TWM632701U - Spot type atmospheric pressure plasma device - Google Patents
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本揭露是有關於一種電漿技術,且特別是有關於一種點狀式大氣電漿裝置。The present disclosure relates to a plasma technology, and in particular to a point-type atmospheric plasma device.
大氣電漿係於一大氣壓或接近一大氣壓之狀態下所產生的電漿。大氣電漿系統因無真空設備,可對工件進行連續處理,因此相較於真空電漿系統,大氣電漿系統在設備與製程成本上均較具優勢。Atmospheric plasma is plasma produced at or near atmospheric pressure. Since the atmospheric plasma system has no vacuum equipment, the workpiece can be processed continuously. Therefore, compared with the vacuum plasma system, the atmospheric plasma system has advantages in terms of equipment and process costs.
依照電漿形式的不同,大氣電漿大致可分為電暈(corona)放電、介電質放電(dielectric barrier discharge,DBD)、噴射電漿(Plasma jet)、以及電漿火炬(Plasma torch)等。介電質放電技術因放電的氣體溫度接近於室溫,可避免浪費能量於升高氣體溫度,而受到注目。然而,介電質放電技術所產生之電漿密度低,電漿清除效率不高。According to the different forms of plasma, atmospheric plasma can be roughly divided into corona discharge, dielectric barrier discharge (DBD), plasma jet (Plasma jet), and plasma torch (Plasma torch), etc. . The dielectric discharge technology has attracted attention because the discharge gas temperature is close to room temperature, which can avoid wasting energy in raising the gas temperature. However, the plasma density generated by the dielectric discharge technology is low, and the plasma removal efficiency is not high.
因此,本揭露之一目的就是在提供一種點狀式大氣電漿裝置,其氣體流道可將工作氣體直接引導到介電層之底部之中央區的電漿噴射口。藉此,大部分之工作氣體可在電漿噴射口附近才解離而形成電漿。因此,可大幅減少電漿在金屬外殼之內部空間內形成,不僅可避免功率不必要的浪費,更可使電漿較集中且較接近待處理工件,進而可提升電漿處理效果。Therefore, an object of the present disclosure is to provide a point-type atmospheric plasma device, the gas channel of which can directly guide the working gas to the plasma injection port in the central area of the bottom of the dielectric layer. In this way, most of the working gas can be dissociated near the plasma injection port to form plasma. Therefore, the formation of plasma in the inner space of the metal shell can be greatly reduced, which can not only avoid unnecessary waste of power, but also make the plasma more concentrated and closer to the workpiece to be treated, thereby improving the plasma treatment effect.
本揭露之另一目的是在提供一種點狀式大氣電漿裝置,其氣體流道的出口段可穿設於金屬電極中,因此可避免電漿在氣體流道之出口段形成,而可進一步降低功率不必要的浪費,使電漿更加集中。故,電漿處理可更為聚焦,避免損及非處理區。Another object of the present disclosure is to provide a point-type atmospheric plasma device, the outlet section of the gas flow channel can be pierced in the metal electrode, so that the formation of plasma at the outlet section of the gas flow channel can be avoided, and further Reduce unnecessary waste of power and make plasma more concentrated. Therefore, plasma treatment can be more focused, avoiding damage to non-treated areas.
本揭露之又一目的是在提供一種點狀式大氣電漿裝置,其可利用密封環環繞抵靠介電層之外側面,以密封金屬外殼之腔室,因此可更有效地避免電漿於腔室內形成。Another object of the present disclosure is to provide a point-type atmospheric plasma device, which can use a sealing ring to surround the outer side of the dielectric layer to seal the cavity of the metal casing, so that the plasma can be more effectively avoided. formed in the chamber.
本揭露之再一目的是在提供一種點狀式大氣電漿裝置,其氣體通道之出口段包含徑向尺寸較小的縮減部鄰近出口。由於氣體在縮減部時可先被壓縮,於出口處再被膨脹,而可使出口處的氣壓略低於大氣壓,因此有利於放電來將工作氣體解離成電漿。Another object of the present disclosure is to provide a point-type atmospheric plasma device, the outlet section of the gas channel includes a reduced portion with a smaller radial dimension adjacent to the outlet. Because the gas can be compressed first at the constriction part and then expanded at the outlet, the pressure at the outlet can be slightly lower than the atmospheric pressure, so it is beneficial for the discharge to dissociate the working gas into plasma.
