US10038034B2 - Organic light-emitting device and display apparatus - Google Patents
Organic light-emitting device and display apparatus Download PDFInfo
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- US10038034B2 US10038034B2 US15/318,013 US201515318013A US10038034B2 US 10038034 B2 US10038034 B2 US 10038034B2 US 201515318013 A US201515318013 A US 201515318013A US 10038034 B2 US10038034 B2 US 10038034B2
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- light
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- charge injection
- electrode
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- 238000002347 injection Methods 0.000 claims abstract description 231
- 239000007924 injection Substances 0.000 claims abstract description 231
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 45
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 45
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 45
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims description 66
- 239000002184 metal Substances 0.000 claims description 66
- 239000011368 organic material Substances 0.000 claims description 39
- 239000011737 fluorine Substances 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 239000002019 doping agent Substances 0.000 claims description 10
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000003086 colorant Substances 0.000 abstract description 17
- 239000010410 layer Substances 0.000 description 521
- 239000010408 film Substances 0.000 description 139
- 230000004048 modification Effects 0.000 description 63
- 238000012986 modification Methods 0.000 description 63
- -1 polyethylene Polymers 0.000 description 40
- 239000000463 material Substances 0.000 description 28
- 230000005525 hole transport Effects 0.000 description 27
- 230000000694 effects Effects 0.000 description 18
- 238000005401 electroluminescence Methods 0.000 description 18
- 239000012535 impurity Substances 0.000 description 17
- 230000003287 optical effect Effects 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 230000015556 catabolic process Effects 0.000 description 8
- 238000006731 degradation reaction Methods 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 7
- 239000007769 metal material Substances 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910052788 barium Inorganic materials 0.000 description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 239000002346 layers by function Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 229920000144 PEDOT:PSS Polymers 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 150000004696 coordination complex Chemical class 0.000 description 3
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000011775 sodium fluoride Substances 0.000 description 3
- 235000013024 sodium fluoride Nutrition 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- NSMJMUQZRGZMQC-UHFFFAOYSA-N 2-naphthalen-1-yl-1H-imidazo[4,5-f][1,10]phenanthroline Chemical compound C12=CC=CN=C2C2=NC=CC=C2C2=C1NC(C=1C3=CC=CC=C3C=CC=1)=N2 NSMJMUQZRGZMQC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 2
- 229920001123 polycyclohexylenedimethylene terephthalate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920006380 polyphenylene oxide Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229920002725 thermoplastic elastomer Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WDECIBYCCFPHNR-UHFFFAOYSA-N Chrysene Natural products C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 239000002262 Schiff base Substances 0.000 description 1
- 150000004753 Schiff bases Chemical class 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JZXXUZWBECTQIC-UHFFFAOYSA-N [Li].C1=CC=CC2=NC(O)=CC=C21 Chemical compound [Li].C1=CC=CC2=NC(O)=CC=C21 JZXXUZWBECTQIC-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 1
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229960005057 canrenone Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- VPUGDVKSAQVFFS-UHFFFAOYSA-N hexabenzobenzene Natural products C1=C(C2=C34)C=CC3=CC=C(C=C3)C4=C4C3=CC=C(C=C3)C4=C2C3=C1 VPUGDVKSAQVFFS-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
- H10K50/171—Electron injection layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
-
- H01L27/3206—
-
- H01L51/5072—
-
- H01L51/5088—
-
- H01L51/5218—
-
- H01L51/5221—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/16—Electron transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/818—Reflective anodes, e.g. ITO combined with thick metallic layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/852—Arrangements for extracting light from the devices comprising a resonant cavity structure, e.g. Bragg reflector pair
Definitions
- the present invention relates to organic light-emitting devices and display apparatuses, and in particular to improving light emission efficiency.
- organic light-emitting devices such as organic electroluminescence (EL) panels and organic EL lighting have been actively developed.
- EL organic electroluminescence
- An organic EL panel has a configuration in which sub-pixels are arranged in two dimensions on a surface of a substrate.
- Each sub-pixel has a layered configuration in which an anode, a hole injection layer (HIL), a hole transport layer, an organic light-emitting layer, an electron transport layer, and a cathode are layered in this order on the substrate.
- the hole injection layer, hole transport layer, and electron transport layer have a function of injecting a charge (electrons, holes) from the anode or cathode to the organic light-emitting layer or a function of transporting a charge from the anode or cathode to the organic light-emitting layer, and therefore these layers are referred to as charge injection/transport layers.
- an electron transport layer the use of an organic material layer doped with barium, for example, has been studied and developed. By using such an electron transport layer, high electron injectability can be achieved.
- Patent Literature 1 discloses a configuration in which a barrier layer formed from an inorganic material is disposed between the organic light-emitting layer and the electron transport layer.
- a barrier layer formed from an inorganic material is disposed between the organic light-emitting layer and the electron transport layer.
- an inorganic material disclosed in Patent Literature 1 an example is silicon oxide (SiO x ).
- configurations have been developed that use a layer including an organic material doped with an alkali metal or alkaline earth metal as the electron transport layer, and an intermediate layer including a fluoride of an alkali metal or alkaline earth metal between the organic light-emitting layer and the electron transport layer.
- Such an intermediate layer has a function of blocking impurities and is thought to achieve high electron injectivity.
- the present invention aims to provide an organic light-emitting device and a display apparatus that suppress degradation of a charge injection/transport layer caused by impurities while improving light emission efficiency.
- An organic light-emitting device pertaining to one aspect of the present invention is an organic light-emitting device comprising a plurality of light emitters arranged in two dimensions along a surface of a substrate.
- Each light emitter of the plurality of light emitters comprises: a first electrode disposed above the substrate; a first charge injection/transport layer disposed above the first electrode; an organic light-emitting layer disposed above the first charge injection/transport layer, an intermediate layer disposed above the organic light-emitting layer; a second charge injection/transport layer disposed on the intermediate layer; and a second electrode disposed above the second charge injection/transport layer.
- the intermediate layer includes a fluoride of an alkali metal or a fluoride of an alkaline earth metal.
- the second charge injection/transport layer includes an organic material doped with an alkali metal or an alkaline earth metal.
- one electrode is light reflective and the other electrode is light transmissive.
- the plurality of light emitters include a first light emitter and a second light emitter that emits a different color of light than the first light emitter.
- one charge injection/transport layer is disposed between the organic light-emitting layer and the one electrode, and thickness of the one charge injection/transport layer in the first light emitter is different from thickness of the one charge injection/transport layer in the second light emitter.
- a layer including an organic material doped with an alkali metal or alkaline earth metal is used as a second charge injection/transport layer, and therefore a high light emission efficiency is achieved.
- an intermediate layer which is a layer including a fluoride of an alkali metal or a fluoride of an alkaline earth metal, is disposed between the organic light-emitting layer and the second charge injection/transport layer, and therefore a high impurity blocking property is achieved.
- impurities from the organic light-emitting layer are effectively blocked from entering the charge injection/transport layer, degradation of the charge injection/transport layer is suppressed, and a high storage stability can be achieved.
- high charge injectability of the organic light-emitting device can be achieved.
