TWM266682U - Negative film positioning device of PCB exposure machine - Google Patents

Negative film positioning device of PCB exposure machine Download PDF

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Publication number
TWM266682U
TWM266682U TW93214461U TW93214461U TWM266682U TW M266682 U TWM266682 U TW M266682U TW 93214461 U TW93214461 U TW 93214461U TW 93214461 U TW93214461 U TW 93214461U TW M266682 U TWM266682 U TW M266682U
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TW
Taiwan
Prior art keywords
base
frame
bottom frame
exposure machine
pcb
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TW93214461U
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Chinese (zh)
Inventor
Huei-Guang Jang
Shiu-Fan Chen
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C Sun Mfg Ltd
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Priority to TW93214461U priority Critical patent/TWM266682U/en
Publication of TWM266682U publication Critical patent/TWM266682U/en

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M266682 八、新型說明: 【新型所屬之技術領域】 本創作係關於-種PCB曝光機底収位結構,其特 供曝光機底框之位置調整及其定位者。 ’、 ” 【先前技術】 ^路板之曝光作業。由於曝光作針,必顧複地開啟 ,其上框’然而’在-般曝光機中不具有上框的對準 ,上框結制啟之重觀度雜。再者,f狀曝&^ -般曝光機,係提供印刷電路板,進行線路圖 類曝光機通常係在-基座中形成一曝光區,該曝光區係透過二 I掀起之上框:將待曝光之電路板壓掣在曝光區中,並藉以進 系透過螺桿的推動而達収位,但是因為螺桿的背隙,使 ίίί會ΐ定位後’會造成職誤差。另外,f知的曝光機 空的方朗定其底框,料會因為吸力或負=平 二=在框:=良因此’本創作_ 【新型内容】 供-機結構所存在的敎,本_主要目的係提 到上框與底框之底片 罐’而調節曝光機之底框,以達 WHiL^A 5 ^ 除曝=====,可娜繊,消 M266682 μ本創作之再—目的錢過本働之PCB曝光機底片定位 、、、°構,可增進曝光機之上框結構開啟之重複精度者。 nS本紹㈣以解決&述習知缺失的技術手段,其係基層電路 板曝光平台巾形成的定健構,並包括··—基M266682 8. Description of the new type: [Technical field to which the new type belongs] This creation is about a kind of bottom exposure structure of the PCB exposure machine, which provides the position adjustment and positioning of the bottom frame of the exposure machine. ',' [Prior art] ^ Road board exposure operation. Due to the exposure of the needle, it must be turned on, and its upper frame 'however' does not have the alignment of the upper frame in a general exposure machine, and the upper frame is opened. The degree of reconciliation is mixed. In addition, f-shaped exposure & ^-like exposure machines are provided with printed circuit boards, and circuit-pattern type exposure machines usually form an exposure area in the base, which is exposed through two I lift the upper frame: press the circuit board to be exposed in the exposure area, and use the advancement of the screw to achieve the closing position, but because of the backlash of the screw, the position will cause job errors. In addition, the empty frame of the known exposure machine Fang Lang determines its bottom frame. It is expected that because of suction or negative = flat two = in the frame: = good, so 'this creation_ [new content] the existence of the supply-machine structure, The main purpose of this book is to adjust the bottom frame of the exposure machine by referring to the film cans of the top frame and the bottom frame to achieve WHiL ^ A 5 ^ In addition to exposure ===== , 可 娜 繊 , 消 MM266682 μ —The purpose is to pass the positioning of the negative film of the PCB exposure machine, and the structure can improve the repeatability of opening the upper frame structure of the exposure machine. . (Iv) by Shao to solve this nS & described conventional techniques missing, given its configuration based health exposure stage towel base layer circuit board is formed, and comprising ·· - yl

