TWM491046U - Vacuum furnace body - Google Patents

Vacuum furnace body Download PDF

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Publication number
TWM491046U
TWM491046U TW103210016U TW103210016U TWM491046U TW M491046 U TWM491046 U TW M491046U TW 103210016 U TW103210016 U TW 103210016U TW 103210016 U TW103210016 U TW 103210016U TW M491046 U TWM491046 U TW M491046U
Authority
TW
Taiwan
Prior art keywords
evaporation
target
source
furnace body
baffle
Prior art date
Application number
TW103210016U
Other languages
Chinese (zh)
Inventor
Shih-Yuan Sung
Original Assignee
Sung Yu Chi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CN201420140625.3U priority Critical patent/CN203741405U/en
Application filed by Sung Yu Chi filed Critical Sung Yu Chi
Publication of TWM491046U publication Critical patent/TWM491046U/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Abstract

Disclosure is related to a vacuum furnace body. The vacuum furnace body includes the body of the furnace (11), evaporation source (A), hanging part (14) which is used to held the object to be plated (B), rotary table (C) which is used to held and move the hanging part (14); the confined space (S) formed by the soleplate (111), the ektexine (112), the wall (113) and the top plate of the body of the furnace (11); the body of the furnace (11) further includes a first baffle (17) and a second baffle (18); the first baffle (17) and the second baffle (18) are separated by a distance, and divide the confined space (S) into a first partitioned space (S1) and a second partitioned space (S2). This invention could preclude instantly generated oxygen substance and avoid the object to be plated (B) contaminated by oxygen substance. With this invention, the object to be plated (B) could be prevented from false attachment, and the stability of the product quality could be enhanced.

Description

Vacuum furnace

The present invention relates to a vacuum furnace body.

The world is now using round furnace design. Always cause PVD (Physical Vapor Deposition) coating (coating), there are many blind spots.

During production, the product often appears to be falsely attached, and the film is leaking. Pseudo-adhesion is a technical problem that cannot be seen and is the most headache of PVD coating (coating). Severe false attachment can be detected immediately after the furnace is leaked. The most feared is the slight falseness. It is often the product that comes to the market that the PVD coating (coating) leaks white and affects goodwill.

Referring to Figures 1-3, the vacuum furnace body 1' of a circular furnace body design in the world includes a vacuum chamber 11', an evaporation target 12', an evaporation target 13', an object hanger 14', a self-rotating frame 15' and a public Turntable 16'.

The evaporation target 12' is distributed on the outer surface of the vacuum chamber 11'. The prior art structure causes the entire vacuum chamber 11' to be covered with various deposited titanium dust, residue and oxidizing species R. The mixed gas is released during the heating process, and it is easy to contaminate the surface of the object to be coated, thereby causing false adhesion, causing the color to be irregular, and the residue is likely to fall on the object to be plated to cause whitening, and the temperature during the coating process is always rising. It is necessary to stop the machine and wait for the temperature to cool down to the required temperature before the coating can be followed. Referring to Figure 2, the evaporation target 13' is distributed within the vacuum chamber 11'. It can be seen that the target source and the target source cannot mutually Cross evaporation. It is easy to cause the dead zone 17', and it is easy to cause the object to be plated to have the same film thickness at the concave corner position as the positive angle position, so that the film thickness of the PVD coating (coating) is not uniform. The larger the furnace body, the more uneven the PVD coating (coating) film thickness. The concave corner position is larger and more serious than the PVD coating (coating) film thickness at the positive angular position. The plated product on the object hanger 14' cannot be rotated. After PVD coating (coating), the film thickness of the product cannot be uniform, such as 4un film thickness. The error value is about 0.5un-1un.

The present invention proposes a vacuum furnace body and a physical vapor deposition coating (coating) method for the vacuum furnace body to solve the above technical problems.

Based on this, it is necessary to provide a vacuum furnace body and a physical vapor deposition coating method for the vacuum furnace body, which solves the technical problem of pseudo adhesion.

