TWM577959U - Environment retaining system for precision production - Google Patents

Environment retaining system for precision production Download PDF

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Publication number
TWM577959U
TWM577959U TW107214598U TW107214598U TWM577959U TW M577959 U TWM577959 U TW M577959U TW 107214598 U TW107214598 U TW 107214598U TW 107214598 U TW107214598 U TW 107214598U TW M577959 U TWM577959 U TW M577959U
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Taiwan
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environment
process processing
accommodating space
space
movable door
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TW107214598U
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Chinese (zh)
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李小丁
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大陸商深圳市辰中科技有限公司
香港商瑞澤科技有限公司
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Priority to TW107214598U priority Critical patent/TWM577959U/en
Publication of TWM577959U publication Critical patent/TWM577959U/en

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Abstract

本創作公開一種用於精密生產的環境保持系統,其主要包含一輸送卡 匣及一製程處理設備。所述輸送卡匣內設有一第一環境保持裝置以保持一正壓環境,所述製程處理設備內設有一第二環境保持裝置以保持一正壓環境及恆溫/恆濕環境,當所述輸送卡匣與所述製程處理設備結合後,可使所述輸送卡匣的一容置空間暴露於所述製程處理設備的一作業空間內,並取出待加工產品放置於所述製程處理設備進行製程加工作業。因此,無論是在儲存、搬運還是在生產過程中,都能有效提高產品的潔淨度。 The present invention discloses an environment holding system for precision production, which mainly comprises a conveyor card 匣 and a process processing equipment. A first environment holding device is disposed in the conveying cassette to maintain a positive pressure environment, and a second environment holding device is disposed in the processing device to maintain a positive pressure environment and a constant temperature/humidity environment. After the cassette is combined with the process processing device, an accommodating space of the transport cassette is exposed to a working space of the process processing device, and the product to be processed is taken out and placed in the process processing device for processing. Processing operations. Therefore, whether it is in storage, handling or in the production process, it can effectively improve the cleanliness of the product.

Description

用於精密生產的環境保持系統 Environmental retention system for precision production

本創作涉及一種半導體與平板顯示技術領域,特別是涉及一種在無塵室等級的精密生產環境下提升潔淨度的系統。 The present invention relates to the field of semiconductor and flat panel display technology, and more particularly to a system for improving cleanliness in a precision production environment of a clean room class.

近年來,人們對液晶顯示面板要求越來越高,超薄、重量輕、低耗電,可以提供更豔麗的色彩和更清晰的影像的低溫多晶矽(Low Temperature Poly-silicon,LTPS)等高階面板越來越受到青睞。但是,LTPS等高價面板生產遇到良率不高的技術瓶頸。其中很大一部分原因在於無塵室環境的潔淨度(空氣污染物如灰塵、酸碱氣體、有機物、硼元素等)以及溫度和濕度等無法達到解析度要求。 In recent years, high-order panels such as Low Temperature Poly-silicon (LTPS), which are more and more demanding for liquid crystal display panels, are ultra-thin, light in weight, and low in power consumption, and can provide more vivid colors and clearer images. More and more popular. However, high-priced panel production such as LTPS has encountered a technical bottleneck with low yield. A large part of the reason is that the cleanliness of the clean room environment (air pollutants such as dust, acid and alkali gases, organic matter, boron, etc.) and temperature and humidity cannot meet the resolution requirements.

一直以來,製造液晶顯示組件、半導體組件(集成電路)等電子組件的工廠,為了保證產品的潔淨度,現有的做法通過設計無塵室,主要是採用氣流(Air Flow)的理念形成一封閉型式的環境,利用空氣過濾單元(Fan Filter Unit,FFU)產生潔淨氣體將原本環境內部的髒空氣帶走,再由濾網過濾髒空氣內的微粒子(Particle),進而達到符合無塵等級的環境。無塵室內自動倉儲系統、裝載卸載裝置、緩存裝置、基板平臺等使用的回風均採用整個無塵室大環境的氣流循環方式。 In the factory for manufacturing electronic components such as liquid crystal display components and semiconductor components (integrated circuits), in order to ensure the cleanliness of the products, the existing practice is to form a closed type by designing a clean room, mainly using the concept of air flow. The environment uses a Fan Filter Unit (FFU) to generate clean gas to remove the dirty air inside the original environment, and then filter the particles in the dirty air to achieve a dust-free environment. The return air used in the clean room automatic storage system, loading and unloading device, buffer device, and substrate platform adopts the air circulation mode of the entire clean room environment.