,光機之主結構者;-上框,係—框體,其—側樞接 :’用以承_光底片,並覆蓋該基座所容置之基層電路板; 二底框’係-框體浮動設置於該基座頂端所形成,其形成—曝 光區之,置空間,提供承載曝光底片,並可容置基層電路板; 以,「,位裝置,係—傳動機構,其連結至該底框,使得該底 框文該纽裝置之鶴科移,關整該細位置,達到該上 框與底框各自承載之曝光底片的對位。 X 為使熟悉該項技藝人士瞭解本創作之目的、特徵及功效, 明如后 效藉由下述具體實施例,她合所附之圖式,對本創作詳加說 【實施方式】 第-圖係顯示本創作之PCB曝光機底片定位結構之立體 組合視圖,第二圖係顯示本創作之PCB曝光機底片定位結 立體分解視圖。 ° 參考第-以及第二@所顯示,本創作pCB曝光機底片定位 結構較佳之實施例中,包括一基座(1)、一上框(2)、一底框 以及-粒裝置(4),並透過該定位裝置⑷可制底框⑶之定 位0 •前述之各元件中,該基座⑴係基層電路板曝光機之主結構 者,該上框(2),係一框體,其一側樞接於該基座g)中,用以承 載曝光底片,並覆蓋該基座(1)所容置之基層電路板,而可進行 基層電路板之曝光者;該底框⑶,係_框體浮動設置於該基座 6 M266682 頂端所形成,其形成一曝光區(31)之容置空間,提供承載曝 光底片,並容置基層電路板,用以進行基層電路板之曝光者; 以及,該定位裝置(4),係-傳動機構,其連結至該底框⑶,使 得該底框(3)受該定位裝置(4)之驅動而平移,以調整該底框(3) 位置,達到該上框(2)與底框(3)各自承載之曝光底片的對位,並 進行基層電路板之雙面曝光者。 -第三_顯示本創作之PCB曝光機底収位結構之局部 元件立體組合視圖,第四圖係顯示本創作之PCB曝光機底片定 位結構之上框閉合狀態的立體分解視圖。 一 參考第二、第三以及第四圖所顯示,該上框係透過數個 凸緣(21)以及卡槽(22)所形成的扣接結構,以和該基座形成閉 合狀態,而覆蓋該基座(1)所容置之基層電路板。以圖中所顯示 為例,各個凸緣(21)係固設於該上框(2)之外緣,而各個卡槽(2 係對應各個凸緣(21)而固設於該基座(1)上。因此,當該上框(2) 閉合時,其各個凸緣(21)會銜入所對應的各個卡槽(22),而與該 基座(1)扣合。 、前述之定位裝置(4)係包括設置於該基座(1)上的調節組(41) 以及(41),且调節組(41)以及(41’)係輸入旋轉動力而輸出直線 動力之機構,並裝設於該基座(1)上而造成調節組(41)與(4ι的 輸出直線動力形成正交的狀態。 〃 第五圖係顯示本創作之PCB曝光機底片定位結 組一實施例的立體組合視圖。 周即 參考第五圖所顯示,前述之調節組(41)或(41,),係一柱狀 之轉動手輪(41a)固接一螺桿(41b)的一端,該螺桿(41b)的另一端 係樞接於基座(1)中,且一支撐座(41c)底部形成一内螺紋而嚙合 該螺桿(41b),且該支撐座(41c)頂端形成一滑轨(41d),該滑^ (41d)係垂直該螺桿(4ib),而可承載一滑動座(41e),使得該滑動 座(41e)可在該支撐座(41c)頂端滑移,且該滑動座(41〇頂端係固 M266682 接該底框(3)之底部。 前述之基座(1)形成一滑動導桿(41f),該滑動導桿(4lf)係平 行其螺桿(41b)方向,並配合該支撐座(41c),使得該支樓座(4ic) 套設該滑動導桿(41f),而可進行相對滑移運動,其中,該滑動 導桿(41f)係為了使該支撐座(41c)的直線移動能更穩定。 前述之滑動座(41e)頂端係與該底框(3)形成樞接之結構,其 中’一種較具體的實施方式係在該滑動座(4ie)頂端固設一旋轉 軸承(41g),並透過該旋轉軸承(41g)固接該底框(3),使得該底框, The main structure of the optical machine;-the upper frame, the-frame body, its-side pivot connection: 'used to support _ light negative film, and cover the base circuit board accommodated in the base; two bottom frame' system- The frame is formed by floatingly arranged on the top of the base, and it forms a space for the exposure area, which provides the exposure film and can accommodate the base circuit board. The bottom frame allows the crane section of the bottom frame and the button device to move and close the fine position to reach the alignment of the exposure film carried by the upper frame and the bottom frame. X In order to make those skilled in the art understand this creation The purpose, features, and effects are as clear as aftereffects. With the following specific examples, she combined the attached drawings to elaborate on this creation. [Embodiment] The first figure shows the film positioning structure of the PCB exposure machine for this creation. This is a three-dimensional combination view. The second figure is a three-dimensional exploded view of the negative position of the negative of the PCB exposure machine of this creation. ° With reference to-and the second @, the preferred embodiment of the negative positioning structure of the negative pCB exposure machine of this creation includes a Base (1), upper frame (2), bottom And-grain device (4), through which the positioning device can make the bottom frame ⑶ positioning 0 • Among the aforementioned components, the base frame is the main structure of the base circuit board exposure machine, the upper frame (2) Is a frame, one side of which is pivotally connected to the base g) for carrying the exposure film and covering the base circuit board accommodated in the base (1), so that the base circuit board can be exposed. The bottom frame ⑶ is formed by the frame floating on the top of the base 6 M266682, which forms an accommodation space for the exposure area (31), provides the exposure film, and houses the base circuit board for The exposed person of the base circuit board; and the positioning device (4), a transmission mechanism, is connected to the bottom frame ⑶, so that the bottom frame (3) is translated by the driving of the positioning device (4) to adjust The position of the bottom frame (3) reaches the alignment of the exposed negatives carried by the upper frame (2) and the bottom frame (3), and the two-sided exposure of the base circuit board is performed.