- the organic light-emitting device pertaining to the above aspect includes a first light emitter and a second light emitter that emits a different color of light than the first light emitter. Further, thickness of the one charge injection/transport layer between the one electrode that is light-reflective and the organic light-emitting layer in the first light emitter is different from thickness of the one charge injection/transport layer in the second light emitter. Thickness of the one charge injection/transport layer affects a difference in optical path length between directly-emitted light that is emitted externally from the organic light-emitting layer and reflected-emitted light that is reflected at the one electrode and emitted externally.
- thickness of the one charge injection/transport layer between the electrode that is light-reflective and the organic light-emitting layer in the first light emitter is different from thickness of the one charge injection/transport layer in the second light emitter and therefore between the first light emitter and the second light emitter the same film thickness is not formed in common. Accordingly, cavity adjustment is performed to obtain a resonance effect between directly-emitted light and reflected-emitted light in each of the first light emitter and the second light emitter, and therefore light emission efficiency can be improved for each of the first light emitter and the second light emitter.
- the organic light-emitting device pertaining to the above aspect suppresses degradation of the charge injection/transport layer due to impurities while further improving light emission efficiency.
- FIG. 1 is a schematic block diagram showing a schematic configuration of an organic EL display apparatus pertaining to an embodiment of the present invention.
- FIG. 2 is a schematic plan view showing an arrangement of sub-pixels in a display panel pertaining to an embodiment of the present invention.
- FIG. 3 is a schematic cross-section view showing a cross-section through A-A in FIG. 2 .
- FIG. 4A is a schematic plan view showing an arrangement of banks in the display panel of FIG. 2
- FIG. 4B is a schematic cross-section view showing a cross-section through B-B in FIG. 4A
- FIG. 4C is a schematic cross-section view showing a cross-section through C-C in FIG. 4A .
- FIG. 5 shows a relationship between thicknesses of hole injection layers and organic light-emitting layers, light emission efficiency, and drive voltage.
- FIG. 6 is a schematic cross-section view showing a display panel pertaining to Modification 1.
- FIG. 7 is a schematic cross-section view showing a display panel pertaining to Modification 3.
- FIG. 8 is a schematic cross-section view showing a display panel pertaining to Modification 8.
- An organic light-emitting device pertaining to one aspect of the present invention is an organic light-emitting device comprising a plurality of light emitters arranged in two dimensions along a surface of a substrate.
- Each light emitter of the plurality of light emitters comprises: a first electrode disposed above the substrate; a first charge injection/transport layer disposed above the first electrode; an organic light-emitting layer disposed above the first charge injection/transport layer; an intermediate layer disposed above the organic light-emitting layer; a second charge injection/transport layer disposed on the intermediate layer; and a second electrode disposed above the second charge injection/transport layer.
- the intermediate layer includes a fluoride of an alkali metal or a fluoride of an alkaline earth metal.
- the second charge injection/transport layer includes an alkali metal or an alkaline earth metal.
- one electrode is light reflective and the other electrode is light transmissive.
- the plurality of light emitters include a first light emitter and a second light emitter that emits a different color of light than the first light emitter.
- one charge injection/transport layer is disposed between the organic light-emitting layer and the one electrode, and thickness of the one charge injection/transport layer in the first light emitter is different from thickness of the one charge injection/transport layer in the second light emitter.
- the second charge injection/transport layer includes an alkali metal or alkaline earth metal, and therefore a high light emission efficiency can be achieved at a low drive voltage.
- an intermediate layer which is a layer including a fluoride of an alkali metal or a fluoride of an alkaline earth metal, is disposed between the organic light-emitting layer and the second charge injection/transport layer, and therefore a high impurity blocking property is achieved.
- entry of impurities from the organic light-emitting layer to the second charge injection/transport layer and the second electrode can be effectively blocked, suppressing degradation of the second charge injection/transport layer and the second electrode, and high charge injectivity can be maintained.
- an organic light-emitting device that has a high storage stability can be achieved.
- the organic light-emitting device pertaining to the above aspect includes a first light emitter and a second light emitter that emits a different color of light than the first light emitter. Thickness of the one charge injection/transport layer in the first light emitter is different from thickness of the one charge injection/transport layer in the second light emitter. That is, the above layers are formed separately in the first light emitter and the second light emitter, and therefore cavity adjustment can be performed for each of the first light emitter and the second light emitter, and resonance effects of each allow improvement of light emission efficiency.
- the organic light-emitting device pertaining to the above aspect suppresses degradation of the charge injection/transport layer due to impurities while improving light emission efficiency.
- the thickness of the one charge injection/transport layer may be a thickness that achieves a resonance effect, based on a wavelength of a light emission color of the light emitter.
- the one charge injection/transport layer may have a lower electrical resistivity than the organic light-emitting layer.
- the one charge injection/transport layer may be formed by a wet process using an organic material.
- film thickness of the layers for cavity adjustment for each light emitter can easily be altered.
- the alkali metal or alkaline earth metal of the fluoride included in the intermediate layer is a first metal and the alkali metal or alkaline earth metal included in the second charge injection/transport layer is a second metal
- the second metal may have a property of cleaving a bond between the first metal and fluorine in the fluoride of the first metal.
- the second metal included in the second charge injection/transport layer cleaves a bond between the first metal and fluorine, releasing the first metal.
- the released first metal is an alkali metal or alkaline earth metal and has excellent electron injection properties, and therefore excellent light emission efficiency can be achieved.
- an alkali metal or alkaline earth metal that has a relatively low work function and high electron supply capacity is used as the second metal, and therefore reactivity with fluorine is relatively high, and a bond between the first metal and fluorine is easily cleaved. Accordingly, electron injectivity of the first metal is more effective, and an excellent light emission efficiency is achieved.
- the second charge injection/transport layer may be formed from an organic material doped with the second metal.
- the second metal dopant in the second charge injection/transport layer acts on the fluoride of the first metal included in the intermediate layer.
- the second charge injection/transport layer may be formed from a first layer made from the second metal and a second layer that includes an organic material, wherein the first layer is disposed in contact with the intermediate layer.
- the first layer is formed from the second metal, and therefore the second metal acts on the fluoride of the first metal included in the intermediate layer at a higher concentration.
- the second layer may be formed from the organic material doped with an alkali metal or alkaline earth metal.
- charge injection/transport properties of the second layer can be improved.
- the alkali metal or alkaline earth metal used to dope the organic material in the second layer may be the second metal.
- the same metal material can be used in forming the first layer and the second layer, making manufacture simpler and decreasing costs.
- the organic material in the second layer need not include a metal dopant.
- the first electrode may be an anode
- the second electrode a cathode
- the first charge injection/transport layer a hole injection layer
- the second charge injection/transport layer an electron transport layer
- impurities from the organic light-emitting layer side are further hindered by the intermediate layer from entering the cathode, which is the second electrode, and the electron transport layer, which is the second charge injection/transport layer, degradation of the cathode and the electron transport layer by impurities is suppressed, and excellent storage stability can be achieved.
