TWM559312U - Gas delivery device - Google Patents

Gas delivery device Download PDF

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Publication number
TWM559312U
TWM559312U TW106213775U TW106213775U TWM559312U TW M559312 U TWM559312 U TW M559312U TW 106213775 U TW106213775 U TW 106213775U TW 106213775 U TW106213775 U TW 106213775U TW M559312 U TWM559312 U TW M559312U
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Taiwan
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plate
valve
delivery device
gas delivery
chamber
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TW106213775U
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Chinese (zh)
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Hao-Jan Mou
Chi-Feng Huang
Wei-Ming Lee
Hsien-Chung Tai
Yung-Lung Han
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Microjet Technology Co Ltd
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Priority to TW106213775U priority Critical patent/TWM559312U/en
Publication of TWM559312U publication Critical patent/TWM559312U/en

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Abstract

本案提供一種氣體輸送裝置,包含:複數個導流單元,導流單元,分別包含:入口板,具有入口孔;基材;共振板,具有中空孔洞,且共振板與入口板之間具有匯流腔室;致動板,具有個懸浮部及外框部及空隙;壓電元件,貼附於致動板之懸浮部之表面;以及出口板,具有出口孔;以及閥,設置在入口孔和出口孔之至少其中之一;讓氣體由入口板之入口孔進入該匯流腔室而流經該共振板之中空孔洞,以進入第一腔室內,並由空隙導入第二腔室內,最後由出口板之該出口孔導出,藉由一特定排列方式設置該些導流單元以傳輸氣體。 The present invention provides a gas delivery device comprising: a plurality of flow guiding units, a flow guiding unit, respectively comprising: an inlet plate having an inlet hole; a substrate; a resonance plate having a hollow hole, and a confluence chamber between the resonance plate and the inlet plate a firing plate having a suspension portion and an outer frame portion and a gap; a piezoelectric element attached to a surface of the suspension portion of the actuation plate; and an outlet plate having an outlet hole; and a valve disposed at the inlet hole and the outlet At least one of the holes; letting gas enter the confluence chamber through the inlet hole of the inlet plate and flow through the hollow hole of the resonance plate to enter the first chamber, and introduce the gap into the second chamber, and finally the outlet plate The outlet holes are led out, and the flow guiding units are arranged in a specific arrangement to transport the gas.

Description

氣體輸送裝置 Gas delivery device

本案係關於一種氣體輸送裝置,尤指一種透過微型、薄型且靜音之氣體輸送裝置。 The present invention relates to a gas delivery device, and more particularly to a gas delivery device that is micro, thin and silent.

目前於各領域中無論是醫藥、電腦科技、列印、能源等工業,產品均朝精緻化及微小化方向發展,其中微幫浦所包含之氣體輸送結構為其關鍵技術,是以,如何藉創新結構突破其技術瓶頸,為發展之重要內容。 At present, in all fields, such as medicine, computer technology, printing, energy and other industries, the products are developing in the direction of refinement and miniaturization. The gas transmission structure included in the micro-pull is its key technology. The innovation structure breaks through its technical bottleneck and is an important part of development.

隨著科技的日新月異,氣體輸送裝置的應用上亦愈來愈多元化,舉凡工業應用、生醫應用、醫療保健、電子散熱等等,甚至近來熱門的穿戴式裝置皆可見它的踨影,可見傳統的氣體輸送裝置已漸漸有朝向裝置微小化、流量極大化的趨勢。 With the rapid development of technology, the application of gas delivery devices is becoming more and more diversified. For industrial applications, biomedical applications, medical care, electronic heat dissipation, etc., even the most popular wearable devices can be seen in the shadows. Conventional gas delivery devices have gradually become the trend toward miniaturization of devices and maximization of flow rates.

於現有技術中,氣體輸送裝置主要以傳統的機構部件堆疊而構成,並以每一個機構部件極小化或厚度薄化的方式,來達到整體裝置微型化、薄型化之目的。然而,傳統機構件在微小化後,其尺寸精度控制不易,且組裝精度同樣難以掌控,進而造成產品良率不一,甚至有氣體傳送之流量不穩定等問題。 In the prior art, the gas delivery device is mainly constructed by stacking conventional mechanical components, and the miniaturization and thinning of the whole device are achieved by minimizing or thinning each mechanical component. However, after the miniaturization of the conventional machine components, the dimensional accuracy control is not easy, and the assembly precision is also difficult to control, resulting in different product yields and even unstable gas flow.

再者,習知的氣體傳輸裝置亦具有輸送流量不足的問題,透過單一氣體傳輸裝置難以因應大量氣體傳輸之需求,且習知的氣體傳輸裝置通常有外凸之導接腳以供通電連接之用,故若欲將多個習知的氣體傳輸裝置並排設置以提高傳輸量,其組裝精度同樣不易控制,導接腳容易 造成設置的障礙,且亦導致其外接之供電線設置複雜,因此仍難以透過此方式提高流量,排列方式亦較無法靈活運用。 Moreover, the conventional gas transmission device also has a problem of insufficient delivery flow rate, which is difficult to cope with the demand for a large amount of gas transmission through a single gas transmission device, and the conventional gas transmission device usually has a convex guiding pin for energizing connection. Use, so if you want to set a number of conventional gas transmission devices side by side to increase the amount of transmission, the assembly accuracy is also difficult to control, the guide pin is easy This creates obstacles to the installation and also complicates the setting of the external power supply line. Therefore, it is still difficult to increase the flow rate in this way, and the arrangement is less flexible.

因此,如何發展一種可改善上述習知技術缺失,可使傳統採用氣體傳輸裝置的儀器或設備達到體積小、微型化且靜音,且克服微型尺寸精度不易掌控、流量不足之問題,且可靈活運用於各式裝置之微型氣體傳輸裝置,實為目前迫切需要解決之問題。 Therefore, how to develop a technique that can improve the above-mentioned conventional techniques can make the apparatus or equipment using the conventional gas transmission device small, miniaturized and muted, and overcome the problem that the micro-size precision is difficult to control and the flow rate is insufficient, and can be flexibly utilized. The micro gas transmission device of various devices is an urgent problem to be solved at present.

本案之主要目的在於提供一種氣體輸送裝置,藉由微機電製程製出一體成型之微型化氣體輸送裝置,以克服傳統輸送裝置無法同時兼具體積小、微型化、尺寸精度掌控以及流量不足之問題。 The main purpose of the present invention is to provide a gas delivery device, which is manufactured by a micro-electromechanical process to integrally form a miniaturized gas delivery device, so as to overcome the problem that the conventional delivery device cannot simultaneously reduce the size, miniaturization, dimensional accuracy control and insufficient flow rate. .

為達上述目的,本案之一較廣義實施樣態為提供一種氣體輸送裝置,包含:複數個導流單元,該導流單元,分別包含:一入口板,具有至少一入口孔;一基材;一共振板,具有一中空孔洞,且該共振板與該入口板之間具有一匯流腔室;一致動板,具有一個懸浮部及一外框部及至少一空隙;一壓電元件,貼附於該致動板之該懸浮部之一表面;一出口板,具有一出口孔;以及至少一閥,設置在該入口孔和該出口孔之至少其中之一;其中,該入口板、該基材、該共振板、該致動板、該壓電元件及該出口板係依序對應堆疊設置,該共振板及該致動板之間具有一間隙形成一第一腔室,該致動板及該出口板之間形成一第二腔室,該壓電元件驅動該致動板產生彎曲共振,以使該第一腔室及該第二腔室形成一壓力差,並使該至少一閥開啟,讓氣體由該入口板之該入口孔進入該匯流腔室而流經該共振板之該中空孔洞,以進入該第一腔室內,並由該至少一空隙導入該第二腔室內,最後由該出口板之該出口孔導出,藉由一特定排列方式設置該些導流單元以傳輸氣體。 In order to achieve the above object, a generalized embodiment of the present invention provides a gas delivery device comprising: a plurality of flow guiding units, each of the flow guiding units comprising: an inlet plate having at least one inlet hole; a substrate; a resonance plate having a hollow hole, and a resonance chamber between the resonance plate and the inlet plate; the movable plate having a floating portion and an outer frame portion and at least one gap; a piezoelectric element attached a surface of the suspension portion of the actuation plate; an outlet plate having an outlet opening; and at least one valve disposed at least one of the inlet aperture and the outlet aperture; wherein the inlet panel, the base The material, the resonant plate, the actuating plate, the piezoelectric element and the outlet plate are arranged in a corresponding manner, and a gap is formed between the resonant plate and the actuating plate to form a first chamber, the actuating plate And forming a second chamber between the outlet plate, the piezoelectric element driving the actuation plate to generate a bending resonance, so that the first chamber and the second chamber form a pressure difference, and the at least one valve is Open, let the gas enter the inlet plate The hole enters the confluence chamber and flows through the hollow hole of the resonance plate to enter the first chamber, and is introduced into the second chamber from the at least one gap, and finally is led out from the outlet hole of the outlet plate, The flow guiding units are arranged in a specific arrangement to transport gas.

