid lines 108 .
  • each solar cell 114 , 116 may be substantially free of metal dendrites.
  • a solar cell assembly may include a semiconductor wafer 202 , an anti-reflection coating 204 and an electrical contact material 206 .
  • the electrical contact material 206 may be applied in a grid pattern to form grid lines 208 that extend inward from a bus bar 210 .
  • Isolation channels may be formed in the solar cell assembly 200 to define and electrically isolate two solar cells 212 , 214 from wafer wings 216 .
  • the wafer wings 216 may be substantially free of the electrical contact material 206 (e.g., silver) used to form the grid lines 208 .
  • the lack of electrical contact material 206 on the wafer wings 216 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 208 .
  • the grid lines 208 do not protrude toward, and open to, the wafer wings 216 . Rather, the outer ends 218 of the grid lines 208 terminate at the bus bar 210 and, as such, do not present a sharp tip to the wafer wings 216 , thereby further reducing the potential for dendrite formation on the grid lines 208 . Therefore, when the solar cells 212 , 214 are separated from the solar cell assembly 200 , each solar cell 212 , 214 may be substantially free of metal dendrites.
  • growth of metal dendrites on solar cell grid lines may be significantly reduced or eliminated by providing a spacer zone between the grid lines and the electrical contact material on the wafer wings, wherein the spacer zone is substantially free of the electrical contact material.
  • a solar cell assembly may include a semiconductor wafer 302 , an anti-reflection coating 304 and an electrical contact material 306 .
  • the electrical contact material 306 may be applied in a grid pattern to form grid lines 308 .
  • the grid lines 308 may extend outward from a bus bar 310 and may terminate at a tip 312 .
  • Isolation channels may be formed in the solar cell assembly 300 to define and electrically isolate two solar cells 314 , 316 from wafer wings 318 .
  • the wafer wings 318 may include the electrical contact material 306 (e.g., silver) used to form the grid lines 308 .
  • the electrical contact material 306 cannot feasibly be eliminated from the wafer wings 318 .
  • a test structure or other type of devices with electrical contact material 306 on the wafer wings 318 may be required or some electrical contact material 306 may be left on the wafer wings 318 to simplify the metal lift off process.
  • a spacer zone 320 may be formed around the solar cells 314 , 316 to space the electrical contact material 306 on the solar cells 314 , 316 , particularly the tips 312 of the grid lines 308 , from the electrical contact material 306 on the wafer wings 318 .
  • the spacer zone 320 may be substantially free of the electrical contact material 306 .
  • the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 1 millimeter between the electrical contact material 306 on the solar cells 314 , 316 and the electrical contact material 306 on the wafer wings 318 . In another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 1.5 millimeters between the electrical contact material 306 on the solar cells 314 , 316 and the electrical contact material 306 on the wafer wings 318 . In another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 2 millimeters between the electrical contact material 306 on the solar cells 314 , 316 and the electrical contact material 306 on the wafer wings 318 .
  • the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 2.5 millimeters between the electrical contact material 306 on the solar cells 314 , 316 and the electrical contact material 306 on the wafer wings 318 . In yet another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 3 millimeters between the electrical contact material 306 on the solar cells 314 , 316 and the electrical contact material 306 on the wafer wings 318 .
  • the spacer zone 320 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 308 . Therefore, when the solar cells or solar cell assemblies 314 , 316 are separated from the wafer, each solar cell 314 , 316 may be substantially free of metal dendrites.
  • a solar cell assembly may include a semiconductor wafer 402 , an anti-reflection coating 404 and an electrical contact material 406 .
  • the electrical contact material 406 may be applied in a grid pattern to form grid lines 408 that extend inward from a bus bar 410 .
  • Isolation channels may be formed in the solar cell wafer 400 to define and electrically isolate two solar cells 412 , 414 from wafer wings 416 .
  • the wafer wings 416 may include the electrical contact material 406 (e.g., silver) used to form the grid lines 408 .
  • a spacer zone 418 may be formed around the solar cells 412 , 414 to space the electrical contact material 406 on the solar cells 412 , 414 from the electrical contact material 406 on the wafer wings 416 .
  • the spacer zone 418 may be substantially free of the electrical contact material 406 .
  • the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 1 millimeter between the electrical contact material 406 on the solar cells 412 , 414 and the electrical contact material 406 on the wafer wings 416 . In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 1.5 millimeter between the electrical contact material 406 on the solar cells 412 , 414 and the electrical contact material 406 on the wafer wings 416 . In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 2 millimeter between the electrical contact material 406 on the solar cells 412 , 414 and the electrical contact material 406 on the wafer wings 416 .
  • the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 2.5 millimeter between the electrical contact material 406 on the solar cells 412 , 414 and the electrical contact material 406 on the wafer wings 416 . In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 3 millimeter between the electrical contact material 406 on the solar cells 412 , 414 and the electrical contact material 406 on the wafer wings 416 .
  • the spacer zone 418 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 408 . Furthermore, since the grid lines 408 do not protrude toward, and open to, the wafer wings 416 , but rather the outer ends 420 of the grid lines 408 terminate at the bus bar 410 , no sharp tips are presented to the wafer wings 416 , thereby further reducing the potential for dendrite formation on the grid lines 408 . Therefore, when the solar cells or solar cell assemblies 412 , 414 are separated from the wafer, each solar cell 412 , 414 may be substantially free of metal dendrites.
  • the disclosed solar cell may be substantially free of metal dendrites, including silver dendrites.
  • the disclosed method for manufacturing solar cells may result in solar cells that are substantially free of metal dendrites, including silver dendrites.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Photovoltaic Devices (AREA)

Abstract

A solar cell assembly including a semiconductor wafer having a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and an electrical contact material positioned on the solar cell portion, wherein the wing portion is substantially free of the electrical contact material.

