TWM560998U - Copper foil and circuit board assembly for high frequency signal transmission - Google Patents

Copper foil and circuit board assembly for high frequency signal transmission Download PDF

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Publication number
TWM560998U
TWM560998U TW106218262U TW106218262U TWM560998U TW M560998 U TWM560998 U TW M560998U TW 106218262 U TW106218262 U TW 106218262U TW 106218262 U TW106218262 U TW 106218262U TW M560998 U TWM560998 U TW M560998U
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Taiwan
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copper foil
layer
high frequency
frequency signal
signal transmission
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TW106218262U
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Chinese (zh)
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Shi-Qing Lin
fu-ze Chen
Guo-Zhao Chen
Yu-Ru Huang
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Nanya Plastics Corp
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Priority to TW106218262U priority Critical patent/TWM560998U/en
Publication of TWM560998U publication Critical patent/TWM560998U/en

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Abstract

本創作公開一種應用於高頻訊號傳輸的銅箔以及線路板組件。銅箔包括一生箔層、一位於所述生箔層上的粗化處理層以及一位於所述粗化處理層上的表面處理層,其中,所述表面處理層的厚度與所述生箔層的厚度比值是介於1.0×10-5至3.0×10-4之間。藉此,由於銅箔內的非銅的金屬元素的含量降低,所以本創作可以在不繼續降低表面粗糙度的情況下,進一步降低利用銅箔所製成之線路板組件在高頻訊號下的訊號損失(Insertion Loss)。 The present invention discloses a copper foil and a circuit board assembly for high frequency signal transmission. The copper foil includes a green foil layer, a roughened layer on the green foil layer, and a surface treatment layer on the roughened layer, wherein the thickness of the surface treatment layer and the green foil layer The thickness ratio is between 1.0 × 10 -5 and 3.0 × 10 -4 . Thereby, since the content of the non-copper metal element in the copper foil is lowered, the present invention can further reduce the circuit board assembly made of the copper foil under the high frequency signal without further reducing the surface roughness. Signal loss (Insertion Loss).

Description

應用於高頻訊號傳輸的銅箔以及線路板組件 Copper foil and circuit board assembly for high frequency signal transmission

本創作涉及一種銅箔以及線路板組件,特別是涉及一種應用於高頻訊號傳輸的銅箔以及線路板組件。 The present invention relates to a copper foil and a circuit board assembly, and more particularly to a copper foil and a circuit board assembly for high frequency signal transmission.

現有應用於印刷電路基板的銅箔,會通過電鍍在陰極輪上形成原箔,再經過後段處理製成而形成最終的產品。後段處理包括對原箔的粗糙面執行粗化處理,以在原箔的粗糙面形成多個銅瘤,從而增加銅箔與電路基板之間的接著強度,也就是增加銅箔的剝離強度。 The copper foil currently applied to the printed circuit board is formed by electroplating on the cathode wheel to form a raw foil, and then processed through a post-stage process to form a final product. The post-processing includes performing a roughening treatment on the rough surface of the original foil to form a plurality of copper tumors on the rough surface of the original foil, thereby increasing the bonding strength between the copper foil and the circuit substrate, that is, increasing the peel strength of the copper foil.

近年來,電子產品的數據處理速度以及通訊速度趨向高頻高速化。目前大部分的研究都指向在傳遞高頻訊號時,銅箔表面的形狀對傳輸損耗有很大的影響。也就是說,表面粗糙度大的銅箔,訊號的傳播距離較長,會導致訊號衰減或延遲。另一方面,隨著傳輸的頻率越高,傳送訊號流於電路表面的集膚效應更顯著(skin effect),也就是導體內的電流會集中在導體的表面。因此,粗度越大則訊號損失越高。 In recent years, the data processing speed and communication speed of electronic products have tended to be high-speed and high-speed. At present, most of the research points to the shape of the copper foil surface having a great influence on the transmission loss when transmitting high frequency signals. That is to say, the copper foil with a large surface roughness has a long propagation distance of the signal, which may cause signal attenuation or delay. On the other hand, as the frequency of transmission increases, the skin effect of the transmitted signal flowing on the surface of the circuit is more pronounced, that is, the current in the conductor is concentrated on the surface of the conductor. Therefore, the greater the thickness, the higher the signal loss.

