TWI839997B - Wafer transfer apparatus and wafer transfer system - Google Patents

Wafer transfer apparatus and wafer transfer system Download PDF

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TWI839997B
TWI839997B TW111146817A TW111146817A TWI839997B TW I839997 B TWI839997 B TW I839997B TW 111146817 A TW111146817 A TW 111146817A TW 111146817 A TW111146817 A TW 111146817A TW I839997 B TWI839997 B TW I839997B
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wafer
indexer
receiving
signal
load
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TW111146817A
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Chinese (zh)
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莊協興
楊東儒
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鴻揚半導體股份有限公司
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Abstract

A wafer transfer apparatus includes an exit load lock chamber, a receiving indexer, a sensor assembly, and a controller. The exit load lock chamber has an outer door. The receiving indexer is liftably located at a side of the exit load lock chamber having the exit load lock valve, and is configured to receive a wafer transferred from the exit load lock chamber. The side of the exit load lock chamber and the receiving indexer have a gap therebetween. The sensor assembly is located between the side of the exit load lock chamber and the receiving indexer. An orthogonal projection of the sensor assembly is located in the gap. The sensor assembly is configured to detect the wafer in the gap. The controller is electrically connected to the outer door and the sensor assembly. When the sensor assembly detects the wafer in the gap, the controller is configured to stop the movement of the outer door and the movement of the receiving indexer.

Description

晶圓傳輸設備及晶圓傳輸系統Wafer transfer equipment and wafer transfer system

本揭露是有關一種晶圓傳輸設備及一種具有此晶圓傳輸設備的晶圓傳輸系統。The present disclosure relates to a wafer transport device and a wafer transport system having the wafer transport device.

隨著科技的進步,含有半導體元件的電子設備更加地普遍,因此晶圓的生產與傳輸也越來越重要。在部分的半導體機台中,晶圓傳輸的順序為:發送索引器、載入加載鎖腔室、製程腔室、載出加載鎖腔室及接收索引器。傳統上,晶圓感測器設置於腔室中或機械手臂旁,以避免晶圓受損。然而,由於晶圓掉片於載出加載鎖腔室與接收索引器之間的位置無法透過上述的配置來偵測,載出加載鎖腔室的出口閥門與接收索引器將持續作動,而晶圓會因出口閥門關閉或者接收索引器的升降而導致破片,使產品受到傷害,進而導致經濟損失。With the advancement of technology, electronic devices containing semiconductor components are becoming more common, so the production and transportation of wafers are becoming more and more important. In some semiconductor machines, the order of wafer transportation is: sending indexer, loading load lock chamber, process chamber, unloading load lock chamber and receiving indexer. Traditionally, wafer sensors are installed in the chamber or next to the robot arm to prevent wafer damage. However, since the position of the wafer falling between the unloading load lock chamber and the receiving indexer cannot be detected by the above configuration, the exit valve of the unloading load lock chamber and the receiving indexer will continue to operate, and the wafer will be broken due to the closing of the exit valve or the lifting of the receiving indexer, causing damage to the product and thus leading to economic losses.

本揭露之一技術態樣為一種晶圓傳輸設備。One technical aspect of the present disclosure is a wafer transfer device.

根據本揭露之一些實施方式,一種晶圓傳輸設備包括載出腔室、接收索引器、偵測組件與控制器。載出腔室具有出口閥門。接收索引器可升降地位於載出腔室具有出口閥門的一側,且配置以接收從載出腔室中傳送出的晶圓。載出腔室的該側與接收索引器之間有一間距。偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,配置以偵測該間距中的晶圓。控制器電性連接出口閥門與偵測組件,其中當偵測組件偵測到該間距中的晶圓時,控制器配置以停止出口閥門與接收索引器的移動。According to some embodiments of the present disclosure, a wafer transport device includes a load-out chamber, a receiving indexer, a detection assembly and a controller. The load-out chamber has an exit valve. The receiving indexer is liftably located on a side of the load-out chamber having the exit valve, and is configured to receive wafers transferred from the load-out chamber. There is a distance between the side of the load-out chamber and the receiving indexer. The detection assembly is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect wafers in the distance. The controller electrically connects the exit valve and the detection assembly, wherein when the detection assembly detects a wafer in the distance, the controller is configured to stop the movement of the exit valve and the receiving indexer.

在一些實施方式中,上述偵測組件具有訊號發射接收器與訊號反射器。訊號發射接收器位於訊號反射器上方。訊號反射器配置以將來自訊號發射接收器的訊號反射回訊號發射接收器。In some embodiments, the detection component has a signal transmitter receiver and a signal reflector. The signal transmitter receiver is located above the signal reflector. The signal reflector is configured to reflect the signal from the signal transmitter receiver back to the signal transmitter receiver.

在一些實施方式中,當上述晶圓傳輸設備的接收索引器接收從載出腔室中傳送出的晶圓時,且晶圓位於載出腔室的該側與接收索引器之間的間距中,訊號發射接收器與訊號反射器分別位於晶圓的上下側而使訊號被晶圓阻擋。In some embodiments, when the receiving indexer of the wafer transport device receives a wafer transferred from a load-out chamber, and the wafer is located in the distance between the side of the load-out chamber and the receiving indexer, the signal transmitting receiver and the signal reflector are respectively located on the upper and lower sides of the wafer so that the signal is blocked by the wafer.