1、2、3、4‧‧‧氣體氣體輸送裝置 1, 2, 3, 4‧‧‧ gas gas delivery devices

5‧‧‧閥 5‧‧‧ valve

10、20、30‧‧‧導流單元 10, 20, 30‧‧‧ diversion unit

11‧‧‧基材 11‧‧‧Substrate

12‧‧‧匯流腔室 12‧‧‧Confluence chamber

13‧‧‧共振板 13‧‧‧Resonance board

130‧‧‧中空孔洞 130‧‧‧ hollow holes

131‧‧‧可動部 131‧‧‧movable department

14‧‧‧致動板 14‧‧‧Acoustic board

141‧‧‧懸浮部 141‧‧‧Floating Department

142‧‧‧外框部 142‧‧‧Outer frame

143‧‧‧空隙 143‧‧‧ gap

15‧‧‧壓電元件 15‧‧‧Piezoelectric components

16、26、36‧‧‧出口板 16, 26, 36‧‧‧ export board

160、260、360‧‧‧出口孔 160, 260, 360‧‧‧ exit holes

17‧‧‧入口板 17‧‧‧ entrance board

170‧‧‧入口孔 170‧‧‧ entrance hole

18‧‧‧第一腔室 18‧‧‧ first chamber

19‧‧‧第二腔室 19‧‧‧Second chamber

g0‧‧‧間隙 G0‧‧‧ gap

5‧‧‧閥 5‧‧‧ valve

51‧‧‧保持件 51‧‧‧ Holder

52‧‧‧密封件 52‧‧‧Seal

53‧‧‧閥片 53‧‧‧ valve

54‧‧‧柔性膜 54‧‧‧Flexible film

511、521、531、541‧‧‧通氣孔 511, 521, 531, 541‧‧ vents

55‧‧‧容置空間 55‧‧‧ accommodating space

第1圖為本案為第一較佳實施例之氣體輸送裝置之外觀結構示意圖。 1 is a schematic view showing the appearance of a gas delivery device according to a first preferred embodiment of the present invention.

第2圖為第1圖所示之氣體輸送裝置之剖面結構示意圖。 Fig. 2 is a schematic cross-sectional view showing the gas delivery device shown in Fig. 1.

第3A圖為第2圖所示之氣體輸送裝置之剖面之單一導流單元局部放大結構示意圖。 Fig. 3A is a partially enlarged schematic view showing a single flow guiding unit of a cross section of the gas delivery device shown in Fig. 2.

第3B圖至第3D圖為第3A圖所示之氣體輸送裝置之單一導流單元作動流程局部示意圖。 3B to 3D are partial schematic views showing the operation flow of a single flow guiding unit of the gas delivery device shown in Fig. 3A.

第4圖為本案為第二較佳實施例之氣體輸送裝置之外觀結構示意圖。 Fig. 4 is a schematic view showing the appearance of a gas delivery device according to a second preferred embodiment of the present invention.

第5圖為本案為第三較佳實施例之氣體輸送裝置之外觀結構示意圖。 Fig. 5 is a schematic view showing the appearance of a gas delivery device according to a third preferred embodiment of the present invention.

第6圖為本案為第四較佳實施例之氣體輸送裝置之外觀結構示意圖。 Figure 6 is a schematic view showing the appearance of the gas delivery device of the fourth preferred embodiment.

第7A圖及第7B圖為本案之閥之第一、第二及第三實施態樣之作動示意圖。 7A and 7B are schematic views showing the operation of the first, second and third embodiments of the valve of the present invention.

第8A圖及第8B圖為本案之閥之第四、第五實施態樣之作動示意圖。 8A and 8B are schematic views showing the operation of the fourth and fifth embodiments of the valve of the present invention.

體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化,其皆不脫離本案的範圍,且其中的說明及圖示在本質上係當作說明之用,而非架構於限制本案。 Some exemplary embodiments embodying the features and advantages of the present invention are described in detail in the following description. It is to be understood that the present invention is capable of various modifications in various aspects, and is not to be construed as a limitation.

本案之氣體輸送裝置係由微機電製程製出一體成型之微型化氣體輸送裝置,用以克服傳統氣體輸送裝置無法同時兼具體積小、微型化、輸出流量不足以及尺寸精度掌控不佳等問題。首先,請參閱第1圖、第2圖及第3A圖,於第一實施例中,氣體輸送裝置1包含有藉由一特定排 列方式設置的複數個導流單元10組成,於本實施例中,複數個導流單元10為2列10行排列方式形成一矩形平板狀的結構,該些導流單元10分別包含有入口板17、基材11、共振板13、致動板14、壓電元件15以及出口板16等元件依序堆疊所構成,其中入口板17具有入口孔170,共振板13具有中空孔洞130及可動部131,且共振板13與該入口板17之間形成匯流腔室12,致動板14具有懸浮部141、外框部142及複數個空隙143,出口板16具有出口孔160,其結構、特徵及設置方式將於說明後段進一步詳述。本實施例氣體輸送裝置1可以為微機電系統製程(MEMS)技術一體成型製成,其尺寸體積小、薄型化,且無需如傳統氣體輸送裝置堆疊加工,可避免尺寸精度難以掌控之問題,所產出成品品質穩定且良率較高。 The gas conveying device of the present invention is a miniaturized gas conveying device integrally formed by a micro-electromechanical process, which overcomes the problems that the conventional gas conveying device cannot simultaneously have a specific small size, miniaturization, insufficient output flow rate, and poor control of dimensional precision. First, please refer to FIG. 1 , FIG. 2 and FIG. 3A . In the first embodiment, the gas delivery device 1 includes a specific row The plurality of flow guiding units 10 are arranged in a column mode. In the embodiment, the plurality of flow guiding units 10 are arranged in a row of 2 rows and 10 rows to form a rectangular flat plate structure, and the flow guiding units 10 respectively include an inlet plate. 17. The substrate 11, the resonance plate 13, the actuation plate 14, the piezoelectric element 15, and the outlet plate 16 are sequentially stacked, wherein the inlet plate 17 has an inlet hole 170, and the resonance plate 13 has a hollow hole 130 and a movable portion. 131, and a confluence chamber 12 is formed between the resonance plate 13 and the inlet plate 17. The actuation plate 14 has a floating portion 141, an outer frame portion 142 and a plurality of gaps 143. The outlet plate 16 has an outlet hole 160, and its structure and characteristics And the setting method will be further detailed in the later part of the description. The gas delivery device 1 of the present embodiment can be integrally formed by a micro-electromechanical system process (MEMS) technology, and has a small size and a thin shape, and does not need to be stacked as a conventional gas delivery device, thereby avoiding the problem that the dimensional accuracy is difficult to control. The finished product quality is stable and the yield is high.

