JP3258088B2 - Vacuum processing equipment - Google Patents

Vacuum processing equipment

Info

Publication number
JP3258088B2
JP3258088B2 JP28172892A JP28172892A JP3258088B2 JP 3258088 B2 JP3258088 B2 JP 3258088B2 JP 28172892 A JP28172892 A JP 28172892A JP 28172892 A JP28172892 A JP 28172892A JP 3258088 B2 JP3258088 B2 JP 3258088B2
Authority
JP
Japan
Prior art keywords
chamber
processing
opening
processing chamber
buffer chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP28172892A
Other languages
Japanese (ja)
Other versions
JPH06132378A (en
Inventor
田 聖 袴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP28172892A priority Critical patent/JP3258088B2/en
Publication of JPH06132378A publication Critical patent/JPH06132378A/en
Application granted granted Critical
Publication of JP3258088B2 publication Critical patent/JP3258088B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、スパッタリング装置、
ドライエッチング装置、真空蒸着装置等の、真空中で被
処理物に物理的または化学的処理を行う真空処理装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sputtering apparatus,
The present invention relates to a vacuum processing apparatus such as a dry etching apparatus and a vacuum evaporation apparatus that performs physical or chemical processing on an object to be processed in a vacuum.

【0002】[0002]

【従来の技術】この種の真空処理装置では、真空室また
は特定のガスを含む室等の処理室内へ被処理物を入れて
物理的または化学的な処理を施す。一種類のみの処理を
行うこともあるが、複数種類の異なる処理を行う場合が
近年増えている。このように異なる複数の処理を行う場
合には、異なる処理室内へ同じ被処理物を順次通すよう
にする。複数の異なる処理室へ被処理物を通す真空処理
装置としては、インライン方式および回転方式がある。
インライン方式では一列に並べた処理室内に順次被処理
物を通過させる(例えば、特開昭55−141570号
公報参照)。また、回転方式では、環状に配列した処理
室内に被処理物をテーブル等の回転により送りつつ順次
通過させるようになっている(例えば、特公昭62−5
7377号公報参照)。
2. Description of the Related Art In a vacuum processing apparatus of this type, an object to be processed is placed in a processing chamber such as a vacuum chamber or a chamber containing a specific gas and subjected to physical or chemical processing. Although only one type of processing may be performed, the number of different types of processing performed in recent years has increased. When a plurality of different processes are performed as described above, the same object is sequentially passed into different processing chambers. Vacuum processing apparatuses for passing an object to be processed into a plurality of different processing chambers include an in-line type and a rotary type.
In the in-line method, the objects to be processed are sequentially passed through the processing chambers arranged in a line (for example, see Japanese Patent Application Laid-Open No. 55-141570). In the rotating method, the objects to be processed are sequentially passed through the processing chambers arranged in a ring while being rotated by rotating a table or the like (for example, Japanese Patent Publication No. Sho 62-5).
No. 7377).

【0003】[0003]

【発明が解決しようとする課題】上述のインライン方式
では、隣接する処理室の間にそれらを分離するゲートバ
ルブが必要であり、そのため、インライン方式の真空処
理装置は全体的に大きく、価格が高い。また、一つの処
理室から次の処理室へ被処理物を搬送するのに時間を要
し、サイクルタイムが長くなる。
In the above-mentioned in-line system, a gate valve is required between adjacent processing chambers to separate them from each other. Therefore, an in-line vacuum processing apparatus is generally large and expensive. . In addition, it takes time to transport an object to be processed from one processing chamber to the next processing chamber, and the cycle time becomes longer.

【0004】また、前述の回転方式では、装置が小さく
て済むが、異なる処理室がつながる状態があるため、他
の処理室との間でガスの移動が起り、汚染が発生し易
い。
[0004] In the above-mentioned rotary system, the apparatus can be small, but since different processing chambers are connected to each other, gas is transferred between the processing chambers and the other processing chambers are liable to cause contamination.

【0005】本発明は、従来技術の上述の問題に鑑みな
されたもので、その目的は、装置が小さくて済み、バッ
ファー室を用いるため異なる処理室間の汚染が生じるこ
とがなく、また、バッファー室内の被処理物を処理室内
での他の被処理物の処理中に搬送することができるた
め、サイクルタイムの短縮を計ることができる真空処理
装置を得ることにある。
The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object to reduce the size of the apparatus and use a buffer chamber so that contamination between different processing chambers does not occur. An object of the present invention is to provide a vacuum processing apparatus that can transfer an object to be processed in a room while another object to be processed is being processed in a processing chamber, so that the cycle time can be reduced.

【0006】[0006]

