TWI836975B - Chip package structure and manufacturing method thereof - Google Patents

Chip package structure and manufacturing method thereof Download PDF

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TWI836975B
TWI836975B TW112116318A TW112116318A TWI836975B TW I836975 B TWI836975 B TW I836975B TW 112116318 A TW112116318 A TW 112116318A TW 112116318 A TW112116318 A TW 112116318A TW I836975 B TWI836975 B TW I836975B
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chip
carrier
layer
lead frame
pin pads
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TW112116318A
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Chinese (zh)
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何崇文
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何崇文
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Abstract

A chip package structure includes a lead frame, at least one chip and a protective layer. The lead frame includes at least one die pad and a plurality of lead pads surrounding the die pad. The die pad is a singular metal structure having no metal leads attached to it to maintain its stability, there are also no leads in between the lead pads to ensure a high lead pad density and high number of lead pads. The chip is disposed on the die pad of the lead frame, and electrically connected to the lead pads of the lead frame. The protective layer at least covers the lead frame and exposes the first etched surface and the second etched surface.

Description

晶片封裝結構及其製作方法Chip packaging structure and manufacturing method thereof

本發明是有關於一種封裝結構及其製作方法,且特別是有關於一種晶片封裝結構及其製作方法。The present invention relates to a packaging structure and a manufacturing method thereof, and in particular to a chip packaging structure and a manufacturing method thereof.

近年來,隨著電子技術的日新月異,高科技電子產業的相繼問世,使得更人性化、功能更佳的電子產品不斷地推陳出新,並朝向輕、薄、短、小的趨勢設計。就半導體封裝技術而言,四方扁平封裝系列的四方扁平式封裝結構(Quad Flat Package, QFP)或四方扁平無引腳封裝結構(Quad Flat Non-leaded package, QFN)具有較短的訊號傳遞路徑及相對較快的訊號傳遞速度,因此為封裝型態的主流之一。In recent years, with the rapid development of electronic technology, the emergence of high-tech electronic industries has made electronic products with better functions more user-friendly and better functions constantly introduced, and the design is trending towards light, thin, short and small. In terms of semiconductor packaging technology, the Quad Flat Package (QFP) or Quad Flat Non-leaded Package (QFN) of the quad flat package series has a shorter signal transmission path and a relatively faster signal transmission speed, so it is one of the mainstream packaging types.

一般而言,四方扁平無引腳封裝結構所採用的導線架的製做是將金屬薄板以蝕刻的方式來形成晶片承載座與多個引腳接墊。由於金屬薄板的厚度限制,所製出的扇出線路寬度較大,且總結構的各部分,如晶片承載座與多個引腳接墊之間,需要相連,導致引腳接墊的總數量大幅降低。Generally speaking, the lead frame used in the QFN package structure is made by etching a metal sheet to form a chip carrier and multiple pin pads. Due to the thickness limit of the metal sheet, the fan-out line width is larger, and the various parts of the overall structure, such as the chip carrier and multiple pin pads, need to be connected, resulting in a significant reduction in the total number of pin pads.

本發明提供一種晶片封裝結構及其製作方法,其製程簡單,可大幅地提升其晶片上的連接腳數及降低製作成本。The present invention provides a chip packaging structure and a manufacturing method thereof. The manufacturing process is simple, and the number of connection pins on the chip can be greatly increased and the manufacturing cost can be reduced.

本發明的晶片封裝結構,其包括一導線架、至少一晶片以及一保護層。導線架包括至少一晶片座以及環繞晶片座的多個引腳接墊。晶片座為一單一金屬結構,其邊及角上沒有連著為保持其穩定之金屬導線,引腳接墊之間亦無導線在其間通過, 俾能逹到高引腳接墊密度及高引腳接墊的腳數。晶片配置於導線架的晶片座上,並與導線架的引腳接墊電性連接。保護層至少覆蓋導線架且暴露出第一蝕刻表面及第二蝕刻表面。The chip packaging structure of the present invention includes a lead frame, at least one chip and a protective layer. The lead frame includes at least one chip seat and a plurality of pin pads surrounding the chip seat. The chip seat is a single metal structure, and its edges and corners are not connected to metal wires to maintain its stability, and there are no wires passing between the pin pads, so as to achieve a high pin pad density and a high number of pins on the pin pads. The chip is arranged on the chip seat of the lead frame and is electrically connected to the pin pads of the lead frame. The protective layer at least covers the lead frame and exposes the first etching surface and the second etching surface.

在本發明的一實施例中,上述的保護層為一封裝膠體,包覆導線架以及晶片。In one embodiment of the present invention, the protective layer is a packaging colloid that covers the lead frame and the chip.

在本發明的一實施例中,上述的晶片座具有彼此相對的至少一內表面與至少一外表面。晶片直接配置於內表面上,而外表面為第一蝕刻表面。In one embodiment of the present invention, the wafer base has at least one inner surface and at least one outer surface facing each other. The wafer is directly disposed on the inner surface, and the outer surface is a first etching surface.

在本發明的一實施例中,上述的晶片封裝結構還包括多條打線,電性連接晶片以及引腳接墊。In one embodiment of the present invention, the chip package structure further includes a plurality of bonding wires electrically connecting the chip and the lead pads.

在本發明的一實施例中,上述的晶片封裝結構還包括多個焊球。導線架更包括連接引腳接墊的多個線路。焊球配置於每一線路的一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。保護層包覆晶片相對於主動表面的一背表面。In an embodiment of the present invention, the above chip packaging structure further includes a plurality of solder balls. The lead frame further includes multiple lines connecting the pin pads. Solder balls are disposed between a surface of each trace and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls. The protective layer covers a back surface of the chip relative to the active surface.

在本發明的一實施例中,上述的晶片封裝結構還包括一底膠,配置於晶片與線路之間,且覆蓋焊球與線路。In an embodiment of the present invention, the above-mentioned chip packaging structure further includes an adhesive disposed between the chip and the circuit and covering the solder balls and the circuit.

在本發明的一實施例中,上述的保護層為一防焊綠漆。In an embodiment of the present invention, the above-mentioned protective layer is a solder resist green paint.

在本發明的一實施例中,上述的晶片封裝結構還包括多個焊球。導線架更包括連接引腳接墊的多個線路。焊球配置於每一線路的一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。在本發明的一實施例中,上述的晶片封裝結構還包括一底膠,配置於晶片與線路之間,且覆蓋焊球與線路。晶片相對於主動表面的一背表面暴露於保護層以及底膠外。In an embodiment of the present invention, the above chip packaging structure further includes a plurality of solder balls. The lead frame further includes multiple lines connecting the pin pads. Solder balls are disposed between a surface of each trace and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls. In an embodiment of the present invention, the above-mentioned chip packaging structure further includes an adhesive disposed between the chip and the circuit and covering the solder balls and the circuit. A back surface of the chip relative to the active surface is exposed to the protective layer and the primer.

