TWM635888U - Wide area atmospheric pressure plasma device - Google Patents
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Abstract
Description
本揭露是有關於一種大氣電漿技術,且特別是有關於一種寬幅式大氣電漿裝置。 The present disclosure relates to an atmospheric plasma technology, and in particular to a wide-format atmospheric plasma device.
大氣電漿係於一大氣壓或接近一大氣壓之狀態下所產生的電漿。大氣電漿系統因無真空設備,可對工件進行連續處理,因此相較於真空電漿系統,大氣電漿系統在設備與製程成本上均較具優勢。 Atmospheric plasma is plasma produced at or near atmospheric pressure. Since the atmospheric plasma system has no vacuum equipment, the workpiece can be processed continuously. Therefore, compared with the vacuum plasma system, the atmospheric plasma system has advantages in terms of equipment and process costs.
依照電漿形式的不同,大氣電漿大致可分為電暈(corona)放電、介電質放電(dielectric barrier discharge,DBD)、噴射電漿(Plasma jet)、以及電漿火炬(Plasma torch)等。為了獲得大面積的電漿處理效能,常採用介電質放電技術。此技術雖可達到大面積電漿處理的效果,然有能量較弱而導致製程速率減緩、以及裝置放電等問題。 According to the different forms of plasma, atmospheric plasma can be roughly divided into corona discharge, dielectric barrier discharge (DBD), plasma jet (Plasma jet), and plasma torch (Plasma torch), etc. . In order to obtain large-area plasma treatment efficiency, dielectric discharge technology is often used. Although this technology can achieve the effect of large-area plasma treatment, there are problems such as weak energy, which leads to a slowdown of the process rate and device discharge.
因此,本揭露之一目的就是在提供一種寬幅式大氣電漿裝置,其金屬外殼穿設有氣體通道,以將工作氣體直接導引至鄰近電漿噴射通道之金屬電極的底部。藉此,工作氣體可在電漿噴射通道附近才解離而形成電漿,因此可避免電漿在金屬外殼之腔室內形成,而可避免功率不必要的浪費,並可使電漿更加集中且更接近待處理工件,進而可提升電漿處理效果。 Therefore, an object of the present disclosure is to provide a wide-format atmospheric plasma device, the metal shell of which is pierced with a gas channel, so as to guide the working gas directly to the bottom of the metal electrode adjacent to the plasma injection channel. In this way, the working gas can be dissociated to form plasma near the plasma injection channel, thus avoiding the formation of plasma in the cavity of the metal shell, avoiding unnecessary waste of power, and making the plasma more concentrated and more efficient. Close to the workpiece to be treated, which can improve the effect of plasma treatment.
本揭露之另一目的是在提供一種寬幅式大氣電漿裝置,其可利用密封環環繞抵靠介電層之外側面,以密封金屬外殼之腔室,因此可更有效地避免電漿於腔室內形成。 Another object of the present disclosure is to provide a wide-format atmospheric plasma device, which can use a sealing ring to surround the outer side of the dielectric layer to seal the cavity of the metal casing, so that the plasma can be more effectively avoided. formed in the chamber.
本揭露之又一目的是在提供一種寬幅式大氣電漿裝置,其氣體通道之出口段包含徑向尺寸較小的縮減部鄰近出口。如此一來,氣體在縮減部時可先被壓縮,於出口處再被膨脹,而可使出口處的氣壓略低於大氣壓,有利於放電來將工作氣體解離成電漿。 Another object of the present disclosure is to provide a wide-format atmospheric plasma device, the outlet section of the gas passage includes a reduced portion with a smaller radial dimension adjacent to the outlet. In this way, the gas can be compressed at the shrinking part first, and then expanded at the outlet, so that the pressure at the outlet can be slightly lower than the atmospheric pressure, which is favorable for the discharge to dissociate the working gas into plasma.
本揭露之再一目的是在提供一種寬幅式大氣電漿裝置,其氣體通道之出口端面為面朝介電層之傾斜面或凹弧面,因此可增加出口端面較接近介電層之面積,有利於放電。 Another object of the present disclosure is to provide a wide-width atmospheric plasma device, the outlet end of the gas channel is an inclined surface or a concave arc facing the dielectric layer, so that the area of the outlet end closer to the dielectric layer can be increased , is conducive to discharge.
