TWM519551U - Circulating vortex water device for preventing dust - Google Patents

Circulating vortex water device for preventing dust Download PDF

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Publication number
TWM519551U
TWM519551U TW104219964U TW104219964U TWM519551U TW M519551 U TWM519551 U TW M519551U TW 104219964 U TW104219964 U TW 104219964U TW 104219964 U TW104219964 U TW 104219964U TW M519551 U TWM519551 U TW M519551U
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Taiwan
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dust
vortex
heating
water
exhaust gas
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TW104219964U
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Chinese (zh)
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Wei-Ming Xie
zhi-ping An
Won-Do Yoon
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Chiyo Entpr Ltd
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Priority to TW104219964U priority Critical patent/TWM519551U/en
Publication of TWM519551U publication Critical patent/TWM519551U/en

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Description

防粉塵循環渦流水設備 Dust-proof circulating vortex water equipment

本新型為提供一種防粉塵循環渦流水設備,尤指一種利用環狀渦流直接防止粉塵附著於管壁的防粉塵循環渦流水設備。 The utility model provides an anti-dust circulation vortex water device, in particular to a dust-proof circulating vortex water device which directly prevents dust from adhering to a pipe wall by using an annular vortex.

按,在半導體晶圓廠、光電廠等產品製作過程中,通常會生成有害的廢氣。以半導體晶圓廠為例,其中的擴散和沉積製程需要應用大量的反應氣體,但這些氣體僅一部分與晶圓反應,其餘大部分則形成廢氣,這些廢氣其主要成份為單矽烷(SiH4)、二氯矽烷(SiH2Cl2)、三氟化氮(NF3)、氯氣(Cl2)或全氟化合物(perfluoro-compounds,PFC)等氣體,由於該些氣體係為劇毒氣體無法直接排放,必須將該廢氣輸送到廢氣處理裝置去除其毒性,使其符合工業廢氣排放標準以避免對環境造成污染。 According to the production process of semiconductor fabs, photovoltaic power plants and other products, harmful exhaust gases are usually generated. In the case of a semiconductor fab, the diffusion and deposition processes require the application of a large amount of reactive gas, but only a part of these gases react with the wafer, and most of the other gas is formed. The main component of these exhaust gases is monodecane (SiH 4 ). , such as dichlorosilane (SiH 2 Cl 2 ), nitrogen trifluoride (NF 3 ), chlorine (Cl 2 ) or perfluoro-compounds (PFC), which cannot be directly discharged due to the highly toxic gases The exhaust gas must be sent to an exhaust gas treatment device to remove its toxicity to meet industrial exhaust emission standards to avoid environmental pollution.

然而,廢氣處理過程中,利用熱輻射方式分解有害物質或利用火焰燃燒淨化廢氣的手段,雖然很常見,但也很容易在主管路中殘留或附著粉塵微粒,故常見有在主管路上設置刮刀組,以將附著粉塵微粒刮除然後排出者。需要這麼做的原因的廢氣處理裝置的加熱源都在管體外,使管壁溫度高於管道而容易在管壁上附著,僅依賴刮刀及刮除後的水流來解決此問題,只是治標不治本、緩不濟急的方式。 However, in the process of exhaust gas treatment, the means of decomposing harmful substances by means of heat radiation or purifying exhaust gas by flame combustion is very common, but it is also easy to leave or attach dust particles in the main road, so it is common to set a scraper group on the main road. To scrape the attached dust particles and then discharge them. The heating source of the exhaust gas treatment device that needs to do this is outside the tube, so that the tube wall temperature is higher than the pipe and easy to adhere to the pipe wall, and only rely on the scraper and the scraped water flow to solve the problem, but the palliative is not a cure. A slow and unhelpful way.

是以,要如何解決廢氣處理設備之問題與缺失,甚至直接預防粉塵微粒的殘留與附著,即為本新型之申請人與從事此行業之相關廠商所亟欲研究改善之方向所在者。 Therefore, how to solve the problem and lack of exhaust gas treatment equipment, and even directly prevent the residual and adhesion of dust particles, is the direction of the applicants and related manufacturers engaged in this industry.

