TWI831852B - A fluid delivery system and a method of electroplating a workpiece - Google Patents
A fluid delivery system and a method of electroplating a workpiece Download PDFInfo
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- TWI831852B TWI831852B TW108138455A TW108138455A TWI831852B TW I831852 B TWI831852 B TW I831852B TW 108138455 A TW108138455 A TW 108138455A TW 108138455 A TW108138455 A TW 108138455A TW I831852 B TWI831852 B TW I831852B
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- 239000012530 fluid Substances 0.000 title claims abstract description 229
- 238000009713 electroplating Methods 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 5
- 238000010586 diagram Methods 0.000 description 9
- 238000007747 plating Methods 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 241001469893 Oxyzygonectes dovii Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003094 perturbing effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
本發明係有關於用於槽中,特別是例如電鍍系統中之處理槽的流體輸送系統及電鍍工件的方法。 The present invention relates to a fluid delivery system for use in a tank, particularly a treatment tank such as an electroplating system, and to a method of electroplating workpieces.
在一習知電鍍機中,多數工件托架可通過及相對收容如一電鍍溶液之一處理溶液的一槽移動。各工件托架與各欲電鍍工件可分離地結合。該等工件托架可序列地,即在一線上一個接著一個地移動通過該槽,以藉此使該等工件序列地移動通過該槽。該等欲電鍍工件之形狀通常為矩形且呈平面狀。當該等工件托架結合且承載該等工件時,該等工件垂直地定向且該等工件之相對主表面面向側方。該電鍍機因此可說是一垂直連續電鍍機。 In a conventional electroplating machine, a plurality of workpiece carriers are movable through and relative to a tank containing a treatment solution, such as a plating solution. Each workpiece holder is detachably coupled to each workpiece to be electroplated. The workpiece carriers can move through the slot sequentially, that is, one after the other on a line, thereby moving the workpieces sequentially through the slot. The shape of the workpieces to be electroplated is usually rectangular and planar. When the workpiece brackets are coupled and carry the workpieces, the workpieces are oriented vertically and opposite major surfaces of the workpieces face sideways. The electroplating machine can therefore be said to be a vertical continuous electroplating machine.
一陰極棒相對該電鍍機之槽固定,且各工件托架透過各滑動接頭與該陰極棒電氣地連接,以便在該等工件托架通過及相對該槽移動時與該陰極棒電氣地連接。各由一電源供電之多數陽極板係定位在該槽內且相對該槽固定。因此,當該等工件藉由該等工件托架移動通過該槽中之電鍍溶液時,它們受到該陰極棒與該等陽極板間之一電場作用,使得該電鍍溶液中之金屬沈積在該等工件 上。 A cathode rod is fixed relative to the tank of the electroplating machine, and each workpiece bracket is electrically connected to the cathode rod through sliding joints so as to be electrically connected to the cathode rod when the workpiece brackets pass through and move relative to the tank. A plurality of anode plates, each powered by a power source, are positioned within the tank and fixed relative to the tank. Therefore, when the workpieces move through the electroplating solution in the tank through the workpiece supports, they are affected by an electric field between the cathode rod and the anode plates, causing the metal in the electroplating solution to be deposited on the artifact superior.
一般習知的是該連續電鍍機中之電鍍槽可長達30至40公尺且該電鍍機之有效覆蓋區域可與一工件之寬度一樣短。因為該工件之導電性主要取決於電鍍時電鍍在該工件上之電鍍厚度,所以重要的是確保該等工件之主要表面未與該槽內之任何其他組件實體地接觸。但是,在習知電鍍機中,因為電鍍時由噴嘴噴射之流體射流(例如一電鍍溶液之射流)係在沿著該射流軸之任一點在一淨動量之守恆之情形下操作且因此與該工件之位置無關地在該工件上施加一小力,所以非常難以避免使移動通過該槽之各工件攝動。即使該工件藉由多個引導件或滾子在該槽中保持在中心線上,這些引導件或滾子無可避免地在某些點與該工件滑動接觸,且因此不利地影響電鍍品質。 It is generally known that the electroplating tank in the continuous electroplating machine can be 30 to 40 meters long and the effective coverage area of the electroplating machine can be as short as the width of a workpiece. Since the conductivity of the workpiece is primarily determined by the thickness of the plating applied to the workpiece during plating, it is important to ensure that no major surface of the workpiece is in physical contact with any other component in the tank. However, in conventional electroplating machines, because the fluid jet (such as a jet of electroplating solution) ejected from the nozzle during electroplating operates under the condition of conservation of net momentum at any point along the jet axis and is therefore consistent with the conservation of net momentum. A small force is exerted on the workpiece regardless of its position, so it is very difficult to avoid perturbing each workpiece moving through the slot. Even if the workpiece is held on the centerline in the groove by a plurality of guides or rollers, these guides or rollers inevitably come into sliding contact with the workpiece at some points, and thus adversely affect the plating quality.
