US20070051616A1 - Multizone magnetron assembly - Google Patents
Multizone magnetron assembly Download PDFInfo
- Publication number
- US20070051616A1 US20070051616A1 US11/282,798 US28279805A US2007051616A1 US 20070051616 A1 US20070051616 A1 US 20070051616A1 US 28279805 A US28279805 A US 28279805A US 2007051616 A1 US2007051616 A1 US 2007051616A1
- Authority
- US
- United States
- Prior art keywords
- target
- magnetron
- substrate
- pole
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000012545 processing Methods 0.000 claims abstract description 190
- 239000000758 substrate Substances 0.000 claims abstract description 116
- 238000000034 method Methods 0.000 claims abstract description 43
- 238000000151 deposition Methods 0.000 claims abstract description 40
- 230000008021 deposition Effects 0.000 claims abstract description 25
- 238000005240 physical vapour deposition Methods 0.000 abstract description 27
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000008569 process Effects 0.000 description 27
- 239000007789 gas Substances 0.000 description 15
- 238000004544 sputter deposition Methods 0.000 description 14
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 101100107923 Vitis labrusca AMAT gene Proteins 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 229910000828 alnico Inorganic materials 0.000 description 2
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3455—Movable magnets
Definitions
- Embodiments of the present invention generally relate to substrate plasma processing apparatuses and methods that are adapted to deposit a film on a surface of a substrate.
- PVD Physical vapor deposition
- a target is electrically biased so that ions generated in a process region can bombard the target surface with sufficient energy to dislodged atoms from the target.
- the process of biasing a target to cause the generation of a plasma that causes ions to bombard and remove atoms from the target surface is commonly called sputtering.
- the sputtered atoms travel generally toward the wafer being sputter coated, and the sputtered atoms are deposited on the wafer.
- the atoms react with a gas in the plasma, for example, nitrogen, to reactively deposit a compound on the wafer.
- a gas in the plasma for example, nitrogen
- Reactive sputtering is often used to form thin barrier and nucleation layers of titanium nitride or tantalum nitride on the substrate.
- Direct current (DC) magnetron sputtering is the most usually practiced commercial form of sputtering.
- the metallic target is biased to a negative DC bias in the range of about ⁇ 100 to ⁇ 600 VDC to attract positive ions of the working gas (e.g., argon) toward the target to sputter the metal atoms.
- the sides of the sputter chamber are covered with a shield to protect the chamber walls from sputter deposition.
- the shield is typically electrically grounded and thus provides an anode in opposition to the target cathode to capacitively couple the DC target power to the plasma generated in the sputter chamber.
- a magnetron having at least a pair of opposed magnetic poles is typically disposed near the back of the target to generate a magnetic field close to and parallel to the front face of the target.
- the induced magnetic field from the pair of opposing magnets trap electrons and extend the electron lifetime before they are lost to an anodic surface or recombine with gas atoms in the plasma. Due to the extended lifetime, and the need to maintain charge neutrality in the plasma, additional argon ions are attracted into the region adjacent to the magnetron to form there a high-density plasma. Thereby, the sputtering rate is increased.
- the substrate is a glass substrate with a surface area greater than about 2000 cm 2 .
- TFT processing equipment is generally configured to accommodate substrates up to about 1.5 ⁇ 1.8 meters.
- processing equipment configured to accommodate substrate sizes up to and exceeding 2.16 ⁇ 2.46 meters, is envisioned in the immediate future.
- One issue that arises is that it is generally not feasible to create a chamber big enough to maintain the surface area ratio of the cathode (target) to anode surface area commonly used in conventional sputter processing chambers.
- the reduced surface area of the anode relative to the large target surface area generally causes the density of the plasma generated in the processing region, which is generally defined as the region below the target and above the substrate, to vary significantly from the center of the target to the edge of the target. Since the anodic surfaces are commonly distributed around the periphery of the target, it is believed that the larger distance from the center of the target to the anodic surfaces, makes the emission of electrons from the target surface at the edge of the target more favorable, and thus reduces the plasma density near the center of the target.
- the reduction in plasma density in various regions across the target face will reduce the number of ions striking the surface of the target in that localized area and thus varying the uniformity of the deposited film across the surface of a substrate that is positioned a distance from the target face.
- the insufficient anode area problem will thus manifest itself as a film thickness non-uniformity that is smaller near the center of the substrate relative to the edge.
- the present invention generally provides a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near the target, wherein the magnetron assembly comprises a magnetron section that has one or more magnets that are magnetically coupled to the processing region, and an actuator that is adapted to position the magnetron section in a direction generally perpendicular to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
- Embodiments of the invention may further provide a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near the target, wherein the magnetron assembly comprises a first magnetron section that has one or more magnets that are magnetically coupled to the processing region, a second magnetron section that has one or more magnets that are magnetically coupled to the processing region, a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target, and a second actuator that is adapted to position the first magnetron section in a direction generally parallel to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
- Embodiments of the invention may further provide a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near to the target, wherein the magnetron assembly comprises a first magnetron section that has one or more magnets that are magnetically coupled to the processing region, a second magnetron section that has one or more magnets that are magnetically coupled to the processing region, wherein the first magnetron section is nested within the second magnetron section, a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target, and a second actuator that is adapted to position the first magnetron section and the second magnetron section in a direction generally parallel to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting
- Embodiments of the invention may further provide a method of depositing a layer on a surface of a substrate, comprising providing a target that has a surface that contacts a processing region, providing a magnetron section that is magnetically coupled to the processing region through the target, depositing a conductive layer on a surface of a substrate that is positioned in the processing region, and adjusting the position the magnetron section in a direction generally perpendicular to the surface of the target to improve the deposition uniformity across the surface of the substrate.
- Embodiments of the invention may further provide a method of depositing a layer on a surface of a substrate, comprising providing a target that has a surface that contacts a processing region, providing a magnetron section that is magnetically coupled to the processing region through the target, moving the magnetron section in a direction that is generally parallel to the surface of the target by use of an actuator, depositing a conductive layer on a surface of a substrate that is positioned in the processing region, and adjusting the position of the magnetron section in a direction generally perpendicular to the surface of the target while the magnetron is moving in a direction that is generally parallel to the surface of the target to improve the deposition uniformity across the surface of the substrate.
- FIG. 1 is a vertical cross-sectional view of conventional physical vapor deposition chamber.
- FIG. 2 is a vertical cross-sectional view of an exemplary physical vapor deposition chamber.
- FIG. 2B is a vertical cross-sectional view of a processing region formed in an exemplary physical vapor deposition chamber.
- FIG. 3A schematically illustrates a plurality of magnetron sections positioned near a target in an exemplary physical vapor deposition chamber.
- FIG. 3B illustrates a plot of magnetic field strength versus the distance along a path that extends across and through the center of a target that may be used in an exemplary physical vapor deposition chamber.
- FIG. 3C schematically illustrates a plurality of magnetron sections positioned near a target in an exemplary physical vapor deposition chamber.
- FIG. 3D illustrates a plot of magnetic field strength versus the distance along a path that extends across and through the center of a target that may be used in an exemplary physical vapor deposition chamber.
- FIG. 4A is a plan view of a linear magnetron usable with the sputter reactor of FIG. 2 .
- FIG. 4B is a schematic plan view of a plasma loop formed by a serpentine magnetron according to one aspect of the invention.
- FIG. 4C is a schematic plan view of a plasma loop formed by a rectangularized spiral magnetron according to one aspect of the invention.
- FIG. 4D is a more realistic plan view of a serpentine magnetron according to one aspect of the invention.
- FIG. 4E is a more realistic plan view of a rectangularized spiral magnetron according to one aspect of the invention.
- FIG. 4F is a plan view of a magnetron assembly having two magnetron sections according to one aspect of the invention.
- FIG. 4G is a vertical cross-sectional view of the magnetron assembly illustrated in FIG. 4F according to one aspect of the invention.
- FIG. 4H is a plan view of a magnetron assembly having two magnetron sections according to one aspect of the invention.
- FIG. 4I is a vertical cross-sectional view of the magnetron assembly illustrated in FIG. 4H according to one aspect of the invention.
- FIG. 5 is a vertical cross-sectional view of a processing region formed in an exemplary physical vapor deposition chamber.
- the present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly that has separately positionable magnetron sections to improve the deposition uniformity.
- aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing.
- the invention is illustratively described below in reference to a physical vapor deposition system, for processing large area substrates, such as a PVD system, available from AKT, a division of Applied Materials, Inc., Santa Clara, Calif.
- the processing chamber is adapted to process substrates that have a surface area of at least about 2000 cm 2 .
- the processing chamber is adapted to process substrates that have a surface area of at least about 19,500 cm 2 (e.g., 1300 mm ⁇ 1500 mm). In one aspect, the processing chamber is adapted to process rectangular substrates.
- the apparatus and method may have utility in other system configurations, including those systems configured to process large area round substrates.
- FIG. 1 illustrates a cross-sectional view of the processing region of a conventional physical vapor deposition (PVD) chamber 1 .
- the conventional PVD chamber 1 generally contains a target 8 , a vacuum chamber 2 , an anode shield 3 , a shadow ring 4 , a target electrical insulator 6 , a DC power supply 7 , a process gas source 9 , a vacuum pump system 11 and a substrate support 5 .
- a process gas such as argon
- a plasma is generated in the processing region 15 due to a negative bias created between the target 8 and the anode shield 3 by use of the DC power supply 7 .
- the plasma is primarily generated and sustained by the emission of electrons from the surface of the target due to the target bias and secondary emission caused by the ion bombardment of the negative (cathodic) target surface.
- a base pressure e.g. 10 ⁇ 6 to 10 ⁇ 9 Torr
- FIG. 1 is intended to illustrate one of the believed causes of the plasma non-uniformity in a large area substrate processing chamber by highlighting the path difference between the an electron (see e ⁇ ) ejected from the surface of the target 8 near the center of the target (see path “A”) and electrons emitted from the surface of the target (e.g., secondary emission) near the edge (see path “B”).
- the longer path to the anode typically a grounded surface, experienced by an electron leaving the center of the target may increase the number of collisions the electron will undergo before it is lost to the anode surface or recombined with an ion contained in the plasma
- the bulk of the electrons emitted from the target 8 will be emitted near the edge of the target due to the reduced electrical resistance of this path to ground.
- the reduced electrical resistance of the path near the edge of the target to ground is due to the lower resistance path through the conductive target 8 material(s) and the shorter path length (“B”) of the electron's path to ground. It is believed that the lower resistance path thus tends to increase the current density and plasma density near the edge of the target thus increasing the amount of material sputtered at the edge versus the center of the target 8 .
- FIG. 2 illustrates a vertical cross-sectional view of one embodiment of a processing chamber 10 that may be used to perform aspects of the invention described herein.
- the processing chamber 10 contains a magnetron assembly 23 that has two or more magnetron sections 301 (e.g., elements 301 A- 301 C in FIG. 2 ) that are used to increase and more evenly distribute a generated magnetic field throughout the processing region 15 .
- FIG. 2 illustrates a substrate 12 that is positioned in a processing position in the processing region 15 .
- the processing chamber 10 contains a lid assembly 20 and a lower chamber assembly 35 .
- the lower chamber assembly 35 generally contains a substrate support assembly 60 , chamber body assembly 40 , a shield 50 , a process gas delivery system 45 and a shadow frame 52 .
- the shadow frame 52 is generally used to shadow the edge of the substrate to prevent or minimize the amount of deposition on the edge of a substrate 12 and substrate support 61 during processing (see FIG. 2 ).
- the chamber body assembly 40 generally contains one or more chamber walls 41 and a chamber base 42 .
- the one or more chamber walls 41 , the chamber base 42 and target 24 generally form a vacuum processing area 17 that has a lower vacuum region 16 and a processing region 15 .
- a shield mounting surface 50 A of the shield 50 is mounted on or connected to a grounded chamber shield support 43 formed in the chamber walls 41 to ground the shield 50 .
- the process gas delivery system 45 generally contains one or more gas sources 45 A that are in fluid communication with one or more inlet ports 45 B that are in direct communication with the lower vacuum region 16 (shown in FIG. 2 ) and/or the processing region 15 , to deliver a process gas that can be used during the plasma process.
- the process gas used in PVD type applications is, for example, an inert gas such as argon, but other gases such as nitrogen may be used.
- the substrate support assembly 60 generally contains a substrate support 61 , a shaft 62 that is adapted to support the substrate support 61 , and a bellows 63 that is sealably connected to the shaft 62 and the chamber base 42 to form a moveable vacuum seal that allows the substrate support 61 to be positioned in the lower chamber assembly 35 by the lift mechanism 65 .
- the lift mechanism 65 may contain a conventional linear slide (not shown), pneumatic air cylinder (not shown) and/or DC servo motor that is attached to a lead screw (not shown), which are adapted to position the substrate support 61 , and substrate 12 , in a desired position in the processing region 15 .
- the substrate support 61 may contain RF biasable elements 61 A embedded within the substrate support 61 that can be used to capacitively RF couple the substrate support 61 to the plasma generated in the processing region 15 by use of an RF power source 67 and RF matching device 66 .
- the ability to RF bias the substrate support 61 may be useful to help improve the plasma density, improve the deposition profile on the substrate, and increase the energy of the deposited material at the surface of the substrate.
- the lower chamber assembly 35 will also generally contain a substrate lift assembly 70 , slit valve 46 and vacuum pumping system 44 .
- the lift assembly 70 generally contains three or more lift pins 74 , a lift plate 73 , a lift actuator 71 , and a bellows 72 that is sealably connected to the lift actuator 71 and the chamber base 42 so that the lift pins 74 can remove and replace a substrate positioned on a robot blade (not shown) that has been extended into the lower chamber assembly 35 from a central transfer chamber (not shown).
- the extended robot blade enters the lower chamber assembly 35 through the access port 32 in the chamber wall 41 and is positioned above the substrate support 61 that is positioned in a transfer position (not shown).
- the vacuum pumping system 44 may generally contains a cryo-pump, turbo pump, cryo-turbo pump, rough pump, and/or roots blower to evacuate the lower vacuum region 16 and processing region 15 to a desired base and/or processing pressure.
- a slit valve actuator (not shown) which is adapted to position the slit valve 46 against or away from the one or more chamber walls 41 may be a conventional pneumatic actuator which are well known in the art.
- a controller 101 is used to control the various processing chamber 10 components and process variables during a deposition process.
- the processing chamber's processing variables may be controlled by use of the controller 101 , which is typically a microprocessor-based controller.
- the controller 101 is configured to receive inputs from a user and/or various sensors in the plasma processing chamber and appropriately control the plasma processing chamber components in accordance with the various inputs and software instructions retained in the controller's memory.
- the controller 101 generally contains memory and a CPU which are utilized by the controller to retain various programs, process the programs, and execute the programs when necessary.
- the memory is connected to the CPU, and may be one or more of a readily available memory, such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, or any other form of digital storage, local or remote.
- RAM random access memory
- ROM read only memory
- floppy disk hard disk, or any other form of digital storage, local or remote.
