TWI836975B - Chip package structure and manufacturing method thereof - Google Patents
Chip package structure and manufacturing method thereof Download PDFInfo
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- TWI836975B TWI836975B TW112116318A TW112116318A TWI836975B TW I836975 B TWI836975 B TW I836975B TW 112116318 A TW112116318 A TW 112116318A TW 112116318 A TW112116318 A TW 112116318A TW I836975 B TWI836975 B TW I836975B
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- 238000004519 manufacturing process Methods 0.000 title claims description 37
- 239000002184 metal Substances 0.000 claims abstract description 69
- 229910052751 metal Inorganic materials 0.000 claims abstract description 69
- 239000011241 protective layer Substances 0.000 claims abstract description 49
- 239000010410 layer Substances 0.000 claims description 110
- 238000004806 packaging method and process Methods 0.000 claims description 49
- 229910000679 solder Inorganic materials 0.000 claims description 40
- 239000010935 stainless steel Substances 0.000 claims description 35
- 229910001220 stainless steel Inorganic materials 0.000 claims description 35
- 239000007769 metal material Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 30
- 238000005530 etching Methods 0.000 claims description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 238000009713 electroplating Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 12
- 239000003292 glue Substances 0.000 claims description 9
- 239000012790 adhesive layer Substances 0.000 claims description 8
- 239000003973 paint Substances 0.000 claims description 5
- 239000000084 colloidal system Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 description 6
- 239000011152 fibreglass Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 239000002335 surface treatment layer Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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Abstract
Description
本發明是有關於一種封裝結構及其製作方法,且特別是有關於一種晶片封裝結構及其製作方法。The present invention relates to a packaging structure and a manufacturing method thereof, and in particular to a chip packaging structure and a manufacturing method thereof.
近年來,隨著電子技術的日新月異,高科技電子產業的相繼問世,使得更人性化、功能更佳的電子產品不斷地推陳出新,並朝向輕、薄、短、小的趨勢設計。就半導體封裝技術而言,四方扁平封裝系列的四方扁平式封裝結構(Quad Flat Package, QFP)或四方扁平無引腳封裝結構(Quad Flat Non-leaded package, QFN)具有較短的訊號傳遞路徑及相對較快的訊號傳遞速度,因此為封裝型態的主流之一。In recent years, with the rapid development of electronic technology, the emergence of high-tech electronic industries has made electronic products with better functions more user-friendly and better functions constantly introduced, and the design is trending towards light, thin, short and small. In terms of semiconductor packaging technology, the Quad Flat Package (QFP) or Quad Flat Non-leaded Package (QFN) of the quad flat package series has a shorter signal transmission path and a relatively faster signal transmission speed, so it is one of the mainstream packaging types.
一般而言,四方扁平無引腳封裝結構所採用的導線架的製做是將金屬薄板以蝕刻的方式來形成晶片承載座與多個引腳接墊。由於金屬薄板的厚度限制,所製出的扇出線路寬度較大,且總結構的各部分,如晶片承載座與多個引腳接墊之間,需要相連,導致引腳接墊的總數量大幅降低。Generally speaking, the lead frame used in the QFN package structure is made by etching a metal sheet to form a chip carrier and multiple pin pads. Due to the thickness limit of the metal sheet, the fan-out line width is larger, and the various parts of the overall structure, such as the chip carrier and multiple pin pads, need to be connected, resulting in a significant reduction in the total number of pin pads.
本發明提供一種晶片封裝結構及其製作方法,其製程簡單,可大幅地提升其晶片上的連接腳數及降低製作成本。The present invention provides a chip packaging structure and a manufacturing method thereof. The manufacturing process is simple, and the number of connection pins on the chip can be greatly increased and the manufacturing cost can be reduced.