故,本新型之申請人有鑑於上述缺失,乃蒐集相關資料,經由多方評估及考量,並以從事於此行業累積之多年經驗,經由不斷試作及修改,始設計出此種利用環狀渦流直接防止粉塵附著於管壁的防粉塵循環渦流水設備之新型專利者。 Therefore, in view of the above-mentioned shortcomings, the applicants of this new type have collected relevant information, and through multi-party evaluation and consideration, and through years of experience in the industry, through continuous trial and modification, they have designed this kind of use of circular eddy current directly. A new patent holder for dust-proof circulating vortex water equipment that prevents dust from adhering to the pipe wall.

本新型之主要目的在於:在粉塵產生的第一時間,即利用管壁上的環狀渦流循環沖刷,直接避免粉塵附著,而改善廢氣處理效果、增加設備壽命、並延長設備清潔之時間間隔。 The main purpose of the novel is to avoid dust adhesion directly at the first time of dust generation by using annular vortex circulation on the pipe wall, thereby improving exhaust gas treatment effect, increasing equipment life, and prolonging equipment cleaning time interval.

本新型之另一主要目的在於:讓環狀渦流形成於加熱傳導區的壁面,使水火共存且互不干擾。 Another main purpose of the present invention is to form an annular vortex on the wall surface of the heating conduction zone so that the water and fire coexist and do not interfere with each other.

為達上述目的,本新型之結構包括:至少一供導入廢氣之進氣口,且該進氣口係連通一加熱傳導區,使廢氣於加熱傳導區中離析出粉塵,並於該加熱傳導區內設置一渦流壁,且於該渦流壁上設置至少一位於該進氣口側處之注水口,係於該渦流壁上產生環狀渦流,以避免粉塵附著於該渦流壁上,最後將該加熱傳導區連通一輸出口,以供夾帶粉塵之水流流出;俾當使用者將廢氣由進氣口導入加熱傳導區時,因廢氣處於高溫之環境而產生化學反應,又離析出之粉塵微粒,在接觸到渦流壁之前,就會先接觸到由注水口射出之高速水流,且該水流係循環環繞於渦流壁上,可完全阻絕粉塵微粒附著於壁面的機會,而將粉塵微粒直接帶出輸出口,且因環狀渦流係緊貼於渦流壁,不會與加熱傳導區之熱源相互干擾,藉此提高廢氣處理效果。 In order to achieve the above object, the structure of the present invention comprises: at least one air inlet for introducing the exhaust gas, and the air inlet is connected to a heating conduction region to cause the exhaust gas to separate the dust in the heating conduction region, and in the heating conduction region a vortex wall is disposed therein, and at least one water injection port located at the side of the air inlet is disposed on the vortex wall, and an annular vortex is generated on the vortex wall to prevent dust from adhering to the vortex wall, and finally The heating conduction zone is connected to an output port for the flow of the dust-laden water; when the user introduces the exhaust gas from the air inlet into the heating conduction zone, the chemical reaction occurs due to the high temperature environment of the exhaust gas, and the dust particles are separated. Before contacting the vortex wall, it will first contact the high-speed water stream emitted from the water injection port, and the water flow system circulates around the vortex wall to completely block the chance of dust particles adhering to the wall surface, and directly take the dust particles out of the output. The mouth is closed to the vortex wall by the annular eddy current system, and does not interfere with the heat source of the heating conduction zone, thereby improving the exhaust gas treatment effect.

藉由上述技術,可針對習用廢氣處理設備所存在之管壁容易附著粉塵微粒、必須透過刮除動作排除粉塵、及廢氣處理效果不佳等問題點加以突破,達到上述優點之實用進步性。 According to the above technique, it is possible to achieve breakthroughs in the problem that the wall of the conventional exhaust gas treatment device is likely to adhere to dust particles, the dust must be removed by the scraping action, and the exhaust gas treatment effect is poor, thereby achieving the practical progress of the above advantages.

1‧‧‧進氣口 1‧‧‧air inlet

2、2a‧‧‧加熱傳導區 2, 2a‧‧‧heating conduction zone

21、21a‧‧‧加熱裝置 21, 21a‧‧‧ heating device

3‧‧‧渦流壁 3‧‧‧ vortex wall

4、4b‧‧‧注水口 4, 4b‧‧‧ water inlet

42b‧‧‧氮氣口 42b‧‧‧Nitrogen port

5、5a‧‧‧輸出口 5, 5a‧‧‧ output

第一圖 係為本新型較佳實施例之結構示意圖。 The first figure is a schematic view of the structure of the preferred embodiment of the present invention.