The invention provides a vacuum furnace body, comprising a furnace body body, an evaporation source, an object hanger for placing the object to be plated, a turntable for placing the object hanger and moving the object hanger; the furnace body comprises a bottom plate, An outer wall extending from the bottom plate, an inner wall bent from the bottom plate and spaced apart from the outer wall, a top plate connecting the outer wall and the inner wall, and a closed space formed by the bottom plate, the outer wall, the inner wall and the top plate; the furnace The body body further includes a first baffle and a second baffle disposed in the confined space respectively connected to the bottom plate, the outer wall, the inner wall and the top plate; the first baffle and the second baffle are separated by a certain distance and the The sealed space is partitioned into a first partition space and a second partition space; the first baffle and the second baffle are movably connected to the outer wall or the inner wall; the evaporation source is disposed in the first partition space, the object hanger and the turntable are disposed In the second partition space; when the first baffle and the second baffle are opened, the turntable separates the object hanger from the second The space moves into the first compartment.

Preferably, the evaporation source comprises a first evaporation source and a second evaporation source, the outer wall comprises a first outer wall located in the first separation space and a second outer wall connected to the first outer wall in the second separation space, the inner wall comprising the first outer wall a first inner wall of the partition space and a second inner wall connected to the first inner wall of the second partition space; the first evaporation source and the second evaporation source are respectively disposed on the first outer wall and the first inner wall, and the first evaporation The source and the second evaporation source are disposed opposite each other.

Preferably, the evaporation source comprises an evaporation target and an evaporation target source that powers the evaporation target.

Preferably, the outer wall of the body of the furnace has at least two doors.

Preferably, the evaporation target source comprises any one of an arc target source or a planar target source, an intermediate frequency cylindrical target source, and a direct current target source, or any combination thereof.

The present invention also provides a vacuum furnace body comprising a sealed vacuum chamber partitioned into a separate object area and a target evaporation area by a baffle; an object area for placing the object to be plated; and a target evaporation area And a physical vapor deposition coating for the object to be plated; the vacuum furnace body further comprising a control component for opening the baffle to communicate the separated object region with the target evaporation zone; and a conveying component for moving the object to be plated from the object The zone moves to the target evaporation zone.

Preferably, the target evaporation zone is oppositely disposed with a first evaporation source and a second evaporation source.

Preferably, the first evaporation source and the second evaporation source respectively comprise an evaporation target and are evaporated a target powered evaporative target; the baffle includes a first baffle and a second baffle.

By adopting the vacuum furnace body provided by the present invention, the evaporation source and the object to be plated are respectively placed in two separate regions, which can eliminate the oxygen substances generated in an instant and prevent the oxygen substances from being contaminated on the surface of the object to be plated, thereby avoiding the object to be plated. Produces false adhesion and improves the stability of product quality.

The new type of evaporation source and the object to be plated are placed in two separate areas. During the production process, various residues, titanium dust and oxides remain in the separate evaporation chamber of the vacuum chamber, and are easily removed completely. The physical vapor deposition coating film has a uniform thickness. There is no invalid evaporation area.

Since two sets of evaporation sources are used, the inner and outer target sources are mutually evaporated, and the physical vapor deposition coating film has a uniform thickness. The thickness of the concave-angle seat and the positive-angle seat physical vapor deposition coating film is uniform.