根據本揭露之上述目的,提出一種寬幅式大氣電漿裝置。此寬幅式大氣電漿裝置包含金屬外殼、金屬電極、以及介電層。金屬外殼包含腔室、至少一氣體通道、與電 漿噴射通道,電漿噴射通道位於腔室之下方。金屬電極設於腔室中,且鄰近電漿噴射通道並順著電漿噴射通道之長度方向延伸。氣體通道之出口鄰近金屬電極之底部,以使氣體通道內之工作氣體朝金屬電極之底部噴射。介電層包覆金屬電極。 According to the above purpose of the present disclosure, a wide-format atmospheric plasma device is proposed. The wide-format atmospheric plasma device includes a metal casing, metal electrodes, and a dielectric layer. The metal casing includes a chamber, at least one gas passage, and electrical The plasma injection channel is located under the chamber. The metal electrode is arranged in the chamber, adjacent to the plasma injection channel and extending along the length direction of the plasma injection channel. The outlet of the gas channel is adjacent to the bottom of the metal electrode, so that the working gas in the gas channel is sprayed toward the bottom of the metal electrode. The dielectric layer covers the metal electrodes.
依據本揭露之一實施例,上述之寬幅式大氣電漿裝置更包含密封環,其中密封環嵌設於腔室之內側壁中,且環繞並抵住介電層之外側面,出口位於密封環之下方。 According to an embodiment of the present disclosure, the above-mentioned wide-format atmospheric plasma device further includes a sealing ring, wherein the sealing ring is embedded in the inner wall of the chamber, and surrounds and resists the outer side of the dielectric layer, and the outlet is located at the sealing below the ring.
依據本揭露之一實施例,上述之氣體通道包含出口段,此出口段包含依序接合之第一部分、第二部分、以及第三部分,出口位於第三部分。第二部分之徑向尺寸小於第一部分之徑向尺寸與第三部分之徑向尺寸。 According to an embodiment of the present disclosure, the above-mentioned gas channel includes an outlet section, and the outlet section includes a first part, a second part, and a third part joined in sequence, and the outlet is located in the third part. The radial dimension of the second portion is smaller than the radial dimension of the first portion and the radial dimension of the third portion.
依據本揭露之一實施例,上述之寬幅式大氣電漿裝置更包含金屬連接塊以及連結件。金屬連接塊與金屬電極電性連接。連結件設於金屬連接塊之端部,且配置以連結電源線與金屬連接塊。 According to an embodiment of the present disclosure, the wide-format atmospheric plasma device further includes a metal connection block and a connecting piece. The metal connection block is electrically connected with the metal electrode. The connecting piece is arranged at the end of the metal connection block, and configured to connect the power line and the metal connection block.
依據本揭露之一實施例,上述之氣體通道之出口端面為傾斜面,此傾斜面面朝介電層。 According to an embodiment of the present disclosure, the outlet end surface of the above-mentioned gas channel is an inclined surface, and the inclined surface faces the dielectric layer.
依據本揭露之一實施例,上述之氣體通道之一出口端面為凹弧面,此凹弧面面朝介電層。 According to an embodiment of the present disclosure, an outlet end surface of the gas channel is a concave arc surface, and the concave arc surface faces the dielectric layer.
依據本揭露之一實施例,上述之介電層為圓管結構。 According to an embodiment of the present disclosure, the above-mentioned dielectric layer is a circular tube structure.
依據本揭露之一實施例,上述之介電層為石英圓管。 According to an embodiment of the present disclosure, the above-mentioned dielectric layer is a quartz tube.
依據本揭露之一實施例,上述之介電層為類矩形長盒結構。 According to an embodiment of the present disclosure, the above-mentioned dielectric layer is a rectangular box-like structure.
依據本揭露之一實施例,上述之介電層為類矩形陶瓷長盒。 According to an embodiment of the present disclosure, the above-mentioned dielectric layer is a rectangular ceramic long box.