【課題を解決するための手段】本発明によれば、上記目
的達成のために、真空処理装置は、被処理物を取入れて
外気と遮断するロードロック室と、ロードロック室に連
通遮断可能に接続された最上流バッファー室と、最上流
バッファー室に連通遮断可能に接続され、ロードロック
室から最上流バッファー室を経て被処理物を受入れて真
空処理する最上流処理室と、この最上流処理室に続いて
設けられ互いに遮断された一連の処理室と、隣接する処
理室同士を連通遮断可能に接続し、上流側の処理室内か
ら被処理物を受入れて一時的に収容した後、続く中間処
理室へ送り出すための中間バッファー室と、最下流の処
理室に連通遮断可能に接続され、最下流処理室から真空
処理され終った製品を受入れる最下流バッファー室と、
最下流バッファー室および外気と連通遮断可能なアンロ
ード室と、前記最上流、最下流および中間処理室の内部
に設けた、被処理物の搬送用腕と、前記最上流、最下流
および中間処理室内で被処理物が真空処理されている間
に前記最上流、最下流および中間バッファー室内の被処
理物を、各バッファー室の搬入側に近い位置から、その
搬出側に近い位置へ移動させる搬送用腕とを備え、互い
に連通遮断可能に接続されている処理室とバッファー室
を仕切る隔壁には、連通用開口が設けられ、各処理室内
の搬送用腕とバッファー室内の搬送用腕は、いずれも先
端部に円孔を有するとともに、これら搬送用腕は、それ
らの円孔が前記連通用開口に対向する位置へ移動可能と
され、各バッファー室内の搬送用腕先端部円孔周縁部の
処理室に対向する側には、第1のシール部材が、前記隔
壁の連通用開口の周縁部に当接する位置へ変位して当該
開口を塞ぎうるように支持され、前記第1のシール部材
には、前記搬送用腕先端部円孔と位置が合うように段付
孔が形成されるとともに、この段付き孔に被処理物のキ
ャッチが設けられ、各バッファー室内には、前記第1の
シール部材の段付孔に押圧係合して段付孔を塞ぎ、か
つ、第1のシール部材を、前記隔壁の連通用開口の周縁
部に当接する位置へ変位させて、前記第1のシール部材
により連通用開口を塞ぐように押圧すべく進退可能の第
1の押圧部材が設けられるとともに、この第1の押圧部
材に、連通用開口を経て進退自在の被処理物用チャック
が付設され、各処理室内の搬送用腕先端部円孔周縁部の
バッファー室に対向する側には、第2のシール部材が、
前記隔壁の連通用開口の周縁部に当接する位置へ変位し
て当該開口を塞ぎうるように支持され、前記第2のシー
ル部材には、処理室内の搬送用腕先端部円孔と位置が合
うように段付孔が形成されるとともに、この段付孔に被
処理物のキャッチが設けられ、各処理室内には、前記第
2のシール部材の段付孔に押圧係合して段付孔を塞ぎ、
かつ、第2のシール部材を、前記隔壁の連通用開口の周
縁部に当接する位置へ変位させて、前記第2のシール部
材により連通用開口を塞ぐように押圧すべく進退可能の
押圧部材が設けられ、各処理室と各バッファー室を遮断
すべき際には、前記第1および第2の押圧部材による押
圧により前記第1および第2のシール部材を前記隔壁の
連通用開口の周縁部に当接させて当該開口を塞ぐように
し、各処理室の搬送用腕先端部と各バッファー室の搬送
用腕先端部間で被処理物を搬送する際には、前記被処理
物用チャックを、第1および第2のシール部材のキャッ
チ間で前記連通用開口を経て移動させる、ように構成さ
れる。
According to the present invention, in order to achieve the above objects, a vacuum processing apparatus is provided with a load lock chamber for taking in an object to be cut off from outside air, and a communication between the load lock chamber and the load lock chamber. A most upstream buffer chamber connected thereto; a most upstream processing chamber connected to the uppermost buffer chamber so as to be able to communicate with the uppermost buffer chamber so as to receive an object to be processed from the load lock chamber via the most upstream buffer chamber and perform vacuum processing; A series of processing chambers provided following the chamber and connected to each other, and the adjacent processing chambers are connected so as to be able to communicate with each other so as to receive and temporarily store the object to be processed from the upstream processing chamber, and then to the next intermediate chamber. An intermediate buffer chamber for sending out to the processing chamber, and a lowermost buffer chamber connected to the lowermost processing chamber so as to be able to communicate with the lowermost processing chamber and receiving the vacuum-processed product from the lowermost processing chamber,
An unload chamber capable of shutting off communication with the most downstream buffer chamber and the outside air, the uppermost stream, the most downstream and the intermediate processing chamber, and a transfer arm for the object to be processed, and the most upstream, most downstream and intermediate processing Conveyance for moving the objects to be processed in the uppermost stream, the lowermost stream, and the intermediate buffer chamber from a position near the loading side of each buffer chamber to a position near the unloading side while the processing object is vacuum-processed in the room. A communication opening is provided in a partition partitioning the processing chamber and the buffer chamber which are connected to each other so as to be able to communicate with each other, and a transfer arm in each processing chamber and a transfer arm in the buffer chamber are provided. Each of the transfer arms has a circular hole at the distal end, and the transfer arms can be moved to a position where the circular holes face the communication opening. Facing the room A first seal member is supported so as to be displaced to a position in contact with a peripheral edge portion of the communication opening of the partition so as to close the opening, and the first seal member includes the transfer arm. A stepped hole is formed so as to be aligned with the distal end circular hole, and a catch for the object to be processed is provided in the stepped hole. In each buffer chamber, a stepped hole of the first seal member is provided. The stepped hole is closed by pressing and the first seal member is displaced to a position in contact with the peripheral edge of the communication opening of the partition wall, and the communication opening is closed by the first seal member. A first pressing member that can move forward and backward so as to be pressed as described above is provided, and a chuck for the processing object that can move forward and backward through the communication opening is attached to the first pressing member, and a transfer arm in each processing chamber is provided. On the side facing the buffer chamber on the periphery of the tip hole, a second Seal member,
The partition wall is displaced to a position where it contacts the peripheral edge of the communication opening, and is supported so as to close the opening. The second seal member is aligned with the transfer arm tip circular hole in the processing chamber. As described above, a stepped hole is formed, and a catch of an object to be processed is provided in the stepped hole. Plugs,
Further, a pressing member which can be moved forward and backward so as to displace the second seal member to a position where the second seal member comes into contact with a peripheral portion of the communication opening of the partition wall and press the second seal member so as to close the communication opening. When the respective processing chambers and the respective buffer chambers are to be shut off, the first and second seal members are attached to the peripheral edge of the communication opening of the partition by pressing by the first and second pressing members. When the workpiece is transported between the transport arm tip of each processing chamber and the transport arm tip of each buffer chamber, the chuck for the workpiece is contacted to close the opening. It is configured to move through the communication opening between the catches of the first and second seal members.

