TWM509808U - Angled-adjustable coating apparatus - Google Patents

Angled-adjustable coating apparatus Download PDF

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Publication number
TWM509808U
TWM509808U TW104205413U TW104205413U TWM509808U TW M509808 U TWM509808 U TW M509808U TW 104205413 U TW104205413 U TW 104205413U TW 104205413 U TW104205413 U TW 104205413U TW M509808 U TWM509808 U TW M509808U
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Taiwan
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substrate
carrier
coating device
lifting
plated
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TW104205413U
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Chinese (zh)
Inventor
Chin-Chao Lee
Yu-Chieh Liu
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Junsun Tech Co Ltd
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Priority to TW104205413U priority Critical patent/TWM509808U/en
Publication of TWM509808U publication Critical patent/TWM509808U/en

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Description

可調變角度之鍍膜裝置Adjustable angle coating device

本新型係一種鍍膜裝置,特別是關於一種可調變角度之鍍膜裝置。The invention relates to a coating device, in particular to a coating device with adjustable angle.

當前,許多工業產品表面都鍍有薄膜以改善產品表面之各種性能,例如:增加待鍍基材的耐熱、耐蝕、表面硬度或延長使用壽命。一般的鍍膜方法主要包括熱阻式蒸鍍法、射頻磁控濺鍍法、電子束熱蒸鍍法、化學氣相沈積法、分子束磊晶法以及離子鍍膜法,其中如何將鍍膜原料以連續性均勻的方式披覆在被鍍物之表面上,並大幅增加產量及降低成本,已成為從事此行業之相關人士所研究之重要課題。Currently, many industrial products are coated with a film to improve various properties of the surface of the product, for example, to increase the heat resistance, corrosion resistance, surface hardness or long service life of the substrate to be plated. The general coating methods mainly include thermal resistance vapor deposition, RF magnetron sputtering, electron beam thermal evaporation, chemical vapor deposition, molecular beam epitaxy, and ion plating, in which the coating materials are continuously The uniformity of the coating on the surface of the object to be plated, and significantly increase production and reduce costs, has become an important topic for researchers involved in this industry.

在傳統的真空鍍膜裝置中,一般待鍍基材大多採用二維式真空鍍膜法,亦即只在於表面沈積特定材質之薄膜,雖然可支援多片進樣與定角度製程作業,但無法在製程過程中即時調整待鍍基材與鍍膜源之間的角度關係。至於常見之斜角度鍍膜法(Oblique Angle Deposition,OAD),雖然可調整待鍍基材與鍍膜源之間的角度關係, 卻受制於待鍍基材之尺寸與系統幾何大小而無法大量生產。由此可知,目前市場上缺乏一種可即時調整傾斜角度、可公自轉鍍膜且能大幅增加量產之鍍膜裝置,故相關業者正在尋求其解決之道。In the conventional vacuum coating device, the two substrates to be plated are mostly vacuum-coated, that is, only a film of a specific material is deposited on the surface. Although it can support multiple injection and angle-angle processes, it cannot be processed. The angular relationship between the substrate to be plated and the source of the coating is adjusted in real time. As for the common Oblique Angle Deposition (OAD), although the angle relationship between the substrate to be plated and the source of the coating can be adjusted, However, it is subject to the size of the substrate to be coated and the geometry of the system and cannot be mass produced. It can be seen that there is currently no coating device on the market that can adjust the tilt angle, can be rotated and coated, and can greatly increase the mass production. Therefore, related companies are seeking solutions.

因此,本新型提供一種可調變角度之鍍膜裝置,其係利用特殊之昇降套座來連結傾角調變模組與自轉模組,不但可於鍍膜的過程中自由地調變基材載具的傾斜角度,同時還可讓基材載具自轉。藉由傾角調變模組、自轉模組以及公轉模組三者間的固定連接,可於此基材載具實現:一、於待鍍基材表面產生均勻鍍膜的效果;二、於待鍍基材表面成長三維立體結構薄膜的效果。再者,透過升降溫控制器與通偏壓控制器之設置,可使基材載具兼具升降溫與通偏壓之功能,進而讓待鍍基材符合各種鍍膜製程的需求。另外,基材載具可以置放多個試片,能大幅地提高產量。Therefore, the present invention provides a variable angle coating device which utilizes a special lifting sleeve to connect the tilt modulation module and the rotation module, and can freely adjust the substrate carrier during the coating process. The angle of inclination also allows the substrate carrier to rotate. The fixed connection between the dip modulation module, the rotation module and the revolving module can realize the substrate carrier: first, the effect of uniformly coating on the surface of the substrate to be plated; The effect of growing a three-dimensional structure film on the surface of the substrate. Moreover, through the setting of the temperature rise and fall controller and the through bias controller, the substrate carrier can have the functions of lifting temperature and through bias, and the substrate to be plated can meet the requirements of various coating processes. In addition, the substrate carrier can accommodate a plurality of test pieces, which can greatly increase the yield.

本新型之一實施方式為一種可調變角度之鍍膜裝置,用以置放至少一待鍍基材,此可調變角度之鍍膜裝置包含至少一基材載具、一自轉模組以及一傾角調變模組。其中基材載具包含一載面。自轉模組則包含一中軸與一轉動馬達。中軸連接基材載具,且中軸之延伸方向與載面之延伸方向相交一夾角。轉動馬達連動中軸而使基材載具自轉。再者,傾角調變模組包含具有一昇降套座的至少一昇 降件與一昇降馬達。其中昇降套座可位移地套接中軸,令昇降件受限平行於中軸之延伸方向位移,且昇降件連接基材載具。而昇降馬達則帶動昇降件位移而連動基材載具,致使夾角調變。One embodiment of the present invention is a variable angle coating device for placing at least one substrate to be plated, the adjustable angle coating device comprising at least one substrate carrier, a rotation module and an inclination Modulation module. Wherein the substrate carrier comprises a carrier surface. The rotation module includes a center shaft and a rotation motor. The central axis is connected to the substrate carrier, and the extending direction of the central axis intersects the extending direction of the carrying surface at an angle. The rotating motor rotates the central shaft to rotate the substrate carrier. Furthermore, the tilt modulation module includes at least one liter having a lift sleeve Drop down with a lift motor. The lifting sleeve is slidably sleeved with the central shaft, so that the lifting member is restricted to be displaced parallel to the extending direction of the central shaft, and the lifting member is connected to the substrate carrier. The lifting motor drives the lifting member to move and interlocks the substrate carrier, causing the angle to change.

