US20040096583A1 - Method for vacuum treatment of workpieces and vacuum treatment installation - Google Patents
Method for vacuum treatment of workpieces and vacuum treatment installation Download PDFInfo
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- US20040096583A1 US20040096583A1 US10/712,509 US71250903A US2004096583A1 US 20040096583 A1 US20040096583 A1 US 20040096583A1 US 71250903 A US71250903 A US 71250903A US 2004096583 A1 US2004096583 A1 US 2004096583A1
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- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000009489 vacuum treatment Methods 0.000 title description 11
- 238000009434 installation Methods 0.000 title description 10
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 238000013500 data storage Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
Definitions
- the present invention relates to a method for the vacuum treatment of workpieces, in which a workpiece is introduced into an interlock chamber open to the ambient atmosphere, the interlock chamber is pumped out after it had been closed off from said ambient atmosphere, the interlock chamber is opened into an at least partially pumped-off vacuum chamber configuration, the workpiece subsequently is transported from the interlock chamber into the configuration and treated in the configuration, the workpiece subsequently is transported back from the configuration into the interlock chamber, the interlock chamber is closed against the configuration, is subsequently flooded and, lastly, the treated workpiece is carried from the flooded interlock chamber into the ambient atmosphere, wherein at least a portion of the configuration is pumped out by means of a turbo vacuum pump with a forevacuum pump operationally connected therewith at the high-pressure side and the interlock chamber is pumped out by means of an interlock pump.
- the present invention relates further to a vacuum treatment installation comprising an interlock chamber, an interlock pump connected therewith, further communicating with the interlock chamber a vacuum chamber configuration operationally connected with at least one turbo vacuum pump, with which latter is associated at the high-pressure side a forevacuum pump.
- FIG. 1 is depicted in the form of a function block diagram one such prior known configuration, in which said prior known workpiece treatment method is readily evident to a person skilled in the art.
- an interlock chamber 1 with lock valve 3 against ambient atmosphere U is provided with a lock valve 5 against a vacuum chamber configuration 7 .
- the vacuum chamber configuration 7 can therein comprise as a minimum configuration a single treatment chamber B or one or several transport chamber(s) operationally connected with the latter, again, one or several treatment chamber(s) B as well as, if appropriate further interlock chambers depending on how complex the treatment to be carried out on the workpieces is and how many steps it comprises.
- the workpieces are introduced into the interlock chamber 1 with the lock valve 5 closed and lock valve 3 is opened, whereupon the lock valve 3 is closed and the interlock chamber 1 is evacuated by means of an interlock pump 9 , such as for example a single- or multistage rotary vane pump and via a valve 11 .
- an interlock pump 9 such as for example a single- or multistage rotary vane pump and via a valve 11 .
- At least one turbo vacuum pump 13 which pumps out at least the one treatment chamber, if appropriate jointly in combination with a transport chamber associated with this treatment chamber. If several treatment chambers are provided which are to be pumped independently of one another, it is entirely possible to provide several turbo vacuum pumps 13 .
- the at least one turbo vacuum pump 13 operationally connected with the vacuum chamber configuration 7 , is succeeded at the high-pressure side by a forevacuum pump 15 , in order to generate the required forepressure at the turbo vacuum pump 13 .
- the vacuum treatment installation of the above described type is distinguished thereby that the forevacuum pump, associated with the turbo vacuum pump, is the interlock pump.
- the method according to the invention as well as also the configuration according to the invention are in particular well suitable for the treatment, in particular coating, of disk-shaped workpieces, in particular of storage disks, therein especially of optical data storage disks.
- FIG. 1 is a function block diagram of a prior art method
- FIG. 2 building on a representation according to FIG. 1, the fundamental further development according to the invention of the vacuum installation for realizing the production method according to the invention.
- FIG. 3 schematically the realization of a highly compact vacuum treatment installation according to the invention in a preferred embodiment.
- FIG. 2 the same vacuum treatment installation as depicted in FIG. 1, however, as will be described in the following, is further developed according to the invention.
- the forevacuum pump succeeding the turbo vacuum pump 13 at the high-pressure side is omitted.