本揭露之再一目的是在提供一種點狀式大氣電漿裝置,其金屬外殼可包含氣簾裝置,而可在電漿噴射口之外圍形成氣簾,可進一步侷限電漿之範圍,因此可更有效避免電漿損及非處理區。Another object of the present disclosure is to provide a point-type atmospheric plasma device, the metal casing of which can include a gas curtain device, and can form a gas curtain around the plasma injection port, which can further limit the range of plasma, so it can be more effective Avoid plasma damage to non-treated areas.
根據本揭露之上述目的,提出一種點狀式大氣電漿裝置。此點狀式大氣電漿裝置包含金屬外殼、金屬電極、介電層、以及氣體通道。金屬外殼具有內部空間。金屬電極設於內部空間中。介電層設於內部空間中且包圍金屬電極之外側面。介電層之底部之中央區具有電漿噴射口,金屬電極之底部鄰接此電漿噴射口。氣體通道包含第一段、第二段、以及第三段。第一段穿過金屬外殼與介電層。第二段與第一段相接,且延伸在介電層與金屬電極之外側面之間。第三段與第二段相接,且配置以將工作氣體導引至電漿噴射口。According to the above purpose of the present disclosure, a point-type atmospheric plasma device is proposed. The point-type atmospheric plasma device includes a metal casing, metal electrodes, dielectric layers, and gas channels. The metal case has an interior space. The metal electrodes are disposed in the inner space. The dielectric layer is disposed in the inner space and surrounds the outer side of the metal electrode. The central area of the bottom of the dielectric layer has a plasma injection port, and the bottom of the metal electrode is adjacent to the plasma injection port. The gas passage includes a first section, a second section, and a third section. The first section passes through the metal case and the dielectric layer. The second segment is connected to the first segment and extends between the dielectric layer and the outer side of the metal electrode. The third section connects with the second section and is configured to guide the working gas to the plasma injection port.
依據本揭露之一實施例,上述之第三段從金屬電極之外側面穿入金屬電極,且從金屬電極之內部延伸至金屬電極之底部。According to an embodiment of the present disclosure, the above-mentioned third segment penetrates into the metal electrode from the outer side of the metal electrode, and extends from the inside of the metal electrode to the bottom of the metal electrode.
依據本揭露之一實施例,上述之第三段包含橫部以及縱部。橫部橫向貫穿金屬電極。縱部從橫部縱向延伸至金屬電極之底部。According to an embodiment of the present disclosure, the above-mentioned third segment includes a horizontal portion and a vertical portion. The transverse part traverses through the metal electrode. The vertical part extends longitudinally from the horizontal part to the bottom of the metal electrode.
依據本揭露之一實施例,上述之點狀式大氣電漿裝置更包含密封環,其中金屬電極更包含凹槽設於金屬電極之外側面中,且凹槽位於橫部之下方,密封環設於凹槽中並抵靠介電層。According to an embodiment of the present disclosure, the above-mentioned point-type atmospheric plasma device further includes a sealing ring, wherein the metal electrode further includes a groove disposed on the outer side of the metal electrode, and the groove is located below the horizontal portion, and the sealing ring is provided in the groove and against the dielectric layer.
依據本揭露之一實施例,上述之第三段包含依序接合之第一部分、第二部分、以及第三部分,氣體通道之出口位於第三部分。第二部分之徑向尺寸小於第一部分之徑向尺寸與第三部分之徑向尺寸。According to an embodiment of the present disclosure, the above-mentioned third section includes a first part, a second part, and a third part joined in sequence, and the outlet of the gas channel is located in the third part. The radial dimension of the second portion is smaller than the radial dimension of the first portion and the radial dimension of the third portion.
依據本揭露之一實施例,上述之第二段包含數個螺旋槽螺設於金屬電極之外側面中,以順著金屬電極之外側面將工作氣體導引至第三段。According to an embodiment of the present disclosure, the above-mentioned second section includes several helical grooves threaded in the outer side of the metal electrode, so as to guide the working gas to the third section along the outer side of the metal electrode.