因此本發明之一目的係提供用於電鍍機之流體輸送系統及電鍍方法,其中前述缺點減少或至少對商業及公眾提供一有用替代方案。特別地,已發現的是利用依據現有自動化電鍍系統之進一步改良及創新,至少可減少前述缺點。 It is therefore an object of the present invention to provide a fluid delivery system for an electroplating machine and an electroplating method in which the aforementioned disadvantages are reduced or at least provide a useful alternative to the business and public. In particular, it has been found that the aforementioned disadvantages can at least be reduced by further improvements and innovations based on existing automated electroplating systems.
依據本發明之一第一態樣,提供一種用於電鍍系統之流體輸送系統,其包括:至少一槽,其配置成收容一流體;一第一流體輸送器,其具有用於將該流體輸送至該槽中之一第一流體出口;一第二流體輸送器,其具 有一第二流體出口;及一第三流體輸送器,其具有一第三流體出口,該等第二與第三流體出口係用於朝相向方向將加壓流體輸送至該槽中,該槽具有一軸,一工件可相對該槽沿著該軸在該第二流體出口與該第三流體出口之間移動,其中該第二流體輸送器配置成將該加壓流體輸送離開該第二流體出口以便施加一第一斥力在朝向該第二流體輸送器偏離該軸一第一距離之該工件上以使該工件朝向該第三流體輸送器移動,其中該第二流體輸送器配置成將該加壓流體輸送離開該第二流體出口以便施加一第二斥力在朝向該第二流體輸送器偏離該軸一第二距離之該工件上以使該工件朝向該第三流體輸送器移動,其中該第一斥力比該第二斥力大且該第一距離比該第二距離大。 According to a first aspect of the present invention, a fluid transport system for an electroplating system is provided, which includes: at least one tank configured to receive a fluid; a first fluid transporter having a function for transporting the fluid to a first fluid outlet in the tank; a second fluid conveyor having There is a second fluid outlet; and a third fluid conveyor having a third fluid outlet, the second and third fluid outlets being used to convey pressurized fluid in opposite directions into the tank, the tank having an axis along which a workpiece is moveable relative to the slot between the second fluid outlet and the third fluid outlet, wherein the second fluid conveyor is configured to convey the pressurized fluid away from the second fluid outlet so as to Applying a first repulsive force on the workpiece offset from the axis a first distance toward the second fluid conveyor to move the workpiece toward the third fluid conveyor, wherein the second fluid conveyor is configured to move the pressurized The fluid is conveyed away from the second fluid outlet to exert a second repulsive force on the workpiece offset from the axis a second distance toward the second fluid conveyor to move the workpiece toward the third fluid conveyor, wherein the first The repulsive force is greater than the second repulsive force and the first distance is greater than the second distance.