因此,目前業界都致力於降低銅箔的表面粗糙度,以降低傳輸損耗,而符合高頻訊號傳輸的需求。然而,由於目前製程上的限制,已難以再進一步降低銅箔的表面粗糙度。除此之外,銅箔的表面粗糙度過低雖然可減少高頻訊號傳輸損耗,但又會使銅箔和電路基板之間的接合強度降低,從而導致銅箔容易從電路基板剝離並降低印刷電路板的信賴度。 Therefore, the industry is currently working to reduce the surface roughness of copper foil to reduce transmission loss, and meet the needs of high-frequency signal transmission. However, due to current limitations in the process, it has been difficult to further reduce the surface roughness of the copper foil. In addition, the surface roughness of the copper foil is too low, although the transmission loss of the high-frequency signal can be reduced, but the bonding strength between the copper foil and the circuit substrate is lowered, thereby causing the copper foil to be easily peeled off from the circuit substrate and reducing the printing. Board reliability.

本創作所要解決的技術問題在於,針對現有技術的不足提供一種應用於高頻訊號傳輸且低電阻的銅箔以及線路板組件。 The technical problem to be solved by the present invention is to provide a low-resistance copper foil and a circuit board assembly for high-frequency signal transmission in view of the deficiencies of the prior art.

本創作所採用的其中一技術方案是,提供一種應用於高頻訊號傳輸的銅箔,其包括一生箔層、一位於所述生箔層上的粗化處理層以及一位於所述粗化處理層上的表面處理層,其中,所述表面處理層的厚度與所述生箔層的厚度比值是介於1.0×10-5至3.0×10-4之間。 One of the technical solutions adopted by the present invention is to provide a copper foil for high frequency signal transmission, comprising a green foil layer, a roughening layer on the green foil layer, and a roughening treatment. a surface treatment layer on the layer, wherein a ratio of a thickness of the surface treatment layer to a thickness of the green foil layer is between 1.0 × 10 -5 and 3.0 × 10 -4 .

本創作所採用的另外一技術方案是,提供一種線路板組件,其包括一基板、至少一位於基板上的線路層以及一連接於基板與線路層之間的黏著層,其中,線路層是上述應用於高頻訊號傳輸的銅箔。 Another technical solution adopted by the present invention is to provide a circuit board assembly including a substrate, at least one circuit layer on the substrate, and an adhesive layer connected between the substrate and the circuit layer, wherein the circuit layer is the above Copper foil for high frequency signal transmission.

本創作所採用的另外再一技術方案是,提供一種線路板組件,其包括一基板以及至少一位於基板上的線路層,其中,線路層是上述應用於高頻訊號傳輸的銅箔。 Another technical solution adopted by the present invention is to provide a circuit board assembly including a substrate and at least one circuit layer on the substrate, wherein the circuit layer is the above-mentioned copper foil for high frequency signal transmission.

本創作的有益效果在於,通過使表面處理層的厚度與生箔層的厚度比值介於1.0×10-5至3.0×10-4之間、提高銅箔的純度、以及控制生箔晶粒尺寸以減少晶粒界面,來達到銅箔阻抗的降低。藉此,本創作實施例所提供的銅箔可以在不繼續降低表面粗糙度的情況下,增加銅箔的導電度。因此,當本創作實施例的銅箔應用於傳輸高頻訊號的線路板組件中時,可具有較低的電性損耗。另外,由於銅箔的表面粗糙度仍維持在一定值,因此銅箔與基板之間的結合強度不會因為降低電性損耗而被犧牲。 The beneficial effect of the present invention is that the ratio of the thickness of the surface treatment layer to the thickness of the green foil layer is between 1.0×10 -5 and 3.0×10 -4 , the purity of the copper foil is improved, and the grain size of the green foil is controlled. In order to reduce the grain boundary, the copper foil impedance is reduced. Thereby, the copper foil provided by the present embodiment can increase the conductivity of the copper foil without further reducing the surface roughness. Therefore, when the copper foil of the present embodiment is applied to a wiring board assembly for transmitting high frequency signals, it can have a lower electrical loss. In addition, since the surface roughness of the copper foil is maintained at a constant value, the bonding strength between the copper foil and the substrate is not sacrificed because the electrical loss is reduced.

為使能更進一步瞭解本創作的特徵及技術內容,請參閱以下有關本創作的詳細說明與附圖,然而所提供的附圖僅提供參考與說明用,並非用來對本創作加以限制。 In order to further understand the features and technical contents of the present invention, please refer to the following detailed description of the present invention and the accompanying drawings. However, the drawings are provided for reference and description only, and are not intended to limit the present invention.