在一些實施方式中,上述訊號發射接收器與訊號反射器在垂直方向上對齊。In some implementations, the signal transmitter receiver is vertically aligned with the signal reflector.

在一些實施方式中,上述訊號發射接收器位於載出腔室的頂面與接收索引器的頂面上方。In some embodiments, the signal transmitting receiver is located above the top surface of the unloading chamber and the top surface of the receiving indexer.

在一些實施方式中,上述訊號反射器位於載出腔室的頂面與接收索引器的頂面下方。In some embodiments, the signal reflector is located below the top surface of the unload chamber and the top surface of the receiving indexer.

在一些實施方式中,上述晶圓傳輸設備更包括電磁閥。電磁閥電性連接出口閥門與控制器。In some implementations, the wafer transport device further includes an electromagnetic valve that electrically connects the outlet valve and the controller.

在一些實施方式中,上述載出腔室更包括與出口閥門相對的入口閥門。In some embodiments, the unloading chamber further includes an inlet valve opposite to the outlet valve.

本揭露之另一技術態樣為一種晶圓傳輸系統。Another technical aspect of the present disclosure is a wafer transport system.

根據本揭露之一些實施方式,一種晶圓傳輸系統包括晶圓傳輸設備與電子裝置。晶圓傳輸設備包括載出腔室、接收索引器、偵測組件與控制器。載出腔室具有出口閥門。接收索引器可升降地位於載出腔室具有出口閥門的一側,且配置以接收從載出腔室中傳送出的晶圓。載出腔室的該側與接收索引器之間有一間距。偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,配置以偵測該間距中的晶圓。控制器電性連接出口閥門與偵測組件,其中當偵測組件偵測到該間距中的晶圓時,控制器配置以停止出口閥門與接收索引器的移動。電子裝置電性連接晶圓傳輸設備的控制器。該電子裝置包括警報器,當控制器停止出口閥門與接收索引器的移動時,警報器配置以發出警示。According to some embodiments of the present disclosure, a wafer transport system includes a wafer transport equipment and an electronic device. The wafer transport equipment includes a load-out chamber, a receiving indexer, a detection assembly and a controller. The load-out chamber has an exit valve. The receiving indexer is liftably located on a side of the load-out chamber having the exit valve, and is configured to receive wafers transferred from the load-out chamber. There is a distance between the side of the load-out chamber and the receiving indexer. The detection assembly is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect wafers in the distance. The controller electrically connects the exit valve and the detection assembly, wherein when the detection assembly detects a wafer in the distance, the controller is configured to stop the movement of the exit valve and the receiving indexer. The electronic device is electrically connected to a controller of the wafer transport apparatus and includes an alarm configured to sound an alarm when the controller stops the movement of the outlet valve and the receiving indexer.

在一些實施方式中,上述晶圓傳輸系統更包括電磁閥。電磁閥電性連接載出腔室的出口閥門、控制器及電子裝置。In some embodiments, the wafer transport system further includes an electromagnetic valve that is electrically connected to an outlet valve of the unloading chamber, a controller, and an electronic device.

在本揭露上述實施方式中,由於晶圓傳輸設備的偵測組件位於載出腔室的該側與接收索引器之間,且偵測組件的垂直投影位於該間距內,所以當晶圓在傳輸時掉片於載出腔室與接收索引器之間的位置時,可被偵測組件所偵測。此外,由於控制器電性連接出口閥門與偵測組件,因此可藉由控制器停止出口閥門與接收索引器的移動。這樣的配置,晶圓傳輸設備不僅可偵測晶圓是否掉片於載出腔室與接收索引器之間的位置,更可透過控制器避免因出口閥門與接收索引器的移動而導致的晶圓破片及相關的經濟損失。In the above-mentioned embodiment of the present disclosure, since the detection component of the wafer transport equipment is located between the side of the unloading chamber and the receiving indexer, and the vertical projection of the detection component is located within the distance, when the wafer falls between the unloading chamber and the receiving indexer during transport, it can be detected by the detection component. In addition, since the controller is electrically connected to the outlet valve and the detection component, the movement of the outlet valve and the receiving indexer can be stopped by the controller. With such a configuration, the wafer transport equipment can not only detect whether the wafer falls between the unloading chamber and the receiving indexer, but also avoid wafer breakage and related economic losses caused by the movement of the outlet valve and the receiving indexer through the controller.

以下揭示之實施方式內容提供了用於實施所提供的標的之不同特徵的許多不同實施方式,或實例。下文描述了元件和佈置之特定實例以簡化本案。當然,該等實例僅為實例且並不意欲作為限制。此外,本案可在各個實例中重複元件符號及/或字母。此重複係用於簡便和清晰的目的,且其本身不指定所論述的各個實施方式及/或配置之間的關係。The embodiments disclosed below provide many different embodiments, or examples, for implementing the different features of the subject matter provided. Specific examples of components and arrangements are described below to simplify the present invention. Of course, these examples are only examples and are not intended to be limiting. In addition, the present invention may repeat component symbols and/or letters in each example. This repetition is for the purpose of simplicity and clarity, and does not itself specify the relationship between the various embodiments and/or configurations discussed.

諸如「在……下方」、「在……之下」、「下部」、「在……之上」、「上部」等等空間相對術語可在本文中為了便於描述之目的而使用,以描述如附圖中所示之一個元件或特徵與另一元件或特徵之關係。空間相對術語意欲涵蓋除了附圖中所示的定向之外的在使用或操作中的裝置的不同定向。裝置可經其他方式定向(旋轉90度或以其他定向)並且本文所使用的空間相對描述詞可同樣相應地解釋。Spatially relative terms such as "below," "beneath," "lower," "above," "upper," and the like may be used herein for descriptive purposes to describe the relationship of one element or feature to another element or feature as illustrated in the accompanying figures. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the accompanying figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

第1圖繪示根據本揭露一實施方式之晶圓傳輸設備100的側視示意圖,其中晶圓150位於載出腔室110中。第2圖繪示第1圖之晶圓傳輸設備100的側視示意圖,其中晶圓150位於接收索引器120中。同時參閱第1圖與第2圖,晶圓傳輸設備100包括載出腔室110、接收索引器120、偵測組件130與控制器140。載出腔室110具有出口閥門112,出口閥門112配置以供晶圓150從載出腔室110載出。接收索引器120可升降地位於載出腔室110具有出口閥門112的一側。舉例來說,接收索引器120可於出口閥門112外以方向D1上升或方向D2下降。接收索引器120配置以接收從載出腔室110中傳送出的晶圓150。載出腔室110具有出口閥門112的該側與接收索引器120之間有一間距D。在晶圓150傳輸時,晶圓150可從載出腔室110中經過間距D傳輸至接收索引器120中。當晶圓150正常地傳輸至接收索引器120後,接收索引器120可往方向D1上升以等待接收下一片晶圓。偵測組件130位於載出腔室110具有出口閥門112的該側與接收索引器120之間的位置,且偵測組件130的垂直投影位於間距D內。偵測組件130配置以偵測間距D中晶圓150是否存在。FIG. 1 is a schematic side view of a wafer transport apparatus 100 according to an embodiment of the present disclosure, wherein a wafer 150 is located in a load-out chamber 110. FIG. 2 is a schematic side view of the wafer transport apparatus 100 of FIG. 1, wherein the wafer 150 is located in a receiving indexer 120. Referring to FIG. 1 and FIG. 2 together, the wafer transport apparatus 100 includes a load-out chamber 110, a receiving indexer 120, a detection assembly 130, and a controller 140. The load-out chamber 110 has an exit valve 112, and the exit valve 112 is configured to allow the wafer 150 to be unloaded from the load-out chamber 110. The receiving indexer 120 is located at a side of the load-out chamber 110 having the exit valve 112 in a liftable position. For example, the receiving indexer 120 can rise in the direction D1 or fall in the direction D2 outside the exit valve 112. The receiving indexer 120 is configured to receive the wafer 150 transferred from the unloading chamber 110. There is a distance D between the side of the unloading chamber 110 having the exit valve 112 and the receiving indexer 120. When the wafer 150 is transferred, the wafer 150 can be transferred from the unloading chamber 110 to the receiving indexer 120 through the distance D. After the wafer 150 is normally transferred to the receiving indexer 120, the receiving indexer 120 can rise in the direction D1 to wait for receiving the next wafer. The detection assembly 130 is located between the side of the unloading chamber 110 having the exit valve 112 and the receiving indexer 120, and the vertical projection of the detection assembly 130 is located within the distance D. The detection assembly 130 is configured to detect whether the wafer 150 exists in the spacing D.

此外,控制器140電性連接出口閥門112與偵測組件130。控制器140可控制出口閥門112的啟閉以及接收偵測組件130所偵測的訊號。當偵測組件130偵測到間距D中的晶圓150存在(將於第3圖說明),控制器140配置以停止出口閥門112的關閉以及接收索引器120的升降。在一些實施方式中,載出腔室110可為加載互鎖真空腔室,接收索引器120可為晶圓匣(Wafer cassette),晶圓150可為矽晶圓或碳化矽晶圓,但不用以限制本揭露。In addition, the controller 140 is electrically connected to the outlet valve 112 and the detection assembly 130. The controller 140 can control the opening and closing of the outlet valve 112 and the signal detected by the receiving detection assembly 130. When the detection assembly 130 detects the presence of the wafer 150 in the spacing D (to be described in FIG. 3 ), the controller 140 is configured to stop the closing of the outlet valve 112 and the lifting and lowering of the receiving indexer 120. In some embodiments, the unloading chamber 110 can be a load interlock vacuum chamber, the receiving indexer 120 can be a wafer cassette, and the wafer 150 can be a silicon wafer or a silicon carbide wafer, but this is not intended to limit the present disclosure.

第3圖繪示第1圖之晶圓傳輸設備100將晶圓150從載出腔室110傳送至接收索引器120過程中的側視示意圖。由於晶圓傳輸設備100的偵測組件130位於載出腔室110的該側與接收索引器120之間,且偵測組件130的垂直投影位於間距D內,所以當晶圓150在傳輸時掉片於載出腔室110與接收索引器120之間的位置,可被偵測組件130所偵測。此外,由於控制器140電性連接出口閥門112與偵測組件130,因此可藉由控制器140停止出口閥門112關閉與接收索引器120的升降,以避免因出口閥門112關閉或接收索引器120的升降而導致的晶圓150破片。如此一來,晶圓傳輸設備100不僅可偵測晶圓150是否掉片於載出腔室110與接收索引器120之間的位置,更可透過控制器140避免出口閥門112與接收索引器120作動而導致晶圓150破片以及產生相關的經濟損失。FIG. 3 is a side view schematic diagram of the wafer transporting apparatus 100 in FIG. 1 during the process of transporting the wafer 150 from the unloading chamber 110 to the receiving indexer 120. Since the detection assembly 130 of the wafer transporting apparatus 100 is located between the side of the unloading chamber 110 and the receiving indexer 120, and the vertical projection of the detection assembly 130 is located within the spacing D, when the wafer 150 falls between the unloading chamber 110 and the receiving indexer 120 during transport, it can be detected by the detection assembly 130. In addition, since the controller 140 is electrically connected to the outlet valve 112 and the detection assembly 130, the controller 140 can stop the outlet valve 112 from closing and the receiving indexer 120 from ascending and descending, so as to avoid the wafer 150 from being broken due to the outlet valve 112 closing or the receiving indexer 120 ascending and descending. In this way, the wafer transport device 100 can not only detect whether the wafer 150 has fallen between the unloading chamber 110 and the receiving indexer 120, but also prevent the outlet valve 112 and the receiving indexer 120 from being actuated to cause the wafer 150 to be broken and generate related economic losses through the controller 140.

在本實施方式中,晶圓傳輸設備100的偵測組件130具有訊號發射接收器132與訊號反射器134。訊號發射接收器132位於訊號反射器134上方。訊號發射接收器132配置以發射訊號136以及接收自訊號反射器134反射而來的訊號138。訊號136、138可為光訊號,但並不以此為限。訊號反射器134配置以將來自訊號發射接收器132的訊號136反射而成訊號138。在晶圓150傳輸的過程中,若偵測組件130的訊號發射接收器132接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,出口閥門112與接收索引器120將不被影響並繼續作動。反之,若偵測組件130的訊號發射接收器132無接收到訊號138或僅接收到一部分訊號138,代表間距D中有晶圓150存在,控制器140將使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,控制器140也可使接收索引器120停止升降(例如往方向D1上升),避免晶圓150未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。In this embodiment, the detection component 130 of the wafer transmission device 100 has a signal transmitter and receiver 132 and a signal reflector 134. The signal transmitter and receiver 132 is located above the signal reflector 134. The signal transmitter and receiver 132 is configured to transmit a signal 136 and receive a signal 138 reflected from the signal reflector 134. The signals 136 and 138 can be optical signals, but are not limited thereto. The signal reflector 134 is configured to reflect the signal 136 from the signal transmitter and receiver 132 into a signal 138. During the transmission of the wafer 150, if the signal transmitter receiver 132 of the detection assembly 130 receives the signal 138 reflected from the signal reflector 134, it means that there is no wafer 150 in the spacing D, and the outlet valve 112 and the receiving indexer 120 will not be affected and continue to operate. On the contrary, if the signal transmitter receiver 132 of the detection assembly 130 does not receive the signal 138 or only receives a part of the signal 138, it means that there is a wafer 150 in the spacing D, and the controller 140 will stop closing the outlet valve 112 to avoid damage to the wafer 150 and economic loss caused by the closing of the outlet valve 112. In addition, the controller 140 may also stop the receiving indexer 120 from rising or falling (eg, rising in the direction D1 ) to prevent the wafer 150 from being broken when the receiving indexer 120 is raised or lowered when the wafer 150 has not completely entered the receiving indexer 120 .

此外,偵測組件130的訊號發射接收器132與訊號反射器134在垂直方向上對齊,使訊號反射器134可反射來自訊號發射接收器132的訊號136,且不因錯位而導致無法反射訊號136。除此之外,訊號發射接收器132位於載出腔室110的頂面與接收索引器120的頂面上方,使在晶圓150傳輸的過程中,接收索引器120接收從載出腔室110中傳送出的晶圓150時,可確保晶圓150不會被訊號發射接收器132所阻擋而無法傳輸。訊號反射器134位於載出腔室110的頂面與接收索引器120的頂面下方,且位於晶圓150的傳輸路徑的下方,使在晶圓150傳輸的過程中,可確保晶圓150不會被訊號反射器134所阻擋而無法傳輸。In addition, the signal transmitter and receiver 132 and the signal reflector 134 of the detection assembly 130 are aligned in the vertical direction, so that the signal reflector 134 can reflect the signal 136 from the signal transmitter and receiver 132, and will not fail to reflect the signal 136 due to misalignment. In addition, the signal transmitter and receiver 132 is located above the top surface of the unloading chamber 110 and the top surface of the receiving indexer 120, so that when the receiving indexer 120 receives the wafer 150 transmitted from the unloading chamber 110 during the transmission of the wafer 150, it can be ensured that the wafer 150 will not be blocked by the signal transmitter and receiver 132 and cannot be transmitted. The signal reflector 134 is located below the top surface of the unloading chamber 110 and the top surface of the receiving indexer 120, and is located below the transmission path of the wafer 150, so that during the transmission process of the wafer 150, it can be ensured that the wafer 150 will not be blocked by the signal reflector 134 and cannot be transmitted.

在本實施方式中,晶圓傳輸設備100還可包括電磁閥160。電磁閥160電性連接載出腔室110的出口閥門112與控制器140。電磁閥160配置以使控制器140可使出口閥門112停止關閉。在晶圓150傳輸的過程中,偵測組件130的訊號發射接收器132接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,控制器140將不會切斷電磁閥160的訊號,使出口閥門112可正常關閉。反之,若偵測組件130的訊號發射接收器132無接收到訊號138或僅接收到一部分訊號138,代表間距D中有晶圓150存在,控制器140將切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,載出腔室110還可具有入口閥門114。入口閥門114位於與載出腔室110的出口閥門112相對的一側,配置以使晶圓150可從製程腔室通過入口閥門114進入載出腔室110。In the present embodiment, the wafer transport device 100 may further include an electromagnetic valve 160. The electromagnetic valve 160 electrically connects the exit valve 112 of the unloading chamber 110 and the controller 140. The electromagnetic valve 160 is configured so that the controller 140 can stop the exit valve 112 from closing. During the wafer 150 transport process, the signal transmitter receiver 132 of the detection assembly 130 receives the signal 138 reflected from the signal reflector 134, indicating that there is no wafer 150 in the spacing D. The controller 140 will not cut off the signal of the electromagnetic valve 160, so that the exit valve 112 can be closed normally. On the contrary, if the signal transmitter and receiver 132 of the detection assembly 130 does not receive the signal 138 or only receives a part of the signal 138, it means that there is a wafer 150 in the spacing D, and the controller 140 will cut off the signal of the electromagnetic valve 160 to stop the exit valve 112 from closing, so as to avoid damage to the wafer 150 and economic loss caused by the closing of the exit valve 112. In addition, the unloading chamber 110 may also have an entrance valve 114. The entrance valve 114 is located on the side opposite to the exit valve 112 of the unloading chamber 110, and is configured so that the wafer 150 can enter the unloading chamber 110 from the process chamber through the entrance valve 114.

如第2圖所示,在晶圓150傳輸的過程中,當接收索引器120接收從載出腔室110中傳送出的晶圓150後,晶圓150位於接收索引器120中,此時晶圓150的垂直投影與間距D不重疊,偵測組件130的訊號發射接收器132會接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,控制器140將不會切斷電磁閥160的訊號,使出口閥門112可正常關閉,且接收索引器120可往方向D1上升以等待接收下一片晶圓。As shown in FIG. 2 , during the transmission of the wafer 150, after the receiving indexer 120 receives the wafer 150 transmitted from the unloading chamber 110, the wafer 150 is located in the receiving indexer 120. At this time, the vertical projection of the wafer 150 does not overlap with the spacing D. The signal transmitter receiver 132 of the detection assembly 130 will receive the signal 138 reflected from the signal reflector 134, indicating that there is no wafer 150 in the spacing D. The controller 140 will not cut off the signal of the solenoid valve 160, so that the exit valve 112 can be closed normally, and the receiving indexer 120 can rise in the direction D1 to wait for receiving the next wafer.

如第3圖所示,在晶圓150傳輸的過程中,當晶圓150的一部分位於載出腔室110具出口閥門112的該側與接收索引器120之間的間距D中的時候(也就是晶圓150掉片於間距D內),由於訊號發射接收器132與訊號反射器134位於晶圓150的上下側,使訊號136被晶圓150阻擋,訊號反射器134無法接收來自訊號發射接收器132的訊號136,因此偵測組件130無法產生訊號138。如此一來,訊號發射接收器132接收不到訊號138,代表間距D中有晶圓150存在,控制器140便切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。除此之外,控制器140也可使接收索引器120停止升降,避免晶圓150在未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。As shown in FIG. 3 , during the transmission of the wafer 150, when a portion of the wafer 150 is located in the distance D between the side of the unloading chamber 110 having the exit valve 112 and the receiving indexer 120 (that is, the wafer 150 falls within the distance D), since the signal transmitter and receiver 132 and the signal reflector 134 are located on the upper and lower sides of the wafer 150, the signal 136 is blocked by the wafer 150, and the signal reflector 134 cannot receive the signal 136 from the signal transmitter and receiver 132, so the detection component 130 cannot generate the signal 138. In this way, the signal transmitter receiver 132 cannot receive the signal 138, indicating that there is a wafer 150 in the spacing D, and the controller 140 cuts off the signal of the electromagnetic valve 160 to stop the exit valve 112 from closing, so as to avoid damage to the wafer 150 and economic losses caused by the closing of the exit valve 112. In addition, the controller 140 can also stop the lifting of the receiving indexer 120 to avoid the wafer 150 from being broken when the receiving indexer 120 is lifted before the wafer 150 completely enters the receiving indexer 120.

應瞭解到,已敘述過的元件連接關係與功效將不再重複贅述,合先敘明。在以下敘述中,將說明具有前述晶圓傳輸設備100的晶圓傳輸系統。It should be understood that the connection relationship and function of the components described above will not be repeated, and it is better to explain them first. In the following description, a wafer transport system having the aforementioned wafer transport device 100 will be described.

第4圖繪示根據本揭露一實施方式之晶圓傳輸系統200的側視示意圖。第5圖繪示第4圖之晶圓傳輸系統200將晶圓150從載出腔室110傳送至接收索引器120過程中的側視示意圖。同時參閱第4圖與第5圖,晶圓傳輸系統200包括前述之晶圓傳輸設備100與電子裝置210。電子裝置210電性連接晶圓傳輸設備100的控制器140。電子裝置210包括警報器212。在一些實施方式中,電子裝置210例如為機台端電腦或廠務端電腦,但並不用以限制本揭露。當控制器140停止載出腔室110的出口閥門112與接收索引器120的移動時,警報器212配置以發出警示。在晶圓150傳輸的過程中,接收索引器120接收從載出腔室110中傳送出的晶圓150後,晶圓150位於接收索引器120中且晶圓150的垂直投影與間距D不重疊時,偵測組件130的訊號發射接收器132會接收到自訊號反射器134反射而來的訊號138,代表間距D中沒有晶圓150存在,出口閥門112與接收索引器120將不被影響並繼續作動,且警報器212不會發出警示。FIG. 4 is a side schematic diagram of a wafer transport system 200 according to an embodiment of the present disclosure. FIG. 5 is a side schematic diagram of the wafer transport system 200 of FIG. 4 in the process of transferring a wafer 150 from a load-out chamber 110 to a receiving indexer 120. Referring to FIG. 4 and FIG. 5 simultaneously, the wafer transport system 200 includes the aforementioned wafer transport equipment 100 and an electronic device 210. The electronic device 210 is electrically connected to the controller 140 of the wafer transport equipment 100. The electronic device 210 includes an alarm 212. In some embodiments, the electronic device 210 is, for example, a machine-side computer or a factory-side computer, but this is not intended to limit the present disclosure. When the controller 140 stops the movement of the exit valve 112 and the receiving indexer 120 of the unloading chamber 110, the alarm 212 is configured to issue an alarm. During the transfer of the wafer 150, after the receiving indexer 120 receives the wafer 150 transferred from the unloading chamber 110, when the wafer 150 is located in the receiving indexer 120 and the vertical projection of the wafer 150 does not overlap with the spacing D, the signal transmitter receiver 132 of the detection assembly 130 will receive the signal 138 reflected from the signal reflector 134, indicating that there is no wafer 150 in the spacing D, the exit valve 112 and the receiving indexer 120 will not be affected and continue to operate, and the alarm 212 will not issue an alarm.

如第5圖所示,在晶圓150傳輸的過程中,當晶圓150的一部分位於載出腔室110具出口閥門112的該側與接收索引器120之間的間距D中的時候(也就是晶圓150掉片於間距D內),由於訊號發射接收器132與訊號反射器134位於晶圓150的上下側,使訊號136被晶圓150阻擋,訊號反射器134無法接收來自訊號發射接收器132的訊號136,因此無法產生訊號138。如此一來,訊號發射接收器132沒有接收到訊號138,代表間距D中有晶圓150存在,控制器140便切斷電磁閥160的訊號,使出口閥門112停止關閉,以避免因出口閥門112關閉而導致晶圓150損壞及經濟損失。控制器140也可使接收索引器120停止升降,避免晶圓150在未完全進入接收索引器120時,升降接收索引器120導致的晶圓150破片。除此之外,控制器140使電子裝置210的警報器212發出警示,以將晶圓150掉片於間距D中的訊息告知晶圓傳輸系統200的使用者,便於後續的狀況排除作業(例如清理、保養、維修等)。As shown in FIG. 5 , during the transfer of the wafer 150, when a portion of the wafer 150 is located in the distance D between the side of the unloading chamber 110 having the exit valve 112 and the receiving indexer 120 (that is, the wafer 150 falls within the distance D), since the signal transmitter and receiver 132 and the signal reflector 134 are located on the upper and lower sides of the wafer 150, the signal 136 is blocked by the wafer 150, and the signal reflector 134 cannot receive the signal 136 from the signal transmitter and receiver 132, and therefore cannot generate the signal 138. In this way, the signal transmitter receiver 132 does not receive the signal 138, which means that there is a wafer 150 in the spacing D. The controller 140 cuts off the signal of the electromagnetic valve 160, so that the outlet valve 112 stops closing, so as to avoid damage to the wafer 150 and economic losses caused by the closing of the outlet valve 112. The controller 140 can also stop the lifting of the receiving indexer 120 to avoid the wafer 150 from being broken when the receiving indexer 120 is lifted before the wafer 150 completely enters the receiving indexer 120. In addition, the controller 140 causes the alarm 212 of the electronic device 210 to issue an alarm to inform the user of the wafer transport system 200 of the information that the wafer 150 has fallen in the spacing D, so as to facilitate subsequent troubleshooting operations (such as cleaning, maintenance, repair, etc.).

前述概述了幾個實施方式的特徵,使得本領域技術人員可以更好地理解本揭露的態樣。本領域技術人員應當理解,他們可以容易地將本揭露用作設計或修改其他過程和結構的基礎,以實現與本文介紹的實施方式相同的目的和/或實現相同的優點。本領域技術人員還應該認識到,這樣的等效構造不脫離本揭露的精神和範圍,並且在不脫離本揭露的精神和範圍的情況下,它們可以在這裡進行各種改變,替換和變更。The foregoing summarizes the features of several embodiments so that those skilled in the art can better understand the aspects of the present disclosure. Those skilled in the art should understand that they can easily use the present disclosure as a basis for designing or modifying other processes and structures to achieve the same purpose and/or achieve the same advantages as the embodiments described herein. Those skilled in the art should also recognize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions and modifications here without departing from the spirit and scope of the present disclosure.