- the first electrode may be reflective
- the first charge injection/transport layer may be formed from an electrically-conductive organic material
- thickness of the first charge injection/transport layer in the first light emitter may be different from thickness of the first charge injection/transport layer in the second light emitter.
- the hole injection layer which is the first charge injection/transport layer
- the hole injection layer is formed from an organic material, and therefore the hole injection layer can be easily formed by using a wet process. Accordingly, in the case of a structure in which surfaces of the anode, which is the first electrode, reflect light, and light is extracted from the side of the cathode, which is the second electrode, the hole injection layer can easily be formed at different film thicknesses in the first light emitter and the second light emitter in order to perform cavity adjustment.
- the second electrode may be light reflective, and the second charge injection/transport layer may be formed from a n-electron system organic material including an alkali metal or an alkaline earth metal.
- the electron transport layer which is the second charge injection/transport layer, is formed from a n-electron system organic material, and therefore the electron transport layer can be formed by using a wet process.
- the electron transport layer can be formed at different film thicknesses in the first light emitter and the second light emitter in order to perform cavity adjustment.
- the first electrode may be a cathode
- the second electrode an anode
- the first charge injection/transport layer an electron transport layer
- the second charge injection/transport layer a hole injection layer
- impurities from the organic light-emitting layer side are further hindered by the intermediate layer from entering the anode, which is the second electrode, and the hole injection layer, which is the second charge injection/transport layer, degradation of the anode and the hole injection layer by impurities is suppressed, and excellent storage stability can be achieved.
- the first electrode may be light reflective, and the first charge injection/transport layer may be formed from a ⁇ -electron system organic material including an alkali metal or an alkaline earth metal.
- the electron transport layer which is the first charge injection/transport layer
- the electron transport layer is formed from a ⁇ -electron system organic material, and therefore the electron transport layer can be formed by using a wet process. Accordingly, in the case of a structure in which surfaces of the cathode, which is the first electrode, reflect light, and light is extracted from the side of the anode, which is the second electrode, the electron transport layer can easily be formed at different film thicknesses in the first light emitter and the second light emitter in order to perform cavity adjustment.
- the second electrode may be light reflective, and the second charge injection/transport layer may be formed from an electrically-conductive organic material.
- the hole injection layer which is the second charge injection/transport layer
- the hole injection layer is formed from an electrically-conductive organic material, and therefore the hole injection layer can be easily formed by using a wet process. Accordingly, in the case of a structure in which surfaces of the anode, which is the second electrode, reflect light, and light is extracted from the side of the cathode, which is the first electrode, the hole injection layer can be formed at different film thicknesses in the first light emitter and the second light emitter in order to perform cavity adjustment.
- a wavelength of light emission color of the first light-emitter may be longer than a wavelength of light emission color of the second light-emitter, and thickness of the one charge injection/transport layer in the first light emitter may be greater than thickness of the one charge injection/transport layer in the second light emitter.
- the first light emitter that has a longer wavelength of light-emission color than the second light emitter, a longer optical path can be ensured, and light emission efficiency improved through a resonance effect.
- the display apparatus pertaining to another aspect of the present invention also achieves the same effects as the organic light-emitting device described above.
- the following describes a schematic configuration of a display apparatus pertaining to an embodiment of an aspect of the present invention, with reference to FIG. 1 and FIG. 2 .
- an organic EL display apparatus 1 includes a display panel and drive/control circuitry 20 connected thereto.
- the display panel 10 is an organic EL panel that uses electroluminescence of organic material and has a plurality of pixels.
- each pixel includes a sub-pixel 10 a , which is an emitter of red (R) light, a sub-pixel 10 b , which is an emitter of green (G) light, and a sub-pixel 10 c , which is an emitter of blue (B) light.
- the sub-pixels 10 a , 10 b , 10 c are arranged in a matrix in X-Y axis directions (a two-dimensional arrangement).
- the drive/control circuitry 20 includes four drive circuits 21 , 22 , 23 , 24 and a control circuit 25 .
- the arrangement of the display panel 10 and the drive/control circuitry 20 in the organic EL display apparatus 1 is not limited to that shown in FIG. 1 .
- pixels in the display panel 10 is not limited to three colors R, G, B of sub-pixels (emitters) as shown in FIG. 2 , and one pixel may be configured from four or more emitters.
- the display panel 10 pertaining to the present embodiment is a top-emission type of organic EL panel.
- FIG. 3 is a cross-section through A-A in FIG. 2 .
- the display panel 10 includes a TFT substrate 100 (substrate) as a base and an insulating layer 101 layered on a top surface of the TFT substrate 100 .
- a top surface of the insulating layer 101 in a Z-axis direction is substantially flat.
- the drawing is simplified and a thin film transistor (TFT) layer in the TFT substrate 100 is not illustrated.
- TFT thin film transistor
- An anode 102 and a hole injection layer 103 are layered in this order on the top surface of the insulating layer 101 in the Z-axis direction.
- the anode 102 and the hole injection layer 103 are provided for each of the sub-pixels 10 a , 10 b , 10 c .
- the hole injection layer 103 may be continuous between the sub-pixels 10 a , 10 b , 10 c.
- First banks 104 are formed on the insulating layer 101 and covering X-axis direction ends of the hole injection layer 103 .
- the first banks 104 are between adjacent ones of the sub-pixels 10 a , 10 b , 10 c in the X-axis direction, and define openings that correspond to light-emitting regions in the X-axis direction.
- a hole transport layer 105 and an organic light-emitting layer 106 are layered in this order in the Z-axis direction.
- An intermediate layer 107 , an electron transport layer 108 , a cathode 109 , and a sealing layer 110 are layered in this order, covering a top surface of the organic light-emitting layer 106 and top surfaces of the first banks 104 .
- a resin layer 114 is layered on the sealing layer 110 in the Z-axis direction.
- a CF panel 117 is attached to the resin layer 114 , the CF panel 117 including a CF panel substrate 111 and a color filter layer 112 and a black matrix layer 113 on a bottom surface of the CF panel substrate 111 in the Z-axis direction.
- the resin layer 114 is in close contact with the sealing layer 110 , the color filter layer 112 , and the black matrix layer 113 .
- the TFT substrate 100 is a substrate, the anode 102 is a first electrode, and the cathode 109 is a second electrode.
- the hole injection layer 103 is a first charge injection/transport layer and the electron transport layer 108 is a second charge injection/transport layer.
- the first banks 104 are each elongated in the Y-axis direction and disposed with intervals therebetween in the X-axis direction
- second banks 115 are each elongated in the X-axis direction and disposed with intervals therebetween in the Y-axis direction.
- a “line bank” structure is used in the present embodiment.
- Regions defined by pairs of adjacent ones of the first banks 104 and pairs of adjacent ones of the second banks 115 are sub-pixel regions 116 a , 116 b , 116 c .
- Each functional layer such as an organic light-emitting layer and hole transport layer corresponding to a light-emission color of a sub-pixel is formed in the sub-pixel regions 116 a , 116 b , 116 c to form the sub-pixels 10 a , 10 b , 10 c.
- the first banks 104 are disposed between the sub-pixels 10 a , 10 b , 10 c in the X-axis direction and have a height H 104 measured from the top surface of the insulating layer 101 .