1‧‧‧銅箔 1‧‧‧ copper foil

10‧‧‧生箔層 10‧‧‧ Raw foil layer

10a‧‧‧光滑面 10a‧‧‧Smooth face

10b‧‧‧粗糙面 10b‧‧‧Rough surface

11‧‧‧粗化處理層 11‧‧‧ roughening layer

110‧‧‧銅瘤 110‧‧‧ copper tumor

12‧‧‧表面處理層 12‧‧‧Surface treatment layer

S1‧‧‧壓合面 S1‧‧‧ pressed surface

P1、P2‧‧‧線路板組件 P1, P2‧‧‧ circuit board assembly

2‧‧‧基板 2‧‧‧Substrate

1’‧‧‧線路層 1’‧‧‧Line layer

3‧‧‧黏著層 3‧‧‧Adhesive layer

T‧‧‧總厚度 T‧‧‧ total thickness

t‧‧‧粗化處理層厚度 T‧‧‧roughening layer thickness

圖1為本創作實施例的銅箔的局部剖面示意圖。 1 is a partial cross-sectional view showing a copper foil of the present embodiment.

圖2為圖1的銅箔在區域II的局部放大示意圖。 2 is a partially enlarged schematic view of the copper foil of FIG. 1 in a region II.

圖3 顯示本創作實施例的線路板組件的剖面示意圖。 Figure 3 is a cross-sectional view showing the circuit board assembly of the present embodiment.

圖4 顯示本創作另一實施例的線路板組件的剖面示意圖。 4 is a cross-sectional view showing a circuit board assembly of another embodiment of the present creation.

以下是通過特定的具體實施例來說明本創作所公開有關“應用於高頻訊號傳輸的銅箔以及線路板組件”的實施方式。本創作實施例所提供的應用於高頻訊號傳輸的銅箔可應用於硬式印刷電路板(printed circuit board,PCB)或軟性印刷電路板(FPC)。前述的高頻訊號通常是指頻率為8GHz以上的高頻訊號。 The following is a description of an embodiment of the present disclosure relating to "copper foil applied to high frequency signal transmission and circuit board assembly" by a specific embodiment. The copper foil for high frequency signal transmission provided by the present embodiment can be applied to a printed circuit board (PCB) or a flexible printed circuit board (FPC). The aforementioned high frequency signal generally refers to a high frequency signal having a frequency of 8 GHz or higher.

請參照圖1及圖2。圖1顯示本創作實施例的銅箔的局部剖面示意圖。圖2為圖1的銅箔在區域II的局部放大圖。本創作實施例的銅箔1包括一生箔層10、一位於生箔層10上的粗化處理層11以及一位於粗化處理層11上的表面處理層12。 Please refer to FIG. 1 and FIG. 2 . Fig. 1 is a partial cross-sectional view showing a copper foil of the present embodiment. 2 is a partial enlarged view of the copper foil of FIG. 1 in a region II. The copper foil 1 of the present embodiment includes a green foil layer 10, a roughened layer 11 on the green foil layer 10, and a surface treatment layer 12 on the roughened layer 11.

須說明的是,生箔層10是通過電鍍製程而形成,且生箔層10具有一光滑面10a及與光滑面10a相對的粗糙面10b。光滑面10a通常是指在電鍍過程中,生箔層10接觸陰極輪(未圖示)的一面,粗糙面10b則是生箔層10和電解液接觸的表面。 It should be noted that the green foil layer 10 is formed by an electroplating process, and the green foil layer 10 has a smooth surface 10a and a rough surface 10b opposite to the smooth surface 10a. The smooth surface 10a generally refers to the side of the green foil layer 10 that contacts the cathode wheel (not shown) during the plating process, and the rough surface 10b is the surface where the green foil layer 10 contacts the electrolyte.

本創作實施例中,生箔層10的銅晶粒尺寸是介於0.1至10μm之間。須說明的是,銅箔1的純度越高,導電度越好,也有助於降低高頻訊號傳輸時的損耗。但是,要得到高純度的銅箔1的製程難度以及成本卻非常高。 In the present embodiment, the copper foil size of the green foil layer 10 is between 0.1 and 10 μm. It should be noted that the higher the purity of the copper foil 1 and the better the conductivity, the lower the loss during high-frequency signal transmission. However, the process and cost of obtaining the high-purity copper foil 1 are very high.

