TWM544035U - Heat spreader device - Google Patents

Heat spreader device Download PDF

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Publication number
TWM544035U
TWM544035U TW105219808U TW105219808U TWM544035U TW M544035 U TWM544035 U TW M544035U TW 105219808 U TW105219808 U TW 105219808U TW 105219808 U TW105219808 U TW 105219808U TW M544035 U TWM544035 U TW M544035U
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TW
Taiwan
Prior art keywords
heat
plate device
equalizing plate
temperature equalizing
chambers
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TW105219808U
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Chinese (zh)
Inventor
Yao-Nan Kang
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All Round Marketing Co Ltd
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Priority to TW105219808U priority Critical patent/TWM544035U/en
Publication of TWM544035U publication Critical patent/TWM544035U/en

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Description

均溫板裝置Temperature plate device

本新型是有關於一種均溫板裝置,特別是指用於輔助電子產品或是機械結構進行散熱的均溫板裝置。The present invention relates to a temperature equalizing plate device, and more particularly to a temperature equalizing plate device for assisting an electronic product or a mechanical structure for heat dissipation.

參閱圖1,一種已知的均溫板裝置1,包含一個底壁11、一個蓋壁12,及數個熱管13。該等熱管13是相間隔的排列在該底壁11上。該蓋壁12蓋設於該底壁11及該等熱管13上,並以熱壓的方式將該等熱管13固定於該蓋壁12及該底壁11間。在使用時,該均溫板裝置1會設置在一個發熱源(圖未示)上方,該發熱源的熱能會通過該底壁11並傳導進入該等熱管13內,該等熱管13能迅速地將熱能自鄰近該底壁11之一端傳導到遠離該底壁11之一端,並將熱能傳導至該蓋壁12並向外排出。然而,已知的該均溫板裝置1的缺點在於該蓋壁12遠離該底壁11之一側面是呈高低起伏的不規則面,不利於後續例如散熱鰭片等其他輔助零件的組裝。Referring to Figure 1, a known temperature equalizing plate apparatus 1 includes a bottom wall 11, a cover wall 12, and a plurality of heat pipes 13. The heat pipes 13 are arranged on the bottom wall 11 at intervals. The cover wall 12 is disposed on the bottom wall 11 and the heat pipes 13 , and the heat pipes 13 are fixed between the cover wall 12 and the bottom wall 11 by heat pressing. In use, the temperature equalizing plate device 1 is disposed above a heat source (not shown) through which the heat energy of the heat source passes and is conducted into the heat pipes 13, and the heat pipes 13 can be quickly Thermal energy is conducted from adjacent one end of the bottom wall 11 to one end away from the bottom wall 11 and conducts heat energy to the cover wall 12 and is discharged outward. However, the known temperature equalizing plate device 1 has a disadvantage in that the side wall of the cover wall 12 away from the bottom wall 11 is an irregular surface having a high and low undulation, which is disadvantageous for subsequent assembly of other auxiliary parts such as heat dissipation fins.

參閱圖2,另一種已知的均溫板裝置2,包含一個底壁21、一個蓋壁22,及一個工作流體23。該蓋壁22包括一個位於該底壁21上方的蓋體部221,及數個由該蓋體部221向下延伸並與該底壁21焊接的隔板部222。該蓋壁22與該底壁21相配合界定出數個容置空間24,該工作流體23灌注在該等容置空間24內。雖然該蓋壁22遠離該底壁21之一側面為一平坦的平面,但因該蓋壁22與該底壁21間存有製造公差或是焊接不良所產生的微小間隙,除了可能會在該底壁21及該蓋壁22的邊緣接合處發生該工作流體23外洩的問題,也會影響到該工作流體23的熱傳遞路徑,造成導熱效率不佳。Referring to Figure 2, another known temperature equalizing plate assembly 2 includes a bottom wall 21, a cover wall 22, and a working fluid 23. The cover wall 22 includes a cover portion 221 above the bottom wall 21, and a plurality of partition portions 222 extending downward from the cover portion 221 and welded to the bottom wall 21. The cover wall 22 cooperates with the bottom wall 21 to define a plurality of accommodating spaces 24 , and the working fluid 23 is filled in the accommodating spaces 24 . Although the cover wall 22 is a flat plane away from the side surface of the bottom wall 21, there is a slight gap between the cover wall 22 and the bottom wall 21 due to manufacturing tolerances or poor soldering, except that The problem that the working fluid 23 leaks out occurs at the edge joint of the bottom wall 21 and the cover wall 22, and also affects the heat transfer path of the working fluid 23, resulting in poor heat conduction efficiency.

