TWM529921U - Anti-sulfurization memory storage device - Google Patents

Anti-sulfurization memory storage device Download PDF

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Publication number
TWM529921U
TWM529921U TW105207600U TW105207600U TWM529921U TW M529921 U TWM529921 U TW M529921U TW 105207600 U TW105207600 U TW 105207600U TW 105207600 U TW105207600 U TW 105207600U TW M529921 U TWM529921 U TW M529921U
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Taiwan
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vulcanization
storage device
memory storage
resistance
ohms
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TW105207600U
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Chinese (zh)
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Chih-Liang Chang
Min-Huang Chou
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Apacer Technology Inc
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Description

抗硫化之記憶體儲存裝置Anti-vulcanization memory storage device

本發明是有關於一種記憶體儲存裝置,特別是有關於一種可抗硫化之記憶體儲存裝置。The present invention relates to a memory storage device, and more particularly to a memory storage device resistant to vulcanization.

記憶體裝置為電子裝置上之一主要元件,其可以儲存或是暫存電子裝置上之數位資料,一般的記憶體裝置可以區分為Unbuffered Dual Inlined Memory Module (UDIMM)、Registered Dual Inlined Memory Module (RDIMM)以及Small Outline Dual Inlined Memory Module (SODIMM)。而無論是何種記憶體裝置,其中都包含著一PCB、至少一揮發性記憶體單元以及複數個被動元件,其中揮發性記憶體單元及被動元件係置於PCB上,而被動元件則是用來控制由主機傳輸而來的電流大小。而在正常使用的情況之下,記憶體模組的壽命可維持五至十年,更甚者,十年以上亦所在多有。The memory device is one of the main components of the electronic device, and can store or temporarily store digital data on the electronic device. The general memory device can be divided into Unbuffered Dual Inlined Memory Module (UDIMM) and Registered Dual Inlined Memory Module (RDIMM). ) and the Small Outline Dual Inlined Memory Module (SODIMM). Regardless of the memory device, it includes a PCB, at least one volatile memory unit, and a plurality of passive components, wherein the volatile memory unit and the passive component are placed on the PCB, and the passive component is used. To control the amount of current transmitted by the host. Under normal use, the life of a memory module can last for five to ten years, and even more than ten years.

由於目前電子裝置的普及化,其設置之地點極有可能是位於戶外之場所,使得空氣中之化合物或是水分子接觸到記憶體裝置之機率大增,而造成記憶體裝置的壽命減短。舉例來說,目前記憶體裝置上的電阻均含有銀之成份,當其與空氣中的硫分子接觸到時,則原有含銀之傳導層將會起化學作用而產生硫化銀,使得此傳導層漸漸成為一絕緣體,而最後將導致電流無法通過此電阻並使此記憶體裝置無法再被使用,此硫化銀之示意圖可參考第1圖。又或者,當空氣中的水汽過多時,也可能造成記憶體裝置上的被動元件受潮而無法使用。Due to the popularization of electronic devices, the location of the electronic devices is likely to be located outdoors, so that the probability of the compounds or water molecules in the air contacting the memory device is greatly increased, resulting in a shortened life of the memory device. For example, the resistance of current memory devices contains silver. When it comes into contact with sulfur molecules in the air, the original silver-containing conductive layer will chemically produce silver sulfide, making this conduction. The layer gradually becomes an insulator, and finally the current will not pass through the resistor and the memory device can no longer be used. The schematic diagram of the silver sulfide can be referred to FIG. Or, when there is too much water vapor in the air, the passive components on the memory device may be wet and unusable.

綜觀前述,本創作之創作人經多年苦心潛心研究、思索並設計一種抗硫化之記憶體儲存裝置,以針對現有技術之缺失加以改善,進而增進產業上之實施利用。Looking at the above, the creators of this creation have been painstakingly researching, thinking and designing a memory storage device resistant to vulcanization for many years to improve the lack of existing technology and to enhance the implementation and utilization of the industry.

有鑑於上述習知技藝之問題,本發明之目的就是在提供一種抗硫化之記憶體儲存裝置,以解決以上的問題。In view of the above-mentioned problems of the prior art, it is an object of the present invention to provide a memory storage device resistant to vulcanization to solve the above problems.

