M348534 八、新型說明： 【新型所屬之技術領域】 本創作隸屬一種防止光罩盒内部形成負壓之技術領域 ，具體而言係一種可避免光罩盒因負壓而無法開啟的收納 櫃體，其並可防止光罩盒内之光罩因瞬間強力氣流而受污 損。 【先前技術】 按，近年來半導體製程技術不斷地進步，晶圓的尺寸 已由早期的3对、4对、6对、8 p寸進展到12 p寸，至於晶片 上的積體電路線徑則不斷的微細化，其線徑則已發展至90 〜45奈米，因此在同一晶圓【Wafer】上的晶片【Die】數 量也大幅增加，晶片的效能與價值也被提升，換言之，當 製程中有不良品產生時，對於廠商的損失也大幅的擴大， 因此如何進一步的提高製程良率，是各半導體廠商不斷思 考的方向； 而影響其製程良率的關鍵除了無塵室中的微粒與操作 上的失誤外，如光罩【Reticle】表面附著有微粒、霧化等 污損問題，則在大量重覆曝光的黃光製程中，會不斷的把 這些錯誤複數於晶圓上，造成極大量的不良品。而目前光 罩於製作、清洗、操作與儲存、運輸的過程中，不論係置 於光罩盒或無塵室的環境中，均存在有不少的微粒、水氣 、氣體、化學溶劑分子等有害物質，這些有害物質會附著 於光罩的表面，且在經長時間儲存或曝光製程的加熱後， 會於光罩表面產生微粒附著、結晶、又或霧化等現象，這 些現象均會造成晶圓良率的降低，且增加清理與改善的時 M348534 間，造成生產量降低，相對上也會提高營運的成本； 為了提高整體操作環境的潔淨度，業界開發有如美國 專利第US 4, 532, 970號與美國專利第US 4, 534, 389號等 用於晶圓、光置的密閉移轉系統，以確保周圓環境之微粒 或有害物質不致進入緊鄰光罩與晶圓的環境中。而由於光 罩污損的原因除了微粒外，更進一步包含環境中的水氣、 有毒氣體、塑膠製光罩盒所釋出的硫化物和製作過程中的 有害物質，其會造成霧化與結晶的現象，故為了解決這些 問題，業界開發有於光罩盒上加裝充、填氣的結構，可將 乾淨的惰性氣體注入該光罩盒内以擠出有害氣體，同時進 一步提升該光罩盒的氣密性，以防止外部微粒進入、且防 止乾淨的惰性氣體流失，如我國專利公告第223680號及第 1262164號等，其均在透過該光罩盒結構的改變，來提高光 罩盒的氣密性，但於結構上進行氣密性的改良是一項重大 的工程，不僅需要增加開發、製模與組裝的成本，且受到 材質、蓋合力與接觸面積等因素的影響，其並無法達到完 全氣密的效果，因此新型人前曾開發一種循環氣流的光罩 盒，透過同步注氣與排氣的循環氣流，來保持光罩盒内部 的潔淨度。 但在實際操作上，新型人發現該光罩盒在同步進、排 氣時，可能因光罩盒内部的流道迁迴曲折、且組件與光罩 阻擋等因素影響，造成其進氣量小於排氣量的現象，如此 將使光罩盒的内部空間與外部環境形成負壓，如此當光罩 盒於開啟時，可能因負壓的影響，無法有效、且順利的開 啟光罩盒，再者當光罩盒内部空間形成負壓時，其在開啟 的瞬間，外部氣流會產生一股瞬間向内流動的強力氣流， M348534 該強力氣流不會會造成微粒與有害物質的揚起，且可能刮 傷或附著於光罩表面的圖形，影響到後續製程中的良率。 緣是於此，本創作人乃針對前述光罩盒在使用上所面 臨的問題深入探討，並藉由多年從事相關產業的研發與製 作經驗，經不斷努力的改良，終於成功開發一種收納櫃體 結構，藉以克服現有光罩盒於充排氣後，容易因負壓而形 成的不便與困擾。 【新型内容】 因此，本創作係在提供一種收納櫃體結構，藉以讓光 罩盒在收納櫃體内充排氣的過程中，避免光罩盒的内部產 生負壓。 又，本創作另在於提供一種收納櫃體結構，藉以防止 光罩盒在開啟時產生瞬間強力氣流，以保護光罩之表面。 基於此，本創作主要係透過下列的技術手段來具體實 現前述的目的與效能；其内部可供擺置一或多數供儲存光 罩的光罩盒，且光罩盒具有複數供進、排氣的氣閥，該收 納櫃體係包含有： 一框架，框架具有至少一進氣迴路與至少一排氣迴路 至少一承置單元，其係設於框架内，該承置單元上設 有至少一連接前述進氣迴路的進氣閥件與至少一連接前述 排氣迴路的穩壓閥件，其中穩壓閥件具有一或多數流道孔 ，該穩壓閥件的流道孔係跨設於光罩盒氣閥的内、外，使 得穩壓閥件可同步吸排光罩盒容置空間與外部環境的氣體 7 M348534 藉此，透過前述技術手段的展現，使得本創作收納櫃 體可透過穩壓閥件的氣流通道跨設於對應氣閥氣流通道孔 内、外的設計，令穩壓閥件可同步吸排光罩盒内部空間與 外部環境的氣體，而讓該收納櫃體可透過穩壓閥件的作用 ，避免光罩盒内部空間產生負壓，不致影響光罩盒的開啟 ，且避免因瞬間向内流動的強力氣流，而傷及内部光罩的 表面。 以下並舉一較佳實施例，同時配合不同圖式及圖號， ^本創作做進-步之說明’㈣悉本肋領域者能對本 作有更詳細的瞭解： 【實施方式】 本創作係一種可讓光罩盒内部與外部保持穩壓狀態之 ―广櫃體’ μ參照第―、二圖所揭示者，該收納櫃體係由 (Η0所組成’框架（1〇)可選自光罩管理系統儲 罩容置櫃等’該框架⑴）内部可擺置一或多數 供倚存光罩的光罩盒（60); 而本創作較佳實施例之詳細構成，則請參看第一、二 端=揭示者，該收納櫃體之框架（1。）具有連接廠矛; 進乳迴路（11)與排氣迴路（12)，且框架（⑷更 啟閉的門板（15)，以進一步保護置於框架 == 罩盒:6°) ’又框架(10)上設有-或多數 壓，提井ίΐ (2G) ’以保持框架（lG)内部形成正 ⑽内部的潔淨度，又框架⑴）内具有 3多數供承置光罩盒（6G)的承置單元（30)，各承置 8 M348534M348534 VIII. New description: [New technical field] This creation belongs to a technical field to prevent the formation of negative pressure inside the mask case, in particular, a storage cabinet that can prevent the mask box from being opened due to negative pressure. It also prevents the reticle in the reticle from being stained by the momentary strong airflow. [Prior Art] According to recent advances in semiconductor process technology, the size of wafers has progressed from the early 3 pairs, 4 pairs, 6 pairs, 8 p inches to 12 p inches, as for the integrated circuit diameter on the wafer. It has been continuously miniaturized, and its wire diameter has been developed to 90 to 45 nm. Therefore, the number of wafers [Die] on the same wafer [Wafer] has also increased significantly, and the performance and value of the wafer have also been improved. In other words, when When there are defective products in the process, the loss to the manufacturer is also greatly expanded. Therefore, how to further improve the process yield is