TWM623500U - Wafer notch position judgment device - Google Patents

Wafer notch position judgment device Download PDF

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TWM623500U
TWM623500U TW110207062U TW110207062U TWM623500U TW M623500 U TWM623500 U TW M623500U TW 110207062 U TW110207062 U TW 110207062U TW 110207062 U TW110207062 U TW 110207062U TW M623500 U TWM623500 U TW M623500U
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wafer
judging
gap
segmented
photographing
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TW110207062U
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Chinese (zh)
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劉育鑫
呂呈祥
佐佐木大輔
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樂華科技股份有限公司
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Publication of TWM623500U publication Critical patent/TWM623500U/en

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Abstract

本新型為有關一種晶圓缺口位置之判斷裝置,主要結構包括一晶圓帶動元件,晶圓帶動元件之一側處設有一攝影元件,攝影元件之一側處設有一背光元件及一處理主機,處理主機內設有一缺口判斷模組及一位置判斷模組。藉此,可利用晶圓帶動元件來帶動晶圓片於攝影元件下方移動,藉此透過攝影元件配合背光元件來進行分段式的拍攝動作,以連續拍攝晶圓片來產生複數的分段圖片。再將分段圖片傳送至缺口判斷模組及位置判斷模組中,來判斷出晶圓片是否具有缺口及缺口位置處,以達到快速準確的檢測動作。 The present invention relates to a device for judging the position of a wafer gap. The main structure includes a wafer driving element, one side of the wafer driving element is provided with a photographing element, one side of the photographing element is provided with a backlight element and a processing host, The processing host is provided with a gap judging module and a position judging module. In this way, the wafer driving element can be used to drive the wafer to move under the photographic element, so that the photographic element cooperates with the backlight element to perform a segmented photographing action to continuously photograph the wafer to generate a plurality of segmented pictures . Then, the segmented pictures are sent to the gap judgment module and the position judgment module to determine whether the wafer has a gap and the position of the gap, so as to achieve a fast and accurate detection action.

Description

晶圓缺口位置之判斷裝置 Wafer notch position judgment device

本新型為提供一種晶圓缺口位置之判斷裝置,尤指一種具有較為準確之檢測方式的晶圓缺口位置之判斷裝置。 The present invention provides a device for judging the position of a wafer gap, especially a device for judging the position of a wafer gap with a relatively accurate detection method.

按,晶圓在半導體晶體的產業之中,是相當重要的一部分,主要都為圓形薄切片,因此也會被稱為晶圓片。可用於積體電路製程中作為載體基片,以及製造太陽能電池,並且晶圓片也因為能根據材質與尺寸分為許多種類。例如材質可分為矽晶圓,氮化鎵晶圓、及碳化矽晶圓等,尺寸則可經由直徑來進行分類,如3英吋、4英吋、或5英吋。 According to the press, wafers are a very important part of the semiconductor crystal industry. They are mainly circular thin slices, so they are also called wafers. It can be used as a carrier substrate in the integrated circuit process, and in the manufacture of solar cells, and the wafers can also be divided into many types according to the material and size. For example, materials can be divided into silicon wafers, gallium nitride wafers, and silicon carbide wafers, etc., and sizes can be classified by diameter, such as 3 inches, 4 inches, or 5 inches.

由於晶圓屬於相當精密的產品,因此對於整體的完整度要求也非常高,所以對於檢測設備的要求也會相對的提升。一般用於檢測晶圓的方式都是利用拍照攝影配合光學量測的方式來進行檢測。 Since wafers are quite sophisticated products, the overall integrity requirements are also very high, so the requirements for testing equipment will also be relatively improved. Generally, the method used to inspect the wafer is to use the method of photographing and optical measurement to carry out the inspection.

但若是需要量測尺寸較大的晶圓片時,則有可能無法完整的拍攝到整顆晶圓片的狀況,若是要直接拍攝到整個晶圓片,則可能會產生畫素上較為模糊的問題點,或是需要加裝攝影功能較高的攝影設備來進行拍攝,導致成本增加的狀況。 However, if you need to measure a larger wafer, you may not be able to photograph the entire wafer completely. If you want to directly photograph the entire wafer, it may produce blurred pixels. The problem is that it is necessary to install photographic equipment with higher photographic functions for shooting, which leads to an increase in cost.