-The third _ shows the PCB of this creation Three-dimensional combined view of partial components of the exposure structure at the bottom of the exposure machine. The fourth picture shows the positioning of the negative of the PCB exposure machine. A three-dimensional exploded view of the closed state of the upper frame. Referring to the second, third, and fourth figures, the upper frame is a fastening structure formed through a plurality of flanges (21) and card slots (22). In order to form a closed state with the base, and cover the base-layer circuit board accommodated in the base (1). Taking the example shown in the figure, each flange (21) is fixed to the upper frame (2). The outer edge, and each slot (2 is fixed to the base (1) corresponding to each flange (21). Therefore, when the upper frame (2) is closed, each flange (21) will be engaged The corresponding slot (22) is inserted into the base (1), and the positioning device (4) includes the adjusting group (41) and (41) provided on the base (1). And the adjustment group (41) and (41 ') are mechanisms that input rotational power and output linear power, and are installed on the base (1) to cause the output linear power of the adjustment group (41) and (4ι) to form Orthogonal state. 〃 The fifth image is a three-dimensional combined view of an embodiment of the negative film positioning assembly of the PCB exposure machine of this creation. Zhou refers to the fifth figure to show that the aforementioned adjustment group (41) or (41,) is a cylindrical turning handwheel (41a) fixed to one end of a screw (41b), and the other of the screw (41b) is One end is pivotally connected to the base (1), and a bottom of a support base (41c) forms an internal thread to engage the screw (41b), and a top of the support base (41c) forms a slide rail (41d), the slide ^ (41d) is vertical to the screw (4ib), and can carry a sliding seat (41e), so that the sliding seat (41e) can slide on the top of the support seat (41c), and the sliding seat (41〇 The fixed M266682 is connected to the bottom of the bottom frame (3). The aforementioned base (1) forms a sliding guide (41f), the sliding guide (4lf) is parallel to the direction of its screw (41b), and cooperates with the support base ( 41c), so that the supporting seat (4ic) is sleeved with the sliding guide (41f) to perform relative sliding movement, wherein the sliding guide (41f) is for linear movement of the supporting seat (41c) It can be more stable. The top end of the aforementioned slide base (41e) is pivotally connected to the bottom frame (3). Among them, a more specific embodiment is that a rotary bearing (41g) is fixed on the top end of the slide base (4ie). ) And through the The rotation bearing (41g) is fixed to the bottom frame (3) so that the bottom frame

(3)可以該旋轉軸承(4ig)為轉轴,與該滑動座(41e)形成相對轉 動0 基於前述之調節組(41)或(41’),可透過其轉動手輪(4:^)旋 轉該螺桿(41b),而驅使該支撐座(41c)沿著該螺桿(41b)與滑動導 桿(41〇達到直線移動,該支撐座(41c)並會帶動該滑動座(41幻而 使得該底框(3)同步移動,然而該底框(3)樞接該滑動座(41e)位置 處,其平面上的三個自由度中,只被該螺桿(41b)限制一個平移 方向的自由度,且藉由該滑動座(4ie)可滑動於支撐座(41c)之滑 執(41d)上,以及該底框⑶與滑動座(41e)之樞接關係,而使得該 底框(3)樞接該滑動座(4ie)位置處保有其另外兩個自由度。(3) The rotary bearing (4ig) can be used as a rotating shaft to form relative rotation with the sliding seat (41e). Based on the aforementioned adjustment group (41) or (41 '), the handwheel (4: ^) can be rotated through it. Rotate the screw (41b) to drive the support base (41c) to move linearly along the screw (41b) and the sliding guide (41), and the support base (41c) will drive the slide base (41) to make The bottom frame (3) moves synchronously. However, the bottom frame (3) is pivotally connected to the sliding seat (41e). Of the three degrees of freedom on the plane, only the freedom of one translation direction is restricted by the screw (41b). And the sliding base (4ie) can be slid on the sliding handle (41d) of the supporting base (41c), and the pivotal relationship between the bottom frame (3e) and the sliding base (41e), so that the bottom frame (3 ) Pivotally retains the other two degrees of freedom at the position of the sliding seat (4ie).

