US20040113243A1 - UV cured polymeric semiconductor die coating - Google Patents
UV cured polymeric semiconductor die coating Download PDFInfo
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- US20040113243A1 US20040113243A1 US10/727,947 US72794703A US2004113243A1 US 20040113243 A1 US20040113243 A1 US 20040113243A1 US 72794703 A US72794703 A US 72794703A US 2004113243 A1 US2004113243 A1 US 2004113243A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
- H01L23/4951—Chip-on-leads or leads-on-chip techniques, i.e. inner lead fingers being used as die pad
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Definitions
- the invention relates to polymeric semiconductor die coatings cured with ultra violet light.
- Passivation films and other semiconductor die coatings are commonly used as a barrier to physical damage and environmental contaminants.
- the passivation film is an insulating protective layer that minimizes mechanical and chemical damage to the dies during assembly and packaging.
- the passivation film material should be impermeable to moisture and to sodium atoms and other highly mobile impurities.
- Inorganic compounds such as phosphosilicate glass and silicon nitride are often used to form passivation films. More recently, organic polymers have been used for passivation films.
- Polyimide is presently the most common type of polymer used to form passivation films.
- the polyimide film is spun on to the wafer as a liquid polyamic-acid precursor.
- the polyamic acid undergoes a chemical change called imidization that causes it to become the solid polyimide film.
- problems with polyimide die coatings center around the ability to properly cure the film.
- high temperature cycles are used to drive the imidization reaction. For example, the wafer is heated to 100° C.-150° C. for 30 minutes to evaporate the solvent and then the wafer is baked at about 300° C. for 60 minutes to fully cure the film.
- Polyimides are also being investigated for use as permanent resist films.
- Photosensitive polyimide precursors are spun on to the wafer and, upon exposure to ultra violet light, undergo cross linking. During development, the unexposed regions are dissolved and final curing by heat treatment leads to imidization of the remaining crosslinked material. At 275° C. nearly all of the precursor is converted to polyimide and most of the photo-crosslinked groups are volatized. The properties of the final cured film are essentially the same as those of the non-photosensitive polyimide.
- polyimides as a permanent photoresist is described in U.S. Pat. No. 5,013,689 issued to Yamamoto et al. on May 7, 1991.
- Yamamoto describes a method of forming a two layer passivation film wherein the resist film used to pattern the first passivation film is retained as the second part of the two part passivation film.
- a conventional positive acting resist, a light sensitive polyimide and a light sensitive silicone ladder polymer were each used to pattern a silicon nitride passivation film.
- the resist was left intact after the passivation film is patterned. It was then “p ost-baked” to render it suitable for use as the second part of the resulting two part passivation film.
- the present invention is directed to a permanent protective semiconductor die coating made from a polymer that is fully curable through exposure to ultra violet light.
- a mixture of polymer resin and a photoactive compound is applied to the die and then cured through exposure to ultraviolet light to form the protective coating.
- the polymer resin is a phenol-formaldehyde epoxy resin and the photoactive compound is CD1011 (marketed under the brand name SARTOMER ⁇ .
- the coating may be applied as a thin protective film, such as a passivation layer, or as a thicker encapsulant used for semiconductor device packages. Such film coatings exhibit reduced film shrinkage and lower film stresses while maintaining mechanical properties comparable to polyimide film coatings.
- FIG. 1 is a partial cross section view of a semiconductor die having a passivation film coating made of a UV cured polymer.
- FIG. 2 is a cut away perspective view of a fully assembled and packaged semiconductor die wherein the encapsulating material is a UV cured polymer.
- the manufacture of semiconductor devices involves building integrated circuits on silicon wafers.
- the silicon wafer is the base substrate upon which successive layers of insulating, conducting and semiconducting materials are stacked. These layers are patterned and usually linked to surrounding areas and other layers to form electronic elements or other structures that perform specific functions.
