TWM503056U - Bush unit using for plasma reaction device - Google Patents

Description

Bushing unit for plasma reactor

The present invention relates to a bushing unit for a plasma reactor, and more particularly to an alternative bushing unit.

Today, plasma reaction technology has been widely used in various industries such as the semiconductor manufacturing industry, the display panel manufacturing industry, and the solar cell manufacturing industry. In general, the plasma reaction device is composed of a plurality of cavities (the material comprises aluminum alloy or stainless steel), and the inner wall of the cavity is coated with a protective film or an aluminum oxide layer or a ceramic layer to achieve insulation. And the effect of resistance to plasma erosion.

Plasma reaction chambers are commonly used in a variety of electronic component fabrication processes, such as etching processes, chemical vapor deposition (CVD) processes, and other processes associated with fabricating electronic components on substrates. The plasma density, shape, and electrical characteristics in the reaction chamber are generated and/or controlled using a number of methods, such as capacitive or inductively coupled RE sources typically used in conventional plasma cavities. For example, during a plasma assisted chemical vapor deposition (PECVD) process, a reactive gas is introduced into the reaction chamber through a capacitive coupling nozzle disposed above the semiconductor substrate surrounded by the process fitting. Once the plasma is formed in the PECVD chamber, the plasma reacts with the reactive gas and the substrate to deposit a desired layer of material on the substrate. In general, the characteristics of the plasma formed in the plasma generating region can be improved in the arrangement of electricity. A deposition, etching, and/or cleaning process performed on a substrate or a portion of the reaction chamber downstream of the slurry formation region.

In the conventional plasma reaction chamber design, the generated plasma is disposed on the surface of the substrate. In addition, this design can cause undesired sputtering and damage to the surface of the substrate due to the interaction of electrons formed in the plasma with the surface of the substrate and the substrate. The free ion and the electrically grounded components of the resulting plasma generally accumulate a net charge. The resulting net charge initiates electrons and/or ions formed in the plasma to bombard the exposed surface of the substrate or chamber component and may cause damage to the exposed surface of the substrate or chamber component. Therefore, in some applications, it is desirable to form gas radicals having sufficient energy to readily react with the substrate surface (or chamber component surface) to enhance the reaction rate while not bombarding the substrate or chamber component surface forcefully because of the non-ion The gas radicals are not affected by the charges formed on the surface of the substrate or component. However, it has been found that severe process drift can occur when using the plasma reaction chamber of the coating apparatus. This process drift may be caused by the interaction of the excitation gas through defects in the coating, such as coating porosity or cracks, with the surface of the structural metal component. The problem of coating is particularly acute when the plasma contains an oxide or fluorinated material that tends to attack most commonly used metallic materials, especially at the cell junction.

In view of this, the plasma reactor must be regularly repaired and maintained, and the plating on the inner wall of the reaction chamber should be completely removed, for example, by chemical etching, sand blasting, polishing or turning. However, when deplating is performed by various means, it is possible to cause the loss of the reaction chamber, for example, the thickness of the cavity wall of the reaction chamber is thinned. On the other hand, the inner wall of the reaction chamber may also cause damage to the local cavity wall under the impact of plasma ions for a long time. For the above reasons, when the plasma reactor is used for a certain period of time, it is bound to be damaged. The cavity is replaced. In addition, when the damaged part of the cavity occurs at the junction of the cavity and the cavity, it will result in poor gas density between the cavity or magnetic field displacement during the plasma reaction, so that the subsequent use of plasma produces efficiency. Reduced and insufficient uniformity occurs.

Furthermore, please refer to Fig. 1, which shows a conventional plasma reactor 10. A portion of the plasma reactor 10 is comprised of a three-part chamber, such as the first chamber 11, the second chamber 12, and the third chamber 13 shown in FIG. In the current market, for the convenience of production and assembly, the first cavity 11 of the plasma reactor 10 is generally designed to be identical to the connection surface of the second cavity 12 and the third cavity 13, respectively. The configuration is, for example, designed to be male on both sides for insertion into the interior of the second cavity 12 and the third cavity 13, or both sides are designed as females to accommodate the second cavity 12 And a portion of the third cavity 13.