另外,還有一種已知的均溫板裝置,是利用兩片銅板上下對接後,在兩者間形成一個中空腔室,在該中空腔室內放置入銅粉並進行高溫燒結,並在環繞於該中空腔室的內壁面上形成表面粗糙的毛細結構。該毛細結構用於增加該中空腔室內的熱交換面積,並提升熱交換的效率。但該均溫板裝置除了須克服該等銅板焊接時的所遇到前述的問題外,也有製備步驟繁瑣的問題。再者,該毛細結構在高溫燒結製備時的不穩定性,也會間接提高該均溫板裝置的品質成本,增加生產者的負擔。In addition, there is also a known temperature equalizing plate device which uses two sheets of copper to form a hollow chamber between the two, and a copper chamber is placed in the hollow chamber and sintered at a high temperature, and is surrounded by A rough surface capillary structure is formed on the inner wall surface of the hollow chamber. The capillary structure is used to increase the heat exchange area in the hollow chamber and to increase the efficiency of heat exchange. However, in addition to the aforementioned problems encountered in the welding of the copper plates, the temperature equalizing plate device has a problem that the preparation steps are cumbersome. Furthermore, the instability of the capillary structure during high-temperature sintering preparation also indirectly increases the quality cost of the temperature equalization plate device and increases the burden on the producer.

因此,本新型之目的,即在提供一種能夠克服先前技術的至少一個缺點的均溫板裝置。Accordingly, it is an object of the present invention to provide a temperature equalization plate apparatus that overcomes at least one of the disadvantages of the prior art.

於是,本新型均溫板裝置,包含一個導熱基板,及一個工作流體。該導熱基板為一個由高導熱率材料一體成型地擠製而成的板體,並包括一個本體部,及兩個分別位於該本體部的兩相反側且平行於一個第一方向的密封部,該本體部具有一個位於一側面上且連接該等密封部的散熱面、數個彼此間隔且密閉地形成於該等密封部之間的熱傳導室,及數個突伸入該等熱傳導室內且彼此間隔的熱循環片,該散熱面呈一個連續的平面,該等熱傳導室平行於一個垂直於該第一方向的第二方向。該工作流體包括數個分別儲存在該等熱傳導室內的流體部,每一個該流體部未充滿相對應之該熱傳導室。Thus, the novel temperature equalizing plate device comprises a thermally conductive substrate and a working fluid. The heat-conducting substrate is a plate body integrally extruded from a high thermal conductivity material, and includes a body portion, and two sealing portions respectively located on opposite sides of the body portion and parallel to a first direction, The main body portion has a heat dissipating surface on one side and connecting the sealing portions, a plurality of heat conducting chambers spaced apart from each other and tightly formed between the sealing portions, and a plurality of protruding into the heat conducting chambers and mutually The spaced thermal cycle sheets have a continuous plane that is parallel to a second direction that is perpendicular to the first direction. The working fluid includes a plurality of fluid portions respectively stored in the heat transfer chambers, each of the fluid portions not being filled with the corresponding heat transfer chamber.

本新型之功效在於:該導熱基板的一體成型設計,除了製備上更為精簡外,也能避免該等熱傳導室內的該工作流體外洩流出。而該散熱面的連續平面設計,能讓後續的其他散熱零件的組裝更為便利。The effect of the novel is that the integrated design of the heat-conducting substrate can prevent the leakage of the working fluid in the heat-conducting chambers in addition to being more compact in preparation. The continuous planar design of the heat dissipating surface can facilitate the assembly of other heat dissipating components.