100:寬幅式大氣電漿裝置 100: Wide format atmospheric plasma device
100a:寬幅式大氣電漿裝置 100a: wide-format atmospheric plasma device
100b:寬幅式大氣電漿裝置 100b: Wide-format atmospheric plasma device
110:金屬外殼 110: metal casing
112:腔室 112: chamber
112a:內側壁 112a: Medial wall
114:氣體通道 114: gas channel
114a:出口 114a: Export
114b:出口端面 114b: Outlet end face
116:電漿噴射通道 116: Plasma Jet Channel
118:氣體通道 118: gas channel
118a:出口 118a: Export
118b:出口端面 118b: Outlet end face
118c:出口段 118c: Export section
118c1:第一部分 118c1: Part I
118c2:第二部分 118c2: Part II
118c3:第三部分 118c3: The third part
120:金屬電極 120: metal electrode
120a:底部 120a: bottom
130:介電層 130: dielectric layer
130a:外側面 130a: Outer side
140:密封環 140: sealing ring
150:金屬連接塊 150: Metal connection block
152:端部 152: end
160:連結件 160: link
170:金屬外殼 170: metal shell
172:腔室 172: chamber
172a:內側壁 172a: Medial wall
174:氣體通道 174: gas channel
174a:出口 174a: Export
174b:出口端面 174b: Outlet end face
176:電漿噴射通道 176: Plasma Jet Channel
180:金屬電極 180: metal electrode
180a:底部 180a: bottom
190:介電層 190: dielectric layer
A:部分 A: part
A-A:線 A-A: line
B:部分 B: part
C:部分 C: part
LD1:長度方向 LD1: Length direction
LD2:長度方向 LD2: Length direction
為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:〔圖1〕係繪示依照本揭露之一實施方式的一種寬幅式大氣電漿裝置的立體示意圖;〔圖2〕係繪示依照本揭露之一實施方式的一種寬幅式大氣電漿裝置的上視示意圖;〔圖3〕係繪示依照本揭露之一實施方式的一種寬幅式大氣電漿裝置的側視示意圖;〔圖4〕係繪示依照本揭露之一實施方式的一種寬幅式大氣電漿裝置的下視示意圖;〔圖5A〕係繪示沿著圖3之線A-A剖切所獲得之寬幅式大氣電漿裝置的剖面示意圖;〔圖5B〕係繪示圖5A之部分A的放大剖面示意圖;〔圖6A〕係繪示依照本揭露之另一實施方式的一種寬幅式大氣電漿裝置的剖面示意圖;〔圖6B〕係繪示圖6A之部分B的放大剖面示意圖;〔圖7A〕係繪示依照本揭露之又一實施方式的一種寬幅式 大氣電漿裝置的剖面示意圖;以及〔圖7B〕係繪示圖7A之部分C的放大剖面示意圖。 In order to make the above and other purposes, features, advantages and embodiments of this disclosure more obvious and easy to understand, the description of the attached drawings is as follows: [Fig. A three-dimensional schematic diagram of a plasma device; [Figure 2] is a schematic top view of a wide-format atmospheric plasma device according to an embodiment of the present disclosure; [Figure 3] is a schematic diagram of a wide-format atmospheric plasma device according to an embodiment of the present disclosure A schematic side view of a wide-format atmospheric plasma device; [Fig. 4] is a schematic bottom view of a wide-format atmospheric plasma device according to an embodiment of the present disclosure; [Fig. 5A] is a diagram along the The cross-sectional schematic diagram of the wide-format atmospheric plasma device obtained by cutting the line A-A of Fig. 3; [Fig. 5B] is an enlarged cross-sectional schematic diagram showing part A of Fig. 5A; [Fig. 6A] is another schematic diagram according to the present disclosure A schematic cross-sectional view of a wide-format atmospheric plasma device according to an embodiment; [Fig. 6B] is an enlarged schematic cross-sectional view showing part B of Fig. 6A; [Fig. 7A] is a schematic diagram showing a device according to another embodiment of the present disclosure wide format A schematic cross-sectional view of an atmospheric plasma device; and [FIG. 7B] is an enlarged schematic cross-sectional view showing part C of FIG. 7A.
