TWM590309U - Vacuum fixture - Google Patents
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Abstract
Description
本文所描述新型係相關於晶片封裝之領域,且更具體地係相關於晶片封裝時用於固定晶圓之治具。The new type described herein is related to the field of chip packaging, and more specifically to a jig for fixing a wafer during chip packaging.
隨著晶片封裝技術的純熟與競爭,不僅封裝之體積越來越小,晶片功能亦越來越多樣化,當多種不同材料的部件組合在晶圓上時,隨著製程中溫度的高、低溫循環,由於該等材質的熱膨脹係數(Coefficient of Thermal Expansion; CTE)之間有所差異,導致整體晶圓結構易產生形變或翹曲(warpage)。With the proficiency and competition of chip packaging technology, not only the volume of the package is getting smaller and smaller, but the functions of the chip are becoming more and more diverse. When the components of many different materials are combined on the wafer, as the temperature in the process is high and low Cycling, due to differences in the coefficient of thermal expansion (CTE) of these materials, the overall wafer structure is prone to deformation or warpage.
在封裝製程的整體過程中,翹曲是一個難解的問題,封膠(molding, M/D)後的晶圓若有翹曲產生,當後製程有黏晶(die attach, D/A)或植球(ball mount, B/M)時,經過迴焊爐處理將會造成更嚴重的翹曲。此外,當黏晶或植球在一翹曲的晶圓上作業時,經高溫烘烤將會導致晶粒偏移或是錫球異常的現象發生。其中錫球異常之情形可包括相鄰之錫球發生橋接(如短路)或甚至結合為一大球之情形。In the overall process of the packaging process, warpage is a difficult problem. If the wafer after the molding (M/D) is warped, the die attach (D/A) or When the ball is mounted (B/M), it will cause more serious warpage after being processed in the reflow furnace. In addition, when the die-bonding or bumping work on a warped wafer, the high-temperature baking will cause the deviation of the die or the abnormal phenomenon of the solder ball. The abnormal situation of the solder ball may include a situation in which adjacent solder balls are bridged (such as a short circuit) or even combined into a large ball.
根據本創作之一實施例,一真空治具,其包括一本體、一第一O型環及一載台。該本體具有一頂部,該頂部沿邊緣具有一凹槽,其中該本體之該頂部之中央具有凹陷之一容置空間,且該本體中具有自該本體之該頂部貫通至該本體之一底部之一第一通孔。該第一O型環具有彈性並置於該凹槽內。該載台置於該容置空間內,該載台具有自該載台之一頂部貫通至該載台之一底部之一第二通孔,其中該第二通孔與該第一通孔連通,其中該第一通孔及該第二通孔連接至一抽氣裝置,並經組態以對該容置空間產生一吸力。According to an embodiment of the present invention, a vacuum jig includes a body, a first O-ring, and a stage. The body has a top, the top has a groove along the edge, wherein the center of the top of the body has a recessed accommodating space, and the body has a portion extending from the top of the body to a bottom of the body A first through hole. The first O-ring has elasticity and is placed in the groove. The carrier is placed in the accommodating space, the carrier has a second through hole penetrating from a top of the carrier to a bottom of the carrier, wherein the second through hole communicates with the first through hole , Wherein the first through hole and the second through hole are connected to a suction device, and are configured to generate a suction force to the accommodating space.
此章節中描述根據本申請案之方法及裝置的代表性應用。提供此等實例以僅僅添加上下文且輔助理解所描述實施例。因此,對於熟習此項技術者而言將顯而易見,可在沒有此等特定細節中之一些或全部的情況下實踐所描述實施例。在其他例子中,尚未詳細地描述熟知之製程步驟以便避免不必要地混淆所描述實施例。其他應用係可能的,使得以下實例不應被視作限制性的。This section describes representative applications of the method and device according to the present application. These examples are provided to merely add context and assist in understanding the described embodiments. Therefore, it will be apparent to those skilled in the art that the described embodiments can be practiced without some or all of these specific details. In other instances, well-known process steps have not been described in detail in order to avoid unnecessarily obscuring the described embodiments. Other applications are possible, so that the following examples should not be considered limiting.
