TWM603190U - Liquid-receiving device for wet etching and cleaning apparatus - Google Patents

Abstract

The present utility model is related to a liquid-receiving device for wet etching and cleaning apparatus. The liquid-receiving device comprises a liquid-receiving tank, a drain, a frame and a plurality of seals. The liquid-receiving tank defines a storage space and comprises an open end portion and a vent. The open end portion is located on the top of the liquid-receiving tank. The vent is located on the bottom of the liquid-receiving tank. The drain is located on the vent of the liquid-receiving tank. The frame is located on the open end portion. The plurality of seals joints the frame and a tank of a wet etching and cleaning apparatus.

Description

Liquid receiving device for wet etching cleaning equipment

This creation is about a liquid receiving device for wet etching cleaning equipment. Specifically, the liquid receiving device can be applied to the wet etching cleaning equipment used in the semiconductor manufacturing process to receive the wet etching cleaning equipment. Treat the liquid discharged from the tank and/or washing tank and prevent the leakage of the liquid.

Generally speaking, the structure of the wet etching cleaning equipment 9 roughly includes an equipment body, a processing chamber 96, a water washing chamber 97, and a drying chamber 98, as shown in FIG. 1. The device body has a clamp 95 (for example, a robotic arm) for clamping a wafer 99 for wet etching and cleaning. The processing chamber 96 has a processing tank and a tank body. According to the requirements of the wet etching process, the processing tank is filled with an etching solution to perform wet etching or acid treatment on the wafer 99. The processing tank has a drain pipe dedicated to the etching solution for directly draining the etching solution. The tank system is arranged below the drain pipe dedicated to the etching solution. The joining method of the tank body is mostly welding. The material of the welding is mostly polyvinyl chloride (PVC). The washing chamber 97 has a washing tank and a tank body. According to the requirements of the wet etching process, the washing tank is filled with an aqueous solution to wash the wafer 99 with water. The washing tank has a liquid discharge valve for discharging the aqueous solution. The tank is in fluid communication with the liquid discharge valve. The joining method of the tank body is mostly welding. The material of the welding is mostly polyvinyl chloride (PVC). The drying chamber 98 is used to dry the wafer 99 that has been wet-etched and cleaned.

Regarding the wet etching cleaning process, as shown in FIG. 2, a wafer is clamped through the jig for wet etching cleaning. The steps include a step S61, a step S62, a step S63, and a step S64. In step S61, the wafer is placed in the processing tank, and an etching solution is used for wet etching (for example, photoresist stripping or organic removal). After the wet etching is completed, the etching solution is directly discharged through a drain pipe dedicated to the etching solution. The step S62 includes a high temperature water washing step S621 and a normal temperature water washing step S622. In step S62, the wafer is first placed in the washing tank, and the high-temperature water washing of step S621 is performed. After the high-temperature water washing is completed, the high-temperature aqueous solution is directly discharged to the tank through a liquid discharge valve; In the water washing tank, the normal temperature water washing of step S622 is performed. After the normal temperature water washing is completed, the normal temperature aqueous solution is directly discharged to the tank body through a liquid discharge valve. In step S63, the wafer is placed in the processing tank, and an etching solution is used for acid treatment (for example, to remove particles or organic matter). After the acid treatment is completed, the etching solution is directly discharged through a drain pipe dedicated to the etching solution. After the wet etching cleaning is completed, in step S64, the wafer is placed in the drying chamber for drying.

In the limited space of the wet etching cleaning equipment, the tank body needs to frequently accept the liquid discharged from the processing tank and/or the water washing tank during the wet etching cleaning process according to different processes, and the polyvinyl chloride (PVC The material of) has poor acceptance of temperature changes (temperature resistance is between -20~60°C), so that the tank of the wet etching cleaning equipment is prone to liquid leakage. Therefore, in view of this, the creator has studied and improved the existing shortcomings, and provided a liquid receiving device for wet etching cleaning equipment in order to achieve a more practical purpose.

The purpose of this creation is to provide a liquid receiving device for wet etching cleaning equipment, which can be applied to the wet etching cleaning equipment used in the semiconductor manufacturing process to receive the processing tank and/or from the wet etching cleaning equipment Wash the liquid discharged from the tank and prevent the leakage of the liquid. Regardless of whether the tank body of the wet etching cleaning equipment has leaked liquid, this device can be added.

In one aspect, this creation provides a liquid receiving device for wet etching cleaning equipment, which includes a liquid receiving tank, a drain pipe, a frame, and a plurality of seals. The liquid receiving groove is used to define a storage space, and has an open end and an opening. The liquid receiving tank is used to receive the liquid discharged from the processing tank and/or water washing tank of a wet etching cleaning equipment. In one embodiment, the material of the liquid receiving tank is fluororesin. In one embodiment, the fluorine resin is at least one of polytetrafluoroethylene (TEFLON) and polyvinylidene fluoride (PVDF). The open end is arranged on the top of the liquid receiving groove. The opening is arranged at the bottom of the liquid receiving tank. The drain pipe is arranged at the opening of the liquid receiving tank. In one embodiment, the material of the drain pipe is fluororesin. In one embodiment, the fluorine resin is at least one of polytetrafluoroethylene (TEFLON) and polyvinylidene fluoride (PVDF). The frame is arranged on the open end. In an embodiment, the material of the frame is polyvinyl chloride (PVC). The plurality of seals are used to join the frame and a tank body of a wet etching cleaning equipment. In an embodiment, the plurality of sealing elements are welded, and the material of the plurality of sealing elements is polyvinyl chloride (PVC).