- the second banks 115 are disposed between adjacent ones of the anode 102 in the Y-axis direction.
- a height H 115 of the second banks 115 is measured from the top surface of the insulating layer 101 .
- the height H 115 of the second banks 115 is in a range from 40% to 70% of the height H 104 of the first banks 104 , and more specifically in a range from 50% to 55%.
- the TFT substrate 100 comprises a substrate and a TFT layer on the top surface of the substrate in the Z-axis direction.
- the TFT layer is not illustrated, but includes three electrodes: a gate, a source, and a drain, a semiconductor layer, and a passivation film.
- the substrate that is a base of the TFT substrate 100 is formed by using a glass substrate, a silica glass substrate, or a silicon substrate; or a metal substrate such as molybdenum sulfide, copper, zinc, aluminium, stainless steel, magnesium, iron, nickel, gold, or silver; or a semiconductor substrate such as a gallium arsenide; or a plastic substrate.
- a glass substrate a silica glass substrate, or a silicon substrate
- a metal substrate such as molybdenum sulfide, copper, zinc, aluminium, stainless steel, magnesium, iron, nickel, gold, or silver
- a semiconductor substrate such as a gallium arsenide
- plastic substrate such as a gallium arsenide
- a resin that is thermoplastic or thermosetting may be used as a plastic substrate.
- polyolefin such as polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide, polyimide (PI), polyamide-imide, polycarbonate, poly-(4-methyl-1-pentene), ionomer, acrylic resin, polymethyl methacrylate, styrene acrylonitrile copolymer (SAN), butadiene styrene copolymer, ethylene vinyl alcohol (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate, polyethylene naphthalate (PEN), polyester such as polycyclohexylenedimethylene terephthalate (PCT), polyether, polyether ketone,
- the insulating layer 101 is formed by using an organic compound such as polyimide, polyamide, or acrylic resin material.
- the insulating layer 101 preferably has organic solvent resistance.
- the insulating layer 101 is preferably formed by using a material that has a high resistance to and is not deformed or deteriorated by such processes.
- the anode 102 is a metal material including silver (Ag) or aluminium (Al).
- surfaces of the anode 102 are preferably highly light-reflective.
- the anode 102 need not be single layer structure formed from a metal material as described above, and may comprise a metal layer and a light-transmissive electrically-conductive layer.
- a light-transmissive electrically-conductive material indium tin oxide (ITO) or indium zinc oxide (IZO) may be used, for example.
- the hole injection layer 103 is a layer formed from an oxide of materials such as silver (Ag), molybdenum (Mo), chromium (Cr), vanadium (V), tungsten (W), nickel (Ni), or iridium (Ir), or an electrically-conductive organic material such as poly(3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT:PSS) or Plexcore (registered trademark) of Plextronics Inc.
- an oxide of materials such as silver (Ag), molybdenum (Mo), chromium (Cr), vanadium (V), tungsten (W), nickel (Ni), or iridium (Ir), or an electrically-conductive organic material such as poly(3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT:PSS) or Plexcore (registered trademark) of Plextronics Inc.
- the hole injection layer 103 is formed from an electrically-conductive organic material such as PEDOT:PSS.
- the first banks 104 are formed from an organic material such as a resin and have insulating properties.
- an organic material used in forming the first banks 104 acrylic resin, polyimide resin, or novalac-type phenolic resin may be used.
- Surfaces of the first banks 104 may be fluorine treated to impart liquid repellency.
- structure of the first banks 104 is not limited to the single-layer structure shown in FIG. 3 and FIG. 4B , and may be a multi-layered structure having two or more layers.
- each layer may be a combination of the materials above, or each layer may be an inorganic material or an organic material.
- the second banks 115 are formed from an inorganic insulating material or an organic insulating material.
- silicon oxide (SiO2), silicon nitride (SiN), or silicon oxynitride (SiON) may be used.
- silicon oxynitride (SiON) may be used.
- acrylic resin, polyimide resin, siloxane resin, or phenolic resin may be used.
- the hole transport layer 105 is formed from an organic material that has high hole mobility, in order to efficiently transport holes from the hole injection layer 103 to the organic light-emitting layer 106 .
- a macromolecular compound that has no hydrophilic group may be used, such as polyfluorene, a derivative thereof, polyarylamine, or a derivative thereof.
- the organic light-emitting layer 106 has a function of emitting light generated by an excited state caused by recombination of holes and electrons injected thereto.
- a material used in forming the organic light-emitting layer 106 a light-emitting organic material that can form a thin film by use of a wet printing method is preferable.
- a phosphorescent material is preferably used, such as an oxinoid compound, perylene compound, coumarin compound, azacoumarin compound, oxazole compound, oxadiazole compound, perinone compound, pyrrolo-pyrrole compound, naphthalene compound, anthracene compound, fluorene compound, fluoranthene compound, tetracene compound, pyrene compound, coronene compound, quinolone compound and azaquinolone compound, pyrazoline derivative and pyrazolone derivative, rhodamine compound, chrysene compound, phenanthrene compound, cyclopentadiene compound, stilbene compound, diphenylquinone compound, styryl compound, butadiene compound, dicyanomethylene pyran compound, dicyanomethylene thiopyran compound, fluorescein compound, pyrylium compound, thiapyry
- the intermediate layer 107 is formed from a fluoride of an alkali metal or a fluoride of an alkaline earth metal.
- a fluoride of an alkali metal or a fluoride of an alkaline earth metal used in the intermediate layer 107 specific examples include sodium fluoride (NaF), lithium fluoride (LiF), cesium fluoride (CsF), calcium fluoride (CaF2), and magnesium fluoride (MgF2).
- NaF sodium fluoride
- LiF lithium fluoride
- CsF cesium fluoride
- CaF2 calcium fluoride
- MgF2 magnesium fluoride
- the intermediate layer 107 is formed by using NaF.
- the electron transport layer 108 has a function of transporting electrons injected from the cathode 109 to the organic light-emitting layer 106 , and is, for example, formed from an organic material doped with an alkali metal or alkaline earth metal.
- the electron transport layer 108 is a ⁇ electron system low-molecular organic material such as an oxydiazole derivative (OXD), a triazole derivative (TAZ), or a phenanthroline derivative (BCP, Bphen), doped with barium (Ba).
- a low work function metal such as lithium (Li), calcium (Ca), cesium (Ce), sodium (Na), or rubidium (Rb); a low work function metal salt such as a lithium fluoride; a low work function metal oxide such as barium oxide; or a low work function metal organic complex such as lithium quinolinol may be used.
- Concentration of the dopant metal is preferably in a range from 5 wt % to 40 wt %, for example.
- the cathode 109 is formed by using a light-transmissive electrically-conductive film of indium tin oxide (ITO) or indium zinc oxide (IZO); or by using a metal thin film that includes aluminium (Al) or silver (Ag).
- ITO indium tin oxide
- IZO indium zinc oxide
- metal thin film that includes aluminium (Al) or silver (Ag).
- the cathode 109 is necessarily formed by using a light-transmissive material.