依據本發明之一第二態樣,提供一種電鍍至少一工件的方法,其包括以下步驟:(a)將流體由一第一流體輸送器之一第一流體出口輸送至一槽;(b)將加壓流體朝相向方向由一第二流體輸送器之一第二流體出口且由一第三流體輸送器之一第三流體出口輸送至該槽中;(c)使該工件相對該槽沿著一軸在該第二流體出口與該第三流體出口之間移動;(d)在朝向該第二流體輸送器偏離該軸一第一距離之該工件上施加一第一斥力,以使該工件朝向該第三流體輸送器移動;及(e)在朝向該第二流體輸送器偏離該軸一第二距離之該工件上施加一第二斥力以使該工件朝向該第三流體輸送器移動,其中該第一斥力比該第二斥力大且該第一距離比該第二距離大。 According to a second aspect of the present invention, a method for electroplating at least one workpiece is provided, which includes the following steps: (a) transporting fluid from a first fluid outlet of a first fluid transporter to a tank; (b) Transport pressurized fluid in opposite directions into the groove from a second fluid outlet of a second fluid conveyor and from a third fluid outlet of a third fluid conveyor; (c) Make the workpiece relative to the edge of the groove moving between the second fluid outlet and the third fluid outlet along an axis; (d) exerting a first repulsive force on the workpiece that is offset from the axis by a first distance toward the second fluid conveyor, so that the workpiece moving toward the third fluid conveyor; and (e) exerting a second repulsive force on the workpiece offset from the axis by a second distance toward the second fluid conveyor to cause the workpiece to move toward the third fluid conveyor, The first repulsive force is greater than the second repulsive force and the first distance is greater than the second distance.
10:電鍍機 10:Electroplating machine
12:槽 12:Slot
14:工件 14:Artifact
15:工件托架 15: Workpiece holder
16:軸 16:Axis
100:流體輸送系統 100: Fluid delivery system
110a,110b,120,130:噴嘴 110a,110b,120,130:Nozzle
121:流體入口 121: Fluid inlet
122,132:流體出口 122,132: Fluid outlet
122a,122b,122c:出口 122a,122b,122c:Export
123:流路 123:Flow path
124:環形孔 124: Annular hole
125:外周邊 125:Outer perimeter
126:內周邊 126: Inner perimeter
127:止擋構件 127: Stop member
128:環形孔區域 128: Annular hole area
140,150:共用流體管 140,150: Common fluid pipe
142,152:入口 142,152: Entrance
d1:較大偏移 d 1 : Larger offset
d2:較小偏移 d 2 : Smaller offset
F1:斥力 F 1 : Repulsion
F2:公稱斥力 F 2 : Nominal repulsion
t:間隙厚度 t: gap thickness
以下只透過多個例子配合附圖說明本發明之多個實施例,其中:圖1係依據本發明一實施例之一流體輸送系統的立體圖;圖2係圖1所示之流體輸送系統的側視圖;圖3係圖1所示之流體輸送系統的部份端視圖;圖4a係圖1所示之流體輸送系統的端視圖;圖4b係圖1所示之流體輸送系統的另一端視圖;圖5a係依據本發明一實施例之一流體輸送系統的一噴嘴的前視圖;圖5b係該噴嘴沿著圖5a之線F-F的橫截面圖;圖5c係圖5a之噴嘴的示意側視圖;圖5d係圖5a之噴嘴的示意立體圖;圖5e係圖5a之噴嘴的立體圖;圖6係顯示該等噴嘴與該加壓噴嘴間之連接的示意立體圖;圖7a係顯示一工件明顯偏離通過一處理槽之一移動中心軸的一工件的示意圖;圖7b係顯示一工件稍微偏離該中心軸的示意圖;圖7c係顯示一工件對齊該中心軸的示意圖;圖8係該斥力相對在二不同流速之噴嘴與該工件間之間隙距離的圖;圖9a係顯示當該等噴嘴沒有流動時,該等噴嘴出口與 該工件間之實體接觸的示意圖;圖9b係顯示當該等噴嘴輸送一小流動時,該等噴嘴出口與該工件間之一小間隙距離的示意圖;圖9c係顯示當該等噴嘴輸送一大流動時,該等噴嘴出口與該工件間之一大間隙距離的示意圖;及圖10係顯示三種不同組態之該等噴嘴之噴嘴出口的斥力的圖。 The following only illustrates various embodiments of the present invention through multiple examples and accompanying drawings, wherein: Figure 1 is a perspective view of a fluid delivery system according to an embodiment of the present invention; Figure 2 is a side view of the fluid delivery system shown in Figure 1 View; Figure 3 is a partial end view of the fluid delivery system shown in Figure 1; Figure 4a is an end view of the fluid delivery system shown in Figure 1; Figure 4b is an other end view of the fluid delivery system shown in Figure 1; Figure 5a is a front view of a nozzle of a fluid delivery system according to an embodiment of the present invention; Figure 5b is a cross-sectional view of the nozzle along line F-F of Figure 5a; Figure 5c is a schematic side view of the nozzle of Figure 5a; Figure 5d is a schematic three-dimensional view of the nozzle of Figure 5a; Figure 5e is a three-dimensional view of the nozzle of Figure 5a; Figure 6 is a schematic three-dimensional view showing the