第二圖 係為本新型較佳實施例之動作示意圖(一)。 The second diagram is a schematic diagram of the action of the preferred embodiment of the present invention (1).

第三圖 係為本新型較佳實施例之動作示意圖(二)。 The third figure is a schematic diagram of the action of the preferred embodiment of the present invention (2).

第四圖 係為本新型較佳實施例之使用狀態圖。 The fourth diagram is a diagram showing the state of use of the preferred embodiment of the present invention.

第五圖 係為本新型再一實施例之實施示意圖。 The fifth figure is a schematic diagram of the implementation of still another embodiment of the present invention.

第六圖 係為本新型又一實施例之實施示意圖。 Figure 6 is a schematic view showing the implementation of still another embodiment of the present invention.

為達成上述目的及功效,本新型所採用之技術手段及構造,茲繪圖就本新型較佳實施例詳加說明其特徵與功能如下,俾利完全了解。 In order to achieve the above objects and effects, the technical means and structure adopted by the present invention are described in detail in the preferred embodiment of the present invention, and the features and functions thereof are as follows.

請參閱第一圖所示,係為本新型較佳實施例之結構示意圖,由圖中可清楚看出本新型係包括:至少一進氣口1,係供導入廢氣;一連通該進氣口1之加熱傳導區2,係使該廢氣離析出粉塵,該加熱傳導區2係包含一對下述渦流壁3中央加熱之加熱裝置21,係供離析該廢氣中之粉塵,且該加熱裝置21係以火焰燃燒、電加熱或電漿加熱其中之一者方式加熱;一設於該加熱傳導區2內之渦流壁3;至少一設於該渦流壁3上且位於該進氣口1側處之注水口4,且該注水口4係斜向設置於該渦流壁3上,以於該渦流壁3上產生環狀渦流,避免粉塵附著於該渦流壁3上,又該注水口4一側具有一加壓裝置(未標示),係供加強注入水壓;及一連通該加熱傳導區2之輸出口5,係供夾帶粉塵之水流流出。 Please refer to the first figure, which is a schematic structural view of a preferred embodiment of the present invention. It can be clearly seen from the figure that the novel system includes at least one air inlet 1 for introducing exhaust gas and one communicating with the air inlet. The heating conduction zone 2 of the first embodiment causes the exhaust gas to be separated from the dust. The heating conduction zone 2 includes a pair of heating devices 21 heated centrally by the vortex wall 3 for isolating the dust in the exhaust gas, and the heating device 21 Heating by one of flame combustion, electric heating or plasma heating; a vortex wall 3 disposed in the heating conduction zone 2; at least one disposed on the vortex wall 3 and located at the side of the inlet 1 a water injection port 4, and the water injection port 4 is obliquely disposed on the vortex wall 3 to generate an annular vortex on the vortex wall 3 to prevent dust from adhering to the vortex wall 3, and the water injection port 4 side A pressurizing device (not shown) is provided for enhancing the injection water pressure; and an output port 5 communicating with the heating conducting zone 2 is provided for the flow of water entrained with dust.

藉由上述之說明,已可了解本技術之結構,而依據這個結構之對應配合,更可達到利用環狀渦流直接防止粉塵附著於管壁等優勢,而詳細之解說將於下述說明。 According to the above description, the structure of the present technology can be understood, and according to the corresponding cooperation of the structure, the advantage of directly preventing the dust from adhering to the pipe wall by the annular vortex can be achieved, and the detailed explanation will be described below.