本發明的晶片封裝結構,其包括一導線架、至少一晶片以及一保護層。導線架包括至少一晶片座以及環繞晶片座的多個引腳接墊。晶片座為一單一金屬結構,其邊及角上沒有連著為保持其穩定之金屬導線,引腳接墊之間亦無導線在其間通過, 俾能逹到高引腳接墊密度及高引腳接墊的腳數。晶片配置於導線架的晶片座上,並與導線架的引腳接墊電性連接。保護層至少覆蓋導線架且暴露出第一蝕刻表面及第二蝕刻表面。The chip packaging structure of the present invention includes a lead frame, at least one chip and a protective layer. The lead frame includes at least one chip seat and a plurality of pin pads surrounding the chip seat. The chip seat is a single metal structure, and its edges and corners are not connected to metal wires to maintain its stability, and there are no wires passing between the pin pads, so as to achieve a high pin pad density and a high number of pins on the pin pads. The chip is arranged on the chip seat of the lead frame and is electrically connected to the pin pads of the lead frame. The protective layer at least covers the lead frame and exposes the first etching surface and the second etching surface.
在本發明的一實施例中,上述的保護層為一封裝膠體,包覆導線架以及晶片。In one embodiment of the present invention, the protective layer is a packaging colloid that covers the lead frame and the chip.
在本發明的一實施例中,上述的晶片座具有彼此相對的至少一內表面與至少一外表面。晶片直接配置於內表面上,而外表面為第一蝕刻表面。In one embodiment of the present invention, the wafer base has at least one inner surface and at least one outer surface facing each other. The wafer is directly disposed on the inner surface, and the outer surface is a first etching surface.
在本發明的一實施例中,上述的晶片封裝結構還包括多條打線,電性連接晶片以及引腳接墊。In one embodiment of the present invention, the chip package structure further includes a plurality of bonding wires electrically connecting the chip and the lead pads.
在本發明的一實施例中,上述的晶片封裝結構還包括多個焊球。導線架更包括連接引腳接墊的多個線路。焊球配置於每一線路的一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。保護層包覆晶片相對於主動表面的一背表面。In an embodiment of the present invention, the above chip packaging structure further includes a plurality of solder balls. The lead frame further includes multiple lines connecting the pin pads. Solder balls are disposed between a surface of each trace and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls. The protective layer covers a back surface of the chip relative to the active surface.
在本發明的一實施例中,上述的晶片封裝結構還包括一底膠,配置於晶片與線路之間,且覆蓋焊球與線路。In an embodiment of the present invention, the above-mentioned chip packaging structure further includes an adhesive disposed between the chip and the circuit and covering the solder balls and the circuit.
在本發明的一實施例中,上述的保護層為一防焊綠漆。In an embodiment of the present invention, the above-mentioned protective layer is a solder resist green paint.
在本發明的一實施例中,上述的晶片封裝結構還包括多個焊球。導線架更包括連接引腳接墊的多個線路。焊球配置於每一線路的一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。在本發明的一實施例中,上述的晶片封裝結構還包括一底膠,配置於晶片與線路之間,且覆蓋焊球與線路。晶片相對於主動表面的一背表面暴露於保護層以及底膠外。In an embodiment of the present invention, the above chip packaging structure further includes a plurality of solder balls. The lead frame further includes multiple lines connecting the pin pads. Solder balls are disposed between a surface of each trace and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls. In an embodiment of the present invention, the above-mentioned chip packaging structure further includes an adhesive disposed between the chip and the circuit and covering the solder balls and the circuit. A back surface of the chip relative to the active surface is exposed to the protective layer and the primer.
本發明的晶片封裝結構的製作方法,其包括以下步驟。電鍍一金屬材料來形成一載體,載體包括至少一晶片座、環繞晶片座的多個引腳接墊以及連接晶片座與引腳接墊的多個連接部。配置至少一晶片於載體的晶片座上,並與載體的引腳接墊電性連接。於配置晶片於載體的晶片座上之後,形成一保護層以覆蓋晶片, 晶片座以及引腳接墊, 用蝕刻方式移除載體的、部分晶片座以及部分每一引腳接墊連接部,而形成一導線架。The manufacturing method of the chip packaging structure of the present invention includes the following steps. A metal material is electroplated to form a carrier. The carrier includes at least one chip seat, a plurality of pin pads surrounding the chip seat, and a plurality of connection portions connecting the chip seat and the pin pads. At least one chip is arranged on the chip seat of the carrier and is electrically connected to the pin pad of the carrier. After arranging the chip on the chip seat of the carrier, a protective layer is formed to cover the chip, the chip seat and the pin pads, and etching is used to remove part of the chip seat and part of each pin pad connection part of the carrier, and Form a lead frame.
