US20080150095A1 - Semiconductor device package - Google Patents
Semiconductor device package Download PDFInfo
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- US20080150095A1 US20080150095A1 US11/952,480 US95248007A US2008150095A1 US 20080150095 A1 US20080150095 A1 US 20080150095A1 US 95248007 A US95248007 A US 95248007A US 2008150095 A1 US2008150095 A1 US 2008150095A1
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- Prior art keywords
- semiconductor device
- substrate
- device package
- metal
- metal member
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
- H01L23/043—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
- H01L23/045—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body the other leads having an insulating passage through the base
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/10—Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Definitions
- This invention relates to semiconductor device packages, and more specifically to semiconductor device packages which are shielded to protect against electromagnetic interference (EMI).
- EMI electromagnetic interference
- Electromagnetic interference is the generation of undesired electrical signals, or noise, in electronic system circuitry due to the unintentional coupling of impinging electromagnetic field energy.
- Crosstalk is within-system EMI, as opposed to EMI from a distant source.
- Crosstalk is proportional to the length of the net parallelism and the characteristic impedance level, and inversely proportional to the spacing between signal nets.
- EMI can come from electrical systems distant from a sensitive receiving circuit, or the source of the noise can come from a circuit within the same system (crosstalk or near source radiated emission coupling). The additive effect of all these sources of noise is to degrade the performance, or to induce errors in sensitive systems.
- EMI electromagnetic interference
- a semiconductor device package having features of the present invention generally includes a semiconductor device mounted to a substrate, a wall erected around the semiconductor device with a height taller than the height of the semiconductor device, at least one metal member provided in the wall or against the wall; and a lid secured to the metal member.
- the metal member and the lid enclose substantially the semiconductor device for providing electromagnetic interference shielding.
- the wall is integrally formed with the substrate.
- another semiconductor device package includes a semiconductor device mounted to a substrate having at least one metal member provided therein and a metal cover secured to the metal member thereby enclosing substantially the semiconductor device for providing electromagnetic interference shielding.
- another semiconductor device package includes a semiconductor device mounted to a substrate and a metal cover secured to the substrate for providing electromagnetic interference shielding.
- the metal cover has a base portion and a side wall extending from the base portion, and the size of the side wall is slightly larger than the size of a top portion of the substrate to enable the top portion of the substrate to be received within the metal cover.
- the side wall of the metal cover abuts the bottom portion of the substrate when the top portion of the substrate is received within the metal cover.
- the lid may be a metal plate or a film with a conductive coating thereon.
- the metal member may be a metal ring or four metal bars arranged around the semiconductor device.
- the metal member is connected to ground potential.
- the substrate may be an organic substrate or a ceramic substrate.
- FIG. 1 is a cross sectional view of a semiconductor device package according to one embodiment of the present invention.
- FIG. 2 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 3 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 4 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 5 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 6 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 7 is a top plan view of a semiconductor device package showing a metal ring and a semiconductor device provided in the metal ring according to one embodiment of the present invention
- FIG. 8 is a top plan view of a semiconductor device package showing four metal bars arranged around a semiconductor device according to another embodiment of the present invention.
- FIG. 9 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention.
- FIG. 1 illustrates a semiconductor device package 100 according to one embodiment of the present invention.
- the package 100 includes a semiconductor device 110 attached to a substrate 120 by means of a conductive adhesive (not shown) such as a silver-filled epoxy or a non-conductive adhesive (not shown).
- a conductive adhesive such as a silver-filled epoxy or a non-conductive adhesive (not shown).
- the semiconductor device 110 is connected to the substrate 120 by a plurality of bonding wires 112 which act as electrical input/output (I/O) connections to conductive traces or pads (not shown) of the substrate 120 .
- the semiconductor device 110 may be connected to the substrate 120 by a plurality of solder balls.
- the solder balls may be formed on an active surface of the semiconductor device 110 using one of any known bumping procedures.
- the package 100 is provided with a wall 130 erected from the periphery of the substrate 120 with a height taller than the height of the semiconductor device 110 .