Description

    FIELD
  • This application relates to solar cells, such as multijunction solar cells, and, more particularly, to solar cells that are substantially free of metal dendrites.
  • BACKGROUND
  • Solar cells convert the sun's energy into useful electrical energy by way of the photovoltaic effect. Modern multijunction solar cells operate at efficiencies significantly higher than traditional, silicon solar cells, with the added advantage of being lightweight. Therefore, solar cells provide a reliable, lightweight and sustainable source of electrical energy suitable for a variety of terrestrial and space applications.
  • A solar cell typically includes a semiconductor material having a certain energy bandgap. Photons in sunlight having energy greater than the bandgap of the semiconductor material are absorbed by the semiconductor material, thereby freeing electrons within the semiconductor material. The freed electrons diffuse through the semiconductor material and flow through a circuit as an electric current.
  • Unfortunately, various components of a solar cell may interfere with the absorption of photons by the semiconductor material, thereby lowering the overall efficiency of the solar cell. Therefore, those skilled in the art continue with research and development efforts in the field of solar cells and, particularly, with research and development efforts aimed at improving solar cell efficiency.
  • SUMMARY
  • In one aspect, the disclosed metal dendrite-free solar cell assembly may include a semiconductor wafer having a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and an electrical contact material positioned on the solar cell portion, wherein the wing portion is substantially free of the electrical contact material.
  • In another aspect, the disclosed metal dendrite-free solar cell assembly may include a semiconductor wafer having a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, a first electrical contact material positioned on the solar cell portion and a second electrical contact material positioned on the wing portion, wherein the first electrical contact material is spaced at least 1 millimeter (or a few millimeters) from the second electrical contact material.
  • In another aspect, disclosed is a method for forming a metal dendrite-free solar cell. The method may include the steps of (1) providing a semiconductor wafer, (2) applying an electrical contact material to the semiconductor wafer, (3) forming an isolation channel in the semiconductor wafer to define a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and wherein both the wing portion and the solar cell portion include the electrical contact material, (4) forming a spacer zone between the solar cell portion and the wing portion, the spacer zone being substantially free of the electrical contact material, wherein the spacer zone spaces the electrical contact material on the wing portion a minimum of at least 1 millimeter (or a few millimeters) from the electrical contact material on the solar cell portion, and/or (5) separating the solar cell portion from the wing portion.
  • In yet another aspect, disclosed is a method for forming a metal dendrite-free solar cell. The method may include the steps of (1) providing a semiconductor wafer, (2) applying an electrical contact material to the semiconductor wafer, (3) forming an isolation channel in the semiconductor wafer to define a solar cell portion and a wing portion, wherein the wing portion is electrically isolated from the solar cell portion, and wherein the wing portion is substantially free of the electrical contact material, and (4) separating the solar cell portion from the wing portion.
  • Other aspects of the disclosed metal dendrite-free solar cell, solar cell assembly and method will become apparent from the following detailed description, the accompanying drawings and the appended claims.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1A is a schematic top plan view of a semiconductor wafer having an anti-reflection coating applied thereto during the manufacture of the disclosed metal dendrite-free solar cell;
  • FIG. 1B is a schematic top plan view of the semiconductor wafer of FIG. 1A, shown with an electrical contact material applied thereto;
  • FIG. 1C is a schematic top plan view of the semiconductor wafer of FIG. 1B, shown with cell electrical isolation defining wafer wings;
  • FIG. 1D is a schematic top plan view of the semiconductor wafer of FIG. 1C, shown after separation into two solar cells;
  • FIG. 1E is a schematic top plan view of the semiconductor wafer of FIG. 1C, shown after separation into two solar cell assemblies which comprise solar cells and other devices on the wings;
  • FIG. 2 is a schematic side elevational view, in section, of a solar cell assembly undergoing metal dendrite formation;
  • FIG. 3A is a photograph of a silver grid tip that was spaced 288 μm from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 3B is a photograph of a silver grid tip that was spaced 438 μm from silver on a wafer wing during manufacture;
  • FIG. 3C is a photograph of a silver grid tip that was spaced 1038 μm from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 3D is a photograph of a silver grid tip that was spaced 3438 μm from silver on a wafer wing during manufacture of a solar cell;
  • FIG. 4 is a top plan view of a first implementation of a first embodiment of the disclosed metal dendrite-free solar cell;
  • FIG. 5 is a top plan view of a second implementation of the first embodiment of the disclosed metal dendrite-free solar cell;
  • FIG. 6 is a top plan view of a first implementation of a second embodiment of the disclosed metal dendrite-free solar cell; and
  • FIG. 7 is a top plan view of a second implementation of the second embodiment of the disclosed metal dendrite-free solar cell.
  • DETAILED DESCRIPTION
