M430479 五、新型說明： 【新型所屬之技術領域】 本創作是有關於一種氣體喷麗頭，且特別是有關於一 種具有對稱分佈的進氣孔，應用於led之有機金屬化學氣 相沈積（MOCVD)磊晶的氣體喷灑頭。 【先前技術】 隨著鍍膜製程的發展，在化學氣相沈積的反應過程 中’如何將氣體均勻地喷灑到腔室中便成為重要的問題。 對此’氣體分佈模組（gas distribution module)，特別是氣 體喷麗頭（gas showerhead)扮演了重要的角色。 針對氣體分佈模組或氣體喷灑頭的設計與結構，已經 有數件專利提出。美國專利US 7138336 B2與美國專利US 7641939 B2採用喷灑頭進氣、腔室側邊抽氣的方式控制氣 體進出。美國專利US 6921437揭露一種可預先混合先驅 氣體的氣體分佈模組，但不適用於先驅氣體不可預先混合 的製程。美國專利US 6478872揭露一種將氣體輸送至腔 室的方法，以及用於輸送氣體的噴灑頭。然而該設計的構 造複雜，且製造成本昂貴。 【新型内容】 本創作提供一種氣體喷灑頭，具有加工簡單，且能形 成均勻氣體分佈的優點。 本創作提出一種氣體喷灑頭，至少包括一喷灑頭主 體，其特徵在於：噴灑頭主體具有氣體作用表面及多個進 3 M430479 氣孔’進氣孔總個數在980個〜105〇個之間，進氣孔是沿 氣體作用表面上的兩垂直方向呈45度角對稱分布，盆中二 部份進氣孔的位置被多個觀察孔取代，且所述觀察孔呈 線排列。 在本創作之-實關中’上述各進氣孔之進氣面積例 如在11 mm〜12 mm2之間。 在本創作之-貫關巾，上述進氣孔之間距例如在W mm〜16 mm之間。 在本創作之-實施例中’上述進氣孔的總進氣面積例鲁 如佔氣體作用表面之面積的3%〜1 〇%之間。 在本創作之一實施例中’上述觀察孔的間距例如在2〇 mm〜22 mm之間。 在本創作之一實施例中，上述觀察孔的孔徑例如在7 s mm〜8.5 mm之間。 产在本創作之一實施例中，上述各進氣孔包括：第一進 氣道、錐形開孔以及至少一第二進氣道。其中第一進氣道 用以供應第一氣體。錐形開孔位在氣體作用表面並連接第 一進氣道。第二進氣道與錐形開孔相連通，用以供應第二 氣體》 〜 在本創作之一實施例中，上述至少一第二進氣道是壤 設在第一進氣道之周圍。 在本創作之一實施例中，上述第二進氣道之中心軸與 第一進氣道之中心軸平行。 在本創作之一實施例中，上述第二進氣道之中心軸與 4 第一進氣道之中心軸成一夾角。 體為之—實施例中’上述第—進氣道與噴灑頭主 緊密加二==用螺接、焊接或其它 氣體=;:=中可包括-位於 氣孔=作之—實施射，上述中央排氣口是由多個排 d乍::實施例中’上述中央排氣。之抽氣端向 縣創作之-實施射’上述巾央排氣σ的排氣方向 與進氣孔的進氣方向相互平行。 ，在本創作之-實施财’上述巾央排氣σ之排氣面積 與進氣孔之總進氣面積的比率小於0 03。 在本創作之一實施例中，上述噴灑頭主體更包括至少 一環狀排氣口，環狀排氣口是以中央排氣口為中心呈對稱 方式配置。 在本創作之一實施例中，上述環狀排氣口包括由多數 個排氣孔所構成。 在本創作之一實施例中，上述環狀排氣口之抽氣端向 噴灑頭主體内凹。 在本創作之一實施例中，上述環狀排氣口的排氣方向 與進氣孔的進氣方向相互平行。 基於上述，本創作的氣體噴灑頭具有易於加工的特 M430479 點^可^氣舰錢均勻，藉岭合進氣與排氣，還可 以讓氣體濃度在整個嘴灑區域中趨向一致。 為讓本創作之上述特徵能更明顯易懂，下文特舉實施 例，並配合所附圖式作詳細說明如下。 【實施方式】 圖1是依照本創作第一實施例所繪示的氣體喷麗頭的 立體視圖。圖2Α是圖i的正視圖。請一併參照圖【與圖 2A 〇 第-實施例的氣體嘴灌頭100包括喷麗頭主體ι〇2， 其具有氣體作用表面1G4以及多個進氣孔1G6。多個進氣 孔106沿著氣體作用表面1〇4上互相垂直的第一方向與第 二方向呈45度角對稱分佈。部份進氣孔1〇6的位置被觀察 孔（viewport)取代，且所述觀察孔是以直線排列，進氣 孔106的總個數在980個〜1〇5〇個之間。各進氣孔1〇6的 進氣面積例如在11 mm2〜12 mm2之間。進氣孔1〇6的間距 例如在10 mm〜16 mm之間，且沿第一方向的進氣孔1〇6 之間的間距可以與沿第二方向的進氣孔丨0 6之間的間距相 同或者不同。進氣孔106的總進氣面積例如佔氣體作用表 面104的面積的3%〜10%之間。觀察孔的間距例如2〇 mm 〜22 mm之間。觀察孔的孔徑例如在7.5 mm〜8.5 mm之 間。 在第一實施例中，氣體喷灑頭100還可參考中華民國 專利公開號201111545號(專利名稱:氣體分佈板及其震置) 6 所揭露之氣體分佈板，在此將該申請案以引用的方式併入 本文之中，以供參考。譬如圖2B是沿著圖2A的連 線所繪示的剖面圖。請參照圖2B，進氣孔1〇6包括第一進 氣道106a、錐形開孔106b以及第二進氣道1〇心。第一進 氣道106a例如連通第一氣體供應孔101，第二進氣道106c 例如連通第二氣體供應孔103。第一氣體供應孔1〇1與第 二氣體供應孔103的數目可視需求調整；例如可視氣體喷 灑頭100的尺寸，在喷灑頭主體1〇2上設置一個以上的第 一氣體供應孔101與第二氣體供應孔103。 圖2C是圖2B中單一個進氣孔1〇6的局部放大圖。圖 2D是本發明另一實施例的進氣孔局部放大圖。請參照圖 2C。第一進氣道l〇6a是用以供應第一氣體G1。錐形開孔 106b位在氣體作用表面104，並連接第一進氣道i〇6a。第 二進氣道l〇6c與錐形開孔l〇6b相連通，用以供應第二氣 體G2。其令第二進氣道106c環設在第一進氣道l〇6a周 園，且第二進氣道106c的中心軸a2與第一進氣道l〇6a的 中心軸al平行。在另一實施例中，第二進氣道l〇6c的中 心軸a2與第一進氣道l〇6a的中心轴ai也可以成一夾角 0，如圖2D所示。在前述實施例中，第一進氣道106a與 噴灑頭主體102為一體成型。在其他實施例中，第一進氟 道例如也可以利用螺接、焊接或其他緊密加工方式連接於 噴灑頭主體上。 圖2C還呈現了第一氣體G1與第二氣體G2通過進氣 扎106的情形。當第一氣體G1經由第一進氣道106a進入 M430479 錐形開孔106b時，會因突然擴大的區域而減緩速度，並產 生擴散現象。此時第二氣體G2經由第二進氣道進入 錐形開孔106b，也一樣產生擴散區域。因此，第一氣體 G!與第二氣體G2可以在錐形開孔106b中先期混合，使 得氣體可以更均勻地分佈在例如製程腔室中，促進反應效 果。 本創作的氣體噴灑頭還可參考中華民國專利申請號 第100127734號所揭露之喷灑頭，在此將該申請案以引用 的方式併入本文之中，以供參考。譬如圖3A是依照本創 作第二實施例所繪示的氣體喷灑頭的正視圖。圖3b是圖 3A的氣體喷麗頭應用於氣體分佈裝置的剖面示意圖。 严凊參照圖3A，第二實施例的氣體喷灑頭2〇〇是結合 進氣與排氣的喷灑頭。氣體喷灑頭2〇〇包括喷灑頭主體 2〇2其具有氣體作用表面2〇4以及多個進氣孔we，其中 進氣孔206是沿著氣體作用表面2〇4上的兩垂直方向呈'45 度角對稱分佈’部份進氣孔206的位置被觀察孔取代，且 觀察孔是呈直_列。氣體健頭還包括中央排氣口 其位於氣體作用表面綱的中心位置。中央排氣口 、》如由多個排氣孔2〇8a所構成。