TWM642342U - Device for manufacturing vapor chamber - Google Patents

Abstract

The present invention relates to a device for manufacturing a uniform temperature plate, which includes a base, a support rod, a bearing platform, a pressure plate and an actuating assembly. The base includes a refractory component, and the refractory component is provided with a through hole; The platform is used for setting the equal temperature plate, and the supporting platform is set above the refractory component and is movably connected to the support rod; the pressure plate is fixed on the end of the support rod away from the refractory component, and is configured corresponding to the supporting platform; the actuating component It is fixed on the base and includes a push rod, which passes through the through hole and connects with the bearing platform. In this way, the airtight sealing of the vapor chambers during the bonding process can be ensured, thereby improving the production yield of finished products.

Description

Manufacture of the vapor chamber device

The invention relates to the technical field of manufacturing a uniform temperature plate, in particular to a device for manufacturing a uniform temperature plate.

In order to solve the heat dissipation problem of the electronic components in the computer, the industry has successively developed related products such as Vapor Chamber (VC) with high heat conduction performance, light weight and wide coverage area, and it has gradually become an electronic component. The mainstream component of heat conduction and heat dissipation.

The existing vapor chamber mainly includes a lower shell seat, an upper shell cover, a capillary tissue and a working fluid. The capillary tissue is laid on the inner surface of the upper shell cover and the lower shell seat, and the upper shell cover is sealed corresponding to the lower shell seat. , the working fluid is filled in the cavity surrounded by the upper case cover and the lower case seat. Among them, the combination of capillary tissue and upper shell cover, capillary tissue and lower shell seat, and upper shell cover and lower shell seat is mostly achieved through a heating process; especially the combination of upper shell cover and lower shell seat is related to the production process. The quality of the finished product.

In the existing manufacturing of vapor chamber devices, most of the upper shell covers correspond to the lower shell seats for covering, and then they are sent into the kiln equipment for heating and bonding. After the heating is completed, each vapor chamber is removed from the kiln equipment. Wherein, the junction of the upper casing cover and the lower casing seat of the chamber is often poorly bonded. Therefore, how to improve the production yield of the chamber has become a problem to be solved by the applicant.

In view of this, the inventor of the present invention aimed at the deficiency of the above-mentioned prior art, devoted himself to research and cooperated with the application of theories, and tried his best to solve the above-mentioned problems, which became the goal of the inventor of the present invention to improve.

One purpose of the present invention is to provide a device for manufacturing a vapor chamber, which can ensure the tightness and sealing of the vapor chamber during the bonding process, thereby improving the production yield of the finished product.

In order to achieve the above purpose, the present invention provides a device for manufacturing a vapor chamber, which includes a base, a plurality of support rods, a bearing platform, a pressure plate and an actuation assembly. The base includes a refractory component, and the refractory component There is a through hole; each of the support rods is arranged on the refractory member at intervals; the receiving platform is provided for the temperature chamber, and the receiving platform is arranged above the refractory member and is movably connected to each of the supporting members. Rod; the pressing plate is fixed on one end of each of the poles away from the refractory component, and is configured corresponding to the bearing table; the actuating assembly is fixed on the base, and the actuating assembly includes a push rod, and the push rod is The through hole is pierced and connected to the receiving platform; wherein the receiving platform is pushed to move through the push rod, and the temperature uniform plate will be clamped between the receiving platform and the pressing plate for bonding processing.

The present invention also has the following effects. With the installation of each manufacturing vapor chamber device, it can not only reduce the heat energy consumption of the kiln equipment, but also improve the overall production efficiency.

The detailed description and technical content of the new model are described below with the accompanying drawings, but the attached drawings are only for reference and illustration, and are not used to limit the new model.

Please refer to Fig. 1, the present invention provides a manufacturing vapor chamber device, which is mainly used for combined processing of batch-produced vapor chambers 9, the manufacturing vapor chamber device 1 mainly includes a base 10, a plurality of branches The rod 20 , a supporting platform 30 , a pressing plate 40 and an actuating component 50 .