在本發明的一實施例中,上述電鍍金屬材料來形成載體的步驟,包括:提供一基材、一不銹鋼層以及一金屬層。不銹鋼層位於基材上且共形地覆蓋基材。金屬層形成於不銹鋼層上且共形地覆蓋不銹鋼層。形成一圖案化光阻層於金屬層上。以圖案化光阻層為電鍍罩幕,電鍍金屬材料於圖案化光阻層所暴露出的金屬層上。移除圖案化光阻層及其下方的金屬層、不銹鋼層以及基材,而形成載體。In one embodiment of the present invention, the step of electroplating a metal material to form a carrier includes: providing a substrate, a stainless steel layer and a metal layer. The stainless steel layer is located on the substrate and conformally covers the substrate. The metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer. A patterned photoresist layer is formed on the metal layer. The patterned photoresist layer is used as a plating mask to electroplating a metal material on the metal layer exposed by the patterned photoresist layer. The patterned photoresist layer and the metal layer, stainless steel layer and substrate thereunder are removed to form a carrier.
在本發明的一實施例中,上述配置晶片於載體的晶片座上,並與載體的引腳接墊電性連接的步驟,包括:將載體貼附於具有一黏著層的一檯面上。配置晶片於載體的晶片座上。形成多條打線以電性連接晶片以及引腳接墊。In one embodiment of the present invention, the step of placing the chip on the chip holder of the carrier and electrically connecting the chip to the pin pads of the carrier includes: attaching the carrier to a table with an adhesive layer, placing the chip on the chip holder of the carrier, and forming a plurality of bonding wires to electrically connect the chip and the pin pads.
在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成保護層之後,保護層為一封裝膠體,且保護層包覆載體以及晶片。In one embodiment of the present invention, after the above-mentioned removal of the connection portion of the carrier, part of the chip holder and part of each pin pad, a protective layer is formed. The protective layer is an encapsulant, and the protective layer covers the carrier and the chip.
在本發明的一實施例中,上述的晶片座具有彼此相對的至少一內表面與至少一外表面。晶片直接配置於內表面上,而外表面為第一蝕刻表面。In one embodiment of the present invention, the wafer base has at least one inner surface and at least one outer surface facing each other. The wafer is directly disposed on the inner surface, and the outer surface is a first etching surface.
在本發明的一實施例中,上述的電鍍金屬材料來形成載體的步驟,包括:提供一基材以及一第一金屬層,第一金屬層形成於基材上。移除部分第一金屬層,而形成暴露出部分基材的至少一第一凹槽以及多個第二凹槽。形成一不銹鋼層以及一第二金屬層。不銹鋼層位於第一金屬層及基材上且共形地覆蓋第一金屬層、第一凹槽的內壁以及第二凹槽的內壁。第二金屬層形成於不銹鋼層上且共形地覆蓋不銹鋼層而成為此結構的連接部。電鍍金屬材料於第二金屬層上。填入於第一凹槽內的金屬材料定義出晶片座,而填入於第二凹槽內的金屬材料定義出引腳接墊,連接引腳接墊且配置於第一凹槽及第二凹槽外的金屬材料定義出多個線路,且連接線路與晶片座的金屬材料及其下方的第二金屬層則定義出連接部。從第二金屬層與其下方的不銹鋼層的介面分離不銹鋼層與其下方的第一金屬層以及基材,而形成載體。In one embodiment of the present invention, the above-mentioned step of electroplating a metal material to form a carrier includes: providing a base material and a first metal layer, and the first metal layer is formed on the base material. Part of the first metal layer is removed to form at least one first groove and a plurality of second grooves that expose part of the substrate. A stainless steel layer and a second metal layer are formed. The stainless steel layer is located on the first metal layer and the base material and conformally covers the first metal layer, the inner wall of the first groove and the inner wall of the second groove. The second metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer to form the connection portion of this structure. Electroplating metal material on the second metal layer. The metal material filled in the first groove defines a chip seat, and the metal material filled in the second groove defines a pin pad, which is connected to the pin pad and disposed in the first groove and the second groove. The metal material outside the groove defines a plurality of circuits, and the metal material connecting the circuits to the chip holder and the second metal layer below defines a connection portion. The stainless steel layer, the first metal layer below and the substrate are separated from the interface between the second metal layer and the stainless steel layer below to form a carrier.