本實施例之氣體輸送裝置1透過入口板17之複數個入口孔170、基材11之複數個匯流腔室12、共振板13之複數個中空孔洞130及複數個可動部131、致動板14之複數個懸浮部141及複數個空隙143、複數個壓電元件15及複數個出口孔160以構成複數個導流單元10,換言之,每一個導流單元10均包含一個匯流腔室12、一個中空孔洞130、一個可動部131、一個懸浮部141、一空隙143、一個壓電元件15及一個出口孔160,且複數個導流單元10係共用一個入口孔170,但不以此為限,每一個導流單元10之共振板13與致動板14之間具有一間隙g0形成第一腔室18(如第3A圖所示),以及致動板14與出口板16之間形成第二腔室19(如第3A圖所示)。為方便說明氣體輸送裝置1之結構及氣體控制方式,下述內容將以單一導流單元10進行說明,然此非用以限制本案僅有單一導流單元10,複數個導流單元10可包含複數個相同結構之單一導流單元10所組成氣體輸送裝置1,其數量可依據實際情形任施變化。於本案之另一些實施例中,每一個導流單元10亦可包含 一個入口孔170,但不以此為限。 The gas delivery device 1 of the present embodiment passes through a plurality of inlet holes 170 of the inlet plate 17, a plurality of confluence chambers 12 of the substrate 11, a plurality of hollow holes 130 of the resonance plate 13, a plurality of movable portions 131, and an actuation plate 14 a plurality of floating portions 141 and a plurality of gaps 143, a plurality of piezoelectric elements 15 and a plurality of outlet holes 160 to form a plurality of flow guiding units 10, in other words, each of the flow guiding units 10 includes a confluent chamber 12 and a a hollow hole 130, a movable portion 131, a floating portion 141, a gap 143, a piezoelectric element 15 and an outlet hole 160, and the plurality of flow guiding units 10 share an inlet hole 170, but not limited thereto. A gap g0 between the resonance plate 13 of each flow guiding unit 10 and the actuation plate 14 forms a first chamber 18 (as shown in FIG. 3A), and a second between the actuation plate 14 and the outlet plate 16 is formed. Chamber 19 (as shown in Figure 3A). In order to facilitate the description of the structure of the gas delivery device 1 and the gas control mode, the following description will be made with a single flow guiding unit 10. However, this is not to limit the single flow guiding unit 10 in the present case, and the plurality of guiding units 10 may include The gas conveying device 1 composed of a plurality of single flow guiding units 10 of the same structure may be varied according to actual conditions. In other embodiments of the present disclosure, each of the flow guiding units 10 may also include An inlet hole 170, but not limited thereto.

如第1圖所示,於第一較佳實施例中,氣體輸送裝置1之複數個導流單元10之數量係為40個,意即氣體輸送裝置1具有40個可單獨傳輸氣體之單元,即如第1圖所示,每一出口孔160係對應於每一個導流單元10,且40個導流單元10更以20個為一行,以兩兩對應並排設置,但均不以此為限,其數量、排列方式皆可依據實際情形任施變化。 As shown in FIG. 1 , in the first preferred embodiment, the number of the plurality of flow guiding units 10 of the gas delivery device 1 is 40, that is, the gas delivery device 1 has 40 units capable of separately transmitting gas. That is, as shown in FIG. 1 , each of the outlet holes 160 corresponds to each of the flow guiding units 10, and the 40 flow guiding units 10 are further arranged in 20 rows, and are arranged side by side in two or two, but none of them are The number and arrangement of the restrictions can be changed according to the actual situation.

請參閱第2圖,於本實施例中,入口板17具有入口孔170,係為一貫穿入口板17之孔洞,以供氣體流通,本實施例之入口孔170數量係為1個。於一些實施例中,入口孔170數量亦可為1個以上,但均不以此為限,其數量及設置方式可依據實際情形任施變化。於一些實施例中,入口板17更可包含過濾裝置(未圖式),但不以此為限,該過濾裝置係封閉設置於入口孔170,用以過濾氣體中的粉塵,或是用以過濾氣體中的雜質,以避免雜質、粉塵流至氣體輸送裝置1之內部使元件受損。 Referring to FIG. 2, in the present embodiment, the inlet plate 17 has an inlet hole 170 which is a hole penetrating through the inlet plate 17 for gas circulation. The number of the inlet holes 170 in this embodiment is one. In some embodiments, the number of the inlet holes 170 may be one or more, but not limited thereto, and the number and arrangement thereof may be changed according to actual conditions. In some embodiments, the inlet plate 17 may further include a filtering device (not shown), but not limited thereto, the filtering device is closed to the inlet hole 170 for filtering dust in the gas, or used for The impurities in the gas are filtered to prevent impurities and dust from flowing into the interior of the gas delivery device 1 to damage the components.

於本實施例中,基材11更包含一驅動電路(未圖示),用以與壓電元件15之正極及負極電性連接,用以提供驅動電源,但不以此為限。於一些實施例中,驅動電路亦可設置於氣體輸送裝置1內部之任一位置,但不以此為限,可依實際情形任施變化。 In the present embodiment, the substrate 11 further includes a driving circuit (not shown) for electrically connecting the positive and negative electrodes of the piezoelectric element 15 to provide a driving power source, but is not limited thereto. In some embodiments, the driving circuit may be disposed at any position inside the gas delivery device 1, but is not limited thereto, and may be changed according to actual conditions.

請繼續參閱第2圖及第3A圖,於本實施例之氣體氣體輸送裝置1中,共振板13係為懸浮結構,共振板13更具有中空孔洞130及複數個可動部131,且每一導流單元10均具有一個中空孔洞130及其所對應之可動部131。於本實施例之導流單元10中,中空孔洞130係設置於可動部131之中心處,且中空孔洞130為一貫穿共振板13之孔洞,並連通於匯流腔室12與第一腔室18之間,以供氣體流通及傳輸。本實施例之可動部131係為共振板13之部分,其為一可撓之結構,並可隨致動模14之驅動而上下彎曲振動,藉此以傳輸氣體,其作動方式將於說明 書後段進一步詳述。 Please refer to FIG. 2 and FIG. 3A. In the gas gas delivery device 1 of the present embodiment, the resonance plate 13 is a suspension structure, and the resonance plate 13 further has a hollow hole 130 and a plurality of movable portions 131, and each guide The flow units 10 each have a hollow bore 130 and its corresponding movable portion 131. In the flow guiding unit 10 of the present embodiment, the hollow hole 130 is disposed at the center of the movable portion 131, and the hollow hole 130 is a hole penetrating the resonance plate 13 and communicates with the confluence chamber 12 and the first chamber 18 Between the gas for circulation and transmission. The movable portion 131 of the embodiment is a portion of the resonance plate 13, which is a flexible structure, and can be bent and vibrated up and down with the driving of the movable mold 14, thereby transmitting gas, and the operation mode thereof will be explained. The latter part of the book is further detailed.

請繼續參閱第2圖及第3A圖,於本實施例之氣體輸送裝置1中,致動板14係為一金屬材料薄膜或多晶矽薄膜所構成,但不以此為限,該致動板14為中空懸浮結構,致動板14更具有懸浮部141及外框部142,且每一導流單元10均具有一個懸浮部141。於本實施例之導流單元10中,懸浮部141係以複數個連接部(未圖示)連接至外框部142,以使懸浮部141懸浮於外框部142中,並於懸浮部141及外框部142之間定義出複數個空隙143,用以供氣體流通,且懸浮部141及外框部142及空隙143之設置方式、實施態樣及數量均不以此為限,可依據實際情形變化。於一些實施例中,懸浮部141係為一階梯面之結構,意即懸浮部141更包含一凸部(未圖示),該凸部可為但不限為一圓形凸起結構,設置於懸浮部141之下表面,並透過凸部之設置以使第一腔室18之深度維持於一特定區間值,藉此可避免因第一腔室18之深度過小導致共振板13之可動部131於進行共振時與致動板14產生碰撞、產生噪音之問題,亦可避免因第一腔室18之深度過大導致氣體傳輸壓力不足之問題,但不以此為限。 Continuing to refer to FIG. 2 and FIG. 3A , in the gas delivery device 1 of the present embodiment, the actuation plate 14 is formed by a thin film of a metal material or a polycrystalline silicon film, but not limited thereto, the actuation plate 14 is not limited thereto. For the hollow suspension structure, the actuation plate 14 further has a suspension portion 141 and an outer frame portion 142, and each flow guiding unit 10 has a floating portion 141. In the flow guiding unit 10 of the present embodiment, the floating portion 141 is connected to the outer frame portion 142 by a plurality of connecting portions (not shown) to suspend the floating portion 141 in the outer frame portion 142 and in the floating portion 141. A plurality of gaps 143 are defined between the outer frame portion 142 and the outer frame portion 142 for the gas to circulate, and the manner, implementation, and quantity of the floating portion 141 and the outer frame portion 142 and the gap 143 are not limited thereto. The actual situation changes. In some embodiments, the floating portion 141 is a stepped surface structure, that is, the floating portion 141 further includes a convex portion (not shown), which may be, but is not limited to, a circular convex structure. The lower surface of the floating portion 141 is disposed through the convex portion to maintain the depth of the first chamber 18 at a specific interval value, thereby preventing the movable portion of the resonant plate 13 from being too small due to the depth of the first chamber 18. The problem that the 131 collides with the actuating plate 14 during the resonance and generates noise can also avoid the problem that the gas transmission pressure is insufficient due to the excessive depth of the first chamber 18, but is not limited thereto.