- the interlock pump 9 is also employed as the forepump of the turbo vacuum pump 13 . Therefore, in FIG. 2 the interlock-/forevacuum pump used in combination is denoted by the combined reference symbol 9 / 15 .
- the low-pressure side of the interlock-/forevacuum pump 9 / 15 is operationally connected via a controlled switch-over device 17 with the interlock chamber as well as also with the high-pressure side of the turbo vacuum pump 13 .
- the low-pressure input of the interlock-/forevacuum pump 9 / 15 is isolated via the switch-over unit 17 from the high-pressure port of the turbo vacuum pump 13 and operationally connected with the interlock.
- the low-pressure input of the interlock-/forevacuum pump 9 / 15 is operationally connected via said switch-over device 17 with the high-pressure side of the turbo vacuum pump 13 .
- control of said operational connections can therein take place under pressure control, for example by measuring the pressure in the interlock chamber 1 and switching-over to forepump operation of the interlock-/forevacuum pump 9 / 15 upon reaching a predetermined pressure value or it can take place at a predetermined periodicity according to pre-ascertained cycles.
- a turbo vacuum pump 13 is employed which at the high-pressure side can work against a maximally high pressure, preferably of at least 1 mbar, in particular preferred of at least 10 mbar.
- turbo drag pumps or turbo pumps combined with Holweck stages at the pump output are especially suitable turbo drag pumps or turbo pumps combined with Holweck stages at the pump output.
- interlock- 1 forevacuum pump furthermore, a single- or multistage rotary vane pump is preferably used.
- the interlock chamber 1 should be pumped out as rapidly as possible such that at the high-pressure side the turbo vacuum pump 13 does not need to operate too long in the operational connection, which in this case is closed, to the switch-over configuration 17 or to a closed valve 17 a . Accordingly is dimensioned, on the one hand, the capacity of the provided interlock-/forevacuum pump 9 / 15 , but in particular the volume of the interlock chamber 1 .
- the latter should be selected to be of minimum size, the ratio of the interlock chamber volume to the volume pumped out by the provided turbo vacuum pump 13 should be selected to be maximally 1:40, preferably even maximally 1:100.
- FIG. 3 is depicted schematically a preferred, highly compact vacuum treatment installation according to the invention for the vacuum treatment according to the invention of workpieces, in particular circular disk-shaped workpieces, such as for example, and preferably, of data storage disks.
- a transport device 21 is provided driven rotationally movable about an axis A by means of a drive 20 , with transport arms 23 bent off at an angle with respect to the axis of rotation A.
- the transport arms 23 are encapsulated, extendable and retractable, as shown by F.
- the vacuum chamber configuration 7 comprises a working station 29 , for example flanged onto the housing 7 a , a working station 29 , such as for example a sputter station.
- the volume of a provided interlock chamber 1 a is minimized thereby that it is virtually integrated into the section thickness of the wall of the housing 7 a .
- This minimization, previously already discussed in conjunction with FIG. 2, of the interlock chamber volume is possible in the extent depicted in FIG. 3, in particular in combination with the treatment, for example in particular of the coating, of disk-shaped workpieces, in particular of storage disks, therein especially of optical data storage disks.
- cycle times for example, of less than 2 seconds were attained in the CD production or the production of optical storage disks, concretely of 1.8 seconds at a lock passing time of 0.4 seconds.
- the sub-interval range of the cycle time “transportation and treatment” is at least 50% of the total cycle time, preferably at least 60%, or expressed with respect to the “lock passage time”, at least 300%.
- the outer lock valve is denoted by 3 a , the inner one is formed by the workpiece carrier plate 27 on the particular transport arm 23 .
- the provided transport arms or the retracted carrier plates 27 are first placed into position onto interlock chamber 1 a and working station 29 .
- the corresponding stations 1 a , 29 are sealed off, either by setting up a pressure stage, such as by means of labyrinth sealing, or vacuum-tight, for example form-fittingly.
- a pressure stage such as by means of labyrinth sealing, or vacuum-tight, for example form-fittingly.
- 31 denotes a flooding valve for the interlock chamber 1 a , 33 the flooding valve, already depicted in FIGS. 1 and 2, for the turbo vacuum pump 13 .