The base 10 mainly includes a platform 11, a refractory component 12 and a support frame 13. The refractory component 12 is arranged on the platform 11, and it is roughly a stepped cylinder, and is composed of stacked refractory bricks and other materials. 11 and the intermediate position of the refractory member 12 is provided with a through hole 14 . The support frame 13 is fixed on the platform 11 and formed at the lower position thereof, and a plurality of rollers 131 are installed at the bottom of the support frame 13 to facilitate movement.

Each strut 20 is vertically arranged on the refractory member 12 at intervals, and the strut 20 in this embodiment is a screw.

The receiving platform 30 is for placing the equal temperature plate 9, and it is made of materials such as graphite, and is roughly a circular plate body. A plurality of perforations 31 are arranged at intervals on the inner side of the peripheral edge of the receiving platform 30, and each perforation 31 is sleeved corresponding to each of the aforementioned struts 20 , so that the receiving platform 30 is formed above the refractory member 12 , and the receiving platform 30 can move linearly in the up and down direction relative to each of the supporting rods 20 .

The pressing plate 40 is also made of graphite and is a circular plate body. The pressing plate 40 is fixed on the end of each strut 20 away from the refractory member 12 and is arranged corresponding to the receiving platform 30 .

The actuating assembly 50 can be a hydraulic cylinder, which mainly includes a lower seat 51 and a push rod 52, the lower seat 51 is fixed on the support frame 13 of the base 10, and one end of the push rod 52 is connected to the lower seat 51 and can be relatively The lower seat 51 moves linearly, and the other end of the push rod 52 passes through the aforementioned through hole 14 and is connected to the receiving platform 30 .

The device for manufacturing a vapor chamber of the present invention also includes a cover body 60 , which is covered on the base 10 , and the receiving platform 30 , the pressure plate 40 and the temperature chamber 9 are formed inside the cover body 60 .

See also shown in Fig. 2 to Fig. 5, wherein the manufacturing method of vapor chamber comprises:

a) Provide at least one vapor chamber manufacturing device 1, a kiln equipment 8 and multiple vapor chambers 9, the manufacturing vapor chamber device 1 includes a base 10, a receiving platform 30, a pressure plate 40 and an actuating component 50. The kiln equipment 8 includes a heating chamber 81 and a lifting mechanism 82; in this step, please refer to FIG. After completing the combination processing of the batch of vapor chambers 9, drag the manufacturing vapor chamber device 1 and each vapor chamber 9 away from the kiln equipment 8 for cooling, and place another batch of vapor chambers 9 and manufacturing vapor chambers The device 1 is moved to the kiln equipment 8 to continue the combined processing, so it can not only reduce the heat energy consumption of the kiln equipment 8, but also improve the overall production efficiency.

Each vapor chamber manufacturing apparatus 1 includes the features of the previous embodiments. The furnace equipment 8 mainly includes a heating chamber 81 , a lifting mechanism 82 and other electric control systems (not shown in the figure), and the lifting mechanism 82 is formed at a position below the heating chamber 81 .

b) Place the vapor chambers 9 on top of each other and place them on the platform 30; in this step, please refer to Fig. 1 and Fig. 3 together, each vapor chamber 9 mainly includes a lower shell seat 91 and an upper case cover 92, a copper paste (not shown) is coated on the sealing position of the upper case cover 92 and the lower case seat 91, and each upper case cover 92 is aligned with each lower case seat 91 to do Covering, the first time the temperature chambers 9 are stacked on each other and then placed on the supporting platform 30 .

c) Provide a cover body 60, cover the cover body 60 on the base 10, and form the receiving platform 30, the pressure plate 40 and each of the uniform temperature plates 9 inside the cover body 60; In this step, please refer to Fig. 3 as well, the cover body 60 is a cylinder, and has a single opening, and covers it on the base 10 with its opening cover, and makes the receiving platform 30, the pressure plate 40 and each even The warm plate 9 is formed inside the housing 60 . Through the rollers 131 of the supporting frame 13 of the base 10 , the manufacturing chamber device 1 can be moved to the top of the lifting mechanism 82 and aligned with the heating chamber 81 .