請參照圖3B。氣體 ms，氣體喷麗頭2〇0、腔室3〇2以及承载座 A载座304例如是用以承載基板306。在第二實施例 程裡以在真空及非真空輯類似製 208b例如可咬計A 土板3〇6。中央排亂口 208的抽氣端 向噴灑頭主體202内凹，以避免抽氣的 M430479 ，體與通過進氣孔206送入腔室3〇2的氣體混流。中央排 ，口 208的排氣方向例如與進氣孔2〇6的進氣方向相互平 订。在本實施例中’藉由中央排氣口 208的排氣以及進氣 tf06的進氣，可以使腔室302中的氣體濃度趨向一致’ 提尚製程的品質。如果腔室302中的製程反應會產生副產 物’中央排氣口 208也可以及早將副產物抽離，避免副產 物滯留過久而影響製程反應。 圖4A疋依本創作第三實施例所繪示的氣體噴麗頭 =正視圖。圖4B是第三實施例的氣體喷灑頭應用於氣體 分佈裝置的剖面示意圖。請參照圖4A。與第二實施例類 似’第三實施例的氣體喷灑頭4〇〇也是結合進氣與排氣的 ，灑頭，其包括喷灑頭主體4〇2，且喷灑頭主體4〇2具有 氣體作用表面404。多個進氣孔406以及中央排氣口 408 位於氣體作用表面404上，其中進氣孔406是沿著氣體作 用表面404上的兩垂直方向呈45度角對稱分佈，部份進氣 孔=06的位置被觀察孔取代，且觀察孔是呈直線排列。在 第二實施例中，中央排氣口 408的排氣面積與進氣孔4〇6 的總進氣面積的比率小於0.03。為了平衡進氣與排氣，氣 體噴灑頭400還包括環狀排氣口 41〇。環狀排氣口 41〇例 如是由多個排氣孔410a所構成，且例如是以中央排氣口 408為中心，呈對稱方式排列。 請參照圖4B。環狀排氣口 410的抽氣端410b例如可 設，為向噴灑頭主體402内凹，以避免抽氣的氣體與通過 進氣孔406送入腔室502的氣體混流。環狀排氣口 410的 9 M430479 排氣方向例如與進氣孔406的進氣方向相互平行。在第三 實施例中，氣體分佈裝置500包括氣體噴灑頭4〇〇、腔室 5〇2以及用以承載基板5〇6的承載座5〇4。在前述各實施例 中，第一氣體供應孔1〇卜20卜401以及第二氣體供應孔 、203、403例如可以連接至氣體供應源，以供應氣體， 還可以連接流量計（未繪示）以控制氣體流量。另^外，中 央排氣口 208、408以及環狀排氣口 41〇也可以連接流量 計’以控制排氣量。M430479 V. New description: [New technical field] This creation is about a gas spray head, and especially for a symmetrically distributed air inlet for metal organic chemical vapor deposition (MOCVD) for LED ) Epitaxial gas spray head. [Prior Art] As the coating process progresses, how to uniformly spray a gas into a chamber during a chemical vapor deposition reaction becomes an important problem. This has played an important role in the gas distribution module, especially the gas showerhead. Several patents have been proposed for the design and construction of gas distribution modules or gas sprinklers. U.S. Patent No. 7,138,336 B2 and U.S. Patent No. 7,641,939 B2 use a sprinkler head intake and chamber side suction to control gas ingress and egress. U.S. Patent No. 6,921, 437 discloses a gas distribution module which is capable of premixing a precursor gas, but is not applicable to a process in which the precursor gas is not premixed. U.S. Patent No. 6,478,872 discloses a method of delivering a gas to a chamber, and a showerhead for delivering a gas. However, the design of the design is complicated and expensive to manufacture. [New content] This creation provides a gas sprinkler head that has the advantages of simple processing and uniform gas distribution. The present invention proposes a gas shower head comprising at least one sprinkler head body, characterized in that: the sprinkler head body has a gas-acting surface and a plurality of inlets 3 M430479, and the total number of intake holes is 980 to 105 〇 Meanwhile, the air inlet holes are symmetrically distributed at an angle of 45 degrees along two perpendicular directions on the gas acting surface, and the positions of the two partial air inlet holes in the basin are replaced by a plurality of observation holes, and the observation holes are arranged in a line. In the context of this creation - the actual intake area of each of the intake holes is, for example, between 11 mm and 12 mm 2 . In the present invention, the distance between the above-mentioned air intake holes is, for example, between W mm