TWI835553B - Circuit board and manufacturing method thereof - Google Patents

Circuit board and manufacturing method thereof Download PDF

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TWI835553B
TWI835553B TW112104534A TW112104534A TWI835553B TW I835553 B TWI835553 B TW I835553B TW 112104534 A TW112104534 A TW 112104534A TW 112104534 A TW112104534 A TW 112104534A TW I835553 B TWI835553 B TW I835553B
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test
substrate
pins
circuit
pads
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TW112104534A
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TW202433156A (en
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謝文章
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友達光電股份有限公司
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Abstract

A circuit substrate includes a substrate, a front circuit structure, first side wires, a back circuit structure and a first flexible circuit board. The front circuit structure is disposed on the front side of the substrate and includes first pads. The first side wires are extending from the front side of the substrate to the back side of the substrate. The back circuit structure is disposed on the back side of the substrate, and includes first leads, test pads and first test wires. The first leads are electrically connected to the first pads through the first side wires. The first leads are located between the test pads and the first side wires. The first test wires are located between the first leads and the test pads. The first flexible circuit board is bonded to the first leads.

Description

電路基板及其製造方法Circuit substrate and manufacturing method thereof

本發明是有關於一種電路基板及其製造方法。The invention relates to a circuit substrate and a manufacturing method thereof.

為了因應市場的需求,越來越多廠商致力於發展窄邊框甚至無邊框的顯示面板。一般而言,畫素陣列基板的正面會設置一些用於測試畫素陣列是否能正常運作的測試接墊。為了減小顯示面板之邊框區的面積,會移除設置於畫素陣列基板的正面的測試接墊,並直接利用畫素陣列基板用於接合薄膜覆晶封裝結構的接墊來進行畫素陣列的測試。然而,畫素陣列基板用於接合薄膜覆晶封裝結構的接墊較為細小,導致線路容易在測試操作過程中損壞。In order to respond to market demand, more and more manufacturers are committed to developing narrow bezel or even bezel-less display panels. Generally speaking, some test pads are provided on the front side of the pixel array substrate for testing whether the pixel array can operate normally. In order to reduce the area of the frame area of the display panel, the test pads provided on the front side of the pixel array substrate will be removed, and the pads of the pixel array substrate used to join the thin film flip-chip packaging structure will be directly used to conduct the pixel array test. However, the pads used to join the thin film flip-chip packaging structure of the pixel array substrate are relatively small, causing the circuit to be easily damaged during the test operation.

本發明提供一種電路基板,能更佳的利用線路布局空間。The invention provides a circuit substrate that can better utilize circuit layout space.

本發明的至少一實施例提供一種電路基板。電路基板包括基板、正面電路結構、多條第一側邊導線、背面電路結構以及第一軟性電路板。正面電路結構設置於基板的正面上,且包括多個第一接墊。第一側邊導線從基板的正面延伸至基板的背面。背面電路結構設置於基板的背面上,且包括多個第一引腳、多個測試接墊以及多條第一測試導線。第一引腳透過第一側邊導線而電性連接至第一接墊。至少部分第一引腳位於測試接墊與第一側邊導線之間。至少部分第一測試導線位於第一引腳與測試接墊之間。第一軟性電路板接合至第一引腳。At least one embodiment of the present invention provides a circuit substrate. The circuit substrate includes a substrate, a front circuit structure, a plurality of first side wires, a back circuit structure and a first flexible circuit board. The front circuit structure is disposed on the front side of the substrate and includes a plurality of first pads. The first side wire extends from the front side of the substrate to the back side of the substrate. The backside circuit structure is disposed on the backside of the substrate and includes a plurality of first pins, a plurality of test pads and a plurality of first test leads. The first pin is electrically connected to the first pad through the first side wire. At least part of the first pin is located between the test pad and the first side conductor. At least part of the first test lead is located between the first pin and the test pad. The first flexible circuit board is bonded to the first pin.

本發明的至少一實施例提供一種電路基板的製造方法,包括以下步驟。形成正面電路結構於基板的正面上,且正面電路結構包括多個第一接墊。形成多條第一側邊導線於基板的側面上,且第一側邊導線從基板的正面延伸至基板的背面。形成背面電路結構於基板的背面上。背面電路結構包括多個第一引腳、多個測試接墊以及多條第一測試導線。第一引腳透過第一側邊導線而電性連接至第一接墊。至少部分第一引腳位於測試接墊與第一側邊導線之間。至少部分第一測試導線位於第一引腳與測試接墊之間。用至少一測試探針電性接觸測試接墊以執行測試步驟。移除部分的第一測試導線,以使第一測試導線與第一引腳分離。將至少一第一軟性電路板接合至第一引腳。At least one embodiment of the present invention provides a method for manufacturing a circuit substrate, including the following steps. A front circuit structure is formed on the front side of the substrate, and the front circuit structure includes a plurality of first pads. A plurality of first side conductors are formed on the side of the substrate, and the first side conductors extend from the front of the substrate to the back of the substrate. A backside circuit structure is formed on the backside of the substrate. The backside circuit structure includes a plurality of first pins, a plurality of test pads and a plurality of first test leads. The first pin is electrically connected to the first pad through the first side wire. At least part of the first pin is located between the test pad and the first side conductor. At least part of the first test lead is located between the first pin and the test pad. Use at least one test probe to electrically contact the test pad to perform the test step. A portion of the first test lead is removed to separate the first test lead from the first pin. Connect at least one first flexible circuit board to the first pin.

基於上述,背面電路結構包括測試接墊,因此能有更大的線路布局空間設置測試接墊。Based on the above, the back circuit structure includes test pads, so there is a larger circuit layout space for setting test pads.

圖1A至圖1F是依照本發明的一實施例的一種電路基板的製造方法的剖面示意圖。請參考圖1A,形成正面電路結構200於基板100的正面100a上。1A to 1F are schematic cross-sectional views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. Referring to FIG. 1A , a front-side circuit structure 200 is formed on the front-side 100 a of the substrate 100 .

基板100之材質可為玻璃、石英、有機聚合物或不透光/反射材料(例如:導電材料、金屬、晶圓、陶瓷或其他可適用的材料)或是其他可適用的材料。The material of the substrate 100 may be glass, quartz, organic polymer, opaque/reflective material (such as conductive material, metal, wafer, ceramic or other applicable materials) or other applicable materials.

正面電路結構200包括多層絕緣層以及多層導電層,其中絕緣層以及導電層的數量可以依照實際需求而進行調整。在本實施例中,正面電路結構200包括依序堆疊的第一絕緣層210、第一導電層220、第二絕緣層230以及第二導電層240。第二導電層240包括多個第一接墊244(圖1B中僅顯示其中一個)以及多個第二接墊242。在一些實施例中,正面電路結構200中包含畫素電路(未繪出),其中畫素電路電性連接至第一接墊244以及第二接墊242。The front circuit structure 200 includes multiple insulating layers and multiple conductive layers, where the number of insulating layers and conductive layers can be adjusted according to actual needs. In this embodiment, the front circuit structure 200 includes a first insulating layer 210, a first conductive layer 220, a second insulating layer 230 and a second conductive layer 240 stacked in sequence. The second conductive layer 240 includes a plurality of first pads 244 (only one of which is shown in FIG. 1B ) and a plurality of second pads 242 . In some embodiments, the front circuit structure 200 includes a pixel circuit (not shown), wherein the pixel circuit is electrically connected to the first pad 244 and the second pad 242 .

形成第一緩衝層300於基板100的背面100b上。在一些實施例中,第一緩衝層300的材料為聚亞醯胺(Polyimide,PI)、聚甲基丙烯酸甲酯(Polymethyl methacrylate,PMMA)、環氧樹脂(epoxy)、光阻或其他不導電且容易塗佈的材料。在一些實施例中,第一緩衝層300的厚度小於或等於10微米。The first buffer layer 300 is formed on the back surface 100b of the substrate 100. In some embodiments, the material of the first buffer layer 300 is polyimide (PI), polymethyl methacrylate (PMMA), epoxy, photoresist or other non-conductive materials. and easy-to-coat materials. In some embodiments, the thickness of the first buffer layer 300 is less than or equal to 10 microns.

請參考圖1B與圖2A,其中圖1B對應了圖2A中線A-A’的位置。形成多條第一側邊導線440於基板100的側面100c上。第一側邊導線440從基板100的正面100a延伸至基板100的背面100b。在一些實施例中,形成第一側邊導線440的方法包括網印、壓印、移印、噴墨印刷、濺鍍或其他合適的製程。在一些實施例中,第一側邊導線440的材料包括金屬、導電膠(例如銀膠)或其他合適的材料。Please refer to Figure 1B and Figure 2A, where Figure 1B corresponds to the position of line A-A’ in Figure 2A. A plurality of first side wires 440 are formed on the side 100c of the substrate 100. The first side wire 440 extends from the front surface 100 a of the substrate 100 to the back surface 100 b of the substrate 100 . In some embodiments, the method of forming the first side conductor 440 includes screen printing, embossing, pad printing, inkjet printing, sputtering or other suitable processes. In some embodiments, the material of the first side wire 440 includes metal, conductive glue (such as silver glue), or other suitable materials.

形成背面電路結構400於基板100的背面100b上。在一些實施例中,形成背面電路結構400的方法包括網印、壓印、移印、噴墨印刷、濺鍍或其他合適的製程。在一些實施例中,背面電路結構400的材料包括金屬、導電膠(例如銀膠)或其他合適的材料。The backside circuit structure 400 is formed on the backside 100b of the substrate 100. In some embodiments, the method of forming the backside circuit structure 400 includes screen printing, embossing, pad printing, inkjet printing, sputtering or other suitable processes. In some embodiments, the material of the back circuit structure 400 includes metal, conductive glue (such as silver glue), or other suitable materials.

背面電路結構400與第一側邊導線440同時形成,但本發明不以此為限。在其他實施例中,背面電路結構400與第一側邊導線440是分別於不同道製程中形成。在其他實施例中,部分的背面電路結構400與第一側邊導線440同時形成,而另一部分的背面電路結構400與第一側邊導線440於不同道製程中形成。背面電路結構400與第一側邊導線440的形成順序可以依照實際需求而進行調整。The back circuit structure 400 and the first side wires 440 are formed at the same time, but the invention is not limited thereto. In other embodiments, the back circuit structure 400 and the first side wire 440 are formed in different processes. In other embodiments, part of the back circuit structure 400 and the first side conductors 440 are formed simultaneously, while another part of the back circuit structure 400 and the first side conductors 440 are formed in different processes. The formation sequence of the back circuit structure 400 and the first side wires 440 can be adjusted according to actual needs.

在本實施例中,先形成第一緩衝層300,接著再形成背面電路結構400與第一側邊導線440,但本發明不以此為限。在其他實施例中,先形成第一側邊導線440,接著形成第一緩衝層300,最後才形成背面電路結構400。In this embodiment, the first buffer layer 300 is formed first, and then the back circuit structure 400 and the first side conductors 440 are formed, but the invention is not limited to this. In other embodiments, the first side conductors 440 are formed first, then the first buffer layer 300 is formed, and finally the back circuit structure 400 is formed.

背面電路結構400包括多個第一引腳430、多個測試接墊410以及多條第一測試導線420。第一引腳430、第一測試導線420以及第一側邊導線440的寬度小於測試接墊410的寬度,因此,後續的測試步驟中所使用的測試探針可能較輕易的接觸到測試接墊410。在本實施例中,測試接墊410沿著第一方向D1排列,且在第一方向D1上彼此對齊,但本發明不以此為限。測試接墊410的位置、間距以及尺寸等配置可以依照實際需求而進行調整。The backside circuit structure 400 includes a plurality of first pins 430 , a plurality of test pads 410 and a plurality of first test leads 420 . The width of the first pin 430 , the first test lead 420 and the first side lead 440 is smaller than the width of the test pad 410 . Therefore, the test probe used in subsequent test steps may easily contact the test pad. 410. In this embodiment, the test pads 410 are arranged along the first direction D1 and aligned with each other in the first direction D1, but the invention is not limited thereto. The position, spacing, size and other configurations of the test pads 410 can be adjusted according to actual needs.

在本實施例中,至少部分的第一測試導線420形成於第一緩衝層300上,且第一緩衝層300位於基板100以及至少部分的第一測試導線420之間。第一測試導線420直接接觸第一緩衝層300。在本實施例中,一個第一緩衝層300橫向且連續地延伸,但本發明不以此為限。在其他實施例中,第一緩衝層300包括彼此分離的多個部分,且每個部分重疊於對應的多個第一測試導線420。In this embodiment, at least part of the first test wires 420 is formed on the first buffer layer 300 , and the first buffer layer 300 is located between the substrate 100 and at least part of the first test wires 420 . The first test wire 420 directly contacts the first buffer layer 300 . In this embodiment, a first buffer layer 300 extends laterally and continuously, but the invention is not limited to this. In other embodiments, the first buffer layer 300 includes a plurality of portions separated from each other, and each portion overlaps a corresponding plurality of first test wires 420 .

第一引腳430透過第一側邊導線440而電性連接至第一接墊244。第一引腳430位於測試接墊410與第一側邊導線440之間。第一測試導線420位於第一引腳430與測試接墊410之間。第一測試導線420將第一引腳430電性連接至對應的測試接墊410。在本實施例中,每個測試接墊410透過對應的一條或多條第一測試導線420而電性連接至對應的一條或多條第一引腳430。當一個測試接墊410電性連接至多條第一引腳430時,可以透過單一個測試接墊410一次測試多個第一引腳430,藉此降低測試步驟的操作難度。The first pin 430 is electrically connected to the first pad 244 through the first side wire 440 . The first pin 430 is located between the test pad 410 and the first side wire 440 . The first test lead 420 is located between the first pin 430 and the test pad 410 . The first test wire 420 electrically connects the first pin 430 to the corresponding test pad 410 . In this embodiment, each test pad 410 is electrically connected to the corresponding one or more first pins 430 through the corresponding one or more first test leads 420 . When one test pad 410 is electrically connected to multiple first pins 430, multiple first pins 430 can be tested at one time through a single test pad 410, thereby reducing the operational difficulty of the test step.

形成保護層450於第一側邊導線440上。保護層450從基板100的正面100a延伸至基板100的背面100b。在一些實施例中,保護層450包括吸光材料,但本發明不以此為限。A protective layer 450 is formed on the first side conductor 440 . The protective layer 450 extends from the front surface 100a of the substrate 100 to the back surface 100b of the substrate 100. In some embodiments, the protective layer 450 includes light-absorbing material, but the invention is not limited thereto.

請參考圖1C,將多個發光元件510設置於基板100的正面100a之上。在本實施例中,發光元件510接合至正面電路結構200的第二接墊242,其中每個發光元件510接合至至少兩個第二接墊242。發光元件510例如為迷你發光二極體、微型發光二極體或其他合適的發光元件。在一些實施例中,也可以將感光元件或其他電子元件接合至正面電路結構200的第二接墊242。形成封裝層520於發光元件510上。Referring to FIG. 1C , a plurality of light-emitting elements 510 are disposed on the front surface 100 a of the substrate 100 . In this embodiment, the light-emitting elements 510 are bonded to the second pads 242 of the front-side circuit structure 200 , wherein each light-emitting element 510 is bonded to at least two second pads 242 . The light-emitting element 510 is, for example, a mini light-emitting diode, a micro light-emitting diode or other suitable light-emitting element. In some embodiments, photosensitive elements or other electronic components may also be bonded to the second pads 242 of the front circuit structure 200 . An encapsulation layer 520 is formed on the light emitting element 510 .

請參考圖1D,用至少一測試探針PB電性接觸測試接墊410以執行測試步驟。在本實施例中,由於測試接墊410的寬度較大(請參考圖2A),可以減少在測試步驟中線路或測試探針PB損傷的機率。Referring to FIG. 1D, at least one test probe PB is used to electrically contact the test pad 410 to perform the test step. In this embodiment, since the width of the test pad 410 is larger (please refer to FIG. 2A ), the probability of damage to the circuit or the test probe PB during the test step can be reduced.

請參考圖1E與圖2B,其中圖1E對應了圖2B中線A-A’的位置。移除部分的第一測試導線420,以使殘留的第一測試導線420與第一引腳430分離。在本實施例中,透過蝕刻剝除、機械力剝除(例如將撕除、刮除或其他類似的方式)、加熱剝除、溶解剝除或雷射切割的方式處理第一緩衝層300,以移除第一緩衝層300以及第一緩衝層300上的部分第一測試導線420。在本實施例中,在移除第一緩衝層300以及部分的第一測試導線420之後,第一切割道C形成於殘留的第一測試導線420與第一引腳430之間。Please refer to Figure 1E and Figure 2B, where Figure 1E corresponds to the position of line A-A’ in Figure 2B. A portion of the first test lead 420 is removed to separate the remaining first test lead 420 from the first pin 430 . In this embodiment, the first buffer layer 300 is processed by etching stripping, mechanical stripping (such as tearing off, scraping off, or other similar methods), heating stripping, dissolving stripping, or laser cutting. To remove the first buffer layer 300 and part of the first test wires 420 on the first buffer layer 300 . In this embodiment, after removing the first buffer layer 300 and part of the first test wire 420 , the first cutting line C is formed between the remaining first test wire 420 and the first pin 430 .

在本實施例中,透過移除第一緩衝層300的方式形成第一切割道C,但本發明不以此為限。在其他實施例中,可以省略第一緩衝層300的設置,且整個第一測試導線420直接形成於基板100上。在這種情況下,可以透過蝕刻、雷射或其他合適的方式來直接移除部分的第一測試導線420以形成第一切割道C。In this embodiment, the first scribe line C is formed by removing the first buffer layer 300, but the invention is not limited thereto. In other embodiments, the provision of the first buffer layer 300 may be omitted, and the entire first test wire 420 may be directly formed on the substrate 100 . In this case, a portion of the first test wire 420 may be directly removed through etching, laser or other suitable methods to form the first cutting track C.

請參考圖1F與圖2C,其中圖1F對應了圖2C中線A-A’的位置。將第一軟性電路板610接合至第一引腳430。在本實施例中,將薄膜覆晶封裝結構600接合至第一引腳430,其中薄膜覆晶封裝結構600包括晶片(未繪出)、第一軟性電路板610以及多個引腳620,其中引腳620透過導電連接結構700而接合至第一引腳430。導電連接結構700例如為銲料、導電膠或其他合適的材料。Please refer to Figure 1F and Figure 2C, where Figure 1F corresponds to the position of line A-A’ in Figure 2C. The first flexible circuit board 610 is bonded to the first pin 430 . In this embodiment, the film flip-chip packaging structure 600 is bonded to the first pin 430 , where the film flip-chip packaging structure 600 includes a chip (not shown), a first flexible circuit board 610 and a plurality of pins 620 , where The pin 620 is bonded to the first pin 430 through the conductive connection structure 700 . The conductive connection structure 700 is, for example, solder, conductive glue, or other suitable materials.

至此,電路基板10大致完成。在本實施例中,在製作電路基板10的過程中,可以透過位於基板100的背面100b的測試接墊410來執行測試步驟。藉由將測試接墊410設置於基板100的背面100b,能節省基板100的正面100a的線路布局空間,藉此減少基板100的正面100a的邊框寬度。At this point, the circuit substrate 10 is substantially completed. In this embodiment, during the process of manufacturing the circuit substrate 10, the testing step can be performed through the test pads 410 located on the backside 100b of the substrate 100. By disposing the test pads 410 on the back side 100b of the substrate 100, the circuit layout space on the front side 100a of the substrate 100 can be saved, thereby reducing the frame width of the front side 100a of the substrate 100.

圖3是依照本發明的一實施例的一種電路基板20的剖面示意圖。在此必須說明的是,圖3的實施例沿用圖1A至圖1F的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 3 is a schematic cross-sectional view of a circuit substrate 20 according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 3 follows the component numbers and part of the content of the embodiment of FIGS. 1A to 1F , where the same or similar numbers are used to represent the same or similar elements, and references with the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖3,在本實施例中,背面電路結構400中的第一引腳430與第一側邊導線440同時形成,且測試接墊410以及第一測試導線420同時形成。舉例來說,先形成第一引腳430與第一側邊導線440,接著再形成測試接墊410以及第一測試導線420。Please refer to FIG. 3 . In this embodiment, the first pin 430 and the first side wire 440 in the back circuit structure 400 are formed at the same time, and the test pad 410 and the first test wire 420 are formed at the same time. For example, the first pin 430 and the first side wire 440 are formed first, and then the test pad 410 and the first test wire 420 are formed.

圖4A至圖4C是依照本發明的一實施例的一種電路基板30的製造方法的仰視示意圖。在此必須說明的是,圖4A至圖4C的實施例沿用圖2A至圖2C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。4A to 4C are schematic bottom views of a manufacturing method of the circuit substrate 30 according to an embodiment of the present invention. It must be noted here that the embodiment of FIGS. 4A to 4C follows the component numbers and part of the content of the embodiment of FIGS. 2A to 2C , where the same or similar numbers are used to represent the same or similar elements, and the same or similar elements are omitted. Description of technical content. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖4A,形成第一緩衝層300於基板100的背面100b上。形成多條第一側邊導線440於基板100的側面100c上。第一側邊導線440從基板100的正面(未繪出)延伸至基板100的背面100b。Referring to FIG. 4A, a first buffer layer 300 is formed on the back surface 100b of the substrate 100. A plurality of first side wires 440 are formed on the side 100c of the substrate 100. The first side wires 440 extend from the front surface (not shown) of the substrate 100 to the back surface 100b of the substrate 100 .

形成背面電路結構400於基板100的背面100b上。背面電路結構400包括多個測試接墊410、多條第一測試導線420以及多個第一引腳430。在本實施例中,測試接墊410在第一方向D1上交錯排列。在本實施例中,部分的測試接墊410與基板100的側面100c之間的距離較另一部分的測試接墊410與基板100的側面100c之間的距離遠,藉此更有效的利用基板100的背面100b的線路布局空間。The backside circuit structure 400 is formed on the backside 100b of the substrate 100. The backside circuit structure 400 includes a plurality of test pads 410 , a plurality of first test leads 420 and a plurality of first pins 430 . In this embodiment, the test pads 410 are staggered in the first direction D1. In this embodiment, the distance between some test pads 410 and the side 100c of the substrate 100 is farther than the distance between another part of the test pads 410 and the side 100c of the substrate 100, thereby utilizing the substrate 100 more effectively. There is 100b of line layout space on the back.

形成保護層450於第一側邊導線440上。保護層450從基板100的正面(未繪出)延伸至基板100的背面100b。A protective layer 450 is formed on the first side conductor 440 . The protective layer 450 extends from the front surface (not shown) of the substrate 100 to the back surface 100b of the substrate 100 .

用至少一測試探針電性接觸測試接墊410以執行測試步驟。在本實施例中,由於測試接墊410的寬度較大,可以減少測試探針在測試步驟中對線路造成損傷的機率,並增加探針接觸的穩定性。At least one test probe is used to electrically contact the test pad 410 to perform the test step. In this embodiment, since the width of the test pad 410 is larger, the probability of the test probe causing damage to the circuit during the test step can be reduced, and the stability of the probe contact can be increased.

請參考圖4B,移除部分的第一測試導線420,以使殘留的第一測試導線420與第一引腳430分離。在本實施例中,透過蝕刻剝除、機械力剝除、加熱剝除、溶解剝除或雷射切割的方式處理第一緩衝層300,以移除第一緩衝層300以及第一緩衝層300上的部分第一測試導線420。在本實施例中,在移除第一緩衝層300以及部分的第一測試導線420之後,第一切割道C形成於殘留的第一測試導線420與第一引腳430之間。Referring to FIG. 4B , a portion of the first test lead 420 is removed to separate the remaining first test lead 420 from the first pin 430 . In this embodiment, the first buffer layer 300 is processed by etching stripping, mechanical stripping, heating stripping, dissolution stripping or laser cutting to remove the first buffer layer 300 and the first buffer layer 300 on the first test lead 420 . In this embodiment, after removing the first buffer layer 300 and part of the first test wire 420 , the first cutting line C is formed between the remaining first test wire 420 and the first pin 430 .

請參考圖4C,將第一軟性電路板610接合至第一引腳430。在本實施例中,將薄膜覆晶封裝結構600接合至第一引腳430,其中薄膜覆晶封裝結構600包括晶片(未繪出)、第一軟性電路板610以及多個引腳620。至此,電路基板30大致完成。Referring to FIG. 4C , the first flexible circuit board 610 is bonded to the first pin 430 . In this embodiment, the film flip-chip packaging structure 600 is bonded to the first pin 430 , where the film flip-chip packaging structure 600 includes a chip (not shown), a first flexible circuit board 610 and a plurality of pins 620 . At this point, the circuit substrate 30 is substantially completed.

圖5A至圖5C是依照本發明的一實施例的一種電路基板40的製造方法的仰視示意圖。在此必須說明的是,圖5A至圖5C的實施例沿用圖4A至圖4C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。5A to 5C are schematic bottom views of a manufacturing method of the circuit substrate 40 according to an embodiment of the present invention. It must be noted here that the embodiment of FIGS. 5A to 5C follows the component numbers and part of the content of the embodiment of FIGS. 4A to 4C , where the same or similar numbers are used to represent the same or similar elements, and the same or similar elements are omitted. Description of technical content. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖5A,形成第一緩衝層300於基板100的背面100b上。形成多條第一側邊導線440於基板100的側面100c上。第一側邊導線440從基板100的正面(未繪出)延伸至基板100的背面100b。Referring to FIG. 5A, a first buffer layer 300 is formed on the back surface 100b of the substrate 100. A plurality of first side wires 440 are formed on the side 100c of the substrate 100. The first side wires 440 extend from the front surface (not shown) of the substrate 100 to the back surface 100b of the substrate 100 .

形成背面電路結構400於基板100的背面100b上。背面電路結構400包括多個多個測試接墊410、多個連接結構411、多條連接線412、多條第一測試導線420以及第一引腳430。在本實施例中,測試接墊410以及連接結構411沿著第一方向D1交錯排列。在本實施例中,部分的測試接墊410與基板100的側面100c之間的距離較另一部分的測試接墊410與基板100的側面100c之間的距離遠。在本實施例中,部分的連接結構411與基板100的側面100c之間的距離較另一部分的連接結構411與基板100的側面100c之間的距離遠。A backside circuit structure 400 is formed on the backside 100b of the substrate 100. The backside circuit structure 400 includes a plurality of test pads 410, a plurality of connection structures 411, a plurality of connection lines 412, a plurality of first test wires 420, and a first pin 430. In this embodiment, the test pads 410 and the connection structures 411 are arranged alternately along the first direction D1. In this embodiment, the distance between some of the test pads 410 and the side surface 100c of the substrate 100 is greater than the distance between another portion of the test pads 410 and the side surface 100c of the substrate 100. In this embodiment, the distance between a portion of the connection structure 411 and the side surface 100 c of the substrate 100 is greater than the distance between another portion of the connection structure 411 and the side surface 100 c of the substrate 100 .

每個連接結構411電性連接至對應的多條第一測試導線420。每條連接線412將對應的一個連接結構411電性連接至對應的一個測試接墊410。在本實施例中,透過連接線412的設置,可以將對應於不同個薄膜覆晶封裝結構(請參考圖5C)的第一引腳430電性連接至同一個測試接墊410。Each connection structure 411 is electrically connected to a corresponding plurality of first test leads 420 . Each connection line 412 electrically connects a corresponding connection structure 411 to a corresponding test pad 410 . In this embodiment, through the arrangement of the connecting wires 412, the first pins 430 corresponding to different thin film flip-chip packaging structures (please refer to FIG. 5C) can be electrically connected to the same test pad 410.

用至少一測試探針電性接觸測試接墊410以執行測試步驟。在本實施例中,由於測試接墊410的寬度較大,可以減少測試探針在測試步驟中對線路造成損傷的機率。在本實施例中,透過連接結構411以及連接線412而將更多的第一引腳430電性連接至同一個測試接墊410,因此,以探針接觸測試接墊410時,可以一次對更多條第一引腳430進行測試,藉此進一步降低測試步驟的難度。At least one test probe is used to electrically contact the test pad 410 to perform the test step. In this embodiment, since the width of the test pad 410 is larger, the probability of the test probe causing damage to the circuit during the test step can be reduced. In this embodiment, more first pins 430 are electrically connected to the same test pad 410 through the connection structure 411 and the connection wire 412. Therefore, when the probe is used to contact the test pad 410, the test pad 410 can be tested at one time. More first pins 430 are tested, thereby further reducing the difficulty of the test steps.

請參考圖5B,移除部分的第一測試導線420,以使殘留的第一測試導線420與第一引腳430分離。在本實施例中,透過蝕刻剝除、機械力剝除、加熱剝除、溶解剝除或雷射切割的方式處理第一緩衝層300,以移除第一緩衝層300以及第一緩衝層300上的部分第一測試導線420。在本實施例中,在移除第一緩衝層300以及部分的第一測試導線420之後,第一切割道C形成於殘留的第一測試導線420與第一引腳430之間。Referring to FIG. 5B , a portion of the first test lead 420 is removed to separate the remaining first test lead 420 from the first pin 430 . In this embodiment, the first buffer layer 300 is processed by etching stripping, mechanical stripping, heating stripping, dissolution stripping or laser cutting to remove the first buffer layer 300 and the first buffer layer 300 on the first test lead 420 . In this embodiment, after removing the first buffer layer 300 and part of the first test wire 420 , the first cutting line C is formed between the remaining first test wire 420 and the first pin 430 .

請參考圖5C,將第一軟性電路板610接合至第一引腳430。在本實施例中,將薄膜覆晶封裝結構600接合至第一引腳430,其中薄膜覆晶封裝結構600包括晶片(未繪出)、第一軟性電路板610以及多個引腳620。至此,電路基板40大致完成。Referring to FIG. 5C , the first flexible circuit board 610 is bonded to the first pin 430 . In this embodiment, the film flip-chip packaging structure 600 is bonded to the first pin 430 , where the film flip-chip packaging structure 600 includes a chip (not shown), a first flexible circuit board 610 and a plurality of pins 620 . At this point, the circuit substrate 40 is substantially completed.

圖6A至圖6C是依照本發明的一實施例的一種電路基板50的製造方法的仰視示意圖。在此必須說明的是,圖6A至圖6C的實施例沿用圖4A至圖4C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。6A to 6C are schematic bottom views of a manufacturing method of a circuit substrate 50 according to an embodiment of the present invention. It must be noted here that the embodiment of FIGS. 6A to 6C follows the component numbers and part of the content of the embodiment of FIGS. 4A to 4C , where the same or similar numbers are used to represent the same or similar elements, and the same or similar elements are omitted. Description of technical content. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖6A,形成第一緩衝層300以及第二緩衝層300a於基板100的背面100b上。形成多條第一側邊導線440於基板100的側面100c上。第一側邊導線440從基板100的正面(未繪出)延伸至基板100的背面100b。形成多條第二側邊導線440a於基板的另一個側面100d上。第二側邊導線440a從基板100的正面延伸至基板的背面100b。第一側邊導線440與第二側邊導線440a分別位於基板100的不同的側面100c, 100d上。分別形成保護層450, 450a於第一側邊導線440以及第二側邊導線440a上。保護層450, 450a從基板100的正面(未繪出)延伸至基板100的背面100b。Referring to FIG. 6A, a first buffer layer 300 and a second buffer layer 300a are formed on the back surface 100b of the substrate 100. A plurality of first side wires 440 are formed on the side 100c of the substrate 100. The first side wires 440 extend from the front surface (not shown) of the substrate 100 to the back surface 100b of the substrate 100 . A plurality of second side wires 440a are formed on the other side 100d of the substrate. The second side wire 440a extends from the front side of the substrate 100 to the back side 100b of the substrate. The first side wire 440 and the second side wire 440a are respectively located on different side surfaces 100c and 100d of the substrate 100. Protective layers 450 and 450a are respectively formed on the first side conductor 440 and the second side conductor 440a. The protective layers 450, 450a extend from the front surface (not shown) of the substrate 100 to the back surface 100b of the substrate 100.

形成背面電路結構400於基板100的背面100b上。背面電路結構400包括多個測試接墊410、多個連接結構411、多條連接線412、多條第一測試導線420、多條第二測試導線420a、多個第一引腳430、以及多個第二引腳430a。在本實施例中,測試接墊410在第一方向D1上交錯排列。連接結構411在第一方向D1上排列。The backside circuit structure 400 is formed on the backside 100b of the substrate 100. The back circuit structure 400 includes a plurality of test pads 410, a plurality of connection structures 411, a plurality of connection lines 412, a plurality of first test leads 420, a plurality of second test leads 420a, a plurality of first pins 430, and a plurality of first test leads 420a. a second pin 430a. In this embodiment, the test pads 410 are staggered in the first direction D1. The connection structures 411 are arranged in the first direction D1.

第一引腳430以及第二引腳430a分別透過第一側邊導線440以及第二側邊導線440a而電性連接至正面電路結構(未繪出)。第一測試導線420位於第一引腳430與測試接墊410之間,且第二測試導線420a位於第二引腳430a與連接結構411之間。The first pin 430 and the second pin 430a are electrically connected to the front circuit structure (not shown) through the first side wire 440 and the second side wire 440a respectively. The first test lead 420 is located between the first pin 430 and the test pad 410, and the second test lead 420a is located between the second pin 430a and the connection structure 411.

每個連接結構411電性連接至對應的多條第二測試導線420a。每條連接線412將對應的一個連接結構411電性連接至對應的一個測試接墊410。在本實施例中,透過連接線412的設置,可以將對應於不同個薄膜覆晶封裝結構(請參考圖6C)的第一引腳430與第二引腳430a電性連接至同一個測試接墊410。Each connection structure 411 is electrically connected to a corresponding plurality of second test leads 420a. Each connection line 412 electrically connects a corresponding connection structure 411 to a corresponding test pad 410 . In this embodiment, through the arrangement of the connecting wire 412, the first pin 430 and the second pin 430a corresponding to different thin film flip-chip packaging structures (please refer to FIG. 6C) can be electrically connected to the same test connection. MAT 410.

用至少一測試探針電性接觸測試接墊410以執行測試步驟。在本實施例中,由於測試接墊410的寬度較大,可以減少測試探針在測試步驟中對線路造成損傷的機率。在本實施例中,透過連接結構411以及連接線412而將多個第二引腳430a電性連接至同一個測試接墊410,因此,以探針接觸測試接墊410時,除了可以一次對多條第一引腳430進行測試外,還可以同時測試多條第二引腳430a,藉此進一步降低測試步驟的難度。At least one test probe is used to electrically contact the test pad 410 to perform the test step. In this embodiment, since the width of the test pad 410 is larger, the probability of the test probe causing damage to the circuit during the test step can be reduced. In this embodiment, multiple second pins 430a are electrically connected to the same test pad 410 through the connection structure 411 and the connection wire 412. Therefore, when contacting the test pad 410 with a probe, in addition to being able to conduct the test at one time In addition to testing multiple first pins 430, multiple second pins 430a can also be tested simultaneously, thereby further reducing the difficulty of the testing steps.

請參考圖6B,移除部分的第一測試導線420,以使殘留的第一測試導線420與第一引腳430分離。移除部分的第二測試導線420a,以使殘留的第二測試導線420a與第二引腳430a分離。在本實施例中,透過蝕刻剝除、機械力剝除、加熱剝除、溶解剝除或雷射切割的方式處理第一緩衝層300以及第二緩衝層300a,以移除第一緩衝層300、第一緩衝層300上的部分第一測試導線420、第二緩衝層300a以及第二緩衝層300a上的部分第二測試導線420a。在本實施例中,在移除第一緩衝層300、部分第一測試導線420、第二緩衝層300a以及部分第二測試導線420a之後,第一切割道C形成於殘留的第一測試導線420與第一引腳430之間,且第二切割道Ca形成於殘留的第二測試導線420a與第二引腳430a之間。Referring to FIG. 6B , a portion of the first test lead 420 is removed to separate the remaining first test lead 420 from the first pin 430 . A portion of the second test lead 420a is removed to separate the remaining second test lead 420a from the second pin 430a. In this embodiment, the first buffer layer 300 and the second buffer layer 300a are processed by etching stripping, mechanical stripping, heating stripping, dissolution stripping, or laser cutting to remove the first buffer layer 300 , part of the first test wire 420 on the first buffer layer 300, part of the second buffer layer 300a and part of the second test wire 420a on the second buffer layer 300a. In this embodiment, after removing the first buffer layer 300, part of the first test wire 420, the second buffer layer 300a and part of the second test wire 420a, the first cutting line C is formed on the remaining first test wire 420. and the first pin 430, and the second cutting track Ca is formed between the remaining second test lead 420a and the second pin 430a.

請參考圖7與圖6C,其中圖7對應了圖6C中線B-B’的位置。分別將第一軟性電路板610以及第二軟性電路板610a接合至第一引腳430以及第二引腳430a。在本實施例中,將薄膜覆晶封裝結構600接合至第一引腳430,其中薄膜覆晶封裝結構600包括晶片(未繪出)、第一軟性電路板610以及多個引腳620。將薄膜覆晶封裝結構600a接合至第二引腳430a,其中薄膜覆晶封裝結構600a包括晶片(未繪出)、第二軟性電路板610a以及多個引腳620a。至此,電路基板50大致完成。Please refer to Figure 7 and Figure 6C, where Figure 7 corresponds to the position of line B-B' in Figure 6C. The first flexible circuit board 610 and the second flexible circuit board 610a are respectively joined to the first pin 430 and the second pin 430a. In this embodiment, the film flip-chip packaging structure 600 is bonded to the first pin 430 , where the film flip-chip packaging structure 600 includes a chip (not shown), a first flexible circuit board 610 and a plurality of pins 620 . The film flip-chip packaging structure 600a is bonded to the second pin 430a, where the film flip-chip packaging structure 600a includes a chip (not shown), a second flexible circuit board 610a and a plurality of pins 620a. At this point, the circuit substrate 50 is substantially completed.

圖8是依照本發明的一實施例的一種電路基板60的局部仰視示意圖。在此必須說明的是,圖8的實施例沿用圖2A至圖2C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 8 is a partial bottom view of a circuit substrate 60 according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 8 follows the component numbers and part of the content of the embodiment of FIGS. 2A to 2C , where the same or similar numbers are used to represent the same or similar elements, and references with the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖8,在本實施例中,各第一測試導線420的最小寬度W1小於第一引腳430的最小寬度W2。第一測試導線420具有最小寬度W1的部分形成於第一緩衝層300上,因此,在後續移除第一緩衝層300的製程中,可以較輕易的將第一緩衝層300上的部分的第一測試導線420隨著第一緩衝層300一併移除。Please refer to FIG. 8 . In this embodiment, the minimum width W1 of each first test lead 420 is smaller than the minimum width W2 of the first pin 430 . The portion of the first test wire 420 with the minimum width W1 is formed on the first buffer layer 300. Therefore, in the subsequent process of removing the first buffer layer 300, the portion of the first buffer layer 300 can be easily removed. A test lead 420 is removed together with the first buffer layer 300 .

圖9是依照本發明的一實施例的一種電路基板70的剖面示意圖。在此必須說明的是,圖9的實施例沿用圖2A至圖2C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 9 is a schematic cross-sectional view of a circuit substrate 70 according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 9 follows the component numbers and part of the content of the embodiment of FIGS. 2A to 2C , where the same or similar numbers are used to represent the same or similar elements, and references with the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.

請參考圖9,在本實施例中,透過雷射製程來將第一測試導線420與第一引腳430分離。雷射製程形成將第一測試導線420與第一引腳430分離的第一切割道C。第一切割道C位於第一緩衝層300上。在一些實施例中,前述雷射製程於第一緩衝層300上留下割痕LS。Please refer to FIG. 9 . In this embodiment, the first test lead 420 and the first pin 430 are separated through a laser process. The laser process forms a first cutting track C that separates the first test lead 420 and the first pin 430 . The first cutting lane C is located on the first buffer layer 300 . In some embodiments, the aforementioned laser process leaves cuts LS on the first buffer layer 300 .

在一些實施例中,在將第一測試導線420與第一引腳430分離之前,形成於第一緩衝層300上的部分第一測試導線420的厚度小於直接形成於基板100上的另一部分第一測試導線420的厚度,因此,可以更輕易的在後續製程中利用雷射切割將第一緩衝層300上的部分第一測試導線420移除。In some embodiments, before the first test wire 420 is separated from the first pin 430 , the thickness of the part of the first test wire 420 formed on the first buffer layer 300 is smaller than the thickness of another part of the first test wire 420 formed directly on the substrate 100 . A thickness of the test wire 420, therefore, part of the first test wire 420 on the first buffer layer 300 can be more easily removed by laser cutting in the subsequent process.

綜上所述,在本發明的電路基板中,背面電路結構包括測試接墊。藉由將測試接墊設置於基板的背面,可以更有效的利用線路布局空間。此外,相較於直接以測試探針接觸第一引腳或第二引腳來執行測試步驟,以測試探針接觸測試接墊的製程比較不容易出現測試探針對位不准的問題,且測試探針不會對第一引腳或第二引腳造成損傷。In summary, in the circuit substrate of the present invention, the backside circuit structure includes test pads. By arranging the test pads on the back side of the substrate, the circuit layout space can be used more effectively. In addition, compared with directly using the test probe to contact the first pin or the second pin to perform the test step, the process of using the test probe to contact the test pad is less likely to cause misalignment of the test probe, and the test The probe will not cause damage to the first pin or the second pin.

10,20,30,40,60,70:電路基板10,20,30,40,60,70:Circuit substrate

100:基板100: Substrate

100a:正面100a: Front

100b:背面100b: back

100c,100d:側面100c,100d: side

200:正面電路結構200: Front circuit structure

210:第一絕緣層210: First insulation layer

220:第一導電層220: First conductive layer

230:第二絕緣層230: Second insulation layer

240:第二導電層240: Second conductive layer

244:第一接墊244:First pad

242:第二接墊242:Second pad

300:第一緩衝層300: First buffer layer

300a:第二緩衝層300a: Second buffer layer

400:背面電路結構400: Back circuit structure

410:測試接墊410: Test pad

411:連接結構411:Connection structure

412:連接線412:Connecting line

420:第一測試導線420: First test lead

420a:第二測試導線420a: Second test lead

430:第一引腳430: first pin

430a:第二引腳430a: Second pin

440:第一側邊導線440: First side wire

440a:第二側邊導線440a: Second side conductor

450,450a:保護層450,450a: protective layer

510:發光元件510:Light-emitting component

520:封裝層520: Encapsulation layer

600,600a:薄膜覆晶封裝結構600,600a: Thin film flip-chip packaging structure

610:第一軟性電路板610:The first flexible circuit board

610a:第二軟性電路板610a: Second flexible circuit board

620,620a:引腳620,620a: pin

700:導電連接結構700: Conductive connection structure

C:第一切割道C: First cutting lane

Ca:第二切割道Ca: second cutting channel

D1:第一方向D1: first direction

LS:割痕LS: cut mark

PB:測試探針PB: test probe

W1,W2:最小寬度W1, W2: minimum width

圖1A至圖1F是依照本發明的一實施例的一種電路基板的製造方法的剖面示意圖。 圖2A至圖2C是依照本發明的一實施例的一種電路基板的製造方法的仰視示意圖。 圖3是依照本發明的另一實施例的一種電路基板的剖面示意圖。 圖4A至圖4C是依照本發明的一實施例的一種電路基板的製造方法的仰視示意圖。 圖5A至圖5C是依照本發明的一實施例的一種電路基板的製造方法的仰視示意圖。 圖6A至圖6C是依照本發明的一實施例的一種電路基板的製造方法的仰視示意圖。 圖7是依照本發明的一實施例的一種電路基板的剖面示意圖。 圖8是依照本發明的一實施例的一種電路基板的局部仰視示意圖。 圖9是依照本發明的一實施例的一種電路基板的剖面示意圖。 1A to 1F are schematic cross-sectional views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. 2A to 2C are schematic bottom views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a circuit substrate according to another embodiment of the present invention. 4A to 4C are schematic bottom views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. 5A to 5C are schematic bottom views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. 6A to 6C are schematic bottom views of a manufacturing method of a circuit substrate according to an embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of a circuit substrate according to an embodiment of the present invention. FIG. 8 is a partial bottom view of a circuit substrate according to an embodiment of the present invention. Figure 9 is a schematic cross-sectional view of a circuit substrate according to an embodiment of the present invention.

10:電路基板 10:Circuit substrate

100:基板 100:Substrate

100a:正面 100a: Front

100b:背面 100b: back

200:正面電路結構 200: Front circuit structure

210:第一絕緣層 210: First insulation layer

220:第一導電層 220: First conductive layer

230:第二絕緣層 230: Second insulation layer

240:第二導電層 240: Second conductive layer

244:第一接墊 244:First pad

242:第二接墊 242:Second pad

400:背面電路結構 400: Back circuit structure

410:測試接墊 410: Test pad

420:第一測試導線 420: First test lead

430:第一引腳 430: first pin

440:第一側邊導線 440: First side wire

450:保護層 450:Protective layer

510:發光元件 510:Light-emitting component

520:封裝層 520: Encapsulation layer

600:薄膜覆晶封裝結構 600: Thin film flip-chip packaging structure

610:第一軟性電路板 610:The first flexible circuit board

620:引腳 620: pin

700:導電連接結構 700: Conductive connection structure

C:第一切割道 C: First cutting lane

Claims (10)

一種電路基板,包括:一基板;一正面電路結構,設置於該基板的正面上,且包括多個第一接墊;多條第一側邊導線,從該基板的該正面延伸至該基板的背面;一背面電路結構,設置於該基板的該背面上,且包括:多個第一引腳,透過該些第一側邊導線而電性連接至該些第一接墊;多個測試接墊,其中至少部分該些第一引腳位於該些測試接墊與該些第一側邊導線之間;以及多條第一測試導線,其中至少部分該些第一測試導線位於該些第一引腳與該些測試接墊之間,其中該些第一測試導線與該些第一引腳分離;以及至少一第一軟性電路板,接合至該些第一引腳。 A circuit substrate includes: a substrate; a front circuit structure, which is disposed on the front side of the substrate and includes a plurality of first pads; a plurality of first side wires extending from the front side of the substrate to the front side of the substrate The back side; a back circuit structure is disposed on the back side of the substrate and includes: a plurality of first pins electrically connected to the first pads through the first side wires; a plurality of test contacts pads, wherein at least some of the first pins are located between the test pads and the first side conductors; and a plurality of first test leads, wherein at least some of the first test conductors are located on the first Between the pins and the test pads, the first test leads are separated from the first pins; and at least a first flexible circuit board is connected to the first pins. 如請求項1所述的電路基板,其中該些測試接墊適用於被至少一測試探針電性接觸以執行一測試步驟。 The circuit substrate of claim 1, wherein the test pads are adapted to be electrically contacted by at least one test probe to perform a test step. 如請求項1所述的電路基板,更包括:一第一緩衝層,設置於該基板的該背面,其中該第一緩衝層位於該基板以及至少部分的該些第一測試導線之間。 The circuit substrate of claim 1, further comprising: a first buffer layer disposed on the back side of the substrate, wherein the first buffer layer is located between the substrate and at least part of the first test leads. 如請求項3所述的電路基板,其中該第一緩衝層上具有將該些第一測試導線與該些第一引腳分離的至少一第一切割道。 The circuit substrate as claimed in claim 3, wherein the first buffer layer has at least one first cutting track that separates the first test leads from the first pins. 如請求項1所述的電路基板,其中該背面電路結構更包括:多個連接結構,各該連接結構電性連接至對應的多條第一測試導線;多條連接線,各該連接線將對應的一個連接結構電性連接至對應的一個測試接墊。 The circuit substrate as claimed in claim 1, wherein the back circuit structure further includes: a plurality of connection structures, each of which is electrically connected to a corresponding plurality of first test leads; a plurality of connection lines, each of which connects A corresponding connection structure is electrically connected to a corresponding test pad. 如請求項1所述的電路基板,更包括:多條第二側邊導線,從該基板的該正面延伸至該基板的背面,其中該些第一側邊導線與該些第二側邊導線分別位於該基板的不同的側面上;以及至少一第二軟性電路板,其中該背面電路結構更包括:多個第二引腳,透過該些第二側邊導線而電性連接至該正面電路結構,其中該至少一第二軟性電路板接合至該些第二引腳;多條第二測試導線;多個連接結構,各該連接結構電性連接至對應的多條第二測試導線;多條連接線,其中各該連接線將對應的一個連接結構電性連接至對應的一個測試接墊。 The circuit substrate according to claim 1, further comprising: a plurality of second side conductors extending from the front side of the substrate to the back side of the substrate, wherein the first side conductors and the second side conductors respectively located on different sides of the substrate; and at least a second flexible circuit board, wherein the back circuit structure further includes: a plurality of second pins electrically connected to the front circuit through the second side wires A structure, wherein the at least one second flexible circuit board is bonded to the second pins; a plurality of second test leads; a plurality of connection structures, each of the connection structures is electrically connected to a corresponding plurality of second test leads; multiple Each connection line electrically connects a corresponding connection structure to a corresponding test pad. 如請求項1所述的電路基板,其中各該第一測試導線的最小寬度小於該些第一引腳的最小寬度。 The circuit substrate of claim 1, wherein the minimum width of each first test wire is smaller than the minimum width of the first pins. 一種電路基板的製造方法,包括:形成一正面電路結構於一基板的正面上,且該正面電路結構包括多個第一接墊;形成多條第一側邊導線於該基板的側面上,且該些第一側邊導線從該基板的該正面延伸至該基板的背面;形成一背面電路結構於該基板的該背面上,其中該背面電路結構包括:多個第一引腳,透過該些第一側邊導線而電性連接至該些第一接墊;多個測試接墊,其中至少部分該些第一引腳位於該些測試接墊與該些第一側邊導線之間;以及多條第一測試導線,其中至少部分該些第一測試導線位於該些第一引腳與該些測試接墊之間;用至少一測試探針電性接觸該些測試接墊以執行一測試步驟;移除部分的該些第一測試導線,以使殘留的該些第一測試導線與該些第一引腳分離;以及將至少一第一軟性電路板接合至該些第一引腳。 A method of manufacturing a circuit substrate, including: forming a front-side circuit structure on the front side of a substrate, and the front-side circuit structure includes a plurality of first pads; forming a plurality of first side conductors on the side of the substrate, and The first side wires extend from the front side of the substrate to the back side of the substrate; forming a back circuit structure on the back side of the substrate, wherein the back circuit structure includes: a plurality of first pins, through the The first side wires are electrically connected to the first pads; a plurality of test pads, in which at least some of the first pins are located between the test pads and the first side wires; and A plurality of first test leads, at least part of which are located between the first pins and the test pads; using at least one test probe to electrically contact the test pads to perform a test Steps: remove part of the first test leads to separate the remaining first test leads from the first pins; and bond at least one first flexible circuit board to the first pins. 如請求項8所述的電路基板的製造方法,更包括:形成一第一緩衝層於該基板的該背面,且至少部分的該些第 一測試導線形成於該第一緩衝層上;以及透過蝕刻剝除、機械力剝除、加熱剝除、溶解剝除或雷射切割的方式處理該第一緩衝層,以移除該第一緩衝層以及該第一緩衝層上的部分的該些第一測試導線,以使殘留的該些第一測試導線與該些第一引腳分離。 The manufacturing method of a circuit substrate as claimed in claim 8, further comprising: forming a first buffer layer on the back side of the substrate, and at least part of the third buffer layer A test lead is formed on the first buffer layer; and the first buffer layer is processed by etching stripping, mechanical stripping, heating stripping, dissolution stripping or laser cutting to remove the first buffer layer. layer and part of the first test wires on the first buffer layer, so that the remaining first test wires are separated from the first pins. 如請求項8所述的電路基板的製造方法,其中形成該背面電路結構的方法以及形成該些第一側邊導線的方法包括網印、壓印、移印、噴墨印刷或濺鍍。The manufacturing method of a circuit substrate according to claim 8, wherein the method of forming the backside circuit structure and the method of forming the first side conductors include screen printing, imprinting, pad printing, inkjet printing or sputtering.
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Citations (6)

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Publication number Priority date Publication date Assignee Title
CN109559667A (en) * 2019-01-04 2019-04-02 京东方科技集团股份有限公司 A kind of array substrate, its test method and display panel, display device
WO2021102899A1 (en) * 2019-11-29 2021-06-03 京东方科技集团股份有限公司 Side wire resistance measuring method for display sustrate, and display substrate
TW202143200A (en) * 2020-05-14 2021-11-16 友達光電股份有限公司 Pixel array substrate
WO2022124157A1 (en) * 2020-12-08 2022-06-16 京セラ株式会社 Display device
CN115548007A (en) * 2022-02-25 2022-12-30 友达光电股份有限公司 Display panel and manufacturing method thereof
TW202303545A (en) * 2021-03-26 2023-01-16 群創光電股份有限公司 Manufacturing method of electronic device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109559667A (en) * 2019-01-04 2019-04-02 京东方科技集团股份有限公司 A kind of array substrate, its test method and display panel, display device
WO2021102899A1 (en) * 2019-11-29 2021-06-03 京东方科技集团股份有限公司 Side wire resistance measuring method for display sustrate, and display substrate
TW202143200A (en) * 2020-05-14 2021-11-16 友達光電股份有限公司 Pixel array substrate
WO2022124157A1 (en) * 2020-12-08 2022-06-16 京セラ株式会社 Display device
TW202303545A (en) * 2021-03-26 2023-01-16 群創光電股份有限公司 Manufacturing method of electronic device
CN115548007A (en) * 2022-02-25 2022-12-30 友达光电股份有限公司 Display panel and manufacturing method thereof

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