依據本揭露之一實施例,上述之金屬電極包含互相接合之第一部分與第二部分,第二段介於第一部分與介電層之間,第三段介於第二部分與介電層之間,其中第一部分之徑向尺寸大於第二部分之徑向尺寸。According to an embodiment of the present disclosure, the above-mentioned metal electrode includes a first part and a second part joined to each other, the second part is between the first part and the dielectric layer, and the third part is between the second part and the dielectric layer Between, wherein the radial dimension of the first part is larger than the radial dimension of the second part.
依據本揭露之一實施例,上述之金屬電極更包含第三部分接合於第一部分上,其中第三部分之徑向尺寸小於第一部分之徑向尺寸。According to an embodiment of the present disclosure, the aforementioned metal electrode further includes a third portion bonded to the first portion, wherein the radial dimension of the third portion is smaller than the radial dimension of the first portion.
依據本揭露之一實施例,上述之金屬外殼更包含氣簾裝置。此氣簾裝置鄰設於電漿噴射口,且配置以在電漿噴射口之外圍形成氣簾。According to an embodiment of the present disclosure, the metal casing further includes an air curtain device. The air curtain device is adjacent to the plasma injection port and configured to form an air curtain around the plasma injection port.
依據本揭露之一實施例,上述之氣簾裝置為抽氣裝置或進氣裝置。According to an embodiment of the present disclosure, the above-mentioned air curtain device is an air suction device or an air intake device.
請參照圖1,其中圖1係繪示依照本揭露之一實施方式的一種點狀式大氣電漿裝置的剖面示意圖。點狀式大氣電漿裝置100可為介電質放電大氣電漿裝置。點狀式大氣電漿裝置100因其電漿較為集中,而可適用於工件之清潔與蝕刻。點狀式大氣電漿裝置100主要可包含金屬外殼110、金屬電極120、介電層130、以及氣體通道140。Please refer to FIG. 1 , wherein FIG. 1 is a schematic cross-sectional view of a point-type atmospheric plasma device according to an embodiment of the present disclosure. The point-type
金屬外殼110之形狀可根據製程或環境需求而設計。舉例而言,金屬外殼110可為長方形體、正方形體、或圓柱體的中空殼體。如圖1所示,金屬外殼110具有內部空間112。腔室112之內部空間112可容納金屬電極120與介電層130。此外,氣體通道140之主要部分位於內部空間112中。The shape of the
金屬電極120可為長柱狀結構。舉例而言,金屬電極120可為類圓柱狀結構。金屬電極120設於金屬外殼110之內部空間112中。在一些實施例中,金屬電極120可順著金屬外殼110之高度方向HD設置,即金屬電極120之長度方向LD實質平行金屬外殼110之高度方向HD。金屬電極120具有彼此相對之頂部120a與底部120b、以及接合在頂部120a與底部120b之間的外側面120c。金屬電極120之頂部120a與金屬外殼110接合。金屬電極120之材料可為任意適合的金屬,例如不鏽鋼、鋁、與鉑。The
介電層130同樣設於金屬外殼110之內部空間112中,且包圍金屬電極120之外側面120c。因此,介電層130可為中空柱狀結構,而金屬電極120穿設在介電層130中。介電層130具有底部130a。在此實施方式中,如圖1所示,介電層130之底部130a之中央區130c設有電漿噴射口132,且金屬電極120之底部120b鄰接電漿噴射口132。在此實施方式中,介電層130亦包覆金屬電極120之底部120b的外周緣。即,介電層130之底部130a延伸在金屬電極120之底部120b的外周緣的下方,使得金屬電極120位於介電層130之底部130a之上。在金屬電極120為類圓柱結構之實施例中,介電層130可為圓管結構,例如石英圓管。The