- Software instructions and data can be coded and stored within the memory for instructing the CPU.
- the support circuits are also connected to the CPU for supporting the processor in a conventional manner.
- the support circuits may include cache, power supplies, clock circuits, input/output circuitry, subsystems, and the like all well known in the art.
- a program (or computer instructions) readable by the controller 101 determines which tasks are performable in the plasma processing chamber.
- the program is software readable by the controller 101 and includes instructions to monitor and control the plasma process based on defined rules and input data.
- the lid assembly 20 generally contains a target 24 , a lid enclosure 22 , a ceramic insulator 26 , one or more o-ring seals 29 and a magnetron assembly 23 that are positioned in a target backside region 21 .
- the ceramic insulator 26 is not required to provide electrical isolation between the backing plate 24 B of the target 24 and the chamber body assembly 40 .
- a vacuum pump 25 FIG. 2 is used to evacuate the target backside region 21 to reduce the stress induced in the target 24 due to the pressure differential created between the processing region 15 and the target backside region 21 during processing.
- the typically less than atmospheric pressure formed in the processing region 15 is created by use of the vacuum pumping system 44 (discussed below).
- the reduction in the pressure differential across the target 24 can be important for process chambers 10 that are adapted to process large area substrates greater than 2000 cm 2 to prevent the large deflections of the center of the target 24 . Large deflections are often experienced even when the pressure differential is about equal to atmospheric pressure (e.g., 14 psi).
- the sputter deposited film uniformity can be affected by the deflection, or bowing, of the target since it will cause the magnetic field strength generated by a conventional planar magnetron to vary from the center to the edge of a target 24 since the center of the target is moving a farther distance away from the conventional planar magnetron than the edge of the target and thus the magnetic field strength in the processing region 15 will be reduced in the center region of the target.
- the reduction in magnetic field strength will affect the plasma density uniformity across the target surface 24 C and thus the sputter deposition profile on the processing surface of the substrate.
- embodiments of the invention utilize a magnetron assembly 23 that contain two or more magnetron sections (e.g., elements 301 A-C) that are positionable relative to the target backside surface 24 D, and thus the target surface 24 C and processing region 15 .
- the magnetron assembly 23 will contain two or more magnetron sections (e.g., three shown in FIGS. 2 and 2 B) that are positionable relative to the target surface 24 C and each contain at least one magnet 27 that has a pair of opposing magnetic poles (i.e., north (N) and south (S)) that create a magnetic field (B-field) that passes through the target 24 and the processing region 15 (see element “B” in FIG. 2B ).
- FIG. 2 and 2 B illustrates a cross-section of one embodiment of a processing chamber 10 that has one magnetron assembly 23 that contain three magnet sections (elements 301 A- 301 C), which are positioned at the back of the target 24 .
- the target 24 illustrated in FIG. 2 , has a backing plate 24 B and target material 24 A
- other embodiments of the invention may use a solid, or monolithic, type target without varying from the basic scope of the invention.
- each of the magnetron sections 301 have an effect on the shape and uniformity of the PVD deposited layer due to the strength and orientation of the magnetic fields generated by the magnetron sections in the magnetron assembly 23 .
- each of the magnetron sections will contain at least one magnet 27 .
- the magnets 27 may be permanent magnets (e.g., neodymium, samarium-cobalt, ceramic, or Alnico) or electromagnets.
- each magnetron section is adapted to deliver a constant or varying magnetic field strength using electromagnets as a function of time and/or position relative to the center of the target 24 .
- the single magnetron assembly 23 may contain two or more regions that have differing magnetic field strengths that are optimized to achieve a desired plasma density and sputter deposition profile.
- the term sputter deposition profile is intended to describe the deposited film thickness as measured across the substrate processing surface (element 12 A in FIG. 2 ) of the substrate 12 .
- the two or more magnetron sections are distributed across the target 24 to balance out the difference in current flow between the center and edge of the target caused the differing resistance to the anode (e.g., ground) for each of these electrical paths.
- the control of the magnetic field distribution from the center to the edge of the target 24 is used to control and improve plasma density and thus the deposition uniformity across the processing surface.
- the magnetic field strength of the magnetron sections are configured to deliver a higher magnetic field strength in the center of the target 24 rather than the edge of the target.
- a higher magnetic field strength in the center of the target rather than the edge of the target is created by positing the magnetron sections near to the center of the target closer to the target surface 24 C and/or moving the magnetron sections near the edge of the target away from the target surface 24 C.
- the magnetron assembly 23 is smaller in size than the target 24 and is translated across the back of the target 24 to assure full utilization of the target surface 24 C.
- the magnetron sections 301 A- 301 C are translated (e.g., raster, scan, and/or rotate) in at least one of the directions (X and/or Y directions) that are parallel to the target surface 24 C by use of one or more horizontal magnetron actuators 34 A.
- two or more orthogonally oriented magnetron actuators 34 A may be used to adjust the magnetron's position in the X-Y plane.
- the horizontal magnetron actuators 34 A may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired speed by use of commands from the controller 101 .
- the horizontal actuators 34 A may contain an independently controlled motor (e.g., linear motor, stepper motor, or DC servo motor) that is coupled to a worm gear, or lead screw, so that the coupled magnetron assembly 23 can be accurately positioned horizontally by commands from the controller 101 .
- the magnetron sections 301 are translated in at least one of the directions that are perpendicular (Z-direction) to the target surface 24 C by use of one or more vertical magnetron actuators 34 B.
- the ability to position a magnetron section (e.g., 301 A, 301 B, 301 C) in a position perpendicular to the target surface 24 C will affect the magnetic field strength formed in the processing region 15 and thus the plasma density in the regions below the target surface 24 C.
- a magnetron section e.g., 301 A, 301 B, 301 C
- the magnetron section(s) closer to the target 24 will increase the magnetic field strength in the processing region 15 while moving the magnet farther away from the target 24 will reduce the magnetic field strength passing through the processing region 15 .
- the plasma density and sputter deposition profile across the processing surface 12 A can be varied or adjusted.
- the vertical position of a magnetron section is adjusted to compensate for the bow of the target 24 .
- the vertical position of a magnetron section 301 is adjusted during processing to compensate for the deposition non-uniformity found in the substrate surface.
- the vertical magnetron actuators 34 B may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired acceleration and/or speed by use of commands from the controller 101 .
- the vertical actuators 34 B may contain an independently controlled motor (e.g., linear motor, stepper motor, or DC servo motor) that is coupled to a worm gear, or lead screw, so that the coupled magnetron sections 301 can be accurately positioned by commands from the controller 101 .
- the position of the magnetron sections 301 can be adjusted in the X, Y and Z directions ( FIG. 2B ) as a function of time or position relative to the center of the target 24 by the coordination of the horizontal and vertical magnetron actuators 34 A-B by use of the controller 101 .
- the ability to adjust the magnetron section 301 position in the X, Y and Z directions can be useful to adjust and/or tune the magnetic field strength in the processing region 15 and thus the sputter deposition profile received on the processing surface 12 A of the substrate 12 .
- each of the magnetron sections 301 A-C are adapted to translate across the target 24 in unison by use of magnetron actuators 34 A-B to control plasma density uniformity and improve the deposition profile across the substrate surface by use of the controller 101 .
- each of the magnetron sections 301 A-B are adapted to separately translated relative to the target 24 by use of one or more magnetron actuators (element 34 A-B) and the controller 101 .
- FIGS. 3A and 3C schematically illustrate a target 24 that has three magnetron sections (elements 301 A-C) that are each adapted to control the magnetic field strength in various regions of the target 24 during processing.
- the magnetron section 301 A is thus adapted to control the magnetic field strength near the center of the target 24 and the magnetron sections 301 B-C are adapted to control the magnetic field strength near the edge of the target 24 .
- the magnetic field strength can be adjusted in each of target sections by use of stronger magnets in different regions of the magnetron section 301 , increasing the density of the magnets in different regions of the magnetron section 301 , using electromagnets that allow one to adjust the delivered magnetic field, and/or increasing the dwell time of each of the magnetron sections 301 over the certain areas of the target as the magnetron is translated in the X, Y and/or Z directions during processing by use of the magnetron actuators 34 A-B.
- FIGS. 3B and 3D illustrate a plot of magnitude of the magnetic field as a function of linear distance across the target 24 (in FIG. 3A or 3 C).
- the magnetic field strength in these plots may be generated by the static placement of magnets across the target sections, the time average of the magnetic field strength caused by the translation of the magnetron sections 301 (e.g., elements 301 A-C) across the target 24 , and/or the varying of the magnetic field strength by adjusting the current delivered to the one or more electromagnets in the magnetron sections 301 .
- 3B and 3D illustrate the magnitude of the magnetic field in a linear path that extends from one edge (element “E”) of the target 24 through the center (element “C”) point of the target 24 and out to the opposite edge (element “E”) of the target 24 .
- FIGS. 3B and 3D also generally illustrate an “edge region”, which is generally defined as an area of the target near the edge “E” of the target, and a “center region”, which is generally defined as an area of the target that is positioned over the center “C” of the target.
- the edge and center regions are generally areas over which one or more magnetron sections are adapted to move to achieve the desired magnetic field strength profile across the target surface in the X and Y-directions.
- the center magnetron section 301 A is generally adapted to be moved across the center section and edge magnetrons 301 B, 301 C are generally adapted to be moved across their respective edge sections.
- overlap of each magnetron into adjacent regions may be desirable to assure desirable process results (e.g., improved target utilization).
- the size and shape of the edge and center regions may be adjusted to improve the deposition uniformity and may vary depending on the magnetic field strength, dwell time of the magnetron sections over each region, and other typical sputter process variables.
- FIG. 3B illustrates an exemplary distribution of the magnetic field strength (elements 131 A-B) across the target (see FIG. 3A ) measured just below the target surfaces 24 C in the processing region 15 .
- the magnetic field strength varies linearly from the edge of the target 24 and peaks at the center of the target 24 .
- the larger magnetic field strength in the center target 24 will tend to increase the plasma density in the center versus the edge of the target and thus can be used to improve the sputter deposition profile when used in large area substrate processing chambers.
- the magnetic field strength variation from the center of the target to the edge for a process chamber adapted to process a 2.2 m ⁇ 2.5 m substrate is configured to deliver about 0 to about 500 gauss near the edge to about 300 to about 1000 gauss near the center of the target 24 .
- FIG. 3D illustrates an exemplary distribution of the magnetic field strength (elements 131 A-B) across the target (see FIG. 3C ) measured just below the target surfaces 24 C in the processing region 15 .
- the magnetic field strength is constant in different regions of the target 24 , and the magnetic field strength has a discontinuity at the transitions between the different regions of the target.
- the larger magnetic field strength in the center of the target will tend to increase the plasma density in the center versus the edge of the target 24 and thus can be used to improve the deposition profile.
- FIGS. 3B and 3D While the graphs of magnetic field strength across the target 24 are shown to vary in a linear fashion from the center to the edge of the target, other embodiments of the invention may use second degree (e.g., quadratic), third degree (e.g., cubic), exponential, or other shaped curves that delivers a desired the plasma density across the target face and desired sputter deposition profile without deviating from the basic scope of the invention described herein.
- FIGS. 3B and 3D illustrate the magnetic field strength across the target 24 , which peak at the center (“C”) of the target 24 , this configuration is not intended to be limiting to basic scope of the invention.
- 3B and 3D illustrate a magnetic field strength plot that varies in two main target sections (e.g., center and edge), other configurations may be used that contain an optimized magnetic field strength profile that contains multiple segments of changing magnetic field strength without varying form the basic scope of the invention as described herein.
- the magnets 27 in the magnetron sections are electromagnets that may be translated or remain stationary over the target section(s) during processing.
- the magnetic field (B-Field) generated by the electromagnets can be dynamically adjusted during different phases of the deposition process, by adjusting the current passing through the plurality conductive coils contained in the electromagnet.
- the magnetic field generated by the electromagnets (element 27 ) can be dynamically adjusted as a function of position of the magnetron section 301 over its target 24 .
- the magnetron assembly's magnetic field strength may be reduced as magnetron section 301 is translated to positions that are near an edge of a target 24 (element “E”) to reduce the interaction between the adjacent magnetron sections or other chamber components.
- E an edge of a target 24
- the ability to adjust the magnetic field strength as a function of translational position can help to improve the deposition uniformity and reduce the interaction between the various target sections.
- the controller 101 commands the vacuum pumping system 44 to evacuate the processing chamber 10 to a predetermined pressure/vacuum so that the plasma processing chamber 10 can receive a substrate 12 from a system robot (not shown) mounted to a central transfer chamber (not shown) which is also under vacuum.
- the slit valve (element 46 ) which seals off the processing chamber 10 from the central transfer chamber, opens to allow the system robot to extend through the access port 32 in the chamber wall 41 .
- the lift pins 74 then remove the substrate 12 from the extended system robot, by lifting the substrate from the extended robot blade (not shown).
- the system robot then retracts from the processing chamber 10 and the slit valve 46 closes to isolate the processing chamber 10 from the central transfer chamber.
- the substrate support 61 then lifts the substrate 12 from the lift pins 74 and moves the substrate 12 to a desired processing position below the target 24 .
- the position of the magnetron sections 301 may then be adjusted or continually varied as a function of time in the X, Y and/or Z directions to achieve a desired magnetic field in the processing region 15 .
- a desired flow of a processing gas is injected into the processing region 15 and a bias voltage is applied to the target 24 by use of a power supply 28 to generate a plasma in the processing region 15 .
- the application of a DC bias voltage by the power supply 28 causes the gas ionized in the processing region 15 to bombard the target surface and thus “sputter” metal atoms that land on the processing surface 12 A of the substrate positioned on the surface of the substrate support 61 .
- FIG. 4A illustrates a plan view of a magnetron section 224 that has two poles 228 and 226 which are typically positioned parallel to the front face of the target 24 ( FIG. 2B ).
- the magnetron assembly 23 may be formed by a central pole 226 of one magnetic polarity surrounded by an outer pole 228 of the opposite polarity to project a magnetic field within the processing region 15 of chamber 10 ( FIG. 2B ).
- the two poles 226 , 228 are separated by a substantially constant gap 230 over which a high-density plasma is formed under the correct chamber conditions and gas flows in a closed loop or track region.
- the outer pole 228 consists of two straight portions 232 connected by two semi-circular arc portions 234 .
- the magnetic field formed between the two poles 226 , 228 traps electrons and thereby increases the density of the plasma and as a result increases the sputtering rate.
- the relatively small widths of the poles 226 , 228 and of the gap 230 produce a high magnetic flux density.
- the closed shape of the magnetic field distribution along a single closed track forms a plasma loop generally following the gap 230 and prevents the plasma from leaking out the ends of the formed plasma. In one aspect, it may not be desirable to form a closed shape of the magnetic field distribution.
- the optimum shape of the generated plasma will vary from one substrate size to another, from the ratio of the anode (e.g., grounded surface) to cathode (e.g., target) surface area, target to substrate spacing, PVD process pressure, motion of the magnetron across the target face, desired deposition rate, and type of material that is being deposited.