基於上述目的,本發明係提供一種抗硫化之記憶體儲存裝置,其包含一連接介面單元、複數個揮發性記憶體單元以及一印刷電路板。連接介面單元可用以耦接至一主機系統。印刷電路板可包含複數個抗硫化被動元件以及一保護膜,複數個抗硫化被動元件可用以控制並傳導一電流至複數個揮發性記憶體單元,保護膜可用以覆蓋印刷電路板,其中複數個抗硫化被動元件可包含一抗硫化電阻及一抗硫化排阻。Based on the above objects, the present invention provides a vulcanization resistant memory storage device comprising a connection interface unit, a plurality of volatile memory units, and a printed circuit board. The connection interface unit can be coupled to a host system. The printed circuit board may comprise a plurality of anti-vulcanization passive components and a protective film, and the plurality of anti-vulcanization passive components may be used to control and conduct a current to the plurality of volatile memory cells, and the protective film may be used to cover the printed circuit board, wherein the plurality of The anti-vulcanization passive component may comprise a resistance to vulcanization resistance and a resistance to vulcanization and exclusion.

較佳地,抗硫化電阻之一最佳電阻值為240歐姆。Preferably, one of the anti-vulcanization resistors has an optimum resistance value of 240 ohms.

較佳地,抗硫化電阻之電阻值之誤差值係介於240歐姆之上下5%區間內。Preferably, the error value of the resistance value of the anti-vulcanization resistor is within a range of 5% above 240 ohms.

較佳地,抗硫化電阻之電阻值之誤差值係介於240歐姆之上下3%區間內。Preferably, the error value of the resistance value of the anti-vulcanization resistor is within a range of 3% above 240 ohms.

較佳地,抗硫化電阻之電阻值之誤差值係介於240歐姆之上下1%區間內。Preferably, the error value of the resistance value of the anti-vulcanization resistor is in the range of 1% below 240 ohms.

較佳地,抗硫化排阻之一最低電阻值為15歐姆。Preferably, one of the resistance to vulcanization is a minimum resistance of 15 ohms.

較佳地,抗硫化排阻之一最高電阻值為39歐姆。Preferably, one of the highest resistance to vulcanization is 39 ohms.

較佳地,連接介面單元可為金手指,且金手指之厚度介於20至30微米。Preferably, the connection interface unit can be a gold finger, and the thickness of the gold finger is between 20 and 30 microns.

較佳地,連接介面單元可為金手指,且金手指之厚度介於35至45微米。Preferably, the connection interface unit can be a gold finger, and the thickness of the gold finger is between 35 and 45 microns.

承上所述,依本發明之抗硫化之記憶體儲存裝置,其可具有一或多個下述優點:In view of the above, the vulcanization resistant memory storage device of the present invention may have one or more of the following advantages:

(1) 本發明之抗硫化之記憶體儲存裝置可防止被動元件與空氣中之化合物產生化學反應,而使得此記憶體儲存裝置的壽命得以延長(1) The anti-vulcanization memory storage device of the present invention prevents the passive component from chemically reacting with a compound in the air, thereby prolonging the life of the memory storage device

(2) 本發明之抗硫化之記憶體儲存裝置之保護膜具有防潮、防塵、防污之功能。(2) The protective film of the anti-vulcanization memory storage device of the present invention has the functions of moisture proof, dustproof, and antifouling.

(3) 本發明之抗硫化之記憶體儲存裝置之連接介面單元係具有耐磨及耐插拔之特性,並可使訊號傳輸更為穩定。(3) The connection interface unit of the anti-vulcanization memory storage device of the present invention has the characteristics of wear resistance and plugging resistance, and can make the signal transmission more stable.

(4) 本發明之抗硫化之記憶體儲存裝置之電阻之誤差值係縮小至1%上下,可使流經過此電阻之電流之一大小更為精準。(4) The error value of the resistance of the anti-vulcanization memory storage device of the present invention is reduced to about 1%, so that one of the currents flowing through the resistor can be made more precise.

為了讓上述目的、技術特徵以及實際實施後之增益性更為明顯易懂,於下文中將係以較佳之實施範例輔佐對應相關之圖式來進行更詳細之說明。In order to make the above-mentioned objects, technical features, and gains after actual implementation more obvious, a more detailed description will be given below with reference to the corresponding drawings in the preferred embodiments.

為利貴審查員瞭解本創作之創作特徵、內容與優點及其所能達成之功效,茲將本創作配合附圖,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本創作實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本創作於實際實施上的權利範圍。In order to understand the creative characteristics, content and advantages of this creation and the effects that can be achieved by the examiner, the author will use the drawings in detail and explain the following in the form of the examples, and the drawings used therein The subject matter is only for the purpose of illustration and supplementary instructions. It is not necessarily the true proportion and precise configuration after the implementation of the creation. Therefore, the proportions and configuration relationships of the attached drawings should not be interpreted or limited in the actual implementation scope.

