US20080314754A1 - Increasing an electrical resistance of a resistor by nitridization - Google Patents
Increasing an electrical resistance of a resistor by nitridization Download PDFInfo
- Publication number
- US20080314754A1 US20080314754A1 US12/202,487 US20248708A US2008314754A1 US 20080314754 A1 US20080314754 A1 US 20080314754A1 US 20248708 A US20248708 A US 20248708A US 2008314754 A1 US2008314754 A1 US 2008314754A1
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- US
- United States
- Prior art keywords
- resistor
- electrical resistance
- oxygen
- electrolytic solution
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- -1 nitrogen ions Chemical class 0.000 claims abstract description 59
- 239000004065 semiconductor Substances 0.000 claims abstract description 44
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 23
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 19
- 238000002048 anodisation reaction Methods 0.000 claims abstract description 18
- 239000002344 surface layer Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 24
- 238000012360 testing method Methods 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 150000004767 nitrides Chemical class 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 5
- 229920005591 polysilicon Polymers 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 4
- 229910021332 silicide Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 238000011088 calibration curve Methods 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 description 62
- 229910052760 oxygen Inorganic materials 0.000 description 62
- 238000010438 heat treatment Methods 0.000 description 43
- 239000002245 particle Substances 0.000 description 41
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 39
- 239000007789 gas Substances 0.000 description 36
- 230000003647 oxidation Effects 0.000 description 30
- 238000007254 oxidation reaction Methods 0.000 description 30
- 230000005855 radiation Effects 0.000 description 21
- 239000000126 substance Substances 0.000 description 21
- 230000001590 oxidative effect Effects 0.000 description 17
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 description 8
- 239000001569 carbon dioxide Substances 0.000 description 8
- 230000007935 neutral effect Effects 0.000 description 7
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000001272 nitrous oxide Substances 0.000 description 6
- 150000002927 oxygen compounds Chemical class 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 229910017464 nitrogen compound Inorganic materials 0.000 description 3
- 150000002830 nitrogen compounds Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Chemical compound O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 239000004160 Ammonium persulphate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- 235000019395 ammonium persulphate Nutrition 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000002772 conduction electron Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/04—Treatment of selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/24—Nitriding
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/026—Anodisation with spark discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/26—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by converting resistive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0802—Resistors only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/8605—Resistors with PN junctions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/903—FET configuration adapted for use as static memory cell
- Y10S257/904—FET configuration adapted for use as static memory cell with passive components,, e.g. polysilicon resistors
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/914—Polysilicon containing oxygen, nitrogen, or carbon, e.g. sipos
Definitions
- the present invention provides a method and structure for increasing an electrical resistance of a resistor that is located within a semiconductor structure such as a semiconductor wafer, a semiconductor chip, and an integrated circuit.
- a resistor on a wafer may have its electrical resistance trimmed by using laser ablation to remove a portion of the resistor.
- the laser ablation may cut slots in the resistor.
- trimming a resistor by using laser ablation requires the resistor to have dimensions on the order of tens of microns.
- a method and structure is needed to increase the electrical resistance of a resistor on a wafer generally, and to increase the electrical resistance of a resistor having dimensions at a micron or sub-micron level.
- the present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
- the present invention provides an electrical structure, comprising:
- a semiconductor structure that includes a resistor
- the present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
- the present invention provides an electrical structure, comprising:
- a semiconductor structure that includes a resistor
- the present invention provides a method and structure for increasing an electrical resistance of a resistor on a wafer generally, and for increasing the electrical resistance of a resistor having dimensions at a micron or sub-micron level.
- FIG. 1 depicts a front cross-sectional view of a semiconductor structure that includes an electrical resistor, in accordance with embodiments of the present invention.
- FIG. 2 depicts FIG. 1 at an onset of exposure of a portion of the resistor to oxygen particles.
- FIG. 3 depicts FIG. 2 after exposure of the portion of the resistor to the oxygen particles.
- FIG. 4 depicts a front cross-sectional view of a heating chamber that includes the semiconductor structure of FIG. 2 and an oxygen-comprising gas, wherein the heating chamber generates heat that heats the semiconductor structure, in accordance with embodiments of the present invention.
- FIG. 5 depicts a front cross-sectional view of a chamber that includes the semiconductor structure of FIG. 2 and an oxygen-comprising gas, wherein the resistor of the semiconductor structure is heated by a directed beam of radiation or particles, in accordance with embodiments of the present invention.
- FIG. 6 depicts a front cross-sectional view of a plasma chamber that includes the semiconductor structure of FIG. 2 , in accordance with embodiments of the present invention.
- FIG. 7 depicts a front cross-sectional view of an anodization bath in which the semiconductor structure of FIG. 2 is partially immersed, in accordance with embodiments of the present invention.
- FIG. 8 depicts a front cross-sectional view of a chemical bath in which the resistor of the semiconductor structure of FIG. 2 is immersed, in accordance with embodiments of the present invention.
- FIG. 9 depicts FIG. 2 during exposure of the portion of the resistor to the oxygen particles, and with the resistor coupled to an electrical resistance measuring apparatus, in accordance with embodiments of the present invention.
- FIG. 1 illustrates a front cross-sectional view of a semiconductor structure 10 that includes an electrical resistor 14 within a semiconductor substrate 12 , in accordance with embodiments of the present invention.
- the electrical resistor 14 includes an electrically resistive material.
- the semiconductor structure 10 may include, inter alia, a semiconductor wafer, a semiconductor chip, an integrated circuit, etc.
- the substrate 12 comprises all portions of the semiconductor structure 10 (e.g., electronic devices including semiconductor devices, wiring levels, etc.) exclusive of the resistor 14 .
- the resistor 14 may have any electrical resistance functionality within the semiconductor substrate 12 and accordingly may exist within a semiconductor device, within an electrical circuit, etc.
- the resistor 14 includes an exposed surface 19 having a surface area S.
- FIG. 2 illustrates FIG. 1 at an onset of exposure of a portion 15 of the resistor 14 to oxygen particles 20 .
- the oxygen particles 20 may comprise oxygen-comprising molecules (e.g., molecular oxygen O 2 , carbon dioxide CO 2 , etc.) or oxygen ions, depending on which of several embodiments of the present invention is operative, as will be discussed infra.
- the oxygen-exposed portion 15 has an oxygen-exposed surface 17 (i.e.; the surface 17 is exposed to the oxygen particles 20 ).
- the resistor 14 includes an oxygen-unexposed portion 16 that has an oxygen-unexposed surface 18 (i.e.; the surface 18 is unexposed to the oxygen particles 20 ).
- the surface 19 see FIG.
- the oxygen-unexposed portion 16 and the associated surface 18 gives rise to a “partially exposed” embodiment, since the surface 19 will be partially exposed to the oxygen particles 20 (at the surface 17 ) such that S U >0.
- FIG. 3 illustrates FIG. 2 after the exposure of the portion 15 of the resistor 14 to the oxygen particles 20 .
- the exposure of the portion 15 of the resistor 14 for a finite time of exposure generates an oxidized region 22 within the portion 15 , wherein an unoxidized portion 24 of the resistor 14 remains.
- the oxidized region 22 is a fraction F of a surface layer of the resistor 14 , wherein the surface layer is a region defined as the oxidized region 22 projected to the side surfaces 25 and 26 of the resistor 14 .
- the oxidized region 22 has a thickness t that may increase as the time of exposure increases or may reach a self-limiting thickness. For oxidation processes which are diffusion dominated, the thickness t may vary, inter alia, as a square root of the time of exposure.
- the oxidized region 22 increases an electrical resistance of the resistor 14 associated with current flow either in a direction 6 or in a direction 7 , in comparison with an electrical resistance of the resistor 14 that existed before the oxidized region 22 was formed.
- the resistor 14 could be within an integrated circuit and, accordingly, FIG. 3 also shows in of the integrated circuit above the resistor 14 .
- the insulative layer 11 includes an insulative material 13 and an opening 23 , wherein the opening 23 which defines the resistor 14 that is potentially oxidizable in accordance with the present invention.
- the resistor 14 could be thought of as being “partially exposed” if the total resistor is defined as the resistor 14 in combination with the underneath or blocked resistive regions 28 .
- the present invention includes five embodiments for oxidizing the resistor 14 to increase the electrical resistance of the resistor 14 , namely: thermal oxidation using a heating chamber ( FIG. 4 ); thermal oxidation using a direct beam of radiation or particles ( FIG. 5 ); plasma oxidation ( FIG. 6 ); anodization ( FIG. 7 ); and chemical oxidation ( FIG. 8 ).
- thermal oxidation using a heating chamber FIG. 4
- thermal oxidation using a direct beam of radiation or particles FIG. 5
- plasma oxidation FIG. 6
- anodization FIG. 7
- chemical oxidation FIG. 8
- Nitridizing the resistor 14 as opposed to oxidizing the resistor 14 , means reacting the resistor 14 with nitrogen particles (instead of with the oxygen particles 20 ) in a manner that forms a nitride of the electrically resistive material of the resistor 14 comprises (instead of forming an oxide of electrically resistive material that the resistor 14 ).
- the nitrogen particles may be in molecular or ionic form depending on the operative embodiment.
- Partially exposed and “fully exposed” embodiments are applicable to nitridization of the resistor 14 , just as “partially exposed” and “fully exposed” embodiments are applicable to oxidation of the resistor 14 .
- all features and aspects of the five embodiments, as discussed infra, apply to nitridization of the resistor 14 just as said all features and aspects of the five embodiments apply to oxidation.
- FIG. 4 illustrates a front cross-sectional view of a heating chamber 30 that includes an oxygen-comprising gas 32 and the semiconductor structure 10 of FIG. 2 , in accordance with embodiments of the present invention.
- the gas 32 includes an oxygen compound such as, inter alia, molecular oxygen (O 2 ), nitrous oxide (N 2 O), carbon dioxide (CO 2 ), and carbon monoxide (CO).