connection between the nozzles and the pressurized nozzle; Figure 7a shows a workpiece clearly deviating through a A schematic diagram of a workpiece moving the central axis of one of the processing tanks; Figure 7b is a schematic diagram showing a workpiece slightly deviating from the central axis; Figure 7c is a schematic diagram showing a workpiece being aligned with the central axis; Figure 8 is a diagram showing the repulsive force at two different flow rates Figure 9a shows the gap distance between the nozzles and the workpiece; Figure 9a shows that when the nozzles are not flowing, the nozzle outlets and A schematic diagram of the physical contact between the workpieces; Figure 9b is a schematic diagram showing a small gap distance between the nozzle outlets and the workpiece when the nozzles deliver a small flow; Figure 9c shows a small gap distance when the nozzles deliver a large flow A schematic diagram of a large gap distance between the nozzle outlets and the workpiece during flow; and Figure 10 is a diagram showing the repulsive force of the nozzle outlets of the nozzles in three different configurations.
依據本發明一實施例之一垂直連續電鍍機的示意圖顯示在圖1至4b中且大致以10表示。 A schematic diagram of a vertical continuous electroplating machine according to an embodiment of the present invention is shown in FIGS. 1 to 4 b and is generally indicated by 10 .
該電鍍機10包括用於收容一電鍍溶液之一槽12。多數工件14宜一起形成可序列地通過且相對該槽12移動之一連續且可捲收材料。各欲電鍍工件14與一工件托架15可分離地結合而可實體地且電氣地連接以便與其建立實體及電氣連接。 The electroplating machine 10 includes a tank 12 for receiving an electroplating solution. Preferably, the plurality of workpieces 14 together form a continuous and retractable material that can be sequentially passed through and moved relative to the slot 12 . Each workpiece 14 to be electroplated is detachably coupled to a workpiece carrier 15 and can be physically and electrically connected to establish physical and electrical connections therewith.
該電鍍機10包括一流體輸送系統100。該流體輸送系統100包括用於將該電鍍溶液輸送至該槽12中之兩排相向噴嘴110a、110b(作為例如第一流體輸送器)。該等噴嘴110a固定地互相分開。類似地,該等噴嘴110b亦固定地互相分開。該等工件14序列地且在該等噴嘴110a、110b之間連續地移動通過該槽12,使得各工件14之一第一主表面面向該等噴嘴110a之出口且各工件14之一第二相對主表面面向該等噴嘴110b之出口。 The electroplating machine 10 includes a fluid delivery system 100 . The fluid delivery system 100 includes two rows of opposing nozzles 110a, 110b for delivering the plating solution into the tank 12 (as, for example, first fluid delivery devices). The nozzles 110a are fixedly separated from each other. Similarly, the nozzles 110b are also fixedly separated from each other. The workpieces 14 move through the slot 12 sequentially and continuously between the nozzles 110a, 110b, so that a first major surface of each workpiece 14 faces the outlet of the nozzles 110a and a second major surface of each workpiece 14 faces the outlet of the nozzles 110a. The main surface faces the outlet of the nozzles 110b.
操作該電鍍機10時,該工件14可沿著一 中心軸16移動,同時與該軸實質垂直地擺動。例如,該工件14可在該工件14與該軸16同軸之一第一位置與該工件14偏離該軸16之一第二位置之間擺動。該擺動係極度不必要的,因為該工件14會無法避免地接觸該槽12內之某些實體物體,特別是該等噴嘴110a、110b。這電鍍性能不必要地受到影響。 When operating the electroplating machine 10, the workpiece 14 can be moved along a The central axis 16 moves while swinging substantially perpendicular to the axis. For example, the workpiece 14 can swing between a first position in which the workpiece 14 is coaxial with the axis 16 and a second position in which the workpiece 14 is deviated from the axis 16 . This swing is extremely unnecessary because the workpiece 14 will inevitably contact some physical objects in the slot 12, especially the nozzles 110a, 110b. This plating performance is unnecessarily affected.