a direction that all semiconductor manufacturers are constantly thinking about; the key to affecting the process yield is the particles in the clean room. In addition to operational errors, such as the surface of the reticle [Reticle] with particles, fogging and other fouling problems, in a large number of repeated exposure yellow light process, these errors will be repeated on the wafer, resulting in A very large number of defective products. At present, in the process of production, cleaning, operation, storage and transportation, there are many particles, water vapor, gas, chemical solvent molecules, etc. in the environment of the reticle box or the clean room. Hazardous substances, which will adhere to the surface of the reticle, and will cause particles to adhere, crystallize, or atomize on the surface of the reticle after heating for a long period of time or exposure process. The decrease in wafer yield and the increase in cleaning and improvement between M348534 will result in lower production and relatively higher operating costs. In order to improve the cleanliness of the overall operating environment, the industry has developed US Patent No. 4, 532. , U.S. Patent No. 970, and U.S. Patent No. 4,534,389, the entire disclosure of which is incorporated herein by reference. In addition to the particles, the photomask contains the moisture in the environment, the toxic gas, the sulfide released by the plastic mask box, and the harmful substances in the manufacturing process, which cause atomization and crystallization. In order to solve these problems, the industry has developed a structure for charging and filling gas on the mask case, which can inject a clean inert gas into the mask box to extrude harmful gases, and further enhance the mask. The airtightness of the box to prevent the entry of external particles and prevent the loss of clean inert gas, such as the Chinese Patent Publication Nos. 223680 and 1262164, etc., all of which improve the mask case by changing the structure of the reticle. The airtightness, but the improvement of the airtightness of the structure is a major project, which not only increases the cost of development, molding and assembly, but also is affected by factors such as material, cover force and contact area. It is impossible to achieve a completely airtight effect, so the new type of person has previously developed a reticle box with a circulating airflow to keep the inside of the reticle through the circulating airflow of simultaneous gas injection and exhaust. Cleaness. However, in actual operation, the new type of person found that the hood is in the process of synchronously entering and exhausting, which may be affected by factors such as the reversal of the flow path inside the reticle box and the blocking of components and reticle, resulting in less air intake. The phenomenon of the amount of exhaust gas will cause the internal space of the photomask box to form a negative pressure with the external environment. When the photomask box is opened, the photomask box may not be effectively and smoothly opened due to the influence of the negative pressure. When the internal space of the reticle box forms a negative pressure, at the moment of opening, the external airflow will generate a strong airflow that flows instantaneously inward. M348534 The strong airflow will