TWI839997B - Wafer transfer apparatus and wafer transfer system - Google Patents
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Description
本揭露是有關一種晶圓傳輸設備及一種具有此晶圓傳輸設備的晶圓傳輸系統。The present disclosure relates to a wafer transport device and a wafer transport system having the wafer transport device.
隨著科技的進步,含有半導體元件的電子設備更加地普遍,因此晶圓的生產與傳輸也越來越重要。在部分的半導體機台中,晶圓傳輸的順序為:發送索引器、載入加載鎖腔室、製程腔室、載出加載鎖腔室及接收索引器。傳統上,晶圓感測器設置於腔室中或機械手臂旁,以避免晶圓受損。然而,由於晶圓掉片於載出加載鎖腔室與接收索引器之間的位置無法透過上述的配置來偵測,載出加載鎖腔室的出口閥門與接收索引器將持續作動,而晶圓會因出口閥門關閉或者接收索引器的升降而導致破片,使產品受到傷害,進而導致經濟損失。With the advancement of technology, electronic devices containing semiconductor components are becoming more common, so the production and transportation of wafers are becoming more and more important. In some semiconductor machines, the order of wafer transportation is: sending indexer, loading load lock chamber, process chamber, unloading load lock chamber and receiving indexer. Traditionally, wafer sensors are installed in the chamber or next to the robot arm to prevent wafer damage. However, since the position of the wafer falling between the unloading load lock chamber and the receiving indexer cannot be detected by the above configuration, the exit valve of the unloading load lock chamber and the receiving indexer will continue to operate, and the wafer will be broken due to the closing of the exit valve or the lifting of the receiving indexer, causing damage to the product and thus leading to economic losses.
本揭露之一技術態樣為一種晶圓傳輸設備。One technical aspect of the present disclosure is a wafer transfer device.
根據本揭露之一些實施方式,一種晶圓傳輸設備包括載出腔室、接收索引器、偵測組件與控制器。載出腔室具有出口閥門。接收索引器可升降地位於載出腔室具有出口閥門的一側,且配置以接收從載出腔室中傳送出的晶圓。載出腔室的該側與接收索引器之間有一間距。偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,配置以偵測該間距中的晶圓。控制器電性連接出口閥門與偵測組件,其中當偵測組件偵測到該間距中的晶圓時,控制器配置以停止出口閥門與接收索引器的移動。According to some embodiments of the present disclosure, a wafer transport device includes a load-out chamber, a receiving indexer, a detection assembly and a controller. The load-out chamber has an exit valve. The receiving indexer is liftably located on a side of the load-out chamber having the exit valve, and is configured to receive wafers transferred from the load-out chamber. There is a distance between the side of the load-out chamber and the receiving indexer. The detection assembly is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect wafers in the distance. The controller electrically connects the exit valve and the detection assembly, wherein when the detection assembly detects a wafer in the distance, the controller is configured to stop the movement of the exit valve and the receiving indexer.
在一些實施方式中,上述偵測組件具有訊號發射接收器與訊號反射器。訊號發射接收器位於訊號反射器上方。訊號反射器配置以將來自訊號發射接收器的訊號反射回訊號發射接收器。In some embodiments, the detection component has a signal transmitter receiver and a signal reflector. The signal transmitter receiver is located above the signal reflector. The signal reflector is configured to reflect the signal from the signal transmitter receiver back to the signal transmitter receiver.
在一些實施方式中,當上述晶圓傳輸設備的接收索引器接收從載出腔室中傳送出的晶圓時,且晶圓位於載出腔室的該側與接收索引器之間的間距中,訊號發射接收器與訊號反射器分別位於晶圓的上下側而使訊號被晶圓阻擋。In some embodiments, when the receiving indexer of the wafer transport device receives a wafer transferred from a load-out chamber, and the wafer is located in the distance between the side of the load-out chamber and the receiving indexer, the signal transmitting receiver and the signal reflector are respectively located on the upper and lower sides of the wafer so that the signal is blocked by the wafer.
在一些實施方式中,上述訊號發射接收器與訊號反射器在垂直方向上對齊。In some implementations, the signal transmitter receiver is vertically aligned with the signal reflector.
在一些實施方式中,上述訊號發射接收器位於載出腔室的頂面與接收索引器的頂面上方。In some embodiments, the signal transmitting receiver is located above the top surface of the unloading chamber and the top surface of the receiving indexer.
在一些實施方式中,上述訊號反射器位於載出腔室的頂面與接收索引器的頂面下方。In some embodiments, the signal reflector is located below the top surface of the unload chamber and the top surface of the receiving indexer.
