US20020070816A1 - Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby - Google Patents

Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby Download PDF

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Publication number
US20020070816A1
US20020070816A1 US09/938,411 US93841101A US2002070816A1 US 20020070816 A1 US20020070816 A1 US 20020070816A1 US 93841101 A US93841101 A US 93841101A US 2002070816 A1 US2002070816 A1 US 2002070816A1
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micromechanical
electrode
lateral
resonator
substrate
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US09/938,411
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English (en)
Inventor
Wan-Thai Hsu
John Clark
Clark Nguyen
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University of Michigan
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Priority to US09/938,411 priority Critical patent/US20020070816A1/en
Assigned to REGENTS OF THE UNIVERSITY OF MICHIGAN, THE reassignment REGENTS OF THE UNIVERSITY OF MICHIGAN, THE ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CLARK, JOHN R., HSU, WAN-THAI, NGUYEN, CLARK T.-C.
Publication of US20020070816A1 publication Critical patent/US20020070816A1/en
Priority to US10/625,992 priority patent/US6846691B2/en
Assigned to UNITED STATES AIR FORCE reassignment UNITED STATES AIR FORCE CONFIRMATORY LICENSE (SEE DOCUMENT FOR DETAILS). Assignors: UNIVERSITY OF MICHIGAN
Abandoned legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/0019—Flexible or deformable structures not provided for in groups B81C1/00142 - B81C1/00182
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00626—Processes for achieving a desired geometry not provided for in groups B81C1/00563 - B81C1/00619
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/013—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for obtaining desired frequency or temperature coefficient
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02244—Details of microelectro-mechanical resonators
    • H03H9/02338—Suspension means
    • H03H9/02362—Folded-flexure
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H9/2436—Disk resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/462—Microelectro-mechanical filters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/48—Coupling means therefor
    • H03H9/50—Mechanical coupling means
    • H03H9/505—Mechanical coupling means for microelectro-mechanical filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0235—Accelerometers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0242—Gyroscopes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0271—Resonators; ultrasonic resonators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0307—Anchors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102—Surface micromachining
    • B81C2201/0105—Sacrificial layer
    • B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02244—Details of microelectro-mechanical resonators
    • H03H2009/02488—Vibration modes
    • H03H2009/02496—Horizontal, i.e. parallel to the substrate plane