- anode e.g., grounded surface
- cathode e.g., target
- the effectiveness of the magnetron assembly 23 on reducing the center to edge deposited thickness variation is affected by the magnetic permeability of the target material(s) and the translation of the magnetron assembly 23 . Therefore, in some case the magnetron magnetic field pattern may need to be adjusted based on the type of target 24 material(s) and their thickness(es).
- FIGS. 4B and 4C schematically illustrates the shape of a plasma loop 245 created in the processing region 15 of a plasma processing chamber below a target 242 , which is formed using two different convoluted magnetron section shapes that will hereafter be described as a serpentine magnetron 240 ( FIG. 4B ) or spiral magnetron 250 ( FIG. 4C ).
- the serpentine magnetron 240 will generally include multiple long parallel straight portions 243 that are joined by end portions 244 .
- a plasma loop 245 may be formed using a spiral magnetron 250 that includes a series of straight portions 252 and 254 that extend along perpendicular axes and are smoothly joined together to form a plasma loop that has a rectangular spiral shape.
- the plasma loop formed by the magnetron shapes illustrated in FIGS. 4B and 4C are intended to be a schematic representation of some magnetron section configurations that may be useful to perform various aspects of the invention described herein.
- the number of folds and the distance between the plasma loops in either magnetron 240 , 250 may be significantly adjusted as required to achieve a desired process uniformity or deposition profile.
- each of the magnetrons may be considered a folded or twisted version of an extended racetrack magnetron of FIG. 4A with a plasma loop formed between the inner pole and the surrounding outer pole.
- FIGS. 4D and 4E illustrate a serpentine magnetron assembly 260 ( FIG. 4D ) and spiral magnetron assembly 270 ( FIG. 4E ), that are closed convoluted magnetron shapes that are useful to perform aspects of the invention described herein.
- one or more of the magnetron sections may contain a serpentine or spiral magnetron assembly.
- FIG. 4D schematically illustrates one embodiment of a serpentine magnetron assembly 260 that has an array of magnets (e.g., hatched circles) that are aligned and arranged in grooves 264 A-B formed in the magnetron plate 263 to form a first pole 261 and a second pole 262 .
- the serpentine magnetron assembly 260 is formed using an array of magnets 27 that are oriented so that the first pole 261 forms the north pole (elements “N”) of the serpentine magnetron assembly and the second pole 262 forms the south pole (elements “S”) of the serpentine magnetron assembly.
- the magnets 27 described herein may be permanent magnets (e.g., neodymium, samarium-cobalt, ceramic, or Alnico) or electromagnets.
- the width of the outer grooves 264 A, which are at the edge of the serpentine magnetron assembly is generally about half the widths of the inner grooves 264 B since the outer grooves 264 A accommodate only a single row of magnets while the inner groove 264 B accommodate two rows of magnets (not shown) in a staggered arrangements to balance the generated magnetic field strength between the poles.
- a single magnetic yoke plate (not shown) may cover the back of the magnetron plate 263 to magnetically couple the poles of all the magnets.
- the magnets positioned in grooves 264 A and 264 B are capped with their respective pole pieces that are typically formed of magnetically soft stainless steel and have a shape and width that is approximate equal to the formed grooves 264 A or 264 B.
- FIG. 4E illustrates one embodiment of a spiral magnetron assembly 270 that has an array of magnets (e.g., hatched circles) that are aligned and arranged in grooves 274 A-B formed in the magnetron plate 273 to form a first pole 271 and a second pole 272 .
- the two opposing poles, such as first pole 271 and the second pole 272 form a magnetic field in the gaps 275 formed between the first pole 271 and second pole 272 .
- the spiral magnetron assembly 270 as illustrated in FIG.
- the width of the outer grooves 274 A, which are at the edge of the spiral magnetron assembly is generally about half the widths of the inner grooves 274 B since the outer grooves 274 A accommodate only a single row of magnets while the inner groove 274 B accommodate two rows of magnets (not shown) in a staggered arrangements to balance the generated magnetic field strength between the poles.
- a single magnetic yoke plate may cover the back of the magnetron plate 273 to magnetically couple the poles of all the magnets.
- the magnets 27 positioned in grooves 274 A and 274 B are capped with their respective pole pieces that are typically formed of magnetically soft stainless steel and have a shape and width that is approximate equal to the formed grooves 274 A or 274 B.
- FIG. 4F illustrates plan view of one embodiment of a magnetron assembly 23 that have two magnetron sections 301 A and 301 B.
- the first magnetron sections 301 A is nested within the second magnetron section 301 B and a gap 302 is formed between the two magnetron sections.
- the first magnetron section 301 A has a serpentine magnetron assembly 260 arrangement of magnets and the second magnetron section 301 B has a spiral magnetron assembly 270 arrangement of magnets.
- outer pole 272 in the second magnetron section 301 B and the outer pole 262 in the first magnetron section 301 A are schematically illustrated as dashed lines
- inner pole 271 in the second magnetron section 301 B and the inner pole 261 in the first magnetron section 301 A are schematically illustrated as solid lines.
- FIG. 4G schematically illustrates a side cross-sectional view of the magnetron assembly 23 shown in FIG. 4F that is contained in the target backside region 21 of the lid assembly 20 ( FIG. 2 ) and near the target 24 .
- the magnetron assembly 23 is supported and/or coupled to a support plate 303 .
- the vertical magnetron actuators e.g., 34 B′ and 34 B
- the vertical magnetron actuators are coupled to support plate 303 and their respective magnetron section (e.g., 301 A or 301 B) to vertically position (Z-direction) the magnetron sections relative to the target surface 24 C.
- the first magnetron section 301 A is adapted to move a distance “A” closer to the target surface 24 C than the second magnetron section 301 B. In one aspect, the distance “A” may be about 5 mm.
- one or more horizontal magnetron actuators 34 A are adapted to translate the support plate 303 , and coupled magnetron sections 301 A-B, in the X and/or Y directions.
- the vertical magnetron actuators 34 B and horizontal actuators 34 A may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired acceleration and/or speed by use of commands from the controller 101 .
- actuators that may be adapted to perform the vertical magnetron actuators (e.g., 34 B′ and 34 B) and horizontal magnetron actuators 34 A are further described in the commonly assigned U.S. patent application Ser. No. 10/863,152 [AMAT 8841.P1], filed Aug. 24, 2005, which is hereby incorporated by reference in its entirety to the extent not inconsistent with the claimed invention.
- FIG. 4H illustrates a plan view of one embodiment of a magnetron assembly 23 that have two magnetron sections 301 A and 301 B.
- the first magnetron sections 301 A is nested within the second magnetron section 301 B and a gap 302 is formed between the two magnetron sections.
- the first and second magnetron sections 301 A-B utilize a spiral magnetron assembly 270 magnet arrangement.
- outer pole 272 in the second magnetron section 301 B and the outer pole 272 in the first magnetron section 301 A are schematically illustrated as dashed lines
- inner pole 271 in the second magnetron section 301 B and the inner pole 271 in the first magnetron section 301 A are schematically illustrated as solid lines.
- FIG. 41 schematically illustrates a side cross-sectional view of the magnetron assembly 23 shown in FIG. 4H that is contained in a lid assembly 20 ( FIG. 2 ) near the target 24 .
- the magnetron assembly 23 is supported and/or coupled to a support plate 303 .
- the second magnetron section 301 B is mounted to the support plate 303 and the first magnetron section 301 A is coupled to the magnetron plate 303 through the vertical magnetron actuator 34 B′ to vertically position the magnetron section 301 A relative to second magnetron section 301 B and the target surface 24 C.
- the first magnetron section 301 A is adapted to move a distance “B” closer to the target surface 24 C. In one aspect, the distance “B” may be about 5 mm.
- one or more horizontal magnetron actuators 34 A are adapted to translate the support plate 303 , and coupled magnetron sections 301 A-B, in the X and/or Y directions.
- a second vertical magnetron actuator (not shown) is adapted to position the support plate 303 vertically and thus vertically position the first and second magnetron sections 301 A-B.
- the position of a magnetron section (e.g., 301 A-B) in the Z-direction is adjusted relative to its position in the X-direction and/or Y-direction to account for the bow of the target 24 , or just to adjust the deposition uniformity.
- the position in the Z-direction of the magnetron section 301 A may be vertically lower (i.e., closer to an un-bowed target 24 ) as the magnetron section is moved across the center “C” of the target versus when the magnetron section 301 A is positioned a distance away from the center “C” of the target in the X or Y-directions.
- FIG. 5 schematically illustrates a vertical cross-sectional view of processing chamber 10 that has target 24 that is bowed and a magnetron assembly 23 .
- the target 24 may be bowed due to a pressure differential between the processing region 15 and the target backside region 21 and due to the distributed weight of the target, which thus causes the target to deflect relative to its original undeflected shape (element “E”).
- E undeflected shape
- the magnetron section 301 A is supported and positioned in the Z-direction by use of a vertical actuator 34 B′, a support plate 303 and one or more supporting rollers 401 that are adapted to carry the weight of the magnetron assembly 23 and allow motion in the X and/or Y-directions.
- the magnetron section 301 A may be positioned in the X and Y-directions by use of one or more horizontal actuators 34 A.
- a typical method of monitoring and controlling the position and motion of the one or more magnetron sections is to use a closed loop control scheme that utilizes encoders, or other similar devices, that are attached to each actuator and communicate with the controller 101 . Therefore, in one embodiment, it is desirable to assure that a user-defined gap “G” ( FIG. 5 ) is maintained between a magnetron section (e.g., 301 A) and the target backside surface 24 D of a target 24 that has a bowed surface.
- the user-defined gap for example, may be between about 0.5 mm and about 10 mm.
- the controller 101 monitors and controls the position of one or more of the magnetron sections by coordinating and controlling the position magnetron section by use of the horizontal magnetron actuator(s) 34 A and vertical magnetron actuator(s) 34 B.
- the trajectory path may be empirically defined, derived from modeling, or calculated so that a desired deposition profile and/or deposition uniformity is achieved on the substrate surface.
- the trajectory path may be optimized to achieve a desired magnetic field strength in the processing region 15 and deposition profile on the surface of the processed substrate, and thus may not coincide with the bowed shape of the target 24 .
Abstract
The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has a magnetron assembly that has separately positionable magnetron sections to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more magnetron sections and magnetron actuators that are used to increase and more evenly distribute the magnetic field strength throughout the processing region of the processing chamber during processing.
Description
- This application claims benefit of U.S. Provisional Patent Application Ser. No. 60/714,979, filed Sep. 7, 2005, which is herein incorporated by reference.
- 1. Field of the Invention
- Embodiments of the present invention generally relate to substrate plasma processing apparatuses and methods that are adapted to deposit a film on a surface of a substrate.
- 2. Description of the Related Art
- Physical vapor deposition (PVD) using a magnetron is one of the principal methods of depositing metal onto a semiconductor integrated circuit to form electrical connections and other structures in an integrated circuit device. During a PVD process a target is electrically biased so that ions generated in a process region can bombard the target surface with sufficient energy to dislodged atoms from the target. The process of biasing a target to cause the generation of a plasma that causes ions to bombard and remove atoms from the target surface is commonly called sputtering. The sputtered atoms travel generally toward the wafer being sputter coated, and the sputtered atoms are deposited on the wafer. Alternatively, the atoms react with a gas in the plasma, for example, nitrogen, to reactively deposit a compound on the wafer. Reactive sputtering is often used to form thin barrier and nucleation layers of titanium nitride or tantalum nitride on the substrate.
- Direct current (DC) magnetron sputtering is the most usually practiced commercial form of sputtering. The metallic target is biased to a negative DC bias in the range of about −100 to −600 VDC to attract positive ions of the working gas (e.g., argon) toward the target to sputter the metal atoms. Usually, the sides of the sputter chamber are covered with a shield to protect the chamber walls from sputter deposition. The shield is typically electrically grounded and thus provides an anode in opposition to the target cathode to capacitively couple the DC target power to the plasma generated in the sputter chamber.
- A magnetron having at least a pair of opposed magnetic poles is typically disposed near the back of the target to generate a magnetic field close to and parallel to the front face of the target. The induced magnetic field from the pair of opposing magnets trap electrons and extend the electron lifetime before they are lost to an anodic surface or recombine with gas atoms in the plasma. Due to the extended lifetime, and the need to maintain charge neutrality in the plasma, additional argon ions are attracted into the region adjacent to the magnetron to form there a high-density plasma. Thereby, the sputtering rate is increased.
- However, conventional sputtering presents challenges in the formation of advanced integrated circuits on large area substrates, such a flat panel display substrates. Typically, for TFT applications, the substrate is a glass substrate with a surface area greater than about 2000 cm2. Commonly, TFT processing equipment is generally configured to accommodate substrates up to about 1.5×1.8 meters. However, processing equipment configured to accommodate substrate sizes up to and exceeding 2.16×2.46 meters, is envisioned in the immediate future. One issue that arises is that it is generally not feasible to create a chamber big enough to maintain the surface area ratio of the cathode (target) to anode surface area commonly used in conventional sputter processing chambers. Trying to maintain the surface area ratio can lead to manufacturing difficulties due to the large size of the parts required to achieve the desired area ratio and processing problems related to the need to pump down such a large volume to a desired base pressure prior to processing. The reduced surface area of the anode relative to the large target surface area generally causes the density of the plasma generated in the processing region, which is generally defined as the region below the target and above the substrate, to vary significantly from the center of the target to the edge of the target. Since the anodic surfaces are commonly distributed around the periphery of the target, it is believed that the larger distance from the center of the target to the anodic surfaces, makes the emission of electrons from the target surface at the edge of the target more favorable, and thus reduces the plasma density near the center of the target. The reduction in plasma density in various regions across the target face will reduce the number of ions striking the surface of the target in that localized area and thus varying the uniformity of the deposited film across the surface of a substrate that is positioned a distance from the target face. The insufficient anode area problem will thus manifest itself as a film thickness non-uniformity that is smaller near the center of the substrate relative to the edge.
- Therefore, there is a need for a method and apparatus that can improve the uniformity of the PVD deposited film.
- The present invention generally provides a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near the target, wherein the magnetron assembly comprises a magnetron section that has one or more magnets that are magnetically coupled to the processing region, and an actuator that is adapted to position the magnetron section in a direction generally perpendicular to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
- Embodiments of the invention may further provide a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near the target, wherein the magnetron assembly comprises a first magnetron section that has one or more magnets that are magnetically coupled to the processing region, a second magnetron section that has one or more magnets that are magnetically coupled to the processing region, a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target, and a second actuator that is adapted to position the first magnetron section in a direction generally parallel to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
- Embodiments of the invention may further provide a plasma processing chamber assembly for depositing a layer on a substrate comprising a plasma processing chamber having a processing region, a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region, a magnetron assembly positioned near to the target, wherein the magnetron assembly comprises a first magnetron section that has one or more magnets that are magnetically coupled to the processing region, a second magnetron section that has one or more magnets that are magnetically coupled to the processing region, wherein the first magnetron section is nested within the second magnetron section, a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target, and a second actuator that is adapted to position the first magnetron section and the second magnetron section in a direction generally parallel to the surface of the target, and a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
- Embodiments of the invention may further provide a method of depositing a layer on a surface of a substrate, comprising providing a target that has a surface that contacts a processing region, providing a magnetron section that is magnetically coupled to the processing region through the target, depositing a conductive layer on a surface of a substrate that is positioned in the processing region, and adjusting the position the magnetron section in a direction generally perpendicular to the surface of the target to improve the deposition uniformity across the surface of the substrate.