However, according to the plasma processing principle, the plasma reactor 10 will be produced in operation. The magnetic lines of force in a certain direction easily cause damage to one of the joint faces of the first cavity 11 having the same configuration on both sides. For the above reasons, because the damaged part of the cavity occurs at the junction of the cavity and the cavity, it also causes a poor gas density between the cavities or a magnetic field shift during the plasma reaction, so that subsequent use of plasma is generated. Reduced performance and insufficient uniformity. Therefore, it is necessary to replace the damaged cavity after long-term use, resulting in an increase in the cost of production.

Therefore, it is necessary to provide a plasma reaction device that does not depend on the local part of the cavity. The wall is damaged, resulting in the need to replace the cavity of the entire damaged part. On the other hand, the plasma reaction device can change the configuration of the suitable cavity connection surface according to the direction of the magnetic line generated under actual production, thereby increasing the service life of the cavity of the plasma reaction device.

In order to solve the above problems of the prior art, the purpose of the present invention is to provide a use a bushing unit of the plasma reactor, which is disposed on an inner side wall of the cavity of the plasma reactor, and the bushing unit is replaceable, which on the one hand protects the inner side wall of the cavity of the plasma reactor It will not be damaged by plasma bombardment, or it will cause the loss of the cavity wall when the film is removed. On the other hand, according to the needs of practical applications, the connection surface of the cavity can be set to meet the magnetic field and gas field principle of plasma reaction. Configuration.

For the above purposes, the present invention provides a bushing for a plasma reactor a plasma reaction device having a first cavity and a second cavity, the bushing unit comprising: a first connecting portion for connecting with the first cavity, and the first connecting portion and the The inner side wall of one of the first cavities is complementary in structure; and a second connecting portion is for abutting with one of the second cavities, wherein the lateral sides of the first connecting portion and the second connecting portion are long Different sizes.

In a preferred embodiment of the present invention, the lateral length of the first connecting portion is smaller than the lateral length of the second connecting portion.

In a preferred embodiment of the present invention, after the first connecting portion of the bushing unit is coupled to the first cavity, the second connecting portion of the bushing unit protrudes from the first cavity. a first port, and the second connecting portion is received in the second cavity.

In a preferred embodiment of the present invention, the lateral length of the first connecting portion is larger than the lateral length of the second connecting portion.

In a preferred embodiment of the present invention, after the first connecting portion of the bushing unit is coupled to the first cavity, the abutting portion of the second cavity protrudes into the bushing unit and is received Within the bushing unit.

In a preferred embodiment of the present invention, the plasma reactor includes a third cavity, and the bushing unit further includes a third connection relative to the second connection The bushing unit is continuous with the second cavity and the third connecting portion is for connecting with one of the third cavity abutting portions.

In a preferred embodiment of the present invention, the lateral lengths of the first connecting portion and the third connecting portion are different in size.

In a preferred embodiment of the present invention, at least one of the first connection portion and the second connection portion comprises an annular structure or other geometric structure.

In a preferred embodiment of the present invention, the bushing unit further includes a first bushing and a second bushing, wherein the first bushing and the second bushing respectively comprise The first connecting portion of the cavity is connected to the second connecting portion for connecting to the other cavity, and the first connecting portion and the second connecting portion of the first bushing have different lateral lengths, And the lateral side lengths of the first connecting portion and the second connecting portion of the second bushing are different.

In a preferred embodiment of the present invention, the first bushing and the second bushing respectively comprise a third connecting portion having a complementary structure, and when the first bushing and the second bushing are respectively associated with the first bushing After the one cavity is combined, the third connecting portions of the first bushing and the second bushing are engaged with each other.

In a preferred embodiment of the present invention, the bushing unit further includes a plurality of bushings, wherein the plurality of bushings respectively include the first connecting portion for connecting with the first cavity and for The second connecting portion of the other cavity is different in the lateral side length of the first connecting portion and the second connecting portion of the plurality of bushes.

In a preferred embodiment of the present invention, after the second connecting portion of the bushing unit is butted against the abutting portion of the second cavity, the second connecting portion and the second cavity are formed. A housing space for accommodating an airtight component.