在以下詳細描述中,參看隨附圖式,該等圖式形成該描述之部分且其中作為說明而展示根據所描述實施例之特定實施例。儘管足夠詳細地描述此等實施例以使熟習此項技術者能夠實踐所描述實施例,但應理解,此等實例並非限制性的;使得在不脫離所描述實施例之精神及範疇的情況下,可使用其他實施例且可進行改變。In the following detailed description, reference is made to the accompanying drawings, which form part of the description and in which specific embodiments according to the described embodiments are shown as illustrations. Although these embodiments are described in sufficient detail to enable those skilled in the art to practice the described embodiments, it should be understood that these examples are not limiting; so that without departing from the spirit and scope of the described embodiments Other embodiments can be used and changes can be made.
本創作可在迴焊爐加熱之過程中將產品持續以真空吸附之方式固定以維持產品之平整,待離開迴焊爐回復到常溫後再解除真空以將產品解開,上述加熱過程工對產品之固定將可減少產品的翹曲,或至少能維持產品作業時之品質。In this creation, the product can be continuously fixed by vacuum adsorption during the heating of the reflow furnace to maintain the flatness of the product. After leaving the reflow furnace and returning to normal temperature, the vacuum is released to release the product. The above heating process works on the product The fixing will reduce the warpage of the product, or at least maintain the quality of the product during operation.
本創作提出一種新型治具,其可經迴焊爐之高溫烘烤而不會產生漏真空之現象從而導致晶圓等材料之脫落。在一實施例中,本治具可耐高溫至280℃或以上,且無漏真空現象。本創作可有效改善經高溫烘烤造成晶圓或鉭酸鍶鉍(SBT)之翹曲,且無須保持連接氣體管路,故具有機動性高,同樣可以被運用在其他需加溫之製程上。This creation proposes a new type of jig, which can be baked at a high temperature in a reflow furnace without generating a vacuum leak, resulting in the shedding of wafers and other materials. In one embodiment, the jig can withstand high temperatures to 280°C or above without vacuum leakage. This creation can effectively improve the warpage of wafers or strontium bismuth tantalate (SBT) caused by high temperature baking, and there is no need to keep the gas pipeline connected, so it has high mobility and can also be used in other processes that require heating .
本文所繪示及描述之實施例可用於固定一晶圓。然而,在各種其他實施例中,可用於固定任何合適之產品(如晶粒、晶條、晶片或基板等)。The embodiments shown and described herein can be used to secure a wafer. However, in various other embodiments, it can be used to fix any suitable product (such as die, crystal strip, wafer or substrate, etc.).
圖1A繪示一真空治具1之俯視圖。該真空治具1包含一本體11、一O型環(O-ring) 12、一載台13及一抽氣裝置17。在本創作之某些實施例中,該抽氣裝置17可包括一槽171、一閥門173及一進氣口175。在本創作之某些實施例中,該載台13可包括自該載台13之一頂部貫通至該載台13之該底部之一通孔131。應注意在所繪示之俯視圖中真空治具1為圓形是由於在本實施例中所固定之晶圓之形狀為圓形之緣故,在不同實施例中,真空治具1之形狀可依據所固定之產品之不同形狀而以不同形狀實施。例如,真空治具1可為方形、橢圓形或任何其他形狀。FIG. 1A shows a top view of a