- a metal member 140 is provided in the wall 130
- a lid such as a metal plate 150 sized and dimensioned to engage the wall 130 , preferably without extending thereover.
- the lid may be a film with a conductive coating thereon.
- the metal plate 150 is suitably bonded to the wall 130 to hermetically close the semiconductor device 110 therein. In this way, the semiconductor device 110 is EMI shielded by the metal member 140 and the metal plate 150 .
- the metal plate 150 may be secured to the metal member 140 by a soldering interface (e.g., Au—Sn solder), a conductive adhesive interface, or resistance welding. Both the metal member 140 and the metal plate 150 may be constructed from silver or copper to effectively reduce the amount of radiation which can penetrate therethrough thereby reducing the total dose radiation received at the semiconductor device 110 to a level less than the total dose tolerance of the semiconductor device 110 .
- the upper surface of the metal plate 150 has a solder layer 152 (or a black-oxidation layer) formed thereon for mark ability.
- the substrate 120 may be an organic substrate formed from a core layer made of fiberglass reinforced BT (bismaleimide-triazine) resin or FR-4 fiberglas reinforced epoxy resin.
- the substrate 120 may be a multi-layer ceramic substrate.
- the substrate 120 and the wall 130 are integrally formed by a LTCC (Low Temperature Cofired Ceramic) manufacturing process.
- the metal member 140 may extend from the wall 130 into the substrate 120 for providing better EMI shielding.
- FIG. 3 illustrates a semiconductor device package 200 according to another embodiment of the present invention.
- the package 200 includes a semiconductor device 110 attached to and electrically coupled to a substrate 122 .
- the metal member 140 is provided in the substrate 122
- the package 120 is provided with a metal cover 210 secured to the metal member 140 thereby enclosing substantially the semiconductor device 110 for providing electromagnetic interference shielding.
- the upper surface of the metal cover 210 has a solder layer 212 (or a black-oxidation layer) formed thereon for mark ability.
- the metal cover 210 may be secured to the metal member 140 by a soldering interface (e.g., Au—Sn solder), a conductive adhesive interface, or resistance welding. Both the metal member 140 and the metal cover 210 may be constructed from silver or copper to effectively reduce the amount of radiation which can penetrate therethrough thereby reducing the total dose radiation received at the semiconductor device 110 to a level less than the total dose tolerance of the semiconductor device 110 .
- the metal member 140 may extend from an upper surface 122 a to a lower surface 122 b of the substrate 122 for providing better EMI shielding.
- FIG. 5 illustrates a semiconductor device package 400 according to another embodiment of the present invention.
- the package 400 is substantially identical to the package 100 shown in FIG. 1 except that the metal member 140 is not provided in the wall 130 but provided against the inner surface of the wall 130 .
- the metal member 140 may extend from the wall 130 into the substrate 120 for providing better EMI shielding.
- the metal member 140 shown in FIGS. 1-6 is connected to ground potential.
- the metal member 140 may be connected to one independent grounding portion (not shown) provided in the substrate 120 or the substrate 122 by a dedicated vertical terminal such as via 120 a (see FIG. 1 , FIG. 3 and FIG. 5 ).
- the grounding portion may be distributed in the substrate 120 or the substrate 122 in any available location, and are electrically joined to an electrical ground of an external printed circuit (PC) main board (not shown) for supplying ground potential.
- PC printed circuit
- the metal member 140 may be directly connected to one independent grounding portion (not shown) provided in the substrate 120 or the substrate 122 .
- the metal member 140 shown in FIGS. 1-6 may be a metal ring 140 a shown in FIG. 7 or metal bars 140 b arranged around the semiconductor device 110 as shown in FIG. 8 .
- FIG. 9 illustrates a semiconductor device package 300 according to another embodiment of the present invention.
- the package 300 includes a semiconductor device 110 mounted to a substrate 310 and a metal cover 320 secured to the substrate 310 for providing electromagnetic interference shielding.
- the substrate 310 includes a top portion 312 and a bottom portion 314 , wherein the size of the bottom portion 314 is larger than the size of the top portion 312 .