10‧‧‧Vacuum body

10"‧‧‧Vacuum furnace body of another embodiment

11‧‧‧ furnace body

111‧‧‧floor

112‧‧‧ outer wall

113‧‧‧ inner wall

11a‧‧‧One of the three doors of the second compartment

11b‧‧‧Two of the three doors of the second compartment

11c‧‧‧Two of the three doors of the second compartment

11d‧‧‧The door to the first compartment

12‧‧‧ evaporation target

12’‧‧‧Evaporation target for existing vacuum furnaces

13‧‧‧ evaporation target

13’‧‧‧Evaporation target for existing vacuum furnaces

14‧‧‧ Object pendant

14’‧‧‧Items for existing vacuum furnaces

15'‧‧‧Automatic vacuum furnace body

15"‧‧‧An autobiographical public form of another embodiment

16‧‧‧public turntable

16’‧‧‧The main turntable of the existing vacuum furnace body

16"‧‧‧ Another embodiment of the male turntable

17‧‧‧First baffle

17’‧‧‧Invalid dead zone of prior art vacuum furnace

17"‧‧‧First baffle of another embodiment

18‧‧‧second baffle

18"‧‧‧ second baffle of another embodiment

19‧‧‧ Schematic diagram of the internal structure of another embodiment

A‧‧‧ evaporation source

A1‧‧‧First evaporation source

A2‧‧‧second evaporation source

A"‧‧‧An evaporation source of another embodiment

A1"‧‧‧ The first evaporation source of another embodiment

A2"‧‧‧Second evaporation source of another embodiment

B‧‧‧Platted objects

C‧‧‧ turntable

C"‧‧‧ Turntable of another embodiment

D"‧‧‧ another embodiment of the baffle

L‧‧‧ ions

R‧‧‧Oxidizing substances

S‧‧‧Confined space

S1‧‧‧ first compartment

S2‧‧‧Second separation space

S1"‧‧‧ target evaporation zone of another embodiment

S2"‧‧‧An object area of another embodiment

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic illustration of a prior art vacuum furnace body provided by the present invention.

Fig. 2 is an internal structural diagram of Fig. 1.

Fig. 3 is a plan view of Fig. 1.

Figure 4 is a schematic view showing the overall structure of an embodiment provided by the present invention.

Fig. 5 is a schematic view showing the internal structure of an embodiment provided by the present invention.

Figure 6 is a schematic view of the operation of the PVD coating provided by the present invention.

Figure 7 is a schematic diagram of the internal structure of an embodiment provided by the present invention (arc target or planar target source, intermediate frequency cylindrical target source and direct current target source).

Figure 8 is a schematic diagram of the internal structure of an embodiment provided by the present invention (arc target or planar target source, intermediate frequency cylindrical target source and direct current target source).

Figure 9 is a schematic diagram of the internal structure of an embodiment provided by the present invention (arc target or planar target source, intermediate frequency cylindrical target source and direct current target source).

The technical solutions of the specific embodiments and the accompanying drawings are described in detail below to make them clearer. The following examples are merely illustrative of the more detailed embodiments of the present invention and are not intended to limit the invention.

Embodiment 1

Referring to Figures 4-7 and 9, the vacuum furnace body 10 of the present invention includes a furnace body 11, an evaporation source A, and an object hanger 14 for placing the object B to be placed for the object hanger 14 and The turntable C of the object hanger 14 is moved.

The furnace body 11 includes a bottom plate 111, an outer wall 112 bent from the bottom plate 111, an inner wall 113 bent from the bottom plate 111 and spaced apart from the outer wall 112, and a top plate (not labeled) connecting the outer wall 112 and the inner wall 113. A sealed space (vacuum chamber) S is formed by the bottom plate 111, the outer wall 112, the inner wall 113, and the top plate.

The furnace body 11 further includes a first baffle 17 and a second baffle 18 disposed in the partition space S respectively connected to the bottom plate 111, the outer wall 112, the inner wall 113 and the top plate; the first baffle 17 and the first baffle The two baffles 18 are separated by a certain distance and divide the separation space S into a first separation space S1 and a second separation space S2; the first baffle 17, the second baffle 18 and the outer wall 112 or the inner wall 113 active connections.

The evaporation source A is disposed in the first separation space S1, and the object hanger 14 and the turntable C are disposed. In the second separation space S2.

When the first flap 17 is opened, the turntable C moves the article hanger 14 from the second partition space S2 into the first partition space S1. The evaporation source A includes a first evaporation source A1 and a second evaporation source A2. Of course, there can be only one evaporation source.

The outer wall 112 includes a first outer wall located in the first partition space S1 and a second outer wall located in the second partition space S2. The inner wall 113 includes a first inner wall located in the first partition space S1 and a second inner space in the second partition space S2 wall. The first outer wall is connected to the second outer wall, and the first inner wall is connected to the second inner wall. That is, the first outer wall, the first inner wall, the bottom plate, and the top plate constitute the first partition space S1; the second outer wall, the second inner wall, the bottom plate, and the top plate constitute the second partition space.

The first evaporation source A1 and the second evaporation source A2 are respectively disposed on the first outer wall and the first inner wall, and the first evaporation source A1 and the second evaporation source A2 are disposed opposite to each other.

Setting two evaporation sources can improve the efficiency of PVD coating (coating). Referring to Figure 6, it can be seen that the two evaporation sources will cross each other to evaporate ions L, improving efficiency.