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Drying Of Semiconductors (AREA)
- Non-Positive Displacement Air Blowers (AREA)
Abstract
A method for manufacturing workpieces treated in a vacuum includes providing first and second vacuum chambers having first and second vacuum pumps, respectively. A vacuum is generated in the first and second vacuum chambers using the second vacuum pump. The second vacuum pump is connected by valves between the first vacuum chamber through the first vacuum pump and the second vacuum chamber. The valves are operated to evacuate the second vacuum chamber, followed by processing the workpieces in the first vacuum chamber.
Description
- This application is a divisional application of U.S. patent application Ser. No. 09/958,404, filed Jan. 22, 2002, the entirety of which is hereby incorporated by reference.
- Method for vacuum treatment of workpieces and vacuum treatment installation. The present invention relates to a method for the vacuum treatment of workpieces, in which a workpiece is introduced into an interlock chamber open to the ambient atmosphere, the interlock chamber is pumped out after it had been closed off from said ambient atmosphere, the interlock chamber is opened into an at least partially pumped-off vacuum chamber configuration, the workpiece subsequently is transported from the interlock chamber into the configuration and treated in the configuration, the workpiece subsequently is transported back from the configuration into the interlock chamber, the interlock chamber is closed against the configuration, is subsequently flooded and, lastly, the treated workpiece is carried from the flooded interlock chamber into the ambient atmosphere, wherein at least a portion of the configuration is pumped out by means of a turbo vacuum pump with a forevacuum pump operationally connected therewith at the high-pressure side and the interlock chamber is pumped out by means of an interlock pump.
- The present invention relates further to a vacuum treatment installation comprising an interlock chamber, an interlock pump connected therewith, further communicating with the interlock chamber a vacuum chamber configuration operationally connected with at least one turbo vacuum pump, with which latter is associated at the high-pressure side a forevacuum pump.
- In FIG. 1 is depicted in the form of a function block diagram one such prior known configuration, in which said prior known workpiece treatment method is readily evident to a person skilled in the art.
- According to FIG. 1, an
interlock chamber 1 withlock valve 3 against ambient atmosphere U is provided with alock valve 5 against avacuum chamber configuration 7. Thevacuum chamber configuration 7 can therein comprise as a minimum configuration a single treatment chamber B or one or several transport chamber(s) operationally connected with the latter, again, one or several treatment chamber(s) B as well as, if appropriate further interlock chambers depending on how complex the treatment to be carried out on the workpieces is and how many steps it comprises. As is readily familiar to a person skilled in the art, the workpieces are introduced into theinterlock chamber 1 with thelock valve 5 closed andlock valve 3 is opened, whereupon thelock valve 3 is closed and theinterlock chamber 1 is evacuated by means of an interlock pump 9, such as for example a single- or multistage rotary vane pump and via avalve 11. - In principle, on the
vacuum chamber configuration 7 at least oneturbo vacuum pump 13 is provided, which pumps out at least the one treatment chamber, if appropriate jointly in combination with a transport chamber associated with this treatment chamber. If several treatment chambers are provided which are to be pumped independently of one another, it is entirely possible to provide severalturbo vacuum pumps 13. - The at least one
turbo vacuum pump 13, operationally connected with thevacuum chamber configuration 7, is succeeded at the high-pressure side by aforevacuum pump 15, in order to generate the required forepressure at theturbo vacuum pump 13. - It is the task of the present invention to further develop the method of the above described type such that it becomes cost-effective and that it becomes less susceptible to fault, further to simplify the installation of said type accordingly, and to realize it such that it requires less maintenance and has greater compactness. This is achieved with the method of said type thereby that as the forevacuum pump the interlock pump is operationally connected with the turbo vacuum pump.
- To solve said task the vacuum treatment installation of the above described type is distinguished thereby that the forevacuum pump, associated with the turbo vacuum pump, is the interlock pump. The method according to the invention as well as also the configuration according to the invention are in particular well suitable for the treatment, in particular coating, of disk-shaped workpieces, in particular of storage disks, therein especially of optical data storage disks.