請同時配合參閱第一圖至第四圖所示,係為本新型較佳實施例之結構示意圖、動作示意圖(一)、動作示意圖(二)及使用狀態圖,藉由上述構件組構時,可由圖中清楚看出,本新型係為廢氣處理裝置中之主管路上的局部設備,主要係於加熱廢氣的同時,利用環狀渦流讓廢氣中離析出來的粉塵微粒不會附著在管壁上,避免降低廢氣處理效果或廢氣處理裝置之壽命。 Please refer to the first to fourth figures at the same time, which is a schematic structural diagram, an operation schematic diagram (1), an operation schematic diagram (2) and a usage state diagram of the preferred embodiment of the present invention. It can be clearly seen from the figure that the present invention is a partial device on the main road in the exhaust gas treatment device, mainly for heating the exhaust gas, and using the annular vortex to prevent the dust particles isolated from the exhaust gas from adhering to the pipe wall. Avoid reducing the exhaust gas treatment effect or the life of the exhaust gas treatment device.

實際操作時,係將廢氣由進氣口1處導引進入加熱傳導區2,在加熱傳導區2中具有一設於進氣口1一側的加熱裝置21(本實施例係以火焰燃燒之方式加熱,但不因以此為侷限),該加熱裝置21係對渦流壁3中央加熱,以離析出該廢氣中的粉塵微粒,因廢氣中的有毒物質無法完全靠過濾方式處理殆盡,而 必須靠熱分解或水溶性才能處理。舉例而言,廢氣中夾帶的四氟化碳(CF4,又稱為四氟甲烷)裡,包含有具毒性的F2,因為C-F鍵能高達515kJ.mol-1,像其他氟代烴一樣十分穩定的,因此不與酸及氫氧化物反應,透過熱分解則會產生劇毒的氣體碳醯氟(COF)、一氧化碳(CO),如果有水存在,則可溶於水而產生氟化氫(HF)。 In actual operation, the exhaust gas is guided from the air inlet 1 into the heating conduction zone 2, and the heating conduction zone 2 has a heating device 21 disposed on the side of the air inlet 1 (this embodiment is a flame burning) By heating in a manner, but not limited thereto, the heating device 21 heats the center of the vortex wall 3 to isolate dust particles in the exhaust gas, and the toxic substances in the exhaust gas cannot be completely processed by filtration. It must be treated by thermal decomposition or water solubility. For example, carbon tetrafluoride (CF 4 , also known as tetrafluoromethane) entrained in exhaust gas contains toxic F 2 because CF bonds can be as high as 515 kJ.mol-1, like other fluorohydrocarbons. Very stable, so it does not react with acids and hydroxides. By thermal decomposition, it produces highly toxic gases such as carbon fluorinated carbon (COF) and carbon monoxide (CO). If water is present, it is soluble in water to produce hydrogen fluoride (HF). ).

故當加熱裝置21離析出廢氣中的粉塵微粒時,或廢氣本身即夾帶粉塵微粒時,一般會附著於主管路的內壁上,但本新型利用加壓裝置將水流由注水口4處射出,使水流在渦流壁3上形成環狀渦流,且因該水流乃高速循環繞著渦流壁3,使粉塵微粒無法直接接觸壁面,並且會讓部分粉塵微粒溶解在水中,或讓其他粉塵微粒被水流帶出輸出口5。再者因加熱裝置21係對渦流壁3中央加熱,而水流則在渦流壁3上流竄,水不會因為高溫而蒸發、火不會因為水流而熄滅,故此設計形成水火互不干涉之效果,而讓廢氣處理效果更佳,配合環狀渦流水的防粉塵功效,延長廢氣處理設備之清理時間間隔,降低主機台因廢氣處理設備清理而造成的停機機率,並縮短主機台停機時間。更能讓本新型之壽命、甚至整個廢氣處理設備的壽命更為延長。 Therefore, when the heating device 21 separates the dust particles in the exhaust gas, or the exhaust gas itself is entrained with dust particles, it generally adheres to the inner wall of the main pipe, but the present invention uses a pressurizing device to spray the water from the water injection port 4, The water flows on the vortex wall 3 to form an annular vortex, and because the water flow is circulated around the vortex wall 3 at a high speed, the dust particles cannot directly contact the wall surface, and some dust particles are dissolved in the water, or other dust particles are allowed to flow. Take out the output port 5. Furthermore, the heating device 21 heats the center of the vortex wall 3, and the water flow flows on the vortex wall 3. The water does not evaporate due to the high temperature, and the fire does not extinguish due to the water flow. Therefore, the design does not interfere with each other. The exhaust gas treatment effect is better, and the anti-dust effect of the annular vortex water is matched, the cleaning time interval of the exhaust gas treatment equipment is prolonged, the shutdown probability caused by the cleaning of the exhaust gas treatment equipment of the mainframe is reduced, and the downtime of the mainframe is shortened. It can further extend the life of the new model and even the life of the entire exhaust gas treatment equipment.