【0007】[0007]

【作用】ロードロック室内へ送り込まれた被処理物はロ
ードロック室から最上流バッファー室を経て最上流処理
室内へ送られ、そこで真空処理を受ける。最初の真空処
理を受けた被処理物は次に中間バッファー室内へ送られ
る。バッファー室内の被処理物は、処理室内での後続の
被処理物の真空処理の間処理室から隔離される。そし
て、この間、バッファー室内の被処理物はその搬入側に
近い位置からその搬出側に近い位置へ、バッファー室内
の搬送手段により搬送される。処理室内での被処理物の
真空処理が終ると、バッファー室内で搬送された被処理
物は、バッファー室と次の処理室が連通状態にされた
後、次の処理室内へ送られ、そこで次の真空処理を受け
る。このようにして、被処理物は後続のバッファー室お
よび処理室を順次通過し、最後に最下流バッファー室を
経てアンロード室へ送られ、そこから製品として取り出
される。
The object to be processed sent into the load lock chamber is sent from the load lock chamber through the most upstream buffer chamber to the most upstream processing chamber, where it undergoes vacuum processing. The workpiece that has undergone the first vacuum treatment is then sent into the intermediate buffer chamber. The workpiece in the buffer chamber is isolated from the processing chamber during subsequent vacuum processing of the workpiece in the processing chamber. During this time, the object to be processed in the buffer chamber is transported from a position near the carry-in side to a position near the carry-out side by the transport means in the buffer chamber. After the vacuum processing of the processing object in the processing chamber is completed, the processing object transported in the buffer chamber is sent to the next processing chamber after the buffer chamber and the next processing chamber are brought into communication with each other, and then sent to the next processing chamber. Under vacuum treatment. In this way, the object to be processed sequentially passes through the subsequent buffer chamber and processing chamber, and finally is sent to the unloading chamber via the most downstream buffer chamber, where it is taken out as a product.

【0008】[0008]

【実施例】以下、図面を参照して本発明の実施例を説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

【0009】図1は本発明の真空処理装置の一実施例の
正面図であり、同図において、被処理物Wは矢印Aで示
すように真空処理装置内へ送り込まれ、複数回の処理を
受けた後、矢印A′で示すように処理ずみ製品W′とし
て真空処理装置外へ取り出される。真空処理は、例えば
コンパクトディスク面への複数層の膜の成形である。な
お、真空処理装置は複数の処理室を有し、その内部は、
単なる真空にされることもあれば、アルゴン、窒素等の
不活性ガスを満たされることもある。
FIG. 1 is a front view of one embodiment of a vacuum processing apparatus according to the present invention. In FIG. 1, an object to be processed W is fed into a vacuum processing apparatus as indicated by an arrow A, and a plurality of processes are performed. After being received, it is taken out of the vacuum processing apparatus as a processed product W 'as shown by an arrow A'. The vacuum processing is, for example, the formation of a multilayer film on the surface of a compact disc. Incidentally, the vacuum processing apparatus has a plurality of processing chambers, the inside of which,
It may be a simple vacuum, or it may be filled with an inert gas such as argon or nitrogen.

【0010】図1において、被処理物Wが送り込まれる
部分はロードロック室Lとして形成され、処理ずみ製品
の取出し部はアンロード室Uとして形成されている。ロ
ードロック室Lとアンロード室Uとの間には一連の処理
室P(図示の例では5つの処理室)が設列されている。
送り込まれた被処理物Wはこれらの処理室P内で順次真
空処理を受ける。真空処理は例えばスパッタリング処理
である。これらの処理室Pの間には、被処理物を処理室
から処理室へ移動させる間に一時的に収容しておく中間
バッファー室Bが設けられている。この実施例の場合に
は処理室間に4つのバッファー室がある。また、最上流
端と最下流端に2つの最上流、最下流バファー室B1,
B2がある。これらのバッファー室B1、B2は、それ
ぞれ、ロードロック室Lの下流側およびアンロード室の
上流側に連通遮断可能に接続されている。
In FIG. 1, the portion into which the workpiece W is fed is formed as a load lock chamber L, and the unloading section U for the processed product is formed as an unload chamber U. A series of processing chambers P (five processing chambers in the illustrated example) are arranged between the load lock chamber L and the unload chamber U.
The workpiece W sent in is subjected to vacuum processing in these processing chambers P sequentially. The vacuum processing is, for example, a sputtering processing. Between these processing chambers P, there is provided an intermediate buffer chamber B for temporarily storing an object to be processed while moving the processing object from the processing chamber to the processing chamber. In this embodiment, there are four buffer chambers between the processing chambers. In addition, the two most upstream and the most downstream buffer chambers B1, B1 at the most upstream end and the most downstream end, respectively.
There is B2. These buffer chambers B1 and B2 are connected to the downstream side of the load lock chamber L and the upstream side of the unload chamber, respectively, so that communication can be interrupted.

【0011】なお、図1中、Tはターボ分子ポンプで、
バッファー室B、B1、B2の排気のためのものであ
り、tは処理室Pのためのポンプである。また、Cはク
ライオポンプである。ロードロック室Lおよびアンロー
ド室Uは油回転ポンプまたはドライポンプで排気され、
独立した排気系となっている。図2は図1の真空処理装
置の平面図であり、後述の回転用モータ、プッシャー等
の配置を示している。
In FIG. 1, T is a turbo molecular pump,
T is a pump for exhausting the buffer chambers B, B1, and B2, and t is a pump for the processing chamber P. C is a cryopump. The load lock chamber L and the unload chamber U are exhausted by an oil rotary pump or a dry pump,
It has an independent exhaust system. FIG. 2 is a plan view of the vacuum processing apparatus of FIG. 1, showing the arrangement of a rotation motor, a pusher, and the like, which will be described later.

【0012】図3は図2の一部に対応する原理的部分水
平縦断面である。ロードロック室Lを構成する部分を有
する最上流バッファー室B1の背部には回転用モータM
が設けられており、このモータMの回転軸2は、バッフ
ァー室B1の内部へ水平に延び、その先端には搬送用の
回転腕3が回転軸2を中心として回転自在に支持されて
いる。回転腕3の先端部は拡大され、その拡大先端部に
は、図4に示すように円孔4が形成されている。
FIG. 3 is a partial horizontal vertical sectional view corresponding to a part of FIG. A rotation motor M is provided at the back of the most upstream buffer chamber B1 having a portion constituting the load lock chamber L.
The rotating shaft 2 of the motor M extends horizontally into the buffer chamber B1, and a transporting rotating arm 3 is rotatably supported on the leading end of the rotating arm 2 around the rotating shaft 2. The tip of the rotary arm 3 is enlarged, and a circular hole 4 is formed in the enlarged tip as shown in FIG.