然而,因無塵室環境較大,各設備間氣流循環時相互干擾,產品在倉儲、搬運及生產過程中極易受到環境潔淨度的影響,其無塵等級僅能維持到Class 10(0.3u)(1立方米空氣中大於0.3um大小的顆粒不超過10顆)。而未來高解析度LTPS/OLED等高價產品則可能要求Class 1(0.1u)的潔淨度(1立方米空氣中大於0.1um大小的顆粒不超過1顆)。因此造成現有技術無法解決LTPS/IGZO/AM-OLED等高精密產品生產潔淨度、溫濕度等達不到要求的問題。 However, due to the large clean room environment, the airflow between the equipments interferes with each other. The products are highly susceptible to environmental cleanliness during storage, handling and production. The dust-free grade can only be maintained to Class 10 (0.3u). (No more than 10 particles larger than 0.3um in 1 cubic meter of air). In the future, high-priced products such as high-resolution LTPS/OLED may require Class 1 (0.1u) cleanliness (no more than one particle larger than 0.1um in 1 cubic meter of air). Therefore, the prior art cannot solve the problem that the cleanliness, temperature and humidity of the high-precision products such as LTPS/IGZO/AM-OLED cannot meet the requirements.

有鑑於此,有必要提供一種用於精密生產的環境保持系統,以解決現有無塵室環境的潔淨度不足的問題。 In view of this, it is necessary to provide an environmental maintenance system for precision production to solve the problem of insufficient cleanliness of the existing clean room environment.

本創作的主要目的在於提供一種用於精密生產的環境保持系統,其主要包含一輸送卡匣及一製程處理設備。所述輸送卡匣與所述製程處理設備可以分別或在結合後保持良好的環境的潔淨度,無論是在儲存、搬運還是在生產過程中,都能有效提高產品的潔淨度,並解決LTPS/IGZO/OLED等高精密產品生產潔淨度、溫濕度等達不到要求的問題。 The main purpose of the present invention is to provide an environment holding system for precision production, which mainly comprises a transport cassette and a process processing device. The transport cassette and the process processing device can maintain good environmental cleanliness separately or after combination, and can effectively improve the cleanliness of the product, whether in storage, handling or in the production process, and solve the LTPS/ High-precision products such as IGZO/OLED produce problems such as cleanliness, temperature and humidity that cannot meet the requirements.

為達上述目的,本創作提供一種用於精密生產的環境保持系統,其包含:一輸送卡匣,其包含一容置空間、一可開關的第一活動艙門及一第一環境保持裝置,其中所述容置空間用於承載至少一待加工產品;所述第一活動艙門設於所述容置空間的一側邊以使所述容置空間形成密封,所述第一環境保持裝置使所述容置空間內保持一正壓環境;及 一製程處理設備,其包含一作業空間、一可開關的第二活動艙門、一內部運輸單元及一第二環境保持裝置,其中所述作業空間用於加工所述待加工產品;所述第二活動艙門設於所述作業空間的一側邊;當所述輸送卡匣的第一活動艙門與所述製程處理設備的第二活動艙門結合並打開時;所述輸送卡匣的容置空間暴露於所述製程處理設備的作業空間內;所述內部運輸單元用於在所述容置空間及所述作業空間之間來回運送所述待加工產品;當所述第二活動艙門關閉時,所述作業空間形成密封,所述第二環境保持裝置使所述作業空間內保持一正壓及恆溫/恆濕環境。 In order to achieve the above object, the present invention provides an environment holding system for precision production, comprising: a transport cassette comprising a receiving space, a switchable first movable door and a first environment holding device; The accommodating space is configured to carry at least one product to be processed; the first movable door is disposed at one side of the accommodating space to form a seal for the accommodating space, and the first environment holding device Maintaining a positive pressure environment in the accommodating space; and a process processing apparatus comprising a work space, a switchable second movable door, an internal transport unit and a second environment holding device, wherein the work space is for processing the product to be processed; a second movable door is disposed at one side of the working space; when the first movable door of the conveying cassette is combined with the second movable door of the process processing device and opened; The accommodating space is exposed to the working space of the process processing device; the internal transport unit is configured to transport the product to be processed back and forth between the accommodating space and the working space; when the second active compartment When the door is closed, the working space forms a seal, and the second environment holding device maintains a positive pressure and a constant temperature/humidity environment in the working space.

在本創作的一實施例中,所述第一環境保持裝置包含一第一空氣過濾單元,其使所述容置空間內保持一正壓環境。 In an embodiment of the present invention, the first environment holding device includes a first air filtering unit that maintains a positive pressure environment in the accommodating space.

在本創作的一實施例中,所述第二環境保持裝置包含一第二空氣過濾單元及一溫濕度控製單元,所述第二空氣過濾單元使所述製程處理設備內保持一正壓環境,所述溫濕度控制單元使所述製程處理設備內保持一恆溫/恆濕環境。 In an embodiment of the present invention, the second environment holding device includes a second air filtering unit and a temperature and humidity control unit, and the second air filtering unit maintains a positive pressure environment in the process processing device. The temperature and humidity control unit maintains a constant temperature/humidity environment in the process processing apparatus.