氣體通道140可將工作氣體從點狀式大氣電漿裝置100外,經由金屬外殼110、介電層130、與金屬電極120,而導引至介電層130之電漿噴射口132。在一些實施例中,如圖1所示,氣體通道140包含第一段142、第二段144、以及第三段146。第一段142可從金屬外殼110之外側面例如橫向穿過金屬外殼110與介電層130。第二段144與第一段142相連接,而與第一段142流體連通。第二段144可從第一段142向下縱向延伸在介電層130與金屬電極120之外側面120c之間。第三段146與第二段144相連接,而與第二段144流體連通。亦即,第一段142、第二段144、與第三段146依序接合。氣體通道140之出口140a位於第三段146之末端。第三段146位於電漿噴射口132之上方,而可將氣體通道140內之工作氣體導引至電漿噴射口132。The
請同時參照圖1與圖2A,其中圖2A係繪示依照本揭露之一實施方式的一種點狀式大氣電漿裝置的金屬電極的剖面示意圖。在本實施方式中,氣體通道140之第三段146從金屬電極120之外側面120c穿入金屬電極120,並進一步從金屬電極120之內部向下縱向延伸至金屬電極120之底部120b。在一些實施例中,如圖2A所示,第三段146包含橫部146a與縱部146b。橫部146a可從金屬電極120之外側面120c橫向貫穿金屬電極120。縱部146b之頂面可與橫部146a相接,且可從橫部146a向下縱向延伸至金屬電極120之底部120b。舉例而言,縱部146b可例如接合在橫部146a之中間區域,使得縱部146b與橫部146a之剖面形狀呈類T字型。Please refer to FIG. 1 and FIG. 2A at the same time, wherein FIG. 2A is a schematic cross-sectional view of a metal electrode of a point-type atmospheric plasma device according to an embodiment of the present disclosure. In this embodiment, the
在一些實施例中,如圖1與圖2A所示,點狀式大氣電漿裝置100更包含密封環150。此外,金屬電極120更包含凹槽122。此凹槽122凹設於金屬電極120之外側面120c中,且凹槽122位於橫部146a之下方。密封環150設於此凹槽122中,並抵靠介電層130。也就是說,密封環150環設於金屬電極120之外側面120c中,且夾設在金屬電極120與介電層130之間。藉此,密封環150可封住第二段144之一端,避免工作氣體從第二段144之此端流出。如此一來,可迫使第二段144內的工作氣體朝密封環150上方之第三段146的橫部146a流動,以使得工作氣體可進一步經由縱部146b的導引而流到縱部146b之下方的電漿噴射口132。In some embodiments, as shown in FIGS. 1 and 2A , the point-type
透過氣體通道140,可將工作氣體直接導引至鄰近電漿噴射口132之金屬電極120的底部120b,藉此可使工作氣體集中在電漿噴射口132附近才放電解離成電漿。因此,可使電漿更為聚焦,所形成之電漿更接近待處理工件,且使得電漿能量可侷限在較小的區域,進而可準確也有效率地蝕刻工件之材料或去除工件上之汙染物。Through the
請參照圖2B,其係繪示依照本揭露之一實施方式的另一種點狀式大氣電漿裝置的金屬電極的剖面示意圖。金屬電極120’之結構與上述金屬電極120之結構大致相同。金屬電極120’與120之間的差異在於金屬電極120’內之氣體通道的第三段146’不同於金屬電極120的第三段146。Please refer to FIG. 2B , which is a schematic cross-sectional view of a metal electrode of another point-type atmospheric plasma device according to an embodiment of the present disclosure. The structure of the metal electrode 120' is substantially the same as that of the above-mentioned
第三段146’之縱部146b’包含依序接合之第一部分p1、第二部分p2、以及第三部分p3。具體而言,第二部分p2介於第一部分p1與第三部分p3之間,且第二部分p2的相對二端分別與該第一部分p1及第三部分p3接合。出口140a位於第三部分p3。第二部分p2之徑向尺寸小於第一部分p1之徑向尺寸,也小於第三部分p3之徑向尺寸。The
工作氣體從第一部分p1流入第二部分p2時,因第二部分p2的徑向尺寸較小而受到壓縮。工作氣體接著從第二部分p2流入第三部分p3時,因第三部分p3之徑向尺寸大於第二部分p2而產生膨脹效果。如此一來,可使第三部分p3上之出口140a處的氣壓略低於大氣壓,即出口140a處的氣體分子密度較低,如此有利於放電來將工作氣體解離成電漿,並可降低電漿的衰減。When the working gas flows from the first part p1 into the second part p2, it is compressed because the radial dimension of the second part p2 is small. When the working gas then flows from the second part p2 into the third part p3, an expansion effect is produced because the radial dimension of the third part p3 is larger than that of the second part p2. In this way, the air pressure at the