【0013】この円孔4に後方から挿通可能に押圧部材
5が設けられ、この押圧部材5を前後動させるためのプ
ッシャーPSが図3に示すように最上流バッファー室B
1の後部に固定されている。押圧部材5は図4に示すよ
うに例えば円板により構成されている。
A pressing member 5 is provided in the circular hole 4 so as to be inserted from behind, and a pusher PS for moving the pressing member 5 back and forth is provided as shown in FIG.
1 at the rear. The pressing member 5 is formed of, for example, a disk as shown in FIG.

【0014】回転腕3の円孔4の前方を覆うように、段
付孔6を有するシール部材7が設けられている。シール
部材7から後方へ突設した頭付きピン8は回転腕3を後
方へ貫通しており、回転腕3の後面と頭付きピン8の頭
との間に介装したばね9の力により、シール部材7は通
常回転腕3の前面に押し付けられている。シール部材7
の段付孔6は、前記押圧部材5に係合するような寸法を
与えられている。一方、シール部材7の段付孔6の内壁
には被処理物Wのチャッキング用スプリングキャッチ1
2が設けられている。押圧部材5を同心的に貫いて前後
動する軸5aの先端には適宜形式のチャック15が設け
られている。
A seal member 7 having a stepped hole 6 is provided so as to cover the front of the circular hole 4 of the rotating arm 3. A headed pin 8 protruding rearward from the seal member 7 penetrates the rotating arm 3 rearward, and due to the force of a spring 9 interposed between the rear surface of the rotating arm 3 and the head of the headed pin 8, The seal member 7 is normally pressed against the front surface of the rotating arm 3. Seal member 7
The stepped hole 6 is dimensioned so as to engage with the pressing member 5. On the other hand, an inner wall of the stepped hole 6 of the seal member 7 has a spring catch 1 for chucking the workpiece W.
2 are provided. An appropriate type of chuck 15 is provided at the tip of a shaft 5a that moves back and forth concentrically through the pressing member 5.

【0015】最上流バッファー室B1の前壁Baには前
記シール部材7の外径より小さい開口11が設けられて
いる。そして開口11の前方に対向して、前後に可動の
蓋体13がプッシャー14(図3)により前後に駆動さ
れるようにして設けられている。蓋体13は図4に示す
ように被処理物Wを受けるようになっている。
An opening 11 smaller than the outer diameter of the seal member 7 is provided in the front wall Ba of the most upstream buffer chamber B1. A lid 13 movable forward and backward is provided so as to be opposed to the front of the opening 11 so as to be driven forward and backward by a pusher 14 (FIG. 3). The lid 13 receives the workpiece W as shown in FIG.

【0016】蓋体13がバッファー室前壁Baへ向かっ
て変位してそれに接触した状態は図5に示されている。
また、プッシャーPSにより押圧部材5が前進した状態
では、図5に示すように、押圧部材5がシール部材7の
段付孔6に密に係合しつつシール部材7をシール材10
を介して最上流バッファー室前壁Baの内面に押圧し開
口11を閉じる。図5の状態では、密閉されたロードロ
ック室Lが形成される。
FIG. 5 shows a state in which the lid 13 is displaced toward the buffer chamber front wall Ba and is in contact therewith.
In a state where the pressing member 5 is advanced by the pusher PS, as shown in FIG. 5, the pressing member 5 is tightly engaged with the stepped hole 6 of the sealing member 7 and the sealing member 7 is
To press the inner surface of the front wall Ba of the uppermost stream buffer chamber to close the opening 11. In the state of FIG. 5, a closed load lock chamber L is formed.

【0017】回転用モータMの回転により、回転腕3は
180°回転するようになっている。回転腕3の先端部
の円孔4が180°変位した位置には、図3および図6
に示すように、前記押圧部材5と同様な押圧部材16が
プッシャーPSにより前後動するように設けられてい
る。また、180°回転したこの位置には、最上流バッ
ファー室B1の前壁Baに開口17(図6)が設けられ
ている。
The rotation of the rotary motor M causes the rotary arm 3 to rotate 180 °. FIGS. 3 and 6 show positions where the circular hole 4 at the tip of the rotary arm 3 is displaced by 180 °.
As shown in the figure, a pressing member 16 similar to the pressing member 5 is provided so as to move back and forth by a pusher PS. At this position rotated by 180 °, an opening 17 (FIG. 6) is provided in the front wall Ba of the most upstream buffer chamber B1.

【0018】図3に示すように、バッファー室B1の開
口17を介して真空処理室Pが続いている。真空処理室
Pは、その前部の回転用モータM1の後向き回転軸20
に固定された回転腕21を収容している。回転腕21は
図1に示すように回転軸20を中心として120°間隔
で3本設けることができる。なお、回転腕21の角度間
隔は任意に定めることができる。
As shown in FIG. 3, the vacuum processing chamber P continues through the opening 17 of the buffer chamber B1. The vacuum processing chamber P is provided with a rearward rotating shaft 20 for the front rotation motor M1.
Is accommodated. As shown in FIG. 1, three rotating arms 21 can be provided at intervals of 120 ° about the rotating shaft 20. Note that the angular interval of the rotating arm 21 can be arbitrarily determined.

【0019】各回転腕21の先端部は図6および図7に
示すように拡大され、それに円孔23が設けられてい
る。この円孔23は、最上流バッファー室B1の前記開
口17の前方にある角度位置で開口17と同軸をなす。
この円孔23の後方において、回転腕21にはシール部
材24が設けられている。シール部材24は中央に段付
孔25を有するとともに、シール部材24から前方へ突
設した頭付きピン27の頭と回転腕21の前面との間に
はばね26が介装されている。そして、このばね26の
力でシール部材24は回転腕21の後面に押し付けられ
ている。
The tip of each rotary arm 21 is enlarged as shown in FIGS. 6 and 7, and has a circular hole 23 formed therein. The circular hole 23 is coaxial with the opening 17 at an angular position in front of the opening 17 of the most upstream buffer chamber B1.
Behind the circular hole 23, a seal member 24 is provided on the rotating arm 21. The seal member 24 has a stepped hole 25 in the center, and a spring 26 is interposed between the head of a headed pin 27 protruding forward from the seal member 24 and the front surface of the rotating arm 21. The seal member 24 is pressed against the rear surface of the rotating arm 21 by the force of the spring 26.