not cause the lifting of particles and harmful substances, and may Patterns that are scratched or attached to the surface of the reticle affect the yield in subsequent processes. The reason is that this creator has in-depth discussion on the problems faced by the above-mentioned masks, and has been successfully developing a storage cabinet by continuously improving the experience of R&D and production of related industries for many years. The structure is to overcome the inconvenience and trouble caused by the negative pressure after the existing reticle box is filled and exhausted. [New content] Therefore, the present invention provides a storage cabinet structure in which the light box is filled and exhausted in the storage cabinet to prevent negative pressure inside the mask case. Moreover, the present invention further provides a storage cabinet structure for preventing an instant strong airflow when the photomask case is opened to protect the surface of the photomask. Based on this, the author mainly uses the following technical means to achieve the above-mentioned purpose and performance; the inside can be placed with one or more reticle boxes for storing the reticle, and the reticle box has multiple feeding and exhausting The air valve, the storage cabinet system comprises: a frame, the frame has at least one air intake circuit and at least one exhaust circuit, at least one receiving unit, which is disposed in the frame, and the receiving unit is provided with at least one connection The intake valve member of the intake circuit and the at least one pressure regulating valve member connected to the exhaust circuit, wherein the voltage stabilizing valve member has one or a plurality of flow passage holes, and the flow passage hole of the constant pressure valve member is disposed across the light The inner and outer parts of the hood valve allow the regulator valve to simultaneously suck and discharge the gas in the accommodating space of the reticle and the external environment. 7 M348534, through the above-mentioned technical means, the creation storage cabinet can be reinforced. The air flow passage of the valve member is disposed in the inner and outer portions of the corresponding air passage of the air valve, so that the pressure regulating valve member can simultaneously suck and discharge the gas in the inner space of the photomask box and the external environment, and the storage cabinet can pass through the pressure regulating valve. Function Interior space to avoid a negative pressure box reticle, the reticle will not affect the open cassette, and for the moment to avoid strong gas stream flowing inwardly, and hurt the inside surface of the reticle. In the following, a preferred embodiment is provided, and at the same time, different drawings and drawings are combined, and the description of the creation is further described. (4) Those who are familiar with the field can have a more detailed understanding of this work: [Embodiment] This creation is a kind of The "wide cabinet" that allows the inside and outside of the mask box to maintain a steady state. Referring to the disclosure of the first and second figures, the cabinet system consists of (Η0) frame (1〇) can be selected from the mask management. In the system storage enclosure, etc., the frame (1) can be placed with one or a