本創作之優點、特徵以及達到之技術方法將參照例示性實施例及所附圖式進行更詳細地描述而更容易理解,且本創作可以不同形式來實現,故不應被理解僅限於此處所陳述的實施例,相反地,對所屬技術領域具有通常知識者而言,所提供的實施例將使本揭露更加透徹與全面且完整地傳達本創作的範疇,且本創作將僅為所附加的申請專利範圍所定義。The advantages, features, and technical methods of the present invention will be more readily understood by referring to the exemplary embodiments and the accompanying drawings, and the present invention can be implemented in various forms and should not be construed as being limited to The stated embodiments, to the contrary, the embodiments of the present invention will provide a more thorough and complete and complete disclosure of the scope of the present invention, and the present invention will only be attached. The scope of the patent application is defined.

請參閱第2圖及第3圖,其係為本發明之抗硫化之記憶體儲存裝置之前視圖及後視圖。在本實施例中,抗硫化之記憶體儲存裝置100係以一SODIMM來舉例實施,其可以包含一連接介面單元10、複數個揮發性記憶體單元20以及一印刷電路板30。其中此複數個揮發性記憶體單元20可以為多個記憶體顆粒,連接介面單元10可以為一金手指,其中此複數個揮發性記憶體單元20與連接介面單元10係位於印刷電路板30上。Please refer to FIG. 2 and FIG. 3, which are front and rear views of the anti-vulcanization memory storage device of the present invention. In the present embodiment, the vulcanization-resistant memory storage device 100 is exemplified by a SODIMM, which may include a connection interface unit 10, a plurality of volatile memory cells 20, and a printed circuit board 30. The plurality of volatile memory cells 20 may be a plurality of memory particles, and the connection interface unit 10 may be a gold finger, wherein the plurality of volatile memory cells 20 and the connection interface unit 10 are located on the printed circuit board 30. .

值得一提的是,上述之記憶體儲存裝置係以SODIMM來舉例實施,但不以此為限,亦可以以ECC Unbuffered Dual In-Line Memory Module(ECC UDIMM)、ECC Small Outline Dual In-Line Memory Module、Load Reduced DIMM (LRDIMM)、UDIMM、RDIMM來舉例實施。It is worth mentioning that the above-mentioned memory storage device is implemented by using SODIMM as an example, but not limited thereto, ECC Unbuffered Dual In-Line Memory Module (ECC UDIMM), ECC Small Outline Dual In-Line Memory can also be used. Modules, Load Reduced DIMMs (LRDIMMs), UDIMMs, and RDIMMs are used as examples.

如圖所示,連接介面單元10可用以耦接至一主機系統,其耦接之方式係將連接介面單元10插入至主機系統上主機板上之記憶體插槽,進而進行電力或是資料之傳送。其中,此連接介面單元10之厚度可介於20~30微米之間,而較佳的情況是,此連接介面單元10之厚度可介於35~45微米之間,以具備耐磨與耐插拔之功能。As shown in the figure, the connection interface unit 10 can be coupled to a host system, which is coupled to insert the connection interface unit 10 into a memory slot on the motherboard of the host system to perform power or data. Transfer. The thickness of the connection interface unit 10 may be between 20 and 30 micrometers, and preferably, the thickness of the connection interface unit 10 may be between 35 and 45 micrometers for wear resistance and insertion resistance. Pull out the function.

此外,此印刷電路板30包含複數個抗硫化被動元件31以及一保護膜32,其中複數個抗硫化被動元件31可包含一抗硫化電阻311及一抗硫化排阻312,其可用以控制並傳導一電流至揮發性記憶體單元20,其中此電流是由主機系統透過連接介面單元10所提供。In addition, the printed circuit board 30 includes a plurality of anti-vulcanization passive components 31 and a protective film 32. The plurality of anti-vulcanization passive components 31 may include a vulcanization resistance resistor 311 and a sulfur suppression resistance exclusion 312, which may be used to control and conduct A current is supplied to the volatile memory unit 20, wherein the current is provided by the host system through the connection interface unit 10.

保護膜32係用以覆蓋印刷電路板30。更進一步地說明,此保護膜32可以利用一塗層防護(conformal coating)技術來覆蓋在印刷電路板30之上,以提供防潮、防塵、防污以及增加印刷電路板30上元件耐磨之能力。The protective film 32 is used to cover the printed circuit board 30. It is further illustrated that the protective film 32 can be overlaid on the printed circuit board 30 by a conformal coating technique to provide moisture, dust, stain and adhesion resistance to components on the printed circuit board 30. .