In another aspect, the liquid receiving device may further include at least one fixing element, wherein the at least one fixing element is used to fix the frame to the open end, so that the frame and the open end are installed More stable.

In another aspect, the liquid receiving device may further include at least one gasket, wherein the at least one gasket is disposed between the frame and the open end for tightly fitting the frame and the open end, Avoid seepage of liquid discharged from the treatment tank and/or water washing tank of a wet etching cleaning equipment.

In another aspect, the liquid receiving device may further include a plurality of baffles, wherein the plurality of baffles are arranged inside the liquid receiving groove and extend upward to above the open end to protect the frame and The plural seals prevent the liquid discharged from the treatment tank and/or water washing tank of a wet etching cleaning equipment from overflowing. In one embodiment, the material of the plurality of baffles is fluororesin. In one embodiment, the fluorine resin is at least one of polytetrafluoroethylene (TEFLON) and polyvinylidene fluoride (PVDF).

In another aspect, the present invention provides a wet etching cleaning equipment, which includes a processing tank, a tank body, a liquid receiving device and a drainage device. The processing tank is used for containing an etching solution and used for wet etching or acid treatment. The treatment tank has a drain pipe dedicated to etching liquid to drain the liquid in the treatment tank. The tank system is arranged below the drain pipe dedicated to the etching solution and used to define a storage space. The tank body has a drainage port arranged at the bottom of the tank body. The liquid receiving device is arranged in the tank. In one embodiment, the liquid receiving device can be any of the above-mentioned forms. The drainage device is connected to the drainage pipe of the liquid receiving device for draining the liquid in the liquid receiving tank.

In another aspect, the present invention provides a wet etching cleaning equipment, which includes a water washing tank, a tank body, a liquid receiving device and a drainage device. The washing tank is used for containing an aqueous solution and used for washing. The washing tank has a liquid discharge valve for discharging the liquid in the washing tank. The tank is in fluid communication with the liquid discharge valve and is used to define a storage space. The tank body has a drainage port arranged at the bottom of the tank body. The liquid receiving device is arranged in the tank. In one embodiment, the liquid receiving device can be any of the above-mentioned forms. The drainage device is connected to the drainage pipe of the liquid receiving device for draining the liquid in the liquid receiving tank.

These and other aspects will be further explained below with reference to the drawings.

The purpose, advantages and features of this creation can be more clearly understood from the detailed description of the following several embodiments and accompanying drawings. It should be understood that the various embodiments shown in the figures are schematic and are not necessarily drawn to scale.

FIG. 3 is a three-dimensional schematic diagram of the liquid receiving device according to the first embodiment of the present invention. The liquid receiving device 1 includes a liquid receiving groove 21, a drain pipe, a frame 23 and a plurality of seals. The liquid receiving groove 21 is used to define a storage space and has an open end and an opening 22. In one example, the liquid receiving device 1 is set in a tank 93 of a wet etching cleaning equipment to receive the liquid discharged from the washing tank 91 of a wet etching cleaning equipment (for example, the temperature is between 60~ 80°C high temperature aqueous solution or normal temperature aqueous solution with temperature between 20~30°C), as shown in Figure 5. In an example, the material of the liquid receiving tank 21 is polytetrafluoroethylene (TEFLON), but it is not limited thereto. The open end 26 is arranged on the top of the liquid receiving groove 21, as shown in FIG. 4. The opening 22 is provided at the bottom of the liquid receiving tank 21 and is in fluid communication with the drain port of the tank body 93 of a wet etching cleaning equipment, as shown in FIG. 5. The drain pipe 50 is arranged at the opening 22 of the liquid receiving tank 21 and is in fluid communication with a drain device 94 of a wet etching cleaning equipment for draining the liquid in the liquid receiving tank 21 as shown in FIG. 5. In an example, the drain pipe 50 is made of polytetrafluoroethylene (TEFLON), but it is not limited thereto. In an example, the connection between the drain pipe 50 and the opening 22 is the welding part 55, but it is not limited to this. The frame 23 is set on the open end 26, as shown in FIG. 4. The plurality of sealing elements 25 (for example, welding) are used to join the frame 23 and a tank body 93 of a wet etching cleaning equipment, as shown in FIG. 5. In an example, the plurality of sealing elements 25 are made of polyvinyl chloride (PVC). The liquid receiving device 1 further includes at least one fixing member 24 (for example, a bolt or rivet) for fixing the frame 23 to the open end 26, so that the installation between the frame 23 and the liquid receiving groove 21 is more stable . The liquid receiving device 1 further includes at least one gasket 30. The at least one gasket 30 (for example, an O-ring) is arranged between the frame 23 and the open end 26 to tightly fit the frame 23 and the open end 26 to avoid a wet etching cleaning device The liquid discharged from the washing tank 91 seeps out, as shown in FIG. 4.

