JP3305786B2 - Manufacturing method of permanent magnet with excellent corrosion resistance - Google Patents

Manufacturing method of permanent magnet with excellent corrosion resistance

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Publication number
JP3305786B2
JP3305786B2 JP35819592A JP35819592A JP3305786B2 JP 3305786 B2 JP3305786 B2 JP 3305786B2 JP 35819592 A JP35819592 A JP 35819592A JP 35819592 A JP35819592 A JP 35819592A JP 3305786 B2 JP3305786 B2 JP 3305786B2
Authority
JP
Japan
Prior art keywords
permanent magnet
gas
magnet
corrosion resistance
ion plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP35819592A
Other languages
Japanese (ja)
Other versions
JPH06204066A (en
Inventor
恭之 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Metals Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
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Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP35819592A priority Critical patent/JP3305786B2/en
Publication of JPH06204066A publication Critical patent/JPH06204066A/en
Application granted granted Critical
Publication of JP3305786B2 publication Critical patent/JP3305786B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/026Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Hard Magnetic Materials (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、Fe−B−R系など
の希土類系永久磁石の製造方法に係り、イオン化したH
2ガスにより表面を清浄化した永久磁石に高真空雰囲気
中でイオンプレーティング法によりチタン系化合物を被
覆させ、磁石表面からのガス発生を防止して、真空中で
も使用可能とした耐食性のすぐれた永久磁石の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a rare earth permanent magnet such as an Fe-BR based magnet, and more particularly to an ionized H-based permanent magnet.
(2) A permanent magnet whose surface has been cleaned with a gas is coated with a titanium-based compound by ion plating in a high-vacuum atmosphere to prevent gas generation from the magnet surface and to be usable even in vacuum. The present invention relates to a method for manufacturing a magnet.

【0002】[0002]

【従来の技術】従来、希土類磁石として、アルニコ磁石
やハードフェライト磁石と比べ磁気特性が格段に高い希
土類コバルト磁石が用いられてきたが、R(RはYを含
む希土類元素のうち少なくとも1種)としてNdやPr
を中心とする資源的に豊富な軽希土類を用い、加工性に
すぐれ、Feを主成分として30MGOe以上の極めて
高いエネルギー積を示すFe−B−R系永久磁石が広く
用いられている。
2. Description of the Related Art Heretofore, rare earth cobalt magnets having much higher magnetic properties than alnico magnets and hard ferrite magnets have been used as rare earth magnets, but R (R is at least one of rare earth elements including Y). As Nd or Pr
Fe-BR-based permanent magnets, which use light rare earths, which are rich in resources, are excellent in workability, and have Fe as a main component and exhibit an extremely high energy product of 30 MGOe or more, are widely used.

【0003】しかしながら、上記のすぐれた磁気特性を
有するFe−B−R系磁気異方性焼結体からなる永久磁
石は、主成分として空気中で酸化し次第に安定な酸化物
を生成し易い希土類元素及び鉄を含有するため、例えば
磁気回路に組み込んだ場合に、磁石表面に生成する酸化
物により、磁気回路の出力低下及び磁気回路間のばらつ
きを惹起し、また、表面酸化物の脱落による周辺機器へ
の汚染の問題があった。
[0003] However, a permanent magnet made of an Fe-BR-based magnetic anisotropic sintered body having excellent magnetic properties is a rare earth element which is easily oxidized in air to form a stable oxide gradually. Since it contains elements and iron, for example, when incorporated in a magnetic circuit, the oxides generated on the magnet surface cause a reduction in the output of the magnetic circuit and variations between the magnetic circuits, and also cause the peripheral oxide to fall off due to the removal of the surface oxide. There was a problem of contamination of the equipment.

【0004】従来、イオンプレーティング法で作成した
被膜は、密着性にすぐれ、密度が高いため、耐食性、潤
滑性、耐磨耗性、耐熱性の向上を図り色々な工業分野で
利用されている。特に、TiN、TiC膜は耐食性、耐
磨耗性に優れているため、工具への耐磨耗性被膜や装飾
品の被膜として広く用いられている。
Conventionally, coatings formed by ion plating have excellent adhesion and high density, and are used in various industrial fields to improve corrosion resistance, lubricity, abrasion resistance, and heat resistance. . In particular, TiN and TiC films are widely used as wear-resistant coatings for tools and coatings for decorative articles because of their excellent corrosion resistance and wear resistance.

