US20080132402A1 - Optical glass - Google Patents
Optical glass Download PDFInfo
- Publication number
- US20080132402A1 US20080132402A1 US11/616,716 US61671606A US2008132402A1 US 20080132402 A1 US20080132402 A1 US 20080132402A1 US 61671606 A US61671606 A US 61671606A US 2008132402 A1 US2008132402 A1 US 2008132402A1
- Authority
- US
- United States
- Prior art keywords
- optical glass
- wavelength
- glass
- less
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000005304 optical glass Substances 0.000 title claims abstract description 52
- 150000001768 cations Chemical class 0.000 claims abstract description 30
- 238000002834 transmittance Methods 0.000 claims abstract description 27
- 229910052742 iron Inorganic materials 0.000 claims abstract description 9
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 28
- 239000011521 glass Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 10
- 229910052681 coesite Inorganic materials 0.000 description 10
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 229910052682 stishovite Inorganic materials 0.000 description 10
- 229910052905 tridymite Inorganic materials 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 229910052593 corundum Inorganic materials 0.000 description 8
- 239000010436 fluorite Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229910001845 yogo sapphire Inorganic materials 0.000 description 8
- 229910026161 MgAl2O4 Inorganic materials 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229910052596 spinel Inorganic materials 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 6
- -1 Fe3+ ion Chemical class 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 229910019092 Mg-O Inorganic materials 0.000 description 2
- 229910019395 Mg—O Inorganic materials 0.000 description 2
- 238000000441 X-ray spectroscopy Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000013213 extrapolation Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910011255 B2O3 Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001687 destabilization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000000671 immersion lithography Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- AHKZTVQIVOEVFO-UHFFFAOYSA-N oxide(2-) Chemical compound [O-2] AHKZTVQIVOEVFO-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1438—Reactant delivery systems for delivering and depositing additional reactants as liquids or solutions, e.g. solution doping of the article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
Definitions
- the present invention relates to an optical glass used in an apparatus including a light source emitting ultraviolet (UV) rays or vacuum UV rays, particularly an optical glass used as an optical component, such as a lens, a prism, or a window member, in regions from UV rays such as that (wavelength: 248 nm) of a KrF excimer laser to vacuum UV rays.
- a light source emitting ultraviolet (UV) rays or vacuum UV rays particularly an optical glass used as an optical component, such as a lens, a prism, or a window member, in regions from UV rays such as that (wavelength: 248 nm) of a KrF excimer laser to vacuum UV rays.
- a conventional optical component such as a lens, a prism, or a window member, used in an apparatus employing light ranging from UV rays to vacuum UV rays
- Synthetic quartz glass is transparent to light in a wide wavelength region from a near-infrared region to a vacuum UV region and its transmittance to a light having a wavelength of 157 nm is 95% at a thickness of 1 cm.
- Fluorite is transparent to a light having a shorter wavelength than synthetic quartz glass and has a transmittance to the light having the wavelength of 157 nm of 99% or more at a thickness of 10 mm.
- Japanese Laid-Open Patent Application 2001-64038 has disclosed a glass material comprising SiO 2 , Al 2 O 3 , B 2 O 3 , and CaO and containing iron in an amount of 50 ppm or less.
- This glass material is principally used for carrying a photocatalyst used in a photocatalyst filter or the like and is required to improve a UV-ray transmitting characteristic at a wavelength of 365 nm.
- a transmittance in a wavelength range of approximately 310-410 nm is improved by using a high-purity starting material, preventing impurity contamination in the glass material production process, and employing a reducing agent.
- An action of the reducing agent is to reduce an Fe 3+ ion having an adsorption peak at a wavelength of approximately 365 nm to an Fe 2+ ion having an absorption peak at a wavelength of approximately 850 nm.
- a refractive index at a wavelength of 248 nm is 1.51 and 1.47 for synthetic quartz glass and fluorite, respectively, which have been used in the conventional exposure apparatus.
- fluorite which is a crystal, has an intrinsic birefringence problem.
- the MgO single-crystal has a refractive index of about 1.82 at a wavelength of 248 nm.