- Light transmission of the cathode 109 is preferably 80% or greater.
- the sealing layer 110 has a function of suppressing exposure of organic layers such as the organic light-emitting layer 106 to moisture and air, and may be formed from a material such as silicon oxide (SiO), silicon nitride (SiN) or silicon oxynitride (SiON). Further, a sealing resin layer formed from a resin material such as acrylic resin or silicone resin may be provided on a layer formed from one of these materials.
- the sealing layer 110 in the case of the display panel 10 pertaining to the present embodiment, which is a top-emission type, is necessarily formed from a light-transmissive material.
- the CF panel substrate 111 is formed by using a glass substrate, silica glass substrate, silicon substrate, or plastic substrate.
- a plastic substrate being used for the CF panel substrate 111 , a thermoplastic resin or thermosetting resin may be used.
- the color filter layer 112 selectively transmits visible light wavelengths in red (R), green (G), and blue (B) colors, and is made of a publicly-known material.
- the color filter layer 112 is formed based on an acrylic resin, for example.
- the black matrix layer 113 is formed from an ultraviolet light curable resin material that includes black pigment that has excellent light absorption and light shielding properties, for example.
- an ultraviolet light curable resin material acrylic resin may be used.
- the resin layer 114 is formed from a light-transmissive resin material (for example, an epoxy resin material). However, as a material of the resin layer 114 , silicone resin may be used.
- typically B has the lowest light emission efficiency.
- an electron transport layer is typically provided as a common layer to R, G, and B light emitters, and typically material and film thickness are selected and designed so light emission efficiency of the B light emitters is maximized.
- light emission efficiency of B light emitters is maximized, but carrier balance of R and G light emitters is not always optimized and in many cases optimal light emission efficiency cannot be obtained.
- a conventional method of compensating for a decrease in light emission efficiency due to a carrier balance collapse is adjusting optical cavities to improve light emission efficiency.
- wavelengths of R, G, and B light are 700 nm, 546.1 nm, and 435.8 nm, respectively.
- Film thickness of each type of functional layer of an organic light-emitting device is typically in a range from several nanometers to several tens of nanometers, and therefore adjusting film thickness of a functional layer to be thinner is difficult when adjusting optical cavities.
- a method of adjusting an optical cavity by making a film thickness of a functional layer thicker is typically used.
- Organic light-emitting layers use materials corresponding to each of R, G, and B light-emission colors, and are formed for each light-emission color, and therefore film thickness can easily be changed for each of R, G, and B. Accordingly, optical cavity adjustment is easily performed by changing film thickness of an organic light-emitting layer.
- electrical resistivity of an organic light-emitting layer is greater than that of a charge transport layer, and therefore making film thickness of the organic light-emitting layer thicker in order to adjust an optical cavity leads to a problem of a relatively large increase in drive voltage.
- cavity adjustment is performed by changing film thickness of a hole injection layer, which has a lower electrical resistivity than an organic light-emitting layer, an increase in drive voltage could be suppressed while improving light emission efficiency.
- the inventors performed experiments to investigate changes in drive voltage and light emission efficiency when film thickness of the hole injection layer 103 is increased instead of film thickness of the organic light-emitting layer 106 being increased.
- film thickness of the hole injection layer 103 was 5 nm or 25 nm
- film thickness of the organic light-emitting layer 106 was 90 nm, 100 nm, 110 nm, or 120 nm.
- the horizontal axis indicates film thickness in nanometers of the organic light-emitting layer 106
- the left vertical axis indicates light emission efficiency
- the right vertical axis indicates drive voltage.
- Light emission efficiency of samples for which film thickness of the hole injection layer 103 was 25 nm is indicated by ⁇ (filled black circles).
- Drive voltage of samples for which film thickness of the hole injection layer 103 was 25 nm is indicated by ⁇ (filled black triangles).
- Light emission efficiency of samples for which film thickness of the hole injection layer 103 was 5 nm is indicated by ⁇ (unfilled circles).
- Drive voltage of samples for which film thickness of the hole injection layer 103 was 5 nm is indicated by ⁇ (unfilled triangles).
- Solid curved lines indicate approximate curves of light emission efficiency and drive voltage of samples for which film thickness of the hole injection layer 103 was 25 nm.
- Dashed curved lines indicate approximate curves of light emission efficiency and drive voltage of samples for which film thickness of the hole injection layer 103 was 5 nm.
- light emission efficiency is expressed as a proportion of a reference light emission efficiency obtained when film thickness of the hole injection layer 103 was 5 nm and film thickness of the organic light-emitting layer 106 was 110 nm; and drive voltage is expressed as a difference from a drive voltage obtained when film thickness of the hole injection layer 103 was 5 nm and film thickness of the organic light-emitting layer 106 was 110 nm.
- samples for which film thickness of the hole injection layer 103 was 5 nm exhibited an increase in light emission efficiency as film thickness of the organic light-emitting layer 106 increased in a range from 90 nm to 110 nm and a slight decrease in light emission efficiency from a film thickness of 110 nm to 120 nm.
- Samples for which film thickness of the hole injection layer 103 was 25 nm exhibited a higher light emission efficiency when film thickness of the organic light-emitting layer 106 was 100 nm than when film thickness of the organic light-emitting layer 106 was 90 nm, and a lower light emission efficiency at 110 nm than at 90 nm.
- the sample for which film thickness of the organic light-emitting layer 106 was 120 nm exhibited a slightly lower light emission efficiency than the sample for which film thickness of the organic light-emitting layer 106 was 110 nm.
- differences in light emission efficiency due to differences in film thickness of the organic light-emitting layer 106 were relatively small when film thickness of the hole injection layer 103 was 25 nm.
- sample A the sample for which film thickness of the hole injection layer 103 was 25 nm and film thickness of the organic light-emitting layer 106 was 90 nm
- sample B the sample for which film thickness of the hole injection layer 103 was 5 nm and film thickness of the organic light-emitting layer 106 was 110 nm
- the sample A had a film thickness of the hole injection layer 103 that was 20 nm thicker and a film thickness of the organic light-emitting layer 106 that was 20 nm thinner than the sample B.
- the sample B had a film thickness of the hole injection layer 103 that was 20 nm thinner and a film thickness of the organic light-emitting layer 106 that was 20 nm thicker than the sample A.
- film thickness of the hole injection layer 103 of the sample A is increased by a corresponding amount. Comparing sample A and sample B, light emission efficiency of sample A is approximately 5% lower than that of sample B, but drive voltage is over 2 V lower. The graph in FIG. 5 indicates that the sample A can obtain a much lower drive voltage than the sample B at approximately the same light emission efficiency.
- increasing film thickness of the hole injection layer 103 by nm instead of increasing film thickness of the organic light-emitting layer 106 by nm suppresses an increase in drive voltage while achieving excellent light emission efficiency.
- altering film thickness of the hole injection layer 103 instead of the organic light-emitting layer 106 to adjust an optical cavity suppresses an increase in drive voltage while achieving excellent light emission efficiency.