  • Silver is often used in the manufacture of multiple junction solar cells as an electrical contact metal due to its high conductivity. Under fluorescent light illumination, which is used in most solar cell manufacturing environments, for a typical triple junction solar cell, the metal grid contact (front side) serves as the cathode of the cell, which has more negative charges than the silver metal contact on the wings due to more metal coverage and wafer perimeter electrical shunting. The silver ions from wings are transferred through aqueous medium to cell grids and reduced to silver dendrite by acquiring electrons. The silver dendrite introduces obscurity to sun light and reduces solar cell efficiency and compromises solar cell reliability. Therefore, disclosed are solar cell wafer front metal contact designs that reduce or eliminate silver dendrite growth on the metal grid.
  • Referring to FIGS. 1A-1E, disclosed is a metal dendrite-free solar cell shown during various stages of manufacture. While a single semiconductor wafer 10 is shown yielding two of the disclosed metal dendrite-free solar cells 12, 14 (FIGS. 1C and 1D) or solar cell assemblies (FIGS. 1C and 1E), those skilled in the art will appreciate that the semiconductor wafer 10 may yield only one solar cell or more than two solar cells without departing from the scope of the present disclosure.
  • As shown in FIG. 1E, the solar cell assemblies 12, 14 may be monolithic integrated solar cells with various electronic devices 11, such as protecting diodes, formed on the wafer wings.
  • As shown in FIG. 1A, the semiconductor wafer 10 may have an upper surface 16, and may be grown on a substrate (see substrate 20 in FIG. 2). Portions of the upper surface 16 of the semiconductor wafer 10 may be coated with an anti-reflection coating 18. During the step of coating the upper surface 16 of the semiconductor wafer 10 with the anti-reflection coating 18, a masking material (not shown) may be applied over portions of the upper surface 16 such that only the desired portions of the upper surface 16 (i.e., the active portions) receive the anti-reflection coating 18.
  • As shown in FIG. 1B, an electrical contact material 22 may be applied to portions of the upper surface 16 of the semiconductor wafer 10. During the step of applying the electrical contact material 22 to the upper surface 16 of the semiconductor wafer 10, a masking material (not shown) may be applied over portions of the upper surface 16 such that only the desired portions of the upper surface 16 receive the electrical contact material 22. For example, the masking material may cover the anti-reflection coating 18 and, optionally, the areas of the semiconductor wafer 10 where isolation channels will be formed during the electrical isolation step.
  • The electrical contact material 22 may be any electrically conductive material capable of being applied to the upper surface 16 of the semiconductor wafer 10. In one general expression, the electrical contact material 22 may be an electrically conductive metal or metal alloy. In another general expression, the electrical contact material 22 may be a highly electrically conductive metal or metal alloy. In one particular expression, the electrical contact material 22 may be silver.
  • Thus, the electrical contact material 22 may form an electrically conductive grid 24 on the upper surface 16 of the semiconductor wafer 10. The electrically conductive grid 24 may include grid lines 30 extending from a bus bar 32. Each grid line 30 may terminate at a grid tip 34.
  • As shown in FIG. 1C, the solar cells 12, 14 may be electrically isolated from the wafer wings 26. Electrical isolation of the solar cells 12, 14 from the wafer wings 26 may be effected by forming one or more isolation channels 28 in the semiconductor wafer 10. The isolation channels 28 may extend through the semiconductor wafer 10 down to the underlying substrate 20.
  • Finally, as shown in FIGS. 1D and 1E, with the solar cells 12, 14 electrically isolated from the wafer wings 26, the solar cells 12, 14 may be separated. During separation, each solar cell 12, 14 may be separated from the adjacent solar cell 12, 14, and may or may not be separated from the wafer wings 26. Separation may be effected by cutting or other available means.
  • It has been discovered that metal dendrites, such as silver dendrites, may form on the grid lines 30 of the electrically conductive grid 24, particularly on the grid tips 34 of the grid lines 30, after the solar cells 12, 14 have been electrically isolated from the wafer wings 26, as shown in FIG. 1C, and submerged in a solvent (e.g., deionized water). Metal dendrite growth may be particularly pronounced in certain solar cell fabrication processes, such as metal lift off at elevated temperatures after solar cell electrical isolation.
  • Metal dendrites may obscure the passage of light to the underlying semiconductor wafer 10, thereby negatively impacting solar cell efficiency. Furthermore, metal dendrites may compromise solar cell reliability, particularly if the metal dendrites grow beyond the cap layer and contact the window layer of the solar cell structure.
  • The mechanism of silver dendrite growth is shown in FIG. 2, which is a cross-sectional view of a portion of a solar cell wafer taken along a grid line 30. Under certain lighting conditions, such as the fluorescent light 36 typically found in the solar cell manufacturing environment, the grid lines 30 (silver) serve as a cathode, which has more negative charges than the electrical contact material 22 (silver) on the wafer wings 26 due to more electrical contact material coverage and wafer perimeter electrical shunting. Therefore, silver ions may transfer from the wafer wings 26, across the isolation channels 28 through the solvent (e.g., deionized water) and, ultimately, to the grid lines 30. At the grid lines 30, the silver ions may acquire electrons and may be reduced to silver, which may accumulate on the grid lines 30 as silver dendrite.