在本發明的一實施例中,上述配置晶片於載體的晶片座上,並與載體的引腳接墊電性連接的步驟,包括:形成多個焊球於晶片上。配置晶片於載體的晶片座上。焊球位於第一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。In one embodiment of the present invention, the step of arranging the chip on the chip seat of the carrier and electrically connecting it to the lead pads of the carrier includes forming a plurality of solder balls on the chip. Arrange the wafer on the wafer holder of the carrier. The solder ball is located between the first surface and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls.
在本發明的一實施例中,上述於配置晶片於載體的晶片座上之後,且於形成保護層之前,形成一底膠於晶片與線路之間,以覆蓋焊球與線路。In one embodiment of the present invention, after the chip is arranged on the chip base of the carrier and before the protective layer is formed, a primer is formed between the chip and the circuit to cover the solder balls and the circuit.
在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成保護層之前,且保護層為一封裝膠體,包覆導線架、晶片以及底膠。In one embodiment of the present invention, the connection portion of the carrier, a portion of the chip base and a portion of each lead pad are removed before forming a protective layer, and the protective layer is a packaging glue body that covers the lead frame, the chip and the bottom glue.
在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成導線架之後,形成一保護層覆蓋導線架的下方,且暴露出第一蝕刻表面及第二蝕刻表面,而保護層為一防焊綠漆,且保護層連接底膠。In one embodiment of the present invention, after the connection portion of the carrier, part of the chip base and part of each lead pad are removed to form a lead frame, a protective layer is formed to cover the bottom of the lead frame and expose the first etching surface and the second etching surface. The protective layer is a solder mask green paint and is connected to the primer.
基於上述,在本發明的晶片封裝結構及其製作方法中,是透過電鍍金屬材料的方式來形成載體,並於配置晶片於載體的晶片座上之後,才移除載體的連接部,而形成導線架。於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,為維持其結構的連接性,晶片座和每一個內圈的引腳接墊都需要用線路通過外圈的引腳接墊到最外圈的環形連接圈,此額外的線路造成外圈引腳接墊的數目減少,進而減少晶片的應用範圍。本發明的晶片封裝結構及其製作方法,其因連接部達成此載體的連接性而不需晶片座用線路與外部環圈連接也不需要內層引腳接墊通過外層引腳接墊之間的線路,因而增加外層引腳接墊的數目且因而擴大晶片的應用範圍。Based on the above, in the chip package structure and the manufacturing method of the present invention, the carrier is formed by electroplating metal materials, and after the chip is arranged on the chip seat of the carrier, the connection part of the carrier is removed to form a lead frame. In the prior art, the lead frame is formed by etching a metal sheet. In order to maintain the connectivity of its structure, the chip seat and each inner ring pin pad need to pass through the outer ring pin pad to the outermost ring annular connection ring through the extra wiring. The number of the outer ring pin pads is reduced, thereby reducing the application range of the chip. The chip packaging structure and the manufacturing method thereof of the present invention achieve the connectivity of the carrier through the connecting portion, and do not require the chip seat to be connected to the external ring with a wire, nor do they require the inner layer pin pads to pass through the wires between the outer layer pin pads, thereby increasing the number of outer layer pin pads and thus expanding the application range of the chip.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more clearly understood, embodiments are given below and described in detail with reference to the accompanying drawings.