藉此,本新型之可調變角度之鍍膜裝置利用特殊之昇降套座來連結傾角調變模組與自轉模組,不但可於鍍膜的過程中自由地調變基材載具的傾斜角度,同時還可讓基材載具自轉。Therefore, the novel variable angle coating device utilizes a special lifting sleeve to connect the tilt modulation module and the rotation module, and can not only modulate the inclination angle of the substrate carrier during the coating process. At the same time, the substrate carrier can be rotated.

依據前述實施方式之其他實施例如下:前述昇降馬達可調整夾角變小而致使基材載具靠攏中軸,或者前述昇降馬達可調整夾角變大而致使基材載具遠離中軸。再者,前述基材載具可包含一升降溫控制器,此升降溫控制器可包含一電熱件、一致冷件及一溫度監控件。其中電熱件可加熱待鍍基材之溫度;致冷件可冷卻待鍍基材之溫度;溫度監控件則可監控待鍍基材之溫度。此外,前述基材載具可包含一通偏壓控制器,此通偏壓控制器控制基材載具之電壓。前述待鍍基材具有複數個試片,而基材載具可置放這些試片。另外,前述傾角調變模組可包含一萬向接頭與一萬向連桿。其中萬向接頭固接昇降套座,萬向連桿之二端則分別連接萬向接頭與基材載具。前述自轉模組可包含一中軸齒輪與一配向齒輪,中軸齒輪固接中軸,而配向齒輪則齒合中軸齒輪且連接基材載具。中軸被轉動馬達轉動而連動配向齒輪,致使基材載具自轉。According to other embodiments of the foregoing embodiments, the lift motor can be adjusted to have a smaller angle to cause the substrate carrier to move closer to the center axis, or the lift motor can be adjusted to have a larger angle to cause the substrate carrier to move away from the center axis. Furthermore, the substrate carrier may include a temperature rise and fall temperature controller, and the temperature rise and fall temperature controller may include an electric heating component, a uniform cooling component, and a temperature monitoring component. The electric heating component can heat the temperature of the substrate to be plated; the cooling component can cool the temperature of the substrate to be plated; and the temperature monitoring component can monitor the temperature of the substrate to be plated. Additionally, the substrate carrier can include a pass bias controller that controls the voltage of the substrate carrier. The substrate to be plated has a plurality of test pieces, and the substrate carrier can place the test pieces. In addition, the foregoing tilt modulation module may include a universal joint and a universal joint. The universal joint is fixed to the lifting sleeve, and the two ends of the universal joint are respectively connected with the universal joint and the substrate carrier. The rotation module may include a center shaft gear and a matching gear, the middle shaft gear is fixed to the center shaft, and the alignment gear is coupled to the center shaft gear and connected to the substrate carrier. The central shaft is rotated by the rotating motor to interlock the alignment gears, causing the substrate carrier to rotate.

藉由上述實施例,在基材載具上加裝升降溫控 制器與通偏壓控制器,不但可使基材載具的傾斜角度改變,還同時兼具升降溫與通偏壓之功能,進而讓待鍍基材符合各種鍍膜製程的需求。在此結構下,使用者除了可以依其製程需求來控制待鍍基材之表面溫度外,亦可將基材載具用於各式真空鍍膜系統中。再者,一個基材載具可以置放多個試片,能大幅地提高產量。此外,萬向接頭與萬向連桿的動態連結設計可以讓整個機構在調變基材載具上下方向的傾斜角度時,不會影響基材載具自轉的擺盪作動。另外,中軸齒輪結合配向齒輪之輪軸結構可使轉動馬達同步帶動基材載具之載墊自轉,其結構簡單且拆組方便,使用者可根據需求來配置。With the above embodiment, the lifting temperature control is added to the substrate carrier The controller and the through-bias controller not only change the tilt angle of the substrate carrier, but also have the functions of lifting temperature and through bias, so that the substrate to be plated meets the requirements of various coating processes. Under this structure, the user can control the surface temperature of the substrate to be plated according to the process requirements, and the substrate carrier can also be used in various vacuum coating systems. Furthermore, a substrate carrier can accommodate a plurality of test pieces, which can greatly increase the yield. In addition, the dynamic connection design of the universal joint and the universal joint allows the entire mechanism to change the inclination angle of the substrate carrier in the up and down direction without affecting the swinging action of the substrate carrier rotation. In addition, the axle shaft structure of the center shaft gear combined with the aligning gear enables the rotating motor to synchronously drive the carrier pad of the substrate carrier to rotate, and the structure is simple and convenient to disassemble, and the user can configure according to requirements.

本新型之另一實施方式為一種可調變角度之鍍膜裝置,用以置放複數待鍍基材。此可調變角度之鍍膜裝置包含複數個基材載具、一自轉模組、一傾角調變模組以及一公轉模組。其中每個基材載具包含一載面,各載面置放待鍍基材。而自轉模組包含一中軸與一轉動馬達。其中中軸連接各基材載具,且中軸之延伸方向與載面之延伸方向相交一夾角。轉動馬達則連動中軸而使各基材載具自轉。再者,傾角調變模組包含具有一昇降套座的至少一昇降件與一昇降馬達。其中昇降套座可位移地套接中軸,令昇降件平行於中軸之延伸方向位移,且昇降件連接各基材載具。昇降馬達則帶動昇降件位移而連動各基材載具,致使夾角調變。此外,公轉模組包含一盤座、一轉軸以及一公轉馬達。其中盤座固接轉動馬達與昇降馬達。轉軸可為 習知之蝸桿蝸輪結構,其一端連接盤座上之齒輪組。至於公轉馬達則連接轉軸之另一端。公轉馬達藉由轉軸蝸桿水平向轉動盤座而連動固鎖於盤座的中軸,致使各基材載具繞著盤座公轉。Another embodiment of the present invention is a variable angle coating device for placing a plurality of substrates to be plated. The adjustable angle coating device comprises a plurality of substrate carriers, a rotation module, a tilt modulation module and a revolution module. Each of the substrate carriers includes a carrier surface on which each substrate is to be plated. The rotation module includes a center shaft and a rotation motor. The central axis is connected to each substrate carrier, and the extending direction of the central axis intersects the extending direction of the carrying surface at an angle. Rotating the motor interlocks the center shaft to cause each substrate carrier to rotate. Furthermore, the tilt modulation module includes at least one lifting member and a lifting motor having a lifting sleeve. The lifting sleeve is slidably sleeved with the central shaft, so that the lifting member is displaced parallel to the extending direction of the central axis, and the lifting member is connected to each substrate carrier. The lifting motor drives the lifting member to move and interlocks the substrate carriers, so that the angle is changed. In addition, the revolution module includes a disc seat, a rotating shaft and a revolving motor. The disk holder is fixed to the rotating motor and the lifting motor. The shaft can be The conventional worm and worm gear structure has one end connected to a gear set on the disc holder. As for the revolution motor, the other end of the shaft is connected. The revolving motor is interlocked with the central shaft of the disc holder by the rotary worm horizontally rotating the disc holder, so that the substrate carriers revolve around the disc holder.