In a preferred embodiment of the present invention, the second connection of the bushing unit The joint portion is formed in a stepped shape, and includes a first step, a second step, and a third step. When the second connecting portion of the bushing unit is butted against the mating portion of the second cavity, the first portion The abutting portion of the two cavity is connected to the first horizontal step surface of the first step and the third horizontal step surface of the third step, and together with the second step forms a capacity for receiving the airtight component Set the space.

The present invention also provides a bushing unit for a plasma reactor, the plasma counter The device has a first cavity and a plurality of second cavities, the bushing unit comprising: a first connecting portion for connecting with the first cavity, and the first connecting portion and the first cavity One of the inner side walls is complementary in structure; and a plurality of second connecting portions are respectively connected to the one of the plurality of second cavities, wherein the first connecting portion and each of the second connecting portions are The lateral side lengths are different in size.

10‧‧‧ Plasma reactor

11‧‧‧First cavity

12‧‧‧Second cavity

13‧‧‧ third cavity

100‧‧‧ plasma reactor

110‧‧‧ Bushing unit

112‧‧‧First connection

114‧‧‧Second connection

120‧‧‧First cavity

122‧‧‧ inner side wall

124‧‧‧First port

130‧‧‧Second cavity

132‧‧‧Docking Department

200‧‧‧ plasma reactor

210‧‧‧ Bushing unit

212‧‧‧First connection

132’‧‧‧Second connection

130’‧‧‧First cavity

230‧‧‧Second cavity

232‧‧‧Docking Department

210'‧‧‧Second bushing unit

300‧‧‧ Plasma reactor

310‧‧‧Blint unit

312‧‧‧ First connection

314‧‧‧Second connection

316‧‧‧ Third connection

320‧‧‧First cavity

322‧‧‧ inner side wall

330‧‧‧Second cavity

332‧‧‧Docking Department

340‧‧‧ third cavity

342‧‧‧Docking Department

400‧‧‧plasma reactor

410‧‧‧ Bushing unit

412‧‧‧First connection

414‧‧‧Second connection

420‧‧‧First cavity

422‧‧‧ inner side wall

500‧‧‧ plasma reactor

510‧‧‧ Bushing unit

501‧‧‧First bushing

505‧‧‧second bushing

512, 512'‧‧‧ first connection

514, 514’ ‧ ‧ second connection

516, 516’ ‧ ‧ third connection

520‧‧‧First cavity

522‧‧‧ inner side wall

600‧‧‧plasma reactor

610‧‧‧Blint unit

602‧‧‧First bushing

604‧‧‧second bushing

606‧‧‧ Third bushing

6022, 6042, 6062‧‧‧ first connection

6024, 6044, 6064‧‧‧second connection

6026, 6046, 6066‧‧‧ third connection

620‧‧‧First cavity

622‧‧‧ inner side wall

700‧‧‧plasma reactor

710‧‧‧ Bushing unit

714‧‧‧Second connection

7142‧‧‧First horizontal step surface

7144‧‧‧Second horizontal step surface

730‧‧‧Second cavity

732‧‧‧Docking Department

750‧‧‧ airtight components

800‧‧‧ plasma reactor

810‧‧‧ Bushing unit

814‧‧‧Second connection

8142‧‧‧First horizontal step surface

8144‧‧‧second horizontal step surface

8146‧‧‧ third horizontal step surface

830‧‧‧Second cavity

832‧‧‧Docking Department

850‧‧‧ airtight components

C1, C2, C3, C1', C2', C3', C1", C2", C3" ‧‧‧ lateral side length dimensions

Figure 1 shows a conventional plasma reactor.

Fig. 2 shows an exploded view of the assembly of the bushing unit and the plasma reactor according to the first embodiment of the present invention.

Figure 3 shows a partial assembled view of Figure 2.

Figure 4 is a cross-sectional exploded view of the bushing unit and the plasma reactor of Figure 2.

Fig. 5 is a cross-sectional exploded view showing a bushing unit and a plasma reactor according to a second embodiment of the present invention.

Figure 6 shows a cross-sectional assembled view of a bushing unit and a plasma reactor in accordance with a third embodiment of the present invention.

