US20060154102A1 - Soft thin laminated substrate - Google Patents
Soft thin laminated substrate Download PDFInfo
- Publication number
- US20060154102A1 US20060154102A1 US11/031,040 US3104005A US2006154102A1 US 20060154102 A1 US20060154102 A1 US 20060154102A1 US 3104005 A US3104005 A US 3104005A US 2006154102 A1 US2006154102 A1 US 2006154102A1
- Authority
- US
- United States
- Prior art keywords
- alloy
- copper
- copper layer
- substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
- Y10T428/12438—Composite
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12556—Organic component
Definitions
- the present rehabilitation invention is related to a soft circuit substrate, and more particularly to a soft thin laminated substrate including one single alloy copper layer as the tie-coating of the copper foil.
- a conventional soft circuit substrate is composed of a soft substrate and a conductive copper foil associated with the substrate.
- the copper foil is adhered to the substrate by means of an adhesive.
- a liquid plastic resin is directly painted over the copper foil and the substrate. After dried and solidified, the copper foil is integrally associated with the substrate.
- the adhesion force of the plastic resin between the copper foil and the substrate is insufficient. That is, when the copper foil conducts current, a temperature (generally below 150° C. ) will more or less rise.
- the material of the copper foil is different from plastic resin. Accordingly, the thermal strain (mechanical tension ) of the copper foil is different from that of the plastic resin under such temperature. As a result, blister or lifting or peeling of the coating of the soft circuit substrate will take place.
- Taiwanese Patent Publication No. 519860 discloses a method for manufacturing soft circuit substrate and a product thereof.
- FIGS. 3 and 4 show the soft circuit substrate structure of the above Patent.
- the soft circuit substrate structure includes a polymer film 81 , a chromium (Ni or Cr/Ni ) attaching layer 82 overlaid on one face of the polymer film, a nickel-chromium alloy attaching layer 83 overlaid on one face of the chromium attaching layer distal from the polymer film and a copper attaching layer 84 overlaid on one face of the nickel-chromium alloy attaching layer distal from the chromium attaching layer.
- a copper foil 85 is further deposited on the copper attaching layer.
- the chromium attaching layer, nickel-chromium alloy attaching layer and copper attaching layer all serve as tie-coatings of the copper foil.
- the polymer film with quite different physical properties can be tightly bonded with the copper foil.
- the multiple tie-coatings lead to increment of manufacturing time and complicate the manufacturing procedure. As a result, the manufacturing cost is much higher.
- the tie-coatings will increase the impedance of the material. For example, the impedance of chromium is more than ten times the impedance of copper and the impedance of nickel is more than four times the impedance of copper. All the above problems should be solved.
- the copper foil can tightly attach to the alloy copper layer to tightly associate with the plastic substrate. When the temperature rises, the coating will not blister or peel. Therefore, the using life is prolonged. Also, the cost is reduced and the manufacturing procedure is simplified.
- the soft thin laminated substrate includes: a plastic substrate; an alloy copper layer overlaid on the plastic substrate, the alloy copper layer having a thickness within 10 ⁇ 10000 angstroms, the alloy copper layer being an alloy of 0.1% ⁇ 99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus; and a copper foil overlaid on the alloy copper layer.
- FIG. 1 is a schematic diagram showing the structure of the present invention
- FIG. 2 is a sectional view showing the structure of the present invention
- FIG. 3 is a schematic diagram showing the structure of a conventional soft circuit substrate.
- FIG. 4 is a sectional view showing the structure of the conventional soft circuit substrate.
- the soft thin laminated substrate of the present invention includes a plastic substrate 1 , an alloy copper layer 2 overlaid on the plastic substrate 1 and a copper foil 3 overlaid on the alloy copper layer 2 .
- the plastic substrate 1 can be made of one of polyimide (PI ), PET, PC, PMMA, etc. With polyimide exemplified, such material has excellent electrical properties, anti-chemical properties and highest heat resistance among polymer materials. Therefore, the thermal strain can be minimized.
- PI polyimide
- PET PET
- PC PC
- PMMA polymethyl methacrylate
- the alloy copper layer 2 is disposed on the plastic substrate 1 by way of vacuum physical coating.