藉此,本新型之可調變角度之鍍膜裝置利用特殊之昇降套座來連結傾角調變模組與自轉模組,不但可於鍍膜的過程中自由地調變基材載具的傾斜角度,同時還可讓基材載具自轉。藉由傾角調變模組、自轉模組以及公轉模組三者間的固定連接,可於此基材載具實現:一、於待鍍基材表面產生均勻鍍膜的效果;二、於待鍍基材表面成長三維立體結構薄膜的效果。Therefore, the novel variable angle coating device utilizes a special lifting sleeve to connect the tilt modulation module and the rotation module, and can not only modulate the inclination angle of the substrate carrier during the coating process. At the same time, the substrate carrier can be rotated. The fixed connection between the dip modulation module, the rotation module and the revolving module can realize the substrate carrier: first, the effect of uniformly coating on the surface of the substrate to be plated; The effect of growing a three-dimensional structure film on the surface of the substrate.

依據前述實施方式之其他實施例如下:前述基材載具之數量可為2個、4個、6個或8個。前述基材載具可包含一升降溫控制器,此升降溫控制器可包含一電熱件、一致冷件及一溫度監控件。其中電熱件加熱待鍍基材之溫度,致冷件冷卻待鍍基材之溫度,而溫度監控件則監控待鍍基材之溫度。另外,前述基材載具可包含一通偏壓控制器,此通偏壓控制器可控制基材載具之電壓。前述待鍍基材具有複數個試片,而基材載具可置放這些試片。前述傾角調變模組可包含複數個萬向接頭與複數個萬向連桿。各萬向接頭固接昇降套座。各萬向連桿之二端分別連接其中一萬向接頭與其中一基材載具。再者,前述自轉模組可包含一中軸齒輪與複數個配向齒輪。中軸齒輪固接中軸,而各配向齒輪齒合中軸齒輪且連接其中一基材載具。 中軸被轉動馬達轉動而連動各配向齒輪,致使各基材載具自轉。前述昇降馬達可調整夾角變小而致使基材載具靠攏中軸,或者昇降馬達調整夾角變大而致使基材載具遠離中軸。According to other embodiments of the foregoing embodiments, the number of the substrate carriers may be two, four, six or eight. The substrate carrier may include a temperature rise and fall temperature controller, and the temperature rise and fall temperature controller may include a heating element, a uniform cooling piece and a temperature monitoring component. The electric heating member heats the temperature of the substrate to be plated, the cooling member cools the temperature of the substrate to be plated, and the temperature monitoring member monitors the temperature of the substrate to be plated. Additionally, the substrate carrier can include a pass bias controller that controls the voltage of the substrate carrier. The substrate to be plated has a plurality of test pieces, and the substrate carrier can place the test pieces. The foregoing tilt modulation module may include a plurality of universal joints and a plurality of universal joints. Each universal joint is fixed to the lifting sleeve. The two ends of each of the universal joints are respectively connected to one of the universal joints and one of the substrate carriers. Furthermore, the aforementioned rotation module may include a center shaft gear and a plurality of alignment gears. The center shaft gear is fixed to the center shaft, and each of the alignment gears meshes with the center shaft gear and is connected to one of the substrate carriers. The center shaft is rotated by the rotating motor to interlock the respective alignment gears, so that the substrate carriers rotate. The lifting motor can adjust the angle to be smaller to cause the substrate carrier to move closer to the center axis, or the lifting motor can adjust the angle to become larger, so that the substrate carrier is away from the center axis.

藉由上述實施例,基材載具之數量可依照不同的腔體尺寸、待鍍基材的尺寸或基材載具的尺寸來調整規劃。由於整個可調變角度之鍍膜裝置中可設置多個基材載具並共用一個自轉模組、一個傾角調變模組以及一個公轉模組,不但可降低成本,還能大幅地提高產量。With the above embodiments, the number of substrate carriers can be adjusted according to different cavity sizes, the size of the substrate to be plated, or the size of the substrate carrier. Since the entire adjustable angle coating device can be provided with a plurality of substrate carriers and share one rotation module, one inclination modulation module and one revolution module, the cost can be reduced, and the output can be greatly improved.

100‧‧‧可調變角度之鍍膜裝置100‧‧‧Adjustable angle coating device

200、210、610~640、710~760、810~880‧‧‧基材載具200, 210, 610~640, 710~760, 810~880‧‧‧ substrate carrier

202、212‧‧‧載座202, 212‧‧‧ carried

204、214‧‧‧載墊204, 214‧‧‧Pack

206、216‧‧‧載面206, 216‧‧‧

300‧‧‧自轉模組300‧‧‧Rotary Module

310‧‧‧中軸310‧‧‧Axis

320‧‧‧轉動馬達320‧‧‧Rotating motor

330‧‧‧中軸齒輪330‧‧‧Axle gear

340、350‧‧‧配向齒輪340, 350‧‧‧ Alignment gears

342、352‧‧‧配向輪軸342, 352‧‧‧ Alignment axle

360、370、430、432、450、452‧‧‧萬向接頭360, 370, 430, 432, 450, 452‧‧‧ universal joints

362、372‧‧‧傳動軸362, 372‧‧‧ drive shaft

380‧‧‧固定座380‧‧‧ fixed seat

400、600、700、800‧‧‧傾角調變模組400, 600, 700, 800‧‧‧ dip modulation module

410‧‧‧昇降件410‧‧‧lifting parts

412‧‧‧轉移部412‧‧‧Transfer Department

414‧‧‧昇降連桿414‧‧‧ lifting link

416‧‧‧昇降套座416‧‧‧lifting seat

420‧‧‧昇降馬達420‧‧‧ Lift motor

422‧‧‧昇降轉軸422‧‧‧ Lifting shaft

440、442‧‧‧萬向連桿440, 442‧‧‧ universal joint

500‧‧‧公轉模組500‧‧‧ revolution module

510‧‧‧公轉馬達510‧‧A revolution motor

520‧‧‧轉軸520‧‧‧ shaft

530‧‧‧盤座530‧‧‧ Socket

θ‧‧‧夾角Θ‧‧‧ angle

第1圖係繪示本新型一實施方式之可調變角度之鍍膜裝置的側視圖。1 is a side view showing a coating device with adjustable angles according to an embodiment of the present invention.

第2A圖係繪示第1圖之自轉模組的作動示意圖。FIG. 2A is a schematic diagram showing the operation of the rotation module of FIG. 1 .

第2B圖係繪示第1圖之傾角調變模組的作動示意圖。FIG. 2B is a schematic diagram showing the operation of the tilt modulation module of FIG. 1 .