and 16 mm. In the present invention, the total intake area of the above-mentioned intake holes is, for example, between 3% and 1% of the area of the gas-acting surface. In an embodiment of the present invention, the spacing of the viewing apertures is, for example, between 2 mm and 22 mm. In an embodiment of the present invention, the aperture of the viewing aperture is, for example, between 7 s mm and 8.5 mm. In one embodiment of the present invention, each of the intake holes includes a first intake passage, a tapered opening, and at least a second intake passage. The first air inlet is for supplying the first gas. The tapered opening is located on the gas acting surface and is connected to the first inlet. The second intake passage communicates with the tapered opening for supplying the second gas. In an embodiment of the present invention, the at least one second intake passage is disposed around the first intake passage. In an embodiment of the present invention, the central axis of the second intake passage is parallel to the central axis of the first intake passage. In an embodiment of the present invention, the central axis of the second intake port is at an angle to the central axis of the fourth intake port. In the embodiment, in the embodiment, the above-mentioned first inlet port and the sprinkler head are closely added with two == with screwing, welding or other gas =;: = can include - located in the air hole = for the implementation - the center The exhaust port is composed of a plurality of rows: in the embodiment, the above central exhaust. The pumping end is created by the county - the radiation direction of the above-mentioned towel discharge σ is parallel to the intake direction of the intake hole. In the present invention, the ratio of the exhaust area of the above-mentioned towel exhaust σ to the total intake area of the intake hole is less than 0 03. In an embodiment of the present invention, the sprinkler head body further includes at least one annular exhaust port, and the annular exhaust port is symmetrically disposed centering on the central exhaust port. In an embodiment of the present invention, the annular exhaust port includes a plurality of vent holes. In an embodiment of the present invention, the suction end of the annular exhaust port is recessed toward the sprinkler body. In an embodiment of the present invention, the exhaust direction of the annular exhaust port and the intake direction of the intake port are parallel to each other. Based on the above, the gas sprinkler head of the present invention has a special M430479 point that can be easily processed, and the gas is evenly distributed, and the gas concentration can be made uniform throughout the mouth sprinkling area. In order to make the above features of the present invention more comprehensible, the following specific embodiments are described below in detail with reference to the accompanying drawings. [Embodiment] Fig. 1 is a perspective view of a gas spray head according to a first embodiment of the present invention. Figure 2A is a front view of Figure i. Referring to the drawings together with FIG. 2A, the gas nozzle head 100 of the first embodiment includes a spray head main body ι 2 having a gas acting surface 1G4 and a plurality of intake holes 1G6. The plurality of intake holes 106 are symmetrically distributed at an angle of 45 degrees to the second direction along a first direction perpendicular to each other on the gas acting surface 1〇4. The positions of the partial intake holes 1〇6 are replaced by viewports, and the observation holes are arranged in a straight line, and the total number of the intake holes 106 is between 980 and 1〇5〇. The intake area of each of the intake holes 1〇6 is, for example, between 11 mm 2 and 12 mm 2 . The distance between the intake holes 1〇6 is, for example, between 10 mm and 16 mm, and the spacing between the intake holes 1〇6 in the first direction may be between the intake holes 丨0 6 in the second direction. The spacing is the same or different. The total intake area of the intake port 106 is, for example, between 3% and 10% of the area of the gas action surface 104. The distance between the observation holes is, for example, between 2 〇 mm and 22 mm. The aperture of the observation hole is, for example, between 7.5 mm and 8.5 mm. In the first embodiment, the gas shower head 100 can also refer to the gas distribution plate disclosed in the Republic of China Patent Publication No. 201111545 (patent name: gas distribution plate and its vibration), which is hereby incorporated by reference. The manner of this is incorporated herein by reference. Figure 2B is a cross-sectional view taken along the line of Figure 2A. Referring to Fig. 2B, the intake port 1〇6 includes a first intake passage 106a, a tapered opening 106b, and a second intake passage 1 center. The first intake passage 106a communicates, for example, with the first gas supply hole 101, and the second intake passage 106c communicates with, for example, the second gas supply hole 103. The number of the first gas supply holes 1〇1 and the second gas supply holes 103 may be adjusted as needed; for example, depending on the size of the gas shower head 100, more than one first gas supply hole 101 may be provided on the shower head main body 1〇2. And a second gas supply hole 103. Fig. 2C is a partial enlarged view of a single intake port 1〇6 of Fig. 2B. Fig. 2D is a partially enlarged view of the intake port of another embodiment of the present invention. Please refer to Figure 2C. The first intake port 16a is for supplying the first gas G1. The tapered opening 106b is located at the gas acting surface 104 and is connected to the first intake port i〇6a. The second intake port 16c communicates with the tapered opening 16b to supply the second gas G2. It causes the second intake passage 106c to be annularly disposed in the first intake passage 106a, and the central axis a2 of the second intake passage 106c is parallel to the central axis a1 of the first intake passage 106a. In another embodiment, the central axis a2 of the second intake port 16c and the central axis ai of the first