Definitions

  • This invention relates to methods of making micromechanical structures having at least one lateral, small gap therebetween and micromechanical devices produced thereby.
  • Vibrating mechanical tank components such as crystal and SAW resonators, are widely used for frequency selection in communication sub-systems because of their high quality factor (Q's in tens of thousands) and exceptional stability against thermal variations and aging.
  • Q's in tens of thousands the majority of heterodyning communication transceivers rely heavily on the high Q of SAW and bulk acoustic mechanical resonators to achieve adequate frequency selection in RF and IF filtering stages and to realize the required low phase noise and stability in their local oscillators.
  • discrete inductors and variable capacitors are used to properly tune and couple the front end sense and power amplifiers, and to implement widely tunable voltage-controlled oscillators.
  • the capacitive gap of vertical micromechanical resonators which is defined by the thickness of a sacrificial layer, can be very small, clamped-clamped beam vertical micromechanical resonators suffer from lower Q due to anchor dissipation. Also, it normally has only one port which limits its application range. Lateral resonators, on the other hand, have advantages of greater geometric design flexibility and more ports than normally attainable via vertical resonators.
  • the electrode-to-resonator gap for capacitively-driven lateral resonators has historically been implemented via lithography and etching, and this greatly limits the degree by which the electrode-to-resonator gap spacing can be reduced.
  • An object of the present invention is to provide an improved method of making micromechanical structures having at least one lateral, small gap therebetween and a micromechanical device produced thereby.
  • a method for making micromechanical structures having at least one lateral gap therebetween.
  • the method includes providing a substrate, and surface micromachining the substrate to form a first micromechanical structure having a first vertical sidewall and a sacrificial spacer layer on the first vertical sidewall.
  • the method also includes forming a second micromechanical structure on the substrate.
  • the second micromechanical structure includes a second vertical sidewall separated from the first vertical sidewall by the spacer layer.
  • the method further includes removing the spacer layer to form a first lateral gap between the first and second micromechanical structures.
  • the step of surface micromachining may further form a third vertical sidewall on the first micromechanical structure with the sacrificial spacer layer thereon and the method may further include forming a third micromechanical structure including a fourth vertical sidewall separated from the third vertical sidewall by the spacer layer.
  • the step of removing may further form a second lateral gap between the first and third micromechanical structures.
  • the second micromechanical structure may include an electrode.
  • the first micromechanical structure may include a resonator wherein the first lateral gap is an electrode-to-resonator capacitive gap.
  • the step of forming may include the step of plating metal on the substrate wherein the second micromechanical structure is a plated metal electrode.
  • the step of forming may include the step of selective epitaxial growth (SEG) to define the second micromechanical structure.
  • SEG selective epitaxial growth
  • the method may further include preventing metal from being plated on the first micromechanical structure.
  • the first lateral gap is preferably a submicron gap.
  • a micromechanical device includes a substrate, a first micromechanical structure supported on the substrate and having a first vertical sidewall, and a second micromechanical structure supported on the substrate and having a second vertical sidewall.
  • the device further includes a first submicron lateral gap between the first and second vertical sidewalls to increase electromechanical coupling of the first and second micromechanical structures.
  • the second micromechanical structure may be a plated metal electrode or an SEG grown electrode and the first micromechanical structure may be a lateral resonator.
  • the first micromechanical structure may have a third vertical sidewall and the device may further include a third micromechanical structure supported on the substrate and having a fourth vertical sidewall and a second submicron lateral gap between the third and fourth vertical sidewalls to increase electromechanical coupling of the first and third micromechanical structures.
  • the lateral resonator may be a polysilicon resonator such as a flexural-mode resonator beam.
  • the substrate may be a semiconductor substrate such as a silicon substrate.
  • the first submicron lateral gap may be a capacitive gap.
  • the second and third micromechanical structures may be electrodes such as plated metal electrodes.
  • the first and second submicron lateral gaps may be capacitive gaps.
  • FIG. 1 a is a side sectional schematic view of an insulation layer comprising oxide and nitride layers formed on a substrate, a patterned polysilicon layer and a sacrificial oxide layer deposited thereon;
  • FIG. 1 b is a side sectional schematic view of the layers of FIG. 1 a after opening for anchors are formed and a patterned polysilicon layer and a gap sacrificial oxide deposited thereon;
  • FIG. 1 c is a side sectional schematic view of the sacrificial oxide after etching and an evaporated seed layer together with the structures of FIG. 1 b ;
  • FIG. 1 d is a side sectional schematic view of a thick photoresist for planarization etch back which has been spun on the structures of FIG. 1 c ;
  • FIG. 1 e is a side sectional schematic view with the PR etched back to the top of the structures and the seed layer etched on the top of the structures;
  • FIG. 1 f is a side sectional schematic view of the structures of FIG. 1 e after the PR is stripped, a PR plating mold is formed and Au electrodes are plated;
  • FIG. 1 g is a side sectional schematic view of the structures of FIG. 1 f with the PR mold stripped, the seed layers removed and an Ni layer formed on the electrodes;
  • FIG. 1 h is a side sectional schematic view of the structures of FIG. 1 g after HF release and the Ni layer removed.
  • FIGS. 1 a - 1 h A preferred embodiment for a small-gap, lateral resonator process flow of the present invention is presented in FIGS. 1 a - 1 h .
  • this process starts with a 2 ⁇ m thick oxide film 10 (i.e. SiO 2 ) thermally grown on a silicon substrate 12 and a 3000 ⁇ thick film 14 of nitride (i.e. Si 3 N 4 ) which together serve as an isolation layer.
  • a 3000 ⁇ thick low stress polysilicon layer 16 is deposited via LPCVD, doped and patterned via reactive ion etching (RIE), a 5000 ⁇ thick layer 18 of sacrificial oxide (i.e. SiO 2 ) is deposited by LPCVD.
  • RIE reactive ion etching
  • vias 20 are patterned into the sacrificial oxide layer 18 by RIE, exposing the underlying polysilicon layer 16 in specific areas to later serve as anchors for eventual structures.
  • a 2 ⁇ m thick structural layer of low stress polysilicon is then deposited via LPCVD and patterned also via RIE to form anchor structures 22 and a resonator structure 23 with straight side walls.
  • a 1000 ⁇ thick layer 24 of conformal LPCVD oxide is then deposited in order to define the small-gap spacing of the present invention. This oxide could also be thermally grown over the polysilicon or silicon structures.
  • the sacrificial oxide layer 18 is then etched (RIE and wet etch) until the isolation nitride layer 14 is exposed in regions where metal electrodes are to be formed.
  • a thin metal layer (Cr200 ⁇ /Au300 ⁇ /Cr200 ⁇ ) is then evaporated over all areas of the wafer to serve as a seed layer 26 for electrode plating.
  • the top Cr layer of the seed layer 26 is used to enhance the adhesion between the seed layer 26 and a plating mold while the bottom Cr layer of the seed layer 26 is for the adhesion between the middle Au layer and the underneath nitride layer 14 .
  • a thick layer 28 of photoresist (PR) is first spun on. Then, the layer 28 is planarized and etched back via RIE to expose the seed metal layer 26 on top of the structures 22 and 23 as shown in FIG. 1 e .
  • the seed layer 26 on top of the structures 22 and 23 is then removed by wet etching to prevent metal from plating over the tops of the polysilicon structures 22 and 23 during subsequent electroplating steps.
  • a plating PR mold 30 is formed by lithography, the Cr layer on top of the exposed seed layer 26 is removed and then Au electrodes 32 are plated on the exposed Au layer of the seed layer 26 between vertical side walls of the resonator structure 23 and the photoresist mold 30 which together define the electrode plating boundaries.
  • a thin layer 34 of Ni is plated on the electrodes 32 in order to protect the surface of the Au electrode regions while portions of the seed layer 26 are being removed.
  • FIG. 1 g shows the PR mold 30 and the portions of the seed layer 26 removed.
  • the layer 34 of Ni is removed and finally, the resonator structure 23 , separated by sub-micron gaps 38 between the two metal electrodes 32 , is free to move after HF release to remove the layer 24 and the layer 18 .
  • metal electrodes less interconnect resistance, more power handling
  • the method of the invention can be used to form:
  • micromechanical structures including resonators, gyroscopes, and accelerometers, etc. driven and sensed by metal electrodes plated along the side walls of the structure;
  • the etch back process used to prevent metal plated on top of the resonator structure 23 is also particularly useful. Also particularly useful is the seed layer combination Cr/Au/Cr or Cr/Ni that survives in straight HF release.
  • Optional plated metals Au, Ni, Pd, Pt, Cu
  • the process can be modified wherein epi-Si is grown to serve as the electrodes.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Acoustics & Sound (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Micromachines (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
US09/938,411 2000-08-24 2001-08-23 Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby Abandoned US20020070816A1 (en)