第2C圖係繪示第1圖之公轉模組的作動示意圖。Fig. 2C is a schematic view showing the operation of the revolution module of Fig. 1.

第3圖係繪示本新型另一實施方式之傾角調變模組與基材載具的俯視圖。FIG. 3 is a plan view showing a tilt modulation module and a substrate carrier according to another embodiment of the present invention.

第4圖係繪示本新型又一實施方式之傾角調變模組與基材載具的俯視圖。4 is a plan view showing a tilt modulation module and a substrate carrier according to still another embodiment of the present invention.

第5圖係繪示本新型再一實施方式之傾角調變模組與基材載具的俯視圖。FIG. 5 is a plan view showing a tilt modulation module and a substrate carrier according to still another embodiment of the present invention.

請一併參閱第1圖至第2C圖。第1圖係繪示本新型一實施方式之可調變角度之鍍膜裝置100的側視圖。第2A圖係繪示第1圖之自轉模組300的作動示意圖。第2B圖係繪示第1圖之傾角調變模組400的作動示意圖。第2C圖係繪示第1圖之公轉模組500的作動示意圖。如圖所示,此可調變角度之鍍膜裝置100係用以置放二待鍍基材(未示於圖中),而且此可調變角度之鍍膜裝置100包含二基材載具200、210、一自轉模組300、一傾角調變模組400以及一公轉模組500。Please refer to Figures 1 to 2C together. 1 is a side view showing a coating device 100 of an adjustable angle according to an embodiment of the present invention. FIG. 2A is a schematic diagram showing the operation of the rotation module 300 of FIG. 1 . FIG. 2B is a schematic diagram showing the operation of the tilt modulation module 400 of FIG. 1 . FIG. 2C is a schematic diagram showing the operation of the revolution module 500 of FIG. 1 . As shown in the figure, the adjustable angle coating device 100 is used for placing two substrates to be plated (not shown), and the variable angle coating device 100 comprises two substrate carriers 200, 210, a rotation module 300, a tilt modulation module 400, and a revolution module 500.

基材載具200包含載座202與載墊204,載座202固接載墊204的一端,且載墊204的另一端具有一載面206。而基材載具210則包含載座212與載墊214,載座212固接載墊214的一端,且載墊214的另一端具有一載面216。載面206與載面216可分別置放連結二待鍍基材。再者,載座202、載座212、載墊204以及載墊214的形狀可為圓形、方形或其他多邊形,以符合各種鍍膜方法之需求。而本實施例之載座202與載座212的形狀均為方形且形狀大小彼此相同,載墊204與載墊214的形狀均為圓形且形狀大小彼此相同。此外,在基材載具200之載座202上可設置升降溫控制器與通偏壓控制器(未示於圖中),且升降溫控制器與通偏壓控制器均電性連接載墊204、214。其中升降溫控制器包含一電熱件、一致冷件及一溫度監控件。電熱件可加熱待鍍基材之溫度;致冷件可 冷卻待鍍基材之溫度;溫度監控件可監控待鍍基材之溫度。另外,通偏壓控制器可控制基材載具200、210中對應之載墊204、214的電壓。藉由上述之升降溫控制器與通偏壓控制器的搭載結合,可使本新型的可調變角度之鍍膜裝置100能因應特殊鍍膜製程的需求。再者,待鍍基材可具有複數個試片,這些試片可置放於基材載具200、210中對應之載墊204、214上同時鍍膜,以增加產量。The substrate carrier 200 includes a carrier 202 and a carrier pad 204. The carrier 202 is fixed to one end of the carrier pad 204, and the other end of the carrier pad 204 has a carrier surface 206. The substrate carrier 210 includes a carrier 212 and a carrier pad 214. The carrier 212 is fixed to one end of the carrier pad 214, and the other end of the carrier pad 214 has a carrier surface 216. The carrier surface 206 and the carrier surface 216 can respectively be placed to connect the two substrates to be plated. Furthermore, the carrier 202, the carrier 212, the carrier pad 204, and the carrier pad 214 may be circular, square or other polygonal shapes to meet the requirements of various coating methods. The carrier 202 and the carrier 212 of the present embodiment have a square shape and the same size and shape, and the pad 204 and the carrier pad 214 have a circular shape and the same shape and size. In addition, a temperature rise and fall controller and a bias bias controller (not shown) may be disposed on the carrier 202 of the substrate carrier 200, and the temperature rise and fall controller and the through bias controller are electrically connected to the carrier pad. 204, 214. The temperature rise and fall temperature controller comprises an electric heating component, a constant cooling component and a temperature monitoring component. The heating element can heat the temperature of the substrate to be plated; the cooling piece can be The temperature of the substrate to be plated is cooled; the temperature monitoring member monitors the temperature of the substrate to be plated. Additionally, the pass bias controller can control the voltage of the corresponding pads 204, 214 in the substrate carriers 200, 210. By combining the above-mentioned temperature rise and fall controller with the on-bias controller, the novel variable angle coating device 100 can meet the requirements of a special coating process. Furthermore, the substrate to be plated may have a plurality of test pieces which may be placed on the corresponding carrier pads 204, 214 of the substrate carriers 200, 210 to be simultaneously coated to increase the yield.