在一些實施方式中,上述晶圓傳輸設備更包括電磁閥。電磁閥電性連接出口閥門與控制器。In some implementations, the wafer transport device further includes an electromagnetic valve that electrically connects the outlet valve and the controller.
在一些實施方式中,上述載出腔室更包括與出口閥門相對的入口閥門。In some embodiments, the unloading chamber further includes an inlet valve opposite to the outlet valve.
本揭露之另一技術態樣為一種晶圓傳輸系統。Another technical aspect of the present disclosure is a wafer transport system.
根據本揭露之一些實施方式,一種晶圓傳輸系統包括晶圓傳輸設備與電子裝置。晶圓傳輸設備包括載出腔室、接收索引器、偵測組件與控制器。載出腔室具有出口閥門。接收索引器可升降地位於載出腔室具有出口閥門的一側,且配置以接收從載出腔室中傳送出的晶圓。載出腔室的該側與接收索引器之間有一間距。偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,配置以偵測該間距中的晶圓。控制器電性連接出口閥門與偵測組件,其中當偵測組件偵測到該間距中的晶圓時,控制器配置以停止出口閥門與接收索引器的移動。電子裝置電性連接晶圓傳輸設備的控制器。該電子裝置包括警報器,當控制器停止出口閥門與接收索引器的移動時,警報器配置以發出警示。According to some embodiments of the present disclosure, a wafer transport system includes a wafer transport equipment and an electronic device. The wafer transport equipment includes a load-out chamber, a receiving indexer, a detection assembly and a controller. The load-out chamber has an exit valve. The receiving indexer is liftably located on a side of the load-out chamber having the exit valve, and is configured to receive wafers transferred from the load-out chamber. There is a distance between the side of the load-out chamber and the receiving indexer. The detection assembly is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect wafers in the distance. The controller electrically connects the exit valve and the detection assembly, wherein when the detection assembly detects a wafer in the distance, the controller is configured to stop the movement of the exit valve and the receiving indexer. The electronic device is electrically connected to a controller of the wafer transport apparatus and includes an alarm configured to sound an alarm when the controller stops the movement of the outlet valve and the receiving indexer.
在一些實施方式中,上述晶圓傳輸系統更包括電磁閥。電磁閥電性連接載出腔室的出口閥門、控制器及電子裝置。In some embodiments, the wafer transport system further includes an electromagnetic valve that is electrically connected to an outlet valve of the unloading chamber, a controller, and an electronic device.
在本揭露上述實施方式中,由於晶圓傳輸設備的偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,所以當晶圓在傳輸時掉片於載出腔室與接收索引器之間的位置時,可被偵測組件所偵測。此外,由於控制器電性連接出口閥門與偵測組件,因此可藉由控制器停止出口閥門與接收索引器的移動。這樣的配置,晶圓傳輸設備不僅可偵測晶圓是否掉片於載出腔室與接收索引器之間的位置,更可透過控制器避免因出口閥門與接收索引器的移動而導致的晶圓破片及相關的經濟損失。In the above-mentioned embodiment of the present disclosure, since the detection component of the wafer transport equipment is located between the side of the unloading chamber and the receiving indexer, and the vertical projection of the detection component is located within the distance, when the wafer falls between the unloading chamber and the receiving indexer during transport, it can be detected by the detection component. In addition, since the controller is electrically connected to the outlet valve and the detection component, the movement of the outlet valve and the receiving indexer can be stopped by the controller. With such a configuration, the wafer transport equipment can not only detect whether the wafer falls between the unloading chamber and the receiving indexer, but also avoid wafer breakage and related economic losses caused by the movement of the outlet valve and the receiving indexer through the controller.
以下揭示之實施方式內容提供了用於實施所提供的標的之不同特徵的許多不同實施方式,或實例。下文描述了元件和佈置之特定實例以簡化本案。當然,該等實例僅為實例且並不意欲作為限制。此外,本案可在各個實例中重複元件符號及/或字母。此重複係用於簡便和清晰的目的,且其本身不指定所論述的各個實施方式及/或配置之間的關係。The embodiments disclosed below provide many different embodiments, or examples, for implementing the different features of the subject matter provided. Specific examples of components and arrangements are described below to simplify the present invention. Of course, these examples are only examples and are not intended to be limiting. In addition, the present invention may repeat component symbols and/or letters in each example. This repetition is for the purpose of simplicity and clarity, and does not itself specify the relationship between the various embodiments and/or configurations discussed.