【0020】最上流バッファー室B1の前記開口17の
前方において、最上流処理室Pの前壁にプッシャー28
が固定され、このプッシャー28の後方へ突出する軸2
9には押圧部材30が固定されている。押圧部材30は
図6に示すように円板により構成されている。押圧部材
30の形状は、前記シール部材24の段付孔25に係合
しうる形状となっている。
In front of the opening 17 of the most upstream buffer chamber B1, a pusher 28 is attached to the front wall of the most upstream processing chamber P.
Is fixed, and the shaft 2 protruding rearward of the pusher 28
A pressing member 30 is fixed to 9. The pressing member 30 is formed of a disk as shown in FIG. The shape of the pressing member 30 is such that it can engage with the stepped hole 25 of the seal member 24.

【0021】プッシャー28の作用で押圧部材30を後
退させると、押圧部材30は図7に示すように、回転腕
21の円孔23を後方へ通り抜けてシール部材24に係
合し、シール部材24を開口17のまわりに押し付けて
開口17を密閉する。
When the pressing member 30 is moved backward by the action of the pusher 28, as shown in FIG. 7, the pressing member 30 passes through the circular hole 23 of the rotating arm 21 rearward and engages with the sealing member 24, thereby engaging the sealing member 24. Is pressed around the opening 17 to seal the opening 17.

【0022】回転腕21が120°回転した角度位置に
おいて、シール部材24の後方に処理室Pのための処理
空間P′が図1および図3に示すように設けられてい
る。処理空間P′は、真空処理がスパッタリングの場合
にはスパッタリング源33(図3)を有する空間であ
る。処理空間P′と処理室Pとの間には開口34が設け
られている。そして、この開口34の位置に、前記プッ
シャー28および押圧部材30と同様なプッシャー35
および押圧部材36が図3に示すように設けられてい
る。
At the angular position where the rotary arm 21 is rotated by 120 °, a processing space P 'for the processing chamber P is provided behind the seal member 24 as shown in FIGS. The processing space P 'is a space having a sputtering source 33 (FIG. 3) when the vacuum processing is sputtering. An opening 34 is provided between the processing space P ′ and the processing chamber P. A pusher 35 similar to the pusher 28 and the pressing member 30 is provided at the position of the opening 34.
The pressing member 36 is provided as shown in FIG.

【0023】一方、回転腕21がさらに120°回転し
た角度位置にも、同様なプッシャー37および押圧部材
38が図3に示すように設けられており、前述のプッシ
ャー28および押圧部材30の場合について図7を参照
して説明したと同様に、開口39(図3)の開閉を行
う。なお、開口39は、最上流処理室Pとそれに続く第
1の中間バッファー室Bとを連通させるための開口であ
る。
On the other hand, similar pushers 37 and pressing members 38 are provided at angular positions where the rotating arm 21 is further rotated by 120 ° as shown in FIG. The opening and closing of the opening 39 (FIG. 3) is performed in the same manner as described with reference to FIG. The opening 39 is an opening for communicating the uppermost stream processing chamber P and the subsequent first intermediate buffer chamber B.

【0024】中間バッファー室Bには、前述の最上流バ
ッファー室B1に設けた搬送用回転腕3、回転用モータ
M、プッシャーPS、押圧部材5,16、シール部材7
と同じ部材が設けられている。図3には、中間バッファ
ー室Bの同じ部材は同じ符号により示している。中間バ
ッファー室Bの入り口開口は前述の開口39であり、そ
の出口開口は符号40により示す。
In the intermediate buffer chamber B, the transport rotary arm 3, the rotary motor M, the pusher PS, the pressing members 5, 16 and the sealing member 7 provided in the above-mentioned most upstream buffer chamber B1 are provided.
The same members are provided. In FIG. 3, the same members of the intermediate buffer chamber B are denoted by the same reference numerals. The inlet opening of the intermediate buffer chamber B is the above-mentioned opening 39, and the outlet opening thereof is indicated by reference numeral 40.

【0025】中間バッファー室Bに続いて、第2番目の
真空処理室Pが図3に仮想線で示すように設けられる。
第2番目の処理室Pは第1番目の処理室Pとまったく均
等な構造をもつので、同じ符号を付して説明を省略す
る。
Subsequent to the intermediate buffer chamber B, a second vacuum processing chamber P is provided as shown by a phantom line in FIG.
Since the second processing chamber P has a structure completely identical to that of the first processing chamber P, the same reference numerals are given and the description is omitted.

【0026】なお、第2の中間バッファー室Bおよび第
3番目の処理室Pも同様にして設けることができる。何
個のバッファー室および処理室を設けるかは処理の種類
の数により定まる。
The second intermediate buffer chamber B and the third processing chamber P can be provided in the same manner. How many buffer chambers and processing chambers are provided depends on the number of types of processing.

【0027】最上流バッファー室B1は、最初、その開
口4、17がシール部材7によりそれぞれ密閉されてお
り、被処理物Wは図3において矢印Aで示すように蓋体
13の内側に図4のように送り込まれる。続いて、プッ
シャー14の作用で蓋体13が図5のように開口11を
閉じる。これにより、密閉されたロードロック室Lが形
成される。この時、被処理物Wは前進しているチャック
15によりチャッキングされる。次に、ロードロック室
Lが最上流バッファー室B1と同程度に減圧された後、
プッシャーPSの作用で押圧部材5およびチャック15
が後退させられ、ロードロック室Lと最上流バッファー
室B1は連通する。チャック15の後退により、それに
保持された被処理物Wも後退し、その時スプリングキャ
ッチ12により保持される。次に、搬送用回転腕3がモ
ータMにより180°回転し、スプリングキャッチ12
に保持されている被処理物Wを開口4の位置から開口1
7の位置へ搬送する。なお、スプリングキャッチ12に
よる被処理物Wの保持状態は図8に示す通りである。
First, the uppermost stream buffer chamber B1 has its openings 4 and 17 sealed with a seal member 7, respectively, and the workpiece W is placed inside the lid 13 as shown by an arrow A in FIG. It is sent like. Subsequently, the lid 13 closes the opening 11 as shown in FIG. Thus, a sealed load lock chamber L is formed. At this time, the workpiece W is chucked by the chuck 15 that is moving forward. Next, after the load lock chamber L is depressurized to the same degree as the uppermost stream buffer chamber B1,
By the action of the pusher PS, the pressing member 5 and the chuck 15
Is retracted, and the load lock chamber L and the most upstream buffer chamber B1 communicate with each other. When the chuck 15 is retracted, the workpiece W held thereon is also retracted, and at this time is held by the spring catch 12. Next, the transport rotating arm 3 is rotated 180 ° by the motor M, and the spring catch 12 is rotated.
The workpiece W held in the opening 1 is moved from the position of the opening 4 to the opening 1.
7 is conveyed. The holding state of the workpiece W by the spring catch 12 is as shown in FIG.