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US09/938,411 US20020070816A1 (en) 2000-08-24 2001-08-23 Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby
US10/625,992 US6846691B2 (en) 2000-08-24 2003-07-24 Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby

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US22750700P 2000-08-24 2000-08-24
US09/938,411 US20020070816A1 (en) 2000-08-24 2001-08-23 Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby

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Cited By (4)

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US20040209435A1 (en) * 2003-04-17 2004-10-21 Aaron Partridge Method of Making a Nanogap for Variable Capacitive Elements, and Device having a Nanogap
US20050151442A1 (en) * 2003-12-04 2005-07-14 Seiko Epson Corporation Micromechanical electrostatic resonator
US20090315644A1 (en) * 2008-06-19 2009-12-24 Honeywell International Inc. High-q disk nano resonator device and method of fabricating the same
CN108883927A (zh) * 2016-02-29 2018-11-23 密执安州立大学董事会 用于三维微结构的组装过程

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US7551043B2 (en) * 2005-08-29 2009-06-23 The Regents Of The University Of Michigan Micromechanical structures having a capacitive transducer gap filled with a dielectric and method of making same
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TWI434803B (zh) 2010-06-30 2014-04-21 Ind Tech Res Inst 微機電元件與電路晶片之整合裝置及其製造方法

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US20040209435A1 (en) * 2003-04-17 2004-10-21 Aaron Partridge Method of Making a Nanogap for Variable Capacitive Elements, and Device having a Nanogap
US7172917B2 (en) 2003-04-17 2007-02-06 Robert Bosch Gmbh Method of making a nanogap for variable capacitive elements, and device having a nanogap
US20050151442A1 (en) * 2003-12-04 2005-07-14 Seiko Epson Corporation Micromechanical electrostatic resonator
US7215061B2 (en) * 2003-12-04 2007-05-08 Seiko Epson Corporation Micromechanical electrostatic resonator
US20090315644A1 (en) * 2008-06-19 2009-12-24 Honeywell International Inc. High-q disk nano resonator device and method of fabricating the same
CN108883927A (zh) * 2016-02-29 2018-11-23 密执安州立大学董事会 用于三维微结构的组装过程

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WO2002016256A2 (fr) 2002-02-28
US20040150057A1 (en) 2004-08-05
AU2001293221A1 (en) 2002-03-04
EP1311455A2 (fr) 2003-05-21
WO2002016256A3 (fr) 2002-09-12
US6846691B2 (en) 2005-01-25

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