US20090212012A1 - Critical dimension control during template formation - Google Patents

Critical dimension control during template formation Download PDF

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Publication number
US20090212012A1
US20090212012A1 US12/392,685 US39268509A US2009212012A1 US 20090212012 A1 US20090212012 A1 US 20090212012A1 US 39268509 A US39268509 A US 39268509A US 2009212012 A1 US2009212012 A1 US 2009212012A1
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United States
Prior art keywords
substrate
critical dimension
features
polymerizable material
thickness
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Abandoned
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US12/392,685
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English (en)
Inventor
Cynthia B. Brooks
Dwayne L. LaBrake
Niyaz Khusnatdinov
Michael N. Miller
Sidlgata V. Sreenivasan
David James Lentz
Frank Y. Xu
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Canon Nanotechnologies Inc
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Molecular Imprints Inc
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Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to US12/392,685 priority Critical patent/US20090212012A1/en
Priority to PCT/US2009/001202 priority patent/WO2009108322A2/en
Priority to EP09716103A priority patent/EP2250020A4/en
Priority to JP2010548716A priority patent/JP5404654B2/ja
Assigned to MOLECULAR IMPRINTS, INC. reassignment MOLECULAR IMPRINTS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SREENIVASAN, SIDLGATA V., KHUSNATDINOV, NIYAZ, MILLER, MICHAEL N., BROOKS, CYNTHIA B., LABRAKE, DWAYNE L., LENTZ, DAVID JAMES, XU, FRANK Y.
Publication of US20090212012A1 publication Critical patent/US20090212012A1/en
Priority to US13/441,500 priority patent/US8545709B2/en
Assigned to JP MORGAN CHASE BANK, N.A. reassignment JP MORGAN CHASE BANK, N.A. PATENT SECURITY AGREEMENT Assignors: MAGIC LEAP, INC., MENTOR ACQUISITION ONE, LLC, MOLECULAR IMPRINTS, INC.
Assigned to CITIBANK, N.A. reassignment CITIBANK, N.A. ASSIGNMENT OF SECURITY INTEREST IN PATENTS Assignors: JPMORGAN CHASE BANK, N.A.
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • Nano-fabrication includes the fabrication of very small structures that have features on the order of 100 nanometers or smaller.
  • One application in which nano-fabrication has had a sizeable impact is in the processing of integrated circuits.
  • the semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate, therefore nano-fabrication becomes increasingly important.
  • Nano-fabrication provides greater process control while allowing continued reduction of the minimum feature dimensions of the structures formed.
  • Other areas of development in which nano-fabrication has been employed include biotechnology, optical technology, mechanical systems, and the like.
  • imprint lithography An exemplary nano-fabrication technique in use today is commonly referred to as imprint lithography.
  • Exemplary imprint lithography processes are described in detail in numerous publications, such as U.S. Patent Publication No. 2004/0065976, U.S. Patent Publication No. 2004/0065252, and U.S. Pat. No. 6,936,194, all of which are hereby incorporated by reference herein.
  • An imprint lithography technique disclosed in each of the aforementioned U.S. patent publications and patent includes formation of a relief pattern in a formable (polymerizable) layer and transferring a pattern corresponding to the relief pattern into an underlying substrate.
  • the substrate may be coupled to a motion stage to obtain a desired positioning to facilitate the patterning process.
  • the patterning process uses a template spaced apart from the substrate and a formable liquid applied between the template and the substrate.
  • the formable liquid is solidified to form a rigid layer that has a pattern conforming to a shape of the surface of the template that contacts the formable liquid.
  • the template is separated from the rigid layer such that the template and the substrate are spaced apart.
  • the substrate and the solidified layer are then subjected to additional processes to transfer a relief image into the substrate that corresponds to the pattern in the solidified layer.
  • FIG. 1 illustrates a simplified side view of a lithographic system in accordance with an embodiment of the present invention.
  • FIG. 2 illustrates a simplified side view of the substrate shown in FIG. 1 having a patterned layer positioned thereon.
  • FIG. 3 illustrates a flow chart for supplying replications of a template.
  • FIGS. 4A and 4B illustrate an exemplary field on a substrate during formation of a sub-master template.
  • FIG. 5 illustrates a graphical representation of exemplary variations of average critical dimension across a substrate at a pre-etch stage and at a post post-etch stage.
  • FIGS. 6A and 6B illustrate a top down view and simplified side views of exemplary variations in critical dimension between on edges and the center of a substrate.
  • FIG. 7 illustrates a graphical representation of exemplary variations of average critical dimension in relation to residual layer thickness wherein average critical dimension is inversely proportional and directly proportional to residual layer thickness.
