M348878 八、新型說明： 【新型所屬之技術領域】 之技=隸:體=形成負壓 利開啟的_構，藉輯—步保無法順 【先前技術】 般容心部通常具有—供放置物 ，而為了保持或控制該容置空 置二間 上會加裝有充填氣的境條件，部份容器 步進行充氣與排氣的作用，藉同 r件的氣體由連_路的氣 内，且不斷的透過與排氣迴路連 = 化盥古效導1 演進及對電子產品微細 =间效化的要求，晶圓的尺寸已由早期的6时、8忖進展 吋，至於其上的積體電路線徑則已發展至90〜45奈 =因此在同—晶圓【Wafer】上的晶片【Die】數量也^ 巾田€加，晶片的效能與價值也被提升，換言之，當製程中 有不良品產生時，對於廠商的損失也大幅的擴大，因此如 何進一步的提高製程良率，是各半導體廠商不斷思考的方 向； 、，而為了提高整體製程環境的潔淨度，相關業界開發有 如美國專利第US 4,532,970號與美國專利第Us 4,534,389 號等用於晶圓、光置的密閉移轉系統，以確保周圓環境之 微粒或有害物質不致進入緊鄰光罩與晶圓的環境中。而由 於光罩污損的原因除了微粒外，更進一步包含環境中的水 M348878 氣、有毒氣體、塑膠製光罩盒所釋出的硫化物和製作過程 中的有害物質，其會造成霧化與結晶的現象，故為了解決 這些問題，業界開發有於光罩盒上加裝充、填氣的結構， 如我國專利公告第1238804號與第M322056號等，用以將 乾淨的惰性氣體注入該移載容器内，並擠出移載容器内的 有害氣體，又或透過同步注氣與排氣的循環氣流，來保持 光罩盒内部的潔淨度。 但在實際操作上，發現該光罩盒在同步進、排氣時， 可能因光罩盒内部的流道迂迴曲折、且組件複雜與光罩阻 擋等因素影響，經常發生進氣量小於排氣量的現象，如此 將使光罩盒的内部空間與外部環境形成負壓，如此當光罩 盒在開啟時，會因負壓而無法有效、且順利的開啟，再者 當光罩盒的容置空間形成負壓時，其在強力開啟的瞬間， 外部氣流會產生一股瞬間向内流動的強力氣流，該強力氣 流不僅會造成微粒與有害物質的揚起，而附著於光罩表面 ，甚至可能因而刮傷光罩表面的圖形，影響到後續製程中 的良率。 有鑑於此，本創作人乃針對前述容器在使用上所面臨 的問題深入探討，並藉由多年從事相關產業的研發與製作 經驗，經不斷努力的改良，終於成功開發一種穩壓閥組結 構，藉以克服現有容器於充排氣過程中的負壓負壓與開啟 時瞬間流入強力氣流的不便與困擾。 【新型内容】 因此，本創作係在提供一種穩壓閥組結構，藉以讓容 器在充排氣的過程中，其氣密的容置空間不致產生負壓， 6 M348878 避免影響到容器容置空間的開啟。 又，本創作另在於提供一種穩壓閥組結構，使容器在 開啟時不致產生瞬間強力氣流，以避免傷及内容容置的物 件。 基於此，本創作主要係透過下列的技術手段來具體實 現前述的目的與效能；該穩壓閥組結構包含有一穩壓閥及 一氣閥，其中穩壓閥件連接一排氣迴路，且穩壓閥件並由 一具氣流通道之閥體所構成； 而氣閥係設於一具容置空間之容器上，且氣閥係由一 具氣流通道之閥體所構成，氣流通道並與前述空置空間連 通，且該氣閥與穩壓閥件對接時，穩壓閥件的氣流通道係 同步跨越氣閥之氣流通道的内、外部。 藉此，透過前述技術手段的展現，使得本創作穩壓閥 件的流道孔可同步連接前述氣閥的流道内、外部，當利用 穩壓閥件排氣時，穩壓閥件可同步經由氣閥吸排容器内、 外部的氣體，讓容器的容置空間在排氣的過程中，不致發 生排氣量大於進氣量而產生負壓的狀況，防止影響容器的 開啟，且可避免發生開啟時，因瞬間的強力氣流而傷及容 器内部容置物件的表面，能大幅增加產品的附加價值，其 提升其競爭力與經濟效益。 以下並舉一較佳實施例，同時配合不同圖式及圖號， 對本創作做進一步之說明，讓熟悉本技術領域者能對本創 作有更詳細的瞭解： 【實施方式】 7 M348878 禮ίη ί避免容器之容置空間形成負壓之閥組結 ⑽舆-氣閥㈤’其中氣閥((2)。)二:於! =置空間之容器上，且氣閥⑽）流道並與該可選擇性 之通，而穩壓閥件°。)則可設於該容器 2應承載裝置上，且穩㈣件⑴）並與該承載裝置之 接，使穩壓閥件（10)與氣閥（2〇)可相對選 擇性接合或分離，供容器進行排氣動作；M348878 VIII. New description: [New technology field] Technology = Lie: Body = Forming a negative pressure to open the _ structure, borrowing - step protection can not be compliant [Prior technology] The general core has usually - for the placement In order to maintain or control the vacant space, a part of the container is filled with a filling gas, and some of the containers are inflated and ventilated, and the gas of the r piece is connected to the gas of the pipe. Continuously through the connection with the exhaust circuit = the evolution of the ancient effect 1 and the requirements for the micro-intermediary of electronic products, the size of the wafer has progressed from the early 6 o'clock, 8 吋, as for the above The circuit diameter has been developed to 90~45N = so the number of wafers [Die] on the same Wafer is also increased, and the performance and value of the wafer is also improved. In other words, when there are processes in the process, When the defective product is produced, the loss to the manufacturer is also greatly expanded. Therefore, how to further improve the process yield is a direction that various semiconductor manufacturers continue to think about; and, in order to improve the cleanliness of the overall process environment, the relevant industry develops a US patent. US 4, 532,970 and U.S. Patent No. 4,534,389 are used for wafer, optically mounted closed transfer systems to ensure that particulates or hazardous materials in the surrounding environment do not enter the environment