- Embodiments of the invention may further provide a method of depositing a layer on a surface of a substrate, comprising providing a target that has a surface that contacts a processing region, providing a magnetron section that is magnetically coupled to the processing region through the target, moving the magnetron section in a direction that is generally parallel to the surface of the target by use of an actuator, depositing a conductive layer on a surface of a substrate that is positioned in the processing region, and adjusting the position of the magnetron section in a direction generally perpendicular to the surface of the target while the magnetron is moving in a direction that is generally parallel to the surface of the target to improve the deposition uniformity across the surface of the substrate.
- So that the manner in which the above recited features of the present invention can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
-
FIG. 1 is a vertical cross-sectional view of conventional physical vapor deposition chamber. -
FIG. 2 is a vertical cross-sectional view of an exemplary physical vapor deposition chamber. -
FIG. 2B is a vertical cross-sectional view of a processing region formed in an exemplary physical vapor deposition chamber. -
FIG. 3A schematically illustrates a plurality of magnetron sections positioned near a target in an exemplary physical vapor deposition chamber. -
FIG. 3B illustrates a plot of magnetic field strength versus the distance along a path that extends across and through the center of a target that may be used in an exemplary physical vapor deposition chamber. -
FIG. 3C schematically illustrates a plurality of magnetron sections positioned near a target in an exemplary physical vapor deposition chamber. -
FIG. 3D illustrates a plot of magnetic field strength versus the distance along a path that extends across and through the center of a target that may be used in an exemplary physical vapor deposition chamber. -
FIG. 4A is a plan view of a linear magnetron usable with the sputter reactor ofFIG. 2 . -
FIG. 4B is a schematic plan view of a plasma loop formed by a serpentine magnetron according to one aspect of the invention. -
FIG. 4C is a schematic plan view of a plasma loop formed by a rectangularized spiral magnetron according to one aspect of the invention. -
FIG. 4D is a more realistic plan view of a serpentine magnetron according to one aspect of the invention. -
FIG. 4E is a more realistic plan view of a rectangularized spiral magnetron according to one aspect of the invention. -
FIG. 4F is a plan view of a magnetron assembly having two magnetron sections according to one aspect of the invention. -
FIG. 4G is a vertical cross-sectional view of the magnetron assembly illustrated inFIG. 4F according to one aspect of the invention. -
FIG. 4H is a plan view of a magnetron assembly having two magnetron sections according to one aspect of the invention. -
FIG. 4I is a vertical cross-sectional view of the magnetron assembly illustrated inFIG. 4H according to one aspect of the invention. -
FIG. 5 is a vertical cross-sectional view of a processing region formed in an exemplary physical vapor deposition chamber. - The present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly that has separately positionable magnetron sections to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. The invention is illustratively described below in reference to a physical vapor deposition system, for processing large area substrates, such as a PVD system, available from AKT, a division of Applied Materials, Inc., Santa Clara, Calif. In one embodiment, the processing chamber is adapted to process substrates that have a surface area of at least about 2000 cm2. In another embodiment, the processing chamber is adapted to process substrates that have a surface area of at least about 19,500 cm2 (e.g., 1300 mm×1500 mm). In one aspect, the processing chamber is adapted to process rectangular substrates. However, it should be understood that the apparatus and method may have utility in other system configurations, including those systems configured to process large area round substrates.
-
FIG. 1 illustrates a cross-sectional view of the processing region of a conventional physical vapor deposition (PVD)chamber 1. Theconventional PVD chamber 1 generally contains atarget 8, avacuum chamber 2, ananode shield 3, ashadow ring 4, a targetelectrical insulator 6, aDC power supply 7, aprocess gas source 9, avacuum pump system 11 and asubstrate support 5. To perform a sputtering process, a process gas, such as argon, is delivered into the evacuatedconventional PVD chamber 1 from thegas source 9 and a plasma is generated in theprocessing region 15 due to a negative bias created between thetarget 8 and theanode shield 3 by use of theDC power supply 7. In general, the plasma is primarily generated and sustained by the emission of electrons from the surface of the target due to the target bias and secondary emission caused by the ion bombardment of the negative (cathodic) target surface. Prior to performing the PVD processing step(s) it is common for thevacuum chamber 2 to be pumped down to a base pressure (e.g., 10−6 to 10−9 Torr) by use of thevacuum pump system 11. -
FIG. 1 is intended to illustrate one of the believed causes of the plasma non-uniformity in a large area substrate processing chamber by highlighting the path difference between the an electron (see e−) ejected from the surface of thetarget 8 near the center of the target (see path “A”) and electrons emitted from the surface of the target (e.g., secondary emission) near the edge (see path “B”). While the longer path to the anode, typically a grounded surface, experienced by an electron leaving the center of the target may increase the number of collisions the electron will undergo before it is lost to the anode surface or recombined with an ion contained in the plasma, the bulk of the electrons emitted from thetarget 8 will be emitted near the edge of the target due to the reduced electrical resistance of this path to ground. The reduced electrical resistance of the path near the edge of the target to ground is due to the lower resistance path through theconductive target 8 material(s) and the shorter path length (“B”) of the electron's path to ground. It is believed that the lower resistance path thus tends to increase the current density and plasma density near the edge of the target thus increasing the amount of material sputtered at the edge versus the center of thetarget 8. - Increased Anode Area Hardware
-
FIG. 2 illustrates a vertical cross-sectional view of one embodiment of aprocessing chamber 10 that may be used to perform aspects of the invention described herein. In the configuration illustrated inFIG. 2 , theprocessing chamber 10 contains amagnetron assembly 23 that has two or more magnetron sections 301 (e.g.,elements 301A-301C inFIG. 2 ) that are used to increase and more evenly distribute a generated magnetic field throughout theprocessing region 15.FIG. 2 illustrates asubstrate 12 that is positioned in a processing position in theprocessing region 15. In general, theprocessing chamber 10 contains alid assembly 20 and alower chamber assembly 35. - A. Lower Chamber Assembly Hardware
- The
lower chamber assembly 35 generally contains asubstrate support assembly 60,chamber body assembly 40, ashield 50, a processgas delivery system 45 and ashadow frame 52. Theshadow frame 52 is generally used to shadow the edge of the substrate to prevent or minimize the amount of deposition on the edge of asubstrate 12 andsubstrate support 61 during processing (seeFIG. 2 ). Thechamber body assembly 40 generally contains one ormore chamber walls 41 and achamber base 42. The one ormore chamber walls 41, thechamber base 42 andtarget 24 generally form avacuum processing area 17 that has alower vacuum region 16 and aprocessing region 15. In one aspect, ashield mounting surface 50A of theshield 50 is mounted on or connected to a groundedchamber shield support 43 formed in thechamber walls 41 to ground theshield 50. The processgas delivery system 45 generally contains one ormore gas sources 45A that are in fluid communication with one ormore inlet ports 45B that are in direct communication with the lower vacuum region 16 (shown inFIG. 2 ) and/or theprocessing region 15, to deliver a process gas that can be used during the plasma process. Typically, the process gas used in PVD type applications is, for example, an inert gas such as argon, but other gases such as nitrogen may be used. - The
substrate support assembly 60 generally contains asubstrate support 61, ashaft 62 that is adapted to support thesubstrate support 61, and abellows 63 that is sealably connected to theshaft 62 and thechamber base 42 to form a moveable vacuum seal that allows thesubstrate support 61 to be positioned in thelower chamber assembly 35 by thelift mechanism 65. Thelift mechanism 65 may contain a conventional linear slide (not shown), pneumatic air cylinder (not shown) and/or DC servo motor that is attached to a lead screw (not shown), which are adapted to position thesubstrate support 61, andsubstrate 12, in a desired position in theprocessing region 15. In one embodiment, thesubstrate support 61 may contain RF biasable elements 61A embedded within thesubstrate support 61 that can be used to capacitively RF couple thesubstrate support 61 to the plasma generated in theprocessing region 15 by use of anRF power source 67 andRF matching device 66. The ability to RF bias thesubstrate support 61 may be useful to help improve the plasma density, improve the deposition profile on the substrate, and increase the energy of the deposited material at the surface of the substrate. - Referring to
FIG. 2 , thelower chamber assembly 35 will also generally contain asubstrate lift assembly 70, slitvalve 46 andvacuum pumping system 44. Thelift assembly 70 generally contains three or more lift pins 74, alift plate 73, alift actuator 71, and abellows 72 that is sealably connected to thelift actuator 71 and thechamber base 42 so that the lift pins 74 can remove and replace a substrate positioned on a robot blade (not shown) that has been extended into thelower chamber assembly 35 from a central transfer chamber (not shown). The extended robot blade enters thelower chamber assembly 35 through theaccess port 32 in thechamber wall 41 and is positioned above thesubstrate support 61 that is positioned in a transfer position (not shown). The vacuum pumping system 44 (elements lower vacuum region 16 andprocessing region 15 to a desired base and/or processing pressure. A slit valve actuator (not shown) which is adapted to position theslit valve 46 against or away from the one ormore chamber walls 41 may be a conventional pneumatic actuator which are well known in the art. - To control the
various processing chamber 10 components and process variables during a deposition process, acontroller 101 is used. The processing chamber's processing variables may be controlled by use of thecontroller 101, which is typically a microprocessor-based controller. Thecontroller 101 is configured to receive inputs from a user and/or various sensors in the plasma processing chamber and appropriately control the plasma processing chamber components in accordance with the various inputs and software instructions retained in the controller's memory. Thecontroller 101 generally contains memory and a CPU which are utilized by the controller to retain various programs, process the programs, and execute the programs when necessary. The memory is connected to the CPU, and may be one or more of a readily available memory, such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, or any other form of digital storage, local or remote. Software instructions and data can be coded and stored within the memory for instructing the CPU. The support circuits are also connected to the CPU for supporting the processor in a conventional manner. The support circuits may include cache, power supplies, clock circuits, input/output circuitry, subsystems, and the like all well known in the art. A program (or computer instructions) readable by thecontroller 101 determines which tasks are performable in the plasma processing chamber. Preferably, the program is software readable by thecontroller 101 and includes instructions to monitor and control the plasma process based on defined rules and input data. - B. Lid Assembly and Magnetron Hardware
- The
lid assembly 20 generally contains atarget 24, alid enclosure 22, aceramic insulator 26, one or more o-ring seals 29 and amagnetron assembly 23 that are positioned in atarget backside region 21. In one aspect, theceramic insulator 26 is not required to provide electrical isolation between thebacking plate 24B of thetarget 24 and thechamber body assembly 40. In one aspect of theprocess chamber 10, a vacuum pump 25 (FIG. 2 ) is used to evacuate thetarget backside region 21 to reduce the stress induced in thetarget 24 due to the pressure differential created between theprocessing region 15 and thetarget backside region 21 during processing. The typically less than atmospheric pressure formed in theprocessing region 15 is created by use of the vacuum pumping system 44 (discussed below). The reduction in the pressure differential across thetarget 24 can be important forprocess chambers 10 that are adapted to process large area substrates greater than 2000 cm2 to prevent the large deflections of the center of thetarget 24. Large deflections are often experienced even when the pressure differential is about equal to atmospheric pressure (e.g., 14 psi). - The sputter deposited film uniformity can be affected by the deflection, or bowing, of the target since it will cause the magnetic field strength generated by a conventional planar magnetron to vary from the center to the edge of a
target 24 since the center of the target is moving a farther distance away from the conventional planar magnetron than the edge of the target and thus the magnetic field strength in theprocessing region 15 will be reduced in the center region of the target. The reduction in magnetic field strength will affect the plasma density uniformity across thetarget surface 24C and thus the sputter deposition profile on the processing surface of the substrate. To resolve this issue, embodiments of the invention utilize amagnetron assembly 23 that contain two or more magnetron sections (e.g.,elements 301A-C) that are positionable relative to thetarget backside surface 24D, and thus thetarget surface 24C andprocessing region 15. In one embodiment, themagnetron assembly 23 will contain two or more magnetron sections (e.g., three shown inFIGS. 2 and 2 B) that are positionable relative to thetarget surface 24C and each contain at least onemagnet 27 that has a pair of opposing magnetic poles (i.e., north (N) and south (S)) that create a magnetic field (B-field) that passes through thetarget 24 and the processing region 15 (see element “B” inFIG. 2B ).FIGS. 2 and 2 B illustrates a cross-section of one embodiment of aprocessing chamber 10 that has onemagnetron assembly 23 that contain three magnet sections (elements 301A-301C), which are positioned at the back of thetarget 24. It should be noted that while thetarget 24, illustrated inFIG. 2 , has abacking plate 24B andtarget material 24A other embodiments of the invention may use a solid, or monolithic, type target without varying from the basic scope of the invention. - The magnetron sections 301 have an effect on the shape and uniformity of the PVD deposited layer due to the strength and orientation of the magnetic fields generated by the magnetron sections in the
magnetron assembly 23. In general, each of the magnetron sections will contain at least onemagnet 27. Themagnets 27 may be permanent magnets (e.g., neodymium, samarium-cobalt, ceramic, or Alnico) or electromagnets. In one embodiment of theprocessing chamber 10, each magnetron section is adapted to deliver a constant or varying magnetic field strength using electromagnets as a function of time and/or position relative to the center of thetarget 24. In this configuration thesingle magnetron assembly 23 may contain two or more regions that have differing magnetic field strengths that are optimized to achieve a desired plasma density and sputter deposition profile. The term sputter deposition profile is intended to describe the deposited film thickness as measured across the substrate processing surface (element 12A inFIG. 2 ) of thesubstrate 12. - Referring to
FIGS. 2 and 2 B, in one embodiment of theprocessing chamber 10, the two or more magnetron sections (elements 301A-C) are distributed across thetarget 24 to balance out the difference in current flow between the center and edge of the target caused the differing resistance to the anode (e.g., ground) for each of these electrical paths. The control of the magnetic field distribution from the center to the edge of thetarget 24 is used to control and improve plasma density and thus the deposition uniformity across the processing surface. In one aspect, the magnetic field strength of the magnetron sections are configured to deliver a higher magnetic field strength in the center of thetarget 24 rather than the edge of the target. In one aspect, a higher magnetic field strength in the center of the target rather than the edge of the target is created by positing the magnetron sections near to the center of the target closer to thetarget surface 24C and/or moving the magnetron sections near the edge of the target away from thetarget surface 24C. - In one aspect, the