請參照圖1至圖5B,其中圖1至圖4係分別繪示依照本揭露之一實施方式的一種寬幅式大氣電漿裝置的立體示意圖、上視示意圖、側視示意圖、與下視示意圖,圖5A係繪示沿著圖3之線A-A剖切所獲得之寬幅式大氣電漿裝置的剖面示意圖,圖5B係繪示圖5A之部分A的放大剖面示意圖。寬幅式大氣電漿裝置100可為介電質放電大氣電漿裝置。寬幅式大氣電漿裝置100主要可應用於清潔與鍍膜。寬幅式大氣電漿裝置100主要可包含金屬外殼110、金屬電極120、以及介電層130。
Please refer to FIG. 1 to FIG. 5B , wherein FIG. 1 to FIG. 4 are schematic perspective views, schematic top views, schematic side views, and schematic bottom views of a wide-format atmospheric plasma device according to an embodiment of the present disclosure. , FIG. 5A is a schematic cross-sectional view of the wide-format atmospheric plasma device obtained by cutting along the line A-A of FIG. 3, and FIG. 5B is an enlarged schematic cross-sectional view of part A of FIG. 5A. The wide-format
金屬外殼110可例如為長矩形體。如圖5A所示,金屬外殼110包含腔室112、至少一氣體通道114、與電漿噴射通道116。腔室112為金屬外殼110的內部空間。氣體通道114穿設於金屬外殼110中,以將工作氣體直接導向金屬電極120。在一些實施例中,如圖5A所示,金屬外殼110包含數個氣體通道114。
The
如圖4與圖5A所示,電漿噴射通道116穿設於金屬外殼110之底部中,且位於腔室112之下方。電漿噴射通道116可供寬幅式大氣電漿裝置100所形成之電漿噴出。在一些實施例中,電漿噴射通道116為順著金屬外殼110之長度方向LD1延伸的狹長通道。由於電漿噴
射通道116係順著金屬外殼110之長度方向LD1延伸,因此電漿噴射通道116之長度方向LD2與金屬外殼110之長度方向LD1平行。
As shown in FIG. 4 and FIG. 5A , the
金屬電極120設於腔室112中,且鄰近電漿噴射通道116。金屬電極120可為長柱狀結構,且可順著電漿噴射通道116之長度方向LD2延伸。舉例而言,如圖5A所示,金屬電極120可為類圓柱狀結構。金屬電極120之材料可為任意適合的金屬,例如鋁。請一併參照圖5B,氣體通道114之出口114a鄰近金屬電極120之底部120a,藉此氣體通道114可將注入其內之工作氣體朝金屬電極120之底部120a的方向噴射。
The
介電層130包覆金屬電極120。在金屬電極120為類圓柱結構之例子中,如圖5A所示,介電層130可為圓管結構,金屬電極120可插設於介電層130中。在一些實施例中,介電層130為石英圓管。
The
透過氣體通道114,可將工作氣體直接導引至鄰近電漿噴射通道116之金屬電極120的底部120a,如此一來,可大幅減少工作氣體進入金屬外殼110的腔室112,且工作氣體可在電漿噴射通道116附近才放電解離成電漿。因此,可有效減少在金屬外殼110之腔室112內形成之電漿,而可避免功率不必要的浪費,並可使電漿更集中,且所形成之電漿更接近待處理工件,進而可提升對工件的電漿處理效果。
Through the
在一些實施例中,如圖5B所示,氣體通道114之出口端面114b可為傾斜面或凹弧面,且此傾斜面或凹弧面面朝介電層130。如此一來,相較於筆直之出口端面,出口端面114b較接近介電層130的面積增加,即放電點增加,有利於電漿的放電。
In some embodiments, as shown in FIG. 5B , the
在一些實施例中,如圖5A與圖5B所示,寬幅式大氣電漿裝置100更包含密封環140。密封環140可嵌設於腔室112之內側壁112a中,且環繞並抵住介電層130之外側面130a。也就是說,密封環140夾設在腔室112之內側壁112a與介電層130之外側面130a之間,而密封住腔室112。此外,氣體通道114之出口114a位於密封環140之下方。因此,密封環140可阻絕氣體通道114與腔室112之間的氣體流通。故,由氣體通道114之出口114a流出之工作氣體不會流到腔室112,而可更有效地避免電漿於腔室112內形成。
In some embodiments, as shown in FIGS. 5A and 5B , the wide-format
請參照圖1,在一些實施例中,寬幅式大氣電漿裝置100可進一步包含金屬連接塊150與連結件160。金屬連接塊150與金屬電極120電性連接。舉例而言,金屬連接塊150可直接與金屬電極120接合,而達到電性連接。金屬連接塊150用以將電流傳送給金屬電極120。金屬連接塊150之材料可為任何適合的金屬,例如銅。連結件160設於金屬連接塊150之一端部152。連結件160可利用例如螺絲而鎖固在金屬連接塊150之端部152。連結件160可用以連結電源線(未繪示)與金屬連接塊
150,而將電源所供給之電流傳遞給金屬連接塊150。透過金屬連接塊150來傳遞電流給金屬電極120,可較容易點起電漿。
Referring to FIG. 1 , in some embodiments, the wide-format
請參照圖6A與圖6B,其係分別繪示依照本揭露之另一實施方式的一種寬幅式大氣電漿裝置的剖面示意圖、以及圖6A之部分B的放大剖面示意圖。寬幅式大氣電漿裝置100a之架構與上述寬幅式大氣電漿裝置100之架構大致相同。寬幅式大氣電漿裝置100a與100之間的差異在於寬幅式大氣電漿裝置100a之氣體通道118包含不同於寬幅式大氣電漿裝置100之氣體通道114的出口段118c。