- the heating chamber 30 is heated to a heating temperature and the resistor 14 is thus oxidized by the gas 32 to form an oxide region within the resistor 14 such as the oxide region 22 depicted supra in FIG. 3 .
- a thickness of the oxidized region increases as a time of exposure of the resistor 14 to the gas 32 increases.
- the oxygen concentration in the ambient gas 32 and the heating temperature, in combination should be sufficient to oxidize the resistor 14 .
- Said combinations depend on the chemistry of the oxidizing reaction between the resistor 14 and the gas 32 .
- the required oxygen concentration and heating temperature depends on a material composition of the resistor 14 and the gas 32 .
- the gas 32 may be non-flowing in the form of a volumetric distribution within the heating chamber 30 .
- the gas 32 may be in a flowing form at low flow, wherein the gas 32 contacts the resistor 14 . Since the flowing gas 32 originates from a source that is likely to be substantially cooler than the heating temperature, the oxygen flow rate should be sufficiently slow as to minimize or substantially eliminate heat transfer from the resistor 14 to the gas 32 .
- Such inhibition of heat transfer may by any method known to one of ordinary skill in the art.
- One such method is for the oxygen flow to be slow enough that the dominant mode of said heat transfer is by natural convection rather than by forced convection.
- An additional alternative using flowing oxygen includes preheating the gas 32 to a temperature sufficiently close to the heating temperature so that said heat transfer is negligible even if said heat transfer occurs by forced convection.
- the heating chamber 30 in FIG. 4 includes any volumetric enclosure capable of heating the semiconductor structure 10 placed therein.
- the heat within the heating chamber 30 may be directed toward the semiconductor structure 10 in the direction 37 from a heat source 34 above the semiconductor structure 10 .
- the heat within the heating chamber 30 may also be directed toward the semiconductor structure 10 in the direction 38 from a heat source 36 below the semiconductor structure 10 .
- Heat directed from the heat source 34 in the direction 37 is transferred to the surface 17 more directly than is heat directed from the heat source 36 in the direction 38 . Accordingly, the heat directed from the heat source 34 in the direction 37 is more efficient for raising the temperature at the surface 17 than is the heat directed from the heat source 36 in the direction 38 .
- Either or both of the heat sources 34 and 36 may be utilized in the heating chamber 30 .
- Either or both of the heat sources 34 and 36 may be a continuous heat source or a distributed array of discrete heat sources such as a distributed array of incandescent bulbs.
- the heating chamber 30 may be a furnace.
- any method of achieving the aforementioned heating temperature in the heating chamber 30 is within the scope of the present invention.
- the semiconductor structure 10 could be inserted into the heating chamber 30 when the heating chamber 30 is at ambient room temperature, followed by a rapid ramping up of temperature within the heating chamber 30 until the desired heating temperature is achieved therein.
- the heating temperature is spatially uniform at and near the resistor 14
- the oxidation of the resistor 14 in the direction 37 will be spatially uniform such that a thickness of the resultant oxide layer is about constant (see, e.g., the thickness t of the oxide layer 22 in FIG. 3 which is about constant).
- a spatially nonuniform heating temperature which would result in a oxide layer thickness that is not constant. Both uniform and nonuniform heating temperature distributions, and consequent uniform and nonuniform oxide layer thicknesses, are within the scope of the present invention.
- Suitable resistor 14 electrically resistive materials for being oxidized in the heating chamber 30 include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof.
- the aforementioned method of oxidizing the resistor 14 using the heating chamber 30 does not depend on the dimensions of the resistor 14 and is thus applicable if the resistor 14 has dimensions of 1 micron or less, and is likewise applicable if the resistor 14 has dimensions in excess of 1 micron.
- thermal nitridization using a heating chamber could be used as an alternative to thermal oxidation using a heating chamber.
- the gas 32 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N 2 ).
- FIG. 5 illustrates a front cross-sectional view of a chamber 40 that includes the semiconductor structure 10 of FIG. 2 and an oxygen-comprising gas 42 , wherein the resistor 14 of the semiconductor structure 10 is heated by a directed beam 46 of radiation or particles, in accordance with embodiments of the present invention.
- the gas 42 includes an oxygen compound such as, inter alia, molecular oxygen (O 2 ), nitrous oxide (N 2 O), carbon dioxide (CO 2 ), and carbon monoxide (CO).
- the gas 42 may be non-flowing or flowing as discussed supra in conjunction with the gas 32 of FIG. 4
- the portion 15 of the resistor 14 is heated to a heating temperature by the directed beam 46 , and the portion 15 is thus oxidized by the gas 32 to form an oxide region within the resistor 14 such as the oxide region 22 depicted supra in FIG. 3 .
- a thickness of the oxidized region increases as a time of exposure of the resistor 14 to the directed beam 46 increases.
- the thickness of the oxidized region also increases as an energy flux of the directed beam 46 increases.
- the directed beam 46 may include radiation (e.g., laser radiation), or alternatively, a beam of particles (e.g., electrons, protons, ions, etc.).
- the directed beam 46 must be sufficiently energetic to provide the required heating of the resistor 14 , and a minimum required energy flux of the directed beam 46 depends on a material composition of the resistor 14 . Additionally, the directed beam 46 should be sufficiently focused so that the aforementioned energy flux requirement is satisfied.
- the laser radiation may comprise a continuous laser radiation or a pulsed laser radiation.
- the resistor 14 comprises a metal, then the present invention will be effective for a wide range of wavelengths of the laser radiation, since a metal is characterized by a continuum of energy levels of the conduction electrons rather than discrete energy levels for absorbing the laser radiation.
- the directed beam 46 which is generated by a source 44 , may be directed to the oxygen-exposed portion 15 of the resistor 14 in a manner that the oxygen-unexposed portion 16 of the resistor 14 exists.
- the source 44 may include a laser whose spot size area is less than the surface area S of the total surface 19 (see FIG. 1 ) of the resistor 14 , and the associated directed beam 46 includes radiation from the laser of the source 44 .
- the laser beam may traverse less than the total surface 19 .
- the source 44 may generate the directed beam 46 as the beam of particles, which impart energy to the resistor 14 and thus heat the resistor 14 .
- the directed beam 46 may be localized to the surface 17 which requires that the directed beam 46 be sufficiently anisotropic; i.e., sufficiently localized to the direction 37 by the source 44 , which depends on physical and operational characteristics of the source 44 . Accordingly, if the directed beam 46 is localized to the surface 17 , then FIG. 5 would exemplify a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (see FIG. 2 ) exists (i.e., S U >0 and F ⁇ 1). Alternatively, FIG. 5 may also exemplify a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (see FIG.
- a spatial extent of partial or total exposure to, and associated reaction with, the oxygen-comprising gas 42 may be controlled by adjusting the size (i.e., area) of the directed beam 46 and/or by scanning the directed beam 46 across portions of the total surface 19 (see FIG. 1 ).
- the oxygen concentration in the gas 32 and the heating temperature, in combination, should be sufficient to oxidize the resistor 14 , and depends on the chemistry of the oxidizing reaction between the resistor 14 and the gas 32 as discussed supra in conjunction with FIG. 4 .
- An ability to achieve the required temperature depends on the directed beam 46 being sufficiently energetic so as to impart enough energy to the portion 15 of the resistor 14 to facilitate the heating and consequent oxidation of the portion 15 .
- the energy of the directed beam 46 is controlled at its source 44 .
- an advantage of using the directed beam 46 of FIG. 5 instead of the heating chamber 30 of FIG. 4 to heat the resistor 14 is the ability to heat less than the total exposed surface area 19 of the resistor 14 .
- Another advantage is that said heating of the semiconductor structure 10 by the heating chamber 30 could potentially damage thermally-sensitive portions of the semiconductor structure 10 which cannot tolerate the temperature elevation caused by the heating chamber 30 .
- the localized heating by the directed beam 46 advantageously does not expose said thermally-sensitive portions of the semiconductor structure 10 to potential thermally-induced damage.
- Suitable resistor 14 electrically resistive materials for being oxidized while being heated by the directed beam 46 include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof.
- the directed beam 46 is required to be confined to the surface 19 (see FIG. 1 ) of the resistor 14 (i.e., if the directed beam 46 should not strike any surface of the resistor 14 other than the surface 19 ), then dimensions of the surface 19 should be no smaller than a smallest surface area on which the directed beam 46 could be focused. For example, if the directed beam 46 includes laser radiation and the source 44 includes a laser, then the dimensions of the portion 15 of the resistor 14 may be no smaller than a laser spot dimension.
- the portion 15 of the resistor 14 may have dimensions of 1 micron or less (to an extent possible with prevailing laser technology at a time when the present invention is practiced), as well as dimensions exceeding 1 micron, when the directed beam 46 includes the laser radiation.
- thermal nitridization using a directed beam of radiation or particles could be used as an alternative to thermal oxidation using a directed beam of radiation or particles.
- the gas 42 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N 2 ).
- FIG. 6 illustrates a front cross-sectional view of a plasma chamber 50 that comprises the semiconductor structure 10 of FIG. 2 , in accordance with embodiments of the present invention.
- the plasma chamber 50 includes an electrode 54 and an electrode 55 .
- the semiconductor structure 10 has been disposed between the electrode 54 and the electrode 55 .
- the plasma chamber 50 also includes oxygen ions 52 which are formed in generation of a plasma gas, as will be explained infra.
- a neutral gas within the plasma chamber 50 includes an oxygen compound such as, inter alia, molecular oxygen (O 2 ), nitrous oxide (N 2 O), carbon dioxide (CO 2 ), and carbon monoxide (CO).
- the plasma chamber 50 may also include one or more noble gases (e.g., argon, helium, nitrogen, etc.) to perform such functions as: acting as a carrier gas, providing electric charge needed for forming ionic species of the plasma, assisting in confining the plasma to within fixed boundaries, assisting in developing a target plasma density or a target plasma density range, and promoting excited state plasma lifetimes.