  • Multiple factors may affect metal dendrite growth, including, but not limited to, the type of electrical contact material 22 used (e.g., silver), the geometry of the electrical contact material 22 on the solar cells 12, 14 and the wafer wings 26, the illumination condition, solar cell shunting resistance, and the type of solvent in which solar cell assembly is submerged. Many of these factors are dictated by the cell fabrication process being used to manufacture the solar cells 12, 14.
  • Dendrite growth rate is proportional to the electric field intensity between the solar cells 12, 14 and the wafer wings 26. The electrical potential difference between the solar cells 12, 14 and the wafer wings 26 may be generally constant at fixed light condition. Therefore, the shorter the distance D (FIG. 2) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26, the higher the electric field intensity that drives metal dendrite growth.
  • To show the effect that the minimum distance D (FIG. 2) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26 has on metal dendrite growth, four different wafer specimens were prepared with silver grid lines terminating at a tip, wherein the minimum distance D of the first specimen was 288 μm (FIG. 3A), the minimum distance D of the second specimen was 438 μm (FIG. 3B), the minimum distance D of the third specimen was 1038 μm (FIG. 3C) and the minimum distance D of the fourth specimen was 3438 μm (FIG. 3D). The specimens were submerged in isopropyl alcohol for 20 minutes under fluorescent room lighting conditions. The electrical potential difference between the cell and wafer wing was 1.83 volts. After the twenty minute bath, the grid tips were observed under 500 times magnification. The results are shown in FIGS. 3A-3D.
  • As can be seen in FIGS. 3A-3D, metal dendrite growth was reduced as the minimum distance D (FIG. 2) between the grid lines 30 and the electrical contact material 22 on the wafer wings 26 increased. Significantly, little or no metal dendrite growth was observed when the distance D was about 1 mm (FIG. 3C), while no metal dendrite growth was observed when the distance D was about 3 mm (FIG. 3D).
  • In addition to the distance D between the grid lines 30 and the electrical contact material 22 on the wafer wings 26, the orientation of the electrically conductive grid 24 may also have a significant impact on the growth rate of metal dendrites. The metal dendrites tend to deposit at sharp edges, specifically at the tips 34 of the grid lines 30. Without being limited to any particular theory, it is believed that the preference of dendrites to deposit on grid tips 34 is because direct current (“DC”) flows more densely to the sharp edges of the grid tips 34 than the less accessible portions of the electrically conductive grid 24.
  • In a first embodiment, growth of metal dendrites on solar cell grid lines may be significantly reduced or eliminated by forming the solar cell assembly such that the wafer wings are substantially free of the electrical contact material.
  • Referring to FIG. 4, in a first implementation of the first embodiment, a solar cell assembly, generally designated 100, may include a semiconductor wafer 102, an anti-reflection coating 104 and an electrical contact material 106. The electrical contact material 106 may be applied in a grid pattern to form grid lines 108. The grid lines 108 may extend outward from a bus bar 110 and may terminate at a tip 112.
  • Isolation channels (see channel 28 in FIG. 2) may be formed in the solar cell assembly 100 to define and electrically isolate two solar cells 114, 116 from wafer wings 118. The wafer wings 118 may be substantially free of the electrical contact material 106 (e.g., silver) used to form the grid lines 108.
  • Thus, despite the tips 112 of the grid lines 108 protruding toward the wafer wings 118, the lack of electrical contact material 106 on the wafer wings 118 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 108. Therefore, when the solar cells 114, 116 are separated from the solar cell wafer, as discussed above in connection with FIG. 1D, each solar cell 114, 116 may be substantially free of metal dendrites.
  • Referring to FIG. 5, in a second implementation of the first embodiment, a solar cell assembly, generally designated 200, may include a semiconductor wafer 202, an anti-reflection coating 204 and an electrical contact material 206. The electrical contact material 206 may be applied in a grid pattern to form grid lines 208 that extend inward from a bus bar 210.
  • Isolation channels may be formed in the solar cell assembly 200 to define and electrically isolate two solar cells 212, 214 from wafer wings 216. The wafer wings 216 may be substantially free of the electrical contact material 206 (e.g., silver) used to form the grid lines 208.
  • Thus, the lack of electrical contact material 206 on the wafer wings 216 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 208. Furthermore, in the second implementation, the grid lines 208 do not protrude toward, and open to, the wafer wings 216. Rather, the outer ends 218 of the grid lines 208 terminate at the bus bar 210 and, as such, do not present a sharp tip to the wafer wings 216, thereby further reducing the potential for dendrite formation on the grid lines 208. Therefore, when the solar cells 212, 214 are separated from the solar cell assembly 200, each solar cell 212, 214 may be substantially free of metal dendrites.
  • In a second embodiment, growth of metal dendrites on solar cell grid lines may be significantly reduced or eliminated by providing a spacer zone between the grid lines and the electrical contact material on the wafer wings, wherein the spacer zone is substantially free of the electrical contact material.