intake port 106a may also form an angle 0, as shown in Fig. 2D. In the foregoing embodiment, the first intake passage 106a is integrally formed with the sprinkler head main body 102. In other embodiments, the first inlet channel may be attached to the showerhead body, for example, by screwing, welding, or other close machining. Fig. 2C also shows the case where the first gas G1 and the second gas G2 pass through the air inlet 106. When the first gas G1 enters the M430479 tapered opening 106b via the first intake passage 106a, the speed is attenuated due to the suddenly enlarged region, and diffusion occurs. At this time, the second gas G2 enters the tapered opening 106b via the second intake port, and the diffusion region is also generated. Therefore, the first gas G! and the second gas G2 can be mixed in advance in the tapered opening 106b, so that the gas can be more uniformly distributed in, for example, the process chamber to promote the reaction effect. The gas sprinkler head of the present invention can also be referred to the sprinkler head disclosed in the Patent Application No. 100127734, which is incorporated herein by reference. 3A is a front elevational view of the gas showerhead in accordance with a second embodiment of the present invention. Figure 3b is a schematic cross-sectional view of the gas spray head of Figure 3A applied to a gas distribution device. Referring to Figure 3A, the gas showerhead 2 of the second embodiment is a showerhead that combines intake and exhaust. The gas shower head 2 includes a sprinkler head body 2〇2 having a gas acting surface 2〇4 and a plurality of gas inlet holes we, wherein the gas inlet holes 206 are in two perpendicular directions along the gas acting surface 2〇4 The position of the portion of the inlet hole 206 that is symmetrically distributed at a '45 degree angle is replaced by the observation hole, and the observation hole is in a straight line. The gas head also includes a central exhaust port located at the center of the gas acting surface. The central exhaust port, "" is composed of a plurality of exhaust holes 2〇8a. Please refer to FIG. 3B. The gas ms, the gas jet head 2 〇 0, the chamber 3 〇 2, and the carrier A carrier 304 are, for example, used to carry the substrate 306. In the second embodiment, for example, a vacuum plate and a non-vacuum similar 208b can be used, for example, to bite the A soil plate 3〇6. The suction end of the central scooping opening 208 is recessed toward the sprinkler head body 202 to avoid pumping of the M430479, which is mixed with the gas fed into the chamber 3〇2 through the intake port 206. The exhaust direction of the center discharge port 208 is, for example, aligned with the intake direction of the intake holes 2〇6. In the present embodiment, by the exhaust of the central exhaust port 208 and the intake of the intake air tf06, the gas concentration in the chamber 302 can be made uniform, which is the quality of the process. If the process reaction in chamber 302 produces by-products, central exhaust 208 can also remove by-products early, avoiding by-product retention for too long and affecting process reactions. 4A is a front view of a gas spray head according to a third embodiment of the present invention. Fig. 4B is a schematic cross-sectional view showing the gas discharge head of the third embodiment applied to a gas distribution device. Please refer to FIG. 4A. Similar to the second embodiment, the gas sprinkler head 4 of the third embodiment is also combined with intake and exhaust, which includes a sprinkler head body 4〇2, and the sprinkler head body 4〇2 has The gas acts on the surface 404. A plurality of intake holes 406 and a central exhaust port 408 are located on the gas acting surface 404, wherein the intake holes 406 are symmetrically distributed at an angle of 45 degrees along two perpendicular directions on the gas acting surface 404, and some of the intake holes are 0.66. The position is replaced by the observation hole, and the observation holes are arranged in a straight line. In the second embodiment, the ratio of the exhaust area of the central exhaust port 408 to the total intake area of the intake port 4〇6 is less than 0.03. To balance intake and exhaust, the gas showerhead 400 also includes an annular exhaust port 41〇. The annular exhaust port 41 is exemplified by a plurality of exhaust holes 410a, and is arranged symmetrically around the central exhaust port 408, for example. Please refer to FIG. 4B. The suction end 410b of the annular exhaust port 410 may, for example, be recessed into the showerhead main body 402 to prevent the pumping gas from flowing into the chamber 502 through the intake port 406. The 9 M430479 exhaust direction of the annular exhaust port 410 is, for example, parallel to the intake direction of the intake port 406. In the third embodiment, the gas distribution device 500 includes a gas shower head 4, a chamber 5〇2, and a carrier 5〇4 for carrying the substrate 5〇6. In the foregoing embodiments, the first gas supply hole 1 and the second gas supply hole 203, 403 may be connected to a gas supply source, for example, to supply a gas, and may also be connected to a flow meter (not shown). To control the gas flow. Alternatively, the central exhaust ports 208, 408 and the annular exhaust port 41〇 may be connected to a flow meter to control the amount of exhaust.
綜上所述，本創作的氣體噴灑頭具有沿氣體作用表面 上的兩垂直方向呈45度角對稱排列的進氣孔，藉此配置， 本創作的氣體喷灑頭能在製程腔室中生成均勻度良好的氣 ，，圍。這種呈45度角對稱排列的進氣孔結構還具有加工 簡單、製造成本低廉的優點。本創作還以觀察孔取代部份 進氣孔，因此得以在製程期間觀察腔室内的情形。本^作 的進氣孔還可以具有_以上的魏道，可視情況均句混 合兩種以上的氣體。另外’本創作的氣體噴灑頭還可包括 中央排氣口與環狀排氣口，能使氣體分佈更均勻，也可在 製程反應的同時抽去反應的副產物，提昇製程良率。 雖然本創作已以實施例揭露如上，然其並^以限定 本創作，任何所屬技術領域中具有通常知識者，在不脫離 本創作之精神和範圍内，當可作些許之更動與潤飾，故本 創作之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 10 M430479 圖1是依照本創作第一實施例所繪的氣體喷灑頭的立 體視圖。 圖2A是圖1的氣體喷灑頭的正視圖。 圖2B是沿圖2A的AA線的剖面圖。 圖2C是圖2B的局部放大圖。 圖2D是本創作另一實施例的氣體喷灑頭的進氣孔剖 面圖。 圖3A是依照本創作第二實施例所繪的氣體喷灑頭的 正視圖。 圖3B是第二實施例的氣體喷灑頭應用於氣體分佈裝 置的剖面圖。 圖4A是依照本創作第三實施例所繪的氣體喷灑頭的 正視圖。 圖4B是第三實施例的氣體喷灑頭應用於氣體分佈裝 置的剖面圖。 【主要元件符號說明】 100、 200、400 :氣體喷灑頭 101、 201、401 :第一氣體供應孔 102、 202、402 :喷灑頭主體 103、 203、403 :第二氣體供應孔 1〇4、204、404 :氣體作用表面 106、206、406 :進氣孔 106a :第一進氣道 11 M430479 106b :錐形開孔 106c :第二進氣道 208、408 :中央排氣口 208a、410a :排氣孔 208b :抽氣端 300、500 :氣體分佈裝置 302、502 :腔室 304、504 :承載台 306、506 :基板 410 :環狀排氣口 al、a2 :中心轴 G1 :第一氣體 G2 :第二氣體 12In summary, the gas sprinkler head of the present invention has an air inlet hole symmetrically arranged at an angle of 45 degrees along two perpendicular directions on the gas acting surface. With this configuration, the gas sprinkler head of the present invention can be generated in the process chamber. Good uniformity of gas, and circumference. The air inlet structure symmetrically arranged at an angle of 45 degrees also has the advantages of simple processing and low manufacturing cost. This creation also replaces some of the air intake holes with observation holes, so that the chamber can be observed during the process. The air intake hole of this method can also have a Wei road of _ or more, and it is possible to mix two or more kinds of gases as the case may be. In addition, the gas sprinkler head of the present invention may further include a central exhaust port and an annular exhaust port, which can make the gas distribution more uniform, and can also remove the by-products of the reaction while the process is being processed, thereby improving the process yield. Although the present invention has been disclosed in the above embodiments, it is intended to limit the present invention, and any person having ordinary knowledge in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of protection of this creation is subject to the definition of the scope of the patent application attached. BRIEF DESCRIPTION OF THE DRAWINGS 10 M430479 Fig. 1 is a perspective view of a gas shower head according to a first embodiment of the present creation. 2A is a front elevational view of the gas showerhead of FIG. 1. Fig. 2B is a cross-sectional view taken along line AA of Fig. 2A. Fig. 2C is a partial enlarged view of Fig. 2B. Fig. 2D is a cross-sectional view of the intake port of the gas shower head of another embodiment of the present invention. Figure 3A is a front elevational view of a gas showerhead depicted in accordance with a second embodiment of the present invention. Fig. 3B is a cross-sectional view showing the gas discharge head of the second embodiment applied to a gas distributing device. Fig. 4A is a front elevational view of a gas shower head according to a third embodiment of the present invention. Fig. 4B is a cross-sectional view showing the gas discharge head of the third embodiment applied to a gas distributing device. [Main component symbol description] 100, 200, 400: gas shower heads 101, 201, 401: first gas supply holes 102, 202, 402: sprinkler head main bodies 103, 203, 403: second gas supply holes 1 4, 204, 404: gas acting surface 106, 206, 406: air inlet hole 106a: first air inlet 11 M430479 106b: tapered opening 106c: second air inlet 208, 408: central exhaust port 208a, 410a: exhaust hole 208b: exhaust end 300, 500: gas distribution device 302, 502: chamber 304, 504: carrier 306, 506: substrate 410: annular exhaust port a1, a2: central axis G1: a gas G2: a second gas 12