Fig. 7 shows an exploded view of the assembly of the bushing unit and the plasma reactor according to the fourth embodiment of the present invention.

Figure 8 is a cross-sectional exploded view of the bushing unit and the plasma reactor of Figure 7.

Fig. 9 is a cross-sectional exploded view showing a bushing unit and a plasma reactor according to a fifth embodiment of the present invention.

Figure 10 shows a cross-sectional assembled view of Figure 9.

Figure 11 is a cross-sectional exploded view showing a bushing unit and a plasma reactor according to a sixth embodiment of the present invention.

Figure 12 shows a partial enlarged view of a bushing unit according to a seventh embodiment of the present invention.

Figure 13 shows a partial enlarged view of a bushing unit according to an eighth embodiment of the present invention.

In order to make the above and other objects, features and advantages of the present invention more comprehensible, the preferred embodiments of the present invention will be described in detail below.

Referring to FIGS. 2, 3, and 4, there is shown a bushing unit 110 for a plasma reactor 100 according to a first embodiment of the present invention, wherein FIG. 2 shows the bushing unit 110 and An exploded view of the assembly of the plasma reactor 100, FIG. 3 shows a partial assembled view of the bush unit 110 and the plasma reactor 100 of FIG. 2, and FIG. 4 shows the bush unit 110 of FIG. A cross-sectional exploded view of the plasma reactor 100. The plasma reactor 100 has a first cavity 120 and a second cavity 130, and the bushing unit 110 includes a first connecting portion 112 and a The second connecting portion 114.

As shown in FIGS. 2 to 4, the first connecting portion 112 of the bushing unit 110 The first cavity 120 is connected to the first cavity 120, and the inner sidewalls 122 of the first connecting portion 112 and the one of the first cavity 120 are complementary to each other. As shown in the first embodiment of the present invention, the outer sidewall of the first connecting portion 112 and the inner sidewall 122 of the first cavity 120 have an annular structure. It can be understood that the outer side walls of the first connecting portion and the inner side walls of the first cavity 120 which are combined with each other in other embodiments may be geometric structures complementary to each other.

On the other hand, in order to make the outer side of the first connecting portion 112 of the bushing unit 110 A tight fit between the wall and the inner sidewall 122 of the first cavity 120 can be complemented by, for example, a connecting surface between the outer sidewall of the first connecting portion 112 and the inner sidewall 122 of the first cavity 120. The thread can be tightly locked between the two, or the ceramic heat sink or the vacuum screw can be applied to the joint surface of the two, but is not limited thereto. In addition, any method that can make the outer side wall of the first connecting portion 112 of the bushing unit 110 and the inner side wall 122 of the first cavity 120 fit tightly can be applied to other embodiments of the present invention. in.

As shown in FIGS. 2 to 4, the first connecting portion 112 of the bushing unit 110 The first cavity 120 is mounted through the first port 124 of the first cavity 120, and after being combined with the first cavity 120, the second connecting portion 114 of the bushing unit 110 is caused to protrude. Extending out of the first port 124 of the first cavity 120. Next, the bushing unit 110 is assembled with the second cavity 130. As shown in the figure, the second connecting portion 114 of the bushing unit 110 is for abutting with one of the abutting portions 132 of the second cavity 130.

As shown in FIGS. 2 to 4, the first connecting portion 112 of the bushing unit 110 The lateral side length dimension C1 is different from the lateral side length dimension C2 of the second connecting portion 114. More specific It is to be noted that, as shown in the first embodiment of the present invention, the lateral side length dimension C1 of the first connecting portion 112 is smaller than the lateral side length dimension C2 of the second connecting portion 114, but in other embodiments, the The lateral side length dimension C1 of one of the connecting portions 112 is designed to be larger than the lateral side length dimension C2 of the second connecting portion 114.

Furthermore, the second connecting portion 114 of the bushing unit 110 and the second cavity 130 Preferably, prior to bonding, an O-ring and/or a ceramic ring and/or a vacuum paste are placed around the outer sidewall of the second connecting portion 114 such that the first cavity 120 and the second cavity 130 When combined, it has a better gas density. In addition, any method that achieves a better airtight effect can be applied to other embodiments of the present creation.