請繼續參閱第2圖及第3A圖,於本實施例之氣體輸送裝置1中,每一導流單元10均具有一個壓電元件15,壓電元件15係貼附於致動板14之懸浮部141之上表面,且壓電元件15更具有一正極及一負極(未圖示),用以電性連接,令該壓電源間15收到電壓後產生型變,用以驅動致動板14往復式地垂直方向之往復式振動,並帶動共振板13產生共振,藉此使共振板13與致動板14之間的第一腔室18產生壓力變化,以供氣體之傳輸,其作動方式將於說明書後段進一步詳述。 Continuing to refer to FIG. 2 and FIG. 3A, in the gas delivery device 1 of the present embodiment, each of the flow guiding units 10 has a piezoelectric element 15 attached to the suspension of the actuation plate 14. The upper surface of the portion 141, and the piezoelectric element 15 further has a positive electrode and a negative electrode (not shown) for electrically connecting, so that the voltage source 15 receives a voltage and is deformed to drive the actuation plate. 14 reciprocatingly reciprocating vibration in the vertical direction, and driving the resonance plate 13 to resonate, thereby causing a pressure change in the first chamber 18 between the resonance plate 13 and the actuation plate 14 for gas transmission, and actuating The method will be further detailed in the later part of the manual.

請繼續參閱第1圖至第3A圖,於本實施例之氣體輸送裝置1中,出口板16更包含出口孔160,且每一導流單元10均具有一個出口孔160。 於本實施例之導流單元10中,出口孔160係連通於該第二腔室19與出口板16外部之間,以供氣體由第二腔室19經出口孔160流至出口板16外部,俾實現氣體之傳輸。 Referring to FIGS. 1 to 3A , in the gas delivery device 1 of the present embodiment, the outlet plate 16 further includes an outlet hole 160 , and each of the flow guiding units 10 has an outlet hole 160 . In the flow guiding unit 10 of the embodiment, the outlet hole 160 is connected between the second chamber 19 and the outside of the outlet plate 16 for the gas to flow from the second chamber 19 through the outlet hole 160 to the outside of the outlet plate 16. , 俾 achieve gas transmission.

請同時參閱第3A圖至第3D圖,第3B圖至第3E圖為第3A圖所示之氣體輸送裝置之單一導流單元10作動流程局部示意圖。首先,第3A圖所示之氣體輸送裝置1之導流單元10為未致能之狀態(即初始狀態),其中共振板13與致動板14之間係具有間隙g0,以使共振板13與致動板14之懸浮部141之間可維持該間隙g0之深度,進而可導引氣體更迅速地流動,且因懸浮部141與共振板13保持適當距離使彼此接觸干涉減少,促使噪音產生可被降低,但不以此為限。 Please refer to FIG. 3A to FIG. 3D at the same time. FIGS. 3B to 3E are partial schematic views showing the operation flow of the single flow guiding unit 10 of the gas delivery device shown in FIG. 3A. First, the flow guiding unit 10 of the gas delivery device 1 shown in Fig. 3A is in an unpowered state (i.e., an initial state), wherein a gap g0 is formed between the resonance plate 13 and the actuation plate 14 to cause the resonance plate 13 The depth of the gap g0 can be maintained between the floating portion 141 of the actuating plate 14, and the gas can be guided to flow more rapidly, and the floating portion 141 and the resonant plate 13 are kept at an appropriate distance to reduce mutual contact interference, thereby promoting noise generation. Can be reduced, but not limited to this.

如第2圖及第3B圖所示,於導流單元10中,當壓電元件15施加電壓,使致動板14受壓電元件15驅動致動時,致動板14之懸浮部141向上振動,使第一腔室18體積增大、壓力減小,則氣體由入口板17上的入口孔170順應外部壓力進入,並匯集到基材11之匯流腔室12處,再經由共振板13上與匯流腔室12對應設置的中央孔洞130向上流入至第一腔室18中。接著,如第2圖及第3C圖所示,且由於受致動板14之懸浮部141振動之帶動,使共振板13之可動部131亦隨之共振而向上振動,且致動板14之懸浮部141亦同時向下振動,使共振板13之可動部131貼附抵觸於致動板14之懸浮部141上,同時關閉第一腔室18中間流通的空間,藉此使第一腔室18壓縮而使體積變小、壓力增大,使第二腔室19體積增大、壓力變小,進而形成壓力梯度,使第一腔室18內部之氣體推擠向兩側流動,並經由致動板14之複數個空隙140流入第二腔室19中。 As shown in FIGS. 2 and 3B, in the flow guiding unit 10, when the piezoelectric element 15 applies a voltage to cause the actuation plate 14 to be driven by the piezoelectric element 15, the suspension portion 141 of the actuation plate 14 is upward. The vibration causes the first chamber 18 to increase in volume and the pressure to decrease, and the gas enters from the inlet hole 170 on the inlet plate 17 in accordance with external pressure, and collects at the confluence chamber 12 of the substrate 11, and then passes through the resonance plate 13 The central hole 130 provided corresponding to the confluence chamber 12 flows upward into the first chamber 18. Next, as shown in FIGS. 2 and 3C, and due to the vibration of the suspension portion 141 of the actuator plate 14, the movable portion 131 of the resonance plate 13 is also resonated to vibrate upward, and the actuation plate 14 is The suspension portion 141 also vibrates downward at the same time, so that the movable portion 131 of the resonance plate 13 is attached against the floating portion 141 of the actuation plate 14 while closing the space circulating in the middle of the first chamber 18, thereby making the first chamber 18 compresses to make the volume smaller and the pressure increase, so that the volume of the second chamber 19 is increased and the pressure is reduced, thereby forming a pressure gradient, so that the gas inside the first chamber 18 is pushed to flow to both sides, and A plurality of voids 140 of the moving plate 14 flow into the second chamber 19.

再如第2圖及第3D圖所示,致動板14之懸浮部141繼續向下振動,並帶動共振板13之可動部131隨之向下振動,使第一腔室18進一步壓 縮,並使大部分之氣體流至第二腔室19中暫存,最後,致動板14之懸浮部141向上振動,使第二腔室19壓縮而體積變小、壓力變大,進而使第二腔室19內之氣體自出口板16之出口孔160導出至出口板16之外部,以完成氣體之傳輸,如此再重複第3B圖所示之作動,使第一腔室18之體積增大、壓力減小,進而使氣體再次由入口板17上的入口孔170順應外部壓力進入,並匯集到基材11之匯流腔室12處,再經由共振板13上與匯流腔室12對應設置的中央孔洞130向上流入至第一腔室18。藉由,重複上述第3B圖至第3D圖之導流單元10之氣體傳輸作流,使致動板14之懸浮部141及共振板13之可動部131持續進行往復式地上下振動,可持續將氣體由進入口170持續導向出口孔160,俾實現氣體之傳輸。 As shown in FIG. 2 and FIG. 3D, the floating portion 141 of the actuating plate 14 continues to vibrate downward, and the movable portion 131 of the resonant plate 13 is caused to vibrate downwardly to further press the first chamber 18. Shrinking, and causing most of the gas to flow into the second chamber 19 for temporary storage. Finally, the floating portion 141 of the actuating plate 14 vibrates upward, compressing the second chamber 19 to reduce the volume and pressure, thereby making The gas in the second chamber 19 is led out from the outlet hole 160 of the outlet plate 16 to the outside of the outlet plate 16 to complete the gas transfer, so that the operation shown in FIG. 3B is repeated to increase the volume of the first chamber 18. The pressure is reduced, and the gas is again introduced by the inlet hole 170 on the inlet plate 17 in accordance with the external pressure, and is collected at the confluence chamber 12 of the substrate 11, and then corresponding to the confluence chamber 12 via the resonance plate 13 The central hole 130 flows upward into the first chamber 18. By repeating the gas transmission flow of the flow guiding unit 10 of the third to third embodiments, the floating portion 141 of the actuating plate 14 and the movable portion 131 of the resonant plate 13 are continuously reciprocally vibrated up and down, which is sustainable. Gas is continuously directed from the inlet port 170 to the outlet port 160 for gas transport.