Please refer to FIG. 6A and FIG. 6B , which are respectively a schematic cross-sectional view of a wide-format atmospheric plasma device according to another embodiment of the present disclosure, and an enlarged schematic cross-sectional view of part B of FIG. 6A . The structure of the wide-format
氣體通道118之出口段118c包含依序接合之第一部分118c1、第二部分118c2、以及第三部分118c3。即,第二部分118c2介於第一部分118c1與第三部分118c3之間,且第二部分118c2的相對二端分別與該第一部分118c1及第三部分118c3接合。出口118a與出口端面118b位於第三部分118c3。第二部分118c2之徑向尺寸小於第一部分118c1之徑向尺寸,也小於第三部分118c3之徑向尺寸。
The
工作氣體從第一部分118c1流入第二部分118c2時,因第二部分118c2的徑向尺寸較小而受到壓縮。工作氣體接著從第二部分118c2流入第三部分118c3時,因第三部分118c3之徑向尺寸大於第二部分118c2而產生膨脹效果。藉此,可使第三部分118c3上
之出口118a處的氣壓略低於大氣壓,即出口118a處的氣體分子密度較低,如此有利於放電來將工作氣體解離成電漿,並可降低電漿的衰減。
When the working gas flows from the first part 118c1 into the second part 118c2, the second part 118c2 is compressed due to the smaller radial dimension. When the working gas then flows from the second portion 118c2 into the third portion 118c3, the radial dimension of the third portion 118c3 is larger than that of the second portion 118c2, resulting in an expansion effect. In this way, the third part 118c3 can be
The pressure at the
在此實施方式中,氣體通道118之出口端面118b亦可類似於氣體通道114之出口端面114b,而具傾斜面或凹弧面設計。
In this embodiment, the
請參照圖7A與圖7B,其係分別繪示依照本揭露之又一實施方式的一種寬幅式大氣電漿裝置的剖面示意圖、以及圖7A之部分C的放大剖面示意圖。類似於上述寬幅式大氣電漿裝置100之架構,寬幅式大氣電漿裝置100b主要包含金屬外殼170、金屬電極180、以及介電層190。寬幅式大氣電漿裝置100b與100之間的差異在於介電層190結構不同於介電層130。因應介電層190之結構的改變,而修改金屬外殼170之結構。
Please refer to FIG. 7A and FIG. 7B , which are respectively a schematic cross-sectional view of a wide-format atmospheric plasma device according to another embodiment of the present disclosure, and an enlarged schematic cross-sectional view of part C of FIG. 7A . Similar to the structure of the wide-format
金屬外殼170同樣可為長矩形體。金屬外殼170包含腔室172、一或多個氣體通道174、與電漿噴射通道176。氣體通道174穿設於金屬外殼170中。電漿噴射通道176穿設於金屬外殼170之底部中,且位於腔室172之下方。電漿噴射通道176同樣可為順著金屬外殼170之長度方向延伸的狹長通道。
The
金屬電極180設於腔室172中,且鄰近電漿噴射通道176。介電層190包覆金屬電極180。在本實施方式中,介電層190為類矩形長盒結構。舉例而言,介電層190為類矩形陶瓷長盒。金屬電極180可裝載於介電
層190內。金屬電極180可例如為圓柱狀結構。此外,與介電層190接合之腔室172的內側壁172a呈實質筆直,以利介電層190與腔室172的接合。
A
氣體通道174之出口174a鄰近金屬電極180之底部180a,因此氣體通道174可將工作氣體朝金屬電極180之底部180a的方向噴射。故,工作氣體可在電漿噴射通道176附近才放電解離成電漿。
The
在本實施方式中,氣體通道174之出口端面174b可為面朝介電層190之傾斜面或凹弧面。此外,氣體通道174亦可具有如同氣體通道118之出口段118c的設計。透過這些設計,可更容易放電而產生電漿。
In this embodiment, the
由上述之實施方式可知,本揭露之一優點就是因為本揭露之寬幅式大氣電漿裝置的金屬外殼穿設有氣體通道,以將工作氣體直接導引至鄰近電漿噴射通道之金屬電極的底部。藉此,工作氣體可在電漿噴射通道附近才解離而形成電漿,因此可避免電漿在金屬外殼之腔室內形成,而可避免功率不必要得浪費,並可使電漿更加集中且更接近待處理工件,進而可提升電漿處理效果。 It can be seen from the above-mentioned embodiments that one of the advantages of the present disclosure is that the metal shell of the wide-format atmospheric plasma device of the present disclosure is pierced with a gas channel to guide the working gas directly to the metal electrode adjacent to the plasma injection channel. bottom. In this way, the working gas can be dissociated to form plasma near the plasma injection channel, so it can avoid the formation of plasma in the cavity of the metal shell, avoid unnecessary waste of power, and make the plasma more concentrated and more efficient. Close to the workpiece to be treated, which can improve the effect of plasma treatment.