- the hole injection layer is typically formed in a single process common to each color, R, G, and B, of sub-pixels. Accordingly, in the case of conventional methods, film thickness of the hole injection layer is the same in each color, R, G, and B, of sub-pixels.
- film thicknesses of the hole injection layer 103 are different, depending on light-emission color.
- film thickness of the hole injection layer 103 in the sub-pixel 10 a is T 103 a
- film thickness of the hole injection layer 103 in the sub-pixel 10 b is T 103 b
- film thickness of the hole injection layer 103 in the sub-pixel 10 c is T 103 c
- T 103 c ⁇ T 103 b ⁇ T 103 a film thickness of the hole injection layer 103 can be set to the most appropriate film thickness for the optical cavity of a sub-pixel, for each light-emission color.
- film thickness of the organic light-emitting layer 106 can be different, depending on light-emission color.
- film thickness of the organic light-emitting layer 106 in the sub-pixel 10 a is T 106 a
- film thickness of the organic light-emitting layer 106 in the sub-pixel 10 b is T 106 b
- film thickness of the organic light-emitting layer 106 in the sub-pixel 10 c is T 106 c
- T 106 c ⁇ T 106 b ⁇ T 106 a is just an example.
- a film thickness that results in an excellent light-emitting property may vary according to material used in each color of the organic light-emitting layer 106 .
- film thicknesses of the hole injection layer 103 are different, based on wavelengths of light-emission colors of sub-pixels. That is, for each light-emission color, film thickness of the hole injection layer 103 is set to align phases of directly-emitted light that is directly emitted externally (without being reflected) from the organic light-emitting layer 106 and reflected-emitted light that is emitted externally after being reflected at a surface of the anode 102 . Accordingly, when light-emission colors are different, film thicknesses of the hole injection layer 103 are different.
- the film thickness T 103 a of the hole injection layer 103 of the first light emitter is different from the film thickness T 103 c of the hole injection layer 103 of the second light emitter. More specifically, the film thickness T 103 a is set to be greater than the film thickness T 103 c . Wavelength of red (R) light is longer than wavelength of blue (B) light, and therefore in order to obtain a resonance effect of aligning phases of directly-emitted light and reflected-emitted light of R light, a longer adjusted distance is usually required for R light.
- R red
- B blue
- cavity adjustment is performed based on total film thickness of every functional layer (including the organic light-emitting layer 106 ) disposed between the anode 102 and the cathode 109 , and therefore, for example, according to film thickness of the organic light-emitting layer 106 , the film thickness T 103 a of the hole injection layer 103 is not necessarily always greater than the film thickness T 103 c . Further, optical path length adjustment changes depending on what order of reflected-emitted light is being considered for a resonance effect, and therefore the thickness T 103 a of the hole injection layer 103 is not necessarily greater than the film thickness T 103 c . In FIG. 3 , T 103 c ⁇ T 103 b ⁇ T 103 a , but these film thicknesses do not necessarily satisfy this relationship and, for example, the magnitude relationship may be reversed.
- the sub-pixel 10 a which is a light emitter emitting R light
- the sub-pixel 10 c which is a light emitter emitting B light
- Light-emission colors of the first light emitter and the second light emitter may be different, and as long as the film thickness of the hole injection layer of the first light emitter and the film thickness of the hole injection layer of the second light emitter are different, the light-emission colors of the first light emitter and the second light emitter may be any combination from R, G, and B.
- film thickness of the hole injection layer 103 is defined according to an optical cavity that obtains an excellent light emission efficiency for each light-emission color. Accordingly, when compared to a case in which cavity adjustment is performed by altering film thickness of an organic light-emitting layer, an increase in drive voltage is suppressed while achieving an excellent light emission efficiency.
- the intermediate layer 107 is disposed between the organic light-emitting layer 106 and the electron transport layer 108 , the intermediate layer 107 including a fluoride of an alkali metal or a fluoride of an alkaline earth metal.
- the intermediate layer 107 has a high impurity-blocking property, and therefore penetration of impurities from the organic light-emitting layer 106 to the electron transport layer 108 and the cathode 109 can be effectively blocked and high storage stability can be achieved. Accordingly, deterioration of the electron transport layer 108 is suppressed and a high electron injectivity can be maintained.
- film thickness of the hole injection layer 103 is altered based on light emission color, thereby performing cavity adjustment, but this is just an example.
- Cavity adjustment may be performed by altering film thickness of the hole transport layer 105 instead of the hole injection layer 103 , and cavity adjustment may be performed by altering film thicknesses of both the hole injection layer 103 and the hole transport layer 105 .
- the electron transport layer 108 is a single-layer structure, but the electron transport layer 108 may be configured to have a plurality of layers.
- FIG. 6 is a diagram schematically showing a structure of a cross-section of a display panel 30 corresponding to an A-A cross-section in FIG. 2 .
- the organic light-emitting layer 106 is disposed between the anode 102 and the cathode 109 , and the hole injection layer 103 and the hole transport layer 105 are disposed in this order from the anode 102 , between the anode 102 and the organic light-emitting layer 106 .
- the intermediate layer 107 is disposed between the cathode 109 and the organic light-emitting layer 106 .
- the present modification also includes an electron transport layer disposed between the organic light-emitting layer 106 and the intermediate layer 107 , but according to the present modification an electron transport layer 308 is a two-layer structure comprising, in order from the organic light-emitting layer 106 , a first electron transport layer portion 308 a (first layer) and a second electron transport layer portion 308 b (second layer).
- the second electron transport layer portion 308 b is the same as the electron transport layer 108 in the embodiment.
- the first electron transport layer portion 308 a is a layer comprising a “second metal” that has a function of cleaving a bond between the first metal and fluorine in the fluoride of the first metal included in the intermediate layer 107 .
- the second metal is an alkali metal or alkaline earth metal. More specifically, for example, the second metal is barium (Ba).
- the first electron transport layer portion 308 a is not limited to being configured from only the second metal. Small amounts of impurities may of course be included, but it suffices that the second metal is a main component of the first electron transport layer portion 308 a .
- main component means that the second metal is at least 40 wt % of the first electron transport layer portion 308 a.
- the following effects can be achieved in addition to the effects of the display panel 10 pertaining to the embodiment.
- the fluoride of the first metal in the intermediate layer 107 i.e., the fluoride of the alkali metal or alkaline earth metal (for example, NaF), has a high electron insulating property. Accordingly, it would seem that electron injection from the electron transport layer 308 to the organic light-emitting layer 106 would be hindered.
- the first electron transport layer portion 308 a of the electron transport layer 308 is disposed in contact with the intermediate layer 107 , and the first electron transport layer portion 308 a comprises an alkali metal or alkaline earth metal that is the second metal, and therefore a bond between the fluorine and the alkali metal or alkaline earth metal in the intermediate layer 107 (a bond between fluorine and the first metal) can be cleaved by the second metal.
- the alkali metal or alkaline earth metal for example, Na
- the first metal has a high electron injectivity, and therefore electron injectivity from the electron transport layer 308 to the organic light-emitting layer 106 is kept high.