如此一來,經由本實施例之氣體輸送裝置1於每一導流單元10之流道設計中產生壓力梯度,使氣體高速流動,並透過流道進出方向之阻抗差異,將氣體由吸入端傳輸至排出端,且在排出端有壓力之狀態下,仍有能力持續推出氣體,並可達到靜音之效果。於一些實施例中,共振板13之垂直往復式振動頻率係可與致動板14之振動頻率相同,即兩者可同時向上或同時向下,其係可依照實際施作情形而任施變化,並不以本實施例所示之作動方式為限。 In this way, the gas delivery device 1 of the present embodiment generates a pressure gradient in the flow channel design of each flow guiding unit 10, so that the gas flows at a high speed, and the gas is transmitted from the suction end through the difference in impedance between the flow path and the flow direction. To the discharge end, and under the pressure of the discharge end, there is still the ability to continuously push out the gas, and the effect of mute can be achieved. In some embodiments, the vertical reciprocating vibration frequency of the resonant plate 13 can be the same as the vibration frequency of the actuating plate 14, that is, the two can be simultaneously upward or downward, which can be changed according to the actual application situation. It is not limited to the mode of operation shown in this embodiment.

於本實施例中,氣體輸送裝置1透過40個導流單元10可配合多種排列方式之設計以及驅動電路之連接,其靈活度極高,更應用於各式電子元件之中,且透過40個導流單元10可同時致能傳輸氣體,可因應大流量之氣體傳輸需求;此外,每一導流單元10亦可單獨控制作動或停止,例如:部份導流單元10作動、另一部分導流單元10停止,亦可以是部分導流單元10與另一部分之導流單元10交替運作,但均不以此為限,藉此可輕易達成各種氣體傳輸流量之需求,並可達到大幅降 低功耗之功效。 In the present embodiment, the gas delivery device 1 can be configured with a plurality of arrangement modes and a connection of the driving circuit through the 40 flow guiding units 10. The flexibility is extremely high, and is applied to various electronic components and transmits through 40 electronic components. The flow guiding unit 10 can simultaneously transmit gas, which can meet the gas transmission demand of a large flow rate; in addition, each flow guiding unit 10 can also be individually controlled to operate or stop, for example, part of the flow guiding unit 10 is actuated, and another part of the flow guiding The unit 10 stops, and the partial flow guiding unit 10 and the other part of the flow guiding unit 10 alternately operate, but are not limited thereto, thereby easily achieving various gas transmission flow demands and achieving a large drop. Low power consumption.

請參閱第4圖,第4圖為本案為第二較佳實施例之氣體輸送裝置之外觀結構示意圖。於本案第二較佳實施例中,氣體輸送裝置2之複數個導流單元20之數量係為80個,其排列方式為即出口板26之每一個出口孔260對應於每一導流單元20,換言之,氣體輸送裝置2具有80個可單獨傳輸氣體之單元,每一導流單元20之結構係於前述第一實施例相仿,差異僅在於其數量、排列設置方式,故其結構於此不再進一步贅述。本實施例80個導流單元20亦以20個為一行,以四行對應並排設置,但均不以此為限,其數量、排列方式皆可依據實際情形任施變化。透過80個導流單元20同時致能傳輸氣體,可達到相較於前述實施例更大的氣體傳輸量,且每一導流單元20亦可單獨致能導流,其可控制氣體傳輸流量的範圍更大,使其更靈活應用於各式需大流量氣體傳輸之裝置中,但均不以此為限。請參閱第4B圖及第4C圖所示,氣體輸送裝置2之複數個導流單元20之數量係為20,其排列方式可分別為一行串接排列設置或是一列串接排列設置。 Please refer to FIG. 4, which is a schematic view showing the appearance of the gas delivery device of the second preferred embodiment. In the second preferred embodiment of the present invention, the number of the plurality of flow guiding units 20 of the gas delivery device 2 is 80, and the arrangement is such that each of the outlet holes 260 of the outlet plate 26 corresponds to each of the flow guiding units 20. In other words, the gas delivery device 2 has 80 units for separately transporting gas, and the structure of each flow guiding unit 20 is similar to that of the first embodiment described above, and the difference lies only in the number and arrangement thereof, so the structure thereof is not I will go into further details. In this embodiment, the 80 flow guiding units 20 are also arranged in a row of 20 rows, and are arranged side by side in four rows, but are not limited thereto, and the number and arrangement thereof may be changed according to actual conditions. By simultaneously enabling the transmission of gas through the 80 flow guiding units 20, a larger gas transmission amount than that of the foregoing embodiment can be achieved, and each of the flow guiding units 20 can also individually induce the flow, which can control the gas transmission flow rate. The larger range makes it more flexible for use in a variety of devices requiring large flow of gas, but not limited to this. Referring to FIGS. 4B and 4C, the number of the plurality of flow guiding units 20 of the gas delivery device 2 is 20, and the arrangement thereof may be one row serial arrangement or one column serial arrangement.

請參閱第5圖,第5圖為本案為第三較佳實施例之氣體輸送裝置之外觀結構示意圖。於本案第三較佳實施例中,氣體輸送裝置3係為一圓形結構,且其導流單元30之數量係為40個,即出口板36之每一個出口孔360對應於每一導流單元30,換言之,氣體輸送裝置3具有40個可單獨傳輸氣體之單元,每一導流單元30之結構係於前述第一實施例相仿,差異僅在於其數量、排列設置方式,故其結構於此不再進一步贅述。本實施例40個導流單元30係以環型排列的方式設置,但不以此為限,其數量、排列方式皆可依據實際情形任施變化。透過40個導流單元30環形陣列,使其可應用於各式圓形或環狀氣體傳輸通道。透過每一導流單元30之陣列方式變化,可因應需求裝置中所需求的各種 形狀,使其更靈活應用於各式氣體傳輸之裝置中。 Please refer to FIG. 5, which is a schematic view showing the appearance of a gas delivery device according to a third preferred embodiment of the present invention. In the third preferred embodiment of the present invention, the gas delivery device 3 has a circular structure, and the number of the flow guiding units 30 is 40, that is, each of the outlet holes 360 of the outlet plate 36 corresponds to each diversion. The unit 30, in other words, the gas delivery device 3 has 40 units for separately transporting gas, and the structure of each of the flow guiding units 30 is similar to that of the first embodiment described above, the difference is only in the number and arrangement manner, so the structure is This will not be further described. In this embodiment, the 40 flow guiding units 30 are arranged in a ring-shaped arrangement, but the limitation is not limited thereto, and the number and arrangement thereof may be changed according to actual conditions. Through the annular array of 40 flow guiding units 30, it can be applied to various circular or annular gas transmission channels. Through the change of the array of each flow guiding unit 30, it can respond to various requirements in the demanding device. The shape makes it more flexible for use in a variety of gas transmission devices.

請參閱第6圖,第6圖為本案為第四較佳實施例之氣體輸送裝置之外觀結構示意圖。於本案第四較佳實施例中,氣體輸送裝置4之導流單元40為蜂巢狀方式排列。 Please refer to FIG. 6. FIG. 6 is a schematic view showing the appearance of a gas delivery device according to a fourth preferred embodiment of the present invention. In the fourth preferred embodiment of the present invention, the flow guiding units 40 of the gas delivery device 4 are arranged in a honeycomb manner.

請繼續參閱第2圖及第3A圖,本案之氣體輸送裝置1更包含有至少一閥5,閥5可設置於氣體輸送裝置1的入口孔170或出口孔160,或同時設置於入口孔170及出口孔160。 Continuing to refer to FIG. 2 and FIG. 3A , the gas delivery device 1 of the present invention further includes at least one valve 5 , and the valve 5 can be disposed at the inlet hole 170 or the outlet hole 160 of the gas delivery device 1 or at the same time at the inlet hole 170 . And an exit hole 160.