在本創作實施例中,也藉由優化生箔層10的微結構,也就是控制生箔層10的銅晶粒尺寸,來進一步降低銅箔1的阻抗。詳細而言,生箔層10中的晶粒界面(grain boundary)會阻礙或阻擾電子傳遞。因此,生箔層10的晶粒界面越少,銅箔1的電性表面會越好。由於晶粒界面的多寡和晶粒尺寸成負相關,當晶粒尺寸越大,晶粒界面越少。因此,本創作實施例中,生箔層10的晶粒尺寸控制在0.1至10μm之間,較佳是在2至5μm之間,也可以進一步提高銅箔1阻抗值,而有助於降低高頻訊號傳輸損耗。 In the present embodiment, the impedance of the copper foil 1 is further reduced by optimizing the microstructure of the green foil layer 10, that is, controlling the copper grain size of the green foil layer 10. In detail, the grain boundary in the raw foil layer 10 can hinder or hinder electron transfer. Therefore, the less the grain boundary of the green foil layer 10, the better the electrical surface of the copper foil 1 will be. Since the grain interface is negatively correlated with the grain size, the larger the grain size, the less the grain boundary. Therefore, in the present embodiment, the grain size of the green foil layer 10 is controlled to be between 0.1 and 10 μm, preferably between 2 and 5 μm, and the copper foil 1 resistance value can be further increased to help lower the height. Frequency signal transmission loss.

在完成生箔層10的製程之後,對生箔層的粗糙面10b進行粗化表面處理,而在粗糙面10b上形成粗化處理層11。前述的粗化表面處理包括多次粗化處理及固化處理。粗化處理與固化處理是指將生箔層10置入具有銅離子與硫酸根離子的電解液中進行電鍍,以使銅原子沉積在生箔層10的粗糙面10b上,而形成多個銅瘤。 After the process of the green foil layer 10 is completed, the rough surface 10b of the green foil layer is subjected to a roughening surface treatment, and the roughened surface layer 11 is formed on the rough surface 10b. The aforementioned roughening surface treatment includes a plurality of roughening treatments and curing treatments. The roughening treatment and the curing treatment mean that the green foil layer 10 is placed in an electrolytic solution having copper ions and sulfate ions for electroplating so that copper atoms are deposited on the rough surface 10b of the green foil layer 10 to form a plurality of copper. tumor.

在本創作實施例中,粗化處理層11為無砷的粗化處理層。也就是說,在執行粗化處理以及固化處理時所使用的電解液中,使用完全不含砷元素的添加劑。在一實施例中,粗化處理層11的厚度t大約是介於0.1至2μm之間。 In the present embodiment, the roughening treatment layer 11 is an arsenic-free roughening treatment layer. That is, an additive which is completely free of arsenic is used in the electrolytic solution used in performing the roughening treatment and the curing treatment. In an embodiment, the thickness t of the roughened layer 11 is approximately between 0.1 and 2 μm.

如圖2所示,經過粗化處理與固化處理之後的粗化處理層11包括多個銅瘤110。每一個銅瘤110是沿著與粗糙面10b不平行的長軸方向延伸。 As shown in FIG. 2, the roughened layer 11 after the roughening treatment and the curing treatment includes a plurality of copper tumors 110. Each of the copper tumors 110 extends in a long axis direction that is not parallel to the rough surface 10b.

另外,銅瘤的形狀可以通過控制電解液的組成,如:銅離子的濃度、硫酸濃度或是添加劑組成,或者是電流密度的大小來調整。舉例而言,可以將銅離子的濃度降低,並控制電流密度以及粗化處理的時間,以使銅在結晶時,在大致垂直於生箔層10的粗糙面10b的方向成長,而限制銅在水平方向成長。據此,可以使位於生箔層10的粗糙面10b的粗化處理層11的銅瘤110的長軸會大致是平行生箔層10的厚度方向。 In addition, the shape of the copper tumor can be adjusted by controlling the composition of the electrolyte such as the concentration of copper ions, the concentration of sulfuric acid or the composition of the additive, or the magnitude of the current density. For example, the concentration of copper ions can be lowered, and the current density and the time of the roughening treatment can be controlled so that the copper grows in a direction substantially perpendicular to the rough surface 10b of the green foil layer 10 when crystallizing, and the copper is restricted. Grow in the horizontal direction. According to this, the long axis of the copper tumor 110 of the roughened layer 11 located on the rough surface 10b of the green foil layer 10 can be substantially the thickness direction of the parallel raw foil layer 10.

須說明的是,由於砷的電阻較高,若銅箔中的砷含量過高,也會增加銅箔的阻抗值。因此,本創作實施例的銅箔1的粗化處理層11為無砷的粗化處理層,可以進一步降低銅箔1的阻抗值,而有利於應用在高頻訊號傳輸。 It should be noted that due to the high resistance of arsenic, if the arsenic content in the copper foil is too high, the impedance value of the copper foil is also increased. Therefore, the roughened layer 11 of the copper foil 1 of the present embodiment is an arsenic-free roughening layer, which can further reduce the impedance value of the copper foil 1, and is advantageous for application in high-frequency signal transmission.