- the metal cover 320 has a base portion 320 a and a side wall 320 b extending from the base portion 320 a, and the size of the side wall 320 b is slightly larger than the size of the upper portion 310 a of the substrate 310 to enable the upper portion 310 a to be received within the metal cover 320 .
- the side wall 320 b of the metal cover 320 abuts the bottom portion 314 of the substrate 310 when the top portion 312 of the substrate 310 is received within the metal cover 320 .
- the metal cover 320 may be connected to one independent grounding portion (not shown) provided in the substrate 310 by a dedicated vertical terminal provided in the bottom portion 314 of the substrate 310 or a dedicated conductive trace extending on the bottom portion 314 of the substrate 310 (not shown in FIG. 7 ).
- the metal cover 320 may be secured to the dedicated vertical terminal or the dedicated conductive trace by a soldering interface (e.g., Au—Sn solder) 314 a.
- the soldering interface 314 a may be replaced by a conductive adhesive interface.
- the grounding portion may be distributed in the substrate 310 in any available location, and are electrically joined to an electrical ground of an external printed circuit (PC) main board (not shown) for supplying ground potential.
- PC printed circuit
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
- This application is a divisional of, and claims priority to, U.S. patent application Ser. No. 10/944,198, filed Sep. 20, 2004, the contents of which is incorporated herein by reference.
- 1. Field of the Invention
- This invention relates to semiconductor device packages, and more specifically to semiconductor device packages which are shielded to protect against electromagnetic interference (EMI).
- 2. Description of the Related Art
- Semiconductor device packages typically have electrical circuitry implemented on a circuit substrate, such as a printed circuit board or a ceramic substrate. The performance of the circuitry may be adversely affected by electromagnetic interference (EMI). Electromagnetic interference (EMI) is the generation of undesired electrical signals, or noise, in electronic system circuitry due to the unintentional coupling of impinging electromagnetic field energy.
- The coupling of signal energy from an active signal net onto another signal net is referred to as crosstalk. Crosstalk is within-system EMI, as opposed to EMI from a distant source. Crosstalk is proportional to the length of the net parallelism and the characteristic impedance level, and inversely proportional to the spacing between signal nets.
- Electronic systems are becoming smaller, and the density of electrical components in these systems is increasing. As a result, the dimensions of the average circuit element is decreasing, favoring the radiation of higher and higher frequency signals. At the same time, the operating frequency of these electrical systems is increasing, further favoring the incidence of high frequency EMI. EMI can come from electrical systems distant from a sensitive receiving circuit, or the source of the noise can come from a circuit within the same system (crosstalk or near source radiated emission coupling). The additive effect of all these sources of noise is to degrade the performance, or to induce errors in sensitive systems.
- It is therefore an object of the present invention to provide semiconductor device packages which are shielded to protect against electromagnetic interference (EMI).
- To achieve the above listed and other objects, a semiconductor device package having features of the present invention generally includes a semiconductor device mounted to a substrate, a wall erected around the semiconductor device with a height taller than the height of the semiconductor device, at least one metal member provided in the wall or against the wall; and a lid secured to the metal member. Note that the metal member and the lid enclose substantially the semiconductor device for providing electromagnetic interference shielding. Preferably, the wall is integrally formed with the substrate.
- In accordance with the present invention, there is provided another semiconductor device package includes a semiconductor device mounted to a substrate having at least one metal member provided therein and a metal cover secured to the metal member thereby enclosing substantially the semiconductor device for providing electromagnetic interference shielding.
- In accordance with the present invention, there is provided another semiconductor device package includes a semiconductor device mounted to a substrate and a metal cover secured to the substrate for providing electromagnetic interference shielding. Specifically, the metal cover has a base portion and a side wall extending from the base portion, and the size of the side wall is slightly larger than the size of a top portion of the substrate to enable the top portion of the substrate to be received within the metal cover. The side wall of the metal cover abuts the bottom portion of the substrate when the top portion of the substrate is received within the metal cover.
- In accordance with the present invention, the lid may be a metal plate or a film with a conductive coating thereon. The metal member may be a metal ring or four metal bars arranged around the semiconductor device. Preferably, the metal member is connected to ground potential. The substrate may be an organic substrate or a ceramic substrate.