- noble gases e.g., argon, helium, nitrogen, etc.
- a power supply 56 generates an electrical potential between the electrode 54 and the electrode 55 .
- the power supply 56 may be of any type known to one skilled in the art such as, inter alia: a radio frequency (RF) power supply; a constant voltage pulsed power supply (see, e.g., U.S. Pat. No. 5,917,286, June 1999, Scholl et al.); and a direct current (DC) voltage source (see, e.g., U.S. Pat. No. 4,292,384, September 1981, Straughan et al.). Pertinent characteristics of the power supply 56 are in accordance with such characteristics as are known in the art.
- a RF power supply may include, inter alia, a radio frequency selected from a wide range of frequencies such as a commonly used frequency of 13.56 Hz.
- the power requirements of the RF power supply depends on the surface area 17 of the resistor 14 and is thus case dependent.
- a typical range of power of the RF power supply may be, inter alia, between about 100 watts and about 2000 watts.
- the electrical potential generated by the power supply 56 ionizes the neutral gas to form a plasma between the electrode 54 and the electrode 55 , wherein the plasma comprises electrons and ions, and wherein a plasma ion polarity depends on the particular neutral gas within the plasma chamber 50 .
- the neutral gas includes molecular oxygen
- a three-component plasma may be formed including electrons, positive oxygen ions, and negative oxygen ions, such that in the glow discharge a predominant positive ion is O 2 + and a lesser positive ionic species is O + . See U.S. Pat. No. 5,005,101 (Gallagher et al.; April 1991; col. 6, lines 1-12).
- a DC power supply 57 has terminals 58 and 59 , wherein the terminal 58 is positive with respect to a ground 51 , and the terminal 59 is negative with respect to the terminal 58 .
- the DC power supply 57 generates an electric field that is directed from the electrode 54 to the electrode 55 , and the electric field is capable of accelerating positive ions from the electrode 54 toward the electrode 55 in the direction 37 . Accordingly, if the oxygen ions 52 are positive oxygen ions (e.g., O 2 + ), then the electric field accelerates the oxygen ions 52 of the plasma toward the electrode 55 causing the oxygen ions 52 to strike the portion 15 of the resistor.
- the oxygen ions 52 are sufficiently energetic (i.e., if the oxygen ions 52 have a minimum or threshold energy) as required to oxidize the portion 15 of the resistor 14 , then the oxygen ions 52 will so oxidize the portion 15 and thus form an oxidized region within the resistor 14 , such as the oxidized region 22 depicted supra in FIG. 3 .
- a thickness of the oxidized region increases as a time of exposure of the resistor 14 to the accelerated oxygen ionic species 52 increases.
- the oxygen ions 52 are negative oxygen ions to be accelerated toward the resistor 14 and reacted with the resistor 14 , then the polarities of the terminals 58 and 59 should be reversed (i.e., the terminals 58 and 59 should have negative and positive polarities, respectively).
- a factor in determining whether positive or negative oxygen ions 52 are to be reacted with the resistor 14 includes consideration of the chemical reactions between said accelerated oxygen ions 52 and the electrically resistive material of the resistor 14 , since characteristics of said chemical reactions (e.g., reaction energetics, reaction rate, etc.) may be a function of the polarity of the reacting ionic oxygen species 52 .
- the accelerated oxygen ions 52 transfer energy to the resistor 14 to provide at least the threshold energy required for effectuating the chemical reaction between the oxygen ions 52 and the resistor 14 , and such energy transferred substitutes for thermal energy (i.e., heat) provided by the heating chamber 30 of FIG. 4 , or by the directed beam 46 of radiation or particles of FIG. 5 , to the resistor 14 .
- a voltage output of the DC power supply 57 must be sufficient to accelerate the oxygen ions 52 to at least the aforementioned threshold energy.
- FIG. 6 depicts a particular plasma chamber 50 configuration for oxidizing the resistor 14 , any plasma configuration known to one of ordinary skill in the art may be used.
- Suitable resistor 14 electrically resistive materials for being subject to plasma oxidation include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof.
- the aforementioned method of oxidizing the resistor 14 using plasma oxidation does not depend on the dimensions of the resistor 14 and is thus applicable if the resistor 14 has dimensions of 1 micron or less, and is likewise applicable if the resistor 14 has dimensions in excess of 1 micron.
- plasma nitridization using a directed beam of radiation or particles could be used as an alternative to plasma oxidation using a directed beam of radiation or particles.
- the neutral gas within the plasma chamber 50 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N 2 ).
- FIG. 7 illustrates a front cross-sectional view of an anodization bath 60 , in accordance with embodiments of the present invention.
- anodizing a first conductive material such as a semiconductor or metal requires immersing into an electrolytic solution both the first conductive material and a second conductive material, and passing a DC current at a sufficient voltage through the electrolytic solution.
- An anodization electrical circuit 69 includes a DC power supply 64 , an electrolytic solution 61 which includes oxygen, the semiconductor structure 10 of FIG. 2 wherein the resistor 14 is partially immersed in the electrolytic solution 61 , and an electrode 63 partially immersed in the electrolytic solution 61 .
- “Partially immersed” includes “totally immersed” (i.e., 100% immersed) as a special case.
- the resistor 14 is made of the electrically resistive material which includes the first conductive material that serves as an anode, and the electrode 63 is made of the second conductive material that serves as a cathode.
- the second conductive material of the cathode may include any inert metal (e.g., platinum) that does not react with the electrolytic solution 61 .
- the resistor 14 is made anodic by electrically coupling the resistor 14 to a positive terminal 65 of the DC power supply 64 .
- the electrode 63 is made cathodic by electrically coupling the electrode 63 to a negative terminal 66 of the DC power supply 64 .
- the anodization may be performed at or above ambient room temperature.
- a thickness of an oxide film formed with the resistor 14 is a function of a voltage output from the DC power supply 64 and the current density in the anodization circuit 69 . The specific voltage and current density is application dependent and would be selected from known art by one of ordinary skill in the art.
- anodization of tantalum or tantalum nitride at ambient room temperature and at with a current density of about 0.1 milliamp/cm 2 in an electrolytic solution of citric acid will generate an oxide (i.e., tantalum pentoxide Ta 2 O 5 ) film thickness of 20 ⁇ per volt.
- an applied voltage of about 25 volts the Ta 2 O 5 film thickness is about 500 ⁇ .
- Suitable resistor 14 electrically resistive materials for being anodized include, inter alia, Suitable cathode 63 materials include, inter alia tantalum, titanium, polysilicon, aluminum, tungsten, nitrides thereof, and alloys thereof.
- a electrolyte containing oxygen that can be used depends on the electrically resistive material to be anodized and is therefore case specific. Thus, any electrolyte containing oxygen that is compatible with said electrically resistive material may be selected as would be known or apparent to one of ordinary skill in the art.
- an electrolytic reaction occurs at the surface 17 of the resistor 14 to generate hydrogen ions, electrons, and oxygen ions 62 from the electrolytic solution.
- the oxygen ions 62 chemically react with the portion 15 of the resistor 14 such that an oxidized region, such as the oxidized region 22 depicted supra in FIG. 3 , forms within the portion 15 of the resistor 14 .
- the generated hydrogen ions and electrons combine at the cathode 63 to form hydrogen gas.
- FIG. 7 shows the portion 16 of the resistor 14 above an electrolyte level 67 .
- FIG. 7 may exemplify a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (see FIG. 2 ) exists (i.e., S U >0 and F ⁇ 1).
- FIG. 7 exemplifies either a “partially exposed” embodiment or a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (see FIG. 2 ) exists or does not exist, respectively.
- a thickness of the oxidized region increases as a time of the electrolytic reaction increases.
- a current drawn by the anodizing bath 60 decreases due to increasing isolation of the portion 15 of the resistor 14 from the electrolytic solution 61 as the thickness of the oxidized layer increases.
- the anodization process may eventually self terminate, because said current is eventually reduced to a negligible value.
- the aforementioned method of oxidizing the resistor 14 using anodization does not depend on the dimensions of the resistor 14 and is thus applicable if the portion 15 of the resistor 14 has dimensions of 1 micron or less, and is likewise applicable if the portion 15 of the resistor 14 has dimensions in excess of 1 micron.
- anodization that causes nitridization of the resistor 14 could be used as an alternative to anodization that causes oxidation of the resistor 14 .
- the electrolytic solution 61 would include nitrogen instead of oxygen.
- An electrolyte containing nitrogen that can be used depends on the electrically resistive material to be anodized and is therefore case specific. Thus, any electrolyte containing nitrogen that is compatible with said electrically resistive material may be selected as would be known or apparent to one of ordinary skill in the art.
- FIG. 8 illustrates a front cross-sectional view of a chemical bath 70 , in accordance with embodiments of the present invention.
- the chemical bath 70 comprises a chemical solution 71 .
- the semiconductor structure 10 of FIG. 2 is immersed in the chemical solution 71 .
- the chemical solution 71 includes oxygen particles 72 in such form as oxygen-comprising liquid molecules, oxygen ions, or an oxygen-comprising gas (e.g., oxygen gas or ozone gas) dissolved in the chemical solution 71 under pressurization.
- the oxygen particles 72 chemically react with the resistor 14 to form an oxidized region within the resistor 14 such as the oxidized region 22 depicted supra in FIG. 3 .
- a thickness of the oxidized region increases as a time of the chemical reaction increases.
- the chemical reaction may be exothermic or endothermic, depending on the electrically resistive material of the resistor 14 and the oxygen particles 72 . If the chemical reaction is endothermic, an addition of a sufficient amount of heat is required. Additionally, a suitable catalyst may be utilized to accelerate the chemical reaction.
- the catalyst may be any catalyst known to one of ordinary skill in the art for the particular chemical reaction.
- Suitable resistor 14 electrically resistive materials for being chemically oxidized include, inter alia, copper, tungsten, aluminum, titanium, nitrides thereof, and alloys thereof.
