TWM647933U - Light-emitting device with quantum dots - Google Patents
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- TWM647933U TWM647933U TW112207501U TW112207501U TWM647933U TW M647933 U TWM647933 U TW M647933U TW 112207501 U TW112207501 U TW 112207501U TW 112207501 U TW112207501 U TW 112207501U TW M647933 U TWM647933 U TW M647933U
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Abstract
Description
本新型有關於發光二極體組成的發光裝置,特別是關於一種具有量子點的發光裝置。The present invention relates to a light-emitting device composed of a light-emitting diode, in particular to a light-emitting device with quantum dots.
量子點用於受光激發,產生激發光譜。因此,量子點經常用於作為轉換發光二極體波長,使得發光裝置的發光頻譜不受限於發光二極體原有的的發光頻譜,而得到所需要的發光效果。現有的量子點應用是於載體基材中加入半導體奈米粒子,而將此載體基材直接覆蓋於發光二極體晶片,形成量子點薄膜。發光二極體晶片發出的光線穿過量子點薄膜,藉以激發量子點產生激發光。Quantum dots are used to be excited by light to produce an excitation spectrum. Therefore, quantum dots are often used to convert the wavelength of light-emitting diodes, so that the luminescence spectrum of the light-emitting device is not limited to the original luminescence spectrum of the light-emitting diode, and the required luminescence effect can be obtained. The existing application of quantum dots is to add semiconductor nanoparticles to a carrier substrate, and then directly cover the carrier substrate on a light-emitting diode chip to form a quantum dot film. The light emitted by the light-emitting diode chip passes through the quantum dot film, thereby exciting the quantum dots to generate excitation light.
上述的設置形成兩個問題。發光二極體晶片通電發光時也同時發熱,量子點薄膜直接接觸發光二極體晶片的表面, 容易使得載體基材快速劣化。其次,載體基材也直接暴露於空氣中,而接觸氧氣以及水氣,同樣使得載體基材容易降解(degrade)劣化。上述兩種因素都會使得量子點薄膜快速劣化,而影響到發光二極體發光裝置的使用壽命。The above settings pose two problems. When the light-emitting diode chip is energized and emits light, it also generates heat. The quantum dot film directly contacts the surface of the light-emitting diode chip, which easily causes rapid deterioration of the carrier substrate. Secondly, the carrier substrate is also directly exposed to the air, and contact with oxygen and moisture also makes the carrier substrate prone to degradation. The above two factors will cause the quantum dot film to rapidly deteriorate and affect the service life of the light-emitting diode light-emitting device.
鑑於上述技術問題,本新型提出一種具有量子點的發光裝置,用於延長量子點薄膜的壽命。In view of the above technical problems, the present invention proposes a light-emitting device with quantum dots to extend the life of the quantum dot film.
本新型提出一種具有量子點的發光裝置包含一發光二極體晶片、一透明阻隔層、一量子點薄膜以及一透明保護層。透明阻隔層覆蓋於發光二極體晶片之上。量子點薄膜置於透明阻隔層之上,使得發光二極體晶片與量子點薄膜之間被透明阻隔層隔開。透明保護層設置於量子點薄膜之上,使得量子點薄膜被包覆於透明阻隔層與透明保護層之間。The invention proposes a light-emitting device with quantum dots, which includes a light-emitting diode chip, a transparent barrier layer, a quantum dot film and a transparent protective layer. The transparent barrier layer covers the light-emitting diode chip. The quantum dot film is placed on the transparent barrier layer, so that the light-emitting diode chip and the quantum dot film are separated by the transparent barrier layer. The transparent protective layer is disposed on the quantum dot film, so that the quantum dot film is covered between the transparent barrier layer and the transparent protective layer.
在本新型至少一實施例中,具有量子點的發光裝置更包含一基底層,用以發光二極體晶片暫時性或永久性的設置於其上。In at least one embodiment of the present invention, the light-emitting device with quantum dots further includes a base layer on which the light-emitting diode chip is temporarily or permanently disposed.
在本新型至少一實施例中,量子點薄膜的材質為可以透過點膠、噴塗方式塗佈的膠材。In at least one embodiment of the present invention, the material of the quantum dot film is an adhesive material that can be applied by dispensing or spraying.