magnetron assembly 23 is smaller in size than thetarget 24 and is translated across the back of thetarget 24 to assure full utilization of thetarget surface 24C. Referring toFIG. 2B , in one embodiment, to improve utilization of the target material and improve deposition uniformity themagnetron sections 301A-301C are translated (e.g., raster, scan, and/or rotate) in at least one of the directions (X and/or Y directions) that are parallel to thetarget surface 24C by use of one or morehorizontal magnetron actuators 34A. In one aspect, where X and Y motion of one or more of the magnetron sections is desired two or more orthogonally orientedmagnetron actuators 34A may be used to adjust the magnetron's position in the X-Y plane. Thehorizontal magnetron actuators 34A may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired speed by use of commands from thecontroller 101. In one aspect, thehorizontal actuators 34A may contain an independently controlled motor (e.g., linear motor, stepper motor, or DC servo motor) that is coupled to a worm gear, or lead screw, so that the coupledmagnetron assembly 23 can be accurately positioned horizontally by commands from thecontroller 101. A translation mechanism that may be used to move the magnetron and be adapted to benefit the invention described herein is further described in the commonly assigned U.S. patent application Ser. No. 10/863,152 [AMAT 8841], filed Jun. 7, 2004, which claims the benefit of U.S. Provisional Patent Application Ser. No. 60/534,952, filed Jan. 7, 2004, and U.S. patent application Ser. No. 10/863,152 [AMAT 8841.P1], filed Aug. 24, 2005, which are hereby incorporated by reference in its entirety to the extent not inconsistent with the claimed invention. - In another embodiment, the magnetron sections 301 are translated in at least one of the directions that are perpendicular (Z-direction) to the
target surface 24C by use of one or morevertical magnetron actuators 34B. The ability to position a magnetron section (e.g., 301A, 301B, 301C) in a position perpendicular to thetarget surface 24C will affect the magnetic field strength formed in theprocessing region 15 and thus the plasma density in the regions below thetarget surface 24C. Generally, by moving the magnetron section(s) closer to thetarget 24 will increase the magnetic field strength in theprocessing region 15 while moving the magnet farther away from thetarget 24 will reduce the magnetic field strength passing through theprocessing region 15. Therefore, by adjusting the position of each of the magnetron sections (e.g.,elements 301A-301C inFIG. 2B ) relative to thetarget surface 24C, the plasma density and sputter deposition profile across theprocessing surface 12A can be varied or adjusted. In one aspect, the vertical position of a magnetron section is adjusted to compensate for the bow of thetarget 24. In another aspect, the vertical position of a magnetron section 301 (e.g., 301A, 301B, 301C) is adjusted during processing to compensate for the deposition non-uniformity found in the substrate surface. Thevertical magnetron actuators 34B may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired acceleration and/or speed by use of commands from thecontroller 101. In one aspect, thevertical actuators 34B may contain an independently controlled motor (e.g., linear motor, stepper motor, or DC servo motor) that is coupled to a worm gear, or lead screw, so that the coupled magnetron sections 301 can be accurately positioned by commands from thecontroller 101. - In one embodiment, the position of the magnetron sections 301 can be adjusted in the X, Y and Z directions (
FIG. 2B ) as a function of time or position relative to the center of thetarget 24 by the coordination of the horizontal andvertical magnetron actuators 34A-B by use of thecontroller 101. The ability to adjust the magnetron section 301 position in the X, Y and Z directions can be useful to adjust and/or tune the magnetic field strength in theprocessing region 15 and thus the sputter deposition profile received on theprocessing surface 12A of thesubstrate 12. In one aspect, each of themagnetron sections 301A-C are adapted to translate across thetarget 24 in unison by use ofmagnetron actuators 34A-B to control plasma density uniformity and improve the deposition profile across the substrate surface by use of thecontroller 101. In another aspect, each of themagnetron sections 301A-B are adapted to separately translated relative to thetarget 24 by use of one or more magnetron actuators (element 34A-B) and thecontroller 101. -
FIGS. 3A and 3C schematically illustrate atarget 24 that has three magnetron sections (elements 301A-C) that are each adapted to control the magnetic field strength in various regions of thetarget 24 during processing. Themagnetron section 301A is thus adapted to control the magnetic field strength near the center of thetarget 24 and themagnetron sections 301B-C are adapted to control the magnetic field strength near the edge of thetarget 24. In one aspect, the magnetic field strength can be adjusted in each of target sections by use of stronger magnets in different regions of the magnetron section 301, increasing the density of the magnets in different regions of the magnetron section 301, using electromagnets that allow one to adjust the delivered magnetic field, and/or increasing the dwell time of each of the magnetron sections 301 over the certain areas of the target as the magnetron is translated in the X, Y and/or Z directions during processing by use of themagnetron actuators 34A-B. -
FIGS. 3B and 3D illustrate a plot of magnitude of the magnetic field as a function of linear distance across the target 24 (inFIG. 3A or 3C). The magnetic field strength in these plots may be generated by the static placement of magnets across the target sections, the time average of the magnetic field strength caused by the translation of the magnetron sections 301 (e.g.,elements 301A-C) across thetarget 24, and/or the varying of the magnetic field strength by adjusting the current delivered to the one or more electromagnets in the magnetron sections 301. The plots shown inFIGS. 3B and 3D illustrate the magnitude of the magnetic field in a linear path that extends from one edge (element “E”) of thetarget 24 through the center (element “C”) point of thetarget 24 and out to the opposite edge (element “E”) of thetarget 24. -
FIGS. 3B and 3D , also generally illustrate an “edge region”, which is generally defined as an area of the target near the edge “E” of the target, and a “center region”, which is generally defined as an area of the target that is positioned over the center “C” of the target. The edge and center regions are generally areas over which one or more magnetron sections are adapted to move to achieve the desired magnetic field strength profile across the target surface in the X and Y-directions. For example, as shown inFIGS. 3A and 3B thecenter magnetron section 301A is generally adapted to be moved across the center section andedge magnetrons -
FIG. 3B illustrates an exemplary distribution of the magnetic field strength (elements 131A-B) across the target (seeFIG. 3A ) measured just below the target surfaces 24C in theprocessing region 15. As shown the magnetic field strength varies linearly from the edge of thetarget 24 and peaks at the center of thetarget 24. In this configuration the larger magnetic field strength in thecenter target 24 will tend to increase the plasma density in the center versus the edge of the target and thus can be used to improve the sputter deposition profile when used in large area substrate processing chambers. In one example, the magnetic field strength variation from the center of the target to the edge for a process chamber adapted to process a 2.2 m×2.5 m substrate is configured to deliver about 0 to about 500 gauss near the edge to about 300 to about 1000 gauss near the center of thetarget 24. -
FIG. 3D illustrates an exemplary distribution of the magnetic field strength (elements 131A-B) across the target (seeFIG. 3C ) measured just below the target surfaces 24C in theprocessing region 15. As shown inFIG. 3D the magnetic field strength is constant in different regions of thetarget 24, and the magnetic field strength has a discontinuity at the transitions between the different regions of the target. In this configuration the larger magnetic field strength in the center of the target will tend to increase the plasma density in the center versus the edge of thetarget 24 and thus can be used to improve the deposition profile. - Referring to
FIGS. 3B and 3D , while the graphs of magnetic field strength across thetarget 24 are shown to vary in a linear fashion from the center to the edge of the target, other embodiments of the invention may use second degree (e.g., quadratic), third degree (e.g., cubic), exponential, or other shaped curves that delivers a desired the plasma density across the target face and desired sputter deposition profile without deviating from the basic scope of the invention described herein. Also, whileFIGS. 3B and 3D illustrate the magnetic field strength across thetarget 24, which peak at the center (“C”) of thetarget 24, this configuration is not intended to be limiting to basic scope of the invention. Furthermore, whileFIGS. 3B and 3D illustrate a magnetic field strength plot that varies in two main target sections (e.g., center and edge), other configurations may be used that contain an optimized magnetic field strength profile that contains multiple segments of changing magnetic field strength without varying form the basic scope of the invention as described herein. - In one embodiment, the
magnets 27 in the magnetron sections (elements 301A-C) are electromagnets that may be translated or remain stationary over the target section(s) during processing. In one aspect, the magnetic field (B-Field) generated by the electromagnets can be dynamically adjusted during different phases of the deposition process, by adjusting the current passing through the plurality conductive coils contained in the electromagnet. In another aspect, the magnetic field generated by the electromagnets (element 27) can be dynamically adjusted as a function of position of the magnetron section 301 over itstarget 24. For example, the magnetron assembly's magnetic field strength may be reduced as magnetron section 301 is translated to positions that are near an edge of a target 24 (element “E”) to reduce the interaction between the adjacent magnetron sections or other chamber components. The ability to adjust the magnetic field strength as a function of translational position can help to improve the deposition uniformity and reduce the interaction between the various target sections. - To perform a PVD deposition process, the
controller 101 commands thevacuum pumping system 44 to evacuate theprocessing chamber 10 to a predetermined pressure/vacuum so that theplasma processing chamber 10 can receive asubstrate 12 from a system robot (not shown) mounted to a central transfer chamber (not shown) which is also under vacuum. To transfer asubstrate 12 to theprocessing chamber 10 the slit valve (element 46), which seals off theprocessing chamber 10 from the central transfer chamber, opens to allow the system robot to extend through theaccess port 32 in thechamber wall 41. The lift pins 74 then remove thesubstrate 12 from the extended system robot, by lifting the substrate from the extended robot blade (not shown). The system robot then retracts from theprocessing chamber 10 and theslit valve 46 closes to isolate theprocessing chamber 10 from the central transfer chamber. Thesubstrate support 61 then lifts thesubstrate 12 from the lift pins 74 and moves thesubstrate 12 to a desired processing position below thetarget 24. The position of the magnetron sections 301 may then be adjusted or continually varied as a function of time in the X, Y and/or Z directions to achieve a desired magnetic field in theprocessing region 15. Then after a achieving a desired base pressure, a desired flow of a processing gas is injected into theprocessing region 15 and a bias voltage is applied to thetarget 24 by use of apower supply 28 to generate a plasma in theprocessing region 15. The application of a DC bias voltage by thepower supply 28 causes the gas ionized in theprocessing region 15 to bombard the target surface and thus “sputter” metal atoms that land on theprocessing surface 12A of the substrate positioned on the surface of thesubstrate support 61. - Magnetron Sections
-
FIG. 4A illustrates a plan view of amagnetron section 224 that has twopoles FIG. 2B ). In one aspect, as shown inFIG. 4A , themagnetron assembly 23 may be formed by acentral pole 226 of one magnetic polarity surrounded by anouter pole 228 of the opposite polarity to project a magnetic field within theprocessing region 15 of chamber 10 (FIG. 2B ). The twopoles constant gap 230 over which a high-density plasma is formed under the correct chamber conditions and gas flows in a closed loop or track region. Theouter pole 228 consists of twostraight portions 232 connected by twosemi-circular arc portions 234. The magnetic field formed between the twopoles poles gap 230 produce a high magnetic flux density. The closed shape of the magnetic field distribution along a single closed track forms a plasma loop generally following thegap 230 and prevents the plasma from leaking out the ends of the formed plasma. In one aspect, it may not be desirable to form a closed shape of the magnetic field distribution. During the PVD deposition process a large portion of the generated plasma in theprocessing region 15 is formed and is retained below themagnetron assemblies 23 in the plasma loop due to the magnetic fields (elements “B” inFIG. 2B ) containment of the electrons found in theprocessing region 15. The optimum shape of the generated plasma will vary from one substrate size to another, from the ratio of the anode (e.g., grounded surface) to cathode (e.g., target) surface area, target to substrate spacing, PVD process pressure, motion of the magnetron across the target face, desired deposition rate, and type of material that is being deposited. The effectiveness of themagnetron assembly 23 on reducing the center to edge deposited thickness variation is affected by the magnetic permeability of the target material(s) and the translation of themagnetron assembly 23. Therefore, in some case the magnetron magnetic field pattern may need to be adjusted based on the type oftarget 24 material(s) and their thickness(es). - In one embodiment, as illustrated in
FIG. 4A , at least one of the magnetron sections 301 are formed using a central pole and outer pole that have a convoluted shape rather than a linear shape.FIGS. 4B and 4C schematically illustrates the shape of aplasma loop 245 created in theprocessing region 15 of a plasma processing chamber below atarget 242, which is formed using two different convoluted magnetron section shapes that will hereafter be described as a serpentine magnetron 240 (FIG. 4B ) or spiral magnetron 250 (FIG. 4C ). Referring toFIG. 4B , to form theplasma loop 245 theserpentine magnetron 240 will generally include multiple long parallelstraight portions 243 that are joined byend portions 244. Theend portions 244 may be arc shaped or alternatively short straight portions with curved corners connecting them to thestraight portions 243. The effective area of theserpentine magnetron 240 defined by the outer generally rectangular outline of the magnetic field distribution parallel to the target face is a substantial fraction of target area. Referring toFIG. 4C , in a related embodiment, aplasma loop 245 may be formed using aspiral magnetron 250 that includes a series ofstraight portions - The plasma loop formed by the magnetron shapes illustrated in
FIGS. 4B and 4C are intended to be a schematic representation of some magnetron section configurations that may be useful to perform various aspects of the invention described herein. One will note that the number of folds and the distance between the plasma loops in eithermagnetron FIG. 4A with a plasma loop formed between the inner pole and the surrounding outer pole. -
FIGS. 4D and 4E illustrate a serpentine magnetron assembly 260 (FIG. 4D ) and spiral magnetron assembly 270 (FIG. 4E ), that are closed convoluted magnetron shapes that are useful to perform aspects of the invention described herein. In one aspect, one or more of the magnetron sections (e.g.,elements 301A-B) may contain a serpentine or spiral magnetron assembly.FIG. 4D schematically illustrates one embodiment of aserpentine magnetron assembly 260 that has an array of magnets (e.g., hatched circles) that are aligned and arranged ingrooves 264A-B formed in themagnetron plate 263 to form afirst pole 261 and asecond pole 262. The two opposing poles, such asfirst pole 261 and thesecond pole 262, form a magnetic field in thegaps 265 formed between thefirst pole 261 andsecond pole 262. In one aspect, theserpentine magnetron assembly 260, as illustrated inFIG. 4D , is formed using an array ofmagnets 27 that are oriented so that thefirst pole 261 forms the north pole (elements “N”) of the serpentine magnetron assembly and thesecond pole 262 forms the south pole (elements “S”) of the serpentine magnetron assembly. Generally, themagnets 27 described herein may be permanent magnets (e.g., neodymium, samarium-cobalt, ceramic, or Alnico) or electromagnets. In one aspect, not shown, the width of theouter grooves 264A, which are at the edge of the serpentine magnetron assembly is generally about half the widths of theinner grooves 264B since theouter grooves 264A accommodate only a single row of magnets while theinner groove 264B accommodate two rows of magnets (not shown) in a staggered arrangements to balance the generated magnetic field strength between the poles. In one aspect, a single magnetic yoke plate (not shown) may cover the back of themagnetron plate 263 to magnetically couple the poles of all the magnets. In one aspect, the magnets positioned ingrooves grooves -