該流體輸送系統100更包括用於將該電鍍溶液加壓至一更高壓力且將該加壓電鍍溶液輸送至該槽12中的兩排噴嘴,即一排第二噴嘴120(作為例如第二流體輸送器)及一排第三噴嘴130(作為例如第三流體輸送器)。該等噴嘴120、130宜定位在該工件14之相對側且將該加壓電鍍溶液朝相反方向相向地且朝向該工件14之相對主表面輸送。 The fluid delivery system 100 further includes two rows of nozzles for pressurizing the electroplating solution to a higher pressure and delivering the pressurized electroplating solution to the tank 12 , that is, a row of second nozzles 120 (as, for example, a second row of nozzles). fluid conveyor) and a row of third nozzles 130 (as, for example, a third fluid conveyor). The nozzles 120 , 130 are preferably positioned on opposite sides of the workpiece 14 and deliver the pressurized plating solution in opposite directions toward opposite major surfaces of the workpiece 14 .
以下請參閱用於詳細說明噴嘴120、130之構造的圖5a至5e,各噴嘴120包括用於收納電鍍溶液之一流體入口121及用於將該電鍍溶液輸送至該槽12之一流體出口122。該流體入口121具有一圓形橫截面積,而該流體出口122具有一環形區域。該噴嘴120亦包括用於流體連通該流體入口121及該流體出口122之一流路123。該流路123之橫截面積由該流體入口121之較大橫截面積收歛至該流體出口122之較小橫截面積。起初,透過該流體入口121將該電鍍溶液以一第一速度導入該噴嘴120,且在通過該內流路123後以比該第一速度高之一第二速度通過該流體出口122排出。 Please refer to Figures 5a to 5e below for a detailed description of the structure of the nozzles 120 and 130. Each nozzle 120 includes a fluid inlet 121 for receiving the electroplating solution and a fluid outlet 122 for delivering the electroplating solution to the tank 12. . The fluid inlet 121 has a circular cross-sectional area, and the fluid outlet 122 has an annular area. The nozzle 120 also includes a flow path 123 for fluidly communicating the fluid inlet 121 and the fluid outlet 122 . The cross-sectional area of the flow path 123 converges from the larger cross-sectional area of the fluid inlet 121 to the smaller cross-sectional area of the fluid outlet 122 . Initially, the electroplating solution is introduced into the nozzle 120 at a first speed through the fluid inlet 121, and is discharged through the fluid outlet 122 at a second speed higher than the first speed after passing through the inner flow path 123.
該流體出口122更包括一環形孔124,即在該流路123之一圓環。該環形孔124可藉由一外周邊125及一內周邊126界限。該環形孔124不一定設置成一環形且該等外與內周邊125、126可設置成不同形狀。例如,該等外與內周邊125、126可個別地選自於如圓形、三角形、多邊形及甚至任何不規則形狀之任何三角學。 The fluid outlet 122 further includes an annular hole 124 , that is, a ring in the flow path 123 . The annular hole 124 may be bounded by an outer perimeter 125 and an inner perimeter 126 . The annular hole 124 need not be configured in an annular shape and the outer and inner peripheries 125, 126 may be configured in different shapes. For example, the outer and inner perimeters 125, 126 may be individually selected from any trigonometric shape such as circles, triangles, polygons, and even any irregular shape.
該環形孔124可延伸通過形成在該流體入口121與該流體出口122間之流路123。特別地,一環形通道可由沿著該流路123設置之一圓柱形止擋構件127形成。該止擋構件127穩定沿著該流路123之壓力且增加在該流體出口122之加壓流體的壓力。為維持一穩定流動,該止擋構件127宜設置在該流路123之一中心部份。即,若該噴嘴120及該止擋構件127均呈圓柱形,則該噴嘴120及該止擋構件127形成一同心配置。 The annular hole 124 can extend through the flow path 123 formed between the fluid inlet 121 and the fluid outlet 122 . In particular, an annular channel may be formed by a cylindrical stop member 127 provided along the flow path 123 . The stop member 127 stabilizes the pressure along the flow path 123 and increases the pressure of the pressurized fluid at the fluid outlet 122 . In order to maintain a stable flow, the stopper member 127 is preferably disposed in a central portion of the flow path 123 . That is, if the nozzle 120 and the stop member 127 are both cylindrical, then the nozzle 120 and the stop member 127 form a concentric arrangement.
請參閱圖6所示之一示範實施例,該等第一噴嘴110a及該等第二噴嘴120在上游與一共用流體管140連接,且另一方面,在相對側之該等第一噴嘴110b(圖6中未示出)及該等第三噴嘴130與另一共用流體管150連接。該等第二噴嘴120及該等第三噴嘴130之直徑比該等第一噴嘴110a、110b大。該等第二噴嘴120及該等第三噴嘴130比該等第一噴嘴110a、110b靠近該工件14。因此,在該等第二噴嘴120之流體出口122的流速及在該等第三噴嘴130之流體出口的流速比在該等噴嘴110a、110b之出口的流速大。 Referring to an exemplary embodiment shown in FIG. 6 , the first nozzles 110 a and the second nozzles 120 are connected to a common fluid pipe 140 upstream, and on the other hand, the first nozzles 110 b on the opposite side (not shown in FIG. 6 ) and the third nozzles 130 are connected to another common fluid pipe 150 . The diameters of the second nozzles 120 and the third nozzles 130 are larger than those of the first nozzles 110a and 110b. The second nozzles 120 and the third nozzles 130 are closer to the workpiece 14 than the first nozzles 110a and 110b. Therefore, the flow rate at the fluid outlets 122 of the second nozzles 120 and the flow rate at the fluid outlets of the third nozzles 130 are greater than the flow rates at the outlets of the nozzles 110a and 110b.
例如,分別透過該等流體管140與150之入口142、152導入一流體流。一較低速度流體流分別通過該等第一噴嘴110a、110b之出口排出。一較高速度流體流通過該等第二與第三噴嘴120、130排出。較佳地,該等第二與第三噴嘴120、130各定位在互相分開一最小距離之二第一噴嘴110a、110b之間。 For example, a fluid flow is introduced through the inlets 142 and 152 of the fluid tubes 140 and 150 respectively. A lower speed fluid flow is discharged through the outlets of the first nozzles 110a and 110b respectively. A higher velocity fluid flow is discharged through the second and third nozzles 120, 130. Preferably, the second and third nozzles 120 and 130 are each positioned between the two first nozzles 110a and 110b that are separated from each other by a minimum distance.
請參閱圖7a至7c,該流體以一較低速度及一高靜壓力進入該流體入口121。接著,該流體透過一壓力降(由於白努力定理)被加速至一較高速度且透過形成在該流體出口122之圓形唇部與該工件14間之一環形孔區域128(即2πrt)離開該流體出口122。理論上,離開該流體出口122之流體的最終靜壓力必須等於該槽12中之外流體的壓力。因此,該環形孔124上游之流體的壓力比該外流體之壓力高且這壓力差在其間產生一「緩衝」。因此,該緩衝施加取決於在該流體出口122之離開流體與該外流體壓力間之壓力差的一斥力在該工件14上。 Referring to Figures 7a to 7c, the fluid enters the fluid inlet 121 at a relatively low velocity and at a high static pressure. The fluid is then accelerated to a higher velocity through a pressure drop (due to Hellenic's theorem) and exits through an annular hole region 128 (ie, 2πrt) formed between the circular lip of the fluid outlet 122 and the workpiece 14 The fluid outlet 122. Theoretically, the final static pressure of the fluid exiting the fluid outlet 122 must be equal to the pressure of the fluid outside the tank 12 . Therefore, the pressure of the fluid upstream of the annular hole 124 is higher than the pressure of the external fluid and this pressure difference creates a "buffer" therebetween. Therefore, the cushioning exerts a repulsive force on the workpiece 14 that is dependent on the pressure difference between the exiting fluid at the fluid outlet 122 and the external fluid pressure.