請再參照圖1。銅箔1在經過粗化及固化處理之後,還可以進行其他後續處理,從而在粗化處理層11上形成表面處理層12,以調整銅箔1的抗熱性或抗腐蝕性。前述的表面處理例如是耐熱及抗化學處理、鉻酸鹽(chromate)處理、矽烷(silane)耦合處理及其組 合之一,可由本領域技術人員根據實際需求選擇。 Please refer to Figure 1 again. After the roughening and solidification treatment of the copper foil 1, other subsequent treatments may be performed to form the surface treatment layer 12 on the roughened layer 11 to adjust the heat resistance or corrosion resistance of the copper foil 1. The foregoing surface treatments are, for example, heat and chemical resistance treatment, chromate treatment, silane coupling treatment, and groups thereof. One can be selected by a person skilled in the art according to actual needs.

因此,構成表面處理層12的材料為金屬元素或者是合金。在一實施例中,構成表面處理層12的材料可以選自由鋅、鉻、鎳及其組合所組成的群組。 Therefore, the material constituting the surface treatment layer 12 is a metal element or an alloy. In an embodiment, the material constituting the surface treatment layer 12 may be selected from the group consisting of zinc, chromium, nickel, and combinations thereof.

雖然表面處理層12可保護銅層(生箔層10以及粗化處理層11)不被氧化,並可在蝕刻銅箔1以形成線路的製程中,保護銅層不被酸鹼藥水腐蝕。然而,構成表面處理層12的材料的電阻值都比銅還高,而使銅箔1的阻抗增加。因此,表面處理層12的厚度需控制在一定範圍,以使銅箔1的阻抗夠低而可減少傳輸損耗,但又能保護銅層不被氧化或腐蝕。 Although the surface treatment layer 12 can protect the copper layer (the raw foil layer 10 and the roughing treatment layer 11) from being oxidized, and in the process of etching the copper foil 1 to form a wiring, the protective copper layer is not corroded by the acid-base syrup. However, the material constituting the surface treatment layer 12 has a higher resistance value than copper, and the impedance of the copper foil 1 is increased. Therefore, the thickness of the surface treatment layer 12 needs to be controlled within a certain range so that the impedance of the copper foil 1 is low enough to reduce transmission loss, but to protect the copper layer from oxidation or corrosion.

由於表面處理層12的厚度和非銅金屬元素的含量成正相關,因此,可以通過控制表面處理層12的厚度,來控制非銅金屬元素(如:鋅、鉻、鎳)的含量。在本創作實施例中,表面處理層12的厚度與生箔層10的厚度比值是介於1.0×10-5至3.0×10-4之間,以降低銅箔1的阻抗。在一實施例中,銅箔1的總厚度T是介於6至400μm之間,而表面處理層12的厚度是介於10至50Å。 Since the thickness of the surface treatment layer 12 is positively correlated with the content of the non-copper metal element, the content of the non-copper metal element (e.g., zinc, chromium, nickel) can be controlled by controlling the thickness of the surface treatment layer 12. In the present embodiment, the thickness ratio of the surface treatment layer 12 to the thickness of the green foil layer 10 is between 1.0 × 10 -5 and 3.0 × 10 -4 to lower the impedance of the copper foil 1. In an embodiment, the total thickness T of the copper foil 1 is between 6 and 400 μm, and the thickness of the surface treatment layer 12 is between 10 and 50 Å.

在一實施例中,構成所述表面處理層的材料包括鋅、鉻及鎳,且在銅箔1中的鋅含量為50~175ppm,鎳含量為20~155ppm,且鉻含量為20~70ppm。在一實施例中,銅箔1中的鋅含量、鎳含量以及鉻含量的總和不超過400ppm。 In one embodiment, the material constituting the surface treatment layer includes zinc, chromium, and nickel, and has a zinc content of 50 to 175 ppm, a nickel content of 20 to 155 ppm, and a chromium content of 20 to 70 ppm in the copper foil 1. In one embodiment, the sum of the zinc content, the nickel content, and the chromium content in the copper foil 1 does not exceed 400 ppm.

須說明的是,若是銅箔1所包含的非銅元素,如:砷、鋅、鉻、鎳等,的總含量越高,會影響銅箔1的阻抗值。本創作實施例的銅箔1的粗化處理層11不含砷元素,且表面處理層12的厚度與銅箔1的總厚度比值偏低,可使銅箔1中所包含的非銅元素的總含量降低。據此,本創作實施例的銅箔1可具有較低的阻抗。當本創作實施例的銅箔1應用在傳輸高頻訊號時,可具有較低的傳輸損耗。 It should be noted that if the total content of non-copper elements contained in the copper foil 1, such as arsenic, zinc, chromium, nickel, etc., is higher, the impedance value of the copper foil 1 is affected. The roughened layer 11 of the copper foil 1 of the present embodiment does not contain an arsenic element, and the ratio of the thickness of the surface treated layer 12 to the total thickness of the copper foil 1 is low, so that the non-copper element contained in the copper foil 1 can be The total content is reduced. Accordingly, the copper foil 1 of the present embodiment can have a lower impedance. When the copper foil 1 of the present embodiment is applied to transmit a high frequency signal, it can have a low transmission loss.