在本新型被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

參閱圖3與圖4,本新型均溫板裝置的一第一實施例,包含一個導熱基板3,及一個工作流體4,並定義出位於水平面上且相互垂直的一個第一方向6及一個第二方向7。Referring to Figures 3 and 4, a first embodiment of the novel temperature equalizing plate apparatus includes a thermally conductive substrate 3, and a working fluid 4, and defines a first direction 6 and a first dimension on a horizontal plane and perpendicular to each other. The second direction is 7.

該導熱基板3為一個由例如銅、鋁、鋁合金、鎂鋁合金等高導熱率材料一體成型地擠製而成的板體,並包括一個本體部31,及兩個密封部32。該等密封部32是用熱壓封合的方式所形成,且分別位於該本體部31的兩相反側,並平行於該第一方向6。The heat conductive substrate 3 is a plate body integrally extruded from a high thermal conductivity material such as copper, aluminum, aluminum alloy, magnesium aluminum alloy, and the like, and includes a body portion 31 and two sealing portions 32. The sealing portions 32 are formed by heat sealing, and are respectively located on opposite sides of the body portion 31 and parallel to the first direction 6.

該本體部31具有一個底壁311、數個相間隔地由該底壁311同體向上延伸的隔壁312、一個同體連接該等隔壁312遠離該底壁311之一側的頂壁313、兩個平行於該第二方向7且連接該等密封部32的側邊面314、一個位於該底壁311的底側且連接該等密封部32與該等側邊面314的導熱面315、一個位於該頂壁313的頂側且連接該等密封部32與該等側邊面314並與該導熱面315相間隔的散熱面316、數個由該底壁311、該等隔壁312與該頂壁313相配合界定出的熱傳導室33,及數個由該底壁311與該頂壁313突伸入該等熱傳導室33內的熱循環片34。該導熱面315與該散熱面316相互平行,且該散熱面316呈一連續的平面。The main body portion 31 has a bottom wall 311, a plurality of partition walls 312 extending upward from the bottom wall 311, and a top wall 313 which is connected to one side of the partition wall 311 away from the bottom wall 311. a side surface 314 parallel to the second direction 7 and connecting the sealing portions 32, a heat conducting surface 315 on the bottom side of the bottom wall 311 and connecting the sealing portions 32 and the side surfaces 314, a heat dissipating surface 316 on the top side of the top wall 313 and connecting the sealing portions 32 and the side surfaces 314 and spaced apart from the heat conducting surface 315, and a plurality of the bottom walls 311, the partition walls 312 and the top The wall 313 cooperates with the defined heat transfer chamber 33 and a plurality of heat cycle sheets 34 projecting from the bottom wall 311 and the top wall 313 into the heat transfer chambers 33. The heat conducting surface 315 and the heat dissipating surface 316 are parallel to each other, and the heat dissipating surface 316 has a continuous plane.

該等熱傳導室33是彼此間隔且密閉地形成於該等密封部32之間,且每一個該熱傳導室33平行於該第二方向7,並具有一個鄰近上緣的熱蒸發區331。在本第一實施例中,每一個該熱傳導室33垂直於該第二方向7的剖切面呈一個矩形。應當注意的是,在本第一實施例的其他變化態樣中,每一個該熱傳導室33垂直於該第二方向7的剖切面也可以呈一個沿著上下長向延伸的橢圓形(見圖5)。The heat transfer chambers 33 are spaced apart from each other and are hermetically formed between the seal portions 32, and each of the heat transfer chambers 33 is parallel to the second direction 7 and has a thermal evaporation zone 331 adjacent the upper edge. In the first embodiment, each of the heat conducting chambers 33 has a rectangular shape perpendicular to the cutting plane of the second direction 7. It should be noted that in other variations of the first embodiment, each of the heat transfer chambers 33 perpendicular to the second direction 7 may also have an elliptical shape extending along the upper and lower directions (see FIG. 5).

該等熱循環片34的其中數個是彼此相間隔地由該頂壁313向下突伸入該等熱傳導室33內,該等熱循環片34中的另外數個彼此相間隔地由該底壁311向上突伸入該熱傳導室33內。A plurality of the heat cycle sheets 34 project downwardly from the top wall 313 into the heat transfer chambers 33, and the other of the heat cycle sheets 34 are spaced apart from each other by the bottom. Wall 311 projects upwardly into the heat transfer chamber 33.

該工作流體4為一種吸收熱能後,可蒸發沸騰而轉變為氣態的液體,例如純淨水、冷卻劑或是冷媒等等。該工作流體4包括數個分別儲存在該等熱傳導室33內的流體部41。每一個該流體部41均未充滿相對應之該熱傳導室33,並保留有該熱傳導室33的該熱蒸發區331。The working fluid 4 is a liquid that can be evaporated into a gaseous state after absorbing heat energy, such as purified water, a coolant or a refrigerant. The working fluid 4 includes a plurality of fluid portions 41 that are respectively stored in the heat transfer chambers 33. Each of the fluid portions 41 is not filled with the corresponding heat conduction chamber 33, and the thermal evaporation region 331 of the heat conduction chamber 33 remains.

該第一實施例在使用時,該本體部31的該導熱面315會與一個發熱源(圖未示)相連接,該發熱源的熱能會向上傳導至該底壁311,及該等熱傳導室33內且連接該底壁311的該等熱循環片34內。位於該等熱傳導室33內呈液態的該等流體部41會吸收來自於該底壁311及連接該底壁311的該等熱循環片34的熱能,而一部分會蒸發並轉化為氣態。而呈氣態的該等流體部41會向上蒸散入該熱蒸發區331內,並接觸到相對低溫的該頂壁313,及連接該頂壁313的該等熱循環片34,此時,呈氣態的該等流體部41會因冷凝而從氣態再度轉化回液態,並滴落回原本呈液態的該流體部41內,完成一次熱傳導的循環。而該頂壁313及連接該頂壁313的該等熱循環片34在接受到熱能後,會繼續將熱能向上傳導至相對低溫的該散熱面316上,並由該散熱面316將該熱能向上排出。由上述可知,該等熱循環片34能增加該等熱傳導室33內進行熱交換時的接觸面積,並提升熱交換的效率。When the first embodiment is in use, the heat conducting surface 315 of the body portion 31 is connected to a heat source (not shown), and the heat energy of the heat source is conducted upward to the bottom wall 311, and the heat conducting chambers. The heat circulating sheets 34 are connected to the bottom wall 311. The fluid portions 41 which are in a liquid state in the heat transfer chambers 33 absorb the heat energy from the bottom wall 311 and the heat cycle sheets 34 connected to the bottom wall 311, and a portion evaporates and is converted into a gaseous state. The gaseous portions 41 in the gaseous state are vaporized upward into the thermal evaporation zone 331 and contact the relatively low temperature of the top wall 313, and the thermal cycle sheets 34 connected to the top wall 313. The fluid portions 41 are again converted from the gaseous state back to the liquid state by condensation, and are dropped back into the fluid portion 41 which is originally in a liquid state to complete a cycle of heat conduction. The top wall 313 and the heat-recycling sheets 34 connected to the top wall 313 continue to conduct thermal energy upward to the relatively low-temperature heat-dissipating surface 316 after receiving the thermal energy, and the heat-dissipating surface 316 heats the heat upward. discharge. As apparent from the above, the heat cycle sheets 34 can increase the contact area when heat exchange is performed in the heat conduction chambers 33, and improve the efficiency of heat exchange.