自轉模組300包含一中軸310、一轉動馬達320、一中軸齒輪330、二配向齒輪340、350、二萬向接頭360、370以及固定座380。中軸310之一端連接轉動馬達320,且為轉動馬達320的轉動軸。而中軸310之另一端則同軸固接中軸齒輪330。再者,配向齒輪340齒合連接中軸齒輪330,且配向齒輪340連接配向輪軸342。配向輪軸342透過萬向接頭360連接傳動軸362的一端,而傳動軸362的另一端則連接基材載具200之載座202。其中載座202內部藉由習知之蝸桿蝸輪的方式轉動載墊204,令載墊204連同其載面206一起旋轉。換句話說,中軸310被轉動馬達320轉動而連動配向齒輪340,然後經由配向輪軸342、萬向接頭360及傳動軸362之結合搭配,使基材載具200之載座202中的蝸桿蝸輪結構連動,進而導致載墊204自轉。同理,配向齒輪350齒合連接中軸齒輪330,且配向齒輪350連接配向輪軸352。配向輪軸352透過萬向接頭370連接傳動軸372的一端,而傳動軸372的另一端則連接基材載具210之載座212。其中載 座212內部藉由習知之蝸桿蝸輪的方式轉動載墊214,令載墊214連同其載面216一起旋轉,其旋轉方向平行於載面216之延伸方向,可順時針或逆時針旋轉。也就是說,中軸310被轉動馬達320轉動而連動配向齒輪350,然後經由配向輪軸352、萬向接頭370及傳動軸372之結合搭配,使載座212中的蝸桿蝸輪結構連動,進而導致載墊204自轉。此外,配向輪軸342、352穿接且被限位於固定座380之上,透過固定座380之設置,不但可使中軸齒輪330穩定地連接齒合配向齒輪340、350,亦可讓基材載具200、210穩定地作動。再者,固定座380可避免入射的材料蒸氣雲團進入機械作動區域而產生不必要的汙染。另外,中軸310之延伸方向與載面206之延伸方向相交一夾角θ,此夾角θ之工作範圍為74度到90度。值得一提的是,中軸310係扮演多功能之角色,其不但可帶動基材載具200、210進行夾角θ之調整,還可讓載墊204、214以及載面206、216自轉。The rotation module 300 includes a center shaft 310, a rotation motor 320, a center shaft gear 330, two alignment gears 340, 350, two universal joints 360, 370, and a fixing base 380. One end of the center shaft 310 is coupled to the rotation motor 320 and is a rotation shaft of the rotation motor 320. The other end of the center shaft 310 is coaxially fixed to the center shaft gear 330. Furthermore, the alignment gear 340 is coupled to the center shaft gear 330, and the alignment gear 340 is coupled to the alignment shaft 342. The alignment axle 342 is coupled to one end of the drive shaft 362 through a universal joint 360, and the other end of the drive shaft 362 is coupled to the carrier 202 of the substrate carrier 200. The carrier 204 is rotated inside the carrier 202 by means of a conventional worm gear to rotate the carrier 204 together with its carrier 206. In other words, the central shaft 310 is rotated by the rotating motor 320 to interlock the alignment gear 340, and then the worm and worm gear structure in the carrier 202 of the substrate carrier 200 is coupled via the combination of the alignment axle 342, the universal joint 360 and the transmission shaft 362. The interlocking causes the carrier pad 204 to rotate. Similarly, the alignment gear 350 is coupled to the center shaft gear 330, and the alignment gear 350 is coupled to the alignment shaft 352. The alignment axle 352 is coupled to one end of the drive shaft 372 through a universal joint 370, and the other end of the drive shaft 372 is coupled to the carrier 212 of the substrate carrier 210. Which contains Inside the seat 212, the carrier pad 214 is rotated by a conventional worm gear, so that the carrier pad 214 rotates together with its carrier surface 216, and its rotation direction is parallel to the extending direction of the carrier surface 216, and can be rotated clockwise or counterclockwise. That is to say, the middle shaft 310 is rotated by the rotation motor 320 to interlock the alignment gear 350, and then the combination of the alignment axle 352, the universal joint 370 and the transmission shaft 372 causes the worm and worm gear structures in the carrier 212 to interlock, thereby causing the carrier pad. 204 rotation. In addition, the alignment axles 342, 352 are pierced and limited to the fixing base 380. The fixing bracket 380 is disposed to not only stably connect the center shaft gear 330 to the tooth alignment gears 340 and 350, but also to the substrate carrier. 200, 210 operate steadily. Moreover, the mount 380 can prevent incident material vapor cloud clouds from entering the mechanically actuated area to create unnecessary contamination. In addition, the extending direction of the central axis 310 intersects with the extending direction of the carrying surface 206 by an angle θ, and the working range of the included angle θ is 74 degrees to 90 degrees. It is worth mentioning that the central axis 310 plays the role of multi-function, which not only can drive the substrate carriers 200, 210 to adjust the angle θ, but also allows the pads 204, 214 and the loading surfaces 206, 216 to rotate.

傾角調變模組400包含一昇降件410、一昇降馬達420、二萬向接頭430、432、二萬向連桿440、442以及二萬向接頭450、452。其中昇降件410具有一轉移部412、一昇降連桿414以及一昇降套座416。昇降馬達420具有一昇降轉軸422,且此昇降轉軸422連接轉移部412的一端。昇降馬達420固接於盤座530上,且昇降轉軸422透過轉移部412連接昇降連桿414。再者,昇降連桿414的一端連接於轉移部412。轉移部412可為習 知之蝸桿蝸輪結構,其可藉由昇降馬達420之順轉逆轉致使昇降連桿414的上下位移。而昇降連桿414之另一端則固接於昇降套座416之外側。昇降連桿414呈L形且為剛性材質,其位移會連結帶動昇降套座416。另外,昇降套座416可位移地套接於中軸310,令昇降件410受限平行於中軸310之延伸方向位移。此昇降套座416呈中空圓筒狀,且其圓筒之內徑大於中軸310的軸徑,可使昇降套座416順暢地上下滑動位移。再者,昇降套座416的二端分別設有萬向接頭430與萬向接頭432,且萬向接頭430、432均固接於昇降套座416之外壁。萬向連桿440的二端分別連接萬向接頭430與萬向接頭450,而萬向連桿442的二端則分別連接萬向接頭432與萬向接頭452。二萬向接頭450、452分別固設於載座202、212上。由此可知,昇降件410係透過一萬向連桿440與二萬向接頭430、450間接地連接基材載具200,並透過一萬向連桿442與二萬向接頭432、452間接地連接基材載具210。由於昇降馬達420之轉動可讓昇降連桿414位移,故昇降馬達420可帶動昇降件410位移並同時連動基材載具200、210,進而調整改變夾角θ。值得一提的是,昇降馬達420調整夾角θ變小,此時昇降馬達420轉動令昇降套座416向上提昇,致使基材載具200、210同時靠攏中軸310。相反地,昇降馬達420可調整夾角θ變大,此時昇降馬達420轉動令昇降套座416向下降,致使基材載具200、210同時遠離中軸310,其作動如同雨傘之收折與 展開,具備了雙向角度之調變。The tilt modulation module 400 includes a lifting member 410, an elevation motor 420, two universal joints 430, 432, two universal joints 440, 442, and two universal joints 450, 452. The lifting member 410 has a transferring portion 412, a lifting link 414 and a lifting sleeve 416. The hoist motor 420 has an elevation shaft 422, and the elevation shaft 422 is coupled to one end of the transfer portion 412. The lift motor 420 is fixed to the disk holder 530, and the lift shaft 422 is connected to the lift link 414 through the transfer portion 412. Further, one end of the lift link 414 is connected to the transfer portion 412. The transfer portion 412 can be a habit The worm gear structure is known to be reversed by the forward rotation of the lift motor 420 to cause the up and down movement of the lift link 414. The other end of the lifting link 414 is fixed to the outer side of the lifting sleeve 416. The lifting link 414 is L-shaped and rigid, and its displacement is coupled to drive the lifting sleeve 416. In addition, the lifting sleeve 416 is slidably sleeved on the central shaft 310, so that the lifting member 410 is restricted to be displaced parallel to the extending direction of the central shaft 310. The lifting sleeve 416 has a hollow cylindrical shape, and the inner diameter of the cylinder is larger than the axial diameter of the central shaft 310, so that the lifting sleeve 416 can smoothly slide up and down. Furthermore, the two ends of the lifting sleeve 416 are respectively provided with a universal joint 430 and a universal joint 432, and the universal joints 430, 432 are fixed to the outer wall of the lifting sleeve 416. The two ends of the universal joint 440 are respectively connected with a universal joint 430 and a universal joint 450, and the two ends of the universal joint 442 are respectively connected with a universal joint 432 and a universal joint 452. The 20,000 joints 450, 452 are fixed to the carriers 202, 212, respectively. It can be seen that the lifting member 410 is indirectly connected to the substrate carrier 200 through the universal joint 440 and the two-way joints 430, 450, and indirectly through the universal joint 442 and the two-way joints 432, 452. The substrate carrier 210 is attached. Since the rotation of the lifting motor 420 can displace the lifting link 414, the lifting motor 420 can drive the lifting member 410 to displace and simultaneously link the substrate carriers 200, 210 to adjust the angle θ. It is worth mentioning that the adjustment angle θ of the lifting motor 420 becomes smaller. At this time, the rotation of the lifting motor 420 causes the lifting sleeve 416 to be lifted upward, so that the substrate carriers 200, 210 are simultaneously close to the central axis 310. Conversely, the lifting motor 420 can adjust the angle θ to become larger. At this time, the lifting motor 420 rotates to lower the lifting sleeve 416, so that the substrate carriers 200 and 210 are away from the center shaft 310 at the same time, and the movement is like the folding of the umbrella. Expanded, with a two-way angle modulation.

