TWM615543U - Insulated metal substrate structure - Google Patents
Insulated metal substrate structure Download PDFInfo
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- TWM615543U TWM615543U TW110203838U TW110203838U TWM615543U TW M615543 U TWM615543 U TW M615543U TW 110203838 U TW110203838 U TW 110203838U TW 110203838 U TW110203838 U TW 110203838U TW M615543 U TWM615543 U TW M615543U
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Abstract
Description
本新型涉及了基板結構,具體來說是涉及了一種絕緣金屬基板結構。The present invention relates to a substrate structure, in particular to an insulated metal substrate structure.
目前現有的絕緣金屬基板結構,使用蝕刻製程來形成預定線路圖形,使得製程流程複雜且成本提高。有鑑於此,本新型創作人本於多年從事相關產品之開發與設計,有感上述缺失之可改善,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善上述缺失之本新型。At present, the existing insulated metal substrate structure uses an etching process to form a predetermined circuit pattern, which makes the process flow complicated and the cost increases. In view of this, the creator of this new model has been engaged in the development and design of related products for many years, and feels that the above-mentioned shortcomings can be improved. He has made great efforts to research and cooperate with the use of academic principles, and finally proposed a new model with reasonable design and effective improvement of the above-mentioned shortcomings. .
本新型所要解決的技術問題在於,針對現有技術的不足提供一種絕緣金屬基板結構。The technical problem to be solved by the present invention is to provide an insulated metal substrate structure in view of the shortcomings of the prior art.
為了解決上述的技術問題,本新型提供一種絕緣金屬基板結構,包括:電絕緣層、多個金屬層、多個電絕緣導熱層、以及散熱層,多個所述電絕緣導熱層形成在所述散熱層之上,所述電絕緣層圍繞多個所述金屬層,使多個所述金屬層分隔不同區域而形成預定線路圖形,且所述電絕緣層形成至少有一用以定位填入所述金屬層與所述散熱層之間的所述電絕緣導熱層的凹角結構。In order to solve the above technical problems, the present invention provides an insulated metal substrate structure, including: an electrical insulation layer, a plurality of metal layers, a plurality of electrical insulation and heat conduction layers, and a heat dissipation layer, a plurality of the electrical insulation and heat conduction layers are formed on the On the heat dissipation layer, the electrically insulating layer surrounds a plurality of the metal layers, so that the plurality of metal layers separate different areas to form a predetermined circuit pattern, and the electrically insulating layer is formed with at least one for positioning and filling the The concave angle structure of the electrically insulating and thermally conductive layer between the metal layer and the heat dissipation layer.
在一優選實施例中,所述電絕緣層是以具高接合性的高分子材料所製成。In a preferred embodiment, the electrically insulating layer is made of a polymer material with high bonding properties.
在一優選實施例中,所述電絕緣導熱層是以具高接合性的高分子材料所製成,並且所述電絕緣導熱層包含有陶瓷填料。In a preferred embodiment, the electrically insulating and thermally conductive layer is made of a polymer material with high bonding properties, and the electrically insulating and thermally conductive layer contains ceramic fillers.
在一優選實施例中,所述金屬層的厚度被配置是小於所述電絕緣層的厚度。In a preferred embodiment, the thickness of the metal layer is configured to be smaller than the thickness of the electrically insulating layer.
在一優選實施例中,所述金屬層為厚度介於1mm至5mm的厚銅塊。In a preferred embodiment, the metal layer is a thick copper block with a thickness ranging from 1 mm to 5 mm.
在一優選實施例中,所述散熱層為一具散熱作用的金屬基板。In a preferred embodiment, the heat dissipation layer is a metal substrate with heat dissipation function.
在一優選實施例中,所述散熱層為一具散熱作用及絕緣性的陶瓷基板。In a preferred embodiment, the heat dissipation layer is a ceramic substrate with heat dissipation and insulation properties.
在一優選實施例中,所述電絕緣層底部不接觸所述散熱層。In a preferred embodiment, the bottom of the electrically insulating layer does not contact the heat dissipation layer.
在一優選實施例中,所述電絕緣層底部直接接觸所述散熱層。In a preferred embodiment, the bottom of the electrically insulating layer directly contacts the heat dissipation layer.