請再次參照圖1,在一些實施例中,金屬外殼110更包含氣簾裝置190。此氣簾裝置190可設於金屬外殼110之底部,且鄰近電漿噴射口132。氣簾裝置190可在電漿噴射口132之外圍形成氣簾。氣簾可侷限電漿之範圍,而可有效避免電漿損及非處理區。氣簾裝置190可為抽氣裝置或進氣裝置。Please refer to FIG. 1 again, in some embodiments, the
請參照圖3與圖4,其中圖3係繪示依照本揭露之另一實施方式的一種點狀式大氣電漿裝置的剖面示意圖,圖4係繪示依照本揭露之另一實施方式的一種點狀式大氣電漿裝置的金屬電極的側視示意圖。類似於上述點狀式大氣電漿裝置100之架構,點狀式大氣電漿裝置100a主要包含金屬外殼110、金屬電極160、介電層170、以及氣體通道180。點狀式大氣電漿裝置100a與100之間的差異在於金屬電極160與氣體通道180之設計不同於金屬電極120與氣體通道140。因應金屬電極160與氣體通道180之設計的改變,而修改介電層170之結構。Please refer to FIG. 3 and FIG. 4 , wherein FIG. 3 is a schematic cross-sectional view of a point-type atmospheric plasma device according to another embodiment of the present disclosure, and FIG. 4 is a schematic diagram of a point-type atmospheric plasma device according to another embodiment of the present disclosure. Schematic side view of the metal electrodes of the dot-type atmospheric plasma device. Similar to the structure of the aforementioned point-type
金屬電極160同樣可為長柱狀結構。舉例而言,金屬電極160可為類圓柱狀結構。金屬電極160亦可順著金屬外殼110之高度方向HD設置,因此金屬電極160之長度方向LD1可實質平行金屬外殼110之高度方向HD。金屬電極160具有彼此相對之頂部160a與底部160b、以及外側面160c接合在頂部160a與底部160b之間。金屬電極160之頂部160a與金屬外殼110接合。金屬電極160之材料可為任意適合的金屬,例如不鏽鋼、鋁、與鉑。The
介電層170設於金屬外殼110之內部空間112中,且包圍金屬電極160之外側面160c。舉例而言,介電層170可為中空柱狀結構,而金屬電極160穿設在介電層170中。在此實施方式中,如圖3所示,金屬電極160之底部160b穿設在介電層170之底部170a中,且金屬電極160與介電層170之間具有狹縫,藉此在金屬電極160之外側面160c外圍之介電層170之底部170a的中央區170c形成電漿噴射口172。因此,介電層170並未包覆金屬電極160之底部160b。介電層170可例如為圓管結構,例如石英圓管。The
氣體通道180可將工作氣體從點狀式大氣電漿裝置100a外,經由金屬外殼110與介電層170,而導引至介電層170之電漿噴射口172。如圖3所示,類似於上述實施方式之氣體通道140,氣體通道180包含依序相接且彼此流體連通之第一段182、第二段184、以及第三段186。第一段182可從金屬外殼110之外側面例如橫向穿過金屬外殼110與介電層170。第二段184延伸在介電層170與金屬電極160之外側面160c之間。第二段184包含數個螺旋槽184a螺設於金屬電極160之外側面160c中,藉此螺旋槽184a可順著金屬電極160之外側面160c將從第一段182流過來之工作氣體導引至第三段186。氣體通道180之出口180a位於第三段186之末端。The
在一些實施例中,如圖3與圖4所示,金屬電極160包含互相接合之第一部分162與第二部分164。氣體通道180之第二段184介於第一部分162與介電層170之間,第三段186則介於第二部分164與介電層170之間。在一些示範實施例中,第一部分162之徑向尺寸大於第二部分164之徑向尺寸,即第二部分164較第一部分162細。在此所描述之徑向尺寸可例如為直徑。In some embodiments, as shown in FIGS. 3 and 4 , the
藉由使鄰接電漿噴射口172之第二部分164的徑向尺寸縮減,可使工作氣體之範圍減小,如此工作氣體解離所形成之電漿更為集中。因此,點狀式大氣電漿裝置100a可準確且有效率對工件進行電漿處理。By reducing the radial dimension of the
在一些實施例中,金屬電極160更包含第三部分166接合於第一部分162上。具體而言,第三部分166與的二部分164分別接合於第一部分162之相對二端上。第三部分166之徑向尺寸小於第一部分162之徑向尺寸。如圖4所示,第三部分166與第一部分162之間的徑向尺寸差,第三部分166可形成氣體環道166a。氣體環道166a與所有螺旋槽184a均流體連通,且氣體環道166a亦與氣體通道180之第一段182流體連通。從第一段182流入氣體環道166a之工作氣體可幾乎同時流入所有螺旋槽184a中。如此一來,不僅可提升工作氣體之傳送效率,更可提升電漿噴射口172之氣體分布的均勻度。In some embodiments, the
氣體通道180可將工作氣體集中引導至電漿噴射口172,如此可使電漿更為聚焦,且使大部分之電漿於更接近待處理工件處才形成。因此,可使得電漿能量侷限在較小的區域,進而可準確且有效率地蝕刻工件之材料或去除工件上之汙染物。The
