TWI844980B - 晶圓裝卸機及其晶圓檢測方法 - Google Patents

晶圓裝卸機及其晶圓檢測方法 Download PDF

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TWI844980B
TWI844980B TW111138084A TW111138084A TWI844980B TW I844980 B TWI844980 B TW I844980B TW 111138084 A TW111138084 A TW 111138084A TW 111138084 A TW111138084 A TW 111138084A TW I844980 B TWI844980 B TW I844980B
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wafer
removal device
handling machine
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游宗哲
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盛詮科技股份有限公司
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Priority to US18/176,570 priority patent/US20240120222A1/en
Priority to CN202320354414.9U priority patent/CN219418985U/zh
Priority to JP2023058365A priority patent/JP2024055739A/ja
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/14Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/16Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

本發明係一種晶圓裝卸機及其晶圓檢測方法,其包含一安裝座,安裝座上設置有一載置台;一開口部,其包含一板體及一驅動組件,驅動組件設置於板體,開口部以板體設置於安裝座的一側面;一開閉門,其包含一門板、一取蓋裝置及一檢測裝置,取蓋裝置及檢測裝置設置於門板的一側面,門板連接於驅動組件且可相對於板體移動,取蓋裝置封閉開口;當設置有晶圓傳送盒時,藉由在開閉門開啟的過程中,即可同時完成對各晶圓之檢測動作,檢測各晶圓是否有凸片、斜置或相互貼靠重疊之情形產生,以及晶圓之變形量,達到可減少製程步驟增進生產效率之功效。