【0005】出願人は先に、イオンプレーティング法に
より、Fe−B−R系正方晶永久磁石体表面に、Al,
Ni,Cr,Cu,Co等の金属あるいはその合金、ま
たAl23、Cr23、TiN、AlN、TiC等から
なる耐食性気相めっき層を有した永久磁石(特開昭61
−150201号)を提案した。例えば具体的には、永
久磁石を1×10-2Torr以下の真空容器内に入れ、
Ti薄片をアーク放電により蒸発させると共に、N2
スを容器内に導入して、Ti蒸発とN2ガスイオン照射
を3時間行い、永久磁石表面にTiN薄膜を形成するも
のである。この方法により得られる被膜は、膜厚が均一
で、永久磁石材料表面に生成する酸化物が抑制され、磁
気特性が劣化することなく腐蝕性の薬品等を使用しても
残留させることがないため、長期にわたって安定な永久
磁石が得られる。
[0005] The applicant has previously reported that Al, Al is deposited on the surface of a Fe-BR-based tetragonal permanent magnet body by ion plating.
A permanent magnet having a corrosion-resistant vapor-phase plating layer made of a metal such as Ni, Cr, Cu, Co, or an alloy thereof, or Al 2 O 3 , Cr 2 O 3 , TiN, AlN, TiC, etc.
No. -150201). For example, specifically, a permanent magnet is placed in a vacuum vessel of 1 × 10 −2 Torr or less,
In addition to evaporating the Ti flakes by arc discharge, N 2 gas is introduced into the vessel, and Ti evaporation and N 2 gas ion irradiation are performed for 3 hours to form a TiN thin film on the surface of the permanent magnet. The film obtained by this method has a uniform film thickness, suppresses oxides generated on the surface of the permanent magnet material, and does not deteriorate even when a corrosive chemical or the like is used without deteriorating magnetic properties. A permanent magnet that is stable over a long period of time can be obtained.

【0006】[0006]

【発明が解決しようとする課題】被覆前の永久磁石材料
表面の汚染が被膜の付着力を減少させることはよく知ら
れており、この洗浄が不十分な場合は、被膜の剥離の原
因となる。従来法では、洗浄に関する具体的な方法が提
示されていないが、通常では、有機溶剤や中性洗剤での
洗浄の後水洗したり、Ar雰囲気中でArイオンの衝撃
を与えて表面の不純物を除去していた。しかし、これら
の洗浄方法では不十分であるためか、被膜がうまく付か
ない場合が多くあった。
It is well known that contamination of the surface of a permanent magnet material prior to coating reduces the adhesion of the coating, and insufficient cleaning can cause the coating to peel. . In the conventional method, a specific method for cleaning is not proposed, but usually, washing with an organic solvent or a neutral detergent is followed by washing with water, or bombardment of Ar ions in an Ar atmosphere to remove impurities on the surface. Had been removed. However, in many cases, the coating was not successfully applied, probably because these cleaning methods were insufficient.

【0007】さらに、耐酸化性被膜を有する永久磁石で
あっても、永久磁石体が焼結体でありかつ有孔性のた
め、磁石より微量のガスが発生することは避けられず、
ドリフトチューブ型線形加速器やアンジュレータ装置等
の、永久磁石を超高真空中に配置する装置にチタン系被
膜を被覆された永久磁石を使用する場合では、永久磁石
表面のチタン化合物被膜が剥離したり均一についていな
い場合、永久磁石のガスが磁石表面からもれ、使用でき
ないことがある。また、イオンプレーティングは被膜の
つきまわりが良いとはいえ、被膜の形成は主に永久磁石
の蒸発源に面した部分に限られるため、永久磁石を大量
に表面処理すると、膜厚にムラが生成することがある。
Further, even with a permanent magnet having an oxidation-resistant coating, a small amount of gas is inevitably generated from the magnet because the permanent magnet body is a sintered body and porous.
When a permanent magnet coated with a titanium-based coating is used in a device that places a permanent magnet in an ultra-high vacuum, such as a drift tube linear accelerator or undulator, the titanium compound coating on the surface of the permanent magnet may peel off or become uniform. If not, the gas of the permanent magnet leaks from the magnet surface and may not be used. In addition, although ion plating has good coverage of the coating, the formation of the coating is mainly limited to the portion facing the evaporation source of the permanent magnet. May be generated.

【0008】この発明は、焼結永久磁石などのイオンプ
レーティング法にてチタン系化合物被膜を形成した希土
類系永久磁石における従来の問題点を解消し、膜厚にム
ラがなく、永久磁石表面のチタン化合物被膜が均一に形
成され、磁石表面からのガス発生が防止され、真空中で
も使用可能とした耐食性のすぐれた永久磁石を得る製造
方法の提供を目的としている。
The present invention solves the conventional problems of a rare earth permanent magnet having a titanium compound film formed by an ion plating method such as a sintered permanent magnet. It is an object of the present invention to provide a method for producing a permanent magnet having a uniform titanium compound coating, preventing generation of gas from the magnet surface, and having excellent corrosion resistance which can be used even in a vacuum.

