US11952307B2 - Method for preparing microstructure on surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser - Google Patents
Method for preparing microstructure on surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser Download PDFInfo
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- US11952307B2 US11952307B2 US17/255,145 US201917255145A US11952307B2 US 11952307 B2 US11952307 B2 US 11952307B2 US 201917255145 A US201917255145 A US 201917255145A US 11952307 B2 US11952307 B2 US 11952307B2
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- 239000011521 glass Substances 0.000 title claims abstract description 76
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 49
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 239000002105 nanoparticle Substances 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000000017 hydrogel Substances 0.000 claims abstract description 31
- 238000000576 coating method Methods 0.000 claims abstract description 14
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000008367 deionised water Substances 0.000 claims abstract description 5
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims abstract description 4
- 238000003825 pressing Methods 0.000 claims abstract description 4
- 238000012545 processing Methods 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/144—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing particles, e.g. powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
Definitions
- the present invention belongs to the technical field of laser machining, and discloses a method for preparing a microstructure on the surface of glass by infrared nanosecond laser.
- Quartz glass has excellent physical and chemical properties and is widely used in biomedicine, aerospace and other fields.
- microfluidic chips made of quartz glass have the advantages of good light transmittance, good chemical stability and good biological compatibility.
- Due to high hardness and brittleness and low fracture toughness of glass there are always problems in the fabrication of micropores and microfluidic channels on the glass surface.
- Traditional abrasive jet processing is suitable for glass cutting, but is difficult to apply to the fabrication of microstructures on the glass surface.
- the fabrication of microstructures on the glass by chemical etching has the defects of chemical pollution and low processing efficiency.
- laser processing has the advantages of simple process, low pollution, direct patterning without the need of masks, etc.
- a 10.6 ⁇ m CO 2 laser is often used for glass cutting, or uses an excimer laser for drilling and microstructure processing.
- the average power of excimer lasers is low, resulting in low processing efficiency and high cost.
- Infrared nanosecond laser is one of the most widely used laser types.
- quartz glass is a very good infrared-transmitting material and has a very low absorption rate for 1064 nm infrared nanosecond laser, and material removal cannot be realized.
- the present invention provides a method for preparing a microstructure on the surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser.
- the present invention increases the absorption rate of infrared nanosecond laser at the interface between glass and a titanium oxide nanoparticle coating by coating the titanium oxide nanoparticles, thereby realizing fabrication of a microstructure.
- the present invention solves the problem that the quartz glass has a low absorption rate for 1064 nm infrared nanosecond laser and cannot be processed.
- a method for preparing a microstructure on the surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser includes the following steps:
- the hydrogel has certain viscosity, and cannot be spread out completely when dropwise applied to the glass surface; the pressure of another piece of glass can be used to achieve uniform coating, and two pieces of glass can be coated at a time. Through experiments, the uniformity of the entire glass surface is difficult to ensure by other coating methods.
- the glass is quartz glass.
- the laser is infrared nanosecond laser.
- short-wavelength lasers for example, 532 nm
- the laser cost is relatively high.
- Infrared laser is the most common and popular laser. Therefore, the objective of the present invention is to realize fabrication of a microstructure on the glass by using infrared nanosecond laser.
- the wavelength of the infrared nanosecond laser is 1064 nm
- laser processing parameters include an average laser power of 2 W-10 W, a pulse frequency of 20-200 kHz, and a scanning speed of 1000-2000 mm/min, improving the processing efficiency and the processing precision.
- Thickness affects the absorption rate of the laser. If the titanium oxide coating is too thick, most of the laser energy is absorbed by the coating, and the microstructure cannot be formed on the glass surface. Therefore, in some embodiments, the concentration of the titanium oxide nanoparticle hydrogel is 35-40%, and the volume of the titanium oxide nanoparticle hydrogel per unit area of the glass surface is 0.1-0.2 ⁇ L/mm 2 .
- the horizontal standing time is 5-10 min to allow the titanium oxide nanoparticle hydrogel to fully solidify.