發明人亦透過自己的研究想出施加在該工件14上之斥力與該等流體出口122、132與該工件14間之對應間隙厚度t逆相關。該工件14由該軸16朝向該等噴嘴120、130中之一噴嘴的攝動會減少該環形區域128且因此增加通過該環形孔之流體速度。依據白努力定理,該上游壓力隨著提供之速度的平方增加且亦與該環形區域128之平方逆相關地增加。因此,該工件14定位成越靠近該流體出口122,該環形孔128之區域減少越多且施加在 該工件14上之斥力越大。 The inventor also found out through his own research that the repulsive force exerted on the workpiece 14 is inversely related to the corresponding gap thickness t between the fluid outlets 122 and 132 and the workpiece 14 . Perturbation of the workpiece 14 from the axis 16 toward one of the nozzles 120, 130 reduces the annular area 128 and thus increases the fluid velocity through the annular hole. According to White-Eye's theorem, the upstream pressure increases with the square of the supplied velocity and also increases inversely with the square of the annular area 128 . Therefore, the closer the workpiece 14 is positioned to the fluid outlet 122, the more the area of the annular hole 128 is reduced and exerted on The greater the repulsive force on the workpiece 14 is.
使用時,該工件14可沿著該軸16移動且由於該等第一噴嘴110a、110b之流,該工件14偏離該軸16。該工件14可沿著該軸16在該等第二噴嘴120與該等第三噴嘴130之間移動且由於該等第一噴嘴110a、110b所輸送之流體流而偏離該軸16。請參閱圖7a,相對該軸16具有一較大偏移d1,即一較小間隙t之工件14被由該第二流體出口122輸送之該加壓流體施加一斥力F1且可朝向該第三流體出口132移動。或者,相對該軸16具有一較小偏移d2,即圖7b所示之一較大間隙t的工件14被由該第二流體出口122輸送之該加壓流體施加一公稱斥力F2且可朝向該第三流體出口132移動。若該工件14定位成與該軸16實質地對齊,即無偏移,如圖7c所示,則由該第二流體出口122輸送之該加壓流體未施加任何其他力或至多施加一可忽略力在該工件14上。 In use, the workpiece 14 can move along the axis 16 and deviate from the axis 16 due to the flow of the first nozzles 110a, 110b. The workpiece 14 can move along the axis 16 between the second nozzles 120 and the third nozzles 130 and deviate from the axis 16 due to the fluid flow delivered by the first nozzles 110a, 110b. Referring to Fig. 7a, the workpiece 14 with a larger offset d1 relative to the axis 16, that is, a smaller gap t, is exerted a repulsive force F1 by the pressurized fluid delivered by the second fluid outlet 122 and can move toward the workpiece 14. The third fluid outlet 132 moves. Alternatively, the workpiece 14 having a smaller offset d 2 relative to the axis 16 , that is, a larger gap t as shown in FIG. 7 b , is exerted a nominal repulsive force F 2 by the pressurized fluid delivered by the second fluid outlet 122 and It can move toward the third fluid outlet 132 . If the workpiece 14 is positioned substantially aligned with the axis 16, ie without offset, as shown in Figure 7c, then the pressurized fluid delivered by the second fluid outlet 122 exerts no other force or at most a negligible force. The force is on the workpiece 14.
此外,發明人亦想出施加在該工件14上之斥力與該等噴嘴120、130之流速相關。這顯示在圖8中,且圖8顯示以該等噴嘴120、130與該工件14間之不同間隙施加在該工件14上的斥力。大致上,噴射至該工件14之加壓流的流速越大,施加在該工件14之主表面上的斥力越大。 In addition, the inventor also figured out that the repulsive force exerted on the workpiece 14 is related to the flow rate of the nozzles 120 and 130 . This is shown in Figure 8, which shows the repulsive force exerted on the workpiece 14 with different gaps between the nozzles 120, 130 and the workpiece 14. Generally speaking, the greater the flow rate of the pressurized flow injected to the workpiece 14 , the greater the repulsive force exerted on the main surface of the workpiece 14 .