- film thickness of the first electron transport layer portion 308 a is preferably in a range from 3% to 25% of film thickness of the intermediate layer 107 . Further, film thickness of the intermediate layer 107 is from 1 nm to 10 nm, approximately, and film thickness of the first electron transport layer portion 308 a is from 0.1 nm to 1 nm, approximately. An actual boundary between the intermediate layer 107 and the first electron transport layer portion 308 a is not clearly defined, and material of the intermediate layer 107 and material of the first electron transport layer portion 308 a may be mixed to a certain extent during manufacture. In such a case, it suffices that the film thicknesses of the intermediate layer 107 and the first electron transport layer portion 308 a are formed by a method that is intended to result in values in the ranges described above.
- a dopant metal in the second electron transport layer portion 308 b and the second metal in the first electron transport layer portion 308 a are the same type of metal. This is due to consideration of ease of manufacture.
- barium is a metal with a high general versatility and its use can reduce costs.
- the present modification also suppresses an increase in drive voltage while achieving an excellent light emission efficiency, by performing of cavity adjustment by altering film thickness of the hole injection layer 103 for each light emission color.
- the TFT substrate 100 is a substrate, the anode 102 is a first electrode, and the cathode 109 is a second electrode.
- the hole injection layer 103 is a first charge injection/transport layer and the electron transport layer 308 is a second charge injection/transport layer.
- cavity adjustment may be performed by changing film thickness of the hole transport layer 105 instead of the hole injection layer 103 .
- the hole transport layer 105 is the first charge injection/transport layer.
- cavity adjustment may be performed by altering film thicknesses of both the hole injection layer 103 and the hole transport layer 105 , and in this case both the hole injection layer 103 and the hole transport layer 105 are the first charge injection/transport layer.
- the display panel 10 pertaining to the present embodiment is a top-emission type of organic EL panel, but this is just an example. Configuration of the display panel 10 can also be applied to a bottom-emission type of organic EL panel.
- the cathode 109 is light-reflective, and the anode 102 is a light-transmissive material. More specifically, the cathode 109 is a metal material including silver (Ag) or aluminium (Al), and the anode 102 is formed using indium tin oxide (ITO) or indium zinc oxide (IZO).
- ITO indium tin oxide
- IZO indium zinc oxide
- the electron transport layer 108 is a continuous layer common to a plurality of sub-pixels, but in the case of the present modification, the electron transport layer 108 is formed for each sub-pixel and film thickness of the electron transport layer 108 is different for sub-pixels of different light-emission colors.
- film thickness of the electron transport layer 108 is defined to be most appropriate for the optical cavity of each sub-pixel, based on wavelengths of light-emission colors. Thus, an excellent light emission efficiency can be achieved.
- the electron transport layer 108 has a lower electrical resistivity than the organic light-emitting layer 106 , and therefore even if film thickness of the electron transport layer 108 is increased, an increase in drive voltage is suppressed, relative to a case in which cavity adjustment is performed by increasing film thickness of an organic light-emitting layer. Accordingly, increase in drive voltage is suppressed while achieving an excellent light emission efficiency.
- the electron transport layer 108 has a lower electrical resistivity than the organic light-emitting layer 106 , and therefore performing cavity adjustment via film thickness of the electron transport layer 108 has the same effects as in the display panel 10 , which is a top-emission type pertaining to the embodiment, of suppressing an increase in drive voltage while achieving an excellent light emission efficiency.
- optical cavity adjustment is performed via film thickness of the electron transport layer 108 , and therefore film thickness of the hole injection layer 103 may be the same for each sub-pixel.
- the TFT substrate 100 is a substrate, the anode 102 is a first electrode, and the cathode 109 is a second electrode. Further, the hole injection layer 103 is a first charge injection/transport layer and the electron transport layer 108 is a second charge injection/transport layer.
- the anode 102 is disposed at the TFT substrate 100 side and the cathode 109 is disposed at the CF panel 117 side, but this is just an example.
- the structure in the Z-axis direction may be such that the positional relationship of the anode 102 and the cathode 109 is reversed.
- FIG. 7 is a diagram schematically showing a structure of a cross-section of a display panel 40 corresponding to an A-A cross-section in FIG. 2 .
- the display panel 40 is a top-emission type of display panel.
- a cathode 409 is disposed at the TFT substrate 100 side and an anode 402 is disposed at the CF panel 117 side. Between the cathode 409 and the anode 402 , from the cathode 409 side, are disposed the electron transport layer 108 , the intermediate layer 107 , the organic light-emitting layer 106 , the hole transport layer 105 , and the hole injection layer 103 .
- the display panel 40 pertaining to the present modification is a top-emission type, and light is extracted from the anode 402 side, and therefore the anode 402 is necessarily formed from a light-transmissive material.
- the anode 402 is formed by using indium tin oxide (ITO) or indium zinc oxide (IZO), for example. Light transmission of the anode 402 is preferably 80% or greater.
- the cathode 409 is a metal material including silver (Ag) or aluminium (Al).
- surfaces of the cathode 409 are preferably highly reflective.
- the cathode 409 need not be single layer structure formed from a metal material as described above, and may comprise a metal layer and a light-transmissive electrically-conductive layer.
- a light-transmissive electrically-conductive material indium tin oxide (ITO) or indium zinc oxide (IZO) may be used, for example.
- film thickness of the electron transport layer 108 is different for different light emission colors. More specifically, for example, in the case of the display panel shown in FIG. 7 , film thickness of the electron transport layer 108 of the sub-pixel 410 a of the R light emitter is T 108 a , film thickness of the electron transport layer 108 of the sub-pixel 410 b of the G light emitter is T 108 b , film thickness of the electron transport layer 108 of the sub-pixel 410 c of the B light emitter is T 108 c , and T 108 c ⁇ T 108 b ⁇ T 108 a .
- film thickness of the electron transport layer 108 is defined as a film thickness that optimizes an optical cavity, based on a wavelength of light-emission color of a sub-pixel.
- film thickness of the electron transport layer 108 is different for each light-emission color, in order to perform cavity adjustment, and therefore an excellent light emission efficiency is achieved.
- the electron transport layer 108 has a lower electrical resistivity than the organic light-emitting layer 106 , and therefore even if film thickness of the electron transport layer 108 is increased, an increase in drive voltage is suppressed, relative to a case in which cavity adjustment is performed by increasing film thickness of an organic light-emitting layer. Accordingly, increase in drive voltage is suppressed while achieving an excellent light emission efficiency.
- a relationship of film thicknesses of the electron transport layer 108 for different sub-pixels is given as T 108 c ⁇ T 108 b ⁇ T 108 a , but this is just an example.
- Film thickness of the hole transport layer 108 can be set to the most appropriate film thickness for the optical cavity of a sub-pixel, for each light-emission color.
- the CF panel substrate 111 is a substrate
- the anode 402 is a first electrode
- the cathode 409 is a second electrode.
- at least one of the hole injection layer 103 and the hole transport layer 105 is a first charge injection/transport layer
- the electron transport layer 108 is a second charge injection/transport layer.
- the display panel 40 pertaining to Modification 3 is a top-emission type of display panel, but the configuration of Modification 3 can also be applied to a bottom-emission type of display panel.