圖1B繪示圖1A之真空治具1之剖面圖。該真空治具1包含一本體11、一O型環12、一載台13、複數個緩衝器15、一抽氣裝置17及一O型環19。在本創作之某些實施例中,該抽氣裝置17可包括一槽171、一閥門173及一進氣口175。沿該本體11之頂部之邊緣兩側各有一凹槽以放置該O型環12,該本體11之頂部之中央則具有凹陷之一容置空間,該載台13置於該容置空間內,該容置空間之底部連接有該複數個緩衝器15之一端,該複數個緩衝器之各者之另一端則與該載台13之底部連接,使該載台13浮動地連接至該本體11。該複數個緩衝器15提供該本體11及該載台13之間之彈性連接,故該本體11及該載台13之間具有一間隙。在本創作之某些實施例中,該複數個緩衝器15可為複數個彈簧。FIG. 1B is a cross-sectional view of the
該本體11中具有自該本體11之該頂部貫通至該本體11之一底部之一通孔111。該載台13中進一步具有自該載台13之一頂部貫通至該載台13之該底部之一通孔131,該通孔131與該本體11中之該通孔111連通並經由該本體11中之該通孔111貫穿至該本體11之底部。在本創作之某些實施例中,該通孔111及該通孔131連接至該抽氣裝置17,該抽氣裝置17經組態以對該容置空間產生一吸力。The
該本體11進一步置於該抽氣裝置17上方。如圖1B所示,在本創作之某些實施例中,該抽氣裝置17可包括一槽171、一閥門173及一進氣口175。該槽171可為一空心之金屬槽,其具有一內部空間1711。在本創作之某些實施例中,該槽171可為一空心之不銹鋼槽。在本創作之某些實施例中,該槽171可與該本體11以不同材質構成。在本創作之某些實施例中,該槽171可與該本體11以相同材質構成。在本創作之某些實施例中,該槽171可與該本體11一體成型。該槽171之頂面具有一開口1713,該開口1713與該通孔131連通。The
在本創作之某些實施例中,該槽171與該本體11之間進一步包含一O型環19,該O型環19可對該槽171與該本體11之間進行一密封,以確保上述空間與外界之隔離。In some embodiments of the present invention, an O-
載本創作之抹某實施例中,該抽氣裝置17可進一步包含一閥門173及一進氣口175,其中可調整該閥門173以使該槽173之內部空間1711與該進氣口175連通或隔離。在本創作之某些實施例中,該槽171之內部空間1711在該閥門173開啟並與該進氣口175連通之情況下,可經由該進氣口175以對該槽171之內部空間1711進行進氣。在本創作之某些實施例中,該槽171之內部空間1711在該閥門173開啟並與該進氣口175連通之情況下,該進氣口175可連接至一管路以對該槽171之內部空間1711進行抽氣以形成一真空狀態。In an embodiment of the present invention, the
圖2A繪示真空治具1(包括所固定之晶圓)之俯視圖。該真空治具1與圖1A中之真空治具1相同或相似,如圖2A所示,將一晶圓21放置於該真空治具1上。FIG. 2A shows a top view of the vacuum jig 1 (including the fixed wafer). The
圖2B繪示圖2A之真空治具1(包括所固定之晶圓21)之剖面圖。該真空治具1與圖2A中之真空治具1相同或相似。如圖2B所示,該本體10與該載台13需用於固定晶圓21並減少晶圓21之翹曲,故該本體11與該載台13之材質較佳可使用在迴焊爐之高溫下相對堅硬之材質。在本創作之某些實施例中,該本體11可為金屬材質。在本創作之某些實施例中,該本體11可為鋁合金材質。在本創作之某些實施例中,該本體11可為不銹鋼材質。在本創作之某些實施例中,該載台13可為金屬材質。在本創作之某些實施例中,該載台13可為塑料材質。在本創作之某些實施例中,該載台13可為鐵氟龍材質。FIG. 2B is a cross-sectional view of the
如圖2B所示,該晶圓21可放置於該O型環12及該載台13上,該O型環12本身具有一彈性,而該載台13係浮動地連接至該本體11,故放置於該O型環12及該載台13上之該晶圓21相對於該本體11同樣並非完全固定而具有浮動性,故該晶圓21與該本體11之間同樣具有一間隙。該載台13中進一步具有一通孔131,該通孔131延伸並經由該本體中之一通孔111貫穿至該本體11之底部。在本創作之某些實施例中,該通孔131與位於該本體11及該載台13之間之間隙以及位於該本體11及該晶圓21之間之間隙相通,且此相同之空間藉由該O型環12而與外界隔離而密封。As shown in FIG. 2B, the
該槽171之頂面具有一開口1713,該開口1713與該通孔131連通,從而將該通孔131與位於該本體11及該載台13之間之間隙以及位於該本體11及該晶圓21之間之間隙相通而形成之空間進一步延伸至該槽171之內部空間1711。在本創作之某些實施例中,該槽171與該本體11之間進一步包含一O型環19,該O型環19可對該槽171與該本體11之間進行一密封,以確保上述空間與外界之隔離。The top surface of the