- These and other features, aspects, and advantages of the present invention will be more fully understood by reading the following detailed description of the preferred embodiment, with reference made to the accompanying drawings as follows:
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FIG. 1 is a cross sectional view of a semiconductor device package according to one embodiment of the present invention; -
FIG. 2 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention; -
FIG. 3 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention; -
FIG. 4 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention; -
FIG. 5 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention; -
FIG. 6 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention; -
FIG. 7 is a top plan view of a semiconductor device package showing a metal ring and a semiconductor device provided in the metal ring according to one embodiment of the present invention; -
FIG. 8 is a top plan view of a semiconductor device package showing four metal bars arranged around a semiconductor device according to another embodiment of the present invention; and -
FIG. 9 is a cross sectional view of a semiconductor device package according to another embodiment of the present invention -
FIG. 1 illustrates asemiconductor device package 100 according to one embodiment of the present invention. Thepackage 100 includes asemiconductor device 110 attached to asubstrate 120 by means of a conductive adhesive (not shown) such as a silver-filled epoxy or a non-conductive adhesive (not shown). As shown, thesemiconductor device 110 is connected to thesubstrate 120 by a plurality ofbonding wires 112 which act as electrical input/output (I/O) connections to conductive traces or pads (not shown) of thesubstrate 120. Alternatively, thesemiconductor device 110 may be connected to thesubstrate 120 by a plurality of solder balls. The solder balls may be formed on an active surface of thesemiconductor device 110 using one of any known bumping procedures. - Referring to
FIG. 1 , thepackage 100 is provided with awall 130 erected from the periphery of thesubstrate 120 with a height taller than the height of thesemiconductor device 110. Note that ametal member 140 is provided in thewall 130, and a lid such as ametal plate 150 sized and dimensioned to engage thewall 130, preferably without extending thereover. Alternatively, the lid may be a film with a conductive coating thereon. Themetal plate 150 is suitably bonded to thewall 130 to hermetically close thesemiconductor device 110 therein. In this way, thesemiconductor device 110 is EMI shielded by themetal member 140 and themetal plate 150. Themetal plate 150 may be secured to themetal member 140 by a soldering interface (e.g., Au—Sn solder), a conductive adhesive interface, or resistance welding. Both themetal member 140 and themetal plate 150 may be constructed from silver or copper to effectively reduce the amount of radiation which can penetrate therethrough thereby reducing the total dose radiation received at thesemiconductor device 110 to a level less than the total dose tolerance of thesemiconductor device 110. Preferably, the upper surface of themetal plate 150 has a solder layer 152 (or a black-oxidation layer) formed thereon for mark ability. - The
substrate 120 may be an organic substrate formed from a core layer made of fiberglass reinforced BT (bismaleimide-triazine) resin or FR-4 fiberglas reinforced epoxy resin. Alternatively, thesubstrate 120 may be a multi-layer ceramic substrate. Preferably, thesubstrate 120 and thewall 130 are integrally formed by a LTCC (Low Temperature Cofired Ceramic) manufacturing process. - Alternatively, as shown in
FIG. 2 , themetal member 140 may extend from thewall 130 into thesubstrate 120 for providing better EMI shielding. -
FIG. 3 illustrates asemiconductor device package 200 according to another embodiment of the present invention. Thepackage 200 includes asemiconductor device 110 attached to and electrically coupled to asubstrate 122. As shown, themetal member 140 is provided in thesubstrate 122, and thepackage 120 is provided with ametal cover 210 secured to themetal member 140 thereby enclosing substantially thesemiconductor device 110 for providing electromagnetic interference shielding. Preferably, the upper surface of themetal cover 210 has a solder layer 212 (or a black-oxidation layer) formed thereon for mark ability. Themetal cover 210 may be secured to themetal member 140 by a soldering interface (e.g., Au—Sn solder), a conductive adhesive interface, or resistance welding. Both themetal member 140 and themetal cover 210 may be constructed from silver or copper to effectively reduce the amount of radiation which can penetrate therethrough thereby reducing the total dose radiation received at thesemiconductor device 110 to a level less than the total dose tolerance of thesemiconductor device 110. - Alternatively, as shown in