圖1A至圖1G是依照本發明的一實施例的一種晶片封裝結構的製作方法的剖面示意圖。關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖1A,提供一基材10、一不銹鋼層12以及一金屬層14。不銹鋼層12位於基材10上且共形地覆蓋基材10。金屬層14形成於不銹鋼層12上且共形地覆蓋不銹鋼層12。此處,基材10可例如是核心(core)基板,其是由片狀的玻纖樹脂基底以及配置於片狀的玻纖樹脂基材相對兩側上的銅箔所組成,可視為一種硬板,但不以此為限。FIG. 1A to FIG. 1G are cross-sectional schematic diagrams of a method for manufacturing a chip package structure according to an embodiment of the present invention. Regarding the method for manufacturing the chip package structure of the present embodiment, first, please refer to FIG. 1A, and provide a
接著,請參考圖1B,形成一圖案化光阻層16於金屬層14上,其中圖案化光阻層16暴露出部分金屬層14。於一實施例中,圖案化光阻層16的厚度例如是56微米,但不以此為限。1B, a patterned
接著,請參考圖1C,以圖案化光阻層16為電鍍罩幕,電鍍一金屬材料M於圖案化光阻層16所暴露出的金屬層14上。Next, referring to FIG. 1C , the patterned
接著,請同時參考圖1C、圖1D以及圖1E,移除圖案化光阻層16,並透過例如是紫外光膠帶(ultraviolet tape)附接於載體110,以軟式轉板的方式將不銹鋼層12與金屬層14撥開,而移除基材10及其上的不銹鋼層12,至此已形成載體110。此時,載體110包括至少一晶片座(示意地繪示二個晶片座112a)、環繞晶片座112a的多個引腳接墊114a以及連接晶片座112a與引腳接墊114a的多個連接部116a。至此,已完成採用電鍍金屬材料M來形成載體110的步驟。須說明的是,由於移除的基材10因並未進行裁切,因此可重複使用,可有效地降低製作成本。Next, please refer to FIG. 1C, FIG. 1D and FIG. 1E at the same time, remove the patterned
接著,請再參考圖1E,將載體110貼附於具有一黏著層22的一檯面20上。於一實施例中,檯面20為封裝廠量產用的平台,但不以此為限。Next, please refer to FIG. 1E again, the
接著,請參考圖1F,配置至少一晶片(示意地繪示二個晶片120a)於載體110的晶片座112a上,並形成多條打線130a以電性連接晶片120a以及載體110的引腳接墊114a。此處,晶片120a的背面可直接接觸晶片座112a或透過晶片黏著膜(die attach film;DAF)而固定於晶片座112a上。簡言之,本實施例是透過打線130a連接的方式來電性連接晶片120a的主動表面與載體110的引腳接墊114a。於一實施例中,打線130a的長度可例如是3毫米,但不以此為限。1F, at least one chip (two
之後,請再參考圖1F,形成一保護層140a以至少覆蓋載體110。此處,保護層140a例如為一封裝膠體,其中保護層140a包覆載體110,晶片120a以及打線130a。Afterwards, please refer to FIG. 1F again, a
最後,請同時參考圖1F以及圖1G,移除檯面20、黏著層22以及載體110的連接部116a、部分晶片座112a以及部分每一引腳接墊114a,而形成一導線架110a。此處,例如是透過拆板的方式來移除檯面20及其上的黏著層22,而移除載體110的連接部116a、部分晶片座112a以及部分每一引腳接墊114a的方法例如是蝕刻法。此時,導線架110a包括晶片座112a以及環繞晶片座112a的引腳接墊114a,意即本實施例的導線架110a並不存在有線路(trace)。晶片座112a具有彼此相對的內表面S1與外表面(即第一蝕刻表面S2),其中晶片120a可直接配置於內表面S1上。於一未繪示的實施例中,亦可晶片座112a的第一蝕刻表面S2以及引腳接墊114a的第二蝕刻表面115a可進行一表面處理,而形成表面處理層(例如是錫)於其上,以避免晶片座112a的第一蝕刻表面S2以及引腳接墊114a的第二蝕刻表面115a產生氧化。由於本實施例移除載體110的連接部116a是於形成保護層140a之後,因此整體結構可具有較佳的支撐力,可提高整體結構的結構可靠度。至此,已完成四方扁平無外引腳(QFN)型態的晶片封裝結構100a的製作。Finally, please refer to FIG. 1F and FIG. 1G at the same time, the table 20, the
於一實施例中,當打線130a的長度例如是3毫米,而引腳接墊114a的尺寸例如是0.23毫米X0.4毫米,且晶片座112a與引腳接墊114a之間具有間距為0.5毫米時,在5X6的矩陣中,面積為5毫米X 5毫米的情況下,可具有341個引腳接墊;於面積為10毫米X 10毫米的情況下,可具有612個引腳接墊,意即本實施例可搭配密度高的晶片。In one embodiment, when the length of the