d) Use the lifting mechanism 82 to move the manufacturing vapor chamber device 1 toward the heating chamber 81; in this step, please refer to FIG. 4, and use the lifting mechanism of the lifting mechanism 82 to move The vapor chamber manufacturing device 1 is moved in toward the heating chamber 81 , so that each vapor chamber 9 can be heated by the heating chamber 81 .

e) Using the actuating assembly 50 to push the receiving platform 30 to move, each of the temperature chambers 9 will be clamped between the receiving platform 30 and the pressing plate 40 for bonding processing. In this step, please also refer to FIG. 5 , when the copper paste of each vapor chamber 9 is heated and melted, the push rod 52 of the actuator assembly 50 is used to push the receiving platform 30 toward the pressure plate 40 direction movement, each temperature chamber 9 will be clamped between the receiving platform 30 and the pressing plate 40 for bonding processing.

To sum up, this new type of manufacturing uniform temperature plate device can indeed achieve the expected purpose of use, and solve the lack of conventional knowledge, and because it is very novel and progressive, it fully meets the requirements for new patent applications, and the application is filed in accordance with the Patent Law. , please investigate and grant the patent of this case to protect the rights of new creators.

1: Manufacture vapor chamber device 10: base 11: Platform 12: Refractory components 13: support frame 131:Roller 14: Through hole 20: pole 30: Stand 31: perforation 40: Resisting plate 50: actuation assembly 51: take a seat 52: putter 60: Cover body 8: Kiln equipment 81: Heating chamber 82: Lifting mechanism 9: Vapor plate 91: Lower shell seat 92: Upper case cover a~e: steps

Fig. 1 is a sectional view of the combination of the device for manufacturing the vapor chamber of the present invention.

Fig. 2 is the flow chart of the block for manufacturing the equal temperature plate of the present invention.

Fig. 3 is a cross-sectional view (1) of the use state of the new-type manufacturing chamber device and kiln equipment.

Fig. 4 is a sectional view (2) of the use state of the new-type manufacturing chamber device and kiln equipment.

Fig. 5 is a sectional view (3) of the use state of the new-type manufacturing vapor chamber device and kiln equipment.

1: Manufacture vapor chamber device

10: base

11: Platform

12: Refractory components

13: support frame

131:Roller

14: Through hole

20: pole

30: Stand

31: perforation

40: Resisting plate

50: actuation assembly

51: take a seat

52: putter

60: Cover body

9: Vapor plate

91: Lower shell seat

92: Upper case cover

Claims (8)

A device for manufacturing a vapor chamber, comprising: A base, including a refractory component, the refractory component is provided with a through hole; A plurality of struts are arranged at intervals on the refractory component; a supporting platform for setting the vapor chamber, the supporting platform is arranged above the refractory component and is movably connected to each of the support rods; a pressure plate, fixed on one end of each of the poles away from the refractory component, and arranged corresponding to the bearing platform; and An actuation assembly, fixed on the base, the actuation assembly includes a push rod, the push rod passes through the through hole and connects to the bearing platform; Wherein, the receiving platform is pushed to move through the push rod, and the temperature uniform plate will be clamped between the receiving platform and the pressing plate for joint processing. The device for manufacturing a vapor chamber according to claim 1, further comprising a cover body, the cover system is covered on the base, and the platform, the pressure plate and the temperature chamber are formed on the base Inside the cover. The manufacture of the vapor chamber device as described in Claim 1, wherein a plurality of perforations are provided on the periphery of the platform, and each of the support rods is corresponding to each of the perforations. The device for manufacturing a vapor chamber as described in Claim 1, wherein both the receiving platform and the pressing plate are a graphite element, and the support rod is a screw rod. The manufacture of a vapor chamber device as described in claim 1, wherein the actuating component is a hydraulic cylinder. The manufacture of the vapor chamber device as described in Claim 1, wherein the base further includes a platform and a support frame, the refractory component is arranged on the platform, and the support frame is fixed on the platform and formed below it. The manufacture of the vapor chamber device as described in Claim 6, wherein a plurality of rollers are provided at the end of the support frame away from the platform. The manufacture of the vapor chamber device as claimed in claim 6, wherein the actuating assembly further includes a lower seat, and the lower seat is fixed on the supporting frame.

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