【0009】[0009]

【課題を解決するための手段】この発明は、希土類系永
久磁石表面にイオンプレーティング法にてチタン系化合
物被膜を形成する耐食性のすぐれた永久磁石の製造方法
において、有機溶剤で表面洗浄した該永久磁石を、40
0℃〜600℃に加熱して1〜2時間保持した後、1×
10 -4 〜1×10 -5 Torrの真空度を保持しながらH
2 ガスを導入してグロー放電によりイオン化し、加熱し
永久磁石に負の電荷を印加して磁石表面を清浄化した
後、所要ガス雰囲気または真空雰囲気において、Tiを
蒸発あるいはイオン化してイオンプレーティングを行
い、永久磁石表面にチタン系化合物を被覆することを特
徴とする耐食性のすぐれた永久磁石の製造方法である。
SUMMARY OF THE INVENTION The present invention relates to a method for manufacturing a permanent magnet having excellent corrosion resistance, in which a titanium compound film is formed on the surface of a rare earth permanent magnet by an ion plating method. 40 permanent magnets
After heating to 0 ° C. to 600 ° C. and holding for 1 to 2 hours, 1 ×
While maintaining a degree of vacuum of 10 -4 to 1 × 10 -5 Torr, H
2 Introduce gas, ionize by glow discharge, heat
After applying a negative charge to the permanent magnet to clean the magnet surface, in a required gas atmosphere or vacuum atmosphere, titanium is evaporated or ionized to perform ion plating, and the permanent magnet surface is coated with a titanium compound. A method for manufacturing a permanent magnet having excellent corrosion resistance.

【0010】[0010]

【0011】また、この発明は、上記の各構成におい
て、1×10-4Torr以上の高真空中でN2ガスを導
入し、Tiを蒸発あるいはイオン化してイオンプレーテ
ィングを行うことを特徴とする記載の耐食性のすぐれた
永久磁石の製造方法である。
Further, the present invention is characterized in that, in each of the above structures, ion plating is performed by introducing N 2 gas in a high vacuum of 1 × 10 −4 Torr or more and evaporating or ionizing Ti. And a method for producing a permanent magnet having excellent corrosion resistance.

【0012】この発明において、チタン系化合物を被膜
する永久磁石は、RとしてNdやPrを中心とする資源
的に豊富な軽希土類を用い、B、Feを主成分として3
0MGOe以上の極めて高いエネルギー積を示すFe−
B−R系永久磁石や、希土類コバルト磁石等の希土類系
永久磁石である。
In the present invention, a permanent magnet coated with a titanium-based compound uses a resource-rich light rare earth element mainly composed of Nd and Pr as R, and contains B and Fe as main components.
Fe- which shows an extremely high energy product of 0 MGOe or more
Rare earth permanent magnets such as BR permanent magnets and rare earth cobalt magnets.

【0013】この発明で使用するイオンプレーティング
法は、例えば、高真空中での蒸発物質の蒸気圧を利用し
アーク放電を行い、蒸発物をイオン化して被膜される永
久磁石表面に被膜を強く生成させる物理的蒸着法であ
る。イオンプレーティング法は、蒸発あるいはイオン化
方法により種々の方法に区分されるが、蒸発物質のイオ
ンおよびガスのイオンの衝撃を行いながら、基板上に蒸
発物質を堆積させる方法であり、蒸発した分子または原
子をイオン化しその運動エネルギーを増大することで膜
質や密着性、複雑な基板へのつきまわりを高めた方法で
ある。永久磁石表面上に被膜するチタン系化合物は、T
iN,TiC等であるが、この方法により、Si34
C−BN、HfN、AlN等の窒化物でも耐酸化性被膜
を生成させることが可能である。
In the ion plating method used in the present invention, for example, arc discharge is performed using the vapor pressure of an evaporating substance in a high vacuum to ionize the evaporant and strongly coat the surface of the permanent magnet to be coated. This is a physical vapor deposition method to be generated. The ion plating method is classified into various methods according to an evaporation or ionization method.The ion plating method is a method of depositing an evaporating substance on a substrate while bombarding ions of the evaporating substance and ions of a gas. This is a method that ionizes atoms and increases their kinetic energy to increase the film quality, adhesion, and coverage with complicated substrates. The titanium-based compound coated on the surface of the permanent magnet is T
iN, TiC, etc., by this method, Si 3 N 4 ,
Oxidation-resistant films can be formed even with nitrides such as C-BN, HfN, and AlN.