FIG. 6 is a schematic vertical cross-sectional view of the liquid receiving device according to the second embodiment of the present invention. The liquid receiving device 1 further includes a plurality of baffles 40. The plurality of baffles 40 are arranged on the inner side of the liquid receiving tank 21 and extend upward to above the open end to protect the frame 23 and the plurality of seals 25 and avoid a washing tank of a wet etching cleaning equipment The liquid discharged by 91 overflows. In an example, the material of the plurality of baffles 40 is polytetrafluoroethylene (TEFLON), but it is not limited thereto. In an example, the connecting method of the plurality of baffles 40 can be screw mounting and fixing, but it is not limited to this.

Therefore, the liquid receiving device disclosed in this creation can be used to receive the liquid discharged from the processing tank and/or water washing tank of a wet etching cleaning equipment, and has the function of preventing the leakage of the liquid. Regardless of whether the tank of the wet etching cleaning equipment has leaked or not, this device can be added to the tank of the wet etching cleaning equipment to achieve more practical purposes and extend the service life of the wet etching cleaning equipment .

Although the above embodiments have been described in detail for the purpose of clear understanding, certain changes and modifications can be made within the scope of the appended patent application. Therefore, the embodiments of this case should be considered for illustrative purposes rather than limiting the scope of this creation. Any partial changes, amendments or additions to the technology still cannot deviate from the scope of protection of this creation.

1: Liquid receiving device 21: Liquid receiving tank 22: opening 23: Border 24: fixed parts 25: Seal 26: open end 30: Gasket 40: bezel 50: Drain pipe 55: Welding part 9: Wet etching cleaning equipment 91: washing tank 92: Liquid discharge valve 93: tank 94: Drainage device 95: Fixture 96: processing room 97: washing room 98: drying room 99: Wafer S61: Wet etching S62: Washing S621: high temperature washing S622: Wash at room temperature S63: Acid treatment S64: Dry

Figure 1 shows a schematic diagram of the structure of the wet etching cleaning equipment.

Figure 2 shows a flow chart of wet etching.

Fig. 3 shows a three-dimensional schematic diagram of the liquid receiving device according to the first embodiment of the present invention.

Fig. 4 shows an exploded view of the liquid receiving device of Fig. 3;

Fig. 5 shows a schematic vertical cross-sectional view of the liquid receiving device of Fig. 3.

Fig. 6 shows a schematic vertical cross-sectional view of the liquid receiving device according to the second embodiment of the present invention.

In the drawings of this creation, component symbols may be used repeatedly to indicate similar and/or identical components.

1: Liquid receiving device

21: Liquid receiving tank

22: opening

23: Border

24: fixed parts

Claims (11)

A liquid receiving device for wet etching cleaning equipment, including: A liquid receiving tank for defining a storage space, and having an open end and an opening, wherein the open end is set at the top of the liquid receiving tank, and the opening is set at the bottom of the liquid receiving tank; A drain pipe, set at the opening of the liquid receiving tank; A frame on the open end; and A plurality of seals are used to join the frame and a tank body of a wet etching cleaning equipment. The liquid receiving device for wet etching cleaning equipment according to claim 1, wherein the material of the liquid receiving tank is fluorine resin. The liquid receiving device for wet etching cleaning equipment according to claim 1, wherein the material of the drain pipe is fluorine resin. The liquid receiving device for wet etching cleaning equipment according to claim 1, wherein the frame and the plurality of sealing elements are made of polyvinyl chloride (PVC). The liquid receiving device for wet etching cleaning equipment as described in claim 1 further includes at least one fixing member for fixing the frame to the open end. The liquid receiving device for wet etching cleaning equipment according to claim 1 or 5, further comprising at least one gasket, which is arranged between the frame and the open end and is used to tightly seal the frame and the open end. Ends. The liquid receiving device for wet etching cleaning equipment according to claim 1, further comprising a plurality of baffles, which are arranged inside the liquid receiving groove and extend upward to above the open end. The liquid receiving device for wet etching cleaning equipment according to claim 7, wherein the material of the plurality of baffles is fluorine resin. The liquid receiving device for wet etching cleaning equipment according to claim 2, 3 or 8, wherein the fluorine resin is at least one of polytetrafluoroethylene (TEFLON) and polyvinylidene fluoride (PVDF) . A wet etching cleaning equipment, including: A treatment tank with a dedicated drain pipe for etching liquid; A trough is arranged below the drain pipe dedicated to the etching solution to define a storage space and has a drain, wherein the drain is arranged at the bottom of the trough; The liquid receiving device described in any one of claims 1-9 is set in the tank; and A drainage device connected to the drainage pipe of the liquid receiving device. A wet etching cleaning equipment, including: A water washing tank with a liquid discharge valve; A tank in fluid communication with the liquid discharge valve to define a storage space and has a drain, wherein the drain is arranged at the bottom of the tank; The liquid receiving device described in any one of claims 1-9 is set in the tank; and A drainage device connected to the drainage pipe of the liquid receiving device.

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