在本新型至少一實施例中,透明阻隔層的材質為可以透過點膠、噴塗方式塗佈的膠材。In at least one embodiment of the present invention, the material of the transparent barrier layer is an adhesive material that can be applied by dispensing or spraying.
在本新型至少一實施例中,透明保護層的材質為可以透過點膠、噴塗方式塗佈的膠材。In at least one embodiment of the present invention, the material of the transparent protective layer is an adhesive material that can be applied by dispensing or spraying.
在本新型至少一實施例中,透明保護層的材質為有機膠材中混合奈米級無機粉末。In at least one embodiment of the present invention, the material of the transparent protective layer is organic glue material mixed with nanoscale inorganic powder.
在本新型至少一實施例中,透明保護層的材質是無機材質的鍍膜。In at least one embodiment of the present invention, the material of the transparent protective layer is an inorganic material coating.
在本新型至少一實施例中,透明保護層是由不同材料構成的多層結構。In at least one embodiment of the present invention, the transparent protective layer is a multi-layer structure composed of different materials.
在本新型至少一實施例中,具有量子點的發光裝置更包含一支架包含一底部與延伸於底部邊緣的一側部;其中底部與側部之間形成一容置空間,發光二極體晶片固定於底部,且透明阻隔層、量子點薄膜以及透明保護層則依序設置於發光二極體晶片之上並且位於容置空間。In at least one embodiment of the present invention, the light-emitting device with quantum dots further includes a bracket including a bottom and a side portion extending from the edge of the bottom; wherein an accommodation space is formed between the bottom and the side portion, and the light-emitting diode chip It is fixed on the bottom, and the transparent barrier layer, the quantum dot film and the transparent protective layer are sequentially arranged on the light-emitting diode chip and located in the accommodation space.
在本新型至少一實施例中,具有量子點的發光裝置,更包含多層附加的量子點薄膜以及多層附加的透明保護層,設置在透明阻隔層上方,並且每一個附加的量子點薄膜都被包覆在兩個附加的透明保護層之間。In at least one embodiment of the present invention, a light-emitting device with quantum dots further includes multiple additional layers of quantum dot films and multiple additional layers of transparent protective layers, which are disposed above the transparent barrier layer, and each additional quantum dot film is wrapped Covered between two additional transparent protective layers.
透過本新型提出的發光裝置,量子點薄膜是被夾持、包覆於透明阻隔層與透明保護層之間。量子點薄膜不會直接接觸發光二極體晶片的高溫表面,也隔絕於外界空氣。因此,本新型的發光裝置可以有效地減緩量子點薄膜的材質降解,延長發光裝置的壽命。同時,本新型提出的製造方法,也可以批量化生產發光,維持需要的產能。Through the light-emitting device proposed in the present invention, the quantum dot film is sandwiched and wrapped between the transparent barrier layer and the transparent protective layer. The quantum dot film does not directly contact the high-temperature surface of the light-emitting diode chip and is also isolated from the outside air. Therefore, the new type of light-emitting device can effectively slow down the material degradation of the quantum dot film and extend the life of the light-emitting device. At the same time, the manufacturing method proposed by this new model can also produce luminescence in batches and maintain the required production capacity.