本揭露之另一優點就是因為本揭露之寬幅式大氣電漿裝置可利用密封環環繞抵靠介電層之外側面,以密封金屬外殼之腔室,因此可更有效地避免電漿於腔室內形成。 Another advantage of the present disclosure is that because the wide-format atmospheric plasma device of the present disclosure can use a sealing ring to surround and abut against the outer side of the dielectric layer to seal the chamber of the metal casing, it can more effectively prevent the plasma from entering the chamber. indoor formation.
本揭露之又一優點就是因為本揭露之寬幅式大氣電漿裝置之氣體通道的出口段包含徑向尺寸較小的縮減部 鄰近出口。如此一來,氣體在縮減部時可先被壓縮,於出口處再被膨脹,而可使出口處的氣壓略低於大氣壓,有利於放電來將工作氣體解離成電漿。 Another advantage of the present disclosure is that the outlet section of the gas channel of the wide-width atmospheric plasma device of the present disclosure includes a reduced portion with a smaller radial dimension Proximity to the exit. In this way, the gas can be compressed at the shrinking part first, and then expanded at the outlet, so that the pressure at the outlet can be slightly lower than the atmospheric pressure, which is favorable for the discharge to dissociate the working gas into plasma.
本揭露之再一優點就是因為本揭露之寬幅式大氣電漿裝置之氣體通道的出口端面為面朝介電層之傾斜面或凹弧面,因此可增加出口端面較接近介電層之面積,有利於放電。 Another advantage of the present disclosure is that the outlet end face of the gas channel of the wide-width atmospheric plasma device of the present disclosure is an inclined surface or a concave arc surface facing the dielectric layer, so the area of the outlet end face closer to the dielectric layer can be increased , is conducive to discharge.
雖然本揭露已以實施例揭示如上,然其並非用以限定本揭露,任何在此技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present disclosure has been disclosed above with embodiments, it is not intended to limit the present disclosure. Any person with ordinary knowledge in this technical field may make various modifications and modifications without departing from the spirit and scope of the present disclosure. Therefore, the scope of protection of this disclosure should be defined by the scope of the appended patent application.
100:寬幅式大氣電漿裝置 100: Wide format atmospheric plasma device
110:金屬外殼 110: metal casing
112:腔室 112: chamber
112a:內側壁 112a: Medial wall
114:氣體通道 114: gas channel
114a:出口 114a: Export
116:電漿噴射通道 116: Plasma Jet Channel
120:金屬電極 120: metal electrode
120a:底部 120a: bottom
130:介電層 130: dielectric layer
130a:外側面 130a: Outer side
140:密封環 140: sealing ring
150:金屬連接塊 150: Metal connection block
160:連結件 160: link
A:部分 A: part
Claims (10)
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