TWI859429B - 用於決定三維資訊的方法、非暫時性電腦可讀媒體及系統 - Google Patents

用於決定三維資訊的方法、非暫時性電腦可讀媒體及系統 Download PDF

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TWI859429B
TWI859429B TW110109090A TW110109090A TWI859429B TW I859429 B TWI859429 B TW I859429B TW 110109090 A TW110109090 A TW 110109090A TW 110109090 A TW110109090 A TW 110109090A TW I859429 B TWI859429 B TW I859429B
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TW202207160A (zh
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安娜 萊芬特
拉法爾 比斯翠札
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以色列商應用材料以色列公司
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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/97Determining parameters from multiple pictures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00Pattern recognition
    • G06F18/20Analysing
    • G06F18/24Classification techniques
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T17/00Three dimensional [3D] modelling, e.g. data description of 3D objects
    • G06T17/20Finite element generation, e.g. wire-frame surface description, tesselation
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0012Biomedical image inspection
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/50Depth or shape recovery
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00Arrangements for image or video recognition or understanding
    • G06V10/70Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/77Processing image or video features in feature spaces; using data integration or data reduction, e.g. principal component analysis [PCA] or independent component analysis [ICA] or self-organising maps [SOM]; Blind source separation
    • G06V10/774Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
    • G06V10/7747Organisation of the process, e.g. bagging or boosting
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00Scenes; Scene-specific elements
    • G06V20/60Type of objects
    • G06V20/64Three-dimensional objects
    • G06V20/653Three-dimensional objects by matching three-dimensional models, e.g. conformal mapping of Riemann surfaces
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10056Microscopic image
    • G06T2207/10061Microscopic image from scanning electron microscope
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20081Training; Learning
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20084Artificial neural networks [ANN]
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00Indexing scheme relating to image or video recognition or understanding
    • G06V2201/06Recognition of objects for industrial automation
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00Indexing scheme relating to image or video recognition or understanding
    • G06V2201/12Acquisition of 3D measurements of objects

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  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Software Systems (AREA)
  • Data Mining & Analysis (AREA)
  • Artificial Intelligence (AREA)
  • Evolutionary Computation (AREA)
  • Multimedia (AREA)
  • Quality & Reliability (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Medical Informatics (AREA)
  • Evolutionary Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • General Engineering & Computer Science (AREA)
  • Databases & Information Systems (AREA)
  • Computing Systems (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Computer Graphics (AREA)
  • Geometry (AREA)
  • Electromagnetism (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW110109090A 2020-03-17 2021-03-15 用於決定三維資訊的方法、非暫時性電腦可讀媒體及系統 TWI859429B (zh)

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US16/821,831 2020-03-17
US16/821,831 US11321835B2 (en) 2020-03-17 2020-03-17 Determining three dimensional information

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TW202207160A TW202207160A (zh) 2022-02-16
TWI859429B true TWI859429B (zh) 2024-10-21

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US (1) US11321835B2 (enExample)
JP (1) JP7648410B2 (enExample)
KR (1) KR102765100B1 (enExample)
CN (1) CN113405493B (enExample)
TW (1) TWI859429B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11288174B2 (en) 2020-02-19 2022-03-29 Applied Materials Israel Ltd. Testing a code using real time analysis
US11443420B2 (en) * 2020-12-28 2022-09-13 Applied Materials Israel Ltd. Generating a metrology recipe usable for examination of a semiconductor specimen
US12480898B2 (en) 2022-09-01 2025-11-25 Applied Materials Israel Ltd. Z-profiling of wafers based on X-ray measurements
JP7754058B2 (ja) * 2022-11-11 2025-10-15 トヨタ自動車株式会社 情報処理装置、情報処理方法、及び情報処理プログラム