【0014】チタン系化合物の永久磁石への密着性向上
のために、永久磁石表面の清浄化がきわめて重要であ
る。この洗浄が不十分であると磁石表面の密着性が損な
われ、蒸着層の剥離が起こってしまう。この発明では、
清浄化工程において、永久磁石をH2雰囲気中でボンバ
ードクリーニングすることを特徴とする。洗浄方法とし
ては、まず、希土類系永久磁石表面を有機溶剤等で洗浄
する。その後、水洗あるいは洗剤による超音波洗浄、蒸
気洗浄等を施すことが好ましい。しかし、これでは必ず
しも十分ではない。次に洗浄された該永久磁石を蒸着室
に挿入するが、蒸着室内の排気を十分に行う必要がある
ため、超高真空排気装置にて行うことが好ましい。この
発明における蒸着室内の排気は、10-3〜10-5Tor
rまで、40〜50分行うことが望ましい。
[0014] In order to improve the adhesion of the titanium compound to the permanent magnet, it is very important to clean the surface of the permanent magnet. If the cleaning is insufficient, the adhesion of the magnet surface will be impaired, and the deposited layer will be peeled off. In the present invention,
In the cleaning step, the permanent magnet is subjected to bombard cleaning in an H 2 atmosphere. As a cleaning method, first, the surface of the rare-earth permanent magnet is cleaned with an organic solvent or the like. Thereafter, it is preferable to perform washing with water or ultrasonic washing with a detergent, steam washing, or the like. However, this is not always enough. Next, the washed permanent magnet is inserted into the vapor deposition chamber. However, since it is necessary to sufficiently exhaust the inside of the vapor deposition chamber, it is preferable to use an ultra-high vacuum exhaust device. The exhaust gas in the deposition chamber in the present invention is 10 −3 to 10 −5 Torr.
It is desirable to perform for 40 to 50 minutes up to r.

【0015】また、H2ガスを用いた清浄化前に永久磁
石を真空中で加熱する。加熱は磁石表面に吸着したガス
を離脱させ、蒸着物質の磁石表面への拡散や化学反応の
促進に役立つ。加熱温度は400℃から600℃、加熱
保持時間は1〜2時間程度が好ましい。清浄化処理前の
加熱で400℃未満では十分なガス放出がなく、特に磁
石に蓄積される水素を放出させるには600℃を超える
加熱は不要であり、また保持時間を1〜2時間とするの
は、磁石表面だけでなく磁石内部に結び付く水素を放出
させるためである。
Further, before cleaning with H 2 gas, the permanent magnet is heated in a vacuum. Heating removes the gas adsorbed on the magnet surface and helps to diffuse the vapor deposition material to the magnet surface and promote the chemical reaction. The heating temperature is preferably from 400 ° C. to 600 ° C., and the heating holding time is preferably about 1 to 2 hours. If the heating before the cleaning treatment is performed at a temperature lower than 400 ° C., sufficient gas is not released. In particular, to release hydrogen accumulated in the magnet, heating exceeding 600 ° C. is unnecessary, and the holding time is set to 1 to 2 hours. This is to release hydrogen that is bound not only on the magnet surface but also inside the magnet.

【0016】H2ガスを用いた清浄化に際し、加熱保持
後真空室内にH2ガスを挿入してグロー放電によりイオ
ン化しつつ、加熱した永久磁石に負の電荷を印加する。
すると永久磁石基板表面にイオンが照射され、表面の酸
化層や異物が還元されて清浄化された表面が得られる。
蒸着室内に挿入されるガスはH2である。H2ガスの方が
Arガスよりもイオンプレーティングの際の基板表面へ
の被膜のつきまわりがよいため、より均一な被膜が得ら
れる。磁石表面を清浄化した後、蒸着室内を排気し、所
定の真空度1×10-4Torr以上を保つようにする。
真空度が1×10-4Torr未満では、蒸着室内に存在
する水素などのガスを完全に除去できないため、1×1
-4Torr以上とすることが好ましい。
[0016] Upon cleaning with H 2 gas, while ionized by glow discharge in the vacuum chamber after heating the holding insert the H 2 gas, applying a negative charge to the heated permanent magnets.
Then, the surface of the permanent magnet substrate is irradiated with ions, and an oxide layer and foreign substances on the surface are reduced to obtain a cleaned surface.
Gas that is inserted into the deposition chamber is H 2. The H 2 gas has better coverage of the coating on the substrate surface during ion plating than the Ar gas, so that a more uniform coating can be obtained. After cleaning the magnet surface, the inside of the deposition chamber is evacuated to maintain a predetermined degree of vacuum of 1 × 10 −4 Torr or more.
If the degree of vacuum is less than 1 × 10 −4 Torr, a gas such as hydrogen existing in the evaporation chamber cannot be completely removed, so that 1 × 1 -4
It is preferably set to 0 -4 Torr or more.