Description

晶圓裝卸機及其晶圓檢測方法
本發明係涉及一種晶圓盒之裝載裝置,尤指一種晶圓裝卸機。
現今半導體製程中,晶圓需經過數個工作站進行加工處理,而在站與站之間等待的過程中,一般會先將晶圓放置於晶圓傳送盒(FOUP)中,並且將晶圓傳送盒置於一裝卸機(Load Port)上,其目的是為了使晶圓保持在一高度無塵之環境中,且可利用裝卸機對晶圓傳送盒的蓋體進行開閉動作,並透過氣體的輸送使得在開閉過程中可保持晶圓傳送盒內部的無塵狀態,如臺灣發明公告號TW I379374B之處理容器中的物件之方法及使用於該方法之蓋開啟/關閉系統,利用清潔氣體供應噴嘴配置於前開式介面機械標準系統之開口部的兩個垂直側的外側,幕狀噴嘴安裝在開口部的頂側上方,當啟閉晶圓盒的蓋時,各清潔氣體供應噴嘴及幕狀噴嘴可噴出氣體以維持晶圓盒內部的清潔。
然而,目前市面上的裝卸機如同前述,其主要功能是用以承載晶圓傳送盒並對蓋進行開閉之動作,且對蓋進行開閉之動作需花費一定的等待時間,如此在製程中無形的增加了不少時間上的浪費,進而也會增加成本;因此,如何增進現有技術裝卸機的功能,增進其功能是有待加以思考並予以改良之必要。
有鑒於現有技術的不足,本發明提供一種晶圓裝卸機及其晶圓檢測方法,其藉由將檢測裝置設置於開閉門,達到開閉門開啟時同步進行檢測動作之目的。
為達上述之發明目的,本發明所採用的技術手段為設計一種晶圓裝卸機,其包含: 一安裝座,其具有一頂面,該頂面上設置有一載置台,該載置台設置有一扣件,該載置台可相對於該安裝座移動; 一開口部,其包含一板體及一驅動組件,該板體貫穿有一開口及一導口,該驅動組件設置於該板體位於該導口的位置,該開口部以該板體設置於該安裝座的一側面,該開口相鄰於該載置台; 一開閉門,其包含一門板、一取蓋裝置及一檢測裝置,該門板的一端設置有一連接桿,該取蓋裝置及該檢測裝置設置於該門板的一側面,該開閉門以該連接桿連接於該驅動組件,該門板可相對於該板體移動,該取蓋裝置封閉該開口。
為達到上述的發明目的,本發明進一步提供一種晶圓裝卸機之晶圓檢測方法,該晶圓裝卸機用以承載一晶圓傳送盒,該晶圓傳送盒具有一前蓋且容置有複數晶圓,其作業步驟為: 步驟一:將該晶圓傳送盒設置於該安裝座上的該載置台; 步驟二:該載置台的該扣件與該晶圓傳送盒相連接; 步驟三:該載置台將該晶圓傳送盒自起始位置移動至該開口部位於該開口的位置,使得該晶圓傳送盒的該前蓋與該開閉門的該取蓋裝置相連接; 步驟四:該取蓋裝置利用該卡固件與該前蓋之間進行解鎖該前蓋之動作後再抽真空,該取蓋裝置固持該前蓋並後移開啟該開口; 步驟五:該開閉門藉由該驅動組件驅動並向下移動一段距離而停止; 步驟六:該檢測裝置的該二旋轉臂朝向前方方向樞轉並前移直至該二旋轉臂上的各該偵測器對齊至感測位置; 步驟七:當各該偵測器定位後,該開閉門繼續向下移動,而在移動的過程中,各該偵測器可用以檢測各該晶圓是否有凸片、斜置或相互貼靠重疊之情形產生,以及晶圓之變形量; 步驟八:當檢測完畢後,該檢測裝置的該二旋轉臂反向樞轉收合,該開閉門上移後再前移至關閉該開口; 步驟九:該取蓋裝置將該前蓋闔上該晶圓傳送盒並上鎖; 步驟十:該取蓋裝置將該前蓋上鎖後再破真空,退回至起始位置,該扣件與該晶圓傳送盒相分離。
進一步而言,所述之晶圓裝卸機,其中該檢測裝置包含一承載架、一滑軌組件、二旋轉臂及複數偵測器,該承載架固設於該門板,該滑軌組件可移動地設置於該承載架上,各該旋轉臂的一端間隔地樞設於該滑軌組件,各該偵測器設置於各該旋轉臂的另一端。
進一步而言,所述之晶圓裝卸機,其中該取蓋裝置包含一片體及複數卡固件,該片體固設於該門板,各該卡固件設置於該片體,該片體位於該開口位置。
進一步而言,所述之晶圓裝卸機,其中該載置台進一步形成有複數導氣連接頭及複數導氣通道,各該導氣連接頭呈間隔排列,各該導氣通道成形於該載置台內且分別與各該導氣連接頭相連通。
進一步而言,所述之晶圓裝卸機,其中各該偵測器為光纖感測頭。
本發明的優點在於,藉由在開閉門開啟的過程中,即可利用檢測裝置同時完成對各晶圓之檢測動作,達到可減少製程步驟增進生產效率之功效,且可利用滑軌組件調整二旋轉臂的位置,並針對不同尺寸之晶圓進行檢測,具有高度通用性。
以下配合圖式以及本發明之較佳實施例,進一步闡述本發明為達成預定發明目的所採取的技術手段。
請參閱圖1所示,本發明之晶圓裝卸機,其包含一安裝座10、一開口部20及一開閉門30。
請參閱圖2及圖3所示,安裝座10具有一頂面11,頂面11上設置有一載置台12,載置台12設置有一扣件121,且載置台12可相對於安裝座10移動,前述載置台12之扣件121及載置台12的移動方式為現有技術故不詳述,但不以此為限,亦可不設置扣件121。
開口部20包含一板體21及一驅動組件22,板體21貫穿有一開口211及一導口212,開口211及導口212分別位於開口部20的上下二端部,驅動組件22設置於板體21位於導口212的位置,驅動組件22為包含有步進馬達、螺桿及線性滑軌之組件,可沿著導口212線性移動,在本實施例中為上下移動,前述驅動組件22為現有技術,其細部構造不再贅述,開口部20以板體21設置於安裝座10的一側面,開口211相鄰於載置台12。
請參閱圖2、圖4及圖5所示,開閉門30包含一門板31、一取蓋裝置32、一檢測裝置33及一連接桿34,門板31的一側面內凹形成一凹槽,取蓋裝置32包含一片體321及複數卡固件322,片體321固設於門板31的凹槽槽口,各卡固件322設置於片體321上,卡固件322為現有技術用以連接晶圓傳送盒的前蓋(圖式中未示)之制式組件,其細部構造不再贅述。
檢測裝置33包含一承載架331、一滑軌組件332、二旋轉臂333及複數偵測器334,滑軌組件332可移動地設置於承載架331上,二旋轉臂333的一端間隔地樞設於滑軌組件332,每一旋轉臂333的一端藉由一驅動裝置(圖式中未示)驅動樞轉或線性移動,利用驅動裝置驅動樞轉或線性移動為現有技術之應用故不詳述,每一旋轉臂333的另一端設置有至少一偵測器334,在本實施例中,偵測器334為光纖感測頭,可單獨投射使用或相對的二偵測器334相互投射及接收使用,偵測器334之數量及形式不以此為限,可依使用者需求作改變,檢測裝置33以承載架331設置於片體321上的上方位置且位於凹槽內,各旋轉臂333可樞轉凸伸於片體321的外側,連接桿34的一端的固設於片體321,另一端連接於驅動組件22,開閉門30藉由連接桿34連接於驅動組件22使之可相對於板體21移動,取蓋裝置32的片體321可開啟或封閉開口211。
本發明使用時,請參閱圖3、圖6至圖8所示,配合容置有複數晶圓(圖式中未示)之晶圓傳送盒40為例說明,晶圓傳送盒40為具有一前蓋42之盒體(前開式晶圓盒),其檢測方法包含以下步驟:
步驟一:將晶圓傳送盒40設置於安裝座10上的載置台12。
步驟二:載置台12的扣件121與晶圓傳送盒40相連接。
步驟三:載置台12將晶圓傳送盒40自起始位置移動至開口部20位於開口211的位置,使得晶圓傳送盒40的前蓋42與開閉門30的取蓋裝置32相連接。
步驟四:取蓋裝置32利用卡固件322與前蓋42之間進行解鎖前蓋42之動作後再抽真空,取蓋裝置32固持前蓋42並後移開啟開口211。
步驟五:開閉門30藉由驅動組件22驅動並向下移動一段距離而停止。
步驟六:檢測裝置33的二旋轉臂333朝向前方方向樞轉並前移直至二旋轉臂333上的各偵測器334對齊至感測位置。
步驟七:當各偵測器334定位後,開閉門30繼續向下移動,而在移動的過程中,各偵測器334可用以檢測各晶圓是否有凸片、斜置或相互貼靠重疊之情形產生,以及晶圓之變形量。
步驟八:當檢測完畢後,檢測裝置33的二旋轉臂333反向樞轉收合,開閉門30上移後再前移至關閉開口211。
步驟九:取蓋裝置32將前蓋42闔上晶圓傳送盒40並上鎖。
步驟十:取蓋裝置32將前蓋42上鎖後再破真空,退回至起始位置,扣件121與晶圓傳送盒40相分離。
前述之方法是藉由在開閉門30開啟的過程中,即可同時完成對各晶圓之檢測動作,達到可減少製程步驟增進生產效率之功效,且可利用滑軌組件332調整二旋轉臂333的位置,並針對不同尺寸之晶圓進行檢測。
請參閱圖9及圖10所示,為本發明之另一實施例,其中開口部20及開閉門30與前述實施例相同,主要差異在於安裝座10A的不同,本實施例之載置台12A進一步形成有複數導氣連接頭122A及複數導氣通道123A,各導氣連接頭122A呈間隔排列,各導氣通道123A成形於載置台12A內且一端分別與各導氣連接頭122A相連通,另一端連接一供氣裝置(圖式中未示),使用時,將形成有連接孔41A之晶圓傳送盒40A放置於載置台12A上,各連接孔41A與各導氣連接頭122A相連通,使用者可藉由供氣裝置將氮氣經由導氣連接頭122A填充至晶圓傳送盒40A中或將氮氣自晶圓傳送盒40A內抽離,具有預防晶圓表面生成氧化物的優點。
以上所述僅是本創作之較佳實施例而已,並非對本創作做任何形式上的限制,雖然本創作已以較佳實施例揭露如上,然而並非用以限定本創作,任何所屬技術領域中具有通常知識者,在不脫離本創作技術方案的範圍內,當可利用上述揭示的技術內容作出些許更動或修飾作為等同變化的等效實施例,但凡是未脫離本創作技術方案的內容,依據本創作的技術實質對以上實施例所做的任何簡單修改、等同變化與修飾,均仍屬於本創作技術方案的範圍內。
10:安裝座 10A:安裝座 11:頂面 12:載置台 12A:載置台 121:扣件 122A:導氣連接頭 123A:導氣通道 20:開口部 21:板體 211:開口 212:導口 22:驅動組件 30:開閉門 31:門板 32:取蓋裝置 321:片體 322:卡固件 33:檢測裝置 331:承載架 332:滑軌組件 333:旋轉臂 334:偵測器 34:連接桿 40:晶圓傳送盒 40A:晶圓傳送盒 41A:連接孔 42:前蓋
圖1係本發明之立體外觀圖。 圖2係本發明之主要元件分解圖。 圖3係本發明之另一角度的主要元件分解圖。 圖4係本發明之開閉門的主要元件分解圖。 圖5係本發明之取蓋裝置後視局部分解圖。 圖6~圖8係本發明之使用示意圖。 圖9係本發明之另一實施例局部放大圖。 圖10係本發明之另一實施例使用示意圖。
10:安裝座 11:頂面 12:載置台 121:扣件 20:開口部 21:板體 211:開口 30:開閉門 31:門板 321:片體 322:卡固件

Claims (5)

  1. 一種晶圓裝卸機,其包含:一安裝座,其具有一頂面,該頂面上設置有一載置台,該載置台設置有一扣件,該載置台可相對於該安裝座移動;一開口部,其包含一板體及一驅動組件,該板體貫穿有一開口及一導口,該驅動組件設置於該板體位於該導口的位置,該開口部以該板體設置於該安裝座的一側面,該開口相鄰於該載置台;一開閉門,其包含一門板、一取蓋裝置及一檢測裝置,該門板的一端設置有一連接桿,該取蓋裝置及該檢測裝置設置於該門板的一側面,該開閉門以該連接桿連接於該驅動組件,該門板可相對於該板體移動,該取蓋裝置封閉該開口,其中該取蓋裝置包含一片體及複數卡固件,該片體固設於該門板,各該卡固件設置於該片體,該片體位於該開口位置。
  2. 如請求項1所述之晶圓裝卸機,其中該檢測裝置包含一承載架、一滑軌組件、二旋轉臂及複數偵測器,該承載架固設於該門板,該滑軌組件可移動地設置於該承載架上,各該旋轉臂的一端間隔地樞設於該滑軌組件,各該偵測器設置於各該旋轉臂的另一端。
  3. 如請求項1或2所述之晶圓裝卸機,其中該載置台進一步形成有複數導氣連接頭及複數導氣通道,各該導氣連接頭呈間隔排列,各該導氣通道成形於該載置台內且分別與各該導氣連接頭相連通。
  4. 如請求項3所述之晶圓裝卸機,其中各該偵測器為光纖感測頭。
  5. 一種晶圓裝卸機之晶圓檢測方法,其應用於請求項1至4中任一項之晶圓裝卸機,該晶圓裝卸機用以承載一晶圓傳送盒,該晶圓傳送盒具有一前蓋且容置有複數晶圓,其作業步驟為: 步驟一:將該晶圓傳送盒設置於該安裝座上的該載置台;步驟二:該載置台的該扣件與該晶圓傳送盒相連接;步驟三:該載置台將該晶圓傳送盒自起始位置移動至該開口部位於該開口的位置,使得該晶圓傳送盒的該前蓋與該開閉門的該取蓋裝置相連接;步驟四:該取蓋裝置利用該卡固件與該前蓋之間進行解鎖該前蓋之動作後再抽真空,該取蓋裝置固持該前蓋並後移開啟該開口;步驟五:該開閉門藉由該驅動組件驅動並向下移動一段距離而停止;步驟六:該檢測裝置的該二旋轉臂朝向前方方向樞轉並前移直至該二旋轉臂上的各該偵測器對齊至感測位置;步驟七:當各該偵測器定位後,該開閉門繼續向下移動,而在移動的過程中,各該偵測器可用以檢測各該晶圓是否有凸片、斜置或相互貼靠重疊之情形產生,以及晶圓之變形量;步驟八:當檢測完畢後,該檢測裝置的該二旋轉臂反向樞轉收合,該開閉門上移後再前移至關閉該開口;步驟九:該取蓋裝置將該前蓋闔上該晶圓傳送盒並上鎖;步驟十:該取蓋裝置將該前蓋上鎖後再破真空,退回至起始位置,該扣件與該晶圓傳送盒相分離。
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US6013920A (en) * 1997-11-28 2000-01-11 Fortrend Engineering Coirporation Wafer-mapping load post interface having an effector position sensing device
TW200926336A (en) * 2007-07-31 2009-06-16 Tdk Corp Method of processing an object in a container and lid opening/closing system used in the method
TWM626076U (zh) * 2021-12-23 2022-04-21 盛詮科技股份有限公司 晶圓檢測裝置

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US6013920A (en) * 1997-11-28 2000-01-11 Fortrend Engineering Coirporation Wafer-mapping load post interface having an effector position sensing device
TW200926336A (en) * 2007-07-31 2009-06-16 Tdk Corp Method of processing an object in a container and lid opening/closing system used in the method
TWM626076U (zh) * 2021-12-23 2022-04-21 盛詮科技股份有限公司 晶圓檢測裝置

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