Please refer to FIG. 5, which shows a bushing according to a second embodiment of the present invention. A cross-sectional exploded view of unit 210 and plasma reactor 200. The plasma reactor 200 includes a first cavity 130' and a second cavity 230, and the bushing unit 210 includes a first connecting portion 212 and a second connecting portion 132'.

As shown in FIG. 5, the first connecting portion 212 of the bushing unit 210 is located at the same. The outer side wall of the bushing unit 210 and the second connecting portion 132' of the bushing unit 210 are located on the inner side wall of the bushing unit 210, wherein the lateral side of the first connecting portion 212 of the bushing unit 210 is long. The dimension C1 is different from the lateral side length dimension C2 of the second connecting portion 132'. More specifically, the lateral side length dimension C1 of the first connecting portion 212 is larger than the lateral side length dimension C2 of the second connecting portion 132'.

As shown in FIG. 5, the first connecting portion 212 of the bushing unit 210 and the first The inner sidewalls of the cavity 130' are structurally complementary to one another such that the two can be joined to each other. Because the second connecting portion 132 ′ of the bushing unit 210 is located on the inner side wall of the bushing unit 210 , after the first connecting portion 212 of the bushing unit 210 is combined with the first cavity 130 ′, One of the abutting portions 232 of the second cavity 230 protrudes into the bushing unit 210 and is received in the bushing unit 210, wherein the The abutting portion 232 is part of the outer side wall of the second cavity 230. Furthermore, as shown, the second cavity 230 can be formed by assembling a single cavity with a second bushing unit 210'.

On the other hand, the single bushing unit of this creation can also react with a plurality of plasmas. The chambers of the device are combined. For example, in a preferred embodiment, the plasma reactor may include a first cavity and a plurality of second cavities, and the bushing unit may include a first connecting portion and a plurality of second connecting portions. Wherein the first connecting portion is for connecting with the first cavity, and the first connecting portion is complementary to the structure of the inner side wall of one of the first cavity. In addition, the plurality of second connecting portions are respectively used for docking with one of the plurality of second cavities. In order to more clearly illustrate the technical solutions of the above embodiments, please refer to the detailed description of the third embodiment described below.

Please refer to FIG. 6 , which shows a bushing according to a third embodiment of the present invention. A partial cross-sectional view of unit 310 in combination with plasma reactor 300. The plasma reaction device 300 includes a first cavity 320, a second cavity 330, and a third cavity 340, and the bushing unit 310 includes a first connecting portion 312, a second connecting portion 314, and a third portion. Connection portion 316. It should be noted that the second cavity 330 and the third cavity 340 in this embodiment are equivalent to the plurality of second cavities described above, and the second connecting portion 314 and the third connection in this embodiment. The portion 316 corresponds to the plurality of second connecting portions described above. Moreover, although the second cavity 330 and the third cavity 340 shown in FIG. 6 have the same configuration and size, in other preferred embodiments, different configurations and sizes may be included. The plurality of second cavities, and the corresponding plurality of second connections are also disposed to have different configurations and sizes.

As shown in FIG. 6, the second connecting portion 314 and the third connecting portion of the bushing unit 310 The connecting portions 316 are respectively located at opposite sides of the first connecting portion 312, and the first connecting portion 312, the second connecting portion 314 and the third connecting portion 316 are all formed on the outer side of the bushing unit 310. The first connecting portion 312 is configured to be coupled to the inner side wall 322 of the first cavity 320. The bushing unit 310 is coupled to the abutting portion 332 of the second cavity 330 such that the bushing unit 310 is continuous with the second cavity 330, and further by the The third connecting portion 316 is combined with one of the abutting portions 342 of the third cavity 340. The abutting portion 332 belongs to a portion of the inner side wall of the third cavity 340.