【0017】蒸着物質であるTiは蒸着室内の陽の電極
に配置され、高電圧の直流プラズマ放電または電子ビー
ム等により溶融され、イオン化するが、被膜される永久
磁石との間にはマスキング部材が介在している。さら
に、蒸着室内の排気を続けて真空度を高めながら、露点
−70℃〜−60℃のN2ガスを導入し、蒸着物質のイ
オン化が安定したところでマスキングを外し、永久磁石
に接近させる。すると蒸発した蒸着物質のイオンは、途
中でN2ガスの分子と幾回か衝突を繰り返したのち、永
久磁石表面に到着するために、ガス散乱効果を受けて、
永久磁石表面の蒸着物質に面していない位置にも堆積す
る。この間の蒸着時間は2〜3時間が好ましい。アーク
電流の電圧を変えることにより蒸着物質の蒸発量をコン
トロールできるため、蒸着物質の所要の付着量を求める
ことができる。
Ti, which is a deposition material, is disposed on a positive electrode in a deposition chamber, and is melted and ionized by a high-voltage DC plasma discharge or an electron beam. A masking member is provided between the film and the permanent magnet to be coated. Intervening. Further, N 2 gas having a dew point of −70 ° C. to −60 ° C. is introduced while evacuation of the deposition chamber is continued to increase the degree of vacuum. When ionization of the deposition material is stabilized, the masking is removed and the deposition material is brought closer to the permanent magnet. Then, the ions of the evaporated deposition material repeatedly collide with molecules of the N 2 gas several times on the way, and then arrive at the surface of the permanent magnet.
It is also deposited on the surface of the permanent magnet that does not face the deposition material. The deposition time during this is preferably 2-3 hours. Since the amount of evaporation of the deposition material can be controlled by changing the voltage of the arc current, the required amount of deposition of the deposition material can be obtained.

【0018】この発明のイオンプレーティング法は、例
えばN2ガスによる散乱効果のため被膜のつきまわりが
良いとはいえ、被膜の生成は主に蒸着物質に面した部分
に偏るため、膜圧むらのない被膜を得るための治具を使
用することが好ましい。この治具は、被膜する永久磁石
が取り付けられた治具の軸回転により、永久磁石がイオ
ン化した蒸着物質を全面で受けるように自転及び公転す
るものが望ましい。この治具は被膜する永久磁石の種
類、寸法、形状等に合わせて適宜選定すればよいが、永
久磁石表面の全体に被膜を生成させる必要性から、多軸
自転治具、自公転治具等が使用できる。さらに、永久磁
石と治具の接着部分に被膜のムラが生成しやすいため、
永久磁石をネット状の治具に入れ、永久磁石の全面に蒸
着物質のイオンがまわり込むようにする等の工夫をする
ことが望ましい。
In the ion plating method of the present invention, although the covering of the coating is good due to, for example, the scattering effect of N 2 gas, the formation of the coating is mainly biased to the portion facing the deposition material, so that the film pressure unevenness. It is preferable to use a jig for obtaining a coating free from defects. The jig preferably rotates and revolves so that the permanent magnet receives the ionized vapor deposition material over the entire surface by axial rotation of the jig to which the permanent magnet to be coated is attached. This jig may be appropriately selected according to the type, size, shape, etc. of the permanent magnet to be coated. However, since it is necessary to form a coating on the entire surface of the permanent magnet, a multi-axis rotation jig, a self-revolution jig, etc. Can be used. In addition, because the unevenness of the coating is likely to be generated at the bonded part between the permanent magnet and the jig,
It is desirable to put a permanent magnet in a net-shaped jig and to make a contrivance such that ions of the vapor deposition material are wrapped around the entire surface of the permanent magnet.