在本創作的一實施例中,所述內部運輸單元為一機械於臂。 In an embodiment of the present creation, the internal transport unit is a mechanical arm.

在本創作的一實施例中,所述製程處理設備是一化學氣相沉積(CVD)設備或一准分子激光退火(ELA)設備。 In an embodiment of the present creation, the process processing apparatus is a chemical vapor deposition (CVD) apparatus or an excimer laser annealing (ELA) apparatus.

本創作技術方案與背景技術相比,它具有如下優點:本創作實施例的一種用於精密生產的環境保持系統可用來提升精密生產環境(如無塵室)的潔淨度,無論是在儲存、搬運還是在生產過程中,除了依賴整個工廠大環境的回風系統外,均將產品使用小環境增加獨立的回風系統。並且,本創作可針對工廠內某些對產品潔淨度及溫濕度要求極高的製程單獨設計小環境增加獨立 的回風系統。通過上述本創作的一種用於精密生產的環境保持系統,使產品在整個儲存、搬運及生產過程中均淨化處理空氣污染物(灰塵、酸碱氣體、有機物、硼元素等),以及恆定溫度和恆定濕度。因此可以解決LTPS/IGZO/AM-OLED等高精密產品生產潔淨度、溫濕度等達不到要求的問題。其中,通過所述輸送卡匣10及所述製程處理設備20,可顯著提高了產品潔淨度從class 10(0.3u)提升到class 1(0.1u)。並且,系統中各裝置環境相互獨立,各自潔淨度、溫濕度等獨立可控,以及可針對工廠內某些對產品潔淨度及溫濕度要求極高的製程單獨設計小環境增加獨立的回風系統。既達到潔淨度要求,又節約成本。 Compared with the background art, the creative technical solution has the following advantages: an environmental maintenance system for precision production of the present embodiment can be used to improve the cleanliness of a precision production environment (such as a clean room), whether in storage, In the production process, in addition to relying on the return air system of the entire factory environment, the product uses a small environment to increase the independent return air system. In addition, this creation can increase the independence of some small environments in the factory for certain processes that require high cleanliness and temperature and humidity. Return air system. Through the above-mentioned environment-preserving system for precision production, the product is purified and treated for air pollutants (dust, acid and alkali gas, organic matter, boron, etc.), and constant temperature and throughout the storage, handling and production process. Constant humidity. Therefore, it is possible to solve the problem that the production purity, temperature and humidity of the high-precision products such as LTPS/IGZO/AM-OLED cannot meet the requirements. Among them, through the transport cassette 10 and the process processing device 20, the product cleanliness can be significantly improved from class 10 (0.3u) to class 1 (0.1u). Moreover, the environment of each device in the system is independent of each other, and the cleanliness, temperature and humidity are independently controllable, and the independent return air system can be added separately for some processes in the factory that have high requirements on product cleanliness and temperature and humidity. . It meets both cleanliness requirements and cost savings.

100‧‧‧精密生產的環境保持系統 100‧‧‧Precisely produced environmental retention system

200‧‧‧待加工產品 200‧‧‧Processed products

300‧‧‧外部運輸單元 300‧‧‧External transport unit

10‧‧‧輸送卡匣 10‧‧‧Transportation card

11‧‧‧容置空間 11‧‧‧ accommodating space

12‧‧‧第一活動艙門 12‧‧‧First activity door

13‧‧‧第一環境保持裝置 13‧‧‧First environmental holding device

13a‧‧‧第一空氣過濾單元 13a‧‧‧First air filter unit

20‧‧‧製程處理設備 20‧‧‧Process processing equipment

21‧‧‧作業空間 21‧‧‧Work space

22‧‧‧第二活動艙門 22‧‧‧Second activity hatch

23‧‧‧內部運輸單元 23‧‧‧Internal transport unit

24‧‧‧第二環境保持裝置 24‧‧‧Second environmental holding device

24a‧‧‧第二空氣過濾單元 24a‧‧‧Second air filter unit

24b‧‧‧溫濕度控制單元 24b‧‧‧temperature and humidity control unit

[圖1]係本創作實施例的一種用於精密生產的環境保持系統的示意圖;[圖2A-2F]係本創作實施例的一種用於精密生產的環境保持方法的動作示意圖。 [Fig. 1] A schematic view of an environment holding system for precision production according to the present embodiment; [Fig. 2A - 2F] is a schematic view showing the operation of an environment holding method for precision production of the present embodiment.