本發明的晶片封裝結構的製作方法,其包括以下步驟。電鍍一金屬材料來形成一載體,載體包括至少一晶片座、環繞晶片座的多個引腳接墊以及連接晶片座與引腳接墊的多個連接部。配置至少一晶片於載體的晶片座上,並與載體的引腳接墊電性連接。於配置晶片於載體的晶片座上之後,形成一保護層以覆蓋晶片, 晶片座以及引腳接墊, 用蝕刻方式移除載體的、部分晶片座以及部分每一引腳接墊連接部,而形成一導線架。The manufacturing method of the chip packaging structure of the present invention includes the following steps. A metal material is electroplated to form a carrier. The carrier includes at least one chip seat, a plurality of pin pads surrounding the chip seat, and a plurality of connection portions connecting the chip seat and the pin pads. At least one chip is arranged on the chip seat of the carrier and is electrically connected to the pin pad of the carrier. After arranging the chip on the chip seat of the carrier, a protective layer is formed to cover the chip, the chip seat and the pin pads, and etching is used to remove part of the chip seat and part of each pin pad connection part of the carrier, and Form a lead frame.

在本發明的一實施例中,上述電鍍金屬材料來形成載體的步驟,包括:提供一基材、一不銹鋼層以及一金屬層。不銹鋼層位於基材上且共形地覆蓋基材。金屬層形成於不銹鋼層上且共形地覆蓋不銹鋼層。形成一圖案化光阻層於金屬層上。以圖案化光阻層為電鍍罩幕,電鍍金屬材料於圖案化光阻層所暴露出的金屬層上。移除圖案化光阻層及其下方的金屬層、不銹鋼層以及基材,而形成載體。In one embodiment of the present invention, the step of electroplating a metal material to form a carrier includes: providing a substrate, a stainless steel layer and a metal layer. The stainless steel layer is located on the substrate and conformally covers the substrate. The metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer. A patterned photoresist layer is formed on the metal layer. The patterned photoresist layer is used as a plating mask to electroplating a metal material on the metal layer exposed by the patterned photoresist layer. The patterned photoresist layer and the metal layer, stainless steel layer and substrate thereunder are removed to form a carrier.

在本發明的一實施例中,上述配置晶片於載體的晶片座上,並與載體的引腳接墊電性連接的步驟,包括:將載體貼附於具有一黏著層的一檯面上。配置晶片於載體的晶片座上。形成多條打線以電性連接晶片以及引腳接墊。In one embodiment of the present invention, the step of placing the chip on the chip holder of the carrier and electrically connecting the chip to the pin pads of the carrier includes: attaching the carrier to a table with an adhesive layer, placing the chip on the chip holder of the carrier, and forming a plurality of bonding wires to electrically connect the chip and the pin pads.

在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成保護層之後,保護層為一封裝膠體,且保護層包覆載體以及晶片。In one embodiment of the present invention, after the above-mentioned removal of the connection portion of the carrier, part of the chip holder and part of each pin pad, a protective layer is formed. The protective layer is an encapsulant, and the protective layer covers the carrier and the chip.

在本發明的一實施例中,上述的晶片座具有彼此相對的至少一內表面與至少一外表面。晶片直接配置於內表面上,而外表面為第一蝕刻表面。In one embodiment of the present invention, the wafer base has at least one inner surface and at least one outer surface facing each other. The wafer is directly disposed on the inner surface, and the outer surface is a first etching surface.

在本發明的一實施例中,上述的電鍍金屬材料來形成載體的步驟,包括:提供一基材以及一第一金屬層,第一金屬層形成於基材上。移除部分第一金屬層,而形成暴露出部分基材的至少一第一凹槽以及多個第二凹槽。形成一不銹鋼層以及一第二金屬層。不銹鋼層位於第一金屬層及基材上且共形地覆蓋第一金屬層、第一凹槽的內壁以及第二凹槽的內壁。第二金屬層形成於不銹鋼層上且共形地覆蓋不銹鋼層而成為此結構的連接部。電鍍金屬材料於第二金屬層上。填入於第一凹槽內的金屬材料定義出晶片座,而填入於第二凹槽內的金屬材料定義出引腳接墊,連接引腳接墊且配置於第一凹槽及第二凹槽外的金屬材料定義出多個線路,且連接線路與晶片座的金屬材料及其下方的第二金屬層則定義出連接部。從第二金屬層與其下方的不銹鋼層的介面分離不銹鋼層與其下方的第一金屬層以及基材,而形成載體。In one embodiment of the present invention, the above-mentioned step of electroplating a metal material to form a carrier includes: providing a base material and a first metal layer, and the first metal layer is formed on the base material. Part of the first metal layer is removed to form at least one first groove and a plurality of second grooves that expose part of the substrate. A stainless steel layer and a second metal layer are formed. The stainless steel layer is located on the first metal layer and the base material and conformally covers the first metal layer, the inner wall of the first groove and the inner wall of the second groove. The second metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer to form the connection portion of this structure. Electroplating metal material on the second metal layer. The metal material filled in the first groove defines a chip seat, and the metal material filled in the second groove defines a pin pad, which is connected to the pin pad and disposed in the first groove and the second groove. The metal material outside the groove defines a plurality of circuits, and the metal material connecting the circuits to the chip holder and the second metal layer below defines a connection portion. The stainless steel layer, the first metal layer below and the substrate are separated from the interface between the second metal layer and the stainless steel layer below to form a carrier.

在本發明的一實施例中,上述配置晶片於載體的晶片座上,並與載體的引腳接墊電性連接的步驟,包括:形成多個焊球於晶片上。配置晶片於載體的晶片座上。焊球位於第一表面與晶片的一主動表面之間。晶片透過焊球與引腳接墊電性連接。In one embodiment of the present invention, the step of arranging the chip on the chip seat of the carrier and electrically connecting it to the lead pads of the carrier includes forming a plurality of solder balls on the chip. Arrange the wafer on the wafer holder of the carrier. The solder ball is located between the first surface and an active surface of the chip. The chip is electrically connected to the pin pad through solder balls.

在本發明的一實施例中,上述於配置晶片於載體的晶片座上之後,且於形成保護層之前,形成一底膠於晶片與線路之間,以覆蓋焊球與線路。In one embodiment of the present invention, after the chip is arranged on the chip base of the carrier and before the protective layer is formed, a primer is formed between the chip and the circuit to cover the solder balls and the circuit.

在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成保護層之前,且保護層為一封裝膠體,包覆導線架、晶片以及底膠。In one embodiment of the present invention, the connection portion of the carrier, a portion of the chip base and a portion of each lead pad are removed before forming a protective layer, and the protective layer is a packaging glue body that covers the lead frame, the chip and the bottom glue.

在本發明的一實施例中,上述移除載體的連接部、部分晶片座以及部分每一引腳接墊於形成導線架之後,形成一保護層覆蓋導線架的下方,且暴露出第一蝕刻表面及第二蝕刻表面,而保護層為一防焊綠漆,且保護層連接底膠。In one embodiment of the present invention, after the connection portion of the carrier, part of the chip base and part of each lead pad are removed to form a lead frame, a protective layer is formed to cover the bottom of the lead frame and expose the first etching surface and the second etching surface. The protective layer is a solder mask green paint and is connected to the primer.