也就是說,相較於現有技術中通過降低銅箔1的表面粗糙度 來降低傳輸損耗,本創作實施例是通過調整生箔層10的微結構以及盡可能提高銅箔1的純度,來降低傳輸損耗。因此,本創作實施例的銅箔1的表面粗糙度不用繼續降低,也同樣可以達到降低傳輸阻抗的效果。 That is, by reducing the surface roughness of the copper foil 1 compared to the prior art To reduce transmission loss, the present embodiment reduces transmission loss by adjusting the microstructure of the green foil layer 10 and increasing the purity of the copper foil 1 as much as possible. Therefore, the surface roughness of the copper foil 1 of the presently-created embodiment does not need to be continuously lowered, and the effect of lowering the transmission impedance can also be achieved.

請參照圖3。圖3顯示本創作實施例的線路板組件的剖面示意圖。本創作實施例的銅箔可應用於不同的線路板組件P1例如硬性印刷電路板(PCB)、軟性印刷電路板(FPC)及其相似物,但本創作不限於此。 Please refer to Figure 3. Figure 3 is a cross-sectional view showing the circuit board assembly of the present embodiment. The copper foil of the present embodiment can be applied to different circuit board assemblies P1 such as a rigid printed circuit board (PCB), a flexible printed circuit board (FPC), and the like, but the present invention is not limited thereto.

在圖1的實施例中,線路板組件P1包括一基板2、一線路層1’以及連接於基板2與線路層1’之間的黏著層3。線路層可以是直接是上述的銅箔1,或者是上述的銅箔1通過蝕刻所形成的電路。 In the embodiment of Fig. 1, the circuit board assembly P1 includes a substrate 2, a wiring layer 1', and an adhesive layer 3 connected between the substrate 2 and the wiring layer 1'. The wiring layer may be a copper foil 1 directly as described above or an electric circuit formed by etching the copper foil 1 described above.

基板2可以是高頻基板,如:環氧樹脂基板、聚氧二甲苯樹脂基板(PPO)或氟系樹脂基板,或者是由聚醯亞胺、乙烯對苯二甲酸酯、聚碳酸酯、液晶高分子或聚四氟乙烯等材料所構成的基板。 The substrate 2 may be a high-frequency substrate such as an epoxy resin substrate, a polyoxyxylene resin substrate (PPO) or a fluorine-based resin substrate, or a polyimide, an ethylene terephthalate or a polycarbonate. A substrate composed of a liquid crystal polymer or a material such as polytetrafluoroethylene.

在本實施例中,銅箔1具有一壓合面S1,且壓合面S1的十點平均粗糙度可以介於0.5μm至3μm之間,較佳是介於2μm至3μm之間。當銅箔1和基板20通過黏著層22接合時,是以壓合面S1面向基板20。 In the present embodiment, the copper foil 1 has a pressing surface S1, and the ten-point average roughness of the pressing surface S1 may be between 0.5 μm and 3 μm, preferably between 2 μm and 3 μm. When the copper foil 1 and the substrate 20 are joined by the adhesive layer 22, the pressing surface S1 faces the substrate 20.

請參照圖4,其顯示本創作另一實施例的線路板組件的剖面示意圖。本實施例的線路板組件P2包括基板20及線路層1’。和圖3的實施例相似,線路層1’可以是上述的銅箔1,或者是上述的銅箔1通過蝕刻所形成的電路。 Referring to FIG. 4, a cross-sectional view of a circuit board assembly of another embodiment of the present invention is shown. The wiring board assembly P2 of this embodiment includes a substrate 20 and a wiring layer 1'. Similar to the embodiment of Fig. 3, the wiring layer 1' may be the above-described copper foil 1, or the above-described copper foil 1 formed by etching.