- One of the last layers formed on the wafer is a metal layer that is patterned into a series of metal wires.
- a passivation layer is formed over the surface of the wafer to cover this final metal wiring pattern.
- the passivation layer is an insulating and protective layer that prevents mechanical and chemical damage during assembly and packaging.
- the passivation layer is patterned to expose select areas on the metal wires. These areas, commonly referred to as bond pads, are the contact points through which the circuits on the semiconductor device are connected to external circuits and devices.
- semiconductor device 10 represents generally an integrated circuit device such as a random access memory (RAM), a read only memory (ROM), or a logic circuit.
- the integrated circuits (not shown) are formed in a main region 12 of semiconductor device 10 .
- the integrated circuits are electrically connected to wires formed on an insulating layer 16 .
- Insulating layer 16 typically made of phosphosilicate glass, is formed over the integrated circuits and usually extends to cover the entire upper surface of the device. Insulating layer 16 is patterned to open contact vias (not shown) to the integrated circuits in the main region 12 of semiconductor device 10 .
- a metal layer formed over insulating layer 16 is patterned to form the wires.
- Passivation layer 18 is then formed over the entire surface of the device. Passivation layer 18 is patterned to expose select areas of the wires. These exposed areas constitute bond pads 20 .
- Passivation layer 18 is made of a composite of silicon dioxide, silicon nitride and a polymer that is fully curable through exposure to ultra violet light.
- the photo sensitive polymer is spun on to the wafer in the form of a liquid.
- the liquid film is cured into a solid or semi-solid layer by irradiating the film with ultra violet light.
- the polymer includes a base resin mixed with a photoactive compound or “ph otoinitiator” as it is sometimes called.
- Suitable base resins include phenol-formaldehyde epoxy novolac resins such as Dow Chemical Company's D.E.N.® 431 epoxy novolac resin.
- Suitable photoactive compounds include CD1011 (marketed under the brand name SARTOMER ⁇ .
- the film is irradiated with light having a wavelength in the range of 200-400 nm at a dose of 2-20 eV for 15-20 seconds.
- the actual cure conditions used in a specific application will vary within these preferred ranges according to the type of base resin and the type and amount photoactive compound are used to form the liquid film.
- the coating composition may be prepared as a resinous liquid or as an organic solvent solution containing the resin, photoactive compound and any other components necessary or desirable for a particular application (e.g., fillers, catalysts, mold release agents, or pigments). Curing may be effected at room temperature. If the coating composition is applied as a solution, by spin coating on to a semiconductor wafer for example, then the wafer is heated first to evaporate the solvent. It is usually sufficient to remove the solvent by heating the wafer to 100° C.-150° C. for about 30 minutes. The amount of ultra violet light and the duration of exposure required to cure the coating depends primarily on the amount and type of radiation sensitive photoinitiator, the thickness of the coating and the degree of curing desired.
- Suitable doses of ultra violet light having a wavelength in the range of 200-400 nm include from about 2 eV to about 20 eV.
- a typical passivation film coating on the order of 10 microns thick will cure upon exposure to the ultra violet light for 15-20 seconds.
- FIG. 2 Another embodiment of the invention is illustrated in FIG. 2.
- a series of metal leads 22 are positioned over and attached to semiconductor device 10 by a layer of adhesive material 24 .
- Bond wires 26 extend between and electrically connect leads 22 to bond pads 20 .
- Semiconductor device 10 and the inner portion of leads 22 are imbedded within encapsulating material 28 .
- Encapsulating material 28 is a UV curable polymer such as the phenol-formaldehyde epoxy novolac resins described above.
- the die coatings and encapsulants may be formed by processing a polymer with a photointiator or cross linking agent to facilitate curing.
- a photointiator or cross linking agent may also be used to reduce shrinkage and reduce film stress.