  • FIG. 8 illustrates a graphical representation of exemplary variation of critical dimension after a descum etching process.
  • FIG. 9 illustrates a graphical representation of exemplary variation of critical dimension after a polymerizing etching process.
  • FIG. 10 illustrates a flow chart of a method for controlling the magnitude of critical dimension of features using an etching process.
  • FIGS. 11A and 11B illustrate simplified side views of substrates having residual layers with different magnitudes of thickness.
  • FIG. 12 illustrates a flow chart of a method for controlling critical dimension of features using a dispensing technique.
  • a lithographic system 10 used to form a relief pattern on substrate 12 .
  • Substrate 12 may be coupled to substrate chuck 14 .
  • substrate chuck 14 is a vacuum chuck.
  • Substrate chuck 14 may be any chuck including, but not limited to, vacuum, pin-type, groove-type, electrostatic, electromagnetic, and/or the like. Exemplary chucks are described in U.S. Pat. No. 6,873,087, which is hereby incorporated by reference herein.
  • Substrate 12 and substrate chuck 14 may be further supported by stage 16 .
  • Stage 16 may provide motion along the x, y, and z axes.
  • Stage 16 , substrate 12 , and substrate chuck 14 may also be positioned on a base (not shown).
  • Template 18 Spaced-apart from substrate 12 is template 18 .
  • Template 18 may include mesa 20 extending therefrom towards substrate 12 , mesa 20 having a patterning surface 22 thereon. Further, mesa 20 may be referred to as mold 20 . Alternatively, template 18 may be formed without mesa 20 .
  • Template 18 and/or mold 20 may be formed from such materials including, but not limited to, fused-silica, quartz, silicon, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, metal, hardened sapphire, and/or the like.
  • patterning surface 22 comprises features defined by a plurality of spaced-apart recesses 24 and/or protrusions 26 , though embodiments of the present invention are not limited to such configurations. Patterning surface 22 may define any original pattern that forms the basis of a pattern to be formed on substrate 12 .
  • Template 18 may be coupled to chuck 28 .
  • Chuck 28 may be configured as, but not limited to, vacuum, pin-type, groove-type, electrostatic, electromagnetic, and/or other similar chuck types. Exemplary chucks are further described in U.S. Pat. No. 6,873,087, which is hereby incorporated by reference herein. Further, chuck 28 may be coupled to imprint head 30 such that chuck 28 and/or imprint head 30 may be configured to facilitate movement of template 18 .
  • System 10 may further comprise fluid dispense system 32 .
  • Fluid dispense system 32 may be used to deposit polymerizable material 34 on substrate 12 .
  • Polymerizable material 34 may be positioned upon substrate 12 using techniques such as drop dispense, spin-coating, dip coating, chemical vapor deposition (CVD), physical vapor deposition (PVD), thin film deposition, thick film deposition, and/or the like.
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • thin film deposition thick film deposition
  • thick film deposition and/or the like.
  • polymerizable material 34 may be positioned upon substrate 12 using techniques such as those described in U.S. Patent Publication No. 2005/0270312 and U.S. Patent Publication No. 2005/0106321, both of which are hereby incorporated by reference herein.
  • Polymerizable material 34 may be disposed upon substrate 12 before and/or after a desired volume is defined between mold 20 and substrate 12 depending on design considerations.
  • Polymerizable material 34 may comprise a monomer mixture as described in U.S. Pat. No. 7,157,036 and U.S. Patent Publication No. 2005/0187339, both of which are hereby incorporated by reference herein.
  • system 10 may further comprise energy source 38 coupled to direct energy 40 along path 42 .
  • Imprint head 30 and stage 16 may be configured to position template 18 and substrate 12 in superimposition with path 42 .
  • System 10 may be regulated by processor 54 in communication with stage 16 , imprint head 30 , fluid dispense system 32 , and/or source 38 , and may operate on a computer readable program stored in memory 56 .
  • Either imprint head 30 , stage 16 , or both vary a distance between mold 20 and substrate 12 to define a desired volume therebetween that is filled by polymerizable material 34 .
  • imprint head 30 may apply a force to template 18 such that mold 20 contacts polymerizable material 34 .
  • source 38 produces energy 40 , e.g., ultraviolet radiation, causing polymerizable material 34 to solidify and/or cross-link conforming to a shape of surface 44 of substrate 12 and patterning surface 22 , defining patterned layer 46 on substrate 12 .
  • Patterned layer 46 may comprise a residual layer 48 and a plurality of features shown as protrusions 50 and recessions 52 , with protrusions 50 having a thickness t 1 and residual layer having a thickness t 2 .
  • FIG. 3 illustrates a flow diagram for supplying such replications.