再請同時配合參閱第五圖所示,係為本新型再一實施例之實施示意圖,由圖中可清楚看出,本實施例與上述實施例為大同小異,僅將加熱裝置21a之設置位置改於輸出口5a一側,此時加熱傳導區2a亦可透過熱對流得到令廢氣離析之高溫,更可將未能在加熱傳導區2a處理完畢之廢氣,在此集中加熱,於此同時環狀渦流仍然環繞於加熱裝置21a外圍。據此,除可防止粉塵微粒附著外,更提升廢氣處理效果。 Please refer to the fifth embodiment at the same time, which is a schematic diagram of the implementation of the further embodiment of the present invention. It can be clearly seen from the figure that the embodiment is similar to the above embodiment, and only the setting position of the heating device 21a is changed. On the side of the output port 5a, at this time, the heating conduction zone 2a can also obtain the high temperature for separating the exhaust gas through the heat convection, and the exhaust gas which has not been processed in the heating conduction zone 2a can be concentrated and heated therein. The vortex still surrounds the periphery of the heating device 21a. Accordingly, in addition to preventing the adhesion of dust particles, the exhaust gas treatment effect is further enhanced.

又請同時配合參閱第六圖所示,係為本新型又一實施例之實施示意圖,由圖中可清楚看出,本實施例係於注水口4b一側具有一氮氣口42b,此乃避免粉塵微粒在接觸到環狀渦流之前就飄到注水口4b處,長時間下來便有注水口4b阻塞之虞,故利用氮氣口42b的氮氣輸出,避免注水口4b處附著粉塵微粒。 Please also refer to the sixth figure, which is a schematic diagram of another embodiment of the present invention. It can be clearly seen from the figure that the embodiment has a nitrogen port 42b on the side of the water injection port 4b, which avoids The dust particles float to the water injection port 4b before coming into contact with the annular vortex, and the water injection port 4b is blocked for a long time. Therefore, the nitrogen gas output from the nitrogen gas port 42b is used to prevent the dust particles from adhering to the water injection port 4b.

惟,以上所述僅為本新型之較佳實施例而已,非因此即侷限本新型之專利範圍,故舉凡運用本新型說明書及圖式內容所為之簡易修飾及等效結構變化,均應同理包含於本新型之專利範圍內,合予陳明。 However, the above description is only the preferred embodiment of the present invention, and thus does not limit the scope of the patent of the present invention. Therefore, all the simple modifications and equivalent structural changes that are made by using the present specification and the drawings are the same. It is included in the scope of this new patent and is given to Chen Ming.

故,請參閱全部附圖所示,本新型使用時,與習用技術相較,著實存在下 列優點: Therefore, please refer to all the drawings, when the new model is used, compared with the conventional technology, it is actually Column advantages:

一、在粉塵產生的第一時間,即利用管壁上的環狀渦流循環沖刷,直接避免粉塵附著,而改善廢氣處理效果、增加設備壽命、並延長設備清潔之時間間隔。 First, in the first time of dust generation, that is, using the annular vortex circulation on the pipe wall to flush, directly avoid dust adhesion, improve the exhaust gas treatment effect, increase the life of the equipment, and prolong the time interval of equipment cleaning.

二、讓環狀渦流形成於加熱傳導區2的壁面,使水火共存且互不干擾。 Second, the annular eddy current is formed on the wall surface of the heating conduction zone 2, so that the water and fire coexist and do not interfere with each other.

綜上所述,本新型之防粉塵循環渦流水設備於使用時,為確實能達到其功效及目的,故本新型誠為一實用性優異之新型,為符合新型專利之申請要件,爰依法提出申請,盼 審委早日賜准本新型,以保障申請人之辛苦發明,倘若鈞局審委有任何稽疑,請不吝來函指示,創作人定當竭力配合,實感德便。 In summary, the dust prevention circulating vortex water device of the present invention can achieve its efficacy and purpose when used, so the novel is a new type of application with excellent practicability, which is in accordance with the requirements of the new patent application. To apply, I hope that the trial committee will grant this new type as soon as possible to protect the applicant's hard work. If there is any doubt in the trial committee, please do not hesitate to give instructions, the creator will try his best to cooperate and feel good.