由於該通孔131與該槽171之內部空間1711相連接,當該槽171之內部空間1711形成一真空狀態時,該通孔131內同樣亦可形成一真空狀態,透過該通孔131將於該晶圓21之上下方形成一壓力差,從而產生一吸力以將晶圓21吸附並固定於該載台13上,此時位於該本體11及該載台13之間之間隙以及位於該本體11及該晶圓21之間之間隙同樣亦可形成一真空狀態。Since the through
於本創作之某些實施例中,該載台13可具有相似於該通孔131之複數個通孔,該本體11可具有相似於該通孔111之複數個通孔,而該槽171亦將有對應之相似於該開口1713之複數個開口,且各開口與各對應之通孔之間亦包含相似於該O型環19之個別O型環。In some embodiments of the present invention, the
在本創作之某些實施例中,O型環為橡膠材質製作,形狀與橫截面均為圓形,適用於軸向與徑向之密封元件。在本創作之某些實施例中,O型環之材料可為耐油橡膠(NBR)、氟素橡膠(FKM)、矽膠(Silicon)等材質,以適用於各種高低溫、酸鹼、溶劑、防靜電等環境。在本創作之某些實施例中,該O型環12及該O型環19之材質經選擇以使該O型環12及該O型環19能夠耐受迴焊爐之高溫烘烤(例如280℃或以上)而仍能維持密封之特性而不使形成之真空在高溫狀態下消失。In some embodiments of the present invention, the O-ring is made of rubber material, and the shape and cross section are circular, which is suitable for axial and radial sealing elements. In some embodiments of this creation, the material of the O-ring may be oil-resistant rubber (NBR), fluororubber (FKM), silicone (Silicon), etc., to be suitable for various high and low temperatures, acids, bases, solvents, Static electricity and other environments. In some embodiments of the present invention, the materials of the O-
圖3A-H進一步說明本創作於製程中操作之實施例。Figures 3A-H further illustrate embodiments of the operation of this creation in the manufacturing process.
圖3A繪示真空治具1在晶圓21放置前連接氣體管路之剖面圖。如圖3A所示,真空治具1尚未放置一晶圓。FIG. 3A shows a cross-sectional view of the
圖3B繪示真空治具在晶圓21放置後連接氣體管路抽真空前之剖面圖。如圖3B所示,將晶圓21放置於該真空治具1上。此時該進氣孔175連接至一管路23,但將該閥門173關閉以使該槽171之內部空間1711與該進氣口175隔離。FIG. 3B shows a cross-sectional view of the vacuum jig after the
圖3C繪示真空治具1在晶圓21放置後連接氣體管路抽真空後之剖面圖。如圖3C所示,將該閥門173開啟以使該槽171之內部空間1711與該進氣口175連通,同時透過與該進氣孔175連接之該管路23進行抽氣。當該槽171之內部空間1711形成一真空狀態時,由於該通孔131與該槽171之內部空間1711相連接,該通孔131內同樣亦可形成一真空狀態,透過該通孔131於該晶圓21之上下方形成一壓力差,從而可將晶圓21吸附並固定於該載台13上,此時位於該本體11及該載台13之間之間隙以及位於該本體11及該晶圓21之間之間隙同樣亦可形成一真空狀態。此時由於該晶圓21有一向下之力量,將使該載台13被向下拉引而向該本體11靠近,同時使該複數個緩衝器15被壓縮,且由於該晶圓21向該本體11靠近,該O型環12於該晶圓21及該本體11之間被擠壓而使該O型環12之截面呈橢圓形,該O型環12此時可將該本體11及該晶圓21之間之間隙密封並與外界隔離。FIG. 3C shows a cross-sectional view of the
圖3D繪示真空治具1在晶圓21放置後連接氣體管路抽真空後關上閥門之剖面圖。如圖3D所示,當該槽171之內部空間1711已呈真空狀態,將該閥門173關閉,以使該槽171之內部空間1711與該進氣口175隔離。FIG. 3D shows a cross-sectional view of the
圖3E繪示真空治具在晶圓放置後移除氣體管路後之剖面圖。如圖3E所示,將連接至該進氣口175之該管路23移除,此時由於該閥門173已關閉而使該槽171之內部空間1711與該進氣口175隔離,故該槽171之內部空間1711及該通孔131仍維持真空狀態,該晶圓21亦維持被吸附至該載台13之狀態。且由於連接至該進氣口175之該管路23已被移除,該晶圓21及該真空治具1將可自由移動並具有機動性,且亦不會產生管路23之材質無法耐受迴焊爐之高溫之情形。在本創作之某些實施例中,可將該晶圓21及該真空治具1以圖3D所示之狀態置入迴焊爐中進行作業。FIG. 3E illustrates a cross-sectional view of the vacuum jig after removing the gas pipeline after the wafer is placed. As shown in FIG. 3E, the