公轉模組500包含一公轉馬達510、一盤座530以及一轉軸520。其中盤座530透過轉軸520連接公轉馬達510且盤座530被中軸310貫穿,而且盤座530固接轉動馬達320與昇降轉軸422。轉軸520之一端可為習知之蝸桿蝸輪結構,其連接盤座530的齒輪組,而轉軸520之另一端則連接公轉馬達510,此轉軸520為公轉馬達510的轉動軸。再者,傾角調變模組400之昇降件410透過昇降連桿414連接於盤座530之上,且自轉模組300透過中軸310連接於盤座530之上。由此可知,公轉馬達510藉由轉軸520之蝸桿蝸輪結構轉動盤座530,進而連動盤座530上的轉動馬達320與中軸310,致使基材載具200、210同步同方向繞著盤座530公轉。The revolution module 500 includes a revolving motor 510, a disc holder 530, and a rotating shaft 520. The disk holder 530 is connected to the revolving motor 510 through the rotating shaft 520, and the disk holder 530 is penetrated by the center shaft 310, and the disk holder 530 is fixed to the rotating motor 320 and the lifting shaft 422. One end of the rotating shaft 520 may be a conventional worm gear structure, which is connected to the gear set of the disk holder 530, and the other end of the rotating shaft 520 is connected to the revolving motor 510, which is the rotating shaft of the revolving motor 510. Moreover, the lifting member 410 of the tilt modulation module 400 is connected to the disk holder 530 via the lifting link 414, and the rotation module 300 is connected to the disk holder 530 through the central axis 310. It can be seen that the revolving motor 510 rotates the disc holder 530 by the worm worm gear structure of the rotating shaft 520, thereby interlocking the rotating motor 320 and the center shaft 310 on the disc holder 530, so that the substrate carriers 200, 210 are synchronously wound in the same direction around the disc holder 530. Revolution.

第3圖係繪示本新型另一實施方式之傾角調變模組600與基材載具610~640的俯視圖,其具有四個基材載具610~640。第4圖係繪示本新型又一實施方式之傾角調變模組700與基材載具710~760的俯視圖,其具有六個基材載具710~760。第5圖係繪示本新型再一實施方式之傾角調變模組800與基材載具810~880的俯視圖,其具有八個基材載具810~880。如第3圖所示,基材載具610與基材載具630彼此相對應,而基材載具620與基材載具640彼此相對應,因此有兩組相對應之基材載具組。同理,第4圖與第5圖分別有三組與四組相對應之基材載具組。此外,基材載具與載面的數量可依照不同的腔體尺 寸、待鍍基材的尺寸或基材載具的尺寸來調整規劃。例如:每個載面可置放一片4英吋晶圓試片或透過轉接治具置放四片2英吋晶圓試片,當然,亦可置放比4英吋晶圓更大的試片,以發揮量產的效果。如此透過基材載具可以置放多個晶圓試片,而且於整個可調變角度之鍍膜裝置100中可設置多個基材載具並共用一個自轉模組300、一個傾角調變模組400以及一個公轉模組500。因此,在低成本的條件下,本新型之可調變角度之鍍膜裝置100能大幅地提高產量。3 is a plan view of a tilt modulation module 600 and substrate carriers 610-640 according to another embodiment of the present invention, which has four substrate carriers 610-640. 4 is a plan view of a tilt modulation module 700 and substrate carriers 710-760 according to still another embodiment of the present invention, which has six substrate carriers 710-760. FIG. 5 is a plan view of a tilt modulation module 800 and a substrate carrier 810-880 according to still another embodiment of the present invention, which has eight substrate carriers 810-880. As shown in FIG. 3, the substrate carrier 610 and the substrate carrier 630 correspond to each other, and the substrate carrier 620 and the substrate carrier 640 correspond to each other, so that there are two sets of corresponding substrate carrier groups. . Similarly, Figures 4 and 5 have three sets of substrate carrier groups corresponding to the four groups, respectively. In addition, the number of substrate carriers and the carrier surface can be different according to the cavity scale The plan is adjusted by the size of the substrate to be plated or the size of the substrate carrier. For example, a 4 inch wafer test piece can be placed on each surface or four 2 inch wafer test pieces can be placed through the transfer fixture. Of course, it can be placed larger than a 4 inch wafer. Test pieces to play the effect of mass production. In this way, a plurality of wafer test pieces can be placed through the substrate carrier, and a plurality of substrate carriers can be disposed in the entire adjustable angle coating device 100 and share one rotation module 300 and one tilt modulation module. 400 and a revolution module 500. Therefore, under the low-cost condition, the novel variable angle coating device 100 of the present invention can greatly increase the yield.