由上述之實施方式可知,本揭露之一優點就是因為本揭露之點狀式大氣電漿裝置的氣體流道可將工作氣體直接引導到介電層之底部之中央區的電漿噴射口。藉此,大部分之工作氣體可在電漿噴射口附近才解離而形成電漿。因此,可大幅減少電漿在金屬外殼之內部空間內形成,不僅可避免功率不必要的浪費,更可使電漿較集中且較接近待處理工件,進而可提升電漿處理效果。It can be seen from the above-mentioned embodiments that one advantage of the present disclosure is that the gas channel of the point-type atmospheric plasma device of the present disclosure can directly guide the working gas to the plasma injection port in the central region of the bottom of the dielectric layer. In this way, most of the working gas can be dissociated near the plasma injection port to form plasma. Therefore, the formation of plasma in the inner space of the metal shell can be greatly reduced, which can not only avoid unnecessary waste of power, but also make the plasma more concentrated and closer to the workpiece to be treated, thereby improving the plasma treatment effect.
本揭露之另一優點就是因為本揭露之點狀式大氣電漿裝置之氣體流道的出口段可穿設於金屬電極中,因此可避免電漿在氣體流道之出口段形成,而可進一步降低功率不必要的浪費,使電漿更加集中。故,電漿處理可更為聚焦,避免損及非處理區。Another advantage of the present disclosure is that because the outlet section of the gas flow channel of the point-type atmospheric plasma device of the present disclosure can be penetrated in the metal electrode, it can avoid the formation of plasma at the outlet section of the gas flow channel, and further Reduce unnecessary waste of power and make plasma more concentrated. Therefore, plasma treatment can be more focused, avoiding damage to non-treated areas.
本揭露之又一優點就是因為本揭露之點狀式大氣電漿裝置之點狀式大氣電漿裝置可利用密封環環繞抵靠介電層之外側面,以密封金屬外殼之腔室,因此可更有效地避免電漿於腔室內形成。Another advantage of the present disclosure is that the point-type atmospheric plasma device of the present disclosure can use a sealing ring to surround and abut against the outer side of the dielectric layer to seal the cavity of the metal shell, so it can More effectively avoid the formation of plasma in the chamber.
本揭露之再一優點就是因為本揭露之點狀式大氣電漿裝置之氣體通道之出口段包含徑向尺寸較小的縮減部鄰近出口。由於氣體在縮減部時可先被壓縮,於出口處再被膨脹,而可使出口處的氣壓略低於大氣壓,因此有利於放電來將工作氣體解離成電漿。Another advantage of the present disclosure is that the outlet section of the gas channel of the point-type atmospheric plasma device of the present disclosure includes a reduced portion with a smaller radial dimension adjacent to the outlet. Because the gas can be compressed first at the constriction part and then expanded at the outlet, the pressure at the outlet can be slightly lower than the atmospheric pressure, so it is beneficial for the discharge to dissociate the working gas into plasma.
