UA155514U - A method of obtaining a transparent electrically conductive coating - Google Patents

Abstract

A method for obtaining a transparent electrically conductive coating includes pretreatment of a dielectric substrate with argon ions in a three-electrode ion-plasma sputtering of an In-Sn mosaic target in one cycle. The pretreatment of the surface of the dielectric substrate with cleaning of its surface is carried out at a bias potential of -100 V on the substrate for (5±0.25) min until the complete destruction of the undesirable gas shell on the substrate surface. After that, while maintaining the effect of the argon ion flux on the substrate, a transparent In-Sn-O oxide coating is sputtered onto the substrate with a bias for (2±0.25) min with simultaneous bombardment of the substrate with argon ions, which continue to be accelerated by a potential of -100 V. Then, after a joint two-minute sputtering with a bias, the further process of sputtering In-Sn-O oxide to a film thickness of 0.1-0.2 μm is continued without the influence of the bias potential on the substrate by sputtering a mosaic In-Sn target when a -1.2 kV potential is applied to the cathode-target for (7±0.5) min at argon and air pressures in the sputtering working volume of 3-10-3 and 4-10-3 Pa, respectively. In addition, the dielectric surface is additionally cleaned of impurities to enhance the forces of chemical interaction between the In-Sn-O oxide atoms and the surface atoms at 65-70 °C by treating its surface in a single cycle with the treatment of the dielectric substrate with argon ions.