  • Referring to FIG. 6, in a first implementation of the second embodiment, a solar cell assembly, generally designated 300, may include a semiconductor wafer 302, an anti-reflection coating 304 and an electrical contact material 306. The electrical contact material 306 may be applied in a grid pattern to form grid lines 308. The grid lines 308 may extend outward from a bus bar 310 and may terminate at a tip 312.
  • Isolation channels may be formed in the solar cell assembly 300 to define and electrically isolate two solar cells 314, 316 from wafer wings 318. The wafer wings 318 may include the electrical contact material 306 (e.g., silver) used to form the grid lines 308.
  • At this point, those skilled in the art will appreciate that in certain situations the electrical contact material 306 cannot feasibly be eliminated from the wafer wings 318. For example, a test structure or other type of devices with electrical contact material 306 on the wafer wings 318 may be required or some electrical contact material 306 may be left on the wafer wings 318 to simplify the metal lift off process.
  • Therefore, a spacer zone 320 may be formed around the solar cells 314, 316 to space the electrical contact material 306 on the solar cells 314, 316, particularly the tips 312 of the grid lines 308, from the electrical contact material 306 on the wafer wings 318. The spacer zone 320 may be substantially free of the electrical contact material 306.
  • In one expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 1 millimeter between the electrical contact material 306 on the solar cells 314, 316 and the electrical contact material 306 on the wafer wings 318. In another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 1.5 millimeters between the electrical contact material 306 on the solar cells 314, 316 and the electrical contact material 306 on the wafer wings 318. In another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 2 millimeters between the electrical contact material 306 on the solar cells 314, 316 and the electrical contact material 306 on the wafer wings 318. In another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 2.5 millimeters between the electrical contact material 306 on the solar cells 314, 316 and the electrical contact material 306 on the wafer wings 318. In yet another expression, the spacer zone 320 may be size and shaped to ensure a minimum distance of at least 3 millimeters between the electrical contact material 306 on the solar cells 314, 316 and the electrical contact material 306 on the wafer wings 318.
  • Thus, despite the tips 312 of the grid lines 308 protruding toward, and opening to, the wafer wings 318, the spacer zone 320 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 308. Therefore, when the solar cells or solar cell assemblies 314, 316 are separated from the wafer, each solar cell 314, 316 may be substantially free of metal dendrites.
  • Referring to FIG. 7, in a second implementation of the second embodiment, a solar cell assembly, generally designated 400, may include a semiconductor wafer 402, an anti-reflection coating 404 and an electrical contact material 406. The electrical contact material 406 may be applied in a grid pattern to form grid lines 408 that extend inward from a bus bar 410.
  • Isolation channels may be formed in the solar cell wafer 400 to define and electrically isolate two solar cells 412, 414 from wafer wings 416. The wafer wings 416 may include the electrical contact material 406 (e.g., silver) used to form the grid lines 408.
  • A spacer zone 418 may be formed around the solar cells 412, 414 to space the electrical contact material 406 on the solar cells 412, 414 from the electrical contact material 406 on the wafer wings 416. The spacer zone 418 may be substantially free of the electrical contact material 406.
  • In one expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 1 millimeter between the electrical contact material 406 on the solar cells 412, 414 and the electrical contact material 406 on the wafer wings 416. In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 1.5 millimeter between the electrical contact material 406 on the solar cells 412, 414 and the electrical contact material 406 on the wafer wings 416. In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 2 millimeter between the electrical contact material 406 on the solar cells 412, 414 and the electrical contact material 406 on the wafer wings 416. In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 2.5 millimeter between the electrical contact material 406 on the solar cells 412, 414 and the electrical contact material 406 on the wafer wings 416. In another expression, the spacer zone 418 may be size and shaped to ensure a minimum distance of at least 3 millimeter between the electrical contact material 406 on the solar cells 412, 414 and the electrical contact material 406 on the wafer wings 416.
  • Thus, the spacer zone 418 may preclude (or at least inhibit) the formation of metal dendrites on the grid lines 408. Furthermore, since the grid lines 408 do not protrude toward, and open to, the wafer wings 416, but rather the outer ends 420 of the grid lines 408 terminate at the bus bar 410, no sharp tips are presented to the wafer wings 416, thereby further reducing the potential for dendrite formation on the grid lines 408. Therefore, when the solar cells or solar cell assemblies 412, 414 are separated from the wafer, each solar cell 412, 414 may be substantially free of metal dendrites.
  • Accordingly, the disclosed solar cell may be substantially free of metal dendrites, including silver dendrites. Furthermore, the disclosed method for manufacturing solar cells may result in solar cells that are substantially free of metal dendrites, including silver dendrites.
  • Although various aspects of the disclosed metal dendrite-free solar cell have been shown and described, modifications may occur to those skilled in the art upon reading the specification. The present application includes such modifications and is limited only by the scope of the claims.