在結構上,請再參考圖1G,在本實施例中,晶片封裝結構100a包括導線架110a、晶片120a以及保護層140a。導線架110a包括晶片座112a以及環繞晶片座112a的引腳接墊114a。晶片座112a具有第一蝕刻表面S2,而每一引腳接墊114a具有第二蝕刻表面115a。晶片座112a為一單一金屬結構,其邊及角上沒有連著為保持其穩定之金屬導線,引腳接墊114a之間亦無導線在其間通過,俾能逹到高引腳接墊密度及高引腳接墊的腳數。晶片120a配置於導線架110a的晶片座112a上,並與導線架110a的引腳接墊114a電性連接。保護層140a至少覆蓋導線架110a且暴露出第一蝕刻表面S2及第二蝕刻表面115a。Structurally, please refer to FIG. 1G again. In this embodiment, the
更具體來說,本實施例的晶片座112a具有彼此相對的內表面S1與外表面(即第一蝕刻表面S2),其中晶片120a可直接配置於內表面S1上。再者,本實施例的晶片封裝結構100a還包括打線130a,電性連接晶片120a以及引腳接墊114a。此外,本實施例的保護層140a具體化為一封裝膠體,包覆導線架110a晶片120a以及打線130a。More specifically, the
由於本實施例是透過電鍍金屬材料M的方式來形成載體110,並於配置晶片120a於載體110的晶片座112a上之後,才移除載體110的連接部116a,而形成導線架110a。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本實施例的晶片封裝結構100a及其製作方法,其製程簡單,可有效地大幅增加引腳接墊的數目及降低製作成本。In this embodiment, the
在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It should be noted that the following embodiments use the component numbers and some contents of the previous embodiments, wherein the same number is used to represent the same or similar components, and the description of the same technical contents is omitted. The description of the omitted parts can refer to the previous embodiments, and the following embodiments will not be repeated.
圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的剖面示意圖。關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖2A,提供一基材30以及一第一金屬層40,其中第一金屬層40形成於基材30上。此處,基材30可例如是核心(core)基板,其是由片狀的玻纖樹脂基底以及配置於片狀的玻纖樹脂基材相對兩側上的銅箔所組成,可視為一種硬板,但不以此為限。第一金屬層40的厚度例如是60微米,其中第一金屬層40例如是銅層。須說明的是,本實施例僅示意地繪示單面製程,於另一實施例中,依據製程需求,亦可採雙面製程,此仍屬於本發明所欲保護的範圍。2A to 2G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to another embodiment of the present invention. Regarding the manufacturing method of the chip packaging structure of this embodiment, first, please refer to FIG. 2A to provide a
接著,請先參考圖2B,移除部分第一金屬層40,而形成暴露出部分基材30的至少一第一凹槽(示意地繪示一個第一凹槽42)以及多個第二凹槽44。此處,移除部分第一金屬層40的方式例如是蝕刻法。Next, please refer to FIG. 2B to remove part of the
接著,請再參考圖2B,形成一不銹鋼層50以及一第二金屬層60。不銹鋼層50位於第一金屬層40及基材30上且共形地覆蓋第一金屬層40、第一凹槽42的內壁以及第二凹槽44的內壁。第二金屬層60形成於不銹鋼層50上且共形地覆蓋不銹鋼層50。Next, referring to FIG. 2B , a
接著,請參考圖2C,電鍍一金屬材料70於第二金屬層60上,其中填入於第一凹槽42內的金屬材料70可定義出晶片座112b,而填入於第二凹槽44內的金屬材料70可定義出引腳接墊114b。連接引腳接墊114b且配置於第一凹槽42及第二凹槽44外的金屬材料70則可定義出多個線路118b。連接線路118b及晶片座112b的金屬材料70及其下方的第二金屬層60則定義出連接部116b,此時,晶片座112b透過連接部116b以及線路118b連接引腳接墊114b。於一實施例中,金屬材料70的厚度例如是70微米,但不以此為限。於一未繪示的實施例中,亦可對晶片座112b、引腳接墊114b以及線路118b進行表面處理,而形成表面處理層於其上,可避免產生氧化。Next, please refer to FIG. 2C , a
接著,請參考圖2D,透過例如是紫外光膠帶(ultraviolet tape)附接於上述圖2C的結構,並以軟式轉板的方式將不銹鋼層50與第二金屬層60撥開,且移除不銹鋼層50、第一金屬層40以及基材30,至此已形成載體110’。Next, please refer to FIG. 2D , an ultraviolet tape is attached to the structure of FIG. 2C , and the