- specific steps of the after-treatment are: ultrasonically cleaning the glass sample with acetone, absolute ethanol and deionized water respectively to remove titanium oxide nanoparticles attached to the surface.
- the present invention further provides a glass sample with the microstructure prepared by any of the above methods.
- the titanium oxide nanoparticles are non-toxic, strong in adhesion, and good in opacity, whiteness and brightness.
- FIG. 1 is a schematic diagram of the method for preparing a microstructure on the surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser of Embodiment 1 of the present invention.
- FIG. 2 is a glass microstructure processed by the preparation method of Embodiment 1 of the present invention.
- FIG. 3 is a glass microfluidic channel processed by the preparation method of Embodiment 1 of the present invention.
- FIG. 4 is a partial morphology of the glass microfluidic channel processed by the preparation method of Embodiment 1 of the present invention.
- the present invention provides a method for preparing a microstructure on the surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser, comprising the following steps:
- the volume of the 35% titanium oxide nanoparticle hydrogel used on a 40 mm ⁇ 20 mm glass sheet in step (1) is 30 ⁇ L, and the volume of the titanium oxide nanoparticle hydrogel per unit area of the glass surface is 0.1-0.2 ⁇ L/mm 2 .
- the standing time in step (2) is 5 min.
- FIGS. 2 and 4 It can be seen from FIGS. 2 and 4 that there are no cracks on the surfaces of the microgrooves and microfluidic channels, and the processing effect is good.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Glass (AREA)
- Laser Beam Processing (AREA)
- Glass Compositions (AREA)
- Micromachines (AREA)
Abstract
Description
-
- dropwise applying a titanium oxide nanoparticle hydrogel onto the surface of a glass sample;
- then pressing another piece of glass on the surface of the titanium oxide nanoparticle hydrogel, so that the titanium oxide nanoparticle hydrogel is evenly distributed between the two pieces of glass, and allowing the two pieces of glass to stand horizontally until the titanium oxide nanoparticle hydrogel is solidified;
- separating the two pieces of glass to obtain a glass with a uniform titanium oxide nanoparticle coating;
- forming a microstructure using laser; and
- performing after-treatment to obtain a glass sample with the microstructure.
-
- step (1): dropwise applying a titanium oxide nanoparticle hydrogel onto the surface of a glass sample;
- step (2): pressing another piece of glass on the surface of the hydrogel, so that the hydrogel is evenly distributed between the two pieces of glass, and then allowing the two pieces of glass to stand horizontally for a period of time until the titanium oxide nanoparticle hydrogel is air-dried;
- step (3): separating the two pieces of glass to obtain a glass with a uniform titanium oxide nanoparticle coating;
- step (4): forming a microstructure using an infrared nanosecond laser with a wavelength of 1064 nm; and
- step (5): performing after-treatment, specifically, ultrasonically cleaning the sample obtained in
step 3 with acetone, absolute ethanol and deionized water respectively for 10 min to remove titanium oxide nanoparticles attached to the surface, and obtain a glass sample with the microstructure.
-
- step (1): Referring to step 1 in
FIG. 1 , 30 μL of titanium oxide nanoparticle hydrogel (Alfa Aesar, Titanium (IV) oxide https://www.alfa.com/en/catalog/044517/) with the mass fraction of 35% was dropwise applied to a 40 mm×20 mm glass sample surface, where the volume of the titanium oxide nanoparticle hydrogel per unit area of the glass surface is 0.18 μL/mm2; - step (2): Referring to step 2 in
FIG. 1 , another piece of 40 mm×20 mm glass was pressed on the surface of the hydrogel, so that the hydrogel was evenly distributed between the two pieces of glass, and then the two pieces of glass were allowed to stand horizontally for 5 min to air-dry the titanium oxide nanoparticle hydrogel; - step (3): Referring to step 3 in
FIG. 1 , the two pieces of glass were separated to obtain a glass with a uniform titanium oxide nanoparticle coating; - step (4): Referring to step 4 in
FIG. 1 , a microstructure was processed using an infrared nanosecond laser with a wavelength of 1064 nm, where the parameters of laser ablation are that the average laser power is 5 W, the pulse frequency is 100 kHz, and the scanning speed is 2000 mm/min; and - step (5): After-treatment was performed, specifically, the sample obtained in
step 3 was ultrasonically cleaned with acetone, absolute ethanol and deionized water respectively for 10 min to remove titanium oxide nanoparticles attached to the surface, and obtain a glass sample with the microstructure.FIG. 2 is a three-dimensional morphology of the final processed microgrooves,FIG. 3 is an overall picture of the final processed microfluidic channels, andFIG. 4 is a partial morphology of the microfluidic channels.