- The invention will subsequently be explained in conjunction with the drawing figures, in which:
- FIG. 1 is a function block diagram of a prior art method;
- FIG. 2 building on a representation according to FIG. 1, the fundamental further development according to the invention of the vacuum installation for realizing the production method according to the invention; and
- FIG. 3 schematically the realization of a highly compact vacuum treatment installation according to the invention in a preferred embodiment.
- Using the same reference symbols, in FIG. 2 the same vacuum treatment installation as depicted in FIG. 1, however, as will be described in the following, is further developed according to the invention.
- According to FIG. 2 the forevacuum pump succeeding the
turbo vacuum pump 13 at the high-pressure side is omitted. In its place the interlock pump 9 is also employed as the forepump of theturbo vacuum pump 13. Therefore, in FIG. 2 the interlock-/forevacuum pump used in combination is denoted by the combined reference symbol 9/15. In terms of signal technology thus the low-pressure side of the interlock-/forevacuum pump 9/15 is operationally connected via a controlled switch-overdevice 17 with the interlock chamber as well as also with the high-pressure side of theturbo vacuum pump 13. When loading a workpiece into theinterlock chamber 1, for pumping out theinterlock chamber 1 the low-pressure input of the interlock-/forevacuum pump 9/15 is isolated via the switch-over unit 17 from the high-pressure port of theturbo vacuum pump 13 and operationally connected with the interlock. After pumping out theinterlock chamber 1 to transfer pressure to thevacuum chamber configuration 7, the low-pressure input of the interlock-/forevacuum pump 9/15 is operationally connected via said switch-overdevice 17 with the high-pressure side of theturbo vacuum pump 13. - It is entirely possible to realize the switch-
over configuration 17, as indicated in dashed lines at 17 a and 17 b, by means of valves controllable independently of one another, or by means of a two-way valve such as thedevice 17 is also depicted. - The control of said operational connections can therein take place under pressure control, for example by measuring the pressure in the
interlock chamber 1 and switching-over to forepump operation of the interlock-/forevacuum pump 9/15 upon reaching a predetermined pressure value or it can take place at a predetermined periodicity according to pre-ascertained cycles. - Preferably a
turbo vacuum pump 13 is employed which at the high-pressure side can work against a maximally high pressure, preferably of at least 1 mbar, in particular preferred of at least 10 mbar. - For this purpose are especially suitable turbo drag pumps or turbo pumps combined with Holweck stages at the pump output. As the interlock-1 forevacuum pump, furthermore, a single- or multistage rotary vane pump is preferably used.
- When applying said preferably used
turbo vacuum pump 13 this even permits using a very “clean” membrane pump as the interlock-/forevacuum pump. - Furthermore, the
interlock chamber 1 should be pumped out as rapidly as possible such that at the high-pressure side theturbo vacuum pump 13 does not need to operate too long in the operational connection, which in this case is closed, to the switch-overconfiguration 17 or to a closedvalve 17 a. Accordingly is dimensioned, on the one hand, the capacity of the provided interlock-/forevacuum pump 9/15, but in particular the volume of theinterlock chamber 1. The latter should be selected to be of minimum size, the ratio of the interlock chamber volume to the volume pumped out by the providedturbo vacuum pump 13 should be selected to be maximally 1:40, preferably even maximally 1:100. - In FIG. 3 is depicted schematically a preferred, highly compact vacuum treatment installation according to the invention for the vacuum treatment according to the invention of workpieces, in particular circular disk-shaped workpieces, such as for example, and preferably, of data storage disks.
- In a
housing 7 a of thevacuum chamber configuration 7 atransport device 21 is provided driven rotationally movable about an axis A by means of adrive 20, withtransport arms 23 bent off at an angle with respect to the axis of rotation A. By means of associated linear drives, such as shown at 25, thetransport arms 23 are encapsulated, extendable and retractable, as shown by F. At their ends they supportworkpiece carrier plates 27 for (not shown) workpiece disks. Thevacuum chamber configuration 7 comprises aworking station 29, for example flanged onto thehousing 7 a, aworking station 29, such as for example a sputter station. - The volume of a provided
interlock chamber 1 a is minimized thereby that it is virtually integrated into the section thickness of the wall of thehousing 7 a. This minimization, previously already discussed in conjunction with FIG. 2, of the interlock chamber volume is possible in the extent depicted in FIG. 3, in particular in combination with the treatment, for example in particular of the coating, of disk-shaped workpieces, in particular of storage disks, therein especially of optical data storage disks. - With the depicted installation according to the invention in particular according to FIG. 3, cycle times, for example, of less than 2 seconds were attained in the CD production or the production of optical storage disks, concretely of 1.8 seconds at a lock passing time of 0.4 seconds.