為讓本創作上述目的、技術手段及優點更明顯易懂,下文特舉本創作實施例,並配合附圖,作詳細說明。為讓本創作上述目的、技術手段及優點更明顯易懂,下文特舉本創作較佳實施例,並配合附圖,作詳細說明如下。再者,本創作所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」、「內」、「外」、「側面」等,僅是參照附加圖式的方向。因此,使用的方向用語是用以說明及理解本創作,而非用以限制本創作。 In order to make the above objects, technical means and advantages of the present invention more obvious and easy to understand, the present embodiment will be described in detail below with reference to the accompanying drawings. In order to make the above objects, technical means and advantages of the present invention more obvious and easy to understand, the preferred embodiments of the present invention are described below in detail with reference to the accompanying drawings. Furthermore, the directional terms mentioned in this creation, such as "upper", "lower", "before", "after", "left", "right", "inside", "outside", "side", etc. Just refer to the direction of the additional schema. Therefore, the directional terminology used is used to describe and understand the creation, and is not intended to limit the creation.

附圖和說明被認為在本質上是示出性的,而不是限制性的。在圖中,結構相似的單元是以相同標號表示。另外,為了理解和便於描述,附圖中示出的每個組件的尺寸和厚度是任意示出的,但是本創作不限於此。 The drawings and the description are to be regarded as illustrative rather than restrictive. In the figures, structurally similar elements are denoted by the same reference numerals. In addition, the size and thickness of each component shown in the drawings are arbitrarily shown for the sake of understanding and convenience of description, but the present creation is not limited thereto.

在附圖中,為了清晰起見,誇大了層、膜、面板、區域等的厚度。在附圖中,為了理解和便於描述,誇大了一些層和區域的厚度。將理解的是,當例如層、膜、區域或基底的組件被稱作“在”另一組件“上”時,所述組件可以直接在所述另一組件上,或者也可以存在中間組件。 In the figures, the thickness of layers, films, panels, regions, etc. are exaggerated for clarity. In the drawings, the thickness of layers and regions are exaggerated for the purposes of illustration and description. It will be understood that when a component such as a layer, a film, a region or a substrate is referred to as being "on" another component, the component can be directly on the other component or an intermediate component can also be present.

另外,在說明書中,除非明確地描述為相反的,否則詞語“包括”將被理解為意指包括所述組件,但是不排除任何其它組件。此外,在說明書中,“在......上”意指位於目標組件上方或者下方,而不意指必須位於基於重力方向的頂部上。 In addition, in the specification, the word "comprising" is to be understood to include the component, but does not exclude any other component. Further, in the specification, "on" means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.

請參照圖1,其是本創作實施例的一種用於精密生產的環境保持系統的示意圖。本創作實施例的一種用於精密生產的環境保持系統100,其可包含:一輸送卡匣10及一製程處理設備20。 Please refer to FIG. 1, which is a schematic diagram of an environment-preserving system for precision production according to an embodiment of the present invention. An environment-preserving system 100 for precision production of the present embodiment may include: a transport cassette 10 and a process processing device 20.

所述輸送卡匣10其包含一容置空間11、一可開關的第一活動艙門12及一第一環境保持裝置13,其中所述容置空間11用於承載至少一待加工產品200;所述第一活動艙門12設於所述容置空間11的一側邊以使所述容置空間11形成密封,所述第一環境保持裝置13使所述容置空間11內保持一正壓環境。 The transport cassette 10 includes an accommodating space 11, a switchable first movable door 12, and a first environment holding device 13, wherein the accommodating space 11 is used to carry at least one product to be processed 200; The first movable door 12 is disposed at one side of the accommodating space 11 to form a seal for the accommodating space 11 , and the first environment holding device 13 maintains a positive inside the accommodating space 11 . Pressure the environment.

所述製程處理設備20包含一作業空間21、一可開關的第二活動艙門22、一內部運輸單元23及一第二環境保持裝置24,其中所述作業空間21用於加工所述待加工產200;所述第二活動艙門22設於所述作業空間21的一側邊;當所述輸送卡匣10的第一活動艙門12與所述製程處理設備20的第二活動艙門22結合 並打開時;所述輸送卡匣10的容置空間11暴露於所述製程處理設備20的作業空間21內;所述內部運輸單元23用於在所述容置空間11及所述作業空間21之間來回運送所述待加工產品200;當所述第二活動艙門22關閉時,所述作業空間21形成密封,所述第二環境保持裝置24使所述作業空間21內保持一正壓及恆溫/恆濕環境。 The process processing device 20 includes a work space 21, a switchable second activity door 22, an internal transport unit 23, and a second environment holding device 24, wherein the work space 21 is used to process the to-be-processed Production 200; the second movable door 22 is disposed at one side of the working space 21; when the first movable door 12 of the conveying cassette 10 and the second movable door of the process processing device 20 22 combined When it is opened, the accommodating space 11 of the transport cassette 10 is exposed to the working space 21 of the process processing device 20; the internal transport unit 23 is used in the accommodating space 11 and the working space 21 The product to be processed 200 is transported back and forth; when the second movable door 22 is closed, the working space 21 forms a seal, and the second environment holding device 24 maintains a positive pressure in the working space 21 And constant temperature / constant humidity environment.