As shown in FIG. 6, the outer side walls of the opposite ends of the bushing unit 310 are also designed. The configuration of the male. That is, after the outer sidewall of the first connecting portion 312 of the bushing unit 310 is combined with the inner sidewall 322 of the first cavity 320, the second connecting portion 314 and the third portion of the bushing unit 310 are made. The connecting portion 316 protrudes from the opposite two ports of the first cavity 320, respectively. It should be noted that, in another embodiment, according to the plasma processing principle, according to the direction of magnetic lines of force generated by the plasma reaction device 300, the same as the bush unit 310 of the embodiment. One of the two connecting portions 314 and the third connecting portion 316 is designed as a female head. Then, a cavity of the second bushing unit is disposed on the cavity, and one end of the cavity is protruded from the port of the cavity (such as the second cavity 230 of the second embodiment shown in FIG. 5). That is to say, one of the connecting portions of the bushing unit is disposed on the inner side wall portion of the bushing unit for receiving the abutting portion of the mating cavity.

As shown in FIG. 6, the lateral side of the first connecting portion 310 of the bushing unit 310 The long dimension C1 is different from the lateral side length dimension C2 of the second connecting portion 314 and the third connecting portion 316. More specifically, the lateral side length dimension C1 of the first connecting portion 310 is greater than the lateral side length dimension C2 of the second connecting portion 314 and the third connecting portion 316. It should be noted that the number of the second cavity and the third cavity shown in the third embodiment of the present invention is merely an example, and further, it should be matched with the type and type of the plasma reaction device, and the bushing unit is connected. The number of cavities can be plural and is not intended to limit the creation.

Please refer to FIG. 7 and FIG. 8 , and FIG. 7 shows a fourth real according to the present creation. The exploded view of the assembly of the bushing unit 410 and the plasma reactor 400 of the embodiment, and the exploded view of the section of the plasma reactor 400 of FIG. The plasma reaction device 400 includes a first cavity 420 having an inner sidewall 422, and the bushing unit 410 includes a first connecting portion 412 and a second connecting portion 414, wherein the first connecting portion 412 is For bonding with the first cavity 420 and the second connecting portion 414 for combining with a second cavity (not shown).

As shown in FIGS. 7 and 8, for the first connection with the bushing unit 410 The inner side wall 422 of the first cavity 420 combined with the portion 412 exhibits a long disc type structure, which is different from the ring type structure in the foregoing embodiment. Moreover, the dimension of the largest lateral side length C1 of the first connecting portion 412 is greater than the dimension of the lateral side length C2 of the second connecting portion 414 of the bushing unit 410.

Please refer to FIG. 9 and FIG. 10, and FIG. 9 shows a fifth embodiment according to the present creation. The cross-sectional exploded view of the bushing unit 510 and the plasma reactor 500 of the embodiment, and the cross-sectional assembled view of Fig. 9 are shown in Fig. 10. The plasma reaction device 500 includes a first cavity 520 having an inner sidewall 522, and the bushing unit 510 includes a first bushing 501 and a second bushing 505 disposed in the first cavity 520. The opposite ends of the first bushing 501 and the second bushing 505 respectively comprise a first connecting portion 512 and 512' for connecting with the first cavity 520 and for connecting with another cavity ( The second connecting portions 514 and 514' are connected.

As shown in FIGS. 9 and 10, the first bushing 501 of the bushing unit 510 and The second bushings 505 are all in an irregular geometric configuration. The first bushing 501 and the second bushing 505 respectively include structurally complementary third connecting portions 516 and 516 ′, and when the first bushing 501 and the second bushing 505 are respectively coupled to the first cavity 520 After the upper and lower joints, the third connecting portions 516 and 516' of the first bushing 501 and the second bushing 505 are further engaged with each other. It is worth noting that these third companies The joints 516 and 516' comprise configurations in which the various structures are complementary, such as barbed, beveled or the like.

As shown in FIG. 9 and FIG. 10, the first connecting portion 512 of the first bushing 501 The maximum lateral side length dimension is defined as C1, the lateral side length dimension of the second connecting portion 514 of the first bushing 501 is defined as C2, and the lateral side length of the third connecting portion 516 of the first bushing 501. The size is defined as C3, where C1, C2, and C3 are all different in size. Similarly, the lateral side length dimension C1' of the first connecting portion 512' of the second bushing 505 and the lateral side length dimension C2' of the second connecting portion 514' and the lateral direction of the third connecting portion 516', respectively. Side length C3' is different.