請參閱圖1至圖4所示,為本新型第一實施例所揭露的一種具有量子點的發光裝置100,包含一基底層110、至少一發光二極體晶片120、一透明阻隔層130、一量子點薄膜140以及一透明保護層150。Referring to FIGS. 1 to 4 , a light-
如圖1與圖2所示,具體而言,基底層110用以供發光二極體晶片120暫時性或永久性的設置於其上。例如,當基底層110為離型膜,發光二極體晶片120是暫時性的設置於基底層110上,而後續製作完成的發光裝置100可以由基底層110剝離以移轉至背光模組基板(例如PCB或玻璃)或其他電路基板上進行表面黏著、焊接等固晶作業。當基底層110為為一背光模組基板或電路基板,發光二極體晶片120是永久性的透過表面黏著、焊接等固晶作業設置於基底層110上。As shown in FIGS. 1 and 2 , specifically, the
如圖1所示,發光二極體晶片120可為但不限定於藍光LED。量子點薄膜140是包含發光性半導體奈米粒子的薄膜。該些粒子可以受到發光二極體晶片120發出的光線激發,而對發光二極體晶片120發出的光進行波長轉換,以使得發光裝置100最終發出的發光波長符合預期的光譜,例如可將發光裝置100最終發出光調整為白色光。As shown in FIG. 1 , the light
如圖1、圖3與圖4所示,透明阻隔層130覆蓋於發光二極體晶片120之上,並且量子點薄膜140設置於透明阻隔層130之上,使得發光二極體晶片120與量子點薄膜140之間被透明阻隔層130隔開。因此,當發光二極體晶片120通電發光時,發光二極體晶片120產生的高溫不會直接影響到量子點薄膜140。具體而言,量子點薄膜140的厚度介於20~200μm之間,材質可為光硬化膠混合奈米粒子等可以透過點膠、噴塗方式塗佈的膠材。透明阻隔層130的厚度介於20~200μm之間,其材質可為光硬化膠等可以透過點膠、噴塗方式塗佈的膠材,而具有低熱傳導係數。透明阻隔層130可以在發光二極體晶片120表面與量子點薄膜140之間形成較高的溫度差,進而避免量子點薄膜140的下表面直接承受發光二極體晶片120的高溫,減緩量子點薄膜140因為受熱發生的降解(degrade)。As shown in FIGS. 1 , 3 and 4 , the
如圖1所示,透明保護層150設置於量子點薄膜140之上,使得量子點薄膜140被包覆於透明阻隔層130與透明保護層150之間,形成三明治夾層結構。透明保護層150進一步隔絕量子點薄膜140與外界空氣的接觸,避免空氣中水分或氧氣造成量子點薄膜140降解。As shown in FIG. 1 , the transparent
具體而言,透明保護層150材質可為純有機材質,例如PE,或是可以透過點膠、噴塗快速塗佈的膠材,並且厚度介於20~200μm之間。透明保護層150的有機材質中也可以進一步混合奈米級無機粉末,例如SiO2、TiO2或Al2O3,以提升透明保護層150的剛性與氣體阻隔性能,並且調整透明保護層150的光學特性。此外,透明保護層150也可以是無機材質的鍍膜,例如透過原子層沉積(atomic layer deposition, ALD)形成Al2O3等無機材質形成的鍍膜,並且厚度介於10~500nm之間。具體而言,透明保護層150適用於包覆、覆蓋量子點薄膜140,隔絕量子點薄膜140與外界空氣的接觸,因此不限定透明保護層150材質或設置方式,只要能達成隔絕量子點薄膜140與外界空氣的接觸即可。Specifically, the material of the transparent
如圖5所示,此外,透明保護層150也可以是由不同材料構成的多層結構,例如先以點膠形成一無機材質的第一透明保護層,再透過ALD形成的Al2O3鍍膜於第一透明保護層之上形成第二透明阻隔層。As shown in FIG. 5 , in addition, the transparent
如圖1所示,第一實施例的發光裝置100可進一步包含一支架160。支架160可為有基材質,例如環氧樹脂所製成,也可以是金屬材質所製成。支架160包含一底部與延伸於底部邊緣的側部。側部可環繞於底部,使得底部與側部之間形成容置空間。底部用於設置於基底層110之上,而發光二極體晶片120固定於底部,使得發光二極體晶片120間接地透過支架160固定於基底層110。透明阻隔層130、量子點薄膜140以及透明保護層150則依序設置於發光二極體晶片120之上並且位於容置空間中。由於底部與側部形成具有容置空間的容器型態,因此透明阻隔層130、量子點薄膜140以及透明保護層150都可以透過點膠作業設置於容置空間中。在批量化生產發光裝置100裝置時,多個支架160可以在基底層110上以陣列化排列,點膠作業可以透過多個陣列化排列的點膠噴嘴同時作業,而同時在多個支架160依序注入形成透明阻隔層130、量子點薄膜140以及透明保護層150的膠材,而達成批量化生產的效果。As shown in FIG. 1 , the light-
如圖1至圖6所示,基於上述具有量子點的發光裝置100,本新型第一實施例進一步提提出一種發光裝置的製造方法。As shown in FIGS. 1 to 6 , based on the above-mentioned light-emitting
如圖2與圖6所示,製造方法先提供一或多個發光二極體晶片120,並將發光二極體晶片120設置於基底層110上,如步驟S110所示。As shown in FIGS. 2 and 6 , the manufacturing method first provides one or more light-emitting
具體而言,步驟S110還可以細分為多個次步驟。首先,先提供一或多個支架160,並將支架160設置於基底層110上,如步驟S112所示。接著,將發光二極體晶片120固定於支架160的底部,如步驟S114所示。Specifically, step S110 can also be subdivided into multiple sub-steps. First, one or