The evaporation source A includes an evaporation target 12 and an evaporation target source 13 that powers the evaporation target 12.

In the present invention, the evaporation source A is provided with a first separation space, so that residual residues, titanium dust, oxides and the like remain in the production process, and it is easy to completely clean.

The evaporation source A is disposed in the first separation space, and the PVD coating (coating) object is plated by the male-floating horizontal insertion method, the physical vapor deposition coating (coating) film thickness is uniform, and the evaporation target source is disposed in the first separation space.

The evaporation source A is disposed in the first separation space, and the temperature does not rise continuously during the PVD coating (coating), and can be controlled at 100-500 degrees Celsius. No need to stop waiting for cooling, you can continue coating coating. The second compartment can be installed with temperature and cooling control system.

The evaporation source A is set in the first separation space, and is regularly cleaned, and the cleaning time is about 2 hours or less to start the new startup.

The evaporation source A is disposed in the first separation space, and the vacuum chamber can be infinitely enlarged without an invalid evaporation region. The evaporation source of the two groups cross-evaporated, the PVD coating (coating) film thickness is very uniform, the concave corner position and the positive angle position PVD coating are quite uniform, and the PVD coating (coating) film thickness 4un error value is about 0.02un or less.

The outer wall of the furnace body 11 is provided with at least two doors. In the improved embodiment of the present invention, referring to FIG. 4, one door 11d is disposed in the first partition space, and the third partition space is three doors, respectively 11a, 11b. , 11c. This is convenient for cleaning and cleaning.

The turntable C includes a self-rotating turntable 15 and a male turntable 16, and the object to be plated is placed on the object hanger 14, and the object hanger 14 is disposed on the self-rotating plate 15 and is rotatably connected to the male turntable 16 from the turntable 15. The object to be plated is moved from the object area S2 into the target evaporation zone S1 by the rotation of the male turntable 16.

The evaporation target source 13 can be any one of an arc target source or a planar target source, an intermediate frequency cylindrical target source, and a direct current target source, or any combination thereof.

Since the vacuum furnace body divides the vacuum furnace body into two spaces, a first partition space and a second partition space through the first baffle and the second baffle, the PVD coating (coating) in the first partition space can be adjusted in advance. The condition of the parameter, after the conditions of each parameter of the PVD coating are satisfied, the object to be plated is moved from the second separation space into the first separation space. In this way, the oxygen species generated in an instant can be eliminated, and the oxygen species can be prevented from being contaminated on the surface of the object to be plated, thereby avoiding false adhesion of the object to be plated and improving the stability of the product quality.

Embodiment 2

In another embodiment, referring to Fig. 8, another vacuum furnace body 10" is provided by the present invention, the vacuum furnace body comprising a separate vacuum chamber, which is separated into a separate object area S2" by a baffle D" and Target evaporation zone S1". The object area S2" is for placing the object B to be plated.

The target evaporation zone S1" is used for physical vapor deposition coating (coating) of the object to be plated.

The vacuum furnace body further includes a control member (not shown) for opening the baffle D" to communicate the object region S2" with the target evaporation region S1.

The conveying member C" is for moving the object to be plated of the object region S2" to the target evaporation region S1".

The target evaporation zone S1" is oppositely disposed with a first evaporation source A1" and a second evaporation source A2".

Of course, an evaporation source is also possible, but the two evaporation sources can improve efficiency, speed, PVD coating (coating) is relatively uniform, PVD coating (coating) is better.

The first evaporation source A1" and the second evaporation source A2" respectively include an evaporation target and an evaporation target source that powers the evaporation target; the shutter D" includes a first shutter 17" and a second shutter 18". There may be only one D" as long as it can isolate the object area S2" from the target evaporation area S1.

In the novel, the evaporation source A" sets the target evaporation zone, so that residual residues, titanium dust, oxides and the like remain in the production process, and it is easy to completely clean.

The evaporation source A" sets the target evaporation zone, and adopts the revolutionary horizontal insertion method to plate the PVD coating (coating) object, and the physical vapor deposition coating (coating) has a uniform film thickness.

Evaporation source A" sets the target evaporation zone, the temperature of the PVD coating (coating) does not rise all the time, can be controlled at 100-500 degrees Celsius. Without stopping the machine to wait for cooling, it can be a physical vapor deposition coating (coating). It can be installed with temperature and cooling control system.