- the thickness of the alloy copper layer 2 is within 10 ⁇ 10000 angstroms.
- the alloy copper layer 2 is an alloy of 0.1%-99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus.
- the added metal has excellent electric conductivity. Preferably, the added metal will not increase the impedance of the alloy copper layer 2 .
- the copper foil 3 disposed on the alloy copper layer 2 by way of vacuum physical coating is composed of 10%-99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus.
- the vacuum physical coating can be thermal evaporation, electron beam evaporation, DC magnetron sputter, RF magnetron sputter, ion beam sputter, molecular beam epitaxy (MBE ) or plasma enhanced CVD.
- the alloy copper layer 2 of the present invention contains pure copper molecules. By means of the better electric conductivity of pure copper molecules, the bonding strength of the copper foil 3 can be enhanced. Moreover, by means of those low-impedance materials such as nickel, chromium, manganese, molybdenum, iron and phosphorus, the electric conductivity of the alloy copper layer 2 will not be greatly reduced.
- the alloy copper layer 2 serves as a tie-coating of the copper foil 3 .
- the alloy materials of nickel, chromium, manganese, molybdenum, iron and phosphorus in the alloy copper layer 2 have better bonding strength to plastic material so that the alloy copper layer 2 can be more firmly bonded with the substrate 1 .
- the copper foil 3 can tightly attach to the alloy copper layer 2 to associate with the plastic substrate 1 . It is known from an actual pull test, the peel strength of the soft thin laminated substrate of the present invention is up to 0.65 kg/cm 2 . Accordingly, the structure of the present invention can truly well bond the plastic substrate 1 , alloy copper layer 2 and copper foil 3 with each other.
- the plastic substrate 1 of the present invention has better thermal strain and the plastic substrate 1 , the alloy copper layer 2 and the copper foil 3 are better bonded with each other. Therefore, when the temperature rises to 150° C., the coating of the present invention is uneasy to blister or lift or peel. Therefore, the using life of the present invention is prolonged.
- the tie-coating is formed of a three-layer structure, that is, a chromium attaching layer, a nickel-chromium alloy attaching layer and a copper attaching layer.
- the soft thin laminated substrate structure of the present invention only includes an alloy copper layer as the tie-coating for tightly bonding the plastic substrate 1 , alloy copper layer 2 and copper foil 3 with each other. Therefore, the present invention can achieve double effects of decrement of cost and simplification of manufacturing procedure.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
Abstract
A soft thin laminated substrate including a plastic substrate, an alloy copper layer overlaid on the plastic substrate and a copper foil overlaid on the alloy copper layer. The alloy copper layer is an alloy of copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus. The alloy copper layer serves as a tie-coating of the copper foil, whereby the copper foil can tightly attach to the alloy copper layer to associate with the plastic substrate and form the soft thin laminated substrate.
Description
- The present rehabilitation invention is related to a soft circuit substrate, and more particularly to a soft thin laminated substrate including one single alloy copper layer as the tie-coating of the copper foil.
- A conventional soft circuit substrate is composed of a soft substrate and a conductive copper foil associated with the substrate. In conventional measure, the copper foil is adhered to the substrate by means of an adhesive. However, such measure often leads to problems of detachment, halogen flameproof agent, etc. In another traditional measure, a liquid plastic resin is directly painted over the copper foil and the substrate. After dried and solidified, the copper foil is integrally associated with the substrate. However, the above two measures can be hardly applied to those copper foils under 8 um. In addition, the adhesion force of the plastic resin between the copper foil and the substrate is insufficient. That is, when the copper foil conducts current, a temperature (generally below 150° C. ) will more or less rise. Moreover, the material of the copper foil is different from plastic resin. Accordingly, the thermal strain (mechanical tension ) of the copper foil is different from that of the plastic resin under such temperature. As a result, blister or lifting or peeling of the coating of the soft circuit substrate will take place.
- Recently, sputtering technique has been applied to manufacturing of soft circuit substrate. For example, Taiwanese Patent Publication No. 519860 discloses a method for manufacturing soft circuit substrate and a product thereof.