請參閱第7A圖及第7B圖,閥5之第一實施態樣為包含一保持件51、一密封件52以及一閥片53。閥片53設置於保持件51及密封件52之間所形成的容置空間55中,保持件51上具有至少兩個通氣孔511,而閥片53對應保持件51上通氣孔511位置也設置至少兩個通氣孔531,保持件51的通氣孔511及閥片53的通氣孔531,其位置為大致相互對準以及密封件52上設有至少一個通氣孔521,且密封件52之通氣孔521與保持件51之通氣孔511之位置形成錯位而不對準。 Referring to FIGS. 7A and 7B, the first embodiment of the valve 5 includes a retaining member 51, a seal member 52, and a valve plate 53. The valve piece 53 is disposed in the accommodating space 55 formed between the holding member 51 and the sealing member 52. The holding member 51 has at least two vent holes 511, and the valve piece 53 is also disposed corresponding to the vent hole 511 of the holding member 51. At least two vent holes 531, a vent hole 511 of the holder 51 and a vent hole 531 of the valve piece 53 are disposed substantially in alignment with each other, and at least one vent hole 521 is provided in the sealing member 52, and the vent hole of the sealing member 52 The position of the 521 and the vent 511 of the holder 51 is misaligned and not aligned.

請繼續參閱第7A圖及第7B圖,於本第一實施例樣態中,閥5可設置於入口板17之入口孔170;當氣體輸送裝置1致能,將氣體由入口板17之入口孔170導入氣體輸送裝置1內部,此時,氣體輸送裝置1內部形成吸力,閥片53會如第7B圖所示,沿箭頭方向之氣流而將閥片53上推,致使閥53頂抵於保持件51,同時開啟密封件52之通氣孔521,氣體可由密封件102之通氣孔102a導入,由於閥片53的通氣孔531之位置大致對準保持件51的通氣孔511,故通氣孔531與511可相互接通,使氣流向上流動,進入氣體輸送裝置1內。當氣體輸送裝置1之致動板14向下振動時,進一步壓縮第一腔室18之體積,使氣體透過空隙143向上流入第二腔室19,同時閥5之閥片53受到氣體推壓,進而恢復如第7A圖所示封閉密封件52之通氣孔521之作動,形成氣 體一單向之流動進入匯流腔室12,並在匯流腔室12內累積氣體,如此氣體輸送裝置1之致動板14向上振動時,即可獲得較多的氣體由出口孔160排出,以提升氣體量的輸出。 Continuing to refer to FIGS. 7A and 7B, in the first embodiment, the valve 5 can be disposed at the inlet opening 170 of the inlet plate 17; when the gas delivery device 1 is enabled, the gas is introduced from the inlet plate 17 The hole 170 is introduced into the interior of the gas delivery device 1. At this time, the inside of the gas delivery device 1 forms a suction force, and the valve piece 53 pushes up the valve piece 53 in the direction of the arrow as shown in Fig. 7B, so that the valve 53 abuts against the valve 53 The holding member 51 simultaneously opens the vent hole 521 of the sealing member 52, and the gas can be introduced from the vent hole 102a of the sealing member 102. Since the position of the vent hole 531 of the valve piece 53 is substantially aligned with the vent hole 511 of the holding member 51, the vent hole 531 is provided. The 511 can be connected to each other to flow the airflow upward into the gas delivery device 1. When the actuation plate 14 of the gas delivery device 1 vibrates downward, the volume of the first chamber 18 is further compressed, so that the gas flows upward through the gap 143 into the second chamber 19, while the valve piece 53 of the valve 5 is pressed by the gas. Further, the operation of the vent hole 521 of the sealing member 52 as shown in FIG. 7A is resumed to form a gas. The one-way flow enters the confluence chamber 12, and accumulates gas in the confluence chamber 12, so that when the actuation plate 14 of the gas delivery device 1 vibrates upward, more gas is obtained to be discharged from the outlet hole 160, Increase the output of the gas volume.

本案閥5之保持件51、密封件52以及閥片53可用石墨烯材料所製成,以形成微型化之閥件。而在本案閥5之第二實施例態樣,閥片53為一帶電荷之材料,保持件51為一兩極性之導電材料。保持件51電性連接一控制電路(未圖示),該控制電路用以控制保持件51之極性(正電極性或負電極性)。若閥片53為一帶負電荷之材料,當閥5須受控開啟時,控制電路控制保持件51形成一正電極,此時閥片53與保持件51維持不同極性,如此會使閥片53朝保持件51靠近,構成閥5之開啟(如第7B圖所示)。反之,若閥片53為一帶負電荷之材料,當閥5須受控關閉時,控制電路控制保持件51形成一負電極,此時閥片53與保持件51維持相同極性,使閥片53朝密封件52靠近,構成閥5之關閉(如第7A圖所示)。 The holder 51 of the valve 5 of the present invention, the sealing member 52 and the valve piece 53 may be made of a graphene material to form a miniaturized valve member. In the second embodiment of the valve 5 of the present invention, the valve piece 53 is a charged material, and the holding member 51 is a two-polar conductive material. The holder 51 is electrically connected to a control circuit (not shown) for controlling the polarity (positive polarity or negative polarity) of the holder 51. If the valve piece 53 is a negatively charged material, when the valve 5 is to be controlled to open, the control circuit controls the holding member 51 to form a positive electrode. At this time, the valve piece 53 and the holding member 51 maintain different polarities, so that the valve piece 53 is caused. Adjacent to the holder 51, the opening of the valve 5 is formed (as shown in Fig. 7B). On the other hand, if the valve piece 53 is a negatively charged material, when the valve 5 is to be controlled to be closed, the control circuit controls the holding member 51 to form a negative electrode, at which time the valve piece 53 and the holding member 51 maintain the same polarity, so that the valve piece 53 Approaching the seal 52 constitutes the closing of the valve 5 (as shown in Figure 7A).

在本案閥10之第三實施例態樣,閥片5為一帶磁性之材料,而保持件51為一可受控變換極性之磁性材料。保持件51電性連接一控制電路(未圖示),該控制電路用以控制保持件51之極性(正極或負極)。若閥片53為一帶負極之磁性材料,當閥5須受控開啟時,保持件51形成一正極之磁性,此時控制電路控制閥片53與保持件51維持不同極性,使閥片53朝保持件51靠近,構成閥5之開啟(如第7B圖所示)。反之,若閥片53為一帶負極之磁性材料,當閥5須受控關閉時,保持件51形成一負極之磁性,此時控制電路控制閥片53與保持件51維持相同極性,使閥片53朝密封件52靠近,構成閥5之關閉(如第7A圖所示)。 In the third embodiment of the valve 10 of the present invention, the valve piece 5 is a magnetic material, and the holding member 51 is a magnetic material of controlled polarity. The holder 51 is electrically connected to a control circuit (not shown) for controlling the polarity (positive or negative) of the holder 51. If the valve piece 53 is a magnetic material with a negative electrode, when the valve 5 is to be controlled to open, the holding member 51 forms a positive magnetic state, and at this time, the control circuit controls the valve piece 53 and the holding member 51 to maintain different polarities, so that the valve piece 53 faces The retaining member 51 is brought close to form the opening of the valve 5 (as shown in Fig. 7B). On the other hand, if the valve piece 53 is a magnetic material with a negative electrode, when the valve 5 is controlled to be closed, the holding member 51 forms a magnetic pole of the negative electrode, and at this time, the control circuit controls the valve piece 53 and the holding member 51 to maintain the same polarity, so that the valve piece 53 approaches the seal 52, constituting the closing of the valve 5 (as shown in Figure 7A).