Evaporation source A" sets the target evaporation zone, cleans regularly, and the cleaning time is less than 2 hours. You can start working from a new boot.

Evaporation source A" sets the target evaporation zone, which can infinitely enlarge the vacuum chamber without invalid evaporation zone. The two evaporation sources cross-evaporate each other, the physical vapor deposition coating film thickness is very uniform, the concave corner position and the positive-angle position physical vapor deposition coating ( The coating) is quite uniform, and the physical vapor deposition coating (coating) film thickness 4un error value is about 0.02un or less.

Since the vacuum furnace body is divided into two spaces, a target evaporation zone and an object zone, the conditions of the PVD coating parameters in the target evaporation zone can be adjusted in advance, and the parameters of the PVD coating (coating) are to be satisfied. Thereafter, the object to be plated is moved from the object area into the target evaporation zone. In this way, the oxygen species generated in an instant can be eliminated, and the oxygen species can be prevented from being contaminated on the surface of the object to be plated, thereby avoiding false adhesion of the object to be plated and improving the stability of the product quality.

In the vacuum furnace body, the PVD coating (coating) of the object to be plated is: placing the object B to be placed in the object area S2 of the vacuum furnace body; setting the parameters of the evaporation source A" in the target evaporation zone S1", And the evaporation source A" starts to work; when the parameter reaches the requirement of the physical vapor deposition coating (coating), the baffle D" is opened, and the object to be plated is moved from the object region S2 to the target evaporation region S1 for physical vapor phase. Deposit coating (coating).

The conveying member C" includes a self-rotating wheel 15" and a male turntable 16", the object to be plated is placed on the object hanger 14", and the object hanger 14" is disposed on the self-rotating plate 15", and rotates from the turntable 15" and the male turntable 16" connection. The object to be plated is moved from the object area S2 to the target evaporation zone S1 by the rotation of the male turntable 16".

The evaporation target source may be an arc target source or a planar target source, an intermediate frequency cylindrical target source, and a direct current target source.

Since the vacuum furnace body is divided into two spaces, the current of the evaporation target source and the parameters of the gas parameters can be adjusted in advance, and the PVD coating (coating) is started after stabilization, so that the evaporation target source (including the arc target source or plane) is activated. When the target source, the intermediate frequency cylinder target source and the DC target source) can eliminate the oxygen substances generated instantaneously, the oxygen substance is prevented from being contaminated on the surface of the object to be plated, thereby avoiding false adhesion of the object to be plated and improving the stability of the product quality. .

In this embodiment, three doors are provided in the target evaporation zone, and three doors are provided in the object area. This is convenient for cleaning and cleaning.

The above-mentioned embodiments are merely illustrative of several embodiments of the present invention, and the description thereof is more specific and detailed, but is not to be construed as limiting the scope of the invention. It should be noted that a number of variations and modifications may be made by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of the invention should be determined by the appended claims.

10‧‧‧Vacuum body

11a‧‧‧One of the three doors of the second compartment

11b‧‧‧Two of the three doors of the second compartment

11c‧‧‧Two of the three doors of the second compartment

11d‧‧‧The door to the first compartment

12‧‧‧ evaporation target

Claims (8)

  1. A vacuum furnace body comprising: a furnace body (11), an evaporation source (A), an object hanger (14) for placing the object to be plated (B), for placing and moving the object hanger (14) a turntable (C) of the object hanger (14); characterized in that the furnace body (11) comprises a bottom plate (111), an outer wall (112) extending from the bottom plate (111), and extending from the bottom plate (111) An inner wall (113) spaced apart from the outer wall (112), a top plate connecting the outer wall and the inner wall, and a closed space formed by the bottom plate (111), the outer wall (112), the inner wall (113) and the top plate (S The furnace body (11) further includes a first baffle (17) and a portion disposed in the closed space (S) respectively connected to the bottom plate (111), the outer wall (112), the inner wall (113) and the top plate a second baffle (18); the first baffle (17) and the second baffle (18) are separated by a certain distance and divide the confined space into a first partition space (S1) and a second partition space (S2) The first baffle (17) and the second baffle (18) are movably connected to the outer wall (112) or the inner wall (113); the evaporation source (A) is disposed in the first partition space (S1), The object hanger (14) and the turntable (C) are disposed in the second separation space (S2); 17) When the second flap (18) is opened, the turntable (C) moves the article hanger (14) from the second partition space (S2) into the first partition space (S1).
  2. A vacuum furnace body as claimed in the first aspect of the invention, characterized in that the evaporation source (A) comprises a first evaporation source (A1) and a second evaporation source (A2), and the outer wall (112) comprises the first a first outer wall of the partition space (S1) and a second outer wall of the second partition space (S2) connected to the first outer wall, the inner wall (113) including a first inner wall located at the first partition space (S1) and located a second partition (S2) is connected to the first inner wall; the first evaporation source (A1) and the second evaporation source (A2) are respectively disposed on the first outer wall and the first inner wall, and the first evaporation The source (A1) and the second evaporation source (A2) are oppositely disposed.
  3. A vacuum furnace body as described in the "Scope 1 or 2" of the patent application, characterized in that the evaporation source (A) comprises an evaporation target (12) and an evaporation target source (13) for powering the evaporation target (12).
  4. A vacuum furnace body according to the "Scope 1" of the patent application, characterized in that the outer wall of the furnace body (11) is provided with at least two doors.
  5. The vacuum furnace body of claim 3, wherein the evaporation target source (13) comprises any one of an arc target source or a planar target source, an intermediate frequency cylindrical target source, and a direct current target source, or Any combination thereof.
  6. A vacuum furnace body, characterized in that the vacuum furnace body comprises a closed vacuum chamber, which is separated into a separate object area (S2") and a target evaporation area (S1") by a baffle (D"); (S2") for placing the object to be plated (B); a target evaporation zone (S1") for physically vapor-depositing a substrate to be plated; the vacuum furnace body further comprising control means for opening the baffle (D") to separate the object region (S2") from the target The evaporation zone (S1") communicates; the conveying member (C") is used to move the object to be plated from the object zone (S2") to the target evaporation zone (S1").
  7. A vacuum furnace body according to the "Scope 6" of the patent application, characterized in that the target evaporation zone is oppositely provided with a first evaporation source (A1") and a second evaporation source (A2").
  8. A vacuum furnace body according to the "Scope 7" of the patent application, characterized in that the first evaporation source (A1") and the second evaporation source (A2") respectively comprise an evaporation target and an evaporation target for powering the evaporation target. The source; the baffle (D") includes a first baffle (17") and a second baffle (18").
TW103210016U 2014-03-26 2014-06-06 Vacuum furnace body TWM491046U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420140625.3U CN203741405U (en) 2014-03-26 2014-03-26 Vacuum furnace body

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Publication Number Publication Date
TWM491046U true TWM491046U (en) 2014-12-01

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TW103119695A TWI565925B (en) 2014-03-26 2014-06-06 Vacuum furnace body and the physical vapor deposition coating method of the vacuum furnace body

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TW (2) TWM491046U (en)
WO (1) WO2015143681A1 (en)

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CN106868457B (en) * 2017-03-22 2019-03-12 合肥鑫晟光电科技有限公司 A kind of vapor deposition component and evaporated device

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CN2736368Y (en) * 2004-09-09 2005-10-26 鸿富锦精密工业(深圳)有限公司 Optical coating apparatus
JP2006077308A (en) * 2004-09-13 2006-03-23 Murata Mfg Co Ltd Vacuum deposition apparatus
CN101760720A (en) * 2009-12-30 2010-06-30 东莞宏威数码机械有限公司 Shielding device with vacuum cavity body
CN101876058B (en) * 2010-03-23 2012-07-11 东莞宏威数码机械有限公司 Vacuum evaporation device
JP2012164847A (en) * 2011-02-08 2012-08-30 Sumitomo Electric Ind Ltd Evaluation method of deposition condition in vacuum deposition, and deposition device
CN102978577A (en) * 2011-09-06 2013-03-20 鸿富锦精密工业(深圳)有限公司 Intermediate-frequency magnetron sputtering coating device

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TWI565925B (en) 2017-01-11
TW201537131A (en) 2015-10-01
WO2015143681A1 (en) 2015-10-01

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