是以,要如何解決上述習用之問題與缺失,即為本新型之申請人與從事此行業之相關廠商所亟欲研究改善之方向所在者。 Therefore, how to solve the above-mentioned conventional problems and deficiencies is the direction that the applicant of the present invention and the relevant manufacturers engaged in this industry are eager to research and improve.

故,本新型之申請人有鑑於上述缺失,乃蒐集相關資料,經由多方評估及考量,並以從事於此行業累積之多年經驗,經由不斷試作及修改,始設計出此種具有較為準確之量測方式的晶圓缺口位置之判斷裝置及其方法的新型專利者。 Therefore, in view of the above-mentioned deficiencies, the applicant of this new model collects relevant information, evaluates and considers from various parties, and uses years of experience accumulated in this industry, through continuous trials and revisions, to design such a more accurate quantity. The patentee of a new type patent for a device for judging the position of a wafer gap in a measuring method and a method thereof.

本新型之主要目的在於:利用拍攝多組的分段圖片,並配合缺口判斷模組及位置判斷模組來準確的量測出缺口位置。 The main purpose of the new model is to accurately measure the position of the gap by taking multiple sets of segmented pictures and cooperating with the gap judging module and the position judging module.

為達成上述目的,本新型之主要結構包括:一晶圓帶動元件、一設於晶圓帶動元件之一側處的攝影元件、一設於攝影元件之一側處的背光元件、一設於攝影元件之一側處並與攝影元件相連接的處理主機、一設於處理主機內的缺口判斷模組、及一設於處理主機內並與缺口判斷模組相連接的位置判斷模組。 In order to achieve the above-mentioned purpose, the main structure of the present invention includes: a wafer driving element, a photographing element arranged at one side of the wafer driving element, a backlight element arranged at one side of the photographing element, and a photographing element arranged at one side of the photographing element. A processing host connected to the photographing element at one side of the element, a gap judging module set in the processing host, and a position judging module set in the processing host and connected with the gap judging module.

藉由上述之結構,使用者可利用晶圓帶動元件帶動一晶圓片於攝影元件的拍攝位置處沿一個方向持續移動,藉此讓攝影元件利用背光元件給予的光源,持續分段式的拍攝晶圓片來產生複數的分段圖片。 With the above structure, the user can use the wafer driving element to drive a wafer to continuously move in one direction at the photographing position of the photographing element, thereby allowing the photographing element to use the light source provided by the backlight element to continuously shoot in segments. wafers to generate complex segmented images.

拍攝出的分段圖片會傳送至處理主機中的缺口判斷模組中進行判斷的動作,藉此來判斷出各個分段圖片中的部分晶圓片是否具有缺口,若沒有發現缺口時,則會結束動作並存取相關資料,若是於分段圖片中的部分晶圓片檢測到缺口,則會將此分段圖片傳送至位置判斷模組中進行研判動作,藉此來判斷出此缺口於晶圓片上的絕對位置處。如此就能利用上述之分段式的方式,來快速準確的檢測晶圓片,以提高檢測時的準確性與降低設備的成本。 The captured segmented pictures will be sent to the gap judgment module in the processing host for judging actions, thereby judging whether some of the wafers in each segmented picture have gaps, if no gaps are found, it will be End the action and access the relevant data. If a gap is detected in some wafers in the segmented image, the segmented image will be sent to the position judgment module for research and judgment, thereby judging that the gap is in the wafer. absolute position on the wafer. In this way, the above-mentioned segmented method can be used to inspect the wafers quickly and accurately, so as to improve the accuracy of inspection and reduce the cost of equipment.

藉由上述技術,可針對檢測尺寸較大的晶圓片時較為麻煩的問題點加以突破,達到上述優點之實用進步性。 With the above-mentioned technology, it is possible to break through the troublesome problem of detecting wafers with larger size, so as to achieve the practical progress of the above-mentioned advantages.

1:晶圓帶動元件 1: Wafer drive components

2:攝影元件 2: Photographic components

3:背光元件 3: Backlight components

4:處理主機 4: Handle the host

5:缺口判斷模組 5: Gap judgment module

6:位置判斷模組 6: Location judgment module

61:角度判斷元件 61: Angle judgment component

62:中心線判斷元件 62: Center line judgment element

63:長度判斷元件 63: Length judgment element

64:位置判斷元件 64: Position judgment element

7:晶圓載具 7: Wafer carrier

T:切線角度 T: Tangent angle

C:中心線 C: center line

W:水平長度 W: horizontal length

A、A1、A2、A3、A4、A5、A6、A7、A8、A9、A10、A11:分段圖片 A, A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11: Segmented pictures

第一圖 係為本新型較佳實施例之立體透視圖。 The first figure is a three-dimensional perspective view of the preferred embodiment of the new type.