plurality of photomask boxes (60) for relying on the reticle; and for the detailed composition of the preferred embodiment of the present invention, please refer to the first and second End = revealer, the frame of the storage cabinet (1.) has a connection spear; the milk inlet circuit (11) and the exhaust circuit (12), and the frame ((4) more open door panel (15) for further protection Placed in the frame == cover box: 6°) 'The frame (10) is provided with - or most of the pressure, and the well is ΐ (2G) 'to maintain the cleanliness inside the frame (lG), and the frame (1) ) There are 3 main mounting units (30) for receiving the reticle box (6G), each bearing 8 M348534
單元（30)分別具有供支撐光罩盒（6〇)的承座（3l)， 且承座（31)上具有複數矩陣排列的透孔（32)，以避免 微粒堆積’再者承座（31)上設有—或多數供光罩盒（6〇 )卡掣限位的定位元件（33)，另承座（31)上設有一或 多ί供檢知與記錄光罩盒（60)的感應開關（34)，又承 置單元（30)的承座（31)上具有一或多數之鎖孔（35) (36)，不同的鎖孔（35 ) ( 36 )可供分別鎖設有一進氣 閥件（4G)或-穩壓閥件（5())，其中進氣閥件（4〇)可 連接框架（10)的進氣迴路（11)，而穩壓閥件（5〇)則 可連接框架（1〇)的排氣迴路（丨2); ^述進氣閥件（40)具有一中空的閥體⑷，該闕 體（41)下段外緣形成有對應鎖孔（35)的螺紋段，供進 氣閥件（4G)可選擇性鎖設於承置單元⑽）的承座⑶ )上，且閥體（41)内部中段形成有—具較小通孔的隔片 :的i動ί?^(41)内設有一可相對隔片（42)通孔滑 的福#(43)，該浮動桿（43)兩端分別具有一可 片（42)的頸部（44)與一較大徑的抵頂部（47)， (44)上束設有—可選擇性封閉隔片（42)通孔 月，、目（46) ’而浮動桿（43)之抵頂部⑷）與隔 i圈U頂撐有—彈簧（45) ’讓浮動桿（43)的密封 i可利㈣簧（45)的壓縮相對遠離或緊貼隔片 U7W if讓氣流轉性流狀目的，再者前述抵頂部 有向it f少一透孔（47G)，而抵頂部（47)頂面具 對庫ί桿（4?1) ’供選擇性啟閉光罩盒（6〇)之 對應軋&通道【如第七、八圖所示】； 至於穩壓閥件（50)則具有一中空的閥體（51)，該 9 M348534 閥體（51)頂面形成有一道較大徑的凸環片（52)，且閥 體（51)内部形成有一隔片（53)，閥體（51)之隔片（ 53)鄰^凸環片（52)内緣處形成有一或多數流道孔（54 )，且前述流道孔（54)並可同時跨越光罩盒（6〇)對應 氣流通道的内部與外部【如第六、八圖所示】，前述隔片 j53)頂面並具有向上凸出之推桿（55)，供選擇性啟閉 光罩盒（60)之對應氣流通道【如第七、八圖所示】，再 者閥體（51)下段外緣並形成有對應鎖孔（35)的螺紋段 (56)，該穩壓閥件（50)閥體（51)可選擇性鎖設於承 置單元（30)的承座（31); 藉此，組構成一可有效保持光罩盒内、外部環境氣壓 平衡的收納櫃體結構者。 透過前述的設計，本創作收納櫃體於實際使用時，係 配合容置光罩盒（60)，有關該光罩盒（6〇)之構成，則 係如第四、五圖所示，該光罩盒（6〇)具有一承置光罩的 底座（61)，且底座（61)頂面並設有組設呈「门」支撐 • 體的兩承抵塊（62)與一貼抵塊（63)，供支撐與抵頂光 罩/又底座（61)上覆設有一殼罩（65)，供光罩盒（6〇 )形成可選擇性啟閉的容置空間，又光罩盒（6〇)於底座 (60底面設有一或多數連通前述容置空間的氣閥（7〇) 且不同氣閥（70)並分別對應前述收納櫃體之承置單元 (30)的進氣閥件（4〇)與穩壓閥件（5〇); 前述氣閥（70)具有一中空的閥體（71)，且閥體（ 71)内部中段形成有一具較小通孔的隔片（72)，又閥體 (71 )内有一可相對隔片（72 )通孔滑動的浮動桿（73 )，該浮動桿（73)兩端分別具有一較大徑的抵頂部（74 M348534 )與一可穿出隔片（72)的頸部（75)，其中頸部 上束設有一可選擇性封閉隔片（72)通孔的密封墊圈 )，而浮動桿（73)之抵頂部（74)與隔片（72) 有一彈簧（76)，讓浮動桿（73)的密封塾圈（77二 用彈簧（76)的壓縮相對遠離或緊貼隔片⑺），而 杯（73)的抵頂部（74)並對應前述進氣闕件（4〇 壓閥件（50)之推桿（471 ) ( 55)，達到讓氣閥（7〇); 文進氣閥件（40)與穩屢閥件（5〇)作用選擇性導通 的【如第六、七圖所示】。 曰 光罩則係如第六、七及八圖所顯示者，當該 士置於框架（1〇)之承置單元（3。）上時， 的^抵，因此氣閥（70)中的浮動桿（73)受彈簧（7^ 而向下定位，使浮動桿（73)上的密封墊圈 二二:片/72) ’讓光罩盒(6〇)容置光罩的内 進Ϊ二=i如第七圖所示】。該承置單元（30)的 閥:二 所亍】盎，框架（10)的進氣迴路（11)【如第-圖 斤不】無法由進氣閥件⑽輸域淨的氣體； 單元盒(6°)置於承置 )的不因洛鬥)時，該光罩盒（6〇)底座（6i )與穩壓閥件(5。)二t座:31)上的進氣閥件(40 (?3) (7〇) k U)之推# (471)的推抵，使進氣 11 M348534 閥件（40)與氣閥（70)的浮動桿（43) (?3) 彈簧（45) ( 76)，使進氣閥件（4〇)與氣閥（7㈧之孚 動桿（43) ( 73)上的密封墊圈（46) ( 77)遠 〆 犯）（72)，讓進氣迴路Π1)内的潔淨 :牛⑽與氣闕⑽注入光罩盒(⑷ ： 光罩盒（60)對應穩壓闕件（⑹的氣閥（7(〇浮 ⑻受健閥件⑽之推桿（55)的推抵，使該=( 、:二上(L3,縮彈簧(76)，而令氣闕心之 ，f動# (73)上的掛封墊圈（77)遠離隔片 框ί = 氣可經氣闕(7〇)與穩壓閥件㈤由 氣閥㈤⑴(54)㈣跨越於 外部’使穩_件（5〇)可同步吸入光罩盒 氣量大二m【如第八圖所示】，如此即可避免因排 二6°i内部空間形編現象 平衡，不较&鄕上在未開啟則，其内、外環境的氣壓保持 外部氣流瞬二内匕(：=啟，且進一步不致發生 60)內邱㈣： 的現象，防止其刮傷光罩盒（ 而附著或使微粒與有害物質因氣流而揚起，進 者於先罩表面’以提升整體製㈣效率與良率。 可大::匕進:解到本創作為一創意極佳之新型創作， 同或近似的產’且在相同的技術領域中未見相 故本創作已符二」作或么開使用，同時具有功效的增進， 要件，乃依法^出=利有關「新穎性」與「進步性」的 伙床钕出申請新型專利。 12 M348534 【圖式簡單說明】 ，一圖：係本創作收納櫃體之立體外觀示意圖。 第二圖··係本創作收納櫃體之内部參考示^圖，其說 創作之構成及其相對關係。 第三圖：係本創作收納櫃體之局部分解及剖面示意圖 一步說明其進氣闕件與穩麗闕件的構成。 : 於本創作收納櫃體之光罩盒分解示意圖。 創作收納櫃體之光罩盒氣閥的分解及 口！J卸木忍圖。 第六圖：本創作體財際使 間穩>1的剖視圖。 竹尤皁1内4空 第圖·本創作收納櫃體於實際使用中推€ 件盥先里各洛M4fei^二用中進軋閥件及穩壓閥 第八圖·本創j之局部剖面示意圖。 