FIG. 4E illustrates one embodiment of aspiral magnetron assembly 270 that has an array of magnets (e.g., hatched circles) that are aligned and arranged ingrooves 274A-B formed in themagnetron plate 273 to form afirst pole 271 and asecond pole 272. The two opposing poles, such asfirst pole 271 and thesecond pole 272, form a magnetic field in thegaps 275 formed between thefirst pole 271 andsecond pole 272. In one aspect, thespiral magnetron assembly 270, as illustrated inFIG. 4F , is formed using an array of magnets that are oriented so that thefirst pole 271 forms the north pole (elements “N”) of the spiral magnetron assembly and thesecond pole 272 forms the south pole (elements “S”) of the spiral magnetron assembly. The width of theouter grooves 274A, which are at the edge of the spiral magnetron assembly is generally about half the widths of theinner grooves 274B since theouter grooves 274A accommodate only a single row of magnets while theinner groove 274B accommodate two rows of magnets (not shown) in a staggered arrangements to balance the generated magnetic field strength between the poles. In one aspect, a single magnetic yoke plate may cover the back of themagnetron plate 273 to magnetically couple the poles of all the magnets. In one aspect, themagnets 27 positioned ingrooves grooves -
FIG. 4F illustrates plan view of one embodiment of amagnetron assembly 23 that have twomagnetron sections first magnetron sections 301A is nested within thesecond magnetron section 301B and agap 302 is formed between the two magnetron sections. In one aspect, as shown inFIG. 4F , thefirst magnetron section 301A has aserpentine magnetron assembly 260 arrangement of magnets and thesecond magnetron section 301B has aspiral magnetron assembly 270 arrangement of magnets. One will note that theouter pole 272 in thesecond magnetron section 301B and theouter pole 262 in thefirst magnetron section 301A are schematically illustrated as dashed lines, and theinner pole 271 in thesecond magnetron section 301B and theinner pole 261 in thefirst magnetron section 301A are schematically illustrated as solid lines. -
FIG. 4G schematically illustrates a side cross-sectional view of themagnetron assembly 23 shown inFIG. 4F that is contained in thetarget backside region 21 of the lid assembly 20 (FIG. 2 ) and near thetarget 24. In one embodiment, as shown inFIG. 4G , themagnetron assembly 23 is supported and/or coupled to asupport plate 303. In this configuration the vertical magnetron actuators (e.g., 34B′ and 34B) are coupled to supportplate 303 and their respective magnetron section (e.g., 301A or 301B) to vertically position (Z-direction) the magnetron sections relative to thetarget surface 24C. In one aspect, thefirst magnetron section 301A is adapted to move a distance “A” closer to thetarget surface 24C than thesecond magnetron section 301B. In one aspect, the distance “A” may be about 5 mm. In embodiment, as shown inFIG. 4G , one or morehorizontal magnetron actuators 34A are adapted to translate thesupport plate 303, and coupledmagnetron sections 301A-B, in the X and/or Y directions. As noted above, thevertical magnetron actuators 34B andhorizontal actuators 34A may be a linear motor, stepper motor, or DC servo motor that are adapted to position and move the magnetron assembly in a desired direction at a desired acceleration and/or speed by use of commands from thecontroller 101. An example of actuators that may be adapted to perform the vertical magnetron actuators (e.g., 34B′ and 34B) andhorizontal magnetron actuators 34A are further described in the commonly assigned U.S. patent application Ser. No. 10/863,152 [AMAT 8841.P1], filed Aug. 24, 2005, which is hereby incorporated by reference in its entirety to the extent not inconsistent with the claimed invention. -
FIG. 4H illustrates a plan view of one embodiment of amagnetron assembly 23 that have twomagnetron sections first magnetron sections 301A is nested within thesecond magnetron section 301B and agap 302 is formed between the two magnetron sections. In one aspect, as shown inFIG. 4H , the first andsecond magnetron sections 301A-B utilize aspiral magnetron assembly 270 magnet arrangement. One will note that theouter pole 272 in thesecond magnetron section 301B and theouter pole 272 in thefirst magnetron section 301A are schematically illustrated as dashed lines, and theinner pole 271 in thesecond magnetron section 301B and theinner pole 271 in thefirst magnetron section 301A are schematically illustrated as solid lines. -
FIG. 41 schematically illustrates a side cross-sectional view of themagnetron assembly 23 shown inFIG. 4H that is contained in a lid assembly 20 (FIG. 2 ) near thetarget 24. In one embodiment, as shown inFIG. 41 , themagnetron assembly 23 is supported and/or coupled to asupport plate 303. In the configuration shown inFIG. 41 , thesecond magnetron section 301B is mounted to thesupport plate 303 and thefirst magnetron section 301A is coupled to themagnetron plate 303 through thevertical magnetron actuator 34B′ to vertically position themagnetron section 301A relative tosecond magnetron section 301B and thetarget surface 24C. In one aspect, thefirst magnetron section 301A is adapted to move a distance “B” closer to thetarget surface 24C. In one aspect, the distance “B” may be about 5 mm. In embodiment, as shown inFIG. 41 , one or morehorizontal magnetron actuators 34A are adapted to translate thesupport plate 303, and coupledmagnetron sections 301A-B, in the X and/or Y directions. In one embodiment, a second vertical magnetron actuator (not shown) is adapted to position thesupport plate 303 vertically and thus vertically position the first andsecond magnetron sections 301A-B. - Coordinated Motion
- In one embodiment, the position of a magnetron section (e.g., 301A-B) in the Z-direction is adjusted relative to its position in the X-direction and/or Y-direction to account for the bow of the
target 24, or just to adjust the deposition uniformity. For example, referring toFIG. 3A , the position in the Z-direction of themagnetron section 301A may be vertically lower (i.e., closer to an un-bowed target 24) as the magnetron section is moved across the center “C” of the target versus when themagnetron section 301A is positioned a distance away from the center “C” of the target in the X or Y-directions. -
FIG. 5 schematically illustrates a vertical cross-sectional view ofprocessing chamber 10 that hastarget 24 that is bowed and amagnetron assembly 23. Thetarget 24, as noted above, may be bowed due to a pressure differential between theprocessing region 15 and thetarget backside region 21 and due to the distributed weight of the target, which thus causes the target to deflect relative to its original undeflected shape (element “E”). One will note that only asingle magnetron section 301A is shown inFIG. 5 for simplicity and clarity, and that this configuration is not intended to be limiting as to the scope of the invention. In this configuration themagnetron section 301A is supported and positioned in the Z-direction by use of avertical actuator 34B′, asupport plate 303 and one or more supportingrollers 401 that are adapted to carry the weight of themagnetron assembly 23 and allow motion in the X and/or Y-directions. Themagnetron section 301A may be positioned in the X and Y-directions by use of one or morehorizontal actuators 34A. To achieve a desired magnetic field strength in theprocessing region 15, and thus a desired deposition uniformity, it may be desirable to continuously control the position of one or more of the magnetron sections (e.g., 301A shown inFIG. 5 ) in the X, Y and Z-directions during processing. A typical method of monitoring and controlling the position and motion of the one or more magnetron sections is to use a closed loop control scheme that utilizes encoders, or other similar devices, that are attached to each actuator and communicate with thecontroller 101. Therefore, in one embodiment, it is desirable to assure that a user-defined gap “G” (FIG. 5 ) is maintained between a magnetron section (e.g., 301A) and thetarget backside surface 24D of atarget 24 that has a bowed surface. The user-defined gap, for example, may be between about 0.5 mm and about 10 mm. - In one embodiment, it may be desirable to define one or more desired trajectory paths (element “D” in
FIG. 5 ) along which one or more of the magnetron sections (e.g.,element 301A) follow as themagnetron assembly 23 is translated by use of thecontroller 101, the horizontal magnetron actuator(s) 34A and/or vertical magnetron actuator(s) 34B. In this configuration thecontroller 101 monitors and controls the position of one or more of the magnetron sections by coordinating and controlling the position magnetron section by use of the horizontal magnetron actuator(s) 34A and vertical magnetron actuator(s) 34B. The trajectory path may be empirically defined, derived from modeling, or calculated so that a desired deposition profile and/or deposition uniformity is achieved on the substrate surface. In one aspect, the trajectory path may be optimized to achieve a desired magnetic field strength in theprocessing region 15 and deposition profile on the surface of the processed substrate, and thus may not coincide with the bowed shape of thetarget 24. - While the foregoing is directed to embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
Claims (26)
1. A plasma processing chamber assembly for depositing a layer on a substrate comprising:
a plasma processing chamber having a processing region;
a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region;
a magnetron assembly positioned near the target, wherein the magnetron assembly comprises:
a magnetron section that has one or more magnets that are magnetically coupled to the processing region; and
an actuator that is adapted to position the magnetron section in a direction generally perpendicular to the surface of the target; and
a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
2. The plasma processing chamber assembly of claim 1 , the substrate support is adapted to support a substrate that has a processing surface that has a surface area of at least 19,500 cm2.
3. The plasma processing chamber assembly of claim 1 , further comprising an actuator that is adapted to position the magnetron section in a direction generally parallel to the surface of the target.
4. The plasma processing chamber assembly of claim 1 , wherein the magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a serpentine shape.
5. The plasma processing chamber assembly of claim 1 , wherein the magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a spiral shape.
6. A plasma processing chamber assembly for depositing a layer on a substrate comprising:
a plasma processing chamber having a processing region;
a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region;
a magnetron assembly positioned near the target, wherein the magnetron assembly comprises:
a first magnetron section that has one or more magnets that are magnetically coupled to the processing region;
a second magnetron section that has one or more magnets that are magnetically coupled to the processing region;
a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target; and
a second actuator that is adapted to position the first magnetron section in a direction generally parallel to the surface of the target; and
a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
7. The plasma processing chamber assembly of claim 6 , the substrate support is adapted to support a substrate that has a processing surface that has a surface area of at least 19,500 cm2.
8. The plasma processing chamber assembly of claim 6 , further comprising a third actuator that is adapted to position the second magnetron section in a direction generally perpendicular to the surface of the target.
9. The plasma processing chamber assembly of claim 6 , wherein the first magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a serpentine shape.
10. The plasma processing chamber assembly of claim 6 , wherein the first magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a spiral shape.
11. The plasma processing chamber assembly of claim 6 , wherein the second actuator is also adapted to position the second magnetron section in a direction parallel to the target surface.
12. The plasma processing chamber assembly of claim 6 , wherein the first magnetron section is positioned over a center region of the target and the second magnetron section is positioned of an edge region, wherein the magnetic field strength delivered by at least a portion of the first magnetron section to the processing region is greater than the magnetic field strength delivered by the second magnetron section to the processing region.
13. A plasma processing chamber assembly for depositing a layer on a substrate comprising:
a plasma processing chamber having a processing region;
a target positioned on the plasma processing chamber so that a surface of the target is in contact with the processing region;
a magnetron assembly positioned near to the target, wherein the magnetron assembly comprises:
a first magnetron section that has one or more magnets that are magnetically coupled to the processing region;
a second magnetron section that has one or more magnets that are magnetically coupled to the processing region, wherein the first magnetron section is nested within the second magnetron section;
a first actuator that is adapted to position the first magnetron section in a direction generally perpendicular to the surface of the target; and
a second actuator that is adapted to position the first magnetron section and the second magnetron section in a direction generally parallel to the surface of the target; and
a substrate support positioned inside the plasma processing region, wherein the substrate support is adapted to support a substrate on a substrate supporting surface.
14. The plasma processing chamber assembly of claim 13 , the substrate support is adapted to support a substrate that has a processing surface that has a surface area of at least 19,500 cm2.
15. The plasma processing chamber assembly of claim 13 , further comprising a third actuator that is adapted to position the second magnetron section in a direction generally perpendicular to the surface of the target.
16. The plasma processing chamber assembly of claim 13 , wherein the first magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a serpentine shape.
17. The plasma processing chamber assembly of claim 13 , wherein the first magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a spiral shape.
18. The plasma processing chamber assembly of claim 13 , wherein the second magnetron section has a first pole and a second pole that is magnetically coupled to the processing region through the target, wherein the first pole and the second pole are adapted to form a plasma loop that has a spiral shape.
19. The plasma processing chamber assembly of claim 13 , wherein the first magnetron section is positioned over a center region of the target and the second magnetron section is positioned of an edge region, wherein the magnetic field strength delivered by at least a portion of the first magnetron section to the processing region is greater than the magnetic field strength delivered by the second magnetron section to the processing region.
20. A method of depositing a layer on a surface of a substrate, comprising:
providing a target that has a surface that contacts a processing region;
providing a magnetron section that is magnetically coupled to the processing region through the target;
depositing a conductive layer on a surface of a substrate that is positioned in the processing region; and
adjusting the position the magnetron section in a direction generally perpendicular to the surface of the target to improve the deposition uniformity across the surface of the substrate.
21. The method of claim 20 , further comprising:
providing a second magnetron section that is magnetically coupled to the processing region through the target; and
adjusting the position the second magnetron section in a direction generally perpendicular to the surface of the target to improve the deposition uniformity across the surface of the substrate.
22. The method of claim 20 , wherein the step of adjusting the position the magnetron section in a direction generally perpendicular to the surface of the target is continually controlled by use of a controller and an actuator.
23. A method of depositing a layer on a surface of a substrate, comprising:
providing a target that has a surface that contacts a processing region;
providing a magnetron section that is magnetically coupled to the processing region through the target;
moving the magnetron section in a direction that is generally parallel to the surface of the target by use of an actuator;
depositing a conductive layer on a surface of a substrate that is positioned in the processing region; and
adjusting the position of the magnetron section in a direction generally perpendicular to the surface of the target while the magnetron is moving in a direction that is generally parallel to the surface of the target to improve the deposition uniformity across the surface of the substrate.
24. The method of claim 23 , further comprising:
providing a second magnetron section that is magnetically coupled to the processing region through the target;
moving the second magnetron section in a direction that is generally parallel to the surface of the target by use of the actuator; and
adjusting the position of the second magnetron section in a direction generally perpendicular to the surface of the target while the second magnetron is moving in a direction that is generally parallel to the surface of the target to improve the deposition uniformity across the surface of the substrate.
25. The method of claim 23 , further comprising:
providing a second magnetron section that is magnetically coupled to the processing region through the target;
moving the second magnetron section in a direction that is generally parallel to the surface of the target by use of a second actuator; and
adjusting the position of the second magnetron section in a direction generally perpendicular to the surface of the target while the second magnetron is moving in a direction that is generally parallel to the surface of the target to improve the deposition uniformity across the surface of the substrate.