- the bottom-emission type of display panel pertaining to Modification 4 is different from the display panel 40 pertaining to Modification 3 in the following points.
- the anode 402 is light-reflective, and the cathode 409 is a light-transmissive material. More specifically, the anode 402 is a metal material including silver (Ag) or aluminium (Al), and the cathode 409 is formed using indium tin oxide (ITO) or indium zinc oxide (IZO).
- the hole injection layer 103 and the hole transport layer 105 are continuous layers common to a plurality of sub-pixels, but in the case of the present modification, at least one of the hole injection layer 103 and the hole transport layer 105 is formed for each of the sub-pixels.
- film thickness of at least one of the hole injection layer 103 and the hole transport layer 105 is different for each sub-pixel. That is, at least one of film thickness of the hole injection layer 103 and film thickness of the hole transport layer 105 is determined so as to optimize optical cavities of each sub-pixel, based on wavelengths of light-emission colors. Thus, an excellent light emission efficiency can be achieved.
- the hole injection layer 103 and the hole transport layer 105 have a lower electrical resistivity than the organic light-emitting layer 106 , and therefore even if film thickness of the hole injection layer 103 and/or the hole transport layer 105 is increased, an increase in drive voltage is suppressed, relative to a case in which cavity adjustment is performed by increasing film thickness of an organic light-emitting layer. Accordingly, increase in drive voltage is suppressed while achieving an excellent light emission efficiency.
- sub-pixels for which light-emission colors are different may have different total film thicknesses for both the hole injection layer 103 and the hole transport layer 105 , or different film thicknesses for the hole injection layer 103 or the hole transport layer 105 .
- the CF panel substrate 111 is a substrate
- the anode 402 is a first electrode
- the cathode 409 is a second electrode.
- at least one of the hole injection layer 103 and the hole transport layer 105 is a first charge injection/transport layer
- the electron transport layer 108 is a second charge injection/transport layer.
- the first electron transport layer portion 308 a of Modification 1 may be applied to the configuration of Modification 3 and to the configuration of Modification 4 .
- the first electron transport layer portion 308 a is disposed between the intermediate layer 107 and the electron transport layer 108 (corresponding to the second electron transport layer portion 308 b of Modification 1 ).
- different film thicknesses for each sub-pixel based on light-emission color may be formed by the first electron transport layer portion 308 a , and film thickness of the first electron transport layer portion 308 a may be used in cavity adjustment.
- Configuration of the display panel pertaining to the present modification may be top-emission, and may be bottom-emission.
- the display panel 10 pertaining to the embodiment has a line-bank structure including the first banks 104 and the second banks 115 that have a lower height than the first banks 104 , but this is just an example.
- the first banks and the second banks may have the same height, may be formed as a single body, and may have a pixel bank structure.
- cavity adjustment is performed by altering film thickness of the hole injection layer 103 for each light-emission color, suppressing an increase in drive voltage while achieving an excellent light emission efficiency.
- an additional thin film of a metal oxide may be disposed between the anode 102 and the hole injection layer 103 .
- a metal oxide for example, tungsten oxide or molybdenum oxide may be used.
- the thin film of metal oxide is formed by sputtering, for example.
- a mask for each color and multiple iterations of sputtering are not necessary, and typically, a film thickness common to each light-emission color can be formed by a single sputtering process, as the process is complicated.
- Cavity length does include film thickness of such a thin film of metal oxide, but for the above reason it is easier to perform cavity adjustment by altering film thickness of the hole injection layer 103 .
- the electron transport layer 308 is a two-layer structure comprising the first electron transport layer portion 308 a and the second electron transport layer portion 308 b , both portions including an alkali metal or alkaline earth metal.
- the second electron transport layer portion may be configured without an alkali metal or alkaline earth metal dopant.
- FIG. 8 shows a configuration of a display panel 50 that is an organic light-emitting device pertaining to Modification 8 .
- FIG. 8 is a diagram schematically showing a structure of a cross-section of the display panel 50 corresponding to an A-A cross-section in FIG. 2 .
- an electron transport layer 508 comprises a first electron transport layer portion 508 a (first layer) and a second electron transport layer portion 508 b (second layer).
- the first electron transport layer portion 508 a is the same as the first electron transport layer portion 308 a in Modification 1 .
- the second electron transport layer portion 508 b aside from the point of not being doped with a metal, is the same as the electron transport layer 108 in the embodiment and the second electron transport layer portion 308 b in Modification 1 . That is, the second electron transport layer portion 508 b is formed from an organic material that has a function of transporting electrons injected from the cathode 109 to the organic light-emitting layer 106 .
- a ⁇ electron system low-molecular organic material can be used such as an oxydiazole derivative (OXD), a triazole derivative (TAZ), or a phenanthroline derivative (BCP, Bphen).
- the second metal included in the first electron transport layer portion 508 a cleaves a bond between the first metal and the fluorine included in the intermediate layer 107 , achieving the same effect as Modification 1 .
- a display panel which is an organic EL panel, as an example of an organic light-emitting device.
- the present invention is not limited in this way. For example, even when the configuration of the present invention is applied to organic EL lighting, the same effects can be achieved.
- the embodiment and each modification described above is applied to an active matrix type of display panel.
- the present invention is not limited in this way.
- the present invention is applicable to a passive matrix type of display panel.
- one pixel is a combination of three sub-pixels 10 a , 10 b , 10 c that each have a rectangular shape in plan view, but the present invention is not limited in this way.
- each sub-pixel may be a shape such as triangular, hexagonal, or octagonal.
- a honeycomb shape may be used.
- the first banks may have a winding crank-like shape.
- the number of sub-pixels in one pixel may be two, or may be four or more. In such a case, a plurality of sub-pixels in one pixel may emit different colors of light from each other or may emit the same color of light as each other.
- a wiring layer that connects cathodes may be disposed between adjacent pixels.
- material of the intermediate layer is not limited to NaF, and material of the first electron transport layer portion is not limited to Ba. It suffices that the intermediate layer is formed from a fluoride of an alkali metal or alkaline earth metal, and impurities may also be present.
- the first electron transport layer portion is formed from an alkali metal or alkaline earth metal, and preferably the same as a metal dopant in the second electron transport layer portion.
- the present invention is applicable to implementation of organic light-emitting devices and organic display apparatuses that have a high light emission efficiency.
- Display panel organic light-emitting device
- Sub-pixel light emitter
- Anode (first electrode, second electrode)
- Hole injection layer (first charge injection/transport layer, second charge injection/transport layer)
- Electron transport layer (first charge injection/transport layer, second charge injection/transport layer)
- First electron transport layer portion (first layer)
- Second electron transport layer portion (second layer)
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Abstract
Description
- [Patent Literature 1] Japanese patent 4882508
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US20170133437A1 (en) | 2017-05-11 |
JP6337111B2 (en) | 2018-06-06 |
WO2015194189A1 (en) | 2015-12-23 |
US20180308906A1 (en) | 2018-10-25 |
US10535717B2 (en) | 2020-01-14 |
JPWO2015194189A1 (en) | 2017-04-20 |
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