【0019】[0019]

【作用】この発明では、イオンプレーティングの前工程
として、所定時間加熱保持した後、H2ガスを導入して
イオン化し、加熱した永久磁石に負の電荷を印加して磁
石表面を清浄化する清浄化処理することにより、磁石表
面に吸着したガスを離脱させ、蒸着物質の磁石表面への
拡散や化学反応を促進させ、また表面の酸化層や異物が
還元されて清浄化された表面が得られ、被覆するチタン
化合物被膜が均一かつ緻密となり、磁石表面からのガス
発生が防止される。
According to the present invention, as a process prior to ion plating, after heating and holding for a predetermined time, H 2 gas is introduced to ionize, and a negative charge is applied to the heated permanent magnet to clean the magnet surface. By the cleaning treatment, the gas adsorbed on the magnet surface is released, the diffusion of the deposited material to the magnet surface and the chemical reaction are promoted, and the oxidized layer and foreign substances on the surface are reduced to obtain a cleaned surface. As a result, the titanium compound film to be coated becomes uniform and dense, and gas generation from the magnet surface is prevented.

【0020】この発明の高真空イオンプレーティング法
により、希土類系永久磁石に均一かつ緻密なチタン化合
物被膜を被覆することができ、真空中で使用してもガス
を発生しない耐食性のすぐれた永久磁石を得ることが可
能である。また、このチタン化合物被膜は金色で装飾性
にとみ、耐食性、耐水性を有し、さらにピッカース硬度
Hv=1900〜2400以上の硬度が得られた強固な
被膜であるため、超高真空装置部品として長期の使用に
耐えることが可能である。
According to the high vacuum ion plating method of the present invention, a rare earth permanent magnet can be uniformly and densely coated with a titanium compound film, and has excellent corrosion resistance which does not generate gas even when used in a vacuum. It is possible to obtain In addition, since this titanium compound coating is decorative in gold, has a corrosion resistance and water resistance, and is a strong coating having a Pickers hardness Hv of 1900 to 2400 or more, it is used as an ultra-high vacuum device part. It can withstand long-term use.

【0021】[0021]

【実施例】希土類系磁石としてNd−Fe−B系磁石合
金から切り出した寸法12mm×10mm×9mmの試
験片を用い、この発明によるイオンプレーティングによ
る被膜を行った。前処理として上記試験片をアルカリ洗
浄、水洗浄および有機溶剤による洗浄を施した。図1は
この実施例に使用したイオンプレーディング装置の概略
説明図である。真空容器1には導入ガス用の吸気系路2
と排気及び真空ポンプに接続した排気系路3が設けら
れ、水平軸で回転する回転円盤4の円周部に所定間隔で
複数のステンレス製の棒状自転治具5が、水平軸で自転
可能に立設され、さらに自転治具5の回転軸を中心に放
射状の突起部6先端に試験片7が固着され、回転円盤4
で自転治具5が公転、さらに自転治具5自体が自転する
構成からなる。また、加熱装置を備えたルツボ8が支持
装置9にて水平移動可能に保持され、棒状自転治具5が
装着された回転円盤4の外側にマスキング部10が配置
され、その下部でルツボ8内のTi薄片を加熱溶融し、
十分な蒸発状態に保持された際に、支持装置9にて回転
円盤4の回転軸中心方向へ移動する構成からなる。
EXAMPLE A test piece having a size of 12 mm × 10 mm × 9 mm cut out from a Nd—Fe—B based magnet alloy was used as a rare earth magnet, and coating was performed by ion plating according to the present invention. As a pretreatment, the test piece was subjected to alkali washing, water washing, and washing with an organic solvent. FIG. 1 is a schematic explanatory view of the ion plating apparatus used in this embodiment. The vacuum vessel 1 has an intake system 2 for the introduced gas.
A plurality of stainless steel rod-shaped rotating jigs 5 are rotatable on a horizontal axis at predetermined intervals around the circumference of a rotating disk 4 rotating on a horizontal axis. A test piece 7 is fixed to the tip of a radial projection 6 around the rotation axis of the rotation jig 5.
Thus, the rotation jig 5 revolves and the rotation jig 5 itself rotates. Further, a crucible 8 having a heating device is held by a supporting device 9 so as to be horizontally movable, and a masking portion 10 is arranged outside the rotating disk 4 on which the rod-shaped rotation jig 5 is mounted. Heat and melt the Ti flake of
When held in a sufficiently evaporated state, the supporting device 9 moves the rotating disk 4 toward the center of the rotation axis.