在本創作的一實施例中,所述第一環境保持裝置13包含一第一空氣過濾單元13a,其使所述容置空間11內保持一正壓環境。在本創作一實施例中,所述第一空氣過濾單元13a例如是一風扇過濾組(FFU,Fan Filter Unit),所述FFU保持通電運轉狀態,所述FFU使所述輸送卡匣10內保持正壓,使所述待加工產品200(如液晶面板的玻璃基板或半導體的基板)表面如有灰塵會持續被吹出所述輸送卡匣10外。 In an embodiment of the present invention, the first environment holding device 13 includes a first air filtering unit 13a that maintains a positive pressure environment in the accommodating space 11. In an embodiment of the present invention, the first air filter unit 13a is, for example, a Fan Filter Unit (FFU), and the FFU maintains a power-on operation state, and the FFU maintains the inside of the transport cassette 10 The positive pressure causes the surface of the product to be processed 200 (such as a glass substrate of a liquid crystal panel or a substrate of a semiconductor) to continue to be blown out of the transport cassette 10 if dust is present.

在本創作另一可能實施例中,所述第一空氣過濾單元13a例如是一高壓泵單元(HPU,High-pressure Pump Unit)以及化學過濾(Chemical filter)單元。 In another possible embodiment of the present invention, the first air filter unit 13a is, for example, a high-pressure pump unit (HPU) and a chemical filter unit.

在本創作的一實施例中,所述第二環境保持裝置24包含一第二空氣過濾單元24a及一溫濕度控制單元24b,所述第二空氣過濾單元24a使所述製程處理設備20內保持一正壓環境,所述溫濕度控制單元24b使所述製程處理設備20內保持一恆溫/恆濕環境。所述第二空氣過濾單元24a例如是一高效濾網(HEPA,High Efficiency Particulate Air filter)。 In an embodiment of the present invention, the second environment holding device 24 includes a second air filtering unit 24a and a temperature and humidity control unit 24b, and the second air filtering unit 24a holds the processing device 20 in the process. In a positive pressure environment, the temperature and humidity control unit 24b maintains a constant temperature/constant humidity environment within the process processing apparatus 20. The second air filter unit 24a is, for example, a High Efficiency Particulate Air Filter (HEPA).

在本創作的一實施例中,所述內部運輸單元23為一機械手臂、滾輪或履帶等運輸裝置。 In an embodiment of the present creation, the internal transport unit 23 is a transport device such as a robot arm, a roller or a crawler.

在本創作的一實施例中,所述製程處理設備20例如是一化學氣相沉積(CVD)設備,LTPS工藝流程中化學氣相沉積(Chemical vapor deposition, 簡稱CVD)是通過氣相或者在基板表面上的化學反應,在基板上形成薄膜。用化學氣相沉積方法製備薄膜材料時,為了合成出優質的薄膜材料,必須控制好反應氣體組成、工作氣壓、基板溫度、氣體流量以及原料氣體的純度等。CVD製程通過本創作設計方式,可有效解決成膜前異物偏高問題。 In an embodiment of the present invention, the process processing device 20 is, for example, a chemical vapor deposition (CVD) device, and a chemical vapor deposition (Chemical vapor deposition) in the LTPS process. Referred to as CVD), a thin film is formed on a substrate by a gas phase or a chemical reaction on the surface of the substrate. When a thin film material is prepared by a chemical vapor deposition method, in order to synthesize a high quality thin film material, it is necessary to control the composition of the reaction gas, the working gas pressure, the substrate temperature, the gas flow rate, and the purity of the raw material gas. The CVD process can effectively solve the problem of high foreign matter before film formation by this creative design method.