adjacent to the reticle and wafer. In addition to the particles, the photomask contains the water M348878 gas, the toxic gas, the sulfide released by the plastic mask box, and the harmful substances in the manufacturing process, which cause fogging and fogging. In order to solve these problems, the industry has developed a structure for charging and filling gas on the mask case, such as China Patent Publication No. 1238084 and No. M322056, etc., for injecting a clean inert gas into the movement. The inside of the container is loaded and the harmful gas in the transfer container is squeezed out, or the circulating air flow of the simultaneous gas injection and the exhaust gas is passed through to maintain the cleanliness inside the photomask case. However, in actual operation, it is found that when the reticle is synchronously introduced and exhausted, the flow path inside the reticle box may be twisted and twisted, and the components are complicated and the reticle is blocked. The phenomenon of quantity, which will cause the internal space of the mask case to form a negative pressure with the external environment, so that when the mask case is opened, it will not be effectively and smoothly opened due to the negative pressure, and then the capacity of the mask case When the space is formed into a negative pressure, at the moment of strong opening, the external airflow generates a strong airflow that flows instantaneously inward. The strong airflow not only causes the particles and harmful substances to rise, but also adheres to the surface of the reticle, even This may scratch the pattern on the surface of the mask, affecting the yield in subsequent processes. In view of this, the creator has in-depth discussion on the problems faced by the aforementioned containers, and through years of experience in research and development and production of related industries, and through continuous efforts to improve, finally successfully developed a regulator valve block structure, In order to overcome the inconvenience and trouble of the negative pressure of the existing container during the charging and discharging process and the instantaneous flow of the powerful airflow when it is opened. [New content] Therefore, this creation is to provide a voltage regulator valve block structure, so that the container can not generate negative pressure in the airtight space during charging and exhausting, 6 M348878 avoids affecting the container accommodation space. Opened. Moreover, the present invention further provides a voltage stabilizing valve block structure that does not cause an instantaneous strong air flow when the container is opened to avoid injuring the contents. Based on this, the author mainly aims to achieve the aforementioned purpose and performance through the following technical means; the voltage regulator valve group structure includes a voltage regulator valve and a gas valve, wherein the voltage regulator valve member is connected to an exhaust circuit, and the voltage regulator The valve member is composed of a valve body with a gas flow passage; and the gas valve is disposed on a container having an accommodating space, and the gas valve is composed of a valve body having an air flow passage, and the air flow passage is vacant with