本創作收納櫃體於實際使用 Γ 件與光罩盒氣_接後之以Μ Α件及穩壓閥 (10) (12) (20) (31) (33) (35) (40) (42) (44) (46) 【主要元件符號說明】 麦之局。Μ面示意圖。 框架 排氣迴路 過濾模組 承座 定位元件 鎖孔 進氣閥件 隔片 頸部 密封墊圈 rim ，— (11) (15) (30) (32) (34) (36) (41) (43) (45) (47) 進氣迴路 門板 承置單元 透孔 感應開關 螺孔 閥體 浮動桿 彈簧 抵頂部 13 M348534 ( 470) 透孔 (471) 推桿 (50) 穩壓閥件 (51) 閥體 (52) 凸環片 (53) 隔片 (54) 流道孔 (55) 推桿 (56) 螺紋段 (60) 光罩盒 (61) 底座 (62) 承抵塊 (63) 貼抵塊 (65) 殼罩 (70) 氣閥 (71) 閥體 (72) 隔片 (73) 浮動桿 (74) 抵頂部 (75) 頸部 (76) 彈簧 (77) 密封墊圈The unit (30) respectively has a socket (3l) for supporting the photomask case (6〇), and the socket (31) has a plurality of matrix-arranged through holes (32) to avoid particle accumulation 'further bearing ( 31) There are - or a plurality of positioning elements (33) for the photomask box (6"), and one or more of the holders (31) for detecting and recording the mask box (60) The sensing switch (34), and the bearing (31) of the receiving unit (30) has one or more locking holes (35) (36), and different locking holes (35) (36) are respectively lockable There is an intake valve member (4G) or a voltage regulator valve member (5 ()), wherein the intake valve member (4 〇) can be connected to the intake circuit (11) of the frame (10), and the pressure regulating valve member (5) 〇), the exhaust circuit (丨2) of the frame (1〇) can be connected; the intake valve member (40) has a hollow valve body (4), and the outer edge of the lower portion of the body (41) is formed with a corresponding keyhole. The threaded section of (35), the inlet valve member (4G) is selectively lockable on the socket (3) of the receiving unit (10), and the inner section of the valve body (41) is formed with a small through hole. The spacer: the i-moving ^^ (41) is provided with a through-slip relative to the spacer (42) #(43), the floating rod (43) has a neck portion (44) of a piece (42) and a top portion (47) of a larger diameter, respectively, and the upper portion of the floating rod (43) is provided with a selective Closed spacer (42) through hole, month (46) 'and floating rod (43) to the top (4)) and the outer ring U top support - spring (45) 'to make the floating rod (43) seal i The compression of the caliper (4) spring (45) is relatively far away or close to the spacer U7W. If the air flow is fluent, the above-mentioned top has a through hole (47G) to the top f, and the top (47) top. The mask to the library (4?1) 'for the selective opening and closing of the reticle box (6 〇) corresponding rolling & channel [as shown in the seventh and eighth figures]; as for the regulator valve (50) has a hollow valve body (51), the top surface of the 9 M348534 valve body (51) is formed with a larger diameter ring piece (52), and a valve body (53) is formed inside the valve body (51), the valve body (51) The spacer (53) has one or a plurality of runner holes (54) formed at the inner edge of the adjacent ring tab (52), and the runner hole (54) can simultaneously span the photomask case (6〇) Corresponding to the internal and external parts of the airflow channel [as shown in Figures 6 and 8], before The top surface of the spacer j53) has a push rod (55) protruding upward for selectively opening and closing the corresponding air flow passage of the photomask case (60) [as shown in the seventh and eighth figures], and then the valve body (51) The lower edge of the lower section is formed with a