Referring to FIG. 11, a bushing according to a sixth embodiment of the present invention is shown. A cross-sectional exploded view of element 610 and plasma reactor 600. The plasma reaction device 600 includes a first cavity 620 having an inner sidewall 622, and the bushing unit 610 includes a first bushing 602, a second bushing 604, and a third bushing 606. The first bushing 602 and the second bushing 604 are disposed at one end of the first cavity 620 , and the third bushing 606 is disposed at the opposite end of the first cavity 620 . The first bushing 602, the second bushing 604 and the third bushing 606 respectively include a first connecting portion 6022, 6042, 6062 for connecting with the first cavity 620 and for another cavity (not shown) the connected second connecting portions 6024, 6044, 6064.

As shown in FIG. 11, the maximum of the first connecting portion 6022 of the first bushing 602 The lateral side length dimension is defined as C1, the lateral side length dimension of the second connecting portion 6024 is defined as C2, and the lateral side length dimension of the third connecting portion 6026 is defined as C3, wherein the size of C1 is different from the sizes of C2 and C3. . Similarly, the lateral side length dimension C1 of the first connecting portion 6042 of the second bushing 604 and the lateral side length dimension C2' of the second connecting portion 6044 and the lateral side length dimension of the third connecting portion 6046, respectively. C3' is different; and the lateral length of the first connecting portion 6062 of the second bushing 606 The inch C1" is different from the lateral side length dimension C2" of the second connecting portion 6064 and the lateral side length dimension C3" of the third connecting portion 6066, respectively.

As shown in FIG. 11 , the first bushing 602, the second bushing 604 and the third lining The sleeves 606 respectively include third connecting portions 6026, 6046, and 6066 having complementary structures, and when the first bushing 602, the second bushing 604, and the third bushing 606 are respectively coupled to the first cavity 620, The third connecting portions 6026, 6046, and 6066 of the first bushing 602, the second bushing 604, and the third bushing 606 are further joined to each other.

According to the above embodiment, in addition to the one-piece bushing unit corresponding to one or more cavities, the multi-piece bushing unit can also correspond to a single cavity. For example, according to the fifth embodiment of the present creation, the bushing unit 510 includes a first bushing 501 and a second bushing 505, and the bushings are respectively combined with the same first cavity 520, or, as in the sixth The embodiment includes a three-piece bushing unit 610, but is not limited thereto.

Referring to Fig. 12, there is shown a partial enlarged view of a bushing unit 710 according to a seventh embodiment of the present invention. In this embodiment, the second connecting portion 714 of the bushing unit 710 has a two-step shape and includes a first horizontal step surface 7142 and a second horizontal step surface 7144. After the second connecting portion 714 of the bushing unit 710 is butted against a mating portion 732 of the second cavity 730, the abutting portion 732 of the second cavity 730 and a portion of the first horizontal step surface 7142 and The second horizontal step surface 7144 is connected, and a sealed accommodating space is formed between the second connecting portion 714 and the second cavity 730. The accommodating space can be used to accommodate an airtight member 750, such as an airtight ring.

Referring to Fig. 13, there is shown a partial enlarged view of a bushing unit 810 according to an eighth embodiment of the present invention. The appearance of the second connecting portion 814 of the bushing unit 810 presents three The stepped shape of the step includes a first step having a first horizontal step surface 8142, a second step having a second horizontal step surface 8144, and a third step having a third horizontal step surface 8146. After the second connecting portion 814 of the bushing unit 810 is butted against a mating portion 832 of the second cavity 830, the abutting portion 832 of the second cavity 830 and the first step of the bushing unit 810 The first horizontal step surface 8142 is connected to the third horizontal step surface 8146 of the third stage, and the abutting portion 832 of the second cavity 830 and the second step together form a capacity for accommodating an airtight member 850. Set the space. It should be noted that in the present creation, the airtight structure provided as shown in the above FIG. 12 or FIG. 13 makes it possible to ensure the first cavity without providing an additional ceramic ring. The bushing unit of the body has a good airtight effect with the second cavity, thereby reducing the manufacturing cost. In addition, the above problems can also avoid problems of air leakage and plasma corrosion caused by thermal deformation and distortion of the cavity.