Claims (20)

What is claimed is:
1. A solar cell assembly comprising:
a semiconductor wafer comprising a solar cell portion and a wing portion, wherein said wing portion is electrically isolated from said solar cell portion; and
an electrical contact material positioned on said solar cell portion,
wherein said wing portion is substantially free of said electrical contact material.
2. The solar cell assembly of claim 1 wherein said electrical contact material comprises silver.
3. The solar cell assembly of claim 1 wherein said electrical contact material is arranged in a grid pattern.
4. The solar cell assembly of claim 3 wherein said grid pattern comprises a plurality of grid lines.
5. The solar cell assembly of claim 4 wherein at least one grid line of said plurality of grid lines comprises a tip, wherein said tip protrudes toward said wing portion.
6. The solar cell assembly of claim 3 wherein said grid pattern comprises a bus bar and a plurality of grid lines.
7. The solar cell assembly of claim 6 wherein at least one grid line of said plurality of grid lines comprises an outer end, and wherein said bus bar is positioned between said outer end and said wing portion.
8. A solar cell separated from said solar cell assembly of claim 1.
9. A solar cell assembly comprising:
a semiconductor wafer comprising a solar cell portion and a wing portion, wherein said wing portion is electrically isolated from said solar cell portion;
a first electrical contact material positioned on said solar cell portion; and
a second electrical contact material positioned on said wing portion,
wherein said first electrical contact material is spaced at least 1 millimeter from said second electrical contact material.
10. The solar cell assembly of claim 9 wherein said solar cell portion is separated from said wing portion by a spacer zone, and wherein said spacer zone is substantially free of said first electrical contact material and said second electrical contact material.
11. The solar cell assembly of claim 9 wherein said first electrical contact material is spaced at least 1.5 millimeters from said second electrical contact material.
12. The solar cell assembly of claim 9 wherein said first electrical contact material is spaced at least 2 millimeters from said second electrical contact material.
13. The solar cell assembly of claim 9 wherein said first electrical contact material is spaced at least 2.5 millimeters from said second electrical contact material.
14. The solar cell assembly of claim 9 wherein said first electrical contact material is spaced at least 3 millimeters from said second electrical contact material.
15. The solar cell assembly of claim 9 wherein both said first electrical contact material and said second electrical contact material comprise silver.
16. The solar cell assembly of claim 9 wherein said first electrical contact material is arranged in a grid pattern.
17. The solar cell assembly of claim 16 wherein said grid pattern comprises a plurality of grid lines.
18. The solar cell assembly of claim 17 wherein at least one grid line of said plurality of grid lines comprises a tip, wherein said tip protrudes toward said wing portion.
19. The solar cell assembly of claim 16 wherein said grid pattern comprises a bus bar and a plurality of grid lines.
20. The solar cell assembly of claim 19 wherein at least one grid line of said plurality of grid lines comprises an outer end, and wherein said bus bar is positioned between said outer end and said wing portion.
US13/423,231 2012-03-18 2012-03-18 Metal Dendrite-free Solar Cell Abandoned US20130240009A1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US13/423,231 US20130240009A1 (en) 2012-03-18 2012-03-18 Metal Dendrite-free Solar Cell
CN2013100571376A CN103325795A (en) 2012-03-18 2013-02-22 Metal dentrite-free solar cell
TW106121997A TWI685122B (en) 2012-03-18 2013-03-13 Metal dendrite-free solar cell
TW102108757A TWI685121B (en) 2012-03-18 2013-03-13 Metal dendrite-free solar cell
EP13159060.6A EP2642526A3 (en) 2012-03-18 2013-03-13 Metal dentrite-free solar cell
US15/488,618 US10224440B2 (en) 2012-03-18 2017-04-17 Metal dendrite-free solar cell
US16/249,015 US11139407B2 (en) 2012-03-18 2019-01-16 Metal dendrite-free solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/423,231 US20130240009A1 (en) 2012-03-18 2012-03-18 Metal Dendrite-free Solar Cell

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US15/488,618 Continuation US10224440B2 (en) 2012-03-18 2017-04-17 Metal dendrite-free solar cell

Publications (1)

Publication Number Publication Date
US20130240009A1 true US20130240009A1 (en) 2013-09-19

Family

ID=47884177

Family Applications (3)

Application Number Title Priority Date Filing Date
US13/423,231 Abandoned US20130240009A1 (en) 2012-03-18 2012-03-18 Metal Dendrite-free Solar Cell
US15/488,618 Expired - Fee Related US10224440B2 (en) 2012-03-18 2017-04-17 Metal dendrite-free solar cell
US16/249,015 Active US11139407B2 (en) 2012-03-18 2019-01-16 Metal dendrite-free solar cell

Family Applications After (2)