- Fundamentally it is preferably proposed that the sub-interval range of the cycle time “transportation and treatment” is at least 50% of the total cycle time, preferably at least 60%, or expressed with respect to the “lock passage time”, at least 300%.
- The outer lock valve is denoted by3 a, the inner one is formed by the
workpiece carrier plate 27 on theparticular transport arm 23. By rotation of thetransport device 21 about axis A, the provided transport arms or the retractedcarrier plates 27 are first placed into position ontointerlock chamber 1 a andworking station 29. By extending the arms thecorresponding stations interlock chamber 1 a by opening thelock valve 3 a a workpiece is input or output, while simultaneously at theworking station 29, either closed or sealed according to the requirements, the workpiece working takes place. - A configuration of this type is fully described in EP A 0 518 109 corresponding to U.S. Pat. No. 5,245,736 by the applicant as well as in the present application. As is evident, the switch-over
device 17, described in conjunction with FIG. 2, is preferably realized by means ofvalves 17 b′ or 17 a′ inserted into the connection line. In the embodiment depicted, theturbo vacuum pump 13 pumps out the interior volume of the transport chamber as well as also the process chamber. A ratio of the volumes ofinterlock chamber 1 a to the volume pumped out by theturbo vacuum pump 13 of 1:110 was realized. - In FIG. 3, 31 denotes a flooding valve for the
interlock chamber 1 a, 33 the flooding valve, already depicted in FIGS. 1 and 2, for theturbo vacuum pump 13.
Claims (15)
1. A method for manufacturing workpieces treated in vacuum comprising:
providing a first vacuum chamber connected with a first vacuum pump;
providing a second vacuum chamber;
providing a second vacuum pump dischargeable into atmosphere for producing a vacuum in both the first and second vacuum chambers;
providing a first valve for connecting said second vacuum pump with the first vacuum chamber via the first vacuum pump;
providing a second valve for connecting the second vacuum pump with the second vacuum chamber;
closing the first valve and opening the second valve for evacuating the second vacuum chamber; and
processing a workpiece in the first vacuum chamber.
2. The method of claim 1 , further comprising the step of closing the second valve after evacuation of the second vacuum chamber and opening the first valve for evacuation of the said first vacuum chamber.
3. The method of claim 1 , wherein said first pump is a turbo-vacuum pump.
4. The method of claim 1 , wherein said second pump is a single or multistage rotary valve or membrane pump.
5. The method of claim 1 , wherein said vacuum treated workpiece is a disc-shaped workpiece.
6. The method of claim 1 , wherein said vacuum treated workpiece is an optical storage disc, said treatment comprising coating.
7. The method of claim 1 , further comprising the step of introducing at least one of said workpiece in one of said first and second vacuum chambers and removing said workpiece from one of said first and second vacuum chambers after said treating, the time-span between said introducing and said removing being no more than 2 seconds.
8. A method for manufacturing a workpiece treated in vacuum comprising:
providing a first vacuum chamber connected with a first vacuum pump;
providing a second vacuum chamber;
transporting a workpiece to the first chamber;
providing a second vacuum pump dischargeable into atmosphere for producing a vacuum in both the first and second vacuum chambers;
providing a first valve for connecting said second vacuum pump with the first vacuum chamber via the first vacuum pump;
providing a second valve for connecting the second vacuum pump with the second vacuum chamber;
closing the first valve and opening the second valve for evacuating the second vacuum chamber; and
treating the workpiece in the first vacuum chamber.