Although the present invention has been disclosed above in the preferred embodiment, it is not intended to limit the present invention. Creation, who has the usual knowledge in the technical field of this creation, can make various changes and refinements without departing from the spirit and scope of this creation. Therefore, the scope of protection of this creation is defined by the scope of the patent application attached. Prevail.

100‧‧‧ plasma reactor

110‧‧‧ Bushing unit

112‧‧‧First connection

114‧‧‧Second connection

120‧‧‧First cavity

122‧‧‧ inner side wall

124‧‧‧First port

130‧‧‧Second cavity

132‧‧‧Docking Department

C1, C2‧‧‧ lateral side length dimensions

Claims (14)

A bushing unit for a plasma reactor, the plasma reactor having a first cavity and a second cavity, the bushing unit comprising: a first connecting portion for the first cavity Connecting, and the first connecting portion is complementary to the structure of the inner side wall of the first cavity; and a second connecting portion for abutting with the one of the second cavity, wherein the first connecting portion and Both of the second connecting portions have different lateral side lengths. The bushing unit of claim 1, wherein the first connecting portion has a lateral side length dimension smaller than a lateral side length dimension of the second connecting portion. The bushing unit of claim 1, wherein the second connecting portion of the bushing unit protrudes from the first connecting portion of the bushing unit One of the first ports of the cavity, and the second connecting portion is received within the second cavity. The bushing unit of claim 1, wherein the first connecting portion has a lateral side length dimension greater than a lateral side length dimension of the second connecting portion. The bushing unit of claim 1, wherein the abutting portion of the second cavity protrudes into the bushing unit after the first connecting portion of the bushing unit is coupled to the first cavity And housed in the bushing unit. The bushing unit of claim 1, wherein the plasma reaction device comprises a third cavity, and the bushing unit further comprises a third connecting portion, the lining relative to the second connecting portion The sleeve unit is continuous with the second cavity and the third connection portion is for connecting with one of the third cavity abutments. The bushing unit of claim 6, wherein the first connecting portion and the third connecting unit The lateral side lengths of the joints are different in size. The bushing unit of claim 1, wherein at least one of the first connecting portion and the second connecting portion comprises an annular structure or other geometric structure. The bushing unit of claim 1, further comprising a first bushing and a second bushing, wherein the first bushing and the second bushing respectively comprise a first cavity and the first cavity Connecting the first connecting portion and the second connecting portion for connecting to another cavity, wherein the first connecting portion and the second connecting portion of the first bush have different lateral side lengths, and The first side connecting portion and the second connecting portion of the second bushing have different lateral side lengths. The bushing unit of claim 9, wherein the first bushing and the second bushing respectively comprise a structurally complementary third connecting portion, and when the first bushing and the second bushing respectively After the first cavity is combined, the third connecting portions of the first bushing and the second bushing are engaged with each other. The bushing unit of claim 1, further comprising a plurality of bushings, wherein the plurality of bushings respectively comprise the first connecting portion for connecting with the first cavity and for The second connecting portion of the cavity is different in the lateral length of the first connecting portion and the second connecting portion of the plurality of bushes. The bushing unit of claim 1, wherein the second connecting portion and the second cavity are after the second connecting portion of the bushing unit is butted against the abutting portion of the second cavity An accommodating space is formed between the two to accommodate an airtight component. The bushing unit of claim 12, wherein the second connecting portion of the bushing unit is formed in a stepped shape, including a first step, a second step, and a third step, when the lining After the second connecting portion of the sleeve unit is mated with the abutting portion of the second cavity, the second cavity is The abutting portion is connected to the first horizontal step surface of the first step and the third horizontal step surface of the third step, and together with the second step forms the receiving space for accommodating the airtight member. A bushing unit for a plasma reactor, the plasma reactor having a first cavity and a plurality of second cavities, the bushing unit comprising: a first connecting portion for the first cavity The body is connected to the body, and the first connecting portion is complementary to the structure of the inner side wall of the first cavity; and the plurality of second connecting portions are respectively for docking with one of the plurality of second cavity portions, wherein the The lateral lengths of the first connecting portion and each of the second connecting portions are different in size.