FIG. 4 , themetal member 140 may extend from anupper surface 122 a to alower surface 122 b of thesubstrate 122 for providing better EMI shielding. -
FIG. 5 illustrates asemiconductor device package 400 according to another embodiment of the present invention. Thepackage 400 is substantially identical to thepackage 100 shown inFIG. 1 except that themetal member 140 is not provided in thewall 130 but provided against the inner surface of thewall 130. Alternatively, as shown inFIG. 6 , themetal member 140 may extend from thewall 130 into thesubstrate 120 for providing better EMI shielding. - Preferably, the
metal member 140 shown inFIGS. 1-6 is connected to ground potential. Specifically, themetal member 140 may be connected to one independent grounding portion (not shown) provided in thesubstrate 120 or thesubstrate 122 by a dedicated vertical terminal such as via 120 a (seeFIG. 1 ,FIG. 3 andFIG. 5 ). The grounding portion may be distributed in thesubstrate 120 or thesubstrate 122 in any available location, and are electrically joined to an electrical ground of an external printed circuit (PC) main board (not shown) for supplying ground potential. In the embodiments shown inFIG. 2 ,FIG. 4 andFIG. 6 , themetal member 140 may be directly connected to one independent grounding portion (not shown) provided in thesubstrate 120 or thesubstrate 122. - Note that the
metal member 140 shown inFIGS. 1-6 may be ametal ring 140 a shown inFIG. 7 ormetal bars 140 b arranged around thesemiconductor device 110 as shown inFIG. 8 . -
FIG. 9 illustrates asemiconductor device package 300 according to another embodiment of the present invention. Thepackage 300 includes asemiconductor device 110 mounted to asubstrate 310 and ametal cover 320 secured to thesubstrate 310 for providing electromagnetic interference shielding. Specifically, thesubstrate 310 includes atop portion 312 and abottom portion 314, wherein the size of thebottom portion 314 is larger than the size of thetop portion 312. Themetal cover 320 has abase portion 320 a and aside wall 320 b extending from thebase portion 320 a, and the size of theside wall 320 b is slightly larger than the size of the upper portion 310 a of thesubstrate 310 to enable the upper portion 310 a to be received within themetal cover 320. Theside wall 320 b of themetal cover 320 abuts thebottom portion 314 of thesubstrate 310 when thetop portion 312 of thesubstrate 310 is received within themetal cover 320. Preferably, themetal cover 320 may be connected to one independent grounding portion (not shown) provided in thesubstrate 310 by a dedicated vertical terminal provided in thebottom portion 314 of thesubstrate 310 or a dedicated conductive trace extending on thebottom portion 314 of the substrate 310 (not shown inFIG. 7 ). Themetal cover 320 may be secured to the dedicated vertical terminal or the dedicated conductive trace by a soldering interface (e.g., Au—Sn solder) 314 a. Thesoldering interface 314 a may be replaced by a conductive adhesive interface. The grounding portion may be distributed in thesubstrate 310 in any available location, and are electrically joined to an electrical ground of an external printed circuit (PC) main board (not shown) for supplying ground potential. - Although the invention has been explained in relation to its preferred embodiments, it is to be understood that many other possible modifications and variations can be made without departing from the spirit and scope of the invention as hereinafter claimed.
Claims (11)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US11/952,480 US20080150095A1 (en) | 2004-09-20 | 2007-12-07 | Semiconductor device package |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US10/944,198 US7327015B2 (en) | 2004-09-20 | 2004-09-20 | Semiconductor device package |
US11/952,480 US20080150095A1 (en) | 2004-09-20 | 2007-12-07 | Semiconductor device package |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US10/944,198 Division US7327015B2 (en) | 2004-09-20 | 2004-09-20 | Semiconductor device package |
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US11/952,480 Abandoned US20080150095A1 (en) | 2004-09-20 | 2007-12-07 | Semiconductor device package |
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