26. The method of claim 23 , wherein the step of adjusting the position the magnetron section is continually controlled by use of a controller and an actuator.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/282,798 US20070051616A1 (en) | 2005-09-07 | 2005-11-17 | Multizone magnetron assembly |
US11/301,849 US7628899B2 (en) | 2005-09-07 | 2005-12-12 | Apparatus and method of positioning a multizone magnetron assembly |
CN200680042135.8A CN101506404B (en) | 2005-11-17 | 2006-11-17 | Flexible magnetron including partial rolling support and centering pins |
JP2008541408A JP2009516776A (en) | 2005-11-17 | 2006-11-17 | Flexible magnetron including a partially rotating support and a centering pin |
KR1020087014682A KR101019826B1 (en) | 2005-11-17 | 2006-11-17 | Flexible magnetron including partial rolling support and centering pins |
US11/601,576 US20070151841A1 (en) | 2005-11-17 | 2006-11-17 | Flexible magnetron including partial rolling support and centering pins |
PCT/US2006/044915 WO2007059347A2 (en) | 2005-11-17 | 2006-11-17 | Flexible magnetron including partial rolling support and centering pins |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71497905P | 2005-09-07 | 2005-09-07 | |
US11/282,798 US20070051616A1 (en) | 2005-09-07 | 2005-11-17 | Multizone magnetron assembly |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/301,849 Continuation-In-Part US7628899B2 (en) | 2005-09-07 | 2005-12-12 | Apparatus and method of positioning a multizone magnetron assembly |
Publications (1)
Publication Number | Publication Date |
---|---|
US20070051616A1 true US20070051616A1 (en) | 2007-03-08 |
Family
ID=46205786
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/282,798 Abandoned US20070051616A1 (en) | 2005-09-07 | 2005-11-17 | Multizone magnetron assembly |
US11/301,849 Active 2027-12-30 US7628899B2 (en) | 2005-09-07 | 2005-12-12 | Apparatus and method of positioning a multizone magnetron assembly |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/301,849 Active 2027-12-30 US7628899B2 (en) | 2005-09-07 | 2005-12-12 | Apparatus and method of positioning a multizone magnetron assembly |
Country Status (1)
Country | Link |
---|---|
US (2) | US20070051616A1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090114528A1 (en) * | 2007-11-07 | 2009-05-07 | Applied Materials, Inc. | Sputter coating device and coating method |
EP2058836A1 (en) | 2007-11-07 | 2009-05-13 | Applied Materials, Inc. | Sputter coating device and coating method |
WO2009059817A1 (en) * | 2007-11-07 | 2009-05-14 | Applied Materials Inc., A Corporation Of The State Of Delaware | Sputter coating device and coating method |
EP2204469A1 (en) * | 2007-10-31 | 2010-07-07 | Canon Anelva Corporation | Magnetron unit, magnetron sputtering apparatus and method for manufacturing electronic device |
CN102789941A (en) * | 2011-05-18 | 2012-11-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magnetron, manufacturing method of magnetron and physical deposition room |
CN112739848A (en) * | 2018-09-27 | 2021-04-30 | 株式会社爱发科 | Magnet unit for magnetron sputtering device |
CN115074687A (en) * | 2022-06-30 | 2022-09-20 | 北京北方华创微电子装备有限公司 | Magnetron moving device, magnetron assembly and semiconductor process equipment |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007092136A (en) * | 2005-09-29 | 2007-04-12 | Shin Meiwa Ind Co Ltd | Magnet structure for magnetron sputtering, cathode electrode unit, and magnetron sputtering apparatus |
JP2007126722A (en) * | 2005-11-04 | 2007-05-24 | Shin Meiwa Ind Co Ltd | Magnet structure for magnetron sputtering system, cathode electrode unit, and magnetron sputtering system |
US20100230274A1 (en) * | 2009-03-12 | 2010-09-16 | Applied Materials, Inc. | Minimizing magnetron substrate interaction in large area sputter coating equipment |
CN101988188B (en) * | 2009-07-30 | 2013-08-28 | 鸿富锦精密工业(深圳)有限公司 | Magnetic control device for sputtering |
JP6009171B2 (en) * | 2012-02-14 | 2016-10-19 | 東京エレクトロン株式会社 | Substrate processing equipment |
US20150311046A1 (en) * | 2014-04-27 | 2015-10-29 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Fabricating low-defect rare-earth doped piezoelectric layer |
KR102363241B1 (en) | 2015-03-27 | 2022-02-16 | 삼성전자주식회사 | Plasma-enhanced chemical vapor deposition (PE-CVD) apparatus and method of operating the same |
AT14912U1 (en) | 2015-05-06 | 2016-08-15 | Plansee Se | Connection piece for pipe target |
CN105568240B (en) * | 2016-02-16 | 2018-11-23 | 武汉华星光电技术有限公司 | Magnetic control sputtering device and magnetically controlled sputter method |
US10153203B2 (en) * | 2016-11-29 | 2018-12-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for forming metal layers in openings and apparatus for forming same |
JP2020200495A (en) * | 2019-06-07 | 2020-12-17 | 株式会社アルバック | Sputtering target mechanism |
Citations (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3878085A (en) * | 1973-07-05 | 1975-04-15 | Sloan Technology Corp | Cathode sputtering apparatus |
US4312731A (en) * | 1979-04-24 | 1982-01-26 | Vac-Tec Systems, Inc. | Magnetically enhanced sputtering device and method |
US4437966A (en) * | 1982-09-30 | 1984-03-20 | Gte Products Corporation | Sputtering cathode apparatus |
US4444643A (en) * | 1982-09-03 | 1984-04-24 | Gartek Systems, Inc. | Planar magnetron sputtering device |
US4600492A (en) * | 1984-07-25 | 1986-07-15 | Kabushiki Kaisha Tokuda Seisakusho | Magnet driving method and device for same |
US4631106A (en) * | 1984-09-19 | 1986-12-23 | Hitachi, Ltd. | Plasma processor |
US4714536A (en) * | 1985-08-26 | 1987-12-22 | Varian Associates, Inc. | Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
US4717462A (en) * | 1985-10-25 | 1988-01-05 | Hitachi, Ltd. | Sputtering apparatus |
US4724060A (en) * | 1984-11-14 | 1988-02-09 | Hitachi, Ltd. | Sputtering apparatus with film forming directivity |
US4824544A (en) * | 1987-10-29 | 1989-04-25 | International Business Machines Corporation | Large area cathode lift-off sputter deposition device |
US4826584A (en) * | 1986-04-17 | 1989-05-02 | Dos Santos Pereiro Ribeiro Car | Magnetron sputtering cathode |
US5202008A (en) * | 1990-03-02 | 1993-04-13 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
US5223108A (en) * | 1991-12-30 | 1993-06-29 | Materials Research Corporation | Extended lifetime collimator |
US5242566A (en) * | 1990-04-23 | 1993-09-07 | Applied Materials, Inc. | Planar magnetron sputtering source enabling a controlled sputtering profile out to the target perimeter |
US5252194A (en) * | 1990-01-26 | 1993-10-12 | Varian Associates, Inc. | Rotating sputtering apparatus for selected erosion |
US5314597A (en) * | 1992-03-20 | 1994-05-24 | Varian Associates, Inc. | Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
US5320728A (en) * | 1990-03-30 | 1994-06-14 | Applied Materials, Inc. | Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
US5328585A (en) * | 1992-12-11 | 1994-07-12 | Photran Corporation | Linear planar-magnetron sputtering apparatus with reciprocating magnet-array |
US5362372A (en) * | 1993-06-11 | 1994-11-08 | Applied Materials, Inc. | Self cleaning collimator |
US5374343A (en) * | 1992-05-15 | 1994-12-20 | Anelva Corporation | Magnetron cathode assembly |
US5380414A (en) * | 1993-06-11 | 1995-01-10 | Applied Materials, Inc. | Shield and collimator pasting deposition chamber with a wafer support periodically used as an acceptor |
US5382344A (en) * | 1991-08-02 | 1995-01-17 | Anelva Corporation | Sputtering apparatus |
US5403459A (en) * | 1993-05-17 | 1995-04-04 | Applied Materials, Inc. | Cleaning of a PVD chamber containing a collimator |
US5419029A (en) * | 1994-02-18 | 1995-05-30 | Applied Materials, Inc. | Temperature clamping method for anti-contamination and collimating devices for thin film processes |
US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
US5505833A (en) * | 1993-07-26 | 1996-04-09 | Siemens Aktiengesellschaft Ag | Method for depositing a layer on a substrate wafer with a sputtering process |
US5658442A (en) * | 1996-03-07 | 1997-08-19 | Applied Materials, Inc. | Target and dark space shield for a physical vapor deposition system |
US5707498A (en) * | 1996-07-12 | 1998-01-13 | Applied Materials, Inc. | Avoiding contamination from induction coil in ionized sputtering |
US5725740A (en) * | 1995-06-07 | 1998-03-10 | Applied Materials, Inc. | Adhesion layer for tungsten deposition |
US5780357A (en) * | 1994-12-14 | 1998-07-14 | Applied Materials, Inc. | Deposition process for coating or filling re-entry shaped contact holes |
US5824197A (en) * | 1996-06-05 | 1998-10-20 | Applied Materials, Inc. | Shield for a physical vapor deposition chamber |
US5827408A (en) * | 1996-07-26 | 1998-10-27 | Applied Materials, Inc | Method and apparatus for improving the conformality of sputter deposited films |
US5833815A (en) * | 1996-04-24 | 1998-11-10 | Anelva Corporation | Sputter deposition system |
US5855744A (en) * | 1996-07-19 | 1999-01-05 | Applied Komatsu Technology, Inc. | Non-planar magnet tracking during magnetron sputtering |
US5873989A (en) * | 1997-02-06 | 1999-02-23 | Intevac, Inc. | Methods and apparatus for linear scan magnetron sputtering |
US5876574A (en) * | 1997-04-23 | 1999-03-02 | Applied Materials, Inc. | Magnet design for a sputtering chamber |
US5914018A (en) * | 1996-08-23 | 1999-06-22 | Applied Materials, Inc. | Sputter target for eliminating redeposition on the target sidewall |
US5956608A (en) * | 1996-06-20 | 1999-09-21 | Applied Materials, Inc. | Modulating surface morphology of barrier layers |
US6083360A (en) * | 1999-04-08 | 2000-07-04 | Sandia Corporation | Supplemental heating of deposition tooling shields |
US6103069A (en) * | 1997-03-31 | 2000-08-15 | Applied Materials, Inc. | Chamber design with isolation valve to preserve vacuum during maintenance |
US6143140A (en) * | 1999-08-16 | 2000-11-07 | Applied Materials, Inc. | Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field |
US6168696B1 (en) * | 1999-09-01 | 2001-01-02 | Micron Technology, Inc. | Non-knurled induction coil for ionized metal deposition, sputtering apparatus including same, and method of constructing the apparatus |
US6176978B1 (en) * | 1997-08-18 | 2001-01-23 | Applied Materials, Inc. | Pasting layer formation method for high density plasma deposition chambers |
US6183614B1 (en) * | 1999-02-12 | 2001-02-06 | Applied Materials, Inc. | Rotating sputter magnetron assembly |
US6200431B1 (en) * | 1997-02-19 | 2001-03-13 | Canon Kabushiki Kaisha | Reactive sputtering apparatus and process for forming thin film using same |
US6217715B1 (en) * | 1997-02-06 | 2001-04-17 | Applied Materials, Inc. | Coating of vacuum chambers to reduce pump down time and base pressure |
US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
US6248398B1 (en) * | 1996-05-22 | 2001-06-19 | Applied Materials, Inc. | Coater having a controllable pressurized process chamber for semiconductor processing |
US6251242B1 (en) * | 2000-01-21 | 2001-06-26 | Applied Materials, Inc. | Magnetron and target producing an extended plasma region in a sputter reactor |
US6271592B1 (en) * | 1998-02-24 | 2001-08-07 | Applied Materials, Inc. | Sputter deposited barrier layers |
US6287436B1 (en) * | 1998-02-27 | 2001-09-11 | Innovent, Inc. | Brazed honeycomb collimator |
US6302960B1 (en) * | 1998-11-23 | 2001-10-16 | Applied Materials, Inc. | Photoresist coater |
US6322679B1 (en) * | 1997-11-19 | 2001-11-27 | Sinvaco N.V. | Planar magnetron with moving magnet assembly |
US6395146B2 (en) * | 2000-01-19 | 2002-05-28 | Veeco Instrument, Inc. | Sputtering assembly and target therefor |
US6413383B1 (en) * | 1999-10-08 | 2002-07-02 | Applied Materials, Inc. | Method for igniting a plasma in a sputter reactor |
US6413384B1 (en) * | 2000-09-21 | 2002-07-02 | Promos Technologies Inc. | Method for maintaining the cleanness of a vacuum chamber of a physical vapor deposition system |
US6416639B1 (en) * | 1999-06-21 | 2002-07-09 | Sinvaco N.V. | Erosion compensated magnetron with moving magnet assembly |
US6432819B1 (en) * | 1999-09-27 | 2002-08-13 | Applied Materials, Inc. | Method and apparatus of forming a sputtered doped seed layer |
US6436251B2 (en) * | 2000-01-21 | 2002-08-20 | Applied Materials, Inc. | Vault-shaped target and magnetron having both distributed and localized magnets |
US6451184B1 (en) * | 1997-02-19 | 2002-09-17 | Canon Kabushiki Kaisha | Thin film forming apparatus and process for forming thin film using same |
US6488822B1 (en) * | 2000-10-20 | 2002-12-03 | Veecoleve, Inc. | Segmented-target ionized physical-vapor deposition apparatus and method of operation |
US6589407B1 (en) * | 1997-05-23 | 2003-07-08 | Applied Materials, Inc. | Aluminum deposition shield |
US20030234175A1 (en) * | 2002-06-25 | 2003-12-25 | Hannstar Display Corp. | Pre-sputtering method for improving utilization rate of sputter target |
US6692619B1 (en) * | 2001-08-14 | 2004-02-17 | Seagate Technology Llc | Sputtering target and method for making composite soft magnetic films |
US6699375B1 (en) * | 2000-06-29 | 2004-03-02 | Applied Materials, Inc. | Method of extending process kit consumable recycling life |
US6709557B1 (en) * | 2002-02-28 | 2004-03-23 | Novellus Systems, Inc. | Sputter apparatus for producing multi-component metal alloy films and method for making the same |
US6732210B1 (en) * | 2000-01-03 | 2004-05-04 | Genesis Microchip Inc | Communication bus for a multi-processor system |
US6802949B2 (en) * | 2001-10-15 | 2004-10-12 | Hanyang Hak Won Co., Ltd. | Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same |
US6806651B1 (en) * | 2003-04-22 | 2004-10-19 | Zond, Inc. | High-density plasma source |
US6808611B2 (en) * | 2002-06-27 | 2004-10-26 | Applied Materials, Inc. | Methods in electroanalytical techniques to analyze organic components in plating baths |
US6878242B2 (en) * | 2003-04-08 | 2005-04-12 | Guardian Industries Corp. | Segmented sputtering target and method/apparatus for using same |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2707144A1 (en) | 1976-02-19 | 1977-08-25 | Sloan Technology Corp | Cathode sputtering device with magnetic equipment - which can be displaced to move the area of sputtering over an extended surface by relative movement |