在一實施例中,當抗硫化被動元件31為一抗硫化電阻311時,在溫度25度C下,則抗硫化電阻311之一最佳電阻值為240歐姆,且抗硫化電阻311之電阻值之誤差值係介於240歐姆之上下5%區間內。In one embodiment, when the anti-vulcanization passive component 31 is a vulcanization resistant resistor 311, at a temperature of 25 degrees C, the optimum resistance value of one of the anti-vulcanization resistors 311 is 240 ohms, and the resistance value of the anti-vulcanization resistor 311 is obtained. The error value is within 5% of the range above 240 ohms.

在一較佳的實施例中,當抗硫化被動元件31為一抗硫化電阻311時,在溫度25度C下,則抗硫化電阻311之一最佳電阻值為240歐姆,且抗硫化電阻311之電阻值之誤差值係介於240歐姆之上下3%區間內。In a preferred embodiment, when the anti-vulcanization passive component 31 is a vulcanization resistant resistor 311, at a temperature of 25 degrees C, one of the anti-vulcanization resistors 311 has an optimum resistance value of 240 ohms and is resistant to vulcanization resistance 311. The error value of the resistance value is within 3% of the range above 240 ohms.

在一較佳的實施例中,當抗硫化被動元件31為一抗硫化電阻311時,在溫度25度C下,則抗硫化電阻311之一最佳電阻值為240歐姆,抗硫化電阻311之電阻值之誤差值係介於240歐姆之上下1%區間內。In a preferred embodiment, when the anti-vulcanization passive component 31 is a vulcanization resistant resistor 311, at a temperature of 25 degrees C, one of the anti-vulcanization resistors 311 has an optimum resistance value of 240 ohms and is resistant to the vulcanization resistance 311. The error value of the resistance value is within 1% of the range above 240 ohms.

在一較佳的實施例中,當抗硫化被動元件31為一抗硫化排阻312時,在溫度25度C下,則抗硫化排阻312之一最低電阻值為15歐姆且其最高電阻值為39歐姆,其中此抗硫化排阻312係包含四個相同之電阻。更進一步的說明,此抗硫化排阻312之規格可以為8P4R或是4P2R。在本實施例中,抗硫化排阻312內之四個電阻個數僅為舉例實例,並不以此為限,在實際應用上可視使用者之需求來設計包含多個電阻之一抗硫化排阻。In a preferred embodiment, when the anti-vulcanization passive component 31 is an anti-vulcanization exclusion 312, at a temperature of 25 degrees C, the lowest resistance value of one of the anti-vulcanization exclusion 312 is 15 ohms and its highest resistance value. It is 39 ohms, and this anti-vulcanization exclusion 312 system contains four identical resistors. Further, the size of the anti-vulcanization exclusion 312 may be 8P4R or 4P2R. In the present embodiment, the number of four resistors in the anti-vulcanization exclusion 312 is only an example, and is not limited thereto. In practical applications, one of the plurality of resistors is designed to be resistant to the sulfurization row. Resistance.

值得一提的是,本發明之抗硫化之記憶體儲存裝置係採用了誤差值極低的抗硫化電阻或是抗硫化排阻,其可以有效地避免較大的電流流通經過記憶體儲存裝置,進而造成記憶體儲存裝置之損壞。It is worth mentioning that the anti-vulcanization memory storage device of the present invention adopts a sulfur resistance resistance or a sulfurization resistance exclusion with extremely low error value, which can effectively prevent a large current from flowing through the memory storage device. This in turn causes damage to the memory storage device.

由上述可以得知,本發明之抗硫化之記憶體儲存裝置使用抗硫化被動元件以取代傳統的被動元件,並利用保護膜來加強防塵及防水之功效,進而有效地維持記憶體儲存裝置上的導電性,故可有效地延長使用壽命。It can be known from the above that the anti-vulcanization memory storage device of the present invention uses the anti-vulcanization passive component to replace the traditional passive component, and uses the protective film to enhance the dustproof and waterproof effect, thereby effectively maintaining the memory storage device. Conductivity, so it can effectively extend the service life.

以上所述之實施例僅係為說明本創作之技術思想及特點,其目的在使熟習此項技藝之人士能夠瞭解本創作之內容並據以實施,當不能以之限定本創作之專利範圍,即大凡依本創作所揭示之精神所作之均等變化或修飾,仍應涵蓋在本創作之專利範圍內。The embodiments described above are only for explaining the technical idea and characteristics of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and implement them according to the scope of the patent. That is, the equivalent changes or modifications made by the people in accordance with the spirit revealed by this creation should still be covered by the scope of the patent of this creation.