- Suitable chemical solutions 71 include, inter alia, hydrogen peroxide, ferric nitrate, ammonium persulphate, etc.
- FIG. 8 would represent a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (See FIG. 2 ) exists (i.e., S U >0 and F ⁇ 1). Accordingly, FIG. 8 exemplifies either a “partially exposed” embodiment or a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (see FIG. 2 ) exists or does not exist, respectively.
- the aforementioned method of oxidizing the resistor 14 using chemical oxidation does not depend on the dimensions of the resistor 14 and is thus applicable if the resistor 14 has dimensions of 1 micron or less, and is likewise applicable if the resistor 14 has dimensions in excess of 1 micron.
- chemical nitridization of the resistor 14 could be used as an alternative to chemical oxidation of the resistor 14 . If chemical nitridization is employed instead of chemical oxidation, then the chemical solution 71 would include nitrogen particles instead of the oxygen particles 72 .
- the resistor 14 may be tested prior to being oxidized or nitridized, while being oxidized or nitridized (i.e., in situ), and/or after being oxidized or nitridized.
- the resistance testing may be accomplished by a conventional test apparatus, such as with a four-point resistance test having four contacts to the resistor with two of the contacts coupled to a known current source outputting a current I and the other two contacts coupled to a voltage meter that measures a voltage V across the resistance to be determined, and the measured resistance is thus V/I.
- the resistance testing may be accomplished with an inline measuring circuit within the same integrated circuit that includes the resistor, wherein the measuring circuit is coupled to instrumentation that outputs the measured resistance.
- FIG. 9 illustrates FIG. 2 during exposure of the portion 15 of the resistor 14 to the oxygen particles 20 , and with the resistor 14 coupled to an electrical resistance measuring apparatus 85 .
- the electrical resistance measuring apparatus 85 may include the conventional test apparatus or the inline measuring circuit, mentioned supra.
- the electrical resistance measuring apparatus 85 may be conductively coupled to surfaces 81 and 82 of the resistor 14 by conductive interconnects (e.g., conductive wiring) 86 and 87 , respectively. Accordingly, the electrical resistance measuring apparatus 85 is capable of measuring an electrical resistance of the resistor 14 (before, during, and after oxidation or nitridization of the resistor 14 ) associated with current flowing in the direction 7 through the resistor 14 .
- the electrical resistance measuring apparatus 85 may be used to measure an electrical resistance of the resistor 14 associated with current flowing in the direction 6 through the resistor 14 (before, during, and after oxidation or nitridization of the resistor 14 ) if the conductive interconnects 86 and 87 are coupled to bounding surfaces 83 and 84 of the resistor 14 instead of to the surfaces 81 and 82 , respectively.
- the surface 83 in FIG. 9 corresponds to the surface 19 in FIG. 1 .
- the resistor 14 includes an oxidized (or nitridized) region 21 , which corresponds to the oxidized (or nitridized) region 22 of FIG. 3 .
- the semiconductor structure 10 is within an oxidizing (or nitridizing) environment 80 , which includes any oxidizing (or nitridizing) environment within the scope of the present invention such, inter alia, the heating chamber 30 of FIG. 4 , the chamber 40 of FIG. 5 , the plasma chamber 50 of FIG. 6 , the anodization bath 60 of FIG. 7 , and the chemical bath 70 of FIG. 8 .
- the electrical resistance measuring apparatus 85 is any apparatus, as is known to one of ordinary skill in the art, capable of measuring an electrical resistance of the resistor 14 .
- the following discussion describes how the electrical resistance measuring apparatus 85 of FIG. 9 can be used for in situ testing to control the electrical resistance acquired by the resistor 14 after being exposed to the oxygen particles 20 .
- the following discussion applies to any of the embodiments described supra (i.e., thermal oxidation or nitridization using a heating chamber, thermal oxidation or nitridization using a directed beam of radiation or particles, plasma oxidation/nitridization, anodization, and chemical oxidation/nitridization).
- R 1 denote an electrical resistance of the resistor 14 prior to being oxidized or nitridized.
- R 2 denote a final electrical resistance of the resistor 14 (i.e., an electrical resistance of the resistor 14 after being oxidized or nitridized).
- the target electrical resistance R t is application dependent.
- R t may be a function of a capacitance in the circuit, wherein for the given capacitance, R t has a value that constrains the width of a resonance peak to a predetermined upper limit.
- the predetermined resistance R t together with the associated resistance tolerance ⁇ R t , may be provided for the intended application.
- the resistor 14 may have its electrical resistance tested during or after the exposure of the resistor 14 to the oxygen particles 20 .
- the thickness t of the oxidized (or nitridized) region 22 increases as the time of said exposure increases, and the electrical resistance of the resistor 14 increases as the thickness t increases.
- the final electrical resistance may be controlled by selection of the time of exposure.
- the time of exposure may be selected based on any method or criteria designed to obtain R 2 as being within R t ⁇ t (i.e., R t ⁇ t ⁇ R 2 ⁇ R t + ⁇ R t ). For example, calibration curves derived from prior experience may be used for determining the time of exposure that results in R 2 being within R t ⁇ R t .
- An iterative testing procedure may be utilized such that the electrical resistance of the resistor 14 is tested during the exposing of the resistor 14 to the oxygen particles 20 and thus during the oxidizing (or nitridizing) of the resistor 14 .
- the testing during the exposing of the resistor 14 to the oxygen particles 20 determines continuously or periodically whether R 2 ′′ is within R t ⁇ R t , wherein R 2 ′′ is the latest resistance of the resistor 14 as determined by the testing.
- the testing is terminated if R 2 ′′ is within R t ⁇ R t or if (R 2 ′′ ⁇ R 1 )(R t ⁇ R 2 ′′) ⁇ 0.
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Abstract
Description
- This application is a divisional application claiming priority to Ser. No. 11/836,308, filed Aug. 9, 2007, which is a divisional of U.S. Pat. No. 7,351,639, issued Apr. 1, 2008, which is a divisional of U.S. Pat. No. 6,730,984, issued May 4, 2004.
- 1. Technical Field
- The present invention provides a method and structure for increasing an electrical resistance of a resistor that is located within a semiconductor structure such as a semiconductor wafer, a semiconductor chip, and an integrated circuit.
- 2. Related Art
- A resistor on a wafer may have its electrical resistance trimmed by using laser ablation to remove a portion of the resistor. For example, the laser ablation may cut slots in the resistor. With existing technology, however, trimming a resistor by using laser ablation requires the resistor to have dimensions on the order of tens of microns. A method and structure is needed to increase the electrical resistance of a resistor on a wafer generally, and to increase the electrical resistance of a resistor having dimensions at a micron or sub-micron level.
- The present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
- providing a semiconductor structure that includes the resistor; and
- oxidizing a fraction F of a surface layer of the resistor with oxygen particles, resulting in the increasing of the electrical resistance of the resistor.
- The present invention provides an electrical structure, comprising:
- a semiconductor structure that includes a resistor; and
- oxygen particles in an oxidizing reaction with a fraction F of a surface layer of the resistor, wherein the oxidizing reaction increases an electrical resistance of the resistor.
- The present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
- providing a semiconductor structure that includes the resistor; and
- nitridizing a fraction F of a surface layer of the resistor with nitrogen particles, resulting in the increasing of the electrical resistance of the resistor.
- The present invention provides an electrical structure, comprising:
- a semiconductor structure that includes a resistor; and
- nitrogen particles in an nitridizing reaction with a fraction F of a surface layer of the resistor, wherein the nitridizing reaction increases an electrical resistance of the resistor.
- The present invention provides a method and structure for increasing an electrical resistance of a resistor on a wafer generally, and for increasing the electrical resistance of a resistor having dimensions at a micron or sub-micron level.