【0028】この間、開口17は図7に示すようにシー
ル部材24により閉じられている。そして、最上流バッ
ファー室B1の内部は、第1番目の処理室Pの内部の状
態に近づけられる。両室B1、Pの状態が等しくなる
と、押圧部材30はプッシャー28により前進させら
れ、開口17が図6に示すように開放される。次いで押
圧部材16がプッシャーPSにより前進させられ、スプ
リングキャッチ12に保持されていた被処理物Wは押圧
部材16に属するチャック15に押されて開口17を経
てシール部材24上の円孔のスプリングキャッチ31に
移される。
During this time, the opening 17 is closed by the seal member 24 as shown in FIG. Then, the inside of the most upstream buffer chamber B1 is brought close to the state inside the first processing chamber P. When the state of both chambers B1 and P becomes equal, the pressing member 30 is advanced by the pusher 28, and the opening 17 is opened as shown in FIG. Next, the pressing member 16 is advanced by the pusher PS, and the workpiece W held by the spring catch 12 is pressed by the chuck 15 belonging to the pressing member 16, passes through the opening 17, and receives the spring catch of the circular hole on the seal member 24. It is moved to 31.

【0029】次に、処理室P内へ搬送された被処理物W
は、モータM1による回転腕21の120°の回転によ
って、処理空間P′の直下に移動させられる。この時、
プッシャー35(図3)の作用で押圧部材36が上昇
し、回転腕21の円孔23を通ってシール部材24をば
ね26の力に抗して上昇させる。これにより、処理空間
P′に被処理物Wが露呈されるので、被処理物に例えば
スパッタリング処理が施される。
Next, the workpiece W transported into the processing chamber P
Is moved directly below the processing space P ′ by the rotation of the rotary arm 21 by 120 ° by the motor M1. At this time,
By the action of the pusher 35 (FIG. 3), the pressing member 36 is raised, passes through the circular hole 23 of the rotating arm 21, and raises the sealing member 24 against the force of the spring 26. As a result, the workpiece W is exposed in the processing space P ′, and the workpiece is subjected to, for example, a sputtering process.

【0030】処理完了後、押圧部材36を元へ戻し、シ
ール部材24を開口34から離し、回転腕21を120
°回転させて被処理物Wを、次の中間バッファー室Bに
連なる開口39に対向するように移動させる。この時開
口39はシール部材7が押圧部材5により押圧されて閉
じている。
After the processing is completed, the pressing member 36 is returned to the original position, the seal member 24 is separated from the opening 34, and the rotating arm 21 is
The object W to be processed is moved so as to face the opening 39 connected to the next intermediate buffer chamber B by rotation. At this time, the opening 39 is closed by the sealing member 7 being pressed by the pressing member 5.

【0031】処理室Pと中間バッファー室Bの内圧を等
しくした後、押圧部材5により開口39が開放される。
そして、プッシャー37により押圧部材38が後退する
ことにより、シール部材24上の被処理物Wを後退させ
開口39内に位置させる。次に、中間バッファー室B内
の回転腕3のチャックの作動により、回転腕3のスプリ
ングキャッチに被処理物Wが保持される。この時、シー
ル部材24により開口39は閉じ、中間バッファー室B
と処理室Pは隔離される。この隔離状態で、同時に、次
に続く被処理物Wが処理空間P′に露呈されて処理され
ている。
After equalizing the internal pressures of the processing chamber P and the intermediate buffer chamber B, the pressing member 5 opens the opening 39.
When the pressing member 38 is moved backward by the pusher 37, the workpiece W on the seal member 24 is moved backward and positioned in the opening 39. Next, the workpiece W is held by the spring catch of the rotating arm 3 by the operation of the chuck of the rotating arm 3 in the intermediate buffer chamber B. At this time, the opening 39 is closed by the seal member 24, and the intermediate buffer chamber B
And the processing chamber P are isolated. At the same time, in the isolated state, the next workpiece W is exposed to the processing space P 'and processed.

【0032】このように被処理物Wが処理されている間
に、中間バッファー室B内では回転腕3がモータMによ
り回転され、スプリングキャッチに保持された被処理物
は開口40に対向する位置まで180°搬送される。そ
して、処理室Pでの処理が完了すると、両室B、Pの圧
力が等しくされた後、開口40が、次の処理室P内の押
圧部材30の前進により開放され、中間バッファー室B
内の被処理物はスプリングキャッチから解放され、次の
処理室P内へ送られる。そして、次の処理室でもさきに
説明したと同様にして真空処理が行われる。
While the workpiece W is being processed in this way, the rotating arm 3 is rotated by the motor M in the intermediate buffer chamber B, and the workpiece held by the spring catch faces the opening 40. Transported by 180 °. When the processing in the processing chamber P is completed, after the pressures in the two chambers B and P are made equal, the opening 40 is opened by the advance of the pressing member 30 in the next processing chamber P, and the intermediate buffer chamber B
The object to be processed is released from the spring catch, and is sent into the next processing chamber P. Then, vacuum processing is performed in the next processing chamber in the same manner as described above.

【0033】なお、以上に説明した実施例では処理室P
は直線状に配列されているが、処理室の配置は直線状で
なくてもよい。
In the embodiment described above, the processing chamber P
Are arranged linearly, but the arrangement of the processing chambers need not be linear.