本揭露之再一優點就是因為本揭露之點狀式大氣電漿裝置之金屬外殼可包含氣簾裝置,而可在電漿噴射口之外圍形成氣簾,可進一步侷限電漿之範圍,因此可更有效避免電漿損及非處理區。Another advantage of the present disclosure is that the metal casing of the point-type atmospheric plasma device of the present disclosure can include an air curtain device, and an air curtain can be formed on the periphery of the plasma injection port, which can further limit the range of the plasma, so it can be more effective. Avoid plasma damage to non-treated areas.
雖然本揭露已以實施例揭示如上,然其並非用以限定本揭露,任何在此技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。Although the present disclosure has been disclosed above with embodiments, it is not intended to limit the present disclosure. Any person with ordinary knowledge in this technical field may make various modifications and modifications without departing from the spirit and scope of the present disclosure. Therefore, the scope of protection of this disclosure should be defined by the scope of the appended patent application.
100:點狀式大氣電漿裝置
100a:點狀式大氣電漿裝置
110:金屬外殼
112:內部空間
120:金屬電極
120’:金屬電極
120a:頂部
120b:底部
120c:外側面
122:凹槽
130:介電層
130a:底部
130c:中央區
132:電漿噴射口
140:氣體通道
140a:出口
142:第一段
144:第二段
146:第三段
146’:第三段
146a:橫部
146b:縱部
146b’:縱部
150:密封環
160:金屬電極
160a:頂部
160b:底部
160c:外側面
162:第一部分
164:第二部分
166:第三部分
166a:氣體環道
170:介電層
170a:底部
170c:中央區
172:電漿噴射口
180:氣體通道
180a:出口
182:第一段
184:第二段
184a:螺旋槽
186:第三段
190:氣簾裝置
HD:高度方向
LD:長度方向
LD1:長度方向
p1:第一部分
p2:第二部分
p3:第三部分100: point type
為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: [圖1]係繪示依照本揭露之一實施方式的一種點狀式大氣電漿裝置的剖面示意圖; [圖2A]係繪示依照本揭露之一實施方式的一種點狀式大氣電漿裝置的金屬電極的剖面示意圖; [圖2B]係繪示依照本揭露之一實施方式的另一種點狀式大氣電漿裝置的金屬電極的剖面示意圖; [圖3]係繪示依照本揭露之另一實施方式的一種點狀式大氣電漿裝置的剖面示意圖;以及 [圖4]係繪示依照本揭露之另一實施方式的一種點狀式大氣電漿裝置的金屬電極的側視示意圖。 In order to make the above and other purposes, features, advantages and embodiments of the present disclosure more comprehensible, the accompanying drawings are described as follows: [Fig. 1] is a schematic cross-sectional view of a point-type atmospheric plasma device according to an embodiment of the present disclosure; [ FIG. 2A ] is a schematic cross-sectional view showing a metal electrode of a point-type atmospheric plasma device according to an embodiment of the present disclosure; [ FIG. 2B ] is a schematic cross-sectional view showing a metal electrode of another point-type atmospheric plasma device according to an embodiment of the present disclosure; [ FIG. 3 ] is a schematic cross-sectional view of a point-type atmospheric plasma device according to another embodiment of the present disclosure; and [ FIG. 4 ] is a schematic side view showing a metal electrode of a point-type atmospheric plasma device according to another embodiment of the present disclosure.
100:點狀式大氣電漿裝置 100: point type atmospheric plasma device
110:金屬外殼 110: metal casing
112:內部空間 112: Internal space
120:金屬電極 120: metal electrode
120a:頂部 120a: top
120b:底部 120b: bottom
120c:外側面 120c: Outer side
122:凹槽 122: Groove
130:介電層 130: dielectric layer
130a:底部 130a: bottom
130c:中央區 130c: Central District
132:電漿噴射口 132: Plasma Injection Port
140:氣體通道 140: gas channel
140a:出口 140a: Export
142:第一段 142: first paragraph
144:第二段 144: second paragraph
146:第三段 146: third paragraph
146a:橫部 146a: horizontal part
146b:縱部 146b: vertical part
150:密封環 150: sealing ring
190:氣簾裝置 190: Air curtain device
HD:高度方向 HD: height direction
LD:長度方向 LD: length direction
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