鈿述之定位裝置(4)中係透過一調節組(41)以及兩調節組 (4Γ)裝設於該基座(1)上,使得該調節組(41)與調節組(41,)而輸 出兩個正交的直線動力。其中,更具體之實施方式係該調節組 (41)設置於該底框(3)之一垂直側,且此二調節組(41,)設置於該 底,(3)之一水平側,使得該調節組(41)係控制該底框在平面 之第一軸向(L1)上的位置,透過此二調節組(41,)的同步操作, 而可以控制該底框(3)在平面之第二軸向(L2)上的位置,且該第 -軸向(L1)係與第二軸向㈣相互垂直。另外,透過此二調節組 ㈣之-的單獨操作,而可以控制該底框⑶在平面之旋轉轴向 (R)上的位置。 8 M266682 第六圖係顯示本創作之PCB曝光機底片定位結構之調節· 組另一實施例的立體組合視圖。 參考第六圖所顯示,前述之調節組(41)或(41,),係一柱狀· 之轉動手輪(41a)沿轴向延伸形成一轉軸(41h)而樞接於該基座· (1)中,該轉軸(41h)則透過一銜接齒輪組(41i)動力連結一螺桿 (jib)的一端,該螺桿(41b)中具有兩處位置枢接於基座(1)中,且- 支撐座(41c)底部形成一内螺紋而嚙合該螺桿(4比),且該支撐 座(41c)頂端形成一滑軌(41d),該滑執(41句係垂直該螺桿 (41b) ’而可承載一滑動座(41e),使得該滑動座(41e)可在該支撐 座(41c)頂端滑移,且該滑動座(41e)頂端係固接該底框(3)之底鲁 部。 一刮述之銜接齒輪組(41i),可以係傘齒輪組,或係螺桿與齒 輪所構成之動力傳動轉向機構,使得調節組(41)或(41,)之轉動 手輪(41a)的轉動軸與螺桿(41b)的轉動軸形成一夹角,此夾角可 以係九十度夾角。 前述之基座(1)形成一滑動導桿(41f),該滑動導桿(4均係平 行其螺桿(41b)方向,並配合該支撐座(41c),使得該支撐座(41c) 套設該滑動導桿(41f),而可進行相對滑移運動,其中,該滑動 導桿(41f)係為了使該支撐座(4ic)的直線移動能更穩定。 舞 前述之滑動座(41e)頂端係與該底框(3)形成樞接之結構,其 中,一種較具體的實施方式係在該滑動座(41e)頂端固設一旋轉 軸承(41g),並透過該旋轉軸承(41g)固接該底框(3),使得該底框 (3)可以該旋轉軸承(41g)為轉軸,與該滑動座(4ie)形成相對轉 動。 第七圖係顯示本創作之PCB曝光機底片定位結構之間隙 消除元件一實施例的側視圖。 參考第一、第二以及第七圖所顯示,該定位裝置(4)係包括 設置於該基座(1)上的數個間隙消除元件(43),且各個間隙消除 9 M266682 元件(43)係對應前述之調節組(41)以及(4Γ)之位置,且各個間隙 消除元件(43)設置有可伸縮之一抵柱(43a),該抵柱(43a)係藉由 固設於間隙消除元件(43)之一彈性元件而保持伸長趨勢,丄其 伸縮行程範圍係配合該調節組(41)以及(41,)所達到之底框⑺在 第一軸向(L1)或第二軸向(L2)上的最大調節位置差距。因此,各 個間隙消除元件(43)中的抵柱(43a)會維持壓掣該底框⑶,使得 該底框(3)因為裝設所產生的間隙得以被消除。 第八圖係顯示本創作之PCB曝光機底片定位結構之鎖定 模組一實施例的側視圖。 參考第一、第二以及第八圖所顯示,該定位裝置(4)係包括 設置於該基座(1)中的數個鎖定模組(44),且各個鎖定模組(私) 係没置有一轴部(44a)貫穿該底框(3)中所對應的穿孔(44b),各個 鎖定模組(44)並可控制該軸部(44a)之軸向伸縮位置,且該軸部 (44a)頂端形成一頂端部(44c)而具有大於該底框(3)中所對應之 穿孔(雜)之徑向尺寸,且其軸部(44a)之伸縮行程範圍之最短位 置係配合夾緊該底框⑶,最長位置則係配合鬆開該底框⑶。因 此’各個鎖定模組(44)驅使其軸部(4句收縮至最短位置時,其 頂j(44c)會壓掣該底框(3),使得該底框(3)因此固定不動。The described positioning device (4) is mounted on the base (1) through an adjustment group (41) and two adjustment groups (4Γ), so that the adjustment group (41) and the adjustment group (41,) are Output two orthogonal linear forces. Among them, a more specific embodiment is that the adjustment group (41) is disposed on a vertical side of the bottom frame (3), and the two adjustment groups (41,) are disposed on the bottom, one of the (3) horizontal sides, so that The adjustment group (41) controls the position of the bottom frame in the first axis (L1) of the plane. Through the synchronous operation of the two adjustment groups (41,), the bottom frame (3) can be controlled in the plane. The position on the second axial direction (L2), and the first axial direction (L1) is perpendicular to the second axial direction ㈣. In addition, through the separate operation of the two adjustment groups ㈣-, the position of the bottom frame ⑶ on the plane's rotational axis (R) can be controlled. 8 M266682 The sixth figure is a three-dimensional combination view showing another embodiment of the adjustment structure of the negative film positioning structure of the PCB exposure machine of this creation. With reference to the sixth figure, the aforementioned adjustment group (41) or (41,) is a column-shaped rotating handwheel (41a) extending in the axial direction to form a rotating shaft (41h) and pivoted to the base. In (1), the rotating shaft (41h) is connected to one end of a screw (jib) through an engaging gear set (41i). The screw (41b) has two positions pivotally connected to the base (1), and -The bottom of the support base (41c) forms an internal thread to engage the screw (4 ratio), and the top of the support base (41c) forms a slide rail (41d), and the slide handle (41 sentences are perpendicular to the screw (41b) ' A sliding base (41e) can be carried, so that the