接著,請參考圖2E,此轉板結構放置於封裝廠商慣用檯面20之上,其上表面的黏著層22具有黏著性,以使晶片座112b以及引腳接墊114b能與檯面20緊密接合。緊接著,形成多個焊球150b於晶片120b上。配置晶片120b於載體110’的晶片座112b上,其中焊球150b位於每一線路118b的一表面119b與晶片120b的一主動表面121b之間。晶片120b透過焊球150b及線路118b與引腳接墊114b電性連接。此時,晶片120b並沒有直接接觸於晶片座112b。然而,晶片作112b仍有導熱的功能,能將晶片120b所產生的熱能經過焊球150b及線路118b傳遞至晶片座112b,進而傳遞至外界以進行散熱。緊接著,形成一底膠160b於晶片120b與線路118b之間、晶片120b與晶片座112b之間以及線路118b之間的空隙內,以覆蓋焊球150b、線路118b以及載體110’相對鄰近晶片120b的正面。Next, please refer to FIG. 2E. This rotating plate structure is placed on a conventional table 20 of the packaging manufacturer. The
之後,請同時參考圖2E以及圖2F,以微蝕刻的方式,從載體110’的背面移除載體110’的連接部116b、部分晶片座112b以及部分每一引腳接墊114b,而形成一導線架110b。此時,晶片座112b具有第一蝕刻表面S2’,而每一引腳接墊114b具有第二蝕刻表面115b。Afterwards, please refer to FIG. 2E and FIG. 2F at the same time. Micro-etching is used to remove the
最後,請參考圖2G,形成一保護層140b以至少覆蓋導線架110b,且暴露出第一蝕刻表面S2’與第二蝕刻表面115b此處,移除載體110’的連接部116b、部分晶片座112b以及部分每一引腳接墊114b於形成保護層140b之前,而保護層140b具體化為一封裝膠體,且包覆導線架110b、晶片120b以及底膠160b。此處,保護層140b的周圍切齊於底膠160b的周圍以及導線架110b的周圍。至此,已完成四方扁平無外引腳(QFN)型態的晶片封裝結構100b的製作。Finally, referring to FIG. 2G , a
在結構上,請參考圖2G,在本實施例中,晶片封裝結構100b包括導線架110b、晶片120b以及保護層140b。導線架110b包括晶片座112b、環繞晶片座112b的引腳接墊114b以及連接引腳接墊114b及連接引腳接墊114b與晶片座112b的線路118b。晶片座112b具有第一蝕刻表面S2’,而每一引腳接墊114b具有第二蝕刻表面115b。晶片120b配置於導線架110b的晶片座112b上,並與導線架110b的引腳接墊114b電性連接。保護層140b至少覆蓋導線架110b且暴露出第一蝕刻表面S2’與第二蝕刻表面115b。Structurally, please refer to FIG. 2G . In this embodiment, the
更具體來說,在本實施例中,晶片座112b與引腳接墊114b位於同一平面上,而線路118b例如是扇出線路位於晶片座112b與引腳接墊114b的上方且正投影不完全重疊。晶片封裝結構100b還包括焊球150b。焊球150b配置於每一線路118b的表面119b與晶片120b的主動表面121b之間。晶片120b透過焊球150b與引腳接墊114b電性連接。保護層140b包覆晶片120b相對於主動表面121b的背表面123b。此外,晶片封裝結構100b還包括底膠160b,配置於晶片120b與線路118b之間,且覆蓋焊球150b與線路118b。More specifically, in this embodiment, the
由於本實施例是透過電鍍金屬材料70的方式來形成載體110’,並於配置晶片120b於載體110’的晶片座112b上之後,才移除載體110’的連接部116b,而形成導線架110b。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本實施例的晶片封裝結構100a及其製作方法,其製程簡單,可有效地大幅增加引腳接墊114b的數目於晶片120b之正下方以及晶片120b之下方外側。由於採用電鍍方式來形成導線架110b,因此導線架110b的線路118b的線寬/線距可例如是35微米/35微米,可增加引腳接墊114b的扇出排數。In this embodiment, the carrier 110' is formed by electroplating the
圖2H是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。請同時參照圖2G與圖2H,本實施例的晶片封裝結構100c與圖2G中的晶片封裝結構100b相似,惟二者主要差異之處在於:在本實施例中,保護層140c具體化為一防焊綠漆,且保護層140c連接底膠160b。此處,晶片120b相對於主動表面121b的背表面123b暴露於保護層140b以及底膠160b外,此結構能降低封裝後產品的厚度,達成輕薄短小的目標。FIG. 2H is a schematic cross-sectional view of a chip packaging structure according to an embodiment of the present invention. Please refer to FIG. 2G and FIG. 2H at the same time. The