- step (1): Referring to step 1 in
Claims (3)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911055343.7 | 2019-10-31 | ||
| CN201911055343.7A CN110642524B (en) | 2019-10-31 | 2019-10-31 | A method for preparing microstructures on glass surface by titania nanoparticles assisted infrared nanosecond laser |
| PCT/CN2019/129537 WO2021082261A1 (en) | 2019-10-31 | 2019-12-28 | Method for preparing micro structure on glass surface with titanium dioxide nanoparticles assisted by infrared nanosecond laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20210371329A1 US20210371329A1 (en) | 2021-12-02 |
| US11952307B2 true US11952307B2 (en) | 2024-04-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US17/255,145 Active 2041-12-21 US11952307B2 (en) | 2019-10-31 | 2019-12-28 | Method for preparing microstructure on surface of glass by titanium oxide nanoparticle-assisted infrared nanosecond laser |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US11952307B2 (en) |
| CN (1) | CN110642524B (en) |
| WO (1) | WO2021082261A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111548023B (en) * | 2020-05-12 | 2022-06-17 | 大连交通大学 | Method for finely processing glass surface by using red light nanosecond laser |
| CN112372144A (en) * | 2020-10-29 | 2021-02-19 | 江苏大学 | Method and device for coating/etching laser transparent material |
| CN114433046B (en) * | 2021-12-22 | 2023-12-26 | 东南大学 | Carbon-based material loaded with titanium oxide nano particles, and preparation method and application thereof |
| CN115466918B (en) * | 2022-09-06 | 2024-04-16 | 哈尔滨工程大学 | Whisker/fiber surface texturing nano bump structure modification method and toughening application thereof |
| CN115625440B (en) * | 2022-10-19 | 2025-05-09 | 西安交通大学 | A method for laser cutting water and its application in processing microfluidic chips |
| CN115647589A (en) * | 2022-10-21 | 2023-01-31 | 华南师范大学 | Method for laser welding of glass |
| CN119820154A (en) * | 2024-12-31 | 2025-04-15 | 北京航天控制仪器研究所 | Efficient quartz inertial component processing method based on ultrafast laser |
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| DE102005041242A1 (en) * | 2005-08-31 | 2007-03-01 | Merck Patent Gmbh | Producing structured surface on substrate, for use as diffuser or reflector for optical applications, e.g. in liquid crystal displays, by structuring then partially smoothing by sol-gel coating process |
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| CN103803485A (en) * | 2013-12-29 | 2014-05-21 | 北京工业大学 | Method for preparing optical microstructure on laser direct writing glass surface |
| CN104386920A (en) * | 2014-10-18 | 2015-03-04 | 中山市创科科研技术服务有限公司 | A kind of iron-doped titanium dioxide nano film glass and its preparation method |
| CN105789031A (en) * | 2016-03-11 | 2016-07-20 | 中国建筑材料科学研究总院 | Mask for laser direct writing and etching method of mask |
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2019
- 2019-10-31 CN CN201911055343.7A patent/CN110642524B/en active Active
- 2019-12-28 WO PCT/CN2019/129537 patent/WO2021082261A1/en not_active Ceased
- 2019-12-28 US US17/255,145 patent/US11952307B2/en active Active
Patent Citations (8)
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| CN110642524A (en) | 2020-01-03 |
| CN110642524B (en) | 2020-06-30 |
| US20210371329A1 (en) | 2021-12-02 |
| WO2021082261A1 (en) | 2021-05-06 |
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