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6246787B1 (en) * 1996-05-31 2001-06-12 Texas Instruments Incorporated System and method for knowledgebase generation and management
CN103946889A (zh) * 2011-10-14 2014-07-23 因格瑞恩股份有限公司 用于生成样品的多维图像的双图像方法和系统
TWI669750B (zh) * 2016-12-16 2019-08-21 荷蘭商Asml荷蘭公司 用於影像分析之方法及設備
TW202006868A (zh) * 2018-07-08 2020-02-01 香港商康代影像技術方案香港有限公司 用於對準之系統及方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3490490B2 (ja) * 1994-01-28 2004-01-26 株式会社東芝 パターン画像処理装置及び画像処理方法
JP3961657B2 (ja) * 1998-03-03 2007-08-22 株式会社東芝 パターン寸法測定方法
US6670610B2 (en) 2001-11-26 2003-12-30 Applied Materials, Inc. System and method for directing a miller
US7764824B2 (en) * 2003-07-18 2010-07-27 Applied Materials Israel, Ltd. Method for defect detection and process monitoring based on SEM images
US8013301B2 (en) * 2003-10-08 2011-09-06 Applied Materials Israel, Ltd. Measurement system and a method
US8392418B2 (en) * 2009-06-25 2013-03-05 University Of Tennessee Research Foundation Method and apparatus for predicting object properties and events using similarity-based information retrieval and model
US8098926B2 (en) * 2007-01-10 2012-01-17 Applied Materials Israel, Ltd. Method and system for evaluating an evaluated pattern of a mask
US7667858B2 (en) * 2007-01-12 2010-02-23 Tokyo Electron Limited Automated process control using optical metrology and a correlation between profile models and key profile shape variables
US7511835B2 (en) * 2007-04-12 2009-03-31 Tokyo Electron Limited Optical metrology using a support vector machine with simulated diffraction signal inputs
US8709269B2 (en) 2007-08-22 2014-04-29 Applied Materials Israel, Ltd. Method and system for imaging a cross section of a specimen
KR101286240B1 (ko) * 2007-10-23 2013-07-15 삼성전자주식회사 반도체 구조물의 형상을 예정하는 공정 파라 메타의 예측시스템, 상기 공정 파라 메타의 예측 시스템을 가지는반도체 제조 장비 및 그 장비의 사용방법
US20090296073A1 (en) 2008-05-28 2009-12-03 Lam Research Corporation Method to create three-dimensional images of semiconductor structures using a focused ion beam device and a scanning electron microscope
JP5479782B2 (ja) * 2009-06-02 2014-04-23 株式会社日立ハイテクノロジーズ 欠陥画像処理装置、欠陥画像処理方法、半導体欠陥分類装置および半導体欠陥分類方法
JP2011027461A (ja) * 2009-07-22 2011-02-10 Renesas Electronics Corp パターン形状計測方法、半導体装置の製造方法、およびプロセス制御システム
US8838422B2 (en) * 2011-12-11 2014-09-16 Tokyo Electron Limited Process control using ray tracing-based libraries and machine learning systems
WO2019006222A1 (en) * 2017-06-30 2019-01-03 Kla-Tencor Corporation SYSTEMS AND METHODS FOR PREDICTING DEFECTS AND CRITICAL DIMENSION USING DEEP LEARNING IN A SEMICONDUCTOR MANUFACTURING PROCESS
EP3451061A1 (en) * 2017-09-04 2019-03-06 ASML Netherlands B.V. Method for monitoring a manufacturing process
EP3682376A1 (en) * 2017-09-15 2020-07-22 Saudi Arabian Oil Company Inferring petrophysical properties of hydrocarbon reservoirs using a neural network
JP6937254B2 (ja) * 2018-02-08 2021-09-22 株式会社日立ハイテク 検査システム、画像処理装置、および検査方法
WO2019198143A1 (ja) * 2018-04-10 2019-10-17 株式会社日立製作所 加工レシピ生成装置
US10811219B2 (en) 2018-08-07 2020-10-20 Applied Materials Israel Ltd. Method for evaluating a region of an object
US20200027021A1 (en) * 2019-09-27 2020-01-23 Kumara Sastry Reinforcement learning for multi-domain problems

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6246787B1 (en) * 1996-05-31 2001-06-12 Texas Instruments Incorporated System and method for knowledgebase generation and management
CN103946889A (zh) * 2011-10-14 2014-07-23 因格瑞恩股份有限公司 用于生成样品的多维图像的双图像方法和系统
TWI669750B (zh) * 2016-12-16 2019-08-21 荷蘭商Asml荷蘭公司 用於影像分析之方法及設備
TW202006868A (zh) * 2018-07-08 2020-02-01 香港商康代影像技術方案香港有限公司 用於對準之系統及方法

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Publication number Publication date
TW202207160A (zh) 2022-02-16
JP7648410B2 (ja) 2025-03-18
US20210295499A1 (en) 2021-09-23
JP2021166284A (ja) 2021-10-14
KR102765100B1 (ko) 2025-02-11
US11321835B2 (en) 2022-05-03
KR20210117195A (ko) 2021-09-28
CN113405493B (zh) 2023-10-24
CN113405493A (zh) 2021-09-17

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