參閱圖6與圖7,本新型的一第二實施例的結構大致相同於該第一實施例,其差別在於:該均溫板裝置還包含一個連接該導熱基板3且為高導熱率材料的散熱鰭片組5。該散熱鰭片組5包括一個連接該導熱基板3的且緊密地貼附在該散熱面316上的底散熱片51,及數個由該底散熱片51向上延伸的側散熱片52。該等側散熱片52沿著該第二方向7相間隔地排列。Referring to FIG. 6 and FIG. 7, a second embodiment of the present invention has substantially the same structure as the first embodiment, and the difference is that the temperature equalizing plate device further comprises a material for connecting the thermally conductive substrate 3 and having high thermal conductivity. Heat sink fin set 5. The heat dissipation fin set 5 includes a bottom heat sink 51 connected to the heat conductive substrate 3 and closely attached to the heat dissipation surface 316, and a plurality of side heat sinks 52 extending upward from the bottom heat sink 51. The side fins 52 are spaced apart along the second direction 7.

本第二實施例在使用時,該底散熱片51接收由該散熱面316所傳導來的熱能,並將一部分的熱能繼續向上傳導至該等側散熱片52。因該底散熱片51與該等側散熱片52與大氣有較多的接觸面積,能更迅速的將熱能逸散到周圍的環境中。當然,在本第二實施例的其他變化態樣中,該等側散熱片52也可以與該第二方向7呈一角度地排列,也能達到類似的效果。In use of the second embodiment, the bottom fins 51 receive thermal energy conducted by the heat dissipating surface 316 and continue to conduct a portion of the thermal energy upwardly to the side fins 52. Since the bottom fins 51 and the side fins 52 have a large contact area with the atmosphere, the heat energy can be more quickly dissipated into the surrounding environment. Of course, in other variations of the second embodiment, the side fins 52 may also be arranged at an angle to the second direction 7, and a similar effect can be achieved.

在實際應用時,該底散熱片51與該散熱面316間會塗抹一層導熱膏(圖未示),用於填補該底散熱片51與該散熱面316之間的微小間隙,並保持良好的接觸面積,但若採用如圖1中已知的該均溫板裝置1的結構設計,就需要大量的該導熱膏去填補圖1中的該蓋壁12的表面凹陷處,進而造成整體的導熱效率受到影響。故本第二實施例的該散熱面316的平坦設計能讓該散熱鰭片組5的該底散熱片51在組裝時使用較少量的導熱膏,除了組裝上更為便利外,也能維持良好的導熱效率。In practical application, a thermal grease (not shown) is applied between the bottom heat sink 51 and the heat dissipation surface 316 for filling a small gap between the bottom heat sink 51 and the heat dissipation surface 316, and maintaining good Contact area, but if the structural design of the temperature equalizing plate device 1 as known in FIG. 1 is adopted, a large amount of the thermal conductive paste is required to fill the surface depression of the cover wall 12 in FIG. 1, thereby causing overall heat conduction. Efficiency is affected. Therefore, the flat design of the heat dissipating surface 316 of the second embodiment enables the bottom heat sink 51 of the heat dissipating fin set 5 to use a smaller amount of thermal conductive paste during assembly, which is more convenient in assembly. Good thermal conductivity.

由上述可知,本新型均溫板裝置的該導熱基板3為一體成型地擠製而成,不需要額外的組裝作業,除了製備上更為精簡外,也能避免因尺寸公差或是組裝手法不佳造成該等熱傳導室33內的該工作流體4外洩流出。再者,該散熱面316的連續平面設計,除了能減少該散熱膏的使用量,讓後續的其他散熱零件的組裝更為便利之外,也能讓維持良好的散熱性。故確實能達成本新型之目的。It can be seen from the above that the heat-conducting substrate 3 of the novel temperature equalizing plate device is integrally molded and extruded, and no additional assembly work is required. In addition to being more compact in preparation, it is also possible to avoid dimensional tolerances or assembly methods. Preferably, the working fluid 4 in the heat transfer chambers 33 is caused to leak out. Furthermore, the continuous planar design of the heat dissipating surface 316 not only reduces the amount of the thermal grease used, but also facilitates the assembly of other heat dissipating components, and also maintains good heat dissipation. Therefore, the purpose of this new type can be achieved.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only the embodiment of the present invention, and when it is not possible to limit the scope of the present invention, all the simple equivalent changes and modifications according to the scope of the patent application and the contents of the patent specification are still This new patent covers the scope.