在本創作的另一實施例中,所述製程處理設備20例如是一準分子激光退火(ELA)設備,LTPS的一個關鍵工藝是准分子激光退火(Excimer Laser Annealing,ELA)技術,亦即利用准分子激光作為熱源以將非晶矽結構轉換為多晶矽結構,具有更高的解析度和更快的反應速度。環境空氣污染物如灰塵、酸碱氣體、有機物、硼元素等對該製程的影響尤為明顯。ELA製程通過本創作設計方式,可有效解決酸碱及有機氣體影響圖形異常問題。 In another embodiment of the present invention, the process processing device 20 is, for example, an excimer laser annealing (ELA) device, and a key process of the LTPS is Excimer Laser Annealing (ELA) technology, that is, utilizing The excimer laser acts as a heat source to convert the amorphous germanium structure into a polycrystalline germanium structure with higher resolution and faster reaction speed. Environmental air pollutants such as dust, acid and alkali gases, organic matter, and boron are particularly important for this process. Through the creative design method, the ELA process can effectively solve the problem of acid and alkali and organic gases affecting graphic anomalies.

然不限於上述實施例,在其他實施例中,製程處理設備20也可應用於其他的半導體製程、或光電製程等精密製程中。 However, it is not limited to the above embodiment. In other embodiments, the processing device 20 can also be applied to other semiconductor processes, or optoelectronic processes and the like.

在本創作的一實施例中,所述製程處理設備20密封的方式是可以是將所述設備的四周及上、下方密封起來隔離,僅保留提供所述輸送卡匣10進出的出入口,如所述第二活動艙門22。另外,較佳地,所述製程處理設備20是由上方送入超潔淨的恆溫恆濕的空氣,並從下方抽走潔淨度低的空氣,因此所述製程處理設備20內始終保持恆溫恆濕超潔淨的狀態。 In an embodiment of the present invention, the process processing device 20 is sealed in such a manner that the circumferences and upper and lower sides of the device are sealed and isolated, and only the entrances and exits for providing the transport cassettes 10 are provided. The second activity door 22 is described. In addition, preferably, the process processing device 20 is configured to feed ultra-clean constant temperature and humidity air from above, and to remove air with low cleanliness from below, so that the process processing device 20 is always kept at a constant temperature and humidity. Ultra clean state.

綜上所述,本創作實施例的一種用於精密生產的環境保持系統100可用來提升精密生產環境(如無塵室)的潔淨度,無論是在儲存、搬運還是在生產過程中,除了依賴整個工廠大環境的回風系統外,均將產品使用小環境增加獨立的回風系統。並且,本創作可針對工廠內某些對產品潔淨度及溫濕度要求極高的製程單獨設計小環境增加獨立的回風系統。 In summary, an environment-preserving system 100 for precision production of the present embodiment can be used to improve the cleanliness of a precision production environment (such as a clean room), whether in storage, handling or in the production process, in addition to relying on Outside the return air system of the entire factory environment, the product uses a small environment to increase the independent return air system. Moreover, this creation can add a separate return air system to the factory to design a small environment separately for some processes with high requirements for product cleanliness and temperature and humidity.

請參照圖2A-2F,其是本創作實施例的一種用於精密生產的環境保持方法的動作示意圖。本創作實施例的一種用於精密生產的環境保持方法,其包含以下步驟: Please refer to FIG. 2A-2F, which are schematic diagrams of the operation of an environment holding method for precision production according to the embodiment of the present invention. An environment holding method for precision production of the present embodiment includes the following steps:

(a)如圖2A所示,提供一輸送卡匣10,其包含一容置空間11、一可開關的第一活動艙門12及一第一環境保持裝置13,其中所述容置空間11承載多個待加工產品200;關閉所述第一活動艙門12使所述容置空間11形成密封,運作所述第一環境保持裝置13使所述容置空間11內保持一正壓環境。 (a) As shown in FIG. 2A, a transport cassette 10 is provided, which includes an accommodating space 11, a switchable first movable door 12, and a first environment holding device 13, wherein the accommodating space 11 Carrying a plurality of products to be processed 200; closing the first movable door 12 to form a seal in the accommodating space 11 and operating the first environment holding device 13 to maintain a positive pressure environment in the accommodating space 11.

(b)如圖2B所示,提供一製程處理設備20,其包含一作業空間21、一可開關的第二活動艙門22、一內部運輸單元23及一第二環境保持裝置24;並運作所述第二環境保持裝置24使所述作業空間21內保持一正壓及恆溫/恆濕環境。 (b) As shown in FIG. 2B, a process processing apparatus 20 is provided, which includes a work space 21, a switchable second movable door 22, an internal transport unit 23, and a second environmental holding device 24; The second environment holding device 24 maintains a positive pressure and a constant temperature/humidity environment in the working space 21.

(c)如圖2C所示,使用一外部運輸單元300將所述輸送卡匣10運送至所述製程處理設備20。 (c) As shown in FIG. 2C, the transport cassette 10 is transported to the process processing apparatus 20 using an external transport unit 300.