- the MgAl 2 O 4 single-crystal has a refractive index of about 1.77. Therefore, these materials have sufficient refractive indices for an optical member for a UV wavelength region.
- the MgO single-crystal has a transmittance of about 18% at a thickness of 9 mm
- the MgAl 2 O 4 single-crystal has a transmittance of about 80% at a thickness of 3.4 mm
- the MgAl 2 O 4 polycrystal has a transmittance of about 72% at a thickness of 2.7 mm.
- the MgO single-crystal has an intrinsic birefringence value of 16.0 ⁇ 0.5 nm/cm (extrapolation value) and MgAl 2 O 4 single-crystal has an intrinsic birefringence value of 14.6 ⁇ 0.1 nm/cm (extrapolation value), thus providing much larger values than that ( ⁇ 0.55 ⁇ 0.07 nm/cm) of CaF 2 .
- a content of iron in the glass material is 50 ppm or less in order to improve the transmittance to UV rays having a wavelength of 365 nm.
- the Fe content in glass is 1.0 ppm and Si containing 0.1 ppm of an impurity as a reducing agent is used in an amount of 0.01 wt. %
- a transmittance at a wavelength of approximately 248 nm is about 50% at a thickness of 1 mm. In this case, however, the glass material used does not have a sufficient refractive index.
- a principal object of the present invention is to provide an optical glass, which has a high refractive index and a high transmittance and which causes no intrinsic birefringence in a UV region.
- an optical glass that comprises SiO 2 and Al 2 O 3 and to which MgO is added is effective.
- an optical glass comprising Si, Al, Mg, and O,
- optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 95% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent, a total amount of Si, Al, and Mg being 99.5% or more, in cation percent, and
- the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.
- the above-described optical glass may preferably contain an OH group in an amount of 5000 wtppm or less.
- the above-described optical glass may preferably have a refractive index to a light having a wavelength of 248 nm of 1.57 or more.
- an optical glass having a high refractive index and a high transmittance in a UV region.
- FIG. 1 is a graph showing wavelength dependence of a refractive index of the optical glass according to the embodiment of the present invention.
- FIG. 2 is a graph showing wavelength dependence of a transmittance of an optical glass according to the embodiment of the present invention.
- the optical glass according to the present invention has a higher refractive index and a higher transmittance in a UV wavelength region compared with synthetic quartz glass and fluorite.
- n a refractive index
- Eg a band gap (eV).
- a fluorine-containing material such as fluorite, has a large band gap, so that it is highly transparent to light of short wavelengths.
- a fluoride ion has a smaller electronic polarizability (1.04 ⁇ 10 ⁇ 24 cm 3 ) than that (3.88 ⁇ 10 ⁇ 24 cm 3 ) of an oxide ion, so that the fluorine-containing material is undesirable in terms of the high refractive index.
- synthetic quartz glass has a refractive index of 1.51 and fluorite has a refractive index of 1.47.
- the above-described SiO 2 —Al 2 O 3 —MgO-based glass has a refractive index of 1.57 at the wavelength of 248 nm.
- the optical glass according to the present invention is Si—Al—Mg—O based glass comprising Si, Al, Mg, and O,
- optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 95% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent, a total amount of Si, Al, and Mg being 99.5% or more, in cation percent, and
- the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.
- the optical glass according to the present invention contains Si.
- An amount of Si (Si content) contained in the optical glass according to the present invention is 40% or more and 60% or less, preferably 45% or more and 55% or less, in terms of cation %.
- a cation % of Si means a ratio of the ion number of a cation of Si to the sum of the ion numbers of the cations of Si, Al, and Mg, on a percentage basis.
- a cation % of Al means a ratio of the ion number of a cation of Al to the sum of the ion numbers of the cations of Si, Al, and Mg, on a percentage basis.
- a cation % of Mg means a ratio of the ion number of a cation of Mg to the sum of the ion number of the cations of Si, Al, and Mg, on a percentage basis.