9. The method of claim 8 , wherein the workpiece is a disc-shaped workpiece, the method including providing the second chamber to be an interlock chamber and providing a lock valve between the first and second chambers for connecting the chambers to each other and for passage of the workpiece between the chambers, the workpiece being transported from the second chamber to the first chamber before the treating step.
10. The method of claim 9 , including closing the second valve and opening the first value for evacuating the first chamber, a total time for transporting and treating the workpiece being at least 50% of a total cycle time for evacuating the first and second chambers plus the time for transporting and treating the workpiece.
11. The method of claim 8 , including closing the second valve and opening the first value for evacuating the first chamber, a total time for transporting and treating the workpiece being at least 50% of a total cycle time for evacuating the first and second chambers plus the time for transporting and treating the workpiece.
12. A method for manufacturing a workpiece treated in vacuum comprising:
providing a first vacuum chamber connected with a first vacuum pump;
providing a second vacuum chamber;
providing a second vacuum pump dischargeable into atmosphere for producing a vacuum in both the first and second vacuum chambers;
providing a switch-over unit having a first position for connecting said second vacuum pump with the first vacuum chamber via the first vacuum pump, and a second position for connecting the second vacuum pump with the second vacuum chamber;
moving the switch-over unit to the first position for evacuating the first vacuum chamber;
moving the switch-over unit to the second position for evacuating the second vacuum chamber; and
processing a workpiece in the first vacuum chamber.
13. The method of claim 12 , wherein the workpiece is a disc-shaped workpiece, the method including providing the second chamber to be an interlock chamber and providing a lock valve between the first and second chambers for connecting the chambers to each other and for passage of the workpiece between the chambers, the method including transported the workpiece from the second chamber to the first chamber before the treating step.
14. The method of claim 13 , wherein a total time for transporting and treating the workpiece is at least 50% of a total cycle time for evacuating the first and second chambers plus a time for transporting and treating the workpiece.
15. The method of claim 12 , wherein a total time for transporting and treating the workpiece is at least 50% of a total cycle time for evacuating the first and second chambers plus a time for transporting and treating the workpiece.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US10/712,509 US20040096583A1 (en) | 1999-04-16 | 2003-11-13 | Method for vacuum treatment of workpieces and vacuum treatment installation |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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CH701/99 | 1999-04-16 | ||
CH70199 | 1999-04-16 | ||
US09/958,404 US6669987B1 (en) | 1999-04-16 | 2000-03-29 | Method for vacuum treatment of workpieces and vacuum treatment facility |
US10/712,509 US20040096583A1 (en) | 1999-04-16 | 2003-11-13 | Method for vacuum treatment of workpieces and vacuum treatment installation |
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US09/958,404 Division US6669987B1 (en) | 1999-04-16 | 2000-03-29 | Method for vacuum treatment of workpieces and vacuum treatment facility |
PCT/CH2000/000181 Division WO2000063460A1 (en) | 1999-04-16 | 2000-03-29 | Method for vacuum treatment of workpieces and vacuum treatment facility |
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US20040096583A1 true US20040096583A1 (en) | 2004-05-20 |
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US09/958,404 Expired - Fee Related US6669987B1 (en) | 1999-04-16 | 2000-03-29 | Method for vacuum treatment of workpieces and vacuum treatment facility |
US10/712,509 Abandoned US20040096583A1 (en) | 1999-04-16 | 2003-11-13 | Method for vacuum treatment of workpieces and vacuum treatment installation |