the foregoing When the space is connected, and the gas valve is docked with the pressure regulating valve member, the air flow passage of the pressure regulating valve member synchronously crosses the inner and outer portions of the air flow passage of the air valve. Thereby, through the display of the foregoing technical means, the flow channel hole of the valve of the present invention can be synchronously connected to the inside and the outside of the flow channel of the gas valve, and when the gas is exhausted by the pressure regulating valve member, the pressure regulating valve member can be synchronously passed through The gas valve sucks and discharges the gas inside and outside the container, so that the container accommodation space does not generate a negative pressure when the exhaust volume is larger than the intake air amount during the exhausting process, thereby preventing the opening of the container and preventing the opening. When the surface of the container is damaged by the momentary strong airflow, the added value of the product can be greatly increased, which enhances its competitiveness and economic benefits. In the following, a preferred embodiment is provided, and the present invention is further described in conjunction with different drawings and drawings, so that those skilled in the art can have a more detailed understanding of the creation: [Embodiment] 7 M348878 礼ίη ί avoid container The accommodating space forms a negative pressure valve assembly (10) 舆-gas valve (5) 'where the gas valve ((2).) 2: on the = space container, and the gas valve (10)) flow path and the optional Sexuality, and the regulator valve ° °. ) can be disposed on the container 2 on the carrying device, and stabilize (four) pieces (1)) and connected with the carrying device, so that the pressure regulating valve member (10) and the air valve (2〇) can be relatively selectively engaged or separated, For the container to perform the exhausting action;
=本創侧⑽構⑴較佳實施狀詳細構成，則請 :看第-、二圖所揭示者，#中穩壓閥件（1G)係由一具 =通道之中空_ (11)所構成，該閥體（n)頂面形 i有一道較大徑的凸環片⑴）’且閥體（11)内部形成 有二隔片（13)，閥體（11)之隔片（13)鄰近凸環片（ 2)内緣處形成有一或多數流道孔（14)，又隔片（丨3) =面並具有向上凸出之推桿（15)，供選擇性啟閉容器對 閥（20)的氣流通道，再者閥體（51)下段外緣並形 (、鎖接於承載裝置之螺紋段（16)，讓穩壓閥件 )可選擇性鎖設於承載裝置上； 該氣閥（2G)係由-具氣流通道之中空閥體（21)所 成其可供連通容器的容置空間與前述穩壓閥件（1〇 ) ’又閥體（21)底部凸伸有-凸環片（22)，該凸環片（ 22)的外徑可跨設於前述穩壓閥件（10)的流道孔（14) =使穩壓閥件（10)的流道孔（⑷可同步跨越氣闕（ 、）的流氣通道内、外部，再者閥體（21)外緣形成一可 選，性鎖設於容器上的螺紋段（ 230)，且閥體（21)内部 中段形成有一具較小通孔的隔片（231)，又閥體（21)内 8 M348878 设有一可相對隔片（231)滑動的浮動桿（24)，該浮動桿 (24)兩端分別具有一較大徑的抵頂部（25)與一可穿出 隔片（ 230 )的頸部（26)，其中頸部（26)上束設有一可 選擇性封閉隔片（ 230)通孔的密封墊圈（28)，且浮動桿 (24)之抵頂部（25)與隔片（23〇)間頂撐有一彈簧 • )，讓浮動桿（24)可受前述穩壓閥件（1〇)推桿（15) . 之推抵，而讓密封墊圈（28)可透過彈簧（27)的壓伸作 - 用，產生相對遠離或緊貼隔片（42)的動作，而達到讓閥 ^ 體（21)氣流通道選擇性啟閉之目的； 广藉此，使得穩壓閥件（1〇)的流道孔（14)同時跨越 於氣閥（20)氣流通道的内、外部，使連接排氣迴路的穩 壓閥件（10)可同步吸排容器内部與外部的氣體，而組構 成一避免容器内部產生負壓的閥組結構者。 透過前述的設計，本創作於實際應用時，則如第二、 二及四圖所示者，當本創作之閥組結構（丨）應用於光罩盒 (50)及其承載裝置（6〇)時，其中光罩盒（5〇)具有一 φ 底座（51 )，且底座（51 )頂面並設有組設呈「门」支撐 體的承抵件（52)，供支撐與抵頂光罩，又底座（51)上 覆設有一可選擇性啟閉之殼罩（55)，供光罩盒（5〇)形 成可選擇性啟閉的容置空間，又光罩盒（5〇)於底座（51 )底面設有一或多數螺帽（54)，供鎖設前述連通容置空 ， 間的氣閥（20)。而承載裝置（60)具有供支撐光罩盒（ 50)之承板（61)，而本創作穩壓閥件（5〇)係鎖設於該 承板（61)上’並可與光罩盒（50)其中一氣閥（2〇)對 接’又承板（61)上另設有一對應光罩盒（5〇)其他氣閥 (20)之充氣閥（65) ’充氣閥（65)連接承载裝置（6〇 9 M348878 )之進氣迴路，使承載裝置（60)可對光罩盒（50)進行 充排氣； 且如第五、六圖所顯示者，當該光罩盒（5〇)未置於 承載裝，（60)的承板（61)上時，光罩盒（5〇)底座（ 51)的氣閥（20 )由於未受任何外力的推抵，因此氣閥（ 2—〇)中的浮動桿（24)受彈簧（27)回復預力頂撐而向下 定位，使浮動桿（24)上的密封墊圈（28)貼抵於隔片（ 231)，讓光罩盒（50)容置光罩的内部空間呈氣密狀【如 第五圖所示】。