-
FIG. 1 depicts a front cross-sectional view of a semiconductor structure that includes an electrical resistor, in accordance with embodiments of the present invention. -
FIG. 2 depictsFIG. 1 at an onset of exposure of a portion of the resistor to oxygen particles. -
FIG. 3 depictsFIG. 2 after exposure of the portion of the resistor to the oxygen particles. -
FIG. 4 depicts a front cross-sectional view of a heating chamber that includes the semiconductor structure ofFIG. 2 and an oxygen-comprising gas, wherein the heating chamber generates heat that heats the semiconductor structure, in accordance with embodiments of the present invention. -
FIG. 5 depicts a front cross-sectional view of a chamber that includes the semiconductor structure ofFIG. 2 and an oxygen-comprising gas, wherein the resistor of the semiconductor structure is heated by a directed beam of radiation or particles, in accordance with embodiments of the present invention. -
FIG. 6 depicts a front cross-sectional view of a plasma chamber that includes the semiconductor structure ofFIG. 2 , in accordance with embodiments of the present invention. -
FIG. 7 depicts a front cross-sectional view of an anodization bath in which the semiconductor structure ofFIG. 2 is partially immersed, in accordance with embodiments of the present invention. -
FIG. 8 depicts a front cross-sectional view of a chemical bath in which the resistor of the semiconductor structure ofFIG. 2 is immersed, in accordance with embodiments of the present invention. -
FIG. 9 depictsFIG. 2 during exposure of the portion of the resistor to the oxygen particles, and with the resistor coupled to an electrical resistance measuring apparatus, in accordance with embodiments of the present invention. -
FIG. 1 illustrates a front cross-sectional view of asemiconductor structure 10 that includes anelectrical resistor 14 within asemiconductor substrate 12, in accordance with embodiments of the present invention. Theelectrical resistor 14 includes an electrically resistive material. Thesemiconductor structure 10 may include, inter alia, a semiconductor wafer, a semiconductor chip, an integrated circuit, etc. Thesubstrate 12 comprises all portions of the semiconductor structure 10 (e.g., electronic devices including semiconductor devices, wiring levels, etc.) exclusive of theresistor 14. Theresistor 14 may have any electrical resistance functionality within thesemiconductor substrate 12 and accordingly may exist within a semiconductor device, within an electrical circuit, etc. Theresistor 14 includes an exposedsurface 19 having a surface area S. -
FIG. 2 illustratesFIG. 1 at an onset of exposure of aportion 15 of theresistor 14 tooxygen particles 20. Theoxygen particles 20 may comprise oxygen-comprising molecules (e.g., molecular oxygen O2, carbon dioxide CO2, etc.) or oxygen ions, depending on which of several embodiments of the present invention is operative, as will be discussed infra. The oxygen-exposedportion 15 has an oxygen-exposed surface 17 (i.e.; thesurface 17 is exposed to the oxygen particles 20). Theresistor 14 includes an oxygen-unexposed portion 16 that has an oxygen-unexposed surface 18 (i.e.; thesurface 18 is unexposed to the oxygen particles 20). The surface 19 (seeFIG. 1 ) comprises thesurfaces FIG. 1 ) is SE+SU. InFIG. 2 , the oxygen-unexposed portion 16 and the associatedsurface 18, if present, gives rise to a “partially exposed” embodiment, since thesurface 19 will be partially exposed to the oxygen particles 20 (at the surface 17) such that SU>0. The oxygen-unexposed portion 16 and the associatedsurface 18, if not present, gives rise to a “totally exposed” embodiment, since thesurface 19 will be totally exposed to the oxygen particles 20 (at the surface 17) such that SU=0. -
FIG. 3 illustratesFIG. 2 after the exposure of theportion 15 of theresistor 14 to theoxygen particles 20. The exposure of theportion 15 of theresistor 14 for a finite time of exposure generates anoxidized region 22 within theportion 15, wherein anunoxidized portion 24 of theresistor 14 remains. The oxidizedregion 22 is a fraction F of a surface layer of theresistor 14, wherein the surface layer is a region defined as the oxidizedregion 22 projected to theside surfaces 25 and 26 of theresistor 14. The fraction F is in a range of 0<F≦1, wherein 0<F<1 corresponds to the “partially exposed” embodiment, and F=1 corresponds to the “totally exposed” embodiment, discussed supra. The oxidizedregion 22 has a thickness t that may increase as the time of exposure increases or may reach a self-limiting thickness. For oxidation processes which are diffusion dominated, the thickness t may vary, inter alia, as a square root of the time of exposure. The oxidizedregion 22 increases an electrical resistance of theresistor 14 associated with current flow either in adirection 6 or in adirection 7, in comparison with an electrical resistance of theresistor 14 that existed before the oxidizedregion 22 was formed. - The
resistor 14 could be within an integrated circuit and, accordingly,FIG. 3 also shows in of the integrated circuit above theresistor 14. Theinsulative layer 11 includes aninsulative material 13 and anopening 23, wherein theopening 23 which defines theresistor 14 that is potentially oxidizable in accordance with the present invention. Note that there may beresistive regions 28 underneath theinsulative material 13 and thus blocked by theinsulative material 13. Accordingly, the underneath or blockedresistive regions 28 are not oxidizable in accordance with the present invention. Although not explicated or discussed in the embodiments described infra, theresistor 14 could be thought of as being “partially exposed” if the total resistor is defined as theresistor 14 in combination with the underneath or blockedresistive regions 28. - The present invention includes five embodiments for oxidizing the
resistor 14 to increase the electrical resistance of theresistor 14, namely: thermal oxidation using a heating chamber (FIG. 4 ); thermal oxidation using a direct beam of radiation or particles (FIG. 5 ); plasma oxidation (FIG. 6 ); anodization (FIG. 7 ); and chemical oxidation (FIG. 8 ). The following discussion will describe these embodiments and explain how in situ testing can be used to control the electrical resistance acquired by theresistor 14 after being exposed to the oxygen particles 20 (FIG. 9 ). - While the five embodiments mentioned supra and discussed infra specifically describe oxidizing the
resistor 14, the five embodiments mentioned supra and discussed infra are each applicable to changing an the resistance of theresistor 14 by nitridizing as an alternative to oxidizing. Nitridizing theresistor 14, as opposed to oxidizing theresistor 14, means reacting theresistor 14 with nitrogen particles (instead of with the oxygen particles 20) in a manner that forms a nitride of the electrically resistive material of theresistor 14 comprises (instead of forming an oxide of electrically resistive material that the resistor 14). As with theoxygen particles 20, the nitrogen particles may be in molecular or ionic form depending on the operative embodiment. “Partially exposed” and “fully exposed” embodiments are applicable to nitridization of theresistor 14, just as “partially exposed” and “fully exposed” embodiments are applicable to oxidation of theresistor 14. Unless noted otherwise herein, all features and aspects of the five embodiments, as discussed infra, apply to nitridization of theresistor 14 just as said all features and aspects of the five embodiments apply to oxidation. -
FIG. 4 illustrates a front cross-sectional view of aheating chamber 30 that includes an oxygen-comprisinggas 32 and thesemiconductor structure 10 ofFIG. 2 , in accordance with embodiments of the present invention. Thegas 32 includes an oxygen compound such as, inter alia, molecular oxygen (O2), nitrous oxide (N2O), carbon dioxide (CO2), and carbon monoxide (CO). - The
heating chamber 30 is heated to a heating temperature and theresistor 14 is thus oxidized by thegas 32 to form an oxide region within theresistor 14 such as theoxide region 22 depicted supra inFIG. 3 . A thickness of the oxidized region (see, e.g., the thickness t of the oxidizedregion 22 described supra forFIG. 3 ) increases as a time of exposure of theresistor 14 to thegas 32 increases.FIG. 4 exemplifies a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) of theresistor 14 does not exist (i.e., SU=0 and F=1), and thesurface 17 is the total surface 19 (seeFIG. 1 ) that is oxidized. InFIG. 4 , the oxygen concentration in theambient gas 32 and the heating temperature, in combination, should be sufficient to oxidize theresistor 14. Said combinations depend on the chemistry of the oxidizing reaction between theresistor 14 and thegas 32. Thus, the required oxygen concentration and heating temperature depends on a material composition of theresistor 14 and thegas 32. - The
gas 32 may be non-flowing in the form of a volumetric distribution within theheating chamber 30. Alternatively, thegas 32 may be in a flowing form at low flow, wherein thegas 32 contacts theresistor 14. Since the flowinggas 32 originates from a source that is likely to be substantially cooler than the heating temperature, the oxygen flow rate should be sufficiently slow as to minimize or substantially eliminate heat transfer from theresistor 14 to thegas 32. Such inhibition of heat transfer may by any method known to one of ordinary skill in the art. One such method is for the oxygen flow to be slow enough that the dominant mode of said heat transfer is by natural convection rather than by forced convection. An additional alternative using flowing oxygen includes preheating thegas 32 to a temperature sufficiently close to the heating temperature so that said heat transfer is negligible even if said heat transfer occurs by forced convection. - The
heating chamber 30 inFIG. 4 includes any volumetric enclosure capable of heating thesemiconductor structure 10 placed therein. The heat within theheating chamber 30 may be directed toward thesemiconductor structure 10 in thedirection 37 from aheat source 34 above thesemiconductor structure 10. The heat within theheating chamber 30 may also be directed toward thesemiconductor structure 10 in thedirection 38 from aheat source 36 below thesemiconductor structure 10. Heat directed from theheat source 34 in thedirection 37 is transferred to thesurface 17 more directly than is heat directed from theheat source 36 in thedirection 38. Accordingly, the heat directed from theheat source 34 in thedirection 37 is more efficient for raising the temperature at thesurface 17 than is the heat directed from theheat source 36 in thedirection 38. Either or both of theheat sources heating chamber 30. Either or both of theheat sources heating chamber 30 may be a furnace. - Any method of achieving the aforementioned heating temperature in the
heating chamber 30 is within the scope of the present invention. For example, thesemiconductor structure 10 could be inserted into theheating chamber 30 when theheating chamber 30 is at ambient room temperature, followed by a rapid ramping up of temperature within theheating chamber 30 until the desired heating temperature is achieved therein. If the heating temperature is spatially uniform at and near theresistor 14, then the oxidation of theresistor 14 in thedirection 37 will be spatially uniform such that a thickness of the resultant oxide layer is about constant (see, e.g., the thickness t of theoxide layer 22 inFIG. 3 which is about constant). A spatially nonuniform heating temperature which would result in a oxide layer thickness that is not constant. Both uniform and nonuniform heating temperature distributions, and consequent uniform and nonuniform oxide layer thicknesses, are within the scope of the present invention. -