由上述實施方式可知,本新型具有下列優點:其一,係利用特殊之昇降套座來連結傾角調變模組與自轉模組,不但可於鍍膜的過程中自由地調變基材載具的傾斜角度,同時還可讓基材載具自轉。其二,藉由傾角調變模組、自轉模組以及公轉模組三者間的固定連接,可於此基材載具實現兩種效果:效果一、於待鍍基材表面產生均勻鍍膜;效果二、於待鍍基材表面成長三維立體結構薄膜。其三,透過升降溫控制器與通偏壓控制器之設置,可使基材載具兼具升降溫與通偏壓之功能,進而讓待鍍基材符合各種鍍膜製程的需求。其四,基材載具可以置放多個試片,能大幅地提高產量。其五,可按照不同真空鍍膜系統的配置,自上下左右前後之6個方向安裝此新型。It can be seen from the above embodiments that the present invention has the following advantages: First, the special tilting socket is used to connect the tilt modulation module and the rotation module, and the substrate carrier can be freely modulated during the coating process. The angle of inclination also allows the substrate carrier to rotate. Secondly, by the fixed connection between the tilt modulation module, the rotation module and the revolution module, the substrate carrier can achieve two effects: the effect is that a uniform coating is formed on the surface of the substrate to be plated; Effect 2: A three-dimensional structure film is grown on the surface of the substrate to be plated. Thirdly, through the setting of the temperature rise controller and the through bias controller, the substrate carrier can have the functions of lifting temperature and through bias, and the substrate to be plated can meet the requirements of various coating processes. Fourth, the substrate carrier can be placed with a plurality of test pieces, which can greatly increase the yield. Fifthly, according to the configuration of different vacuum coating systems, the new type can be installed in six directions from top to bottom, left and right.

雖然本新型已以實施方式揭露如上,然其並非用以限定本新型,任何熟習此技藝者,在不脫離本新型之精神和範圍內,當可作各種之更動與潤飾,因此本新型之 保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Any one skilled in the art can make various changes and retouchings without departing from the spirit and scope of the present invention. The scope of protection is subject to the definition of the scope of the patent application attached.

100‧‧‧可調變角度之鍍膜裝置100‧‧‧Adjustable angle coating device

200、210‧‧‧基材載具200, 210‧‧‧ substrate carrier

202、212‧‧‧載座202, 212‧‧‧ carried

204、214‧‧‧載墊204, 214‧‧‧Pack

206、216‧‧‧載面206, 216‧‧‧

300‧‧‧自轉模組300‧‧‧Rotary Module

310‧‧‧中軸310‧‧‧Axis

320‧‧‧轉動馬達320‧‧‧Rotating motor

330‧‧‧中軸齒輪330‧‧‧Axle gear

340、350‧‧‧配向齒輪340, 350‧‧‧ Alignment gears

342、352‧‧‧配向輪軸342, 352‧‧‧ Alignment axle

360、370、430、432、450、452‧‧‧萬向接頭360, 370, 430, 432, 450, 452‧‧‧ universal joints

362、372‧‧‧傳動軸362, 372‧‧‧ drive shaft

380‧‧‧固定座380‧‧‧ fixed seat

400‧‧‧傾角調變模組400‧‧‧ inclination modulation module

410‧‧‧昇降件410‧‧‧lifting parts

412‧‧‧轉移部412‧‧‧Transfer Department

414‧‧‧昇降連桿414‧‧‧ lifting link

416‧‧‧昇降套座416‧‧‧lifting seat

420‧‧‧昇降馬達420‧‧‧ Lift motor

422‧‧‧昇降轉軸422‧‧‧ Lifting shaft

440、442‧‧‧萬向連桿440, 442‧‧‧ universal joint

500‧‧‧公轉模組500‧‧‧ revolution module

510‧‧‧公轉馬達510‧‧A revolution motor

520‧‧‧轉軸520‧‧‧ shaft

530‧‧‧盤座530‧‧‧ Socket

θ‧‧‧夾角Θ‧‧‧ angle

Claims (15)