第二圖 係為本新型較佳實施例之拍攝示意圖。 The second figure is a photographing schematic diagram of the new preferred embodiment.

第三圖 係為本新型較佳實施例之分段圖片示意圖。 The third figure is a schematic diagram of a segmented picture of the preferred embodiment of the new model.

第四圖 係為本新型較佳實施例之判斷示意圖(一)。 The fourth figure is a schematic diagram (1) of the judgment of this new preferred embodiment.

第五圖 係為本新型較佳實施例之判斷示意圖(二)。 Fig. 5 is a schematic diagram (2) of the judgment of this new preferred embodiment.

第六圖 係為本新型較佳實施例之判斷示意圖(三)。 The sixth figure is a schematic diagram (3) of the judgment of the preferred embodiment of the new model.

為達成上述目的及功效,本新型所採用之技術手段及構造,茲繪圖就本新型較佳實施例詳加說明其特徵與功能如下,俾利完全了解。 In order to achieve the above purpose and effect, the technical means and structure adopted by the present invention are described in detail with reference to the preferred embodiment of the present invention and its features and functions are as follows, so as to be fully understood.

請參閱第一圖所示,係為本新型較佳實施例之立體透視圖,由圖中可清楚看出本新型係包括: Please refer to the first figure, which is a three-dimensional perspective view of a preferred embodiment of the new model. It can be clearly seen from the figure that the new model includes:

一晶圓帶動元件1,於本實施例中之晶圓帶動元件1以可帶動晶圓片移動的機械手臂作為舉例; A wafer driving element 1, the wafer driving element 1 in this embodiment takes a robotic arm that can drive the wafer to move as an example;

一設於晶圓帶動元件1之一側處的攝影元件2; a photographing element 2 disposed at one side of the wafer driving element 1;

一設於攝影元件2之一側處的背光元件3,本實施例之背光元件3以可發出穩定光源之LED背光板作為舉例; A backlight element 3 disposed at one side of the photographing element 2, the backlight element 3 of this embodiment is an example of an LED backlight plate that can emit a stable light source;

一設於攝影元件2之一側處並與攝影元件2相連接之處理主機4; a processing host 4 disposed at one side of the photographing element 2 and connected to the photographing element 2;

一設於處理主機4內的缺口判斷模組5,本實施例之缺口判斷模組5以設於處理主機4內之處理器模組作為舉例; A gap judging module 5 disposed in the processing host 4, the gap judging module 5 in the present embodiment takes the processor module disposed in the processing host 4 as an example;

一設於處理主機4內並與缺口判斷模組5資訊連接的位置判斷模組6,本實施例之位置判斷模組6以設於處理主機4內之處理器模組作為舉例,且缺口判斷模組5具有一角度判斷元件61、一設於該角度判斷元件61之一側處的中心線判斷元件62、一設於該中心線判斷元件62之一側處的長度判斷元件63、及一與該角度判斷元件61、該中心線判斷元件62、及該長度判斷元件63資訊連接的位置判斷元件64;及 A position judging module 6 disposed in the processing host 4 and connected with the information of the gap judging module 5. The position judging module 6 in this embodiment takes the processor module set in the processing host 4 as an example, and the gap judging The module 5 has an angle judging element 61 , a centerline judging element 62 disposed at one side of the angle judging element 61 , a length judging element 63 disposed at one side of the centerline judging element 62 , and a a position judging element 64 that is informationally connected to the angle judging element 61, the centerline judging element 62, and the length judging element 63; and

一設於晶圓帶動元件1之一側處的晶圓載具7。 A wafer carrier 7 is provided at one side of the wafer carrying element 1 .

藉由上述之說明,已可了解本技術之結構,而依據這個結構之對應配合,即可達到快速準確之量測效果的優勢,而詳細之解說將於下述說明。 Through the above description, the structure of the present technology can be understood, and according to the corresponding cooperation of the structure, the advantages of fast and accurate measurement effect can be achieved, and the detailed explanation will be described below.

請同時配合參閱第一圖至第六圖所示,係為本新型較佳實施例之立體透視圖至判斷示意圖(三),藉由上述構件組構時,由圖中可清楚看出,使用者能利用晶圓帶動元件1來取出晶圓載具7中的晶圓片,並將晶圓片帶動至攝影元件2的下側處來進行拍攝動作,而晶圓帶動元件1則會帶動晶圓片沿一固定方向進行移動,藉此讓攝影元件2配合背光元件3給予的光源持續進行分段式的拍攝動作,即可透過背光元件3給予的光源更加完整顯示出晶圓片的邊緣形狀,即可如第三圖所示,拍攝出複數的分段圖片A(本實施例以分段圖片 A1至A11作為舉例),並且在拍攝分段圖片A時,會拍攝出重疊的部位,例如分段圖片A1的下半部與分段圖片A2的上半部會相互重疊,藉此透過此種相互重疊的效果,能夠確保完整的拍攝到整個的晶圓片。 Please also refer to the first to sixth figures, which are the three-dimensional perspective views to the judgment schematic diagram (3) of the preferred embodiment of the new model. The user can use the wafer driving element 1 to take out the wafers in the wafer carrier 7, and drive the wafers to the lower side of the photographing element 2 for shooting, while the wafer driving element 1 will drive the wafers The wafer moves in a fixed direction, so that the photographic element 2 cooperates with the light source provided by the backlight element 3 to continuously perform a segmented shooting action, so that the edge shape of the wafer can be more completely displayed through the light source provided by the backlight element 3, That is, as shown in the third figure, a complex number of segmented pictures A (in this embodiment, the segmented pictures are taken A1 to A11 are used as examples), and when the segmented picture A is taken, overlapping parts will be photographed, for example, the lower half of the segmented picture A1 and the upper half of the segmented picture A2 will overlap each other. The overlapping effects ensure that the entire wafer is captured completely.

之後再將分段圖片A傳送至缺口判斷模組5中,來檢測各分段圖片A中所拍攝到的部分晶圓片(分段圖片A中所拍攝到之晶圓片的局部部分圖片)是否具有缺口,本實施例之檢測方式以透過二值化之方式判斷晶圓片是否具有缺口作為舉例。 Then, the segmented pictures A are sent to the gap judgment module 5 to detect the partial wafers captured in the segmented pictures A (partial pictures of the wafers captured in the segmented pictures A) Whether there is a notch or not, the detection method of this embodiment takes as an example whether the wafer has a notch or not by means of binarization.

而若缺口判斷模組5判斷各分段圖片A中的部分晶圓片沒有缺口時,則會直接結束整體的檢測動作,並將相關資料進行存取,若是檢測到有缺口時,則會將具有缺口之分段圖片A傳送至缺口判斷模組5中,來計算出該缺口位於晶圓片上的絕對位置於何處,本實施例以分段圖片A2及分段圖片A3中有拍攝到缺口作為舉例。 And if the gap determination module 5 determines that some of the wafers in each segmented picture A have no gap, it will directly end the overall detection operation, and access the relevant data. If a gap is detected, it will The segmented picture A with the gap is sent to the gap determination module 5 to calculate where the absolute position of the gap is on the wafer. In this embodiment, the gap is captured in the segmented picture A2 and the segmented picture A3 As an example.

本實施例之計算方式可配合第四圖至第六圖所示,且會以計算分段圖片A2中的缺口來作為舉例,可先利用角度判斷元件61計算缺口位置的切線角度T,例如本實施例之缺口切線角度T為正60度,之後再利用中心線判斷元件62來判斷出部分晶圓片的中心線C位置,來判讀出缺口位於左側處還是右側處(本實施例以位於左側處作為舉例),再經由長度判斷元件63來判讀出缺口位置處於晶圓片上的水平長度W,最後將切線角度T、中心線C位置、及水平長度W傳送至位置判斷元件64中來進行整合判斷的動作,即可判斷出缺口的絕對位置於何處並進行紀錄存取的動作。 The calculation method of this embodiment can be matched with those shown in the fourth to sixth figures, and the calculation of the gap in the segmented picture A2 will be used as an example. The tangent angle T of the notch in the embodiment is positive 60 degrees, and then the centerline judging element 62 is used to determine the position of the centerline C of some wafers to determine whether the notch is located on the left side or the right side (in this embodiment, it is located on the left side). (as an example), and then the horizontal length W of the notch position on the wafer is judged and read through the length judgment element 63, and finally the tangent angle T, the position of the center line C, and the horizontal length W are transmitted to the position judgment element 64 for integration. The action of judging can determine where the absolute position of the gap is and perform the action of recording and accessing.

例如以本實施例之數據可看出,符合的水平長度W之位置有第六圖的兩處,即代表缺口可能位置在上下兩條水平長度W的端點處,再配合因為切線角度T為正值,因此可判斷出缺口應位於左上及右下兩處(因只有左上及右下兩處的切線角度T會是正值,而右上及左下兩側會是負值),最後再透過中心線C判讀的方式,來判讀出缺口應位於中心線C的左側處,如此即可推斷出缺口的絕對位置在於第六圖的左上之絕對位置處。 For example, from the data of this embodiment, it can be seen that the corresponding horizontal lengths W have two positions as shown in the sixth figure, which means that the possible positions of the gaps are at the end points of the upper and lower horizontal lengths W, and the matching is because the tangent angle T is Positive value, so it can be judged that the gap should be located at the upper left and lower right (because only the tangent angle T of the upper left and lower right will be positive, while the upper right and lower left will be negative), and finally through the center In the way of interpreting line C, it can be judged that the gap should be located on the left side of the center line C, so it can be inferred that the absolute position of the gap is at the upper left absolute position in the sixth figure.

如此使用者即可透過上述之方向,將晶圓片分段式的拍成多組分段圖片A,以分別來檢測分段圖片A中是否具有缺口處,並當出現缺口時,能相當準確的判讀出缺口的位置處,以利使用者能快速進行檢測的動作。並且由於能進行分段式的拍攝檢測,因此不論檢測尺寸多大的晶圓片,都能利用同一 組攝影元件2進行拍攝,不需要根據晶圓片的尺寸,採購設置不同尺寸的攝影元件2,因此還能大幅降低檢測時的成本。 In this way, the user can use the above direction to take the wafer segmented into multiple sets of segmented pictures A, so as to detect whether there are gaps in the segmented pictures A, and when there is a gap, it can be quite accurate. The position of the gap can be judged to facilitate the user to perform the detection action quickly. In addition, since segmented imaging inspection is possible, the same wafer can be used regardless of the inspection size of the wafer. It is not necessary to purchase and install imaging elements 2 of different sizes according to the size of the wafer, so that the cost during inspection can be greatly reduced.

另外,一般利用連續拍攝的技術來檢測是否有異常狀況時,會於拍攝機台中設置編碼器(encoder)來進行觸發取像的動作,例如利用編碼器(encoder)設置移動200mm則拍攝一張分段圖片A,藉此降低拍攝每張分段圖片A時的移動誤差,以讓拍攝出的分段圖片A能完整的銜接拼湊出一晶圓片,來得知缺口位置。而本案能於上述內容中得知,可直接利用具有缺口的分段圖片A,來計算出缺口於晶圓片上的絕對位置處。與一般連續拍攝的檢測技術完全不相同,並不需要另外加裝編碼器(encoder)來進行觸發取像的動作,因此在製造成本上也能大幅度的降低,同時能提高使用上的方便性。 In addition, when the continuous shooting technology is generally used to detect whether there is an abnormal situation, an encoder will be set in the shooting machine to trigger the image capture action. segment image A, thereby reducing the movement error when shooting each segmented image A, so that the captured segmented image A can be completely connected and pieced together to form a wafer, so as to know the position of the gap. In this case, it can be seen from the above content that the absolute position of the gap on the wafer can be calculated directly by using the segmented picture A with the gap. It is completely different from the detection technology of general continuous shooting. It does not need to install an additional encoder (encoder) to trigger the image acquisition. Therefore, the manufacturing cost can also be greatly reduced, and the convenience of use can be improved at the same time. .

綜上所述,本新型之晶圓缺口位置之判斷裝置於使用時,為確實能達到其功效及目的,故本新型誠為一實用性優異之新型,為符合新型專利之申請要件,爰依法提出申請,盼 審委早日賜准本新型,以保障申請人之辛苦創作,倘若 鈞局審委有任何稽疑,請不吝來函指示,申請人定當竭力配合,實感德便。 To sum up, the device for judging the position of the wafer gap of the present invention can indeed achieve its effect and purpose when it is used. Therefore, the present invention is a new model with excellent practicability. I hope that the review committee will approve this new model as soon as possible to protect the applicant's hard work. If the review committee has any doubts, please do not hesitate to send a letter for instructions, and the applicant will do our best to cooperate.