- SiO 2 is capable of forming glass by itself and is a frequently used glass component. As described above, SiO 2 has a band gap (Eg) of about 9 eV, so that it exhibits excellent optical transparency and light resistance with respect to UV rays and vacuum UV rays. A refractive index thereof is 1.51 at a wavelength of 248 nm, which is small. Accordingly, Si content may preferably be increased in order to permit transmission of light of short wavelengths, but the increase in Si content is disadvantageous with respect to the improvement in refractive index. Further, when the Si content is larger, a resultant material is liable to vitrify and has a small thermal expansion coefficient, thus being improved in stability as glass. However, viscosity and melting points thereof are increased.
- the Si content in accordance with the present invention may be in the above-described range.
- the optical glass in the present invention contains Al.
- An amount of Al (Al content) contained in the optical glass according to the first aspect of the present invention is 10% or more and 35% or less, preferably 12% or more and 33% or less, in terms of cation %.
- Al 2 O 3 is a glass component for improving chemical durability that is added to a so-called glass-forming oxide, such as SiO 2 or the like. Further, Al 2 O 3 has a band gap (Eg) of 8.7 eV as described above and high optical transparency with respect to UV rays and vacuum UV rays. Further, compared with SiO 2 , Al 2 O 3 improves the refractive index, so that Al content in accordance with the present invention is preferably in the above-described range.
- the optical glass in the present invention contains Mg.
- An amount of Mg (Mg content) contained in the optical glass according to the present invention is 20% or more and 35% or less, preferably 22% or more and 33% or less, in terms of cation %.
- MgO functions as a so-called modifier oxide in glass formation to decrease the viscosity.
- MgO has an Eg of 7.6 eV, so that MgO has a larger band gap (Eg) than energy (5.0 eV) of a KrF excimer laser (wavelength: 248 nm).
- Eg band gap
- MgO is treated as an impurity, which decreases transparency to UV rays.
- Mg—O has a binding energy of 88 kcal/mol, which is smaller than that (150 kcal/mol) of SiO 2 and that (115 kcal/mol) of Al 2 O 3 , thus resulting in low bond strength. Therefore, it is preferable to increase the MgO content from the viewpoint of improvement in the refractive index. However, it is preferable to decrease the MgO content from the viewpoint of increasing optical transparency and light resistance with respect to UV rays and vacuum UV rays. Therefore, the Mg content in accordance with the present invention is preferably in the above
- each of Fe and Na is contained in an amount of 0.01 wtppm or less, preferably 0.001 wtppm or less.
- wtppm means a weight ratio of Fe or Na to the entire weight of optical glass.
- the optical glass according to the present invention is an optical member formed of glass, so that similar to synthetic quartz glass and fluorite that have been employed for the same purpose, it is preferable for the optical glass to contain as little impurity as possible having an absorption peak in UV region. More specifically, it is required in the present invention that high-purity starting materials be used and impurity contamination during the production process be reduced as much as possible.
- Oxides of metal elements examples of which may include oxides of transition metals, such as Ti or Fe, and oxides of alkali metal, such as Na or K, are principal impurities of UV and vacuum UV transmissive materials. It is desirable for these oxides to be substantially excluded from the optical glass of the present invention. Furthermore, it is desirable to substantially exclude from the optical glass of the present invention other metal oxides having band gaps close to or lower than the UV or vacuum UV energy to be used.
- the optical glasses according to the present invention it is desirable for the optical glasses according to the present invention to contain not more than 5000 wtppm, preferably 2000 wtppm or less, of an OH group.
- the OH group is present close to Mg and accelerates the destabilization of the network structure of glass. This results in a decrease in light resistance to UV rays or vacuum UV rays. For this reason, the OH group content is preferably as low as possible.
- the optical glass of the present invention may desirably have a transmittance to a light having a wavelength of 248 nm of 40% or more, preferably 50% or more, at a thickness of 5 mm.
- the optical glass of the present invention has a refractive index to a light having a wavelength of 248 nm of 1.57 or more.
- a process capable of eliminating impurity contamination is preferable. More specifically, examples of such a process may include a process in which starting materials are melted by electricity, arc plasma, or flame; a flame hydrolysis procedure; a direct process; a soot remelting process, such as vapor-phase axial deposition (VAD) or modified chemical vapor deposition (MCVD); plasma CVD; sol-gel process; and the like. In any process, it is preferable to use high-purity starting materials.