Application Number Title Priority Date Filing Date
US15/488,618 Expired - Fee Related US10224440B2 (en) 2012-03-18 2017-04-17 Metal dendrite-free solar cell
US16/249,015 Active US11139407B2 (en) 2012-03-18 2019-01-16 Metal dendrite-free solar cell

Country Status (4)

Country Link
US (3) US20130240009A1 (en)
EP (1) EP2642526A3 (en)
CN (1) CN103325795A (en)
TW (2) TWI685122B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11081606B2 (en) * 2018-12-27 2021-08-03 Solarpaint Ltd. Flexible and rollable photovoltaic cell having enhanced properties of mechanical impact absorption

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130240009A1 (en) * 2012-03-18 2013-09-19 The Boeing Company Metal Dendrite-free Solar Cell
CN106100570B (en) * 2016-06-12 2018-01-16 上海空间电源研究所 A kind of semi-rigid solar cell circuit module and its mount method

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105471A (en) * 1977-06-08 1978-08-08 Arco Solar, Inc. Solar cell with improved printed contact and method of making the same
US5318638A (en) * 1991-10-18 1994-06-07 Canon Kabushiki Kaisha Solar cell
US5340409A (en) * 1992-04-23 1994-08-23 Canon Kabushiki Kaisha Photovoltaic element and method for forming the same
US5428249A (en) * 1992-07-15 1995-06-27 Canon Kabushiki Kaisha Photovoltaic device with improved collector electrode
US5986204A (en) * 1996-03-21 1999-11-16 Canon Kabushiki Kaisha Photovoltaic cell
US6488820B1 (en) * 1999-08-23 2002-12-03 Applied Materials, Inc. Method and apparatus for reducing migration of conductive material on a component
US6825135B2 (en) * 2002-06-06 2004-11-30 Micron Technology, Inc. Elimination of dendrite formation during metal/chalcogenide glass deposition
US20050109388A1 (en) * 2003-11-05 2005-05-26 Canon Kabushiki Kaisha Photovoltaic device and manufacturing method thereof
US20070074756A1 (en) * 2005-09-30 2007-04-05 Sanyo Electric Co., Ltd. Manufacturing method of solar cell module, and solar cell and solar cell module
US20090283145A1 (en) * 2008-05-13 2009-11-19 Kim Yun-Gi Semiconductor Solar Cells Having Front Surface Electrodes
US20100012175A1 (en) * 2008-07-16 2010-01-21 Emcore Solar Power, Inc. Ohmic n-contact formed at low temperature in inverted metamorphic multijunction solar cells
US20100031994A1 (en) * 2008-08-07 2010-02-11 Emcore Corporation Wafer Level Interconnection of Inverted Metamorphic Multijunction Solar Cells
US7687707B2 (en) * 2005-11-16 2010-03-30 Emcore Solar Power, Inc. Via structures in solar cells with bypass diode
US20100089447A1 (en) * 2008-10-09 2010-04-15 Solopower, Inc. Conductive grids for solar cells
US20100233839A1 (en) * 2009-01-29 2010-09-16 Emcore Solar Power, Inc. String Interconnection and Fabrication of Inverted Metamorphic Multijunction Solar Cells
US7851696B2 (en) * 2006-12-08 2010-12-14 Q-Cells Se Solar cell

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004023856B4 (en) * 2004-05-12 2006-07-13 Rwe Space Solar Power Gmbh Solar cell with integrated protection diode and additionally arranged on this tunnel diode
JP4909032B2 (en) * 2006-11-30 2012-04-04 三洋電機株式会社 Solar cell module
JP5142565B2 (en) * 2007-03-20 2013-02-13 三洋電機株式会社 Manufacturing method of solar cell
EP2214213A2 (en) * 2009-01-29 2010-08-04 SCHOTT Solar AG Photovoltaic module
US8337942B2 (en) * 2009-08-28 2012-12-25 Minsek David W Light induced plating of metals on silicon photovoltaic cells
KR20110135203A (en) * 2010-06-10 2011-12-16 삼성전자주식회사 Solar cell module and method of manufacturing the same
JPWO2012086703A1 (en) * 2010-12-22 2014-05-22 京セラ株式会社 Photoelectric conversion device
US20130240009A1 (en) * 2012-03-18 2013-09-19 The Boeing Company Metal Dendrite-free Solar Cell