基於上述,在本發明的晶片封裝結構及其製作方法中,是透過電鍍金屬材料的方式來形成載體,並於配置晶片於載體的晶片座上之後,才移除載體的連接部,而形成導線架。於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,為維持其結構的連接性,晶片座和每一個內圈的引腳接墊都需要用線路通過外圈的引腳接墊到最外圈的環形連接圈,此額外的線路造成外圈引腳接墊的數目減少,進而減少晶片的應用範圍。本發明的晶片封裝結構及其製作方法,其因連接部達成此載體的連接性而不需晶片座用線路與外部環圈連接也不需要內層引腳接墊通過外層引腳接墊之間的線路,因而增加外層引腳接墊的數目且因而擴大晶片的應用範圍。Based on the above, in the chip package structure and the manufacturing method of the present invention, the carrier is formed by electroplating metal materials, and after the chip is arranged on the chip seat of the carrier, the connection part of the carrier is removed to form a lead frame. In the prior art, the lead frame is formed by etching a metal sheet. In order to maintain the connectivity of its structure, the chip seat and each inner ring pin pad need to pass through the outer ring pin pad to the outermost ring annular connection ring through the extra wiring. The number of the outer ring pin pads is reduced, thereby reducing the application range of the chip. The chip packaging structure and the manufacturing method thereof of the present invention achieve the connectivity of the carrier through the connecting portion, and do not require the chip seat to be connected to the external ring with a wire, nor do they require the inner layer pin pads to pass through the wires between the outer layer pin pads, thereby increasing the number of outer layer pin pads and thus expanding the application range of the chip.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more clearly understood, embodiments are given below and described in detail with reference to the accompanying drawings.

圖1A至圖1G是依照本發明的一實施例的一種晶片封裝結構的製作方法的剖面示意圖。關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖1A,提供一基材10、一不銹鋼層12以及一金屬層14。不銹鋼層12位於基材10上且共形地覆蓋基材10。金屬層14形成於不銹鋼層12上且共形地覆蓋不銹鋼層12。此處,基材10可例如是核心(core)基板,其是由片狀的玻纖樹脂基底以及配置於片狀的玻纖樹脂基材相對兩側上的銅箔所組成,可視為一種硬板,但不以此為限。FIG. 1A to FIG. 1G are cross-sectional schematic diagrams of a method for manufacturing a chip package structure according to an embodiment of the present invention. Regarding the method for manufacturing the chip package structure of the present embodiment, first, please refer to FIG. 1A, and provide a substrate 10, a stainless steel layer 12, and a metal layer 14. The stainless steel layer 12 is located on the substrate 10 and conformally covers the substrate 10. The metal layer 14 is formed on the stainless steel layer 12 and conformally covers the stainless steel layer 12. Here, the substrate 10 can be, for example, a core substrate, which is composed of a sheet-like fiberglass resin base and copper foils disposed on opposite sides of the sheet-like fiberglass resin base, and can be regarded as a hard board, but is not limited to this.

接著,請參考圖1B,形成一圖案化光阻層16於金屬層14上,其中圖案化光阻層16暴露出部分金屬層14。於一實施例中,圖案化光阻層16的厚度例如是56微米,但不以此為限。1B, a patterned photoresist layer 16 is formed on the metal layer 14, wherein the patterned photoresist layer 16 exposes a portion of the metal layer 14. In one embodiment, the thickness of the patterned photoresist layer 16 is, for example, 56 micrometers, but is not limited thereto.

接著,請參考圖1C,以圖案化光阻層16為電鍍罩幕,電鍍一金屬材料M於圖案化光阻層16所暴露出的金屬層14上。Next, referring to FIG. 1C , the patterned photoresist layer 16 is used as a plating mask to electroplate a metal material M on the metal layer 14 exposed by the patterned photoresist layer 16 .

接著,請同時參考圖1C、圖1D以及圖1E,移除圖案化光阻層16,並透過例如是紫外光膠帶(ultraviolet tape)附接於載體110,以軟式轉板的方式將不銹鋼層12與金屬層14撥開,而移除基材10及其上的不銹鋼層12,至此已形成載體110。此時,載體110包括至少一晶片座(示意地繪示二個晶片座112a)、環繞晶片座112a的多個引腳接墊114a以及連接晶片座112a與引腳接墊114a的多個連接部116a。至此,已完成採用電鍍金屬材料M來形成載體110的步驟。須說明的是,由於移除的基材10因並未進行裁切,因此可重複使用,可有效地降低製作成本。Next, please refer to FIG. 1C, FIG. 1D and FIG. 1E at the same time, remove the patterned photoresist layer 16, and attach it to the carrier 110 through, for example, ultraviolet tape, and separate the stainless steel layer 12 and the metal layer 14 by a soft transfer plate, and remove the substrate 10 and the stainless steel layer 12 thereon, so that the carrier 110 is formed. At this time, the carrier 110 includes at least one chip seat (two chip seats 112a are schematically shown), a plurality of lead pads 114a surrounding the chip seat 112a, and a plurality of connecting portions 116a connecting the chip seat 112a and the lead pads 114a. At this point, the step of using the electroplated metal material M to form the carrier 110 has been completed. It should be noted that since the removed substrate 10 is not cut, it can be reused, which can effectively reduce the manufacturing cost.

接著,請再參考圖1E,將載體110貼附於具有一黏著層22的一檯面20上。於一實施例中,檯面20為封裝廠量產用的平台,但不以此為限。Next, please refer to FIG. 1E again, the carrier 110 is attached to the table top 20 having an adhesive layer 22 . In one embodiment, the table 20 is a platform used by a packaging factory for mass production, but it is not limited to this.

接著,請參考圖1F,配置至少一晶片(示意地繪示二個晶片120a)於載體110的晶片座112a上,並形成多條打線130a以電性連接晶片120a以及載體110的引腳接墊114a。此處,晶片120a的背面可直接接觸晶片座112a或透過晶片黏著膜(die attach film;DAF)而固定於晶片座112a上。簡言之,本實施例是透過打線130a連接的方式來電性連接晶片120a的主動表面與載體110的引腳接墊114a。於一實施例中,打線130a的長度可例如是3毫米,但不以此為限。1F, at least one chip (two chips 120a are schematically shown) is placed on the chip seat 112a of the carrier 110, and a plurality of bonding lines 130a are formed to electrically connect the chip 120a and the pin pads of the carrier 110. 114a. Here, the back side of the chip 120a can directly contact the chip holder 112a or be fixed on the wafer holder 112a through a die attach film (DAF). In short, in this embodiment, the active surface of the chip 120a and the pin pads 114a of the carrier 110 are electrically connected through bonding wires 130a. In one embodiment, the length of the bonding line 130a may be, for example, 3 mm, but is not limited thereto.

之後,請再參考圖1F,形成一保護層140a以至少覆蓋載體110。此處,保護層140a例如為一封裝膠體,其中保護層140a包覆載體110,晶片120a以及打線130a。Afterwards, please refer to FIG. 1F again, a protective layer 140a is formed to at least cover the carrier 110. Here, the protective layer 140a is, for example, an encapsulant, wherein the protective layer 140a covers the carrier 110, the chip 120a and the bonding wire 130a.