100‧‧‧記憶體儲存裝置
10‧‧‧連接介面單元
20‧‧‧揮發性記憶體單元
30‧‧‧印刷電路板
31‧‧‧抗硫化被動元件
311‧‧‧抗硫化電阻
312‧‧‧抗硫化排阻
32‧‧‧保護膜
100‧‧‧ memory storage device
10‧‧‧Connecting interface unit
20‧‧‧ volatile memory unit
30‧‧‧Printed circuit board
31‧‧‧Anti-vulcanization passive components
311‧‧‧Resistance resistance
312‧‧‧Anti-sulfurization
32‧‧‧Protective film

第1圖係為被動元件產生硫化銀之示意圖。Figure 1 is a schematic diagram of the production of silver sulfide by passive components.

第2圖係為本發明之抗硫化之記憶體儲存裝置之前視圖。Figure 2 is a front elevational view of the vulcanization resistant memory storage device of the present invention.

第3圖係為本發明之抗硫化之記憶體儲存裝置之後視圖。Figure 3 is a rear elevational view of the vulcanization resistant memory storage device of the present invention.

100‧‧‧記憶體儲存裝置 100‧‧‧ memory storage device

10‧‧‧連接介面單元 10‧‧‧Connecting interface unit

20‧‧‧揮發性記憶體單元 20‧‧‧ volatile memory unit

30‧‧‧印刷電路板 30‧‧‧Printed circuit board

31‧‧‧抗硫化被動元件 31‧‧‧Anti-vulcanization passive components

311‧‧‧抗硫化電阻 311‧‧‧Resistance resistance

312‧‧‧抗硫化排阻 312‧‧‧Anti-sulfurization

32‧‧‧保護膜 32‧‧‧Protective film

Claims (9)

一種抗硫化之記憶體儲存裝置,包含: 一連接介面單元,用以耦接至一主機系統; 複數個揮發性記憶體單元;以及 一印刷電路板,包含複數個抗硫化被動元件以及一保護膜,該複數個抗硫化被動元件係用以控制並傳導一電流至該複數個揮發性記憶體單元,該保護膜係用以覆蓋該印刷電路板; 其中該複數個抗硫化被動元件係包含一抗硫化電阻及一抗硫化排阻。A vulcanization-resistant memory storage device comprising: a connection interface unit for coupling to a host system; a plurality of volatile memory units; and a printed circuit board comprising a plurality of anti-vulcanization passive components and a protective film The plurality of anti-vulcanization passive components are used to control and conduct a current to the plurality of volatile memory cells, the protective film is used to cover the printed circuit board; wherein the plurality of anti-vulcanization passive components comprise a primary antibody Vulcanization resistance and primary resistance vulcanization and exclusion. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化電阻之一最佳電阻值為240歐姆。The memory storage device of claim 1, wherein the one of the anti-vulcanization resistors has an optimum resistance value of 240 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化電阻之電阻值之誤差值係介於240歐姆之上下5%區間內。The memory storage device of claim 1, wherein the resistance value of the anti-vulcanization resistor is within a range of 5% above 240 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化電阻之電阻值之誤差值係介於240歐姆之上下3%區間內。The memory storage device of claim 1, wherein the resistance value of the anti-vulcanization resistor is within a range of 3% above 240 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化電阻之電阻值之誤差值係介於240歐姆之上下1%區間內。The memory storage device of claim 1, wherein the resistance value of the anti-vulcanization resistance is within a range of 1% below 240 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化排阻之一最低電阻值為15歐姆。The memory storage device of claim 1, wherein the one of the resistance to vulcanization is a minimum resistance value of 15 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該抗硫化排阻之一最高電阻值為39歐姆。The memory storage device of claim 1, wherein the highest resistance value of the anti-vulcanization exclusion is 39 ohms. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該連接介面單元係為一金手指,且該金手指之厚度介於20至30微米。The memory storage device of claim 1, wherein the connection interface unit is a gold finger, and the gold finger has a thickness of 20 to 30 micrometers. 如申請專利範圍第1項所述之記憶體儲存裝置,其中該連接介面單元係為一金手指,且該金手指之厚度介於35至45微米。The memory storage device of claim 1, wherein the connection interface unit is a gold finger, and the gold finger has a thickness of 35 to 45 micrometers.
TW105207600U 2016-05-24 2016-05-24 Anti-sulfurization memory storage device TWM529921U (en)

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