(d)如圖2D所示,結合所述輸送卡匣10的第一活動艙門12與所述製程處理設備20的第二活動艙門22並同時打開,使所述輸送卡匣10的容置空間11暴露於所述製程處理設備20的作業空間21內。 (d) as shown in FIG. 2D, the first movable door 12 of the transport cassette 10 is combined with the second movable door 22 of the process processing apparatus 20 and simultaneously opened to allow the capacity of the transport cassette 10 The space 11 is exposed to the work space 21 of the process processing apparatus 20.

(e)如圖2E所示,使用所述內部運輸單元23取出所述容置空間11內的所述待加工產品200,並放置於所述製程處理設備20的作業空間21內。 (e) As shown in FIG. 2E, the product to be processed 200 in the accommodating space 11 is taken out using the internal transport unit 23 and placed in the work space 21 of the process processing apparatus 20.

(f)如圖2F所示,運作所述製程處理設備20以對所述待加工產品200進行製程加工作業。 (f) As shown in FIG. 2F, the process processing apparatus 20 is operated to perform a processing operation on the product 200 to be processed.

較佳地,所述外部運輸單元300為一自動倉儲系統的運輸單元。 Preferably, the external transport unit 300 is a transport unit of an automated storage system.

另外,所述製程加工作業完成後,使用所述內部運輸單元23將所述製程處理設備20的作業空間21內的待加工產品200送回所述輸送卡匣10的所述 容置空間11內,並可接著取出下一個待加工產品200以進行製程加工作業。當所述輸送卡匣10內的所有待加工產品200都完成作業後,即可關閉所述輸送卡匣10的第一活動艙門12與所述製程處理設備20的第二活動艙門22,並通過所述外部運輸單元300將所述輸送卡匣10移出所述製程處理設備20。 In addition, after the process operation is completed, the internal transport unit 23 is used to send the product to be processed 200 in the work space 21 of the process processing device 20 back to the transport cassette 10 The housing space 11 is accommodated, and the next product to be processed 200 can be taken out for processing work. When all the products to be processed 200 in the transport cassette 10 have completed the work, the first movable door 12 of the transport cassette 10 and the second movable door 22 of the process processing device 20 can be closed. The transport cassette 10 is removed from the process processing apparatus 20 by the external transport unit 300.

通過上述本創作的一種用於精密生產的環境保持系統與方法,使產品在整個儲存、搬運及生產過程中均淨化處理空氣污染物(灰塵、酸碱氣體、有機物、硼元素等),以及恆定溫度和恆定濕度。因此可以解決LTPS/IGZO/AM-OLED等高精密產品生產潔淨度、溫濕度等達不到要求的問題。其中,通過所述輸送卡匣10及所述製程處理設備20,可顯著提高了產品潔淨度從class 10(0.3u)提升到class 1(0.1u)。並且,系統中各裝置環境相互獨立,各自潔淨度、溫濕度等獨立可控,以及可針對工廠內某些對產品潔淨度及溫濕度要求極高的製程單獨設計小環境增加獨立的回風系統。既達到潔淨度要求,又節約成本。 Through the above-mentioned environment-preserving system and method for precision production, the product is purified and treated for air pollutants (dust, acid and alkali gas, organic matter, boron, etc.) and constant throughout the storage, handling and production process. Temperature and constant humidity. Therefore, it is possible to solve the problem that the production purity, temperature and humidity of the high-precision products such as LTPS/IGZO/AM-OLED cannot meet the requirements. Among them, through the transport cassette 10 and the process processing device 20, the product cleanliness can be significantly improved from class 10 (0.3u) to class 1 (0.1u). Moreover, the environment of each device in the system is independent of each other, and the cleanliness, temperature and humidity are independently controllable, and the independent return air system can be added separately for some processes in the factory that have high requirements on product cleanliness and temperature and humidity. . It meets both cleanliness requirements and cost savings.

“在一些實施例中”及“在各種實施例中”等用語被重複地使用。該用語通常不是指相同的實施例;但它亦可以是指相同的實施例。“包含”、“具有”及“包括”等用詞是同義詞,除非其前後文意顯示出其它意思。 Terms such as "in some embodiments" and "in various embodiments" are used repeatedly. The term generally does not refer to the same embodiment; however, it may also refer to the same embodiment. Terms such as "including", "having" and "including" are synonymous, unless the context is intended to mean otherwise.