Suitable resistor 14 electrically resistive materials for being oxidized in theheating chamber 30 include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof. - The aforementioned method of oxidizing the
resistor 14 using theheating chamber 30 does not depend on the dimensions of theresistor 14 and is thus applicable if theresistor 14 has dimensions of 1 micron or less, and is likewise applicable if theresistor 14 has dimensions in excess of 1 micron. - As stated supra, thermal nitridization using a heating chamber could be used as an alternative to thermal oxidation using a heating chamber. If nitridization is employed, the
gas 32 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N2). -
FIG. 5 illustrates a front cross-sectional view of achamber 40 that includes thesemiconductor structure 10 ofFIG. 2 and an oxygen-comprisinggas 42, wherein theresistor 14 of thesemiconductor structure 10 is heated by a directedbeam 46 of radiation or particles, in accordance with embodiments of the present invention. Thegas 42 includes an oxygen compound such as, inter alia, molecular oxygen (O2), nitrous oxide (N2O), carbon dioxide (CO2), and carbon monoxide (CO). Thegas 42 may be non-flowing or flowing as discussed supra in conjunction with thegas 32 ofFIG. 4 - The
portion 15 of theresistor 14 is heated to a heating temperature by the directedbeam 46, and theportion 15 is thus oxidized by thegas 32 to form an oxide region within theresistor 14 such as theoxide region 22 depicted supra inFIG. 3 . A thickness of the oxidized region (see, e.g., the thickness t of the oxidizedregion 22 described supra forFIG. 3 ) increases as a time of exposure of theresistor 14 to the directedbeam 46 increases. The thickness of the oxidized region also increases as an energy flux of the directedbeam 46 increases. The directedbeam 46 may include radiation (e.g., laser radiation), or alternatively, a beam of particles (e.g., electrons, protons, ions, etc.). The directedbeam 46 must be sufficiently energetic to provide the required heating of theresistor 14, and a minimum required energy flux of the directedbeam 46 depends on a material composition of theresistor 14. Additionally, the directedbeam 46 should be sufficiently focused so that the aforementioned energy flux requirement is satisfied. - If the directed
beam 46 includes laser radiation, then the laser radiation may comprise a continuous laser radiation or a pulsed laser radiation. If theresistor 14 comprises a metal, then the present invention will be effective for a wide range of wavelengths of the laser radiation, since a metal is characterized by a continuum of energy levels of the conduction electrons rather than discrete energy levels for absorbing the laser radiation. - The directed
beam 46, which is generated by asource 44, may be directed to the oxygen-exposedportion 15 of theresistor 14 in a manner that the oxygen-unexposed portion 16 of theresistor 14 exists. For example, thesource 44 may include a laser whose spot size area is less than the surface area S of the total surface 19 (seeFIG. 1 ) of theresistor 14, and the associated directedbeam 46 includes radiation from the laser of thesource 44. Thus it is possible for the laser beam to traverse less than thetotal surface 19. Similarly, thesource 44 may generate the directedbeam 46 as the beam of particles, which impart energy to theresistor 14 and thus heat theresistor 14. The directedbeam 46 may be localized to thesurface 17 which requires that the directedbeam 46 be sufficiently anisotropic; i.e., sufficiently localized to thedirection 37 by thesource 44, which depends on physical and operational characteristics of thesource 44. Accordingly, if the directedbeam 46 is localized to thesurface 17, thenFIG. 5 would exemplify a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) exists (i.e., SU>0 and F<1). Alternatively,FIG. 5 may also exemplify a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) does not exist (i.e., SU=0 and F=1), since the directedbeam 46 could be directed to thetotal surface 19. Thus,FIG. 4 exemplifies either a “totally exposed” (F=1) or a “partially exposed” (F<1) embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) may or may not exist. A spatial extent of partial or total exposure to, and associated reaction with, the oxygen-comprisinggas 42 may be controlled by adjusting the size (i.e., area) of the directedbeam 46 and/or by scanning the directedbeam 46 across portions of the total surface 19 (seeFIG. 1 ). - In
FIG. 5 , the oxygen concentration in thegas 32 and the heating temperature, in combination, should be sufficient to oxidize theresistor 14, and depends on the chemistry of the oxidizing reaction between theresistor 14 and thegas 32 as discussed supra in conjunction withFIG. 4 . An ability to achieve the required temperature depends on the directedbeam 46 being sufficiently energetic so as to impart enough energy to theportion 15 of theresistor 14 to facilitate the heating and consequent oxidation of theportion 15. The energy of the directedbeam 46 is controlled at itssource 44. - As stated supra, an advantage of using the directed
beam 46 ofFIG. 5 instead of theheating chamber 30 ofFIG. 4 to heat theresistor 14 is the ability to heat less than the total exposedsurface area 19 of theresistor 14. Another advantage is that said heating of thesemiconductor structure 10 by theheating chamber 30 could potentially damage thermally-sensitive portions of thesemiconductor structure 10 which cannot tolerate the temperature elevation caused by theheating chamber 30. In contrast, the localized heating by the directedbeam 46 advantageously does not expose said thermally-sensitive portions of thesemiconductor structure 10 to potential thermally-induced damage. -
Suitable resistor 14 electrically resistive materials for being oxidized while being heated by the directedbeam 46 include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof. - If the directed
beam 46 is required to be confined to the surface 19 (seeFIG. 1 ) of the resistor 14 (i.e., if the directedbeam 46 should not strike any surface of theresistor 14 other than the surface 19), then dimensions of thesurface 19 should be no smaller than a smallest surface area on which the directedbeam 46 could be focused. For example, if the directedbeam 46 includes laser radiation and thesource 44 includes a laser, then the dimensions of theportion 15 of theresistor 14 may be no smaller than a laser spot dimension. Since with current and future projected technology, laser spot dimensions of the order of 1 micron or less are possible, theportion 15 of theresistor 14 may have dimensions of 1 micron or less (to an extent possible with prevailing laser technology at a time when the present invention is practiced), as well as dimensions exceeding 1 micron, when the directedbeam 46 includes the laser radiation. - As stated supra, thermal nitridization using a directed beam of radiation or particles could be used as an alternative to thermal oxidation using a directed beam of radiation or particles. If nitridization is employed, the
gas 42 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N2). -
FIG. 6 illustrates a front cross-sectional view of aplasma chamber 50 that comprises thesemiconductor structure 10 ofFIG. 2 , in accordance with embodiments of the present invention. Theplasma chamber 50 includes anelectrode 54 and anelectrode 55. Thesemiconductor structure 10 has been disposed between theelectrode 54 and theelectrode 55. Theplasma chamber 50 also includesoxygen ions 52 which are formed in generation of a plasma gas, as will be explained infra. - A neutral gas within the
plasma chamber 50 includes an oxygen compound such as, inter alia, molecular oxygen (O2), nitrous oxide (N2O), carbon dioxide (CO2), and carbon monoxide (CO). Inasmuch as a plasma gas will be formed from the neutral gas, theplasma chamber 50 may also include one or more noble gases (e.g., argon, helium, nitrogen, etc.) to perform such functions as: acting as a carrier gas, providing electric charge needed for forming ionic species of the plasma, assisting in confining the plasma to within fixed boundaries, assisting in developing a target plasma density or a target plasma density range, and promoting excited state plasma lifetimes. - A
power supply 56 generates an electrical potential between theelectrode 54 and theelectrode 55. Thepower supply 56 may be of any type known to one skilled in the art such as, inter alia: a radio frequency (RF) power supply; a constant voltage pulsed power supply (see, e.g., U.S. Pat. No. 5,917,286, June 1999, Scholl et al.); and a direct current (DC) voltage source (see, e.g., U.S. Pat. No. 4,292,384, September 1981, Straughan et al.). Pertinent characteristics of thepower supply 56 are in accordance with such characteristics as are known in the art. For example, a RF power supply may include, inter alia, a radio frequency selected from a wide range of frequencies such as a commonly used frequency of 13.56 Hz. The power requirements of the RF power supply depends on thesurface area 17 of theresistor 14 and is thus case dependent. For example, a typical range of power of the RF power supply may be, inter alia, between about 100 watts and about 2000 watts. - The electrical potential generated by the
power supply 56 ionizes the neutral gas to form a plasma between theelectrode 54 and theelectrode 55, wherein the plasma comprises electrons and ions, and wherein a plasma ion polarity depends on the particular neutral gas within theplasma chamber 50. For example, if the neutral gas includes molecular oxygen, then a three-component plasma may be formed including electrons, positive oxygen ions, and negative oxygen ions, such that in the glow discharge a predominant positive ion is O2 + and a lesser positive ionic species is O+. See U.S. Pat. No. 5,005,101 (Gallagher et al.; April 1991; col. 6, lines 1-12). - In
FIG. 6 , aDC power supply 57 hasterminals ground 51, and the terminal 59 is negative with respect to the terminal 58. TheDC power supply 57 generates an electric field that is directed from theelectrode 54 to theelectrode 55, and the electric field is capable of accelerating positive ions from theelectrode 54 toward theelectrode 55 in thedirection 37. Accordingly, if theoxygen ions 52 are positive oxygen ions (e.g., O2 +), then the electric field accelerates theoxygen ions 52 of the plasma toward theelectrode 55 causing theoxygen ions 52 to strike theportion 15 of the resistor. If theoxygen ions 52 are sufficiently energetic (i.e., if theoxygen ions 52 have a minimum or threshold energy) as required to oxidize theportion 15 of theresistor 14, then theoxygen ions 52 will so oxidize theportion 15 and thus form an oxidized region within theresistor 14, such as the oxidizedregion 22 depicted supra inFIG. 3 . A thickness of the oxidized region (see, e.g., the thickness t of the oxidizedregion 22 described supra forFIG. 3 ) increases as a time of exposure of theresistor 14 to the accelerated oxygenionic species 52 increases. - If the