【0022】前処理洗浄の後、該試験片7を図1のCに
示すステンレス製の自転治具5に取り付け、また複数の
自転治具5を回転円盤4の円周上に取り付けた。その
後、真空容器1を真空度1×10-5Torr真空度とな
るように排気した後、該試験片7を約400℃、1時間
加熱保持した。また、容器内を1×10-4Torr台の
真空度を保持しながら吸気系路2よりH2ガスを導入
し、さらに、試験片に500V〜1kVの電圧を印加
し、水素イオンにより磁石表面を還元して清浄化した。
さらに、再度10-4Torrを保つよう排気を行いなが
ら、マスキング部10内でコーティング材のTi薄片を
ルツボ8で500V〜1kVのアーク放電により溶融さ
せ、Tiの蒸発が安定したところで、露点−70℃のN
2ガスを引出電圧40V、イオン化電流100mA、ビ
ームサイズ4×10cm2で加速し、マスキング部10
からルツボ8を回転円盤4の中心側へ移動させ、蒸着角
度±50°でTi蒸発とN2ガスイオン照射を3時間行
い、3〜4μm厚のTiN薄膜を形成した。さらに真空
容器1内で4時間保持したあと、TiN被膜された試験
片を取り出したところ、剥がれ、膨れ等のない均一な膜
が得られており、温度80℃、湿度90%、1000時
間の試験において腐食の発生は全くなく、良好な結果が
得られた。
After the pretreatment cleaning, the test piece 7 was mounted on a stainless steel rotation jig 5 shown in FIG. 1C, and a plurality of rotation jigs 5 were mounted on the circumference of the rotating disk 4. Thereafter, the vacuum vessel 1 was evacuated to a degree of vacuum of 1 × 10 −5 Torr, and the test piece 7 was heated and maintained at about 400 ° C. for 1 hour. Further, while maintaining the inside of the container at a degree of vacuum of the order of 1 × 10 −4 Torr, H 2 gas was introduced from the suction line 2, a voltage of 500 V to 1 kV was applied to the test piece, and hydrogen ions were applied to the surface of the magnet. Was reduced and cleaned.
Further, while evacuating again to maintain 10 −4 Torr, the Ti flakes of the coating material are melted in the masking section 10 by an arc discharge of 500 V to 1 kV in the crucible 8, and when the evaporation of Ti is stabilized, the dew point is −70. ° C N
2 The gas was accelerated at an extraction voltage of 40 V, an ionization current of 100 mA, and a beam size of 4 × 10 cm 2 ,
Then, the crucible 8 was moved to the center side of the rotating disk 4 and Ti evaporation and N 2 gas ion irradiation were performed at an evaporation angle of ± 50 ° for 3 hours to form a 3 to 4 μm thick TiN thin film. After holding for 4 hours in the vacuum chamber 1, the test piece coated with TiN was taken out, and a uniform film without peeling or swelling was obtained. No corrosion occurred at all and good results were obtained.

【0023】さらに、この発明によるTiN被膜された
試験片と、実施例で使用した試験片と同様の磁石でコー
ティングしていない試験片を真空容器に入れて50時間
の排気を行ったところ、到達真空度に差を生じた。Ti
N被膜を行った磁石のガス放出度は、コートしていない
磁石に比べ3分の1以下に減少しており、高真空中でも
ガスを発生せず、使用に耐えることが分かった。
Further, the test piece coated with TiN according to the present invention and a test piece not coated with a magnet similar to the test piece used in the examples were placed in a vacuum vessel and evacuated for 50 hours. There was a difference in the degree of vacuum. Ti
The gas release of the magnet coated with N was reduced to one-third or less as compared with the uncoated magnet, and it was found that no gas was generated even in a high vacuum, and the magnet was usable.

【0024】[0024]

【発明の効果】この発明は、イオン化したH2ガスによ
り表面を清浄化した永久磁石に高真空雰囲気中でイオン
プレーティング法によりチタン系化合物を被覆させる高
真空イオンプレーティング法により、希土類系永久磁石
に均一かつ緻密なチタン化合物被膜を被覆することがで
き、密着性、防食性、耐水性にすぐれた永久磁石を得る
ことができる。さらに、このチタン化合物被膜がドッグ
ボーンや剥がれのない均一被膜であることから、高真空
中で使用してもガスを発生しない耐食性のすぐれた永久
磁石が得られる。
According to the present invention, a rare-earth permanent magnet is formed by a high-vacuum ion plating method in which a permanent magnet whose surface is cleaned by ionized H 2 gas is coated with a titanium compound by an ion plating method in a high vacuum atmosphere. A uniform and dense titanium compound film can be coated on the magnet, and a permanent magnet excellent in adhesion, corrosion resistance and water resistance can be obtained. Further, since this titanium compound coating is a uniform coating without dog bone or peeling, a permanent magnet having excellent corrosion resistance which does not generate gas even when used in a high vacuum can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明によるイオンプレーディング装置の概
略説明図であり、AはTi薄片を加熱溶融中、Bはイオ
ンプレーディング中、Cは自転治具を示す。
FIG. 1 is a schematic explanatory view of an ion plating apparatus according to the present invention, wherein A denotes a Ti flake heated and melted, B denotes an ion plating, and C denotes a rotation jig.