sliding base (41e) can slide on the top of the supporting base (41c), and the top of the sliding base (41e) is fixedly connected to the bottom part of the bottom frame (3). A connected gear set (41i) can be a bevel gear set, or a power transmission steering mechanism composed of a screw and a gear, so that the turning handwheel (41a) of the adjustment set (41) or (41,) The rotating shaft and the rotating shaft of the screw (41b) form an included angle, and this included angle can be an angle of ninety degrees. The aforementioned base (1) forms a sliding guide (41f), and the sliding guides (4 are parallel to each other). Direction of screw (41b), Cooperate with the support base (41c), so that the support base (41c) is sleeved with the sliding guide rod (41f) to perform relative sliding movement, wherein the sliding guide rod (41f) is for the support base (4ic) ) Linear movement can be more stable. The top of the aforementioned sliding seat (41e) is a structure that forms a pivot connection with the bottom frame (3), wherein a more specific embodiment is fixed on the top of the sliding seat (41e). A rotary bearing (41g) is fixedly connected to the bottom frame (3) through the rotary bearing (41g), so that the bottom frame (3) can use the rotary bearing (41g) as a rotating shaft, and is opposite to the sliding seat (4ie). Rotate. The seventh figure is a side view showing an embodiment of the gap removing element of the negative structure of the PCB exposure machine of the original creation. Referring to the first, second and seventh figures, the positioning device (4) includes A plurality of clearance elimination elements (43) on the base (1), and each clearance elimination 9 M266682 element (43) corresponds to the position of the aforementioned adjustment group (41) and (4Γ), and each clearance elimination element (43 ) Is provided with a retractable abutment post (43a), which is fixed to one of the clearance eliminating elements (43) The flexible element maintains the elongation trend. Its telescopic stroke range is matched with the bottom frame reached by the adjustment group (41) and (41,). The maximum in the first axial direction (L1) or the second axial direction (L2). Adjust the position gap. Therefore, the abutment posts (43a) in each of the clearance eliminating elements (43) will keep pressing the bottom frame ⑶, so that the gap generated by the bottom frame (3) due to installation can be eliminated. It is a side view showing an embodiment of the locking module of the negative structure of the PCB exposure machine of this creation. Referring to the first, second and eighth figures, the positioning device (4) includes a plurality of locking modules (44) provided in the base (1), and each locking module (private) is not A shaft portion (44a) is provided through the corresponding perforation (44b) in the bottom frame (3), each locking module (44) can control the axial telescopic position of the shaft portion (44a), and the shaft portion (44a) 44a) The top end forms a top end portion (44c) which has a larger radial size than the corresponding perforation (miscellaneous) in the bottom frame (3), and the shortest position of the telescopic travel range of its shaft portion (44a) is matched with clamping The longest position of the bottom frame (3) is to release the bottom frame (3). Therefore, each locking module (44) drives its shaft portion (when 4 sentences are contracted to the shortest position, its top j (44c) will press the bottom frame (3), so that the bottom frame (3) is fixed.

刖述各個鎖疋板組(44)之軸部(44a)之伸縮行程範圍的最長 Γίί配合鬆開該底框(3),且可頂起該上框(2),直到其凸緣⑼ 相互脫離’因此,可藉由該鎖定模組(44)之動力開啟 妓僅為用以解釋本創作之較佳實施例,並非企圖 =對本創作作任何形式上之_,如,凡有在相同之創ξ M266682 【圖式簡單說明】 第一圖係顯示本創作 +則作之pCB曝光機底片定位結構之立 體組合視圖。 第二圖係顯示本創作之pcB曝光機底片定位結構之立 體分解視圖。 第三圖係顯示本創作之PCB曝光機底片定位結構之局 部元件立體組合視圖。 第四圖係顯示本創作之PCB曝光機底片定位結構之上 框閉合狀態的立體分解視圖。 第五圖係顯示本創作之PCB曝光機底片定位結構之調 節組一實施例的立體組合視圖。 第六圖係顯示本創作之PCB曝光機底片定位結構之調 節組另一實施例的立體組合視圖。 第七圖係顯示本創作之pCB曝光機底片定位結構之間 隙消除元件一實施例的侧視圖。 第八圖係顯示本創作之PCB曝光機底片定位結構之鎖 定模組一實施例的側視圖。 【主要元件符號說明】 基座(1) 上框(2;) 凸緣(21) 11 M266682 卡槽C22) 底框(3) 曝光區(31) 定位裝置(4) 調節組(41) 調節組(41’) 轉動手輪(41a) 螺桿(41b) 支撐座(41c) 滑執(41d) 滑動座(41e) 滑動導桿(41f) 旋轉軸承(41g) 轉軸(41h) 銜接齒輪組(4li) 第一軸向(L1) 第二軸向(L2) 旋轉軸向(R) 間隙消除元件(43) 抵柱(43a) 鎖定模組(4句 軸部(44a) 穿孔(44b) 頂端部(44c)The longest length of the telescopic travel range of the shaft portion (44a) of each lock plate group (44) is described, and the bottom frame (3) is loosened, and the upper frame (2) can be pushed up until the flanges ⑼ of each other '' Therefore, the prostitute can be turned on by the power of the lock module (44) only to explain the preferred embodiment of this creation, not to attempt = to make any form of this creation, such as, Chuang ξ M266682 [Schematic description] The first picture is a three-dimensional combined view of the negative positioning structure of the pCB exposure machine of this creation + the original creation. The second figure is an exploded perspective view showing the film positioning structure of the pcB exposure machine in this creation. The third picture is a three-dimensional view of the local components of the negative structure of the PCB exposure machine. The fourth picture is a three-dimensional exploded view showing the closed state of the upper frame of the negative structure of the PCB exposure machine of this creation. The fifth figure is a three-dimensional combined view showing an embodiment of the adjustment group of the negative film positioning structure of the PCB exposure machine of this creation. The sixth figure is a three-dimensional combined view showing another embodiment of the adjustment group of the negative structure of the PCB exposure machine of this creation. The seventh figure is a side view showing an embodiment of the gap-removing element between the film positioning structure of the pCB exposure machine of the present invention. The eighth figure is a side view showing an embodiment of the locking module of the negative structure of the PCB exposure machine of this creation. [Description of main component symbols] Base (1) Upper frame (2;) Flange (21) 11 M266682 Card slot C22) Bottom frame (3) Exposure area (31) Positioning device (4) Adjustment group (41) Adjustment group (41 ') Turn the hand wheel (41a), the screw (41b), the support seat (41c), the slide handle (41d), the slide seat (41e), the slide guide (41f), the rotation bearing (41g), the shaft (41h), and the gear set (4li). First axial direction (L1) Second axial direction (L2) Rotary axial direction (R) Clearance eliminating element (43) Abutment post (43a) Locking module (4 sentences Shaft portion (44a) Perforation (44b) Tip portion (44c) )

Claims (1)

M266682 九、申請專利範圍: 1.:種PCB曝錢底収絲構,其健層魏板曝光平 ,的定位結構,包括-基座、一上框、一底框 ^勤 其特徵在於: 疋仅衷置 該基座係基層電路板曝光機之主結構者; 该上框’係-框體,其一側樞接於該基座 片,並覆魏紐絲置之騎銳板; 纟載曝先底 =框’係-框體浮動設置於該基座頂端所形 =之容置空間’提供承載曝光底片’並可容置基層=板曝 該定位裝置,係-傳動機構,其連結至該底框,使得 ,定位裝置之驅動而平移,以調整該底框位置,達到u 底框各自承載之曝光底片的對位; '-上 其t ’前述之定位裝置係包括設置於該基座上的數個 且係輸入旋轉動力而輸出直線動力之機構,並裝設 ^該基座上而造成各個組的輸出直線動力形成正交的狀 2·=申明專利範圍第!_項所述之PCB曝光機底 :的透過數靖 3· t申利範圍第1項所述之PCB曝光機底片定位結構’盆 ^亥定位裝置係包括設置於該基座上的數綱料除元- 狀各個調節組位置,且間 =除^設置有可伸縮之—抵柱,該抵柱係藉軸設於= 配合各個調節組所達到之底框的最大調節位置=_ 4·如申凊專利範圍第i項所述之pcB曝光機底片定位結構,其 13 M266682 中°亥疋位裝置係包括設置於該基座中的數個鎖定槿 組係設置有—軸部貫穿該底框中所對應的穿孔,各個 奴換、、錢可控繼軸狀軸向雜位置,且該麵 一頂端部而具有大於該底框中所對應之穿孔之徑向尺寸, 軸部之伸縮行程範圍之最短位置係配合夾晋 則係配合鬆開該底框。 认取長位置 5· 6· 7· 8· ^申^專利範’ 4項所述之PCB曝光機底片定位結構,i 鎖定顯之卿之雜行絲_最長位置係配 可頂起該上框,直到該上框之凸緣與卡槽相 =申^專利範圍第i項所述之pCB曝光機底片定位結構,盆 調節组’係—柱狀之轉動手輪固接—螺桿的-端,該螺 ;合^=係樞接於基座中,且—支撑座底部形成—内螺紋而 桿:且該支撐座頂端形成一滑執’該滑軌係垂直該螺 移,且物座’使龍赖座可錢支撐座頂端滑 f且^亥h動座頂端係固接該底框之底部; 其中上’雜動朗端係與該底框形餘接之結構。 m利扼圍第6項所述之pcb曝光機底片定位結構,其 並配動導桿’該滑動導桿係平行其螺桿方向: 對滑^_相 5申tti範圍第6項所獻pcb曝光機底片定位結構,其 底框:4=固設-旋轉軸承’並透過該旋轉軸承固接該 對轉動。〜&框可以該旋轉轴承為轉轴,與該滑動座形成相 如申^專利範圍第!項所述之㈣曝光機底片定位 直 二二,ϊ置中係i域設於該基座上的一調節組以及另ί 。即、”且’者之辦組所輸出的直雜力與後兩者調節組所 14 9· M266682 輸出的直線動力形成相互正交之狀態。 10·如申請專利範圍第9項所述之PCB曝光機底片定位結構,其 中,前者之調節組設置於該底框之一垂直侧,且後者 2 組設置於該底框之一水平側。 °。即 U·如申請專利範圍第1項所述之PCB曝光機底片定位結構,1 中。亥:周命、、且係-柱狀之轉動手輪沿軸向延伸形成一轉輛而 區接於祕座中,該轉軸則透過—銜接齒輪組動纟 的-端,刺桿中具有兩處位置樞接於基座中,且 載且;座頂端形成-滑軌 12該支綱物======可在 u如申請專利範圍第llJM所述之pcB 片 中,該銜接齒輪組,可以係伞齒輪繞曝螺構’其 之動力傳動轉向機構,使得n f;係Ά與㈣輪所構成 的轉動轴職-失肖。°°即轉辭輪_動軸與螺桿 15M266682 Nine, the scope of patent application: 1 .: a PCB exposed to the bottom of the collection structure, its health layer Wei board exposed flat, positioning structure, including-the base, an upper frame, a bottom frame ^ Qin is characterized by: 疋The base frame is only the main structure of the base circuit board exposure machine; the upper frame is a frame body, one side of which is pivotally connected to the base plate, and covered with a sharp plate mounted by Wei Nisi; Exposure bottom = frame 'system-frame floating on the top of the pedestal = accommodation space' provided bearing exposure film 'and can accommodate the base layer = plate exposure the positioning device, system-transmission mechanism, which is connected to The bottom frame is such that the positioning device is driven and translated to adjust the position of the bottom frame to reach the alignment of the exposure film carried by the u bottom frame; '-上 其 t' The aforementioned positioning device includes a set on the base Several of the above-mentioned mechanisms are inputting rotational power and outputting linear power, and are installed on the base to cause the output linear power of each group to form an orthogonal shape. 2 · = Declaration of patent scope! The bottom of the PCB exposure machine described in item _: The position of the negative film positioning structure of the PCB exposure machine described in the first paragraph of the “Shenli Range” item 1 is provided. The positioning device includes a number of materials arranged on the base. In addition, the position of each adjustment group is divided, and the interval = except ^ is provided with a retractable-abutment column, the abutment column is set by the axis = the maximum adjustment position of the bottom frame reached with each adjustment group = _ 4 · 如The film positioning structure of the pcB exposure machine described in item i of the patent application, its 13 M266682 mid-degree position device includes several locking hibiscus systems arranged in the base. The shaft portion penetrates the bottom frame. The corresponding perforation in the middle can control the axis-shaped axial miscellaneous position of the slave, and the top end of the surface has a larger radial size than the corresponding perforation in the bottom frame, and the telescopic stroke range of the shaft The shortest position is to fit the clip to release the bottom frame. Recognize the long position 5 · 6 · 7 · 8 · ^ Shen ^ Patent Fan's 4 PCB exposure machine positioning structure described in the above, i lock the clear line of the miscellaneous wires _ the longest position is equipped to lift the upper frame Until the flange of the upper frame and the slot are equal to the film positioning structure of the pCB exposure machine described in item i of the patent application, the basin