請參閱第8A圖及第8B圖,其為本案之閥之第四實施態樣之作動示意圖。如第8A圖所示,閥5包含一保持件51、一密封件52及一柔性膜 54。保持件51上具有至少兩個通氣孔511,保持件51與密封件52之間保持一容置空間55。柔性膜54以一可撓性材料所製成,貼附於保持件51之一側面而置於容置空間55內,且對應保持件51上通氣孔511位置也設置至少兩個通氣孔541,保持件51的通氣孔511及柔性膜54的通氣孔541,其位置為大致相互對準。以及密封件52上設有至少一個通氣孔521且密封件52之通氣孔521與保持件51之通氣孔511之位置形成錯位而不對準。 Please refer to FIG. 8A and FIG. 8B , which are schematic diagrams showing the operation of the fourth embodiment of the valve of the present invention. As shown in FIG. 8A, the valve 5 includes a retaining member 51, a sealing member 52 and a flexible membrane. 54. The holder 51 has at least two vent holes 511 therein, and an accommodating space 55 is held between the holder 51 and the sealing member 52. The flexible film 54 is made of a flexible material, and is attached to one side of the holding member 51 to be placed in the accommodating space 55. At least two vent holes 541 are also disposed at positions corresponding to the vent holes 511 of the holding member 51. The vent hole 511 of the holder 51 and the vent hole 541 of the flexible film 54 are positioned substantially in alignment with each other. And the sealing member 52 is provided with at least one venting hole 521 and the position of the venting hole 521 of the sealing member 52 and the venting hole 511 of the holding member 51 is misaligned and not aligned.

請繼續參閱第8A圖及第8B圖。在本案閥5以之第四佳實施例實施,保持件51為一受熱膨脹之材料,且電性連接一控制電路(未圖示),該控制電路用以控制保持件51受熱。當閥5須受控開啟時,控制電路控制保持件51不受熱膨脹,使保持件101與密封件102保持容置空間55之間距,構成閥5之開啟(如第8A圖所示)。反之,當閥5須受控關閉,控制電路控制保持件51受熱膨脹,而驅使保持件51朝密封件52抵觸,此時柔性膜54可以密貼封閉密封件52之通氣孔521,構成閥5之關閉(如第8B圖所示)。 Please continue to refer to Figures 8A and 8B. In the fourth preferred embodiment of the present invention, the retaining member 51 is a thermally expanded material and is electrically connected to a control circuit (not shown) for controlling the holding member 51 to be heated. When the valve 5 is to be controlled to open, the control circuit controls the holding member 51 to be free from thermal expansion, so that the holder 101 and the seal member 102 are maintained at a distance between the accommodating spaces 55, constituting the opening of the valve 5 (as shown in Fig. 8A). On the contrary, when the valve 5 is controlled to be closed, the control circuit controls the holding member 51 to be thermally expanded to drive the holding member 51 against the sealing member 52. At this time, the flexible film 54 can be closely attached to the vent hole 521 of the sealing member 52 to constitute the valve 5. Closed (as shown in Figure 8B).

請繼續參閱第8A圖及第8B圖,本案閥5以第五實施例實施,其中該保持件51為一壓電材料,由一控制電路(未圖示)控制其形變。當閥5須受控開啟時,以令該保持件51不受形變,使保持件101與密封件102保持容置空間55之間距,構成該閥5之開啟(如第8A圖所示)。反之,當閥5須受控關閉時,控制電路控制保持件51,以令該保持件51受形變而驅使保持件51朝該密封件52抵觸,此時柔性膜54以密貼封閉該密封件52之通氣孔521,構成該閥5之關閉(如第8B圖所示)。當然,密封件52之複數個通氣孔521所對應之每個間隔區塊之保持件51,也可獨立受控制電路控制,形成可調變閥5之流通作動,達成適當氣體流量之調節作用。 Continuing to refer to FIGS. 8A and 8B, the valve 5 of the present invention is implemented in the fifth embodiment, wherein the holder 51 is a piezoelectric material controlled by a control circuit (not shown). When the valve 5 is to be controlled to open, so that the retaining member 51 is not deformed, the distance between the retaining member 101 and the sealing member 102 in the accommodating space 55 constitutes the opening of the valve 5 (as shown in Fig. 8A). On the contrary, when the valve 5 is to be controlled to be closed, the control circuit controls the holding member 51 to deform the holding member 51 to urge the holding member 51 against the sealing member 52, at which time the flexible film 54 closes the sealing member with a close seal. The vent 521 of 52 constitutes the closing of the valve 5 (as shown in Fig. 8B). Of course, the holding member 51 of each of the spacer blocks corresponding to the plurality of vent holes 521 of the sealing member 52 can also be independently controlled by the control circuit to form a flow operation of the adjustable variable valve 5 to achieve an appropriate gas flow regulating effect.

綜上所述,本案所提供之氣體輸送裝置包含有複數個導流單元,透過導流單元進行作動,產生壓力梯度,使氣體快速的流動,並利用特定的排列方式來設置該些導流單元,用以控制及調整氣體傳輸量氣體輸送。此外,透過壓電元件致能致動板之進行作動,使氣體於設計後之流道及壓力腔室中產生壓力梯度,進而使氣體高速流動,由進入端快速傳遞至出口端,俾實現氣體之傳輸。再者,本案亦透過導流單元之數量、設置方式及驅動方式之靈活變化,可因應各種不同裝置及氣體傳輸流量之需求,可達到高傳輸量、高效能、高靈活性等功效。更甚者,本案透過閥之設置,使氣體證有效率的集中,並於有限容積的腔室累積氣體,達到提升氣體輸出量之功效。 In summary, the gas delivery device provided in the present invention comprises a plurality of flow guiding units, which are actuated by the flow guiding unit to generate a pressure gradient, so that the gas flows rapidly, and the flow guiding units are arranged by using a specific arrangement. To control and adjust the gas delivery volume gas delivery. In addition, the actuating plate is actuated by the piezoelectric element, so that the gas generates a pressure gradient in the designed flow channel and the pressure chamber, so that the gas flows at a high speed, and is quickly transmitted from the inlet end to the outlet end, and the gas is realized. Transmission. In addition, this case also allows for high transmission capacity, high efficiency, and high flexibility through the flexible changes in the number, setting, and driving methods of the diversion unit. What's more, in this case, through the setting of the valve, the gas certificate is efficiently concentrated, and the gas is accumulated in the chamber of a limited volume to achieve the effect of increasing the gas output.

本案得由熟知此技術之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。 This case has been modified by people who are familiar with the technology, but it is not intended to be protected by the scope of the patent application.

Claims (12)