【符号の説明】[Explanation of symbols]

1 真空容器 2 吸気系路 3 排気系路 4 回転円盤 5 自転治具 6 突起部 7 試験片 8 ルツボ 9 支持装置 10 マスキング部 DESCRIPTION OF SYMBOLS 1 Vacuum container 2 Intake path 3 Exhaust path 4 Rotating disk 5 Rotating jig 6 Projection part 7 Test piece 8 Crucible 9 Support device 10 Masking part

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01F 41/02 C23C 14/06 C23C 14/32 H01F 1/053 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) H01F 41/02 C23C 14/06 C23C 14/32 H01F 1/053

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 希土類系永久磁石表面にイオンプレーテ
ィング法にてチタン系化合物被膜を形成する耐食性のす
ぐれた永久磁石の製造方法において、有機溶剤で表面洗
浄した該永久磁石を、400℃〜600℃に加熱して1
〜2時間保持した後、1×10 -4 〜1×10 -5 Torr
の真空度を保持しながらH 2 ガスを導入してグロー放電
によりイオン化し、加熱した永久磁石に負の電荷を印加
して磁石表面を清浄化した後、所要ガス雰囲気または真
空雰囲気において、Tiを蒸発あるいはイオン化してイ
オンプレーティングを行い、永久磁石表面にチタン系化
合物を被覆することを特徴とする耐食性のすぐれた永久
磁石の製造方法。
1. A method for producing a permanent magnet having excellent corrosion resistance for forming a titanium-based compound film on a rare earth-based permanent magnet surface by ion plating method, the permanent magnet surface cleaning with an organic solvent, 400 ° C. to 600 Heat to ℃ 1
After holding for about 2 hours, 1 × 10 -4 to 1 × 10 -5 Torr
Glow discharge by introducing H 2 gas while maintaining the vacuum degree
After applying a negative charge to the heated permanent magnet to clean the magnet surface, in a required gas atmosphere or vacuum atmosphere, Ti is evaporated or ionized to perform ion plating, and the titanium surface is coated with titanium. A method for producing a permanent magnet having excellent corrosion resistance, characterized by coating a base compound.
【請求項2】 1×10-4Torr以上の高真空中でN
2ガスを導入し、Tiを蒸発あるいはイオン化してイオ
ンプレーティングを行うことを特徴とする請求項1
載の耐食性のすぐれた永久磁石の製造方法。
2. N 2 in a high vacuum of 1 × 10 −4 Torr or more.
The method for producing a permanent magnet having excellent corrosion resistance according to claim 1 , wherein two gases are introduced and Ti is evaporated or ionized to perform ion plating.
JP35819592A 1992-12-26 1992-12-26 Manufacturing method of permanent magnet with excellent corrosion resistance Expired - Lifetime JP3305786B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35819592A JP3305786B2 (en) 1992-12-26 1992-12-26 Manufacturing method of permanent magnet with excellent corrosion resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35819592A JP3305786B2 (en) 1992-12-26 1992-12-26 Manufacturing method of permanent magnet with excellent corrosion resistance

Publications (2)

Publication Number Publication Date
JPH06204066A JPH06204066A (en) 1994-07-22
JP3305786B2 true JP3305786B2 (en) 2002-07-24

Family

ID=18458027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35819592A Expired - Lifetime JP3305786B2 (en) 1992-12-26 1992-12-26 Manufacturing method of permanent magnet with excellent corrosion resistance

Country Status (1)

Country Link
JP (1) JP3305786B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1091537C (en) * 1995-12-25 2002-09-25 住友特殊金属株式会社 Permanent magnet for ultrahigh vacuum application and method for mfg. same
JPH11307328A (en) * 1998-04-16 1999-11-05 Sumitomo Special Metals Co Ltd Corrosion resistant permanent magnet and its manufacture
JP4691833B2 (en) * 2001-06-07 2011-06-01 日立金属株式会社 Method for producing rare earth-based permanent magnet having metal-deposited coating on its surface
JP4697581B2 (en) * 2004-12-24 2011-06-08 Tdk株式会社 Permanent magnet body and manufacturing method thereof
JP4697580B2 (en) * 2004-12-24 2011-06-08 Tdk株式会社 Method and apparatus for manufacturing permanent magnet body

Also Published As

Publication number Publication date
JPH06204066A (en) 1994-07-22

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