-
FIGS. 3 and 4 show the soft circuit substrate structure of the above Patent. The soft circuit substrate structure includes apolymer film 81, a chromium (Ni or Cr/Ni ) attachinglayer 82 overlaid on one face of the polymer film, a nickel-chromiumalloy attaching layer 83 overlaid on one face of the chromium attaching layer distal from the polymer film and acopper attaching layer 84 overlaid on one face of the nickel-chromium alloy attaching layer distal from the chromium attaching layer. Acopper foil 85 is further deposited on the copper attaching layer. - In the above soft circuit substrate structure, the chromium attaching layer, nickel-chromium alloy attaching layer and copper attaching layer all serve as tie-coatings of the copper foil. By means of the tie-coating, the polymer film with quite different physical properties can be tightly bonded with the copper foil.
- However, in the above structure, the multiple tie-coatings lead to increment of manufacturing time and complicate the manufacturing procedure. As a result, the manufacturing cost is much higher. Moreover, the tie-coatings will increase the impedance of the material. For example, the impedance of chromium is more than ten times the impedance of copper and the impedance of nickel is more than four times the impedance of copper. All the above problems should be solved.
- It is therefore a primary object of the present invention to provide a soft thin laminated substrate in which only an alloy copper layer is disposed between the plastic substrate and the copper foil as the tie-coating of the copper foil. The copper foil can tightly attach to the alloy copper layer to tightly associate with the plastic substrate. When the temperature rises, the coating will not blister or peel. Therefore, the using life is prolonged. Also, the cost is reduced and the manufacturing procedure is simplified.
- According to the above object, the soft thin laminated substrate includes: a plastic substrate; an alloy copper layer overlaid on the plastic substrate, the alloy copper layer having a thickness within 10˜10000 angstroms, the alloy copper layer being an alloy of 0.1%˜99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus; and a copper foil overlaid on the alloy copper layer.
- The present invention can be best understood through the following description and accompanying drawings wherein:
-
FIG. 1 is a schematic diagram showing the structure of the present invention; -
FIG. 2 is a sectional view showing the structure of the present invention; -
FIG. 3 is a schematic diagram showing the structure of a conventional soft circuit substrate; and -
FIG. 4 is a sectional view showing the structure of the conventional soft circuit substrate. - Please refer to
FIG. 1 . The soft thin laminated substrate of the present invention includes aplastic substrate 1, analloy copper layer 2 overlaid on theplastic substrate 1 and acopper foil 3 overlaid on thealloy copper layer 2. - The
plastic substrate 1 can be made of one of polyimide (PI ), PET, PC, PMMA, etc. With polyimide exemplified, such material has excellent electrical properties, anti-chemical properties and highest heat resistance among polymer materials. Therefore, the thermal strain can be minimized. - The
alloy copper layer 2 is disposed on theplastic substrate 1 by way of vacuum physical coating. The thickness of thealloy copper layer 2 is within 10˜10000 angstroms. Thealloy copper layer 2 is an alloy of 0.1%-99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus. The added metal has excellent electric conductivity. Preferably, the added metal will not increase the impedance of thealloy copper layer 2. - The
copper foil 3 disposed on thealloy copper layer 2 by way of vacuum physical coating is composed of 10%-99.95% copper metal and at least one of nickel, chromium, manganese, molybdenum, iron and phosphorus. - The vacuum physical coating can be thermal evaporation, electron beam evaporation, DC magnetron sputter, RF magnetron sputter, ion beam sputter, molecular beam epitaxy (MBE ) or plasma enhanced CVD. The
alloy copper layer 2 of the present invention contains pure copper molecules. By means of the better electric conductivity of pure copper molecules, the bonding strength of thecopper foil 3 can be enhanced. Moreover, by means of those low-impedance materials such as nickel, chromium, manganese, molybdenum, iron and phosphorus, the electric conductivity of thealloy copper layer 2 will not be greatly reduced. - In the soft thin laminated substrate structure of the present invention, the
alloy copper layer 2 serves as a tie-coating of thecopper foil 3. The alloy materials of nickel, chromium, manganese, molybdenum, iron and phosphorus in thealloy copper layer 2 have better bonding strength to plastic material so that thealloy copper layer 2 can be more firmly bonded with thesubstrate 1. Also, thecopper foil 3 can tightly attach to thealloy copper layer 2 to associate with theplastic substrate 1. It is known from an actual pull test, the peel strength of the soft thin laminated substrate of the present invention is up to 0.65 kg/cm2. Accordingly, the structure of the present invention can truly well bond theplastic substrate 1,alloy copper layer 2 andcopper foil 3 with each other. Moreover, theplastic substrate 1 of the present invention has better thermal strain and theplastic substrate 1, thealloy copper layer 2 and thecopper foil 3 are better bonded with each other. Therefore, when the temperature rises to 150° C., the coating of the present invention is uneasy to blister or lift or peel. Therefore, the using life of the present invention is prolonged. - In conventional technique, the tie-coating is formed of a three-layer structure, that is, a chromium attaching layer, a nickel-chromium alloy attaching layer and a copper attaching layer. In comparison with the prior art, the soft thin laminated substrate structure of the present invention only includes an alloy copper layer as the tie-coating for tightly bonding the
plastic substrate 1, alloycopper layer 2 andcopper foil 3 with each other. Therefore, the present invention can achieve double effects of decrement of cost and simplification of manufacturing procedure. - The above embodiments are only used to illustrate the present invention, not intended to limit the scope thereof. Many modifications of the above embodiments can be made without departing from the spirit of the present invention.