本新型的有益效果至少在於,本新型的絕緣金屬基板結構,其能通過「所述電絕緣層圍繞多個所述金屬層,使多個所述金屬層分隔不同區域而形成預定線路圖形,且所述電絕緣層形成至少有一用以定位填入所述金屬層與所述散熱層之間的所述電絕緣導熱層的凹角結構」的技術方案,使得多個金屬層能夠快速被電絕緣層分隔為不同區域而形成預定線路圖形,降低製程流程及成本,並且能夠有效定位填入金屬層與散熱層之間的電絕緣導熱層。The beneficial effect of the present invention is at least that the insulated metal substrate structure of the present invention can form a predetermined circuit pattern by surrounding a plurality of the metal layers with the electrical insulating layer, so that the plurality of metal layers are separated from different regions, and The electrical insulation layer is formed with at least one technical solution for positioning and filling the electrical insulation and heat conduction layer between the metal layer and the heat dissipation layer, so that multiple metal layers can be quickly covered by the electrical insulation layer. Separate into different areas to form a predetermined circuit pattern, reduce the manufacturing process and cost, and can effectively locate the electrically insulating and thermally conductive layer filled between the metal layer and the heat dissipation layer.
為使能更進一步瞭解本新型的特徵及技術內容,請參閱以下有關本新型的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本新型加以限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed descriptions and drawings about the present invention. However, the drawings provided are only for reference and explanation, and are not used to limit the present invention.
以下是通過特定的具體實施例來說明本新型所公開有關的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本新型的優點與效果。本新型可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本新型的構思下進行各種修改與變更。另外,本新型的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本新型的相關技術內容,但所公開的內容並非用以限制本新型的保護範圍。The following are specific specific examples to illustrate the related implementations disclosed in the present invention. Those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are merely schematic illustrations, and are not drawn according to actual dimensions, and are stated in advance. The following embodiments will further describe the related technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.
應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”等術語來描述各種元件,但這些元件不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as “first” and “second” may be used herein to describe various elements, these elements should not be limited by these terms. These terms are mainly used to distinguish one element from another. In addition, the term "or" used in this document may include any one or a combination of more of the associated listed items depending on the actual situation.
請參考圖1、2,本新型第一實施例提供一種絕緣金屬基板結構。如圖所示,根據本新型第一實施例所提供的絕緣金屬基板結構,其基本上包括有電絕緣層10、多個金屬層20、多個電絕緣導熱層30、以及散熱層40。Please refer to FIGS. 1 and 2. The first embodiment of the present invention provides an insulated metal substrate structure. As shown in the figure, the insulated metal substrate structure provided by the first embodiment of the present invention basically includes an electrically insulating
在本實施例中,散熱層40可以是鋁製散熱器(heat sink),亦或是具有散熱鰭片的散熱器,也可以是具散熱作用的金屬基板,或是具散熱作用及絕緣性的陶瓷基板,然並不侷限於此。In this embodiment, the
在本實施例中,電絕緣導熱層30形成在散熱層40之上,電絕緣導熱層30可以是以具高接合性的高分子材料所製成,例如環氧樹脂,以增加絕緣性與接合性。並且,電絕緣導熱層30還可以包含有陶瓷填料,以提高導熱性。In this embodiment, the electrically insulating and thermally
在本實施例中,金屬層20的數量示意為兩個,但金屬層20的數量並不限制,也可以為兩個以上。並且,本實施例的電絕緣層10圍繞多個金屬層20,使多個金屬層20分隔不同區域,藉此可以快速形成預定線路圖形(Pattern),並且電絕緣層10形成至少有一用以定位填入金屬層20與散熱層40之間的電絕緣導熱層30的凹角結構101,藉此可以有效定位填入金屬層20與散熱層40之間的電絕緣導熱層30。In this embodiment, the number of
在本實施例中,電絕緣層10可以是由矽膠所構成。電絕緣層10可以是由樹脂所構成。電絕緣層10較佳可以是以具高接合性的高分子材料、或是陶瓷材料等高絕緣材料所製成。In this embodiment, the electrically insulating
在本實施例中,金屬層20可以是厚度介於1mm至5mm的厚銅塊,以更提高導熱均勻性與熱傳效率。並且,金屬層20的厚度與電絕緣層10的厚度不同,金屬層20的厚度被配置是小於電絕緣層10的厚度,以使電絕緣層10圍繞金屬層20後可填入電絕緣導熱層30。並且,本實施例的電絕緣層10底部可不接觸散熱層40。In this embodiment, the
請參考圖3、4,本新型第二實施例提供一種絕緣金屬基板結構。如圖所示,根據本新型第二實施例所提供的絕緣金屬基板結構,其基本上包括有電絕緣層10、多個金屬層20、多個電絕緣導熱層30、以及散熱層40。Please refer to FIGS. 3 and 4, the second embodiment of the present invention provides an insulated metal substrate structure. As shown in the figure, the insulated metal substrate structure provided by the second embodiment of the present invention basically includes an electrically insulating
在本實施例中,金屬層20的數量示意為兩個,但金屬層20的數量並不限制,也可以為兩個以上。並且,本實施例的電絕緣層10圍繞多個金屬層20,以使多個金屬層20分隔不同區域,藉此可以快速形成預定線路圖形,並且電絕緣層10形成至少有一用以定位填入金屬層20與散熱層40之間的電絕緣導熱層30的凹角結構101,藉此可以有效定位填入金屬層20與散熱層40之間的電絕緣導熱層30。In this embodiment, the number of
並且,金屬層20的厚度與電絕緣層10的厚度不同,金屬層20的厚度被配置是小於電絕緣層10的厚度,以使電絕緣層10圍繞金屬層20後可填入電絕緣導熱層30。並且,本實施例的電絕緣層10底部是直接接觸散熱層40。以上是針對本實施例與其它實施例不同之處進行說明,而不再對相同之處作重複贅述。Moreover, the thickness of the
綜合以上所述,本新型提供的絕緣金屬基板結構,其能通過「所述電絕緣層10圍繞多個所述金屬層20,使多個所述金屬層20分隔不同區域而形成預定線路圖形,且所述電絕緣層10形成至少有一用以定位填入所述金屬層20與所述散熱層40之間的所述電絕緣導熱層30的凹角結構101」的技術方案,使得多個金屬層能夠快速被電絕緣層分隔為不同區域而形成預定線路圖形,降低製程流程及成本,並且能夠有效定位填入金屬層與散熱層之間的電絕緣導熱層。In summary, the insulated metal substrate structure provided by the present invention can form a predetermined circuit pattern by surrounding a plurality of the
以上所公開的內容僅為本新型的優選可行實施例,並非因此侷限本新型的申請專利範圍,所以凡是運用本新型說明書及圖式內容所做的等效技術變化,均包含於本新型的申請專利範圍內。The content disclosed above is only a preferred and feasible embodiment of the present model, and does not limit the scope of the patent application of the present model. Therefore, all equivalent technical changes made by using the description and schematic content of the present model are included in the application of the present model. Within the scope of the patent.
10:電絕緣層 101:凹角結構 20:金屬層 30:電絕緣導熱層 40:散熱層10: Electrical insulation layer 101: concave angle structure 20: Metal layer 30: Electrically insulating and thermally conductive layer 40: heat dissipation layer
圖1為本新型第一實施例的俯視示意圖。Fig. 1 is a schematic top view of the first embodiment of the new type.
圖2為圖1中的II-II線的剖面結構示意圖。Fig. 2 is a schematic cross-sectional structure diagram taken along the line II-II in Fig. 1.
圖3為本新型第二實施的俯視示意圖。Fig. 3 is a schematic top view of the second implementation of the new type.
圖4為圖3中的IV-IV線的剖面結構示意圖。FIG. 4 is a schematic cross-sectional structure diagram taken along the line IV-IV in FIG. 3.
10:電絕緣層 10: Electrical insulation layer
101:凹角結構 101: concave angle structure
20:金屬層 20: Metal layer
30:電絕緣導熱層 30: Electrically insulating and thermally conductive layer
40:散熱層 40: heat dissipation layer
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