adjustment group is a series of cylindrical handwheels fixed to the end of the screw. The screw; ^ = is pivotally connected in the base, and-the bottom of the support base is formed-an internal thread and a rod: and the top of the support base forms a slide handle "the slide rail is perpendicular to the screw movement, and the object seat" makes The top of the long support seat slides f and the top end of the movable seat is fixedly connected to the bottom of the bottom frame; wherein the upper hybrid end is connected to the bottom frame in a structure. The film positioning structure of the pcb exposure machine described in item 6 is combined with a guide rod. The sliding guide rod is parallel to its screw direction: anti-slip ^ _phase 5 application tti range pct exposure provided by item 6 The bottom plate positioning structure of the machine, its bottom frame: 4 = fixed-rotary bearing ', and the pair of rotations are fixedly connected through the rotary bearing. ~ &Amp; The frame can use the rotary bearing as a rotating shaft, forming a sliding bearing, which is similar to the patent application! The positioning of the negative film of the exposure machine described in item 2 is straight, the centering area is an adjustment group provided on the base and the other. That is to say, the direct hybrid force output by the “and” group and the linear power output by M266682 of the latter two adjustment groups form a mutually orthogonal state. 10. The PCB as described in item 9 of the scope of patent application The negative film positioning structure of the exposure machine, wherein the former adjustment group is set on one vertical side of the bottom frame, and the latter two groups are set on one horizontal side of the bottom frame. ° U. As described in the first item of the scope of patent application The positioning structure of the film exposure of the PCB exposure machine, 1 in. Hai: Zhou Ming, and the system-column-shaped rotating handwheel extends in the axial direction to form a car and is connected to the secret seat, and the shaft is connected to the gear set through— At the -end of the movable, two positions in the thorn rod are pivotally connected to the base, and carry; the top of the seat is formed-a slide rail 12 This branch ====== In the pcB chip, the connecting gear set can be used to turn the bevel gear around the exposed screw structure and its power transmission steering mechanism, so that nf; the rotation axis composed of the Ά and the stern wheel. Wheel_movement shaft and screw 15
TW93214461U 2004-09-10 2004-09-10 Negative film positioning device of PCB exposure machine TWM266682U (en)

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Application Number Priority Date Filing Date Title
TW93214461U TWM266682U (en) 2004-09-10 2004-09-10 Negative film positioning device of PCB exposure machine

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TWM266682U true TWM266682U (en) 2005-06-01

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI410192B (en) * 2008-02-04 2013-09-21 Chime Ball Technology Co Ltd Two-sided pcb photo exposing apparatus and method thereof
CN117420741A (en) * 2023-12-19 2024-01-19 深圳市欣光辉科技有限公司 Exposure positioning structure and exposure machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI410192B (en) * 2008-02-04 2013-09-21 Chime Ball Technology Co Ltd Two-sided pcb photo exposing apparatus and method thereof
CN117420741A (en) * 2023-12-19 2024-01-19 深圳市欣光辉科技有限公司 Exposure positioning structure and exposure machine
CN117420741B (en) * 2023-12-19 2024-03-12 深圳市欣光辉科技有限公司 Exposure positioning structure and exposure machine

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