3‧‧‧導熱基板
31‧‧‧本體部
311‧‧‧底壁
312‧‧‧隔壁
313‧‧‧頂壁
314‧‧‧側邊面
315‧‧‧導熱面
316‧‧‧散熱面
32‧‧‧密封部
33‧‧‧熱傳導室
331‧‧‧熱蒸發區
34‧‧‧熱循環片
4‧‧‧工作流體
41‧‧‧流體部
5‧‧‧散熱鰭片組
51‧‧‧底散熱片
52‧‧‧側散熱片
6‧‧‧第一方向
7‧‧‧第二方向
3‧‧‧thermal substrate
31‧‧‧ Body Department
311‧‧‧ bottom wall
312‧‧‧ next door
313‧‧‧ top wall
314‧‧‧ side surface
315‧‧‧heat conduction surface
316‧‧‧heating surface
32‧‧‧ Sealing Department
33‧‧‧Hot Conduction Room
331‧‧‧ Thermal evaporation zone
34‧‧‧Hot cycle film
4‧‧‧Working fluid
41‧‧‧ Fluid Department
5‧‧‧Fixing fin group
51‧‧‧ bottom heat sink
52‧‧‧ Side heat sink
6‧‧‧First direction
7‧‧‧second direction

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一已知的均溫板裝置的一不完整的剖視圖; 圖2是另一已知的均溫板裝置的一不完整的剖視圖; 圖3是本新型的一第一實施例的一導熱基板的一立體圖; 圖4是該第一實施例的一不完整的剖視圖; 圖5是該第一實施例的另一變化態樣的一不完整的剖視圖; 圖6是本新型的一第二實施例的一立體圖;及 圖7是該第二實施例的一不完整的剖視圖。Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: FIG. 1 is an incomplete cross-sectional view of a known temperature equalizing plate device; FIG. 2 is another known 3 is a perspective view of a thermally conductive substrate of a first embodiment of the present invention; FIG. 4 is an incomplete cross-sectional view of the first embodiment; FIG. An incomplete cross-sectional view of another variation of an embodiment; FIG. 6 is a perspective view of a second embodiment of the present invention; and FIG. 7 is an incomplete cross-sectional view of the second embodiment.

3‧‧‧導熱基板 3‧‧‧thermal substrate

31‧‧‧本體部 31‧‧‧ Body Department

311‧‧‧底壁 311‧‧‧ bottom wall

312‧‧‧隔壁 312‧‧‧ next door

313‧‧‧頂壁 313‧‧‧ top wall

315‧‧‧導熱面 315‧‧‧heat conduction surface

316‧‧‧散熱面 316‧‧‧heating surface

33‧‧‧熱傳導室 33‧‧‧Hot Conduction Room

331‧‧‧熱蒸發區 331‧‧‧ Thermal evaporation zone

34‧‧‧熱循環片 34‧‧‧Hot cycle film

4‧‧‧工作流體 4‧‧‧Working fluid

41‧‧‧流體部 41‧‧‧ Fluid Department

Claims (8)

