TWM422651U - Plasma apparatus for the abatement of PFC emissions and plasma vortex reactor for making the same - Google Patents

Abstract

This invention provides a novel plasma apparatus, for the abating emissions of perfluoro compounds, which consists of a vortex plasma reactor, a venturi scrubber, a scrubber liquid sump, and a packed tower scrubber. The said vortex plasma reactor has a plasma torch installed at the center of one end, and tangentially injected ports installed at the other end for the intake of flue gas containing perfluoro compounds and an amount of water for chemical reaction, to generate a highly turbulent vortex flow with high temperature gradient for the destruction of the said perfluoro compounds. The flue gas from the said vortex plasma reactor is further treated by the said venturi scrubber and the said packed scrubber for quenching, removal of acid gases and particulates.

Description

V. New description: [New technical field] The creation department is based on the semiconductor production surface waste gas treatment device, especially the perfluorinated electric power treatment device, which uses the perfluorinated waste gas to be injected in a tangential manner. A strong thirst flow is formed in the vortex plasma reactor, so that the perfluorinated exhaust gas and the suitable moisture react with the plasma torch to perform high temperature reaction to completely destroy the perfluorinated matter in the exhaust gas. The Wenshi strip tower and the wet scrubber are used to remove the acid gas and particulate matter produced by the reaction to achieve high destruction efficiency. [Prior Art] Semiconductor processes such as CF4, c2f6, NF3, etc. (PFC; Per-flu〇r〇compound) are widely used as process gases, but only a small part of these gases are used, and most of the remaining As an exhaust gas, there are doubts about the greenhouse effect. For example, 'CF4 is only used 5% in the process, C2|:6 is only used 30 〇 / 〇, milk is only used 6 〇 %, NR is only used 60%, CHF3 is only used 4 〇 %, Sf:6 is only about 2% used. In 1997, the “Kyoto Protocol of the United Nations Framework Convention on Climate Change”, through the regulation of carbon dioxide C〇2, A hospital (10), nitrous oxide _, sulphur hexafluoride SFe, nitrogen fluorocarbon HFCs and perfluorinated PFCs The specific reduction of the main greenhouse gases I plan and _ table. In these six main tube-by-chamber gas injections, %, HFCs and PFCs are mainly artificial greenhouse gas components; although HFCs and PFCs do not deplete the ozone layer, they are all powerful greenhouse gases with high global warming potential. Global Warming Potential (GWP), with a very long life period, such as 'CR' life cycle up to 5_, the life of the version 4 M422651 j up to 1〇, leap year, life of SFe Up to 32 years, the life of the flavor can reach 2,600 years, the life of NF3 can reach 7 milk years, the life of CHF3 can reach 270 years, and the life of c land reaches 49 years. These fluorine compounds can stay in the atmosphere for a considerable period of time, and the cumulative effect of the big money is irreversible. Due to the difficulty in manufacturing the semiconductor equipment tree, the use of the sewing compound is also increasing rapidly with the production of the conductor (4). Therefore, the industry urgently needs more effective surface sugar processing technology, mining _ pFCs exhaust gas treatment system to respond In the future, more stringent emission standards will be produced, and the production of pollution will occur. First, "traditional processing of PFCs and HFCs is most effective in using combustion methods. However, there is a risk of derivative fires due to fear of improper combustion control. There are examples of switching to electrothermal treatment; but electrothermal method is more sensitive to operating temperature and flow field distribution. Control of difficult impacts 'Processing efficiency can usually only reach less than 90%, it is difficult to meet the requirements of meeting the stringent emission standards. The use of plasma torch creation, only consider one-sided solutions, for example, the Republic of China new patent application No. 091209744, although a perfluorinated waste gas plasma processing device is proposed, which is characterized in that the exhaust gas and the high-temperature plasma torch are directly acted upon, and then enter the reaction chamber for treatment, wherein the interior of the reaction chamber is constructed of refractory heat-insulating materials. Under the heating of the plasma torch, a high temperature environment can be formed. A sprinkler group is arranged at the outlet of the reaction chamber, and the exhaust gas is cooled by the sprinkler group, and then introduced into a wet scrubber for treatment, and then discharged. The circulating water of the washing tower is provided with a water tank. When the static pressure of the perfluorinated waste gas provided by the exhaust gas source is insufficient, the wet type A windmill is added at the rear end of the washing tower to make up the static pressure 'smooth discharge design. 5 M422651 (4) The traditional Lailang is sensitive to the Weihu torch, and needs the reaction of the profit=(4) cake reaction, _, Laiqi must provide enough Maintain two temperatures (five) such as coffee, 〇 energy, and the reaction chamber must be constructed of fire-resistant coffin 枓 ' 'heating in the plasma torch τ, forming a high temperature environment, in order to allow independent reflection to destroy the perfluorinated pure Capability. Moreover, at the high temperature, the company is dedicated to the money, directly to the water test and then to the wet scrubbing tower. At this time, it is necessary to provide enough cold energy.

It can cool the gas and make it clear; _, the wet cleaning performance will be greatly affected.

The perfluorinated treatment device of the present invention adopts a galvanic polycondensation reactor, and the exhaust gas containing perfluorinated material is injected into the eddy current plasma reactor by using a tangential line, and the reversed contribution caused by the reduction of the electric enthalpy (4) is utilized. The high-energy electron mass of the plasma torch is in full contact with the perfluorinated material and moisture and oxygen, and initiates a rapid reaction. Therefore, efficient and thorough destruction can be achieved without requiring a high-energy power supply and a high-temperature reactor. The purpose of fluoride. In addition, this creation uses the Venturi riding tower and wet scrubbing after the eddy current reactor to cool, deacidify, and remove particulate matter from the vortex plasma reactor, achieving 99% to 99_9% or more. Destruction removal efficiency. [New content] The main purpose of this creation is to provide a perfluorinated plasma processing device that utilizes a vortex plasma reactor and subsequent air pollution control equipment to achieve a high-efficiency destruction of the entire fluoride energy-saving. 6 M422651 A plasma treatment device for perfluorination provided by the present invention for the purpose of the present invention comprises: a vortex plasma reactor, a plasma torch, a Wenner scrubber, a washing tank, and a wet a washing tower; characterized in that after collecting a plurality of perfluorinated exhaust gases, adding an appropriate amount of water required for the reaction, and injecting them into a vortex plasma reactor end in a tangential manner, forming a vortex in the vortex plasma reactor The vortex in the direction of the plasma torch at the other end of the plasma reactor, the perfluorinated exhaust gas is in direct contact with the high temperature plasma torch, and then thermally expanded to generate a turbulent temperature difference cyclone vortex, which is then formed by the electrothermal torch to the vortex current reactor outlet. The reverse high-speed jet causes the perfluorinated exhaust gas to be completely destroyed by chemically reacting in a vortex plasma reactor with a plasma torch having a high energy density. A Venturi gas column is arranged at the outlet of the vortex plasma reactor to cool the exhaust gas, partially remove the acid, remove the particulate matter, and then enter a wet scrubber for acid removal treatment. The circulating water for the Venturi scrubber and the wet scrubber is supplied with a washing tank. The scope of application of this creation includes the treatment of harmful exhaust gases such as perfluorinated compounds in semiconductors and other industrial processes, such as SiH4, CF4, CHh, C2F6, Nh and other exhaust gas treatment. In order to better understand the present work, the following illustrations are taken as an example of a preferred embodiment of the present invention. [Embodiment] As shown in the drawings, a preferred embodiment of the electrofluorination processing apparatus of the present invention is described below, and the principle and operation mode thereof will be described below. The perfluorinated plasma processing apparatus of the present invention is a method for injecting a vortex plasma reactor 30 into a vortex plasma reactor by using a perfluorinated exhaust gas to generate a gas vortex 7 M422651 flow 'installed inside the vortex plasma reactor 30 At the other end of the DC plasma torch 31, the whole gasification exhaust gas is pyrolyzed, and the Wenshi scrubber tower 4〇 and the wide-type washbasin are used to cool and remove the gas and remove the particulate matter, and then use the bubble to remove the H 7〇. A perfluorinated-hetero-processing device for removing foam and droplets from the airflow. Its main equipment includes: - eddy current electropolymer reactor 3Q using tangential / main-into-H gas waste gas to generate eddy current, an electric fire

The torch 31, the Venturi gas tower 40, the washing liquid tank 5, the wet scrubbing tower 6 and a foam remover 70. As the second ride shows, the job record reaction (4) is that the pasteurized fluoride exhaust gas is directly connected with the same / dish electric appliance dissimilarity 31, so that the whole fluorescing exhaust gas body swells to produce a high temperature difference, so that it contains perfluorination. The exhaust gas can be sufficiently mixed with the high-energy electron group in the eddy current device 30 to carry out a chemical reaction to achieve effective destruction.

(IV) Reaction H3G is equipped with a multi-nuclear collecting wire connection to collect the perfluorinated wire 1G produced by the semi-conducting process. Produced by the semiconductor process end = perfluoro (10) exhaust gas 1G piping and collection tube n are connected to the vortex plasma reactor. The collection r 11 can be a branch or a plurality of branches, and is usually designed in a range of 4 to 8 to reduce the number of miscellaneous miscellaneous. Each of the 彳彳 收 丝 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The recording of the whole thing can be mixed, and the plasma processing device of the perfluorinated product can be created privately before the real life. 8 The perfluorinated exhaust gas 10 is collected by the collecting pipe (1) to the exhaust gas collecting main pipe 12, and the water is injected into the water inlet 15 to take a proper amount of water for the reaction, and then passed through the gas injector 20' from the vortex plasma reactor. End 34 is injected into vortex plasma reactor 30 in a multi-point tangential manner to produce a rotating vortex. The amount of water injected by the water injection port 15 is estimated based on the composition of the perfluorinated exhaust gas according to the chemical reaction formula. The reaction equation is as follows:

SiH4 + 2〇2 Si〇2 + 2H2〇

CF4 + 2H20-^C〇2 + 4HF CF4 + 〇2 Current C〇2 + 2F2 C2F6 + 4H20 + 1/2 〇2 ^ 6HF + 2C〇2 + H2〇 C2F6+2O2+2CO2+3F2

C3F8 + 6H2O + O2 8HF + 3C〇2 + 2H2O C3F8 + 3〇2 3C〇2+ 4F2 SFe + 3H20 S02 + 6HF + 1/2 〇2

F2+ H2~> 2HF Since most of the PFCs react in the vortex plasma reactor 30, they are reported to be easily repolymerized into the most stable compound CR. Therefore, before the exhaust gas enters the full-flow polymerization reactor 30, it must be utilized. The inlet 15 is injected with an appropriate amount of water required for the reaction, and the appropriate moisture content required for the reaction is first adjusted and supplied, so that the PFCs can be converted into HF and C〇2 to obtain better destruction and removal efficiency. Using the function of the full-flow electropolymer reactor 30, CF4 will be destroyed by the following high-energy electrons: θ + CF4 CF3 + F + θ e + 〇2~^0 + 0 + e M422651

CF3+O^COF2+F CF4 is a very stable compound. The pyrolysis of % requires a large amount of energy to be supplied, and 'requires a very large amount of activation energy to carry out. The reaction formula and reaction heat of CF4 for pyrolysis reaction are as follows: CF4 C (soot) + F2 ΔΗ = +916 kJ/mol CF4 is oxidized in the red and should be the endothermic reaction

The reaction heat ΔΗ should be as follows: CF4+〇2-> CO2 + 2F2 ΔΗ = +585 kJ/mol CR is oxidized with oxygen and aeronautical, and is an exothermic reaction. The reaction will release the heat of reaction ΔΗ as follows: CF4 + 〇2 + 2H2 + C〇2 + 4HF ΔΗ = -557 kJ/mol The perfluorinated exhaust gas forms a vortex flowing in the direction of the vortex electropolymer reactor end 34 to the Laiyan 31 in the (5) galvanic polycondensation reactor. Then, after the fully vaporized exhaust gas is in direct contact with the electric torch 31, a chemical reaction is initiated to completely destroy the chemical bond of the perfluorinated compound, and with water molecules or oxygen.

The combination of gas forms some molecules or atoms that are treated at the same time, while the temperature of the gas rises rapidly, the volume expands, and the high temperature difference cyclone flow 36 is faster. After the high temperature difference cyclone vortex 36 reaches the top 35 of the eddy current electrolysis reactor, it is subjected to the chemical reaction of the electropolymerized torch 31»' to cause the domain compound to react with the water, and the volume of the gas is rapidly affected by the chemical reaction and the temperature rise, and After being guided by the gas flow of the plasma torch 31, a high-speed spray stream 37 from the plasma torch 31 to the vortex plasma reactor outlet is formed, so that the perfluorinated exhaust gas can be combined with a high energy density in the full-flow 10 M422651 reactor 30. The electrophoresis of the electrons is fully mixed and chemically reacted to produce combustion products such as c〇F2, HF, and C〇2, which are completely destroyed. The DC power torch 31 located in the thirsty flow «reaction n 3 〇 〇 财 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The perfluorinated impurities in the exhaust gas are heated, decomposed, atomized and ionized, so that the chemical bonds of the perfluorinated compounds are completely destroyed, and combined with water molecules or Wei to form some simple and easy-to-wear lion molecular filaments, such as Wei and carbon monoxide. , carbon dioxide and hydrogen fluoride, etc. 'Kinuosi Lai Qianfu _ molecules, to achieve the purpose of complete destruction. — The plasma torch 31 can be powered by a direct current power supply to produce a non-transmission type DC plasma torch for high temperature electricity. The chip flow recorder 3G is a good use of the torch 31 and the high-energy electron mass generated by it to fully mix and react with the exhaust gas of the full-form product gas. Therefore, it is necessary to establish a uniform temperature field, so that a lower power can be used. Plasma torch. 卩 can achieve the destruction efficiency. For example, the conventional plasma torch is about _1 rate. Use 4 to the power of the plasma torch 31. Since the entangled waste is not heated in the 3 Torring reactor, it will flow in a vortex along the outer wall 32 of the reactor, because the temperature of the outer wall 32 of the taoqi reactor is not too high. Simply use quartz glass or _ b to protect the metal, which can make the device simple. In order to achieve better mixing effect, the vortex electropolymerization provided by this creation has the following basic structural design and size setting. ^In order to make the perfluorinated exhaust gas 1G surface flow plasma anti-filament plus internal energy can produce stable cis And to avoid the deposition of the reduced matter, the gas flow rate of the gas injection (4) should be maintained above 10 m / s.

The 2's thirsty plasma reactor 3 is a cylindrical structure, and its optimum length L is 1 to 3 times that of the internal control 0. That is, l/D = 1 to 3.

3· ~ Plasma reaction 11 3G The optimum ih α diameter d is about D 1/2 to 1/3 times the inner diameter. That is, 'd/D = 1/3~μ.

Since the temperature of the exhaust gas treated by the plasma torch 31 in the thirst electromechanical beam reactor is extremely high, and the fresh gas is generated, the method is provided at the vortex electropolymer reactor 30. The thief tower milk connection, by the = gas compound transition temperature shadow _, if the temperature is too much, then the degree of resolution is reduced' Therefore, the liquid nozzle 42 sprays the washing ride into the Wenshi listen tower 4G towel to cool the exhaust gas And dissolve some acid gases such as HfI, at the same time; remove the particles from the corpus callosum, such as containing Weiwei; Wenlin tube milk in the Wenlin tube 43 ' can make the Wenshi strip tower 4 〇 decompression Under the conditions of operation; Wen's article secret 4G bottom financial_board 44, audible washing pressure caused by fluctuations, affecting the operation of the wet scrubber 60. The wet scrubber 60 has a filling material 64 for providing a large contact surface area. The washing and washing machine is sprayed on the filling material to form a joint movement of the gas and the liquid, and the ijf amount is transmitted to the prosthetic filler. # 64 U Installed _ 63 ' on top of it is the defogger wash knee nozzle 62, which can be large. The P/7 Ik airflow is removed by the water droplets on the belt; the washing nozzles 61, 12 M422651 mist eliminator washing nozzle 62 and the liquid nozzle 42 are supplied with washing liquid by the washing liquid circulation pump 51.

When the exhaust gas passes through the wet scrubber 60, the acid gas such as hydrogen fluoride HF can be absorbed. When the hydrogen fluoride waste gas product is treated, the washing liquid can be added with NaOH, so that the sprayed water mist can neutralize the acidity such as hydrogen fluoride. According to the current situation, there are manufacturers of wastewater treatment plants in the Science Park. Usually, their wastewater treatment plants have the ability to treat fluorine-containing wastewater. Therefore, the discharge water of the washing tank 5 of this creation can be batch discharged or continuous. Discharge to the wastewater treatment plant. Since the semiconductor process is often operated under low pressure conditions, the wet scrubber 6 often produces a large number of bubble beds, and it is difficult to use the demister 63 $ full removal, which is accompanied by the exhaust gas arrangement, which is after the _ wire tower (five) The mechanical remover 70' utilizes the idle motor 71 with _, the read disk %, the gamma centrifugal force removes the bubble, so that the downstream of the pipe is not subject to the contamination (four); the separation of the post-test body and the contact flow line 72 Garbage rides 5 feet. The rear end of the foam remover 70 is provided - the windmill 75 is used to make up (four) negative, so that the exhaust gas can be smoothly discharged.

The removal efficiency of the king fluoride PFcs in the exhaust gas in the equipment towel is clear: the total mass of the second IS squirting end compound CmFn is calculated by dividing the total mass of the s material CmFn entering the equipment: DRE = f 1 - 5i5 ^n^n)〇ut\ I Cap _ where fi is the compound CmFn $ | 〇〇.. Fluoride __1 _ == S·. The overall removal efficiency of this creation can reach 99.9%. The wind and the king of the waste gas, broken 13 M422651 The above description is only illustrative and not restrictive for this creation, ^ the general knowledge of the field understands the j and the fine case defined in the patent Under the ridge can be modified, changed or equivalent, but both: Luo into the scope of the creation of the φ patent can be limited. [Simple description of the diagram] The first picture of the perfluorinated waste gas plasma treatment device of the present invention: The eddy current plasma reactor of the present invention [Signature of main components] 10 Perfluorinated exhaust gas 11 Collection pipe 12 Exhaust gas collection Tube 15 Moisture injection port 20 Gas injector 30 Vortex plasma reactor 31 Plasma torch 32 Reactor outer wall 33 Flange connection port 34 Vortex plasma reactor end 35 Vortex plasma reactor top 36 Vortex vortex 37 High velocity cyclone jet 38 DC power supply 40 Venturi scrubber 41 Washing fluid 14

Claims (1)

M422651 Sixth, the scope of application for patents: 1. A perfluorinated plasma treatment device, including: - full-flow electric limbs should be H'-end with a -t slurry torch, and another end with a set of gas injectors and ―Export, wherein the gas injection device circulates the exhaust gas into the main gas flow in the Hefei poly-reverse wire, and the exhaust gas is excited by the electric torch to carry out a chemical reaction to form a reverse high-speed cyclone. The vortex is discharged from the outlet. The slurry reactor, - Wenshi Su Mi' is connected to the plasma reactor, shot, with a liquid nozzle for cooling, acid removal and removal of particulate matter, and a wet scrubbing scale after connecting the Yu's secret tower The towel has a filling material, a mist eliminator and a washing liquid nozzle for removing acid gases. 2. The electropolymerization treatment apparatus of the perfluorinated compound according to claim i, wherein the full-flow electro-reactor is a cylindrical structure having a length of '3 to 3 times the inner diameter. 3. The electropolymerization apparatus according to claim j, wherein the gas injector is connected to an exhaust gas collection main pipe, and the exhaust gas collection main pipe is provided with four or more collection pipes and one moisture Note the entrance. 16 M422651 VII, schema · 1 ( 17 M422651 First picture 50 M422651 Λ ...corrected year month *7 士·微 12.1 9蒱38