最後,請同時參考圖1F以及圖1G,移除檯面20、黏著層22以及載體110的連接部116a、部分晶片座112a以及部分每一引腳接墊114a,而形成一導線架110a。此處,例如是透過拆板的方式來移除檯面20及其上的黏著層22,而移除載體110的連接部116a、部分晶片座112a以及部分每一引腳接墊114a的方法例如是蝕刻法。此時,導線架110a包括晶片座112a以及環繞晶片座112a的引腳接墊114a,意即本實施例的導線架110a並不存在有線路(trace)。晶片座112a具有彼此相對的內表面S1與外表面(即第一蝕刻表面S2),其中晶片120a可直接配置於內表面S1上。於一未繪示的實施例中,亦可晶片座112a的第一蝕刻表面S2以及引腳接墊114a的第二蝕刻表面115a可進行一表面處理,而形成表面處理層(例如是錫)於其上,以避免晶片座112a的第一蝕刻表面S2以及引腳接墊114a的第二蝕刻表面115a產生氧化。由於本實施例移除載體110的連接部116a是於形成保護層140a之後,因此整體結構可具有較佳的支撐力,可提高整體結構的結構可靠度。至此,已完成四方扁平無外引腳(QFN)型態的晶片封裝結構100a的製作。Finally, please refer to FIG. 1F and FIG. 1G at the same time, the table 20, the adhesive layer 22, the connecting portion 116a of the carrier 110, a portion of the chip base 112a, and a portion of each pin pad 114a are removed to form a lead frame 110a. Here, for example, the table 20 and the adhesive layer 22 thereon are removed by disassembling the board, and the method of removing the connecting portion 116a of the carrier 110, a portion of the chip base 112a, and a portion of each pin pad 114a is, for example, etching. At this time, the lead frame 110a includes the chip base 112a and the pin pads 114a surrounding the chip base 112a, which means that the lead frame 110a of this embodiment does not have a trace. The wafer base 112a has an inner surface S1 and an outer surface (i.e., a first etched surface S2) opposite to each other, wherein the wafer 120a can be directly disposed on the inner surface S1. In an embodiment not shown, the first etched surface S2 of the wafer base 112a and the second etched surface 115a of the lead pad 114a can also be subjected to a surface treatment to form a surface treatment layer (e.g., tin) thereon to prevent oxidation of the first etched surface S2 of the wafer base 112a and the second etched surface 115a of the lead pad 114a. Since the connection portion 116a of the carrier 110 is removed after the protective layer 140a is formed in this embodiment, the overall structure can have a better supporting force, which can improve the structural reliability of the overall structure. At this point, the manufacturing of the QFN type chip package structure 100a has been completed.

於一實施例中,當打線130a的長度例如是3毫米,而引腳接墊114a的尺寸例如是0.23毫米X0.4毫米,且晶片座112a與引腳接墊114a之間具有間距為0.5毫米時,在5X6的矩陣中,面積為5毫米X 5毫米的情況下,可具有341個引腳接墊;於面積為10毫米X 10毫米的情況下,可具有612個引腳接墊,意即本實施例可搭配密度高的晶片。In one embodiment, when the length of the bonding line 130a is, for example, 3 mm, the size of the pin pad 114a is, for example, 0.23 mm×0.4 mm, and the distance between the die base 112a and the pin pad 114a is 0.5 mm. At that time, in a 5X6 matrix, when the area is 5 mm X 5 mm, there can be 341 pin pads; when the area is 10 mm That is, this embodiment can be used with high-density chips.

在結構上,請再參考圖1G,在本實施例中,晶片封裝結構100a包括導線架110a、晶片120a以及保護層140a。導線架110a包括晶片座112a以及環繞晶片座112a的引腳接墊114a。晶片座112a具有第一蝕刻表面S2,而每一引腳接墊114a具有第二蝕刻表面115a。晶片座112a為一單一金屬結構,其邊及角上沒有連著為保持其穩定之金屬導線,引腳接墊114a之間亦無導線在其間通過,俾能逹到高引腳接墊密度及高引腳接墊的腳數。晶片120a配置於導線架110a的晶片座112a上,並與導線架110a的引腳接墊114a電性連接。保護層140a至少覆蓋導線架110a且暴露出第一蝕刻表面S2及第二蝕刻表面115a。Structurally, please refer to FIG. 1G again. In this embodiment, the chip package structure 100a includes a lead frame 110a, a chip 120a, and a protective layer 140a. The lead frame 110a includes a chip base 112a and pin pads 114a surrounding the chip base 112a. The chip base 112a has a first etched surface S2, and each pin pad 114a has a second etched surface 115a. The chip base 112a is a single metal structure, and there are no metal wires connected to its edges and corners to maintain its stability. There are no wires passing between the pin pads 114a, so as to achieve a high pin pad density and a high number of pin pads. The chip 120a is disposed on the chip base 112a of the lead frame 110a and is electrically connected to the lead pad 114a of the lead frame 110a. The protective layer 140a at least covers the lead frame 110a and exposes the first etched surface S2 and the second etched surface 115a.

更具體來說,本實施例的晶片座112a具有彼此相對的內表面S1與外表面(即第一蝕刻表面S2),其中晶片120a可直接配置於內表面S1上。再者,本實施例的晶片封裝結構100a還包括打線130a,電性連接晶片120a以及引腳接墊114a。此外,本實施例的保護層140a具體化為一封裝膠體,包覆導線架110a晶片120a以及打線130a。More specifically, the chip base 112a of the present embodiment has an inner surface S1 and an outer surface (i.e., a first etched surface S2) facing each other, wherein the chip 120a can be directly disposed on the inner surface S1. Furthermore, the chip package structure 100a of the present embodiment further includes a bonding wire 130a electrically connected to the chip 120a and the lead pad 114a. In addition, the protective layer 140a of the present embodiment is embodied as a packaging gel, covering the lead frame 110a, the chip 120a and the bonding wire 130a.

由於本實施例是透過電鍍金屬材料M的方式來形成載體110,並於配置晶片120a於載體110的晶片座112a上之後,才移除載體110的連接部116a,而形成導線架110a。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本實施例的晶片封裝結構100a及其製作方法,其製程簡單,可有效地大幅增加引腳接墊的數目及降低製作成本。In this embodiment, the carrier 110 is formed by electroplating the metal material M, and after the chip 120a is placed on the chip seat 112a of the carrier 110, the connecting portion 116a of the carrier 110 is removed to form the lead frame 110a. Compared with the prior art of etching metal sheets to form a lead frame, the chip packaging structure 100a and its manufacturing method of this embodiment have a simple manufacturing process, which can effectively significantly increase the number of pin pads and reduce manufacturing costs. cost.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It should be noted that the following embodiments use the component numbers and some contents of the previous embodiments, wherein the same number is used to represent the same or similar components, and the description of the same technical contents is omitted. The description of the omitted parts can refer to the previous embodiments, and the following embodiments will not be repeated.

圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的剖面示意圖。關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖2A,提供一基材30以及一第一金屬層40,其中第一金屬層40形成於基材30上。此處,基材30可例如是核心(core)基板,其是由片狀的玻纖樹脂基底以及配置於片狀的玻纖樹脂基材相對兩側上的銅箔所組成,可視為一種硬板,但不以此為限。第一金屬層40的厚度例如是60微米,其中第一金屬層40例如是銅層。須說明的是,本實施例僅示意地繪示單面製程,於另一實施例中,依據製程需求,亦可採雙面製程,此仍屬於本發明所欲保護的範圍。2A to 2G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to another embodiment of the present invention. Regarding the manufacturing method of the chip packaging structure of this embodiment, first, please refer to FIG. 2A to provide a base material 30 and a first metal layer 40 , wherein the first metal layer 40 is formed on the base material 30 . Here, the substrate 30 can be, for example, a core substrate, which is composed of a sheet-shaped fiberglass resin substrate and copper foils disposed on opposite sides of the sheet-shaped fiberglass resin substrate, and can be regarded as a hard substrate. board, but not limited to this. The thickness of the first metal layer 40 is, for example, 60 microns, where the first metal layer 40 is, for example, a copper layer. It should be noted that this embodiment only schematically illustrates a single-sided process. In another embodiment, a double-sided process may also be adopted based on process requirements, which still falls within the scope of the present invention.