圖3F繪示真空治具1在晶圓21放置後打開閥門173之剖面圖。如圖3F所示,當於迴焊爐中作業完畢並移出迴焊爐後,可將該閥門173開啟以使該槽171之內部空間1711及該通孔131與該進氣口175連通,此時外界之氣體將經由該進氣口175進入該槽171之內部空間1711及該通孔131,從而解除真空狀態,此時由於該晶圓21之上下壓力差消失,該晶圓21向下之力量將減少,從而使該載台13遠離該本體11,同時導致該複數個緩衝器15解除壓縮狀態。此時由於該晶圓21遠離該本體11,該O型環12將解除壓縮狀態而恢復原形狀。3F shows a cross-sectional view of the
圖3G繪示真空治具在取走晶圓後之剖面圖。如圖3G所示,由於真空狀態已解除,可將晶圓21自該真空治具1移除,此時該閥門173仍維持開啟之狀態。FIG. 3G shows a cross-sectional view of the vacuum jig after removing the wafer. As shown in FIG. 3G, since the vacuum state has been released, the
圖3H繪示真空治具在取走晶圓後關上閥門之剖面圖。如圖3H所示,將該閥門173關閉,可接著準備將另一晶圓置於該真空治具1上以再進行迴焊爐作業。FIG. 3H shows a cross-sectional view of the vacuum jig after the wafer is removed and the valve is closed. As shown in FIG. 3H, the
應注意,圖3A-H中之操作僅係本創作之一實施例。在某些實施例中,可依不同順序執行操作。另外,在各種實施例中,可包括額外操作。It should be noted that the operations in FIGS. 3A-H are only one embodiment of this creation. In some embodiments, operations may be performed in a different order. In addition, in various embodiments, additional operations may be included.
雖然上文已描述特定實施例,但是這些實施例非意欲限制本揭露之範疇,即使針對一特定特徵僅描述一單一實施例。在本揭露中所提供之特徵之實例意欲為闡釋性而非限制性,除非另有陳述。以上描述意欲涵蓋對受益於本揭露之所屬技術領域中具有通常知識者將是顯而易見的此類替代例、修改例、及等效例。Although specific embodiments have been described above, these embodiments are not intended to limit the scope of the present disclosure, even if only a single embodiment is described for a specific feature. The examples of features provided in this disclosure are intended to be illustrative and not limiting, unless stated otherwise. The above description is intended to cover such alternatives, modifications, and equivalents that will be apparent to those of ordinary skill in the art to benefit from the present disclosure.
1‧‧‧真空治具
11‧‧‧本體
12‧‧‧O型環
13‧‧‧載台
15‧‧‧緩衝器
17‧‧‧抽氣裝置
19‧‧‧O型環
21‧‧‧晶圓
23‧‧‧管路
111‧‧‧通孔
131‧‧‧通孔
171‧‧‧槽
173‧‧‧閥門
175‧‧‧進氣口
1711‧‧‧內部空間
1713‧‧‧開口
1‧‧‧
可藉由參考以下描述及隨附圖式來較好地理解所描述實施例。另外,可藉由參考以下描述及隨附圖式來較好地理解所描述實施例之優點,在該等圖式中:The described embodiments can be better understood by referring to the following description and accompanying drawings. In addition, the advantages of the described embodiments can be better understood by referring to the following description and accompanying drawings, in which:
圖1A繪示真空治具之俯視圖。FIG. 1A shows a top view of a vacuum fixture.