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105471A (en) * 1977-06-08 1978-08-08 Arco Solar, Inc. Solar cell with improved printed contact and method of making the same
US5318638A (en) * 1991-10-18 1994-06-07 Canon Kabushiki Kaisha Solar cell
US5340409A (en) * 1992-04-23 1994-08-23 Canon Kabushiki Kaisha Photovoltaic element and method for forming the same
US5428249A (en) * 1992-07-15 1995-06-27 Canon Kabushiki Kaisha Photovoltaic device with improved collector electrode
US5986204A (en) * 1996-03-21 1999-11-16 Canon Kabushiki Kaisha Photovoltaic cell
US6488820B1 (en) * 1999-08-23 2002-12-03 Applied Materials, Inc. Method and apparatus for reducing migration of conductive material on a component
US6825135B2 (en) * 2002-06-06 2004-11-30 Micron Technology, Inc. Elimination of dendrite formation during metal/chalcogenide glass deposition
US20050109388A1 (en) * 2003-11-05 2005-05-26 Canon Kabushiki Kaisha Photovoltaic device and manufacturing method thereof
US20070074756A1 (en) * 2005-09-30 2007-04-05 Sanyo Electric Co., Ltd. Manufacturing method of solar cell module, and solar cell and solar cell module
US7687707B2 (en) * 2005-11-16 2010-03-30 Emcore Solar Power, Inc. Via structures in solar cells with bypass diode
US7851696B2 (en) * 2006-12-08 2010-12-14 Q-Cells Se Solar cell
US20090283145A1 (en) * 2008-05-13 2009-11-19 Kim Yun-Gi Semiconductor Solar Cells Having Front Surface Electrodes
US20100012175A1 (en) * 2008-07-16 2010-01-21 Emcore Solar Power, Inc. Ohmic n-contact formed at low temperature in inverted metamorphic multijunction solar cells
US20100031994A1 (en) * 2008-08-07 2010-02-11 Emcore Corporation Wafer Level Interconnection of Inverted Metamorphic Multijunction Solar Cells
US20100089447A1 (en) * 2008-10-09 2010-04-15 Solopower, Inc. Conductive grids for solar cells
US20100233839A1 (en) * 2009-01-29 2010-09-16 Emcore Solar Power, Inc. String Interconnection and Fabrication of Inverted Metamorphic Multijunction Solar Cells

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Speckman et al. "Dendrite Growth and Degradation in Multi-junction Solar Cells." Prog. Photovolt. Res. Appl. 2005; 13: 157-163. *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11081606B2 (en) * 2018-12-27 2021-08-03 Solarpaint Ltd. Flexible and rollable photovoltaic cell having enhanced properties of mechanical impact absorption

Also Published As

Publication number Publication date
TWI685122B (en) 2020-02-11
TW201349528A (en) 2013-12-01
TWI685121B (en) 2020-02-11
CN103325795A (en) 2013-09-25
US20190148572A1 (en) 2019-05-16
US11139407B2 (en) 2021-10-05
US10224440B2 (en) 2019-03-05
US20170222070A1 (en) 2017-08-03
EP2642526A2 (en) 2013-09-25
TW201737505A (en) 2017-10-16
EP2642526A3 (en) 2016-08-17

Similar Documents

Publication Publication Date Title
US11139407B2 (en) Metal dendrite-free solar cell
JP4727607B2 (en) Solar cell
CN202948939U (en) Back contact thin wafer cell
US8293568B2 (en) Crystalline silicon PV cell with selective emitter produced with low temperature precision etch back and passivation process
CN102473648B (en) The surface treatment of silicon
WO2018157520A1 (en) Improved p-type perc double-sided solar cell and preparation method therefor
BR112015017500B1 (en) OPTOELECTRONIC DEVICE AND METHOD FOR PRODUCING THE SAME
CN105144398B (en) The electric conductivity of solar battery is promoted
US20120270356A1 (en) Method for manufacturing a solar cell
JP2013537364A (en) Photovoltaic power generation apparatus and manufacturing method thereof
US8536447B2 (en) Electrode of solar cell and fabricating method thereof
CN102903765A (en) All Al-BSF crystal silicon cell and preparation method thereof
US20150214394A1 (en) Opto-electrical conversion structure
JP2010080578A (en) Photoelectric conversion element and manufacturing method therefor
KR20130109330A (en) Solar cell and method of fabricating the same
CN103094414B (en) Carry on the back the preparation method of passivation solar battery back electric field and there is the back of the body passivation solar cell of this back of the body electric field
US4401840A (en) Semicrystalline solar cell
JP2013532907A (en) Photovoltaic power generation apparatus and manufacturing method thereof
WO2013094556A1 (en) Solar cell with wiring sheet, solar cell module, and solar cell manufacturing method
US20140026936A1 (en) Photovoltaic solar cell and a method for the production of same
KR101193021B1 (en) Solar cell having dot type electrode and manufacturing method of the same
CN104681665A (en) Preparation method of novel back-passivation solar cell
DE102011086302A1 (en) Method for producing contact grid on surface of e.g. photovoltaic solar cell for converting incident electromagnetic radiation into electrical energy, involves electrochemically metalizing contact region with metal, which is not aluminum
Dang et al. Effects of anodic aluminum oxide membrane on performance of nanostructured solar cells
KR100322708B1 (en) Method for fabricating self-voltage applying solar cell

Legal Events

Date Code Title Description
AS Assignment

Owner name: THE BOEING COMPANY, ILLINOIS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ZHANG, XIAOBO;LIM, VINCENT A.;LEE, HOON H.;AND OTHERS;SIGNING DATES FROM 20120314 TO 20120315;REEL/FRAME:027882/0282

STCB Information on status: application discontinuation

Free format text: ABANDONED -- AFTER EXAMINER'S ANSWER OR BOARD OF APPEALS DECISION