諸如「在……下方」、「在……之下」、「下部」、「在……之上」、「上部」等等空間相對術語可在本文中為了便於描述之目的而使用,以描述如附圖中所示之一個元件或特徵與另一元件或特徵之關係。空間相對術語意欲涵蓋除了附圖中所示的定向之外的在使用或操作中的裝置的不同定向。裝置可經其他方式定向(旋轉90度或以其他定向)並且本文所使用的空間相對描述詞可同樣相應地解釋。Spatially relative terms such as "below," "beneath," "lower," "above," "upper," and the like may be used herein for descriptive purposes to describe the relationship of one element or feature to another element or feature as illustrated in the accompanying figures. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the accompanying figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
第1圖繪示根據本揭露一實施方式之晶圓傳輸設備100的側視示意圖,其中晶圓150位於載出腔室110中。第2圖繪示第1圖之晶圓傳輸設備100的側視示意圖,其中晶圓150位於接收索引器120中。同時參閱第1圖與第2圖,晶圓傳輸設備100包括載出腔室110、接收索引器120、偵測組件130與控制器140。載出腔室110具有出口閥門112,出口閥門112配置以供晶圓150從載出腔室110載出。接收索引器120可升降地位於載出腔室110具有出口閥門112的一側。舉例來說,接收索引器120可於出口閥門112外以方向D1上升或方向D2下降。接收索引器120配置以接收從載出腔室110中傳送出的晶圓150。載出腔室110具有出口閥門112的該側與接收索引器120之間有一間距D。在晶圓150傳輸時,晶圓150可從載出腔室110中經過間距D傳輸至接收索引器120中。當晶圓150正常地傳輸至接收索引器120後,接收索引器120可往方向D1上升以等待接收下一片晶圓。偵測組件130位於載出腔室110具有出口閥門112的該側與接收索引器120之間的位置,且偵測組件130的垂直投影位於間距D內。偵測組件130配置以偵測間距D中晶圓150是否存在。FIG. 1 is a schematic side view of a
此外,控制器140電性連接出口閥門112與偵測組件130。控制器140可控制出口閥門112的啟閉以及接收偵測組件130所偵測的訊號。當偵測組件130偵測到間距D中的晶圓150存在(將於第3圖說明),控制器140配置以停止出口閥門112的關閉以及接收索引器120的升降。在一些實施方式中,載出腔室110可為加載互鎖真空腔室,接收索引器120可為晶圓匣(Wafer cassette),晶圓150可為矽晶圓或碳化矽晶圓,但不用以限制本揭露。In addition, the
第3圖繪示第1圖之晶圓傳輸設備100將晶圓150從載出腔室110傳送至接收索引器120過程中的側視示意圖。由於晶圓傳輸設備100的偵測組件130位於載出腔室110的該側與接收索引器120之間,且偵測組件130的垂直投影位於間距D內,所以當晶圓150在傳輸時掉片於載出腔室110與接收索引器120之間的位置,可被偵測組件130所偵測。此外,由於控制器140電性連接出口閥門112與偵測組件130,因此可藉由控制器140停止出口閥門112關閉與接收索引器120的升降,以避免因出口閥門112關閉或接收索引器120的升降而導致的晶圓150破片。如此一來,晶圓傳輸設備100不僅可偵測晶圓150是否掉片於載出腔室110與接收索引器120之間的位置,更可透過控制器140避免出口閥門112與接收索引器120作動而導致晶圓150破片以及產生相關的經濟損失。FIG. 3 is a side view schematic diagram of the
在本實施方式中,晶圓傳輸設備100的偵測組件130具有訊號發射接收器132與訊號反射器134。訊號發射接收器132位於訊號反射器134上方。訊號發射接收器132配置以發射訊號136以及接收自訊號反射器134反射而來的訊號138。訊號136、138可為光訊號,但並不以此為限。訊號反射器134配置以將來自訊號發射接收器132的訊號136反射而成訊號138。在晶圓150傳輸的過程中,若偵測組件130的訊號發射接收器132接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,出口閥門112與接收索引器120將不被影響並繼續作動。反之,若偵測組件130的訊號發射接收器132無接收到訊號138或僅接收到一部分訊號138,代表間距D中有晶圓150存在,控制器140將使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,控制器140也可使接收索引器120停止升降(例如往方向D1上升),避免晶圓150未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。In this embodiment, the
此外,偵測組件130的訊號發射接收器132與訊號反射器134在垂直方向上對齊,使訊號反射器134可反射來自訊號發射接收器132的訊號136,且不因錯位而導致無法反射訊號136。除此之外,訊號發射接收器132位於載出腔室110的頂面與接收索引器120的頂面上方,使在晶圓150傳輸的過程中,接收索引器120接收從載出腔室110中傳送出的晶圓150時,可確保晶圓150不會被訊號發射接收器132所阻擋而無法傳輸。訊號反射器134位於載出腔室110的頂面與接收索引器120的頂面下方,且位於晶圓150的傳輸路徑的下方,使在晶圓150傳輸的過程中,可確保晶圓150不會被訊號反射器134所阻擋而無法傳輸。In addition, the signal transmitter and
在本實施方式中,晶圓傳輸設備100還可包括電磁閥160。電磁閥160電性連接載出腔室110的出口閥門112與控制器140。電磁閥160配置以使控制器140可使出口閥門112停止關閉。在晶圓150傳輸的過程中,偵測組件130的訊號發射接收器132接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,控制器140將不會切斷電磁閥160的訊號,使出口閥門112可正常關閉。反之,若偵測組件130的訊號發射接收器132無接收到訊號138或僅接收到一部分訊號138,代表間距D中有晶圓150存在,控制器140將切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,載出腔室110還可具有入口閥門114。入口閥門114位於與載出腔室110的出口閥門112相對的一側,配置以使晶圓150可從製程腔室通過入口閥門114進入載出腔室110。In the present embodiment, the
如第2圖所示,在晶圓150傳輸的過程中,當接收索引器120接收從載出腔室110中傳送出的晶圓150後,晶圓150位於接收索引器120中,此時晶圓150的垂直投影與間距D不重疊,偵測組件130的訊號發射接收器132會接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,控制器140將不會切斷電磁閥160的訊號,使出口閥門112可正常關閉,且接收索引器120可往方向D1上升以等待接收下一片晶圓。As shown in FIG. 2 , during the transmission of the
如第3圖所示,在晶圓150傳輸的過程中,當晶圓150的一部分位於載出腔室110具出口閥門112的該側與接收索引器120之間的間距D中的時候(也就是晶圓150掉片於間距D內),由於訊號發射接收器132與訊號反射器134位於晶圓150的上下側,使訊號136被晶圓150阻擋,訊號反射器134無法接收來自訊號發射接收器132的訊號136,因此偵測組件130無法產生訊號138。如此一來,訊號發射接收器132接收不到訊號138,代表間距D中有晶圓150存在,控制器140便切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,控制器140也可使接收索引器120停止升降,避免晶圓150在未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。As shown in FIG. 3 , during the transmission of the
應瞭解到,已敘述過的元件連接關係與功效將不再重複贅述,合先敘明。在以下敘述中,將說明具有前述晶圓傳輸設備100的晶圓傳輸系統。It should be understood that the connection relationship and function of the components described above will not be repeated, and it is better to explain them first. In the following description, a wafer transport system having the aforementioned
第4圖繪示根據本揭露一實施方式之晶圓傳輸系統200的側視示意圖。第5圖繪示第4圖之晶圓傳輸系統200將晶圓150從載出腔室110傳送至接收索引器120過程中的側視示意圖。同時參閱第4圖與第5圖,晶圓傳輸系統200包括前述之晶圓傳輸設備100與電子裝置210。電子裝置210電性連接晶圓傳輸設備100的控制器140。電子裝置210包括警報器212。在一些實施方式中,電子裝置210例如為機台端電腦或廠務端電腦,但並不用以限制本揭露。當控制器140停止載出腔室110的出口閥門112與接收索引器120的移動時,警報器212配置以發出警示。在晶圓150傳輸的過程中,接收索引器120接收從載出腔室110中傳送出的晶圓150後,晶圓150位於接收索引器120中且晶圓150的垂直投影與間距D不重疊時,偵測組件130的訊號發射接收器132會接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,出口閥門112與接收索引器120將不被影響並繼續作動,且警報器212不會發出警示。FIG. 4 is a side schematic diagram of a
如第5圖所示,在晶圓150傳輸的過程中,當晶圓150的一部分位於載出腔室110具出口閥門112的該側與接收索引器120之間的間距D中的時候(也就是晶圓150掉片於間距D內),由於訊號發射接收器132與訊號反射器134位於晶圓150的上下側,使訊號136被晶圓150阻擋,訊號反射器134無法接收來自訊號發射接收器132的訊號136,因此無法產生訊號138。如此一來,訊號發射接收器132沒有接收到訊號138,代表間距D中有晶圓150存在,控制器140便切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。控制器140也可使接收索引器120停止升降,避免晶圓150在未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。除此之外,控制器140使電子裝置210的警報器212發出警示,以將晶圓150掉片於間距D中的訊息告知晶圓傳輸系統200的使用者,便於後續的狀況排除作業(例如清理、保養、維修等)。As shown in FIG. 5 , during the transfer of the
前述概述了幾個實施方式的特徵,使得本領域技術人員可以更好地理解本揭露的態樣。本領域技術人員應當理解,他們可以容易地將本揭露用作設計或修改其他過程和結構的基礎,以實現與本文介紹的實施方式相同的目的和/或實現相同的優點。本領域技術人員還應該認識到,這樣的等效構造不脫離本揭露的精神和範圍,並且在不脫離本揭露的精神和範圍的情況下,它們可以在這裡進行各種改變,替換和變更。The foregoing summarizes the features of several embodiments so that those skilled in the art can better understand the aspects of the present disclosure. Those skilled in the art should understand that they can easily use the present disclosure as a basis for designing or modifying other processes and structures to achieve the same purpose and/or achieve the same advantages as the embodiments described herein. Those skilled in the art should also recognize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions and modifications here without departing from the spirit and scope of the present disclosure.
100:晶圓傳輸設備 110:載出腔室 112:出口閥門 114:入口閥門 120:接收索引器 130:偵測組件 132:訊號發射接收器 134:訊號反射器 136:訊號 138:訊號 140:控制器 150:晶圓 160:電磁閥 200:晶圓傳輸系統 210:電子裝置 212:警報器 D:間距 D1,D2:方向 100: Wafer transport equipment 110: Unload chamber 112: Exit valve 114: Entry valve 120: Receiver indexer 130: Detection assembly 132: Signal transmitter receiver 134: Signal reflector 136: Signal 138: Signal 140: Controller 150: Wafer 160: Solenoid valve 200: Wafer transport system 210: Electronic device 212: Alarm D: Distance D1, D2: Direction
當與隨附圖示一起閱讀時,可由後文實施方式最佳地理解本揭露內容的態樣。注意到根據此行業中之標準實務,各種特徵並未按比例繪製。實際上,為論述的清楚性,可任意增加或減少各種特徵的尺寸。 第1圖繪示根據本揭露一實施方式之晶圓傳輸設備的側視示意圖,其中晶圓位於載出腔室中。 第2圖繪示第1圖之晶圓傳輸設備的側視示意圖,其中晶圓位於接收索引器中。 第3圖繪示第1圖之晶圓傳輸設備將晶圓從載出腔室傳送至接收索引器過程中的側視示意圖。 第4圖繪示根據本揭露一實施方式之晶圓傳輸系統的側視示意圖。 第5圖繪示第4圖之晶圓傳輸系統將晶圓從載出腔室傳送至接收索引器過程中的側視示意圖。 The disclosure is best understood from the following embodiments when read in conjunction with the accompanying drawings. Note that various features are not drawn to scale, in accordance with standard practice in the industry. In fact, the dimensions of various features may be arbitrarily increased or decreased for clarity of discussion. FIG. 1 illustrates a schematic side view of a wafer transport apparatus according to an embodiment of the disclosure, wherein a wafer is located in a load-out chamber. FIG. 2 illustrates a schematic side view of the wafer transport apparatus of FIG. 1, wherein a wafer is located in a receiving indexer. FIG. 3 illustrates a schematic side view of the wafer transport apparatus of FIG. 1 during the process of transferring a wafer from a load-out chamber to a receiving indexer. FIG. 4 illustrates a schematic side view of a wafer transport system according to an embodiment of the disclosure. FIG. 5 is a schematic side view of the wafer transport system in FIG. 4 during the process of transferring the wafer from the unloading chamber to the receiving indexer.
100:晶圓傳輸設備 100: Wafer transfer equipment
110:載出腔室 110: Load out of chamber
112:出口閥門 112:Exit valve
114:入口閥門 114:Entrance valve
120:接收索引器 120: receiving indexer
130:偵測組件 130: Detection component
132:訊號發射接收器 132: Signal transmitter and receiver
134:訊號反射器 134:Signal reflector
136:訊號 136:Signal
138:訊號 138:Signal
140:控制器 140: Controller
150:晶圓 150: Wafer
160:電磁閥 160:Solenoid valve
D:間距 D: Spacing
D1,D2:方向 D1,D2: Direction
Claims (8)
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US20220367223A1 (en) | 2021-05-12 | 2022-11-17 | Tokyo Electron Limited | Substrate transport apparatus and substrate transport method |
Patent Citations (1)
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US20220367223A1 (en) | 2021-05-12 | 2022-11-17 | Tokyo Electron Limited | Substrate transport apparatus and substrate transport method |
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