請參閱三種不同組態之圖9a、9b與9c,其中該等第二與第三噴嘴120、130係在不同流速操作。若該噴嘴120產生一零流動,則因為該第一噴嘴110b朝一 相向方向之噴射動量,所以該噴嘴出口與該工件14之間的作用距離可忽略且甚至低至一零距離(請參見圖9a)。若該噴嘴120產生一小流動,則該噴嘴出口與該工件14之間的作用距離小,例如2mm(請參見圖9b)。最後,若該噴嘴120產生一大流動,則該噴嘴出口與該工件14之間的作用距離大,例如4mm(請參見圖9c)。 Please refer to Figures 9a, 9b and 9c of three different configurations in which the second and third nozzles 120 and 130 operate at different flow rates. If the nozzle 120 produces a zero flow, then because the first nozzle 110b faces a The jet momentum in the opposite direction is so that the effective distance between the nozzle outlet and the workpiece 14 is negligible and even as low as zero distance (see Figure 9a). If the nozzle 120 generates a small flow, the effective distance between the nozzle outlet and the workpiece 14 is small, such as 2 mm (see FIG. 9b ). Finally, if the nozzle 120 generates a large flow, the effective distance between the nozzle outlet and the workpiece 14 is large, such as 4 mm (see Figure 9c).
該等第二與第三噴嘴120、130應互相分開一所需間隙距離。若該等第二與第三噴嘴120、130互相分開一小距離,則由例如120之一噴嘴施加在該工件14上的斥力會過大且將該工件14推離該軸16且朝向另一噴嘴130。若該等第二與第三噴嘴120、130互相分開一過大距離,則由一噴嘴120施加在該工件14上的斥力可忽略且不足以將該工件14推向該軸16並抵消該偏移16。最佳地,該等第二與第三噴嘴120、130應放在比該工件14之厚度稍寬之一間隙距離之間,使得該工件14由該軸16之偏移可藉由來自二相反方向之流體出口122、132的加壓流來抵消。 The second and third nozzles 120 and 130 should be separated from each other by a required gap distance. If the second and third nozzles 120, 130 are separated by a small distance from each other, the repulsive force exerted on the workpiece 14 by one nozzle, such as 120, will be excessive and push the workpiece 14 away from the axis 16 and toward the other nozzle. 130. If the second and third nozzles 120 and 130 are separated from each other by an excessive distance, the repulsive force exerted by one nozzle 120 on the workpiece 14 is negligible and insufficient to push the workpiece 14 toward the axis 16 and offset the offset. 16. Optimally, the second and third nozzles 120, 130 should be placed between a gap distance slightly wider than the thickness of the workpiece 14, so that the deflection of the workpiece 14 from the axis 16 can be achieved by moving the workpiece 14 from two opposite directions. The pressurized flow in the direction of the fluid outlets 122, 132 is offset.
由三種不同組態之各組態產生的斥力亦顯示在圖10中,其中具止擋構件127之二出口122a、122b的性能與不具止擋127之出口122c(對照實驗)比較。大致上,若該止擋構件127由該流體出口122移除,該出口122之性能明顯地下降。 The repulsive force generated by each of the three different configurations is also shown in Figure 10, in which the performance of the two outlets 122a and 122b with the stopper member 127 is compared with the outlet 122c without the stopper 127 (control experiment). In general, if the stop member 127 is removed from the fluid outlet 122, the performance of the outlet 122 is significantly reduced.
應了解的是以上只是顯示多個例子,藉此可實施本發明,且在不偏離本發明之精神的情形下可對該 等例子進行各種修改及/或替換。 It should be understood that the above merely illustrates a number of examples by which the invention may be implemented and that the invention may be implemented without departing from the spirit of the invention. Make various modifications and/or substitutions to other examples.
亦應了解的是可在一單一實施例組合地提供為清楚了解而在不同實施例之上下文中說明的本發明的某些特徵。相反地,亦可分別地或以任何適當次組合提供為簡化而在一單一實施例之上下文中說明的本發明的各種特徵。 It is also to be understood that certain features of the invention, which are described in the context of different embodiments for clarity of understanding, may be provided in combination in a single embodiment. Conversely, various features of the invention, which are described for simplicity in the context of a single embodiment, may also be provided separately or in any suitable combination.
12:槽12:Slot
14:工件14:Artifact
100:流體輸送系統100: Fluid delivery system
110a,110b,120,130:噴嘴110a,110b,120,130:Nozzle
121:流體入口121: Fluid inlet
122,132:流體出口122,132: Fluid outlet
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