- VAD vapor-phase axial deposition
- MCVD modified chemical vapor deposition
- sol-gel process sol-gel process
- the soot of SiO 2 was synthesized in a glass vessel of SiO 2 by a CVD apparatus to obtain A.
- the thus synthesized A was immersed in a solution of AlCl 3 hydrate (purity: 99.9999% or more) and MgCl 2 hydrate (purity: 99.9999% or more) in ultrapure water and then was dried for about 12 hours in a dry nitrogen gas atmosphere to obtain B.
- the thus obtained B was heated at about 2300° C. from the outside of the glass vessel by means of an oxy-hydrogen burner to melt B, followed by cooling to obtain an optical glass (material).
- the thus obtained glass was in a melted state together with the glass vessel, so that a central portion was cut and optically polished to obtain a parallel flat plate having a thickness of about 5 mm.
- the OH group concentration (content) is expected to be about 17000 wtppm.
- the transmittance of the glass was measured by a visible-ultraviolet spectrophotometer.
- the refractive index of the glass was measured by a fast spectroscopic ellipsometer (“M-2000D”, mfd. by J. A. Woolam Co., Inc.).
- FIG. 1 shows a wavelength dependence of the refractive index of the glass obtained in this Example.
- FIG. 2 shows a wavelength dependence of the external transmittance of the glass obtained in this Example.
- the measured transmittance at a wavelength of 248 nm was 43%.
- the measured refractive index at a wavelength of 248 nm was 1.57.
- An optical glass was prepared in the same manner as in Example 1, except that the drying time for preparing the powder B was changed to 3 hours.
- the OH group content was about 1500 wtppm.
- the measured transmittance was 38%.
- the optical glass has a high refractive index and high transmittance in a UV region, so that it is possible to use the optical glass as an optical part, such as a lens, a prism, a window material, and the like, in a wavelength range from UV rays to vacuum UV rays.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/932,024 US7727918B2 (en) | 2006-12-05 | 2007-10-31 | Optical glass |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006328745A JP2008143718A (ja) | 2006-12-05 | 2006-12-05 | 光学ガラス |
| JP328745/2006(PAT.) | 2006-12-05 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/932,024 Continuation-In-Part US7727918B2 (en) | 2006-12-05 | 2007-10-31 | Optical glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20080132402A1 true US20080132402A1 (en) | 2008-06-05 |
Family
ID=39476166
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/616,716 Abandoned US20080132402A1 (en) | 2006-12-05 | 2006-12-27 | Optical glass |
| US11/932,024 Expired - Fee Related US7727918B2 (en) | 2006-12-05 | 2007-10-31 | Optical glass |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/932,024 Expired - Fee Related US7727918B2 (en) | 2006-12-05 | 2007-10-31 | Optical glass |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US20080132402A1 (enExample) |
| JP (1) | JP2008143718A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080131691A1 (en) * | 2006-12-05 | 2008-06-05 | Canon Kabushiki Kaisha | Optical glass |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4664473A (en) * | 1985-04-01 | 1987-05-12 | Corning Glass Works | Optical fiber formed of MgO--Al2 O3 --SiO2 glass |
| US5099174A (en) * | 1988-07-12 | 1992-03-24 | Thorn Emi Plc | Arc tube for a discharge lamp |
| US6645891B2 (en) * | 2000-04-03 | 2003-11-11 | Minolta Co., Ltd. | Glass composition for crystallized glass |
| US20040138044A1 (en) * | 2002-12-25 | 2004-07-15 | Nippon Sheet Glass Company Limited | Glass composition for poling and glass functional product containing the same |
| US7291571B2 (en) * | 2002-09-27 | 2007-11-06 | Schott Ag | Crystallizable glass and the use thereof for producing extremely solid and break resistant glass-ceramics having an easily polished surface |
| US20080131691A1 (en) * | 2006-12-05 | 2008-06-05 | Canon Kabushiki Kaisha | Optical glass |
| US20080227616A1 (en) * | 2004-01-05 | 2008-09-18 | Ulrich Peuchert | Use of Glass Ceramics |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001064038A (ja) | 1999-08-30 | 2001-03-13 | Hoya Corp | ガラス材およびそれを用いたガラスファイバ |
| JP4614403B2 (ja) * | 2000-10-13 | 2011-01-19 | 信越石英株式会社 | プラズマ耐食性ガラス部材 |
| DE10362074B4 (de) * | 2003-10-14 | 2007-12-06 | Schott Ag | Hochschmelzendes Glas oder Glaskeramik sowie der Verwendung |
| JP2008143719A (ja) * | 2006-12-05 | 2008-06-26 | Canon Inc | 光学ガラス |
-
2006
- 2006-12-05 JP JP2006328745A patent/JP2008143718A/ja active Pending
- 2006-12-27 US US11/616,716 patent/US20080132402A1/en not_active Abandoned
-
2007
- 2007-10-31 US US11/932,024 patent/US7727918B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4664473A (en) * | 1985-04-01 | 1987-05-12 | Corning Glass Works | Optical fiber formed of MgO--Al2 O3 --SiO2 glass |
| US5099174A (en) * | 1988-07-12 | 1992-03-24 | Thorn Emi Plc | Arc tube for a discharge lamp |
| US6645891B2 (en) * | 2000-04-03 | 2003-11-11 | Minolta Co., Ltd. | Glass composition for crystallized glass |
| US7291571B2 (en) * | 2002-09-27 | 2007-11-06 | Schott Ag | Crystallizable glass and the use thereof for producing extremely solid and break resistant glass-ceramics having an easily polished surface |
| US20040138044A1 (en) * | 2002-12-25 | 2004-07-15 | Nippon Sheet Glass Company Limited | Glass composition for poling and glass functional product containing the same |
| US20080227616A1 (en) * | 2004-01-05 | 2008-09-18 | Ulrich Peuchert | Use of Glass Ceramics |
| US20080131691A1 (en) * | 2006-12-05 | 2008-06-05 | Canon Kabushiki Kaisha | Optical glass |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080131691A1 (en) * | 2006-12-05 | 2008-06-05 | Canon Kabushiki Kaisha | Optical glass |
| US7727918B2 (en) * | 2006-12-05 | 2010-06-01 | Canon Kabushiki Kaisha | Optical glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008143718A (ja) | 2008-06-26 |
| US7727918B2 (en) | 2010-06-01 |
| US20080131691A1 (en) | 2008-06-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7294595B2 (en) | Silica glass | |
| EP1166183A1 (en) | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass | |
| JP3188624B2 (ja) | 遠紫外線用高純度合成シリカガラス及びその製造方法 | |
| Ehrt | Deep-UV materials | |
| KR20120055564A (ko) | TiO₂를 함유하는 실리카 유리 및 EUV 리소그래피용 광학 부재 | |
| US8735308B2 (en) | Optical member comprising TiO2-containing silica glass | |
| JP4323319B2 (ja) | アルミニウムを含有する溶融シリカ | |
| US7727918B2 (en) | Optical glass | |
| US20080131690A1 (en) | Optical glass | |
| KR20110108351A (ko) | TiO₂를 함유하는 실리카 유리를 포함하는 광학 부재 | |
| JP2000239040A (ja) | F2エキシマレーザー光学部材用石英ガラス材料及び光学部材 | |
| US6630418B2 (en) | Fused silica containing aluminum | |
| US20120152730A1 (en) | Glass composition for ultraviolet light and optical device using the same | |
| JP5606100B2 (ja) | ガラス組成物及びそれを用いた光学装置 | |
| JP3705501B2 (ja) | エキシマレーザ光学素材用合成石英ガラス部材の製造方法 | |
| JP2002316831A (ja) | フッ素添加石英ガラス | |
| US20020160276A1 (en) | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass | |
| JP2004525409A (ja) | 真空紫外透過性シリコンオキシフルオライドリソグラフィガラス |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: CANON KABUSHIKI KAISHA, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:WATANABE, TOMOHIRO;MUKAIDE, TAIHEI;ITOH, HIDENOSUKE;REEL/FRAME:018832/0013 Effective date: 20070124 |
|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |