TWM613007U - Substrate debonder - Google Patents
Substrate debonder Download PDFInfo
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- TWM613007U TWM613007U TW109216285U TW109216285U TWM613007U TW M613007 U TWM613007 U TW M613007U TW 109216285 U TW109216285 U TW 109216285U TW 109216285 U TW109216285 U TW 109216285U TW M613007 U TWM613007 U TW M613007U
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Abstract
本案揭露一種基板分離裝置,包括基座、變溫檯、緩衝檯、滑動裝置與擋件。在解鍵合製程中,滑動裝置的吸取裝置可吸取第一載板的上表面,使第一載板與組合基板分離,接著,滑動裝置帶動吸取裝置及第一載板位移到緩衝檯的上方,而擋件接觸第一載板的上表面,以在吸取裝置向上位移時阻擋第一載板被吸取裝置吸附,使第一載板留在緩衝檯。 This case discloses a substrate separation device, which includes a base, a temperature changing table, a buffer table, a sliding device and a stopper. In the debonding process, the suction device of the sliding device can suck the upper surface of the first carrier to separate the first carrier from the combined substrate. Then, the sliding device drives the suction device and the first carrier to move above the buffer table, and The stopper contacts the upper surface of the first carrier board to prevent the first carrier board from being sucked by the sucking device when the sucking device moves upward, so that the first carrier board stays in the buffer table.
Description
本新型係關於一種基板分離裝置,尤其指一種透過擋件阻擋第一載板被吸取裝置吸附,使第一載板留在緩衝檯的一種基板分離裝置。 The present invention relates to a substrate separation device, in particular to a substrate separation device that blocks a first carrier board from being absorbed by a suction device through a stopper, so that the first carrier board stays in a buffer table.
積體電路技術的發展已經成熟,且目前電子產品朝向輕薄短小、高性能、高可靠性與智能化的趨勢發展。電子產品中的晶片(基板)會對電子產品的性能產生重要影響,其中前述性能部分相關於晶片的厚度。舉例來說,厚度較薄的晶片可以提高散熱效率、增加機械性能、提升電性以及減少封裝的體積及重量。 The development of integrated circuit technology has matured, and current electronic products are developing towards the trend of light, thin, short, high performance, high reliability and intelligence. The chip (substrate) in the electronic product has an important impact on the performance of the electronic product, and the aforementioned performance is partly related to the thickness of the chip. For example, a thinner chip can improve heat dissipation efficiency, increase mechanical performance, improve electrical performance, and reduce the size and weight of the package.
於半導體製程中,通常會在晶片的背面(即下表面)進行基板減薄製程、通孔蝕刻製程與背面金屬化製程。然而,當晶片的晶圓之基板的厚度過薄(例如,低於或等於150微米),則在進行基板減薄處理時,可能會導致晶圓破片或使晶圓發生彎曲變形,從而使得晶片無法使用並降低晶片良率。一般來說,在進行基板減薄製程前,會進行鍵合製程,以將晶圓與載板(例如,藍寶石玻璃)鍵合,並於進行基板減薄製程後,進行解鍵合製程,以將晶圓與載板分離。 In the semiconductor manufacturing process, a substrate thinning process, a via etching process, and a back metallization process are usually performed on the back side (ie, the lower surface) of the wafer. However, when the thickness of the substrate of the wafer of the wafer is too thin (for example, less than or equal to 150 microns), the wafer may be broken or deformed during the substrate thinning process, thereby causing the wafer Unable to use and reduce chip yield. Generally speaking, before the substrate thinning process, a bonding process is performed to bond the wafer to a carrier (for example, sapphire glass), and after the substrate thinning process, a debonding process is performed to bond the crystal The circle is separated from the carrier board.
在解鍵合製程中,通常是以真空吸取裝置吸附載板,以將載板自晶圓分離。然而,當真空吸取裝置欲卸除載板時,經常因真空狀態未完全解除,導致載板滯留在真空吸取裝置,並可能在非目標位置掉落,導致解鍵合機台受損或是產生髒污。 In the debonding process, the carrier board is usually sucked by a vacuum suction device to separate the carrier board from the wafer. However, when the vacuum suction device wants to remove the carrier board, the vacuum state is often not completely released, causing the carrier board to stay in the vacuum suction device and may fall at a non-target position, resulting in damage to the debonding machine or dirty .
因此,為了克服習知技術的不足之處,本新型實施例提供一種基板分離裝置,可輔助載板自吸取裝置卸除。 Therefore, in order to overcome the shortcomings of the conventional technology, an embodiment of the present invention provides a substrate separation device, which can assist the removal of the carrier board from the suction device.
基於前述目的的至少其中之一者,本新型實施例提供的基板分離裝置包括基座、變溫檯、緩衝檯與滑動裝置。所述基座包括滑動軌道。所述變溫檯位於基座,並透過變溫以控制組合基板的頂面與第一載板的底面之間的黏著劑融化。所述緩衝檯位於基座,用以承載自組合基板分離的第一載板。所述滑動裝置連接基座的滑動軌道,且在變溫檯與緩衝檯之間位移,而滑動裝置包括本體、升降裝置、吸取裝置與至少一擋件。所述本體連接基座的滑動軌道。所述升降裝置連接本體。所述吸取裝置連接升降裝置,並透過升降裝置帶動吸取裝置相對於本體升降。所述擋件連接本體。所述滑動裝置在變溫檯的上方,升降裝置驅動吸取裝置向下位移,使吸取裝置吸附第一載板的上表面,其中滑動裝置的本體帶動吸取裝置及第一載板位移到緩衝檯的上方,並以升降裝置驅動吸取裝置向上位移,擋件接觸第一載板的上表面,以阻擋第一載板被吸取裝置吸附,使第一載板留在緩衝檯。 Based on at least one of the foregoing objectives, the substrate separation device provided by the embodiment of the present invention includes a base, a temperature changing table, a buffer table, and a sliding device. The base includes a sliding track. The temperature-changing stage is located on the base and controls the melting of the adhesive between the top surface of the combined substrate and the bottom surface of the first carrier through temperature-changing. The buffer stage is located on the base and is used to carry the first carrier plate separated from the combined substrate. The sliding device is connected to the sliding track of the base and displaces between the temperature changing table and the buffer table, and the sliding device includes a body, a lifting device, a suction device and at least one stopper. The body is connected to the sliding track of the base. The lifting device is connected to the body. The suction device is connected to the lifting device, and the lifting device drives the suction device to rise and fall relative to the main body through the lifting device. The stopper is connected to the body. The sliding device is above the temperature-changing table, and the lifting device drives the suction device to move downwards, so that the suction device absorbs the upper surface of the first carrier board, wherein the body of the sliding device drives the suction device and the first carrier board to move above the buffer table , And the lifting device drives the suction device to move upward, and the stopper contacts the upper surface of the first carrier board to prevent the first carrier board from being sucked by the suction device, so that the first carrier board stays in the buffer table.
可選地,在所述滑動裝置滑動到緩衝檯的上方,擋件與緩衝檯之間的垂直距離為1~10公釐。 Optionally, when the sliding device slides above the buffer table, the vertical distance between the stopper and the buffer table is 1-10 mm.
可選地,所述擋件還包括連接部與接觸部,擋件的接觸部透過連接部連接滑動裝置的本體,而接觸部用以接觸第一載板的上表面,其中連接部的材質為金屬,而接觸部的材質為塑料。 Optionally, the stopper further includes a connecting portion and a contact portion, the contact portion of the stopper is connected to the body of the sliding device through the connecting portion, and the contact portion is used to contact the upper surface of the first carrier board, wherein the connecting portion is made of Metal, and the material of the contact part is plastic.
可選地,所述基板分離裝置還包括控溫模組,連接變溫檯,用以控制變溫檯的溫度。 Optionally, the substrate separation device further includes a temperature control module, which is connected to the temperature change table to control the temperature of the temperature change table.
可選地,所述緩衝檯還包括至少一噴氣口,位於緩衝檯的上表面,其中在第一載板被吸取裝置帶動到緩衝檯,噴氣口提供氣體以冷卻第一載板的底面的黏著劑,防止第一載板黏附於緩衝檯。 Optionally, the buffer table further includes at least one air jet located on the upper surface of the buffer table, wherein the first carrier plate is driven to the buffer table by the suction device, and the air jet provides gas to cool the adhesion of the bottom surface of the first carrier plate Agent to prevent the first carrier from sticking to the buffer table.
基於前述目的的至少其中之一者,本新型實施例提供的基板分離裝置包括基座、變溫檯、緩衝檯、至少一擋件與滑動裝置。所述基座包括滑動軌道。所述變溫檯位於基座,透過變溫以控制組合基板的頂面與第一載板的底面之間的黏著劑融化。所述緩衝檯位於基座,用以承載自組合基板分離的第一載板。所述擋件相鄰緩衝檯。所述滑動裝置連接基座的滑動軌道,且在變溫檯與緩衝檯之間位移,而滑動裝置包括本體、升降裝置與吸取裝置。所述本體連接基座的滑動軌道。所述升降裝置連接本體。所述吸取裝置連接升降裝置,並透過升降裝置帶動吸取裝置相對於本體升降。所述滑動裝置在變溫檯的上方,升降裝置驅動吸取裝置向下位移,使吸取裝置吸附第一載板的上表面,其中滑動裝置的本體帶動吸取裝置及第一載板位移到緩衝檯的上方,擋件位移到第一載板的上方,並以升降裝置驅動吸取裝置向上位移,擋件接觸第一載板的上表 面,以阻擋第一載板被吸取裝置吸附,使第一載板留在緩衝檯。可選地,在擋件位移到第一載板的上方,擋件與緩衝檯之間的垂直距離為1~10公釐。 Based on at least one of the foregoing objectives, the substrate separation device provided by the embodiment of the present invention includes a base, a temperature changing stage, a buffer stage, at least one stopper, and a sliding device. The base includes a sliding track. The temperature-changing stage is located on the base, and the temperature is changed to control the melting of the adhesive between the top surface of the combined substrate and the bottom surface of the first carrier board. The buffer stage is located on the base and is used to carry the first carrier plate separated from the combined substrate. The stopper is adjacent to the buffer platform. The sliding device is connected to the sliding track of the base, and is displaced between the temperature changing table and the buffer table, and the sliding device includes a body, a lifting device and a suction device. The body is connected to the sliding track of the base. The lifting device is connected to the body. The suction device is connected to the lifting device, and the lifting device drives the suction device to lift relative to the body. The sliding device is above the temperature-changing table, and the lifting device drives the suction device to move downwards, so that the suction device absorbs the upper surface of the first carrier board, wherein the body of the sliding device drives the suction device and the first carrier board to move above the buffer table , The stopper moves above the first carrier board, and the lifting device drives the suction device to move upward, and the stopper contacts the upper surface of the first carrier board Surface to prevent the first carrier board from being adsorbed by the suction device, so that the first carrier board stays in the buffer table. Optionally, when the stopper is displaced above the first carrier board, the vertical distance between the stopper and the buffer table is 1-10 mm.
可選地,所述擋件還包括連接部與接觸部,擋件的接觸部透過連接部連接滑動裝置的本體,而接觸部用以接觸第一載板的上表面,其中連接部的材質為金屬,而接觸部的材質為塑料。 Optionally, the stopper further includes a connecting portion and a contact portion, the contact portion of the stopper is connected to the body of the sliding device through the connecting portion, and the contact portion is used to contact the upper surface of the first carrier board, wherein the connecting portion is made of Metal, and the material of the contact part is plastic.
可選地,所述基板分離裝置還包括控溫模組,連接變溫檯,用以控制變溫檯的溫度。 Optionally, the substrate separation device further includes a temperature control module, which is connected to the temperature change table to control the temperature of the temperature change table.
可選地,所述緩衝檯還包括至少一噴氣口,位於緩衝檯的上表面,其中在第一載板被吸取裝置帶動到緩衝檯,噴氣口提供氣體以冷卻第一載板的底面的黏著劑,防止第一載板黏附於緩衝檯。 Optionally, the buffer table further includes at least one air jet located on the upper surface of the buffer table, wherein the first carrier plate is driven to the buffer table by the suction device, and the air jet provides gas to cool the adhesion of the bottom surface of the first carrier plate Agent to prevent the first carrier from sticking to the buffer table.
簡言之,本新型實施例提供的基板分離裝置可協助載板欲卸除於吸取裝置時,不滯留於吸取裝置,以避免載板在非目標位置掉落,進而防止解鍵合機台受損或是產生髒污,故於對解鍵合製程有需求的市場具有優勢。 In short, the substrate separation device provided by the embodiment of the present invention can assist the carrier plate to be removed from the suction device without staying in the suction device, so as to prevent the carrier plate from falling at a non-target position, thereby preventing damage or damage to the debonding machine. Dirt is generated, so the market that has a demand for the debonding process has an advantage.
為讓本新型之上述和其他目的、特徵及優點能更明顯易懂,配合所附圖示,做詳細說明如下。 In order to make the above and other objects, features and advantages of the present invention more obvious and understandable, detailed descriptions are made as follows in conjunction with the accompanying drawings.
1、2:基板分離裝置 1, 2: Substrate separation device
11:基座 11: Pedestal
111:滑動軌道 111: Sliding track
13:變溫檯 13: Variable temperature platform
15:緩衝檯 15: buffer table
151:噴氣口 151: Jet Port
17、27:滑動裝置 17, 27: sliding device
171、271:本體 171, 271: Ontology
173、273:升降裝置 173, 273: Lifting device
175、275:吸取裝置 175, 275: suction device
177、29:擋件 177, 29: stop
177A、29A:連接部 177A, 29A: connecting part
177B、29B:接觸部 177B, 29B: contact part
S0:組合基板 S0: Combination board
S1:第一載板 S1: The first carrier board
S2:晶圓 S2: Wafer
S3:第二載板 S3: second carrier board
圖1是本新型實施例的基板分離裝置的示意圖。 Fig. 1 is a schematic diagram of a substrate separation device according to an embodiment of the present invention.
圖2是本新型實施例的基板分離裝置的示意圖。 Fig. 2 is a schematic diagram of a substrate separation device according to an embodiment of the present invention.
圖3是本新型另一實施例的基板分離裝置的示意圖。 Fig. 3 is a schematic diagram of a substrate separation device according to another embodiment of the present invention.
圖4是本新型另一實施例的基板分離裝置的示意圖。 Fig. 4 is a schematic diagram of a substrate separation device according to another embodiment of the present invention.
為充分瞭解本新型之目的、特徵及功效,茲藉由下述具體之實施例,並配合所附之圖式,對本新型做一詳細說明,說明如後。 In order to fully understand the purpose, features and effects of the present invention, a detailed description of the present invention is given with the following specific embodiments and accompanying drawings. The description is as follows.
請參照圖1與圖2,圖1與圖2是本新型實施例的基板分離裝置的示意圖。如圖所示,基板分離裝置1包括基座11、變溫檯13、緩衝檯15與滑動裝置17,其中變溫檯13與緩衝檯15皆位於基座11。在一個實施例中,變溫檯13與緩衝檯15是相鄰設置,但本新型不以此為限制。
Please refer to FIG. 1 and FIG. 2. FIG. 1 and FIG. 2 are schematic diagrams of a substrate separation device according to an embodiment of the present invention. As shown in the figure, the
所述基座11包括滑動軌道111,而滑動裝置17連接基座11的滑動軌道111,以使滑動裝置17可以在變溫檯13與該緩衝檯15之間水平位移。在一個實施例中,滑動軌道111為兩長形軌道,且位於彼此相鄰的變溫檯13與緩衝檯15的兩外側,但本新型不以此為限制。滑動軌道111也可以是兩L型軌道或形成其他路徑,並位於彼此不相鄰的變溫檯13與緩衝檯15的兩外側。
The
所述滑動裝置17包括本體171、升降裝置173、吸取裝置175與至少一擋件177。所述吸取裝置175連接升降裝置173,升降裝置173及擋件177連接本體171,而本體171連接基座11的滑動軌道111,以帶動升降裝置173、吸取裝置175與擋件177沿著滑動軌道111位移。
The sliding
具體而言,升降裝置173高於本體171,並可帶動吸取裝置175相對於本體171升降(垂直位移)。擋件177則位於本體171的下方,且可在滑動裝置17沿著滑動軌道111位移的過程中,相鄰且高於變溫檯13或緩衝檯15,其中在滑動裝置173滑動到緩衝檯15的上方時,擋件177與緩衝檯15之間的垂直距離為1~10公釐。
Specifically, the
當彼此鍵合的第一載板S1與組合基板S0(包括晶圓S2與第二載板S3)要進行解鍵合時,彼此垂直排列的第一載板S1與組合基板S0被放置到變溫檯13,其中第一載板S1位於最上層,晶圓S2位於第一載板S1與第二載板S3之間,而第二載板S3位於最下層。 When the first carrier board S1 and the combined substrate S0 (including the wafer S2 and the second carrier board S3) that are bonded to each other are to be debonded, the first carrier board S1 and the combined substrate S0 arranged perpendicular to each other are placed on the temperature changing table 13 , Wherein the first carrier board S1 is located at the uppermost layer, the wafer S2 is located between the first carrier board S1 and the second carrier board S3, and the second carrier board S3 is located at the lowermost layer.
在一個實施例中,變溫檯13還包括複數個升降頂桿(lift pin)(圖未示),而升起的升降頂桿在承載第一載板S1與組合基板S0後,可垂直向下位移以帶動第一載板S1與組合基板S0的下降,使組合基板S0的底面接觸變溫檯13。再者,變溫檯13還可包括真空模組(圖未示),當組合基板S0的底面接觸變溫檯13時,真空模組以真空吸附的方式使組合基板S0被固定在變溫檯13。
In one embodiment, the
請參照圖1,當第一載板S1與組合基板S0被放置到變溫檯13,變溫檯13可透過變溫以控制組合基板S0的頂面與第一載板S1的底面之間的黏著劑融化。具體而言,基板分離裝置1還包括控溫模組(圖未示),而控溫模組連接變溫檯13,並用以控制變溫檯13的溫度,進而控制組合基板S0的頂面與第一載板S1的底面之間的黏著劑融化。
Please refer to FIG. 1, when the first carrier board S1 and the combined substrate S0 are placed on the temperature-changing
接著,滑動裝置17位移到變溫檯13的上方,並帶動升降裝置173與吸取裝置175位移到第一載板S1與組合基板S0上方。接著,升降裝置173驅動吸取裝置175向下位移,使吸取裝置175吸附第一載板S1的上表面,其中吸取裝置175例如但不限制為真空吸取裝置。
Then, the sliding
接著,請參照圖2,滑動裝置17帶動吸取裝置175及第一載板S1位移到緩衝檯15的上方,使緩衝檯15承載自組合基板S0分離的第一載板S1,而組合基板S0則留在變溫檯13。進一步地,升降裝置173驅動吸取裝置175向上位
移,而擋件177接觸第一載板S1的上表面,以阻擋第一載板S1被吸取裝置175吸附,使第一載板S1留在緩衝檯15。如此,可使第一載板S1不會吸附於吸取裝置175。當滑動裝置17在緩衝檯15的上方時,擋件177與緩衝檯15之間的垂直距離例如但不限制為1~10公釐。
Next, referring to FIG. 2, the sliding
在一個實施例中,緩衝檯15還包括至少一噴氣口151,位於緩衝檯15的上表面。當第一載板S1被吸取裝置175帶動到緩衝檯15時,噴氣口151可提供氣體以冷卻第一載板S1的底面的黏著劑,防止第一載板S1黏附於緩衝檯15。再者,緩衝檯15還可包括複數升降頂桿,並可垂直位移以帶動第一載板S1接觸或不接觸緩衝檯15。
In an embodiment, the buffer table 15 further includes at least one
在一個實施例中,擋件177是由連接部177A與接觸部177B構成,而擋件177的接觸部177B透過連接部177A連接滑動裝置17的本體171,接觸部177B則用以接觸第一載板S1的上表面,其中連接部177A的材質可以是金屬,而接觸部177B的材質可以是塑料。在其他實施例中,擋件177也可以是一體成形並由一種材質構成,例如為塑料。
In one embodiment, the
在其他實施例中,擋件177也可以不位於本體171。請參照圖3與圖4。圖3與圖4是本新型另一實施例的基板分離裝置的示意圖。所述基板分離裝置2的構件(基座11、變溫檯13、緩衝檯15)及功能與前述實施例大致相同,故不贅述,差別僅在於擋件29的位置以及滑動裝置27的構造略有不同。
In other embodiments, the
如圖3與圖4所示,擋件29相鄰緩衝檯15。具體而言,擋件29位於滑動軌道111與緩衝檯15之間,並可以旋轉位移,而基板分離裝置2的滑動裝置27則不包括擋件29。具體而言,滑動裝置27包括本體271、升降裝置273與吸取
裝置275,吸取裝置275連接升降裝置273,升降裝置273連接本體271,而本體271連接基座11的滑動軌道111,其中升降裝置273高於本體271,並可帶動吸取裝置275相對於本體271升降(垂直位移)。
As shown in FIG. 3 and FIG. 4, the
請參照圖3,當第一載板S1與組合基板S0被放置到變溫檯13,變溫檯13可透過變溫以控制組合基板S0的頂面與第一載板S1的底面之間的黏著劑融化。 Please refer to FIG. 3, when the first carrier S1 and the combined substrate S0 are placed on the temperature-changing table 13, the temperature-changing table 13 can control the melting of the adhesive between the top surface of the combined substrate S0 and the bottom surface of the first carrier S1 by changing the temperature .
接著,滑動裝置27位移到變溫檯13的上方,並帶動升降裝置273與吸取裝置275位移到第一載板S1與組合基板S0上方,而升降裝置273驅動吸取裝置275向下位移,使吸取裝置275吸附第一載板S1的上表面,其中吸取裝置275例如但不限制為真空吸取裝置。
Then, the sliding
接著,請參照圖4,滑動裝置27帶動吸取裝置275及第一載板S1位移到緩衝檯15的上方,使緩衝檯15承載自組合基板S0分離的第一載板S1,而組合基板S0則留在變溫檯13。進一步地,擋件29旋轉位移到第一載板S1的上方,升降裝置273驅動吸取裝置275向上位移,而擋件29接觸第一載板S1的上表面,以阻擋第一載板S1被吸取裝置275吸附,使第一載板S1留在緩衝檯15。如此,可使第一載板S1不會吸附於吸取裝置275。當擋件29位移到第一載板S1的上方時,擋件29與緩衝檯15之間的垂直距離例如但不限制為1~10公釐。
4, the sliding
在一個實施例中,擋件29是一體成形並由一種材質構成,例如為塑料。在其他實施例中,擋件29也可以是由連接部29A與接觸部29B構成,而擋件29透過連接部29A連接滑動裝置27,接觸部29B則用以接觸第一載板S1的上表面,其中連接部29A的材質可以是金屬,而接觸部29B的材質可以是塑料。
In one embodiment, the
綜合以上所述,相較於習知技術,本新型實施例所述之基板分離裝置之技術效果,係說明如下。 In summary, compared with the prior art, the technical effects of the substrate separation device according to the embodiment of the present invention are described as follows.
習知技術中,在解鍵合的過程裡,常因真空吸取裝置與載板之間的真空狀態未完全解除,導致載板滯留在真空吸取裝置,並可能在非目標位置掉落,導致解鍵合機台受損或是產生髒污。反觀本新型所述之基板分離裝置,可透過擋板接觸載板的上表面,使載板停留在緩衝檯而不被吸取裝置持續吸取,以防止載板在非目標位置掉落,進而降低機台受損或髒汙產生的機率。 In the prior art, in the process of debonding, the vacuum state between the vacuum suction device and the carrier is often not completely released, causing the carrier to stay in the vacuum suction device, and may fall at a non-target position, resulting in the debonding machine Damaged or dirty. In contrast, the substrate separation device of the present invention can contact the upper surface of the carrier through the baffle, so that the carrier stays on the buffer table without being continuously sucked by the suction device, so as to prevent the carrier from falling at non-target positions and lower the machine. The probability of a damaged or dirty table.
本新型在上文中已以較佳實施例揭露,然熟習本項技術者應理解的是,上述實施例僅用於描繪本新型,而不應解讀為限制本新型之範圍。應注意的是,舉凡與前述實施例等效之變化與置換,均應設為涵蓋於本新型之範疇內。 The present invention has been disclosed in preferred embodiments above. However, those familiar with the art should understand that the above-mentioned embodiments are only used to describe the present invention and should not be interpreted as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to the foregoing embodiments should be included in the scope of the present invention.
1:基板分離裝置 1: Substrate separation device
11:基座 11: Pedestal
111:滑動軌道 111: Sliding track
13:變溫檯 13: Variable temperature platform
15:緩衝檯 15: buffer table
151:噴氣口 151: Jet Port
17:滑動裝置 17: Sliding device
171:本體 171: Body
173:升降裝置 173: Lifting device
175:吸取裝置 175: Suction Device
177:擋件 177: Block
177A:連接部 177A: Connecting part
177B:接觸部 177B: Contact
S0:組合基板 S0: Combination board
S1:第一載板 S1: The first carrier board
S2:晶圓 S2: Wafer
S3:第二載板 S3: second carrier board
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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TW109216285U TWM613007U (en) | 2020-12-09 | 2020-12-09 | Substrate debonder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109216285U TWM613007U (en) | 2020-12-09 | 2020-12-09 | Substrate debonder |
Publications (1)
Publication Number | Publication Date |
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TWM613007U true TWM613007U (en) | 2021-06-11 |
Family
ID=77517795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW109216285U TWM613007U (en) | 2020-12-09 | 2020-12-09 | Substrate debonder |
Country Status (1)
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TW (1) | TWM613007U (en) |
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2020
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