綜上所述,在本發明的晶片封裝結構及其製作方法中,是透過電鍍金屬材料的方式來形成載體,並於配置晶片於載體的晶片座上之後,才移除載體的連接部,而形成導線架。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本發明的晶片封裝結構及其製作方法,其製程簡單,可大幅地增加引腳接墊的密度和排數,俾能使用較高晶片的腳數。To sum up, in the chip packaging structure and its manufacturing method of the present invention, the carrier is formed by electroplating metal materials, and after the chip is placed on the chip seat of the carrier, the connecting portion of the carrier is removed, and Form a leadframe. Compared with the prior art of etching metal sheets to form lead frames, the chip packaging structure and its manufacturing method of the present invention have a simple manufacturing process and can greatly increase the density and row number of pin pads, so that the Use higher chip pin count.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above by the embodiments, they are not intended to limit the present invention. Any person with ordinary knowledge in the relevant technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be defined by the scope of the attached patent application.
10、30:基材
12、50:不銹鋼層
14:金屬層
16:圖案化光阻層
20:檯面
22:黏著層
40:第一金屬層
42:第一凹槽
44:第二凹槽
60:第二金屬層
70、M:金屬材料
100a:晶片封裝結構
110、110’:載體
110a、110b:導線架
112a、112b:晶片座
114a、114b:引腳接墊
115a、115b:第二蝕刻表面
116a、116b:連接部
118b:線路
119b:表面
120a、120b:晶片
121b:主動表面
123b:背表面
130a:打線
140a、140b、140c:保護層
141a、141b:下表面
150b:焊球
160b:底膠
S1:內表面
S2、S2’:第一蝕刻表面10, 30:
圖1A至圖1G是依照本發明的一實施例的一種晶片封裝結構的製作方法的剖面示意圖。 圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的剖面示意圖。 圖2H是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。 Figures 1A to 1G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to an embodiment of the present invention. Figures 2A to 2G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to another embodiment of the present invention. Figure 2H is a schematic cross-sectional view of a chip packaging structure according to an embodiment of the present invention.
20:檯面 20: Countertop
22:黏著層 22: Adhesive layer
110b:導線架 110b: Conductor frame
112b:晶片座 112b: chip holder
114b:引腳接墊 114b: Pin pad
115b:第二蝕刻表面 115b: Second etching surface
118b:線路 118b:line
119b:表面 119b: Surface
120b:晶片 120b: chip
121b:主動表面 121b: Active surface
150b:焊球 150b: Solder ball
160b:底膠 160b: Base glue
S2’:第一蝕刻表面 S2’: first etched surface
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US20190067212A1 (en) | 2017-08-31 | 2019-02-28 | Stmicroelectronics, Inc. | Package with interlocking leads and manufacturing the same |
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