- Such copolymers are described in U.S. Pat. No. 5,376,503 issued to Audett et al. on Dec. 27, 1994. The disclosure in Audett, found at columns 7-67, is incorporated herein by reference. While there is shown and described several exemplary embodiments of the invention, it is to be understood that the invention is not limited thereto but may be variously embodied to practice within the scope of the following claims.
Abstract
A permanent protective semiconductor die coating made from a polymer that is fully curable through exposure to ultra violet light. A mixture of polymer resin and a photoactive compound is applied to the die and then cured through exposure to ultraviolet light to form the protective coating. In one preferred embodiment, the polymer resin is a phenol-formaldehyde epoxy resin and the photoactive compound is CD1011 (marketed under the brand name SARTOMER□. The coating may be applied as a thin protective film, such as a passivation layer, or as a thicker encapsulant used for semiconductor device packages. Such film coatings exhibit reduced film shrinkage and lower film stresses while maintaining mechanical properties comparable to polyimide film coatings.
Description
- The invention relates to polymeric semiconductor die coatings cured with ultra violet light.
- Passivation films and other semiconductor die coatings are commonly used as a barrier to physical damage and environmental contaminants. In the manufacture of semiconductor devices, the entire top surface of the wafer is often coated with a passivation film following the formation of the final metal layer. The passivation film is an insulating protective layer that minimizes mechanical and chemical damage to the dies during assembly and packaging. The passivation film material should be impermeable to moisture and to sodium atoms and other highly mobile impurities. Inorganic compounds such as phosphosilicate glass and silicon nitride are often used to form passivation films. More recently, organic polymers have been used for passivation films.
- Polyimide is presently the most common type of polymer used to form passivation films. The polyimide film is spun on to the wafer as a liquid polyamic-acid precursor. During high temperature curing, the polyamic acid undergoes a chemical change called imidization that causes it to become the solid polyimide film. Problems with polyimide die coatings center around the ability to properly cure the film. To cure the liquid precursor, high temperature cycles are used to drive the imidization reaction. For example, the wafer is heated to 100° C.-150° C. for 30 minutes to evaporate the solvent and then the wafer is baked at about 300° C. for 60 minutes to fully cure the film. It is not unusual for the polyimide to lose 20%-30% of its volume during the imidization/curing process. The substantial shrinkage of the polyimide film as well as other aspects of the imidization process cause severe stress on the wafer surface which, in extreme cases, leads to film pealing and/or reduction in yield as a result of surface cracks and dislocations induced in the substrate.
- Polyimides are also being investigated for use as permanent resist films. Photosensitive polyimide precursors are spun on to the wafer and, upon exposure to ultra violet light, undergo cross linking. During development, the unexposed regions are dissolved and final curing by heat treatment leads to imidization of the remaining crosslinked material. At 275° C. nearly all of the precursor is converted to polyimide and most of the photo-crosslinked groups are volatized. The properties of the final cured film are essentially the same as those of the non-photosensitive polyimide. One example of the use of polyimides as a permanent photoresist is described in U.S. Pat. No. 5,013,689 issued to Yamamoto et al. on May 7, 1991. Yamamoto describes a method of forming a two layer passivation film wherein the resist film used to pattern the first passivation film is retained as the second part of the two part passivation film. In Yamamoto, a conventional positive acting resist, a light sensitive polyimide and a light sensitive silicone ladder polymer were each used to pattern a silicon nitride passivation film. The resist was left intact after the passivation film is patterned. It was then “p ost-baked” to render it suitable for use as the second part of the resulting two part passivation film.
- The present invention is directed to a permanent protective semiconductor die coating made from a polymer that is fully curable through exposure to ultra violet light. A mixture of polymer resin and a photoactive compound is applied to the die and then cured through exposure to ultraviolet light to form the protective coating. In one preferred embodiment, the polymer resin is a phenol-formaldehyde epoxy resin and the photoactive compound is CD1011 (marketed under the brand name SARTOMER□. The coating may be applied as a thin protective film, such as a passivation layer, or as a thicker encapsulant used for semiconductor device packages. Such film coatings exhibit reduced film shrinkage and lower film stresses while maintaining mechanical properties comparable to polyimide film coatings.