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US09/958,404 Expired - Fee Related US6669987B1 (en) | 1999-04-16 | 2000-03-29 | Method for vacuum treatment of workpieces and vacuum treatment facility |
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US (2) | US6669987B1 (en) |
EP (1) | EP1183405B1 (en) |
JP (1) | JP2002542396A (en) |
AT (1) | ATE247723T1 (en) |
DE (1) | DE50003375D1 (en) |
HK (1) | HK1048342A1 (en) |
TW (1) | TW513321B (en) |
WO (1) | WO2000063460A1 (en) |
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DE50003375D1 (en) * | 1999-04-16 | 2003-09-25 | Unaxis Balzers Ag | METHOD FOR VACUUM TREATMENT OF WORKPIECES AND VACUUM TREATMENT SYSTEM |
JP2002090978A (en) * | 2000-09-12 | 2002-03-27 | Hoya Corp | Method of manufacturing phase shift mask blank and apparatus for manufacturing phase shift mask blank |
GB0229353D0 (en) * | 2002-12-17 | 2003-01-22 | Boc Group Plc | Vacuum pumping system and method of operating a vacuum pumping arrangement |
KR101046520B1 (en) | 2007-09-07 | 2011-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | Source gas flow path control in pecvd system to control a by-product film deposition on inside chamber |
US8445874B2 (en) * | 2010-04-11 | 2013-05-21 | Gatan Inc. | Ion beam sample preparation apparatus and methods |
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US6669987B1 (en) * | 1999-04-16 | 2003-12-30 | Unaxis Balzers Aktiengesellschaft | Method for vacuum treatment of workpieces and vacuum treatment facility |
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US3649339A (en) * | 1969-09-05 | 1972-03-14 | Eugene C Smith | Apparatus and method for securing a high vacuum for particle coating process |
JPS58123872A (en) * | 1982-01-19 | 1983-07-23 | Matsushita Electric Ind Co Ltd | Sputtering apparatus |
DE4232959C2 (en) * | 1992-10-01 | 2001-05-10 | Leybold Ag | Device for introducing and discharging disc-shaped substrates |
US5922179A (en) * | 1996-12-20 | 1999-07-13 | Gatan, Inc. | Apparatus for etching and coating sample specimens for microscopic analysis |
KR100252213B1 (en) * | 1997-04-22 | 2000-05-01 | 윤종용 | Apparatus for manufacturing semiconductor device and method of manufacturing semiconductor device using the same |
-
2000
- 2000-03-29 DE DE50003375T patent/DE50003375D1/en not_active Expired - Fee Related
- 2000-03-29 JP JP2000612534A patent/JP2002542396A/en not_active Withdrawn
- 2000-03-29 AT AT00910483T patent/ATE247723T1/en not_active IP Right Cessation
- 2000-03-29 WO PCT/CH2000/000181 patent/WO2000063460A1/en active IP Right Grant
- 2000-03-29 EP EP00910483A patent/EP1183405B1/en not_active Expired - Lifetime
- 2000-03-29 US US09/958,404 patent/US6669987B1/en not_active Expired - Fee Related
- 2000-04-11 TW TW089106693A patent/TW513321B/en not_active IP Right Cessation
-
2002
- 2002-09-05 HK HK02106553A patent/HK1048342A1/en not_active IP Right Cessation
-
2003
- 2003-11-13 US US10/712,509 patent/US20040096583A1/en not_active Abandoned
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US5641960A (en) * | 1994-01-13 | 1997-06-24 | Fujitsu Limited | Circuit pattern inspecting device and method and circuit pattern arrangement suitable for the method |
US6083566A (en) * | 1998-05-26 | 2000-07-04 | Whitesell; Andrew B. | Substrate handling and processing system and method |
US6669987B1 (en) * | 1999-04-16 | 2003-12-30 | Unaxis Balzers Aktiengesellschaft | Method for vacuum treatment of workpieces and vacuum treatment facility |
US6446651B1 (en) * | 1999-06-28 | 2002-09-10 | Pfeiffer Vacuum Gmbh | Multi-chamber vacuum system and a method of operating the same |
Cited By (1)
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US9875895B2 (en) * | 2011-11-17 | 2018-01-23 | Eugene Technology Co., Ltd. | Substrate processing apparatus including exhaust ports and substrate processing method |
Also Published As
Publication number | Publication date |
---|---|
WO2000063460A1 (en) | 2000-10-26 |
JP2002542396A (en) | 2002-12-10 |
EP1183405B1 (en) | 2003-08-20 |
ATE247723T1 (en) | 2003-09-15 |
US6669987B1 (en) | 2003-12-30 |
DE50003375D1 (en) | 2003-09-25 |
TW513321B (en) | 2002-12-11 |
HK1048342A1 (en) | 2003-03-28 |
EP1183405A1 (en) | 2002-03-06 |
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