和圖3的實施例不同的是,在本實施例中,基板20可通過熱壓而直接和線路層1’接合,不需額外通過黏著層3與銅箔1接合。在本實施例中,基板20可以是由液晶高分子或者玻纖基板(Pre-preg)等材料構成。因此,在進行壓合時,基板20會直接和壓合面S1貼合。 Unlike the embodiment of Fig. 3, in the present embodiment, the substrate 20 can be directly bonded to the wiring layer 1' by heat pressing without additionally bonding the copper foil 1 through the adhesive layer 3. In the present embodiment, the substrate 20 may be made of a material such as a liquid crystal polymer or a glass fiber substrate (Pre-preg). Therefore, when press-bonding, the substrate 20 is directly bonded to the press-fit surface S1.

須說明的是,經過測試,本創作實施例的銅箔1經過200℃ 加熱2小時後的電阻值低於0.16ohm-gram/m2。因此,在本創作實施例的線路板組件P1、P2中,由於銅箔1的壓合面S1的表面粗糙度不需要降到2μm以下,即可減少高頻訊號傳輸時的電性損耗。因此,銅箔1和基板2或是黏著層3之間可以具有較高的接合強度,從而可解決先前技術中,為了降低高頻傳輸損耗而可能犧牲銅箔1與基板2之間的接合強度的問題。 It should be noted that the copper foil 1 of the present embodiment was tested to have a resistance value of less than 0.16 ohm-gram/m 2 after being heated at 200 ° C for 2 hours. Therefore, in the circuit board assemblies P1 and P2 of the present embodiment, since the surface roughness of the pressing surface S1 of the copper foil 1 does not need to be reduced to 2 μm or less, the electrical loss at the time of high-frequency signal transmission can be reduced. Therefore, the copper foil 1 and the substrate 2 or the adhesive layer 3 can have a high bonding strength, so that the bonding strength between the copper foil 1 and the substrate 2 can be sacrificed in order to reduce the high-frequency transmission loss in the prior art. The problem.

此外,須說明的是,雖然研究中發現若銅箔的導電性越高,也就是電阻越低,是判定訊號損失的一項重要因素,但目前卻無人致力於提高銅箔的導電度。因此,本創作的有益效果在於,通過使表面處理層12的厚度與生箔層10的厚度比值介於1.0×10-5至3.0×10-4之間,以提高銅箔1的純度,以及通過控制生箔層10的晶粒尺寸以減少晶界,進而可降低銅箔1的阻抗。 In addition, it should be noted that although the study found that the higher the conductivity of the copper foil, that is, the lower the resistance, is an important factor in determining the loss of the signal, no one is currently working to improve the conductivity of the copper foil. Therefore, the present invention has an advantageous effect of increasing the purity of the copper foil 1 by setting the thickness of the surface treatment layer 12 to the thickness of the green foil layer 10 to be between 1.0 × 10 -5 and 3.0 × 10 -4 . By controlling the grain size of the green foil layer 10 to reduce the grain boundary, the impedance of the copper foil 1 can be lowered.

藉此,本創作實施例所提供的銅箔1可以在不繼續降低表面粗糙度的情況下,增加銅箔1的導電度。因此,當本創作實施例的銅箔1應用於傳輸高頻訊號的線路板組件P1、P2中時,可具有較低的電性損耗。換言之,本創作可以在不繼續降低表面粗糙度的情況下,進一步降低利用銅箔1所製成之線路板組件P1、P2在高頻訊號下的訊號損失(Insertion Loss)。另外,由於銅箔1的表面粗糙度仍維持在一定值,因此銅箔1與基板2之間的結合強度不會因為降低電性損耗而被犧牲。 Thereby, the copper foil 1 provided by the present embodiment can increase the conductivity of the copper foil 1 without continuing to lower the surface roughness. Therefore, when the copper foil 1 of the present embodiment is applied to the wiring board assemblies P1, P2 for transmitting high frequency signals, it can have a lower electrical loss. In other words, the present invention can further reduce the signal loss (Insertion Loss) of the circuit board assemblies P1 and P2 made of the copper foil 1 under the high frequency signal without further reducing the surface roughness. In addition, since the surface roughness of the copper foil 1 is maintained at a constant value, the bonding strength between the copper foil 1 and the substrate 2 is not sacrificed because the electrical loss is reduced.

以上所公開的內容僅為本創作的優選可行實施例,並非因此侷限本創作的申請專利範圍,故凡運用本創作說明書及附圖內容所做的等效技術變化,均包含於本創作的申請專利範圍內。 The above disclosure is only a preferred and feasible embodiment of the present invention, and is not intended to limit the scope of the patent application of the present invention. Therefore, any equivalent technical changes made by using the present specification and the contents of the drawings are included in the application for this creation. Within the scope of the patent.

Claims (13)

一種應用於高頻訊號傳輸的銅箔,其包括:一生箔層、一位於所述生箔層上的粗化處理層以及一位於所述粗化處理層上的表面處理層,其中,所述表面處理層的厚度與所述生箔層的厚度比值是介於1.0×10-5至3.0×10-4之間。 A copper foil for high frequency signal transmission, comprising: a primary foil layer, a roughened layer on the green foil layer, and a surface treatment layer on the roughened layer, wherein The ratio of the thickness of the surface treatment layer to the thickness of the green foil layer is between 1.0 × 10 -5 and 3.0 × 10 -4 . 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述生箔層的銅晶粒尺寸是介於0.1至10μm之間。 The copper foil for high frequency signal transmission according to claim 1, wherein the raw foil layer has a copper grain size of between 0.1 and 10 μm. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述粗化處理層的厚度是介於0.1至2μm之間,且所述粗化處理層為無砷的粗化處理層。 The copper foil for high frequency signal transmission according to claim 1, wherein the thickness of the roughened layer is between 0.1 and 2 μm, and the roughened layer is arsenic-free roughening treatment. Floor. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述粗化處理層包括多個銅瘤。 The copper foil for high frequency signal transmission according to claim 1, wherein the roughening treatment layer comprises a plurality of copper tumors. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述表面處理層的厚度為10~50Å,且構成所述表面處理層的材料選自由鋅、鉻、鎳及其組合所組成的群組。 The copper foil for high frequency signal transmission according to claim 1, wherein the surface treatment layer has a thickness of 10 to 50 Å, and the material constituting the surface treatment layer is selected from the group consisting of zinc, chromium, nickel, and combinations thereof. The group formed. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,構成所述表面處理層的材料包括鋅、鉻及鎳,且在所述銅箔中的鋅含量為50~175ppm,鎳含量為20~155ppm,且鉻含量為20~70ppm。 The copper foil for high frequency signal transmission according to claim 1, wherein the material constituting the surface treatment layer comprises zinc, chromium and nickel, and the zinc content in the copper foil is 50 to 175 ppm, nickel The content is 20~155ppm, and the chromium content is 20~70ppm. 如請求項6所述的應用於高頻訊號傳輸的銅箔,其中,在所述銅箔中的所述鋅含量、所述鎳含量以及所述鉻含量的總和不超過400ppm。 The copper foil for high frequency signal transmission according to claim 6, wherein the sum of the zinc content, the nickel content, and the chromium content in the copper foil does not exceed 400 ppm. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述銅箔具有一壓合面,所述壓合面的十點平均粗糙度介於0.5至3μm之間。 The copper foil for high-frequency signal transmission according to claim 1, wherein the copper foil has a pressing surface, and the ten-point average roughness of the pressing surface is between 0.5 and 3 μm. 如請求項1所述的應用於高頻訊號傳輸的銅箔,其中,所述銅箔經200℃加熱2小時後的阻抗值低於0.16ohm-gram/m2The copper foil for high frequency signal transmission according to claim 1, wherein the copper foil has an impedance value of less than 0.16 ohm-gram/m 2 after being heated at 200 ° C for 2 hours. 一種線路板組件,所述線路板組件包括一基板、至少一位於所述基板上的線路層以及一連接於所述基板與所述線路層之間的黏著層,其中,所述線路層為如請求項1至9其中之一所述的應用於高頻訊號傳輸的銅箔。 A circuit board assembly, the circuit board assembly comprising a substrate, at least one circuit layer on the substrate, and an adhesive layer connected between the substrate and the circuit layer, wherein the circuit layer is A copper foil for high frequency signal transmission as claimed in any one of claims 1 to 9. 如請求項10所述的線路板組件,其中,所述線路板組件為硬性印刷電路板或是軟性印刷電路板。 The circuit board assembly of claim 10, wherein the circuit board assembly is a rigid printed circuit board or a flexible printed circuit board. 如請求項10所述的線路板組件,其中,所述基板為一高頻基板,且所述高頻基板為環氧樹脂基板、聚氧二甲苯樹脂基板或氟系樹脂基板。 The circuit board assembly according to claim 10, wherein the substrate is a high frequency substrate, and the high frequency substrate is an epoxy resin substrate, a polyoxyxylene resin substrate or a fluorine resin substrate. 一種線路板組件,所述線路板組件包括一基板以及至少一位於所述基板上的線路層,其中,所述線路層為如請求項1至9其中之一所述的應用於高頻訊號傳輸的銅箔。 A circuit board assembly comprising a substrate and at least one circuit layer on the substrate, wherein the circuit layer is applied to high frequency signal transmission as described in one of claims 1 to 9. Copper foil.
TW106218262U 2017-12-08 2017-12-08 Copper foil and circuit board assembly for high frequency signal transmission TWM560998U (en)

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