接著,請先參考圖2B,移除部分第一金屬層40,而形成暴露出部分基材30的至少一第一凹槽(示意地繪示一個第一凹槽42)以及多個第二凹槽44。此處,移除部分第一金屬層40的方式例如是蝕刻法。Next, please refer to FIG. 2B to remove part of the first metal layer 40 to form at least one first groove (schematically showing one first groove 42 ) and a plurality of second grooves that expose part of the base material 30 . slot 44. Here, the method of removing part of the first metal layer 40 is, for example, etching.

接著,請再參考圖2B,形成一不銹鋼層50以及一第二金屬層60。不銹鋼層50位於第一金屬層40及基材30上且共形地覆蓋第一金屬層40、第一凹槽42的內壁以及第二凹槽44的內壁。第二金屬層60形成於不銹鋼層50上且共形地覆蓋不銹鋼層50。Next, referring to FIG. 2B , a stainless steel layer 50 and a second metal layer 60 are formed. The stainless steel layer 50 is located on the first metal layer 40 and the substrate 30 and conformally covers the first metal layer 40, the inner wall of the first groove 42, and the inner wall of the second groove 44. The second metal layer 60 is formed on the stainless steel layer 50 and conformally covers the stainless steel layer 50.

接著,請參考圖2C,電鍍一金屬材料70於第二金屬層60上,其中填入於第一凹槽42內的金屬材料70可定義出晶片座112b,而填入於第二凹槽44內的金屬材料70可定義出引腳接墊114b。連接引腳接墊114b且配置於第一凹槽42及第二凹槽44外的金屬材料70則可定義出多個線路118b。連接線路118b及晶片座112b的金屬材料70及其下方的第二金屬層60則定義出連接部116b,此時,晶片座112b透過連接部116b以及線路118b連接引腳接墊114b。於一實施例中,金屬材料70的厚度例如是70微米,但不以此為限。於一未繪示的實施例中,亦可對晶片座112b、引腳接墊114b以及線路118b進行表面處理,而形成表面處理層於其上,可避免產生氧化。Next, please refer to FIG. 2C , a metal material 70 is electroplated on the second metal layer 60, wherein the metal material 70 filled in the first groove 42 can define the chip base 112b, and the metal material 70 filled in the second groove 44 can define the lead pad 114b. The metal material 70 connected to the lead pad 114b and arranged outside the first groove 42 and the second groove 44 can define a plurality of lines 118b. The metal material 70 connecting the line 118b and the chip base 112b and the second metal layer 60 thereunder define a connecting portion 116b. At this time, the chip base 112b is connected to the lead pad 114b through the connecting portion 116b and the line 118b. In one embodiment, the thickness of the metal material 70 is, for example, 70 microns, but is not limited thereto. In an embodiment not shown, the chip base 112b, the lead pads 114b and the circuits 118b may also be surface treated to form a surface treatment layer thereon to prevent oxidation.

接著,請參考圖2D,透過例如是紫外光膠帶(ultraviolet tape)附接於上述圖2C的結構,並以軟式轉板的方式將不銹鋼層50與第二金屬層60撥開,且移除不銹鋼層50、第一金屬層40以及基材30,至此已形成載體110’。Next, please refer to FIG. 2D , an ultraviolet tape is attached to the structure of FIG. 2C , and the stainless steel layer 50 and the second metal layer 60 are separated by a soft transfer plate, and the stainless steel layer 50 , the first metal layer 40 and the substrate 30 are removed, thereby forming a carrier 110 ′.

接著,請參考圖2E,此轉板結構放置於封裝廠商慣用檯面20之上,其上表面的黏著層22具有黏著性,以使晶片座112b以及引腳接墊114b能與檯面20緊密接合。緊接著,形成多個焊球150b於晶片120b上。配置晶片120b於載體110’的晶片座112b上,其中焊球150b位於每一線路118b的一表面119b與晶片120b的一主動表面121b之間。晶片120b透過焊球150b及線路118b與引腳接墊114b電性連接。此時,晶片120b並沒有直接接觸於晶片座112b。然而,晶片作112b仍有導熱的功能,能將晶片120b所產生的熱能經過焊球150b及線路118b傳遞至晶片座112b,進而傳遞至外界以進行散熱。緊接著,形成一底膠160b於晶片120b與線路118b之間、晶片120b與晶片座112b之間以及線路118b之間的空隙內,以覆蓋焊球150b、線路118b以及載體110’相對鄰近晶片120b的正面。Next, please refer to FIG. 2E. This rotating plate structure is placed on a conventional table 20 of the packaging manufacturer. The adhesive layer 22 on the upper surface has adhesive properties so that the chip holder 112b and the pin pad 114b can be tightly connected to the table 20. Next, a plurality of solder balls 150b are formed on the chip 120b. The chip 120b is disposed on the chip seat 112b of the carrier 110', wherein the solder ball 150b is located between a surface 119b of each trace 118b and an active surface 121b of the chip 120b. The chip 120b is electrically connected to the pin pad 114b through the solder ball 150b and the circuit 118b. At this time, the chip 120b is not in direct contact with the chip holder 112b. However, the chip 112b still has a thermal conductive function and can transfer the heat energy generated by the chip 120b to the chip holder 112b through the solder ball 150b and the circuit 118b, and then to the outside for heat dissipation. Next, an undercoat 160b is formed in the gaps between the chip 120b and the circuit 118b, between the chip 120b and the chip seat 112b, and between the circuits 118b to cover the solder ball 150b, the circuit 118b and the carrier 110' relatively adjacent to the chip 120b. of the front.

之後,請同時參考圖2E以及圖2F,以微蝕刻的方式,從載體110’的背面移除載體110’的連接部116b、部分晶片座112b以及部分每一引腳接墊114b,而形成一導線架110b。此時,晶片座112b具有第一蝕刻表面S2’,而每一引腳接墊114b具有第二蝕刻表面115b。Afterwards, please refer to FIG. 2E and FIG. 2F at the same time. Micro-etching is used to remove the connection portion 116b of the carrier 110', part of the chip seat 112b and part of each pin pad 114b from the back side of the carrier 110' to form a Leadframe 110b. At this time, the chip holder 112b has a first etching surface S2', and each pin pad 114b has a second etching surface 115b.

最後,請參考圖2G,形成一保護層140b以至少覆蓋導線架110b,且暴露出第一蝕刻表面S2’與第二蝕刻表面115b此處,移除載體110’的連接部116b、部分晶片座112b以及部分每一引腳接墊114b於形成保護層140b之前,而保護層140b具體化為一封裝膠體,且包覆導線架110b、晶片120b以及底膠160b。此處,保護層140b的周圍切齊於底膠160b的周圍以及導線架110b的周圍。至此,已完成四方扁平無外引腳(QFN)型態的晶片封裝結構100b的製作。Finally, referring to FIG. 2G , a protective layer 140b is formed to at least cover the lead frame 110b and expose the first etched surface S2′ and the second etched surface 115b. Here, the connection portion 116b of the carrier 110′, a portion of the chip base 112b, and a portion of each lead pad 114b are removed before forming the protective layer 140b, and the protective layer 140b is embodied as a packaging glue body and covers the lead frame 110b, the chip 120b, and the bottom glue 160b. Here, the periphery of the protective layer 140b is aligned with the periphery of the bottom glue 160b and the periphery of the lead frame 110b. At this point, the manufacture of the chip package structure 100b of the quad flat no external lead (QFN) type has been completed.