一種氣體輸送裝置,包含:複數個導流單元,該導流單元,分別包含:一入口板,具有至少一入口孔;一基材;一共振板,具有一中空孔洞,且該共振板與該入口板之間具有一匯流腔室;一致動板,具有一個懸浮部及一外框部及至少一空隙;一壓電元件,貼附於該致動板之該懸浮部之一表面;一出口板,具有一出口孔;以及至少一閥,設置在該入口孔和該出口孔之至少其中之一;其中,該入口板、該基材、該共振板、該致動板、該壓電元件及該出口板係依序對應堆疊設置,該共振板及該致動板之間具有一間隙形成一第一腔室,該致動板及該出口板之間形成一第二腔室,該壓電元件驅動該致動板產生彎曲共振,以使該第一腔室及該第二腔室形成一壓力差,並使該至少一閥開啟,讓氣體由該入口板之該入口孔進入該匯流腔室而流經該共振板之該中空孔洞,以進入該第一腔室內,並由該至少一空隙導入該第二腔室內,最後由該出口板之該出口孔導出,藉由一特定排列方式設置該些導流單元以傳輸氣體。 A gas delivery device comprising: a plurality of flow guiding units, each of the flow guiding units comprising: an inlet plate having at least one inlet hole; a substrate; a resonance plate having a hollow hole, and the resonance plate and the Between the inlet plates, there is a confluence chamber; the movable plate has a floating portion and an outer frame portion and at least one gap; a piezoelectric element attached to one surface of the floating portion of the actuating plate; an outlet a plate having an outlet hole; and at least one valve disposed at least one of the inlet hole and the outlet hole; wherein the inlet plate, the substrate, the resonance plate, the actuation plate, and the piezoelectric element And the outlet plate is sequentially arranged correspondingly, the gap between the resonant plate and the actuating plate forms a first chamber, and a second chamber is formed between the actuating plate and the outlet plate, the pressure The electric component drives the actuation plate to generate a bending resonance to cause a pressure difference between the first chamber and the second chamber, and the at least one valve is opened to allow gas to enter the confluence from the inlet aperture of the inlet plate a chamber and flowing through the hollow hole of the resonance plate , To enter the first chamber, the at least one gap by introducing the second chamber, and finally derived from the outlet orifice of the outlet plate, with a particular arrangement of the plurality of guide means arranged to transport gas. 如申請專利範圍第1項所述之氣體輸送裝置,其中該特定排列方式為一行串接排列。 The gas delivery device of claim 1, wherein the specific arrangement is one row in series. 如申請專利範圍第1項所述之氣體輸送裝置,其中該特定排列方式為一列串接排列。 The gas delivery device of claim 1, wherein the specific arrangement is a series of tandem arrangements. 如申請專利範圍第1項所述之氣體輸送裝置,其中該特定排列方式為環狀方式排列。 The gas delivery device of claim 1, wherein the specific arrangement is arranged in an annular manner. 如申請專利範圍第1項所述之氣體輸送裝置,其中特定排列方式為蜂巢狀方式排列。 The gas delivery device of claim 1, wherein the specific arrangement is arranged in a honeycomb manner. 如申請專利範圍第1項所述之氣體輸送裝置,其中該閥包含一保持件、一密封件及一閥片,其中該保持件及該密封件之間保持一容置空間,該閥片設置於該容置空間中,該保持件上具有至少兩個通氣孔,而該閥片對應該保持件之該通氣孔位置設通氣孔,該保持件之該通氣孔及該閥片之該通氣孔位置為大致相互對準,以及該密封件上設有至少一個通氣孔,且與該保持件之該通氣孔位置為形成錯位不對準。 The gas delivery device of claim 1, wherein the valve comprises a holding member, a sealing member and a valve piece, wherein an accommodating space is maintained between the holding member and the sealing member, the valve plate is arranged In the accommodating space, the holder has at least two vent holes, and the valve plate is provided with a vent hole corresponding to the vent hole of the holding member, the vent hole of the holding member and the vent hole of the valve piece The positions are substantially aligned with each other, and the seal is provided with at least one venting opening, and the venting opening position of the retaining member is misaligned to form a misalignment. 如申請專利範圍第1項所述之氣體輸送裝置,其中該閥包含由石墨烯材製成之一保持件、一密封件及一閥片,其中該保持件及該密封件之間保持一容置空間,該閥片設置於該容置空間中,該保持件上具有至少兩個通氣孔,而該閥片對應該保持件之該通氣孔位置設通氣孔,該保持件之該通氣孔及該閥片之該通氣孔位置為大致相互對準,以及該密封件上設有至少一個通氣孔,且與該保持件之該通氣孔位置為形成錯位不對準。 The gas delivery device of claim 1, wherein the valve comprises a holder made of graphene material, a sealing member and a valve piece, wherein the holding member and the sealing member maintain a volume The valve plate is disposed in the accommodating space, the holder has at least two vent holes, and the valve plate is provided with a vent hole corresponding to the vent hole of the retaining member, the vent hole of the retaining member and The vent holes of the valve plate are substantially aligned with each other, and the sealing member is provided with at least one vent hole, and the vent hole position of the retaining member is misaligned to form a misalignment. 如申請專利範圍第6項或第7項所述之氣體輸送裝置,其中該閥片為一帶電荷之材料,而該保持件為一兩極性之導電材料,由一控制電路控制其極性,當該閥片與該保持件維持不同極性時,該閥片朝該保持件靠近,構成該閥之開啟;當該閥片與該保持件維持相同極性時,該閥片朝該密封件靠近,構成該閥之關閉。 The gas delivery device of claim 6 or 7, wherein the valve piece is a charged material, and the holding member is a two-polar conductive material controlled by a control circuit. When the valve piece and the holder maintain different polarities, the valve piece approaches the holder to constitute opening of the valve; when the valve piece maintains the same polarity as the holder, the valve piece approaches the sealing member, thereby constituting the valve piece The valve is closed. 如申請專利範圍第6項或第7項所述之氣體輸送裝置,其中該閥片為一帶磁性之材料,而該保持件為一可受控變換極性之磁性材料,由一控制電路控制其極性,當該閥片與該保持件維持不同極性時,該閥片朝該保持件靠近,構成該閥之開啟;當該閥片與該保持件維持相同極性時,該閥片朝該密封件,靠近構成該閥之關閉。 The gas delivery device of claim 6 or 7, wherein the valve piece is a magnetic material, and the holding member is a magnetic material of controlled polarity, controlled by a control circuit. When the valve plate maintains a different polarity from the retaining member, the valve plate approaches the retaining member to form an opening of the valve; when the valve plate maintains the same polarity as the retaining member, the valve plate faces the sealing member. Close to the closing of the valve. 如申請專利範圍第1項所述之氣體輸送裝置,其中該閥包含一保持件、 一密封件及一柔性膜,其中該保持件與該密封件之間保持有一容置空間,以及該柔性膜貼附於該保持件一表面上,並設置位於該容置空間內,又該保持件上具有至少兩個通氣孔,而該柔性膜對應該保持件之該通氣孔位置設通氣孔,該保持件之該通氣孔及該柔性膜之該通氣孔位置為大致相互對準,以及該密封件上設有至少一個通氣孔,且與該保持件之該通氣孔位置為形成錯位不對準。 The gas delivery device of claim 1, wherein the valve comprises a retaining member, a sealing member and a flexible film, wherein an accommodating space is maintained between the holding member and the sealing member, and the flexible film is attached to a surface of the holding member and disposed in the accommodating space, and the holding The device has at least two vent holes, and the flexible film is provided with a vent hole corresponding to the vent hole of the retaining member, and the vent hole of the retaining member and the vent hole of the flexible film are substantially aligned with each other, and At least one venting hole is provided in the sealing member, and the venting hole position of the holding member is misaligned to form a misalignment. 如申請專利範圍第10項所述之氣體輸送裝置,其中該保持件為一熱膨脹之材料,由一控制電路控制其受熱,當該保持件受熱膨脹時,該柔性膜朝該密封件抵觸,以封閉該密封件之該至少一通氣孔,構成該閥之關閉;當該保持件不受熱膨脹時,該密封件與該保持件之間保持該容置空間之間距,構成該閥之開啟。 The gas delivery device of claim 10, wherein the retaining member is a thermally expandable material, which is controlled by a control circuit to be heated, and when the retaining member is thermally expanded, the flexible membrane is in contact with the sealing member to The at least one venting opening of the sealing member constitutes closing of the valve; when the retaining member is not thermally expanded, the distance between the sealing member and the retaining member is maintained to form an opening of the valve. 如申請專利範圍第11項所述之氣體輸送裝置,其中該保持件為一壓電材料,由一控制電路控制其形變,當該保持件受形變時,該柔性膜朝該密封件抵觸,以封閉該密封件之該至少一通氣孔,構成該閥之關閉;當該保持件不受形變時,該密封件與該保持件之間保持該容置空間之間距,構成該閥之開啟。 The gas delivery device of claim 11, wherein the holding member is a piezoelectric material, and the deformation is controlled by a control circuit, and when the holder is deformed, the flexible film is in contact with the sealing member to The at least one venting opening of the sealing member constitutes closing of the valve; when the retaining member is not deformed, the distance between the accommodating space and the retaining member is maintained to form an opening of the valve.
TW106213775U 2017-09-15 2017-09-15 Gas delivery device TWM559312U (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111434261A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
CN111434262A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
CN111434260A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
TWI722364B (en) * 2019-01-11 2021-03-21 研能科技股份有限公司 Actuating breathable material structure
TWI724362B (en) * 2019-01-11 2021-04-11 研能科技股份有限公司 Actuating breathable material structure
US11540416B2 (en) 2019-01-11 2022-12-27 Microjet Technology Co., Ltd. Actuating breathable material structure

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111434261A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
CN111434262A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
CN111434260A (en) * 2019-01-11 2020-07-21 研能科技股份有限公司 Actuated breathable material structure
TWI722364B (en) * 2019-01-11 2021-03-21 研能科技股份有限公司 Actuating breathable material structure
TWI724362B (en) * 2019-01-11 2021-04-11 研能科技股份有限公司 Actuating breathable material structure
US11540416B2 (en) 2019-01-11 2022-12-27 Microjet Technology Co., Ltd. Actuating breathable material structure

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