Claims (3)
1. A polymeric substrate comprising: a plastic substrate; an alloy copper layer overlaid on the plastic substrate, the alloy copper layer being disposed on the plastic substrate by way of vacuum physical coating, the alloy copper layer having a thickness within 10˜10000 angstroms, the alloy copper layer being an alloy containing copper metal ranging from 0.1 to 99.95 weight % in said alloy and at least one of manganese, molybdenum, and phosphorus; and a copper foil overlaid on the alloy copper layer by vacuum physical coating.
2. The polymeric substrate as claimed in claim 1 , wherein the copper foil is composed of copper metal ranging from 10 to 99.95 weight % and at least one of materials from the group of materials consisting of nickel, chromium, manganese, molybdenum, and phosphorus.
3. The polymeric substrate as claimed in claim 1 , wherein the plastic substrate is made of a material from the group of materials consisting of PI, PET, PC and PMMA.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/031,040 US20060154102A1 (en) | 2005-01-10 | 2005-01-10 | Soft thin laminated substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/031,040 US20060154102A1 (en) | 2005-01-10 | 2005-01-10 | Soft thin laminated substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
US20060154102A1 true US20060154102A1 (en) | 2006-07-13 |
Family
ID=36653610
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/031,040 Abandoned US20060154102A1 (en) | 2005-01-10 | 2005-01-10 | Soft thin laminated substrate |
Country Status (1)
Country | Link |
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US (1) | US20060154102A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4131517A (en) * | 1977-06-03 | 1978-12-26 | Nippon Mining Co., Ltd. | Surface treating process for copper foil for use in printed circuit |
US4917963A (en) * | 1988-10-28 | 1990-04-17 | Andus Corporation | Graded composition primer layer |
US6399496B1 (en) * | 1998-04-27 | 2002-06-04 | International Business Machines Corporation | Copper interconnection structure incorporating a metal seed layer |
US6448492B1 (en) * | 1997-12-24 | 2002-09-10 | Gunze Limited | Transparent member for shielding electromagnetic waves and method of producing the same |
-
2005
- 2005-01-10 US US11/031,040 patent/US20060154102A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4131517A (en) * | 1977-06-03 | 1978-12-26 | Nippon Mining Co., Ltd. | Surface treating process for copper foil for use in printed circuit |
US4917963A (en) * | 1988-10-28 | 1990-04-17 | Andus Corporation | Graded composition primer layer |
US6448492B1 (en) * | 1997-12-24 | 2002-09-10 | Gunze Limited | Transparent member for shielding electromagnetic waves and method of producing the same |
US6399496B1 (en) * | 1998-04-27 | 2002-06-04 | International Business Machines Corporation | Copper interconnection structure incorporating a metal seed layer |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: WINTEX CORPORATION, TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:WANG, CHIH YUAN;CHANG, HENG YI;CHANG, HUI YU;AND OTHERS;REEL/FRAME:015635/0406 Effective date: 20040520 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |