TWI455755B - Vortex plasma reactor for the abatement of pfcs emission - Google Patents

Vortex plasma reactor for the abatement of pfcs emission Download PDF

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Publication number
TWI455755B
TWI455755B TW101114354A TW101114354A TWI455755B TW I455755 B TWI455755 B TW I455755B TW 101114354 A TW101114354 A TW 101114354A TW 101114354 A TW101114354 A TW 101114354A TW I455755 B TWI455755 B TW I455755B
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Taiwan
Prior art keywords
gas
vortex
reactor
plasma reactor
plasma
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TW101114354A
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Chinese (zh)
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TW201343240A (en
Inventor
Ron Hsin Chang
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Resi Corp
Ron Hsin Chang
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Priority to TW101114354A priority Critical patent/TWI455755B/en
Publication of TW201343240A publication Critical patent/TW201343240A/en
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Publication of TWI455755B publication Critical patent/TWI455755B/en

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Claims (10)

  1. 一種用於廢氣處理的渦流電漿反應器,包含有:一廢氣收集管其具有多數個廢氣入口、一火焰防阻器其具有火焰防阻元件,該火焰防阻元件之多孔層孔徑小於氣體的最大實驗安全間隙、一渦流電漿反應器本體、一第一氣體注入裝置其安裝於渦流電漿反應器頂部、一第二氣體注入裝置其安裝於渦流電漿反應器末端、一反應器導流管、一電漿火炬、及一高週波感應線圈,其特徵是第一股氣體以廢氣收集管收集後,經火焰防阻器,再以切線方式由第一氣體注入裝置注入渦流電漿反應器本體內,注入渦流電漿反應器本體內的氣體利用位於渦流電漿反應器頂部中央的電漿火炬將該氣體等離子化,第二股氣體以切線方式由第二氣體注入裝置注入渦流電漿反應器本體內,並與高溫的反應器導流管接觸預熱後,匯入被等離子化的高溫氣體中形成渦流進行反應,使等離子化的氣體與第二股氣體產生激烈的混合,再經高週波感應線圈加熱形成一感應電漿區維持等離子化,使氣體在渦流電漿反應器內與具有高能量密度的電漿充分混合,維持一定反應時間進行反應而被徹底破壞。A vortex plasma reactor for exhaust gas treatment, comprising: an exhaust gas collecting pipe having a plurality of exhaust gas inlets, a flame retarder having a flame resistance preventing member, wherein the porous layer of the flame blocking element has a pore diameter smaller than that of the gas a maximum experimental safety gap, a vortex plasma reactor body, a first gas injection device installed at the top of the vortex plasma reactor, a second gas injection device installed at the end of the vortex plasma reactor, and a reactor diversion a tube, a plasma torch, and a high-frequency induction coil, characterized in that the first gas is collected by the exhaust gas collecting tube, and then injected into the eddy current plasma reactor by the first gas injection device through the flame resistor. In the body, the gas injected into the body of the vortex plasma reactor is plasma-oxidized by a plasma torch located at the center of the top of the vortex plasma reactor, and the second gas is injected into the eddy current plasma reaction by the second gas injection device in a tangential manner. After being preheated in contact with the high-temperature reactor draft tube, the reactor body is introduced into a plasma-formed high-temperature gas to form a vortex to react, etc. The sub-gas is strongly mixed with the second gas, and then heated by a high-frequency induction coil to form an inductive plasma zone to maintain plasmaization, so that the gas is thoroughly mixed with the plasma having high energy density in the vortex plasma reactor. , the reaction is maintained for a certain reaction time and is completely destroyed.
  2. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中廢氣收集管的多數個廢氣入口為四個以上。 The vortex plasma reactor for exhaust gas treatment according to claim 1, wherein the exhaust gas collection pipe has a plurality of exhaust gas inlets of four or more.
  3. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中之電漿火炬係以直流電力供應產生高溫電漿之非傳輸型直流電漿火炬,且該電漿火炬可以在操作中由渦流電漿反應器中抽出。 The vortex plasma reactor for exhaust gas treatment according to claim 1, wherein the plasma torch is a non-transmission type DC plasma torch that generates a high temperature plasma by using a direct current power, and the plasma torch can be It is extracted from the vortex plasma reactor during operation.
  4. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中渦流電漿反應器本體包含有:一反應器外管其係使用可導電的非磁性金屬材料製作、一反應器內管其係使用可導電的非磁性金屬材料、陶瓷材料或石英管製作,在反應器內管及反應器外管間裝有高週波感應線圈及隔熱材。 The vortex plasma reactor for exhaust gas treatment according to claim 1, wherein the vortex plasma reactor body comprises: a reactor outer tube which is made of a conductive non-magnetic metal material, and a reaction The inner tube is made of a conductive non-magnetic metal material, a ceramic material or a quartz tube, and a high-frequency induction coil and a heat insulating material are arranged between the inner tube of the reactor and the outer tube of the reactor.
  5. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中反應器導流管係使用可導電的非磁性金屬材料、陶瓷材料或石英管製作,除作為渦流導流作用外,同時提供第二股氣體預熱之用。 The vortex plasma reactor for exhaust gas treatment according to claim 1, wherein the reactor flow guiding tube is made of an electrically conductive non-magnetic metal material, a ceramic material or a quartz tube, in addition to being used as a vortex flow guiding function. In addition, a second gas preheating is provided.
  6. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中反應器導流管係利用高週波感應線圈加熱,以提供氣體加熱之用。 The vortex plasma reactor for exhaust gas treatment according to claim 1, wherein the reactor draft tube is heated by a high-frequency induction coil to provide gas heating.
  7. 如申請專利範圍第1項所述之用於廢氣處理的渦流電漿反應器,其中 第一氣體注入裝置利用氣體導流環以切線方向將氣體注入渦流電漿反應器本體,產生由渦流電漿反應器頂部往渦流電漿反應器末端方向的旋轉渦流,第二氣體注入裝置利用氣體導流環將氣體以相反的切線方向注入渦流電漿反應器本體,產生由渦流電漿反應器末端往渦流電漿反應器頂部的逆向旋轉渦流。 A vortex plasma reactor for exhaust gas treatment according to claim 1, wherein The first gas injection device injects gas into the vortex plasma reactor body in a tangential direction by using a gas guiding ring to generate a rotating vortex from the top of the eddy current plasma reactor toward the end of the vortex plasma reactor, and the second gas injection device utilizes the gas The flow guides inject gas into the vortex plasma reactor body in opposite tangential directions, creating a counter-rotating vortex from the end of the vortex plasma reactor to the top of the vortex plasma reactor.
  8. 如申請專利範圍第7項所述之用於廢氣處理的渦流電漿反應器,其中第一氣體注入裝置的氣體導流環具有多數個氣體切線注入口。 The vortex plasma reactor for exhaust gas treatment according to claim 7, wherein the gas guiding ring of the first gas injection device has a plurality of gas tangential injection ports.
  9. 如申請專利範圍第7項所述之用於廢氣處理的渦流電漿反應器,其中第二氣體注入裝置的氣體導流環具有多數個氣體切線注入口。 The vortex plasma reactor for exhaust gas treatment according to claim 7, wherein the gas guiding ring of the second gas injection device has a plurality of gas tangential injection ports.
  10. 如申請專利範圍第7項所述之用於廢氣處理的渦流電漿反應器,其中第一股氣體所產生的渦流係位於渦流電漿反應器本體內部中央的圓柱狀空間,第二股氣體所產生的渦流係位於接近反應器內管的內壁且在第一股氣體所產生的渦流外側,第二股氣體於感應電漿區匯入第一股氣體的渦流中,進行化學反應。 The vortex plasma reactor for exhaust gas treatment according to claim 7, wherein the vortex generated by the first gas is located in a cylindrical space in the center of the vortex plasma reactor body, and the second gas is The generated eddy current system is located near the inner wall of the inner tube of the reactor and outside the vortex generated by the first gas, and the second gas is introduced into the vortex of the first gas in the induction plasma region to perform a chemical reaction.
TW101114354A 2012-04-23 2012-04-23 Vortex plasma reactor for the abatement of pfcs emission TWI455755B (en)

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Application Number Priority Date Filing Date Title
TW101114354A TWI455755B (en) 2012-04-23 2012-04-23 Vortex plasma reactor for the abatement of pfcs emission
CN201310123807.XA CN103372368B (en) 2012-04-23 2013-04-10 For the eddy current plasma reactor of PFCs exhaust-gas treatment

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TW201343240A TW201343240A (en) 2013-11-01
TWI455755B true TWI455755B (en) 2014-10-11

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US9666415B2 (en) * 2015-02-11 2017-05-30 Ford Global Technologies, Llc Heated air plasma treatment
KR20190107729A (en) * 2017-02-03 2019-09-20 어플라이드 머티어리얼스, 인코포레이티드 Plasma Reduction of Nitrous Oxide from Semiconductor Process Effluents
CN108970346B (en) * 2017-06-02 2021-04-30 中国石油化工股份有限公司 Safety protection control method for degrading organic waste gas by low-temperature plasma
KR101959165B1 (en) * 2018-04-27 2019-03-15 (주)엔노피아 Plasma waste gas processing apparatus and system

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JP2006297275A (en) * 2005-04-20 2006-11-02 Kanken Techno Co Ltd Plasma detoxifier and exhaust gas treating system using this plasma detoxifier
TWM422651U (en) * 2011-10-05 2012-02-11 Resi Corp Plasma apparatus for the abatement of PFC emissions and plasma vortex reactor for making the same
TW201210679A (en) * 2011-09-29 2012-03-16 Resi Corp Plasma apparatus for the abating emissions of per-fluoro compounds and plasma vortex reactor for making the plasma apparatus

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FR2825295B1 (en) * 2001-05-31 2004-05-28 Air Liquide Application of density plasmas created at atmospheric pressure for the treatment of gaseous effluents
CN101143296B (en) * 2007-03-30 2010-06-30 黄樟焱 Multifunctional cyclone plasma air processing machine
EP2378199A1 (en) * 2010-04-13 2011-10-19 Siemens Aktiengesellschaft Resonator device for damping the pressure oscillation within a combustion chamber and a method for operating a combustion arrangement

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006297275A (en) * 2005-04-20 2006-11-02 Kanken Techno Co Ltd Plasma detoxifier and exhaust gas treating system using this plasma detoxifier
TW201210679A (en) * 2011-09-29 2012-03-16 Resi Corp Plasma apparatus for the abating emissions of per-fluoro compounds and plasma vortex reactor for making the plasma apparatus
TWM422651U (en) * 2011-10-05 2012-02-11 Resi Corp Plasma apparatus for the abatement of PFC emissions and plasma vortex reactor for making the same

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TW201343240A (en) 2013-11-01
CN103372368A (en) 2013-10-30
CN103372368B (en) 2015-09-09

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