JPH0248876A (en) | 1988-08-10 | 1990-02-19 | Hitachi Ltd | Integration type signal output device |
US4995958A (en) * | 1989-05-22 | 1991-02-26 | Varian Associates, Inc. | Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile |
JPH0959772A (en) | 1995-08-21 | 1997-03-04 | Nippon Sheet Glass Co Ltd | Magnetron sputtering method |
US6436252B1 (en) * | 2000-04-07 | 2002-08-20 | Surface Engineered Products Corp. | Method and apparatus for magnetron sputtering |
TW573041B (en) | 2002-02-07 | 2004-01-21 | Hannstar Display Corp | Method for improving performance of sputtering target |
-
2005
- 2005-11-17 US US11/282,798 patent/US20070051616A1/en not_active Abandoned
- 2005-12-12 US US11/301,849 patent/US7628899B2/en active Active
Patent Citations (76)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3878085A (en) * | 1973-07-05 | 1975-04-15 | Sloan Technology Corp | Cathode sputtering apparatus |
US4312731A (en) * | 1979-04-24 | 1982-01-26 | Vac-Tec Systems, Inc. | Magnetically enhanced sputtering device and method |
US4444643A (en) * | 1982-09-03 | 1984-04-24 | Gartek Systems, Inc. | Planar magnetron sputtering device |
US4437966A (en) * | 1982-09-30 | 1984-03-20 | Gte Products Corporation | Sputtering cathode apparatus |
US4600492A (en) * | 1984-07-25 | 1986-07-15 | Kabushiki Kaisha Tokuda Seisakusho | Magnet driving method and device for same |
US4631106A (en) * | 1984-09-19 | 1986-12-23 | Hitachi, Ltd. | Plasma processor |
US4724060A (en) * | 1984-11-14 | 1988-02-09 | Hitachi, Ltd. | Sputtering apparatus with film forming directivity |
US4714536A (en) * | 1985-08-26 | 1987-12-22 | Varian Associates, Inc. | Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
US4717462A (en) * | 1985-10-25 | 1988-01-05 | Hitachi, Ltd. | Sputtering apparatus |
US4826584A (en) * | 1986-04-17 | 1989-05-02 | Dos Santos Pereiro Ribeiro Car | Magnetron sputtering cathode |
US4824544A (en) * | 1987-10-29 | 1989-04-25 | International Business Machines Corporation | Large area cathode lift-off sputter deposition device |
US5252194A (en) * | 1990-01-26 | 1993-10-12 | Varian Associates, Inc. | Rotating sputtering apparatus for selected erosion |
US5202008A (en) * | 1990-03-02 | 1993-04-13 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
US5320728A (en) * | 1990-03-30 | 1994-06-14 | Applied Materials, Inc. | Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
US5242566A (en) * | 1990-04-23 | 1993-09-07 | Applied Materials, Inc. | Planar magnetron sputtering source enabling a controlled sputtering profile out to the target perimeter |
US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
US5382344A (en) * | 1991-08-02 | 1995-01-17 | Anelva Corporation | Sputtering apparatus |
US5223108A (en) * | 1991-12-30 | 1993-06-29 | Materials Research Corporation | Extended lifetime collimator |
US5314597A (en) * | 1992-03-20 | 1994-05-24 | Varian Associates, Inc. | Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
US5374343A (en) * | 1992-05-15 | 1994-12-20 | Anelva Corporation | Magnetron cathode assembly |
US5328585A (en) * | 1992-12-11 | 1994-07-12 | Photran Corporation | Linear planar-magnetron sputtering apparatus with reciprocating magnet-array |
US5630917A (en) * | 1993-05-17 | 1997-05-20 | Applied Materials, Inc. | Cleaning of a PVD chamber containing a collimator |
US5403459A (en) * | 1993-05-17 | 1995-04-04 | Applied Materials, Inc. | Cleaning of a PVD chamber containing a collimator |
US5549802A (en) * | 1993-05-17 | 1996-08-27 | Applied Materials, Inc. | Cleaning of a PVD chamber containing a collimator |
US5380414A (en) * | 1993-06-11 | 1995-01-10 | Applied Materials, Inc. | Shield and collimator pasting deposition chamber with a wafer support periodically used as an acceptor |
US5362372A (en) * | 1993-06-11 | 1994-11-08 | Applied Materials, Inc. | Self cleaning collimator |
US5505833A (en) * | 1993-07-26 | 1996-04-09 | Siemens Aktiengesellschaft Ag | Method for depositing a layer on a substrate wafer with a sputtering process |
US5755936A (en) * | 1994-02-18 | 1998-05-26 | Applied Materials, Inc | Temperature clamped anti-contamination and collimating devices for thin film processes |
US5419029A (en) * | 1994-02-18 | 1995-05-30 | Applied Materials, Inc. | Temperature clamping method for anti-contamination and collimating devices for thin film processes |
US5598622A (en) * | 1994-02-18 | 1997-02-04 | Applied Materials, Inc. | Temperature clamping method for anti-contamination and collimating devices for thin film processes |
US5780357A (en) * | 1994-12-14 | 1998-07-14 | Applied Materials, Inc. | Deposition process for coating or filling re-entry shaped contact holes |
US5725740A (en) * | 1995-06-07 | 1998-03-10 | Applied Materials, Inc. | Adhesion layer for tungsten deposition |
US5658442A (en) * | 1996-03-07 | 1997-08-19 | Applied Materials, Inc. | Target and dark space shield for a physical vapor deposition system |
US5833815A (en) * | 1996-04-24 | 1998-11-10 | Anelva Corporation | Sputter deposition system |
US6248398B1 (en) * | 1996-05-22 | 2001-06-19 | Applied Materials, Inc. | Coater having a controllable pressurized process chamber for semiconductor processing |
US5824197A (en) * | 1996-06-05 | 1998-10-20 | Applied Materials, Inc. | Shield for a physical vapor deposition chamber |
US5956608A (en) * | 1996-06-20 | 1999-09-21 | Applied Materials, Inc. | Modulating surface morphology of barrier layers |
US5707498A (en) * | 1996-07-12 | 1998-01-13 | Applied Materials, Inc. | Avoiding contamination from induction coil in ionized sputtering |
US5855744A (en) * | 1996-07-19 | 1999-01-05 | Applied Komatsu Technology, Inc. | Non-planar magnet tracking during magnetron sputtering |
US5827408A (en) * | 1996-07-26 | 1998-10-27 | Applied Materials, Inc | Method and apparatus for improving the conformality of sputter deposited films |
US5914018A (en) * | 1996-08-23 | 1999-06-22 | Applied Materials, Inc. | Sputter target for eliminating redeposition on the target sidewall |
US5873989A (en) * | 1997-02-06 | 1999-02-23 | Intevac, Inc. | Methods and apparatus for linear scan magnetron sputtering |
US6217715B1 (en) * | 1997-02-06 | 2001-04-17 | Applied Materials, Inc. | Coating of vacuum chambers to reduce pump down time and base pressure |
US6200431B1 (en) * | 1997-02-19 | 2001-03-13 | Canon Kabushiki Kaisha | Reactive sputtering apparatus and process for forming thin film using same |
US6451184B1 (en) * | 1997-02-19 | 2002-09-17 | Canon Kabushiki Kaisha | Thin film forming apparatus and process for forming thin film using same |
US6103069A (en) * | 1997-03-31 | 2000-08-15 | Applied Materials, Inc. | Chamber design with isolation valve to preserve vacuum during maintenance |
US5876574A (en) * | 1997-04-23 | 1999-03-02 | Applied Materials, Inc. | Magnet design for a sputtering chamber |
US6589407B1 (en) * | 1997-05-23 | 2003-07-08 | Applied Materials, Inc. | Aluminum deposition shield |
US6176978B1 (en) * | 1997-08-18 | 2001-01-23 | Applied Materials, Inc. | Pasting layer formation method for high density plasma deposition chambers |
US6322679B1 (en) * | 1997-11-19 | 2001-11-27 | Sinvaco N.V. | Planar magnetron with moving magnet assembly |
US6271592B1 (en) * | 1998-02-24 | 2001-08-07 | Applied Materials, Inc. | Sputter deposited barrier layers |
US6287436B1 (en) * | 1998-02-27 | 2001-09-11 | Innovent, Inc. | Brazed honeycomb collimator |
US6302960B1 (en) * | 1998-11-23 | 2001-10-16 | Applied Materials, Inc. | Photoresist coater |
US6183614B1 (en) * | 1999-02-12 | 2001-02-06 | Applied Materials, Inc. | Rotating sputter magnetron assembly |
US6083360A (en) * | 1999-04-08 | 2000-07-04 | Sandia Corporation | Supplemental heating of deposition tooling shields |
US6416639B1 (en) * | 1999-06-21 | 2002-07-09 | Sinvaco N.V. | Erosion compensated magnetron with moving magnet assembly |
US6143140A (en) * | 1999-08-16 | 2000-11-07 | Applied Materials, Inc. | Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field |
US6168696B1 (en) * | 1999-09-01 | 2001-01-02 | Micron Technology, Inc. | Non-knurled induction coil for ionized metal deposition, sputtering apparatus including same, and method of constructing the apparatus |
US6432819B1 (en) * | 1999-09-27 | 2002-08-13 | Applied Materials, Inc. | Method and apparatus of forming a sputtered doped seed layer |
US6413383B1 (en) * | 1999-10-08 | 2002-07-02 | Applied Materials, Inc. | Method for igniting a plasma in a sputter reactor |
US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
US6732210B1 (en) * | 2000-01-03 | 2004-05-04 | Genesis Microchip Inc | Communication bus for a multi-processor system |
US6395146B2 (en) * | 2000-01-19 | 2002-05-28 | Veeco Instrument, Inc. | Sputtering assembly and target therefor |
US6436251B2 (en) * | 2000-01-21 | 2002-08-20 | Applied Materials, Inc. | Vault-shaped target and magnetron having both distributed and localized magnets |
US6444104B2 (en) * | 2000-01-21 | 2002-09-03 | Applied Materials, Inc. | Sputtering target having an annular vault |
US6251242B1 (en) * | 2000-01-21 | 2001-06-26 | Applied Materials, Inc. | Magnetron and target producing an extended plasma region in a sputter reactor |
US6699375B1 (en) * | 2000-06-29 | 2004-03-02 | Applied Materials, Inc. | Method of extending process kit consumable recycling life |
US6413384B1 (en) * | 2000-09-21 | 2002-07-02 | Promos Technologies Inc. | Method for maintaining the cleanness of a vacuum chamber of a physical vapor deposition system |
US6488822B1 (en) * | 2000-10-20 | 2002-12-03 | Veecoleve, Inc. | Segmented-target ionized physical-vapor deposition apparatus and method of operation |
US6692619B1 (en) * | 2001-08-14 | 2004-02-17 | Seagate Technology Llc | Sputtering target and method for making composite soft magnetic films |
US6802949B2 (en) * | 2001-10-15 | 2004-10-12 | Hanyang Hak Won Co., Ltd. | Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same |
US6709557B1 (en) * | 2002-02-28 | 2004-03-23 | Novellus Systems, Inc. | Sputter apparatus for producing multi-component metal alloy films and method for making the same |
US20030234175A1 (en) * | 2002-06-25 | 2003-12-25 | Hannstar Display Corp. | Pre-sputtering method for improving utilization rate of sputter target |
US6808611B2 (en) * | 2002-06-27 | 2004-10-26 | Applied Materials, Inc. | Methods in electroanalytical techniques to analyze organic components in plating baths |
US6878242B2 (en) * | 2003-04-08 | 2005-04-12 | Guardian Industries Corp. | Segmented sputtering target and method/apparatus for using same |
US6806651B1 (en) * | 2003-04-22 | 2004-10-19 | Zond, Inc. | High-density plasma source |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2204469A1 (en) * | 2007-10-31 | 2010-07-07 | Canon Anelva Corporation | Magnetron unit, magnetron sputtering apparatus and method for manufacturing electronic device |
EP2204469A4 (en) * | 2007-10-31 | 2012-03-28 | Canon Anelva Corp | Magnetron unit, magnetron sputtering apparatus and method for manufacturing electronic device |
US20090114528A1 (en) * | 2007-11-07 | 2009-05-07 | Applied Materials, Inc. | Sputter coating device and coating method |
EP2058836A1 (en) | 2007-11-07 | 2009-05-13 | Applied Materials, Inc. | Sputter coating device and coating method |
WO2009059817A1 (en) * | 2007-11-07 | 2009-05-14 | Applied Materials Inc., A Corporation Of The State Of Delaware | Sputter coating device and coating method |
CN102789941A (en) * | 2011-05-18 | 2012-11-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magnetron, manufacturing method of magnetron and physical deposition room |
CN112739848A (en) * | 2018-09-27 | 2021-04-30 | 株式会社爱发科 | Magnet unit for magnetron sputtering device |
CN115074687A (en) * | 2022-06-30 | 2022-09-20 | 北京北方华创微电子装备有限公司 | Magnetron moving device, magnetron assembly and semiconductor process equipment |
Also Published As
Publication number | Publication date |
---|---|
US20070051617A1 (en) | 2007-03-08 |
US7628899B2 (en) | 2009-12-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7628899B2 (en) | Apparatus and method of positioning a multizone magnetron assembly | |
US20070056850A1 (en) | Large-area magnetron sputtering chamber with individually controlled sputtering zones | |
US20070056843A1 (en) | Method of processing a substrate using a large-area magnetron sputtering chamber with individually controlled sputtering zones | |
KR100776861B1 (en) | Improved magnetron sputtering system for large-area substrates | |
KR100751174B1 (en) | Improved magnetron sputtering system for large-area substrates having removable anodes | |
CA1195951A (en) | Shaped field magnetron electrode | |
US6864773B2 (en) | Variable field magnet apparatus | |
EP0251567B1 (en) | Dry process apparatus | |
KR100659828B1 (en) | Method and apparatus for ionized physical vapor deposition | |
WO2007032858A1 (en) | Large-area magnetron sputtering chamber with individually controlled sputtering zones | |
EP0442939B1 (en) | Improved magnetron sputtering cathode | |
US20070012663A1 (en) | Magnetron sputtering system for large-area substrates having removable anodes | |
US20030178299A1 (en) | Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode | |
WO2007032855A2 (en) | Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers | |
EP1193729A2 (en) | Method and apparatus for magnetron sputtering | |
KR20010099597A (en) | Physical vapor processing of a surface with non-uniformity compensation | |
US6432285B1 (en) | Planar magnetron sputtering apparatus | |
US20070084720A1 (en) | Magnetron sputtering system for large-area substrates having removable anodes | |
JP2660951B2 (en) | Sputtering equipment | |
US20070056845A1 (en) | Multiple zone sputtering target created through conductive and insulation bonding | |
KR102616067B1 (en) | Inclined magnetron in PVD sputtering deposition chamber | |
US20070012559A1 (en) | Method of improving magnetron sputtering of large-area substrates using a removable anode | |
JP2928479B2 (en) | Sputtering equipment | |
WO2007106195A2 (en) | Magnetron source for deposition on large substrates | |
KR100963413B1 (en) | Magnetron sputtering apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: APPLIED MATERIALS, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LE, HIENMINH H;HOSOKAWA, AKIHIRO;REEL/FRAME:018486/0512 Effective date: 20060302 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |