TWI837341B - Reduced pressure drying device - Google Patents

Reduced pressure drying device Download PDF

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TWI837341B
TWI837341B TW109111598A TW109111598A TWI837341B TW I837341 B TWI837341 B TW I837341B TW 109111598 A TW109111598 A TW 109111598A TW 109111598 A TW109111598 A TW 109111598A TW I837341 B TWI837341 B TW I837341B
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substrate
solvent
region
drying device
solvent collection
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TW202044337A (en
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戸原淳志
林輝幸
今田雄
島村明典
大島澄美
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日商東京威力科創股份有限公司
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[課題]使基板上之溶液的乾燥時間在基板之面內更為均一。 [解決手段]一種減壓乾燥裝置,係使被塗佈於基板上之溶液在減壓狀態下乾燥,該減壓乾燥裝置,其特徵係,具備有:溶媒捕集部,暫時捕集從前述基板氣化之前述溶液中的溶劑,前述溶媒捕集部,係被配設為與前述基板對向,且被劃分成複數個區域,在前述複數個區域分別形成開口,並被形成為前述複數個區域各自之每一單位面積的熱容量因應與該區域對向之基板的部分而不同。[Topic] Making the drying time of a solution on a substrate more uniform within the surface of the substrate. [Solution] A decompression drying device dries a solution applied on a substrate under decompression, wherein the decompression drying device is characterized in that it comprises: a solvent collection portion temporarily collecting the solvent in the solution vaporized from the substrate, the solvent collection portion being arranged to face the substrate and divided into a plurality of regions, openings being formed in the plurality of regions, and the heat capacity per unit area of each of the plurality of regions being different according to the portion of the substrate facing the region.

Description

減壓乾燥裝置Pressure reduction drying device

本揭示,係關於減壓乾燥裝置。The present disclosure relates to a pressure reduction drying device.

在專利文獻1,係揭示有使被收納於腔室內之基板上的溶液在減壓狀態下乾燥的減壓乾燥裝置。在該減壓乾燥裝置,係設置有溶媒捕集網。溶媒捕集網,係由網狀板所構成,且用於暫時捕集從基板氣化之上述溶液中的溶劑,並被設置為在腔室內與上述基板對向。在專利文獻1所揭示之減壓乾燥裝置中,係藉由設置該溶媒捕集網的方式,使乾燥時間在基板之面內成為均一。 [先前技術文獻] [專利文獻]Patent document 1 discloses a decompression drying device for drying a solution on a substrate contained in a chamber under a decompression state. In the decompression drying device, a solvent collection net is provided. The solvent collection net is composed of a mesh plate and is used to temporarily collect the solvent in the solution vaporized from the substrate, and is provided in the chamber to face the substrate. In the decompression drying device disclosed in Patent document 1, the solvent collection net is provided so that the drying time becomes uniform within the surface of the substrate. [Prior technical document] [Patent document]

[專利文獻1]日本特開2018-59597號公報[Patent Document 1] Japanese Patent Application Publication No. 2018-59597

[本發明所欲解決之課題][Problems to be solved by the present invention]

本揭示之技術,係使基板上之溶液的乾燥時間在基板之面內更為均一。 [用以解決課題之手段]The technology disclosed herein is to make the drying time of the solution on the substrate more uniform within the surface of the substrate. [Method for solving the problem]

本揭示之一態樣,係一種使被塗佈於基板上之溶液在減壓狀態下乾燥的減壓乾燥裝置,其特徵係,具備有:溶媒捕集部,暫時捕集從前述基板氣化之前述溶液中的溶劑,前述溶媒捕集部,係被配設為與前述基板對向,且被劃分成複數個區域,在前述複數個區域分別形成開口,並被形成為前述複數個區域各自之每一單位面積的熱容量因應與該區域對向之基板的部分而不同。 [發明之效果]One aspect of the present disclosure is a decompression drying device for drying a solution applied on a substrate under decompression, characterized in that it has: a solvent collection portion for temporarily collecting the solvent in the solution vaporized from the substrate, the solvent collection portion being arranged to face the substrate and divided into a plurality of regions, openings being formed in the plurality of regions, and being formed so that the heat capacity per unit area of each of the plurality of regions is different according to the portion of the substrate facing the region. [Effect of the invention]

根據本發明,可使基板上之溶液的乾燥時間在基板之面內更為均一。According to the present invention, the drying time of the solution on the substrate can be made more uniform within the surface of the substrate.

以往,已知有利用有機EL (Electroluminescence)之發光的發光二極體即有機發光二極體(OLED:Organic Light Emitting Diode)。使用了該有機發光二極體之有機EL顯示器,係除了薄型輕量且低消費電力以外,具有響應速度或視角、對比方面優異這樣的優點,因此,近年來,作為次世代之平板顯示器(FPD)備受矚目。In the past, organic light emitting diodes (OLEDs) that utilize organic EL (Electroluminescence) have been known. Organic EL displays that use these organic light emitting diodes have advantages such as being thin, light, and low in power consumption, as well as being excellent in response speed, viewing angle, and contrast. Therefore, they have attracted much attention as next-generation flat panel displays (FPDs) in recent years.

有機發光二極體,係具有在基板上的陽極與陰極之間夾著有機EL層的構造。有機EL層,係例如從陽極側依序層積電洞注入層、電洞輸送層、發光層、電子輸送層及電子注入層而形成。在形成該些有機EL層之各層(特別是電洞注入層、電洞輸送層及發光層)時,係例如使用如下述這樣的方法:以噴墨方式,對與離散地被配置於基板上之各色的像素對應之堤部吐出有機材料的液滴,藉此,將其像素之有機材料的膜塗佈於堤部內。An organic light-emitting diode has a structure in which an organic EL layer is sandwiched between an anode and a cathode on a substrate. The organic EL layer is formed by, for example, stacking a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer in order from the anode side. When forming each layer of these organic EL layers (especially the hole injection layer, the hole transport layer, and the light-emitting layer), for example, the following method is used: droplets of organic material are ejected into the bank corresponding to the pixels of each color discretely arranged on the substrate by inkjet printing, thereby coating a film of the organic material of the pixel inside the bank.

在以噴墨方式被吐出至基板上的有機材料中,係含有多量的溶媒。因此,以去除溶媒為目的,進行使基板上之溶媒在減壓狀態下乾燥的減壓乾燥處理。The organic material ejected onto the substrate by inkjet printing contains a large amount of solvent. Therefore, a decompression drying process is performed to remove the solvent, in which the solvent on the substrate is dried under reduced pressure.

作為進行減壓乾燥處理之減壓乾燥裝置,在專利文獻1,係揭示有一種裝置,其具備有:腔室,被構成為氣密,藉由排氣裝置予以減壓;及溶媒捕集網,被設置為在腔室內與基板對向,捕集從基板上之有機材料膜揮發的溶媒。 如專利文獻1般,藉由設置溶媒捕集網的方式,雖可使基板上之溶液的乾燥時間在基板之面內大致均一,但如以下說明般,基板上之溶液的乾燥時間之面內均勻性,係尚有改善的餘地。As a decompression drying device for performing decompression drying treatment, Patent Document 1 discloses a device having: a chamber that is constructed to be airtight and decompressed by an exhaust device; and a solvent collection net that is arranged in the chamber to face the substrate and collect the solvent volatilized from the organic material film on the substrate. As in Patent Document 1, by setting the solvent collection net, the drying time of the solution on the substrate can be made roughly uniform within the surface of the substrate. However, as described below, the uniformity of the drying time of the solution on the substrate within the surface still has room for improvement.

例如,在使用1片基板整體作為1片FPD用之面板的情況下,如圖1所示般,對除了基板W之周緣部以外的大致整面塗佈有機材料M。在像這樣進行塗佈的情況下,即便如專利文獻1般地設置溶媒捕集網,亦有導致基板中央部WC其溶媒之乾燥時間比基板角部WP長的情形。For example, when a single substrate is used as a panel for an FPD, as shown in FIG1 , an organic material M is applied to substantially the entire surface of the substrate W except for the peripheral portion. When the coating is performed in this manner, even if a solvent collecting net is provided as in Patent Document 1, the drying time of the solvent in the center portion WC of the substrate may be longer than that in the corner portion WP of the substrate.

又,亦有將1片基板分割而使用作為複數片(例如4片)FPD用之面板的情形。在該情況下,如圖2所示般,對除了將基板W分割而成之面板P的周緣部以外之大致整面塗佈有機材料M。在像這樣進行塗佈的情況下,即便如專利文獻1般地設置溶媒捕集網,亦有導致面板中央部PC其溶媒之乾燥時間比面板角部PP長的情形。In addition, there is also a case where a single substrate is divided and used as a plurality of panels (e.g., four panels) for FPD. In this case, as shown in FIG. 2 , an organic material M is applied to substantially the entire surface of the panel P except for the peripheral portion thereof formed by dividing the substrate W. When applying in this manner, even if a solvent collecting net is provided as in Patent Document 1, the drying time of the solvent in the center PC of the panel may be longer than that in the corner PP of the panel.

如上述般,當溶媒之乾燥時間產生差異時,則導致乾燥先結束而被形成於基板角部WP或面板角部PP的塗佈膜因在乾燥未結束之基板中央部WC或面板中央部PC氣化的溶媒而溶解。 另外,如上述般,作為導致溶媒之乾燥時間產生差異的理由,係可列舉出如下述情形:由於有機材料M的塗佈區域中之與非塗佈區域的邊界部分,係其周圍的氛圍中之溶媒的濃度低,因此,溶媒容易揮發。As described above, when there is a difference in the drying time of the solvent, the coating film formed at the substrate corner WP or the panel corner PP, which is dried first, is dissolved by the solvent vaporized at the substrate center WC or the panel center PC, which is not dried yet. In addition, as described above, as a reason for the difference in the drying time of the solvent, the following can be cited: Since the concentration of the solvent in the surrounding atmosphere is low at the boundary between the coated area and the non-coated area of the organic material M, the solvent is easily volatilized.

因此,本揭示之技術,係使基板上之溶液的乾燥時間在基板之面內更為均一。Therefore, the technology disclosed in the present invention makes the drying time of the solution on the substrate more uniform within the surface of the substrate.

以下,參閱圖面,說明本實施形態的減壓乾燥裝置。另外,在本說明書及圖面中,對於實質上具有相同機能構成之要素,係賦予相同符號而省略重複說明。In the following, the reduced pressure drying device of this embodiment is described with reference to the drawings. In addition, in this specification and the drawings, the elements having substantially the same functional structure are given the same symbols and repeated description is omitted.

(第1實施形態) 圖3及圖4,係表示第1實施形態之減壓乾燥裝置之概略構成的圖,圖3為剖面圖,圖4為上視圖。在圖3中,係省略用以支撐後述之溶媒捕集網之構造體的圖示,在圖4中,係省略後述之頂板等的圖示。圖5及圖6,係用以說明溶媒捕集網之安裝構造的圖,圖5,係減壓乾燥裝置內的部分側視圖,圖6,係減壓乾燥裝置中之溶媒捕集網與其周圍的下視圖。(First embodiment) Figures 3 and 4 are diagrams showing the schematic structure of the pressure-reducing drying device of the first embodiment, with Figure 3 being a cross-sectional view and Figure 4 being a top view. In Figure 3, the structure for supporting the solvent collection net described later is omitted, and in Figure 4, the top plate described later is omitted. Figures 5 and 6 are diagrams for explaining the installation structure of the solvent collection net, with Figure 5 being a partial side view of the inside of the pressure-reducing drying device and Figure 6 being a bottom view of the solvent collection net and its surroundings in the pressure-reducing drying device.

圖3之減壓乾燥裝置1,係使以例如噴墨方式被塗佈於基板上的溶液在減壓狀態下乾燥者。又,減壓乾燥裝置1之處理對象的基板,係例如有機EL顯示器用之玻璃基板,且為與圖1所示者相同地,以1片基板整體被使用作為1片FPD用之面板者。另外,處理對象之基板,係大型基板,其寬度為例如215mm。The reduced pressure drying device 1 of FIG3 dries the solution applied on the substrate by, for example, inkjet method under reduced pressure. The substrate to be processed by the reduced pressure drying device 1 is, for example, a glass substrate for an organic EL display, and is used as a panel for an FPD as a whole, similar to the one shown in FIG1 . In addition, the substrate to be processed is a large substrate, and its width is, for example, 215 mm.

塗佈於處理對象之基板的溶液,係由溶質與溶媒所構成,成為減壓乾燥處理之對象的成分,係主要為溶媒。作為溶媒所含有之有機化合物,係大多為高沸點者,例如可列舉出1,3-二甲基-2-四氫咪唑酮(1,3-dimethyl-2-imidazolidinone、沸點220℃、熔點8℃)、4-tert-丁基苯甲醚(4-tert-Butylanisole、沸點222℃、熔點18℃)、Trans-茴香腦(Trans-Anethole、沸點235℃、熔點20℃)、1,2-二甲氧苯(1,2-Dimethoxybenzene、沸點206.7℃、熔點22.5℃)、2-甲氧基聯苯(2-Methoxybiphenyl、沸點274℃、熔點28℃)、二苯醚(PhenylEther、沸點258.3℃、熔點28℃)、2-乙氧基萘(2-Ethoxynaphthalene、沸點282℃、熔點35℃)、苄基苯基醚(Benzyl Phenyl Ether、沸點288℃、熔點39℃)、2,6-二甲氧基甲苯(2,6-Dimethoxytoluene、沸點222℃、熔點39℃)、2-丙氧基萘(2-Propoxynaphthalene、沸點305℃、熔點40℃)、1,2,3-三甲氧基苯(1,2,3-Trimethoxybenzene、沸點235℃、熔點45℃)、環己苯(cyclohexylbenzene、沸點237.5℃、熔點5℃)、十二烷基苯(dodecylbenzene、沸點288℃、熔點-7℃)、1,2,3,4-四甲基苯(1,2,3,4-tetramethylbenzene、沸點203℃、熔點76℃)等。該些高沸點有機化合物,係亦有將2種以上組合而混合於溶液中的情況。The solution applied to the substrate to be treated is composed of a solute and a solvent. The component to be treated by the reduced pressure drying treatment is mainly the solvent. Most of the organic compounds contained in the solvent are high boiling point compounds, such as 1,3-dimethyl-2-imidazolidinone (boiling point 220°C, melting point 8°C), 4-tert-Butylanisole (boiling point 222°C, melting point 18°C), and Trans-Anethole (boiling point 235°C, melting point 20°C). 、1,2-Dimethoxybenzene (1,2-Dimethoxybenzene, boiling point 206.7℃, melting point 22.5℃), 2-Methoxybiphenyl (2-Methoxybiphenyl, boiling point 274℃, melting point 28℃), Phenyl Ether (Phenyl Ether, boiling point 258.3℃, melting point 28℃), 2-Ethoxynaphthalene (2-Ethoxynaphthalene, boiling point 282℃, melting point 35℃), Benzyl Phenyl Ether (Benzyl Phenyl ether, boiling point 288℃, melting point 39℃), 2,6-dimethoxytoluene (boiling point 222℃, melting point 39℃), 2-propoxynaphthalene (boiling point 305℃, melting point 40℃), 1,2,3-trimethoxybenzene (boiling point 235℃, melting point 45℃), cyclohexylbenzene (boiling point 237.5℃, melting point 5℃), dodecylbenzene (boiling point 288℃, melting point -7℃), 1,2,3,4-tetramethylbenzene (boiling point 203℃, melting point 76℃), etc. These high boiling point organic compounds may be mixed in solution in combination of two or more.

減壓乾燥裝置1,係具備有腔室10與載置台20,並被連接於排氣裝置30。The reduced pressure drying device 1 includes a chamber 10 and a mounting table 20 , and is connected to an exhaust device 30 .

腔室10,係被構成為可減壓的處理容器,例如由不銹鋼等的金屬材料所形成。腔室10,係具有:角筒狀之本體部11;頂板12,被安裝於本體部11之上側;及底板13,被安裝於本體部11之下側。The chamber 10 is a depressurized processing container, and is formed of a metal material such as stainless steel. The chamber 10 includes a rectangular cylindrical body 11, a top plate 12 mounted on the upper side of the body 11, and a bottom plate 13 mounted on the lower side of the body 11.

本體部11,係在其側面設置有用以將基板W搬入搬出腔室10內的搬入搬出口(未圖示)。 頂板12,係堵塞本體部11之上側的開口,並且支撐後述的溶媒捕集網40。The main body 11 is provided with a loading and unloading port (not shown) on its side for loading and unloading the substrate W into and out of the chamber 10. The top plate 12 blocks the opening on the upper side of the main body 11 and supports the solvent collection net 40 described later.

頂板13,係堵塞本體部11之下側的開口者。在底板13之上側的中央,係配設有載置台20。又,在底板13,係以包圍載置台20之外周的方式,設置排氣口狹縫13a,在排氣口狹縫13a,係經由排氣管31連接有排氣裝置30。可經由該排氣口狹縫13a,對減壓乾燥裝置1的腔室10內進行減壓。The top plate 13 blocks the opening on the lower side of the body 11. A mounting table 20 is provided at the center of the upper side of the bottom plate 13. An exhaust slit 13a is provided on the bottom plate 13 so as to surround the outer periphery of the mounting table 20. An exhaust device 30 is connected to the exhaust slit 13a via an exhaust pipe 31. The chamber 10 of the decompression drying device 1 can be depressurized via the exhaust slit 13a.

載置台20,係載置基板W者。在載置台20,係以貫通該載置台20的方式,設置有升降銷(未圖示)。升降銷,係用以在與將基板W從腔室10之外部插入該腔室10內的基板搬送裝置(未圖示)之間進行收授者。該升降銷,係被構成為可藉由升降機構(未圖示)上下自由移動。The stage 20 is used to place the substrate W. A lifting pin (not shown) is provided on the stage 20 so as to penetrate the stage 20. The lifting pin is used to transfer the substrate W to and from a substrate transfer device (not shown) that inserts the substrate W from the outside of the chamber 10 into the chamber 10. The lifting pin is configured to be freely movable up and down by a lifting mechanism (not shown).

另外,排氣裝置30,係由真空泵所構成,具體而言,係例如將渦輪分子泵與乾式泵從上游側依序串聯連接而構成。 在排氣管31中之排氣口狹縫13a與排氣裝置30之間的部分,係設置有自動壓力控制閥(APC(Adaptive Pressure Control)閥)32。在減壓乾燥裝置1中,係在使排氣裝置30之真空泵作動的狀態下,調節APC閥32之開合度,藉此,可控制減壓排氣時之腔室10內的真空度。 另外,為了由APC閥32控制上述真空度,從而在減壓乾燥裝置1設置有測定腔室10內之壓力的壓力計(未圖示)。上述壓力計之計測結果,係作為電信號被輸入至APC閥32。In addition, the exhaust device 30 is composed of a vacuum pump, specifically, a turbomolecular pump and a dry pump are connected in series from the upstream side. An automatic pressure control valve (APC (Adaptive Pressure Control) valve) 32 is provided between the exhaust port slit 13a in the exhaust pipe 31 and the exhaust device 30. In the decompression drying device 1, the opening and closing degree of the APC valve 32 is adjusted while the vacuum pump of the exhaust device 30 is activated, thereby controlling the vacuum degree in the chamber 10 during decompression exhaust. In addition, in order to control the above vacuum degree by the APC valve 32, a pressure gauge (not shown) for measuring the pressure in the chamber 10 is provided in the decompression drying device 1. The measurement result of the above pressure gauge is input to the APC valve 32 as an electrical signal.

又,減壓乾燥裝置1,係具有控制部(未圖示)。該控制部,係例如具備有CPU或記憶體等的電腦,並具有程式儲存部(未圖示)。在程式儲存部,係儲存有控制減壓乾燥裝置1中之減壓乾燥處理的程式。另外,上述程式,係亦可為被記錄於電腦可讀取的記憶媒體者,且亦可為從該記憶媒體安裝於上述控制部者。程式之一部分或全部,係亦可由專用硬體(電路基板)來實現。Furthermore, the reduced pressure drying device 1 has a control unit (not shown). The control unit is, for example, a computer having a CPU or a memory, and has a program storage unit (not shown). The program storage unit stores a program for controlling the reduced pressure drying process in the reduced pressure drying device 1. In addition, the above program may be recorded in a computer-readable storage medium, and may be installed in the above control unit from the storage medium. Part or all of the program may also be implemented by dedicated hardware (circuit board).

而且,減壓乾燥裝置1,係具備有:作為溶媒捕集部的溶媒捕集網40,暫時捕集從被載置於載置台20之基板W氣化的溶液中之溶媒。具體而言,溶媒捕集網40,係捕集從藉由噴墨方式被塗佈於基板W上之溶液氣化的溶媒。藉由在腔室10內設置溶媒捕集網40的方式,可調節該腔室10內的氛圍中之溶媒濃度。Furthermore, the reduced pressure drying device 1 is provided with a solvent collecting net 40 as a solvent collecting portion, which temporarily collects the solvent in the solution vaporized from the substrate W placed on the mounting table 20. Specifically, the solvent collecting net 40 collects the solvent vaporized from the solution applied on the substrate W by the inkjet method. By arranging the solvent collecting net 40 in the chamber 10, the solvent concentration in the atmosphere in the chamber 10 can be adjusted.

溶媒捕集網40,係被支撐於該溶媒捕集網40之上部的構造物且為最靠近溶媒捕集網40之構造物即頂板12與基板W之間的位置。又,溶媒捕集網40,係以與基板W正對的方式,亦即以與基板W成為大致平行的方式,被支撐於頂板12。另外,溶媒捕集網40,係被支撐於直至基板W之距離例如成為75mm的位置。The solvent collecting net 40 is supported by a structure on the upper part of the solvent collecting net 40 and is located between the top plate 12, which is the structure closest to the solvent collecting net 40, and the substrate W. The solvent collecting net 40 is supported by the top plate 12 in a manner facing the substrate W, that is, in a manner substantially parallel to the substrate W. In addition, the solvent collecting net 40 is supported at a distance of, for example, 75 mm from the substrate W.

頂板12對溶媒捕集網40之支撐,係如圖5所示般,經由框體50與腳部51來進行。例如,藉由熔接等來將溶媒捕集網40固定於方筒狀之框體50,並使用螺孔等來將被設置於框體50之外側的耳部50a固定於從頂板12往下方向延伸的腳部51,藉此,溶媒捕集網40被支撐於頂板12。 另外,框體50或腳部51,係例如由不銹鋼等的金屬材料所構成。 又,框體50或腳部51,係與基板W之間夾著溶媒捕集網40並位於相反側。因此,從基板W側觀看,由於溶媒捕集網40未被框體50或腳部51覆蓋,因此,框體50或腳部51不會阻礙氣化之溶媒從基板W往溶媒捕集網40的方向之流動。The support of the solvent collecting net 40 by the top plate 12 is performed through the frame 50 and the leg 51 as shown in FIG5 . For example, the solvent collecting net 40 is fixed to the square cylindrical frame 50 by welding, and the ear 50a provided on the outside of the frame 50 is fixed to the leg 51 extending downward from the top plate 12 by screw holes, thereby supporting the solvent collecting net 40 on the top plate 12. In addition, the frame 50 or the leg 51 is made of a metal material such as stainless steel. In addition, the frame 50 or the leg 51 is sandwiched between the substrate W and the solvent collecting net 40 and is located on the opposite side. Therefore, when viewed from the substrate W side, since the solvent collecting net 40 is not covered by the frame 50 or the leg 51 , the frame 50 or the leg 51 will not hinder the flow of the vaporized solvent from the substrate W to the solvent collecting net 40 .

接著,參閱圖6,使用圖7及圖8說明關於溶媒捕集網40之形狀等的詳細內容。圖7,係溶媒捕集網40之中央區域的部分放大平面圖,圖8,係溶媒捕集網40之周緣區域的部分放大平面圖。Next, referring to Fig. 6, details about the shape of the solvent collecting net 40 are described using Fig. 7 and Fig. 8. Fig. 7 is a partially enlarged plan view of the central area of the solvent collecting net 40, and Fig. 8 is a partially enlarged plan view of the peripheral area of the solvent collecting net 40.

溶媒捕集網40,係被劃分成複數個區域,在上述複數個區域分別形成開口。例如,溶媒捕集網40,係如圖6所示般,被劃分成中央區域R1與周緣區域R2,且如圖7及圖8所示般,在中央區域R1形成有俯視正六角形狀的開口41,在周緣區域R2形成有開口42。另外,開口41、42,係例如在溶媒捕集網40之厚度方向貫通該溶媒捕集網40的貫通孔。The solvent collection net 40 is divided into a plurality of regions, and openings are formed in the plurality of regions. For example, the solvent collection net 40 is divided into a central region R1 and a peripheral region R2 as shown in FIG6 , and as shown in FIG7 and FIG8 , an opening 41 having a regular hexagonal shape in a top view is formed in the central region R1, and an opening 42 is formed in the peripheral region R2. In addition, the openings 41 and 42 are, for example, through holes that penetrate the solvent collection net 40 in the thickness direction of the solvent collection net 40.

而且,溶媒捕集網40,係被形成為複數個區域各自之俯視下的每一單位面積熱容量因應與該區域對向之基板W的部分而不同。本實施形態,係在溶媒捕集網40中,與基板中央部WC對向的中央區域R1及包含與基板角部WP對向之區域的周緣區域R2其開口率不同,藉此,俯視下之每一單位面積的熱容量在中央區域R1與周緣區域R2不同。更具體而言,溶媒捕集網40,係被形成為中央區域R1之開口率大於周緣區域R2的開口率,且中央區域R1的俯視下之每一單位面積的熱容量小於周緣區域R2的同熱容量。Furthermore, the solvent collecting net 40 is formed so that the heat capacity per unit area in the top view of each of the plurality of regions is different according to the portion of the substrate W facing the region. In this embodiment, the opening ratios of the central region R1 facing the substrate center WC and the peripheral region R2 including the region facing the substrate corner WP are different in the solvent collecting net 40, whereby the heat capacity per unit area in the top view is different in the central region R1 and the peripheral region R2. More specifically, the solvent collecting net 40 is formed so that the opening ratio of the central region R1 is greater than the opening ratio of the peripheral region R2, and the heat capacity per unit area in the top view of the central region R1 is smaller than the same heat capacity of the peripheral region R2.

例如,中央區域R1之開口41及周緣區域R2之開口42,係於俯視下,皆規則地被形成為格子狀,開口41與開口42,係其間距相等。但是,於俯視下,開口41之內徑大於開口42的內徑。換言之,於俯視下,相隔著鄰接之開口41間之隔壁部41a的寬度小於相隔著鄰接之開口42間之隔壁部42a的寬度。藉像這樣的形狀之差異,溶媒捕集網40,係中央區域R1之開口率大於周緣區域R2的開口率。 另外,開口率,係指俯視下之溶媒捕集網40的開口41或開口42的面積相對於溶媒捕集網40之單位面積的比率。中央區域R1中之開口率及周緣區域R2中之開口率,係例如被設定於60%~80%的範圍。For example, the openings 41 of the central region R1 and the openings 42 of the peripheral region R2 are both regularly formed in a grid shape when viewed from above, and the distances between the openings 41 and 42 are equal. However, when viewed from above, the inner diameter of the opening 41 is larger than the inner diameter of the opening 42. In other words, when viewed from above, the width of the partition wall 41a between adjacent openings 41 is smaller than the width of the partition wall 42a between adjacent openings 42. Due to such a difference in shape, the solvent capture net 40 has a larger opening rate in the central region R1 than in the peripheral region R2. The opening ratio refers to the ratio of the area of the opening 41 or the opening 42 of the solvent collection net 40 in a plan view to the unit area of the solvent collection net 40. The opening ratio in the central region R1 and the opening ratio in the peripheral region R2 are set in the range of 60% to 80%, for example.

溶媒捕集網40,係由具有如上述般之開口41、42的網狀板所構成。網狀板,係指貫通於厚度方向之開口在俯視下規則地被形成為格子狀的板狀構件。又,溶媒捕集網40,係由不銹鋼或鋁、銅、金這樣的金屬材料等之熱傳導性良好的材料所構成。溶媒捕集網40之開口41、42,係例如藉由雷射加工所形成。The solvent collecting net 40 is composed of a mesh plate having the openings 41 and 42 as described above. The mesh plate refers to a plate-like member in which the openings extending in the thickness direction are regularly formed in a lattice shape when viewed from above. The solvent collecting net 40 is composed of a material having good thermal conductivity such as stainless steel or a metal material such as aluminum, copper, or gold. The openings 41 and 42 of the solvent collecting net 40 are formed, for example, by laser processing.

另外,溶媒捕集網40薄,其厚度為例如0.05mm~0.2mm。又,溶媒捕集網40之水平方向的尺寸,係與基板W之水平方向的尺寸大致相同。但是,為了增加氣化之溶媒的吸附量,溶媒捕集網40之水平方向的尺寸,係亦可大於基板W之水平方向的尺寸。In addition, the solvent collection net 40 is thin, and its thickness is, for example, 0.05 mm to 0.2 mm. Moreover, the horizontal dimension of the solvent collection net 40 is substantially the same as the horizontal dimension of the substrate W. However, in order to increase the adsorption amount of the vaporized solvent, the horizontal dimension of the solvent collection net 40 may also be larger than the horizontal dimension of the substrate W.

另外,由於溶媒捕集網40,係即便在開口率如上述般因區域而不同者之任一區域,開口率亦大至60%~80%且薄至0.05~0.2mm,因此,俯視下之每一單位面積的熱容量小。In addition, since the solvent collection net 40 has an opening rate as large as 60% to 80% and a thickness as thin as 0.05 to 0.2 mm even in any region where the opening rate varies among regions as described above, the heat capacity per unit area in a top view is small.

接著,說明關於使用了減壓乾燥裝置1的減壓乾燥處理。 在使用了減壓乾燥裝置1之減壓乾燥處理中,係首先,將以噴墨方式塗佈了溶液的基板W載置於載置台20。 其次,使排氣裝置30之乾式泵作動,對腔室10內進行減壓排氣。乾式泵所致之減壓排氣,係進行直至腔室10內的壓力成為例如10Pa為止。 在該減壓排氣時,藉由絕熱膨脹冷卻腔室10內的氣體。如此一來,即便腔室10內之氣體被冷卻,基板W之溫度,係由於基板W的熱容量大等,亦幾乎不會從室溫23℃發生變化。但是,熱容量小之溶媒捕集網40的溫度會降低。Next, the decompression drying process using the decompression drying device 1 is described. In the decompression drying process using the decompression drying device 1, first, the substrate W coated with the solution by inkjet is placed on the mounting table 20. Next, the dry pump of the exhaust device 30 is operated to decompress and exhaust the chamber 10. The decompression exhaust by the dry pump is performed until the pressure in the chamber 10 reaches, for example, 10 Pa. During the decompression exhaust, the gas in the chamber 10 is cooled by adiabatic expansion. Thus, even if the gas in the chamber 10 is cooled, the temperature of the substrate W will hardly change from the room temperature of 23° C. due to the large heat capacity of the substrate W. However, the temperature of the solvent collection net 40 having a small heat capacity will decrease.

其後,使排氣裝置30之渦輪分子泵作動,進一步進行減壓排氣。伴隨著該減壓排氣,與上述相同地,溶媒捕集網40的溫度會下降而成為在該時間點之腔室10內的壓力下之露點以下(例如8~15℃)。 又,溶媒捕集網40之溫度,係在直至基板W上的溶媒之蒸發結束為止的期間,被維持為在各時間點之腔室10內的壓力下之溶媒的露點以下。 因此,由於從基板W氣化之溶媒,係藉由溶媒捕集網40被高效率地捕集,因此,腔室10內之氣體狀的溶媒之濃度被維持較低。因此,可快速地去除基板上W上的溶媒。Thereafter, the turbomolecular pump of the exhaust device 30 is operated to further perform decompression exhaust. Along with the decompression exhaust, the temperature of the solvent collection net 40 will drop to below the dew point under the pressure in the chamber 10 at that time point (e.g., 8 to 15°C) as described above. In addition, the temperature of the solvent collection net 40 is maintained below the dew point of the solvent under the pressure in the chamber 10 at each time point until the evaporation of the solvent on the substrate W is completed. Therefore, since the solvent vaporized from the substrate W is efficiently captured by the solvent collection net 40, the concentration of the gaseous solvent in the chamber 10 is maintained at a low level. Therefore, the solvent on the substrate W can be quickly removed.

而且,溶媒捕集網40如前述般被形成為中央區域R1之開口率大於周緣區域R2的開口率,且中央區域R1的俯視下之每一單位面積的熱容量小於周緣區域R2的同熱容量。因此,在上述減壓排氣之過程的冷卻中,溶媒捕集網40之中央區域R1比周緣區域R2更早到達在各時間點之腔室10內的壓力下之露點以下,又,作為上述冷卻的結果,溶媒捕集網40之中央區域R1的到達溫度低於周緣區域R2。亦即,溶媒捕集網40,係中央區域R1其溶媒之吸附能力高於周緣區域R2。因此,藉由使用溶媒捕集網40的方式,可在使用了以往之溶媒捕集網的情況下,與來自基板角部WP之溶媒相比,更高效率地捕集來自溶媒的乾燥時間比基板角部WP長之基板中央部WC的溶媒。因此,可在基板中央部WC與基板角部WP,使基板W上之溶液的乾燥結束之時間點相等。Furthermore, as described above, the solvent collection net 40 is formed such that the opening ratio of the central region R1 is greater than the opening ratio of the peripheral region R2, and the heat capacity per unit area of the central region R1 in a top view is smaller than the heat capacity of the peripheral region R2. Therefore, in the cooling process of the above-mentioned decompression and exhaust, the central region R1 of the solvent collection net 40 reaches the dew point below the pressure in the chamber 10 at each time point earlier than the peripheral region R2, and as a result of the above-mentioned cooling, the central region R1 of the solvent collection net 40 reaches a lower temperature than the peripheral region R2. That is, the solvent collection net 40 has a higher solvent adsorption capacity in the central region R1 than in the peripheral region R2. Therefore, by using the solvent collection net 40, the solvent from the substrate center WC where the drying time of the solvent is longer than that of the substrate corner WP can be more efficiently collected than the solvent from the substrate corner WP when the conventional solvent collection net is used. Therefore, the time point at which the drying of the solution on the substrate W is completed can be equalized at the substrate center WC and the substrate corner WP.

基板W上之溶媒的去除結束後,亦持續排氣裝置30之渦輪分子泵的排氣。原因在於為了從該溶媒捕集網40去除由溶媒捕集網40所捕集的溶媒。 例如從使渦輪分子泵作動起至經過預定時間為止,持續渦輪分子泵的排氣,藉此,從溶媒捕集網40去除溶媒之溶媒捕集網40的乾燥工程便結束。After the removal of the solvent on the substrate W is completed, the exhaust device 30 continues to exhaust the turbomolecular pump. The reason is to remove the solvent captured by the solvent capture net 40 from the solvent capture net 40. For example, from the start of the turbomolecular pump to the time when the predetermined time has passed, the exhaust of the turbomolecular pump continues, thereby completing the drying process of the solvent capture net 40 to remove the solvent from the solvent capture net 40.

溶媒捕集網40之乾燥工程結束後,停止排氣裝置30。其後,在腔室10內之壓力返回到大氣壓後,從腔室10搬出基板W。由此,使用了減壓乾燥裝置1的減壓乾燥處理便結束。After the drying process of the solvent collection net 40 is completed, the exhaust device 30 is stopped. After that, after the pressure in the chamber 10 is returned to the atmospheric pressure, the substrate W is unloaded from the chamber 10. Thus, the reduced pressure drying process using the reduced pressure drying device 1 is completed.

如以上般,在本實施形態中,係溶媒捕集網40被設置為與腔室10內之基板W對向,且被劃分成複數個區域,在複數個區域分別形成開口,並被形成為複數個區域各自之俯視下的每一單位面積之熱容量因應與該區域對向之基板W的部分而不同。因此,由於溶媒捕集網40之複數個區域各自的溶媒吸附能力因應與該區域對向之部分而不同,因此,可使基板W上之溶液的乾燥時間在基板W之面內成為均一。因此,可防止產生像素內膜形狀在基板W內的偏差或基板W內之膜厚分布的偏差、一像素內之膜厚分布的偏差。 當基板W大型化時,則溶媒之乾燥時間在基板面內的不均一性變得更顯著。因此,本實施形態之減壓乾燥裝置1,係在以大型之基板W作為乾燥處理對象的情形下特別有用。As described above, in the present embodiment, the solvent collection net 40 is arranged to face the substrate W in the chamber 10 and is divided into a plurality of regions, openings are formed in the plurality of regions, and the heat capacity per unit area of each of the plurality of regions in a top view is different according to the portion of the substrate W facing the region. Therefore, since the solvent adsorption capacity of each of the plurality of regions of the solvent collection net 40 is different according to the portion facing the region, the drying time of the solution on the substrate W can be made uniform within the surface of the substrate W. Therefore, the deviation of the film shape within the pixel within the substrate W or the deviation of the film thickness distribution within the substrate W, and the deviation of the film thickness distribution within one pixel can be prevented. When the substrate W is enlarged, the non-uniformity of the solvent drying time within the substrate surface becomes more significant. Therefore, the reduced pressure drying apparatus 1 of this embodiment is particularly useful when a large substrate W is to be dried.

在本實施形態中,係溶媒捕集網40被劃分成中央區域R1與周緣區域R2,在中央區域R1與周緣區域R2分別形成開口41、42。而且,該溶媒捕集網40,係每一單位面積之熱容量在中央區域R1與周緣區域R2並不同。在乾燥處理對象的基板W是以1片基板整體被使用作為1片FPD用之面板者的情況下,可使基板W上之溶液的乾燥時間在基板W之面內成為均一。In this embodiment, the solvent collecting net 40 is divided into a central region R1 and a peripheral region R2, and openings 41 and 42 are formed in the central region R1 and the peripheral region R2, respectively. Moreover, the heat capacity per unit area of the solvent collecting net 40 is different in the central region R1 and the peripheral region R2. In the case where the substrate W to be dried is a single substrate used as a panel for an FPD, the drying time of the solution on the substrate W can be made uniform within the surface of the substrate W.

(第2實施形態) 圖9,係用以說明第2實施形態之被設置於減壓乾燥裝置之溶媒捕集網的平面圖。 第1實施形態之減壓乾燥裝置的乾燥處理對象之基板,係以1片基板整體被使用作為1片FPD用之面板者。對此,本實施形態之減壓乾燥裝置的乾燥處理對象之基板W,係與圖2所示者相同地,將1片基板分割而使用作為4片FPD用之面板者。(Second embodiment) Figure 9 is a plan view of a solvent collection net installed in a decompression drying device for explaining the second embodiment. The substrate to be dried by the decompression drying device in the first embodiment is a substrate that is used as a panel for a single FPD as a whole. In contrast, the substrate W to be dried by the decompression drying device in this embodiment is a substrate that is divided into four panels for FPDs, similar to that shown in Figure 2.

本實施形態之被設置於減壓乾燥裝置的圖9之溶媒捕集網100,係被劃分成:面板對應中央區域R11,與相當於基板W中之面板中央部PC的部分對向;及面板對應周緣區域R12,與相當於基板W中之面板角部PP的部分對向。而且,在面板對應中央區域R11,係設置有與圖7之開口41相同的開口,在面板對應周緣區域R12,係設置有與圖8之開口相同的開口。亦即,溶媒捕集網100,係被形成為面板對應中央區域R11之開口率大於面板對應周緣區域R12的開口率。藉此,在溶媒捕集網100中,面板對應中央區域R11之俯視下的每一單位面積之熱容量小於面板對應周緣區域R12的同熱容量。The solvent collection net 100 of FIG. 9 disposed in the decompression drying device of this embodiment is divided into: a panel corresponding central region R11, which is opposite to a portion corresponding to the panel central portion PC in the substrate W; and a panel corresponding peripheral region R12, which is opposite to a portion corresponding to the panel corner portion PP in the substrate W. Moreover, the panel corresponding central region R11 is provided with an opening identical to the opening 41 of FIG. 7, and the panel corresponding peripheral region R12 is provided with an opening identical to the opening of FIG. 8. That is, the solvent collection net 100 is formed such that the opening ratio of the panel corresponding central region R11 is greater than the opening ratio of the panel corresponding peripheral region R12. Thus, in the solvent collection net 100, the heat capacity per unit area of the panel corresponding to the central region R11 in a top view is smaller than the heat capacity of the panel corresponding to the peripheral region R12.

因此,在減壓乾燥處理時之腔室10內的減壓排氣之過程中,溶媒捕集網100之面板對應中央區域R11比面板對應周緣區域R12更早到達在各時間點之腔室10內的壓力下之露點以下,又,面板對應中央區域R11的到達溫度低於面板對應周緣區域R12。亦即,溶媒捕集網100,係面板對應中央區域R11其溶媒之吸附能力高於面板對應周緣區域R12。因此,藉由使用溶媒捕集網100的方式,可在使用了以往之溶媒捕集網的情況下,與來自面板角部PP之溶媒相比,更高效率地捕集來自溶媒的乾燥時間比面板角部PP長之面板中央部PC的溶媒。因此,可在面板中央部PC與面板角部PP,使基板W上之溶液的乾燥結束之時間點相等。Therefore, during the decompression and exhaust process in the chamber 10 during the decompression and drying process, the panel corresponding central area R11 of the solvent collection net 100 reaches below the dew point under the pressure in the chamber 10 at each time point earlier than the panel corresponding peripheral area R12, and the reaching temperature of the panel corresponding central area R11 is lower than that of the panel corresponding peripheral area R12. That is, the solvent collection net 100 has a higher solvent adsorption capacity in the panel corresponding central area R11 than in the panel corresponding peripheral area R12. Therefore, by using the solvent collection net 100, the solvent from the panel central part PC, where the drying time of the solvent is longer than that of the panel corner PP, can be more efficiently captured than the solvent from the panel corner PP when the conventional solvent collection net is used. Therefore, the time points at which the drying of the solution on the substrate W is completed can be made equal at the panel center PC and the panel corner PP.

根據本實施形態,在乾燥處理對象的基板W是將1片基板分割而使用作為4片FPD用之面板者的情況下,可使基板W上之溶液的乾燥時間在面板面內成為均一。According to this embodiment, when the substrate W to be dried is a single substrate that is divided and used as four FPD panels, the drying time of the solution on the substrate W can be made uniform within the panel surface.

圖10,係用以說明第2實施形態之被設置於減壓乾燥裝置之溶媒捕集網之其他例的平面圖。 用於「在乾燥處理對象的基板W是將1片基板分割而使用作為4片FPD用之面板者」的情況下之溶媒捕集網,係不限於圖9的例子,亦可為如圖10所示般者。FIG. 10 is a plan view of another example of a solvent collection net installed in a pressure reduction drying device for explaining the second embodiment. The solvent collection net used in the case where "the substrate W to be dried is a single substrate divided and used as four panels for FPD" is not limited to the example of FIG. 9 and may be as shown in FIG. 10.

圖10之溶媒捕集網110,係被劃分成第1~第3區域R21~R23。第1區域R21,係與「相當於基板中央部WC中之面板中央部PC的部分」對向之區域。第2區域R22,係與「相當於基板中央部WC中之面板角部PP的部分或相當於基板角部WP中之面板中央部PC的部分」對向之區域。第3區域R23,係與「相當於基板角部WP中之面板角部PP的部分」對向之區域。而且,溶媒捕集網110,係以滿足以下之關係的方式,在第1~第3區域R21~R23形成開口。 第1區域R21之開口率>第2區域R22之開口率>第3區域R23之開口率The solvent collection net 110 of FIG. 10 is divided into the first to third regions R21 to R23. The first region R21 is a region opposite to the "portion of the panel center PC corresponding to the substrate center WC". The second region R22 is a region opposite to the "portion of the panel corner PP corresponding to the substrate center WC or the panel center PC corresponding to the substrate corner WP". The third region R23 is a region opposite to the "portion of the panel corner PP corresponding to the substrate corner WP". Moreover, the solvent collection net 110 forms openings in the first to third regions R21 to R23 in a manner that satisfies the following relationship. The opening ratio of the first region R21> the opening ratio of the second region R22> the opening ratio of the third region R23

藉此,在溶媒捕集網110中,俯視下之每一單位面積的熱容量成為如以下般的關係。 第1區域R21<第2區域R22<第3區域R23Thus, in the solvent collection net 110, the heat capacity per unit area in a top view becomes the following relationship. 1st region R21<2nd region R22<3rd region R23

因此,在減壓乾燥處理時之腔室10內的減壓排氣之過程中,以第1區域R21、第2區域R22、第3區域R23的順序,到達在各時間點之腔室10內的壓力下之露點以下。又,上述減壓排氣之過程中的到達溫度是成為第1區域R21、第2區域R22、第3區域R23的順序。亦即,在溶媒捕集網110中,溶媒之吸附能力從高到低依序為第1區域R21、第2區域R22、第3區域R23。而且,在使用了以往之溶媒捕集網的情況下,從溶媒之乾燥時間較長者依序列舉為與基板W中之溶媒捕集網110的第1區域R21對向之部分、與第2區域R22對向之部分、與第3區域R23對向之部分。因此,藉由使用溶媒捕集網110的方式,可在基板W之面內及面板面內,使基板W上之溶液的乾燥結束之時間點相等。亦即,可更正確地使基板W上之溶液的乾燥時間在基板W之面內及面板面內成為均一。因此,不僅可防止產生像素內膜形狀在基板W內的偏差、基板W內之膜厚分布的偏差、一像素內之膜厚分布的偏差,另可防止產生像素內膜形狀在面板內的偏差或面板內之膜厚分布的偏差。Therefore, during the process of decompression and exhaust in the chamber 10 during the decompression and drying process, the first region R21, the second region R22, and the third region R23 are in the order of reaching the dew point under the pressure in the chamber 10 at each time point. In addition, the reaching temperature during the process of decompression and exhaust is in the order of the first region R21, the second region R22, and the third region R23. That is, in the solvent collection net 110, the adsorption capacity of the solvent is from high to low in the order of the first region R21, the second region R22, and the third region R23. Furthermore, when the conventional solvent collection net is used, the solvent is dried in the order of the longer drying time, i.e., the portion opposite to the first region R21 of the solvent collection net 110 in the substrate W, the portion opposite to the second region R22, and the portion opposite to the third region R23. Therefore, by using the solvent collection net 110, the time point at which the drying of the solution on the substrate W is completed can be made equal within the surface of the substrate W and within the surface of the panel. That is, the drying time of the solution on the substrate W can be more accurately made uniform within the surface of the substrate W and within the surface of the panel. Therefore, not only can the deviation of the film shape within the pixel within the substrate W, the deviation of the film thickness distribution within the substrate W, and the deviation of the film thickness distribution within a pixel be prevented, but also the deviation of the film shape within the pixel within the panel or the deviation of the film thickness distribution within the panel can be prevented.

另外,溶媒捕集網110之第2區域R22,係亦可分成與基板中央部WC中之面板角部PP對向的區域及與相當於基板角部WP中之面板中央部PC的部分對向之區域,並使各區域的俯視下之每一單位面積的熱容量與所劃分之其他區域者不同。In addition, the second region R22 of the solvent capture net 110 can also be divided into a region opposite to the panel corner PP in the substrate center WC and a region opposite to the portion corresponding to the panel center PC in the substrate corner WP, and the heat capacity per unit area of each region when viewed from above is different from that of other divided regions.

(第3實施形態) 圖11,係用以說明第3實施形態之被設置於減壓乾燥裝置之溶媒捕集網的圖,且為減壓乾燥裝置的部分側視圖。 在以上之例子的減壓乾燥裝置中,雖係使用了1片溶媒捕集網,但亦可將形狀彼此不同的複數片溶媒捕集網層積使用。(Third embodiment) Figure 11 is a diagram for explaining the solvent collection net installed in the decompression drying device of the third embodiment, and is a partial side view of the decompression drying device. In the decompression drying device of the above example, although one solvent collection net is used, a plurality of solvent collection nets of different shapes may be used in layers.

在圖11之例子的減壓乾燥裝置,係層積配設有圖6的溶媒捕集網40與圖9的溶媒捕集網100。溶媒捕集網40與溶媒捕集網100,係與層積方向無間隙地彼此密接,且藉由熔接等彼此接合。不論溶媒捕集網40及溶媒捕集網100之層積順序為何,溶媒捕集網40與溶媒捕集網100的任一者亦可被配設於基板側W側(下側)。In the reduced pressure drying apparatus of the example of FIG11, the solvent collecting net 40 of FIG6 and the solvent collecting net 100 of FIG9 are stacked. The solvent collecting net 40 and the solvent collecting net 100 are closely attached to each other without a gap in the stacking direction, and are joined to each other by welding or the like. Regardless of the stacking order of the solvent collecting net 40 and the solvent collecting net 100, either the solvent collecting net 40 or the solvent collecting net 100 may be disposed on the substrate side W (lower side).

如前述般,溶媒捕集網40,係被劃分成中央區域R1與周緣區域R2,溶媒捕集網100,係被劃分成面板對應中央區域R11與面板對應周緣區域R12。As described above, the solvent collecting net 40 is divided into a central region R1 and a peripheral region R2, and the solvent collecting net 100 is divided into a panel corresponding central region R11 and a panel corresponding peripheral region R12.

即便根據本實施形態,亦與使用了圖10之溶媒捕集網110的情形相同地,在乾燥處理對象的基板W是將1片基板分割而使用作為複數片(例如4片)FPD用之面板者的情況下,可更正確地使基板W上之溶液的乾燥時間在基板W之面內及面板面內成為均一。Even according to the present embodiment, as in the case where the solvent collection net 110 of Figure 10 is used, when the substrate W to be dried is a single substrate that is divided and used as a panel for a plurality of (for example, four) FPDs, the drying time of the solution on the substrate W can be more accurately made uniform within the surface of the substrate W and within the surface of the panel.

圖12~圖14,係用以說明被形成於溶媒捕集網之開口的形狀之其他例的平面圖,且部分放大地表示溶媒捕集網。 在以上的例子中,形成於溶媒捕集網之開口的形狀雖係俯視六角形,但不限於該例。 例如,如圖12所示般,開口120之形狀,係亦可為俯視圓形狀。 又,如圖13所示般,開口120之形狀,係俯視四角形狀,更具體而言,係亦可為俯視長方形狀。 而且,如圖14所示般,開口120之形狀,係俯視三角形狀,更具體而言,係亦可為俯視正三角形狀。FIG. 12 to FIG. 14 are plan views for explaining other examples of the shape of the opening formed in the solvent collection net, and partially enlarge the solvent collection net. In the above example, the shape of the opening formed in the solvent collection net is a hexagonal shape when viewed from above, but it is not limited to this example. For example, as shown in FIG. 12, the shape of the opening 120 can also be a circular shape when viewed from above. Moreover, as shown in FIG. 13, the shape of the opening 120 is a quadrangular shape when viewed from above, and more specifically, it can also be a rectangular shape when viewed from above. Moreover, as shown in FIG. 14, the shape of the opening 120 is a triangular shape when viewed from above, and more specifically, it can also be a regular triangle shape when viewed from above.

又,形成於溶媒捕集網之開口的俯視形狀,係亦可為六角形、圓形、四角形及三角形之任意2個以上的組合。Furthermore, the top view shape of the opening formed in the solvent collecting net may be a combination of any two or more of a hexagon, a circle, a square, and a triangle.

另外,在以上的說明中,係在溶媒捕集網中,開口率依所劃分之每區域而不同,藉此,俯視下之每一單位面積的熱容量依所劃分之每區域而不同。取而代之,在溶媒捕集網中,亦可使板厚依所劃分之每區域而不同,藉此,俯視下之每一單位面積的熱容量依所劃分之每區域而不同。 又,在溶媒捕集網中,亦可使開口率與板厚兩者依所劃分之每區域而不同。In the above description, the opening ratio of the solvent collection net is different for each divided area, thereby the heat capacity per unit area in a top view is different for each divided area. Alternatively, the plate thickness of the solvent collection net may be different for each divided area, thereby the heat capacity per unit area in a top view is different for each divided area. In addition, the opening ratio and the plate thickness may be different for each divided area in the solvent collection net.

本次所揭示之實施形態,係在所有方面皆為例示,吾人應瞭解該等例示並非用以限制本發明。上述之實施形態,係亦可在不脫離添附之申請專利範圍及其主旨的情況下,以各種形態進行省略、置換、變更。The embodiments disclosed herein are illustrative in all aspects, and it should be understood that such illustrative embodiments are not intended to limit the present invention. The embodiments described above may be omitted, replaced, or modified in various forms without departing from the scope and gist of the attached patent application.

另外,如以下般之構成亦屬於本揭示的技術範圍。 (1)一種減壓乾燥裝置,係使被塗佈於基板上之溶液在減壓狀態下乾燥,該減壓乾燥裝置,其特徵係,具備有: 溶媒捕集部,暫時捕集從前述基板氣化之前述溶液中的溶劑, 前述溶媒捕集部,係被配設為與前述基板對向, 且被劃分成複數個區域, 在前述複數個區域分別形成開口, 並被形成為前述複數個區域各自之每一單位面積的熱容量因應與該區域對向之基板的部分而不同。 根據前述(1),可使基板上之溶液的乾燥時間在基板面內成為均一。In addition, the following structures also belong to the technical scope of the present disclosure. (1) A decompression drying device is used to dry a solution applied on a substrate under decompression, and the decompression drying device is characterized by having: A solvent collection portion temporarily collects the solvent in the solution vaporized from the substrate, The solvent collection portion is arranged to face the substrate, and is divided into a plurality of regions, Openings are formed in the plurality of regions, and the heat capacity per unit area of each of the plurality of regions is different according to the portion of the substrate facing the region. According to the above (1), the drying time of the solution on the substrate can be made uniform within the substrate surface.

(2)如前述(1)之減壓乾燥裝置,其中, 前述溶媒捕集部,係被形成為前述複數個區域各自之開口率因應與該區域對向之基板的部分而不同。(2) A reduced pressure drying device as described in (1) above, wherein the solvent collection portion is formed so that the opening ratio of each of the plurality of regions is different depending on the portion of the substrate opposite to the region.

(3)如前述(1)或(2)之減壓乾燥裝置,其中, 前述溶媒捕集部,係被形成為前述複數個區域各自之厚度因應與該區域對向之基板的部分而不同。(3) A reduced pressure drying device as described in (1) or (2) above, wherein the solvent collection portion is formed such that the thickness of each of the plurality of regions is different depending on the portion of the substrate opposite to the region.

(3)如前述(1)~(3)中任一之減壓乾燥裝置,其中, 前述溶媒捕集部,係被劃分成:與基板角部對向的區域;及與基板中央部對向的區域。 根據前述(4),在乾燥處理對象之基板是以1片基板整體被使用作為1片面板者的情況下,可使基板上之溶液的乾燥時間在基板面內成為均一。(3) A reduced pressure drying device as described in any one of (1) to (3) above, wherein the solvent collection portion is divided into: an area opposite to the corner of the substrate; and an area opposite to the center of the substrate. According to (4) above, when the substrate to be dried is a single substrate used as a panel, the drying time of the solution on the substrate can be made uniform within the substrate surface.

(5)如前述(1)~(3)中任一之減壓乾燥裝置,其中, 前述基板,係在乾燥後被分割成複數個面板者, 前述溶媒捕集部,係被劃分成: 與相當於前述基板中之面板角部的部分對向之區域;及 與相當於前述基板中之面板中央部的部分對向之區域。 根據前述(5),在乾燥處理對象之基板是將1片基板分割成複數片面板而使用者的情況下,可使基板上之溶液的乾燥時間在面板面內成為均一。(5) A reduced pressure drying device as described in any one of (1) to (3) above, wherein: the substrate is divided into a plurality of panels after drying, and the solvent collection portion is divided into: a region opposite to a portion corresponding to a panel corner portion of the substrate; and a region opposite to a portion corresponding to a panel center portion of the substrate. According to (5) above, when the substrate to be dried is a substrate divided into a plurality of panels, the drying time of the solution on the substrate can be made uniform within the panel surface.

(6)如前述(1)~(3)中任一之減壓乾燥裝置,其中, 前述基板,係在乾燥後被分割成複數個面板者, 前述溶媒捕集部,係被劃分成: 與相當於基板中央部中之面板中央部的部分對向之區域; 與「相當於基板中央部中之面板角部的部分或相當於基板角部中之面板中央部的部分」對向之區域;及 與相當於基板角部中之面板角部的部分對向之區域。 根據前述(6),在乾燥處理對象之基板是將1片基板分割成複數片面板而使用者的情況下,可使基板上之溶液的乾燥時間在基板面內成為均一且在面板面內成為均一。(6) A reduced pressure drying device as described in any one of (1) to (3) above, wherein: the substrate is divided into a plurality of panels after drying, and the solvent collection portion is divided into: a region opposite to the portion corresponding to the central portion of the panel in the central portion of the substrate; a region opposite to "a portion corresponding to the panel corner in the central portion of the substrate or a portion corresponding to the central portion of the panel in the corner portion of the substrate"; and a region opposite to the portion corresponding to the panel corner in the corner portion of the substrate. According to (6) above, when the substrate to be dried is a substrate divided into a plurality of panels, the drying time of the solution on the substrate can be made uniform within the substrate surface and uniform within the panel surface.

(7)如前述(1)~(3)中任一之減壓乾燥裝置,其中, 該減壓乾燥裝置,係具備有: 複數個前述溶媒捕集部, 前述基板,係在乾燥後被分割成複數個面板者, 複數個前述溶媒捕集部,係被層積配設,包含有「被劃分成與基板角部對向之區域及與基板中央部對向之區域」的前述溶媒捕集部和「被劃分成與相當於前述基板中之面板角部的部分對向之區域及與相當於前述基板中之面板中央部的部分對向之區域」的前述溶媒捕集部。 根據前述(7),在乾燥處理對象之基板是將1片基板分割成複數片面板而使用者的情況下,可使基板上之溶液的乾燥時間在基板面內成為均一且在面板面內成為均一。(7) A decompression drying device as described in any one of (1) to (3) above, wherein: The decompression drying device comprises: A plurality of the aforementioned solvent collecting parts; The aforementioned substrate is divided into a plurality of panels after drying; The plurality of the aforementioned solvent collecting parts are arranged in layers, including the aforementioned solvent collecting parts "divided into a region opposite to the corner of the substrate and a region opposite to the central portion of the substrate" and the aforementioned solvent collecting parts "divided into a region opposite to a portion corresponding to the corner of the panel in the aforementioned substrate and a region opposite to a portion corresponding to the central portion of the panel in the aforementioned substrate". According to the aforementioned (7), when the substrate to be dried is a substrate divided into a plurality of panels and the user selects the substrate, the drying time of the solution on the substrate can be made uniform within the substrate surface and uniform within the panel surface.

(8)如前述(1)~(7)中任一之減壓乾燥裝置,其中, 前述開口之俯視形狀,係六角形、圓形、四角形及三角形之任一個或任意2個以上的組合。(8) A pressure-reducing drying device as described in any one of (1) to (7) above, wherein the top view shape of the opening is any one of a hexagon, a circle, a square and a triangle, or a combination of any two or more of them.

1:減壓乾燥裝置 40,100,110:溶媒捕集網 41,42,120:開口 W:基板1: Pressure reduction drying device 40,100,110: Solvent collection net 41,42,120: Opening W: Substrate

[圖1]用以說明習知技術的課題之塗佈了溶液之狀態之基板的平面圖。 [圖2]用以說明習知技術的課題之塗佈了溶液之狀態之基板的平面圖。 [圖3]表示第1實施形態之減壓乾燥裝置之概略構成的剖面圖。 [圖4]表示第1實施形態之減壓乾燥裝置之概略構成的上視圖。 [圖5]用以說明溶媒捕集網之安裝構造的圖,且為減壓乾燥裝置內的部分側視圖。 [圖6]用以說明溶媒捕集網之安裝構造的圖,且為減壓乾燥裝置中之溶媒捕集網與其周圍的下視圖。 [圖7]圖3之溶媒捕集網之中央區域的部分放大平面圖。 [圖8]圖3之溶媒捕集網之周緣區域的部分放大平面圖。 [圖9]用以說明第2實施形態之被設置於減壓乾燥裝置之溶媒捕集網的平面圖。 [圖10]用以說明第2實施形態之被設置於減壓乾燥裝置之溶媒捕集網之其他例的平面圖。 [圖11]用以說明第3實施形態之被設置於減壓乾燥裝置之溶媒捕集網的圖,且為減壓乾燥裝置的部分側視圖。 [圖12]用以說明被形成於溶媒捕集網之開口的形狀之其他例之溶媒捕集網的部分放大平面圖。 [圖13]用以說明被形成於溶媒捕集網之開口的形狀之其他例之溶媒捕集網的部分放大平面圖。 [圖14]用以說明被形成於溶媒捕集網之開口的形狀之其他例之溶媒捕集網的部分放大平面圖。[Figure 1] A plan view of a substrate coated with a solution for explaining the subject of the known technology. [Figure 2] A plan view of a substrate coated with a solution for explaining the subject of the known technology. [Figure 3] A cross-sectional view showing the schematic structure of the first embodiment of the reduced pressure drying device. [Figure 4] A top view showing the schematic structure of the first embodiment of the reduced pressure drying device. [Figure 5] A view for explaining the installation structure of the solvent collection net, and a partial side view of the reduced pressure drying device. [Figure 6] A view for explaining the installation structure of the solvent collection net, and a bottom view of the solvent collection net and its surroundings in the reduced pressure drying device. [Figure 7] A partially enlarged plan view of the central area of the solvent collection net of Figure 3. [Figure 8] A partially enlarged plan view of the peripheral area of the solvent collection net of Figure 3. [Figure 9] A plan view of a solvent collection net installed in a pressure-reducing drying device for illustrating the second embodiment. [Figure 10] A plan view of another example of a solvent collection net installed in a pressure-reducing drying device for illustrating the second embodiment. [Figure 11] A view of a solvent collection net installed in a pressure-reducing drying device for illustrating the third embodiment, and a partial side view of the pressure-reducing drying device. [Figure 12] A partially enlarged plan view of a solvent collection net for illustrating another example of the shape of the opening formed in the solvent collection net. [Figure 13] A partially enlarged plan view of a solvent collection net for illustrating another example of the shape of the opening formed in the solvent collection net. [Figure 14] A partially enlarged plan view of a solvent collection net for illustrating another example of the shape of the opening formed in the solvent collection net.

40:溶媒捕集網 40: Solvent capture net

50:框體 50:Frame

50a:耳部 50a: Ears

R1:中央區域 R1: Central area

R2:周緣區域 R2: Peripheral area

Claims (7)

一種減壓乾燥裝置,係使被塗佈於基板上之溶液在減壓狀態下乾燥,該減壓乾燥裝置,其特徵係,具備有:溶媒捕集部,暫時捕集從前述基板氣化之前述溶液中的溶劑,前述溶媒捕集部,係被配設為與前述基板對向,且被劃分成複數個區域,在前述複數個區域分別形成開口,並被形成為前述複數個區域各自之每一單位面積的熱容量因應與該區域對向之基板的部分而不同,前述溶媒捕集部,係被形成為前述複數個區域各自之厚度因應與該區域對向之基板的部分而不同。 A decompression drying device dries a solution applied on a substrate under decompression. The decompression drying device is characterized in that it has: a solvent collection part temporarily collecting the solvent in the solution vaporized from the substrate; the solvent collection part is arranged to face the substrate and is divided into a plurality of regions, openings are formed in the plurality of regions respectively, and the heat capacity per unit area of each of the plurality of regions is different according to the portion of the substrate facing the region; the solvent collection part is formed so that the thickness of each of the plurality of regions is different according to the portion of the substrate facing the region. 如請求項1之減壓乾燥裝置,其中,前述溶媒捕集部,係被形成為前述複數個區域各自之開口率因應與該區域對向之基板的部分而不同。 As in claim 1, the reduced pressure drying device, wherein the solvent collection portion is formed such that the opening ratio of each of the plurality of regions is different depending on the portion of the substrate opposite to the region. 如請求項1或2之減壓乾燥裝置,其中,前述溶媒捕集部,係被劃分成:與基板角部對向的區域;及與基板中央部對向的區域。 As in claim 1 or 2, the reduced pressure drying device, wherein the solvent collection portion is divided into: an area opposite to the corner of the substrate; and an area opposite to the center of the substrate. 如請求項1或2之減壓乾燥裝置,其中,前述基板,係在乾燥後被分割成複數個面板者,前述溶媒捕集部,係被劃分成:與相當於前述基板中之面板角部的部分對向之區域;及 與相當於前述基板中之面板中央部的部分對向之區域。 In the reduced pressure drying device of claim 1 or 2, the substrate is divided into a plurality of panels after drying, and the solvent collection portion is divided into: a region opposite to a portion corresponding to a panel corner portion of the substrate; and a region opposite to a portion corresponding to a panel center portion of the substrate. 如請求項1或2之減壓乾燥裝置,其中,前述基板,係在乾燥後被分割成複數個面板者,前述溶媒捕集部,係被劃分成:與相當於基板中央部中之面板中央部的部分對向之區域;與「相當於基板中央部中之面板角部的部分或相當於基板角部中之面板中央部的部分」對向之區域;及與相當於基板角部中之面板角部的部分對向之區域。 In the reduced pressure drying device of claim 1 or 2, the substrate is divided into a plurality of panels after drying, and the solvent collection portion is divided into: an area opposite to the portion corresponding to the central portion of the panel in the central portion of the substrate; an area opposite to "a portion corresponding to the panel corner in the central portion of the substrate or a portion corresponding to the central portion of the panel in the corner of the substrate"; and an area opposite to the portion corresponding to the panel corner in the corner of the substrate. 如請求項1或2之減壓乾燥裝置,其中,該減壓乾燥裝置,係具備有:複數個前述溶媒捕集部,前述基板,係在乾燥後被分割成複數個面板者,複數個前述溶媒捕集部,係被層積配設,包含有「被劃分成與基板角部對向之區域及與基板中央部對向之區域」的前述溶媒捕集部和「被劃分成與相當於前述基板中之面板角部的部分對向之區域及與相當於前述基板中之面板中央部的部分對向之區域」的前述溶媒捕集部。 As in claim 1 or 2, the decompression drying device is provided with: a plurality of the aforementioned solvent collection parts, the aforementioned substrate is divided into a plurality of panels after drying, and the plurality of the aforementioned solvent collection parts are arranged in layers, including the aforementioned solvent collection parts "divided into a region opposite to the corner of the substrate and a region opposite to the central part of the substrate" and the aforementioned solvent collection parts "divided into a region opposite to the portion corresponding to the panel corner of the aforementioned substrate and a region opposite to the portion corresponding to the central part of the panel of the aforementioned substrate". 如請求項1或2之減壓乾燥裝置,其中,前述開口之俯視形狀,係六角形、圓形、四角形及三角形之任一個或任意2個以上的組合。 For example, the pressure reduction drying device of claim 1 or 2, wherein the top view shape of the aforementioned opening is any one of a hexagon, a circle, a quadrilateral and a triangle, or a combination of any two or more.
TW109111598A 2019-04-16 2020-04-07 Reduced pressure drying device TWI837341B (en)

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JP2014199806A (en) 2013-03-14 2014-10-23 東京エレクトロン株式会社 Dryer and dry processing method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014199806A (en) 2013-03-14 2014-10-23 東京エレクトロン株式会社 Dryer and dry processing method

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