oxygen ions 52 are negative oxygen ions to be accelerated toward theresistor 14 and reacted with theresistor 14, then the polarities of theterminals terminals negative oxygen ions 52 are to be reacted with theresistor 14 includes consideration of the chemical reactions between saidaccelerated oxygen ions 52 and the electrically resistive material of theresistor 14, since characteristics of said chemical reactions (e.g., reaction energetics, reaction rate, etc.) may be a function of the polarity of the reactingionic oxygen species 52. Nonetheless, ifnegative oxygen ions 52 of the plasma are accelerated by theDC power supply 57 toward theresistor 14, then electrons of the plasma will also be accelerated toward theresistor 14, which in some situations may result in undesirable interactions between said electrons and theresistor 14. Thus, each of the aforementioned considerations (e.g., material of theresistor 14, characteristics of the chemical reactions between theoxygen ions 52 and theresistor 14, etc.) must be considered when choosing the neutral gas and choosing whichionic species 52 to react with theresistor 14. - The accelerated
oxygen ions 52 transfer energy to theresistor 14 to provide at least the threshold energy required for effectuating the chemical reaction between theoxygen ions 52 and theresistor 14, and such energy transferred substitutes for thermal energy (i.e., heat) provided by theheating chamber 30 ofFIG. 4 , or by the directedbeam 46 of radiation or particles ofFIG. 5 , to theresistor 14. A voltage output of theDC power supply 57 must be sufficient to accelerate theoxygen ions 52 to at least the aforementioned threshold energy. -
FIG. 6 exemplifies a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) of theresistor 14 does not exist (i.e., SU=0 and F=1), and thesurface 17 is the total surface 19 (seeFIG. 1 ) that is oxidized in theplasma chamber 50. - While
FIG. 6 depicts aparticular plasma chamber 50 configuration for oxidizing theresistor 14, any plasma configuration known to one of ordinary skill in the art may be used. -
Suitable resistor 14 electrically resistive materials for being subject to plasma oxidation include, inter alia, one or more of polysilicon, amorphous silicon, titanium, tantalum, tungsten, aluminum, silver, copper, or nitrides, silicides, or alloys thereof. - The aforementioned method of oxidizing the
resistor 14 using plasma oxidation does not depend on the dimensions of theresistor 14 and is thus applicable if theresistor 14 has dimensions of 1 micron or less, and is likewise applicable if theresistor 14 has dimensions in excess of 1 micron. - As stated supra, plasma nitridization using a directed beam of radiation or particles could be used as an alternative to plasma oxidation using a directed beam of radiation or particles. If nitridization is employed, the neutral gas within the
plasma chamber 50 would include, instead of an oxygen compound, a nitrogen compound such as, inter alia, molecular nitrogen (N2). -
FIG. 7 illustrates a front cross-sectional view of ananodization bath 60, in accordance with embodiments of the present invention. Generally, anodizing a first conductive material such as a semiconductor or metal requires immersing into an electrolytic solution both the first conductive material and a second conductive material, and passing a DC current at a sufficient voltage through the electrolytic solution. - An anodization
electrical circuit 69 includes aDC power supply 64, anelectrolytic solution 61 which includes oxygen, thesemiconductor structure 10 ofFIG. 2 wherein theresistor 14 is partially immersed in theelectrolytic solution 61, and anelectrode 63 partially immersed in theelectrolytic solution 61. “Partially immersed” includes “totally immersed” (i.e., 100% immersed) as a special case. Theresistor 14 is made of the electrically resistive material which includes the first conductive material that serves as an anode, and theelectrode 63 is made of the second conductive material that serves as a cathode. The second conductive material of the cathode may include any inert metal (e.g., platinum) that does not react with theelectrolytic solution 61. Theresistor 14 is made anodic by electrically coupling theresistor 14 to apositive terminal 65 of theDC power supply 64. Theelectrode 63 is made cathodic by electrically coupling theelectrode 63 to anegative terminal 66 of theDC power supply 64. The anodization may be performed at or above ambient room temperature. A thickness of an oxide film formed with theresistor 14 is a function of a voltage output from theDC power supply 64 and the current density in theanodization circuit 69. The specific voltage and current density is application dependent and would be selected from known art by one of ordinary skill in the art. For example, an anodization of tantalum or tantalum nitride at ambient room temperature and at with a current density of about 0.1 milliamp/cm2 in an electrolytic solution of citric acid will generate an oxide (i.e., tantalum pentoxide Ta2O5) film thickness of 20 Å per volt. Thus for an applied voltage of about 25 volts, the Ta2O5 film thickness is about 500 Å. -
Suitable resistor 14 electrically resistive materials for being anodized include, inter alia,Suitable cathode 63 materials include, inter alia tantalum, titanium, polysilicon, aluminum, tungsten, nitrides thereof, and alloys thereof. A electrolyte containing oxygen that can be used depends on the electrically resistive material to be anodized and is therefore case specific. Thus, any electrolyte containing oxygen that is compatible with said electrically resistive material may be selected as would be known or apparent to one of ordinary skill in the art. - Upon activation of the DC power supply 64 (i.e., the
DC power supply 64 is turned on), and under the voltage output (and the associated current) from theDC power supply 64, an electrolytic reaction occurs at thesurface 17 of theresistor 14 to generate hydrogen ions, electrons, andoxygen ions 62 from the electrolytic solution. Theoxygen ions 62 chemically react with theportion 15 of theresistor 14 such that an oxidized region, such as the oxidizedregion 22 depicted supra inFIG. 3 , forms within theportion 15 of theresistor 14. The generated hydrogen ions and electrons combine at thecathode 63 to form hydrogen gas. -
FIG. 7 shows theportion 16 of theresistor 14 above anelectrolyte level 67. Accordingly,FIG. 7 may exemplify a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) exists (i.e., SU>0 and F<1). Alternatively,FIG. 7 may also exemplify a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) does not exist (i.e., SU=0 and F=1) if theresistor 14 is totally immersed in theelectrolytic solution 61. Thus,FIG. 7 exemplifies either a “partially exposed” embodiment or a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) exists or does not exist, respectively. - A thickness of the oxidized region (see, e.g., the thickness t of the oxidized
region 22 described supra forFIG. 3 ) increases as a time of the electrolytic reaction increases. As the thickness of the oxidized region increases, a current drawn by the anodizingbath 60 decreases due to increasing isolation of theportion 15 of theresistor 14 from theelectrolytic solution 61 as the thickness of the oxidized layer increases. Forcertain resistor 14 materials (e.g., aluminum), the anodization process may eventually self terminate, because said current is eventually reduced to a negligible value. - The aforementioned method of oxidizing the
resistor 14 using anodization does not depend on the dimensions of theresistor 14 and is thus applicable if theportion 15 of theresistor 14 has dimensions of 1 micron or less, and is likewise applicable if theportion 15 of theresistor 14 has dimensions in excess of 1 micron. - As stated supra, anodization that causes nitridization of the
resistor 14 could be used as an alternative to anodization that causes oxidation of theresistor 14. If anodization with nitridization is employed instead of anodization with oxidation, then theelectrolytic solution 61 would include nitrogen instead of oxygen. An electrolyte containing nitrogen that can be used depends on the electrically resistive material to be anodized and is therefore case specific. Thus, any electrolyte containing nitrogen that is compatible with said electrically resistive material may be selected as would be known or apparent to one of ordinary skill in the art. -
FIG. 8 illustrates a front cross-sectional view of achemical bath 70, in accordance with embodiments of the present invention. Thechemical bath 70 comprises achemical solution 71. Thesemiconductor structure 10 ofFIG. 2 is immersed in thechemical solution 71. Thechemical solution 71 includesoxygen particles 72 in such form as oxygen-comprising liquid molecules, oxygen ions, or an oxygen-comprising gas (e.g., oxygen gas or ozone gas) dissolved in thechemical solution 71 under pressurization. Theoxygen particles 72 chemically react with theresistor 14 to form an oxidized region within theresistor 14 such as the oxidizedregion 22 depicted supra inFIG. 3 . A thickness of the oxidized region (see, e.g., the thickness t of the oxidizedregion 22 described supra forFIG. 3 ) increases as a time of the chemical reaction increases. The chemical reaction may be exothermic or endothermic, depending on the electrically resistive material of theresistor 14 and theoxygen particles 72. If the chemical reaction is endothermic, an addition of a sufficient amount of heat is required. Additionally, a suitable catalyst may be utilized to accelerate the chemical reaction. The catalyst may be any catalyst known to one of ordinary skill in the art for the particular chemical reaction. -
Suitable resistor 14 electrically resistive materials for being chemically oxidized include, inter alia, copper, tungsten, aluminum, titanium, nitrides thereof, and alloys thereof.Suitable chemical solutions 71 include, inter alia, hydrogen peroxide, ferric nitrate, ammonium persulphate, etc. -
FIG. 8 shows theresistor 14 as totally immersed in thechemical solution 71, which exemplifies a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) of theresistor 14 does not exist (i.e., SU=0 and F=1), and thesurface 17 is the total surface 19 (seeFIG. 1 ) that is oxidized in thechemical solution 71. Nonetheless, theresistor 14 could be rotated 90 degrees (within the cross-section plane illustrated inFIG. 8 ) and moved upward in adirection 75 such that a portion of theresistor 14 would be above thelevel 77 of thechemical solution 71 just as theportion 16 is above theelectrolyte level 67 inFIG. 7 . Under such 90 degree rotation and upward movement,FIG. 8 would represent a “partially exposed” embodiment in which the oxygen-unexposed portion 16 (SeeFIG. 2 ) exists (i.e., SU>0 and F<1). Accordingly,FIG. 8 exemplifies either a “partially exposed” embodiment or a “totally exposed” embodiment in which the oxygen-unexposed portion 16 (seeFIG. 2 ) exists or does not exist, respectively. - The aforementioned method of oxidizing the
resistor 14 using chemical oxidation does not depend on the dimensions of theresistor 14 and is thus applicable if theresistor 14 has dimensions of 1 micron or less, and is likewise applicable if theresistor 14 has dimensions in excess of 1 micron. - As stated supra, chemical nitridization of the
resistor 14 could be used as an alternative to chemical oxidation of theresistor 14. If chemical nitridization is employed instead of chemical oxidation, then thechemical solution 71 would include nitrogen particles instead of theoxygen particles 72. - The