一種均溫板裝置,包含: 一個導熱基板,為一個由高導熱率材料一體成型地擠製而成的板體,並包括一個本體部,及兩個分別位於該本體部的兩相反側且平行於一個第一方向的密封部,該本體部具有一個位於一側面上且連接該等密封部的散熱面、數個彼此間隔且密閉地形成於該等密封部之間的熱傳導室,及數個突伸入該等熱傳導室內且彼此間隔的熱循環片,該散熱面呈一個連續的平面,該等熱傳導室平行於一個垂直於該第一方向的第二方向;及 一個工作流體,包括數個分別儲存在該等熱傳導室內的流體部,每一個該流體部未充滿相對應之該熱傳導室。A temperature equalizing plate device comprising: a heat conducting substrate, a plate body integrally extruded from a high thermal conductivity material, and comprising a body portion, and two opposite sides on the opposite sides of the body portion and parallel a sealing portion in a first direction, the body portion having a heat dissipating surface on one side and connecting the sealing portions, a plurality of heat conducting chambers spaced apart from each other and tightly formed between the sealing portions, and a plurality of a heat-recycling sheet projecting into the heat-conducting chambers and spaced apart from each other, the heat-dissipating surface being in a continuous plane, the heat-conducting chambers being parallel to a second direction perpendicular to the first direction; and a working fluid comprising a plurality of The fluid portions are respectively stored in the heat transfer chambers, and each of the fluid portions is not filled with the corresponding heat transfer chamber. 如請求項1所述的均溫板裝置,其中,該本體部還具有兩個平行於該第二方向且連接該等密封部的側邊面,及一個連接該等密封部與該等側邊面且與該散熱面相間隔的導熱面。The temperature equalizing plate device of claim 1, wherein the body portion further has two side faces parallel to the second direction and connecting the sealing portions, and a connecting the sealing portions and the sides a heat conducting surface that is spaced apart from the heat dissipating surface. 如請求項2所述的均溫板裝置,其中,該本體部還具有一個底壁、數個相間隔地由該底壁同體向上延伸的隔壁,及一個同體連接該等隔壁遠離該底壁之一側的頂壁,該底壁、該等隔壁與該頂壁相配合界定出該等熱傳導室。The temperature equalizing plate device of claim 2, wherein the body portion further has a bottom wall, a plurality of partition walls extending upward from the bottom wall by the bottom wall, and a body connecting the partition walls away from the bottom a top wall on one side of the wall, the bottom wall, the partition walls cooperating with the top wall to define the heat transfer chambers. 如請求項3所述的均溫板裝置,其中,該等熱循環片中的其中數個由該頂壁向下突伸入該等熱傳導室內,該等熱循環片中的另外數個由該底壁向上突伸入該熱傳導室內。The temperature equalizing plate device of claim 3, wherein a plurality of the heat cycle sheets project downwardly from the top wall into the heat transfer chambers, and the other ones of the heat cycle sheets are The bottom wall projects upwardly into the heat transfer chamber. 如請求項4所述的均溫板裝置,其中,該等密封部是用熱壓封合的方式形成。The temperature equalizing plate device according to claim 4, wherein the sealing portions are formed by heat sealing. 如請求項5所述的均溫板裝置,還包含一個連接該導熱基板的散熱鰭片組,該散熱鰭片組包括一個連接該導熱基板的該散熱面的底散熱片,及數個相間隔地由該底散熱片向上延伸的側散熱片。The temperature equalizing plate device of claim 5, further comprising a heat dissipating fin set connected to the heat conducting substrate, the heat dissipating fin set comprising a bottom heat sink connecting the heat dissipating surface of the heat conducting substrate, and a plurality of spaced intervals A side fin extending upward from the bottom fin. 如請求項1至6中任一項所述的均溫板裝置,其中,每一個該熱傳導室垂直於該第二方向的剖切面呈一個橢圓形。The temperature equalizing plate device according to any one of claims 1 to 6, wherein each of the heat conducting chambers has an elliptical shape perpendicular to a cutting plane of the second direction. 如請求項1至6中任一項所述的均溫板裝置,其中,每一個該熱傳導室垂直於該第二方向的剖切面呈一個矩形。The temperature equalizing plate device according to any one of claims 1 to 6, wherein each of the heat conducting chambers has a rectangular shape perpendicular to a cutting plane of the second direction.
TW105219808U 2016-12-28 2016-12-28 Heat spreader device TWM544035U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI817052B (en) * 2020-11-09 2023-10-01 欣興電子股份有限公司 Vapor chamber device and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI817052B (en) * 2020-11-09 2023-10-01 欣興電子股份有限公司 Vapor chamber device and manufacturing method thereof

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