在結構上,請參考圖2G,在本實施例中,晶片封裝結構100b包括導線架110b、晶片120b以及保護層140b。導線架110b包括晶片座112b、環繞晶片座112b的引腳接墊114b以及連接引腳接墊114b及連接引腳接墊114b與晶片座112b的線路118b。晶片座112b具有第一蝕刻表面S2’,而每一引腳接墊114b具有第二蝕刻表面115b。晶片120b配置於導線架110b的晶片座112b上,並與導線架110b的引腳接墊114b電性連接。保護層140b至少覆蓋導線架110b且暴露出第一蝕刻表面S2’與第二蝕刻表面115b。Structurally, please refer to FIG. 2G . In this embodiment, the chip package structure 100b includes a lead frame 110b, a chip 120b, and a protective layer 140b. The lead frame 110b includes a chip base 112b, a pin pad 114b surrounding the chip base 112b, and a line 118b connecting the pin pad 114b and connecting the pin pad 114b and the chip base 112b. The chip base 112b has a first etched surface S2′, and each pin pad 114b has a second etched surface 115b. The chip 120b is disposed on the chip base 112b of the lead frame 110b and is electrically connected to the pin pad 114b of the lead frame 110b. The protection layer 140b at least covers the lead frame 110b and exposes the first etched surface S2' and the second etched surface 115b.

更具體來說,在本實施例中,晶片座112b與引腳接墊114b位於同一平面上,而線路118b例如是扇出線路位於晶片座112b與引腳接墊114b的上方且正投影不完全重疊。晶片封裝結構100b還包括焊球150b。焊球150b配置於每一線路118b的表面119b與晶片120b的主動表面121b之間。晶片120b透過焊球150b與引腳接墊114b電性連接。保護層140b包覆晶片120b相對於主動表面121b的背表面123b。此外,晶片封裝結構100b還包括底膠160b,配置於晶片120b與線路118b之間,且覆蓋焊球150b與線路118b。More specifically, in this embodiment, the chip holder 112b and the pin pads 114b are located on the same plane, and the line 118b, such as a fan-out line, is located above the chip holder 112b and the pin pads 114b and the orthographic projection is incomplete. overlap. Chip package structure 100b also includes solder balls 150b. Solder ball 150b is disposed between surface 119b of each trace 118b and active surface 121b of die 120b. The chip 120b is electrically connected to the pin pad 114b through the solder ball 150b. The protective layer 140b covers the back surface 123b of the wafer 120b relative to the active surface 121b. In addition, the chip packaging structure 100b also includes an undercoat 160b, which is disposed between the chip 120b and the circuit 118b and covers the solder ball 150b and the circuit 118b.

由於本實施例是透過電鍍金屬材料70的方式來形成載體110’,並於配置晶片120b於載體110’的晶片座112b上之後,才移除載體110’的連接部116b,而形成導線架110b。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本實施例的晶片封裝結構100a及其製作方法,其製程簡單,可有效地大幅增加引腳接墊114b的數目於晶片120b之正下方以及晶片120b之下方外側。由於採用電鍍方式來形成導線架110b,因此導線架110b的線路118b的線寬/線距可例如是35微米/35微米,可增加引腳接墊114b的扇出排數。In this embodiment, the carrier 110' is formed by electroplating the metal material 70, and after the chip 120b is placed on the chip seat 112b of the carrier 110', the connecting portion 116b of the carrier 110' is removed to form the lead frame 110b. . Compared with the prior art of etching metal sheets to form a lead frame, the chip packaging structure 100a and its manufacturing method of this embodiment have a simple manufacturing process and can effectively significantly increase the number of pin pads 114b on the chip. Just below 120b and below and outside of chip 120b. Since the lead frame 110b is formed by electroplating, the line width/line spacing of the lines 118b of the lead frame 110b can be, for example, 35 microns/35 microns, which can increase the number of fan-out rows of the pin pads 114b.

圖2H是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。請同時參照圖2G與圖2H,本實施例的晶片封裝結構100c與圖2G中的晶片封裝結構100b相似,惟二者主要差異之處在於:在本實施例中,保護層140c具體化為一防焊綠漆,且保護層140c連接底膠160b。此處,晶片120b相對於主動表面121b的背表面123b暴露於保護層140b以及底膠160b外,此結構能降低封裝後產品的厚度,達成輕薄短小的目標。FIG. 2H is a schematic cross-sectional view of a chip packaging structure according to an embodiment of the present invention. Please refer to FIG. 2G and FIG. 2H at the same time. The chip packaging structure 100c of this embodiment is similar to the chip packaging structure 100b in FIG. 2G. The main difference between the two is that in this embodiment, the protective layer 140c is embodied as a Solder resist green paint, and the protective layer 140c is connected to the primer 160b. Here, the back surface 123b of the chip 120b relative to the active surface 121b is exposed to the protective layer 140b and the base glue 160b. This structure can reduce the thickness of the packaged product and achieve the goal of being light, thin and compact.

綜上所述,在本發明的晶片封裝結構及其製作方法中,是透過電鍍金屬材料的方式來形成載體,並於配置晶片於載體的晶片座上之後,才移除載體的連接部,而形成導線架。相較於現有技術中以蝕刻金屬薄板的方式來形成導線架而言,本發明的晶片封裝結構及其製作方法,其製程簡單,可大幅地增加引腳接墊的密度和排數,俾能使用較高晶片的腳數。To sum up, in the chip packaging structure and its manufacturing method of the present invention, the carrier is formed by electroplating metal materials, and after the chip is placed on the chip seat of the carrier, the connecting portion of the carrier is removed, and Form a leadframe. Compared with the prior art of etching metal sheets to form lead frames, the chip packaging structure and its manufacturing method of the present invention have a simple manufacturing process and can greatly increase the density and row number of pin pads, so that the Use higher chip pin count.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above by the embodiments, they are not intended to limit the present invention. Any person with ordinary knowledge in the relevant technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be defined by the scope of the attached patent application.

10、30:基材 12、50:不銹鋼層 14:金屬層 16:圖案化光阻層 20:檯面 22:黏著層 40:第一金屬層 42:第一凹槽 44:第二凹槽 60:第二金屬層 70、M:金屬材料 100a:晶片封裝結構 110、110’:載體 110a、110b:導線架 112a、112b:晶片座 114a、114b:引腳接墊 115a、115b:第二蝕刻表面 116a、116b:連接部 118b:線路 119b:表面 120a、120b:晶片 121b:主動表面 123b:背表面 130a:打線 140a、140b、140c:保護層 141a、141b:下表面 150b:焊球 160b:底膠 S1:內表面 S2、S2’:第一蝕刻表面10, 30: substrate 12, 50: stainless steel layer 14: metal layer 16: patterned photoresist layer 20: countertop 22: adhesive layer 40: first metal layer 42: first groove 44: second groove 60: second metal layer 70, M: metal material 100a: chip packaging structure 110, 110': carrier 110a, 110b: lead frame 112a, 112b: chip holder 114a, 114b: lead pad 115a, 115b: second etched surface 116a, 116b: connection part 118b: circuit 119b: surface 120a, 120b: chip 121b: active surface 123b: back surface 130a: wire bonding 140a, 140b, 140c: protective layer 141a, 141b: bottom surface 150b: solder ball 160b: bottom glue S1: inner surface S2, S2’: first etched surface

圖1A至圖1G是依照本發明的一實施例的一種晶片封裝結構的製作方法的剖面示意圖。 圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的剖面示意圖。 圖2H是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。 Figures 1A to 1G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to an embodiment of the present invention. Figures 2A to 2G are schematic cross-sectional views of a method for manufacturing a chip packaging structure according to another embodiment of the present invention. Figure 2H is a schematic cross-sectional view of a chip packaging structure according to an embodiment of the present invention.