當鮮盒（5G)置於承載裝置（6Q)的承 板（61)上時，該光罩盒（5〇)底座（η)的氣閥（加） 了與承載裝置（60)上的穩壓閥件（1〇)相對接合，其中 氣閥（20)的浮動桿（24)受到穩壓閥件（1〇)之推桿（ 15)的推抵，使氣閥（2〇)的浮動桿（24)同步壓縮彈簧 (2J)，使氣閥（20)之浮動桿（24)上的密封墊圈（& )遠離隔片（231)，讓光罩盒（50)内的空氣可經氣闊（ 2〇)與穩壓閥件（1〇)氣流通道由承載裝置（⑻的排氣 迴路排出，且由於該穩壓閥件（1〇)的閥體（11)流道孔 (14)同時跨越於氣閥（2〇)凸抵環（22)的内、外部， 使穩壓閥件（10)可同步吸排光罩盒（5〇)内部容置1間 與外部環境的氣體，如此即可避免因排氣量大 讓光罩盒㈤）内部”形成負壓現象，使光罩盒（= 在未開啟前，其内、外環境的氣壓保持平衡，不致影塑光 罩盒（50)的殼罩（55)開啟，且進一步不致發生外^氣 流瞬間向内強力流動的現象，防止微粒與有害物質因氣流 ，揚起而附著於光罩表面，且進—步避免帶有微粒的強力 氣流刮傷光罩表面，以提升整體製程的效率與良率。 M348878 又本創作另有—實施例，其係如第七圖所揭示者 創作，谷器可為容置晶圓之晶圓容置 Ϊ箱^G)並具有可選擇性啟閉之箱門㈤，而二^ 丄(Γ; It自製程設備的進出料機體，而將本創作閥 裝ΐ⑽）I日rf閥件（1G)與氣閥（2G)分別設於承載 述的功效與效^箱（7G)的對接處’其'樣具有前 可大創作， 同或近似的產品創作，"未見相 故本創作已符合以;：二:Γ有功效的增進’ 要件，乃依法提出申請新型專利穎性」與「進步性」的 【圖式簡單說明】 =一=.係本創作_結構較佳實施例之外觀示音圖。 第一圖：係本創作閥組結構二 ,^^ ηη ^ 傅敉1 土貫施例之剖面分解示意圖 第n ίΓ 件㈣樣及其相對關係。 .係本創作閥組結構於實 第五圖 第六圖 弟七目 :=闕組結構於實際使用二 if:閥組結構於對接前之剖面示意圖。 閥組結構於對接後之剖面示意圖。 狴、7閥組結構另外應用於 裝置之外觀示意圖。 —㈣ 【主要元件符號說明】 M348878 (1) 閥組結構 (10) 穩壓閥件 (11) 閥體 (12) 凸環片 (13) 隔片 (14) 流道孔 (15) 推桿 (16) 螺紋段 (20) 氣閥 (21) 閥體 (22) 凸抵環 ( 230) 螺紋段 (231) 隔片 (24) 浮動桿 (25) 抵頂部 (26) 頸部 (27) 彈簣 (28) 密封墊圈 (50) 光罩盒 (51) 底座 (52) 承抵件 (54) 螺帽 (55) 殼罩 (60) 承載裝置 (61) 承板 (65) 充氣閥 (70) 晶圓容置箱 (75) 箱門 (80) 承載裝置 (85) 充氣閥= The creation side (10) structure (1) is a detailed configuration of the preferred embodiment. Please refer to the ones shown in the first and second figures. The #1V regulator valve (1G) consists of a hollow channel _ (11). The valve body (n) top surface shape i has a larger diameter convex ring piece (1))' and the valve body (11) is internally formed with two spacers (13), and the valve body (11) spacer (13) One or a plurality of flow passage holes (14) are formed adjacent to the inner edge of the convex ring piece (2), and the spacer (丨3)=face has a push rod (15) protruding upward for selectively opening and closing the container to the valve (20) the air flow passage, and then the outer edge of the lower portion of the valve body (51) is shaped and shaped (locked to the threaded section (16) of the carrying device to allow the voltage regulating valve member to be selectively locked to the carrying device; The gas valve (2G) is formed by a hollow valve body (21) having a gas flow passage, and a space for connecting the container and the aforementioned pressure regulating valve member (1〇) and a bottom portion of the valve body (21) a convex ring piece (22) having an outer diameter spanning a flow path hole (14) of the pressure regulating valve member (10) = a flow path hole of the pressure regulating valve member (10) ((4) It can synchronize the gas passage inside and outside the gas passage ( , ), and then the valve (21) The outer edge forms an optional threaded section (230) that is locked on the container, and a middle piece of the valve body (21) is formed with a spacer (231) having a smaller through hole, and the valve body (21) The inner 8 M348878 is provided with a floating rod (24) slidable relative to the spacer (231), the floating rod (24) has a larger diameter abutting top (25) and a pierceable septum (230) a neck (26), wherein the neck (26) is provided with a sealing gasket (28) that selectively closes the through hole of the spacer (230), and the floating rod (24) abuts against the top (25) and the partition The top of the piece (23〇) has a spring • ), so that the floating rod (24) can be pushed by the aforementioned pressure regulating valve member (1〇) push rod (15), and the sealing gasket (28) can pass through the spring. (27) The pressure-extension operation is used to generate a relatively distant or close contact with the spacer (42), and the purpose of selectively opening and closing the airflow passage of the valve body (21) is achieved; The flow passage hole (14) of (1〇) simultaneously spans the inside and the outside of the air flow passage of the gas valve (20), so that the pressure regulating valve member (10) connected to the exhaust circuit can simultaneously suck and discharge the gas inside and outside the container, and The assembly is constructed to avoid a valve block structure that creates a negative pressure inside the container. Through the foregoing design, the actual application, as shown in the second, second and fourth figures, when the valve structure of the creation (丨) is applied to the mask case (50) and its carrying device (6〇) Wherein, the photomask case (5〇) has a φ base (51), and the top surface of the base (51) is provided with a bearing member (52) assembled as a "door" support body for supporting and abutting The photomask and the base (51) are covered with a selectively openable and coverable cover (55), and the photomask case (5〇) forms a selectively openable and accommodating space, and the photomask case (5〇) One or more nuts (54) are provided on the bottom surface of the base (51) for locking the air valve (20) that communicates with the space. The carrying device (60) has a carrier plate (61) for supporting the photomask case (50), and the created voltage regulating valve member (5〇) is locked on the carrier plate (61) and can be combined with the photomask In the box (50), one of the air valves (2〇) is docked, and the carrier plate (61) is further provided with a corresponding photomask box (5〇), an inflation valve (65) of the other air valve (20), and an inflation valve (65) connection. The air intake circuit of the carrying device (6〇9 M348878) enables the carrying device (60) to charge and vent the reticle box (50); and as shown in Figures 5 and 6, when the hood box (5) 〇) When not placed on the carrier (61) of the carrying device, (60), the air valve (20) of the base (51) of the photomask case (51) is not pushed by any external force, so the air valve ( The floating rod (24) in 2—〇) is positioned downward by the spring (27) returning to the pre-stressed support, so that the sealing gasket (28) on the floating rod (24) is placed against the spacer (231), allowing light The inner space of the cover box (50) accommodating the reticle is airtight [as shown in the fifth figure]. When the fresh box (5G) is placed on the carrier plate (61) of the carrying device (6Q), the air valve of the base (n) of the photomask case (n) is (plus) and stabilized on the carrying device (60). The pressure valve member (1〇) is relatively engaged, wherein the floating rod (24) of the gas valve (20) is pushed against the push rod (15) of the pressure regulating valve member (1〇), so that the valve (2〇) floats The rod (24) synchronizes the compression spring (2J) so that the