【0034】[0034]

【発明の効果】以上に説明したように、本発明によれ
ば、一連の処理室内を順次通されて真空処理を受ける被
処理物を、一つの処理室から次の処理室へ移動させるに
あたり一時的に収容するバッファー室内に搬送手段を設
け、処理室内で被処理物が処理されている間に、バッフ
ァー室内の被処理物を搬出に都合のよい位置へ搬送する
ようにしているので、被処理物の移動により処理が中断
される時間的損失が少なくなり、サイクルタイムが短縮
される。また、被処理物の搬送をバッファー室内で行う
ので、処理室間の汚染が防止され、処理室間のゲート弁
がないので処理装置全体の小形化を計ることができる。
また、本発明では、処理室内での処理中に、バッファー
室と処理室を仕切る隔壁に設けた開口を、バッファー室
側の第1のシール部材および処理室側の第2のシール部
材の段付孔内にそれぞれの押圧部材を押圧係合させて完
全にシールすることができるので、処理室内の残留処理
ガスがバッファー室内を汚染する等の事態の発生を防止
することができ、また、バッファー室と処理室との間で
被処理物を搬送する際には、バッファー室と処理室を仕
切る隔壁の開口を経て第1のシール部材と第2のシール
部材のキヤッチの間で被処理物用チャックを用いて被処
理物を確実に移動させることができる。
As described above, according to the present invention, an object to be processed, which is successively passed through a series of processing chambers and subjected to vacuum processing, is temporarily moved from one processing chamber to the next processing chamber. A transfer means is provided in the buffer chamber for temporarily storing the processing object, and the processing object in the buffer chamber is transferred to a position convenient for unloading while the processing object is being processed in the processing chamber. The time loss in which the processing is interrupted by the movement of the object is reduced, and the cycle time is shortened. Further, since the transfer of the object to be processed is performed in the buffer chamber, contamination between the processing chambers is prevented, and since there is no gate valve between the processing chambers, the size of the entire processing apparatus can be reduced.
Further, in the present invention, during the processing in the processing chamber, the opening provided in the partition partitioning the buffer chamber and the processing chamber is provided with the step of the first sealing member on the buffer chamber side and the second sealing member on the processing chamber side. Since the respective pressing members can be pressed and engaged in the holes to completely seal them, it is possible to prevent the occurrence of a situation such as the residual processing gas in the processing chamber contaminating the buffer chamber and the like. When the workpiece is transferred between the processing chamber and the processing chamber, the chuck for the workpiece is held between the first seal member and the second seal member via the opening of the partition wall separating the buffer chamber and the processing chamber. The object can be reliably moved by using.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の真空処理装置の一実施例の正面図。FIG. 1 is a front view of one embodiment of a vacuum processing apparatus of the present invention.

【図2】図1の平面図。FIG. 2 is a plan view of FIG. 1;

【図3】図2の一部の水平拡大原理断面図。FIG. 3 is a cross-sectional view of a part of FIG.

【図4】バッファー室の入口部の拡大断面図。FIG. 4 is an enlarged sectional view of an inlet portion of a buffer chamber.

【図5】図4と異なる作動状態を示す図。FIG. 5 is a diagram showing an operation state different from FIG. 4;

【図6】最上流バッファー室と第1番目の処理室の接続
のための開口の近傍を示す拡大断面図。
FIG. 6 is an enlarged cross-sectional view showing the vicinity of an opening for connection between a most upstream buffer chamber and a first processing chamber.

【図7】図6と異なる作動状態を示す図。FIG. 7 is a diagram showing an operation state different from FIG. 6;

【図8】スプリングキャッチ部の拡大断面図。FIG. 8 is an enlarged sectional view of a spring catch portion.

【符号の説明】[Explanation of symbols]

W 被処理物 W′ 処理ずみ製品 L ロードロック室 U アンロード室 P 処理室 B 中間バッファー室 B1 最上流バッファー室 B2 最下流バッファー室 M モータ PS プッシャー 3 搬送用回転腕(搬送手段) 5 押圧部材 7 シール部材 8 ピン 9 ばね 15 チャック 16 押圧部材 17 開口 M1 回転用モータ 21 回転腕 24 シール部材 28,37 プッシャー 30,38 押圧部材 W Workpiece W 'Processed product L Load lock chamber U Unloading chamber P Processing chamber B Intermediate buffer chamber B1 Upstream buffer chamber B2 Downstream buffer chamber M Motor PS Pusher 3 Transport rotating arm (transporting means) 5 Pressing member 7 Sealing Member 8 Pin 9 Spring 15 Chuck 16 Pressing Member 17 Opening M1 Rotating Motor 21 Rotating Arm 24 Sealing Member 28, 37 Pusher 30, 38 Pressing Member