resistor 14 may be tested prior to being oxidized or nitridized, while being oxidized or nitridized (i.e., in situ), and/or after being oxidized or nitridized. The resistance testing may be accomplished by a conventional test apparatus, such as with a four-point resistance test having four contacts to the resistor with two of the contacts coupled to a known current source outputting a current I and the other two contacts coupled to a voltage meter that measures a voltage V across the resistance to be determined, and the measured resistance is thus V/I. Alternatively, the resistance testing may be accomplished with an inline measuring circuit within the same integrated circuit that includes the resistor, wherein the measuring circuit is coupled to instrumentation that outputs the measured resistance. -
FIG. 9 illustratesFIG. 2 during exposure of theportion 15 of theresistor 14 to theoxygen particles 20, and with theresistor 14 coupled to an electricalresistance measuring apparatus 85. The electricalresistance measuring apparatus 85 may include the conventional test apparatus or the inline measuring circuit, mentioned supra. The electricalresistance measuring apparatus 85 may be conductively coupled tosurfaces resistor 14 by conductive interconnects (e.g., conductive wiring) 86 and 87, respectively. Accordingly, the electricalresistance measuring apparatus 85 is capable of measuring an electrical resistance of the resistor 14 (before, during, and after oxidation or nitridization of the resistor 14) associated with current flowing in thedirection 7 through theresistor 14. Alternatively, the electricalresistance measuring apparatus 85 may be used to measure an electrical resistance of theresistor 14 associated with current flowing in thedirection 6 through the resistor 14 (before, during, and after oxidation or nitridization of the resistor 14) if theconductive interconnects surfaces resistor 14 instead of to thesurfaces surface 83 inFIG. 9 corresponds to thesurface 19 inFIG. 1 . InFIG. 9 , theresistor 14 includes an oxidized (or nitridized) region 21, which corresponds to the oxidized (or nitridized)region 22 ofFIG. 3 . Thesemiconductor structure 10 is within an oxidizing (or nitridizing)environment 80, which includes any oxidizing (or nitridizing) environment within the scope of the present invention such, inter alia, theheating chamber 30 ofFIG. 4 , thechamber 40 ofFIG. 5 , theplasma chamber 50 ofFIG. 6 , theanodization bath 60 ofFIG. 7 , and thechemical bath 70 ofFIG. 8 . The electricalresistance measuring apparatus 85 is any apparatus, as is known to one of ordinary skill in the art, capable of measuring an electrical resistance of theresistor 14. - The following discussion describes how the electrical
resistance measuring apparatus 85 ofFIG. 9 can be used for in situ testing to control the electrical resistance acquired by theresistor 14 after being exposed to theoxygen particles 20. The following discussion applies to any of the embodiments described supra (i.e., thermal oxidation or nitridization using a heating chamber, thermal oxidation or nitridization using a directed beam of radiation or particles, plasma oxidation/nitridization, anodization, and chemical oxidation/nitridization). - Let R1 denote an electrical resistance of the
resistor 14 prior to being oxidized or nitridized. Let R2 denote a final electrical resistance of the resistor 14 (i.e., an electrical resistance of theresistor 14 after being oxidized or nitridized). Let Rt denote a predetermined target electrical resistance with an associated resistance tolerance ΔRt for theresistor 14 after the oxidation (or nitridization) has been completed (i.e., it is intended that R2=Rt within the tolerance ΔRt). The target electrical resistance Rt is application dependent. For example, in an analog circuit Rt may be a function of a capacitance in the circuit, wherein for the given capacitance, Rt has a value that constrains the width of a resonance peak to a predetermined upper limit. In practice, the predetermined resistance Rt, together with the associated resistance tolerance ΔRt, may be provided for the intended application. - The
resistor 14 may have its electrical resistance tested during or after the exposure of theresistor 14 to theoxygen particles 20. As stated supra, the thickness t of the oxidized (or nitridized) region 22 (seeFIG. 3 ) increases as the time of said exposure increases, and the electrical resistance of theresistor 14 increases as the thickness t increases. Thus, the final electrical resistance may be controlled by selection of the time of exposure. The time of exposure may be selected based on any method or criteria designed to obtain R2 as being within Rt±Δt (i.e., Rt−Δt≦R2≦Rt+ΔRt). For example, calibration curves derived from prior experience may be used for determining the time of exposure that results in R2 being within Rt±ΔRt. - An iterative testing procedure may be utilized such that the electrical resistance of the
resistor 14 is tested during the exposing of theresistor 14 to theoxygen particles 20 and thus during the oxidizing (or nitridizing) of theresistor 14. The testing during the exposing of theresistor 14 to theoxygen particles 20 determines continuously or periodically whether R2″ is within Rt±ΔRt, wherein R2″ is the latest resistance of theresistor 14 as determined by the testing. The testing is terminated if R2″ is within Rt±ΔRt or if (R2″−R1)(Rt−R2″)≦0. - While particular embodiments of the present invention have been described herein for purposes of illustration, many modifications and changes will become apparent to those skilled in the art. Accordingly, the appended claims are intended to encompass all such modifications and changes as fall within the true spirit and scope of this invention.
Claims (13)
Priority Applications (1)
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US12/202,487 US20080314754A1 (en) | 2000-11-14 | 2008-09-02 | Increasing an electrical resistance of a resistor by nitridization |
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US09/712,391 US6730984B1 (en) | 2000-11-14 | 2000-11-14 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US10/753,241 US7351639B2 (en) | 2000-11-14 | 2004-01-08 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US11/836,308 US7456074B2 (en) | 2000-11-14 | 2007-08-09 | Increasing an electrical resistance of a resistor by nitridization |
US12/202,487 US20080314754A1 (en) | 2000-11-14 | 2008-09-02 | Increasing an electrical resistance of a resistor by nitridization |
Related Parent Applications (1)
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US11/836,308 Division US7456074B2 (en) | 2000-11-14 | 2007-08-09 | Increasing an electrical resistance of a resistor by nitridization |
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US20080314754A1 true US20080314754A1 (en) | 2008-12-25 |
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US09/712,391 Expired - Lifetime US6730984B1 (en) | 2000-11-14 | 2000-11-14 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US10/753,241 Expired - Fee Related US7351639B2 (en) | 2000-11-14 | 2004-01-08 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US11/836,308 Expired - Fee Related US7456074B2 (en) | 2000-11-14 | 2007-08-09 | Increasing an electrical resistance of a resistor by nitridization |
US11/968,686 Expired - Fee Related US8440522B2 (en) | 2000-11-14 | 2008-01-03 | Increasing an electrical resistance of a resistor by oxidation |
US12/202,511 Abandoned US20090011526A1 (en) | 2000-11-14 | 2008-09-02 | Increasing an electrical resistance of a resistor by nitridization |
US12/202,487 Abandoned US20080314754A1 (en) | 2000-11-14 | 2008-09-02 | Increasing an electrical resistance of a resistor by nitridization |
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US09/712,391 Expired - Lifetime US6730984B1 (en) | 2000-11-14 | 2000-11-14 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US10/753,241 Expired - Fee Related US7351639B2 (en) | 2000-11-14 | 2004-01-08 | Increasing an electrical resistance of a resistor by oxidation or nitridization |
US11/836,308 Expired - Fee Related US7456074B2 (en) | 2000-11-14 | 2007-08-09 | Increasing an electrical resistance of a resistor by nitridization |
US11/968,686 Expired - Fee Related US8440522B2 (en) | 2000-11-14 | 2008-01-03 | Increasing an electrical resistance of a resistor by oxidation |
US12/202,511 Abandoned US20090011526A1 (en) | 2000-11-14 | 2008-09-02 | Increasing an electrical resistance of a resistor by nitridization |
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US (6) | US6730984B1 (en) |
KR (1) | KR100430130B1 (en) |
CN (1) | CN1188903C (en) |
SG (1) | SG101499A1 (en) |
TW (1) | TW543040B (en) |
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US6730984B1 (en) * | 2000-11-14 | 2004-05-04 | International Business Machines Corporation | Increasing an electrical resistance of a resistor by oxidation or nitridization |
JP2004071927A (en) * | 2002-08-08 | 2004-03-04 | Renesas Technology Corp | Semiconductor device |
KR100560717B1 (en) * | 2004-03-11 | 2006-03-13 | 삼성전자주식회사 | ink jet head substrate, ink jet head and method for manufacturing ink jet head substrate |
US7122436B2 (en) * | 2004-09-16 | 2006-10-17 | Lsi Logic Corporation | Techniques for forming passive devices during semiconductor back-end processing |
KR100689586B1 (en) | 2005-04-26 | 2007-03-02 | 매그나칩 반도체 유한회사 | Resistor of radio frequency device and method for manufacturing radio frequency device having the same |
US8125019B2 (en) | 2006-10-18 | 2012-02-28 | International Business Machines Corporation | Electrically programmable resistor |
US8555216B2 (en) * | 2007-03-27 | 2013-10-08 | International Business Machines Corporation | Structure for electrically tunable resistor |
US7723200B2 (en) * | 2007-03-27 | 2010-05-25 | International Business Machines Corporation | Electrically tunable resistor and related methods |
CN103971874A (en) * | 2014-05-27 | 2014-08-06 | 广州天极电子科技有限公司 | Method for regulating resistance of tantalum nitride thin-film resistor |
CN104361967B (en) * | 2014-11-19 | 2017-11-07 | 广州天极电子科技有限公司 | A kind of method that ion implanting regulates and controls tantalum nitride membrane resistance |
KR102447144B1 (en) | 2015-01-09 | 2022-09-26 | 삼성전자주식회사 | Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices |
US10192822B2 (en) | 2015-02-16 | 2019-01-29 | Globalfoundries Inc. | Modified tungsten silicon |
NL2019147B1 (en) | 2017-06-29 | 2019-01-14 | D O R C Dutch Ophthalmic Res Center International B V | A foot pedal control unit |
JP7234573B2 (en) * | 2017-12-25 | 2023-03-08 | 三菱マテリアル株式会社 | THERMISTOR AND MANUFACTURING METHOD THEREOF AND THERMISTOR SENSOR |
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Also Published As
Publication number | Publication date |
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TW543040B (en) | 2003-07-21 |
US20040140529A1 (en) | 2004-07-22 |
US8440522B2 (en) | 2013-05-14 |
US7351639B2 (en) | 2008-04-01 |
US20080102543A1 (en) | 2008-05-01 |
KR20020037682A (en) | 2002-05-22 |
US20090011526A1 (en) | 2009-01-08 |
US6730984B1 (en) | 2004-05-04 |
US7456074B2 (en) | 2008-11-25 |
CN1188903C (en) | 2005-02-09 |
US20070267286A1 (en) | 2007-11-22 |
KR100430130B1 (en) | 2004-05-03 |
CN1353451A (en) | 2002-06-12 |
SG101499A1 (en) | 2004-01-30 |
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