20:檯面 20: Countertop

22:黏著層 22: Adhesive layer

110b:導線架 110b: Conductor frame

112b:晶片座 112b: chip holder

114b:引腳接墊 114b: Pin pad

115b:第二蝕刻表面 115b: Second etching surface

118b:線路 118b:line

119b:表面 119b: Surface

120b:晶片 120b: chip

121b:主動表面 121b: Active surface

150b:焊球 150b: Solder ball

160b:底膠 160b: Base glue

S2’:第一蝕刻表面 S2’: first etched surface

Claims (19)

一種晶片封裝結構,包括: 一導線架,包括至少一晶片座以及環繞該至少一晶片座的多個引腳接墊,其中該至少一晶片座具有至少一第一蝕刻表面,而各該引腳接墊具有一第二蝕刻表面,該至少一晶片座為一單一金屬結構,其邊及角上沒有連著為保持其穩定的金屬導線,該些引腳接墊之間亦無導線在其間通過; 至少一晶片,配置於該導線架的該至少一晶片座上,並與該導線架的該些引腳接墊電性連接;以及 一保護層,至少覆蓋該導線架,且暴露出該至少一第一蝕刻表面及該第二蝕刻表面。 A chip packaging structure includes: A lead frame includes at least one chip holder and a plurality of pin pads surrounding the at least one wafer holder, wherein the at least one wafer holder has at least a first etched surface, and each of the pin pads has a second etched surface On the surface, the at least one chip holder is a single metal structure, with no metal wires connected to its edges and corners to maintain its stability, and no wires passing between the pin pads; At least one chip is disposed on the at least one chip seat of the lead frame and is electrically connected to the pin pads of the lead frame; and A protective layer covers at least the lead frame and exposes the at least one first etched surface and the second etched surface. 如請求項1所述的晶片封裝結構,其中該保護層為一封裝膠體,包覆該導線架以及該至少一晶片。The chip packaging structure of claim 1, wherein the protective layer is a packaging colloid covering the lead frame and the at least one chip. 如請求項2所述的晶片封裝結構,其中該至少一晶片座具有彼此相對的至少一內表面與至少一外表面,該至少一晶片直接配置於該至少一內表面上,而該至少一外表面為該至少一第一蝕刻表面。The chip packaging structure of claim 2, wherein the at least one chip holder has at least one inner surface and at least one outer surface opposite to each other, the at least one chip is directly disposed on the at least one inner surface, and the at least one outer surface The surface is the at least one first etching surface. 如請求項2所述的晶片封裝結構,更包括: 多條打線,電性連接該至少一晶片以及該些引腳接墊。 The chip packaging structure as described in claim 2 further includes: A plurality of bonding wires are electrically connected to the at least one chip and the pin pads. 如請求項2所述的晶片封裝結構,更包括: 多個焊球,該導線架更包括連接該些引腳接墊的多個線路,該些焊球配置於各該線路的一表面與該至少一晶片的一主動表面之間,該至少一晶片透過該些焊球與該些引腳接墊電性連接,而該保護層包覆該至少一晶片相對於該主動表面的一背表面。 The chip packaging structure as described in claim 2 further includes: A plurality of solder balls, the lead frame further includes a plurality of circuits connected to the pin pads, the solder balls are arranged between a surface of each circuit and an active surface of the at least one chip, the at least one chip The solder balls are electrically connected to the pin pads, and the protective layer covers a back surface of the at least one chip relative to the active surface. 如請求項5所述的晶片封裝結構,更包括: 一底膠,配置於該至少一晶片與該些線路之間,且覆蓋該些焊球與該些線路。 The chip packaging structure as described in claim 5 further includes: An undercoat is disposed between the at least one chip and the circuits, and covers the solder balls and the circuits. 如請求項1所述的晶片封裝結構,其中該保護層為一防焊綠漆。The chip packaging structure of claim 1, wherein the protective layer is a solder resist green paint. 如請求項7所述的晶片封裝結構,更包括: 多個焊球,該導線架更包括連接該些引腳接墊的多個線路,該些焊球配置於各該線路的一表面與該至少一晶片的一主動表面之間,而該至少一晶片透過該些焊球與該些引腳接墊電性連接。 The chip packaging structure as described in claim 7 further includes: A plurality of solder balls, the lead frame further includes a plurality of circuits connected to the pin pads, the solder balls are arranged between a surface of each circuit and an active surface of the at least one chip, and the at least one The chip is electrically connected to the pin pads through the solder balls. 如請求項8所述的晶片封裝結構,更包括: 一底膠,配置於該至少一晶片與該些線路之間,且覆蓋該些焊球與該些線路,其中該至少一晶片相對於該主動表面的一背表面暴露於該保護層以及該底膠外。 The chip package structure as described in claim 8 further includes: A primer, disposed between the at least one chip and the circuits, and covering the solder balls and the circuits, wherein a back surface of the at least one chip relative to the active surface is exposed outside the protective layer and the primer. 一種晶片封裝結構的製作方法,包括: 電鍍一金屬材料來形成一載體,該載體包括至少一晶片座、環繞該至少一晶片座的多個引腳接墊以及連接該至少一晶片座與該些引腳接墊的多個連接部; 配置至少一晶片於該載體的該至少一晶片座上,並與該載體的該些引腳接墊電性連接; 於配置該至少一晶片於該載體的該至少一晶片座上之後,移除該載體的該些連接部、部分該至少一晶片座以及部分各該引腳接墊,而形成一導線架,其中該至少一晶片座具有至少一第一蝕刻表面,而各該引腳接墊具有一第二蝕刻表面;以及 形成一保護層以至少覆蓋該導線架,且暴露出該至少一第一蝕刻表面及該第二蝕刻表面。 A method for manufacturing a chip packaging structure, including: Electroplating a metal material to form a carrier, the carrier including at least one chip seat, a plurality of pin pads surrounding the at least one chip seat, and a plurality of connection portions connecting the at least one chip seat and the pin pads; disposing at least one chip on the at least one chip holder of the carrier and electrically connecting with the pin pads of the carrier; After disposing the at least one chip on the at least one chip holder of the carrier, removing the connection portions of the carrier, part of the at least one chip holder and part of each of the pin pads to form a lead frame, wherein The at least one die pad has at least a first etched surface, and each of the pin pads has a second etched surface; and A protective layer is formed to cover at least the lead frame and expose the at least one first etched surface and the second etched surface. 如請求項10所述的晶片封裝結構的製作方法,其中電鍍該金屬材料來形成該載體的步驟,包括: 提供一基材、一不銹鋼層以及一金屬層,該不銹鋼層位於該基材上且共形地覆蓋該基材,該金屬層形成於該不銹鋼層上且共形地覆蓋該不銹鋼層; 形成一圖案化光阻層於該金屬層上; 以該圖案化光阻層為電鍍罩幕,電鍍該金屬材料於該圖案化光阻層所暴露出的該金屬層上;以及 移除該圖案化光阻層及其下方的該金屬層、該不銹鋼層以及該基材,而形成該載體。 The manufacturing method of the chip packaging structure as described in claim 10, wherein the step of electroplating the metal material to form the carrier includes: Providing a substrate, a stainless steel layer and a metal layer, the stainless steel layer is located on the substrate and conformally covers the substrate, and the metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer; Forming a patterned photoresist layer on the metal layer; Using the patterned photoresist layer as a plating mask, electroplating the metal material on the metal layer exposed by the patterned photoresist layer; and Removing the patterned photoresist layer and the metal layer, the stainless steel layer and the substrate thereunder to form the carrier. 