- FIG. 1 is a partial cross section view of a semiconductor die having a passivation film coating made of a UV cured polymer.
- FIG. 2 is a cut away perspective view of a fully assembled and packaged semiconductor die wherein the encapsulating material is a UV cured polymer.
- The manufacture of semiconductor devices involves building integrated circuits on silicon wafers. The silicon wafer is the base substrate upon which successive layers of insulating, conducting and semiconducting materials are stacked. These layers are patterned and usually linked to surrounding areas and other layers to form electronic elements or other structures that perform specific functions. One of the last layers formed on the wafer is a metal layer that is patterned into a series of metal wires. A passivation layer is formed over the surface of the wafer to cover this final metal wiring pattern. The passivation layer is an insulating and protective layer that prevents mechanical and chemical damage during assembly and packaging. The passivation layer is patterned to expose select areas on the metal wires. These areas, commonly referred to as bond pads, are the contact points through which the circuits on the semiconductor device are connected to external circuits and devices.
- Referring to FIG. 1,
semiconductor device 10 represents generally an integrated circuit device such as a random access memory (RAM), a read only memory (ROM), or a logic circuit. The integrated circuits (not shown) are formed in amain region 12 ofsemiconductor device 10. The integrated circuits are electrically connected to wires formed on aninsulating layer 16.Insulating layer 16, typically made of phosphosilicate glass, is formed over the integrated circuits and usually extends to cover the entire upper surface of the device.Insulating layer 16 is patterned to open contact vias (not shown) to the integrated circuits in themain region 12 ofsemiconductor device 10. A metal layer formed over insulatinglayer 16 is patterned to form the wires.Passivation layer 18 is then formed over the entire surface of the device.Passivation layer 18 is patterned to expose select areas of the wires. These exposed areas constitutebond pads 20. -
Passivation layer 18 is made of a composite of silicon dioxide, silicon nitride and a polymer that is fully curable through exposure to ultra violet light. In one preferred embodiment of the invention, the photo sensitive polymer is spun on to the wafer in the form of a liquid. The liquid film is cured into a solid or semi-solid layer by irradiating the film with ultra violet light. The polymer includes a base resin mixed with a photoactive compound or “ph otoinitiator” as it is sometimes called. Suitable base resins include phenol-formaldehyde epoxy novolac resins such as Dow Chemical Company's D.E.N.® 431 epoxy novolac resin. Dow D.E.N.® 431 epoxy novolac resin shrinks only 5%-10% by volume upon curing. It is expected that other phenol-formaldehyde resins will exhibit similarly favorable shrink rates. Suitable photoactive compounds include CD1011 (marketed under the brand name SARTOMER□. Preferably, the film is irradiated with light having a wavelength in the range of 200-400 nm at a dose of 2-20 eV for 15-20 seconds. The actual cure conditions used in a specific application will vary within these preferred ranges according to the type of base resin and the type and amount photoactive compound are used to form the liquid film. - The coating composition may be prepared as a resinous liquid or as an organic solvent solution containing the resin, photoactive compound and any other components necessary or desirable for a particular application (e.g., fillers, catalysts, mold release agents, or pigments). Curing may be effected at room temperature. If the coating composition is applied as a solution, by spin coating on to a semiconductor wafer for example, then the wafer is heated first to evaporate the solvent. It is usually sufficient to remove the solvent by heating the wafer to 100° C.-150° C. for about 30 minutes. The amount of ultra violet light and the duration of exposure required to cure the coating depends primarily on the amount and type of radiation sensitive photoinitiator, the thickness of the coating and the degree of curing desired. Suitable doses of ultra violet light having a wavelength in the range of 200-400 nm include from about 2 eV to about 20 eV. A typical passivation film coating on the order of 10 microns thick will cure upon exposure to the ultra violet light for 15-20 seconds.