threaded section (56) corresponding to the locking hole (35), and the valve body (51) of the pressure regulating valve member (50) is selectively lockable to the socket of the receiving unit (30) (31) Thereby, the group constitutes a storage cabinet structure which can effectively maintain the air pressure balance in the inside and outside of the photomask case. Through the foregoing design, the creation storage cabinet body is adapted to accommodate the photomask case (60) in actual use, and the composition of the photomask case (6〇) is as shown in the fourth and fifth figures. The reticle box (6 〇) has a base (61) for receiving the reticle, and the top surface of the base (61) is provided with two bearing blocks (62) which are assembled with a "door" support body and a sticker The block (63) is provided with a cover (65) for supporting and abutting the reticle/substrate (61), and the hood (6 〇) forms a accommodating space for selective opening and closing, and the reticle a box (6〇) is provided on the bottom surface of the base (one or a plurality of air valves (7〇) communicating with the accommodating space, and different air valves (70) respectively corresponding to the air intakes of the receiving unit (30) of the storage cabinet body a valve member (4〇) and a pressure regulating valve member (5〇); the gas valve (70) has a hollow valve body (71), and a middle portion of the valve body (71) is formed with a spacer having a small through hole. (72), the valve body (71) has a floating rod (73) slidable relative to the through hole of the spacer (72), and the two ends of the floating rod (73) respectively have a larger diameter to the top (74 M348534) With a separable septum (72) a neck (75), wherein the neck is provided with a sealing gasket for selectively closing the through hole of the spacer (72), and the floating rod (73) has a spring against the top (74) and the spacer (72) (76), let the sealing ring of the floating rod (73) (77 two with the spring (76) compressed relatively far away or close to the spacer (7)), and the cup (73) against the top (74) and corresponding to the aforementioned intake阙 (4 〇 阀 阀 ( ( 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 471 Conducted [as shown in Figures 6 and 7]. The reticle is as shown in the sixth, seventh and eighth figures, when the person is placed on the mounting unit (3.) of the frame (1〇). , ^, so the floating rod (73) in the air valve (70) is biased by the spring (7^, so that the sealing washer on the floating rod (73) 22: piece / 72) 'Let the mask box (6〇) The inner lining of the accommodating reticle == i is as shown in the seventh figure. The valve of the receiving unit (30): two 亍 盎, the intake circuit of the frame (10) (11) [If the first - figure is not] can not be net gas from the intake valve (10); unit box ( When the 6°) is placed on the base), the hood (6〇) base (6i) and the regulator valve (5.) two t seats: 31) on the intake valve ( 40 (?3) (7〇) k U) push # (471) pushes the intake rod 11 M348534 valve member (40) and the air valve (70) floating rod (43) (?3) spring ( 45) (76), make the intake valve member (4〇) and the sealing washer (46) (77) on the gas valve (7 (8) of the moving rod (43) (73)) (72), let in Cleaning in the gas circuit Π1): the cow (10) and the gas raft (10) are injected into the reticle box ((4): the reticle box (60) corresponds to the pressure regulating element ((6) the air valve (7 (the rafting (8) is subjected to the valve member (10) The push of the rod (55) makes the = (,: two upper (L3, shrink spring (76), and the air seal heart, the load washer (77) on the f move # (73) away from the spacer frame ί = The gas can pass through the gas cylinder (7〇) and the pressure regulating valve member (5) from the gas valve (5) (1) (54) (four) across the external 'to stabilize the _ pieces (5 〇) can be simultaneously inhaled into the reticle box gas volume m [such as the eighth figure As shown in the figure, this can avoid the balance of the internal space shape of the 6°i, and the air pressure of the internal and external environment keeps the external airflow in the second time. = Kai, and further does not occur 60) Nei Qiu (4): The phenomenon prevents it from scratching the mask box (and attaching or causing particles and harmful substances to rise due to airflow, and entering the surface of the mask) to enhance the overall system (4) Efficiency and yield. Can be big:: 匕进: The solution to this creation is a creative new creation, the same or similar production 'and the same technical field has not seen the same, this creation has been used or used, and at the same time The promotion of efficiency, the essentials, is to apply for a new type of patent in accordance with the law of the "newness" and "progressive". 12 M348534 [Simple description of the diagram], a picture: is a three-dimensional appearance of the creation of the storage cabinet. The second picture is the internal reference diagram of the creation storage cabinet, which describes the composition of the creation and its relative relationship. The third picture: the partial decomposition and cross-section diagram of the creation storage cabinet. The composition of the intake and stable parts is explained in one step. : The exploded view of the mask box in this creation storage cabinet. Create the decomposition and mouth of the reticle box valve of the storage cabinet! J unloaded the picture. Figure 6: A cross-sectional view of the creation of the creation of the financial system. Bamboo Soap 1 inside 4 empty map · The creation of the storage cabinet in the actual use of pushing pieces 盥 里 里 里 洛 M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M M schematic diagram. This creation storage cabinet is connected to the actual use of the 与 与 光 光 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 稳压 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 42 42 42 42 42 42 42 42 42 42 42 ) (44) (46) [Explanation of main component symbols] Mai Bureau. Schematic diagram of the face. Frame Exhaust Loop Filter Module Bearing Positioning Element Keyhole Intake Valve Parts Septum Neck Gasket rim , — (11) (15) (30) (32) (34) (36) (41) (43) (45) (47) Intake circuit door panel mounting unit through hole sensing switch screw hole valve body floating rod spring to the top 13 M348534 ( 470) through hole (471) push rod (50) pressure regulator valve (51) valve body (52) Tab (53) Spacer (54) Runner hole (55) Pusher (56) Threaded section (60) Mask box (61) Base (62) Bearing block (63) Sticking block ( 65) Housing (70) Air valve (71) Body (72) Spacer (73) Floating rod (74) Abutting top (75) Neck (76) Spring (77) Sealing washer
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