1‧‧‧進氣口 1‧‧‧air inlet

2‧‧‧加熱傳導區 2‧‧‧heating conduction zone

21‧‧‧加熱裝置 21‧‧‧ heating device

3‧‧‧渦流壁 3‧‧‧ vortex wall

4‧‧‧注水口 4‧‧‧Water inlet

5‧‧‧輸出口 5‧‧‧Outlet

Claims (9)

一種防粉塵循環渦流水設備,其包含:至少一進氣口,係供導入廢氣;一連通該進氣口之加熱傳導區,係使該廢氣離析出粉塵;一設於該加熱傳導區內之渦流壁;至少一設於該渦流壁上且位於該進氣口側處之注水口,係於該渦流壁上產生環狀渦流,以避免粉塵附著於該渦流壁上;及一連通該加熱傳導區之輸出口,係供夾帶粉塵之水流流出。 A dust-proof circulating vortex water device comprising: at least one air inlet for introducing an exhaust gas; a heating conduction region communicating with the air inlet for separating the dust from the exhaust gas; and being disposed in the heating conduction region a vortex wall; at least one water injection port disposed on the vortex wall and located at the side of the air inlet, generating an annular vortex on the vortex wall to prevent dust from adhering to the vortex wall; and communicating with the heating The outlet of the zone is for the flow of water with entrained dust. 如申請專利範圍第1項所述之防粉塵循環渦流水設備,其中該注水口一側具有一氮氣口,係供導入氮氣。 The dust-proof circulating vortex water device of claim 1, wherein the water injection port side has a nitrogen gas port for introducing nitrogen gas. 如申請專利範圍第1項所述之防粉塵循環渦流水設備,其中該注水口一側具有一加壓裝置,係供加強注入水壓。 The dust-proof circulating vortex water device according to claim 1, wherein the water injection port side has a pressing device for enhancing the injection water pressure. 如申請專利範圍第1項所述之防粉塵循環渦流水設備,其中該注水口係斜向設置於該渦流壁上。 The dust-proof circulating vortex water device of claim 1, wherein the water injection port is obliquely disposed on the vortex wall. 如申請專利範圍第1項所述之防粉塵循環渦流水設備,其中該加熱傳導區係包含一對該渦流壁中央加熱之加熱裝置,係供離析該廢氣中之粉塵。 The anti-dust cycle vortex water device of claim 1, wherein the heating conduction zone comprises a pair of heating devices centrally heated by the vortex wall for isolating dust in the exhaust gas. 如申請專利範圍第5項所述之防粉塵循環渦流水設備,其中該環狀渦流係環繞於該加熱裝置產生之火源外而不相接觸。 The dust-proof circulating vortex water device of claim 5, wherein the annular vortex is surrounded by a fire source generated by the heating device without contacting. 如申請專利範圍第5項所述之防粉塵循環渦流水設備,其中該加熱裝置係設於該進氣口一側。 The dust-proof circulating vortex water device of claim 5, wherein the heating device is disposed on a side of the air inlet. 如申請專利範圍第5項所述之防粉塵循環渦流水設備,其中該加熱裝置係設於該輸出口一側。 The dust-proof circulating vortex water device of claim 5, wherein the heating device is disposed on one side of the outlet. 如申請專利範圍第5項所述之防粉塵循環渦流水設備,其中該加熱裝置係以火焰燃燒、電加熱或電漿加熱其中之一者方式加熱。 The dust-proof circulating vortex water device of claim 5, wherein the heating device is heated by one of flame combustion, electric heating or plasma heating.
TW104219964U 2015-12-11 2015-12-11 Circulating vortex water device for preventing dust TWM519551U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110760926A (en) * 2019-11-22 2020-02-07 北京大学东莞光电研究院 Method for preparing high-quality GaN single crystal substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110760926A (en) * 2019-11-22 2020-02-07 北京大学东莞光电研究院 Method for preparing high-quality GaN single crystal substrate

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