- The following example illustrates one preferred formulation and application of the UV cured polymer semiconductor die coating.
- Dow Chemical D.E.N.® 431 epoxy novolac resin, available from Dow Chemical Company in Midland, Mich., was mixed with the photoinitiator CD1011 marketed under the brand name SARTOMER□ in a propylene glycol acitate solvent. The components were mixed at the rate of 55% by volume solvent, 44% by volume resin and 1% by volume photoinitiator. The mixture was procured in solution from Dow Chemical. The solution was spun on to a dummy wafer using conventional spin coating equipment. The wafer was heated to 100° C. for 30 minutes to evaporate the solvent and then the coating was irradiated with ultra violet light having a wavelength of 248 nm at a dose of 200 mJ.
- Another embodiment of the invention is illustrated in FIG. 2. In FIG. 2, a series of metal leads22 are positioned over and attached to
semiconductor device 10 by a layer ofadhesive material 24.Bond wires 26 extend between and electrically connect leads 22 tobond pads 20.Semiconductor device 10 and the inner portion ofleads 22 are imbedded within encapsulatingmaterial 28. Encapsulatingmaterial 28 is a UV curable polymer such as the phenol-formaldehyde epoxy novolac resins described above. - The die coatings and encapsulants may be formed by processing a polymer with a photointiator or cross linking agent to facilitate curing. Alternatively, it is expected that internally cross linked copolymers that do not require a photointiator or cross linking agent may also be used to reduce shrinkage and reduce film stress. Such copolymers are described in U.S. Pat. No. 5,376,503 issued to Audett et al. on Dec. 27, 1994. The disclosure in Audett, found at columns 7-67, is incorporated herein by reference. While there is shown and described several exemplary embodiments of the invention, it is to be understood that the invention is not limited thereto but may be variously embodied to practice within the scope of the following claims.
Claims (13)
1. A semiconductor die coating, comprising a polymer that is fully curable by exposure to ultra violet light.
2. A semiconductor die coating according to claim 1 , wherein the polymer shrinks 10% or less by volume upon curing.
3. A semiconductor structure, comprising:
a semiconductor die;
a permanent protective coating on at least one surface of the die, the coating including a polymer resin and a photoactive compound.
4. A semiconductor structure according to claim 3 , wherein the polymer resin shrinks 10% or less by volume upon curing.
5. A semiconductor structure according to claim 3 , wherein the polymer comprises a phenol-formaldehyde epoxy novolac resin.
6. A semiconductor structure according to claim 3 , wherein the photoactive compound is CD1011.
7. A semiconductor die coating, comprising a phenol-formaldehyde epoxy novolac resin and CD1011.
8. A semiconductor die coating, comprising approximately 44% by volume phenol-formaldehyde epoxy novolac resin and 1% by volume CD 1011.
9. A process for forming a protective coating on a semiconductor die, which comprises:
applying a mixture of a phenol-formaldehyde epoxy novolac resin and CD1011 to a portion of the die; and
exposing the mixture to ultraviolet light.
10. A process for forming a protective coating on a semiconductor die, which comprises:
mixing a phenol-formaldehyde epoxy novolac resin and CD1011 in the relative amounts of about 44% by volume resin and 1% by volume CD1011 to form an epoxy resin composition applying the composition to at least a portion of the die; and
exposing the mixture to ultraviolet light.
11. A semiconductor die package, comprising:
a semiconductor die;
conductive leads electrically connected to the die;
encapsulating material covering at least a portion of the die and at least a portion of the leads, the encapsulating material comprising a polymer that is fully curable by exposure to ultra violet light.
12. A semiconductor die package, comprising:
a semiconductor die;
conductive leads electrically connected to the die;
encapsulating material covering at least a portion of the die and at least a portion of the leads, the encapsulating material comprising a polymer resin and a photoactive compound.