圖1B繪示圖1A之真空治具之剖面圖。FIG. 1B is a cross-sectional view of the vacuum jig of FIG. 1A.
圖2A繪示真空治具(包括所固定之晶圓)之俯視圖。FIG. 2A shows a top view of the vacuum jig (including the fixed wafer).
圖2B繪示圖2A之真空治具(包括所固定之晶圓)之剖面圖。FIG. 2B is a cross-sectional view of the vacuum jig of FIG. 2A (including the fixed wafer).
圖3A繪示真空治具在晶圓放置前連接氣體管路之剖面圖。FIG. 3A shows a cross-sectional view of the vacuum jig connected to the gas pipeline before the wafer is placed.
圖3B繪示真空治具在晶圓放置後連接氣體管路抽真空前之剖面圖。FIG. 3B shows a cross-sectional view of the vacuum jig after the wafer is placed and before connecting the gas pipeline to evacuate.
圖3C繪示真空治具在晶圓放置後連接氣體管路抽真空後之剖面圖。FIG. 3C shows a cross-sectional view of the vacuum jig after the wafer is placed and connected to the gas pipeline for evacuation.
圖3D繪示真空治具在晶圓放置後連接氣體管路抽真空後關上閥門之剖面圖。FIG. 3D shows a cross-sectional view of the vacuum jig connected to the gas pipeline after the wafer is placed, and then the valve is closed.
圖3E繪示真空治具在晶圓放置後移除氣體管路後之剖面圖。FIG. 3E illustrates a cross-sectional view of the vacuum jig after removing the gas pipeline after the wafer is placed.
圖3F繪示真空治具在晶圓放置後打開閥門之剖面圖。FIG. 3F shows a cross-sectional view of the vacuum jig after the wafer is placed and the valve is opened.
圖3G繪示真空治具在取走晶圓後之剖面圖。FIG. 3G shows a cross-sectional view of the vacuum jig after removing the wafer.
圖3H繪示真空治具在取走晶圓後關上閥門之剖面圖。FIG. 3H shows a cross-sectional view of the vacuum jig after the wafer is removed and the valve is closed.
1‧‧‧真空治具 1‧‧‧Vacuum Fixture
11‧‧‧本體 11‧‧‧Body
12‧‧‧O型環 12‧‧‧O-ring
13‧‧‧載台 13‧‧‧ stage
15‧‧‧緩衝器 15‧‧‧buffer
17‧‧‧抽氣裝置 17‧‧‧Suction device
19‧‧‧O型環 19‧‧‧O-ring
21‧‧‧晶圓 21‧‧‧ Wafer
111‧‧‧通孔 111‧‧‧Through hole
131‧‧‧通孔 131‧‧‧Through hole
171‧‧‧槽 171‧‧‧slot
173‧‧‧閥門 173‧‧‧Valve
175‧‧‧進氣口 175‧‧‧Air inlet
1711‧‧‧內部空間 1711‧‧‧Internal space
1713‧‧‧開口 1713‧‧‧ opening
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW108209904U TWM590309U (en) | 2019-07-29 | 2019-07-29 | Vacuum fixture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW108209904U TWM590309U (en) | 2019-07-29 | 2019-07-29 | Vacuum fixture |
Publications (1)
Publication Number | Publication Date |
---|---|
TWM590309U true TWM590309U (en) | 2020-02-01 |
Family
ID=70413978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108209904U TWM590309U (en) | 2019-07-29 | 2019-07-29 | Vacuum fixture |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWM590309U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI733433B (en) * | 2020-05-05 | 2021-07-11 | 吳有榮 | Leveling-docking equipment for chip and substrate and method thereof |
TWI751722B (en) * | 2020-09-28 | 2022-01-01 | 帆宣系統科技股份有限公司 | Wafer cloth glue fixture |
-
2019
- 2019-07-29 TW TW108209904U patent/TWM590309U/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI733433B (en) * | 2020-05-05 | 2021-07-11 | 吳有榮 | Leveling-docking equipment for chip and substrate and method thereof |
TWI751722B (en) * | 2020-09-28 | 2022-01-01 | 帆宣系統科技股份有限公司 | Wafer cloth glue fixture |
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