如請求項10所述的晶片封裝結構的製作方法,其中配置該至少一晶片於該載體的該至少一晶片座上,並與該載體的該些引腳接墊電性連接的步驟,包括: 將該載體貼附於具有一黏著層的一檯面上; 配置該至少一晶片於該載體的該至少一晶片座上;以及 形成多條打線以電性連接該至少一晶片以及該些引腳接墊。 The manufacturing method of the chip package structure as described in claim 10, wherein the step of configuring the at least one chip on the at least one chip seat of the carrier and electrically connecting the at least one chip to the pin pads of the carrier includes: Attaching the carrier to a table having an adhesive layer; Configuring the at least one chip on the at least one chip seat of the carrier; and Forming a plurality of bonding wires to electrically connect the at least one chip and the pin pads. 如請求項11所述的晶片封裝結構的製作方法,其中移除該載體的該些連接部、部分該至少一晶片座以及部分各該引腳接墊於形成該保護層之後,該保護層為一封裝膠體,且該保護層包覆該載體以及該至少一晶片。The manufacturing method of a chip packaging structure as claimed in claim 11, wherein after removing the connection portions of the carrier, part of the at least one chip seat and part of each of the pin pads and forming the protective layer, the protective layer is An encapsulating colloid is provided, and the protective layer covers the carrier and the at least one chip. 如請求項13所述的晶片封裝結構的製作方法,其中該至少一晶片座具有彼此相對的至少一內表面與至少一外表面,該至少一晶片直接配置於該至少一內表面上,而該至少一外表面為該至少一第一蝕刻表面。A method for manufacturing a chip packaging structure as described in claim 13, wherein the at least one chip seat has at least one inner surface and at least one outer surface opposite to each other, the at least one chip is directly configured on the at least one inner surface, and the at least one outer surface is the at least one first etching surface. 如請求項10所述的晶片封裝結構的製作方法,其中電鍍該金屬材料來形成該載體的步驟,包括: 提供一基材以及一第一金屬層,該第一金屬層形成於該基材上; 移除部分該第一金屬層,而形成暴露出部分該基材的至少一第一凹槽以及多個第二凹槽; 形成一不銹鋼層以及一第二金屬層,該不銹鋼層位於該第一金屬層及該基材上且共形地覆蓋該第一金屬層、該至少一第一凹槽的內壁以及該些第二凹槽的內壁,該第二金屬層形成於該不銹鋼層上且共形地覆蓋該不銹鋼層; 電鍍該金屬材料於該第二金屬層上,填入於該至少一第一凹槽內的該金屬材料定義出該至少一晶片座,而填入於該些第二凹槽內的該金屬材料定義出該些引腳接墊,連接該些引腳接墊且配置於該至少一第一凹槽及該些第二凹槽外的該金屬材料定義出多個線路,且連接該些線路與該至少一晶片座的該金屬材料及其下方的該第二金屬層則定義出該些連接部;以及 從該第二金屬層與其下方的該不銹鋼層的介面分離該不銹鋼層與其下方的該第一金屬層以及該基材,而形成該載體。 The manufacturing method of the chip packaging structure as described in claim 10, wherein the step of electroplating the metal material to form the carrier includes: Providing a substrate and a first metal layer, the first metal layer is formed on the substrate; Removing a portion of the first metal layer to form at least one first groove and a plurality of second grooves that expose a portion of the substrate; Forming a stainless steel layer and a second metal layer, the stainless steel layer is located on the first metal layer and the substrate and conformally covers the first metal layer, the inner wall of the at least one first groove and the inner walls of the second grooves, and the second metal layer is formed on the stainless steel layer and conformally covers the stainless steel layer; Electroplating the metal material on the second metal layer, the metal material filled in the at least one first groove defines the at least one chip seat, and the metal material filled in the second grooves defines the lead pads, the metal material connecting the lead pads and arranged outside the at least one first groove and the second grooves defines a plurality of circuits, and the metal material connecting the circuits and the at least one chip seat and the second metal layer thereunder defines the connecting parts; and Separating the stainless steel layer from the first metal layer thereunder and the substrate from the interface between the second metal layer and the stainless steel layer thereunder to form the carrier. 如請求項15所述的晶片封裝結構的製作方法,其中配置該至少一晶片於該載體的該至少一晶片座上,並與該載體的該些引腳接墊電性連接的步驟,包括: 形成多個焊球於該至少一晶片上;以及 配置該至少一晶片於該載體的該至少一晶片座上,該些焊球位於各該線路的一表面與該至少一晶片的一主動表面之間,且該至少一晶片透過該些焊球與該些引腳接墊電性連接。 The manufacturing method of the chip package structure as described in claim 15, wherein the step of configuring the at least one chip on the at least one chip seat of the carrier and electrically connecting it to the pin pads of the carrier includes: forming a plurality of solder balls on the at least one chip; and configuring the at least one chip on the at least one chip seat of the carrier, the solder balls being located between a surface of each of the circuits and an active surface of the at least one chip, and the at least one chip being electrically connected to the pin pads through the solder balls. 如請求項16所述的晶片封裝結構的製作方法,更包括: 於配置該至少一晶片於該載體的該至少一晶片座上之後,且於形成該保護層之前,形成一底膠於該至少一晶片與該些線路之間,以覆蓋該些焊球與該些線路。 The manufacturing method of the chip packaging structure as described in claim 16 further includes: After arranging the at least one chip on the at least one chip seat of the carrier and before forming the protective layer, an undercoat is formed between the at least one chip and the circuits to cover the solder balls and the circuits. some lines. 如請求項17所述的晶片封裝結構的製作方法,其中移除該載體的該些連接部、部分該至少一晶片座以及部分各該引腳接墊於形成該保護層之前,且該保護層為一封裝膠體,包覆該導線架、該至少一晶片以及該底膠。The manufacturing method of a chip packaging structure as claimed in claim 17, wherein the connection portions of the carrier, part of the at least one chip seat and part of each of the pin pads are removed before forming the protective layer, and the protective layer It is a packaging colloid that covers the lead frame, the at least one chip and the base glue. 如請求項17所述的晶片封裝結構的製作方法,其中移除該載體的該些連接部、部分該至少一晶片座以及部分各該引腳接墊於形成該導線架之後,形成一保護層覆蓋該導線架的下方,且暴露出該至少一第一蝕刻表面及該第二蝕刻表面,而該保護層為一防焊綠漆,且該保護層連接該底膠。The manufacturing method of a chip packaging structure as claimed in claim 17, wherein the connecting portions of the carrier, part of the at least one chip seat and part of each of the pin pads are removed to form a protective layer after forming the lead frame. Cover the bottom of the lead frame and expose the at least one first etched surface and the second etched surface, and the protective layer is a solder resist green paint, and the protective layer is connected to the primer.
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Publication number Priority date Publication date Assignee Title
US20190067212A1 (en) 2017-08-31 2019-02-28 Stmicroelectronics, Inc. Package with interlocking leads and manufacturing the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190067212A1 (en) 2017-08-31 2019-02-28 Stmicroelectronics, Inc. Package with interlocking leads and manufacturing the same

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