步驟S112與步驟S114的順序並無限制,只要能透過支架160間接地設置發光二極體晶片120於基底層110之上即可。因此,在步驟S110中,也可以是先進行步驟S114,將發光二極體晶片120固定於底部,接著再進行步驟S112,將支架160設置於基底層110上。The order of steps S112 and S114 is not limited, as long as the light-emitting
如圖3與圖6所示,接著,於支架160的容置空間進行點膠,注入形成透明阻隔層130的膠材,經過膠材固化後形成覆蓋於發光二極體晶片120之上的透明阻隔層130,如步驟S120所示。As shown in FIGS. 3 and 6 , glue is then dispensed into the accommodation space of the
如圖4與圖6所示,於支架160的容置空間進行點膠,注入形成量子點薄膜140的膠材,經過膠材固化後形成設置於透明阻隔層130之上的量子點薄膜140,如步驟S130所示。As shown in Figures 4 and 6, glue is dispensed in the accommodation space of the
如圖1與圖6所示,最後,於支架160的容置空間進行點膠,注入形成透明保護層150的膠材,經過膠材固化後形成設置於量子點薄膜140之上的透明保護層150,使得量子點薄膜140被包覆於透明阻隔層130與透明保護層150之間,如步驟S140所示。As shown in FIGS. 1 and 6 , finally, glue is dispensed into the accommodation space of the
如圖5所示,步驟S140可以執行多次,分別使用相同或不同的膠材,而形成多層結構的透明保護層150。As shown in FIG. 5 , step S140 can be performed multiple times using the same or different glue materials to form a multi-layer transparent
此外,如圖7所示,步驟S130至步驟S140也可以循環執行多次,亦即反覆在透明保護層150再設置量子點薄膜140,然後於量子點薄膜140上設置透明保護層150,使得透明阻隔層130上方有多層附加的量子點薄膜140以及多層附加的透明保護層150,進一步每一個附加的量子點薄膜140都被包覆在兩個附加的透明保護層150之間。每一個附加的量子點薄膜140都可以配置有不同的激發光譜,而使得發光裝置100最終發出的光譜符合需求。In addition, as shown in FIG. 7 , steps S130 to S140 can also be executed multiple times in a loop, that is, repeatedly setting the
請參閱圖8至圖15所示,為本新型第二實施例所所揭露的一種具有量子點的發光裝置100以及發光裝置的製造方法。根據第二實施例的發光裝置的製造方法,省略了支架160的設置,並且透過不同於點膠的方式達成批量化生產。Please refer to FIGS. 8 to 15 , which illustrate a light-emitting
如圖8、圖9與圖15所示,製造方法先提供一或多個發光二極體晶片120,並將發光二極體晶片120設置於基底層110上,如步驟S210所示。於此實施例中,基底層110為離型膜,並且基底層110將於後續的步驟中撥離。多個發光二極體晶片120可透過Pick and Place程序 (P & P) 設置於基底層110上。As shown in FIGS. 8 , 9 and 15 , the manufacturing method first provides one or more light-emitting
如圖10與圖15所示,接著,對基底層110的上表面進行噴塗、鍍膜、模造(Molding)等程序,使透明阻隔層130覆蓋於發光二極體晶片120以及基底層110之上,如步驟S220所示。As shown in FIGS. 10 and 15 , processes such as spraying, coating, and molding are then performed on the upper surface of the
如圖11與圖15所示,進一步地再對透明阻隔層130的進行噴塗、鍍膜、模造等程序,使量子點薄膜140覆蓋於透明阻隔層130之上,如步驟S230所示。As shown in FIGS. 11 and 15 , the
如圖12與圖15所示,對量子點薄膜140進行噴塗、鍍膜、模造等程序,使透明保護層150覆蓋於量子點薄膜140之上,如步驟S240所示。As shown in FIGS. 12 and 15 , processes such as spraying, coating, and molding are performed on the
如同第一實施例,步驟S240可以執行多次,分別使用相同或不同的材料進行噴塗、鍍膜、模造等程序,而形成多層結構的透明保護層150。或是,此外,步驟S230至步驟S240循環執行多次,使得透明阻隔層130上方有多層附加的量子點薄膜140以及多層附加的透明保護層150。Like the first embodiment, step S240 can be performed multiple times, using the same or different materials for spraying, coating, molding and other processes to form the transparent