sealing gasket (&) on the floating rod (24) of the gas valve (20) is away from the spacer (231), allowing the air in the mask box (50) to pass through The air wide (2〇) and the steady-state valve member (1〇) air flow passage are discharged by the carrying device ((8) exhaust circuit, and due to the valve body (11) flow passage hole of the constant-pressure valve member (1〇) (14) At the same time, it spans the inner and outer parts of the gas valve (2〇) convex ring (22), so that the pressure regulating valve member (10) can simultaneously accommodate the gas inside the mask box (5〇) and the external environment. In this way, it is possible to avoid the negative pressure phenomenon caused by the large amount of exhaust gas inside the reticle box (5), so that the damper box (= before and after the opening, the air pressure inside and outside the environment is balanced, and the reticle box is not formed ( 50) The cover (55) is opened and further does not cause The phenomenon that the airflow instantaneously flows inwardly, preventing the particles and harmful substances from rising due to the airflow, and attaching to the surface of the reticle, and further avoiding the strong airflow with particles to scratch the surface of the reticle to improve the overall process Efficiency and yield. M348878 In addition, the author creates another embodiment, which is created by the person disclosed in the seventh figure. The grain can be used to accommodate the wafers of the wafer. Open and close the box door (5), and two ^ 丄 (Γ; It's self-made equipment into and out of the body, and the creative valve is installed (10)) I day rf valve (1G) and air valve (2G) are set in the bearing The effect and effectiveness of the box (7G) docking point 'its 'like the former can be big creation, the same or similar product creation, " unseen appearance of this creation has been consistent with;: two: Γ effective enhancement' The requirements are based on the law to apply for a new type of patent and "progressive" [simplified graphical description] = one =. This is the appearance of the preferred embodiment of the structure. The first picture: the structure of the creation of the valve group 2, ^^ ηη ^ Fu 敉 1 cross-sectional decomposition of the example of the application of the nth Γ Γ ( 四 四 四 四 四 及其 及其 及其 及其 。 。 。 。 。 。 。 。 The structure of the creation of the valve group is in the fifth picture. The sixth picture: the seventh group: = 阙 group structure in actual use two if: the valve group structure before the docking schematic diagram. Schematic diagram of the valve block structure after docking. The 狴 and 7 valve block structures are additionally applied to the appearance of the device. — (4) [Explanation of main component symbols] M348878 (1) Valve block structure (10) Regulator valve (11) Body (12) Annular ring (13) Spacer (14) Flow hole (15) Plunger ( 16) Thread section (20) Air valve (21) Body (22) Convex ring (230) Thread section (231) Spacer (24) Floating rod (25) Abutting top (26) Neck (27) Magazine (28) Gasket (50) Photomask case (51) Base (52) Bearing (54) Nut (55) Housing (60) Carrier (61) Carrier (65) Inflation valve (70) Crystal Round container (75) Door (80) Carrying device (85) Inflator valve
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