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】被処理物を取入れて外気と遮断するロード
ロック室と、 ロードロック室に連通遮断可能に接続された最上流バッ
ファー室と、 最上流バッファー室に連通遮断可能に接続され、ロード
ロック室から最上流バッファー室を経て被処理物を受入
れて真空処理する最上流処理室と、 この最上流処理室に続いて設けられ互いに遮断された一
連の処理室と、 隣接する処理室同士を連通遮断可能に接続し、上流側の
処理室内から被処理物を受入れて一時的に収容した後、
続く中間処理室へ送り出すための中間バッファー室と、 最下流の処理室に連通遮断可能に接続され、最下流処理
室から真空処理され終った製品を受入れる最下流バッフ
ァー室と、 最下流バッファー室および外気と連通遮断可能なアンロ
ード室と、 前記最上流、最下流および中間処理室の内部に設けた、
被処理物の搬送用腕と、 前記最上流、最下流および中間処理室内で被処理物が真
空処理されている間に前記最上流、最下流および中間バ
ッファー室内の被処理物を、各バッファー室の搬入側に
近い位置から、その搬出側に近い位置へ移動させる搬送
用腕とを備え、 互いに連通遮断可能に接続されている処理室とバッファ
ー室を仕切る隔壁には、連通用開口が設けられ、 各処理室内の搬送用腕とバッファー室内の搬送用腕は、
いずれも先端部に円孔を有するとともに、これら搬送用
腕は、それらの円孔が前記連通用開口に対向する位置へ
移動可能とされ、 各バッファー室内の搬送用腕先端部円孔周縁部の処理室
に対向する側には、第1のシール部材が、前記隔壁の連
通用開口の周縁部に当接する位置へ変位して当該開口を
塞ぎうるように支持され、前記第1のシール部材には、
前記搬送用腕先端部円孔と位置が合うように段付孔が形
成されるとともに、この段付き孔に被処理物のキャッチ
が設けられ、 各バッファー室内には、前記第1のシール部材の段付孔
に押圧係合して段付孔を塞ぎ、かつ、第1のシール部材
を、前記隔壁の連通用開口の周縁部に当接する位置へ変
位させて、前記第1のシール部材により連通用開口を塞
ぐように押圧すべく進退可能の第1の押圧部材が設けら
れるとともに、この第1の押圧部材に、連通用開口を経
て進退自在の被処理物用チャックが付設され、 各処理室内の搬送用腕先端部円孔周縁部のバッファー室
に対向する側には、第2のシール部材が、前記隔壁の連
通用開口の周縁部に当接する位置へ変位して当該開口を
塞ぎうるように支持され、前記第2のシール部材には、
処理室内の搬送用腕先端部円孔と位置が合うように段付
孔が形成されるとともに、この段付孔に被処理物のキャ
ッチが設けられ、 各処理室内には、前記第2のシール部材の段付孔に押圧
係合して段付孔を塞ぎ、かつ、第2のシール部材を、前
記隔壁の連通用開口の周縁部に当接する位置へ変位させ
て、前記第2のシール部材により連通用開口を塞ぐよう
に押圧すべく進退可能の押圧部材が設けられ、 各処理室と各バッファー室を遮断すべき際には、前記第
1および第2の押圧部材による押圧により前記第1およ
び第2のシール部材を前記隔壁の連通用開口の周縁部に
当接させて当該開口を塞ぐようにし、 各処理室の搬送用腕先端部と各バッファー室の搬送用腕
先端部間で被処理物を搬送する際には、前記被処理物用
チャックを、第1および第2のシール部材のキャッチ間
で前記連通用開口を経て移動させる、 ように構成したことを特徴とする真空処理装置。
A load lock chamber for taking in an object to be cut off from outside air; an uppermost buffer chamber connected to the load lock chamber so as to be able to shut off communication; The most upstream processing chamber that receives the object to be processed from the lock chamber via the most upstream buffer chamber and performs vacuum processing, a series of processing chambers that are provided subsequent to the most upstream processing chamber and are isolated from each other, and the adjacent processing chambers After connecting the connection so that communication can be cut off and receiving and temporarily storing the workpiece from the upstream processing chamber,
An intermediate buffer chamber for sending out to the subsequent intermediate processing chamber, a lowermost buffer chamber connected to the lowermost processing chamber so as to be able to communicate with the lowermost processing chamber, and receiving a vacuum-processed product from the lowermost processing chamber; An unload chamber capable of shutting off communication with outside air, and provided in the uppermost stream, the lowermost stream, and the intermediate processing chamber;
The transfer arm of the object to be processed, and the objects to be processed in the uppermost stream, the lowermost stream, and the intermediate buffer chamber while the object to be processed is vacuum-processed in the uppermost stream, the lowermost stream, and the intermediate chamber, A transfer arm for moving from a position near the carry-in side to a position close to the carry-out side, and a communication opening is provided in a partition separating the processing chamber and the buffer chamber, which are connected to each other so as to be able to cut off communication. The transfer arm in each processing chamber and the transfer arm in the buffer chamber
Both have circular holes at the distal end, and these transfer arms can be moved to positions where the circular holes face the communication opening, and the transfer arm distal end circular hole peripheral portion in each buffer chamber is provided. On the side facing the processing chamber, a first seal member is supported so as to be displaced to a position in contact with a peripheral portion of the communication opening of the partition wall so as to be able to close the opening, and is supported by the first seal member. Is
A stepped hole is formed so as to be aligned with the circular hole at the tip of the transfer arm, and a catch for an object to be processed is provided in the stepped hole. In each buffer chamber, the first seal member is provided. The first sealing member is displaced to a position where the first sealing member abuts on the peripheral edge of the communication opening of the partition wall by pressing and engaging the stepped hole, and the first sealing member is connected by the first sealing member. A first pressing member that can move forward and backward so as to press so as to close the communication opening is provided, and a chuck for a processing object that can move forward and backward through the communication opening is attached to the first pressing member. The second seal member is displaced to a position in contact with the periphery of the communication opening of the partition wall on the side facing the buffer chamber of the peripheral edge of the circular hole of the tip end of the transfer arm so that the opening can be closed. , The second seal member,
A stepped hole is formed so as to be aligned with the circular hole at the tip end of the transfer arm in the processing chamber, and a catch for an object to be processed is provided in the stepped hole. The second sealing member is displaced to a position where the second sealing member is brought into contact with the peripheral edge of the communication opening of the partition wall by pressing and engaging the stepped hole of the member and closing the stepped hole. A pressing member is provided that can move forward and backward so as to press to close the communication opening, and when each processing chamber and each buffer chamber are to be shut off, the first and second pressing members press the first and second pressing members. And the second seal member is brought into contact with the peripheral edge of the communication opening of the partition wall so as to close the opening, and is covered between the transfer arm tip of each processing chamber and the transfer arm tip of each buffer chamber. When transporting the workpiece, the chuck for the workpiece is held in the first and the second positions. Vacuum processing apparatus wherein the moving through the communicating Spoken opening, configured as between the catch of the second seal member.
JP28172892A 1992-10-20 1992-10-20 Vacuum processing equipment Expired - Fee Related JP3258088B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28172892A JP3258088B2 (en) 1992-10-20 1992-10-20 Vacuum processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28172892A JP3258088B2 (en) 1992-10-20 1992-10-20 Vacuum processing equipment

Publications (2)

Publication Number Publication Date
JPH06132378A JPH06132378A (en) 1994-05-13
JP3258088B2 true JP3258088B2 (en) 2002-02-18

Family

ID=17643160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28172892A Expired - Fee Related JP3258088B2 (en) 1992-10-20 1992-10-20 Vacuum processing equipment

Country Status (1)

Country Link
JP (1) JP3258088B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4683453B2 (en) * 2001-04-27 2011-05-18 芝浦メカトロニクス株式会社 Vacuum processing equipment

Also Published As

Publication number Publication date
JPH06132378A (en) 1994-05-13

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