如圖13與圖15所示,接著,剝離基底層110,對透明阻隔層130、量子點薄膜140以及透明保護層150執行切割程序,形成多個分別包含一個發光二極體晶片120的發光裝置100,如步驟S250所示。切割程序可為水刀切割或雷射切割。As shown in FIG. 13 and FIG. 15 , then, the
如圖14與圖15所示,最後,執行Pick and Place程序 (P & P),將多個發光裝置100固定於一固定基板170,例如背光模組基板,而成具有多個發光裝置100的一發光模組,如步驟S260所示。As shown in FIGS. 14 and 15 , finally, the Pick and Place process (P & P) is executed to fix multiple light-emitting
透過本新型提出的發光裝置100與其製造方法,量子點薄膜140是被夾持、包覆於透明阻隔層130與透明保護層150之間。量子點薄膜140不會直接接觸發光二極體晶片120的高溫表面,也隔絕於外界空氣。因此,本新型的發光裝置100可以有效地減緩量子點薄膜140的材質降解,延長發光裝置100的壽命。同時,本新型提出的製造方法,也可以批量化生產發光裝置100,維持需要的產能。Through the light-emitting
100:發光裝置 110:基底層 120:發光二極體晶片 130:透明阻隔層 140:量子點薄膜 150:透明保護層 160:支架 170:固定基板 S110~S140:步驟 S210~S250:步驟 100:Lighting device 110: Basal layer 120:LED chip 130:Transparent barrier layer 140:Quantum dot film 150:Transparent protective layer 160:Bracket 170: Fixed base plate S110~S140: steps S210~S250: steps
圖1是本新型第一實施例中,具有量子點的發光裝置的剖面示意圖。 圖2至圖4是本新型第一實施例中,具有量子點的發光裝置的半成品的剖面示意圖。 圖5是本新型第一實施例的一變化例中,具有量子點的發光裝置的剖面示意圖。 圖6是本新型第一實施例中,發光裝置的製造方法的流程圖。 圖7是本新型第一實施例的另一變化例中,具有量子點的發光裝置的剖面示意圖。 圖8至圖13是本新型第二實施例中,具有量子點的發光裝置的半成品的剖面示意圖。 圖14是本新型第二實施例中,具有量子點的發光裝置的剖面示意圖。 圖15是本新型第一實施例中,發光裝置的製造方法的流程圖。 Figure 1 is a schematic cross-sectional view of a light-emitting device with quantum dots in the first embodiment of the present invention. 2 to 4 are schematic cross-sectional views of a semi-finished product of a light-emitting device with quantum dots in the first embodiment of the present invention. FIG. 5 is a schematic cross-sectional view of a light-emitting device with quantum dots in a variation of the first embodiment of the present invention. FIG. 6 is a flow chart of a manufacturing method of a light-emitting device in the first embodiment of the present invention. 7 is a schematic cross-sectional view of a light-emitting device with quantum dots in another variation of the first embodiment of the present invention. 8 to 13 are schematic cross-sectional views of a semi-finished product of a light-emitting device with quantum dots in the second embodiment of the present invention. Figure 14 is a schematic cross-sectional view of a light-emitting device with quantum dots in the second embodiment of the present invention. FIG. 15 is a flow chart of a manufacturing method of a light-emitting device in the first embodiment of the present invention.
100:發光裝置 100:Lighting device
110:基底層 110: Basal layer
120:發光二極體晶片 120:LED chip
130:透明阻隔層 130:Transparent barrier layer
140:量子點薄膜 140:Quantum dot film
150:透明保護層 150:Transparent protective layer
160:支架 160:Bracket
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