一種可調變角度之鍍膜裝置,用以置放至少一待鍍基材,該可調變角度之鍍膜裝置包含:至少一基材載具,包含一載面;一自轉模組,包含:一中軸,連接該基材載具,該中軸之延伸方向與該載面之延伸方向相交一夾角;及一轉動馬達,連動該中軸而使該基材載具自轉;以及一傾角調變模組,包含:具有一昇降套座的至少一昇降件,該昇降套座可位移地套接該中軸,令該昇降件受限平行於該中軸之延伸方向位移,且該昇降件連接該基材載具;及一昇降馬達,帶動該昇降件位移而連動該基材載具,致使該夾角調變。An adjustable angled coating device for arranging at least one substrate to be plated, the adjustable angle coating device comprising: at least one substrate carrier comprising a carrier surface; and a rotation module comprising: a central axis connecting the substrate carrier, the extending direction of the central axis intersecting an extending direction of the carrying surface; and a rotating motor for interlocking the central axis to rotate the substrate carrier; and a tilt modulation module, The invention comprises: at least one lifting member having a lifting sleeve, the lifting sleeve is slidably sleeved to the central shaft, the lifting member is restricted to be displaced parallel to the extending direction of the central shaft, and the lifting member is connected to the substrate carrier And a lifting motor that drives the lifting member to move the substrate carrier to cause the angle to be changed. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該昇降馬達調整該夾角變小而致使該基材載具靠攏該中軸,或者該昇降馬達調整該夾角變大而致使該基材載具遠離該中軸。The coating device of the variable angle according to claim 1, wherein the lifting motor adjusts the angle to become smaller so that the substrate carrier is close to the central axis, or the lifting motor adjusts the angle to become larger The substrate carrier is remote from the central axis. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該基材載具更包含一升降溫控制器,該升降溫控制器可包含一電熱件、一致冷件及一溫度監控件,該電熱件加熱該待鍍基材之溫度,該致冷件冷卻該待 鍍基材之溫度,該溫度監控件監控該待鍍基材之溫度。The coating device of the variable angle according to the first aspect of the invention, wherein the substrate carrier further comprises a temperature rise and fall temperature controller, wherein the temperature rise and fall controller can comprise a heating element, a uniform cooling piece and a temperature monitoring The heating element heats the temperature of the substrate to be plated, and the cooling member cools the The temperature of the substrate is plated, and the temperature monitoring member monitors the temperature of the substrate to be plated. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該基材載具更包含一通偏壓控制器,該通偏壓控制器控制該基材載具之電壓。The variable angle coating device of claim 1, wherein the substrate carrier further comprises a pass bias controller that controls the voltage of the substrate carrier. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該待鍍基材具有複數試片,該基材載具可置放該些試片。The coating device of the variable angle according to claim 1, wherein the substrate to be plated has a plurality of test pieces, and the substrate carrier can place the test pieces. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該傾角調變模組更包含:一萬向接頭,固接該昇降套座;以及一萬向連桿,該萬向連桿之二端分別連接該萬向接頭與該基材載具。The adjustable angle coating device of claim 1, wherein the tilt modulation module further comprises: a universal joint that fixes the lift sleeve; and a universal joint, the universal joint The two ends of the connecting rod are respectively connected to the universal joint and the substrate carrier. 如申請專利範圍第1項所述之可調變角度之鍍膜裝置,其中該自轉模組更包含:一中軸齒輪,固接該中軸;以及一配向齒輪,齒合該中軸齒輪且連接該基材載具,該中軸被該轉動馬達轉動而連動該配向齒輪,致使該基材載具自轉。The coating device of the variable angle according to the first aspect of the invention, wherein the rotation module further comprises: a center shaft gear fixed to the center shaft; and an alignment gear that meshes the center shaft gear and connects the substrate The carrier is rotated by the rotating motor to interlock the alignment gear, so that the substrate carrier rotates. 一種可調變角度之鍍膜裝置,用以置放複數待鍍基材,該可調變角度之鍍膜裝置包含: 複數基材載具,各該基材載具包含一載面,各該載面置放其中一該待鍍基材;一自轉模組,包含:一中軸,連接各該基材載具,該中軸之延伸方向與該載面之延伸方向相交一夾角;及一轉動馬達,連動該中軸而使各該基材載具自轉;一傾角調變模組,包含:具有一昇降套座的至少一昇降件,該昇降套座可位移地套接該中軸,令該昇降件平行於該中軸之延伸方向位移,且該昇降件連接各該基材載具;及一昇降馬達,帶動該昇降件位移而連動各該基材載具,致使該夾角調變;以及一公轉模組,包含:一盤座,固接該轉動馬達與該昇降馬達;一轉軸,該轉軸之一端連接該盤座;及一公轉馬達,連接該轉軸之另一端,該公轉馬達藉由該轉軸水平轉動該盤座而連動該中軸,致使各該基材載具繞該盤座公轉。A variable angle coating device for placing a plurality of substrates to be plated, the adjustable angle coating device comprising: a plurality of substrate carriers, each of the substrate carriers comprising a carrier surface, wherein each of the carrier surfaces is disposed with one of the substrates to be plated; and a rotation module comprising: a central axis connecting the substrate carriers, The extending direction of the central axis intersects with the extending direction of the carrying surface; and a rotating motor interlocking the central shaft to rotate each of the substrate carriers; and a tilting modulation module comprising: at least one having a lifting sleeve a lifting member, the lifting sleeve is slidably sleeved to the central shaft, the lifting member is displaced parallel to the extending direction of the central shaft, and the lifting member is connected to each of the substrate carriers; and a lifting motor drives the lifting member to be displaced And interlocking the substrate carriers to cause the angle modulation; and a revolution module comprising: a disk holder fixed to the rotation motor and the lifting motor; and a rotating shaft, one end of the rotating shaft is connected to the disk holder; A rpm motor is coupled to the other end of the rotating shaft, and the revolving motor rotates the disc shaft horizontally by the rotating shaft to interlock the center shaft, so that each of the substrate carriers revolves around the disc holder. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中該些基材載具之數量為2個、4個、6個或8個。The coating device of the variable angle according to claim 8, wherein the number of the substrate carriers is two, four, six or eight. 如申請專利範圍第8項所述之可調變角 度之鍍膜裝置,其中一該基材載具更包含一升降溫控制器,且該升降溫控制器包含一電熱件、一致冷件及一溫度監控件,該電熱件加熱其中一該待鍍基材之溫度,該致冷件冷卻該待鍍基材之溫度,該溫度監控件監控該待鍍基材之溫度。Adjustable angle as described in item 8 of the patent application The coating device further comprises a temperature rise and fall temperature controller, and the temperature rise and fall temperature controller comprises an electric heating member, a constant cooling member and a temperature monitoring member, wherein the heating element heats one of the substrates to be plated The temperature of the material, the cooling member cools the temperature of the substrate to be plated, and the temperature monitoring member monitors the temperature of the substrate to be plated. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中一該基材載具更包含一通偏壓控制器,該通偏壓控制器控制其中一該基材載具之電壓。The coating device of the variable angle according to claim 8, wherein the substrate carrier further comprises a pass bias controller that controls the voltage of one of the substrate carriers. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中一該待鍍基材具有複數試片,其中一該基材載具可置放該些試片。The coating device of the variable angle according to claim 8, wherein the substrate to be plated has a plurality of test pieces, and one of the substrate carriers can place the test pieces. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中該傾角調變模組更包含:複數萬向接頭,各該萬向接頭固接該昇降套座;以及複數萬向連桿,各該萬向連桿之二端分別連接其中一該萬向接頭與其中一該基材載具。The variable angle coating device of claim 8, wherein the tilt modulation module further comprises: a plurality of universal joints, each of the universal joints fixed to the lift sleeve; and a plurality of To the connecting rod, two ends of each of the universal joints are respectively connected to one of the universal joints and one of the substrate carriers. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中該自轉模組更包含:一中軸齒輪,固接該中軸;以及複數配向齒輪,各該配向齒輪齒合該中軸齒輪且連接其中一該基材載具,該中軸被該轉動馬達轉動而連動各該 配向齒輪,致使各該基材載具自轉。The adjustable angle coating device of claim 8, wherein the rotation module further comprises: a center shaft gear fixed to the center shaft; and a plurality of alignment gears, each of the alignment gear teeth meshing with the center shaft gear Connecting one of the substrate carriers, the central shaft being rotated by the rotating motor to interlock The gears are aligned so that each of the substrate carriers rotates. 如申請專利範圍第8項所述之可調變角度之鍍膜裝置,其中該昇降馬達調整該夾角變小而致使各該基材載具靠攏該中軸,或者該昇降馬達調整該夾角變大而致使各該基材載具遠離該中軸。The coating device of the variable angle according to claim 8, wherein the lifting motor adjusts the angle to become smaller so that each of the substrate carriers is close to the central axis, or the lifting motor adjusts the angle to become larger Each of the substrate carriers is remote from the central axis.
TW104205413U 2015-04-10 2015-04-10 Angled-adjustable coating apparatus TWM509808U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108486542A (en) * 2018-05-18 2018-09-04 辽宁科技大学 A kind of Novel workpiece rotary frame device applied to magnetron sputtering
TWI664305B (en) * 2018-11-13 2019-07-01 聚昌科技股份有限公司 Three dimension revolution and rotation deposition turntable structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108486542A (en) * 2018-05-18 2018-09-04 辽宁科技大学 A kind of Novel workpiece rotary frame device applied to magnetron sputtering
TWI664305B (en) * 2018-11-13 2019-07-01 聚昌科技股份有限公司 Three dimension revolution and rotation deposition turntable structure

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