  • template 18 hereinafter referred to as master template 18
  • master template 18 may be replicated to form a plurality of sub-master templates 60 .
  • These sub-master templates 60 may then form working templates 62 and/or patterned wafers for device fabrication.
  • master template 18 may form working templates 62 and/or patterned wafers for device fabrication.
  • the device wafers may be patterned as a whole substrate or in a step and repeat manner described in further detail in S. V.
  • sub-master template 60 may be formed by patterning multiple fields 80 a - 801 across substrate 12 .
  • a portion of field 801 is illustrated in FIG. 4B .
  • Features 50 a and/or 52 a formed on substrate 12 may have a critical dimension 70 .
  • critical dimension 70 may be a width of feature 50 a.
  • patterned layer 46 a may have non-uniform critical dimension 70 across substrate 12 resulting from e-beam patterning, etching of master template 18 , replicate etching, and/or the like. For example, as etching rates may vary at the edges of substrate 12 and/or transition points between materials, patterned layer 46 a may have non-uniform critical dimension 70 resulting from relative loading of materials (e.g., resist, chrome, and/or the like). In this situation, a uniform thickness t 1 of residual layer 48 a may exacerbate this non-uniformity.
  • materials e.g., resist, chrome, and/or the like
  • FIG. 5 is a graphical representation of exemplary variations of average critical dimension 70 across substrate 12 a at a pre-etch stage and at a post post-etch stage. At the pre-etch stage, the average critical dimension 70 across a pattern may vary based on non-uniformity of master template 18 by which it may be formed. Additionally, at the post-etch stage, variation of the average critical dimension 70 may be further exacerbated.
  • Critical dimension 70 may also be varied across patterned layer 48 a due to processing and/or other similar conditions. For example, as illustrated in FIGS. 6A and 6B , critical dimension 70 at the inner edge 90 and the outer edge 92 of a pattern may be different than critical dimension 70 at the center 94 of the pattern.
  • the magnitude of critical dimension 70 of features 50 a and/or 52 a may be determined as a function of thickness t 3 of residual layer 48 a .
  • thickness t 3 of residual layer 48 a may be altered to control critical dimension 70 of features 50 a and/or 52 a .
  • Thickness t 3 of residual layer 48 a may be directly proportional or inversely proportional to critical dimension 70 of features 50 a and/or 52 a .
  • thickness t 3 of residual layer 48 a may be altered to be directly proportional and as such provide substantially uniform critical dimension 70 across substrate 12 , shown by Process A in FIG. 7 .
  • thickness t 3 of residual layer 48 a may be altered to be inversely proportional and as such provide variations in magnitude of critical dimension 70 across substrate 12 , shown as Processes B and C in FIG. 7 .
  • an etching process may be used to alter thickness t 3 of residual layer 48 a to provide control of critical dimension 70 of features 50 a and/or 52 a .
  • a descum etching process e.g., O 2 /Ar composition
  • FIG. 8 illustrates a graphical representation of exemplary variation of critical dimension 70 after a descum etching process. As shown, an approximate 3 nm variation in thickness t 3 may provide an approximate 1 nm variation of critical dimension 70 of features 50 a and/or 52 a .
  • a polymerizing etch process e.g., CF 4 /CHF 3 /Ar composition
  • the timing of the etch process may be used to control the variation in thickness t 3 .
  • a longer etching time may be used to further reduce the critical dimension 70 .
  • FIG. 9 illustrates a graphical representation of exemplary variation of critical dimension 70 after a polymerizing etch process. As shown, an approximate 1 nm variation among critical dimension 70 of features 50 a and/or 52 a may be expected from approximately 4.5 nm of thickness t 1 .
  • FIG. 10 illustrates a flow chart of a method 100 for controlling the magnitude of critical dimension 70 of features 50 a and/or 52 a using an etching process.
  • mold 20 and substrate 12 may be positioned to define a desired volume therebetween capable of being filled by polymerizable material 34 .
  • desired volume may be filled with polymerizable material 34 .
  • source 38 may produce energy 40 , e.g., ultraviolet radiation, causing polymerizable material 34 to solidify and/or cross-link conforming to a shape of surface 44 of substrate 12 and patterning surface 22 , defining patterned layer 46 on substrate 12 .
  • energy 40 e.g., ultraviolet radiation
  • Patterned layer 46 may comprise residual layer 48 a and a plurality of features shown as protrusions 50 a and recessions 52 a , with residual layer having thickness t 3 .
  • thickness t 3 of residual layer 48 a may be determined and a desired critical dimension may be determined.
  • a first etching composition may be applied to patterned layer 46 based on thickness t 3 of residual layer 48 a alter the critical dimension of features 70 to the desired critical dimension. The first etching composition may thus be provided to control magnitude of critical dimension 70 of features 50 a and/or 52 a . It should be noted that the desired critical dimension and the critical dimension 70 of features 50 a and/or 52 a may be similar.
  • a second etching composition may be applied to patterned layer 46 to etch features 50 a and/or 52 a into substrate 12 .
  • Thickness t 3 of residual layer 48 a may also be altered by adjusting dispensing of polymerizable material 34 on substrate 12 .
  • FIG. 11A illustrates substrate 12 a having residual layer 48 b with thickness t 4
  • FIG. 11B illustrates substrate 12 b having residual layer 48 c with thickness t 5 .
  • the additional thickness t 4 of residual layer 48 b formed in FIG. 11A may provide etching that is relatively more protective of the sidewall. This may result in less variation in critical dimension 70 than the thinner residual layer 48 c in FIG. 10B .
  • dispensing techniques may be used to control critical dimension 70 of features 50 a and/or 52 a .
  • dispensing techniques may be used to provide residual layer 48 a with thickness t 3 . Thickness t 3 of residual layer 48 a may be selected by the dispensing and positioning of polymerizable material 34 on substrate 12 .
  • the magnitude of critical dimension 70 of features 50 a and/or 52 a may be a function of the thickness t 3 of residual layer 48 a .
  • dispensing and positioning of polymerizable material 34 on substrate 12 may control critical dimension 70 of features 50 a and/or 52 a .
  • Exemplary dispensing techniques may include, but are not limited to, techniques further described in U.S. Ser.
  • FIG. 12 illustrates a flow chart of a method 120 for controlling critical dimension 70 of features 50 a and/or 52 a using a dispensing technique.
  • mold 20 and substrate 12 may be positioned to define a desired volume therebetween capable of being filled by polymerizable material 34 .
  • a dispense pattern of polymerizable material 34 for filling the desired volume may be determined.
  • the dispense pattern may be adjusted to provide varying thickness t 2 of residual layer 48 a . For example, the dispense pattern may be adjusted for dispensing a greater amount of polymerizable material 34 at the edges of field 80 .
  • polymerizable material 34 may be dispensed based on the dispense pattern.
  • source 38 may produce energy 40 , e.g., ultraviolet radiation, causing polymerizable material 34 to solidify and/or cross-link conforming to a shape of surface 44 of substrate 12 and patterning surface 22 , defining patterned layer 46 on substrate 12 .
  • Patterned layer 46 may comprise residual layer 48 a and a plurality of features shown as protrusions 50 a and recessions 52 a , with protrusions 50 a having thickness t 1 and residual layer having thickness t 3 .
  • thickness t 2 of residual layer 48 a may be determined.
  • a first etching composition may be applied to patterned layer 46 based on thickness t 3 of residual layer 48 a to control magnitude of critical dimension 70 of features 50 a and/or 52 a .
  • a second etching composition may be applied to patterned layer 46 to etch features 50 a and/or 52 a into substrate 12 .
  • Differing polymerizable material 34 may have different erosion rates under the same etching process. As such, polymerizable material 34 with slower erosion rates may retain substantially uniform critical dimension 70 during an etching process than polymerizable material 34 having a faster erosion rate.
  • critical dimension 70 of features 50 a and/or 52 a may be varied and/or controlled. For example, regions having a faster etch rate in an etch chamber may be imprinted using a slower-eroding polymerizable material 34 . The slower-eroding polymerizable material 34 may minimize variations in critical dimension 70 of features 50 a and/or 52 a .
  • regions that etch slower in an etch chamber may be imprinted using a faster-eroding polymerizable material 34 .
  • critical dimension 70 of features 50 a and/or 52 a may be controlled and/or be substantially uniform.
US12/392,685 2008-02-27 2009-02-25 Critical dimension control during template formation Abandoned US20090212012A1 (en)

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US12/392,685 US20090212012A1 (en) 2008-02-27 2009-02-25 Critical dimension control during template formation
PCT/US2009/001202 WO2009108322A2 (en) 2008-02-27 2009-02-26 Critical dimension control during template formation
EP09716103A EP2250020A4 (en) 2008-02-27 2009-02-26 CRITICAL DIMENSION CONTROL IN THE MANUFACTURE OF MATRICES
JP2010548716A JP5404654B2 (ja) 2008-02-27 2009-02-26 テンプレート形成時の限界寸法制御
US13/441,500 US8545709B2 (en) 2008-02-27 2012-04-06 Critical dimension control during template formation

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US3175908P 2008-02-27 2008-02-27
US10891408P 2008-10-28 2008-10-28
US12/392,685 US20090212012A1 (en) 2008-02-27 2009-02-25 Critical dimension control during template formation

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