13. A semiconductor die package, comprising:
a semiconductor die;
conductive leads electrically connected to the die;
encapsulating material covering at least a portion of the die and at least a portion of the leads, the encapsulating material comprising a phenol-formaldehyde epoxy novolac resin and CD1011.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US10/727,947 US20040113243A1 (en) | 1998-09-03 | 2003-12-03 | UV cured polymeric semiconductor die coating |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US14610798A | 1998-09-03 | 1998-09-03 | |
US10/086,907 US6674158B2 (en) | 1998-09-03 | 2002-02-28 | Semiconductor die package having a UV cured polymeric die coating |
US10/727,947 US20040113243A1 (en) | 1998-09-03 | 2003-12-03 | UV cured polymeric semiconductor die coating |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US10/086,907 Continuation US6674158B2 (en) | 1998-09-03 | 2002-02-28 | Semiconductor die package having a UV cured polymeric die coating |
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US20040113243A1 true US20040113243A1 (en) | 2004-06-17 |
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US10/086,907 Expired - Fee Related US6674158B2 (en) | 1998-09-03 | 2002-02-28 | Semiconductor die package having a UV cured polymeric die coating |
US10/727,947 Abandoned US20040113243A1 (en) | 1998-09-03 | 2003-12-03 | UV cured polymeric semiconductor die coating |
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US10/086,907 Expired - Fee Related US6674158B2 (en) | 1998-09-03 | 2002-02-28 | Semiconductor die package having a UV cured polymeric die coating |
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US7276385B1 (en) * | 2003-11-24 | 2007-10-02 | Kovio, Inc. | Methods of laser repairing a circuit, compositions and equipment for such methods, and structures formed from such methods |
US20110229822A1 (en) * | 2008-11-25 | 2011-09-22 | Stapleton Russell A | Methods for protecting a die surface with photocurable materials |
WO2011156221A3 (en) * | 2010-06-08 | 2012-04-05 | Henkel Corporation | Wafer backside coating process with pulsed uv light source |
US9093448B2 (en) | 2008-11-25 | 2015-07-28 | Lord Corporation | Methods for protecting a die surface with photocurable materials |
EP1917281B2 (en) † | 2005-08-22 | 2019-01-09 | Chevron Phillips Chemical Company Lp | Polymerization catalysts and process for producing bimodal polymers in a single reactor |
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US6674158B2 (en) * | 1998-09-03 | 2004-01-06 | Micron Technology, Inc. | Semiconductor die package having a UV cured polymeric die coating |
JP4174174B2 (en) * | 2000-09-19 | 2008-10-29 | 株式会社ルネサステクノロジ | Semiconductor device, manufacturing method thereof, and semiconductor device mounting structure |
US7479653B2 (en) | 2003-12-04 | 2009-01-20 | Henkel Ag & Co Kgaa | UV curable protective encapsulant |
US7223630B2 (en) * | 2004-12-03 | 2007-05-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Low stress semiconductor device coating and method of forming thereof |
JP5891771B2 (en) * | 2011-01-18 | 2016-03-23 | 富士通株式会社 | Surface coating method, semiconductor device, and mounting circuit board |
KR101541618B1 (en) * | 2013-12-30 | 2015-08-03 | 서울대학교산학협력단 | Forming Method of Flexible Substrate, Flexible Substrate and Electronic Device having Flexible Substrate |
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US7276385B1 (en) * | 2003-11-24 | 2007-10-02 | Kovio, Inc. | Methods of laser repairing a circuit, compositions and equipment for such methods, and structures formed from such methods |
EP1917281B2 (en) † | 2005-08-22 | 2019-01-09 | Chevron Phillips Chemical Company Lp | Polymerization catalysts and process for producing bimodal polymers in a single reactor |
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Also Published As
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US6674158B2 (en) | 2004-01-06 |
US20020098626A1 (en) | 2002-07-25 |
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