1:晶圓帶動元件 1: Wafer drive components

2:攝影元件 2: Photographic components

3:背光元件 3: Backlight components

4:處理主機 4: Handle the host

5:缺口判斷模組 5: Gap judgment module

6:位置判斷模組 6: Location judgment module

61:角度判斷元件 61: Angle judgment component

62:中心線判斷元件 62: Center line judgment element

63:長度判斷元件 63: Length judgment element

64:位置判斷元件 64: Position judgment element

7:晶圓載具 7: Wafer carrier

Claims (5)

一種晶圓缺口位置之判斷裝置,其主要包含: A device for judging the position of a wafer gap, which mainly includes: 一晶圓帶動元件,該晶圓帶動元件係帶動晶圓片移動; a wafer driving element, the wafer driving element drives the wafer to move; 一攝影元件,該攝影元件設於該晶圓帶動元件之一側處,以供分段式的連續拍攝該晶圓帶動元件所帶動之晶圓片,以產生複數之分段圖片; a photographing element, the photographing element is arranged at one side of the wafer driving element for continuously photographing the wafers driven by the wafer driving element in a segmented manner, so as to generate a plurality of segmented pictures; 一背光元件,該背光元件設於該攝影元件之一側處,以供給予該攝影元件所需之光源; a backlight element provided at one side of the photographic element for providing the photographic element with the required light source; 一處理主機,該處理主機設於該攝影元件之一側處,以供接收該攝影元件所拍攝的該些分段圖片; a processing host, which is arranged at one side of the photographing element for receiving the segmented pictures captured by the photographing element; 一缺口判斷模組,該缺口判斷模組設於該處理主機內,以供判斷該分段圖片上之部分晶圓片是否具有缺口;及 a gap judging module, the gap judging module is arranged in the processing host for judging whether some of the wafers on the segmented image have gaps; and 一位置判斷模組,該位置判斷模組設於該處理主機內並與該缺口判斷模組相連接,以供接收具有缺口之各該分段圖片。 A position judging module, the position judging module is arranged in the processing host and is connected with the gap judging module for receiving each of the segmented pictures with gaps. 如申請專利範圍第1項所述之晶圓缺口位置之判斷裝置,其中該位置判斷模組具有一角度判斷元件、一設於該角度判斷元件之一側處的中心線判斷元件、一設於該中心線判斷元件之一側處的長度判斷元件、及一與該角度判斷元件、該中心線判斷元件、及該長度判斷元件資訊連接的位置判斷元件。 The device for judging the position of the wafer notch as described in the first claim, wherein the position judging module has an angle judging element, a centerline judging element disposed on one side of the angle judging element, and a A length judging element at one side of the centerline judging element, and a position judging element connected to the angle judging element, the centerline judging element, and the length judging element information. 如申請專利範圍第1項所述之晶圓缺口位置之判斷裝置,其中該缺口判斷模組係透過二值化之方式判斷各該分段圖片上的部分晶圓片是否具有缺口。 The device for judging the position of a wafer gap as described in claim 1, wherein the gap judging module judges whether a part of the wafer on each of the segmented images has a gap through binarization. 如申請專利範圍第1項所述之晶圓缺口位置之判斷裝置,其中該晶圓帶動元件之一側處設有一晶圓載具。 The device for judging the position of the wafer gap according to the first item of the scope of application, wherein a wafer carrier is disposed on one side of the wafer driving element. 如申請專利範圍第1項所述之晶圓缺口位置之判斷裝置,其中該些分段圖片上之部分晶圓片係供組合成一完整之晶圓片。 The device for judging the position of the wafer notch according to the first item of the scope of the application, wherein some of the wafers on the segmented pictures are for combining into a complete wafer.
TW110207062U 2021-06-18 2021-06-18 Wafer notch position judgment device TWM623500U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798725B (en) * 2021-06-18 2023-04-11 浚輔科技股份有限公司 Device and method for judging wafer notch position

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798725B (en) * 2021-06-18 2023-04-11 浚輔科技股份有限公司 Device and method for judging wafer notch position

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