100:晶圓傳輸設備 110:載出腔室 112:出口閥門 114:入口閥門 120:接收索引器 130:偵測組件 132:訊號發射接收器 134:訊號反射器 136:訊號 138:訊號 140:控制器 150:晶圓 160:電磁閥 200:晶圓傳輸系統 210:電子裝置 212:警報器 D:間距 D1,D2:方向 100: Wafer transport equipment 110: Unload chamber 112: Exit valve 114: Entry valve 120: Receiver indexer 130: Detection assembly 132: Signal transmitter receiver 134: Signal reflector 136: Signal 138: Signal 140: Controller 150: Wafer 160: Solenoid valve 200: Wafer transport system 210: Electronic device 212: Alarm D: Distance D1, D2: Direction

當與隨附圖示一起閱讀時,可由後文實施方式最佳地理解本揭露內容的態樣。注意到根據此行業中之標準實務,各種特徵並未按比例繪製。實際上,為論述的清楚性,可任意增加或減少各種特徵的尺寸。 第1圖繪示根據本揭露一實施方式之晶圓傳輸設備的側視示意圖,其中晶圓位於載出腔室中。 第2圖繪示第1圖之晶圓傳輸設備的側視示意圖,其中晶圓位於接收索引器中。 第3圖繪示第1圖之晶圓傳輸設備將晶圓從載出腔室傳送至接收索引器過程中的側視示意圖。 第4圖繪示根據本揭露一實施方式之晶圓傳輸系統的側視示意圖。 第5圖繪示第4圖之晶圓傳輸系統將晶圓從載出腔室傳送至接收索引器過程中的側視示意圖。 The disclosure is best understood from the following embodiments when read in conjunction with the accompanying drawings. Note that various features are not drawn to scale, in accordance with standard practice in the industry. In fact, the dimensions of various features may be arbitrarily increased or decreased for clarity of discussion. FIG. 1 illustrates a schematic side view of a wafer transport apparatus according to an embodiment of the disclosure, wherein a wafer is located in a load-out chamber. FIG. 2 illustrates a schematic side view of the wafer transport apparatus of FIG. 1, wherein a wafer is located in a receiving indexer. FIG. 3 illustrates a schematic side view of the wafer transport apparatus of FIG. 1 during the process of transferring a wafer from a load-out chamber to a receiving indexer. FIG. 4 illustrates a schematic side view of a wafer transport system according to an embodiment of the disclosure. FIG. 5 is a schematic side view of the wafer transport system in FIG. 4 during the process of transferring the wafer from the unloading chamber to the receiving indexer.

100:晶圓傳輸設備 100: Wafer transfer equipment

110:載出腔室 110: Load out of chamber

112:出口閥門 112:Exit valve

114:入口閥門 114:Entrance valve

120:接收索引器 120: receiving indexer

130:偵測組件 130: Detection component

132:訊號發射接收器 132: Signal transmitter and receiver

134:訊號反射器 134:Signal reflector

136:訊號 136:Signal

138:訊號 138:Signal

140:控制器 140: Controller

150:晶圓 150: Wafer

160:電磁閥 160:Solenoid valve

D:間距 D: Spacing

D1,D2:方向 D1,D2: Direction

Claims (8)

一種晶圓傳輸設備,包括:一載出腔室,具有一出口閥門;一接收索引器,可升降地位於該載出腔室具有該出口閥門的一側,且配置以接收從該載出腔室中傳送出的一晶圓,其中該載出腔室的該側與該接收索引器之間有一間距;一偵測組件,位於該載出腔室的該側與該接收索引器之間,且該偵測組件的垂直投影位於該間距內,配置以偵測該間距中的該晶圓,其中該偵測組件具有一訊號發射接收器與一訊號反射器,該訊號發射接收器位於該訊號反射器上方,該訊號反射器配置以將來自該訊號發射接收器的一訊號反射回該訊號發射接收器,當該接收索引器接收從該載出腔室中傳送出的該晶圓時,且該晶圓位於該載出腔室的該側與該接收索引器之間的該間距中,該訊號發射接收器與該訊號反射器分別位於該晶圓的上下側而使該訊號被該晶圓阻擋;以及一控制器,電性連接該出口閥門與該偵測組件,其中當該偵測組件偵測到該間距中的該晶圓時,該控制器配置以停止該出口閥門與該接收索引器的移動。 A wafer transport device comprises: a load-out chamber having an outlet valve; a receiving indexer which is movably located on a side of the load-out chamber having the outlet valve and is configured to receive a wafer transported from the load-out chamber, wherein there is a distance between the side of the load-out chamber and the receiving indexer; a detection assembly which is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect the wafer in the distance, wherein the detection assembly has a signal transmitter and receiver and a signal reflector, and the signal transmitter and receiver is located on the signal reflector. The signal reflector is configured to reflect a signal from the signal transmitting receiver back to the signal transmitting receiver. When the receiving indexer receives the wafer transmitted from the unloading chamber and the wafer is located in the gap between the side of the unloading chamber and the receiving indexer, the signal transmitting receiver and the signal reflector are respectively located on the upper and lower sides of the wafer so that the signal is blocked by the wafer; and a controller electrically connected to the outlet valve and the detection assembly, wherein when the detection assembly detects the wafer in the gap, the controller is configured to stop the movement of the outlet valve and the receiving indexer. 如請求項1所述之晶圓傳輸設備,其中該訊號發射接收器與該訊號反射器在垂直方向上對齊。 The wafer transport device as described in claim 1, wherein the signal transmitter receiver and the signal reflector are aligned in the vertical direction. 如請求項1所述之晶圓傳輸設備,其中該訊 號發射接收器位於該載出腔室的頂面與該接收索引器的頂面上方。 The wafer transport device as described in claim 1, wherein the signal transmitting receiver is located above the top surface of the unloading chamber and the top surface of the receiving indexer. 如請求項1所述之晶圓傳輸設備,其中該訊號反射器位於該載出腔室的頂面與該接收索引器的頂面下方。 The wafer transport device as described in claim 1, wherein the signal reflector is located below the top surface of the unloading chamber and the top surface of the receiving indexer. 如請求項1所述之晶圓傳輸設備,更包括:一電磁閥,電性連接該出口閥門與該控制器。 The wafer transport device as described in claim 1 further includes: an electromagnetic valve electrically connecting the outlet valve and the controller. 如請求項1所述之晶圓傳輸設備,其中該載出腔室更包括:一入口閥門,與該出口閥門相對。 The wafer transfer device as described in claim 1, wherein the unloading chamber further comprises: an entrance valve, opposite to the exit valve. 一種晶圓傳輸系統,包括:一晶圓傳輸設備,包括:一載出腔室,具有一出口閥門;一接收索引器,可升降地位於該載出腔室具有該出口閥門的一側,且配置以接收從該載出腔室中傳送出的一晶圓,其中該載出腔室的該側與該接收索引器之間有一間距;一偵測組件,位於該載出腔室的該側與該接收索引器之間,且該偵測組件的垂直投影位於該間距內,配置以偵測該間距中的該晶圓,其中該偵測組件具有一訊號發 射接收器與一訊號反射器,該訊號發射接收器位於該訊號反射器上方,該訊號反射器配置以將來自該訊號發射接收器的一訊號反射回該訊號發射接收器,當該接收索引器接收從該載出腔室中傳送出的該晶圓時,且該晶圓位於該載出腔室的該側與該接收索引器之間的該間距中,該訊號發射接收器與該訊號反射器分別位於該晶圓的上下側而使該訊號被該晶圓阻擋;以及一控制器,電性連接該出口閥門與該偵測組件,其中當該偵測組件偵測到該間距中的該晶圓時,該控制器配置以停止該出口閥門與該接收索引器的移動;以及一電子裝置,電性連接該晶圓傳輸設備的該控制器,該電子裝置包括一警報器,當該控制器停止該出口閥門與該接收索引器的移動時,該警報器配置以發出警示。 A wafer transport system includes: a wafer transport device, including: a load-out chamber having an exit valve; a receiving indexer, which is movably located on a side of the load-out chamber having the exit valve and is configured to receive a wafer transferred from the load-out chamber, wherein there is a distance between the side of the load-out chamber and the receiving indexer; a detection assembly, which is located between the side of the load-out chamber and the receiving indexer, and the vertical projection of the detection assembly is located within the distance, and is configured to detect the wafer in the distance, wherein the detection assembly has a signal transmitter receiver and a signal reflector, the signal transmitter receiver is located above the signal reflector, and the signal reflector is configured to reflect a signal from the signal transmitter receiver back to the load-out chamber. A signal transmitter receiver, when the receiving indexer receives the wafer transmitted from the unloading chamber, and the wafer is located in the gap between the side of the unloading chamber and the receiving indexer, the signal transmitter receiver and the signal reflector are respectively located on the upper and lower sides of the wafer so that the signal is blocked by the wafer; and a controller electrically connected to the outlet valve and the detection assembly, wherein when the detection assembly detects the wafer in the gap, the controller is configured to stop the movement of the outlet valve and the receiving indexer; and an electronic device electrically connected to the controller of the wafer transport equipment, the electronic device including an alarm, when the controller stops the movement of the outlet valve and the receiving indexer, the alarm is configured to issue an alarm. 如請求項7所述之晶圓傳輸系統,更包括:一電磁閥,電性連接該載出腔室的該出口閥門、該控制器及該電子裝置。 The wafer transport system as described in claim 7 further includes: an electromagnetic valve electrically connected to the exit valve of the unloading chamber, the controller and the electronic device.
TW111146817A 2022-12-06 Wafer transfer apparatus and wafer transfer system TWI839997B (en)

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Publication number Priority date Publication date Assignee Title
US20220367223A1 (en) 2021-05-12 2022-11-17 Tokyo Electron Limited Substrate transport apparatus and substrate transport method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220367223A1 (en) 2021-05-12 2022-11-17 Tokyo Electron Limited Substrate transport apparatus and substrate transport method

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