雖然各種方法、設備、及系統的例子已被描述於本文中,但本揭示內容涵蓋的範圍並不局限於此。相反地,本揭示內容涵蓋所有合理地落在請求項界定的範圍內的方法、設備、系統及製造之物,請求項的專利範圍應依據已被建立的申請專利範圍解釋原理來加以解讀。例如,雖然上面揭示的系統的例子在其它構件之外還包括可自硬體上執行的軟體或或韌體,但應被理解的是,該等系統只是示範性的例子,並應被解讀為是限制性的例子。詳言之,任 何或所有被揭示的硬體、軟體、及/或韌體構件可被專門地被具體呈現為硬體、專門地被具體呈現為軟體、專門地被具體呈現為韌體、或硬體、軟體及/或韌體的一些組合。 Although examples of various methods, apparatus, and systems have been described herein, the scope of the disclosure is not limited in this respect. Rather, the present disclosure encompasses all methods, devices, systems, and articles of manufacture that fall within the scope of the claims. The scope of the claims is to be interpreted in accordance with the principles of the claimed scope of application. For example, while the examples of systems disclosed above include software or firmware that can be executed on a hard body in addition to other components, it should be understood that such systems are merely exemplary examples and should be interpreted as It is a restrictive example. In detail, any Any or all of the disclosed hardware, software, and/or firmware components may be specifically embodied as hardware, specifically embodied as software, specifically embodied as firmware, or as hardware or software. And/or some combination of firmware.

本創作已由上述相關實施例加以描述,然而上述實施例僅為實施本創作的範例。必需指出的是,已公開的實施例並未限制本創作的範圍。相反地,包含於新型申請專利範圍的精神及範圍的修改及均等設置均包括於本創作的範圍內。 This creation has been described by the above related embodiments, but the above embodiments are merely examples for implementing the present creation. It must be noted that the disclosed embodiments do not limit the scope of the present invention. On the contrary, modifications and equivalents of the spirit and scope of the invention are included in the scope of the present invention.

Claims (5)

一種用於精密生產的環境保持系統,其包含:一輸送卡匣,其包含一容置空間、一可開關的第一活動艙門及一第一環境保持裝置,其中所述容置空間用於承載至少一待加工產品,所述第一活動艙門設於所述容置空間的一側邊以使所述容置空間形成密封,所述第一環境保持裝置使所述容置空間內保持一正壓環境;及一製程處理設備,其包含一作業空間、一可開關的第二活動艙門、一內部運輸單元及一第二環境保持裝置,其中所述作業空間用於加工所述待加工產品,所述第二活動艙門設於所述作業空間的一側邊,當所述輸送卡匣的第一活動艙門與所述製程處理設備的第二活動艙門結合並打開時,所述輸送卡匣的容置空間暴露於所述製程處理設備的作業空間內,所述內部運輸單元用於在所述容置空間及所述作業空間之間來回運送所述待加工產品,當所述第二活動艙門關閉時,所述作業空間形成密封,所述第二環境保持裝置使所述作業空間內保持一正壓及恆溫/恆濕環境。 An environment-preserving system for precision production, comprising: a transport cassette, comprising an accommodating space, a switchable first movable door and a first environment holding device, wherein the accommodating space is used for Carrying at least one product to be processed, the first movable door is disposed at one side of the accommodating space to form a seal for the accommodating space, and the first environment holding device keeps the accommodating space a positive pressure environment; and a process processing apparatus including a work space, a switchable second movable door, an internal transport unit, and a second environment holding device, wherein the work space is used to process the Processing the product, the second movable door is disposed on one side of the working space, when the first movable door of the conveying cassette is combined with the second movable door of the process processing device, The accommodating space of the transport cassette is exposed in a working space of the process processing device, and the internal transport unit is configured to transport the product to be processed back and forth between the accommodating space and the working space. Said When the second movable doors are closed, sealing the work space is formed, said second retaining means holding ambient pressure and a constant temperature / humidity environment within the work space. 如請求項1所述的環境保持系統,其中所述第一環境保持裝置包含一第一空氣過濾單元,其使所述容置空間內保持一正壓環境。 The environment holding system of claim 1, wherein the first environment holding device comprises a first air filtering unit that maintains a positive pressure environment within the accommodating space. 如請求項1所述的環境保持系統,其中所述第二環境保持裝置包含一第二空氣過濾單元及一溫濕度控制單元,所述第二空氣過濾單元使所述製程處理設備內保持一正壓環境,所述溫濕度控制單元使所述製程處理設備內保持一恆溫/恆濕環境。 The environment holding system of claim 1, wherein the second environment holding device comprises a second air filtering unit and a temperature and humidity control unit, the second air filtering unit maintaining a positive inside the process processing device The temperature and humidity control unit maintains a constant temperature/humidity environment in the process processing apparatus. 如請求項1所述的環境保持系統,其中所述內部運輸單元為一機械手臂。 The environmental maintenance system of claim 1, wherein the internal transport unit is a robotic arm. 如請求項1所述的環境保持系統,其中所述製程處理設備是一化學氣相沉積設備或一準分子激光退火設備。 The environmental maintenance system of claim 1, wherein the process processing device is a chemical vapor deposition device or an excimer laser annealing device.
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